## 3 Results and Discussion
### Polishing Performance Analysis  
Figure 10 illustrates the impact of different abrasive concentrations on the fixed-point material removal profiles when phosphoric ester compounds were used as dispersants with a concentration of 1.0 wt%. At an abrasive concentration of 20 g/dm\({}^{3}\), the material removal profile exhibited a relatively smooth and regular \"W\" shape. As the abrasive concentration increased, the material removal depth also increased, indicating an improvement in the removal rate. However, the material removal profile became irregular, especially at an abrasive concentration of 100 g/dm\({}^{3}\), where the profile was highly irregular, with sharp transitions at the bottom. This is attributed to the decrease in abrasive dispersion stability because of the increase in abrasive concentration, leading to increased particle aggregation. This may cause temporary local blockages at the nozzle outlet, affecting the stability of the jet and consequently reducing the polishing quality.  
Figure 11 shows the influence of different phosphoric ester compounds concentrations on the fixed-point material removal profiles with an abrasive concentration of 20 g/dm\({}^{3}\). When the phosphoric ester compounds concentration was 1.0 wt% and 1.5 wt%, the material removal profiles were similar, presenting a relatively smooth and regular shape. However, when the phosphoric ester compounds concentration was 0.5 wt% and 3.0 wt%, the removal profiles were less smooth at the bottom transition and were asymmetrical compared to the former concentrations. This indicates that insufficient or excessive dispersant concentration leads to inadequate dispersibility, causing locally unstable pressure on the target surface and uneven material removal profiles.  
Figure 10: Removal morphology and removal profile at a phosphoric ester compounds concentration of 1.0 wt% with different abrasive concentrations: (**a**) abrasive concentration: 20 g/dm\({}^{3}\); (**b**) abrasive concentration: 60 g/dm\({}^{3}\); (**c**) abrasive concentration: 100 g/dm\({}^{3}\).  
Finally, local polishing experiments were conducted using grid path, and the surface morphology before and after polishing is shown in Figure 12. As a control group without the addition of a dispersant, the RMS of the polished K9 glass decreased from 32.291 nm to 14.748 nm, a reduction of 54.33%, and PV decreased from 135.832 nm to 83.071 nm, a reduction of 38.84%. With the addition of 1.0 wt% phosphoric ester compounds, the RMS of the polished K9 glass decreased from 25.067 nm to 4.451 nm, a reduction of 82.24%, and PV decreased from 113.053 nm to 35.078 nm, a reduction of 68.97%. Clearly, phosphoric ester compounds as dispersants significantly improved the polishing quality of MAWJP.  
Overall, the experimental results indicate that phosphoric ester compounds can enhance the polishing quality of the polishing solution within a certain concentration range. Under the conditions of an abrasive concentration of 20 g/dm\({}^{3}\) and a phosphoric ester compounds concentration of 1.0 wt%, the polishing effect is optimal, resulting in regular, smooth removal profiles and high-quality surface morphology.  
Figure 11: Removal morphology and removal profile at an abrasive concentration of 20 g/dm\({}^{3}\) with different phosphoric ester compounds concentrations: (**a**) phosphoric ester compounds concentration: 0.5 wt%; (**b**) phosphoric ester compounds concentration: 1.0 wt%; (**c**) phosphoric ester compounds concentration: 1.5 wt%; (**d**) phosphoric ester compounds concentration: 3.0 wt%.