## 1 Introduction  
The emergence of powerful electromagnetic attack weapons poses a significant risk to sensitive electronic devices and photoelectric detection systems, as they are vulnerable to high-power electromagnetic attacks [1; 2; 3]. On the other side, as the application of technology deepens, frequency band resources are gradually becoming scarce. This scarcity leads to increased signal interference between different devices, and intensifies the competition for spectrum resources, which has now reached a white-hot stage. The photoelectric detection system requires robust electromagnetic protection materials that possess not only high shielding and ultra-wideband protection against strong electromagnetic attacks but also excellent infrared transmittance. This is essential for ensuring effective signal transmission and meeting the demands of high-quality communication and imaging. Electromagnetic shielding technology aims to mitigate the negative effects of electromagnetic interference (EMI) by utilizing effective shielding measures. Its purpose is to safeguard against potential harm caused by electromagnetic waves and to explore the use of shielding materials or methods to block or weaken the propagation of electromagnetic signals between a protected area and the outside world [4; 5; 6]. Filters are one of the many devices used for selecting frequency bands. They work by allowing electromagnetic waves of specific wavelengths to pass through. Traditional filters come in two main structures: a grid structure [7; 8] and a metal-based structure [9; 10]. The current transparent electromagnetic shielding materials, such as metal oxide conductive film and metal nanowire film materials, face a challenge in achieving high infrared transmittance and microwave shielding efficiency simultaneously. This is due to the mutual restriction between their infrared transmittance and conductivity. On the other hand, electromagnetic shielding materials that rely on metal grids face the challenge of limited shielding bandwidth due to high-pass filtering characteristics. This can result in a reduction of shielding effectiveness (SE) in the high-frequency region. Currently, most of the electromagnetic shielding materials that use metal grids employ a multilayer film system in combination with the grid. The multilayer film system utilizes materials that meet the demands for both high transmittance and light filtering. Additionally, the grid structure effectively shields microwave band signals. Furthermore, when utilizing metal-based conductive electromagnetic shielding materials, such as metal-based conductive transparent film and metal nanowire film, the electromagnetic energy is primarily shielded through either electromagnetic reflection or absorption. However, this process can result in a more intricate electromagnetic environment, leading to potential issues such as electromagnetic interference and radiation heating. Currently, it is of the utmost importance to discover a suitable structure or material that can effectively address the layer adhesion and diffraction issues in multilayer film and grid structures, respectively. Surface plasmons (SPs) possess exceptional characteristics, including subwavelength size, high electric field localization, and local field enhancement [11; 12]. By etching micro/nano structures of varying sizes onto a metal surface, the surface plasmons can enhance the optical transmission (EOT) and filtering effect of specific wavelengths [13; 14; 15; 16]. Simultaneously, the conductive structure created by the remaining metal film after etching forms a continuous shielding layer. This layer achieves high shielding and ultra-wideband effects in the radar band, effectively addressing the limitations of traditional strong electromagnetic protection materials. In this article, the circle hole array structure has been designed and optimized by a full wave simulation.