A list of nanomaterials that are of strategic importance for the semiconductor sector in the future (2019)

The NanoStreeM project collects and summarizes data on nanomaterials that come or may come of interest in future manufacturing of semiconductor devices and circuits. The layout and results of a systematic literature survey are described in the present document. The structured approach starts with the definition of the goals and definition of the research field followed by a delineation against areas that are beyond the scope of the task. In detail, only fabrication processes related to the manufacture or post-processing of silicon integrated circuits are under investigation. Although this field has been adressed by other authors, a thorough study is not existent. The NanoStreeM project collects and summarizes data on nanomaterials that come or may come of interest in future manufacturing of semiconductor devices and circuits. Nanomaterials like nanowires or 2-dimensional semiconductors offer unprecedented properties with respect to carrier mobilities or channel control in MOSFETs making them highly attractive for integration into ULSI technologies. The present study was conducted in the context of the NanoStreeM project with the objective to identify potential risks and hazards of emerging and future nanomaterials due to adoption in the semiconductor industry. After discussing the applicability of available sources, a two-stage strategy is developed for retrieving relevant data. As groundwork, the chapters on <em>Emerging Research Devices</em> and <em>Emerging Research Materials</em> of the meanwhile discontinued <em>International Technology Roadmap for Semiconductors</em> (2011 version) were used for the retrieval of keywords and the subsequent elaboration of search phrases for an extended literature search on a standard repository. A total of 58 keyword families with numerous variation possibilities were identified. As a compendium offering a thorough overview on the history and future of silicon based devices and respective manufacturing, the proceedings of the <em>IEEE International Electron Devices Meeting</em> (IEDM) from 1954 up to now were chosen. It is assumed that all relevant developments regarding Si related device concepts and processing should have been presented at this conference. Based on this survey, a total of 1080 articles (as of spring 2017) were identified that contain information on the application of nanomaterials in front-end silicon integrated circuit manufacturing. These instances were gathered in a literature database and categorized for further evaluation. The report reviews the emergence of 0-, 1- and 2-dimensional nanomaterials from concept via initial realization in laboratory until large-scale integration with current FEOL and BEOL schemes. The literature survey further indicates that most likely novel materials will morph into existing planar Si/Ge processing technology, which avoids handling of “free” nanomaterials. Therefore, top-down production of nano-functionalized materials and device approaches will not add additional hazards only because it is “nano”<strong>. </strong>This puts the emphasis on generic approaches in managing emerging risks related to new technologies, which are not limited only to nanotechnologies.