Sentence:  The isolated disordered regions and the amorphous layer have widely different anneal behavior. In the case of <WSD>germanium</WSD> and silicon, the isolated disordered regions anneal at moderate temperatures of approximately 200° and 300° C, respectively. The amorphous layers also anneal in a characteristic fashion, but at appreciably higher temperatures, i.e., at approximately 600° C in silicon and 400° C in <WSD>germanium</WSD>. 
Meaning of the word marked with <WSD> tags:  (Q867)A nonmetallic chemical element ("symbol" Ge) with an atomic number of 32: a lustrous, hard-brittle, grayish-white metalloid in the carbon group.