2000R1334 — EN — 19.01.2002 — 003.001 — 1
This document is meant purely as a documentation tool and the institutions do not assume any liability for its contents
►B COUNCILREGULATION(EC)No1334/2000
of22June2000
settingupaCommunityregime forthecontrolofexportsofdual-useitemsandtechnology
(OJ L 159, 30.6.2000, p. 1)
Amended by:
Official Journal
No page date
►M1Council Regulation (EC) No 2889/2000 of 22 December 2000 L 336 14 30.12.2000
►M2Council Regulation (EC) No 458/2001 of 6 March2001 L 65 19 7.3.2001
►M3Council Regulation (EC) No 2432/2001 of 20 November 2001 L 338 1 20.12.2001
Corrected by:
►C1Corrigendum, OJ L 176, 15.7.2000, p. 52 (1334/2000)
►C2Corrigendum, OJ L 10, 12.1.2002, p. 82 (2432/2001)
▼B
COUNCILREGULATION(EC)No1334/2000
of22June2000
setting up a Community regime for the control of exports of dual-
useitemsandtechnology
THE COUNCIL OF THE EUROPEAN UNION,
Having regard to the Treaty establishing the European Community, and
in particular Article 133 thereof,
Having regard to the proposal from the Commission(1),
Whereas:
(1)Dual-use items (including software and technology) should be
subject to effective control when they are exported from the
Community.
(2)An effective common system of export controls on dual-use itemsis necessary to ensure that the international commitments and
responsabilities of the Member States, especially regarding non-proliferation, and of the European Union, are complied with.
(3)The existence of a common control system and harmonisedpolicies for enforcement and monitoring in all Member States is aprerequisite for establishing the free movement of dual-use itemsinside the Community.
(4)The current regime of export controls on dual-use itemsestablished by Regulation (EC) No 3381/94(
2), and Decision
94/942/CFSP(3), needs to be further harmonised in order to
continue to guarantee the effective application of controls.
(5)Common lists of dual-use items, destinations and guidelines areessential elements for an effective export control system; suchlists have been established by Decision 94/942/CFSP andsubsequent amendments and should be incorporated into thisRegulation.
(6)The responsability for deciding on applications for exportauthorisations lies with national authorities. National provisions
and decisions affecting exports of dual-use items must be taken in
the framework of the common commercial policy, and inparticular Council Regulation (EEC) No 2603/69 of 20 December1969 establishing common rules for exports(
4).
(7)Decisions to update the common lists of dual-use items must be infull conformity with the obligations and commitments that eachMember State has accepted as a member of the relevantinternational non-proliferation regimes and export control
arrangements, or by ratification of relevant international treaties.
(8)Transmission of software and technology by means of electronic
media, fax or telephone to destinations outside the Communityshould also be controlled.
(9)Particular attention needs to be paid to issues of reexport and end-use.
(10)On 22 September 1998 representatives of the Member States andthe European Commission signed Protocols additional to therespective safeguards agreements between the Member States, theEuropean Atomic Energy Community and the InternationalAtomic Energy Agency, which, among other measures, oblige2000R1334 — EN — 19.01.2002 — 003.001 — 2
(1) OJ C 399, 21.12.1998, p. 1.
(2) OJ L 367, 31.12.1994, p. 1. Regulation as amended by Regulation (EC) No
837/95 (OJ L 90, 21.4.1995, p. 1).
(3) OJ L 367, 31.12.1994, p. 8. Decision as last amended by Decision 2000/243
CFSP (OJ L 82, 1.4.2000, p. 1).
(4) OJ L 324, 27.12.1969, p. 25. Regulation as last amended by Regulation
(EEC) No 3918/91 (OJ L 372, 31.12.1991, p. 31).
▼B
the Member States to provide information on specified equipment
and non-nuclear material.
(11)The Community has adopted a body of customs rules, containedin Council Regulation (EEC) No 2913/92 of 12 October 1992establishing the Community Customs Code(
1) and Commission
Regulation (EEC) No2454/93(2) implementing Regulation (EEC)
No 2913/92 which lay down, among other things, provisions
relating to the export and reexport of goods. Nothing in this
Regulation constrains any powers under and pursuant to theCommunity Customs Code and its implementing provisions.
(12)Pursuant to and within the limits of Article 30 of the Treaty andpending a greater degree of harmonisation, Member States will
retain the right to carry out controls on transfers of certain dual-
use items within the European Community in order to safeguardpublic policy or public security. Where these controls are linkedto the effectiveness of controls on exports from the Community,they will be periodically reviewed by the Council.
(13)In order to ensure that this Regulation is properly applied, eachMember State should take measures giving the competentauthorities appropriate powers.
(14)Each Member State should determine the penalties applicable in
the event of breach of the provisions of this Regulation.
(15)The European Parliament expressed its views in its resolution of
13 April 1999(3).
(16)In view of the foregoing, Regulation (EC) No 3381/94 should be
repealed,
HAS ADOPTED THIS REGULATION:
CHAPTER I
Subjectanddefinitions
Article 1
This Regulation setsup a Community system ofexport controls for dual-
use items.
Article 2
For the purposes of this Regulation:
(a) ‘dual-use items’ shall mean items, including software and
technology, which can be used for both civil and military purposes,and shall include all goods which can be used for both non-explosiveuses and assisting in any way in the manufacture of nuclear weaponsor other nuclear explosive devices;
(b) ‘export’ shall mean:
(i) an export procedure within Article 161 of the Community
Customs Code;
(ii) a reexport within Article 182 of that Code, and
(iii) transmission of software or technology by electronic media, fax
or telephone to a destination outside the Community; this
applies to oral transmission of technology by telephone only
where the technology is contained in a document the relevantpart of which is read out over the telephone, or is described2000R1334 — EN — 19.01.2002 — 003.001 — 3
(1) OJ L 302, 19.10.1992, p. 1. Regulation as last amended by Regulation (EC)
No 955/1999 of the European Parliament and of the Council (OJ L 119,
7.5.1999, p. 1).
(2) OJ L 253, 11.10.1993, p. 1. Regulation as last amended by Regulation (EC)
No 1662/1999 (OJ L 197, 29.7.1999, p. 25).
(3) OJ C 219, 30.7.1999, p. 34.
▼B
over the telephone in such a way as to achieve substantially the
same result;
(c) ‘exporter’ shall mean any natural or legal person on whose behalf an
export declaration is made, that is to say the person who, at the timewhen the declaration is accepted, holds the contract with the
consignee in the third country and has the power for determining the
sending of the item out of the customs territory of the Community. Ifno export contract has been concluded or if the holder of the contractdoes not act on its own behalf, the power for determining thesending of the item out of the customs territory of the Community
shall be decisive;
‘exporter’ shall also mean any natural or legal person who decides to
transmit software or technology by electronic media, fax or
telephone to a destination outside the Community;
Where the benefit of a right to dispose of the dual-use item belongs
to a person established outside the Community pursuant to the
contract on which the export is based, the exporter shall beconsidered to be the Contracting Party established in the Commu-nity.
(d) ‘export declaration’ shall mean the act whereby a person indicates in
the prescribed form and manner the wish to place dual-use itemsunder an export procedure.
CHAPTER II
Scope
Article 3
1. An authorisation shall be required for the export of the dual-use
items listed in Annex I.
2. Pursuant to Article 4 or Article 5, an authorisation may also be
required for the export to all or certain destinations of certain dual-use
items not listed in Annex I.
3. This Regulation does not apply to the supply of services or the
transmission of technology if that supply or transmission involves cross-
border movement of natural persons.
4. This Regulation does not apply to dual-use items which only pass
through the territory of the Community, that is those which are notassigned a customs-approved treatment or use other than the external
transit procedure or which are merely placed in a free zone or free
warehouse and where no record of them has to be kept in an approvedstock record.
Article 4
1. An authorisation shall be required for the export of dual-use items
not listed in Annex I if the exporter has been informed by the competentauthorities of the Member State in which he is established that the itemsin question are or may be intended, in their entirety or in part, for use inconnection with the development, production, handling, operation,maintenance, storage, detection, identification or dissemination of
chemical, biological or nuclear weapons or other nuclear explosive
devices or the development, production, maintenance or storage ofmissiles capable of delivering suchweapons.
2. An authorisation shall also be required for the export of dual-use
items not listed in Annex I if the purchasing country or country of
destination is subject to an arms embargo decided by a common positionor joint action adopted by the Council or a decision of the OSCE or anarms embargo imposed by a binding resolution of the Security Councilof the United Nations and if the exporter has been informed by theauthorities referred to in paragraph 1 that the items in question are or2000R1334 — EN — 19.01.2002 — 003.001 — 4
▼B
may be intended, in their entirety or in part, for a military end-use. For
the purposes of this paragraph, ‘military end-use’ shall mean:
(a) incorporation into military items listed in the military list of Member
States;
(b) use of production-, test- or analytical equipment and components
therefor, for the development, production or maintenance of militaryitems listed in the abovementioned list;
(c) use of any unfinished products in a plant for the production of
military items listed in the abovementioned list.
3. An authorisation shall also be required for the export of dual-use
items not listed in Annex I if the exporter has been informed by the
authorities referred to in paragraph 1 that the items in question are ormay be intended, in their entirety or in part, for use as parts orcomponents of military items listed in the national military list that havebeen exported from the territory of that Member State withoutauthorisation or in violation of an authorisation prescribed by national
legislation of that Member State.
4. If an exporter is aware that dual-use items which he proposes to
export, not listed in Annex I, are intended, in their entirety or in part, forany of the uses referred to in paragraphs 1, 2 and 3, he must notify the
authorities referred to in paragraph 1, which will decide whether or not it
is expedient to make the export concerned subject to authorisation.
5. A Member State may adopt or maintain national legislation
imposing an authorisation requirement on the export of dual-use items
not listed in Annex I if the exporter has grounds for suspecting that those
items are or may be intended, in their entirety or in part, for any of theuses referred to in paragraph1.
6. A Member State which imposes an authorisation requirement, in
application of paragraphs 1 to 5, on the export of a dual-use item not
listed in Annex I, shall, where appropriate, inform the other Member
States and the Commission. The other Member States shall give all dueconsideration to this information and shall inform, to the extent possible,their customs offices and other relevant national authorities.
7. The provisions of Article 9(2) and (3) shall apply to cases
concerning dual-use items not listed in Annex I.
8. This Regulation is without prejudice to the right of Member States
to take national measures under Article 11 of Regulation (EEC) No
2603/69.
Article 5
1. A Member State may prohibit or impose an authorisation
requirement on the export of dual-use items not listed in Annex I for
reasons of public security or human rights considerations.
2. Member States shall notify any measures adopted pursuant to
paragraph 1 to the Commission immediately after their adoption andindicate the precise reasons for the measures.
3. Member States shall also immediately notify the Commission of
any modifications to measures adopted pursuant to paragraph1.
4. The Commission shall publish the measures notified to it pursuant
to paragraphs 2 and 3 in the C series of the Official Journal of the
European Communities .
CHAPTER III
Exportauthorisation
Article 6
1. A Community general export authorisation for certain exports as
set out in Annex II is established by this Regulation.2000R1334 — EN — 19.01.2002 — 003.001 — 5
▼B
2. For all other exports for which an authorisation is required under
this Regulation, such authorisation shall be granted by the competentauthorities of the Member State where the exporter is established.
Subject to the restriction specified in paragraph 3, this authorisation may
be an individual, global or general authorisation.
The authorisation shall be valid throughout the Community.
The authorisation may be subject, if appropriate, to certain requirements
and conditions, suchas an obligation to provide an end-use statement.
3. Items listed in Part 2 of Annex II shall not be included in a general
authorisation.
4. Member States shall indicate in general authorisations that these
may not be used if the exporter has been informed by his authorities that
the items in question are or may be intended, in their entirety or in part,for any of the uses referred to in paragraphs 1, 2 and 3 of Article 4, or ifthe exporter is aware that the items are intended for the abovementioneduses.
5. Member States shall maintain or introduce in their respective
national legislation the possibility of granting a global authorisation to aspecific exporter in respect of a type or category of dual-use item whichmay be valid for exports to one or more specified countries.
6. Member States shall supply the Commission with a list of the
authorities empowered to grant export authorisations for dual-use items.
The Commission shall publish the list of these authorities in the C series
of theOfficial Journal of the European Communities .
Article 7
1. If the dual-use items in respect of which an application has been
made for an individual export authorisation to a destination not listed inAnnex II or to any destination in the case of dual-use items listed inAnnex IV are or will be located in one or more Member States otherthan the one where the application has been made, that fact shall be
indicated in the application. The competent authorities of the Member
State to which the application for authorisation has been made shallimmediately consult the competent authorities of the Member State orStates in question and provide the relevant information. The MemberState or States consulted shall make known within 10 working days any
objections it or they may have to the granting of such an authorisation,
which shall bind the Member State in which the application has beenmade.
If no objections are received within 10 working days, the Member State
or States consulted shall be regarded as having no objection.
In exceptional cases, any Member State consulted may request the
extension of the 10-day period. However, the extension may not exceed30 working days.
2. If an export might prejudice its essential security interests, a
Member State may request another Member State not to grant an exportauthorisation or, if such authorisation has been granted, request its
annulment, suspension, modification or revocation. The Member State
receiving sucha request sh all immediately engage in consultations of anon-binding nature withth e requesting Member State, to be terminatedwithin 10 working days.
Article 8
In deciding whether or not to grant an export authorisation under this
Regulation, the Member States shall take into account all relevantconsiderations including:
(a) the obligations and commitments they have each accepted as a
member of the relevant international non-proliferation regimes andexport control arrangements, or by ratification of relevant interna-tional treaties;2000R1334 — EN — 19.01.2002 — 003.001 — 6
▼B
(b) their obligations under sanctions imposed by a common position or a
joint action adopted by the Council or by a decision of the OSCE orby a binding resolution of the Security Council of the United
Nations;
(c) considerations of national foreign and security policy, including
those covered by the European Union Code of Conduct on arms
exports;
(d) considerations about intended end-use and the risk of diversion.
Article 9
1. Exporters shall supply the competent authorities with all relevant
information required for their applications for export authorisation.
2. The competent authorities, acting in accordance with this
Regulation, may refuse to grant an export authorisation and may annul,
suspend, modify or revoke an export authorisation which they havealready granted. Where they refuse, annul, suspend, substantially limitor revoke an authorisation, they shall inform the competent authoritiesof the other Member States and the Commission thereof and exchangethe relevant information with the other Member States and the
Commission, while complying with the provisions of Article 15(3)
concerning the confidentiality of such information.
3. Before any Member State grants an export authorisation which has
been denied by another Member State or States for an essentiallyidentical transaction within the previous three years, it will first consultthe Member State or States which issued the denial(s). If following
consultations, the Member State nevertheless decides to grant an
authorisation, it shall inform the other Member States and theCommission, providing all relevant information to explain the decision.
Article 10
1. All individual and global export authorisations shall be issued on
forms consistent withth e model set out in Annex IIIa.
2. At the request of exporters, global export authorisations that
contain quantitative limitations shall be split.
3. General export authorisations granted under Article 6(2) shall be
published in accordance with national laws and practices. They shall beissued in accordance withth e indications set out in Annex IIIb.
CHAPTER IV
Updatingoflistofdual-useitems
Article 11
The lists of dual-use items set out in Annex I and Annex IV shall be
updated in conformity withth e relevant obligations and commitments,
and any modification thereof, that each Member State has accepted as a
member ofthe international non-proliferation regimes and export controlarrangements, or by ratification of relevant international treaties.
CHAPTER V
Customsprocedures
Article 12
1. When completing the formalities for the export of dual-use items
at the customs office responsible for handling the export declaration, the
exporter shall furnish proof that any necessary export authorisation hasbeen obtained.
2. A translation of any documents furnished as proof into an official
language of the Member State where the export declaration is presentedmay be required of the exporter.2000R1334 — EN — 19.01.2002 — 003.001 — 7
▼B
3. Without prejudice to any powers conferred on it under, and
pursuant to, the Community Customs Code, a Member State may also,for a period not exceeding the periods referred to in paragraph 4,
suspend the process of export from its territory, or, if necessary,
otherwise prevent the dual-use items listed in Annex I which are coveredby a valid export authorisation from leaving the Community via itsterritory, where it has grounds for suspicion that:
(a) relevant information was not taken into account when the
authorisation was granted, or
(b) circumstances have materially changed since the grant of the
authorisation.
4. In the case referred to in paragraph 3, the competent authorities of
the Member State which granted the export authorisation shall beconsulted forthwith in order that they may take action pursuant to
Article 9(2). If such competent authorities decide to maintain the
authorisation, they shall reply within 10 working days, which, at theirrequest, may be extended to 30 working days in exceptionalcircumstances. In suchcase, or if no reply is received with in 10 or 30days, as the case may be, the dual-use items shall be released
immediately. The Member State which granted the authorisation shall
inform the other Member States and the Commission.
Article 13
1. Member States may provide that customs formalities for the export
of dual-use items may be completed only at customs offices empoweredto that end.
2. Member States availing themselves of the option set out in
paragraph 1 shall inform the Commission of the duly empoweredcustoms offices. The Commission shall publish the information in the C
series of the Official Journal of the European Communities .
Article 14
►
M3The provisions of Articles 843 and 912a to 912g of Regulation
(EEC) No 2454/93 ◄shall apply to the restrictions relating to the
exportation, reexportation and exit from the customs territory of dual-use items for the export of which an authorisation is required under this
Regulation.
CHAPTER VI
Administrativecooperation
Article 15
1. Acting in liaison with the Commission, Member States shall take
all appropriate measures to establishdirect cooperation and exch ange of
information between competent authorities, in particular to eliminate therisk that possible disparities in the application of export controls to dual-use items may lead to a deflection of trade, which could createdifficulties for one or more Member States.
2. Member States shall take all appropriate measures to establish
direct cooperation and exchange of information between competentauthorities on sensitive end-users with a view to providing a consistent
level of guidance to exporters concerned by this Regulation.
3. Council Regulation (EC) No 515/97 of 13 March1997 on mutual
assistance between the administrative authorities of the Member States
and cooperation between the latter and the Commission to ensure the
correct application of the law on customs and agricultural matters(
1),
and in particular the provisions on the confidentiality of information,shall apply mutatis mutandis , without prejudice to Article 18 of this
Regulation.2000R1334 — EN — 19.01.2002 — 003.001 — 8
(1) OJ L 82, 22.3.1997, p. 1.
▼B
CHAPTER VII
Controlmeasures
Article 16
1. Exporters shall keep detailed registers or records of their exports,
in accordance with the practice in force in the respective Member States.Suchregisters or records sh all include in particular commercialdocuments suchas invoices, manifests and transport and oth er dispatch
documents containing sufficient information to allow the following to be
identified:
(a) the description of the dual-use items;
(b) the quantity of the dual-use items;
(c) the name and address of the exporter and of the consignee;
(d) where known, the end-use and end-user of the dual-use items.
2. The registers or records and the documents referred to in paragraph
1 shall be kept for at least three years from the end of the calendar yearin which the export took place. They shall be produced to the competentauthorities of the Member State in which the exporter is established on
request.
Article 17
In order to ensure that this Regulation is properly applied, each Member
State shall take whatever measures are needed to permit its competent
authorities:
(a) to gather information on any order or transaction involving dual-use
items;
(b) to establish that the export control measures are being properly
applied, which may include in particular the power to enter the
premises of persons withan interest in an export transaction.
CHAPTER VIII
General andfinalprovisions
Article 18
1. A Coordinating Group chaired by a representative of the
Commission shall be set up. Each Member State shall appoint a
representative to the Coordinating Group.
The Coordinating Group shall examine any question concerning the
application of this Regulation which may be raised either by thechairman or by a representative of a Member State and, inter alia :
(a) the measures which should be taken by Member States to inform
exporters of their obligations under this Regulation;
(b) guidance concerning export authorisation forms.
2. The Coordinating Group may, whenever it considers it to be
necessary, consult organisations representative of exporters concernedby this Regulation.
Article 19
EachMember State sh all take appropriate measures to ensure proper
enforcement of all the provisions of this Regulation. In particular, itshall lay down the penalties applicable to infringements of theprovisions of this Regulation or of those adopted for its implementation.Those penalties must be effective, proportionate and dissuasive.
Article 20
Each Member State shall inform the Commission of the laws,
regulations and administrative provisions adopted in implementationof this Regulation, including the measures referred to in Article 19. The2000R1334 — EN — 19.01.2002 — 003.001 — 9
▼B
Commission shall forward the information to the other Member States.
Every three years the Commission shall present a report to the EuropeanParliament and the Council on the application of this Regulation.
Member States shall provide to the Commission all appropriate
information for the preparation of the report.
Article 21
1. Anauthorisation shall be required for intra-Community transfers of
dual-use items listed in Annex IV. Items listed in Part 2 of Annex IV
shall not be covered by a general authorisation.
2. (a) A Member State may impose an authorisation requirement for the
transfer of other dual-use items from its territory to anotherMember State in cases where at the time of transfer:
— the operator knows that the final destination of the items
concerned is outside the Community,
— export of those items to that final destination is subject to an
authorisation requirement pursuant to Article 3, 4 or 5 in the
Member State from which the items are to be transferred, and
suchexport directly from its territory is not auth orised by ageneral authorisation or a global authorisation,
— no processing or working as defined in Article 24 of the
Community Customs Code is to be performed on the items inthe Member State to which they are to be transferred.
(b) The transfer authorisation must be applied for in the Member
State from which the dual-use items are to be transferred.
(c) In cases where the subsequent export of the dual-use items has
already been accepted, in the consultation procedures set out inArticle 7, by the Member State from which the items are to betransferred, the transfer authorisation shall be issued to theoperator immediately, unless the circumstances have substantially
changed.
(d) A Member State which adopts legislation imposing such a
requirement shall inform the Commission and the other MemberStates of the measures it has taken. The Commission shall publishthis information in the C series of the Official Journal of the
European Communities .
3. The measures pursuant to paragraphs 1 and 2 shall not involve the
application of internal frontier controls within the Community, but
solely controls which are performed as part of the normal controlprocedures applied in a non-discriminatory fashion throughout theterritory of the Community.
4. Application of the measures pursuant to paragraphs 1 and 2 may in
no case result in transfers from one Member State to another beingsubject to more restrictive conditions than those imposed for exports of
the same items to non-Member States.
5. Documents and records of intra-Community transfers of dual-use
items listed in Annex I shall be kept for at least three years from the endof the calendar year in which a transfer took place and shall be producedto the competent authorities of the Member State from which these itemswere transferred on request.
6. A Member State may, by national legislation, require that, for any
intra-Community transfers from that Member State of items listed inCategory 5, Part 2 of Annex I which are not listed in Annex IV,
additional information concerning those items shall be provided to the
competent authorities of that Member State.
7. The relevant commercial documents relating to intra-Community
transfers of dual-use items listed in Annex I shall indicate clearly thatthose items are subject to controls if exported from the Community.Relevant commercial documents include, in particular, any salescontract, order confirmation, invoice or dispatchnote.2000R1334 — EN — 19.01.2002 — 003.001 — 10
▼B
Article 22
This Regulation does not affect:
— the application of Article 296of the Treaty establishing the European
Community,
— the application of the Treaty establishing the European Atomic
Energy Community.
Article 23
Regulation (EC) No 3381/94 is hereby repealed.However, for export authorisation applications made before the date of
entry into force of this Regulation, the relevant provisions of Regulation(EC) No 3381/94 shall continue to apply.
Article 24
This Regulation shall enter into force 90 days after the date of its
publication in the Official Journal of the European Communities .
This Regulation shall be binding in its entirety and directly applicable in
all Member States.2000R1334 — EN — 19.01.2002 — 003.001 — 11
▼M3
ANNEX I
LISTOFDUAL-USEITEMSANDTECHNOLOGY
(referred toinArticle 3ofRegulation(EC)No1334/2000)
This list implements internationally agreed dual-use controls including the
Wassenaar Arrangement, the Missile Technology Control Regime (MTCR), the
Nuclear Suppliers' Group (NSG), the Australia Group and the Chemical Weapons
Convention (CWC). No account has been taken of any items that Member States
wishto place on an exclusion list. No account h as been taken of any national
controls (non-regime origin controls) that may be maintained by Member States.2000R1334 — EN — 19.01.2002 — 003.001 — 12
▼M3
GENERAL NOTES TO ANNEX I
1. For control of goods which are designed or modified for military use, see the
relevant list(s) of controls on military goods maintained by individual Member
States. References in this Annex that state "SEE ALSO MILITARY GOODS
CONTROLS" refer to the same lists.
2. The object of the controls contained in this Annex should not be defeated by
the export of any non-controlled goods (including plant) containing one or
more controlled components when the controlled component or components
are the principal element of the goods and can feasibly be removed or used for
other purposes.
N.B.: In judging whether the controlled component or components are to be
considered the principal element, it is necessary to weigh the factors
of quantity, value and technological know-how involved and other
special circumstances which might establish the controlled compo-
nent or components as the principal element of the goods being
procured.
3. Goods specified in this Annex include both new and used goods.
NUCLEAR TECHNOLOGY NOTE (NTN)
(To be read in conjunction withsection E of Category 0.)
The "technology" directly associated with any goods controlled in Category 0 is
controlled according to the provisions of Category 0.
"Technology" for the "development", "production" or "use" of goods under
control remains under control even when applicable to non-controlled goods.
The approval of goods for export also authorises the export to the same end-user
of the minimum "technology" required for the installation, operation, main-
tenance and repair of the goods.
Controls on "technology" transfer do not apply to information "in the public
domain" or to "basic scientific research".
GENERAL TECHNOLOGY NOTE (GTN)
(To be read in conjunction withsection E of Categories 1 to 9.)
The export of "technology" which is "required" for the "development",
"production" or "use" of goods controlled in Categories 1 to 9, is controlled
according to the provisions of Categories 1 to 9.
"Technology" "required" for the "development", "production" or "use" of goods
under control remains under control even when applicable to non-controlled
goods.
Controls do not apply to that "technology" which is the minimum necessary for
the installation, operation, maintenance (checking) and repair of those goods
which are not controlled or whose export has been authorised.
N.B.: This does not release such "technology" specified in 1E002.e., 1E002.f.,
8E002.a. and 8E002.b.
Controls on "technology" transfer do not apply to information "in the public
domain", to "basic scientific research" or to the minimum necessary information
for patent applications.
GENERAL SOFTWARE NOTE (GSN)
(This note overrides any control within section D of Categories 0 to 9.)
Categories 0 to 9 of this list do not control "software" which is either:
a. Generally available to the public by being:
1. Sold from stock at retail selling points, without restriction, by means of:
a. Over-the-counter transactions;
b. Mail order transactions; or
c. Telephone order transactions; and
2. Designed for installation by the user without further substantial support by
the supplier; or
N.B.: Entry a. of the General Software Note does not release "software"
specified in Category 5 — Part 2 ("Information Security").2000R1334 — EN — 19.01.2002 — 003.001 — 13
▼M3
b. "In the public domain".
EDITORIAL PRACTICES
In accordance with the rules set out in paragraph 101 on page 86 of the
Interinstitutional style guide (1997 edition), for texts in English published in the
Official Journal of the European Communities :
— a comma is used to separate the whole number from the decimals,
— whole numbers are presented in series of three, each series being separated by
a thin space.2000R1334 — EN — 19.01.2002 — 003.001 — 14
▼M3
DEFINITIONS OF TERMS USED IN THIS ANNEX
Definitions of terms between 'single quotation marks' are given in a Technical
Note to the relevant item.
Definitions of terms between "double quotation marks" are as follows:
N.B.: Category references are given in brackets after the defined term."Accuracy" (2 6), usually measured in terms of inaccuracy, means the maximum
deviation, positive or negative, of an indicated value from an accepted standard or
true value.
"Active flight control systems" (7) are systems that function to prevent
undesirable "aircraft" and missile motions or structural loads by autonomously
processing outputs from multiple sensors and then providing necessary preventive
commands to effect automatic control.
"Active pixel" (6 8) is a minimum (single) element of the solid state array which
has a photoelectric transfer function when exposed to light (electromagnetic)
radiation.
"Adapted for use in war" (1) means any modification or selection (suchas
altering purity, shelf life, virulence, dissemination characteristics, or resistence to
UV radiation) designed to increase the effectiveness in producing casualties inhumans or animals, degrading equipment or damaging crops or the environment.
"Adaptive control" (2) means a control system that adjusts the response from
conditions detected during the operation (ref. ISO 2806-1980).
"Aircraft" (1 7 9) means a fixed wing, swivel wing, rotary wing (helicopter), tilt
rotor or tilt-wing airborne vehicle.
N.B.: See also "civil aircraft".
"All compensations available" (2) means after all feasible measures available to
the manufacturer to minimise all systematic positioning errors for the particular
machine-tool model are considered.
"Allocated by the ITU" (3 5) means the allocation of frequency bands according
to the ITU Radio Regulations (Edition 1998) for primary, permitted and
secondary services.
N.B.: Additional and alternative allocations are not included.
"Angular position deviation" (2) means the maximum difference between angular
position and the actual, very accurately measured angular position after the
workpiece mount of the table has been turned out of its initial position (ref. VDI/
VDE 2617, Draft: 'Rotary tables on coordinate measuring machines').
"Asymmetric algorithm" (5) means a cryptographic algorithm using different,
mathematically-related keys for encryption and decryption.
N.B.: A common use of "asymmetric algorithms" is key management.
"Asynchronous transfer mode" ("ATM") (5) means a transfer mode in which the
information is organised into cells; it is asynchronous in the sense that the
recurrence of cells depends on the required or instantaneous bit rate.
"ATM" is equivalent to "Asynchronous transfer mode".
"Automatic target tracking" (6) means a processing technique that automatically
determines and provides as output an extrapolated value of the most probable
position of the target in real time.
"Basic gate propagation delay time" (3) means the propagation delay time value
corresponding to the basic gate used in a "monolithic integrated circuit". For a
'family' of "monolithic integrated circuits", this may be specified either as the
propagation delay time per typical gate within the given 'family' or as the typical
propagation delay time per gate within the given 'family'.
N.B. 1: "Basic gate propagation delay time" is not to be confused with the
input/output delay time of a complex "monolithic integrated circuit".
N.B. 2: 'Family' consists of all integrated circuits to which all of the following
are applied as their manufacturing methodology and specifications
except their respective functions:
a. The common hardware and software architecture;
b. The common design and process technology; and
c. The common basic characteristics.
"Basic scientific research" (GTN NTN) means experimental or theoretical work
undertaken principally to acquire newknowledge of the fundamental principles of2000R1334 — EN — 19.01.2002 — 003.001 — 15
▼M3
phenomena or observable facts, not primarily directed towards a specific practical
aim or objective.
"Bias" (accelerometer) (7) means an accelerometer output when noacceleration is
applied.
"Camming" (2) means axial displacement in one revolution of the main spindle
measured in a plane perpendicular to the spindle faceplate, at a point next to the
circumference of the spindle faceplate (Reference: ISO 230/1 1986, paragraph
5.63).
"Carbon fibre preforms" (1) means an ordered arrangement of uncoated or coated
fibres intended to constitute a framework of a part before the "matrix" is
introduced to form a "composite".
"CE" is equivalent to "computing element".
"CEP" (circle of equal probability) (7) is a measure of accuracy; the radius of the
circle centred at the target, at a specific range, in which 50 % of the payloads
impact.
"Chemical laser" (6) means a "laser" in which the excited species is produced by
the output energy from a chemical reaction.
"Chemical mixture" (1) means a solid, liquid or gaseous product made up of two
or more components which do not react together under the conditions under
which the mixture is stored.
"Circulation-controlled anti-torque or circulation controlled direction control
systems" (7) are systems that use air blown over aerodynamic surfaces to increase
or control the forces generated by the surfaces.
"Civil aircraft" (1 7 9) means those "aircraft" listed by designation in published
airworthiness certification lists by the civil aviation authorities to fly commercial
civil internal and external routes or for legitimate civil, private or business use.
N.B.: See also "aircraft".
"Commingled" (1) means filament to filament blending of thermoplastic fibres
and reinforcement fibres in order to produce a fibre reinforcement "matrix" mix
in total fibre form.
"Comminution" (1) means a process to reduce a material to particles by crushing
or grinding.
"Common channel signalling" (5) is a signalling method in which a single
channel between exchanges conveys, by means of labelled messages, signalling
information relating to a multiplicity of circuits or calls and other information
suchas th at used for network management.
"Communications channel controller" (4) means the physical interface which
controls the flow of synchronous or asynchronous digital information. It is an
assembly that can be integrated into computer or telecommunications equipment
to provide communications access.
"Composite" (1 2 6 8 9) means a "matrix" and an additional phase or additional
phases consisting of particles, whiskers, fibres or any combination thereof,
present for a specific purpose or purposes.
"Composite theoretical performance" ("CTP")(3 4) is a measure of computational
performance given in millions of theoretical operations per second (Mtops),
calculated using the aggregation of "computing elements" ("CE").
N.B.: See Category 4, Technical Note.
"Compound rotary table" (2) means a table allowing the workpiece to rotate and
tilt about two non-parallel axes, which can be coordinated simultaneously for
"contouring control".
"Computing element" ("CE") (4) means the smallest computational unit that
produces an arithmetic or logic result.
"Contouring control" (2) means two or more "numerically controlled" motions
operating in accordance with instructions that specify the next required position
and the required feed rates to that position. These feed rates are varied in relation
to each other so that a desired contour is generated (ref. ISO/DIS 2806-1980).
"Critical temperature" (1 3 6) (sometimes referred to as the transition
temperature) of a specific "superconductive" material means the temperature at
which the material loses all resistance to the flow of direct electrical current.
"Cryptography" (5) means the discipline which embodies principles, means and
methods for the transformation of data in order to hide its information content,
prevent its undetected modification or prevent its unauthorised use. "Crypto-2000R1334 — EN — 19.01.2002 — 003.001 — 16
▼M3
graphy" is limited to the transformation of information using one or more 'secret
parameters' (e.g., crypto variables) or associated key management.
N.B.: 'Secret parameter': a constant or key kept from the knowledge of others
or shared only within a group.
"CTP" is equivalent to "composite theoretical performance"."Data signalling rate" (5) means the rate, as defined in ITU Recommendation 53-
36, taking into account that, for non-binary modulation, baud and bit per second
are not equal. Bits for coding, checking and synchronisation functions are to be
included.
N.B. 1: When determining the "data signalling rate", servicing and adminis-
trative channels shall be excluded.
N.B. 2: It is the maximum one-way rate, i.e., the maximum rate in either
transmission or reception.
"Deformable mirrors" (6) (also known as adaptive optic mirrors) means mirrors
having:
a. A single continuous optical reflecting surface which is dynamically deformed
by the application of individual torques or forces to compensate for distortions
in the optical waveform incident upon the mirror; or
b. Multiple optical reflecting elements that can be individually and dynamically
repositioned by the application of torques or forces to compensate for
distortions in the optical waveform incident upon the mirror.
"Depleted uranium" (0) means uranium depleted in the isotope 235 below that
occurring in nature.
"Development" (GTN NTN All) is related to all phases prior to serial production,
suchas: design, design research , design analyses, design concepts, assembly and
testing of prototypes, pilot production schemes, design data, process of
transforming design data into a product, configuration design, integration design,
layouts.
"Diffusion bonding" (1 2 9) means a solid state molecular joining of at least two
separate metals into a single piece with a joint strength equivalent to that of the
weakest material.
"Digital computer" (4 5) means equipment which can, in the form of one or more
discrete variables, perform all of the following:
a. Accept data;
b. Store data or instructions in fixed or alterable (writable) storage devices;
c. Process data by means of a stored sequence of instructions which is
modifiable; and
d. Provide output of data.
N.B.: Modifications of a stored sequence of instructions include replacement
of fixed storage devices, but not a physical change in wiring or
interconnections.
"Digital transfer rate" (5) means the total bit rate of the information that is
directly transferred on any type of medium.
N.B.: See also "total digital transfer rate".
"Direct-acting hydraulic pressing" (2) means a deformation process which uses a
fluid-filled flexible bladder in direct contact withth e workpiece.
"Drift rate" (gyro) (7) means the time rate of output deviation from the desired
output. It consists of random and systematic components and is expressed as an
equivalent input angular displacement per unit time withrespect to inertial space.
"Dynamic adaptive routing" (5) means automatic rerouting of traffic based on
sensing and analysis of current actual network conditions.
N.B.: This does not include cases of routing decisions taken on predefined
information.
"Dynamic signal analysers" (3) means "signal analysers" which use digital
sampling and transformation techniques to form a Fourier spectrum display of the
given waveform including amplitude and phase information.
N.B.: See also "signal analysers".
"Effective gramme" (0 1) of "special fissile material" means:
a. For plutonium isotopes and uranium-233, the isotope weight in grammes;2000R1334 — EN — 19.01.2002 — 003.001 — 17
▼M3
b. For uranium enriched 1 per cent or greater in the isotope uranium-235, the
element weight in grammes multiplied by the square of its enrichment
expressed as a decimal weight fraction;
c. For uranium enriched below 1 per cent in the isotope uranium-235, the
element weight in grammes multiplied by 0,0001.
"Electronic assembly" (3 4 5) means a number of electronic components (i.e.,
'circuit elements', 'discrete components', integrated circuits, etc.) connected
together to perform (a) specific function(s), replaceable as an entity and normally
capable of being disassembled.
N.B. 1: 'Circuit element': a single active or passive functional part of an
electronic circuit, such as one diode, one transistor, one resistor, one
capacitor, etc.
N.B. 2: 'Discrete component': a separately packaged 'circuit element' with its
own external connections.
"Electronically steerable phased array antenna" (5 6) means an antenna which
forms a beam by means of phase coupling, i.e., the beam direction is controlled
by the complex excitation coefficients of the radiating elements and the direction
of that beam can be varied in azimuth or in elevation, or both, by application,
bothin transmission and reception, of an electrical signal.
"End-effectors" (2) means grippers, 'active tooling units' and any other tooling
that is attached to the baseplate on the end of a "robot" manipulator arm.
N.B.: 'Active tooling unit' means a device for applying motive power, process
energy or sensing to the workpiece.
"Equivalent Density" (6) means the mass of an optic per unit optical area
projected onto the optical surface.
"Expert systems" (4 7) mean systems providing results by application of rules to
data which are stored independently of the "programme" and capable of any of
the following:
a. Modifying automatically the "source code" introduced by the user;
b. Providing knowledge linked to a class of problems in quasi-natural language;
or
c. Acquiring the knowledge required for their development (symbolic training).
"FADEC" is equivalent to "full authority digital engine control"."Fault tolerance" (4) is the capability of a computer system, after any malfunction
of any of its hardware or "software" components, to continue to operate without
human intervention, at a given level of service that provides: continuity of
operation, data integrity and recovery of service within a given time.
"Fibrous or filamentary materials" (0 1 8) include:
a. Continuous "monofilaments";
b. Continuous "yarns" and "rovings";
c. "Tapes", fabrics, random mats and braids;
d. Chopped fibres, staple fibres and coherent fibre blankets;
e. Whiskers, either monocrystalline or polycrystalline, of any length;
f. Aromatic polyamide pulp.
"Film type integrated circuit" (3) means an array of 'circuit elements' and metallic
interconnections formed by deposition of a thick or thin film on an insulating
"substrate".
N.B.: 'Circuit element' is a single active or passive functional part of an
electronic circuit, such as one diode, one transistor, one resistor, one
capacitor, etc.
"Fixed" (5) means that the coding or compression algorithm cannot accept
externally supplied parameters (e.g., cryptographic or key variables) and cannot
be modified by the user.
"Flight control optical sensor array" (7) is a network of distributed optical
sensors, using "laser" beams, to provide real-time flight control data for on-board
processing.
"Flight path optimisation" (7) is a procedure that minimises deviations from a
four-dimensional (space and time) desired trajectory based on maximising
performance or effectiveness for mission tasks.2000R1334 — EN — 19.01.2002 — 003.001 — 18
▼M3
"Focal plane array" (6) means a linear or two-dimensional planar layer, or
combination of planar layers, of individual detector elements, withor with out
readout electronics, which work in the focal plane.
N.B.: This is not intended to include a stack of single detector elements or any
two, three or four element detectors provided time delay and integration
is not performed within the element.
"Fractional bandwidth" (3) means the "instantaneous bandwidth" divided by the
centre frequency, expressed as a percentage.
"Frequency hopping" (5) means a form of "spread spectrum" in which the
transmission frequency of a single communication channel is made to change by
a random or pseudo-random sequence of discrete steps.
"Frequency switching time" (3 5) means the maximum time (i.e., delay), taken by
a signal, when switched from one selected output frequency to another selected
output frequency, to reach:
a. A frequency within 100 Hz of the final frequency; or
b. An output level within 1 dB of the final output level.
"Frequency synthesiser" (3) means any kind of frequency source or signal
generator, regardless of the actual technique used, providing a multiplicity of
simultaneous or alternative output frequencies, from one or more outputs,
controlled by, derived from or disciplined by a lesser number of standard (or
master) frequencies.
"Full Authority Digital Engine Control" ("FADEC") (7 9) means an electronic
control system for gas turbine or combined cycle engines utilising a digital
computer to control the variables required to regulate engine thrust or shaft power
output throughout the engine operating range from the beginning of fuel metering
to fuel shutoff.
"Gas Atomisation" (1) means a process to reduce a molten stream of metal alloy
to droplets of 500 micrometre diameter or less by a high pressure gas stream.
"Geographically dispersed" (6) is where each location is distant from any other
more than 1 500 m in any direction. Mobile sensors are always considered
"geographically dispersed".
"Global interrupt latency time" (4) means the time taken by the computer system
to recognise an interrupt due to the event, service the interrupt and perform a
context switchto an alternate memory-resident task waiting on th e interrupt.
"Guidance set" (7) means systems that integrate the process of measuring and
computing a vehicles position and velocity (i.e. navigation) with that of
computing and sending commands to the vehicles flight control systemsto correct
the trajectory.
"Hot isostatic densification" (2) means the process of pressurising a casting at
temperatures exceeding 375 K (102 ºC) in a closed cavity through various media
(gas, liquid, solid particles, etc.) to create equal force in all directions to reduce or
eliminate internal voids in the casting.
"Hybrid computer" (4) means equipment which can perform all of the following:
a. Accept data;
b. Process data, in bothanalogue and digital representations; and
c. Provide output of data.
"Hybrid integrated circuit" (3) means any combination of integrated circuit(s), or
integrated circuit with'circuit elements' or 'discrete components' connected
together to perform (a) specific function(s), and having all of the following
characteristics:
a. Containing at least one unencapsulated device;
b. Connected together using typical IC production methods;
c. Replaceable as an entity; and
d. Not normally capable of being disassembled.
N.B. 1: 'Circuit element': a single active or passive functional part of an
electronic circuit, such as one diode, one transistor, one resistor, one
capacitor, etc.
N.B. 2: 'Discrete component': a separately packaged 'circuit element' with its
own external connections.
"Image enhancement" (4) means the processing of externally derived informa-
tion-bearing images by algorithms such as time compression, filtering, extraction,
selection, correlation, convolution or transformations between domains (e.g., fast2000R1334 — EN — 19.01.2002 — 003.001 — 19
▼M3
Fourier transform or Walsh transform). This does not include algorithms using
only linear or rotational transformation of a single image, suchas translation,
feature extraction, registration or false coloration.
"Immunotoxin" (1) is a conjugate of one cell specific monoclonal antibody and a
"toxin" or "sub-unit of toxin", that selectively affects diseased cells.
"In the public domain" (GTN NTN GSN), as it applies herein, means
"technology" or "software" which has been made available without restrictions
upon its further dissemination (copyright restrictions do not remove "technology"
or "software" from being "in the public domain").
"Information security" (4 5) is all the means and functions ensuring the
accessibility, confidentiality or integrity of information or communications,
excluding the means and functions intended to safeguard against malfunctions.
This includes "cryptography", 'cryptanalysis', protection against compromising
emanations and computer security.
N.B.: 'Cryptanalysis': analysis of a cryptographic system or its inputs and
outputs to derive confidential variables or sensitive data, including clear
text.
"Instantaneous bandwidth" (3 5 7) means the bandwidth over which output power
remains constant within 3 dB without adjustment of other operating parameters.
"Instrumented range" (6) means the specified unambiguous display range of a
radar.
"Insulation" (9) is applied to the components of a rocket motor, i.e. the case,
nozzle, inlets, case closures, and includes cured or semi-cured compounded
rubber sheet stock containing an insulating or refractory material. It may also be
incorporated as stress relief boots or flaps.
"Interconnected radar sensors" (6) means two or more radar sensors are
interconnected when they mutually exchange data in real time.
"Interior lining" (9) is suited for the bond interface between the solid propellant
and the case or insulating liner. Usually a liquid polymer based dispersion of
refractory or insulating materials, e.g. carbon filled hydroxyl terminated
polybutadiene (HTPB) or other polymer with added curing agents sprayed or
screeded over a case interior.
"Intrinsic Magnetic Gradiometer" (6) is a single magnetic field gradient sensing
element and associated electronics the output of which is a measure of magnetic
field gradient.
N.B.: See also "magnetic gradiometer".
"Isolated live cultures" (1) includes live cultures in dormant form and in dried
preparations.
"Isostatic presses" (2) mean equipment capable of pressurising a closed cavity
through various media (gas, liquid, solid particles, etc.) to create equal pressure in
all directions within the cavity upon a workpiece or material.
"Laser" (0, 2, 3, 5, 6, 7, 8, 9) is an assembly of components which produce both
spatially and temporally coherent light that is amplified by stimulated emission of
radiation.
N.B.: See also: "Chemical laser";
"Q-switched laser";"Super High Power Laser";"Transfer laser".
"Linearity" (2) (usually measured in terms of non-linearity) means the maximum
deviation of the actual characteristic (average of upscale and downscale
readings), positive or negative, from a straight line so positioned as to equalise
and minimise the maximum deviations.
"Local area network" (4) is a data communication system having all of the
following characteristics:
a. Allows an arbitrary number of independent 'data devices' to communicate
directly witheachoth er;
and
b. Is confined to a geographical area of moderate size (e.g., office building, plant,
campus, warehouse).
N.B.: 'Data device' means equipment capable of transmitting or receiving
sequences of digital information.
"Magnetic Gradiometers" (6) are instruments designed to detect the spatial
variation of magnetic fields from sources external to the instrument. They consist2000R1334 — EN — 19.01.2002 — 003.001 — 20
▼M3
of multiple "magnetometers" and associated electronics the output of which is a
measure of magnetic field gradient.
N.B.: See also "intrinsic magnetic gradiometer".
"Magnetometers" (6) are instruments designed to detect magnetic fields from
sources external to the instrument. They consist of a single magnetic field sensing
element and associated electronics the output of which is a measure of the
magnetic field.
"Main storage" (4) means the primary storage for data or instructions for rapid
access by a central processing unit. It consists of the internal storage of a "digital
computer" and any hierarchical extension thereto, such as cache storage or non-
sequentially accessed extended storage.
"Materials resistant to corrosion by UF6" (0) may be copper, stainless steel,
aluminium, aluminium oxide, aluminium alloys, nickel or alloy containing 60
weight percent or more nickel and UF6- resistant fluorinated hydrocarbon
polymers, as appropriate for the type of separation process.
"Matrix" (1 2 8 9) means a substantially continuous phase that fills the space
between particles, whiskers or fibres.
"Measurement uncertainty" (2) is the characteristic parameter which specifies in
what range around the output value the correct value of the measurable variable
lies witha confidence level of 95 %. It includes th e uncorrected systematic
deviations, the uncorrected backlash and the random deviations (ref. ISO 10360-
2, or VDI/VDE 2617).
"Mechanical Alloying" (1) means an alloying process resulting from the bonding,
fracturing and rebonding of elemental and master alloy powders by mechanical
impact. Non-metallic particles may be incorporated in the alloy by addition of the
appropriate powders.
"Melt Extraction" (1) means a process to 'solidify rapidly' and extract a ribbon-
like alloy product by the insertion of a short segment of a rotating chilled block
into a bathof a molten metal alloy.
N.B.: 'Solidify rapidly': solidification of molten material at cooling rates
exceeding 1 000 K/s.
"Melt Spinning" (1) means a process to 'solidify rapidly' a molten metal stream
impinging upon a rotating chilled block, forming a flake, ribbon or rod-like
product.
N.B.: 'Solidify rapidly': solidification of molten material at cooling rates
exceeding 1 000 K/s.
"Microcomputer microcircuit" (3) means a "monolithic integrated circuit" or
"multichip integrated circuit" containing an arithmetic logic unit (ALU) capable
of executing general purpose instructions from an internal storage, on data
contained in the internal storage.
N.B.: The internal storage may be augmented by an external storage.
"Microprocessor microcircuit" (3) means a "monolithic integrated circuit" or
"multichip integrated circuit" containing an arithmetic logic unit (ALU) capable
of executing a series of general purpose instructions from an external storage.
N.B. 1: The "microprocessor microcircuit" normally does not contain integral
user-accessible storage, although storage present on-the-chip may be
used in performing its logic function.
N.B. 2: This includes chip sets which are designed to operate together to
provide the function of a "microprocessor microcircuit".
"Microorganisms" (1 2) means bacteria, viruses, mycoplasms, rickettsiae,
chlamydiae or fungi, whether natural, enhanced or modified, either in the form
of isolated live cultures or as material including living material which has been
deliberately inoculated or contaminated withsuchcultures.
"Missiles" (1 3 5 6 7 9) means complete rocket systems and unmanned air vehicle
systems, capable of delivering at least 500 kg payload to a range of at least
300 km.
"Monofilament" (1) or filament is the smallest increment of fibre, usually several
micrometres in diameter.
"Monolithic integrated circuit" (3) means a combination of passive or active
'circuit elements' or both which:
a. Are formed by means of diffusion processes, implantation processes or
deposition processes in or on a single semiconducting piece of material, a so-
called 'chip';2000R1334 — EN — 19.01.2002 — 003.001 — 21
▼M3
b. Can be considered as indivisibly associated; and
c. Perform the function(s) of a circuit.
N.B.: 'Circuit element' is a single active or passive functional part of an
electronic circuit, such as one diode, one transistor, one resistor, one
capacitor, etc.
"Monospectral imaging sensors" (6) are capable of acquisition of imaging data
from one discrete spectral band.
"Multichip integrated circuit" (3) means two or more "monolithic integrated
circuits" bonded to a common "substrate".
"Multi-data-stream processing" (4) means the 'microprogramme' or equipment
architecture technique which permits simultaneous processing of two or more
data sequences under the control of one or more instruction sequences by means
suchas:
a. Single Instruction Multiple Data (SIMD) architectures such as vector or array
processors;
b. Multiple Single Instruction Multiple Data (MSIMD) architectures;
c. Multiple Instruction Multiple Data (MIMD) architectures, including those
which are tightly coupled, closely coupled or loosely coupled; or
d. Structured arrays of processing elements, including systolic arrays.
