## Appendix A The Pseudo Code for MDBSCAN Preprocessing
\begin{tabular}{l l l} \hline \hline
**No.** & **Topic** & **Keywords** \\ \hline T41 & Arc evaporation & Super hydrophobicity, zinc oxide nanowires, arc ion plating, arc ion plating, DC arc spraying method \\ T42 & Plasma enhanced chemical & Silicon oxide micro ring core cavity, chemical vapor deposition cavity, deposition insulation layer, pulse power supply, chemical vapor deposition \\ T43 & screen printing & Substrate film, ink, pattern, semiconductor tube, scraper \\ T44 & Additive manufacturing & 3D printing, gel electrolyte, main arc power supply, UV curing, lamination \\ T45 & Electron beam evaporation & Zinc oxide nanocrystals, polymer-based composites, passivation alloys, \\ T46 & RF sputtering & Vacuum conditions, thin films, direct current, power, temperature \\ T47 & Laser pulse evaporation & Dielectric layer, nano plating, laser pen, pulsed light, alkaline solution \\ T48 & Piezoelectric method & Ultrasonic motor, integrated module, piezoelectric coefficient, electromechanical resonator, consistency \\ T49 & Inkjet printing & Hydrogen film, substrate, carbon ink, organic liquid source, \\ T50 & Transfer Integration & Integrated variable torque sensor, seal, substrate, heating element, circuit board \\ T51 & Nanoimprinting & Electron beam, template, transparent strip, flexible circuit strip, nano \\ T52 & Dry preparation & Surface nanostructure, photoresist, semiconductor device, dry \\ T53 & Wet preparation & Electromagnetic shielding film, wet etching machine, drilling, high-frequency mixed pressure, electroplating \\ T54 & Low pressure chemical & Plasma chemical vapor deposition machine, atomic flow, thin film, \\ T55 & Photolithography & Currosion resistance, laser, photolithography, concentric ring, grating \\ T56 & Capacitive type & Sensors, capacitors, nanowires, pressure, conductivity \\ T57 & Hot bubble method & Heat dissipation, metal nano ink, high-temperature sintering, particle-free copper ink, thermoplastic ink powder \\ T58 & Roll to roll preparation & Thermal conductive layer, deposited particles, roll-to-roll vacuum deposition machine, array, carbon nanotubes \\ T59 & DC sputtering & Nanoimprint adhesive, deposition layer, metal frame, DC sputtering, current \\ T60 & Resistive evaporation & Passive resistance film, coating machine, thin film, hole lithography, \\ T61 & Chemical vapor deposition & Chemical vapor deposition, photonic crystal period, cathode to ground, source plate, preparation method \\ T61 & Porous deposition & Porous, thin film, deposition system, agglomeration device, ion beam \\ T63 & Sol gel method & Bare electrode, sol gel method, synthetic rubber, magnetic absorber, \\ T64 & Inorganic display & Inorganic electroluminescence, substrate, luminescent material, display screen, coating \\ T65 & Blood oxygen & Blood oxygen signal, sensor, health, parameters, measuring instrument \\ T66 & Mechanical energy generation & Power generation film, generator, motor, energy, mechanism \\ T67 & Electroencephalogram & Sensitivity, recognition, intention, EEG signals, head-mounted \\ T68 & Piezoelectric type & Thermoelectric materials, pressure sensors, arrays, touch, sensitivity \\ T69 & temperature & Integrated sensing, ambient temperature, variable shape, sensor, \\ T70 & Organic semiconductor & Micron lens, electrode block, organic insulation layer, electroplated nickel, \\ T71 & pressure & Ultrasonic silicon solar energy \\ T72 & display & Organic field-effect transistor, large amplitude, bipolar plate, display screen, curved screen \\ T73 & chronic disease & Chronic diseases, physiological monitoring sensors, deposition rate, powder cavity, nanoliposomes \\ \hline \hline \end{tabular}