Optical lithography : here is why This book is written for new and experienced engineers technology managers and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography learn the basics of exposure systems and image formation and come away with a full understanding of system components processing and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author’s unique experience in research teaching and world class high volume manufacturing to add brand new material on proximity printing as well as updated and expanded material on exposure systems image formation E D methodology hardware components processing and optimization and EUV and immersion lithographies.