Sentence:  The isolated disordered regions and the amorphous layer have widely different <WSD>anneal</WSD> behavior. In the case of germanium and silicon, the isolated disordered regions <WSD>anneal</WSD> at moderate temperatures of approximately 200° and 300° C, respectively. The amorphous layers also <WSD>anneal</WSD> in a characteristic fashion, but at appreciably higher temperatures, i.e., at approximately 600° C in silicon and 400° C in germanium. It should be noted that even though both types of disorder can be <WSD>annealed</WSD> at temperatures well below those where diffusion of the dopant species occurs, there are still defects present. 
Meaning of the word marked with <WSD> tags:  To subject to great heat and then (often slow) cooling, and sometimes reheating and further cooling, for the purpose of rendering less brittle; to temper; to toughen.