N.B.: 'Microprogramme' means a sequence of elementary instructions,
maintained in a special storage, the execution of which is initiated by
the introduction of its reference instruction into an instruction register.
"Multilevel security" (5) means a class of system containing information with
different sensitivities that simultaneously permits access by users with different
security clearances and needs-to-know, but prevents users from obtaining access
to information for which they lack authorisation.
N.B.: "Multilevel security" is computer security and not computer reliability
which deals with equipment fault prevention or human error prevention
in general.
"Multispectral imaging sensors" (6) are capable of simultaneous or serial
acquisition of imaging data from two or more discrete spectral bands. Sensors
having more than twenty discrete spectral bands are sometimes referred to as
hyperspectral imaging sensors.
"Natural uranium" (0) means uranium containing the mixtures of isotopes
occurring in nature.
"Network access controller" (4) means a physical interface to a distributed
switching network. It uses a common medium which operates throughout at the
same "digital transfer rate" using arbitration (e.g., token or carrier sense) for
transmission. Independently from any other, it selects data packets or data groups
(e.g., IEEE 802) addressed to it. It is an assembly that can be integrated into
computer or telecommunications equipment to provide communications access.
"Neural computer" (4) means a computational device designed or modified to
mimic the behaviour of a neuron or a collection of neurons, i.e., a computational
device which is distinguished by its hardware capability to modulate the weights
and numbers of the interconnections of a multiplicity of computational
components based on previous data.
"Noise level" (6) means an electrical signal given in terms of power spectral
density. The relation between "noise level" expressed in peak-to-peak is given by
S2
pp=8 No(f2−f1), where Sppis the peak-to-peak value of the signal (e.g.,
nanoteslas), Nois the power spectral density (e.g., (nanotesla)2/Hz) and (f2−f1)
defines the bandwidth of interest.
"Nuclear reactor" (0) means the items within or attached directly to the reactor
vessel, the equipment which controls the level of power in the core, and the
components which normally contain, come into direct contact with or control the
primary coolant of the reactor core.
"Numerical control" (2) means the automatic control of a process performed by a
device that makes use of numeric data usually introduced as the operation is in
progress (ref. ISO 2382).
"Object code" (9) means an equipment executable form of a convenient
expression of one or more processes ("source code" (source language)) which has
been converted by programming system.
"Optical amplification" (5), in optical communications, means an amplification
technique that introduces a gain of optical signals that have been generated by a2000R1334 — EN — 19.01.2002 — 003.001 — 22
▼M3
separate optical source, without conversion to electrical signals, i.e., using
semiconductor optical amplifiers, optical fibre luminescent amplifiers.
"Optical computer" (4) means a computer designed or modified to use light to
represent data and whose computational logic elements are based on directly
coupled optical devices.
"Optical integrated circuit" (3) means a "monolithic integrated circuit" or a
"hybrid integrated circuit", containing one or more parts designed to function as a
photosensor or photoemitter or to perform (an) optical or (an) electro-optical
function(s).
"Optical switching" (5) means the routing of or switching of signals in optical
form without conversion to electrical signals.
"Overall current density" (3) means the total number of ampere-turns in the coil
(i.e., the sum of the number of turns multiplied by the maximum current carried
by each turn) divided by the total cross-section of the coil (comprising the
superconducting filaments, the metallic matrix in which the superconducting
filaments are embedded, the encapsulating material, any cooling channels, etc.).
"Participating state" (7 9) is a state participating in the Wassenaar Arrangement
(see www.wassenaar.org).
"Peak power" (6), means energy per pulse in joules divided by the pulse duration
in seconds.
"Personalised smart card" (5) means a smart card containing a microcircuit which
has been programmed for a specific application and cannot be reprogrammed for
any other application by the user.
"Power management" (7) means changing the transmitted power of the altimeter
signal so that received power at the "aircraft" altitude is always at the minimum
necessary to determine the altitude.
"Pressure transducers" (2) are devices that convert pressure measurements into an
electrical signal.
"Previously separated" (0 1) means the application of any process intended to
increase the concentration of the controlled isotope.
"Primary flight control" (7) means an "aircraft" stability or manoeuvering control
using force/moment generators, i.e., aerodynamic control surfaces or propulsive
thrust vectoring.
"Principal element" (4), as it applies in Category 4, is a "principal element" when
its replacement value is more than 35 % of the total value of the system of which
it is an element. Element value is the price paid for the element by the
manufacturer of the system, or by the system integrator. Total value is the normal
international selling price to unrelated parties at the point of manufacture or
consolidation of shipment.
"Production" (GTN NTN All) means all production phases, such as: construction,
production engineering, manufacture, integration, assembly (mounting), inspec-
tion, testing, quality assurance.
"Production equipment" (1 9) means tooling, templates, jigs, mandrels, moulds,
dies, fixtures, alignment mechanisms, test equipment, other machinery and
components therefor, limited to those specially designed or modified for
"development" or for one or more phases of "production".
"Production facilities" (9) means equipment and specially designed software
therefor integrated into installations for "development" or for one or more phases
of "production".
"Programme" (2 6) means a sequence of instructions to carry out a process in, or
convertible into, a form executable by an electronic computer.
"Pulse compression" (6) means the coding and processing of a radar signal pulse
of long time duration to one of short time duration, while maintaining the benefits
of high pulse energy.
"Pulse duration" (6) is the duration of a "laser" pulse measured at Full Width Half
Intensity (FWHI) levels.
"Q-switched laser" (6) means a "laser" in which the energy is stored in the
population inversion or in the optical resonator and subsequently emitted in a
pulse.
"Radar frequency agility" (6) means any technique which changes, in a pseudo-
random sequence, the carrier frequency of a pulsed radar transmitter between
pulses or between groups of pulses by an amount equal to or larger than the pulse
bandwidth.2000R1334 — EN — 19.01.2002 — 003.001 — 23
▼M3
"Radar spread spectrum" (6) means any modulation technique for spreading
energy originating from a signal witha relatively narrow frequency band, over a
muchwider band of frequencies, by using random or pseudo-random coding.
"Real time bandwidth" (3) for "dynamic signal analysers" is the widest frequency
range which the analyser can output to display or mass storage without causing
any discontinuity in the analysis of the input data. For analysers with more than
one channel, the channel configuration yielding the widest "real-time bandwidth"
shall be used to make the calculation.
"Real time processing" (2 4 6 7) means the processing of data by a computer
system providing a required level of service, as a function of available resources,
within a guaranteed response time, regardless of the load of the system, when
stimulated by an external event.
"Required" (GTN 1-9), as applied to "technology" or "software", refers to only
that portion of "technology" or "software" which is peculiarly responsible for
achieving or extending the controlled performance levels, characteristics or
functions. Such "required" "technology" or "software" may be shared by different
goods.
"Resolution" (2) means the least increment of a measuring device; on digital
instruments, the least significant bit (ref. ANSI B-89.1.12).
"Robot" (2 8) means a manipulation mechanism, which may be of the continuous
path or of the point-to-point variety, may use sensors, and has all the following
characteristics:
a. Is multifunctional;
b. Is capable of positioning or orienting material, parts, tools or special devices
through variable movements in three dimensional space;
c. Incorporates three or more closed or open loop servo-devices which may
include stepping motors; and
d. Has "user-accessible programmability" by means of teach/playback method or
by means of an electronic computer which may be a programmable logic
controller, i.e., without mechanical intervention.
N.B.: The above definition does not include the following devices:
1. Manipulation mechanisms which are only manually/teleoperator
controllable;
2. Fixed sequence manipulation mechanisms which are automated
moving devices, operating according to mechanically fixed
programmed motions. The programme is mechanically limited by
fixed stops, such as pins or cams. The sequence of motions and the
selection of paths or angles are not variable or changeable by
mechanical, electronic or electrical means;
3. Mechanically controlled variable sequence manipulation mechanisms
which are automated moving devices, operating according to
mechanically fixed programmed motions. The programme is
mechanically limited by fixed, but adjustable stops, such as pins or
cams. The sequence of motions and the selection of paths or angles
are variable within the fixed programme pattern. Variations or
modifications of the programme pattern (e.g., changes of pins or
exchanges of cams) in one or more motion axes are accomplished
only through mechanical operations;
4. Non-servo-controlled variable sequence manipulation mechanisms
which are automated moving devices, operating according to
mechanically fixed programmed motions. The programme is variable
but the sequence proceeds only by the binary signal from
mechanically fixed electrical binary devices or adjustable stops;
5. Stacker cranes defined as Cartesian coordinate manipulator systems
manufactured as an integral part of a vertical array of storage bins
and designed to access the contents of those bins for storage or
retrieval.
"Rotary atomisation" (1) means a process to reduce a stream or pool of molten
metal to droplets to a diameter of 500 micrometre or less by centrifugal force.
"Roving" (1) is a bundle (typically 12-120) of approximately parallel 'strands'.
N.B.: 'Strand' is a bundle of "monofilaments" (typically over 200) arranged
approximately parallel.
"Run out" (2) (out-of-true running) means radial displacement in one revolution
of the main spindle measured in a plane perpendicular to the spindle axis at a
point on the external or internal revolving surface to be tested (Reference: ISO
230/1 1986, paragraph5.61).2000R1334 — EN — 19.01.2002 — 003.001 — 24
▼M3
"Scale factor" (gyro or accelerometer) (7) means the ratio of change in output to a
change in the input intended to be measured. Scale factor is generally evaluated
as the slope of the straight line that can be fitted by the method of least squares to
input-output data obtained by varying the input cyclically over the input range.
"Settling time" (3) means the time required for the output to come within one-half
bit of the final value when switching between any two levels of the converter.
"SHPL" is equivalent to "super high power laser"."Signal analysers" (3) means apparatus capable of measuring and displaying basic
properties of the single-frequency components of multi-frequency signals.
"Signal processing" (3 4 5 6) means the processing of externally derived
information-bearing signals by algorithms such as time compression, filtering,
extraction, selection, correlation, convolution or transformations between
domains (e.g., fast Fourier transform or Walshtransform).
"Software" (GSN All) means a collection of one or more "programmes" or
'microprogrammes' fixed in any tangible medium of expression.
N.B.: 'Microprogramme' means a sequence of elementary instructions,
maintained in a special storage, the execution of which is initiated by
the introduction of its reference instruction into an instruction register.
"Source code" (or source language) (4 5 6 7 9) is a convenient expression of one
or more processes which may be turned by a programming system into equipment
executable form ("object code" (or object language)).
"Spacecraft" (7 9) means active and passive satellites and space probes."Space qualified" (3 6) refers to products designed, manufactured and tested to
meet the special electrical, mechanical or environmental requirements for use in
the launch and deployment of satellites or high altitude flight systems operating at
altitudes of 100 km or higher.
"Special fissile material" (0) means plutonium-239, uranium-233, "uranium
enriched in the isotopes 235 or 233", and any material containing the foregoing.
"Specific modulus" (0 1) is Young's modulus in pascals, equivalent to N/m
2
divided by specific weight in N/m3, measured at a temperature of (296 ± 2) K
((23 ± 2) ºC) and a relative humidity of (50 ± 5) %.
"Specific tensile strength" (0 1) is ultimate tensile strength in pascals, equivalent
to N/m2divided by specific weight in N/m3, measured at a temperature of
(296 ± 2) K ((23 ± 2) ºC) and a relative humidity of (50 ± 5) %.
"Splat Quenching" (1) means a process to 'solidify rapidly' a molten metal stream
impinging upon a chilled block, forming a flake-like product.
N.B.: 'Solidify rapidly' solidification of molten material at cooling rates
exceeding 1 000 K/s.
"Spread spectrum" (5) means the technique whereby energy in a relatively
narrow-band communication channel is spread over a much wider energy
spectrum.
"Spread spectrum" radar (6) — see "Radar spread spectrum"."Stability" (7) means the standard deviation (1 sigma) of the variation of a
particular parameter from its calibrated value measured under stable temperature
conditions. This can be expressed as a function of time.
"States (not) Party to the Chemical Weapon Convention" (1) are those States for
which the Convention on the Prohibition of the Development, Production,
Stockpiling and Use of Chemical Weapons has (not) entered into force (see
www.opcw.org).
"Stored programme controlled" (2 3 5) means controlled by using instructions
stored in an electronic storage which a processor can execute in order to direct the
performance of predetermined functions.
N.B.: Equipment may be "stored programme controlled" whether the
electronic storage is internal or external to the equipment.
"Substrate" (3) means a sheet of base material with or without an interconnection
pattern and on which or within which 'discrete components' or integrated circuits
or bothcan be located.
N.B. 1: 'Discrete component': a separately packaged 'circuit element' with its
own external connections.
N.B. 2: 'Circuit element': a single active or passive functional part of an
electronic circuit, such as one diode, one transistor, one resistor, one
capacitor, etc.2000R1334 — EN — 19.01.2002 — 003.001 — 25
▼M3
"Substrate blanks" (6) means monolithic compounds with dimensions suitable for
the production of optical elements such as mirrors or optical windows.
"Sub-unit of toxin" (1) is a structurally and functionally discrete component of a
whole "toxin".
"Superalloys" (2 9) means nickel-, cobalt- or iron-base alloys having strengths
superior to any alloys in the AISI 300 series at temperatures over 922 K (649 ºC)
under severe environmental and operating conditions.
"Superconductive" (1 3 6 8) means materials, i.e., metals, alloys or compounds,
which can lose all electrical resistance, i.e., which can attain infinite electrical
conductivity and carry very large electrical currents without joule heating.
N.B.: The "superconductive" state of a material is individually characterised
by a "critical temperature", a critical magnetic field, which is a function
of temperature, and a critical current density which is, however, a
function of both magnetic field and temperature.
"Super HighPower Laser" ("SHPL") (6) means a "laser" capable of delivering
(the total or any portion of) the output energy exceeding 1 kJ within 50 ms or
having an average or CW power exceeding 20 kW.
"Superplastic forming" (1 2) means a deformation process using heat for metals
that are normally characterised bylow values of elongation (lessthan 20%) at the
breaking point as determined at room temperature by conventional tensile
strength testing, in order to achieve elongations during processing which are at
least 2 times those values.
"Symmetric algorithm" (5) means a cryptographic algorithm using an identical
key for bothencryption and decryption.
N.B.: A common use of "symmetric algorithms" is confidentiality of data.
"System tracks" (6) means processed, correlated (fusion of radar target data to
flight plan position) and updated aircraft flight position report available to the Air
Traffic Control centre controllers.
"Systolic array computer" (4) means a computer where the flow and modification
of the data is dynamically controllable at the logic gate level by the user.
"Tape" (1) is a material constructed of interlaced or unidirectional "monofila-
ments", 'strands', "rovings", "tows", or "yarns", etc., usually preimpregnated with
resin.
N.B.: 'Strand' is a bundle of "monofilaments" (typically over 200) arranged
approximately parallel.
"Technology" (GTN NTN All) means specific information necessary for the
"development", "production" or "use" of goods. This information takes the form
of 'technical data' or 'technical assistance'.
N.B.: 1: 'Technical assistance' may take forms such as instructions, skills,
training, working knowledge and consulting services and may involve
the transfer of "technical data".
N.B. 2: 'Technical data' may take forms such as blueprints, plans, diagrams,
models, formulae, tables, engineering designs and specifications,
manuals and instructions written or recorded on other media or
devices such as disk, tape, read-only memories.
"Three dimensional Vector Rate" (4) means the number of vectors generated per
second which have 10 pixel poly line vectors, clip tested, randomly oriented, with
either integer or floating point X-Y-Z coordinate values (whichever produces the
maximum rate).
"Tilting spindle" (2) means a tool-holding spindle which alters, during the
machining process, the angular position of its centre line with respect to any other
axis.
"Time constant" (6) is the time taken from the application of a light stimulus for
the current increment to reach a value of 1 − 1/e times the final value (i.e., 63 %
of the final value).
"Total control of flight" (7) means an automated control of "aircraft" state
variables and flight path to meet mission objectives responding to real time
changes in data regarding objectives, hazards or other "aircraft".
"Total digital transfer rate" (5) means the number of bits, including line coding,
overhead and so forth per unit time passing between corresponding equipment in
a digital transmission system.
N.B.: See also "digital transfer rate".
"Tow" (1) is a bundle of "monofilaments", usually approximately parallel.2000R1334 — EN — 19.01.2002 — 003.001 — 26
▼M3
"Toxins" (1 2) means toxins in the form of deliberately isolated preparations or
mixtures, no matter how produced, other than toxins present as contaminants of
other materials such as pathological specimens, crops, foodstuffsor seed stocks of
"microorganisms".
"Transfer laser" (6) means a "laser" in which the lasing species is excited through
the transfer of energy by collision of a non-lasing atom or molecule with a lasing
atom or molecule species.
"Tunable" (6) means the ability of a "laser" to produce a continuous output at all
wavelengths over a range of several "laser" transitions. A line selectable "laser"
produces discrete wavelengths within one "laser" transition and is not considered
"tunable".
"Uranium enriched in the isotopes 235 or 233" (0) means uranium containing the
isotopes 235 or 233, or both, in an amount such that the abundance ratio of the
sum of these isotopes to the isotope 238 is more than the ratio of the isotope 235
to the isotope 238 occurring in nature (isotopic ratio 0,72 per cent).
"Use" (GTN NTN All) means operation, installation (including on-site
installation), maintenance (checking), repair, overhaul and refurbishing.
"User-accessible programmability" (4 5 6) means the facility allowing a user to
insert, modify or replace "programmes" by means other than:
a. A physical change in wiring or interconnections; or
b. The setting of function controls including entry of parameters.
"Vaccine" (1) is a medicinal product which is intended to stimulate a protective
immunological response in humans or animals in order to prevent disease.
"Vacuum Atomisation" (1) means a process to reduce a molten stream of metal to
droplets of a diameter of 500 micrometre or less by the rapid evolution of a
dissolved gas upon exposure to a vacuum.
"Variable geometry airfoils" (7) means the use of trailing edge flaps or tabs, or
leading edge slats or pivoted nose droop, the position of which can be controlled
in flight.
"Yarn" (1) is a bundle of twisted 'strands'.
N.B.: 'Strand' is a bundle of "monofilaments" (typically over 200) arranged
approximately parallel.2000R1334 — EN — 19.01.2002 — 003.001 — 27
▼M3
ACRONYMS AND ABBREVIATIONS USED IN THIS ANNEX
An acronym or abbreviation, when used as a defined term, will be found in
'Definitions of Terms used in this Annex'.
Acronym or
abbreviationMeaning
ABEC Annular Bearing Engineers Committee
AGMA American Gear Manufacturers' Association
AHRS attitude and heading reference systems
AISI American Iron and Steel Institute
ALU arithmetic logic unit
ANSI American National Standards Institute
ASTM the American Society for Testing and Materials
ATC air traffic control
AVLIS atomic vapour laser isotope separation
CAD computer-aided-design
CAS Chemical Abstracts Service
CCITT International Telegraphand Teleph one Consultative
Committee
CDU control and display unit
CEP circular error probable
CNTD controlled nucleation thermal deposition
CRISLA chemical reaction by isotope selective laser activation
CVD chemical vapour deposition
CW chemical warfare
CW (for lasers) continuous waveDME distance measuring equipment
DS directionally solidified
EB-PVD electron beam physical vapour deposition
EBU European Broadcasting Union
ECM electro-chemical machining
ECR electron cyclotron resonance
EDM electrical discharge machines
EEPROMS electrically erasable programmable read only memory
EIA Electronic Industries Association
EMC electromagnetic compatibility
FFT Fast Fourier Transform
GLONASS global navigation satellite system
GPS global positioning system
HBT hetero-bipolar transistors
HDDR high density digital recording
HEMT high electron mobility transistors
ICAO International Civil Aviation Organisation
IEC International Electro-technical Commission
IEEE Institute of Electrical and Electronic Engineers
IFOV instantaneous-field-of-view
ILS instrument landing systemIRIG inter-range instrumentation group
ISAR inverse synthetic aperture radar
ISO International Organisation for Standardisation
ITU International Telecommunication Union2000R1334 — EN — 19.01.2002 — 003.001 — 28
▼M3
Acronym or
abbreviationMeaning
JIS Japanese Industrial Standard
JT Joule-Thomson
LIDAR light detection and ranging
LRU line replaceable unit
MAC message authentication codeMachratio of speed of an object to speed of sound (after Ernst
Mach)
MLIS molecular laser isotopic separation
MLS microwave landing systems
MOCVD metal organic chemical vapour deposition
MRI magnetic resonance imaging
MTBF mean-time-between-failures
Mtops million theoretical operations per second
MTTF mean-time-to-failure
NBC Nuclear, Biological and Chemical
NDT non-destructive test
PAR precision approachradar
PIN personal identification number
ppm parts per million
PSD power spectral density
QAM quadrature-amplitude-modulation
RF radio frequency
SACMA Suppliers of Advanced Composite Materials Association
SAR synthetic aperture radar
SC single crystal
SLAR sidelooking airborne radar
SMPTE Society of Motion Picture and Television Engineers
SRA shop replaceable assemblySRAM static random access memory
SRM SACMA Recommended Methods
SSB single sideband
SSR secondary surveillance radar
TCSEC trusted computer system evaluation criteria
TIR total indicated reading
UV ultraviolet
UTS ultimate tensile strength
VOR very high frequency omni-directional range
YAG yttrium/aluminum garnet2000R1334 — EN — 19.01.2002 — 003.001 — 29
▼M3
CATEGORY0
NUCLEARMATERIALS,FACILITIES,ANDEQUIPMENT2000R1334 — EN — 19.01.2002 — 003.001 — 30
▼M3
0A Systems,EquipmentandComponents
0A001 "Nuclear reactors" and specially designed or prepared equipment
and components therefor, as follows:
a. "Nuclear reactors" capable of operation so as to maintain a
controlled self-sustaining fission chain reaction;
b. Metal vessels, or major shop-fabricated parts therefor, specially
designed or prepared to contain the core of a "nuclear reactor",
including the reactor vessel head for a reactor pressure vessel;
c. Manipulative equipment specially designed or prepared for
inserting or removing fuel in a "nuclear reactor";
d. Control rods specially designed or prepared for the control of
the fission process in a "nuclear reactor", support or suspension
structures therefor, rod drive mechanisms and rod guide tubes;
e. Pressure tubes specially designed or prepared to contain fuel
elements and the primary coolant in a "nuclear reactor" at an
operating pressure in excess of 5,1 MPa;
f. Zirconium metal and alloys in the form of tubes or assemblies
of tubes in which the ratio of hafnium to zirconium is less than
1:500 parts by weight, specially designed or prepared for use in
a "nuclear reactor";
g. Coolant pumps specially designed or prepared for circulating
the primary coolant of "nuclear reactors";
h. 'Nuclear reactor internals' specially designed or prepared foruse
in a "nuclear reactor", including support columns for the core,
fuel channels, thermal shields, baffles, core grid plates, and
diffuser plates;
Note: In 0A001.h. 'nuclear reactor internals' means any
major structure within a reactor vessel which has one
or more functions such as supporting the core,
maintaining fuel alignment, directing primary coolant
flow, providing radiation shields for the reactor
vessel, and guiding in-core instrumentation.
i. Heat exchangers (steam generators) specially designed or
prepared for use in the primary coolant circuit of a "nuclear
reactor";
j. Neutron detection and measuring instruments specially
designed or prepared for determining neutron flux levels within
the core of a "nuclear reactor".2000R1334 — EN — 19.01.2002 — 003.001 — 31
▼M3
0B Test,InspectionandProductionEquipment
0B001 Plant for the separation of isotopes of "natural uranium", "depleted
uranium" and "special fissile materials", and specially designed or
prepared equipment and components therefor, as follows:
a. Plant specially designed for separating isotopes of "natural
uranium", "depleted uranium", and "special fissile materials",
as follows:
1. Gas centrifuge separation plant;
2. Gaseous diffusion separation plant;3. Aerodynamic separation plant;4. Chemical exchange separation plant;
5. Ion-exchange separation plant;
6. Atomic vapour "laser" isotope separation (AVLIS) plant;7. Molecular "laser" isotope separation (MLIS) plant;8. Plasma separation plant;9. Electro magnetic separation plant;
b. Gas centrifuges and assemblies and components, specially
designed or prepared for gas centrifuge separation process, asfollows:
Note: In 0B001.b. 'high strength-to-density ratio material'
means any of the following:
a. Maraging steel capable of an ultimate tensile
strength of 2 050 MPa or more;
b. Aluminium alloys capable of an ultimate tensile
strength of 460 MPa or more; or
c. "Fibrous or filamentary materials" with a "specific
modulus" of more than 3,18 × 106m and a
"specifictensilestrength"greaterthan76,2×103m;
1. Gas centrifuges;2. Complete rotor assemblies;3. Rotor tube cylinders witha wall th ickness of 12 mm or
less, a diameter of between 75 mm and 400 mm, made
from 'high strength-to-density ratio materials';
4. Rings or bellows witha wall th ickness of 3 mm or less and
a diameter of between 75 mm and 400 mm and designed to
give local support to a rotor tube or to join a number
together, made from 'high strength-to-density ratio mate-
rials';
5. Baffles of between 75 mm and 400 mm diameter for
mounting inside a rotor tube, made from 'high strength-to-
density ratio materials'.
6. Top or bottom caps of between 75 mm and 400 mm
diameter to fit the ends of a rotor tube, made from 'high
strength-to-density ratio materials';
7. Magnetic suspension bearings consisting of an annular
magnet suspended within a housing made of or protected
by "materials resistant to corrosion by UF
6" containing a
damping medium and having the magnet coupling with a
pole piece or second magnet fitted to the top cap of the
rotor;
8. Specially prepared bearings comprising a pivot-cup
assembly mounted on a damper;
9. Molecular pumps comprised of cylinders having internally
machined or extruded helical grooves and internallymachined bores;
10. Ring-shaped motor stators for multiphase AC hysteresis (or
reluctance) motors for synchronous operation within a
vacuum in the frequency range of 600 to 2000 Hz and a
power range of 50 to 1 000 Volt-Amps;
11. Centrifuge housing/recipients to contain the rotor tube
assembly of a gas centrifuge, consisting of a rigid cylinder
of wall thickness up to 30 mm with precision machined
ends and made of or protected by "materials resistant to
corrosion by UF
6";2000R1334 — EN — 19.01.2002 — 003.001 — 32
▼M3
12. Scoops consisting of tubes of up to 12 mm internal
diameter for the extraction of UF6gas from within a
centrifuge rotor tube by a Pitot tube action, made of or
protected by "materials resistant to corrosion by UF6";
13. Frequency changers (converters or inverters) specially
designed or prepared to supply motor stators for gas
centrifuge enrichment, having all of the following char-
acteristics, and specially designed components therefor:
a. Multiphase output of 600 to 2 000 Hz;
b. Frequency control better than 0,1 %;
c. Harmonic distortion of less than 2 %; and
d. An efficiency greater than 80 %;
c. Equipment and components, specially designed or prepared for
gaseous diffusion separation process, as follows:
1. Gaseous diffusion barriers made of porous metallic, polymer
or ceramic "materials resistant to corrosion by UF6" witha
pore size of 10 to 100 nm, a thickness of 5 mm or less, and,
for tubular forms, a diameter of 25 mm or less;
2. Gaseous diffuser housings made of or protected by
"materials resistant to corrosion by UF6";
3. Compressors (positive displacement, centrifugal and axial
flow types) or gas blowers witha suction volume capacity of
1m3/min or more of UF6, and discharge pressure up to
666,7 kPa, made of or protected by "materials resistant to
corrosion by UF6";
4. Rotary shaft seals for compressors or blowers specified in
0B001.c.3. and designed for a buffer gas in-leakage rate of
less than 1 000 cm3/min.;
5. Heat exchangers made of aluminium, copper, nickel, or
alloys containing more than 60 per cent nickel, or
combinations of these metals as clad tubes, designed to
operate at sub-atmospheric pressure with a leak rate that
limits the pressure rise to less than 10 Pa per hour under a
pressure differential of 100 kPa;
6. Bellow valves made of or protected by"materials resistant to
corrosion by UF6", witha diameter of 40 mm to 1500 mm;
d. Equipment and components, specially designed or prepared for
aerodynamic separation process, as follows:
1. Separation nozzles consisting of slit-shaped, curved chan-
nels having a radius of curvature less than 1 mm, resistant to
corrosion by UF6, and having a knife-edge contained within
the nozzle which separates the gas flowing through the
nozzle into two streams;
2. Tangential inlet flow-driven cylindrical or conical tubes,
(vortex tubes), made of or protected by "materials resistant
to corrosion by UF6" witha diameter of between 0,5 cm and
4 cm and a lengthto diameter ratio of 20:1 or less and with
one or more tangential inlets;
3. Compressors (positive displacement, centrifugal and axial
flow types) or gas blowers witha suction volume capacity of
2m3/min or more, made of or protected by "materials
resistant to corrosion by UF6", and rotary shaft seals
therefor;
4. Heat exchangers made of or protected by "materials resistant
to corrosion by UF6";
5. Aerodynamic separation element housings, made of or
protected by "materials resistant to corrosion by UF6"t o
contain vortex tubes or separation nozzles;
6. Bellows valves made of or protected by "materials resistant
to corrosion by UF6", witha diameter of 40 to 1 500 mm;
7. Process systems for separating UF6from carrier gas
(hydrogen or helium) to 1 ppm UF6content or less,
including:
a. Cryogenic heat exchangers and cryoseparators capable of
temperatures of 153 K (− 120 ºC) or less;
b. Cryogenic refrigeration units capable of temperatures of
153 K (− 120 ºC) or less;2000R1334 — EN — 19.01.2002 — 003.001 — 33
▼M3
c. Separation nozzle or vortex tube units for the separation
of UF6from carrier gas;
d. UF6cold trapscapable oftemperatures of253K(−20ºC)
or less;
e. Equipment and components, specially designed or prepared for
chemical exchange separation process, as follows:
1. Fast-exchange liquid-liquid pulse columns with stage
residence time of 30 seconds or less and resistant to
concentrated hydrochloric acid (e.g. made of or protected by
suitable plastic materials suchas fluorocarbon polymers or
glass);
2. Fast-exchange liquid-liquid centrifugal contactors with stage
residence time of 30 seconds or less and resistant to
concentrated hydrochloric acid (e.g. made of or protected by
suitable plastic materials suchas fluorocarbon polymers or
glass);
3. Electrochemical reduction cells resistant to concentrated
hydrochloric acid solutions, for reduction of uranium from
one valence state to another;
4. Electrochemical reduction cells feed equipment to take U+4
from the organic stream and, for those parts in contact with
the process stream, made of or protected by suitable
materials (e.g. glass, fluorocarbon polymers, polyphenyl
sulphate, polyether sulfone and resin-impregnated graphite);
5. Feed preparation systems for producing high purity uranium
chloride solution consisting of dissolution, solvent extraction
and/or ion exchange equipment for purification and electro-
lytic cells for reducing the uranium U+6or U+4to U+3;
6. Uranium oxidation systems for oxidation of U+3to U+4;
f. Equipment and components, specially designed or prepared for
ion-exchange separation process, as follows:
1. Fast reacting ion-exchange resins, pellicular or porous
macro-reticulated resins in which the active chemical
exchange groups are limited to a coating on the surface of
an inactive porous support structure, and other compositestructures in any suitable form, including particles or fibres,
withdiameters of 0,2 mm or less, resistant to concentrated
hydrochloric acid and designed to have an exchange rate
half-time of less than 10 seconds and capable of operating at
temperatures in the range of 373 K (100 ºC) to 473 K
(200 ºC);
2. Ion exchange columns (cylindrical) with a diameter greater
than 1 000 mm, made of or protected by materials resistant
to concentrated hydrochloric acid (e.g. titanium or fluor-
ocarbon plastics) and capable of operating at temperatures in
the range of 373 K (100 ºC) to 473 K (200 ºC) and pressures
above 0,7 MPa;
3. Ion exchange reflux systems (chemical or electrochemical
oxidation or reduction systems) for regeneration of the
chemical reducing or oxidizing agents used in ion exchange
enrichment cascades;
g. Equipment and components, specially designed or prepared for
atomic vapour "laser" isotope separation process (AVLIS), as
follows:
1. Highpower strip or scanning electron beam guns witha
delivered power of more than 2,5 kW/cm for use in uranium
vaporization systems;
2. Liquid uranium metal handling systems for molten uranium
or uranium alloys, consisting of crucibles, made of or
protected by suitable corrosion and heat resistant materials
(e.g. tantalum, yttria-coated graphite, graphite coated with
other rare earth oxides or mixtures thereof), and cooling
equipment for the crucibles;
N.B.: SEEALSO2A225.
3. Product and tails collector systems made of or lined with
materials resistant to the heat and corrosion of uranium
metal vapour or liquid, suchas yttria-coated graph ite or
tantalum;2000R1334 — EN — 19.01.2002 — 003.001 — 34
▼M3
4. Separator module housings (cylindrical or rectangular
vessels) for containing the uranium metal vapour source,
the electron beam gun and the product and tails collectors;
5. "Lasers" or "laser" systems for the separation of uranium
isotopes witha spectrum frequency stabiliser for operation
over extended periods of time;
N.B.: SEEALSO6A005AND6A205.
h. Equipment and components, specially designed or prepared for
molecular "laser" isotope separation process (MLIS) or
chemical reaction by isotope selective laser activation
(CRISLA), as follows:
1. Supersonic expansion nozzles for cooling mixtures of UF6and carrier gas to 150 K (− 123 ºC) or less and made from
"materials resistant to corrosion by UF6";
2. Uranium pentafluoride (UF5) product collectors consisting of
filter, impact, or cyclone-type collectors or combinations
thereof, and made of "materials resistant to corrosion byUF
5/UF6";
3. Compressors made of or protected by "materials resistant to
corrosion by UF6", and rotary shaft seals therefor;
4. Equipment for fluorinating UF5(solid) to UF6(gas);
5. Process systems for separating UF6from carrier gas (e.g.
nitrogen or argon) including:
a. Cryogenic heat exchangers and cryoseparators capable of
temperatures of 153 K (− 120 ºC) or less;
b. Cryogenic refrigeration units capable of temperatures of
153 K (− 120 ºC) or less;
c. UF6cold trapscapable oftemperatures of253K(−20ºC)
or less;
6. "Lasers" or "laser" systems for the separation of uranium
isotopes witha spectrum frequency stabiliser for operation
over extended periods of time;
N.B.: SEEALSO6A005AND6A205.
i. Equipment and components, specially designed or prepared for
plasma separation process, as follows:
1. Microwave power sources and antennae for producing or
accelerating ions, withan output frequency greater th an
30 GHz and mean power output greater than 50 kW;
2. Radio frequency ion excitation coils for frequencies of more
than 100 kHz and capable of handling more than 40 kW
mean power;
3. Uranium plasma generation systems;
4. Liquid metal handling systems for molten uranium or
uranium alloys, consisting of crucibles, made of or protected
by suitable corrosion and heat resistant materials (e.g.
tantalum, yttria-coated graphite, graphite coated with other
rare earthoxides or mixtures th ereof), and cooling equip-
ment for the crucibles;
N.B.: SEEALSO2A225.
5. Product and tails collectors made of or protected by
materials resistant to the heat and corrosion of uranium
vapour suchas yttria-coated graph ite or tantalum;
6. Separator module housings (cylindrical) for containing the
uranium plasma source, radio-frequency drive coil and the
product and tails collectors and made of a suitable non-
magnetic material (e.g. stainless steel);
j. Equipment and components, specially designed or prepared for
electromagnetic separation process, as follows:
1. Ion sources, single or multiple, consisting of a vapour
source, ioniser, and beam accelerator made of suitable non-
magnetic materials (e.g. graphite, stainless steel, or copper)
and capable of providing a total ion beam current of 50 mA
or greater;
2. Ion collector plates for collection of enriched or depleted
uranium ion beams, consisting of two or more slits and2000R1334 — EN — 19.01.2002 — 003.001 — 35
▼M3
pockets and made of suitable non-magnetic materials (e.g.
graphite or stainless steel);
3. Vacuum housings for uranium electromagnetic separators
made of non-magnetic materials (e.g. stainless steel) and
designed to operate at pressures of 0,1 Pa or lower;
4. Magnet pole pieces witha diameter greater th an 2 m;
5. Highvoltage power supplies for ion sources, h aving all of
the following characteristics:
a. Capable of continuous operation;
b. Output voltage of 20000 V or greater;
c. Output current of 1 A or greater; and
d. Voltage regulation of better than 0,01 % over a period of
8 hours;
N.B.: SEEALSO3A227.
6. Magnet power supplies (high power, direct current) having
all of the following characteristics:
a. Capable of continuous operation witha current output of
500 A or greater at a voltage of 100 V or greater; and
b. Current or voltage regulation better than 0,01 % over a
period of 8 hours.
N.B.: SEEALSO3A226.
0B002 Specially designed or prepared auxiliary systems, equipment and
components, as follows, for isotope separation plant specified in
0B001,made of or protected by"materials resistant to corrosion by
UF6":
a. Feed autoclaves, ovens or systems used for passing UF6to the
enrichment process;
b. Desublimers or cold traps, used to remove UF6from the
enrichment process for subsequent transfer upon heating;
c. Product and tails stations for transferring UF6into containers;
d. Liquefaction or solidification stations used to remove UF6from
the enrichment process by compressing, cooling and converting
UF6to a liquid or solid form;
e. Piping systems and header systems specially designed for
handling UF6within gaseous diffusion, centrifuge or aero-
dynamic cascades;
f. 1. Vacuum manifolds or vacuum headers having a suction
capacity of 5 m3/minute or more; or
2. Vacuum pumps specially designed for use in UF6bearing
atmospheres;
g. UF6mass spectrometers/ion sources specially designed or
prepared for taking on-line samples of feed, product or tails
from UF6gas streams and having all of the following
characteristics:
1. Unit resolution for mass of more than 320 amu;
2. Ion sources constructed of or lined withnich rome or monel,
or nickel plated;
3. Electron bombardment ionisation sources; and
4. Collector system suitable for isotopic analysis.
0B003 Plant for the conversion of uranium and equipment specially
designed or prepared therefor, as follows:
a. Systems for the conversion of uranium ore concentrates to UO3;
b. Systems for the conversion of UO3to UF6;
c. Systems for the conversion of UO3to UO2;
d. Systems for the conversion of UO2to UF4;
e. Systems for the conversion of UF4to UF6;
f. Systems for the conversion of UF4to uranium metal;
g. Systems for the conversion of UF6to UO2;
h. Systems for the conversion of UF6to UF4;
i. Systems for the conversion of UO2to UCl4.2000R1334 — EN — 19.01.2002 — 003.001 — 36
▼M3
0B004 Plant for the production or concentration of heavy water,
deuterium and deuterium compounds and specially designed or
prepared equipment and components therefor, as follows:
a. Plant for the production of heavy water, deuterium or deuterium
compounds, as follows:
1. Water-hydrogen sulphide exchange plants;
2. Ammonia-hydrogen exchange plants;
b. Equipment and components, as follows:
1. Water-hydrogen sulphide exchange towers fabricated from
fine carbon steel (e.g. ASTM A516) withdiameters of 6 m
to 9 m, capable of operating at pressures greater than or
equal to 2 MPa and witha corrosion allowance of 6 mm or
greater;
2. Single stage, low head (i.e. 0,2 MPa) centrifugal blowers or
compressors for hydrogen sulphide gas circulation (i.e. gas
containing more than 70 % H2S) with a throughput capacity
greater than or equal to 56 m3/second when operating at
pressures greater than or equal to 1,8 MPa suction and
having seals designed for wet H2S service;
3. Ammonia-hydrogen exchange towers greater than or equal
to 35 m in height with diameters of 1,5 m to 2,5 m capable
of operating at pressures greater than 15 MPa;
4. Tower internals, including stage contactors, and stage
pumps, including those which are submersible, for heavy
water production utilising the ammonia-hydrogen exchange
process;
5. Ammonia crackers withoperating pressures greater th an or
equal to 3 MPa for heavy water production utilising the
ammonia-hydrogen exchange process;
6. Infrared absorption analysers capable of on-line hydrogen/
deuterium ratio analysis where deuterium concentrations are
equal to or greater than 90 %;
7. Catalytic burners for the conversion of enriched deuterium
gas into heavy water utilising the ammonia-hydrogen
exchange process;
8. Complete heavy water upgrade systems, or columns
therefor, for the upgrade of heavy water to reactor-grade
deuterium concentration.
0B005 Plant specially designed for the fabrication of "nuclear reactor"
fuel elements and specially designed or prepared equipment
therefor.
Note: A plant for the fabrication of "nuclear reactor" fuel
elements includes equipment which:
a. Normally comes into direct contact with or directly
processes or controls the production flow of nuclear
materials;
b. Seals the nuclear materials within the cladding;
c. Checks the integrity of the cladding or the seal; or
d. Checks the finish treatment of the sealed fuel.
0B006 Plant for the reprocessing of irradiated "nuclear reactor" fuel
elements, and specially designed or prepared equipment and
components therefor.
Note: 0B006includes:
a. Plant for the reprocessing of irradiated "nuclear
reactor" fuel elements including equipment and
components which normally come into direct contact
with and directly control the irradiated fuel and the
major nuclear material and fission product processing
streams;
b. Fuel element chopping or shredding machines, i.e.
remotely operated equipment to cut, chop, shred or
shear irradiated "nuclear reactor" fuel assemblies,
bundles or rods;
c. Dissolvers, critically safe tanks (e.g. small diameter,
annular or slab tanks) specially designed or prepared2000R1334 — EN — 19.01.2002 — 003.001 — 37
▼M3
for the dissolution of irradiated "nuclear reactor" fuel,
which are capable of withstanding hot, highly
corrosive liquids, and which can be remotely loaded
and maintained;
d. Counter-current solvent extractors and ion-exchange
processing equipment specially designed or prepared
for use in a plant for the reprocessing of irradiated
"natural uranium", "depleted uranium" or "special
fissile materials";
e. Holding or storage vessels specially designed to be
critically safe and resistant to the corrosive effects of
nitric acid;
Note: Holding or storage vessels may have the
following features:
1. Walls or internal structures with a boron
equivalent (calculated for all constituent
elements as defined in the note to 0C004)
of at least two per cent;
2. A maximum diameter of 175 mm for
cylindrical vessels; or
3. A maximum width of 75 mm for either a
slab or annular vessel.
f. Process control instrumentation specially designed or
prepared for monitoring or controlling the reproces-
sing of irradiated "natural uranium", "depleted
uranium" or "special fissile materials".
0B007 Plant for the conversion of plutonium and equipment specially
designed or prepared therefor, as follows:
a. Systems for the conversion of plutonium nitrate to oxide;
b. Systems for plutonium metal production.2000R1334 — EN — 19.01.2002 — 003.001 — 38
▼M3
0C Materials
0C001 "Natural uranium" or "depleted uranium" or thorium in the form of
metal, alloy, chemical compound or concentrate and any other
material containing one or more of the foregoing;
Note: 0C001 does not control the following:
a. Four grammes or less of "natural uranium" or
"depleted uranium" when contained in a sensing
component in instruments;
b. "Depleted uranium" specially fabricated for the
following civil non-nuclear applications:
1. Shielding;
2. Packaging;
3. Ballasts having a mass not greater than 100 kg;
4. Counter-weights having a mass not greater than
100 kg;
c. Alloys containing less than 5 % thorium;
d. Ceramic products containing thorium, which have
been manufactured for non-nuclear use.
0C002 "Special fissile materials"
Note: 0C002 does not control four "effective grammes" or less
when contained in a sensing component in instruments.
0C003 Deuterium, heavy water (deuterium oxide) and other compounds
of deuterium, and mixtures and solutions containing deuterium, in
which the isotopic ratio of deuterium to hydrogen exceeds 1:5 000.
0C004 Graphite, nuclear grade, having a purity level of less than 5 parts
per million 'boron equivalent' and witha density greater th an 1,5 g/
cm3.
N.B.: SEEALSO1C107
Note 1: 0C004 does not control the following:
a. Manufactures of graphite having a mass less than
1 kg, other than those specially designed or
prepared for use in a nuclear reactor;
b. Graphite powder.
Note 2: In 0C004, 'boron equivalent' (BE) is defined as the sum
of BEzfor impurities (excluding BEcarbonsince carbon is
not considered an impurity) including boron, where:
BEZ(ppm) = CF × concentration of element Z in ppm;
where CF is the conversion factor =σZ/C2AB
σB/C2AZandσBandσZare the thermal neutron capture cross
sections (in barns) for naturally occurring boron and
element Z respectively; and ABand AZare the atomic
masses of naturally occurring boron and element Z
respectively.
0C005 Specially prepared compounds or powders for the manufacture of
gaseous diffusion barriers, resistant to corrosion by UF6(e.g.
nickel or alloy containing 60 weight per cent or more nickel,
aluminium oxide and fully fluorinated hydrocarbon polymers),
having a purity of 99,9 weight per cent or more and a mean
particle size of less than 10 micrometres measured by American
Society for Testing and Materials (ASTM) B330 standard and a
high degree of particle size uniformity.2000R1334 — EN — 19.01.2002 — 003.001 — 39
▼M3
0D Software
0D001 "Software" specially designed or modified for the "development",
"production" or "use" of goods specified in this Category.2000R1334 — EN — 19.01.2002 — 003.001 — 40
▼M3
0E Technology
0E001 "Technology" according to the Nuclear Technology Note for the
"development", "production" or "use" of goods specified in this
Category.2000R1334 — EN — 19.01.2002 — 003.001 — 41
▼M3
CATEGORY1
MATERIALS,CHEMICALS,"MICROORGANISMS"&"TOXINS"2000R1334 — EN — 19.01.2002 — 003.001 — 42
▼M3
1A Systems,EquipmentandComponents
1A001 Components made from fluorinated compounds, as follows:
a. Seals, gaskets, sealants or fuel bladders specially designed for
"aircraft" or aerospace use made from more than 50 % by
weight of any of the materials specified in 1C009.b. or
1C009.c.;
b. Piezoelectric polymers and copolymers made from vinylidene
fluoride materials specified in 1C009.a.:
1. In sheet or film form; and
2. Witha th ickness exceeding 200 µm;
c. Seals, gaskets, valve seats, bladders or diaphragms made from
fluoroelastomers containing at least one vinylether group as a
constitutional unit, specially designed for "aircraft", aerospace
or 'missile' use.
Note: In 1A001.c., 'missile' means complete rocket systems
and unmanned air vehicle systems.
1A002 "Composite" structures or laminates, having any of the following:
N.B: SEEALSO1A202,9A010AND9A110
a. An organic "matrix" and made from materials specified in
1C010.c., 1C010.d. or 1C010.e.; or
b. A metal or carbon "matrix" and made from:
1. Carbon "fibrous or filamentary materials" with:
a. A "specific modulus" exceeding 10,15 × 106m;and
b. A "specific tensile" strengthexceeding 17,7 × 104m;or
2. Materials specified in 1C010.c.
Note 1: 1A002 does not control composite structures or
laminates made from epoxy resin impregnated carbon
"fibrous or filamentary materials" for the repair of
aircraft structures or laminates, provided the size does
not exceed 1 m2.
Note 2: 1A002 does not control finished or semi-finished items
specially designed for purely civilian applications as
follows:
a. Sporting goods;
b. Automotive industry;
c. Machine tool industry;
d. Medical applications.
1A003 Manufactures of non-fluorinated polymeric substances specified in
1C008.a.3. in film, sheet, tape or ribbon form with either of the
following characteristics:
a. Witha th ickness exceeding 0,254 mm; or
b. Coated or laminated withcarbon, graph ite, metals or magnetic
substances.
Note: 1A003 does not control manufactures when coated or
laminated with copper and designed for the production of
electronic printed circuit boards.
1A004 Protective and detection equipment and components, other than
those specified in military goods controls, as follows:
N.B.: SEEALSO2B351AND2B352.
a. Gas masks, filter canisters and decontamination equipment
therefor designed or modified for defence against biological
agents or radioactive materials "adapted for use in war" or
chemical warfare (CW) agents and specially designed compo-
nents therefor;
b. Protective suits, gloves and shoes specially designed or
modified for defence against biological agents or radioactive
materials "adapted for use in war" or chemical warfare (CW)
agents;
c. Nuclear, biological and chemical (NBC) detection systems
specially designed or modified for detection or identification of2000R1334 — EN — 19.01.2002 — 003.001 — 43
▼M3
biological agents or radioactive materials "adapted for use in
war" or chemical warfare (CW) agents and specially designed
components therefor.
Note: 1A004 does not control:
a. Personal radiation monitoring dosimeters;
b. Equipment limited by design or function to protect
against hazards specific to civil industries, such as
mining, quarrying, agriculture, pharmaceuticals,
medical, veterinary, environmental, waste manage-
ment, or to the food industry.
1A005 Body armour, and specially designed components therefor, other
than those manufactured to military standards or specifications or
to their equivalents in performance.
N.B.: SEEALSOMILITARYGOODSCONTROLS.
Note 1: 1A005 does not control individual suits of body armour
and accessories therefor, when accompanying their
users for his/her own personal protection.
Note 2: 1A005 does not control body armour designed to
provide frontal protection only from both fragment and
blast from non-military explosive devices.
1A102 Resaturated pyrolised carbon-carbon components designed for
space launchveh icles specified in 9A004 or sounding rockets
specified in 9A104.
1A202 Composite structures, other than those specified in 1A002, in the
form of tubes and having both of the following characteristics:
N.B.: SEEALSO9A010AND9A110.
a. An inside diameter of between 75 mm and 400 mm; and
b. Made withany of th e "fibrous or filamentary materials"
specified in 1C010.a. or b. or 1C210.a. or withcarbon prepreg
materials specified in 1C210.c.
1A225 Platinised catalysts specially designed or prepared for promoting
the hydrogen isotope exchange reaction between hydrogen and
water for the recovery of tritium from heavy water or for the
production of heavy water.
1A226 Specialised packings which may be used in separating heavy water
from ordinary water, having both of the following characteristics:
a. Made of phosphor bronze mesh chemically treated to improve
wettability; and
b. Designed to be used in vacuum distillation towers.
1A227 High-density (lead glass or other) radiation shielding windows,
having all of the following characteristics, and specially designed
frames therefor:
a. A 'cold area' greater than 0,09 m2;
b. A density greater than 3 g/cm3;and
c. A thickness of 100 mm or greater.
