# Plasmonic and Dielectric Metasurfaces: Design, Fabrication and Applications
## 3 Dielectric Metasurfaces  
Dielectric metasurfaces are composed of high refractive index dielectric nanoparticles based on the Mie resonances. Several typical types of dielectric metasurfaces and previous relevant research are shown in Table 2: (1) a Er-doped Si-rich silicon nitride nano-pillar array is designed and fabricated using RF magnetron sputtering, electron beam lithography and reactive ion etching methods for enhanced omnidirectional light extraction and OAM beam generation [97]; (2) Si-based metasurfaces are designed and fabricated using electron-beam lithography and reactive ion etching techniques to possess sharp electromagnetically-induced transparency-like resonances in the near-infrared regime [111]; (3) silicon nanobeam antennas are designed and fabricated using low-pressure chemical  
Figure 17: (**a**) Center frequency tunable total absorption spectra of the split-ring graphene under different chemical potentials; (**b**) total absorption of the split-ring graphene when the chemical potential is \(\mu_{\text{c}}\) = 0 eV. Reproduced with permission from [122], Copyright The Optical Society, 2015. Figure 18: Schematic diagram of the fabrication process of the proposed graphene split-ring metasurface. EBL, electron-beam lithography. vapor deposition (LPCVD), electron-beam lithography and reactive ion etching techniques to generate Bessel beams [85]; (4) amorphous-silicon nanoridges are designed and fabricated using standard electron-beam lithography and reactive ion etching techniques to realize polarization beam splitting at the pixel-level [100]; (5) silicon nanodiscs are designed and fabricated using chemical vapor deposition, electron-beam lithography and reactive ion etching methods to achieve high transmission and full phase control in visible wavelengths [125]; (6) a silicon cut-wire array in combination with a silver ground plane are designed and fabricated using chemical vapor deposition, electron-beam lithography and reactive ion etching techniques to achieve high linear polarization conversion efficiency in the near-infrared band [126]; (7) the silicon nano-pillar array is designed and fabricated using electron-beam lithography and reactive ion etching techniques to realize low loss micro-lenses in the near-infrared band [127]; (8) dielectric metasurface with a tailored phase gradient is designed to achieve carpet cloaking at microwave frequencies [128]. All of these previous works are based on manipulating the Mie responses of dielectric nano-particles by altering the dimensions, directions, arrangement of unit structures and even combining multiple resonators with different shapes. Recently, we have also made some progress in dielectric metasurfaces on the basis of previous works. \begin{table}
\begin{tabular}{|p{142.3 pt}|p{142.3 pt}|} \hline  & \multicolumn{1}{p{142.3 pt}|}{Er-doped Si-rich silicon nitride nano-pillar array for enhanced omnidirectional light extraction and OAM beam generation. Reproduced with permission from [97], Copyright AIP Publishing LLC, 2012.} \\ \hline  & \multicolumn{1}{p{142.3 pt}|}{Si-based metasurfaces possessing sharp electromagnetically-induced transparency-like resonances in the near-infrared regime. Reproduced with permission from [111], Copyright Nature Publishing Group, 2014.} \\ \hline  & \multicolumn{1}{p{142.3 pt}|}{Silicon nanobeams antennas function as a flat axicon to generate Bessel beams. Reproduced with permission from [85], Copyright The American Association for the Advancement of Science, 2014.} \\ \hline  & \multicolumn{1}{p{142.3 pt}|}{Amorphous-silicon nanoridges to realize polarization beam splitting at the pixel-level. Reproduced with permission from [100], Copyright The Optical Society, 2015.} \\ \hline  & \multicolumn{1}{p{142.3 pt}|}{Amorphous-silicon nanoridges to realize polarization beam splitting at the pixel-level. Reproduced with permission from [100], Copyright The Optical Society, 2015.}