## 2 Materials and Methods  
Measurement Methods and Conditions of the DRE, Use Rate of Gas (\(U_{l}\)), and By-Product Emission Factor (\(B_{by\_product,\ i}\))  
DRE, the use rate of gas (\(U_{l}\)), and by-product emission factor (\(B_{by\_product,\ i}\)) were calculated on site using the semiconductor and display manufacturing facilities during normal operation. Based on the on-site circumstances and process gas being used, the volume flowrate of the gas entering and gas emitting processes from the abatement equipment was measured using a quadrupole mass spectrometer (QMS), and the concentration of the targeted FCs or N\({}_{2}\)O was measured using a Fourier transform infrared spectrometer (FT-IR) (Figure 1). The QMS and FT-IR equipment regulations used for measurement purposes are specified in SEMATECH [16], and measurements were performed using the equipment that complies with them. QMS is a mass spectrometer, mainly used for gas analysis, that uses an ion separation quadrupole. In this study, it was used for the purpose of calculating the flow rate of process exhaust gas by measuring the concentration of the injected tracer gas and calculating the dilution ratio, and a mass analyzer with a minimum specification of 0 to 100 amu should be used to include both the composition of the exhaust gas and the mass range of the tracer gas. Additionally, in order to maintain the vacuum pressure, a vacuum pump and pressure gauge were installed and used together. FT-IR is a device that enables qualitative and quantitative analysis by measuring the number of infrared rays absorbed by a sample, and it is used for the purpose of measuring the concentration of the target substance contained in the exhaust  
Figure 1: Diagram of measuring device installation for measuring DRE. gas from the process. The gas cell installed in the FT-IR uses standardized cells and vacuum-only fittings, and is accurately placed on the holder by attaching the window made of KBr, ZnSe, or Ge/ZnSe material through which infrared light passes. The gas cell that is suitable for the type and concentration of the target gas should be applied, as well as the length for each type of scrubber, as mentioned in Table S3. This measurement guidelines used for estimating the DRE, use rate of gas (\(U_{i}\)), and by-product emission factor (\(B_{by-product,i}\)) apply nitrova oxide (N\({}_{2}\)O), hydrofluorocarbon (HFC), perfluorocarbon (PFC), sulfur hexafluoride (SF\({}_{6}\)), and nitrogen trifluoride (NF\({}_{3}\)), among other semiconductors and display manufacturing process emissions as target substances in order to calculate the GHG emissions presented in the guidelines for reporting and certifying the trading of GHG emissions. Hydrofluorocarbons (such as HFC-23 (CHF\({}_{3}\)) and HFC-32 (CH\({}_{2}\)F\({}_{2}\))) and perfluorocarbons (such as PFC-14 (CF\({}_{4}\)), PFC-116 (C\({}_{2}\)F\({}_{6}\)), PFC-218 (C\({}_{3}\)F\({}_{8}\)), and PFC-c318 (c-C\({}_{4}\)F\({}_{8}\))) were used in this measurement method, and the detection limit (DL) for each gas cell of FT-IR was in accordance with Table S2. Interfering substances that were found to affect the measurement's results in the process included moisture found via spectrum interference. In order to eliminate this interference, the gas sample must be heated to 100 \({}^{\circ}\)C or more before the gas sample flows into the analysis device to minimize the inflow of moisture and substances, causing interference. Due to overlapping with the reference spectrum region of the target gas, measurements should be reset to a spectrum that does not overlap in order to minimize interference. The tracer gas injected into the pipeline to calculate the flow rate of the process exhaust gas was chemically stable and was also well mixed and diffused with the atmosphere, and the tracer gas that was applied used helium (He), neon (Ne), argon (Ar), krypton (Kr), and xenon (Xe) gases, which are inert gases used for measuring the volume flow rate of GHG emissions from the manufacturing process.