Technical Note:In 1A227 the term 'cold area' means the viewing area of the
window exposed to the lowest level of radiation in the design
application.2000R1334 — EN — 19.01.2002 — 003.001 — 44
▼M3
1B Test,InspectionandProductionEquipment
1B001 Equipment for the production of fibres, prepregs, preforms or
"composites" specified in 1A002 or 1C010, as follows, and
specially designed components and accessories therefor:
N.B.: SEEALSO1B101AND1B201.
a. Filament winding machines of which the motions for
positioning, wrapping and winding fibres are coordinated and
programmed in three or more axes, specially designed for the
manufacture of "composite" structures or laminates from
"fibrous or filamentary materials";
b. Tape-laying or tow-placement machines of which the motions
for positioning and laying tape, tows or sheets are coordinated
and programmed in two or more axes, specially designed for
the manufacture of "composite" airframe or 'missile' structures;
Note: In 1B001.b., 'missile' means complete rocket systems
and unmanned air vehicle systems.
c. Multidirectional, multidimensional weaving machines or inter-
lacing machines, including adapters and modification kits, for
weaving, interlacing or braiding fibres to manufacture "compo-
site" structures;
Note: 1B001.c. does not control textile machinery not
modified for the above end-uses.
d. Equipment specially designed or adapted for the production of
reinforcement fibres, as follows:
1. Equipment for converting polymeric fibres (suchas poly-
acrylonitrile, rayon, pitchor polycarbosilane) into carbon
fibres or silicon carbide fibres, including special equipment
to strain the fibre during heating;
2. Equipment for the chemical vapour deposition of elements
or compounds on heated filamentary substrates to manu-
facture silicon carbide fibres;
3. Equipment for the wet-spinning of refractory ceramics (such
as aluminium oxide);
4. Equipment for converting aluminium containing precursor
fibres into alumina fibres by heat treatment;
e. Equipment for producing prepregs specified in 1C010.e. by the
hot melt method;
f. Non-destructive inspection equipment capable of inspecting
defects three dimensionally, using ultrasonic or X-ray tomo-
graphy and specially designed for "composite" materials.
1B002 Equipment for producing metal alloys, metal alloy powder or
alloyed materials, specially designed to avoid contamination and
specially designed for use in one of the processes specified in
1C002.c.2.
N.B.: SEEALSO1B102.
1B003 Tools, dies, moulds or fixtures, for "superplastic forming" or
"diffusion bonding" titanium or aluminium or their alloys,
specially designed for the manufacture of:
a. Airframe or aerospace structures;
b. "Aircraft" or aerospace engines; or
c. Specially designed components for those structures or engines.
1B101 Equipment, other than that specified in 1B001, for the "produc-
tion" of structural composites as follows; and specially designed
components and accessories therefor:
N.B.: SEEALSO1B201.
Note: Components and accessories specified in 1B101 include
moulds, mandrels, dies, fixtures and tooling for the
preform pressing, curing, casting, sintering or bonding of
composite structures, laminates and manufactures
thereof.
a. Filament winding machines of which the motions for
positioning, wrapping and winding fibres can be coordinated
and programmed in three or more axes, designed to fabricate2000R1334 — EN — 19.01.2002 — 003.001 — 45
▼M3
composite structures or laminates from fibrous or filamentary
materials, and coordinating and programming controls;
b. Tape-laying machines of which the motions for positioning and
laying tape and sheets can be coordinated and programmed in
two or more axes, designed for the manufacture of composite
airframe and "missile" structures;
c. Equipment designed or modified for the "production" of
"fibrous or filamentary materials" as follows:
1. Equipment for converting polymeric fibres (suchas poly-
acrylonitrile, rayon or polycarbosilane) including special
provision to strain the fibre during heating;
2. Equipment for the vapour deposition of elements or
compounds on heated filament substrates;
3. Equipment for the wet-spinning of refractory ceramics (such
as aluminium oxide);
d. Equipment designed or modified for special fibre surface
treatment or for producing prepregs and preforms specified in
entry 9C110.
Note: 1B101.d. includes rollers, tension stretchers, coating
equipment, cutting equipment and clicker dies.
1B102 Metal powder "production equipment", other than that specified in
1B002, and components as follows:
N.B.: SEEALSO1B115.b.
a. Metal powder "production equipment" usuable for the "produc-
tion", in a controlled environment, of spherical or atomised
materials specified in 1C011.a., 1C011.b., 1C111.a.1.,
1C111.a.2. or in the Military Goods Controls;
b. Specially designed components for "production equipment"
specified in 1B002 or 1B102.a.
Note: 1B102 includes:
a. Plasma generators (high frequency arc-jet) usable for
obtaining sputtered or spherical metallic powders
with organisation of the process in an argon-water
environment;
b. Electroburst equipment usable for obtaining sputtered
or spherical metallic powders with organisation of the
process in an argon-water environment;
c. Equipment usable for the "production" of spherical
aluminium powders by powdering a melt in an inert
medium (e.g. nitrogen).
1B115 Equipment, other than that specified in 1B002 or 1B102, for the
production of propellant and propellant constituents, as follows,
and specially designed components therefor:
a. "Production equipment" for the "production", handling or
acceptance testing of liquid propellants or propellant constitu-
ents specified in 1C011.a., 1C011.b., 1C111 or in the Military
Goods Controls;
b. "Production equipment" for the "production", handling, mixing,
curing, casting, pressing, machining, extruding or acceptance
testing of solid propellants or propellant constituents specified
in 1C011.a., 1C011.b., 1C111 or in the Military Goods
Controls.
Note: B115.b. does not control batch mixers, continuous
mixers or fluid energy mills. For the control of batch
mixers, continuous mixers and fluid energy mills see
1B117, 1B118 and 1B119.
Note 1: For equipment specially designed for the production of
military goods, see the Military Goods Controls.
Note 2: 1B115 does not control equipment for the "production",
handling and acceptance testing of boron carbide.
1B116 Specially designed nozzles for producing pyrolitically derived
materials formed on a mould, mandrel or other substrate from
precursor gases which decompose in the 1573 K (1 300 ºC) to
3 173 K (2 900 ºC) temperature range at pressures of 130 Pa to
20 kPa.2000R1334 — EN — 19.01.2002 — 003.001 — 46
▼M3
1B117 Batchmixers withprovision for mixing under vacuum in th e range
of zero to 13,326 kPa and withtemperature control capability of
the mixing chamber and having all of the following, and specially
designed components therefor:
a. A total volumetric capacity of 110 litres or more; and
b. At least one mixing/kneading shaft mounted off centre.
1B118 Continuous mixers withprovision for mixing under vacuum in th e
range of zero to 13,326 kPa and withtemperature control
capability of the mixing chamber and having all of the following,
and specially designed components therefor:
a. Two or more mixing/kneading shafts; and
b. Capability to open the mixing chamber.
1B119 Fluid energy mills usable for grinding or milling substances
specified in 1C011.a., 1C011.b., 1C111 or in the Military Goods
Controls, and specially designed components therefor.
1B201 Filament winding machines, other than those specified in 1B001 or
1B101, and related equipment, as follows:
a. Filament winding machines having all of the following
characteristics:
1. Having motions for positioning, wrapping, and winding
fibres coordinated and programmed in two or more axes;
2. Specially designed to fabricate composite structures or
laminates from "fibrous or filamentary materials"; and
3. Capable of winding cylindrical rotors of diameter between
75 and 400 mm and lengths of 600 mm or greater;
b. Coordinating and programming controls for the filament
winding machines specified in 1B201.a.;
c. Precision mandrels for the filament winding machines specified
in 1B201.a.
1B225 Electrolytic cells for fluorine production withan output capacity
greater than 250 g of fluorine per hour.
1B226 Electromagnetic isotope separators designed for, or equipped with,
single or multiple ion sources capable of providing a total ion
beam current of 50 mA or greater.
Note: 1B226includes separators:
a. Capable of enriching stable isotopes;
b. With the ion sources and collectors both in the
magnetic field and those configurations in which they
are external to the field.
1B227 Ammonia synthesis converters or ammonia synthesis units, in
which the synthesis gas (nitrogen and hydrogen) is withdrawn
from an ammonia/hydrogen high-pressure exchange column and
the synthesised ammonia is returned to said column.
1B228 Hydrogen-cryogenic distillation columns having all of the
following characteristics:
a. Designed for operation withinternal temperatures of 35 K (−
238 ºC) or less;
b. Designed for operation at an internal pressure of 0,5 to 5 MPa;
c. Constructed of either:
1. Stainless steel of the 300 series with low sulphur content and
withan austenitic ASTM (or equivalent standard) grain size
number of 5 or greater; or
2. Equivalent materials which are both cryogenic and H2-
compatible; and
d. Withinternal diameters of 1 m or greater and effective length s
of 5 m or greater.
1B229 Water-hydrogen sulphide exchange tray columns and 'internal
contactors', as follows:
Note: For columns which are specially designed or prepared
for the production of heavy water see 0B004.2000R1334 — EN — 19.01.2002 — 003.001 — 47
▼M3
a. Water-hydrogen sulphide exchange tray columns, having all of
the following characteristics:
1. Can operate at pressures of 2 MPa or greater;
2. Constructed of carbon steel having an austenitic ASTM (or
equivalent standard) grain size number of 5 or greater; and
3. Witha diameter of 1,8 m or greater;
b. 'Internal contactors' for the water-hydrogen sulphide exchange
tray columns specified in 1B229.a.
Technical Note:
'Internal contactors' of the columns are segmented trays which
have an effective assembled diameter of 1,8 m or greater, are
designed to facilitate countercurrent contacting and are
constructed of stainless steels with a carbon content of 0,03 %
or less. These may be sieve trays, valve trays, bubble cap trays,
or turbogrid trays.
1B230 Pumps capable of circulating solutions of concentrated or dilute
potassium amide catalyst in liquid ammonia (KNH2/NH3), having
all of the following characteristics:
a. Airtight (i.e., hermetically sealed);
b. A capacity greater than 8,5 m3/h;and
c. Either of the following characteristics:
1. For concentrated potassium amide solutions (1 % or
greater), an operating pressure of 1,5 to 60 MPa; or
2. For dilute potassium amide solutions (less than 1 %), an
operating pressure of 20 to 60 MPa.
1B231 Tritium facilities or plants, and equipment therefor, as follows:
a. Facilities or plants for the production, recovery, extraction,
concentration, or handling of tritium;
b. Equipment for tritium facilities or plants, as follows:
1. Hydrogen or helium refrigeration units capable of cooling to
23 K (− 250 ºC) or less, withh eat removal capacity greater
than 150 W;
2. Hydrogen isotope storage or purification systems using
metal hydrides as the storage or purification medium.
1B232 Turboexpanders or turboexpander-compressor sets having both of
the following characteristics:
a. Designed for operation withan outlet temperature of 35 K (−
238 ºC) or less; and
b. Designed for a throughput of hydrogen gas of 1 000 kg/h or
greater.
1B233 Lithium isotope separation facilities or plants, and equipment
therefor, as follows:
a. Facilities or plants for the separation of lithium isotopes;
b. Equipment for the separation of lithium isotopes, as follows:
1. Packed liquid-liquid exchange columns specially designed
for lithium amalgams;
2. Mercury or lithium amalgam pumps;3. Lithium amalgam electrolysis cells;
4. Evaporators for concentrated lithium hydroxide solution.2000R1334 — EN — 19.01.2002 — 003.001 — 48
▼M3
1C Materials
Technical Note:
Metals and alloys:
Unless provision to the contrary is made, the words 'metals' and
'alloys' in 1C001 to 1C012 cover crude and semi-fabricated forms,
as follows:
Crude forms:Anodes, balls, bars (including notched bars and wire bars), billets,
blocks, blooms, brickets, cakes, cathodes, crystals, cubes, dice,
grains, granules, ingots, lumps, pellets, pigs, powder, rondelles,
shot, slabs, slugs, sponge, sticks;
Semi-fabricated forms (whether or not coated, plated, drilled or
punched):
a. Wrought or worked materials fabricated by rolling, drawing,
extruding, forging, impact extruding, pressing, graining,
atomising, and grinding, i.e.: angles, channels, circles, discs,
dust,flakes, foils andleaf, forging, plate, powder, pressings and
stampings, ribbons, rings, rods (including bare welding rods,
wire rods, and rolled wire), sections, shapes, sheets, strip, pipe
and tubes (including tube rounds, squares, and hollows), drawn
or extruded wire;
b. Cast material produced by casting in sand, die, metal, plaster
or other types of moulds, including high pressure castings,
sintered forms, and forms made by powder metallurgy.
The object of the control should not be defeated by the export of
non-listed forms alleged to be finished products but representing
in reality crude forms or semi-fabricated forms.
1C001 Materials specially designed for use as absorbers of electromag-
netic waves, or intrinsically conductive polymers, as follows:
N.B.: SEEALSO1C101.
a. Materials for absorbing frequencies exceeding 2 × 10
8Hz but
less than 3 × 1012Hz;
Note 1: 1C001.a. does not control:
a. Hair type absorbers, constructed of natural or
synthetic fibres, with non-magnetic loading to
provide absorption;
b. Absorbers having no magnetic loss and whose
incident surface is non-planar in shape, including
pyramids, cones, wedges and convoluted
surfaces;
c. Planar absorbers, having all of the following
characteristics:
1. Made from any of the following:
a. Plastic foam materials (flexible or non-
flexible) with carbon-loading, or organic
materials, including binders, providing
more than 5 % echo compared with metal
over a bandwidth exceeding ± 15 % of the
centre frequency of the incident energy,
and not capable of withstanding tempera-
tures exceeding 450 K (177 ºC); or
b. Ceramic materials providing more than
20 % echo compared with metal over a
bandwidth exceeding ± 15 % of the centre
frequency of the incident energy, and not
capable of withstanding temperatures
exceeding 800 K (527 ºC);
Technical Note:
Absorption test samples for 1C001.a. Note:
1.c.1. should be a square at least 5 wave-
lengths of the centre frequency on a side and
positioned in the far field of the radiating
element.
2. Tensile strength less than 7 × 106N/m2;and2000R1334 — EN — 19.01.2002 — 003.001 — 49
▼M3
3. Compressive strength less than 14 × 106N/m2;
d. Planar absorbers made of sintered ferrite,
having:
1. A specific gravity exceeding 4.4; and
2. A maximum operating temperature of 548 K
(275 ºC).
Note 2: Nothing in Note 1 to 1C001.a. releases magnetic
materials to provide absorption when contained in
paint.
b. Materials for absorbing frequencies exceeding 1,5 × 1014Hz but
less than 3,7 × 1014Hz and not transparent to visible light;
c. Intrinsically conductive polymeric materials witha 'bulk
electrical conductivity' exceeding 10000 S/m (Siemens per
metre) or a 'sheet (surface) resistivity' of less than 100 ohms/
square, based on any of the following polymers:
1. Polyaniline;
2. Polypyrrole;
3. Polythiophene;4. Polyphenylene-vinylene;
or
5. Polythienylene-vinylene.
Technical Note:
'Bulk electrical conductivity' and 'sheet (surface) resistivity'
should be determined using ASTM D-257 or national
equivalents.
1C002 Metal alloys, metal alloy powder and alloyed materials, as follows:
N.B.: SEEALSO1C202.
Note: 1C002 does not control metal alloys, metal alloy powder
and alloyed materials for coating substrates.
Technical Notes:
1. The metal alloys in 1C002 are those containing a higher
percentage by weight of the stated metal than of any other
element.
2. Stress-rupture life should be measured in accordance with
ASTM standard E-139 or national equivalents.
3. Low cycle fatigue life should be measured in accordance with
ASTM Standard E-606 'Recommended Practice for Constant-
Amplitude Low-Cycle Fatigue Testing' or national equivalents.
Testing should be axial with an average stress ratio equal to 1
and a stress-concentration factor (Kt) equal to 1. The average
stress is defined as maximum stress minus minimum stress
divided by maximum stress.
a. Aluminides, as follows:
1. Nickel aluminides containing a minimum of 15 weight
percent aluminium, a maximum of 38 weight percent
aluminium and at least one additional alloying element;
2. Titanium aluminides containing 10 weight percent or more
aluminium and at least one additional alloying element;
b. Metal alloys, as follows, made from material specified in
1C002.c.:
1. Nickel alloys with:
a. A stress-rupture life of 10000 hours or longer at 923 K
(650 ºC) at a stress of 676 MPa; or
b. Alowcyclefatigue lifeof10000cyclesormoreat823K
(550 ºC) at a maximum stress of 1 095 MPa;
2. Niobium alloys with:
a. A stress-rupture life of 10000 hours or longer at 1073 K
(800 ºC) at a stress of 400 MPa; or
b. Alowcyclefatigue lifeof10000cyclesormoreat973K
(700 ºC) at a maximum stress of 700 Pa;2000R1334 — EN — 19.01.2002 — 003.001 — 50
▼M3
3. Titanium alloys with:
a. A stress-rupture life of 10000 hours or longer at 723 K
(450 ºC) at a stress of 200 MPa; or
b. Alowcyclefatigue lifeof10000cyclesormoreat723K
(450 ºC) at a maximum stress of 400 MPa;
4. Aluminium alloys witha tensile strengthof:
a. 240 MPa or more at 473 K (200 ºC); or
b. 415 MPa or more at 298 K (25 ºC);
5. Magnesium alloys with:
a. A tensile strengthof 345 MPa or more; and
b. A corrosion rate of less than 1 mm/year in 3 % sodium
chloride aqueous solution measured in accordance with
ASTM standard G-31 or national equivalents;
c. Metal alloy powder or particulate material for material, having
all of the following characteristics:
1. Made from any of the following composition systems:
Technical Note:
X in the following equals one or more alloying elements.
a. Nickel alloys (Ni-Al-X, Ni-X-Al) qualified for turbine
engine parts or components, i.e. withless th an 3 non-
metallic particles (introduced during the manufacturing
process) larger than 100 µm in 109alloy particles;
b. Niobium alloys (Nb-Al-Xor Nb-X-Al, Nb-Si-Xor Nb-X-
Si, Nb-Ti-X or Nb-X-Ti);
c. Titanium alloys (Ti-Al-X or Ti-X-Al);
d. Aluminium alloys (Al-Mg-X or Al-X-Mg, Al-Zn-X or
Al-X-Zn, Al-Fe-X or Al-X-Fe); or
e. Magnesium alloys (Mg-Al-X or Mg-X-Al);
2. Made in a controlled environment by any of the following
processes:
a. "Vacuum atomisation";
b. "Gas atomisation";
c. "Rotary atomisation";
d. "Splat quenching";
e. "Melt spinning" and "comminution";
f. "Melt extraction" and "comminution"; or
g. "Mechanical alloying"; and
3. Capable of forming materials specified in 1C002.a. or
1C002.b.
d. Alloyed materials, having all of the following characteristics:
1. Made from any of the composition systems specified in
1C002.c.1.;
2. In the form of uncomminuted flakes, ribbons or thin rods;
3. Produced in a controlled environment by any of the
following:
a. "Splat quenching";
b. "Melt spinning"; or
c. "Melt extraction".
1C003 Magnetic metals, of all types and of whatever form, having any of
the following characteristics:
a. Initial relative permeability of 120000 or more and a thickness
of 0,05 mm or less;
Technical Note:
Measurement of initial permeability must be performed on fully
annealed materials.2000R1334 — EN — 19.01.2002 — 003.001 — 51
▼M3
b. Magnetostrictive alloys, having any of the following character-
istics:
1. A saturation magnetostriction of more than 5 × 10−4;or
2. A magnetomechanical coupling factor (k) of more than 0,8;
or
c. Amorphous or 'nanocrystalline' alloy strips, having all of the
following characteristics:
1. A composition having a minimum of 75 weight percent of
iron, cobalt or nickel;
2. A saturation magnetic induction (Bs) of 1,6 T or more; and
3. Any of the following:
a. A strip thickness of 0,02 mm or less; or
b. An electrical resistivity of 2 × 10−4ohm cm or more.
Technical Note:
'Nanocrystalline' materials in 1C003.c. are those materials
having a crystal grain size of 50 nm or less, as determined by
X-ray diffraction.
1C004 Uranium titanium alloys or tungsten alloys witha "matrix" based
on iron, nickel or copper, having all of the following:
a. A density exceeding 17,5 g/cm3;
b. An elastic limit exceeding 880 MPa;
c. An ultimate tensile strengthexceeding 1 270 MPa; and
d. An elongation exceeding 8 %.
1C005 "Superconductive" "composite" conductors in lengths exceeding
100 m or witha mass exceeding 100 g, as follows:
a. Multifilamentary "superconductive" "composite" conductors
containing one or more niobium-titanium filaments:
1. Embedded in a "matrix" other than a copper or copper-based
mixed "matrix"; or
2. Having a cross-section area less than 0,28 × 10−4mm2(6 µm
in diameter for circular filaments);
b. "Superconductive" "composite" conductors consisting of one or
more "superconductive" filaments other than niobium-titanium,
having all of the following:
1. A "critical temperature" at zero magnetic induction
exceeding 9,85 K (− 263,31 ºC) but less than 24 K (−
249,16 ºC);
2. A cross-section area less than 0,28 × 10−4mm2;and
3. Remaining in the "superconductive" state at a temperature of
4,2 K (− 268,96 ºC) when exposed to a magnetic field
corresponding to a magnetic induction of 12 T.
1C006 Fluids and lubricating materials, as follows:
a. Hydraulic fluids containing, as their principal ingredients, any
of the following compounds or materials:
1. Synthetic silahydrocarbon oils, having all of the following:
Technical Note:
For the purpose of 1C006.a.1., silahydrocarbon oils contain
exclusively silicon, hydrogen and carbon.
a. A flashpoint exceeding 477 K (204 ºC);
b. A pour point at 239 K (− 34 ºC) or less;
c. A viscosity index of 75 or more; and
d. A thermal stability at 616 K (343 ºC); or
2. Chlorofluorocarbons, having all of the following:
Technical Note:
For the purpose of 1C006.a.2., chlorofluorocarbons contain
exclusively carbon, fluorine and chlorine.
a. No flashpoint;2000R1334 — EN — 19.01.2002 — 003.001 — 52
▼M3
b. An autogenous ignition temperature exceeding 977 K
(704 ºC);
c. A pour point at 219 K (− 54 ºC) or less;
d. A viscosity index of 80 or more; and
e. A boiling point at 473 K (200 ºC) or higher;
b. Lubricating materials containing, as their principal ingredients,
any of the following compounds or materials:
1. Phenylene or alkylphenylene ethers or thio-ethers, or their
mixtures, containing more than two ether or thio-ether
functions or mixtures thereof; or
2. Fluorinated silicone fluids witha kinematic viscosity of less
than 5000 mm2/s (5 000 centistokes) measured at 298 K
(25 ºC);
c. Damping or flotation fluids witha purity exceeding 99,8 %,
containing less than 25 particles of 200 µm or larger in size per
100 ml and made from at least 85 % of any of the following
compounds or materials:
1. Dibromotetrafluoroethane;
2. Polychlorotrifluoroethylene (oily and waxy modifications
only);or
3. Polybromotrifluoroethylene;
d. Fluorocarbon electronic cooling fluids, having all of the
following characteristics:
1. Containing 85 % by weight or more of any of the following,
or mixtures thereof:
a. Monomeric forms of perfluoropolyalkylether-triazines or
perfluoroaliphatic-ethers;
b. Perfluoroalkylamines;
c. Perfluorocycloalkanes; or
d. Perfluoroalkanes;
2. Density at 298 K (25 ºC) of 1,5 g/ml or more;3. In a liquid state at 273 K (0 ºC);
and
4. Containing 60 % or more by weight of fluorine.
Technical Note:
For the purpose of 1C006:
a. Flash point is determined using the Cleveland Open Cup
Method described in ASTM D-92 or national equivalents;
b. Pour point is determined using the method described in ASTM
D-97 or national equivalents;
c. Viscosity index is determined using the method described in
ASTM D-2270 or national equivalents;
d. Thermal stability is determined by the following test procedure
or national equivalents:
Twenty ml of the fluid under test is placed in a 46ml type 317
stainless steel chamber containing one each of 12,5 mm
(nominal) diameter balls of M-10 tool steel, 52100 steel and
naval bronze (60 % Cu, 39 % Zn, 0,75 % Sn);
The chamber is purged with nitrogen, sealed at atmospheric
pressure and the temperature raised to and maintained at
6 44 ± 6K (371 ± 6ºC) for six hours;
The specimen will be considered thermally stable if, on
completion of the above procedure, all of the following
conditions are met:
1. Thelossin weight of each ball is lessthan10mg/mm2of ball
surface;
2. The change in original viscosity as determined at 311 K
(38 ºC) is less than 25 %; and
3. The total acid or base number is less than 0,40;
e. Autogenous ignition temperature is determined using the
method described in ASTM E-659 or national equivalents.2000R1334 — EN — 19.01.2002 — 003.001 — 53
▼M3
1C007 Ceramic base materials, non-"composite" ceramic materials,
ceramic-"matrix" "composite" materials and precursor materials,
as follows:
N.B.: SEEALSO1C107.
a. Base materials of single or complex borides of titanium having
total metallic impurities, excluding intentional additions, of less
than 5 000 ppm, an average particle size equal to or less than
5 µm and no more than 10 % of the particles larger than 10 µm;
b. Non-"composite" ceramic materials in crude or semi-fabricated
form, composed of borides of titanium witha density of 98 %
or more of the theoretical density;
Note: 1C007.b. does not control abrasives.
c. Ceramic-ceramic "composite" materials witha glass or oxide-
"matrix" and reinforced with fibres having all of the following:
1. Made from any of the following materials:
a. Si-N;
b. Si-C;
c. Si-Al-O-N; or
d. Si-O-N; and
2. Having a specific tensile strengthexceeding 12,7 × 103m;
d. Ceramic-ceramic "composite" materials, withor with out a
continuous metallic phase, incorporating particles, whiskers or
fibres, where carbides or nitrides of silicon, zirconium or boron
form the "matrix";
e. Precursor materials (i.e., special purpose polymeric or metallo-
organic materials) for producing any phase or phases of the
materials specified in 1C007.c., as follows:
1. Polydiorganosilanes (for producing silicon carbide);
2. Polysilazanes (for producing silicon nitride);3. Polycarbosilazanes (for producing ceramics withsilicon,
carbon and nitrogen components);
f. Ceramic-ceramic "composite" materials withan oxide or glass
"matrix" reinforced withcontinuous fibres from any of th e
following systems:
1. Al
2O3;or
2. Si-C-N.
Note: 1C007.f. does not control "composites" containing
fibres from these systems with a fibre tensile strength
of less than 700 MPa at 1 273 K (1 000 ºC) or fibre
tensile creep resistance of more than 1 % creep strain
at 100 MPa load and 1 273 K (1 000 ºC) for 100
hours.
1C008 Non-fluorinated polymeric substances, as follows:
a. 1. Bismaleimides;
2. Aromatic polyamide-imides;3. Aromatic polyimides;4. Aromatic polyetherimides having a glass transition tempera-
ture (T
g) exceeding 513 K (240 ºC) determined using the dry
method described in ASTM D 3418;
Note: 1C008.a. does not control non-fusible compression
moulding powders or moulded forms.
b. Thermoplastic liquid crystal copolymers having a heat distor-
tion temperature exceeding 523 K (250 ºC) measured according
to ASTM D-648, method A, or national equivalents, with a load
of 1,82 N/mm2and composed of:
1. Any of the following:
a. Phenylene, biphenylene or naphthalene; or
b. Methyl, tertiary-butyl or phenyl substituted phenylene,
biphenylene or naphthalene; and2000R1334 — EN — 19.01.2002 — 003.001 — 54
▼M3
2. Any of the following acids:
a. Terephthalic acid;
b. 6-hydroxy-2 naphthoic acid; or
c. 4-hydroxybenzoic acid;
c. Polyarylene ether ketones, as follows:
1. Polyether ether ketone (PEEK);
2. Polyether ketone ketone (PEKK);3. Polyether ketone (PEK);4. Polyether ketone ether ketone ketone (PEKEKK);
d. Polyarylene ketones;
e. Polyarylene sulphides, where the arylene group is biphenylene,
triphenylene or combinations thereof;
f. Polybiphenylenethersulphone.
Technical Note:
The glass transition temperature (Tg) for 1C008 materials is
determined using the method described in ASTM D 3418 using the
dry method.
1C009 Unprocessed fluorinated compounds, as follows:
a. Copolymers of vinylidene fluoride having 75 % or more beta
crystalline structure without stretching;
b. Fluorinated polyimides containing 10 % by weight or more of
combined fluorine;
c. Fluorinated phosphazene elastomers containing 30 % by weight
or more of combined fluorine.
1C010 "Fibrous or filamentary materials" which may be used in organic
"matrix", metallic "matrix" or carbon "matrix" "composite"
structures or laminates, as follows:
N.B.: SEEALSO1C210.
a. Organic "fibrous or filamentary materials", having all of the
following:
1. A "specific modulus" exceeding 12,7 × 106m;and
2. A "specific tensile strength" exceeding 23,5 × 104m;
Note: 1C010.a. does not control polyethylene.
b. Carbon "fibrous or filamentary materials", having all of the
following:
1. A "specific modulus" exceeding 12,7 × 106m;and
2. A "specific tensile strength" exceeding 23,5 × 104m;
Note: 1C010.b. does not control fabric made from "fibrous
or filamentary materials" for the repair of aircraft
structures or laminates, in which the size of individual
sheets does not exceed 50 cm × 90 cm.
Technical Note:
Properties for materials described in 1C010.b. should be
determined using SACMA recommended methods SRM 12 to
17, or national equivalent tow tests, such as Japanese
Industrial Standard JIS-R-7601, Paragraph 6.6.2., and based
on lot average.
c. Inorganic "fibrous or filamentary materials", having all of the
following:
1. A "specific modulus" exceeding 2,54 × 106m;and
2. A melting, softening, decomposition or sublimation point
exceeding 1 922 K (1 649 ºC) in an inert environment;
Note: 1C010.c. does not control:
1. Discontinuous, multiphase, polycrystalline alumina
fibres in chopped fibre or random mat form,
containing 3 weight percent or more silica, with
a specific modulus of less than 10 × 106m;
2. Molybdenum and molybdenum alloy fibres;2000R1334 — EN — 19.01.2002 — 003.001 — 55
▼M3
3. Boron fibres;
4. Discontinuous ceramic fibres with a melting,
softening, decomposition or sublimation point
lower than 2 043 K (1 770 ºC) in an inert
environment.
d. "Fibrous or filamentary materials":
1. Composed of any of the following:
a. Polyetherimides specified in 1C008.a.; or
b. Materials specified in 1C008.b. to 1C008.f.; or
2. Composed of materials specified in 1C010.d.1.a. or
1C010.d.1.b. and "commingled" withoth er fibres specified
in 1C010.a., 1C010.b. or 1C010.c.;
e. Resin-impregnated or pitch-impregnated fibres (prepregs),
metal or carbon-coated fibres (preforms) or "carbon fibre
preforms", as follows:
1. Made from "fibrous or filamentary materials" specified in
1C010.a., 1C010.b. or 1C010.c.;
2. Made from organic or carbon "fibrous or filamentary
materials":
a. Witha "specific tensile strength " exceeding 17,7 × 104m;
b. Witha "specific modulus" exceeding 10,15 × 106m;
c. Not controlled by 1C010.a. or 1C010.b.; and
d. When impregnated with materials specified in 1C008 or
1C009.b., having a glass transition temperature (Tg)
exceeding 383 K (110 ºC) or withph enolic or epoxy
resins, having a glass transition temperature (Tg) equal to
or exceeding 418 K (145 ºC).
Note: 1C010.e. does not control:
a. Epoxy resin "matrix" impregnated carbon "fibrous
or filamentary materials" (prepregs) for the repair
of aircraft structures orlaminates, in which the size
of individual sheets of prepreg does not exceed
50 cm × 90 cm;
b. Prepregs when impregnated with phenolic or epoxy
resins having a glass transition temperature (Tg)
less than 433 K (160 ºC) and a cure temperature
lower than the glass transition temperature.
Technical Note:
The glass transition temperature (Tg) for 1C010.e. materials is
determined using the method described in ASTM D 3418 using
the dry method. The glass transition temperature for phenolic
and epoxy resins is determined using the method described in
ASTM D 4065 at a frequency of 1 Hz and a heating rate of 2 K
(ºC) per minute using the dry method.
1C011 Metals and compounds, as follows:
N.B.: SEE ALSO MILITARY GOODS CONTROLS and
1C111.
a. Metals in particle sizes of less than 60 µm whether spherical,
atomised, spheroidal, flaked or ground, manufactured from
material consisting of 99 % or more of zirconium, magnesium
and alloys of these;
Technical Note:
The natural content of hafnium in the zirconium (typically 2 %
to 7 %) is counted with the zirconium.
Note: The metals or alloys listed in 1C011.a. are controlled
whether or not the metals or alloys are encapsulated
in aluminium, magnesium, zirconium or beryllium.
b. Boron or boron carbide of 85 % purity or higher and a particle
size of 60 µm or less;
Note: The metals or alloys listed in 1C011.b. are controlled
whether or not the metals or alloys are encapsulated
in aluminium, magnesium, zirconium or beryllium.
c. Guanidine nitrate;2000R1334 — EN — 19.01.2002 — 003.001 — 56
▼M3
d. Nitroguanidine (NQ) (CAS 556-88-7).
1C012 Materials as follows:
Technical Note:
These materials are typically used for nuclear heat sources.
a. Plutonium in any form witha plutonium isotopic assay of
plutonium-238 of more than 50 % by weight;
Note: 1C012.a. does not control:
a. Shipments with a plutonium content of 1 g or less;
b. Shipments of 3 "effective grammes" or less when
contained in a sensing component in instruments.
b. "Previously separated" neptunium-237 in any form.
Note: 1C012.b. does not control shipments with a neptu-
nium-237 content of 1 g or less.
1C101 Materials and devices for reduced observables suchas radar
reflectivity, ultraviolet/infrared signatures and acoustic signatures,
other than those specified in 1C001, usable in "missiles" and their
subsystems.
Note 1: 1C101 includes:
a. Structural materials and coatings specially designed
for reduced radar reflectivity;
b. Coatings, including paints, specially designed for
reduced or tailored reflectivity or emissivity in the
microwave, infrared or ultra violet regions of the
electromagnetic spectrum.
Note 2: 1C101 does not include coatings when specially used
for the thermal control of satellites.
1C102 Resaturated pyrolised carbon-carbon materials designed for space
launchveh icles specified in 9A004 or sounding rockets specified
in 9A104.
1C107 Graphite and ceramic materials, other than those specified in
1C007, as follows:
a. Fine grain recrystallised bulk graphites having a bulk density of
1,72 g/cm3or greater, measured at 288 K (15 ºC), and having a
particle size of 100 micrometres or less, usable for "missile"
nozzles and reentry vehicle nose tips;
Note: See also 0C004
b. Pyrolytic or fibrous reinforced graphites, usable for "missile"
nozzles and reentry vehicle nose tips;
Note: See also 0C004
c. Ceramic composite materials (dielectric constant less than 6 at
frequencies from 100 Hz to 10000 MHz) usable for "missile"
radomes;
d. Bulk machinable silicon-carbide reinforced unfired ceramic,
usable for "missile" nose tips.
1C111 Propellants and constituent chemicals for propellants, other than
those specified in 1C011, as follows:
a. Propulsive substances:
1. Spherical aluminium powder, other than that specified in the
Military Goods Controls, withparticles of uniform diameter
of less than 200 µm and an aluminium content of 97 % by
weight or more, if at least 10 % of the total weight is made
up of particles of less than 63 µm, according to ISO
2591:1988 or national equivalents;
Technical Note:
A particle size of 63 µm (ISO R-565) corresponds to 250
mesh (Tyler) or 230 mesh (ASTM standard E-11).
2. Metal fuels, other than that specified in the Military Goods
Controls, in particle sizes of less than 60 µm, whether
spherical, atomised, spheroidal, flaked or ground, consisting
97 % by weight or more of any of the following:
a. Zirconium;2000R1334 — EN — 19.01.2002 — 003.001 — 57
▼M3
b. Beryllium;
c. Magnesium; or
d. Alloys of the metals specified by a. to c. above;
Technical Note:
The natural content of hafnium in the zirconium (typically
2 % to 7 %) is counted with the zirconium.
3. Liquid oxidisers, the following:
a. Dinitrogen trioxide;
b. Nitrogen dioxide/dinitrogen tetroxide;
c. Dinitrogen pentoxide;
b. Polymeric substances:
1. Carboxy-terminated polybutadiene (CTPB);
2. Hydroxy-terminated polybutadiene (HTPB), other than that
specified in the Military Goods Controls;
3. Polybutadiene-acrylic acid (PBAA);4. Polybutadiene-acrylic acid-acrylonitrile (PBAN);
c. Other propellant additives and agents:
1.SEEMILITARYGOODSCONTROLSFOR
Butacene;
2. Triethylene glycol dinitrate (TEGDN);3. 2-Nitrodiphenylamine;4. Trimethylolethane trinitrate (TMETN);5. Diethylene glycol dinitrate (DEGDN);6. Ferrocene derivatives other than those specified in the
Military Goods Controls.
Note: For propellants and constituent chemicals for propellants
not specified in 1C111, see the Military Goods Controls.
1C116 Maraging steels (steels generally characterised byhigh nickel, very
low carbon contentand the use of substitutional elements or
precipitates to produce age-hardening) having an ultimate tensile
strengthof 1 500 MPa or greater, measured at 293 K (20 ºC), in
the form of sheet, plate or tubing with a wall or plate thickness
equal to or less than 5 mm.
N.B.: SEEALSO1C216.
1C117 Tungsten, molybdenum and alloys of these metals in the form of
uniform spherical or atomised particles of 500 micrometre
diameter or less witha purity of 97 % or greater for fabrication
of "missile" motor components, i.e., heat shields, nozzle substrates,
nozzle throats and thrust vector control surfaces.
1C118 Titanium-stabilised duplex stainless steel (Ti-DSS) having all of
the following:
a. Having all of the following characteristics:
1. Containing 17,0-23,0 weight percent chromium and 4,5-7,0
weight percent nickel;
2. Having a titanium content of greater than 0,10 weight
percent;and
3. A ferritic-austenitic microstructure (also referred to as a
two-phase microstructure) of which at least 10 percent is
austenite by volume (according to ASTM E-1181-87 or
national equivalents); and
b. Having any of the following forms:
1. Ingots or bars having a size of 100 mm or more in each
dimension;
2. Sheets having a width of 600 mm or more and a thickness of
3 mm or less; or
3. Tubes having an outer diameter of 600 mm or more and a
wall thickness of 3 mm or less.2000R1334 — EN — 19.01.2002 — 003.001 — 58
▼M3
1C202 Alloys, other than those specified in 1C002.a.2.c. or d., as follows:
a. Aluminium alloys having both of the following characteristics:
1. 'Capable of' an ultimate tensile strengthof 460 MPa or more
at 293 K (20 ºC); and
2. In the form of tubes or cylindrical solid forms (including
forgings) withan outside diameter of more th an 75 mm;
b. Titanium alloys having both of the following characteristics:
1. 'Capable of' an ultimate tensile strengthof 900 MPa or more
at 293 K (20 ºC); and
2. In the form of tubes or cylindrical solid forms (including
forgings) withan outside diameter of more th an 75 mm.
Technical Note:
The phrase alloys 'capable of' encompasses alloys before or after
heat treatment.
1C210 'Fibrous or filamentary materials' or prepregs, other than those
specified in 1C010.a., b. or e., as follows:
a. Carbon or aramid 'fibrous or filamentary materials' having
either of the following characteristics:
1. A "specific modulus" of 12,7 × 106m or greater; or
2. A "specific tensile strength" of 235 × 103m or greater;
Note: 1C210.a. does not control aramid 'fibrous or filamen-
tary materials' having 0,25 percent or more by weight
of an ester based fibre surface modifier;
b. Glass 'fibrous or filamentary materials' having both of the
following characteristics:
1. A "specific modulus" of 3,18 × 106m or greater; and
2. A "specific tensile strength" of 76,2 × 103m or greater;
c. Thermoset resin impregnated continuous "yarns", "rovings",
"tows" or "tapes" witha widthof 15 mm or less (prepregs),
made from carbon or glass 'fibrous or filamentary materials'
specified in 1C210.a. or b.
Technical Note:
The resin forms the matrix of the composite.
Note: In 1C210, 'fibrous or filamentary materials' is restricted
to continuous "monofilaments", "yarns", "rovings",
"tows" or "tapes".
1C216 Maraging steel, other than that specified in 1C116, 'capable of' an
ultimate tensile strengthof 2050 MPa or more, at 293 K (20 ºC).
Note: 1C216does not control forms in which all linear
dimensions are 75 mm or less.
Technical Note:
The phrase maraging steel 'capable of' encompasses maraging
steel before or after heat treatment.
1C225 Boron enriched in the boron-10 (10B) isotope to greater than its
natural isotopic abundance, as follows: elemental boron,
compounds, mixtures containing boron, manufactures thereof,
waste or scrap of any of the foregoing.
Note: In 1C225 mixtures containing boron include boron
loaded materials.
Technical Note:
The natural isotopic abundance of boron-10 is approximately 18,5
weight per cent (20 atom per cent).
1C226 Tungsten, tungsten carbide, and alloys containing more than 90 %
tungsten by weight, having both of the following characteristics:
a. In forms witha h ollow cylindrical symmetry (including
cylinder segments) withan inside diameter between 100 mm
and 300 mm; and
b. A mass greater than 20 kg.2000R1334 — EN — 19.01.2002 — 003.001 — 59
▼M3
Note: 1C226does not control manufactures specially designed
as weights or gamma-ray collimators.
1C227 Calcium having both of the following characteristics:
a. Containing less than 1 000 parts per million by weight of
metallic impurities other than magnesium; and
b. Containing less than 10 parts per million by weight of boron.
1C228 Magnesium having both of the following characteristics:
a. Containing less than 200 parts per million by weight of metallic
impurities other than calcium; and
b. Containing less than 10 parts per million by weight of boron.
1C229 Bismuth having both of the following characteristics:
a. A purity of 99,99 % or greater by weight; and
b. Containing less than 10 parts per million by weight of silver.
1C230 Beryllium metal, alloys containing more than 50 % beryllium by
weight, beryllium compounds, manufactures thereof, and waste or
scrap of any of the foregoing.
Note: 1C230 does not control the following:
a. Metal windows for X-ray machines, or for bore-hole
logging devices;
b. Oxide shapes in fabricated or semi-fabricated forms
specially designed for electronic component parts or
as substrates for electronic circuits;
c. Beryl (silicate of beryllium and aluminium) in the
form of emeralds or aquamarines.
1C231 Hafnium metal, alloys containing more than 60 % hafnium by
weight, hafnium compounds containing more than 60 % hafnium
by weight, manufactures thereof, and waste or scrap of any of the
foregoing.
1C232 Helium-3 (3He), mixtures containing helium-3, and products or
devices containing any of the foregoing.
Note: 1C232 does not control a product or device containing
less than 1 g of helium-3.
1C233 Lithium enriched in the lithium-6 (6Li) isotope to greater than its
natural isotopic abundance, and products or devices containing
enriched lithium, as follows: elemental lithium, alloys,
compounds, mixtures containing lithium, manufactures thereof,
waste or scrap of any of the foregoing.
Note: 1C233 does not control thermoluminescent dosimeters.
Technical Note:
The natural isotopic abundance of lithium-6is approximately 6 ,5
weight per cent (7,5 atom per cent).
1C234 Zirconium with a hafnium content of less than 1 part hafnium to
500parts zirconium byweight, as follows: metal, alloys containing
more than 50 % zirconium by weight, compounds, manufactures
thereof, waste or scrap of any of the foregoing.
Note: 1C234 does not control zirconium in the form of foil
having a thickness of 0,10 mm or less.
1C235 Tritium, tritium compounds, mixtures containing tritium in which
the ratio of tritium to hydrogen atoms exceeds 1 part in 1 000, and
products or devices containing any of the foregoing.
Note: 1C235 does not control a product or device containing
less than 1,48 × 103GBq (40 Ci) of tritium.
1C236 Alpha-emitting radionuclides having an alpha half-life of 10 days
or greater but less than 200 years, in the following forms:
a. Elemental;
b. Compounds having a total alpha activity of 37 GBq/kg (1 Ci/
kg) or greater;
c. Mixtures having a total alpha activity of 37GBq/kg(1 Ci/kg) or
greater;2000R1334 — EN — 19.01.2002 — 003.001 — 60
▼M3
d. Products or devices containing any of the foregoing.
Note: 1C236does not control a product or device containing
less than 3,7 GBq (100 millicuries) of alpha activity.
1C237 Radium-226 (226Ra), radium-226 alloys, radium-226 compounds,
mixtures containing radium-226, manufactures therof, and
products or devices containing any of the foregoing.
Note: 1C237 does not control the following:
a. Medical applicators;
b. A product or device containing less than 0,37 GBq (10
millicuries) of radium-226.
1C238 Chlorine trifluoride (ClF3).
1C239 High explosives, other than those specified in the Military Goods
Controls, or substances or mixtures containing more than 2 % by
weight thereof, with a crystal density greater than 1,8 g/cm3and
having a detonation velocity greater than 8 000 m/s.
1C240 Nickel powder and porous nickel metal, other than those specified
in 0C005, as follows:
a. Nickel powder having both of the following characteristics:
1. A nickel purity content of 99,0 % or greater by weight; and
2. A mean particle size of less than 10 micrometres measured
by American Society for Testing and Materials (ASTM)
B330 standard;
b. Porous nickel metal produced from materials specified in
1C240.a.
Note: 1C240 does not control the following:
a. Filamentary nickel powders;
b. Single porous nickel sheets with an area of 1 000 cm2
per sheet or less.
Technical Note:1C240.b. refers to porous metal formed by compacting and
sintering the materials in 1C240.a. to form a metal material with
fine pores interconnected throughout the structure.
1C350 Chemicals, which may be used as precursors for toxic chemical
agents, as follows, and "chemical mixtures" containing one or
more thereof:
N.B.: SEE ALSO MILITARY GOODS CONTROLS AND
1C450.
1. Thiodiglycol (111-48-8);
2. Phosphorus oxychloride (10025-87-3);
3. Dimethyl methylphosphonate (756-79-6);
4.SEEMILITARYGOODSCONTROLSFOR
Methylphosphonyldifluoride(676-99-3);
5. Methyl phosphonyl dichloride (676-97-1);
6. Dimethyl phosphite (868-85-9);
7. Phosphorus trichloride (7719-12-2);
8. Trimethyl phosphite (121-45-9);
9. Thionyl chloride (7719-09-7);
10. 3-Hydroxy-1-methylpiperidine (3554-74-3);
11. N,N-Diisopropyl-(beta)-aminoethyl chloride (96-79-7);
12. N,N-Diisopropyl-(beta)-aminoethane thiol (5842-07-9);
13. 3-Quinuclidinol (1619-34-7);
14. Potassium fluoride (7789-23-3);
15. 2-Chloroethanol (107-07-3);
16. Dimethylamine (124-40-3);
17. Diethyl ethylphosphonate (78-38-6);
18. Diethyl-N,N-dimethylphosphoramidate (2404-03-7);
19. Diethyl phosphite (762-04-9);2000R1334 — EN — 19.01.2002 — 003.001 — 61
▼M3
20. Dimethylamine hydrochloride (506-59-2);
21. Ethyl phosphinyl dichloride (1498-40-4);
22. Ethyl phosphonyl dichloride (1066-50-8);23.SEEMILITARYGOODSCONTROLSFOR
Ethylphosphonyldifluoride(753-98-0);
24. Hydrogen fluoride (7664-39-3);25. Methyl benzilate (76-89-1);
26. Methyl phosphinyl dichloride (676-83-5);
27. N,N-Diisopropyl-(beta)-amino ethanol (96-80-0);
28. Pinacolyl alcohol (464-07-3);
29.SEEMILITARYGOODSCONTROLSFOR
O-Ethyl-2-diisopropylaminoethyl methyl phosphonite
(57856-11-8);
30. Triethyl phosphite (122-52-1);31. Arsenic trichloride (7784-34-1);
32. Benzilic acid (76-93-7);
33. Diethyl methylphosphonite (15715-41-0);
34. Dimethyl ethylphosphonate (6163-75-3);
35. Ethyl phosphinyl difluoride (430-78-4);36. Methyl phosphinyl difluoride (753-59-3);
37. 3-Quinuclidone (3731-38-2);
38. Phosphorus pentachloride (10026-13-8);39. Pinacolone (75-97-8);
40. Potassium cyanide (151-50-8);
41. Potassium bifluoride (7789-29-9);42. Ammonium hydrogen fluoride (1341-49-7);
43. Sodium fluoride (7681-49-4);
44. Sodium bifluoride (1333-83-1);45. Sodium cyanide (143-33-9);
46. Triethanolamine (102-71-6);
47. Phosphorus pentasulphide (1314-80-3);48. Di-isopropylamine (108-18-9);
49. Diethylaminoethanol (100-37-8);
50. Sodium sulphide (1313-82-2);
51. Sulphur monochloride (10025-67-9);
52. Sulphur dichloride (10545-99-0);53. Triethanolamine hydrochloride (637-39-8);
54. N,N-Diisopropyl-(Beta)-aminoethyl chloride hydrochloride
(4261-68-1).
Note 1: For exports to "States not Party to the Chemical
Weapons Convention", 1C350 does not control
"chemical mixtures" containing one or more of the
chemicals specified in entries 1C350.1, .3, .5, .11, .12,
.13,.17, .18, .21,.22, .26, .27,.28, .31, .32,.33, .34, .35,
.36and .54 in which no individually specified chemical
constitutes more than 10 % by weight of the mixture.
Note 2: For exports to "States Party to the Chemical Weapons
Convention", 1C350 does not control "chemical
mixtures" containing one or more of the chemicals
specified in entries 1C350.1, .3, .5, .11, .12, .13, .17,
.18, .21, .22, .26, .27, .28, .31, .32, .33, .34, .35, .36 and
.54 and in which no individually specified chemical
constitutes more than 30 % by weight of the mixture.
Note 3: 1C350 does not control "chemical mixtures" containing
one or more of the chemicals specified in entries
1C350.2, .6, .7, .8, .9, 10, .14, .15, .16, .19, .20, .24, .25,
.30,.37, .38, .39,.40, .41, .42,.43, .44, .45,.46, .47, .48,
.49, .50, .51, .52 and .53 in which no individually
specified chemical constitutes more than 30 % by
weight of the mixture.2000R1334 — EN — 19.01.2002 — 003.001 — 62
▼M3
Note 4: 1C350 does not control products identified as consumer
goods packaged for retail sale for personal use or
packaged for individual use.
