分类：社会民生-求职就业
问题：怎么翻译(在线等)摘要:本文对硅片清洗的基本理论、常用工艺方法和 
摘要:本文对硅片清洗的基本理论 、常用工艺方法和及硅片清洗清洗技术的研究历史、现状和发展前景作了简单论述，并对一些常用的清洗方案进行了浅析。同时对硅片的氧化及sio2膜的性质、用途作了阐述。 关键词：硅片清洗；硅的氧化   
回答：Wafer cleaning is the basic theory, common methods and techniques of wafer cleaning and washing techniques of history, status and prospects is a simple exposition, and some commonly used for the cleaning of the program. Meanwhile the oxidation of silicon and sio2 nature of the film, uses discussed. 

硅片清洗：Wafer cleaning 
硅的氧化：Silicon oxide