## Other Nanotechnology Applications  
Additively Manufactured W-Band Transmission Line Using Aerosol Air-brushing of Silver Nanoflakes (Poster)  
[PERSON] 1, [PERSON] 2, [PERSON] 3 and [PERSON] 1  
1 Department of Electrical Engineering, University of South Florida, Tampa, FL  
2 Department of Electrical Engineering, L3 Harris Technologies, Melbourne, FL  
3 Department of Electrical Engineering, Oregon State University, Corvallis, OR  
An affordable highly integrated, quasi-planar, and compact 75-110 GHz (W-band) transceiver can be implemented by using laser-enhanced direct-print additive manufacturing (LE-DPAM) for interconnects and packaging. LE-DPAM incorporates laser machining using a pico-second pulsed laser with a 355 nm (UV) or 1064 nm (IR) wavelength along with fused deposition modelling and aerosol air-brushing in a single digital additive manufacturing platform. The development of a full additive manufacturing process to deposit a thin-film conductor with low loss at millimeter wave frequencies as well as uniform thickness is reported. Novacentrix's HPS-FG77 is used to prepare a conductive paste infused with 85% silver nanoflakes with an average diameter of 0.3 \(\upmu\)m that can be diluted and air-brushed to produce a thin-film conductive layer with a DC conductivity as high as \(2.2\times 10^{7}\) S/m and uniform film thickness of around 1.5-2.0 \(\upmu\)m. The picosecond laser has a laser beam size of 5 \(\upmu\)m. It is used for the precise removal of additively deposited materials and the formation of high-aspect ratio structures. The laser has also been shown to significantly enhance the conductivity of the laser-trimmed regions of the conductor by sintering the silver nanoparticles near the edges. Figures 1 and 2 show the images of fabricated coplanar waveguide (CPW) transmission lines and measured results, respectively. With the additional degree of freedom in the z-axis, this allows for novel, high-precision, fast throughput additive manufacturing capabilities that are on par or better than traditional manufacturing techniques, especially at the millimeter wave frequencies.  
Photochemistry of (\(\eta^{3}\)-ally])Ru(CO)\({}_{3}\)X Precursors for Photoassisted Chemical Vapor Deposition  
[PERSON], [PERSON], [PERSON], [PERSON], [PERSON], [PERSON] and [PERSON]  
Chemical vapor deposition (CVD) is a potentially attractive technique for the metallization of organic thin films. However, thermal CVD processes often require high temperatures which are incompatible with organic substrates. Photochemistry provides an alternative means of initiating precursor decomposition without heating the substrate. Readily available Ru precursors, such as (\(\eta^{3}\)-ally)Ru(CO)\({}_{3}\)X (X = Cl, Br, I), have been used to deposit Ru on functionalized self-assembled monolayers by means of photochemical CVD as a model system for deposition of metal on a thermally sensitive substrate (Figure 1). Quantum yields for loss of a single CO ligand in alkane solutions were determined for the (\(\eta^{3}\)-ally)Ru(CO)\({}_{3}\)X complexes. The quantum yields were determined at 254, 313, and 334 nm. Trends in quantum yield with respect to wavelength and halide will be discussed. Very low levels of luminescence were observed for the compounds, demonstrating that radiative decay of the  
Figure 1: Left: HPS-FG77 air-brushed on AM ABS. Right: CPW transmission lines produced by laser trimming the air-brushed HPS-FG77 on ABS material.  
Figure 2: Measured S-parameter frequency responses for the CPW line of the airbrushed HPS-FG77 on ABS cured at 110 \({}^{\circ}\)C.  
excited states was not competitive with their photochemical reactions. The solution photochemistry will be discussed in the context of precursor design for photochemical deposition techniques.  
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