1C351 Human pathogens, zoonoses and "toxins", as follows:
a. Viruses, whether natural, enhanced or modified, either in the
form of "isolated live cultures" or as material including living
material which has been deliberately inoculated or contami-
nated withsuchcultures, as follows:
1. Chikungunya virus;
2. Congo-Crimean haemorrhagic fever virus;
3. Dengue fever virus;
4. Eastern equine encephalitis virus;
5. Ebola virus;
6. Hantaan virus;
7. Junin virus;
8. Lassa fever virus;
9. Lymphocytic choriomeningitis virus;
10. Machupo virus;
11. Marburg virus;
12. Monkey pox virus;
13. Rift Valley fever virus;
14. Tick-borne encephalitis virus (Russian Spring-Summer
encephalitis virus);
15. Variola virus;
16. Venezuelan equine encephalitis virus;
17. Western equine encephalitis virus;
18. White pox;
19. Yellow fever virus;
20. Japanese encephalitis virus;
b. Rickettsiae, whether natural, enhanced or modified, either in
the form of "isolated live cultures" or as material including
living material which has been deliberately inoculated or
contaminated withsuchcultures, as follows:
1. Coxiella burnetii;
2. Bartonella quintana (Rochalimaea quintana, Rickettsia
quintana);
3. Rickettsia prowasecki;
4. Rickettsia rickettsii;
c. Bacteria, whether natural, enhanced or modified, either in the
form of "isolated live cultures" or as material including living
material which has been deliberately inoculated or contami-
nated withsuchcultures, as follows:
1. Bacillus anthracis;
2. Brucella abortus;
3. Brucella melitensis;
4. Brucella suis;
5. Chlamydia psittaci;
6. Clostridium botulinum;
7. Francisella tularensis;
8. Burkholderia mallei (Pseudomonas mallei);
9. Burkholderia pseudomallei (Pseudomonas pseudomallei);
10. Salmonella typhi;
11. Shigella dysenteriae;
12. Vibrio cholerae;
13. Yersinia pestis;
d. "Toxins", as follows, and "sub-unit of toxins" thereof:
1. Botulinum toxins;2000R1334 — EN — 19.01.2002 — 003.001 — 63
▼M3
Note: 1C351.d.1. does not control botulinum toxins in
product form meeting all of the following criteria:
1. Are pharmaceutical formulations designed for
human administration in the treatment of
medical conditions;
2. Are pre-packaged for distribution as medical
products;
3. Are authorised by a State authority to be
marketed as medical products.
2. Clostridium perfringens toxins;3. Conotoxin;4. Ricin;5. Saxitoxin;
6. Shiga toxin;
7. Staphylococcus aureus toxins;8. Tetrodotoxin;9. Verotoxin;
10. Microcystin (Cyanginosin);
11. Aflatoxins
Note: 1C351 does not control "vaccines" or "immunotoxins".
1C352 Animal pathogens, as follows:
a. Viruses, whether natural, enhanced or modified, either in the
form of "isolated live cultures" or as material including living
material which has been deliberately inoculated or contami-
nated withsuchcultures, as follows:
1. African swine fever virus;
2. Avian influenza virus, which are:
a. Uncharacterised; or
b. Defined in Directive 92/40/EEC (OJ L 16, 23.1.1992, p.
19) as having high pathogenicity, as follows:
1. Type A viruses withan IVPI (intravenous path o-
genicity index) in 6-week old chickens of greater
than 1,2; or
2. Type A viruses H5 or H7 subtype for which
nucletide sequencing has demonstrated multiple
basic amino acids at the cleavage site of haemagglu-
tinin;
3. Bluetongue virus;
4. Foot-and-mouthdisease virus;5. Goat pox virus;6. Porcine herpes virus (Aujeszky's disease);7. Swine fever virus (Hog cholera virus);
8. Lyssa virus;
9. Newcastle disease virus;
10. Peste des petits ruminants virus;11. Porcine enterovirus type 9 (swine vesicular disease virus);
12. Rinderpest virus;
13. Sheep pox virus;14. Teschen disease virus;15. Vesicular stomatitis virus;
b. Mycoplasma mycoides, whether natural, enhanced or modified,
either in the form of "isolated live cultures" or as material
including living material which has been deliberately inocu-
lated or contaminated withsuchMycoplasma mycoides.
Note: 1C352 does not control "vaccines".2000R1334 — EN — 19.01.2002 — 003.001 — 64
▼M3
1C353 Genetically-modified "microorganisms", as follows:
a. Genetically modified "microorganisms" or genetic elements
that contain nucleic acid sequences associated with pathogeni-
city of organisms specified in 1C351.a. to c. or 1C352 or
1C354;
b. Genetically modified "microorganisms" or genetic elements
that contain nucleic acid sequences coding for any of the
"toxins" specified in 1C351.d. or "sub-units of toxins" thereof.
1C354 Plant pathogens, as follows:
a. Bacteria, whether natural, enhanced or modified, either in the
form of "isolated live cultures" or as material which has been
deliberately inoculated or contaminated withsuchcultures, as
follows:
1. Xanthomonas albilineans;
2. Xanthomonas campestris pv. citri including strains referred
to as Xanthomonas campestris pv. citri types A,B,C,D,E or
otherwise classified as Xanthomonas citri, Xanthomonas
campestris pv. aurantifolia or Xanthomonas campestris pv.
citrumelo;
b. Fungi, whether natural, enhanced or modified, either in the
form of "isolated live cultures" or as material which has been
deliberately inoculated or contaminated withsuchcultures, as
follows:
1. Colletotrichum coffeanum var. virulans (Colletotrichum
kahawae);
2. Cochliobolus miyabeanus (Helminthosporium oryzae);
3. Microcyclus ulei (syn. Dothidella ulei);
4. Puccinia graminis (syn. Puccinia graminis f. sp. tritici);5. Puccinia striiformis (syn. Puccinia glumarum);6. Magnaporthe grisea (pyricularia grisea/pyricularia oryzae).
1C450 Toxic chemicals and toxic chemical precursors, as follows, and
"chemical mixtures" containing one or more thereof:
N.B.: SEE ALSO ENTRY 1C350, 1C351.d. AND MILI-
TARYGOODSCONTROLS.
a. Toxic chemicals, as follows:
1. Amiton: O,O-Diethyl S-[2-(diethylamino)ethyl] phosphor-
othiolate (78-53-5) and corresponding alkylated or
protonated salts;
2. PFIB: 1,1,3,3,3-Pentafluoro-2-(trifluoromethyl)-1-propene
(382-21-8);
3.SEEMILITARYGOODSCONTROLSFOR
BZ:3-Quinuclidinylbenzilate(6581-06-2);
4. Phosgene: Carbonyl dichloride (75-44-5);
5. Cyanogen chloride (506-77-4);6. Hydrogen cyanide (74-90-8);7. Chloropicrin: Trichloronitromethane (76-06-2);
Note 1: For exports to "States not Party to the Chemical
Weapons Convention", 1C450 does not control
"chemical mixtures" containing one or more ofthe chemicals specified in entries 1C450.a.1 and
.a.2. in which no individually specified chemical
constitutes more than 1 % by weight of the
mixture.
Note 2: For exports to "States Party to the Chemical
Weapons Convention", 1C450 does not control
"chemical mixtures" containing one or more of
the chemicals specified in entries 1C450.a.1. and
.a.2. in which no individually specified chemical
constitutes more than 30 % by weight of the
mixture.
Note 3: 1C450 does not control "chemical mixtures"
containing one ormore of the chemicals specified
in entries 1C450.a.4., .a.5., .a.6. and .a.7. in2000R1334 — EN — 19.01.2002 — 003.001 — 65
▼M3
which no individually specified chemical consti-
tutes more than 30 % by weight of the mixture.
b. Toxic chemical precursors, as follows:
1. Chemicals, other than those specified in the Military Goods
Controls or in 1C350, containing a phosphorus atom to
which is bonded one methyl, ethyl or propyl (normal or iso)
group but not further carbon atoms;
Note: 1C450.b.1 does not control Fonofos: O-Ethyl S-
phenyl ethylphosphonothiolothionate (944-22-9);
2. N,N-Dialkyl [methyl, ethyl or propyl (normal or iso)]
phosphoramidic dihalides;
3. Dialkyl [methyl, ethyl or propyl (normal or iso)]N,N-dialkyl
[methyl, ethyl or propyl (normal or iso)]-phosphoramidates,
other than Diethyl-N,N-dimethylphosphoramidate which is
specified in 1C350;
4. N,N-Dialkyl [methyl, ethyl or propyl (normal or iso)]
aminoethyl-2-chlorides and corresponding protonated salts,
other than N,N-Diisopropyl-(beta)-aminoethyl chloride or
N,N-Diisopropyl-(beta)-aminoethyl chloride hydrochloride
which are specified in 1C350;
5. N,N-Dialkyl [methyl, ethyl or propyl (normal or iso)]
aminoethane-2-ols and corresponding protonated salts, other
than N,N-Diisopropyl-(beta)-aminoethanol (96-80-0) and
N,N-Diethylaminoethanol (100-37-8) which are specified
in 1C350;
Note: 1C450.b.5. does not control the following:
a. N,N-Dimethylaminoethanol (108-01-0) and
corresponding protonated salts;
b. Protonated salts of N,N-Diethylaminoethanol
(100-37-8);
6. N,N-Dialkyl [methyl, ethyl or propyl (normal or iso)]
aminoethane-2-thiols and corresponding protonated salts,
other than N,N-Diisopropyl-(beta)-aminoethane thiol which
is specified in 1C350;
7. Ethyldiethanolamine (139-87-7);8. Methyldiethanolamine (105-59-9).
Note 1: For exports to "States not Party to the Chemical
Weapons Convention", 1C450 does not control
"chemical mixtures" containing one or more of
the chemicals specified in entries 1C450.b.1.,
.b.2., .b.3., .b.4., .b.5. and .b.6. in which no
individually specified chemical constitutes more
than 10 % by weight of the mixture.
Note 2: For exports to "States Party to the Chemical
Weapons Convention", 1C450 does not control
"chemical mixtures" containing one or more of
the chemicals specified in entries 1C450.b.1.,
.b.2., .b.3., .b.4., .b.5. and .b.6. in which no
individually specified chemical constitutes more
than 30 % by weight of the mixture.
Note 3: 1C450 does not control "chemical mixtures"
containing one ormore of the chemicals specified
in entries 1C450.b.7. and .b.8. in which no
individually specified chemical constitutes more
than 30 % by weight of the mixture.
Note 4: 1C450 does not control products identified as
consumer goods packaged for retail sale for
personal use or packaged for individual use.2000R1334 — EN — 19.01.2002 — 003.001 — 66
▼M3
1D Software
1D001 "Software" specially designed or modified for the "development",
"production" or "use" of equipment specified in 1B001 to 1B003.
1D002 "Software" for the "development" of organic "matrix", metal
"matrix" or carbon "matrix" laminates or "composites".
1D101 "Software" specially designed or modified for the "use" of goods
specified in 1B101, 1B102, 1B115, 1B117, 1B118 or 1B119.
1D103 "Software" specially designed for analysis of reduced observables
suchas radar reflectivity, ultraviolet/infrared signatures and
acoustic signatures.
1D201 "Software" specially designed for the "use" of goods specified in
1B201.2000R1334 — EN — 19.01.2002 — 003.001 — 67
▼M3
1E Technology
1E001 "Technology" according to the General Technology Note for the
"development" or "production" of equipment or materials specified
in 1A001.b., 1A001.c., 1A002 to 1A005, 1B or 1C.
1E002 Other "technology", as follows:
a. "Technology" for the "development" or "production" of
polybenzothiazoles or polybenzoxazoles;
b. "Technology" for the "development" or "production" of
fluoroelastomer compounds containing at least one vinylether
monomer;
c. "Technology" for the design or "production" of the following
base materials or non-"composite" ceramic materials:
1. Base materials having all of the following characteristics:
a. Any of the following compositions:
1. Single or complex oxides of zirconium and complex
oxides of silicon or aluminium;
2. Single nitrides of boron (cubic crystalline forms);3. Single or complex carbides of silicon or boron;
or
4. Single or complex nitrides of silicon;
b. Total metallic impurities, excluding intentional additions,
of less than:
1. 1 000 ppm for single oxides or carbides; or
2. 5 000 ppm for complex compounds or single nitrides;
and
c. Being any of the following:
1. Zirconia withan average particle size equal to or less
than 1 µm and no more than 10 % of the particles
larger than 5 µm;
2. Other base materials with an average particle size
equal to or less than 5 µm and no more than 10 % of
the particles larger than 10 µm; or
3. Having all of the following:
a. Platelets witha lengthto th ickness ratio exceeding
5;
b. Whiskers with a length to diameter ratio exceeding
10 for diameters less than 2 µm; and
c. Continuous or chopped fibres less than 10 µm in
diameter;
2. Non-"composite" ceramic materials composed of the
materials described in 1E002.c.1;
Note: 1E002.c.2. does not control "technology" for the
design or production of abrasives.
d. "Technology" for the "production" of aromatic polyamide
fibres;
e. "Technology" for the installation, maintenance or repair of
materials specified in 1C001;
f. "Technology" for the repair of "composite" structures, lami-
nates or materials specified in 1A002, 1C007.c. or 1C007.d.
Note: 1E002.f. does not control "technology" for the repair
of "civil aircraft" structures using carbon "fibrous or
filamentary materials" and epoxy resins, contained in
aircraft manufacturers' manuals.
1E101 "Technology" according to the General Technology Note for the
"use" of goods specified in 1A102, 1B001, 1B101, 1B102, 1B115
to 1B119, 1C001, 1C101, 1C107, 1C111 to 1C117, 1D101 or
1D103.
1E102 "Technology" according to the General Technology Note for
the"development" of "software" specified in 1D001, 1D101 or
1D103.2000R1334 — EN — 19.01.2002 — 003.001 — 68
▼M3
1E103 "Technology" for the regulation of temperature, pressure or
atmosphere in autoclaves or hydroclaves, when used for the
"production" of "composites" or partially processed "composites".
1E104 "Technology" relating to the "production" of pyrolytically derived
materials formed on a mould, mandrel or other substrate from
precursor gases which decompose in the 1573 K (1 300 ºC) to
3 173 K (2 900 ºC) temperature range at pressures of 130 Pa to
20 kPa.
Note: 1E104 includes "technology" for the composition of
precursor gases, flow-rates and process control sche-
dules and parameters.
1E201 "Technology" according to the General Technology Note for the
"use" of goods specified in 1A002, 1A202, 1A225 to 1A227,
1B201, 1B225 to 1B233, 1C002.a.2.c. or d., 1C010.b., 1C202,
1C210, 1C216, 1C225 to 1C240 or 1D201.
1E202 "Technology" according to the General Technology Note for
the"development" or "production" of goods specified in 1A202 or
1A225 to 1A227.
1E203 "Technology" according to the General Technology Note for
the"development" of "software" specified in 1D201.2000R1334 — EN — 19.01.2002 — 003.001 — 69
▼M3
CATEGORY2
MATERIALSPROCESSING2000R1334 — EN — 19.01.2002 — 003.001 — 70
▼M3
2A Systems,EquipmentandComponents
N.B.: For quiet running bearings, see the Military Goods
Controls.
2A001 Anti-friction bearings and bearing systems, as follows, and
components therefor:
Note: 2A001 does not control balls with tolerances specified by
the manufacturer in accordance with ISO 3290 as grade
5 or worse.
a. Ball bearings and solid roller bearings having tolerances
specified by the manufacturer in accordance with ISO 492
Tolerance Class 4 (or ANSI/ABMA Std 20 Tolerance Class
ABEC-7 or RBEC-7, or other national equivalents), or better,
and having rings, balls or rollers made from monel or
beryllium;
Note: 2A001.a. does not control tapered roller bearings.
b. Other ball bearings and solid roller bearings having tolerances
specified by the manufacturer in accordance with ISO 492
Tolerance Class 2 (or ANSI/ABMA Std 20 Tolerance Class
ABEC-9 or RBEC-9, or other national equivalents) or better;
Note: 2A001.b. does not control tapered roller bearings.
c. Active magnetic bearing systems using any of the following:
1. Materials withflux densities of 2,0 T or greater and yield
strengths greater than 414 MPa;
2. All-electromagnetic 3D homopolar bias designs for actua-
tors;or
3. Hightemperature (450 K (177 ºC) and above) position
sensors.
2A225 Crucibles made of materials resistant to liquid actinide metals, as
follows:
a. Crucibles having both of the following characteristics:
1. A volume of between 150 cm3and 8 000 cm3;and
2. Made of or coated withany of th e following materials,
having a purity of 98 % or greater by weight:
a. Calcium fluoride (CaF2);
b. Calcium zirconate (metazirconate) (CaZrO3);
c. Cerium sulphide (Ce2S3);
d. Erbium oxide (erbia) (Er2O3);
e. Hafnium oxide (hafnia) (HfO2);
f. Magnesium oxide (MgO);
g. Nitrided niobium-titanium-tungsten alloy (approximately
50 % Nb, 30 % Ti, 20 % W);
h. Yttrium oxide (yttria) (Y2O3);or
i. Zirconium oxide (zirconia) (ZrO2);
b. Crucibles having both of the following characteristics:
1. A volume of between 50 cm3and 2000 cm3;and
2. Made of or lined withtantalum, h aving a purity of 99,9 % or
greater by weight;
c. Crucibles having all of the following characteristics:
1. A volume of between 50 cm3and 2000 cm3;
2. Made of or lined withtantalum, h aving a purity of 98 % or
greater by weight; and
3. Coated withtantalum carbide, nitride, boride, or any
combination thereof.
2A226 Valves having all of the following characteristics:
a. A 'nominal size' of 5 mm or greater;
b. Having a bellows seal; and2000R1334 — EN — 19.01.2002 — 003.001 — 71
▼M3
c. Wholly made of or lined with aluminium, aluminium alloy,
nickel, or nickel alloy containing more than 60 % nickel by
weight.
Technical Note:
For valves with different inlet and outlet diameters, the 'nominal
size' in 2A226refers to the smallest diameter.2000R1334 — EN — 19.01.2002 — 003.001 — 72
▼M3
2B Test,InspectionandProductionEquipment
Technical Notes:
1. Secondary parallel contouring axes, (e.g., the w-axis on
horizontal boring mills or a secondary rotary axis the centre
line of which is parallel to the primary rotary axis) are not
counted in the total number of contouring axes. Rotary axes
need not rotate over 360º. A rotary axis can be driven by a
linear device (e.g. a screw or a rack-and-pinion).
2. For the purposes of 2B, the number of axes which can be
coordinated simultaneously for "contouring control" is the
number of axes which affect relative movement between any
one workpiece and a tool, cutting head or grinding wheel
which is cutting or removing material from the workpiece.
This does not include any additional axes which affect other
relative movement within the machine. Such axes include:
a. Wheel-dressing systems in grinding machines;
b. Parallel rotary axes designed for mounting of separate
workpieces;
c. Co-linear rotary axes designed for manipulating the same
workpiece by holding it in a chuck from different ends.
3. Axis nomenclature shall be in accordance with International
Standard ISO 841, 'Numerical Control Machines — Axis and
Motion Nomenclature'.
4. For the purposes of 2B001 to 2B009 a "tilting spindle" is
counted as a rotary axis.
5. Stated positioning accuracy levels derived from measure-
ments made according to ISO 230/2 (1988) (1)or national
equivalents may be used for each machine tool model instead
of individual machine tests. Stated positioning accuracy
means the accuracy value provided to the competent
authorities of the Member State in which the exporter is
established as representative of the accuracy of a machinemodel.
Determination of Stated Values
a. Select five machines of a model to be evaluated;
b. Measure the linear axis accuracies according to ISO 230/
2 (1988) (
1);
c. Determine the A-values for each axis of each machine.
The method of calculating the A-value is described in the
ISO standard;
d. Determine the mean value of the A-value of each axis.
This mean value Â becomes the stated value of each axis
for the model (Âx Ây …);
e. Since the Category 2 list refers to each linear axis there
will be as many stated values as there are linear axes;
f. If any axis of a machine model not controlled by 2B001.a.
to 2B001.c. or 2B201 has a stated accuracy Â of 6
microns for grinding machines and 8 microns for milling
and turning machines or better, the manufacturer should
be required to reaffirm the accuracy level once every
eighteen months.
2B001 Machine tools, as follows, and any combination thereof, for
removing (or cutting) metals, ceramics or "composites", which,
according to the manufacturer's technical specification, can be
equipped withelectronic devices for "numerical control":
N.B.: SEEALSO2B201.
Note 1: 2B001 does not control special purpose machine tools
limited to the manufacture of gears. For such machines
see 2B003.2000R1334 — EN — 19.01.2002 — 003.001 — 73
(1) Manufacturers calculating positioning accuracy in accordance withISO 230/2 (1997)
should consult the competent authorities of the Member State in which they are
established.
▼M3
Note 2: 2B001 does not control special purpose machine tools
limited to the manufacture of any of the following parts:
a. Crank shafts or cam shafts;
b. Tools or cutters;
c. Extruder worms;
d. Engraved or faceted jewellery parts.
a. Machine tools for turning, having all of the following
characteristics:
1. Positioning accuracy with"all compensations available"
equal to or less (better) than 6 µm according to ISO 230/2
(1988)(1) or national equivalents along any linear axis; and
2. Two or more axes which can be coordinated simultaneously
for "contouring control";
Note: 2B001.a. does not control turning machines specially
designed for the production of contact lenses.
b. Machine tools for milling, having any of the following
characteristics:
1. Having all of the following:
a. Positioning accuracy with"all compensations available"
equal to or less (better) than 6 µm according to ISO 230/2
(1988) (1) or national equivalents along any linear axis;
and
b. Three linear axes plus one rotary axis which can be
coordinated simultaneously for "contouring control";
2. Five or more axes which can be coordinated simultaneously
for "contouring control"; or
3. A positioning accuracy for jig boring machines, with "all
compensations available", equal to or less (better) than 4 µm
according to ISO 230/2 (1988) (1) or national equivalents
along any linear axis;
4. Fly cutting machines, having all of the following character-
istics:
a. Spindle "run-out" and "camming" less (better) than
0,0004 mm TIR; and
b. Angular deviation of slide movement (yaw, pitchand
roll) less (better) than 2 seconds of arc, TIR over 300 mm
of travel;
c. Machine tools for grinding, having any of the following
characteristics:
1. Having all of the following:
a. Positioning accuracy with"all compensations available"
equal to or less (better) than 4 µm according to ISO 230/2
(1988) (1) or national equivalents along any linear axis;
and
b. Three or more axes which can be coordinated simulta-
neously for "contouring control"; or
2. Five or more axes which can be coordinated simultaneously
for "contouring control";
Note: 2B001.c. does not control grinding machines, as
follows:
1. Cylindrical external, internal, and external-
internal grinding machines having all the following
characteristics:
a. Limited to cylindrical grinding; and
b. Limited to a maximum workpiece capacity of
150 mm outside diameter or length.2000R1334 — EN — 19.01.2002 — 003.001 — 74
(1) Manufacturers calculating positioning accuracy in accordance withISO 230/2 (1997)
should consult the competent authorities of the Member State in which they are
established.
▼M3
2. Machines designed specifically as jig grinders
having any of the following characteristics:
a. The c-axis is used to maintain the grinding
wheel normal to the work surface; or
b. The a-axis is configured to grind barrel cams.
3. Tool or cutter grinding machines limited to the
production of tools or cutters.
4. Crank shaft or cam shaft grinding machines.
5. Surface grinders.
d. Electrical discharge machines (EDM) of the non-wire type
which have two or more rotary axes which can be coordinated
simultaneously for "contouring control";
e. Machine tools for removing metals, ceramics or "composites"
having all of the following characteristics:
1. Removing material by means of any of the following:
a. Water or other liquid jets, including those employing
abrasive additives;
b. Electron beam; or
c. "Laser" beam; and
2. Having two or more rotary axes which:
a. Can be coordinated simultaneously for "contouring
control"; and
b. Have a positioning accuracy of less (better) than 0,003º;
f. Deep-hole-drilling machines and turning machines modified for
deep-hole-drilling, having a maximum depth-of-bore capability
exceeding 5 000 mm and specially designed components
therefor.
2B003 "Numerically controlled" or manual machine tools, and specially
designed components, controls and accessories therefor, specially
designed for the shaving, finishing, grinding or honing of hardened
(Rc = 40 or more) spur, helical and double-helical gears with a
pitchdiameter exceeding 1250 mm and a face widthof 15 % of
pitchdiameter or larger finish ed to a quality of AGMA14 or better
(equivalent to ISO 1328 class 3).
2B004 Hot "isostatic presses", having all of the following, and specially
designed components and accessories therefor:
N.B.: SEEALSO2B104and2B204.
a. A controlled thermal environment within the closed cavity and
a chamber cavity with an inside diameter of 406 mm or more;
and
b. Any of the following:
1. A maximum working pressure exceeding 207 MPa;
2. A controlled thermal environment exceeding 1 773 K
(1 500 ºC); or
3. A facility for hydrocarbon impregnation and removal of
resultant gaseous degradation products.
Technical Note:
The inside chamber dimension is that of the chamber in which both
the working temperature and the working pressure are achieved
anddoes not include fixtures. Thatdimension will be the smaller of
either the inside diameter of the pressure chamber or the inside
diameter of the insulated furnace chamber, depending on which of
the two chambers is located inside the other.
N.B. For specially designed dies, moulds and tooling see
1B003, 9B009 and the Military Goods Controls.
2B005 Equipment specially designed for the deposition, processing and
in-process control of inorganic overlays, coatings and surface
modifications, as follows, for non-electronic substrates, by
processes shown in the Table and associated Notes following2000R1334 — EN — 19.01.2002 — 003.001 — 75
▼M3
2E003.f., and specially designed automated handling, positioning,
manipulation and control components therefor:
a. "Stored programme controlled" chemical vapour deposition
(CVD) production equipment having all of the following:
N.B.: SEEALSO2B105.
1. Process modified for one of the following:
a. Pulsating CVD;
b. Controlled nucleation thermal deposition (CNTD); or
c. Plasma enhanced or plasma assisted CVD; and
2. Any of the following:
a. Incorporating high vacuum (equal to or less than 0,01 Pa)
rotating seals; or
b. Incorporating in situcoating thickness control;
b. "Stored programme controlled" ion implantation production
equipment having beam currents of 5 mA or more;
c. "Stored programme controlled" electron beam physical vapour
deposition (EB-PVD) production equipment incorporating
power systems rated for over 80 kW, having any of the
following:
1. A liquid pool level "laser" control system which regulates
precisely the ingots feed rate; or
2. A computer controlled rate monitor operating on the
principle of photo-luminescence of the ionised atoms in
the evaporant stream to control the deposition rate of a
coating containing two or more elements;
d. "Stored programme controlled" plasma spraying production
equipment having any of the following characteristics:
1. Operating at reduced pressure controlled atmosphere (equal
to or lessthan 10kPa measured above and within 300mm of
the gun nozzle exit) in a vacuum chamber capable of
evacuation down to 0,01 Pa prior to the spraying process; or
2. Incorporating in situcoating thickness control;
e. "Stored programme controlled" sputter deposition production
equipment capable of current densities of 0,1 mA/mm2or
higher at a deposition rate of 15 µm/h or more;
f. "Stored programme controlled" cathodic arc deposition produc-
tion equipment incorporating a grid of electromagnets for
steering control of the arc spot on the cathode;
g. "Stored programme controlled" ion plating production equip-
ment allowing for the in situmeasurement of any of the
following:
1. Coating thickness on the substrate and rate control; or
2. Optical characteristics.
Note: 2B005 does not control chemical vapour deposition,
cathodic arc, sputter deposition, ion plating or ion
implantation equipment specially designed for cutting or
machining tools.
2B006 Dimensional inspection or measuring systems and equipment, as
follows:
a. Computer controlled, "numerically controlled" or "stored
programme controlled" dimensional inspection machines,
having a three dimensional length (volumetric) "measurement
uncertainty" equal to or less (better) than (1,7 + L/1 000) µm (L
is the measured length in mm) tested according to ISO 10360-2;
N.B.: SEEALSO2B206.
b. Linear and angular displacement measuring instruments, as
follows:
1. Linear measuring instruments having any of the following:
a. Non-contact type measuring systems witha "resolution"
equal to or less (better) than 0,2 µm within a measuring
range up to 0,2 mm;2000R1334 — EN — 19.01.2002 — 003.001 — 76
▼M3
b. Linear voltage differential transformer systems having all
of the following characteristics:
1. "Linearity" equal to or less (better) than 0,1 % within
a measuring range up to 5 mm; and
2. Drift equal to or less (better) than 0,1 % per day at a
standard ambient test room temperature ± 1 K; or
c. Measuring systems having all of the following:
1. Containing a "laser"; and
2. Maintaining, for at least 12 hours, over a temperature
range of ± 1 K around a standard temperature and at a
standard pressure, all of the following:
a. A "resolution" over their full scale of 0,1 µm or
less (better); and
b. A "measurement uncertainty" equal to or less
(better) than (0,2 + L/2 000) µm (L is the measured
lengthin mm);
Note: 2B006.b.1. does not control measuring interferom-
eter systems, without closed or open loop feedback,
containing a "laser" to measure slide movement
errors of machine-tools, dimensional inspection
machines or similar equipment.
2. Angular measuring instruments having an angular position
deviation equal to or less (better) than 0,00025º;
Note: 2B006.b.2. does not control optical instruments,
such as autocollimators, using collimated light to
detect angular displacement of a mirror.
c. Equipment for measuring surface irregularities, by measuring
opticalscatterasafunctionofangle,withasensitivityof0,5nm
or less (better).
Note 1: Machine tools which can be used as measuring
machines are controlled if they meet or exceed the
criteria specified for the machine tool function or the
measuring machine function.
Note 2: A machine described in 2B006is controlled if it
exceeds the control threshold anywhere within its
operating range.
2B007 "Robots" having any of the following characteristics and specially
designed controllers and "end-effectors" therefor:
N.B.: SEEALSO2B207.
a. Capable in real time of full three-dimensional image processing
or full three-dimensional 'scene analysis' to generate or modify
"programmes" or to generate or modify numerical programme
data;
Technical Note:
The 'scene analysis' limitation does not include approximation
of the third dimension by viewing at a given angle, or limited
grey scale interpretation for the perception of depth or texture
for the approved tasks (2½ D).
b. Specially designed to comply withnational safety standards
applicable to explosive munitions environments;
c. Specially designed or rated as radiation-hardened to withstand a
total radiation dose greater than 5 × 103Gy (silicon) without
operational degradation; or
Technical Note:
The term Gy (silicon) refers to the energy in Joules per
kilogram absorbed by an unshielded silicon sample when
exposed to ionising radiation.
d. Specially designed to operate at altitudes exceeding 30000 m.
2B008 Assemblies or units, specially designed for machine tools, or
dimensional inspection or measuring systems and equipment, asfollows:
a. Linear position feedback units (e.g., inductive type devices,
graduated scales, infrared systems or "laser" systems)2000R1334 — EN — 19.01.2002 — 003.001 — 77
▼M3
having an overall "accuracy" less (better) than
(800 + (600 × L × 10−3)) nm (L equals the effective length
in mm);
N.B.: For "laser" systems see also Note to 2B006.b.1.
b. Rotary position feedback units (e.g., inductive type devices,
graduated scales, infrared systems or "laser" systems) having an
"accuracy" less (better) than 0,00025º;
N.B.: For "laser" systems see also Note to 2B006.b.1.
c. "Compound rotary tables" and "tilting spindles", capable of
upgrading, according to the manufacturer's specifications,
machine tools to or above the levels specified in 2B.
2B009 Spin-forming machines and flow-forming machines, which,
according to the manufacturer's technical specification, can be
equipped with"numerical control" units or a computer control and
having all of the following:
N.B.: SEEALSO2B109AND2B209.
a. Two or more controlled axes of which at least two can be
coordinated simultaneously for "contouring control"; and
b. A roller force more than 60 kN.
Technical Note:
Machines combining the function of spin-forming and flow-
forming are for the purpose of 2B009 regarded as flow-forming
machines.
2B104 "Isostatic presses", other than those specified in 2B004, having all
of the following:
N.B.: SEEALSO2B204.
a. Maximum working pressure of 69 MPa or greater;
b. Designed to achieve and maintain a controlled thermal
environment of 873 K (600 ºC) or greater; and
c. Possessinga chamber cavity withan inside diameter of 254 mm
or greater.
2B105 CVD furnaces, other than those specified in 2B005.a., designed or
modified for the densification of carbon-carbon composites.
2B109 Flow-forming machines, other than those specified in 2B009, and
specially designed components as follows:
N.B.: SEEALSO2B209.
a. Flow-forming machines having all of the following:
1. According to the manufacturer's technical specification, can
be equipped with"numerical control" units or a computer
control, even when not equipped with such units; and
2. With more than two axes which can be coordinated
simultaneously for "contouring control".
b. Specially designed components for flow-forming machines
specified in 2B009 or 2B109.a.
Note: 2B109 does not control machines that are not usable in
the production of propulsion components and equipment
(e.g. motor cases) for systems specified in 9A005,
9A007.a. or 9A105.a.
Technical Note:
Machines combining the function of spin-forming and flow-
forming are for the purpose of 2B109 regarded as flow-forming
machines.
2B116 Vibration test systems, equipment and components therefor, as
follows:
a. Vibration test systems employing feedback or closed loop
techniques and incorporating a digital controller, capable of
vibrating a system at 10 g rms or more over the entire range
20 Hz to 2 000 Hz and imparting forces of 50 kN, measured
'bare table', or greater;
b. Digital controllers, combined withspecially designed vibration
test software, with a "real-time bandwidth" greater than 5 kHz2000R1334 — EN — 19.01.2002 — 003.001 — 78
▼M3
designed for use withvibration test systems specified in
2B116.a.;
c. Vibration thrusters (shaker units), with or without associated
amplifiers, capable of imparting a force of 50 kN, measured
'bare table', or greater and usable in vibration test systems
specified in 2B116.a.;
d. Test piece support structures and electronic units designed to
combine multiple shaker units in a system capable of providing
an effective combined force of 50 kN, measured 'bare table', or
greater, and usable in vibration systems specified in 2B116.a.
Technical Note:
In 2B116, 'bare table' means a flat table, or surface, with no
fixture or fittings.
2B117 Equipment and process controls, other than those specified in
2B004, 2B005.a., 2B104 or 2B105, designed or modified for
densification and pyrolysis of structural composite rocket nozzles
and reentry vehicle nose tips.
2B119 Balancing machines and related equipment, as follows:
N.B.: SEEALSO2B219.
a. Balancing machines having all the following characteristics:
1. Not capable of balancing rotors/assemblies having a mass
greater than 3 kg;
2. Capable of balancing rotors/assemblies at speeds greater
than 12500 rpm;
3. Capable of correcting unbalance in two planes or more; and
4. Capable of balancing to a residual specific unbalance of
0,2 g mm per kg of rotor mass;
Note: 2B119.a. does not control balancing machines
designed or modified for dental or other medical
equipment.
b. Indicator heads designed or modified for use with machines
specified in 2B119.a.
Technical Note:
Indicator heads are sometimes known as balancing instrumen-
tation.
2B120 Motion simulators or rate tables having all of the following
characteristics:
a. Two axes or more;
b. Slip rings capable of transmitting electrical power and/or signal
information; and
c. Having any of the following characteristics:
1. For any single axis having all of the following:
a. Capable of rates of 400 degrees/s or more, or 30 degrees/
s or less; and
b. A rate resolution equal to or less than 6 degrees/s and an
accuracy equal to or less than 0,6 degrees/s;
2. Having a worst-case rate stability equal to or better (less)
than plus or minus 0,05 % averaged over 10 degrees or
more;or
3. A positioning accuracy equal to or better than 5 arc second.
Note: 2B120 does not control rotary tables designed or
modified for machine tools or for medical equipment.
For controls on machine tool rotary tables see 2B008.
2B121 Positioning tables (equipment capable of precise rotary positioning
in any axes), other than those specified in 2B120, having all the
following characteristics:
a. Two axes or more; and
b. A positioning accuracy equal to or better than 5 arc second.
Note: 2B121 does not control rotary tables designed or
modified for machine tools or for medical equipment.
For controls on machine tool rotary tables see 2B008.2000R1334 — EN — 19.01.2002 — 003.001 — 79
▼M3
2B122 Centrifuges capable of imparting accelerations above 100 g and
having slip rings capable of transmitting electrical power and
signal information.
2B201 Machine tools, other than those specified in 2B001, as follows, for
removing or cutting metals, ceramics or "composites", which,
according to the manufacturer's technical specification, can be
equipped withelectronic devices for simultaneous "contouring
control" in two or more axes:
a. Machine tools for milling, having any of the following
characteristics:
1. Positioning accuracies with"all compensations available"
equal to or less (better) than 6 µm according to ISO 230/2
(1988)(1) or national equivalents along any linear axis; or
2. Two or more contouring rotary axes;
Note: 2B201.a. does not control milling machines having
the following characteristics:
a. X-axis travel greater than 2 m; and
b. Overall positioning accuracy on the x-axis more
(worse) than 30 µm.
b. Machine tools for grinding, having any of the following
characteristics:
1. Positioning accuracies with"all compensations available"
equal to or less (better) than 4 µm according to ISO 230/2
(1988) (1) or national equivalents along any linear axis; or
2. Two or more contouring rotary axes.
Note: 2B201.b. does not control the following grinding
machines:
a. Cylindrical external, internal, and external-
internal grinding machines having all of the
following characteristics:
1. Limited to cylindrical grinding;
2. A maximum workpiece outside diameter or
length of 150 mm;
3. Not more than two axes that can be coordinated
simultaneously for "contouring control"; and
4. No contouring c axis;
b. Jig grinderswith axes limited to x, y, c and a where
c axis is used to maintain the grinding wheel
normal to the work surface, and the a axis is
configured to grind barrel cams;
c. Tool or cutter grinding machines with "software"
specially designed for the production of tools or
cutters;or
d. Crankshaft or camshaft grinding machines.
2B204 "Isostatic presses", other than those specified in 2B004 or 2B104,
and related equipment, as follows:
a. "Isostatic presses" having both of the following characteristics:
1. Capable of achieving a maximum working pressure of
69 MPa or greater; and
2. A chamber cavity with an inside diameter in excess of
152 mm;
b. Dies, moulds and controls, specially designed for "isostatic
presses" specified in 2B204.a.
Technical Note:
In 2B204 the inside chamber dimension is that of the chamber in
which both the working temperature and the working pressure are
achieved and does not include fixtures. That dimension will be the
smaller of either the inside diameter of the pressure chamber or2000R1334 — EN — 19.01.2002 — 003.001 — 80
(1) Manufacturers calculating positioning accuracy in accordance withISO 230/2 (1997)
should consult the competent authorities of the Member State in which they are
established.
▼M3
the inside diameter of the insulated furnace chamber, depending
on which of the two chambers is located inside the other.
2B206 Dimensional inspection machines, instruments or systems, other
than those specified in 2B006, as follows:
a. Computer controlled or numericaly controlled dimensional
inspection machines having both of the following character-
istics:
1. Two or more axes; and
2. A one-dimensional length"measurement uncertainty" equal
to or less (better) than (1,25 + L/1 000) µm tested with a
probe of an "accuracy" of less (better) than 0,2 µm (L is the
measured lengthin millimeters) (Ref.:VDI/VDE 2617 Parts
1 and 2);
b. Systems for simultaneously linear-angular inspection of hemi-
shells, having both of the following characteristics:
1. "Measurement uncertainty" along any linear axis equal to or
less (better) than 3,5 µm per 5 mm; and
2. "Angular position deviation" equal to or less than 0,02º.
Note 1: Machine tools that can be used as measuring machines
are controlled if they meet or exceed the criteria
specified for the machine tool function or the
measuring machine function.
Note 2: A machine specified in 2B206is controlled if it exceeds
the control threshold anywhere within its operating
range.
Technical Notes:
1. The probe used in determining the measurement uncertainty
of a dimensional inspection systemshall be described in VDI/
VDE 2617 parts 2, 3 and 4.
2. All parameters of measurement values in 2B206represent
plus/minus i.e., not total band.
2B207 "Robots", "end-effectors" and control units, other than those
specified in 2B007, as follows:
a. "Robots" or "end-effectors" specially designed to comply with
national safety standards applicable to handling high explosives
(for example, meeting electrical code ratings for high
explosives);
b. Control units specially designed for any of the "robots" or "end-
effectors" specified in 2B207.a.
2B209 Flow forming machines, spin forming machines capable of flow
forming functions, other than those specified in 2B009 or 2B109,
and mandrels, as follows:
a. Machines having both of the following characteristics:
1. Three or more rollers (active or guiding); and
2. Which, according to the manufacturer's technical specifica-
tion, can be equipped with"numerical control" units or a
computer control;
b. Rotor-forming mandrels designed to form cylindrical rotors of
inside diameter between 75 mm and 400 mm.
Note: 2B209.a. includes machines which have only a single
roller designed to deform metal plus two auxiliary rollers
which support the mandrel, but do not participate
directly in the deformation process.
2B219 Centrifugal multiplane balancing machines, fixed or portable,
horizontal or vertical, as follows:
a. Centrifugal balancing machines designed for balancing flexible
rotors having a length of 600 mm or more and having all of the
following characteristics:
1. Swing or journal diameter greater than 75 mm;
2. Mass capability of from 0,9 to 23 kg; and
3. Capable of balancing speed of revolution greater than 5 000
r.p.m.;2000R1334 — EN — 19.01.2002 — 003.001 — 81
▼M3
b. Centrifugal balancing machines designed for balancing hollow
cylindrical rotor components and having all of the following
characteristics:
1. Journal diameter greater than 75 mm;
2. Mass capability of from 0,9 to 23 kg;
3. Capable of balancing to a residual imbalance equal to or less
than 0,01 kg × mm/kg per plane; and
4. Belt drive type.
2B225 Remote manipulators that can be used to provide remote actions in
radiochemical separation operations or hot cells, having either of
the following characteristics:
a. A capability of penetrating 0,6 m or more of hot cell wall
(through-the-wall operation); or
b. A capability of bridging over the top of a hot cell wall with a
thickness of 0,6 m or more (over-the-wall operation).
Technical Note:
Remote manipulators provide translation of human operator
actions to a remote operating arm and terminal fixture. They
may be of 'master/slave' type or operated by joystick or keypad.
2B226 Controlled atmosphere (vacuum or inert gas) induction furnaces,
and power supplies therefor, as follows:
N.B: SEEALSO3B.
a. Furnaces having all of the following characteristics:
1. Capable of operation above 1 123 K (850 ºC);
2. Induction coils 600 mm or less in diameter; and
3. Designed for power inputs of 5 kW or more;
b. Power supplies, witha specified power output of 5 kW or more,
specially designed for furnaces specified in 2B226.a.
Note: 2B226.a. does not control furnaces designed for the
processing of semiconductor wafers.
2B227 Vacuum or other controlled atmosphere metallurgical melting and
casting furnaces and related equipment as follows:
a. Arc remelt and casting furnaces having both of the following
characteristics:
1. Consumable electrode capacities between 1 000 cm3and
20000 cm3,and
2. Capable of operating withmelting temperatures above
1 973 K (1 700 ºC);
b. Electron beam melting furnaces and plasma atomisation and
melting furnaces, having both of the following characteristics:
1. A power of 50 kW or greater; and
2. Capable of operating withmelting temperatures above
1 473 K (1 200 ºC).
c. Computer control and monitoring systems specially configured
for any of the furnaces specified in 2B227.a. or b.
2B228 Rotor fabrication or assembly equipment, rotor straightening
equipment, bellows-forming mandrels and dies, as follows:
a. Rotor assembly equipment for assembly of gas centrifuge rotor
tube sections, baffles, and end caps;
Note: 2B228.a. includes precision mandrels, clamps, and
shrink fit machines.
b. Rotor straightening equipment for alignment of gas centrifuge
rotor tube sections to a common axis;
Technical Note:
In 2B228.b. such equipment normally consists of precision
measuring probes linked to a computer that subsequently
controls the action of, for example, pneumatic rams used for
aligning the rotor tube sections.2000R1334 — EN — 19.01.2002 — 003.001 — 82
▼M3
c. Bellows-forming mandrels and dies for producing single-
convolution bellows.
Technical Note:
In 2B228.c. the bellows have all of the following character-
istics:
1. Inside diameter between 75 mm and 400 mm;
2. Length equal to or greater than 12,7 mm;
3. Single convolution depth greater than 2 mm; and
4. Made of high-strength aluminium alloys, maraging steel or
high strength "fibrous or filamentary materials".
2B230 "Pressure transducers" capable of measuring absolute pressures at
any point in the range 0 to 13 kPa and having both of the following
characteristics:
a. Pressure sensing elements made of or protected by aluminium,
aluminium alloy, nickel or nickel alloy withmore th an 60 %
nickel by weight; and
b. Having either of the following characteristics:
1. A full scale of less than 13 kPa and an 'accuracy' of better
than ± 1 % of full-scale; or
2. A full scale of 13 kPa or greater and an 'accuracy' of better
than ± 130 Pa.
Technical Note:
For the purposes of 2B230, 'accuracy' includes non-linearity,
hysteresis and repeatability at ambient temperature.
2B231 Vacuum pumps having all of the following characteristics:
a. Input throat size equal to or greater than 380 mm;
b. Pumping speed equal to or greater than 15 m3/s;and
c. Capable of producing an ultimate vacuum better than 13 mPa.
Technical Notes:
1. The pumping speed is determined at the measurement point
with nitrogen gas or air.
2. The ultimate vacuum is determined at the input of the pump
with the input of the pump blocked off.
2B232 Multistage light gas guns or other high-velocity gun systems (coil,
electromagnetic, and electrothermal types, and other advanced
systems) capable of accelerating projectiles to 2 km/s or greater.
2B350 Chemical manufacturing facilities and equipment, as follows:
a. Reaction vessels or reactors, withor with out agitators, with
total internal (geometric) volume greater than 0,1m3(100litres)
and less than 20 m3(20000 litres), where all surfaces that come
in direct contact with the chemical(s) being processed or
contained are made from any of the following materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;
2. Fluoropolymers;
3. Glass (including vitrified or enamelled coating or glass
lining);
4. Nickel or alloys with more than 40 % nickel by weight;
5. Tantalum or tantalum alloys;
6. Titanium or titanium alloys; or
7. Zirconium or zirconium alloys;
b. Agitators for use in reaction vessels or reactors where all
surfaces of the agitator that come in direct contact with the
chemical(s) being processed or contained are made from any of
the following materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;
2. Fluoropolymers;2000R1334 — EN — 19.01.2002 — 003.001 — 83
▼M3
3. Glass (including vitrified or enamelled coatings or glass
lining);
4. Nickel or alloys with more than 40 % nickel by weight;5. Tantalum or tantalum alloys;6. Titanium or titanium alloys;
or
7. Zirconium or zirconium alloys;
c. Storage tanks, containers or receivers witha total internal
(geometric) volume greater than 0,1 m3(100 litres) where all
surfaces that come in direct contact with the chemical(s) being
processed or contained are made from any of the following
materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;
2. Fluoropolymers;3. Glass (including vitrified or enamelled coatings or glass
lining);
4. Nickel or alloys with more than 40 % nickel by weight;5. Tantalum or tantalum alloys;6. Titanium or titanium alloys;
or
7. Zirconium or zirconium alloys;
d. Heat exchangers or condensers with a heat transfer surface area
greater than 0,15 m2, and less than 20 m2, where all surfaces
that come in direct contact with the chemical(s) being
processed are made from any of the following materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;
2. Fluoropolymers;
3. Glass (including vitrified or enamelled coatings or glass
lining);
4. Graphite or 'carbon graphite';5. Nickel or alloys with more than 40 % nickel by weight;
6. Tantalum or tantalum alloys;
7. Titanium or titanium alloys;8. Zirconium or zirconium alloys;9. Silicon carbide;
or
10. Titanium carbide;
e. Distillation or absorption columns of internal diameter greater
than 0,1 m, where all surfaces that come in direct contact with
the chemical(s) being processed are made from any of the
following materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;
2. Fluoropolymers;3. Glass (including vitrified or enamelled coatings or glass
lining);
4. Graphite or 'carbon graphite';5. Nickel or alloys with more than 40 % nickel by weight;6. Tantalum or tantalum alloys;
7. Titanium or titanium alloys;
or
8. Zirconium or zirconium alloys;
f. Remotely operated filling equipment in which all surfaces that
come in direct contact with the chemical(s) being processed are
made from any of the following materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;or
2. Nickel or alloys with more than 40 % nickel by weight;
g. Multiple seal valves incorporating a leak detection port,
bellows-seal valves, non-return (check) valves or diaphragm
valves, in whichall surfaces that come in direct contact withthe2000R1334 — EN — 19.01.2002 — 003.001 — 84
▼M3
chemical(s) being processed or contained are made from any of
the following materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;
2. Fluoropolymers;
3. Glass (including vitrified or enamelled coatings or glass
lining);
4. Nickel or alloys with more than 40 % nickel by weight;
5. Tantalum or tantalum alloys;
6. Titanium or titanium alloys; or
7. Zirconium or zirconium alloys;
h. Multi-walled piping incorporating a leak detection port, in
which all surfaces that come in direct contact with the
chemical(s) being processed or contained are made from any
of the following materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;
2. Fluoropolymers;
3. Glass (including vitrified or enamelled coatings or glass
lining);
4. Graphite or 'carbon graphite';
5. Nickel or alloys with more than 40 % nickel by weight;
6. Tantalum or tantalum alloys;7. Titanium or titanium alloys;
or
8. Zirconium or zirconium alloys;
i. Multiple-seal, canned drive, magnetic drive, bellows or
diaphragm pumps, with manufacturer's specified maximum
flow-rate greater than 0,6 m3/hour, or vacuum pumps with
manufacturer's specified maximum flow-rate greater than 5 m3/
hour (under standard temperature (273 K (0 ºC)) and pressure
(101,3 kPa) conditions), in which all surfaces that come in
direct contact with the chemical(s) being processed are made
from any of the following materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;
2. Ceramics;
3. Ferrosilicon;
4. Fluoropolymers;5. Glass (including vitrified or enamelled coatings or glass
lining);
6. Graphite or 'carbon graphite';
7. Nickel or alloys with more than 40 % nickel by weight;
8. Tantalum or tantalum alloys;
9. Titanium or titanium alloys;
or
10. Zirconium or zirconium alloys;
j. Incinerators designed to destroy chemicals specified in entry
1C350, having specially designed waste supply systems, special
handling facilities and an average combustion chamber
temperature greater than 1 273 K (1 000 ºC), in which all
surfaces in the waste supply system that come into direct
contact withth e waste products are made from or lined with
any of the following materials:
1. Alloys with more than 25 % nickel and 20 % chromium by
weight;
2. Ceramics; or
3. Nickel or alloys with more than 40 % nickel by weight.
Technical Note:
'Carbon graphite' is a composition of amorphous carbon and
graphite, in which the graphite content is 8 % or more by
weight.2000R1334 — EN — 19.01.2002 — 003.001 — 85
▼M3
2B351 Toxic gas monitoring systems, as follows; and dedicated detectors
therefor:
a. Designed for continuous operation and usable for the detection
of chemical warfare agents or chemicals specified in 1C350, at
concentrations of less than 0,3 mg/m3;or
b. Designed for the detection of cholinesterase-inhibiting activity.
