## 5 Advanced Setups
### \"Cleanroom in a Glovebox\" Setups  
In the research work of [PERSON] et al. [84], a vacuum cluster system integrated with several gloveboxes has been developed to enable oxygen- and moisture-free fabrication and characterization of devices, particularly those involving air-sensitive materials. This system comprises four interconnected gloveboxes linked to a high-vacuum chamber with a robotic arm, facilitating seamless transfer of samples without air exposure. The gloveboxes are filled with high-purity argon gas, maintaining moisture and oxygen levels below 1 ppm, crucial for preventing sample oxidation during fabrication processes. The gloveboxes are equipped with various tools: an optical microscope and thermal evaporator in Glovebox 1, a dry transfer system in Glovebox 2, a pattern generator in Glovebox 3, and a probe station in Glovebox 4, alongside additional equipment, like a spin-coater and hot plates (Figure 7). The gloveboxes are connected by buffer cluster and terminal chambers. This setup ensures a controlled environment for each step, maintaining a pressure of 10\({}^{-6}\) Torr in the cluster chamber. Utilizing this system, few-layer hafnium disulfide (HfS2) field-effect transistors (FETs) were fabricated, demonstrating high switching ratios (Ion/Ioff \(\approx\) 10\({}^{7}\)) and low hysteresis at room temperature. Despite the potential of HfS2 in optoelectronic applications due to its reasonable mobility, bandgap, and high photoresponsivity, the material showed rapid structural degradation when exposed to air, highlighting the necessity of the vacuum system to preserve its intrinsic properties. The research article _A Cleanroom in a Glovebox_ by [PERSON] et al. [86] describes the creation of a hybrid system that merges the benefits of traditional cleanrooms and gloveboxes to fabricate and characterize sensitive materials in an inert argon atmosphere. This innovative setup (Figure 8) includes two main chambers: one for lithography equipped with precision tools, like the Heidelberg uPG101 Direct-Write system, and another for characterization featuring advanced instruments, such as the WITec alpha300R confocal Raman system and a Nanomagnetics ezAFM. The glovebox is designed to maintain extremely low levels of oxygen and water through continuous argon recirculation, passing the gas through a copper column to adsorb contaminants and HEPA filters to remove particulate matter, achieving particle counts equivalent to a class 100 cleanroom. A custom-built antechamber connectsthe two main work chambers, allowing seamless sample transfer without air exposure. Additionally, an intermediate chamber at the back of the glovebox interfaces with an ultra-high vacuum (UHV) suitcase, enabling the system to connect to various UHV systems, like molecular-beam epitaxy and scanning tunneling microscopy, for advanced material analysis. The efficient maintenance of an inert atmosphere, with oxygen and water levels kept below 1 ppm, allows for high-quality material fabrication and characterization. The user-friendly design requires minimal training and no special attire, operating effectively for four years without needing filter replacements. This system provides a versatile and cost-effective solution for high-quality material fabrication and characterization, crucial for advancing research and training in quantum materials. In more recent work by [PERSON] et al. [87] in 2023, the authors introduced a cost-effective (\(\sim\)USD 32,000) and compact microfabrication setup specifically designed for the manipulation of 2D materials that are unstable in ambient conditions. Central to their approach is the use of a glovebox system with an inert nitrogen atmosphere containing less than 20 ppm oxygen. This system enables the entire fabrication process, including optical contact mask lithography, metal evaporation, and electric measurements, to be conducted without exposing the materials to air. Figure 7: Four-way glovebox in vacuum by [PERSON] et al. [84].