Introduction to metrology applications in IC manufacturing Metrology has grown significantly especially in semiconductor manufacturing and such growth necessitates increased expertise. Until now this field has never had book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges including measurement methods industrial applications fundamentals of traditional measurement system characterization and calibration measurement system characterization and calibration semiconductor specific applications optical metrology measurement techniques charged particle measurement techniques x ray and in situ metrology hybrid metrology and mask making. Includes example spreadsheets of measurement uncertainty analysis specifically precision matching and relative accuracy Preface Acknowledgments List of acronyms 1. Introduction 2. Metrology fundamentals: measurement system characterization and calibration using traditional definitions 3. Fundamental metrology: redefining measurement system analysis 4. Metrology in the semiconductor IC industry 5. Metrology toolsets in IC manufacturing: optical metrology 6. Metrology toolsets in IC manufacturing: charged particle metrology systems 7. Metrology toolsets in IC manufacturing: additional metrology systems 8. Limitations of metrology techniques and hybrid metrology 9. Metrology in mask making 10. Perspectives on future challenges and considerations Appendix Index