2B352 Equipment capable of use in handling biological materials, as
follows:
a. Complete biological containment facilities at P3, P4 contain-
ment level;
Technical Note:
P3 orP4 (BL3,BL4,L3,L4)containment levels areasspecified
in the WHO Laboratory Biosafety manual (Geneva, 1983).
b. Fermenters capable of cultivation of pathogenic "microorgan-
isms", viruses or capable of toxin production, without the
propagation of aerosols,and havinga total capacity of 100litres
or more;
Technical Note:
Fermenters include bioreactors, chemostats and continuous-
flow systems.
c. Centrifugal separators, capable of continuous separation
without the propagation of aerosols, having all the following
characteristics:
1. Flow rate exceeding 100 litres per hour;
2. Components of polished stainless steel or titanium;
3. One or more sealing joints within the steam containment
area;and
4. Capable of in-situ steam sterilisation in a closed state;
Technical Note:
Centrifugal separators include decanters.
d. Cross (tangential) flow filtration equipment, capable of
continuous separation without the propagation of aerosols,
having both of the following characteristics:
1. Equal to or greater than 5 m2;and
2. Capable of in-situ sterilisation;
e. Steam sterilisable freeze drying equipment witha condenser
capacity exceeding 50 kg of ice in 24 hours and less than
1 000 kg of ice in 24 hours;
f. Equipment that incorporates or is contained in P3 or P4
containment housing, as follows:
1. Independently ventilated protective full or half suits;
2. Class III biological safety cabinets or isolators withsimilar
performance standards;
Note: In 2B352.f.2., isolators include flexible isolators,
dry boxes, anaerobic chambers, glove boxes and
laminar flow hoods.
g. Chambers designed for aerosol challenge testing with "micro-
organisms" or "toxins" and having a capacity of 1 m3or greater.2000R1334 — EN — 19.01.2002 — 003.001 — 86
▼M3
2C Materials
None.2000R1334 — EN — 19.01.2002 — 003.001 — 87
▼M3
2D Software
2D001 "Software", other than that specified in 2D002, specially designed
or modified for the "development", "production" or "use" of
equipment specified in 2A001or 2B001 to 2B009.
2D002 "Software" for electronic devices, even when residing in an
electronic device or system, enabling suchdevices or systems to
function as a "numerical control" unit, capable of coordinating
simultaneously more than four axes for "contouring control".
Note: 2D002 does not control "software" specially designed or
modified for the operation of machine tools not specified
in Category 2.
2D101 "Software" specially designed or modified for the "use" of
equipment specified in 2B104, 2B105, 2B109, 2B116, 2B117 or
2B119 to 2B122.
N.B.: SEEALSO9D004.
2D201 "Software" specially designed for the "use" of equipment specified
in 2B204, 2B206, 2B207, 2B209, 2B219 or 2B227.
2D202 "Software" specially designed or modified for the "development",
"production" or "use" of equipment specified in 2B201.2000R1334 — EN — 19.01.2002 — 003.001 — 88
▼M3
2E Technology
2E001 "Technology" according to the General Technology Note for the
"development" of equipment or "software" specified in 2A, 2B or
2D.
2E002 "Technology" according to the General Technology Note for the
"production" of equipment specified in 2A or 2B.
2E003 Other "technology", as follows:
a. "Technology" for the "development" of interactive graphics as
an integrated part in "numerical control" unitsfor preparation or
modification of part programmes;
b. "Technology" for metal-working manufacturing processes, as
follows:
1. "Technology" for the design of tools, dies or fixtures
specially designed for any of the following processes:
a. "Superplastic forming";
b. "Diffusion bonding"; or
c. "Direct-acting hydraulic pressing";
2. Technical data consisting of process methods or parameters
as listed below used to control:
a. "Superplastic forming" of aluminium alloys, titanium
alloys or "superalloys":
1. Surface preparation;
2. Strain rate;
3. Temperature;
4. Pressure;
b. "Diffusion bonding" of "superalloys" or titanium alloys:
1. Surface preparation;
2. Temperature;
3. Pressure;
c. "Direct-acting hydraulic pressing" of aluminium alloys or
titanium alloys:
1. Pressure;
2. Cycle time;
d. "Hot isostatic densification" of titanium alloys, alumi-
nium alloys or "superalloys":
1. Temperature;
2. Pressure;
3. Cycle time;
c. "Technology" for the "development" or "production" of
hydraulic stretch-forming machines and dies therefor, for the
manufacture of airframe structures;
d. "Technology" for the "development" of generators of machine
tool instructions (e.g., part programmes) from design data
residing inside "numerical control" units;
e. "Technology" for the "development" of integration "software"
for incorporation of expert systems for advanced decision
support of shop floor operations into "numerical control" units;
f. "Technology" for the application of inorganic overlay coatings
or inorganic surface modification coatings (specified in column
3 of the following table) to non-electronic substrates (specified
in column 2 of the following table), by processes specified in
column 1 of the following table and defined in the Technical
Note.
Note: The table and Technical Note appear after entry
2E301.
2E101 "Technology" according to the General Technology Note for the
"use" of equipment or "software" specified in 2B004, 2B009,
2B104, 2B109, 2B116, 2B119 to 2B122 or 2D101.
2E201 "Technology" according to the General Technology Note for the
"use" of equipment or "software" specified in 2A225, 2A226,2000R1334 — EN — 19.01.2002 — 003.001 — 89
▼M3
2B001, 2B006, 2B007.b., 2B007.c., 2B008, 2B009, 2B201,
2B204, 2B206, 2B207, 2B209, 2B225 to 2B232, 2D201 or 2D202.
2E301 "Technology" according to the General Technology Note for the
"use" of goods specified in 2B350 to 2B352.2000R1334 — EN — 19.01.2002 — 003.001 — 90
▼M3
Table
Depositiontechniques
1. Coating Process (1) (*) 2. Substrate 3. Resultant Coating
A. Chemical Vapour Deposition
(CVD)"Superalloys" Aluminides for internal passages
Ceramics (19) and Low-
expansion glasses (14)Silicides
CarbidesDielectric layers (15)Diamond
Diamond-like carbon (17)
Carbon-carbon, Ceramic and
Metal "matrix" "composites"Silicides
Carbides
Refractory metals
Mixtures thereof (4)Dielectric layers (15)
Aluminides
Alloyed aluminides (2)Boron nitride
Cemented tungsten carbide
(16), Silicon carbide (18)Carbides
TungstenMixtures thereof (4)Dielectric layers (15)
Molybdenum and Molyb-
denum alloysDielectric layers (15)
Beryllium and Beryllium
alloysDielectric layers (15)
DiamondDiamond-like carbon (17)
Sensor window materials (9) Dielectric layers (15)
DiamondDiamond-like carbon (17)2000R1334 — EN — 19.01.2002 — 003.001 — 91
▼M3
1. Coating Process (1) (*) 2. Substrate 3. Resultant Coating
B.Thermal-Evaporation Physical
Vapour Deposition (TE-PVD)
B.1. Physical Vapour Deposi-
tion (PVD): Electron-Beam
(EB-PVD)"Superalloys" Alloyed silicides
Alloyed aluminides (2)MCrAlX (5)
Modified zirconia (12)
SilicidesAluminides
Mixtures thereof (4)
Ceramics (19) and Low-
expansion glasses (14)Dielectric layers (15)
Corrosion resistant steel (7) MCrAlX (5)
Modified zirconia (12)
Mixtures thereof (4)
Carbon-carbon, Ceramic and
Metal "matrix" "composites"Silicides
Carbides
Refractory metals
Mixtures thereof (4)Dielectric layers (15)Boron nitride
Cemented tungsten carbide
(16), Silicon carbide (18)Carbides
Tungsten
Mixtures thereof (4)
Dielectric layers (15)
Molybdenum and Molyb-
denum alloysDielectric layers (15)
Beryllium and Beryllium
alloysDielectric layers (15)
Borides
Beryllium
Sensor window materials (9) Dielectric layers (15)
Titanium alloys (13) Borides
Nitrides
B.2. Ion assisted resistive
heating Physical Vapour
Deposition (PVD) (Ion Plating)Ceramics (19) and Low-
expansion glasses (14)Dielectric layers (15)
Diamond-like carbon (17)
Carbon-carbon, Ceramic and
Metal "matrix" "composites"Dielectric layers (15)
Cemented tungsten carbide
(16), Silicon carbideDielectric layers (15)
Molybdenum and Molyb-
denum alloysDielectric layers (15)
Beryllium and Beryllium
alloysDielectric layers (15)
Sensor window materials (9) Dielectric layers (15)
Diamond-like carbon (17)2000R1334 — EN — 19.01.2002 — 003.001 — 92
▼M3
1. Coating Process (1) (*) 2. Substrate 3. Resultant Coating
B.3. Physical Vapour Deposi-
tion (PVD): "Laser"
VaporisationCeramics (19) and Low-
expansion glasses (14)Silicides
Dielectric layers (15)Diamond-like carbon (17)
Carbon-carbon, Ceramic and
Metal "matrix" "composites"Dielectric layers (15)
Cemented tungsten carbide
(16), Silicon carbideDielectric layers (15)
Molybdenum and Molyb-
denum alloysDielectric layers (15)
Beryllium and Beryllium
alloysDielectric layers (15)
Sensor window materials (9) Dielectric layers (15)
Diamond-like carbon
B.4. Physical Vapour Deposi-
tion (PVD): Cathodic Arc
Discharge"Superalloys" Alloyed silicides
Alloyed aluminides (2)
MCrAlX (5)
Polymers (11) and Organic
"matrix" "composites"Borides
Carbides
NitridesDiamond-like carbon (17)
C. Pack cementation (see A
above for out-of-pack cementa-
tion) (10)Carbon-carbon, Ceramic and
Metal "matrix" "composites"Silicides
CarbidesMixtures thereof (4)
Titanium alloys (13) Silicides
AluminidesAlloyed aluminides (2)
Refractory metals and alloys
(8)Silicides
Oxides2000R1334 — EN — 19.01.2002 — 003.001 — 93
▼M3
1. Coating Process (1) (*) 2. Substrate 3. Resultant Coating
D. Plasma spraying "Superalloys" MCrAlX (5)
Modified zirconia (12)Mixtures thereof (4)
Abradable Nickel-Graphite
Abradable materialscontaining Ni-Cr-Al
Abradable Al-Si-Polyester
Alloyed aluminides (2)
Aluminium alloys (6) MCrAlX (5)
Modified zirconia (12)
SilicidesMixtures thereof (4)
Refractory metals and alloys
(8)Aluminides
SilicidesCarbides
Corrosion resistant steel (7) MCrAlX (5)
Modified zirconia (12)Mixtures thereof (4)
Titanium alloys (13) Carbides
AluminidesSilicides
Alloyed aluminides (2)
Abradable Nickel-GraphiteAbradable materialscontaining Ni-Cr-Al
Abradable Al-Si-Polyester
E. Slurry Deposition Refractory metals and alloys
(8)Fused silicides
Fused aluminides except for
resistance heating elements
Carbon-carbon, Ceramic and
Metal "matrix" "composites"Silicides
Carbides
Mixtures thereof (4)2000R1334 — EN — 19.01.2002 — 003.001 — 94
▼M3
1. Coating Process (1) (*) 2. Substrate 3. Resultant Coating
F. Sputter Deposition "Superalloys" Alloyed silicides
Alloyed aluminides (2)Noble metal modified alumi-
nides (3)
MCrAlX (5)
Modified zirconia (12)
PlatinumMixtures thereof (4)
Ceramics and Low-expansion
glasses (14)Silicides
PlatinumMixtures thereof (4)Dielectic layers (15)
Diamond-like carbon (17)
Titanium alloys (13) Borides
Nitrides
Oxides
SilicidesAluminides
Alloyed aluminides (2)
Carbides
Carbon-carbon, Ceramic and
Metal "matrix" "composites"Silicides
Carbides
Refractory metalsMixtures thereof (4)Dielectric layers (15)
Boron nitride
Cemented tungsten carbide
(16), Silicon carbide (18)Carbides
Tungsten
Mixtures thereof (4)
Dielectric layers (15)Boron nitride
Molybdenum and Molyb-
denum alloysDielectric layers (15)
Beryllium and Beryllium
alloysBorides
Dielectric layers (15)Beryllium
Sensor window materials (9) Dielectric layers (15)
Diamond-like carbon (17)
Refractory metals and alloys
(8)Aluminides
SilicidesOxidesCarbides
G. Ion Implantation Hightemperature bearing
steelsAdditions of Chromium,
Tantalum or Niobium (Colum-
bium)
Titanium alloys (13) Borides
Nitrides
Beryllium and Beryllium
alloysBorides
Cemented tungsten carbide
(16)Carbides
Nitrides2000R1334 — EN — 19.01.2002 — 003.001 — 95
▼M3
Notes
1. The term 'coating process' includes coating repair and refurbishing as well as original coating.
2. The term 'alloyed aluminide coating' includes single or multiple-step coatings in which an element
or elements are deposited prior to or during application of the aluminide coating, even if these
elements are deposited by another coating process. It does not, however, include the multiple use of
single-step pack cementation processes to achieve alloyed aluminides.
3. The term 'noble metal modified aluminide' coating includes multiple-step coatings in which the
noble metal or noble metals are laid down by some other coating process prior to application of the
aluminide coating.
4. The term 'mixtures thereof' includes infiltrated material, graded compositions, co-deposits and
multilayer deposits and are obtained by one or more of the coating processes specified in the Table.
5. 'MCrAlX' refers to a coating alloy where M equals cobalt, iron, nickel or combinations thereof and
X equals hafnium, yttrium, silicon, tantalum in any amount or other intentional additions over 0,01
weight percent in various proportions and combinations, except:
a. CoCrAlY coatings which contain less than 22 weight percent of chromium, less than 7 weight
percent of aluminium and less than 2 weight percent of yttrium;
b. CoCrAlY coatings which contain 22 to 24 weight percent of chromium, 10 to 12 weight percent
of aluminium and 0,5 to 0,7 weight percent of yttrium; or
c. NiCrAlY coatings which contain 21 to 23 weight percent of chromium, 10 to 12 weight percent
of aluminium and 0,9 to1,1 weight percent of yttrium.
6. The term 'aluminium alloys' refers to alloys having an ultimate tensile strength of 190 MPa or more
measured at 293 K (20 ºC).
7. The term 'corrosion resistant steel' refers to AISI (American Iron and Steel Institute) 300 series or
equivalent national standard steels.
8. 'Refractory metals and alloys' include the following metals and their alloys: niobium (columbium),
molybdenum, tungsten and tantalum.
9. 'Sensor window materials', as follows: alumina, silicon, germanium, zinc sulphide, zinc selenide,
gallium arsenide, diamond, gallium phosphide, sapphire and the following metal halides: sensor
window materials of more than 40 mm diameter for zirconium fluoride and hafnium fluoride.
10. 'Technology' for single-step pack cementation of solid airfoils is not controlled by Category 2.
11. 'Polymers', as follows: polyimide, polyester, polysulphide, polycarbonates and polyurethanes.
12. 'Modified zirconia' refers to additions of other metal oxides (e.g., calcia, magnesia, yttria, hafnia,
rare earth oxides) to zirconia in order to stabilise certain crystallographic phases and phase
compositions. Thermal barrier coatings made of zirconia, modified with calcia or magnesia by
mixing or fusion, are not controlled.
13. 'Titanium alloys' refers only to aerospace alloys having an ultimate tensile strength of 900 MPa or
more measured at 293 K (20 ºC).
14. 'Low-expansion glasses' refers to glasses which have a coefficient of thermal expansion of 1 × 10−7
K−1or less measured at 293 K (20 ºC).
15. 'Dielectric layers' are coatings constructed of multi-layers of insulator materials in which the
interference properties of a design composed of materials of various refractive indices are used to
reflect, transmit or absorb various wavelengthbands. Dielectric layers refers to more th an four
dielectric layers or dielectric/metal "composite" layers.
16. 'Cemented tungsten carbide' does not include cutting and forming tool materials consisting of
tungsten carbide/(cobalt, nickel), titanium carbide/(cobalt, nickel), chromium carbide/nickel-
chromium and chromium carbide/nickel.
17. 'Technology' specially designed to deposit diamond-like carbon on any of the following is not
controlled:
magnetic disk drives and heads, equipment for the manufacture of disposables, valves for faucets,
acoustic diaphragms for speakers, engine parts for automobiles, cutting tools, punching-pressing
dies, office automation equipment, microphones or medical devices.
18. 'Silicon carbide' does not include cutting and forming tool materials.
19. Ceramic substrates, as used in this entry, does not include ceramic materials containing 5 % by
weight, or greater, clay or cement content, either as separate constituents or in combination.
Processes specified in Column 1 of the Table are defined as follows:
a. Chemical Vapour Deposition (CVD) is an overlay coating or surface modification coating process
wherein a metal, alloy, "composite", dielectric or ceramic is deposited upon a heated substrate.
Gaseous reactants are decomposed or combined in the vicinity of a substrate resulting in the2000R1334 — EN — 19.01.2002 — 003.001 — 96
▼M3
deposition of the desired elemental, alloy or compound material on the substrate. Energy for this
decomposition or chemical reaction process may be provided by the heat of the substrate, a glow
discharge plasma, or "laser" irradiation.
N.B.1 CVD includes the following processes: directed gas flow out-of-pack deposition, pulsating
CVD, controlled nucleation thermal deposition (CNTD), plasma enhanced or plasma
assisted CVD processes.
N.B.2 Pack denotes a substrate immersed in a powder mixture.
N.B.3 The gaseous reactants used in the out-of-pack process are produced using the same basic
reactions and parameters as the pack cementation process, except that the substrate to be
coated is not in contact with the powder mixture.
b. Thermal Evaporation-Physical Vapour Deposition (TE-PVD) is an overlay coating process
conducted in a vacuum with a pressure less than 0,1 Pa wherein a source of thermal energy is
used to vaporise the coating material. This process results in the condensation, or deposition, of the
evaporated species onto appropriately positioned substrates.
The addition of gases to the vacuum chamber during the coating process to synthesise compound
coatings is an ordinary modification of the process.
The use of ion or electron beams, or plasma, to activate or assist the coating's deposition is also a
common modification in this technique. The use of monitors to provide in-process measurement of
optical characteristics and thickness of coatings can be a feature of these processes.
Specific TE-PVD processes are as follows:1. Electron Beam PVD uses an electron beam to heat and evaporate the material which forms the
coating;
2. Ion Assisted Resistive Heating PVD employs electrically resistive heating sources in combination
withimpinging ion beam(s) to produce a controlled and uniform flux of evaporated coating
species;
3. "Laser" Vaporisation uses either pulsed or continuous wave "laser" beams to vaporise the material
which forms the coating;
4. Cathodic Arc Deposition employs a consumable cathode of the material which forms the coating
and has an arc discharge established on the surface by a momentary contact of a ground trigger.
Controlled motion of arcing erodes the cathode surface creating a highly ionised plasma. The
anode can be either a cone attached to the periphery of the cathode, through an insulator, or the
chamber. Substrate biasing is used for non line-of-sight deposition.
N.B. This definition does not include random cathodic arc deposition with non-biased
substrates.
5. Ion Plating is a special modification of a general TE-PVD process in which a plasma or an ion
source is used to ionise the species to be deposited, and a negative bias is applied to the substrate
in order to facilitate the extraction of the species from the plasma. The introduction of reactive
species, evaporation of solids within the process chamber, and the use of monitors to provide in-
process measurement of optical characteristics and thicknesses of coatings are ordinary
modifications of the process.
c. Pack Cementation is a surface modification coating or overlay coating process wherein a substrate is
immersed in a powder mixture (a pack), that consists of:
1. The metallic powders that are to be deposited (usually aluminium, chromium, silicon or
combinations thereof);
2. An activator (normally a halide salt); and3. An inert powder, most frequently alumina.The substrate and powder mixture is contained within a retort which is heated to between 1 030 K
(757 ºC) and 1 375 K (1 102 ºC) for sufficient time to deposit the coating.
d. Plasma Spraying is an overlay coating process wherein a gun (spray torch) which produces and
controls a plasma accepts powder or wire coating materials, melts them and propels them towards a
substrate, whereon an integrally bonded coating is formed. Plasma spraying constitutes either low
pressure plasma spraying or high velocity plasma spraying.
N.B.1 Low pressure means less than ambient atmospheric pressure.
N.B.2 High velocity refers to nozzle-exit gas velocity exceeding 750 m/s calculated at 293 K
(20 ºC) at 0,1 MPa.
e. Slurry Deposition is a surface modification coating or overlay coating process wherein a metallic or
ceramic powder withan organic binder is suspended in a liquid and is applied to a substrate by eith er
spraying, dipping or painting, subsequent air or oven drying, and heat treatment to obtain the desired
coating.
f. Sputter Deposition is an overlay coating process based on a momentum transfer phenomenon,
wherein positive ions are accelerated by an electric field towards the surface of a target (coating2000R1334 — EN — 19.01.2002 — 003.001 — 97
▼M3
material). The kinetic energy of the impacting ions is sufficient to cause target surface atoms to be
released and deposited on an appropriately positioned substrate.
N.B.1 The Table refers only to triode, magnetron or reactive sputter deposition which is used to
increase adhesion of the coating and rate of deposition and to radio frequency (RF)
augmented sputter deposition used to permit vaporisation of non-metallic coating
materials.
N.B.2 Low-energy ion beams (less than 5 keV) can be used to activate the deposition.
g. Ion Implantation is a surface modification coating process in which the element to be alloyed is
ionised, accelerated through a potential gradient and implanted into the surface region of the
substrate. This includes processes in which ion implantation is performed simultaneously with
electron beam physical vapour deposition or sputter deposition.
(*) The numbers in parentheses refer to the Notes following this Table.2000R1334 — EN — 19.01.2002 — 003.001 — 98
▼M3
CATEGORY3
ELECTRONICS2000R1334 — EN — 19.01.2002 — 003.001 — 99
▼M3
3A Systems,EquipmentandComponents
Note 1: The control status of equipment and components
described in 3A001 or 3A002, other than those
described in 3A001.a.3. to 3A001.a.10. or
3A001.a.12., which are specially designed for or which
have the same functional characteristics as other
equipment is determined by the control status of the
other equipment.
Note 2: The control status of integrated circuits described in
3A001.a.3. to 3A001.a.9. or 3A001.a.12. which are
unalterably programmed or designed for a specific
function for another equipment is determined by the
control status of the other equipment.
N.B.: When the manufacturer or applicant cannot
determine the control status of the other
equipment, the control status of the integrated
circuits is determined in 3A001.a.3. to
3A001.a.9. and 3A001.a.12. If the integrated
circuit is a silicon-based "microcomputer
microcircuit" or microcontroller microcircuit
described in 3A001.a.3. having an operand
(data) word length of 8 bit or less, the control
status of the integrated circuit is determined in
3A001.a.3.
3A001 Electronic components, as follows:
a. General purpose integrated circuits, as follows:
Note 1: The control status of wafers (finished or unfinished),
in which the function has been determined, is to be
evaluated against the parameters of 3A001.a.
Note 2: Integrated circuits include the following types:
— "Monolithic integrated circuits";
— "Hybrid integrated circuits";
— "Multichip integrated circuits";
— "Film type integrated circuits", including
silicon-on-sapphire integrated circuits;
— "Optical integrated circuits".
1. Integrated circuits, designed or rated as radiation hardened
to withstand any of the following:
a. A total dose of 5 × 103Gy (silicon) or higher; or
b. A dose rate upset of 5 × 106Gy (silicon)/s or higher;
2. "Microprocessor microcircuits", "microcomputer microcir-
cuits", microcontroller microcircuits, storage integrated
circuits manufactured from a compound semiconductor,
analogue-to-digital converters, digital-to-analogue conver-
ters, electro-optical or "optical integrated circuits" designed
for "signal processing", field programmable logic devices,
neural network integrated circuits, custom integrated
circuits for which either the function is unknown or the
control status of the equipment in which the integrated
circuit will be used is unknown, Fast Fourier Transform
(FFT) processors, electrical erasable programmable read-
only memories (EEPROMs), flashmemories or static
random-access memories (SRAMs), having any of the
following:
a. Rated for operation at an ambient temperature above
398 K (125 ºC);
b. Rated for operation at an ambient temperature below
218 K (− 55 ºC); or
c. Rated for operation over the entire ambient temperature
range from 218 K (− 55 ºC) to 398 K (125 ºC);
Note: 3A001.a.2. does not apply to integrated circuits
for civil automobiles or railway train applica-
tions.
3. "Microprocessor microcircuits", "micro-computer micro-
circuits" and microcontroller microcircuits, having any of
the following characteristics:2000R1334 — EN — 19.01.2002 — 003.001 — 100
▼M3
Note: 3A001.a.3. includes digital signal processors,
digital array processors and digital coprocessors.
a. A "composite theoretical performance" ("CTP") of
6 500 million theoretical operations per second (Mtops)
or more and an arithmetic logic unit with an access
widthof 32 bit or more;
b. Manufactured from a compound semiconductor and
operating at a clock frequency exceeding 40 MHz; or
c. More than one data or instruction bus or serial
communication port that provides a direct external
interconnection between parallel "microprocessor
microcircuits" witha transfer rate exceeding
150 Mbyte/s;
4. Storage integrated circuits manufactured from a compound
semiconductor;
5. Analogue-to-digital and digital-to-analogue converter inte-
grated circuits, as follows:
a. Analogue-to-digital converters having any of the
following:
N.B. SEEALSO3A101.
1. A resolution of 8 bit or more, but less than 12 bit,
witha "total conversion time" of less th an 5 ns;
2. A resolution of 12 bit witha 'total conversion time'
of less than 200 ns; or
3. A resolution of more than 12 bit with a 'total
conversion time' of less than 2 µs;
b. Digital-to-analogue converterswitharesolutionof12bit
or more, and a "settling time" of less than 10 ns;
Technical Notes:
1. A resolution of n bits corresponds to a quantisation of
2nlevels.
2. 'Total conversion time' is the inverse of sample rate.
6. Electro-optical and "optical integrated circuits" designed
for "signal processing" having all of the following:
a. One or more than one internal "laser" diode;
b. One or more than one internal light detecting element;
and
c. Optical waveguides;
7. Field programmable logic devices having any of the
following:
a. An equivalent usable gate count of more than 30000 (2
input gates);
b. A typical "basic gate propagation delay time" of less
than 0,4 ns; or
c. A toggle frequency exceeding 133 MHz;
Note: 3A001.a.7. includes:
— Simple Programmable Logic Devices (SPLDs)
— CPLDs (Complex Programmable Logic
Devices),
— FPGAs (Field Programmable Gate Arrays),
— FPLAs (Field Programmable Logic Arrays),
— FPICs (Field Programmable Interconnects).
N.B.: Field programmable logic devices are
also known as field programmable gate
or field programmable logic arrays.
8. Not used;9. Neural network integrated circuits;
10. Custom integrated circuits for which the function is
unknown, or the control status of the equipment in which2000R1334 — EN — 19.01.2002 — 003.001 — 101
▼M3
the integrated circuits will be used is unknown to the
manufacturer, having any of the following:
a. More than 1 000 terminals;
b. A typical "basic gate propagation delay time" of less
than 0,1 ns; or
c. An operating frequency exceeding 3 GHz;
11. Digital integrated circuits, other than those described in
3A001.a.3 to 3A001.a.10. and 3A001.a.12., based upon any
compound semiconductor and having any of the following:
a. An equivalent gate count of more than 3 000 (2 input
gates);or
b. A toggle frequency exceeding 1,2 GHz;
12. Fast Fourier Transform (FFT) processors having a rated
execution time for an N-point complex FFT of less than (N
log2N)/20480 ms, where N is the number of points;
Technical Note:
When N is equal to 1 024 points, the formula in
3A001.a.12. gives an execution time of 500 µs.
b. Microwave or millimetre wave components, as follows:
1. Electronic vacuum tubes and cathodes, as follows:
Note: 3A001.b.1. does not control tubes designed or
rated for operation in any frequency band which
meets all of the following characteristics:
a. Does not exceed 31 GHz; and
b. Is "allocated by the ITU" for radio-communica-
tions services, but not for radio-determination.
a. Travelling wave tubes, pulsed or continuous wave, as
follows:
1. Operating at frequencies exceeding 31 GHz;
2. Having a cathode heater element with a turn on time
to rated RF power of less than 3 seconds;
3. Coupled cavity tubes, or derivatives thereof, with
"fractional bandwidth" of more than 7 % or a peak
power exceeding 2,5 kW;
4. Helix tubes, or derivatives thereof, with any of the
following characteristics:
a. An "instantaneous bandwidth" of more than one
octave, and average power (expressed in kW) times
frequency (expressed in GHz) of more than 0,5;
b. An "instantaneous bandwidth" of one octave or
less, and average power (expressed in kW) times
frequency (expressed in GHz) of more than 1; or
c. Being "space qualified";
b. Crossed-field amplifier tubes witha gain of more th an
17 dB;
c. Impregnated cathodes designed for electronic tubes
producing a continuous emission current density at rated
operating conditions exceeding 5 A/cm2;
2. Microwave integrated circuits or modules having all of the
following:
a. Containing "monolithic integrated circuits" having one or
more active circuit elements; and
b. Operating at frequencies exceeding 3 GHz;
Note 1: 3A001.b.2. does not control circuits or modules
for equipment designed or rated for operation in
any frequency band which meets all of the
following characteristics:
a. Does not exceed 31 GHz; and
b. Is "allocated by the ITU" for radio-commu-
nications services, but not for radio-
determination.2000R1334 — EN — 19.01.2002 — 003.001 — 102
▼M3
Note 2: 3A001.b.2. does not control broadcast satellite
equipment designed or rated to operate in the
frequency range of 40,5 GHz to 42,5 GHz.
3. Microwave transistors rated for operation at frequencies
exceeding 31 GHz;
4. Microwave solid state amplifiers, having any of the
following:
a. Operating frequencies exceeding 10,5 GHz and an
"instantaneous bandwidth" of more than half an octave;
or
b. Operating frequencies exceeding 31 GHz;
5. Electronically or magnetically tunable band-pass or band-
stop filters having more than 5 tunable resonators capable of
tuning across a 1,5:1 frequency band (fmax/fmin) in less than
10 µs having any of the following:
a. A band-pass bandwidthof more th an 0,5 % of centre
frequency; or
b. A band-stop bandwidthof less th an 0,5 % of centre
frequency;
6. Microwave assemblies capable of operating at frequencies
exceeding 31 GHz;
7. Mixers and converters designed to extend the frequency
range of equipment described in 3A002.c., 3A002.e. or
3A002.f. beyond the limits stated therein;
8. Microwave power amplifiers containing tubes specified in
3A001.b. and having all of the following:
a. Operating frequencies above 3 GHz;
b. An average output power density exceeding 80 W/kg;
and
c. A volume of less than 400 cm3;
Note: 3A001.b.8. does not control equipment designed or
rated for operation in any frequency band which is
"allocated by the ITU" for radio-communications
services, but not for radio-determination.
c. Acoustic wave devices, as follows, and specially designed
components therefor:
1. Surface acoustic wave and surface skimming (shallow bulk)
acoustic wave devices (i.e., "signal processing" devices
employing elastic waves in materials), having any of the
following:
a. A carrier frequency exceeding 2,5 GHz;
b. A carrier frequency exceeding 1 GHz, but not exceeding
2,5 GHz, and having any of the following:
1. A frequency side-lobe rejection exceeding 55 dB;
2. A product of the maximum delay time and the
bandwidth(time in µsand bandwidthin MHz)of more
than 100;
3. A bandwidthgreater th an 250 MHz; or
4. A dispersive delay of more than 10 µs; or
c. A carrier frequency of 1 GHz or less, having any of the
following:
1. A product of the maximum delay time and the
bandwidth(time in µsand bandwidthin MHz)of more
than 100;
2. A dispersive delay of more than 10 µs; or
3. A frequency side-lobe rejection exceeding 55 dB and
a bandwidthgreater th an 50 MHz;
2. Bulk (volume) acoustic wave devices (i.e., "signal proces-
sing" devices employing elastic waves) which permit the
direct processing of signals at frequencies exceeding 1 GHz;
3. Acoustic-optic "signal processing" devices employing inter-
action between acoustic waves (bulk wave or surface wave)
and light waves which permit the direct processing of2000R1334 — EN — 19.01.2002 — 003.001 — 103
▼M3
signals or images, including spectral analysis, correlation or
convolution;
d. Electronic devices and circuits containing components, manu-
factured from "superconductive" materials specially designed
for operation at temperatures below the "critical temperature"
of at least one of the "superconductive" constituents, with any
of the following:
1. Current switching for digital circuits using "superconduc-
tive" gates witha product of delay time per gate (in seconds)
and power dissipation per gate (in watts) of less than 10−14J;
or
2. Frequency selection at all frequencies using resonant circuits
withQ-values exceeding 10000;
e. Highenergy devices, as follows:
1. Batteries and photovoltaic arrays, as follows:
Note: 3A001.e.1. does not control batteries with volumes
equal to or less than 27 cm3(e.g., standard C-cells
or R14 batteries).
a. Primary cells and batteries having an 'energy density'
exceeding 480 Wh/kg and rated for operation in the
temperature range from below 243 K (− 30 ºC) to above
343 K (70 ºC);
b. Rechargeable cells and batteries having an 'energy
density' exceeding 150 Wh/kg after 75 charge/discharge
cycles at a discharge current equal to C/5 hours (C being
the nominal capacity in ampere hours) when operating in
the temperature range from below 253 K (− 20 ºC) to
above 333 K (60 ºC);
Technical Note:
'Energy density' is obtained by multiplying the average
power in watts (average voltage in volts times average
current in amperes) by the duration of the discharge in
hours to 75 % of the open circuit voltage divided by the
total mass of the cell (or battery) in kg.
c. "Space qualified" and radiation hardened photovoltaic
arrays witha specific power exceeding 160 W/m2at an
operating temperature of 301 K (28 ºC) under a tungsten
illumination of 1 kW/m2at 2800 K (2 527 ºC);
2. Highenergy storage capacitors, as follows:
N.B.: SEEALSO3A201.a.
a. Capacitors witha repetition rate of less th an 10 Hz
(single shot capacitors) having all of the following:
1. A voltage rating equal to or more than 5 kV;
2. An energy density equal to or more than 250 J/kg; and
3. A total energy equal to or more than 25 kJ;
b. Capacitors witha repetition rate of 10 Hz or more
(repetition rated capacitors) having all of the following:
1. A voltage rating equal to or more than 5 kV;
2. An energy density equal to or more than 50 J/kg;3. A total energy equal to or more than 100 J;
and
4. A charge/discharge cycle life equal to or more than
10000;
3. "Superconductive" electromagnets and solenoids specially
designed to be fully charged or discharged in less than one
second, having all of the following:
N.B.: SEEALSO3A201.b.
Note: 3A001.e.3. does not control "superconductive"
electromagnets or solenoids specially designed
for Magnetic Resonance Imaging (MRI) medical
equipment.
a. Energy delivered during the discharge exceeding 10 kJ in
the first second;2000R1334 — EN — 19.01.2002 — 003.001 — 104
▼M3
b. Inner diameter of the current carrying windings of more
than 250 mm; and
c. Rated for a magnetic induction of more than 8 T or
"overall current density" in the winding of more than
300 A/mm2;
f. Rotary input type shaft absolute position encoders having any
of the following:
1. A resolution of better than 1 part in 265 000 (18 bit
resolution) of full scale; or
2. An accuracy better than ± 2,5 seconds of arc.
3A002 General purpose electronic equipment, as follows:
a. Recording equipment, as follows, and specially designed test
tape therefor:
1. Analogue instrumentation magnetic tape recorders,
including those permitting the recording of digital signals
(e.g. using a high density digital recording (HDDR)
module), having any of the following:
a. A bandwidthexceeding 4 MHz per electronic ch annel or
track;
b. A bandwidthexceeding 2 MHz per electronic ch annel or
track and having more than 42 tracks; or
c. A time displacement (base) error, measured in accor-
dance withapplicable IRIG or EIA documents, of less
than ± 0,1 µs;
Note: Analogue magnetic tape recorders specially
designed for civilian video purposes are not
considered to be instrumentation tape recorders.
2. Digital video magnetic tape recorders having a maximum
digital interface transfer rate exceeding 360 Mbit/s;
Note: 3A002.a.2. does not control digital video magnetic
tape recorders specially designed for television
recording using a signal format, which may include
a compressed signal format, standardised or
recommended by the ITU, the IEC, the SMPTE,
the EBU or the IEEE for civil television applica-
tions.
3. Digital instrumentation magnetic tape data recorders
employing helical scan techniques or fixed head techniques,
having any of the following:
a. A maximum digital interface transfer rate exceeding
175 Mbit/s; or
b. Being "space qualified";
Note: 3A002.a.3. does not control analogue magnetic
tape recorders equipped with HDDR conversion
electronics and configured to record only digital
data.
4. Equipment, having a maximum digital interface transfer rate
exceeding 175 Mbit/s, designed to convert digital video
magnetic tape recorders for use as digital instrumentation
data recorders;
5. Waveform digitisers and transient recorders having all of the
following:
a. Digitising rates equal to or more than 200 million
samples per second and a resolution of 10 bits or more;
and
b. A continuous throughput of 2 Gbit/s or more;
Technical Note:
For those instruments with a parallel bus architecture, the
continuous throughput rate is the highest word rate
multiplied by the number of bits in a word.
Continuous throughput is the fastest data rate the instrument
can output to mass storage without the loss of any
information whilst sustaining the sampling rate and
analogue-to-digital conversion.2000R1334 — EN — 19.01.2002 — 003.001 — 105
▼M3
b. "Frequency synthesiser" "electronic assemblies" having a
"frequency switching time" from one selected frequency to
another of less than 1 ms;
c. "Signal analysers", as follows:
1. "Signal analysers" capable of analysing frequencies
exceeding 31 GHz;
2. "Dynamic signal analysers" having a "real-time bandwidth"
exceeding 500 kHz;
Note: 3A002.c.2. does not control those "dynamic signal
analysers" using only constant percentage band-
width filters (also known as octave or fractional
octave filters).
d. Frequency synthesised signal generators producing output
frequencies, the accuracy and short term and long term stability
of which are controlled, derived from or disciplined by the
internal master frequency, and having any of the following:
1. A maximum synthesised frequency exceeding 31 GHz;
2. A "frequency switching time" from one selected frequency
to another of less than 1 ms; or
3. A single sideband (SSB) phase noise better than − (126 + 20
log10F − 20 log10f) in dBc/Hz, where F is the off-set from the
operating frequency in Hzand f is the operating frequency in
MHz;
Note: 3A002.d. does not control equipment in which the
output frequency is either produced by the addition or
subtraction of two or more crystal oscillator frequen-
cies, or by an addition or subtraction followed by a
multiplication of the result.
e. Network analysers witha maximum operating frequency
exceeding 40 GHz;
f. Microwave test receivers having all of the following:
1. A maximum operating frequency exceeding 40 GHz; and
2. Being capable of measuring amplitude and phase simulta-
neously;
g. Atomic frequency standards having any of the following:
1. Long-term stability (aging) less (better) than 1 × 10−1 1/
month;or
2. Being "space qualified".
Note: 3A002.g.1. does not control non-"space qualified"
rubidium standards.
3A101 Electronic equipment, devices and components, other than those
specified in 3A001, as follows:
a. Analog-to-digital converters, usable in "missiles", designed to
meet military specifications for ruggedised equipment;
b. Accelerators capable of delivering electromagnetic radiation
produced by bremsstrahlung from accelerated electrons of
2 MeV or greater, and systems containing those accelerators.
Note: 3A101.b. above does not specify equipment specially
designed for medical purposes.
3A201 Electronic components, other than those specified in 3A001, as
follows;
a. Capacitors having either of the following sets of characteristics:
1. a. Voltage rating greater than 1,4 kV;
b. Energy storage greater than 10 J;
c. Capacitance greater than 0,5 µF; and
d. Series inductance less than 50 nH; or
2. a. Voltage rating greater than 750 V;
b. Capacitance greater than 0,25 µF; and
c. Series inductance less than 10 nH;2000R1334 — EN — 19.01.2002 — 003.001 — 106
▼M3
b. Superconducting solenoidal electromagnets having all of the
following characteristics:
1. Capable of creating magnetic fields greater than 2 T;
2 A ratio of lengthto inner diameter greater th an 2;
3. Inner diameter greater than 300 mm; and
4. Magnetic field uniform to better than 1 % over the central
50 % of the inner volume;
Note: 3A201.b. does not control magnets specially designed
for and exported 'as parts of' medical nuclear
magnetic resonance (NMR) imaging systems. The
phrase 'as part of' does not necessarily mean physical
part in the same shipment; separate shipments from
different sources are allowed, provided the related
export documents clearly specify that the shipments
are dispatched 'as part of' the imaging systems.
c. FlashX-ray generators or pulsed electron accelerators h aving
either of the following sets of characteristics:
1. a. An accelerator peak electron energy of 500 keV or
greater but less than 25 MeV; and
b. Witha 'figure of merit' (K) of 0,25 or greater; or
2. a. An accelerator peak electron energy of 25 MeV or
greater;and
b. A 'peak power' greater than 50 MW.
Note: 3A201.c. does not control accelerators that are
component parts of devices designed for purposes
other than electron beam or X-ray radiation (electron
microscopy, for example) nor those designed for
medical purposes:
Technical Notes:
1. The 'figure of merit' K is defined as:
K = 1,7 × 103V2,65Q
V is the peak electron energy in million electron volts.
If the accelerator beam pulse duration is less than or equal
to 1 µs, then Q is the total accelerated charge in Coulombs.
If the accelerator beam pulse duration is greater than 1 µs,
then Q is the maximum accelerated charge in 1 µs.
Q equals the integral of i with respect to t, over the lesser of
1 µs or the time duration of the beam pulse (Q = ∫idt),
where i is beam current in amperes and t is time in seconds.
2. 'Peak power' = (peak potential in volts) × (peak beam
current in amperes).
3. In machines based on microwave accelerating cavities, the
time duration of the beam pulse is the lesser of 1 µs or the
duration of the bunched beam packet resulting from one
microwave modulator pulse.
4. In machines based on microwave accelerating cavities, the
peak beam current is the average current in the time
duration of a bunched beam packet.
3A225 Frequency changers or generators, other than those specified in
0B001.b.13., having all of the following characteristics:
a. Multiphase output capable of providing a power of 40 W or
greater;
b. Capable of operating in the frequency range between 600 and
2 000 Hz;
c. Total harmonic distortion better (less) than 10 %; and
d. Frequency control better (less) than 0,1 %.
Technical Note:
Frequency changers in 3A225 are also known as converters or
inverters.2000R1334 — EN — 19.01.2002 — 003.001 — 107
▼M3
3A226 High-power direct current power supplies, other than those
specified in 0B001.j.6., having both of the following character-
istics:
a. Capable of continuously producing, over a time period of 8
hours, 100 V or greater with current output of 500 A or greater;
and
b. Current or voltage stability better than 0,1 % over a time period
of 8 hours.
3A227 High-voltage direct current power supplies, other than those
specified in 0B001.j.5., having both of the following character-
istics:
a. Capable of continuously producing, over a time period of 8
hours, 20 kV or greater with current output of 1 A or greater;
and
b. Current or voltage stability better than 0,1 % over a time period
of 8 hours.
3A228 Switching devices, as follows:
a. Cold-cathode tubes, whether gas filled or not, operating
similarly to a spark gap, having all of the following
characteristics:
1. Containing three or more electrodes;
2. Anode peak voltage rating of 2,5 kV or more;3. Anode peak current rating of 100 A or more;
and
4. Anode delay time of 10 µs or less;
Note: 3A228 includes gas krytron tubes and vacuum
sprytron tubes.
b. Triggered spark-gaps having both of the following character-
istics:
1. An anode delay time of 15 µs or less; and
2. Rated for a peak current of 500 A or more;
c. Modules or assemblies with a fast switching function having all
of the following characteristics:
1. Anode peak voltage rating greater than 2 kV;
2. Anode peak current rating of 500 A or more; and
3. Turn-on time of 1 µs or less.
3A229 Firing sets and equivalent high-current pulse generators as follows:
N.B.: SEEALSOMILITARYGOODSCONTROLS.
a. Explosive detonator firing sets designed to drive multiple
controlled detonators specified in 3A232;
b. Modular electrical pulse generators (pulsers) having all of the
following characteristics:
1. Designed for portable, mobile, or ruggedised-use;
2. Enclosed in a dust-tight enclosure;
3. Capable of delivering their energy in less than 15 µs;
4. Having an output greater than 100 A;5. Having a 'rise time' of less than 10 µs into loads of less than
40 ohms;
6. No dimension greater than 254 mm;7. Weight less than 25 kg;
and
8. Specified for use over an extended temperature range 223 K
(− 50 ºC) to 373 K (100 ºC) or specified as suitable for
aerospace applications.
Note: 3A229.b. includes xenon flash-lamp drivers.
Technical Note:
In 3A229.b.5. 'rise time' is defined as the time interval from
10 % to 90 % current amplitude when driving a resistive load.2000R1334 — EN — 19.01.2002 — 003.001 — 108
▼M3
3A230 High-speed pulse generators having both of the following
characteristics:
a. Output voltage greater than 6 V into a resistive load of less than
55 ohms, and
b. 'Pulse transition time' less than 500 ps.
Technical Note:In 3A230, 'pulse transition time' is defined as the time interval
between 10 % and 90 % voltage amplitude.
3A231 Neutron generator systems, including tubes, having both of the
following characteristics:
a. Designed for operation without an external vacuum system;
and
b. Utilising electrostatic acceleration to induce a tritium-
deuterium nuclear reaction.
3A232 Detonators and multipoint initiation systems, as follows:
N.B.: SEEALSOMILITARYGOODSCONTROLS.
a. Electrically driven explosive detonators, as follows:
1. Exploding bridge (EB);
2. Exploding bridge wire (EBW);
3. Slapper;4. Exploding foil initiators (EFI);
b. Arrangements using single or multiple detonators designed to
nearly simultaneously initiate an explosive surface over greaterthan 5000 mm
2from a single firing signal withan initiation
timing spread over the surface of less than 2,5 µs.
Note: 3A232 does not control detonators using only primary
explosives, such as lead azide.
Technical Note:
In 3A232 the detonators of concern all utilise a small electrical
conductor (bridge, bridge wire or foil) that explosively vapourises
when a fast, high-current electrical pulse is passed through it. In
nonslapper types, the exploding conductor starts a chemical
detonation in a contacting high-explosive material such as PETN
(Pentaerythritoltetranitrate). In slapper detonators, the explosive
vapourisation of the electrical conductor drives a flyer or slapper
across a gap and the impact of the slapper on an explosive starts a
chemical detonation. The slapper in some designs is driven by a
magnetic force. The term exploding foil detonator may refer to
either an EB or a slapper-type detonator. Also, the word initiator
is sometimes used in place of the word detonator.
3A233 Mass spectrometers, other than those specified in 0B002.g.,
capable of measuring ions of 230 atomic mass units or greater
and having a resolution of better than 2 parts in 230, as follows,
and ion sources therefor:
a. Inductively coupled plasma mass spectrometers (ICP/MS);
b. Glow discharge mass spectrometers (GDMS);
c. Thermal ionisation mass spectrometers (TIMS);
d. Electron bombardment mass spectrometers which have a source
ch amber constructed from, lined withor plated withmaterials
resistant to UF6;
e. Molecular beam mass spectrometers having either of the
following characteristics:
1. A source chamber constructed from, lined with or plated
withstainless steel or molybdenum and equipped witha cold
trap capable of cooling to 193 K (− 80 ºC) or less; or
2. A source chamber constructed from, lined with or plated
withmaterials resistant to UF6;
f. Mass spectrometers equipped witha microfluorination ion
source designed for actinides or actinide fluorides.2000R1334 — EN — 19.01.2002 — 003.001 — 109
▼M3
3B Test,InspectionandProductionEquipment
3B001 Equipment for the manufacturing of semiconductor devices or
materials, as follows, and specially designed components and
accessories therefor:
a. "Stored programme controlled" equipment designed for
epitaxial growth, as follows:
1. Equipment capable of producing a layer thickness uniform
to less than ± 2,5 % across a distance of 75 mm or more;
2. Metal organic chemical vapour deposition (MOCVD)
reactors specially designed for compound semiconductor
crystal growth by the chemical reaction between materials
specified in 3C003 or 3C004;
3. Molecular beam epitaxial growthequipment using gas or
solid sources;
b. "Stored programme controlled" equipment designed for ion
implantation, having any of the following:
1. A beam energy (accelerating voltage) exceeding 1MeV;
2. Being specially designed and optimised to operate at a beam
energy (accelerating voltage) of less than 2 keV;
3. Direct write capability; or
4. Being capable of high energy oxygen implant into a heated
semiconductor material "substrate";
c. "Stored programme controlled" anisotropic plasma dry etching
equipment, as follows:
1. Equipment withcassette-to-cassette operation and load-
locks, and having any of the following:
a. Designed or optimised to produce critical dimensions of
0,3 µm or less with± 5 % 3 sigma precision; or
b. Designed for generating less than 0,04 particles/cm2with
a measurable particle size greater than 0,1 µm in
diameter;
2. Equipment specially designed for equipment specified in
3B001.e. and having any of the following:
a. Designed or optimised to produce critical dimensions of
0,3 µm or less with± 5 % 3 sigma precision; or
b. Designed for generating less than 0,04 particles/cm2with
a measurable particle size greater than 0,1 µm in
diameter;
d. "Stored programme controlled" plasma enhanced CVD equip-
ment, as follows:
1. Equipment withcassette-to-cassette operation and load-
locks, and having any of the following:
a. Designed according to the manufacturer's specifications
or optimised to produce critical dimensions of 0,3 µm or
less with± 5 % 3 sigma precision; or
b. Designed for generating less than 0,04 particles/cm2with
a measurable particle size greater than 0,1 µm in
diameter;
2. Equipment specially designed for equipment specified in
3B001.e. and having any of the following:
a. Designed according to the manufacturer's specifications
or optimised to produce critical dimensions of 0,3 µm or
less with± 5 % 3 sigma precision; or
b. Designed for generating less than 0,04 particles/cm2with
a measurable particle size greater than 0,1 µm in
diameter;
e. "Stored programme controlled" automatic loading multi-
chamber central wafer handling systems, having all of the
following:
1. Interfaces for wafer input and output, to which more than
two pieces of semiconductor processing equipment are to be
connected; and2000R1334 — EN — 19.01.2002 — 003.001 — 110
▼M3
2. Designed to form an integrated system in a vacuum
environment for sequential multiple wafer processing;
Note: 3B001.e. does not control automatic robotic wafer
handling systems not designed to operate in a vacuum
environment.
f. "Stored programme controlled" lithography equipment, as
follows:
1. Align and expose step and repeat (direct step on wafer) or
step and scan (scanner) equipment for wafer processing
using photo-optical or X-ray methods, having any of the
following:
a. A light source wavelength shorter than 350 nm; or
b. Capable of producing a pattern witha 'minimum
resolvable feature' size of 0,5 µm or less;
Technical Note:
The 'minimum resolvable feature' size is calculated by the
following formula:
MRF ¼anexposure light source wavelength in èmmðÞ /C2 KfactorðÞ
numerical aperture
where the K factor = 0,7
MRF = minimum resolvable feature size
2. Equipment specially designed for mask making or semi-
conductor device processing using deflected focused
electron beam, ion beam or "laser" beam, having any of
the following:
a. A spot size smaller than 0,2 µm;
b. Being capable of producing a pattern witha feature size
of less than 1 µm; or
c. An overlay accuracy of better than ± 0,20 µm (3 sigma);
g. Masks and reticles designed for integrated circuits specified in
3A001;
h. Multi-layer masks with a phase shift layer.
