## 1 Introduction  
In recent decades, new levels of complexity and miniaturisation have been reached in micro- and nanotechnology manufacturing [1]. As described in various road maps such as the ITRS or IRDS, structure sizes continue to decrease, while wafer sizes increase in order to achieve the highest possible throughput [2, 3]. Highly accurate metrology is needed to achieve reproducible and error-free fabrication as well as the imaging of structures in various fields, such as nanoelectronics and semiconductors [4]. In the fabrication as well as the characterisation of nanostructures, many different alternative tools, in contrast to conventional methods, have been established, such as optical systems, tip-based systems as well as imprint tools [5]. However, most of these established technologies are limited to their measurement range. Especially with tip-based methods such as atomic force microscopy [6], there are usually a few square micrometres of area available in which the surface can be scanned with high precision. In order to meet these challenges of high-precision positioning and, at the same time, the possibility of positioning on large areas in the millimetre range, nanopositioning and namemeasuring machines can fill this gap. In the past decades, numerous research groups have worked on the development and improvement of nanopositioning technology [7]. For more than 20 years now, the Institute for Process Measurement and Sensor Technology at the Technische Universitat Ilmenau has invested a great deal of work in the development of nanopositioning technology. The first three-dimensional positioning machine was developed with a movement range of 25 mm \(\times\) 25 mm \(\times\) 5 mm [8]. Subsequently, another machine was developed with a much larger measuring and movement range:200 mm \(\times\) 200 mm \(\times\) 25 mm [9]. With these machines, the focus was primarily on a large movement range in all three spatial axes (\(x\), \(y\) and \(z\) direction). These machines can be equipped with various tools. For example, they can be used for characterisation by means of an autofocus sensor or an atomic force microscope (AFM) and for the production of structures via direct laser writing (DLW), nanoimprint lithography (NIL) and tip-based via field emission scanning probe lithography (FESPL) [5]. Especially for wafer-based technologies, it is of particular importance to have a stable \(z\) axis, which is why, in the development of a new type of nanopositioning machine, it was decided to limit the range of motion to two dimensions. This planar machine in combination with a tip-based measuring system was designed and developed by SIOS GmbH in cooperation with the companies IMMS GmbH and nano analytikh GmbH in Ilmenau [10]. With its range of motion of \(\mathcal{O}\)100 mm, this newly developed nanopositioning machine is used to explore atomic force microscopy on large surfaces with ultimate precision. In previous contributions, the enormous potential of the combination of a tip-based measurement system and the nanopositioning technique could yield first results. Line scans over millimetre ranges [11] as well as area scans [10] could be demonstrated, where the tip-based system realises the movement in the \(z\) direction and the machine table moves the sample in the \(x\) and \(y\) direction. In this paper, the focus lies on the positioning accuracy of the machine table itself, how the deviation from the given trajectory increases with higher speed. First of all, after the presentation and classification of various positioning systems, the machine which is used and its structure are explained in more detail. Subsequently, the components available are described and the basic control scheme is explained. The analysis of the positioning accuracy starts with the investigation of the static state in closed-loop control. The deviation from the predefined trajectory is to be considered in different traversing scenarios, such as linear and circular movements up to the maximum velocity of 20 mm/s.