## 1 Introduction
A polarization and angle insensitive ultra-broadband MA for the infrared spectrum was presented in [33], although it contains a complex multilayer structure with a very thin chromium dielectric. As a result, the manufacture and subsequent fabrication of the MA is a challenging process. Furthermore, this MA is suitable for 800 nm to 4000 nm which covers the infrared spectrum but not the visible optical spectrum and is also polarization-insensitive up to 60\({}^{\circ}\). An anisotropic plasmonic metasurface for the mid-infrared band was presented in [34]. This metasurface is highly sensitive to the oblique incidence angle and works as an absorber between 15\({}^{\circ}\) and 25\({}^{\circ}\) angle of oblique incidence, which is not ideal for broadband applications. It also employs gold, which increases the fabrication cost. Moreover, there are other works that achieve polarization insensitivity by using a water bubble [35], stair-like three-dimensional structured resonator [36] and tunable reconfigurable metasurface [37]. In [38], an ultrathin plasmonic absorber is presented. It uses gold (Au) as a resonating metal element making fabrication costly. Furthermore, these absorbers obtained only 71% in the visible spectrum from 400 to 700 nm with 45\({}^{\circ}\) incident angle stability. In [39],researchers employ a complex metal structure (gear-shape) of Fe. This structure can make the MA physically fragile. Moreover, Fe layer without any protective coating can cause oxidation. A silicon-based nanostructured polarization-insensitive broadband plasmonic absorber was studied in the article [40], which tolerates wide-incident angles for both TM and TE modes between 514 THz and 638 THz with 99.90% peak absorption. As common infrared absorbers, most earlier investigations have concentrated on multi-layered structures with alternating layers of metal and dielectric plates. This is performed in order to increase the absorption bandwidths. For example, to obtain absorption from 3000 to 5500 nm, [41] proposed an MA with 20 metal-dielectric layers. Despite the MA's extensive infrared light absorption, the construction approach relies on expensive multipole nanofabrication processes. Furthermore, most investigations reveal that the polarization angle and incidence angle vary during practical use. This renders optical and infrared MA design more challenging to develop. In addition, a simple MDM (metal-dielectric-meta) structured MA was described for optical and infrared regions of the spectrum. The uniqueness of the proposed structure is in its use of a small-size MA unit cell for both visible and near-infrared wavelength regions of the spectrum. The obtained absorber was further enhanced by introducing AR protective coating. A top layer of SiO\({}_{2}\) acts as an anti-reflection protective coating that enhances the absorption performance and protects the Tu metal layer from oxidation. The average absorption over the optical and first infrared spectrum includes the range of 380-1250 nm reaching 95.3%. Moreover, the absorption of the developed MA is polarization-independent with a significant incident angle stable up to 45\({}^{\circ}\). Further, a brief study of the electric field, magnetic field, and current density have been presented. The MA shows numerous excellent characteristics, including low cost, simple fabrication, simultaneous ultra-broad, and perfect absorption performances.