3B002 "Stored programme controlled" test equipment, specially designed
for testing finished or unfinished semiconductor devices, as
follows, and specially designed components and accessories
therefor:
a. For testing S-parameters of transistor devices at frequencies
exceeding 31 GHz;
b. For testing integrated circuits capable of performing functional
(truthtable) testing at a 'pattern rate' of more th an 333 MHz;
Note: 3B002.b. does not control test equipment specially
designed for testing:
1. "Electronic assemblies" or a class of "electronic
assemblies" for home or entertainment applica-
tions;
2. Uncontrolled electronic components, "electronic
assemblies" or integrated circuits;
3. Memories.
Technical Note:
For the purpose of this entry, 'pattern rate' is defined as the
maximum frequency of digital operation of a tester. It is
therefore equivalent to the highest data rate that a tester can
provide in a non-multiplexed mode. It is also referred to as test
speed, maximum digital frequency or maximum digital speed.
c. For testing microwave integrated circuits specified in
3A001.b.2.2000R1334 — EN — 19.01.2002 — 003.001 — 111
▼M3
3C Materials
3C001 Hetero-epitaxial materials consisting of a "substrate" having
stacked epitaxially grown multiple layers of any of the following:
a. Silicon;
b. Germanium;
c. Silicon carbide; or
d. III/V compounds of gallium or indium.
Technical Note:
III/V compounds are polycrystalline or binary or complex
monocrystalline products consisting of elements of groups IIIA
and VA of Mendeleyev's periodic classification table (e.g.,
gallium arsenide, gallium-aluminium arsenide, indium phos-
phide).
3C002 Resist materials, as follows, and "substrates" coated with
controlled resists:
a. Positive resists designed for semiconductor lithography
specially adjusted (optimised) for use at wavelengths below
350 nm;
b. All resists designed for use withelectron beams or ion beams,
witha sensitivity of 0,01 µcoulomb/mm2or better;
c. All resists designed for use withX-rays, witha sensitivity of
2,5 mJ/mm2or better;
d. All resists optimised for surface imaging technologies,
including 'silylated' resists.
Technical Note:
'Silylation' techniques are defined as processes incorporating
oxidation of the resist surface to enhance performance for both
wet and dry developing.
3C003 Organo-inorganic compounds, as follows:
a. Organo-metallic compounds of aluminium, gallium or indium
having a purity (metal basis) better than 99,999 %;
b. Organo-arsenic, organo-antimony and organo-phosphorus
compounds having a purity (inorganic element basis) better
than 99,999 %.
Note: 3C003 only controls compounds whose metallic, partly
metallic or non-metallic element is directly linked to
carbon in the organic part of the molecule.
3C004 Hydrides of phosphorus, arsenic or antimony, having a purity
better than 99,999 %, even diluted in inert gases or hydrogen.
Note: 3C004 does not control hydrides containing 20 % molar
or more of inert gases or hydrogen.2000R1334 — EN — 19.01.2002 — 003.001 — 112
▼M3
3D Software
3D001 "Software" specially designed for the "development" or "produc-
tion" of equipment specified in 3A001.b. to 3A002.g. or 3B.
3D002 "Software" specially designed for the "use" of "stored programme
controlled" equipment specified in 3B.
3D003 Computer-aided-design (CAD) "software" having all of the
following:
a. Designed for the "development" of semiconductor devices or
integrated circuits; and
b. Designed to perform or use any of the following:
1. Design rules or circuit verification rules;
2. Simulation of the physically laid out circuits; or
3. 'Lithographic processing simulators' for design.
Technical Note:
A 'lithographic processing simulator' is a "software"
package used in the design phase to define the sequence
of lithographic, etching and deposition steps for translating
masking patterns into specific topographical patterns in
conductors, dielectrics or semiconductor material.
Note 1: 3D003 does not control "software" specially designed
for schematic entry, logic simulation, placing androuting, layout verification or pattern generation tape.
Note 2: Libraries, design attributes or associated data for the
design of semiconductor devices or integrated circuits
are considered as "technology".
3D101 "Software" specially designed or modified for the "use" of
equipment specified in 3A101.b.2000R1334 — EN — 19.01.2002 — 003.001 — 113
▼M3
3E Technology
3E001 "Technology" according to the General Technology Note for the
"development" or "production" of equipment or materials specified
in 3A, 3B or 3C;
Note: 3E001 does not control "technology" for the "develop-
ment" or "production" of:
a. Microwave transistors operating at frequencies below
31 GHz;
b. Integrated circuits specified in 3A001.a.3. to
3A001.a.12., having all of the following:
1. Using "technology" of 0,7 µm or more, and
2. Not incorporating 'multi-layer structures'.
Technical Note:
The term 'multi-layer structures' in Note b.2. to
3E001 does not include devices incorporating a
maximum of two metal layers and two polysilicon
layers.
3E002 "Technology" according to the General Technology Note other
than that specified in 3E001 for the "development" or "production"
of "microprocessor microcircuits", "micro-computer microcircuits"
and microcontroller microcircuits having a "composite theoretical
performance" ("CTP") of 530 million theoretical operations per
second (Mtops)or more and an arithmetic logic unit withan access
widthof 32 bits or more.
Note: The decontrol note to 3E001 also applies to 3E002.
3E003 Other "technology" for the "development" or "production" of:
a. Vacuum microelectronic devices;
b. Hetero-structure semiconductor devices suchas h ighelectron
mobility transistors (HEMT), hetero-bipolar transistors (HBT),
quantum well and super lattice devices;
c. "Superconductive" electronic devices;
d. Substrates of films of diamond for electronic components;
e. Substrates of silicon-on-insulator (SOI)forintegrated circuits in
which the insulator is silicon dioxide;
f. Substrates of silicon carbide for electronic components;
3E101 "Technology" according to the General Technology Note for the
"use" of equipment or "software" specified in 3A001.a.1. or 2.,
3A101 or 3D101.
3E102 "Technology" according to the General Technology Note for the
"development" of "software" specified in 3D101.
3E201 "Technology" according to the General Technology Note for the
"use" of equipment specified in 3A001.e.2., 3A001.e.3., 3A201,
3A225 to 3A233.2000R1334 — EN — 19.01.2002 — 003.001 — 114
▼M3
CATEGORY4
COMPUTERS2000R1334 — EN — 19.01.2002 — 003.001 — 115
▼M3
Note 1: Computers, related equipment and "software"
performing telecommunications or "local area
network" functions must also be evaluated against the
performance characteristics of Category 5, Part 1
(Telecommunications).
Note 2: Control units which directly interconnect the buses or
channels of central processing units, "main storage" or
disk controllers are not regarded as telecommunica-
tions equipment described in Category 5, Part 1
(Telecommunications).
N.B.: For the control status of "software" specially
designed for packet switching, see 5D001.
Note 3: Computers, related equipment and "software"
performing cryptographic, cryptanalytic, certifiable
multi-level security or certifiable user isolation func-
tions, or which limit electromagnetic compatibility
(EMC), must also be evaluated against the performance
characteristics in Category 5, Part 2 ("Information
Security").
4A Systems,EquipmentandComponents
4A001 Electronic computers and related equipment, as follows, and
"electronic assemblies" and specially designed components
therefor:
N.B.: SEEALSO4A101.
a. Specially designed to have any of the following characteristics:
1. Rated for operation at an ambient temperature below 228 K
(− 45 ºC) or above 358 K (85 ºC);
Note: 4A001.a.1. does not apply to computers specially
designed for civil automobile or railway train
applications.
2. Radiation hardened to exceed any of the following
specifications:
a. Total Dose 5 × 103
Gy (silicon);
b. Dose Rate Upset 5 × 106
Gy (silicon)/s; or
c. Single Event Upset 1 × 10−7
Error/bit/day;
b. Having characteristics or performing functions exceeding the
limits in Category 5, Part 2 ("Information Security").
Note: 4A001.b. does not control electronic computers and
related equipment when accompanying their user for
the user's personal use.
4A002 "Hybrid computers", as follows, and "electronic assemblies" and
specially designed components therefor:
N.B.: SEEALSO4A102.
a. Containing "digital computers" specified in 4A003;
b. Containing analogue-to-digital converters having all of the
following characteristics:
1. 32 channels or more; and
2. A resolution of 14 bits (plus sign bit) or more witha
conversion rate of 200 000 conversions/s or more.
4A003 "Digital computers", "electronic assemblies", and related equip-
ment therefor, as follows, and specially designed components
therefor:
Note 1: 4A003 includes the following:
a. Vector processors;
b. Array processors;2000R1334 — EN — 19.01.2002 — 003.001 — 116
▼M3
c. Digital signal processors;
d. Logic processors;
e. Equipment designed for "image enhancement";
f. Equipment designed for "signal processing".
Note 2: The control status of the "digital computers" and
related equipment described in 4A003 is determined by
the control status of other equipment or systemsprovided:
a. The "digital computers" or related equipment are
essential for the operation of the other equipment or
systems;
b. The "digital computers" or related equipment are
not a "principal element" of the other equipment or
systems;
and
N.B. 1: The control status of "signal processing"
or "image enhancement" equipment
specially designed for other equipment
with functions limited to those required
for the other equipment is determined by
the control status of the other equipment
even if it exceeds the "principal element"criterion.
N.B. 2: For the control status of "digital compu-
ters" or related equipment for
telecommunications equipment, see Cate-
gory 5, Part 1 (Telecommunications).
c. The "technology" for the "digital computers" and
related equipment is determined by 4E.
a. Designed or modified for "fault tolerance";
Note: For the purposes of 4A003.a., "digital computers" and
related equipment are not considered to be designed
or modified for "fault tolerance" if they utilise any of
the following:
1. Error detection or correction algorithms in "main
storage";
2. The interconnection of two "digital computers" so
that, if the active central processing unit fails, an
idling but mirroring central processing unit can
continue the system's functioning;
3. The interconnection of two central processing units
by data channels or by use of shared storage to
permit one central processing unit to perform other
work until the second central processing unit fails,
at which time the first central processing unit takes
over in order to continue the system's functioning;
or
4. The synchronisation of two central processing units
by "software" so that one central processing unit
recognises when the other central processing unit
fails and recovers tasks from the failing unit.
b. "Digital computers" having a "composite theoretical perfor-
mance" ("CTP") exceeding 28000 million theoretical
operations per second (Mtops);
c. "Electronic assemblies" specially designed or modified for
enhancing performance by aggregation of "computing
elements" ("CEs") so that the "CTP" of the aggregation exceeds
the limit in 4A003.b.;
Note 1: 4A003.c. applies only to "electronic assemblies" and
programmable interconnections not exceeding the
limit in 4A003.b. when shipped as unintegrated
"electronic assemblies". It does not apply to
"electronic assemblies" inherently limited by nature
of their design for useasrelated equipment specified
in 4A003.d. or 4A003.e.
Note 2: 4A003.c. does not control "electronic assemblies"
specially designed for a product or family of
products whose maximum configuration does not
exceed the limit of 4A003.b.2000R1334 — EN — 19.01.2002 — 003.001 — 117
▼M3
d. Graphics accelerators and graphics coprocessors exceeding a
"three dimensional Vector Rate" of 200 000000;
e. Equipment performing analogue-to-digital conversions
exceeding the limits in 3A001.a.5.;
f. Not used;
g. Equipment specially designed to provide external interconnec-
tion of "digital computers" or associated equipment whichallows communications at data rates exceeding 1,25 Gbyte/s.
Note: 4A003.g. does not control internal interconnection
equipment (e.g. backplanes, buses), passive intercon-
nection equipment, "network access controllers" or
"communications channel controllers".
4A004 Computers, as follows, and specially designed related equipment,
"electronic assemblies" and components therefor:
a. "Systolic array computers";
b. "Neural computers";
c. "Optical computers".
4A101 Analogue computers, "digital computers" or digital differential
analysers, other than those specified in 4A001.a.1., which are
ruggedised and designed or modified for use in space launch
vehicles specified in 9A004 or sounding rockets specified in
9A104.
4A102 "Hybrid computers" specially designed for modelling, simulation
or design integration of space launchveh icles specified in 9A004
or sounding rockets specified in 9A104.
Note: This control only applies when the equipment is supplied
with "software" specified in 7D103 or 9D103.2000R1334 — EN — 19.01.2002 — 003.001 — 118
▼M3
4B Test,InspectionandProductionEquipment
None.2000R1334 — EN — 19.01.2002 — 003.001 — 119
▼M3
4C Materials
None.2000R1334 — EN — 19.01.2002 — 003.001 — 120
▼M3
4D Software
Note: The control status of "software" for the "development",
"production", or "use" of equipment described in other
Categories is dealt with in the appropriate Category. The
control status of "software" for equipment described in
this Category is dealt with herein.
4D001 "Software" specially designed or modified for the "development",
"production" or "use" of equipment or "software" specified in
4A001 to 4A004, or 4D.
4D002 "Software" specially designed or modified to support "technology"
specified in 4E.
4D003 Specific "software", as follows:
a. Operating system "software", "software" development tools and
compilers specially designed for "multi-data-stream processing"
equipment, in "source code";
b. Not used;
c. "Software" having characteristics or performing functions
exceeding the limits in Category 5, Part 2 ("Information
Security");
Note: 4D003.c. does not control "software" when accom-
panying its user for the user's personal use.
d. Operating systems specially designed for "real time processing"
equipment which guarantees a "global interrupt latency time" of
less than 20 µs.2000R1334 — EN — 19.01.2002 — 003.001 — 121
▼M3
4E Technology
4E001 "Technology" according to the General Technology Note, for the
"development", "production" or "use" of equipment or "software"
specified in 4A or 4D.2000R1334 — EN — 19.01.2002 — 003.001 — 122
▼M3
Technicalnoteon"CompositeTheoretical Performance"("CTP")
Abbreviations used in this Technical Note
"CE" "computing element" (typically an arithmetic logical unit)
FP floating pointXP fixed point
t execution time
XOR exclusive ORCPU central processing unit
TP theoretical performance (of a single "CE")
"CTP" "composite theoretical performance" (multiple "CEs")R effective calculating rateWL word length
L word length adjustment
× multiply — Execution time 't' is expressed in microseconds, TP and
"CTP" are expressed in millions of theoretical operations per second
(Mtops) and WL is expressed in bits.
Outline of "CTP" calculation method
"CTP" is a measure of computational performance given in Mtops. In calculating
the "CTP" of an aggregation of "CEs" the following three steps are required:
1. Calculate the effective calculating rate R for each "CE";
2. Apply the word length adjustment (L) to the effective calculating rate (R),
resulting in a Theoretical Performance (TP) for each "CE";
3. If there is more than one "CE", combine the TPs, resulting in a "CTP" for the
aggregation.
Details for these steps are given in the following sections.
Note 1: For aggregations of multiple "CEs" which have both shared and
unshared memory subsystems, the calculation of "CTP" is completed
hierarchically, in two steps: first, aggregate the groups of "CEs"
sharing memory; second, calculate the "CTP" of the groups using the
calculation method for multiple "CEs" not sharing memory.
Note 2: "CEs" that are limited to input/output and peripheral functions (e.g.,
disk drive, communication and video display controllers) are not
aggregated into the "CTP" calculation.2000R1334 — EN — 19.01.2002 — 003.001 — 123
▼M3
The following table shows the method of calculating the Effective Calculating
Rate R for each"CE":
Step 1: The effective calculating rate R
For "CEs" implementing:
Note:Every "CE" must be evaluated indepen-
dently.Effective calculating rate, R
XP only
Rxp¼1
3/C2txp add/C0/C1
if no add is implemented use:
Rxp¼1
txp mult/C0/C1
If neither add nor multiply is implemented use
the fastest available arithmetic operation as
follows:
Rxp¼1
3/C2txp
See Notes X & Z
FP only
Rfp¼max1
tfp add/C0/C1 ;1
tfp mult/C0/C1
See Notes X & Y
BothFP and XP (R) Calculate bothRxp,Rfp
For simple logic processors not implementing
any of the specified arithmetic operations. R¼1
3/C2tlog
Where tlogis the execute time of the XOR, or for
logic hardware not implementing the XOR, the
fastest simple logic operation.
See Notes X & Z
For special logic processorsnot using any of the
specified arithmetic or logic operations.R=R′× WL/64
Where R' is the number of results per second,
WL is the number of bits upon which the logic
operation occurs, and 64 is a factor to normalise
to a 64 bit operation.2000R1334 — EN — 19.01.2002 — 003.001 — 124
▼M3
Note W: For a pipelined "CE" capable of executing up to one arithmetic or
logic operation every clock cycle after the pipeline is full, a pipelined
rate can be established. The effective calculating rate (R) for such a
"CE" is the faster of the pipelined rate or non-pipelined execution
rate.
Note X: For a "CE" which performs multiple operations of a specific type in a
single cycle (e.g., two additions per cycle or two identical logic
operations per cycle), the execution time t is given by:
t¼cycle time
the number of identical operations per machine cycle
"CEs" which perform different types of arithmetic or logic operations
in a single machine cycle are to be treated as multiple separate "CEs"
performing simultaneously (e.g., a "CE" performing an addition and a
multiplication in one cycle is to be treated as two "CEs", the first
performing an addition in one cycle and the second performing a
multiplication in one cycle).
If a single "CE" has both scalar function and vector function, use the
shorter execution time value.
Note Y: For the "CE" that does not implement FP add or FP multiply, but that
performs FP divide:
Rfp¼1
tfp divide/C0/C1
If the "CE" implements FP reciprocal but not FP add, FP multiply or
FP divide, then
Rfp¼1
tfp reciprocal/C0/C1
If none of the specified instructions is implemented, the effective FP
rate is 0.
Note Z: In simple logic operations, a single instruction performs a single logic
manipulation of no more than two operands of given lengths.
In complex logic operations, a single instruction performs multiple
logic manipulations to produce one or more results from two or more
operands.
Rates should be calculated for all supported operand lengths
considering both pipelined operations (if supported), and non-
pipelined operations using the fastest executing instruction for each
operand length based on:
1. Pipelined or register-to-register operations.
Exclude extraordinarily short execution times generated for
operations on a predetermined operand or operands (for example,
multiplication by 0 or 1). If no register-to-register operations are
implemented, continue with (2).
2. The faster of register-to-memory or memory-to-register operations;
if these also do not exist, then continue with (3).
3. Memory-to-memory.
In each case above, use the shortest execution time certified by the
manufacturer.2000R1334 — EN — 19.01.2002 — 003.001 — 125
▼M3
Step 2: TP for eachsupported operand lengthWL
Adjust the effective rate R (or R') by the word length adjustment L as follows:
T P=R×L
where L = (1/3 + WL/96)
Note: The word length WL used in these calculations is the operand length in
bits. (If an operation uses operands of different lengths, select the
largest word length.)
The combination of a mantissa ALU and an exponent ALU of a floating
point processororunit is considered to be one "CE"with a WordLength
(WL) equal to the number of bits in the data representation (typically 32
or 64) for purposes of the "CTP" calculation.
This adjustment is not applied to specialized logic processors which do not use
XOR instructions. In this case TP = R.
Select the maximum resulting value of TP for:
EachXP-only "CE" (Rxp);
EachFP-only "CE" (Rfp);
Eachcombined FP and XP "CE" (R);EachXP-only "CE" (R
xp);
Each simple logic processor not implementing any of the specified arithmetic
operations; and
Each special logic processor not using any of the specified arithmetic or logic
operations.
Step 3: "CTP" for aggregations of "CEs", including CPUs
For a CPU witha single "CE",
"CTP" = TP
(for "CEs" performing bothfixed and floating point operations
TP = max (TPfp;T Pxp)).
"CTP" for aggregations of multiple "CEs" operating simultaneously is calculated
as follows:
Note 1: For aggregations that do not allow all of the "CEs" to run
simultaneously, the possible combination of "CEs" that provides the
largest "CTP" should be used. The TP of each contributing "CE" is to
be calculated at its maximum value theoretically possible before the
"CTP" of the combination is derived.
N.B. To determine the possible combinations of simultaneously
operating "CEs", generate an instruction sequence that
initiates operations in multiple "CEs", beginning with the
slowest "CE" (the one needing the largest number of cycles to
complete its operation) and ending with the fastest "CE". At
each cycle of the sequence, the combination of "CEs" that are
in operation during that cycle is a possible combination. The
instruction sequence must take into account all hardware and/
or architectural constraints on overlapping operations.
Note 2: A single integrated circuit chip or board assembly may contain
multiple "CEs".
Note 3: Simultaneous operations are assumed to exist when the computer
manufacturer claims concurrent, parallel or simultaneous operation
or execution in a manual or brochure for the computer.
Note 4: "CTP" values are not to be aggregated for "CE" combinations
(inter)connected by "Local Area Networks", Wide Area Networks, I/O
shared connections/devices, I/O controllers and any communication
interconnection implemented by "software".
Note 5: "CTP" values must be aggregated for multiple "CEs" specially
designed to enhance performance by aggregation, operating simulta-
neously and sharing memory,- or multiple memory/"CE"-
combinations operating simultaneously utilising specially designed
hardware.
This aggregation does not apply to "electronic assemblies" described
by 4A003.c.
"CTP" = TP1+C2×T P2+…+Cn×T Pn,2000R1334 — EN — 19.01.2002 — 003.001 — 126
▼M3
where the TPs are ordered by value, with TP1being the highest, TP2being the second highest, …, and TPnbeing the lowest. Ciis a
coefficient determined by the strength of the interconnection between
"CEs", as follows:
For multiple "CEs" operating simultaneously and sharing memory:
C2=C3=C4=…=Cn= 0,75
Note 1: When the "CTP" calculated by the above method does not exceed 194
Mtops, the following formula may be used to calculate Ci:
Ci¼0;75ﬃﬃﬃ ﬃmpi¼2;... ;n ðÞ
where: m = the number of "CEs" or groups of "CEs" sharing access.
provided:1. The TP
iof each "CE" or group of "CEs" does not exceed 30 Mtops;
2. The "CEs" or groups of "CEs" share access to main memory
(excluding cache memory) over a single channel; and
3. Only one "CE" or group of "CEs" can have use of the channel at
any given time.
N.B. This does not apply to items controlled under Category 3.
Note 2: "CEs" share memory if they access a common segment of solid state
memory. This memory may include cache memory, main memory or
other internal memory. Peripheral memory devices such as disk
drives, tape drives or RAM disks are not included.
Note: For Multiple "CEs" or groups of "CEs" not sharing memory,
interconnected by one or more data channels:
Ci= 0,75 × ki(i = 2, …, 32) (see Note below)
= 0,60 × ki(i = 33, …, 64)
= 0,45 × ki(i = 65, …, 256)
= 0,30 × ki(i > 256)
The value of Ciis based on the number of "CE"s, not the number of nodes.where
ki= min (Si/Kr,1); and
Kr= normalising factor of 20 MByte/s
Si= sum of the maximum data rates (in units of MByte/s) for all data channels
connected to the ith"CE" or group of "CEs" sharing memory
When calculating a Cifor a group of "CEs", the number of the first "CE" in a
group determines the proper limit for Ci. For example, in an aggregation of
groups consisting of three "CEs" each, the 22nd group will contain "CE"64,
"CE"65, and "CE"66. The proper limit for Cifor this group is 0,60.
Aggregation (of "CEs" or groups of "CEs") should be from the fastest-to-slowest;
i.e.:
TP1≥TP2≥…T Pn, and
in the case of TPi=T Pi+1, from the largest to smallest; i.e.:
Ci≥Ci+1
Note: The kifactor is not to be applied to "CEs" 2 to 12 if the TPiof the "CE"
or group of "CEs" is more than 50 Mtops; i.e., Cifor "CEs" 2 to 12 is
0,75.2000R1334 — EN — 19.01.2002 — 003.001 — 127
▼M3
CATEGORY5
TELECOMMUNICATIONSAND"INFORMATIONSECURITY"2000R1334 — EN — 19.01.2002 — 003.001 — 128
▼M3
PART 1
TELECOMMUNICATIONS
Note 1: The control status of components, "lasers", test and
"production" equipment and "software" therefor which
are specially designed for telecommunications equip-
ment or systems is determined in Category 5, Part 1.
Note 2: "Digital computers", related equipment or "software",
when essential for the operation and support of
telecommunications equipment described in this Cate-
gory, are regarded as specially designed components,
provided they are the standard models customarily
supplied by the manufacturer. This includes operation,
administration, maintenance, engineering or billing
computer systems.
5A1 Systems,EquipmentandComponents
5A001 a. Any type of telecommunications equipment having any of the
following characteristics, functions or features:
1. Specially designed to withstand transitory electronic effects
or electromagnetic pulse effects, botharising from a nuclear
explosion;
2. Specially hardened to withstand gamma, neutron or ion
radiation; or
3. Specially designed to operate outside the temperature range
from 218 K (− 55 ºC) to 397 K (124 ºC),
Note: 5A001.a.3. applies only to electronic equipment.
Note: 5A001.a.2. and 5A001.a.3. do not control equipment
designed or modified for use on board satellites.
b. Telecommunication transmission equipment and systems, and
specially designed components and accessories therefor, having
any of the following characteristics, functions or features:
1. Being underwater communications systems having any of
the following characteristics:
a. An acoustic carrier frequency outside the range from
20 kHz to 60 kHz;
b. Using an electromagnetic carrier frequency below
30 kHz;or
c. Using electronic beam steering techniques;
2. Being radio equipment operating in the 1,5 MHz to
87,5 MHz band and having any of the following character-
istics:
a. Incorporating adaptive techniques providing more than
15 dB suppression of an interfering signal; or
b. Having all of the following:
1. Automatically predicting and selecting frequencies
and "total digital transfer rates" per channel to
optimise the transmission; and
2. Incorporating a linear power amplifier configuration
having a capability to support multiple signals
simultaneously at an output power of 1 kW or more
in the 1,5 MHz to 30 MHz frequency range or 250 W
or more in the 30 MHz to 87,5 MHz frequency range,
over an "instantaneous bandwidth" of one octave or
more and withan output h armonic and distortion
content of better than − 80 dB;
3. Being radio equipment employing "spread spectrum"
techniques, including "frequency hopping" techniques,
having any of the following characteristics:
a. User programmable spreading codes; or
b. A total transmitted bandwidthwh ichis 100 or more times
the bandwidth of any one information channel and in
excess of 50 kHz;2000R1334 — EN — 19.01.2002 — 003.001 — 129
▼M3
Note:5A001.b.3.b. does not control radio equipment
specially designed for use withcivil cellular
radio-communications systems.
Note: 5A001.b.3 does not control equipment designed to
operate at an output power of 1 Watt or less.
4. Being digitally controlled radio receivers having all of the
following:
a. More than 1,000 channels;
b. A "frequency switching time" of less than 1 ms;
c. Automatic searching or scanning of a part of the
electromagnetic spectrum; and
d. Identification of the received signals or the type of
transmitter; or
Note: 5A001.b.4. does not control radio equipment
specially designed for use with civil cellular
radio-communications systems.
5. Employing functions of digital "signal processing" to
provide voice coding at rates of less than 2 400 bit/s.
c. Optical fibre communication cables, optical fibres and
accessories, as follows:
1. Optical fibresof more than 500m in length, and specified by
the manufacturer as being capable of withstanding a proof
test tensile stress of 2 × 109N/m2or more;
Technical Note:
Proof Test: on-line or off-line production screen testing that
dynamically applies a prescribed tensile stress over a 0,5 to
3 m length of fibre at a running rate of 2 to 5 m/s while
passing between capstans approximately 150 mm in
diameter. The ambient temperature is a nominal 293 K
(20 ºC) and relative humidity 40 %. Equivalent national
standards may be used for executing the proof test.
2. Optical fibre cables and accessories designed for underwater
use.
Note: 5A001.c.2. does not control standard civil tele-
communication cables and accessories.
N.B. 1: For underwater umbilical cables, and connectors
therefor, see 8A002.a.3.
N.B. 2: For fibre-optic hull penetrators or connectors,
see 8A002.c.
d. "Electronically steerable phased array antennae" operating
above 31 GHz.
Note: 5A001.d. does not control "electronically steerable
phased array antennae" for landing systems with
instruments meeting ICAO standards covering micro-
wave landing systems (MLS).
5A101 Telemetering and telecontrol equipment usable for "missiles".
Note: 5A101 does not control equipment specially designed to
be used for remote control of model planes, boats or
vehicles and having an electric field strength of not more
than200microvoltspermetreatadistanceof500metres.2000R1334 — EN — 19.01.2002 — 003.001 — 130
▼M3
5B1 Test,InspectionandProductionEquipment
5B001 a. Equipment and specially designed components or accessories
therefor, specially designed for the "development", "produc-
tion" or "use" of equipment, functions or features specified in
5A001, 5B001, 5D001 or 5E001.
Note: 5B001.a. does not control optical fibre characterisa-
tion equipment not using semiconductor "lasers".
b. Equipment and specially designed components or accessories
therefor, specially designed for the "development" of any of the
following telecommunication transmission or "stored
programme controlled" switching equipment:
1. Equipment employing digital techniques, including "Asyn-
chronous Transfer Mode" ("ATM"), designed to operate at a
"total digital transfer rate" exceeding 1,5 Gbit/s;
2. Equipment employing a "laser" and having any of the
following:
a. A transmission wavelengthexceeding 1 750 nm;
b. Performing "optical amplification";
c. Employing coherent optical transmission or coherent
optical detection techniques (also called optical hetero-
dyne or homodyne techniques); or
d. Employing analogue techniques and having a bandwidth
exceeding 2,5 GHz;
Note: 5B001.b.2.d. does not control equipment
specially designed for the "development" of
commercial TV systems.
3. Equipment employing "optical switching";
4. Radio equipment employing quadrature-amplitude-modula-
tion (QAM) techniques above level 128; or
5. Equipment employing "common channel signalling" oper-
ating in either non-associated or quasi- associated mode of
operation.2000R1334 — EN — 19.01.2002 — 003.001 — 131
▼M3
5C1 Materials
None.2000R1334 — EN — 19.01.2002 — 003.001 — 132
▼M3
5D1 Software
5D001 a. "Software" specially designed or modified for the "develop-
ment", "production" or "use" of equipment, functions or
features specified by 5A001 or 5B001.
b. "Software" specially designed or modified to support "tech-
nology" specified in 5E001.
c. Specific "software" as follows:
1. "Software" specially designed or modified to provide
characteristics, functions or features of equipment specified
in 5A001 or 5B001;
2. Not used;
3. "Software", other than in machine-executable form,
specially designed for "dynamic adaptive routing".
d. "Software" specially designed or modified for the "develop-
ment" of any of the following telecommunication transmission
or "stored programme controlled" switching equipment:
1. Equipment employing digital techniques, including "Asyn-
chronous Transfer Mode" ("ATM"), designed to operate at a
"total digital transfer rate" exceeding 1,5 Gbit/s;
2. Equipment employing a "laser" and having any of the
following:
a. A transmission wavelengthexceeding 1 750 nm; or
b. Employing analogue techniques and having a bandwidth
exceeding 2,5 GHz;
Note: 5D001.d.2.b. does not control "software"
specially designed or modified for the "devel-
opment" of commercial TV systems.
3. Equipment employing "optical switching"; or
4. Radio equipment employing quadrature-amplitude-modula-
tion (QAM) techniques above level 128.
5D101 "Software" specially designed or modified for the "use" of
equipment specified in 5A101.2000R1334 — EN — 19.01.2002 — 003.001 — 133
▼M3
5E1 Technology
5E001 a. "Technology" according to the General Technology Note for
the "development", "production" or "use" (excluding operation)
of equipment, functions or features or "software" specified in
5A001, 5B001 or 5D001.
b. Specific "technologies", as follows:
1. "Required" "technology" for the "development" or "produc-
tion" of telecommunications equipment specially designed
to be used on board satellites;
2. "Technology" for the "development" or "use" of "laser"
communication techniques with the capability of automati-
cally acquiring and tracking signals and maintaining
communications through exoatmosphere or sub-surface
(water) media;
3. "Technology" for the "development" of digital cellular radio
systems;
4. "Technology" for the "development" of "spread spectrum"
techniques, including "frequency hopping" techniques.
c. "Technology" according to the General Technology Note for
the "development" or "production" of any of the following
telecommunication transmission or "stored programme
controlled" switching equipment, functions or features:
1. Equipment employing digital techniques, including "Asyn-
chronous Transfer Mode" ("ATM"), designed to operate at a
"total digital transfer rate" exceeding 1,5 Gbit/s;
2. Equipment employing a "laser" and having any of the
following:
a. A transmission wavelengthexceeding 1 750 nm;
b. Performing "optical amplification" using praseodymium-
doped fluoride fibre amplifiers (PDFFA);
c. Employing coherent optical transmission or coherent
optical detection techniques (also called optical hetero-
dyne or homodyne techniques);
d. Employing wavelengthdivision multiplexing tech niques
exceeding 8 optical carriers in a single optical window;
or
e. Employing analogue techniques and having a bandwidth
exceeding 2,5 GHz;
Note: 5E001.c.2.e. does not control "technology" for
the "development" or "production" of commer-
cial TV systems.
3. Equipment employing "optical switching";
4. Radio equipment having any of the following:
a. Quadrature-amplitude-modulation (QAM) techniques
above level 128; or
b. Operating at input or output frequencies exceeding
31 GHz; or
Note: 5E001.c.4.b. does not control "technology" for
the "development" or "production" of equipment
designed or modified for operation in any
frequency band which is "allocated by the
ITU" for radio-communications services, but
not for radio-determination.
5. Equipment employing "common channel signalling" oper-
ating in either non-associated or quasi-associated mode of
operation.
5E101 "Technology" according to the General Technology Note for the
"development", "production" or "use" of equipment specified in
5A101.2000R1334 — EN — 19.01.2002 — 003.001 — 134
▼M3
PART 2
INFORMATION SECURITY
Note 1: The control status of "information security" equipment,
"software", systems, application specific "electronic
assemblies", modules, integrated circuits, components
or functions is determined in Category 5, Part 2 even if
they are components or"electronic assemblies"of other
equipment.
Note 2: Category 5 — Part 2 does not control products when
accompanying their user for the user's personal use.
Note 3: Cryptography Note
5A002 and 5D002 do not control goods that meet all of
the following:
a. Generally available to the public by being sold,
without restriction, from stock at retail selling points
by means of any of the following:
1. Over-the-counter transactions;
2. Mail order transactions;3. Electronic transactions; or4. Telephone call transactions;
b. The cryptographic functionality cannot easily be
changed by the user;
c. Designed for installation by the user without further
substantial support by the supplier; and
d. When necessary, details of the goods are accessible
and will be provided, upon request, to the competent
authorities of the Member State in which the
exporter is established in order to ascertain
compliance with conditions described in paragraphs
a. to c. above.
Technical Note:
In Category 5 — Part 2, parity bits are not included in the key
length.
5A2 Systems,EquipmentandComponents
5A002 a. Systems, equipment, application specific "electronic assem-
blies", modules and integrated circuits for "information
security", as follows, and other specially designed components
therefor:
N.B.: For the control of global navigation satellite systems
receiving equipment containing or employing decryp-
tion (i.e. GPS or GLONASS), see 7A005.
1. Designed or modified to use "cryptography" employing
digital techniques performing any cryptographic function
other than authentication or digital signature having any of
the following:
Technical Notes:
1. Authentication and digital signature functions include
their associated key management function.
2. Authentication includes all aspects of access control
where there is no encryption of files or text except as
directly related to the protection of passwords,
Personal Identification Numbers (PINs) or similar
data to prevent unauthorised access.
3. "Cryptography"does not include "fixed" data compres-
sion or coding techniques.
Note: 5A002.a.1. includes equipment designed or modi-
fied to use "cryptography" employing analogue
principles when implemented with digital techni-
ques.2000R1334 — EN — 19.01.2002 — 003.001 — 135
▼M3
a. A "symmetric algorithm" employing a key length in
excess of 56 bits; or
b. An "asymmetric algorithm" where the security of the
algorithm is based on any of the following:
1. Factorisation of integers in excess of 512 bits (e.g.,
RSA);
2. Computation of discrete logarithms in a multiplicative
group of a finite field of size greater than 512 bits
(e.g., Diffie-Hellman over Z/pZ); or
3. Discrete logarithms in a group other than mentioned in
5A002.a.1.b.2. in excess of 112 bits (e.g., Diffie-
Hellman over an elliptic curve);
2. Designed or modified to perform cryptanalytic functions;
3. Not used;4. Specially designed or modified to reduce the compromising
emanations of information-bearing signals beyond what is
necessary for health, safety or electromagnetic interference
standards;
5. Designed or modified to use cryptographic techniques to
generate the spreading code for "spread spectrum" systems,
including the hopping code for "frequency hopping"
systems;
6. Designed or modified to provide certified or certifiable
"multilevel security" or user isolation at a level exceeding
Class B2 of the Trusted Computer System Evaluation
Criteria (TCSEC) or equivalent;
7. Communications cable systems designed or modified using
mechanical, electrical or electronic means to detect surrep-
titious intrusion.
Note: 5A002 does not control:
a. "Personalised smart cards" where the cryptographic
capability is restricted for use in equipment or systems
excluded from control under entries b. to f. of this
Note. If a "personalised smart card" has multiple
functions, the control status of each function is
assessed individually;
b. Receiving equipment for radio broadcast, pay televi-
sion or similar restricted audience broadcast of the
consumer type, without digital encryption except that
exclusively used for sending the billing or programme-
related information back to the broadcast providers;
c. Equipment where the cryptographic capability is not
user-accessible and which is specially designed and
limited to allow any of the following:
1. Execution of copy-protected "software";
2. Access to any of the following:
a. Copy-protected contents stored on read-only
media;or
b. Information stored in encrypted form on media
(e.g. in connection with the protection of
intellectual property rights) when the media is
offered for sale in identical sets to the public; or
3. One-time copying of copyright protected audio/
video data.
d. Cryptographic equipment specially designed and
limited for banking use or 'money transactions';
Technical Note:
'Money transactions' in 5A002 Note d. includes the
collection and settlement of fares or credit functions.
e. Portable or mobile radiotelephones for civil use (e.g.
for use with commercial civil cellular radiocommuni-
cations systems) that are not capable of end-to-end
encryption;
f. Cordless telephone equipment not capable of end-to-
end encryption where the maximum effective range of2000R1334 — EN — 19.01.2002 — 003.001 — 136
▼M3
unboosted cordless operation (i.e. a single, unrelayed
hop between terminal and home basestation) is less
than 400 metres according to the manufacturer's
specifications.2000R1334 — EN — 19.01.2002 — 003.001 — 137
▼M3
5B2 Test,InspectionandProductionEquipment
5B002 a. Equipment specially designed for:
1. The "development" of equipment or functions specified in
5A002, 5B002, 5D002 or 5E002 including measuring or test
equipment;
2. The "production" of equipment or functions specified in
5A002, 5B002, 5D002 or 5E002, including measuring, test,
repair or production equipment;
b. Measuring equipment specially designed to evaluate and
validate the "information security" functions specified in
5A002 or 5D002.2000R1334 — EN — 19.01.2002 — 003.001 — 138
▼M3
5C2 Materials
None.2000R1334 — EN — 19.01.2002 — 003.001 — 139
▼M3
5D2 Software
5D002 a. "Software" specially designed or modified for the "develop-
ment", "production" or "use" of equipment or "software"
specified in 5A002, 5B002 or 5D002;
b. "Software" specially designed or modified to support "tech-
nology" specified in 5E002;
c. Specific "software", as follows:
1. "Software" having the characteristics, or performing or
simulating the functions of the equipment specified in
5A002 or 5B002;
2. "Software" to certify "software" specified in 5D002.c.1.
Note: 5D002 does not control:
a. "Software" required for the "use" of equipment
excluded from control under the Notes to
5A002;
b. "Software" providing any of the functions of
equipment excluded from control under the
Notes to 5A002.2000R1334 — EN — 19.01.2002 — 003.001 — 140
▼M3
5E2 Technology
5E002 "Technology" according to the General Technology Note for the
"development", "production" or "use" of equipment or "software"
specified in 5A002, 5B002 or 5D002.2000R1334 — EN — 19.01.2002 — 003.001 — 141
▼M3
CATEGORY6
SENSORSANDLASERS2000R1334 — EN — 19.01.2002 — 003.001 — 142
▼M3
6A Systems,EquipmentandComponents
6A001 Acoustics:
a. Marine acoustic systems, equipment and specially designed
components therefor, as follows:
1. Active (transmitting or transmitting-and-receiving) systems,
equipment and specially designed components therefor, as
follows:
Note: 6A001.a.1. does not control:
a. Depth sounders operating vertically below the
apparatus, not including a scanning function
exceeding ± 20º, and limited to measuring the
depth of water, the distance of submerged or
buried objects or fish finding;
b. Acoustic beacons, as follows:
1. Acoustic emergency beacons;
2. Pingers specially designed for relocating or
returning to an underwater position.
a. Wide-swathbath ymetric survey systems designed for sea
bed topographic mapping, having all of the following:
1. Being designed to take measurements at an angle
exceeding 20º from the vertical;
2. Being designed to measure depths exceeding 600 m
below the water surface; and
3. Being designed to provide any of the following:
a. Incorporation of multiple beams any of which is
less than 1,9º; or
b. Data accuracies of better than 0,3 % of water depth
across the swath averaged over the individual
measurements within the swath;
b. Object detection or location systems having any of the
following:
1. A transmitting frequency below 10 kHz;
2. Sound pressure level exceeding 224 dB (reference
1 µPa at 1 m) for equipment withan operating
frequency in the band from 10 kHz to 24 kHz
inclusive;
3. Sound pressure level exceeding 235 dB (reference
1 µPa at 1 m) for equipment withan operating
frequency in the band between 24 kHz and 30 kHz;
4. Forming beams of less than 1º on any axis and having
an operating frequency of less than 100 kHz;
5. Designed to operate withan unambiguous display
range exceeding 5 120 m; or
6. Designed to withstand pressure during normal opera-
tion at depths exceeding 1 000 m and having
transducers withany of th e following:
a. Dynamic compensation for pressure; or
b. Incorporating other than lead zirconate titanate as
the transduction element;
c. Acoustic projectors, including transducers, incorporating
piezoelectric, magnetostrictive, electrostrictive, electro-
dynamic or hydraulic elements operating individually or
in a designed combination, having any of the following:
Note 1: The control status of acoustic projectors,
including transducers, specially designed for
other equipment is determined by the controlstatus of the other equipment.
Note 2: 6A001.a.1.c. does not control electronic
sources which direct the sound vertically
only, or mechanical (e.g., air gun or vapour-
shock gun) or chemical (e.g., explosive)
sources.2000R1334 — EN — 19.01.2002 — 003.001 — 143
▼M3
1. An instantaneous radiated 'acoustic power density'
exceeding 0,01 mW/mm2/Hz for devices operating at
frequencies below 10 kHz;
2. A continuously radiated 'acoustic power density'
exceeding 0,001 mW/mm2/Hz for devices operating
at frequencies below 10 kHz; or
Technical Note:
'Acoustic power density' is obtained by dividing the
output acoustic power by the product of the area of
the radiating surface and the frequency of operation.
3. Side-lobe suppression exceeding 22 dB;
d. Acoustic systems, equipment and specially designed
components for determining the position of surface
vessels or underwater vehicles designed to operate at a
range exceeding 1 000 m witha positioning accuracy of
less than 10 m rms (root mean square) when measured at
a range of 1 000 m;
Note: 6A001.a.1.d. includes:
a. Equipment using coherent "signal proces-
sing" between two or more beacons and the
hydrophone unit carried by the surface
vessel or underwater vehicle;
b. Equipment capable of automatically
correcting speed-of-sound propagation
errors for calculation of a point.
2. Passive (receiving, whether or not related in normal
application to separate active equipment) systems, equip-
ment and specially designed components therefor, as
follows:
a. Hydrophones having any of the following characteristics:
Note: The control status of hydrophones specially
designed for other equipment is determined by
the control status of the other equipment.
1. Incorporating continuous flexible sensors or assem-
blies of discrete sensor elements witheith er a
diameter or lengthless th an 20 mm and witha
separation between elements of less than 20 mm;
2. Having any of the following sensing elements:
a. Optical fibres;
b. Piezoelectric polymers; or
c. Flexible piezoelectric ceramic materials;
3. A 'hydrophone sensitivity' better than − 180 dB at any
depthwithno acceleration compensation;
4. When designed to operate at depths exceeding 35 m
withacceleration compensation; or
5. Designed for operation at depths exceeding 1 000 m;
Technical Note:
'Hydrophone sensitivity' is defined as twenty times the
logarithm to the base 10 of the ratio of rms output
voltage to a 1 V rms reference, when the hydrophone
sensor, without a pre-amplifier, is placed in a plane wave
acoustic field with an rms pressure of 1 µPa. For
example, a hydrophone of − 160 dB (reference 1 V per
µPa) would yield an output voltage of 10−8V in such a
field, while one of − 180 dB sensitivity would yield only
10−9V output. Thus, − 160 dB is better than − 180 dB.
b. Towed acoustic hydrophone arrays having any of the
following:
1. Hydrophone group spacing of less than 12,5 m;
2. Designed or 'able to be modified' to operate at depths
exceeding 35 m;2000R1334 — EN — 19.01.2002 — 003.001 — 144
▼M3
Technical Note:
'Able to be modified' in 6A001.a.2.b.2. means having
provisions to allow a change of the wiring or
interconnections to alter hydrophone group spacing
or operating depth limits. These provisions are: spare
wiring exceeding 10 % of the number of wires,
hydrophone group spacing adjustment blocks or
internal depth limiting devices that are adjustable or
that control more than one hydrophone group.
3. Heading sensors specified in 6A001.a.2.d.;
4. Longitudinally reinforced array hoses;5. An assembled array of less than 40 mm in diameter;6. Multiplexed hydrophone group signals designed to
operate at depths exceeding 35 m or having an
adjustable or removable depthsensing device in order
to operate at depths exceeding 35 m;
or
7. Hydrophone characteristics specified in 6A001.a.2.a.;
c. Processing equipment, specially designed for towed
acoustic hydrophone arrays, having "user accessible
programmability" and time or frequency domain proces-
sing and correlation, including spectral analysis, digital
filtering and beamforming using Fast Fourier or other
transforms or processes;
d. Heading sensors having all of the following:
1. An accuracy of better than ± 0.5º; and
2. Designed to operate at depths exceeding 35 m or
having an adjustable or removable depth sensing
device in order to operate at depths exceeding 35 m;
e. Bottom or bay cable systemshaving any of the following:
1. Incorporating hydrophones specified in 6A001.a.2.a.;
or
2. Incorporating multiplexed hydrophone group signal
modules having all of the following characteristics:
a. Designed to operate at depths exceeding 35 m or
having an adjustable or removable depth sensing
deviceinordertooperateatdepthsexceeding35m;
and
b. Capable of being operationally interchanged with
towed acoustic hydrophone array modules;
f. Processing equipment, specially designed for bottom or
bay cable systems, having "user accessible program-
mability" and time or frequency domain processing and
correlation, including spectral analysis, digital filtering
and beamforming using Fast Fourier or other transforms
or processes;
b. Correlation-velocity sonar log equipment designed to measure
the horizontal speed of the equipment carrier relative to the sea
bed at distances between the carrier and the sea bed exceeding
500 m.
6A002 Optical sensors
N.B.: SEEALSO6A102.
a. Optical detectors, as follows:
Note: 6A002.a. does not control germanium or silicon
photodevices.
1. "Space-qualified" solid-state detectors, as follows:
a. "Space-qualified" solid-state detectors, having all of the
following:
1. A peak response in the wavelength range exceeding
10 nm but not exceeding 300 nm; and
2. A response of less than 0,1 % relative to the peak
response at a wavelengthexceeding 400 nm;2000R1334 — EN — 19.01.2002 — 003.001 — 145
▼M3
b. "Space-qualified" solid-state detectors, having all of the
following:
1. A peak response in the wavelength range exceeding
900 nm but not exceeding 1 200 nm; and
2. A response "time constant" of 95 ns or less;
c. "Space-qualified" solid-state detectors having a peak
responsein the wavelength range exceeding 1 200nm but
not exceeding 30000 nm;
2. Image intensifier tubes and specially designed components
therefor, as follows:
a. Image intensifier tubes having all of the following:
1. A peak response in the wavelength range exceeding
400 nm but not exceeding 1 050 nm;
2. A microchannel plate for electron image amplification
witha h ole pitch(centre-to-centre spacing) of 15 µm
or less;and
3. Photocathodes, as follows:
a. S-20, S-25 or multialkali photocathodes with a
luminous sensitivity exceeding 240 µA/lm;
b. GaAs or GaInAs photocathodes; or
c. Other III-V compound semiconductor photo-
cathodes;
Note: 6A002.a.2.a.3.c. does not control
compound semiconductor photocathodes
with a maximum radiant sensitivity of
10 mA/W or less.
b. Specially designed components, as follows:
1. Microchannel plates having a hole pitch (centre-to-
centre spacing) of 15 µm or less;
2. GaAs or GaInAs photocathodes;
3. Other III-V compound semiconductor photocathodes;
Note: 6A002.a.2.b.3. does not control compound
semiconductor photocathodes with a
maximum radiant sensitivity of 10 mA/W or
less.
3. Non-"space-qualified" "focal plane arrays", as follows:
Technical Note:
Linear or two-dimensional multi-element detector arraysare
referred to as "focal plane arrays".
Note 1: 6A002.a.3. includes photoconductive arrays and
photovoltaic arrays.
Note 2: 6A002.a.3. does not control:
a. Silicon "focal plane arrays";
b. Multi-element (not to exceed 16elements)
encapsulated photoconductive cells using
either lead sulphide or lead selenide;
c. Pyroelectric detectors using any of the
following:
1. Triglycine sulphate and variants;
2. Lead-lanthanum-zirconium titanate and
variants;
3. Lithium tantalate;
4. Polyvinylidene fluoride and variants; or
5. Strontium barium niobate and variants.
a. Non-"space-qualified" "focal plane arrays", having all of
the following:
1. Individual elements with a peak response within the
wavelengthrange exceeding 900 nm but not
exceeding 1 050 nm; and
2. A response "time constant" of less than 0,5 ns;2000R1334 — EN — 19.01.2002 — 003.001 — 146
▼M3
b. Non-"space-qualified" "focal plane arrays", having all of
the following:
1. Individual elements witha peak response in th e
wavelengthrange exceeding 1 050 nm but not
exceeding 1 200 nm; and
2. A response "time constant" of 95 ns or less;
c. Non-"space-qualified" "focal plane arrays", having indi-
vidual elements witha peak response in th e wavelength
range exceeding 1 200 nm but not exceeding 30000 nm.
b. "Monospectral imaging sensors" and "multispectral imaging
sensors" designed for remote sensing applications, having any
of the following:
1. An Instantaneous-Field-Of-View (IFOV) of less than
200 µrad (microradians); or
2. Being specified for operation in the wavelength range
exceeding 400 nm but not exceeding 30000 nm and having
all the following:
a. Providing output imaging data in digital format; and
b. Being any of the following:
1. "Space-qualified"; or
2. Designed for airborne operation, using other than
silicon detectors, and having an IFOV of less than
2,5 mrad (milliradians).
c. 'Direct view' imaging equipment operating in the visible or
infrared spectrum, incorporating any of the following:
1. Image intensifier tubes specified in 6A002.a.2.a.; or
2. "Focal plane arrays" specified in 6A002.a.3.
