# Supply Systems of Non-Thermal Plasma Reactors. Construction Review with Examples of Applications
## 4 Power Electronics Supply Systems for NTPR  
The use of static semiconductor voltage and frequency converters to NTPR is becoming more common and promising because of the enormous and ongoing progress in the field of semiconductor technologies, especially high power. There are many, based on power electronics, solutions of NTPR supply systems. Plasma reactors with DBDs, surface and co-planar discharges, atmospheric pressure plasma jets (APPI) are often energized from frequency resonant converters, RF and pulse power systems, flyback and forward converters. Plasma reactors with arc discharges can be supplied with both direct and alternating voltage and pulse voltage [43; 55]. Block diagrams of two basic constructions of DC power system of arc plasma reactors are presented in Figure 9. They consist of a bridge controlled on the secondary side of the matching transformer--Figure 9a or an AC controller on the primary side of the matching transformer--Figure 9b. Other solutions of DC arc power supply systems are modifications of the above mentioned structures. Among the alternate current (AC) power supply system's the AC/DC/AC are used to energize three and multielectrode arc plasma reactor. Highly efficient AC/DC/AC converters are more and more commonly applied in numerous applications of the plasma-chemical process. They enable adjustment of the voltage waveform, as well as the current, voltage, power and frequency regulation, for the purpose \begin{table}
\begin{tabular}{c c c c c c} \hline \hline  & & \multicolumn{2}{c}{**PROPANE**} & \multicolumn{2}{c}{**BUTANE**} \\ \hline Initial concentration (volume) & \% & **1.26** & 0.48 & 0.85 & 0.345 \\ Abatement level & \% & **54** & 22 & 47 & 19 \\ Flow rate & **m\({}^{3}\)/h** & **74** & 88 & 75 & 87 \\ Active power & kW & **4.3** & 3.8 & 4.2 & 4.1 \\ Gas temperature (inlet) & \({}^{\circ}\)C & **25** & 22 & 28 & 28 \\ Gas temperature (outlet) & \({}^{\circ}\)C & **410** & 188 & 400 & 210 \\ \hline SEI & kWh/m\({}^{3}\) & & 0.057 & 0.044 & 0.056 & 0.047 \\ SER & kWh/kg & & 4.3 & 21 & 5.4 & 28 \\ \hline \hline \end{tabular}
\end{table} 
Table 2: Laboratory experimental results [53]. \begin{table}
\begin{tabular}{c c c c c c c} \hline \hline  & \multicolumn{4}{c}{**Measurement 1**} & \multicolumn{4}{c}{**Measurement 2**} \\  & \multicolumn{2}{c}{**at Air Mixture Velocity 4 m/s**} & \multicolumn{2}{c}{**at Air Mixture Velocity 6m/s**} \\ \cline{2-7}
**Chemical** & \multicolumn{2}{c}{**Retention**} & \multicolumn{2}{c}{**Amount**} & \multicolumn{2}{c}{**Retention**} & \multicolumn{2}{c}{**Amount**} \\
**Compound** & \multicolumn{2}{c}{**Time**} & \multicolumn{2}{c}{**of Pollutants \%**} & \multicolumn{2}{c}{**Time**} & \multicolumn{2}{c}{**of Pollutants \%**} \\ \cline{2-7}  & \multicolumn{2}{c}{**min**} & \multicolumn{2}{c}{**before**} & \multicolumn{2}{c}{**after**} & \multicolumn{2}{c}{**min**} & \multicolumn{2}{c}{**before**} & \multicolumn{2}{c}{**after**} \\  & \multicolumn{2}{c}{**Treatment**} & \multicolumn{2}{c}{**Treatment**} & \multicolumn{2}{c}{**min**} & \multicolumn{2}{c}{**Treatment**} & \multicolumn{2}{c}{**Treatment**} \\ \hline methyl ethyl ketone & 13.78 & 0.38 & 7.38 & 13.749 & 0.28 & 4.70 \\ ethyl acetate & 14.85 & 13.39 & 9.20 & 14.828 & 13.37 & 8.96 \\
1-butanol & 18.47 & 1.09 & 2.14 & 18.462 & 1.06 & 1.20 \\ benzene & 21.12 & 10.25 & 9.90 & 21.118 & 10.15 & 10.47 \\ heptane & 21.33 & 66.36 & 62.0 & 21.338 & 68.10 & 65.8 \\ toluene & 21.97 & 6.32 & 5.70 & 21.976 & 6.59 & 6.24 \\ butyl acetate & 23.32 & 0.23 & 0.09 & 23.325 & 0.29 & 0.06 \\ ethyl benzene & 23.62 & 0.23 & 0.16 & 23.621 & 0.25 & 0.20 \\ xylene & 24.44 & 0.58 & 0.44 & 24.446 & 0.61 & 0.53 \\ \hline \hline \end{tabular}
\end{table} 
Table 3: Gas chromatography results of volatile organic compound (VOC) treatment [53]. of a given plasma process. Block diagram of sixth electrode GAD power supply system is presented in Figure 10[43; 55].