Reliability wearout mechanisms in advanced CMOS technologies Introduction Alvin W. Strong Dielectric characterization and reliability methodology Ernest Y. Wu Rolf Peter Vollertsen and Jordi Suñé Dielectric breakdown of gate oxides: physics and experiments Ernest Y. Wu Rolf Peter Vollertsen and Jordi Suñé Negative bias temperature instabilities in pMOSFET devices Giuseppe LaRosa Hot carriers Stewart E. Rauch III Stress induced voiding Timothy D. Sullivan Electromigration Timothy D. Sullivan