Technical Note:
'Direct view' refers to imaging equipment, operating in the
visible or infrared spectrum, that presents a visual image to a
human observer without converting the image into an
electronic signal for television display, and that cannot record
or store the image photographically, electronically or by any
other means.
Note: 6A002.c. does not control the following equipment
incorporating other than GaAs or GaInAs photo-
cathodes:
a. Industrial or civilian intrusion alarm, traffic or
industrial movement control or counting systems;
b. Medical equipment;
c. Industrial equipment used for inspection, sorting or
analysis of the properties of materials;
d. Flame detectors for industrial furnaces;
e. Equipment specially designed for laboratory use.
d. Special support components for optical sensors, as follows:
1. "Space-qualified" cryocoolers;
2. Non-"space-qualified" cryocoolers, having a cooling source
temperature below 218 K (− 55 ºC), as follows:
a. Closed cycle type witha specified Mean-Time-To-
Failure (MTTF), or Mean-Time-Between-Failures
(MTBF), exceeding 2 500 hours;
b. Joule-Thomson (JT) self-regulating minicoolers having
bore (outside) diameters of less than 8 mm;
3. Optical sensing fibres specially fabricated either composi-
tionally or structurally, or modified by coating, to be
acoustically, thermally, inertially, electromagnetically or
nuclear radiation sensitive.
e. "Space qualified" "focal plane arrays" having more than 2 048
elements per array and having a peak response in the
wavelengthrange exceeding 300 nm but not exceeding 900 nm.
6A003 Cameras2000R1334 — EN — 19.01.2002 — 003.001 — 147
▼M3
N.B.: SEEALSO6A203.
N.B.: For cameras specially designed or modified for under-
water use, see 8A002.d. and 8A002.e.
a. Instrumentation cameras and specially designed components
therefor, as follows:
Note: Instrumentation cameras, specified in 6A003.a.3. to
6A003.a.5., with modular structures should be eval-
uated by their maximum capability, using plug-ins
available according to the camera manufacturer's
specifications.
1. High-speed cinema recording cameras using any film format
from 8 mm to 16 mm inclusive, in which the film is
continuously advanced throughout the recording period, and
that are capable of recording at framing rates exceeding
13150 frames/s;
Note: 6A003.a.1. does not control cinema recording
cameras designed for civil purposes.
2. Mechanical high speed cameras, in which the film does not
move, capable of recording at rates exceeding
1 000000 frames/s for the full framing height of 35 mm
film, or at proportionately higher rates for lesser frame
heights, or at proportionately lower rates for greater frame
heights;
3. Mechanical or electronic streak cameras having writing
speeds exceeding 10 mm/µs;
4. Electronic framing cameras having a speed exceeding
1 000000 frames/s;
5. Electronic cameras, having all of the following:
a. An electronic shutter speed (gating capability) of less
than 1 µs per full frame; and
b. A read out time allowing a framing rate of more than 125
full frames per second.
6. Plug-ins, having all of the following characteristics:
a. Specially designed for instrumentation cameras which
have modular structures and which are specified in
6A003.a.; and
b. Enabling these cameras to meet the characteristics
specified in 6A003.a.3., 6A003.a.4., or 6A003.a.5.,
according to the manufacturer's specifications.
b. Imaging cameras, as follows:
Note: 6A003.b. does not control television or video cameras
specially designed for television broadcasting.
1. Video cameras incorporating solid state sensors, having any
of the following:
a. More than 4 × 106"active pixels" per solid state array for
monochrome (black and white) cameras;
b. More than 4 × 106"active pixels" per solid state array for
colour cameras incorporating three solid state arrays; or
c. More than 12 × 106"active pixels" for solid state array
colour cameras incorporating one solid state array;
Technical Note:
For the purpose of this entry, digital video cameras should
be evaluated by the maximum number of "active pixels" used
for capturing moving images.
2. Scanning cameras and scanning camera systems, having all
of the following:
a. Linear detector arrays withmore th an 8 192 elements per
array;and
b. Mechanical scanning in one direction;
3. Imaging cameras incorporating image intensifier tubes
specified in 6A002.a.2.a.;
4. Imaging cameras incorporating "focal plane arrays" speci-
fied in 6A002.a.3.2000R1334 — EN — 19.01.2002 — 003.001 — 148
▼M3
Note: 6A003.b.4. does not control imaging cameras
incorporating linear "focal plane arrays" with
twelve elements or fewer, not employing time-
delay-and-integration within the element, designed
for any of the following:
a. Industrial or civilian intrusion alarm, traffic or
industrial movement control or counting
systems;
b. Industrial equipment used for inspection or
monitoring of heat flows in buildings, equipment
or industrial processes;
c. Industrial equipment used for inspection,
sorting or analysis of the properties of mate-
rials;
d. Equipment specially designed for laboratory
use;or
e. Medical equipment.
6A004 Optics
a. Optical mirrors (reflectors), as follows:
1. "Deformable mirrors" having either continuous or multi-
element surfaces, and specially designed components
therefor, capable of dynamically repositioning portions of
the surface of the mirror at rates exceeding 100 Hz;
2. Lightweight monolithic mirrors having an average "equiva-
lent density" of less than 30 kg/m2and a total mass
exceeding 10 kg;
3. Lightweight "composite" or foam mirror structures having
an average "equivalent density" of less than 30 kg/m2and a
total mass exceeding 2 kg;
4. Beam steering mirrors more than 100 mm in diameter or
lengthof major axis, wh ichmaintain a flatness of lambda/2
or better (lambda is equal to 633 nm) having a control
bandwidthexceeding 100 Hz.
b. Optical components made from zinc selenide (ZnSe) or zinc
sulphide (ZnS) with transmission in the wavelength range
exceeding 3 000 nm but not exceeding 25000 nm and having
any of the following:
1. Exceeding 100 cm3in volume; or
2. Exceeding 80 mm in diameter or lengthof major axis and
20 mm in thickness (depth).
c. "Space-qualified" components for optical systems, as follows:
1. Lightweighted to less than 20 % "equivalent density"
compared witha solid blank of th e same aperture and
thickness;
2. Raw substrates, processed substrates having surface coatings
(single-layer or multi-layer, metallic or dielectric,
conducting, semiconducting or insulating) or having protec-
tive films;
3. Segments or assemblies of mirrors designed to be assembled
in space into an optical system witha collecting aperture
equivalent to or larger than a single optic 1 m in diameter;
4. Manufactured from "composite" materials having a coeffi-
cient oflinear thermal expansionequaltoorlessthan5×10−
6in any coordinate direction.
d. Optical control equipment, as follows:
1. Specially designed to maintain the surface figure or
orientation of the "space-qualified" components specified
in 6A004.c.1. or 6A004.c.3.;
2. Having steering, tracking, stabilisation or resonator align-
ment bandwidths equal to or more than 100 Hz and an
accuracy of 10 µrad (microradians) or less;
3. Gimbals having all of the following:
a. A maximum slew exceeding 5º;
b. A bandwidthof 100 Hz or more;2000R1334 — EN — 19.01.2002 — 003.001 — 149
▼M3
c. Angular pointing errors of 200 µrad (microradians) or
less;and
d. Having any of the following:
1. Exceeding 0,15 m but not exceeding 1 m in diameter
or major axis lengthand capable of angular accelera-
tions exceeding 2 rad (radians)/s2;or
2. Exceeding 1 m in diameter or major axis lengthand
capable of angular accelerations exceeding 0,5 rad
(radians)/s2;
4. Specially designed to maintain the alignment of phased
array or phased segment mirror systems consisting of
mirrors witha segment diameter or major axis lengthof
1 m or more.
e. 'Aspheric optical elements' having all of the following
characteristics:
1. The largest dimension of the optical-aperture is greater than
400 mm;
2. The surface roughness is less than 1 nm (rms) for sampling
lengths equal to or greater than 1 mm; and
3. The coefficient of linear thermal expansion's absolute
magnitude is less than 3 × 10−6/K at 25 ºC.
Technical Notes:
1. An 'aspheric optical element' is any element used in an
optical system whose imaging surface or surfaces are
designed to depart from the shape of an ideal sphere.
2. Manufacturers are not required to measure the surface
roughness listed in 6A004.e.2. unless the optical element
was designed or manufactured with the intent to meet, or
exceed, the control parameter.
Note: 6A004.e. does not control aspheric optical
elements having any of the following:
a. A largest optical-aperture dimension less
than 1 m and a focal length to aperture ratio
equal to or greater than 4,5:1;
b. A largest optical-aperture dimension equal to
or greater than 1 m and a focal length to
aperture ratio equal to or greater than 7:1;
c. Being designed as Fresnel, flyeye, stripe,
prism or diffractive optical elements;
d. Being fabricated from borosilicate glass
having a coefficient of linear thermal expan-
sion greater than 2,5 × 10−6/K at 25 ºC; or
e. Being an x-ray optical element having inner
mirror capabilities (e.g. tube-type mirrors).
N.B.: For aspheric optical elements specially designed
for lithography equipment, see 3B001.
6A005 "Lasers", other than those specified in 0B001.g.5. or 0B001.h.6.,
components and optical equipment, as follows:
N.B.: SEEALSO6A205.
Note 1: Pulsed "lasers" include those that run in a continuous
wave (CW) mode with pulses superimposed.
Note 2: Pulse-excited "lasers" include those that run in a
continuously excited mode with pulse excitation super-
imposed.
Note 3: The control status of Raman "lasers" is determined by
the parameters of the pumping source "lasers". The
pumping source "lasers" can be any of the "lasers"
described below.
a. Gas "lasers", as follows:
1. Excimer "lasers", having any of the following:
a. An output wavelengthnot exceeding 150 nm and h aving
any of the following:
1. An output energy exceeding 50 mJ per pulse; or2000R1334 — EN — 19.01.2002 — 003.001 — 150
▼M3
2. An average output power exceeding 1 W;
b. An output wavelengthexceeding 150 nm but not
exceeding 190 nm and having any of the following:
1. An output energy exceeding 1,5 J per pulse; or
2. An average output power exceeding 120 W;
c. An output wavelengthexceeding 190 nm but not
exceeding 360 nm and having any of the following:
1. An output energy exceeding 10 J per pulse; or
2. An average output power exceeding 500 W; or
d. An output wavelengthexceeding 360 nm and h aving any
of the following:
1. An output energy exceeding 1,5 J per pulse; or
2. An average output power exceeding 30 W;
Note: For eximer "lasers" specially designed for
lithography equipment, see 3B001.
2. Metal vapour "lasers", as follows:
a. Copper (Cu) "lasers" having an average output power
exceeding 20 W;
b. Gold (Au) "lasers" having an average output power
exceeding 5 W;
c. Sodium (Na) "lasers" having an output power exceeding
5W ;
d. Barium (Ba) "lasers" having an average output power
exceeding 2 W;
3. Carbon monoxide (CO) "lasers" having any of the
following:
a. An output energy exceeding 2 J per pulse and a pulsed
"peak power" exceeding 5 kW; or
b. An average or CW output power exceeding 5 kW;
4. Carbon dioxide (CO2) "lasers" having any of the following:
a. A CW output power exceeding 15 kW;
b. A pulsed output having a "pulse duration" exceeding
10 µs and having any of the following:
1. An average output power exceeding 10 kW; or
2. A pulsed "peak power" exceeding 100 kW; or
c. A pulsed output having a "pulse duration" equal to or less
than 10 µs; and having any of the following:
1. A pulse energy exceeding 5 J per pulse; or
2. An average output power exceeding 2,5 kW;
5. "Chemical lasers", as follows:
a. Hydrogen Fluoride (HF) "lasers";
b. Deuterium Fluoride (DF) "lasers";
c. "Transfer lasers", as follows:
1. Oxygen Iodine (O2-I) "lasers";
2. Deuterium Fluoride-Carbon dioxide (DF-CO2)
"lasers";
6. Krypton ion or argon ion "lasers" having any of the
following:
a. An output energy exceeding 1,5 J per pulse and a pulsed
"peak power" exceeding 50 W; or
b. An average or CW output power exceeding 50 W;
7. Other gas "lasers", having any of the following:
Note: 6A005.a.7. does not control nitrogen "lasers".
a. An output wavelengthnot exceeding 150 nm and h aving
any of the following:
1. An output energy exceeding 50 mJ per pulse and a
pulsed "peak power" exceeding 1 W; or2000R1334 — EN — 19.01.2002 — 003.001 — 151
▼M3
2. An average or CW output power exceeding 1 W;
b. An output wavelengthexceeding 150 nm but not
exceeding 800 nm and having any of the following:
1. An output energy exceeding 1,5 J per pulse and a
pulsed "peak power" exceeding 30 W; or
2. An average or CW output power exceeding 30 W;
c. An output wavelengthexceeding 800 nm but not
exceeding 1 400 nm and having any of the following:
1. An output energy exceeding 0,25 J per pulse and a
pulsed "peak power" exceeding 10 W; or
2. An average or CW output power exceeding 10 W; or
d. An output wavelengthexceeding 1 400 nm and an
average or CW output power exceeding 1 W.
b. Semiconductor "lasers", as follows:
1. Individual single-transverse mode semiconductor "lasers",
having all of the following:
a. A wavelength of less than 950 nm or mor than 2000 nm;
and
b. An average or CW output power exceeding 100 mW;
2. Individual, multiple-transverse mode semiconductor
"lasers", having all of the following:
a. Awavelength oflessthan950nmormorethan2 000nm;
and
b. An average or CW output power exceeding 10 W;
3. Individual arrays of semiconductor "lasers", having all of the
following:
a. A wavelengthof less th an 950 nm and an average or CW
output power exceeding 60 W; or
b. A wavelengthequal to or greater th an 2 000 nm and an
average or CW output power exceeding 10 W;
Technical Note:
Semiconductor "lasers" are commonly called "laser" diodes.
Note 1: 6A005.b. includes semiconductor "lasers" having
optical output connectors (e.g. fibre optic pigtails).
Note 2: The control status of semiconductor "lasers"
specially designed forother equipment is determined
by the control status of the other equipment.
c. Solid state "lasers", as follows:
1. "Tunable" "lasers" having any of the following:
Note: 6A005.c.1. includes titanium — sapphire (Ti:
Al2O3), thulium — YAG (Tm: YAG), thulium —
YSGG (Tm: YSGG), alexandrite (Cr: BeAl2O4) and
colour centre "lasers".
a. An output wavelength less than 600 nm and having any
of the following:
1. An output energy exceeding 50 mJ per pulse and a
pulsed "peak power" exceeding 1 W; or
2. An average or CW output power exceeding 1 W;
b. An output wavelengthof 600 nm or more but not
exceeding 1 400 nm and having any of the following:
1. An output energy exceeding 1 J per pulse and a pulsed
"peak power" exceeding 20 W; or
2. An average or CW output power exceeding 20 W; or
c. An output wavelengthexceeding 1 400 nm and h aving
any of the following:
1. An output energy exceeding 50 mJ per pulse and a
pulsed "peak power" exceeding 1 W; or
2. An average or CW output power exceeding 1 W;
2. Non-"tunable" "lasers", as follows:2000R1334 — EN — 19.01.2002 — 003.001 — 152
▼M3
Note: 6A005.c.2. includes atomic transition solid state
"lasers".
a. Neodymium glass "lasers", as follows:
1. "Q-switched lasers" having any of the following:
a. An output energy exceeding 20 J but not exceeding
50 J per pulse and an average output power
exceeding 10 W; or
b. An output energy exceeding 50 J per pulse;
2. Non-"Q-switched lasers" having any of the following:
a. An output energy exceeding 50 J but not exceeding
100 J per pulse and an average output power
exceeding 20 W; or
b. An output energy exceeding 100 J per pulse;
b. Neodymium-doped (other than glass) "lasers", having an
output wavelengthexceeding 1000 nm but not exceeding
1 100 nm, as follows:
Note: For neodymium-doped (other than glass)
"lasers" having an output wavelength not
exceeding 1 000 nm or exceeding 1 100 nm,
see 6A005.c.2.c.
1. Pulse-excited, mode-locked, "Q-switched lasers"
having a "pulse duration" of less than 1 ns and having
any of the following:
a. A "peak power" exceeding 5 GW;
b. An average output power exceeding 10 W; or
c. A pulsed energy exceeding 0,1 J;
2. Pulse-excited, "Q-switched lasers" having a "pulse
duration equal" to or more than 1 ns, and having any
of the following:
a. A single-transverse mode output having:
1. A "peak power" exceeding 100 MW;
2. An average output power exceeding 20 W; or
3. A pulsed energy exceeding 2 J; or
b. A multiple-transverse mode output having:
1. A "peak power" exceeding 400 MW;
2. An average output power exceeding 2 kW; or
3. A pulsed energy exceeding 2 J;
3. Pulse-excited, non-"Q-switched lasers", having:
a. A single-transverse mode output having:
1. A "peak power" exceeding 500 kW; or
2. An average output power exceeding 150 W; or
b. A multiple-transverse mode output having:
1. A "peak power" exceeding 1 MW; or
2. An average power exceeding 2 kW;
4. Continuously excited "lasers" having:
a. A single-transverse mode output having:
1. A "peak power" exceeding 500 kW; or
2. An average or CW output power exceeding
150 W;or
b. A multiple-transverse mode output having:
1. A "peak power" exceeding 1 MW; or
2. An average or CW output power exceeding
2 kW;2000R1334 — EN — 19.01.2002 — 003.001 — 153
▼M3
c. Other non-"tunable" "lasers", having any of the
following:
1. A wavelength less than 150 nm and having any of the
following:
a. An output energy exceeding 50 mJ per pulse and a
pulsed "peak power" exceeding 1 W; or
b. An average or CW output power exceeding 1 W;
2. A wavelengthof 150 nm or more but not exceeding
800 nm and having any of the following:
a. An output energy exceeding 1,5 J per pulse and a
pulsed "peak power" exceeding 30 W; or
b. An average or CW output power exceeding 30 W;
3. A wavelengthexceeding 800 nm but not exceeding
1 400 nm, as follows:
a. "Q-switched lasers" having:
1. An output energy exceeding 0,5 J per pulse and
a pulsed "peak power" exceeding 50 W; or
2. An average output power exceeding:
a. 10 W for single-transverse mode "lasers";
b. 30 W for multiple-transverse mode "lasers";
b. Non-"Q-switched lasers" having:
1. An output energy exceeding 2 J per pulse and a
pulsed "peak power" exceeding 50 W; or
2. An average or CW output power exceeding
50 W;or
4. A wavelengthexceeding 1 400 nm and h aving any of
the following:
a. An output energy exceeding 100 mJ per pulse and
a pulsed "peak power" exceeding 1 W; or
b. An average or CW output power exceeding 1 W;
d. Dye and other liquid "lasers", having any of the following:
1. A wavelengthless th an 150 nm and:
a. An output energy exceeding 50 mJ per pulse and a pulsed
"peak power" exceeding 1 W; or
b. An average or CW output power exceeding 1 W;
2. A wavelengthof 150 nm or more but not exceeding 800 nm
and having any of the following:
a. An output energy exceeding 1,5 J per pulse and a pulsed
"peak power" exceeding 20 W;
b. An average or CW output power exceeding 20 W; or
c. A pulsed single longitudinal mode oscillator having an
average output power exceeding 1 W and a repetition rate
exceeding 1 kHz if the "pulse duration" is less than
100 ns;
3. Awavelengthexceeding 800nmbutnotexceeding 1 400nm
and having any of the following:
a. An output energy exceeding 0,5 J per pulse and a pulsed
"peak power" exceeding 10 W; or
b. An average or CW output power exceeding 10 W; or
4. A wavelength exceeding 1 400 nm and having any of the
following:
a. An output energy exceeding 100 mJ per pulse and a
pulsed "peak power" exceeding 1 W; or
b. An average or CW output power exceeding 1 W;
e. Components, as follows:
1. Mirrors cooled either by 'active cooling' or by heat pipe
cooling;2000R1334 — EN — 19.01.2002 — 003.001 — 154
▼M3
Technical Note:
'Active cooling' is a cooling technique for optical compo-
nents using flowing fluids within the subsurface (nominally
less than 1 mm below the optical surface) of the optical
component to remove heat from the optic.
2. Optical mirrors or transmissive or partially transmissive
optical or electro-optical components specially designed for
use withcontrolled "lasers";
f. Optical equipment, as follows:
Note: For shared aperture optical elements, capable of
operating in "Super-High Power Laser" ("SHPL")
applications, see the Military Goods Lists.
1. Dynamic wavefront (phase) measuring equipment capable of
mapping at least 50 positions on a beam wavefront having
any of the following:
a. Frame rates equal to or more than 100 Hz and phase
discrimination of at least 5 % of the beam's wavelength;
or
b. Frame rates equal to or more than 1000 Hz and phase
discrimination of at least 20 % of the beam's wavelength;
2. "Laser" diagnostic equipment capable of measuring "SHPL"
system angular beam steering errors of equal to or less than
10 µrad;
3. Optical equipment and components specially designed for a
phased-array "SHPL" system for coherent beam combina-
tion to an accuracy of lambda/10 at the designed
wavelength, or 0,1 µm, whichever is the smaller;
4. Projection telescopes specially designed for use with
"SHPL" systems.
6A006 "Magnetometers", "magnetic gradiometers", "intrinsic magnetic
gradiometers" and compensation systems, and specially designed
components therefor, as follows:
Note: 6A006 does not control instruments specially designed
for biomagnetic measurements for medical diagnostics.
a. "Magnetometers" using "superconductive", optically pumped or
nuclear precession (proton/Overhauser) "technology" having a
"noise level" (sensitivity) lower (better) than 0,05 nT rms per
square root Hz;
b. Induction coil "magnetometers" having a "noise level"
(sensitivity) lower (better) than any of the following:
1. 0,05 nT rms/square root Hz at frequencies of less than 1 Hz;
2. 1 × 10−3nT rms/square root Hz at frequencies of 1 Hz or
more but not exceeding 10 Hz; or
3. 1 × 10−4nT rms/square root Hz at frequencies exceeding
10 Hz;
c. Fibre optic "magnetometers" having a "noise level" (sensitivity)
lower (better) than 1 nT rms per square root Hz;
d. "Magnetic gradiometers" using multiple "magnetometers"
specified in 6A006.a., 6A006.b. or 6A006.c.;
e. Fibre optic "intrinsic magnetic gradiometers" having a
magnetic gradient field "noise level" (sensitivity) lower (better)
than 0,3 nT/m rms per square root Hz;
f. "Intrinsic magnetic gradiometers", using "technology" other
than fibre-optic "technology", having a magnetic gradient field
"noise level" (sensitivity) lower (better) than 0,015 nT/m rms
per square root Hz;
g. Magnetic compensation systems for magnetic sensors designed
for operation on mobile platforms;
h. "Superconductive" electromagnetic sensors, containing compo-
nents manufactured from "superconductive" materials and
having all of the following:
1. Being designed for operation at temperatures below the
"critical temperature" of at least one of their "super-
conductive" constituents (including Josephson effect2000R1334 — EN — 19.01.2002 — 003.001 — 155
▼M3
devices or "superconductive" quantum interference devices
(SQUIDS));
2. Being designed for sensing electromagnetic field variations
at frequencies of 1 kHz or less; and:
3. Having any of the following characteristics:
a. Incorporating thin-film SQUIDS with a minimum feature
size of less than 2 µm and with associated input and
output coupling circuits;
b. Designed to operate witha magnetic field slew rate
exceeding 1 × 106magnetic flux quanta per second;
c. Designed to function without magnetic shielding in the
earth's ambient magnetic field; or
d. Having a temperature coefficient less (smaller) than 0,1
magnetic flux quantum/K.
6A007 Gravity meters (gravimeters) and gravity gradiometers, as follows:
N.B.: SEEALSO6A107.
a. Gravity meters designed or modified for ground use having a
static accuracy of less (better) than 10 µgal;
Note: 6A007.a. does not control groundgravity meters of the
quartz element (Worden) type.
b. Gravity meters designed for mobile platforms, having all of the
following:
1. A static accuracy of less (better) than 0,7 mgal; and
2. An in-service (operational) accuracy of less (better) than 0,7
mgal having a time-to-steady-state registration of less than 2
minutes under any combination of attendant corrective
compensations and motional influences;
c. Gravity gradiometers.
6A008 Radar systems, equipment and assemblies having any of the
following characteristics, and specially designed components
therefor:
N.B.: SEEALSO6A108.
Note: 6A008 does not control:
a. Secondary surveillance radar (SSR);
b. Car radar designed for collision prevention;
c. Displays or monitors used for air traffic control (ATC)
having no more than 12 resolvable elements per mm;
d. Meteorological (weather) radar.
a. Operating at frequencies from 40 GHz to 230 GHz and having
an average output power exceeding 100 mW;
b. Having a tunable bandwidthexceeding ± 6,25 % of th e 'centre
operating frequency';
Technical Note:
The 'centre operating frequency' equals one half of the sum of
the highest plus the lowest specified operating frequencies.
c. Capable of operating simultaneously on more than two carrier
frequencies;
d. Capable of operating in synthetic aperture (SAR), inverse
synthetic aperture (ISAR) radar mode, or sidelooking airborne
(SLAR) radar mode;
e. Incorporating "electronically steerable phased array antennae";
f. Capable of heightfinding non-cooperative targets;
Note: 6A008.f. does not control precision approach radar
(PAR) equipment conforming to ICAO standards.
g. Specially designed for airborne (balloon or airframe mounted)
operation and having Doppler "signal processing" for the
detection of moving targets;
h. Employing processing of radar signals using any of the
following:
1. "Radar spread spectrum" techniques; or2000R1334 — EN — 19.01.2002 — 003.001 — 156
▼M3
2. "Radar frequency agility" techniques;
i. Providing ground-based operation witha maximum "instru-
mented range" exceeding 185 km;
Note: 6A008.i. does not control:
a. Fishing ground surveillance radar;
b. Ground radar equipment specially designed for
enroute air traffic control, provided that all the
following conditions are met:
1. It has a maximum "instrumented range" of
500 km or less;
2. It is configured so that radar target data can be
transmitted only one way from the radar site to
one or more civil ATC centres;
3. It contains no provisions for remote control of
the radar scan rate from the enroute ATC
centre;and
4. It is to be permanently installed;
c. Weather balloon tracking radars.
j. Being "laser" radar or Light Detection and Ranging (LIDAR)
equipment, having any of the following:
1. "Space-qualified"; or
2. Employing coherent heterodyne or homodyne detection
techniques and having an angular resolution of less (better)
than 20 µrad (microradians);
Note: 6A008.j. does not control LIDAR equipment specially
designed for surveying or for meteorological observa-
tion.
k. Having "signal processing" sub-systems using "pulse compres-
sion", withany of th e following:
1. A "pulse compression" ratio exceeding 150; or
2. A pulse widthof less th an 200 ns; or
l. Having data processing sub-systems withany of th e following:
1. "Automatic target tracking" providing, at any antenna
rotation, the predicted target position beyond the time of
the next antenna beam passage;
Note: 6A008.l.1. does not control conflict alert capability
in ATC systems, or marine or harbour radar.
2. Calculation of target velocity from primary radar having
non-periodic (variable) scanning rates;
3. Processing for automatic pattern recognition (feature
extraction) and comparison withtarget ch aracteristic data
bases (waveforms or imagery) to identify or classify targets;
or
4. Superposition and correlation, or fusion, of target data from
two or more "geographically dispersed" and "interconnected
radar sensors" to enhance and discriminate targets.
Note: 6A008.l.4. does not control systems, equipment and
assemblies used for marine traffic control.
6A102 Radiation hardened 'detectors', other than those specified in
6A002, specially designed or modified for protecting against
nuclear effects (e.g. electromagnetic pulse (EMP), X-rays,
combined blast and thermal effects) and usable for "missiles",
designed or rated to withstand radiation levels which meet or
exceed a total irradiation dose of 5 × 105rads (silicon).
Technical Note:
In 6A102, a 'detector' is defined as a mechanical, electrical,
optical or chemical device that automatically identifies and
records, or registers a stimulus such as an environmental change
in pressure or temperature, an electrical or electromagnetic signal
or radiation from a radioactive material. This includes devices
that sense by one time operation or failure.2000R1334 — EN — 19.01.2002 — 003.001 — 157
▼M3
6A107 Gravity meters (gravimeters) and components for gravity meters
and gravity gradiometers, as follows:
a. Gravity meters, other than those specified in 6A007.b.,
designed or modified for airborne or marine use, and having
a static or operational accuracy of 7 × 10−6m/s2(0,7 milligal)
or less (better), and having a time-to-steady-state registration of
two minutes or less;
b. Specially designed components for gravity meters specified in
6A007.b. or 6A107.a. and gravity gradiometers specified in
6A007.c.
6A108 Radar systems and tracking systems, other than those specified in
entry 6A008, as follows:
a. Radar and laser radar systems designed or modified for use in
space launchveh icles specified in 9A004 or sounding rockets
specified in 9A104;
Note: 6A108.a. includes the following:
a. Terrain contour mapping equipment;
b. Imaging sensor equipment;
c. Scene mapping and correlation (both digital and
analogue) equipment;
d. Doppler navigation radar equipment;
b. Precision tracking systems, usable for "missiles", as follows:
1. Tracking systems which use a code translator in conjunction
witheith er surface or airborne references or navigation
satellite systems to provide real-time measurements of in-
flight position and velocity;
2. Range instrumentation radars including associated optical/
infrared trackers withall of th e following capabilities:
a. Angular resolution better than 3 milliradians (0,5 mils);
b. Range of 30 km or greater witha range resolution better
than 10 m rms;
c. Velocity resolution better than 3 m/s.
6A202 Photomultiplier tubes having both of the following characteristics:
a. Photocathode area of greater than 20 cm2;and
b. Anode pulse rise time of less than 1 ns.
6A203 Cameras and components, other than those specified in 6A003, as
follows:
a. Mechanical rotating mirror cameras, as follows, and specially
designed components therefor:
1. Framing cameras withrecording rates greater th an 225000
frames per second;
2. Streak cameras withwriting speeds greater th an 0,5 mm per
microsecond;
Note: In 6A203.a. components of such cameras include their
synchronising electronics units and rotor assemblies
consisting of turbines, mirrors and bearings.
b. Electronic streak cameras, electronic framing cameras, tubes
and devices, as follows:
1. Electronic streak cameras capable of 50 ns or less time
resolution;
2. Streak tubes for cameras specified in 6A203.b.1.;3. Electronic (or electronically shuttered) framing cameras
capable of 50 ns or less frame exposure time;
4. Framing tubes and solid-state imaging devices for use with
cameras specified in 6A203.b.3., as follows:
a. Proximity focused image intensifier tubes having the
photocathode deposited on a transparent conductive
coating to decrease photocathode sheet resistance;
b. Gate silicon intensifier target (SIT) videcon tubes, where
a fast system allows gating the photoelectrons from the
photocathode before they impinge on the SIT plate;2000R1334 — EN — 19.01.2002 — 003.001 — 158
▼M3
c. Kerr or Pockels cell electro-optical shuttering;
d. Other framing tubes and solid-state imaging devices
having a fast-image gating time of less than 50 ns
specially designed for cameras specified in 6A203.b.3.;
c. Radiation-hardened TV cameras, or lenses therefor, specially
designed or rated as radiation hardened to withstand a total
radiation dose greater than 50 × 103Gy (silicon) (5 × 106rad
(silicon)) without operational degradation.
Technical Note:
The term Gy (silicon) refers to the energy in Joules per
kilogram absorbed by an unshielded silicon sample when
exposed to ionising radiation.
6A205 "Lasers", "laser" amplifiers and oscillators, other than those
specified in 0B001.g.5., 0B001.h.6. and 6A005; as follows:
a. Argon ion "lasers" having both of the following characteristics:
1. Operating at wavelengths between 400 nm and 515 nm; and
2. An average output power greater than 40 W;
b. Tunable pulsed single-mode dye laser oscillators having all of
the following characteristics:
1. Operating at wavelengths between 300 nm and 800 nm;
2. An average output power greater than 1 W;
3. A repetition rate greater than 1 kHz; and
4. Pulse widthless th an 100 ns;
c. Tunable pulsed dye laser amplifiers and oscillators, having all
of the following characteristics:
1. Operating at wavelengths between 300 nm and 800 nm;
2. An average output power greater than 30 W;
3. A repetition rate greater than 1 kHz; and
4. Pulse widthless th an 100 ns;
Note: 6A205.c. does not control single mode oscillators;
d. Pulsed carbon dioxide "lasers" having all of the following
characteristics:
1. Operating at wavelengths between 9 000 nm and 11000 nm;
2. A repetition rate greater than 250 Hz;
3. An average output power greater than 500 W; and
4. Pulse widthof less th an 200 ns;
e. Para-hydrogen Raman shifters designed to operate at 16
micrometre output wavelengthand at a repetition rate greater
than 250 Hz;
f. Pulse-excited, Q-switched neodymium-doped (other than glass)
"lasers", having all of the following characteristics:
1. An output wavelengthexceeding 1 000 nm but not
exceeding 1 100 nm;
2. A pulse duration equal to or more than 1 ns; and
3. A multiple-transverse mode output having an average power
exceeding 50 W.
6A225 Velocity interferometers for measuring velocities exceeding 1 km/
s during time intervals of less than 10 microseconds.
Note: 6A225 includes velocity interferometers such as VISARs
(Velocity interferometer systems for any reflector) and
DLIs (Doppler laser interferometers).
6A226 Pressure sensors, as follows:
a. Manganin gauges for pressures greater than 10 GPa;
b. Quartz pressure transducers for pressures greater than 10 GPa.2000R1334 — EN — 19.01.2002 — 003.001 — 159
▼M3
6B Test,InspectionandProductionEquipment
6B004 Optical equipment, as follows:
a. Equipment for measuring absolute reflectance to an accuracy of
± 0,1 % of the reflectance value;
b. Equipment other than optical surface scattering measurement
equipment, having an unobscured aperture of more than 10 cm,
specially designed for the non-contact optical measurement of a
non-planar optical surface figure (profile) to an "accuracy" of
2 nm or less (better) against the required profile.
Note: 6B004 does not control microscopes.
6B007 Equipment to produce, align and calibrate land-based gravity
meters witha static accuracy of better th an 0,1 mgal.
6B008 Pulse radar cross-section measurement systems having transmit
pulse widths of 100 ns or less and specially designed components
therefor.
N.B.: SEEALSO6B108.
6B108 Systems, other than those specified in 6B008, specially designed
for radar cross section measurement usable for "missiles" and their
subsystems.2000R1334 — EN — 19.01.2002 — 003.001 — 160
▼M3
6C Materials
6C002 Optical sensor materials, as follows:
a. Elemental tellurium (Te) of purity levels of 99,9995 % or more;
b. Single crystals (including epitaxial wafers) of any of the
following:
1. Cadmium zinc telluride (CdZnTe) withzinc content of less
than 6 % by 'mole fraction';
2. Cadmium telluride (CdTe) of any purity level; or
3. Mercury cadmium telluride (HgCdTe) of any purity level.
Technical Note:
'Mole fraction' is defined as the ratio of moles ZnTe to the sum
of moles CdTe and ZnTe present in the crystal.
6C004 Optical materials, as follows:
a. Zinc selenide (ZnSe)and zinc sulphide (ZnS)"substrate blanks"
produced by the chemical vapour deposition process, having
any of the following:
1. A volume greater than 100 cm3;or
2. A diameter greater than 80 mm having a thickness of 20 mm
or more;
b. Boules of the following electro-optic materials:
1. Potassium titanyl arsenate (KTA);
2. Silver gallium selenide (AgGaSe2);
3. Thallium arsenic selenide (Tl3AsSe3, also known as TAS);
c. Non-linear optical materials, having all of the following:
1. Third order susceptibility (chi 3) of 10−6m2/V2or more;and
2. A response time of less than 1 ms;
d. "Substrate blanks" of silicon carbide or beryllium beryllium
(Be/Be) deposited materials exceeding 300 mm in diameter or
major axis length;
e. Glass, including fused silica, phosphate glass, fluorophosphate
glass, zirconium fluoride (ZrF4) and hafnium fluoride (HfF4),
having all of the following:
1. A hydroxyl ion (OH-) concentration of less than 5 ppm;
2. Integrated metallic purity levels of less than 1 ppm; and
3. High homogeneity (index of refraction variance) less than
5×1 0−6;
f. Synthetically produced diamond material with an absorption of
less than 10−5cm−1for wavelengths exceeding 200 nm but not
exceeding 14000 nm.
6C005 Synthetic crystalline "laser" host material in unfinished form, as
follows:
a. Titanium doped sapphire;
b. Alexandrite.2000R1334 — EN — 19.01.2002 — 003.001 — 161
▼M3
6D Software
6D001 "Software" specially designed for the "development" or "produc-
tion" of equipment specified in 6A004, 6A005, 6A008 or 6B008.
6D002 "Software" specially designed for the "use" of equipment specified
in 6A002.b., 6A008 or 6B008.
6D003 Other "software", as follows:
a. 1. "Software" specially designed for acoustic beam forming for
the "real time processing" of acoustic data for passive
reception using towed hydrophone arrays;
2. "Source code" for the "real time processing" of acoustic data
for passive reception using towed hydrophone arrays;
3. "Software" specially designed for acoustic beam forming for
"real time processing" of acoustic data for passive reception
using bottom or bay cable systems;
4. "Source code" for "real time processing" of acoustic data for
passive reception using bottom or bay cable systems;
b. 1. "Software" specially designed for magnetic compensation
systems for magnetic sensors designed to operate on mobile
platforms;
2. "Software" specially designed for magnetic anomaly detec-
tion on mobile platforms;
c. "Software" specially designed to correct motional influences of
gravity meters or gravity gradiometers;
d. 1. Air Traffic Control "software" application "programmes"
hosted on general purpose computers located at Air Traffic
Control centres and capable of any of the following:
a. Processing and displaying more than 150 simultaneous
"system tracks"; or
b. Accepting radar target data from more than four primary
radars;
2. "Software" for the design or "production" of radomes which:
a. Are specially designed to protect the "electronically
steerable phased array antennae" specified in 6A008.e.;
and
b. Result in an antenna pattern having an 'average side lobe
level' more than 40 dB below the peak of the main beam
level.
Technical Note:
'Average side lobe level' in 6D003.d.2.b. is measured
over the entire array excluding the angular extent of the
main beam and the first two side lobes on either side of
the main beam.
6D102 "Software" specially designed or modified for the "use" of goods
specified in 6A108.
6D103 "Software" which processes post-flight, recorded data, enabling
determination of vehicle position throughout its flight path,
specially designed or modified for "missiles".2000R1334 — EN — 19.01.2002 — 003.001 — 162
▼M3
6E Technology
6E001 "Technology" according to the General Technology Note for the
"development" of equipment, materials or "software" specified in
6A, 6B, 6C or 6D.
6E002 "Technology" according to the General Technology Note for the
"production" of equipment or materials specified in 6A, 6B or 6C.
6E003 Other "technology", as follows:
a. 1. Optical surface coating and treatment "technology"
"required" to achieve uniformity of 99,5 % or better for
optical coatings 500 mm or more in diameter or major axis
lengthand witha total loss (absorption and scatter) of less
than 5 × 10−3;
N.B.: SEEALSO2E003.f.
2. Optical fabrication "technology" using single point diamond
turning techniques to produce surface finish accuracies of
better than 10 nm rms on non-planar surfaces exceeding
0,5 m2;
b. "Technology" "required" for the "development", "production"
or "use" of specially designed diagnostic instruments or targets
in test facilities for "SHPL" testing or testing or evaluation of
materials irradiated by "SHPL" beams;
c. "Technology" "required" for the "development" or "production"
of fluxgate "magnetometers" or fluxgate "magnetometer"
systems, having any of the following:
1. A "noise level" of less than 0,05 nT rms per square root Hz
at frequencies of less than 1 Hz; or
2. A "noise level" of less than 1 × 10−3nT rms per square root
Hz at frequencies of 1 Hz or more.
6E101 "Technology" according to the General Technology Note for the
"use" of equipment or "software" specified in 6A002, 6A007.b.
and c., 6A008, 6A102, 6A107, 6A108, 6B108, 6D102 or 6D103.
Note: 6E101 only specifies "technology" for equipment speci-
fied in 6A008 when it is designed for airborne
applications and is usable in "missiles".
6E201 "Technology" according to the General Technology Note for the
"use" of equipment specified in 6A003, 6A005.a.1.c.,
6A005.a.2.a., 6A005.c.1.b., 6A005.c.2.c.2., 6A005.c.2.d.2.b.,
6A202, 6A203, 6A205, 6A225 or 6A226.2000R1334 — EN — 19.01.2002 — 003.001 — 163
▼M3
CATEGORY7
NAVIGATIONANDAVIONICS2000R1334 — EN — 19.01.2002 — 003.001 — 164
▼M3
7A Systems,EquipmentandComponents
Note 1: For automatic pilots for underwater vehicles, see
Category 8.
For radar, see Category 6.
Note 2: For inertial navigation equipment for ships or submer-
sibles see the Military Goods Controls.
7A001 Linear accelerometers designed for use in inertial navigation or
guidance systems and having any of the following characteristics,and specially designed components therefor:
N.B.: SEE ALSO 7A101. For angular or rotational accel-
erometers,see7A002.
a. A "bias" "stability" of less (better) than 130 micro g with
respect to a fixed calibration value over a period of one year;
b. A "scale factor" "stability" of less (better) than 130 ppm with
respect to a fixed calibration value over a period of one year;
or
c. Specified to function at linear acceleration levels exceeding
100 g.
7A002 Gyros, and angular or rotational accelerometers, having any of the
following characteristics, and specially designed components
therefor:
N.B.: SEEALSO7A102.
a. A "drift rate" "stability", when measured in a 1 g environment
over a period of three months and with respect to a fixed
calibration value, of:
1. Less (better) than 0,1º per hour when specified to function at
linear acceleration levels below 10 g; or
2. Less (better) than 0,5º per hour when specified to function at
linear acceleration levels from 10 g to 100 g inclusive; or
b. Specified to function at linear acceleration levels exceeding
100 g.
7A003 Inertial navigation systems (gimballed or strapdown) and inertial
equipment designed for "aircraft", land vehicle or "spacecraft" for
attitude, guidance or control having any of the following
characteristics, and specially designed components therefor:
N.B.: SEEALSO7A103.
a. Navigation error (free inertial) subsequent to normal alignment
of 0,8 nautical mile per hour (50 % Circular Error Probable
(CEP)) or less (better); or
b. Specified to function at linear acceleration levels exceeding
10 g.
Note 1: The parameters of 7A003.a. are applicable with any of
the following environmental conditions:
1. Input randomvibration with an overall magnitude of
7,7 g rms in the first half hour and a total test
duration of one and one half hour per axis in each of
the three perpendicular axes, when the random
vibration meets the following:
a. A constant power spectral density (PSD) value of
0,04 g2/Hz over a frequency interval of 15 to
1 000 Hz; and
b. The PSD attenuates with frequency from 0,04 g2/
Hz to 0,01 g2/Hz over a frequency interval from
1 000 to 2 000 Hz; or
2. A roll and yaw rate of equal to or more than
+ 2,62 radian/s (150 deg/s); or
3. According to national standards equivalent to 1. or
2. above.
Note 2: 7A003 does not control inertial navigation systems
which are certified for use on "civil aircraft" by civil
authorities of a "participating state".
7A004 Gyro-astro compasses, and other devices which derive position or
orientation by means of automatically tracking celestial bodies or2000R1334 — EN — 19.01.2002 — 003.001 — 165
▼M3
satellites, withan azimuthaccuracy of equal to or less (better) th an
5 seconds of arc.
N.B.: SEEALSO7A104.
7A005 Global navigation satellite systems (i.e. GPS or GLONASS)
receiving equipment having any of the following characteristics,
and specially designed components therefor:
N.B.: SEEALSO7A105.
a. Employing decryption; or
b. A null-steerable antenna.
7A006 Airborne altimeters operating at frequencies other than 4,2 to
4,4 GHz inclusive, having any of the following characteristics:
N.B.: SEEALSO7A106.
a. "Power management"; or
b. Using phase shift key modulation.
7A007 Direction finding equipment operating at frequencies above
30 MHz and having all of the following characteristics, and
specially designed components therefor:
a. "Instantaneous bandwidth" of 1 MHz or more;
b. Parallel processing of more than 100 frequency channels; and
c. Processing rate of more than 1 000 direction finding results per
second and per frequency channel.
7A101 Accelerometers, other than those specified in 7A001, as follows,
and withspecially designed components th erefor:
a. Accelerometers with a threshold of 0,05 g or less, or a linearity
error within 0,25 % of full scale output, or both, which are
designed for use in inertial navigation systems or in guidance
systems;
Note: 7A101.a. does not specify accelerometers which are
specially designed and developed as MWD (Measure-
ment While Drilling) Sensors for use in downhole well
service operations.
b. Continuous output accelerometers specified to function at
acceleration levels exceeding 100 g.
7A102 All types of gyros, other than those specified in 7A002, usable in
"missiles", witha rated "drift rate" "stability" of less th an 0,5 (1
sigma or rms) per hour in a 1 g environment and specially
designed components therefor.
7A103 Instrumentation, navigation equipment and systems, other than
those specified in 7A003, as follows; and specially designed
components therefor:
a. Inertial or other equipment using accelerometers specified in
7A001 or 7A101 or gyros specified in 7A002 or 7A102 and
systems incorporating suchequipment;
Note: 7A103.a. does not specify equipment containing
accelerometers specified in 7A001 where such accel-
erometers are specially designed and developed as
MWD (Measurement While Drilling) sensors for use
in down-hole well services operations.
b. Integrated flight instrument systems, which include gyrostabi-
lisers or automatic pilots, designed or modified for use in space
launchveh icles specified in 9A004 or sounding rockets
specified in 9A104.
7A104 Gyro-astro compasses and other devices, other than those specified
in 7A004, which derive position or orientation by means of
automatically tracking celestial bodies or satellites and specially
designed components therefor.
7A105 Global Positioning Systems (GPS) or similar satellite receivers,
other than those specified in 7A005, capable of providing
navigation information under the following operational conditions
and designed or modified for use in space launchveh icles
specified in 9A004 or sounding rockets specified in 9A104.
a. At speeds in excess of 515 m/s; and2000R1334 — EN — 19.01.2002 — 003.001 — 166
▼M3
b. At altitudes in excess of 18 km.
7A106 Altimeters, other than those specified in 7A006, of radar or laser
radar type, designed or modified for use in space launchveh icles
specified in 9A004 or sounding rockets specified in 9A104.
7A115 Passive sensors for determining bearing to specific electromag-
netic source (direction finding equipment) or terrain
characteristics, designed or modified for use in space launch
vehicles specified in 9A004 or sounding rockets specified in
9A104.
Note: 7A115 includes sensors for the following equipment:
a. Terrain contour mapping equipment;
b. Imaging sensor equipment (both active and passive);
c. Passive interferometer equipment.
7A116 Flight control systems, as follows; designed or modified for use in
space launchveh icles specified in 9A004 or sounding rockets
specified in 9A104.
a. Hydraulic, mechanical, electro-optical, or electro-mechanical
flight control systems (including fly-by-wire types);
b. Attitude control equipment.
7A117 "Guidance sets", usable in "missiles" capable of achieving system
accuracy of 3,33 % or less of the range (e.g., a "CEP" of 10 km or
less at a range of 300 km).2000R1334 — EN — 19.01.2002 — 003.001 — 167
▼M3
7B Test,InspectionandProductionEquipment
7B001 Test, calibration or alignment equipment specially designed for
equipment specified in 7A.
Note: 7B001 does not control test, calibration or alignment
equipment for Maintenance Level I or MaintenanceLevel II.
Technical Notes:
1. Maintenance Level I
The failure of an inertial navigation unit is detected on the
aircraft by indications from the control and display unit (CDU)
or by the status message from the corresponding sub-system. By
following the manufacturer's manual, the cause of the failure
may be localised at the level of the malfunctioning line
replaceable unit (LRU). The operator then removes the LRU
and replaces it with a spare.
2. Maintenance Level II
The defective LRU is sent to the maintenance workshop (the
manufacturer's or that of the operator responsible for Level II
maintenance). At the maintenance workshop, the malfunc-
tioning LRU is tested by various appropriate means to verify
and localise the defective shop replaceable assembly (SRA)
module responsible for the failure. This SRA is removed and
replaced by an operative spare. The defective SRA (or possibly
the complete LRU) is then shipped to the manufacturer.
Note: Maintenance Level II does not include the removal of
controlled accelerometers or gyro sensors from the
SRA.
7B002 Equipment, as follows, specially designed to characterise mirrors
for ring "laser" gyros:
N.B.: SEEALSO7B102.
a. Scatterometers having a measurement accuracy of 10 ppm or
less (better);
b. Profilometers having a measurement accuracy of 0,5 nm (5
angstrom) or less (better).
7B003 Equipment specially designed for the "production" of equipment
specified in 7A.
Note: 7B003 includes:
a. Gyro tuning test stations;
b. Gyro dynamic balance stations;
c. Gyro run-in/motor test stations;
d. Gyro evacuation and fill stations;
e. Centrifuge fixtures for gyro bearings;
f. Accelerometer axis align stations.
7B102 Reflectometers specially designed to characterise mirrors, for
"laser" gyros, having a measurement accuracy of 50 ppm or less
(better).
7B103 "Production facilities" and "production equipment" as follows:
a. "Production facilities" specially designed for equipment
specified in 7A117;
b. Production equipment, and other test, calibration and alignment
equipment, other than that specified in 7B001 to 7B003,
designed or modified to be used withequipment specified in
7A.2000R1334 — EN — 19.01.2002 — 003.001 — 168
▼M3
7C Materials
None.2000R1334 — EN — 19.01.2002 — 003.001 — 169
▼M3
7D Software
7D001 "Software" specially designed or modified for the "development"
or "production" of equipment specified in 7A. or 7B.
7D002 "Source code" for the "use" of any inertial navigation equipment
including inertial equipment not controlled by 7A003 or 7A004, orAttitude and Heading Reference Systems (AHRS).
Note: 7D002 does not control "source code" for the "use" of
gimballed AHRS.
