## 1 Introduction  
Glass production dates back several millennia, yet it was not until 1813 that [PERSON] achieved the micro-scale synthesis of quartz glass. Quartz glass, characterized by high hardness, high transmittance, and excellent chemical stability, has become an indispensable material in cutting-edge technologies such as optical devices, biomedical microstructures, space technology, and fiber-optic communications [1; 2; 3; 4]. With the rapid advancements in high-purity quartz glass preparation techniques, the primary methods for producing quartz glass include electric melting, gas refinement, chemical vapor deposition (CVD) [5; 6], and plasma chemical vapor deposition (PCVD) [7]. The electric melting method utilizes natural crystal or quartz sand as the raw materials, with electric resistance or medium-frequency induction as the heat sources. This method produces quartz glass with a low hydroxyl content and metal impurities, related to the raw material purity, and is commonly used in lighting and crucibles. [PERSON] [8] et al. prepared quartz glass tubes using the electric melting method, demonstrating that the lowest power consumption was achieved when using 160 kW to melt a 400 mm diameter quartz glass tube. The gas refinement method employs a mixture of hydrogen and oxygen as a heat source to melt the raw materials (natural crystal or quartz sand) into quartz glass. Due to the use of a hydrogen and oxygen mixture as the heat source, this type of quartz glass has a lower economic cost and is often applied in low-grade optical plates and fiber-optic holding rods. [PERSON] et al. [9] successfully prepared Yb\({}^{2+}\)/Yb\({}^{3+}\) co-doped quartz glass using the gas refinement method, which exhibited a strong absorption intensity and multiple absorption peaks, with the absorption spectrum tail extending to longer wavelengths. The CVD method uses SiCl\({}_{4}\) or other synthetic silicon compounds as the raw materials, with a mixture of hydrogen and oxygen as the heat source, to synthesize quartz glass through chemical deposition. This type of quartz glass possesses advantages such as high purity, high optical homogeneity, and radiation resistance and is commonly used in the production of precision optical lenses and ultraviolet optical plates. [PERSON] [10] et al. synthesized graphene superhydrophobic transparent glass using the CVD process, demonstrating adjustable quality for all glass samples, excellent film uniformity, and potential scalability. The PCVD process is employed to fabricate high-purity quartz glass. This method utilizes a plasma flame as a heat source and high-purity SiCl\({}_{4}\) as a precursor to produce Type IV quartz glass with the highest purity [11; 12]. The quartz glass produced by the PCVD process is characterized by low metal impurities and hydroxyl content, high optical homogeneity, high spectral transmittance, and a wide transmittance range (0.18-3.5 \(\upmu\)m), making it an ideal material for specialized optical applications and high-quality quartz materials. However, the PCVD process has the disadvantages of a slower deposition rate and a higher cost, so it cannot be widely used in the field of optical materials. For quartz glass used in the optical field, there are many factors affecting optical quartz glass, of which the hydroxyl content is particularly important. In terms of physical properties, too much hydroxyl content in optical quartz glass will lead to quartz glass at high temperatures prone to the cracking phenomenon, reducing its mechanical properties. In terms of chemical properties, the hydroxyl group easily controls gas and impurities, thus affecting the chemical stability and corrosion resistance of the quartz glass, in addition to affecting its radiation resistance [13; 14]. In terms of optical properties, the presence of the hydroxyl group reduces the light transmission performance and optical purity of the quartz glass and reduces its refractive index. Therefore, the preparation of quartz glass with a low hydroxyl content is particularly important.