###### Abstract  
The effect of the spatial arrangement in the physical vapor deposition (PVD) chamber on the composition and properties of coatings is considered using the example of the deposition of the (Ti,Al)N coating. The proposed method is one of the ways (along with varying the arc current of the cathodes and the bias voltage, as well as using alloy cathodes) to change the ratio of elements in the coating, and achieves this across a wide range of values. The three samples were located, respectively, opposite the evaporator with a titanium cathode, opposite the evaporator with an aluminum cathode and in an intermediate position between the two evaporators. The coating was deposited without rotating the turntable. The aluminum content in the coatings decreases from 94.2 at.% for the sample located directly opposite the evaporator with an Al cathode to 10.3 at.% for the sample located opposite the evaporator with a Ti cathode. In the coating deposited on the sample located opposite the aluminum cathode, the formation of a nitridded layer with a thickness of about 250 nm was observed in the substrate. The maximum hardness (32.3 \(\pm\) 1.7 GPa) belongs to a coating on the sample occupying an intermediate position. The coating on the sample located opposite the aluminum cathode has a hardness of 16.7 \(\pm\) 0.8 GPa. The coating hardness on the sample located opposite the titanium cathode is 28.5 \(\pm\) 1.1 GPa. The best fracture strength in the scratch test was observed for the coating on the sample occupying an intermediate position. The nature of the coating fracture in the scratch test was studied. A sufficiently high-quality coating can be obtained without rotating the turntable, and the coating composition can be controlled by changing the position of the sample relative to the evaporators. PVD coatings; spatial arrangement; content of elements; hardness; scratch test; nitriding 4.0.0.0000-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-0001-00001 of samples in the chamber. This ensures the relative identity of the coating properties in the horizontal plane, but such uniformity is not observed in the vertical plane. Obviously, when depositing a coating including two or more metal components, the composition of the coating will depend on its location relative to the plasma sources. At the same time, if we abandon the rotational movement of the samples, it is possible to vary the ratio of elements in the coating by changing the spatial location of the sample relative to the evaporators. Although such a deposition scheme is not rational for mass production (due to a significant reduction in the working area), its use may be justified in the process of research and in the manufacture of small batches of products. Previously, a number of studies have been conducted examining the effect of the spatial arrangement of the sample on the properties of the coating. It was found that the arrangement of samples during the deposition of a CrN coating affects the coating thickness and surface roughness, but does not affect its hardness [6]. A significant effect of the arrangement of the substrate surface relative to the plasma flows on the elemental and phase composition, as well as the tribological properties, of a W-S-C coating was found [7]. There are results of studies of the peculiarities of the deposition of metallic and nitride coatings based on Ti and Al. The simultaneous deposition of metallic Ti and Al on a substrate with a non-central orientation allows for synthesizing the intermetallic compounds TiAl, TiAl\({}_{2}\) and TiAl\({}_{3}\), while the ratio of elements and the composition of intermetallic compounds depend on the angle between the plasma flow axis and the substrate surface [8].