## 4 Case Study
### Analysis Phase
The test condition is to clean the dirt on the scraper in the coating every 30 min by the operator. If the experimental level is \"Yes\", the operator will clean the coater's scraper every 30 min. Avoid curing the photo resistor on the scraper. If the level is \"No\", the operator will not increase this cleaning action. 5. Wipe speed: Continue with the above question. The test condition requires the operator to clean the scraper, and the cleaning speed must slow down and remove the photo resistor on the scraper. If the experimental level is \"Y\", the operator must use the special organic solvent for each cleaning and the cleaning should not be too fast; the cleaning time should be more than 30 s. The residual photo resistor on the blade is completely removed. If the level is \"No\", the operator only needs to clean with 95% alcohol. And the wiping time needs to be within 30 s.
6. Sticky mat: The test condition is that the substrate is a wet film, and the sticky mat is installed on the floor of the working site near the working area, e.g., coating machine. If the experimental level is \"Yes\", the sticky mat is placed on the floor to prevent particle floating generation when the person is moving. If the level is \"No\", the floor maintains a perforated floor. 7. Dust sleeve: In order to prevent the equipment from dusting, the test condition is to set up the dust sleeve or adhesive paper on the machine to reduce the problem of dirt in the equipment (e.g., dusting on the arm of robot). If the experimental level is \"Yes\", put a dust sleeve or sticky paper that is easy to dust on the equipment. If the level is \"No\", it does not need to put on a dust sleeve and sticky paper. 8. VCD (vacuum dry): Test conditions for each exchange product change, the site required to clean the VCD equipment, and the High Efficiency Particulate Air (HEPA) on the ceiling of the area, because there is ~70% or greater by proportion of chemical solvents in the photo resistor. Therefore, the photo resistor needs to be extracted and dissociated by a chemical solvent after coating. The goal is to improve the stability of the process. This part is handled by the VCD. If the experimental level is \"Yes\", the VCD will be cleaned each time the production conditions are changed, and the HEPA above the VCD will be cleaned. If the level is \"No\", no cleaning is required when changing the production conditions. It only needs to be cleaned and maintained according to the original equipment maintenance frequency. 9. HP/CP: Test conditions for each exchange product line change, the site required to clean HP/CP equipment and the High Efficiency Particulate Air (HEPA) on the ceiling of the area. The photo resistor is coating on the glass, and the photo resistor exhibits a liquid state. It is easy to shift due to the movement of the glass. Therefore, it is necessary to cure through HP/CP. HP mainly heats the coated glass at a high temperature to fix the photo resistor. The temperature of the glass is cooled down through the CP to return to normal temperature. If the experimental level is \"Yes\", the HP/CP is cleaned each time the production conditions are changed. And clean the HEPA above the HP/CP. If the level is \"No\", there is no need to clean and maintain when changing production conditions. Just keep the general cleaning cycle. 10. Develop filter: In the wet development, the test condition is to add a secondary filter core to the pure water filter center. After the photo resistor is exposed, a chemical change is produced by the Developer. The developer during Development is recycled. Originally filtered through a filter before use. If the experimental level is \"Yes\", a filter with a smaller aperture will be added. The impurities in the developer are filtered. If the level is \"No\", keep a filter. * Ultrasonic: Test conditions for glass cleaning, open ultrasonic cleaning in the cleaner. In the current wet equipment, both the precleaner and developing machine are cleaned with pure water.