## 4 Analytical Discussion
### Methodology Journal Evaluation  
This section described the developed methods utilized to grow the films along with the films' substrates YIG characterizations and applications. The film quality is dependent on the preparation methods, which include the deposition factors, annealing control parameters, and YIG substitution ions [9; 33]. Based on the highly cited studies, the most favorable methodologies such as pulsed laser deposition (PLD), sputtering, and liquid phase epitaxy (LPE) have been developed with a frequency of 34, 17, and 13, respectively. Both the sol-gel and solid-state reaction methods have a frequency of two. Molecular beam epitaxy (MBE), metal-organic decomposition (MOD), and wet chemical techniques each have a frequency of one. Findings on the preparation of the YIG can be summarized based on a bibliometric analysis. * Pulsed laser deposition (PLD) is the most common technique preparation employed by highly cited articles as indicated in Table 1. For oxide film epitaxy, PLD is the most versatile method [7]. The works [2; 7; 8; 11; 12; 13; 14; 15; 16; 17; 19; 61; 17; 18; 19; 61; 75; 77; 81; 82; 83; 86; 87; 91; 94; 95; 107; 109; 111; 114; 117; 119; 124; 126; 130; 132] performed were used to prepare YIG films with the PLD method. Prior research demonstrated PLD processing of relatively low-damping YIG thin films [5]. Utilizing sputtering and PLD to prepare YIG enables precise control over layer thickness, stoichiometry, surface roughness, and magnetic properties [2]. Additionally, [PERSON] et al. [107] reported the growing of thin YIG films with bulk-like properties that had been obtained using the PLD technique. * Sputtering is the most prevalent industrial technique [5]. The articles [5; 6; 26; 27; 28; 30; 70; 72; 80; 89; 92; 97; 103; 121; 127; 131] discuss the sputtering growth of YIG films. This report [6] also indicates the viability of producing high-quality YIG nanofilms by the sputtering method. The papers have employed radio frequency (RF) magnetron sputtering, which is a well-established and reasonably inexpensive process for fabricating YIG film that would be excellent for usage in any potential industrial applications [26]. * Experiments to date have also utilized liquid phase epitaxy (LPE) to fabricate YIG films [17; 20; 21; 22; 23; 24; 93; 99; 105; 118; 129]. The LPE approach produces an excellent minority carrier lifetime, low damping value, and thick epitaxial layers. LPE produces thick, low-damping magnetic garnet films and high-quality magneto-optical material. In contrast to the PLD method, the LPE technique has low-cost equipment and operations [134]. * Additionally, it is shown that other various methodology processes including molecular beam epitaxy (MBE), wet chemical, sputtering, solid-state reaction, sol-gel, and metal-organic decomposition (MOD) techniques have been utilized in the production of garnet films. Hence, it is shown that high-quality thin and ultra-thin YIG films were produced using the PLD, LPE, and sputtering techniques to research spin-wave phenomena and construct YIG waveguides and nanostructures for spin-wave excitation, modulation, and detection in magnonic circuits [25]. The PLD method is the most advantageous approach among highly cited articles that have been proven to produce high-quality films for magneto-optical devices. The LPE technique is the most established technology for microwave devices because of its ability to produce thicker films than other technologies. LPE can produce sub-micrometer YIG films with excellent crystallographic and magnetic characteristics for magnon spintronics [25]. YIG film deposition has also been performed using the sputtering method [135]. Substrates are required for the growth of the film. There were four types of substrates reported by the highly cited articles.