Technical Note:
AHRS generally differ from inertial navigation systems (INS) in
that an AHRS provides attitude and heading information and
normally does not provide the acceleration, velocity and position
information associated with an INS.
7D003 Other "software", as follows:
a. "Software" specially designed or modified to improve the
operational performance or reduce the navigational error of
systems to the levels specified in 7A003 or 7A004;
b. "Source code" for hybrid integrated systems which improves
the operational performance or reduces the navigational error of
systems to the level specified in 7A003 by continuously
combining inertial data withany of th e following navigation
data:
1. Doppler radar velocity;
2. Global navigation satellite systems (i.e., GPS or GLONASS)
reference data; or
3. Terrain data from data bases;
c. "Source code" for integrated avionics or mission systems which
combine sensor data and employ "expert systems";
d. "Source code" for the "development" of any of the following:
1. Digital flight management systems for "total control of
flight";
2. Integrated propulsion and flight control systems;
3. Fly-by-wire or fly-by-light control systems;4. Fault-tolerant or self-reconfiguring "active flight control
systems";
5. Airborne automatic direction finding equipment;6. Air data systems based on surface static data;
or
7. Raster-type head-up displays or three dimensional displays;
e. Computer-aided-design (CAD) "software" specially designed
for the "development" of "active flight control systems",
helicopter multi-axis fly-by-wire or fly-by-light controllers or
helicopter "circulation controlled anti-torque or circulation-
controlled direction control systems" whose "technology" is
specified in 7E004.b., 7E004.c.1. or 7E004.c.2.
7D101 "Software" specially designed or modified for the "use" of
equipment specified in 7A001 to 7A006, 7A101 to 7A106,
7A115, 7A116.a., 7A116.b., 7B001, 7B002, 7B003, 7B102 or
7B103.
7D102 Integration "software" as follows:
a. Integration "software" for the equipment specified in 7A103.b.;
b. Integration "software" specially designed for the equipment
specified in 7A003 or 7A103.a.
7D103 "Software" specially designed for modelling or simulation of the
"guidance sets" specified in 7A117 or for their design integration
with the space launch vehicles specified in 9A004 or sounding
rockets specified in 9A104.
Note: "Software" specified in 7D103 remains controlled when
combined with specially designed hardware specified in
4A102.2000R1334 — EN — 19.01.2002 — 003.001 — 170
▼M3
7E Technology
7E001 "Technology" according to the General Technology Note for the
"development" of equipment or "software" specified in 7A, 7B or
7D.
7E002 "Technology" according to the General Technology Note for the
"production" of equipment specified in 7A or 7B.
7E003 "Technology" according to the General Technology Note for the
repair, refurbishing or overhaul of equipment specified in 7A001
to 7A004.
Note: 7E003 does not control maintenance "technology"
directly associated with calibration, removal or replace-
ment of damaged or unserviceable LRUs and SRAs of a
"civil aircraft" as described in Maintenance Level I or
Maintenance Level II.
Note: See Technical Notes to 7B001.
7E004 Other "technology", as follows:
a. "Technology" for the "development" or "production" of:
1. Airborne automatic direction finding equipment operating at
frequencies exceeding 5 MHz;
2. Air data systems based on surface static data only, i.e.,
which dispense with conventional air data probes;
3. Raster-type head-up displays or three dimensional displays
for "aircraft";
4. Inertial navigation systems or gyro-astro compasses
containing accelerometers or gyros specified in 7A001 or
7A002;
5. Electric actuators (i.e., electromechanical, electrohydrostatic
and integrated actuator package) specially designed for
"primary flight control";
6. "Flight control optical sensor array" specially designed for
implementing "active flight control systems";
b. "Development" "technology", as follows, for "active flight
control systems" (including fly-by-wire or fly-by-light):
1. Configuration design for interconnecting multiple micro-
electronic processing elements (on-board computers) to
achieve "real time processing" for control law implementa-
tion;
2. Control law compensation for sensor location or dynamic
airframe loads, i.e., compensation for sensor vibration
environment or for variation of sensor location from the
centre of gravity;
3. Electronic management of data redundancy or systems
redundancy for fault detection, fault tolerance, fault isolation
or reconfiguration;
Note: 7E004.b.3. does not control "technology" for the
design of physical redundancy.
4. Flight controls which perit inflight reconfiguration of force
and moment controls for real time autonomous air vehicle
control;
5. Integration of digital flight control, navigation and propul-
sion control data into a digital flight management system for
"total control of flight";
Note: 7E004.b.5. does not control:
a. "Development" "technology" for integration of
digital flight control, navigation and propulsion
control data into a digital flight managementsystem for "flight path optimisation";
b. "Development" "technology" for "aircraft"
flight instrument systems integrated solely for
VOR, DME, ILS or MLS navigation or
approaches.
6. Full authority digital flight control or multisensor mission
management systems employing "expert systems";2000R1334 — EN — 19.01.2002 — 003.001 — 171
▼M3
Note: For "technology" for Full Authority Digital Engine
Control ("FADEC"), see 9E003.a.9.
c. "Technology" for the "development" of helicopter systems, as
follows:
1. Multi-axis fly-by-wire or fly-by-light controllers which
combine the functions of at least two of the following into
one controlling element:
a. Collective controls;
b. Cyclic controls;
c. Yaw controls;
2. "Circulation-controlled anti-torque or circulation-controlled
directional control systems";
3. Rotor blades incorporating "variable geometry airfoils" for
use in systems using individual blade control.
7E101 "Technology" according to the General Technology Note for the
"use" of equipment specified in 7A001 to 7A006, 7A101 to
7A106, 7A115 to 7A117, 7B001, 7B002, 7B003, 7B102, 7B103,
7D101 to 7D103.
7E102 "Technology" for protection of avionics and electrical subsystems
against electromagnetic pulse (EMP) and electromagnetic inter-
ference (EMI) hazards, from external sources, as follows:
a. Design "technology" for shielding systems;
b. Design "technology" for the configuration of hardened
electrical circuits and subsystems;
c. Design "technology" for the determination of hardening criteria
of 7E102.a. and 7E102.b.
7E104 "Technology" for the integration of the flight control, guidance,
and propulsion data into a flight management system for
optimisation of rocket system trajectory.2000R1334 — EN — 19.01.2002 — 003.001 — 172
▼M3
CATEGORY8
MARINE2000R1334 — EN — 19.01.2002 — 003.001 — 173
▼M3
8A Systems,EquipmentandComponents
8A001 Submersible vehicles and surface vessels, as follows:
Note: For the control status of equipment for submersible
vehicles, see:
Category 5, Part 2 "Information Security" for encrypted
communication equipment;
Category 6for sensors;
Categories 7 and 8 for navigation equipment;Category 8A for underwater equipment.
a. Manned, tethered submersible vehicles designed to operate at
depths exceeding 1 000 m;
b. Manned, untethered submersible vehicles, having any of the
following:
1. Designed to 'operate autonomously' and having a lifting
capacity of all the following:
a. 10 % or more of their weight in air;
and
b. 15 kN or more;
2. Designed to operate at depths exceeding 1 000 m; or
3. Having all of the following:
a. Designed to carry a crew of 4 or more;
b. Designed to 'operate autonomously' for 10 hours or more;
c. Having a 'range' of 25 nautical miles or more; and
d. Having a lengthof 21 m or less;
Technical Notes:
1. For the purposes of 8A001.b., 'operate autonomously'
means fully submerged, without snorkel, all systems
working and cruising at minimum speed at which the
submersible can safely control its depth dynamically by
using its depth planes only, with no need for a support
vessel or support base on the surface, sea-bed or shore,
and containing a propulsion system for submerged or
surface use.
2. For the purposes of 8A001.b., 'range' means half the
maximum distance a submersible vehicle can cover.
c. Unmanned, tethered submersible vehicles designed to operate
at depths exceeding 1 000 m, having any of the following:
1. Designed for self-propelled manoeuvre using propulsion
motors or thrusters specified in 8A002.a.2.; or
2. Having a fibre optic data link;
d. Unmanned, untethered submersible vehicles, having any of the
following:
1. Designed for deciding a course relative to any geographical
reference without real-time human assistance;
2. Having an acoustic data or command link; or
3. Having a fibre optic data or command link exceeding
1 000 m;
e. Ocean salvage systems witha lifting capacity exceeding 5 MN
for salvaging objects from depths exceeding 250 m and having
any of the following:
1. Dynamic positioning systems capable of position keeping
within 20 m of a given point provided by the navigation
system;or
2. Seafloor navigation and navigation integration systems for
depths exceeding 1 000 m with positioning accuracies to
within 10 m of a predetermined point;
f. Surface-effect vehicles (fully skirted variety) having all of the
following characteristics:
1. A maximum design speed, fully loaded, exceeding 30 knots
in a significant wave height of 1,25 m (Sea State 3) or more;2000R1334 — EN — 19.01.2002 — 003.001 — 174
▼M3
2. A cushion pressure exceeding 3 830 Pa; and
3. A light-ship-to-full-load displacement ratio of less than 0,70;
g. Surface-effect vehicles (rigid sidewalls) with a maximum
design speed, fully loaded, exceeding 40 knots in a significant
wave height of 3,25 m (Sea State 5) or more;
h. Hydrofoil vessels with active systems for automatically
controlling foil systems, witha maximum design speed, fully
loaded, of 40 knots or more in a significant wave height of
3,25 m (Sea State 5) or more;
i. 'Small waterplane area vessels' having any of the following:
1. A full load displacement exceeding 500 tonnes witha
maximum design speed, fully loaded, exceeding 35 knots in
a significant wave height of 3,25 m (Sea State 5) or more; or
2. A full load displacement exceeding 1 500 tonnes witha
maximum design speed, fully loaded, exceeding 25 knots in
a significant wave height of 4 m (Sea State 6) or more.
Technical Note:
A 'small waterplane area vessel' is defined by the following
formula: waterplane area at an operational design draught less
than 2 × (displaced volume at the operational design draught)2/
3.
8A002 Systems and equipment, as follows:
Note: For underwater communications systems, see Category 5,
Part 1 — Telecommunications.
a. Systems and equipment, specially designed or modified for
submersible vehicles, designed to operate at depths exceeding
1 000 m, as follows:
1. Pressure housings or pressure hulls with a maximum inside
chamber diameter exceeding 1,5 m;
2. Direct current propulsion motors or thrusters;3. Umbilical cables, and connectors therefor, using optical
fibre and having synthetic strength members;
b. Systems specially designed or modified for the automated
control of the motion of submersible vehicles specified in
8A001 using navigation data and having closed loop servo-
controls:
1. Enabling a vehicle to move within 10 m of a predetermined
point in the water column;
2. Maintaining the position of the vehicle within 10 m of a
predetermined point in the water column;
or
3. Maintaining the position of the vehicle within 10 m while
following a cable on or under the seabed;
c. Fibre optic hull penetrators or connectors;
d. Underwater vision systems, as follows:
1. Television systems and television cameras, as follows:
a. Television systems (comprising camera, monitoring and
signal transmission equipment) having a limiting
resolution when measured in air of more than 800 lines
and specially designed or modified for remote operation
witha submersible veh icle;
b. Underwater television cameras having a limiting resolu-
tion when measured in air of more than 1100 lines;
c. Low light level television cameras specially designed or
modified for underwater use containing all of the
following:
1. Image intensifier tubes specified in 6A002.a.2.a.; and
2. More than 150 000 "active pixels" per solid state area
array;
Technical Note:
Limiting resolution in television is a measure of
horizontal resolution usually expressed in terms of the
maximum number of lines per picture height discrimi-2000R1334 — EN — 19.01.2002 — 003.001 — 175
▼M3
nated on a test chart, using IEEE Standard 208/1960 or
any equivalent standard.
2. Systems, specially designed or modified for remote
operation with an underwater vehicle, employing techni-
ques to minimise the effects of back scatter, including
range-gated illuminators or "laser" systems;
e. Photographic still cameras specially designed or modified for
underwater use below 150 m having a film format of 35 mm or
larger, and having any of the following:
1. Annotation of the film with data provided by a source
external to the camera;
2. Automatic back focal distance correction; or
3. Automatic compensation control specially designed to
permit an underwater camera housing to be usable at
depths exceeding 1 000 m;
f. Electronic imaging systems, specially designed or modified for
underwater use, capable of storing digitally more than 50
exposed images;
g. Light systems, as follows, specially designed or modified for
underwater use:
1. Stroboscopic light systems capable of a light output energy
of more th an 300 J per flashand a flashrate of more th an 5
flashes per second;
2. Argon arc light systems specially designed for use below
1 000 m;
h. "Robots" specially designed for underwater use, controlled by
using a dedicated "stored programme controlled" computer,
having any of the following:
1. Systems that control the "robot" using information from
sensors which measure force or torque applied to an
external object, distance to an external object, or tactile
sense between the "robot" and an external object; or
2. The ability to exert a force of 250 N or more or a torque of
250 Nm or more and using titanium based alloys or "fibrous
or filamentary" "composite" materials in their structural
members;
i. Remotely controlled articulated manipulators specially
designed or modified for use withsubmersible veh icles,
having any of the following:
1. Systems which control the manipulator using the informa-
tion from sensors which measure the torque or force applied
to an external object, or tactile sense between the
manipulator and an external object; or
2. Controlled by proportional master-slave techniques or by
using a dedicated "stored programme controlled" computer,
and having 5 degrees of freedom of movement or more;
Note: Only functions having proportional control using
positional feedback or by using a dedicated
"stored programme controlled" computer are
counted when determining the number of degrees
of freedom of movement.
j. Air independent power systems, specially designed for under-
water use, as follows:
1. Brayton or Rankine cycle engine air independent power
systems having any of the following:
a. Chemical scrubber or absorber systems specially
designed to remove carbon dioxide, carbon monoxide
and particulates from recirculated engine exhaust;
b. Systems specially designed to use a monoatomic gas;
c. Devices or enclosures specially designed for underwater
noise reduction in frequencies below 10 kHz, or special
mounting devices for shock mitigation; or
d. Systems specially designed:
1. To pressurise the products of reaction or for fuel
reformation;2000R1334 — EN — 19.01.2002 — 003.001 — 176
▼M3
2. To store the products of the reaction; and
3. To discharge the products of the reaction against a
pressure of 100 kPa or more;
2. Diesel cycle engine air independent systems, having all of
the following:
a. Chemical scrubber or absorber systems specially
designed to remove carbon dioxide, carbon monoxide
and particulates from recirculated engine exhaust;
b. Systems specially designed to use a monoatomic gas;
c. Devices or enclosures specially designed for underwater
noise reduction in frequencies below 10 kHz or special
mounting devices for shock mitigation; and
d. Specially designed exhaust systems that do not exhaust
continuously the products of combustion;
3. Fuel cell air independent power systems withan output
exceeding 2 kW having any of the following:
a. Devices or enclosures specially designed for underwater
noise reduction in frequencies below 10 kHz or special
mounting devices for shock mitigation; or
b. Systems specially designed:
1. To pressurise the products of reaction or for fuel
reformation;
2. To store the products of the reaction; and
3. To discharge the products of the reaction against a
pressure of 100 kPa or more;
4. Stirling cycle engine air independent power systems, having
all of the following:
a. Devices or enclosures specially designed for underwater
noise reduction in frequencies below 10 kHz or special
mounting devices for shock mitigation; and
b. Specially designed exhaust systems which discharge the
products of combustion against a pressure of 100 kPa or
more;
k. Skirts, seals and fingers, having any of the following:
1. Designed for cushion pressures of 3,830 Pa or more,
operating in a significant wave height of 1,25 m (Sea State
3) or more and specially designed forsurface effect vehicles
(fully skirted variety) specified in 8A001.f.; or
2. Designed for cushion pressures of 6,224 Pa or more,
operating in a significant wave height of 3,25 m (Sea State
5) or more and specially designed forsurface effect vehicles
(rigid sidewalls) specified in 8A001.g.;
l. Lift fans rated at more than 400 kW specially designed for
surface effect vehicles specified in 8A001.f. or 8A001.g.;
m. Fully submerged subcavitating or supercavitating hydrofoils
specially designed for vessels specified in 8A001.h.;
n. Active systems specially designed or modified to control
automatically the sea-induced motion of vehicles or vessels
specified in 8A001.f., 8A001.g., 8A001.h. or 8A001.i.;
o. Propellers, power transmission systems, power generation
systems and noise reduction systems, as follows:
1. Water-screw propeller or power transmission systems, as
follows, specially designed for surface effect vehicles (fully
skirted or rigid sidewall variety), hydrofoils or small
waterplane area vessels specified in 8A001.f., 8A001.g.,
8A001.h. or 8A001.i.:
a. Supercavitating, super-ventilated, partially-submerged or
surface piercing propellers rated at more than 7,5 MW;
b. Contrarotating propeller systems rated at more than
15 MW;
c. Systems employing pre-swirl or post-swirl techniques
for smoothing the flow into a propeller;
d. Light-weight, high capacity (K factor exceeding 300)
reduction gearing;2000R1334 — EN — 19.01.2002 — 003.001 — 177
▼M3
e. Power transmission shaft systems, incorporating
"composite" material components, capable of transmit-
ting more than 1 MW;
2. Water-screw propeller, power generation systems or
transmission systems designed for use on vessels, as
follows:
a. Controllable-pitchpropellers and h ub assemblies rated at
more than 30 MW;
b. Internally liquid-cooled electric propulsion engines with
a power output exceeding 2,5 MW;
c. "Superconductive" propulsion engines, or permanent
magnet electric propulsion engines, witha power output
exceeding 0,1 MW;
d. Power transmission shaft systems, incorporating
"composite" material components, capable of transmit-
ting more than 2 MW;
e. Ventilated or base-ventilated propeller systems rated at
more than 2,5 MW;
3. Noise reduction systems designed for use on vessels of
1 000 tonnes displacement or more, as follows:
a. Systems that attenuate underwater noise at frequencies
below 500 Hz and consist of compound acoustic mounts
for the acoustic isolation of diesel engines, diesel
generator sets, gas turbines, gas turbine generator sets,
propulsion motors or propulsion reduction gears,
specially designed for sound or vibration isolation,
having an intermediate mass exceeding 30 % of the
equipment to be mounted;
b. Active noise reduction or cancellation systems, or
magnetic bearings, specially designed for power trans-
mission systems, and incorporating electronic control
systems capable of actively reducing equipment vibra-
tion by the generation of anti-noise or anti-vibration
signals directly to the source;
p. Pumpjet propulsion systems having a power output exceeding
2,5 MW using divergent nozzle and flow conditioning vane
techniques to improve propulsive efficiency or reduce propul-
sion-generated underwater-radiated noise;
q. Self-contained, closed or semi-closed circuit (rebreathing)
diving and underwater swimming apparatus.
Note: 8A002.q. does not control an individual apparatus for
personal use when accompanying its user.2000R1334 — EN — 19.01.2002 — 003.001 — 178
▼M3
8B Test,InspectionandProductionEquipment
8B001 Water tunnels, having a background noise of less than 100 dB
(reference 1 µPa, 1 Hz), in the frequency range from 0 to 500 Hz,
designed for measuring acoustic fields generated by a hydro-flow
around propulsion system models.2000R1334 — EN — 19.01.2002 — 003.001 — 179
▼M3
8C Materials
8C001 'Syntactic foam' designed for underwater use, having all of the
following:
a. Designed for marine depths exceeding 1000 m; and
b. A density less than 561 kg/m3.
Technical Note:
'Syntactic foam' consists of hollow spheres of plastic or glass
embedded in a resin matrix.2000R1334 — EN — 19.01.2002 — 003.001 — 180
▼M3
8D Software
8D001 "Software" specially designed or modified for the "development",
"production" or "use" of equipment or materials specified in 8A,
8B or 8C.
8D002 Specific "software" specially designed or modified for the
"development", "production", repair, overhaul or refurbishing
(re-machining) of propellers specially designed for underwater
noise reduction.2000R1334 — EN — 19.01.2002 — 003.001 — 181
▼M3
8E Technology
8E001 "Technology" according to the General Technology Note for the
"development" or "production" of equipment or materials specified
in 8A, 8B or 8C.
8E002 Other "technology", as follows:
a. "Technology" for the "development", "production", repair,
overhaul or refurbishing (re-machining) of propellers specially
designed for underwater noise reduction;
b. "Technology" for the overhaul or refurbishing of equipment
specified in 8A001, 8A002.b., 8A002.j., 8A002.o. or 8A002.p.2000R1334 — EN — 19.01.2002 — 003.001 — 182
▼M3
CATEGORY9
PROPULSION SYSTEMS, SPACE VEHICLES AND RELATED EQUIP-
MENT2000R1334 — EN — 19.01.2002 — 003.001 — 183
▼M3
9A Systems,EquipmentandComponents
N.B.: For propulsion systems designed or rated against neutron
or transient ionising radiation, see the Military Goods
Controls.
9A001 Aero gas turbine engines incorporating any of the "technologies"
specified in 9E003.a., as follows:
N.B.: SEEALSO9A101.
a. Not certified for the specific "civil aircraft" for which they are
intended;
b. Not certified for civil use by the aviation authorities in a
"participating state";
c. Designed to cruise at speeds exceeding Mach1,2 for more th an
thirty minutes.
9A002 'Marine gas turbine engines' withan ISO standard continuous
power rating of 24245 kW or more and a specific fuel
consumption not exceeding 0,219 kg/kWhin th e power range
from 35 to 100 %, and specially designed assemblies and
components therefor.
Note: The term 'marine gas turbine engines' includes those
industrial, or aero-derivative, gas turbine engines
adapted for a ship's electric power generation or
propulsion.
9A003 Specially designed assemblies and components, incorporating any
of the "technologies" specified in 9E003.a., for the following gas
turbine engine propulsion systems:
a. Specified in 9A001;
b. Whose design or production origins are either non-"partici-
pating states" or unknown to the manufacturer.
9A004 Space launchveh icles and "spacecraft".
N.B.: SEEALSO9A104.
Note: 9A004 does not control payloads.
N.B.: For the control status of products contained in
"spacecraft" payloads, see the appropriate
Categories.
9A005 Liquid rocket propulsion systems containing any of the systems or
components specified in 9A006.
N.B.: SEEALSO9A105and9A119.
9A006 Systems and components specially designed for liquid rocket
propulsion systems, as follows:
N.B.: SEEALSO9A106and9A108.
a. Cryogenic refrigerators, flightweight dewars, cryogenic heat
pipes or cryogenic systems specially designed for use in space
vehicles and capable of restricting cryogenic fluid losses to less
than 30 % per year;
b. Cryogenic containers or closed-cycle refrigeration systems
capable of providing temperatures of 100 K (− 173 ºC) or
less for "aircraft" capable of sustained flight at speeds
exceeding Mach3, launchveh icles or "spacecraft";
c. Slushh ydrogen storage or transfer systems;
d. Highpressure (exceeding 17,5 MPa) turbo pumps, pump
components or their associated gas generator or expander cycle
turbine drive systems;
e. High-pressure (exceeding 10,6 MPa) thrust chambers and
nozzles therefor;
f. Propellant storage systems using the principle of capillary
containment or positive expulsion (i.e., withflexible bladders);
g. Liquidpropellantinjectors,withindividualorificesof0,381mm
or smaller in diameter (an area of 1,14 × 10−3cm2or smaller for
non-circular orifices) specially designed for liquid rocket
engines;2000R1334 — EN — 19.01.2002 — 003.001 — 184
▼M3
h. One-piece carbon-carbon thrust chambers or one-piece carbon-
carbon exit cones withdensities exceeding 1,4g/cm3and tensile
strengths exceeding 48 MPa.
9A007 Solid rocket propulsion systems withany of th e following:
N.B.: SEEALSO9A119.
a. Total impulse capacity exceeding 1,1 MNs;
b. Specific impulse of 2,4 kNs/kg or more when the nozzle flow is
expanded to ambient sea level conditions for an adjusted
chamber pressure of 7 MPa;
c. Stage mass fractions exceeding 88 % and propellant solid
loadings exceeding 86 %;
d. Any of the components specified in 9A008; or
e. Insulation and propellant bonding systems using direct-bonded
motor designs to provide a 'strong mechanical bond' or a barrier
to chemical migration between the solid propellant and case
insulation material.
Technical Note:
For the purposes of 9A007.e., a 'strong mechanical bond'
means bond strength equal to or more than propellant strength.
9A008 Components, as follows, specially designed for solid rocket
propulsion systems:
N.B.: SEEALSO9A108.
a. Insulation and propellant bonding systems using liners to
provide a 'strong mechanical bond' or a barrier to chemical
migration between the solid propellant and case insulation
material;
Technical Note:
For the purposes of 9A008.a., a 'strong mechanical bond'
means bond strength equal to or more than propellant strength.
b. Filament-wound "composite" motor cases exceeding 0,61 m in
diameter or having 'structural efficiency ratios (PV/W)'
exceeding 25 km;
Technical Note:
The 'structural efficiency ratio (PV/W)' is the burst pressure (P)
multiplied by the vessel volume (V) divided by the total pressure
vessel weight (W).
c. Nozzles with thrust levels exceeding 45 kN or nozzle throat
erosion rates of less than 0,075 mm/s;
d. Movable nozzle or secondary fluid injection thrust vector
control systems capable of any of the following:
1. Omni-axial movement exceeding ± 5º;
2. Angular vector rotations of 20º/s or more; or
3. Angular vector accelerations of 40º/s2or more.
9A009 Hybrid rocket propulsion systems with:
N.B.: SEEALSO9A109and9A119.
a. Total impulse capacity exceeding 1,1 MNs; or
b. Thrust levels exceeding 220 kN in vacuum exit conditions.
9A010 Specially designed components, systems and structures for launch
vehicles, launch vehicle propulsion systems or "spacecraft", as
follows:
N.B.: SEEALSO1A002AND9A110.
a. Components and structures eachexceeding 10 kg, specially
designed for launchveh icles manufactured using metal
"matrix", "composite", organic "composite", ceramic "matrix"
or intermetallic reinforced materials specified in 1C007 or
1C010;
Note: The weight cut-off is not relevant for nose cones.
b. Components and structures specially designed for launch
vehicle propulsion systems specified in 9A005 to 9A009
manufactured using metal matrix, composite, organic compo-2000R1334 — EN — 19.01.2002 — 003.001 — 185
▼M3
site, ceramic matrix or intermetallic reinforced materials
specified in 1C007 or 1C010;
c. Structural components and isolation systems specially designed
to control actively the dynamic response or distortion of
"spacecraft" structures;
d. Pulsed liquid rocket engines with thrust-to-weight ratios equal
to or more than 1 kN/kg and a response time (the time required
to achieve 90 % of total rated thrust from start-up) of less than
30 ms.
9A011 Ramjet, scramjet or combined cycle engines and specially
designed components therefor.
N.B.: SEEALSO9A111and9A118.
9A101 Lightweight turbojet and turbofan engines (including turbocom-
pound engines) usable in "missiles", other than those specified in
9A001, as follows;
a. Engines having both of the following characteristics:
1. Maximum thrust value greater than 1 000 N (achieved un-
installed) excluding civil certified engines witha maximum
thrust value greater than 8 890 N (achieved un-installed),
and
2. Specific fuel consumption of 0,13 kg/N/hr or less (at sea
level static and standard conditions); or
b. Engines designed or modified for use in "missiles".
9A104 Sounding rockets, capable of a range of at least 300 km.
N.B.: SEEALSO9A004.
9A105 Liquid propellant rocket engines, as follows:
N.B.: SEEALSO9A119.
a. Liquid propellant rocket engines usable in "missiles", other than
those specified in 9A005, having a total impulse capacity of
1,1 MNs or greater;
b. Liquid propellant rocket engines, usable in complete rocket
systemsorunmannedairvehicles,capableofarangeof300km,
other than those specified in 9A005 or 9A105.a., having a total
impulse capacity of 0,841 MNs or greater.
9A106 Systems or components, other than those specified in 9A006,
usable in "missiles", as follows, specially designed for liquid
rocket propulsion systems:
a. Ablative liners for thrust or combustion chambers;
b. Rocket nozzles;
c. Thrust vector control sub-systems;
Technical Note:
Examples of methods of achieving thrust vector control
specified in 9A106.c. are:
1. Flexible nozzle;
2. Fluid or secondary gas injection;
3. Movable engine or nozzle;4. Deflection of exhaust gas stream (jet vanes or probes);
or
5. Thrust tabs.
d. Liquid and slurry propellant (including oxidisers) control
systems, and specially designed components therefor, designed
or modified to operate in vibration environments of more than
10 g rms between 20 Hz and 2 000 Hz.
Note: The only servo valves and pumps specified in
9A106.d., are the following:
a. Servo valves designed for flow rates of 24 litres per
minuteorgreater,atanabsolutepressureof7MPa
or greater, that have an actuator response time of
less than 100 ms;
b. Pumps, for liquid propellants, with shaft speeds
equal to or greater than 8000 r.p.m. or with2000R1334 — EN — 19.01.2002 — 003.001 — 186
▼M3
discharge pressures equal to or greater than
7 MPa.
9A107 Solid propellant rocket engines, usable in complete rocket systems
or unmanned air vehicles, capable of a range of 300 km, other than
those specified in 9A007, having total impulse capacity of
0,841 MNs or greater.
N.B.: SEEALSO9A119.
9A108 Components, other than those specified in 9A008, usable in
"missiles", as follows, specially designed for solid rocket
propulsion systems:
a. Rocket motor cases, "interior lining" and "insulation" therefor;
b. Rocket nozzles;
c. Thrust vector control sub-systems.
Technical Note:
Examples of methods of achieving thrust vector control
specified in 9A108.c. are:
1. Flexible nozzle;
2. Fluid or secondary gas injection;
3. Movable engine or nozzle;
4. Deflection of exhaust gas stream (jet vanes or probes); or
5. Thrust tabs.
9A109 Hybrid rocket motors, usable in "missiles", other than those
specified in 9A009, and specially designed components therefor.
N.B.: SEEALSO9A119.
9A110 Composite structures, laminates and manufactures thereof, other
than those specified in 9A010, specially designed for use in space
launchveh icles specified in 9A004 or sounding rockets specified
in 9A104 or the subsystems specified in 9A005, 9A007, 9A105.a.,
9A106 to 9A108, 9A116 or 9A119.
N.B.: SEEALSO1A002.
9A111 Pulse jet engines, usable in "missiles", and specially designed
components therefor.
N.B.: SEEALSO9A011and9A118.
9A115 Launchsupport equipment, designed or modified for space launch
vehicles specified in 9A004 or sounding rockets specified in
9A104, as follows:
a. Apparatus and devices for handling, control, activation or
launching;
b. Vehicles for transport, handling, control, activation or
launching.
9A116 Reentry vehicles, usable in "missiles", and equipment designed or
modified therefor, as follows:
a. Reentry vehicles;
b. Heat shields and components therefor fabricated of ceramic or
ablative materials;
c. Heat sinks and components therefor fabricated of light-weight,
high heat capacity materials;
d. Electronic equipment specially designed for reentry vehicles.
9A117 Staging mechanisms, separation mechanisms, and interstages,
usable in "missiles".
9A118 Devices to regulate combustion usable in engines, which are
usable in "missiles", specified in 9A011 or 9A111.
9A119 Individual rocket stages, usable in complete rocket systems or
unmanned air vehicles, capable of a range of 300 km, other than
those specified in 9A005, 9A007, 9A009, 9A105, 9A107 and
9A109.2000R1334 — EN — 19.01.2002 — 003.001 — 187
▼M3
9B Test,InspectionandProductionEquipment
9B001 Specially designed equipment, tooling and fixtures, as follows, for
manufacturing gas turbine blades, vanes or tip shroud castings:
a. Directional solidification or single crystal casting equipment;
b. Ceramic cores or shells;
9B002 On-line (real time) control systems, instrumentation (including
sensors) or automated data acquisition and processing equipment,
specially designed for the "development" of gas turbine engines,
assemblies or components incorporating "technologies" specified
in 9E003.a.
9B003 Equipment specially designed for the "production" or test of gas
turbine brushseals designed to operate at tip speeds exceeding
335 m/s, and temperatures in excess of 773 K (500 ºC), and
specially designed components or accessories therefor.
9B004 Tools, dies or fixtures for the solid state joining of "superalloy",
titanium or intermetallic airfoil-to-disk combinations described in
9E003.a.3. or 9E003.a.6. for gas turbines.
9B005 On-line (real time) control systems, instrumentation (including
sensors) or automated data acquisition and processing equipment,
specially designed for use withany of th e following wind tunnels
or devices:
N.B.: SEEALSO9B105.
a. Wind tunnels designed for speeds of Mach1,2 or more, except
those specially designed for educational purposes and having a
'test section size' (measured laterally) of less than 250 mm;
Technical Note:
'Test section size' in 9B005.a. means the diameter of the circle,
or the side of the square, or the longest side of the rectangle, at
the largest test section location.
b. Devices for simulating flow-environments at speeds exceeding
Mach 5, including hot-shot tunnels, plasma arc tunnels, shock
tubes, shock tunnels, gas tunnels and light gas guns; or
c. Wind tunnels or devices, other than two-dimensional sections,
capable of simulating Reynolds number flows exceeding
25 × 106.
9B006 Acoustic vibration test equipment capable of producing sound
pressure levels of 160 dB or more (referenced to 20 µPa) witha
rated output of 4 kW or more at a test cell temperature exceeding
1 273 K (1 000 ºC), and specially designed quartz heaters therefor.
N.B.: SEEALSO9B106.
9B007 Equipment specially designed for inspecting the integrity of rocket
motors using non-destructive test (NDT) techniques other than
planar X-ray or basic physical or chemical analysis.
9B008 Transducers specially designed for the direct measurement of the
wall skin friction of the test flow with a stagnation temperature
exceeding 833 K (560 ºC).
9B009 Tooling specially designed for producing turbine engine powder
metallurgy rotor components capable of operating at stress levels
of 60 % of ultimate tensile strength(UTS) or more and metal
temperatures of 873 K (600 ºC) or more.
9B105 Wind tunnels for speeds of Mach0,9 or more, usable for"missiles"
and their subsystems.
N.B.: SEEALSO9B005.
9B106 Environmental chambers and anechoic chambers, as follows:
a. Environmental chambers capable of simulating the following
flight conditions:
1. Vibration environments of 10 g rms or greater between
20 Hz and 2000 Hz and imparting forces of 5 kN or greater;
and
2. Altitudes of 15000 m or greater; or
3. Temperature range of at least 223 K (− 50 ºC) to 398 K
(+ 125 ºC);2000R1334 — EN — 19.01.2002 — 003.001 — 188
▼M3
b. Anechoic chambers capable of simulating the following flight
conditions:
1. Acoustic environments at an overall sound pressure level of
140 dB or greater (referenced to 20 µPa) or witha rated
power output of 4 kW or greater; and
2. Altitudes of 15000 m or greater; or
3. Temperature range of at least 223 K (− 50 ºC) to 398 K
(+ 125 ºC).
9B115 Specially designed "production equipment" for the systems, sub-
systems and components specified in 9A005 to 9A009, 9A011,
9A101, 9A105 to 9A109, 9A111, 9A116 to 9A119.
9B116 Specially designed "production facilities" for the space launch
vehicles specified in 9A004, or systems, sub-systems, and
components specified in 9A005 to 9A009, 9A011, 9A101,
9A104 to 9A109, 9A111, or 9A116 to 9A119.
9B117 Test benches and test stands for solid or liquid propellant rockets
or rocket motors, having either of the following characteristics:
a. The capacity to handle more than 90 kN of thrust; or
b. Capable of simultaneously measuring the three axial thrust
components.2000R1334 — EN — 19.01.2002 — 003.001 — 189
▼M3
9C Materials
9C110 Resin impregnated fibre prepregs and metal coated fibre preforms
therefor, for composite structures, laminates and manufactures
specified in 9A110, made either with organic matrix or metal
matrix utilising fibrous or filamentary reinforcements having a
"specific tensile strength" greater than 7,62 × 104m and a "specific
modulus" greater than 3,18 × 106m.
N.B.: SEEALSO1C010and1C210.
Note: The only resin impregnated fibre prepregs specified in
entry 9C110 are those using resins with a glass transition
temperature (Tg),after cure, exceeding 418K (145ºC) as
determined by ASTM D4065 or equivalent.2000R1334 — EN — 19.01.2002 — 003.001 — 190
▼M3
9D Software
9D001 "Software" specially designed or modified for the "development"
of equipment or "technology" specified in 9A, 9B or 9E003.
9D002 "Software" specially designed or modified for the "production" of
equipment specified in 9A or 9B.
9D003 "Software" specially designed or modified for the "use" of "full
authority digital electronic engine controls" ("FADEC") for
propulsion systems specified in 9A or equipment specified in
9B, as follows:
a. "Software" in digital electronic controls for propulsion systems,
aerospace test facilities or air breathing aero-engine test
facilities;
b. Fault-tolerant "software" used in "FADEC" systems for
propulsion systems and associated test facilities.
9D004 Other "software", as follows:
a. 2D or 3D viscous "software" validated withwind tunnel or
flight test data required for detailed engine flow modelling;
b. "Software" for testing aero gas turbine engines, assemblies or
components, specially designed to collect, reduce and analyse
data in real time, and capable of feedback control, including the
dynamic adjustment of test articles or test conditions, as the test
is in progress;
c. "Software" specially designed to control directional solidifica-
tion or single crystal casting;
d. "Software" in "source code", "object code" or machine code
required for the "use" of active compensating systems for rotor
blade tip clearance control.
Note: 9D004.d. does not control "software" embedded in
uncontrolled equipment or required for maintenance
activities associated with the calibration or repair or
updates to the active compensating clearance control
system.
9D101 "Software" specially designed or modified for the "use" of goods
specified in 9B105, 9B106, 9B116 or 9B117.
9D103 "Software" specially designed for modelling, simulation or design
integration of the space launch vehicles specified in 9A004 or
sounding rockets specified in 9A104, or the subsystems specified
in 9A005, 9A007, 9A105.a., 9A106, 9A108, 9A116 or 9A119.
Note: "Software" specified in 9D103 remains controlled when
combined with specially designed hardware specified in
4A102.
9D104 "Software" specially designed or modified for the "use" of goods
specified in 9A001, 9A005, 9A006.d., 9A006.g., 9A007.a.,
9A008.d., 9A009.a., 9A010.d., 9A011, 9A101, 9A105, 9A106.c.,
9A106.d., 9A107, 9A108.c., 9A109, 9A111, 9A115.a., 9A116.d.,
9A117 or 9A118.
9D105 "Software" which coordinates the function of more than one
subsystem, specially designed or modified for "use" in space
launchveh icles specified in 9A004 or sounding rockets specified
in 9A104.2000R1334 — EN — 19.01.2002 — 003.001 — 191
▼M3
9E Technology
Note: "Development" or "production" "technology" specified in
9E001 to 9E003 for gas turbine engines remains
controlled when used as "use" "technology" for repair,
rebuild and overhaul. Excluded from control are:
technical data, drawings or documentation for main-
tenance activities directly associated with calibration,
removal or replacement of damaged or unserviceable
line replaceable units, including replacement of whole
engines or engine modules.
9E001 "Technology" according to the General Technology Note for the
"development" of equipment or "software" specified in 9A001.c.,
9A004 to 9A011, 9B or 9D.
9E002 "Technology" according to the General Technology Note for the
"production" of equipment specified in 9A001.c., 9A004 to
9A011, or 9B.
N.B.: For "technology" for the repair of controlled structures,
laminates or materials, see 1E002.f.
9E003 Other "technology", as follows:
a. "Technology" "required" for the "development" or "production"
of any of the following gas turbine engine components or
systems:
1. Gas turbine blades, vanes or tip shrouds made from
directionally solidified (DS) or single crystal (SC) alloys
having (in the 001 Miller Index Direction) a stress-rupture
life exceeding 400 hours at 1 273 K(1 000 ºC) at a stress of
200 MPa, based on the average property values;
2. Multiple domed combustors operating at average burner
outlet temperatures exceeding 1 813 K (1 540 ºC) or
combustors incorporating thermally decoupled combustion
liners, non-metallic liners or non-metallic shells;
3. Components manufactured from any of the following:
a. Organic "composite" materials designed to operate
above 588 K (315 ºC);
b. Metal "matrix" "composite", ceramic "matrix", inter-
metallic or intermetallic reinforced materials specified
in 1C007; or
c. "Composite" material specified in 1C010 and manufac-
tured withresins specified in 1C008.
4. Uncooled turbine blades, vanes, tip-shrouds or other
components designed to operate at gas pathtemperatures
of 1 323 K (1 050 ºC) or more;
5. Cooled turbine blades, vanes or tip-shrouds, other than
those described in 9E003.a.1., exposed to gas path
temperatures of 1 643 K (1 370 ºC) or more;
6. Airfoil-to-disk blade combinations using solidstate joining;7. Gas turbine engine components using "diffusion bonding"
"technology" specified in 2E003.b.;
8. Damage tolerant gas turbine engine rotating components
using powder metallurgy materials controlled by 1C002.b.;
9. "FADEC" for gas turbine and combined cycle engines and
their related diagnostic components, sensors and specially
designed components;
10. Adjustable flow pathgeometry and associated control
systems for:
a. Gas generator turbines;
b. Fan or power turbines;
c. Propelling nozzles;
Note 1: Adjustable flow path geometry and associated
control systems in 9E003.a.10. do not include
inlet guide vanes, variable pitch fans, variable
stators or bleed valves for compressors.
Note 2: 9E003.a.10. does not control "development" or
"production" "technology" for adjustable flow
path geometry for reverse thrust.2000R1334 — EN — 19.01.2002 — 003.001 — 192
▼M3
11. Wide chord hollow fan blades without part-span support;
b. "Technology" "required" for the "development" or "production"
of any of the following:
1. Wind tunnel aero-models equipped withnon-intrusive
sensors capable of transmitting data from the sensors to
the data acquisition system; or
2. "Composite" propeller blades or propfans capable of
absorbing more than 2 000 kW at flight speeds exceeding
Mach0,55;
c. "Technology" "required" for the "development" or "production"
of gas turbine engine components using "laser", water jet, ECM
or EDM hole drilling processes to produce holes having any of
the following sets of characteristics:
1. All of the following:
a. Depths more than four times their diameter;
b. Diameters less than 0,76 mm; and
c. Incidence angles equal to or less than 25º; or
2. All of the following:
a. Depths more than five times their diameter;
b. Diameters less than 0,4 mm; and
c. Incidence angles of more than 25º;
Technical Note:
For the purposes of 9E003.c., incidence angle is
measured from a plane tangential to the airfoil surface
at the point where the hole axis enters the airfoil surface.
d. "Technology" "required" for the "development" or "production"
of helicopter power transfer systems or tilt rotor or tilt wing
"aircraft" power transfer systems;
e. "Technology" for the "development" or "production" of
reciprocating diesel engine ground vehicle propulsion systems
having all of the following:
1. A 'box volume' of 1,2 m3or less;
2. An overall power output of more than 750 kW based on 80/
1269/EEC, ISO 2534 or national equivalents; and
3. A power density of more than 700 kW/m3'box volume';
Technical Note:
"Box volume" in 9E003.e.1. is the product of three perpendi-
cular dimensions measured in the following way:
Length: The length of the crankshaft from front flange to
flywheel face;
Width: The widest of the following:
a. The outside dimension from valve cover to valve
cover;
b. The dimensions of the outside edges of the
cylinder heads; or
c. The diameter of the flywheel housing;
Height: The largest of the following:
a. The dimension of the crankshaft centre-line to the
top plane of the valve cover (or cylinder head)
plus twice the stroke; or
b. The diameter of the flywheel housing.
f. "Technology" "required" for the "production" of specially
designed components, as follows, for high output diesel
engines:
1. "Technology" "required" for the "production" of engine
systems having all of the following components employing
ceramics materials specified in 1C007:
a. Cylinder liners;
b. Pistons;2000R1334 — EN — 19.01.2002 — 003.001 — 193
▼M3
c. Cylinder heads; and
d. One or more other components (including exhaust ports,
turbochargers, valve guides, valve assemblies or insu-
lated fuel injectors);
2. "Technology" "required" for the "production" of turbo-
charger systems, with single-stage compressors having all of
the following:
a. Operating at pressure ratios of 4:1 or higher;
b. A mass flow in the range from 30 to 130 kg per minute;
and
c. Variable flow area capability within the compressor or
turbine sections;
3. "Technology" "required" for the "production" of fuel
injection systems witha specially designed multifuel (e.g.,
diesel or jet fuel) capability covering a viscosity range from
diesel fuel (2,5 cSt at 310,8 K (37,8 ºC)) down to gasoline
fuel (0,5 cSt at 310,8 K (37,8 ºC)), having both of the
following:
a. Injection amount in excess of 230 mm3per injection per
cylinder; and
b. Specially designed electronic control features for
switching governor characteristics automatically
depending on fuel property to provide the same torque
characteristics by using the appropriate sensors;
g. "Technology" "required" for the "development" or "production"
of high output diesel engines for solid, gas phase or liquid film
(or combinations thereof) cylinder wall lubrication, permitting
operation to temperatures exceeding 723 K (450 ºC), measured
on the cylinder wall at the top limit of travel of the top ring of
the piston.
Technical Note:
High output diesel engines: diesel engines with a specified
brake mean effective pressure of 1,8 MPa or more at a speed of
2 300 r.p.m., provided the rated speed is 2 300 r.p.m. or more.
9E101 "Technology" according to the General Technology Note for the
"development" or "production" of goods specified in 9A101,
9A104 to 9A111 or 9A115 to 9A119.
9E102 "Technology" according to the General Technology Note for the
"use" of space launchveh icles specified in 9A004, or goods
specified in 9A005 to 9A011, 9A101, 9A104 to 9A111, 9A115 to
9A119, 9B105, 9B106, 9B115, 9B116, 9B117, 9D101 or 9D103.2000R1334 — EN — 19.01.2002 — 003.001 — 194
▼M3
ANNEX II
COMMUNITYGENERALEXPORTAUTHORISATIONNoEU001
(referred toinArticle 6ofRegulation(EC)No1334/2000)
Issuingauthority:EuropeanCommunity
Part1
This export authorisation covers the following items:
All dual-use items specified in any entry in Annex I to the present Regulation
except those listed in Part 2 below.
Part2
— All items specified in Annex IV.
— 0C001 ‘Natural uranium’ or ‘depleted uranium’ or thorium in the
form of metal, alloy, chemical compound or concentrate and
any other material containing one or more of the foregoing.
— 0C002 ‘Special fissile materials’ other than those specified in Annex
IV.
— 0D001 ‘Software’ specially designed or modified for the ‘develop-
ment’, ‘production’ or ‘use’ of goodsspecified in Category 0,
in sofar as it relates to 0C001 or to those items of 0C002 that
are excluded from Annex IV.
— 0E001 ‘Technology’ according to the Nuclear Technology Note for
the ‘development’, ‘production’ or ‘use’ of goods specified
in Category 0, in so far as it relates to 0C001 or to those
items of 0C002 that are excluded from Annex IV.
— 1A102 Resaturated pyrolised carboncarbon components designed for
space launchveh icles specified in 9A004or sounding rockets
specified in 9A104.
— 7E104 ‘Technology’ for the integration of the flight control,
guidance, and propulsion data into a flight management
system for optimisation of rocket system trajectory.
— 9A009.a. Hybrid rocket propulsion systems withtotal impulse capacity
exceeding 1,1 MNs.
— 9A117 Staging mechanisms, separation mechanisms, and inter-
stages, usable in ‘missiles’.
Part3
This export authorisation is valid throughout the Community for exports to the
following destinations:
Australia
CanadaCzechRepublicHungaryJapan
New Zealand
NorwayPolandSwitzerlandUnited States of America
Note: Parts 2 and 3 may be amended only in conformity with the relevant
obligations and commitments that each Member State has accepted as a
member of the international non-proliferation regimes and export
control arrangements, and in conformity with the public security
interests of each Member State as reflected in its responsibility for
deciding on applications for authorisations to export dual-use items
under Article 6(2) of this Regulation.2000R1334 — EN — 19.01.2002 — 003.001 — 195
▼M3
Conditionsandrequirementsforuseofthisauthorisation
(1) This general authorisation may not be used if the exporter has been informed
by the competent authorities of the Member State in which he is established
that the items in question are or may be intended, in their entirety or in part,
for use in connection with the development, production, handling, operation,
maintenance, storage, detection, identification or dissemination of chemical,
biological or nuclear weapons or other nuclear explosive devices or the
development, production, maintenance or storage of missiles capable of
delivering such weapons, or if the exporter is aware that the items in question
are intended for suchuse.
(2) This general authorisation may not be used if the exporter has been informed
by the competent authorities of the Member State in which he is established
that the items in question are or may be intended for a military end-use as
defined in Article 4(2) of the Regulation in a country subject to an EU, OSCE
or UN arms embargo, or if the exporter is aware that the items in question are
intended for suchuse.
(3) This general authorisation may not be used when the relevant items are
exported to a customs free zone or free warehouse which is located in a
desination covered by this authorisation.
(4) The registration and reporting requirements attached to the use of this general
authorisation, and the additional information that the Member State from
which the export is made might require on items exported under this
authorisation, are defined by Member States. These requirements must be
based on those defined for the use of general export authorisations granted by
those Member States which provide for such authorisations.2000R1334 — EN — 19.01.2002 — 003.001 — 196
▼M3
ANNEX IIIa
(modelform)
(referred toinArticle10(1))
2000R1334 — EN — 19.01.2002 — 003.001 — 197
▼M3
2000R1334 — EN — 19.01.2002 — 003.001 — 198
▼M3
2000R1334 — EN — 19.01.2002 — 003.001 — 199
▼M3
ANNEX IIIb
COMMON ELEMENTS FOR PUBLICATION OF GENERAL EXPORT
AUTHORISATIONS
(referred toinArticle10(3))
(1) Title of general export authorisation
(2) Authority issuing the authorisation(3) EC validity. The following text shall be used:
‘This is a general export authorisation under the terms of Article 6(2) of
Regulation (EC) No 1334/2000. This authorisation, in accordance with
Article 6(2) of that Regulation, is valid in all Member States of the European
Community’.
(4) Items concerned: the following introductory text shall be used:
‘This export authorisation covers the following items’
(5) Destinations concerned: The following introductory text shall be used:
‘This export authorisation is valid for exports to the following destinations’
(6) Conditions and requirements2000R1334 — EN — 19.01.2002 — 003.001 — 200
▼M3
ANNEX IV
(Listreferred toinArticle21(1)ofRegulation(EC)No1334/2000)
Theentriesdonotalwayscoverthecompletedescriptionoftheitemandthe
related notes in Annex I (1). Only Annex I provides for the complete
descriptionoftheitems.
ThementionofaniteminthisAnnexdoesnotaffect theapplicationofthe
provisionsconcerningmass-marketproductsinAnnexI.
PARTI
(possibilityofNationalGeneral Authorisationforintra-Communitytrade)
Itemsofstealthtechnology
1C001 Materials specially designed for use as absorbers of electro-
magnetic waves, or intrinsically conductive polymers.
NB: SEEALSO1C101
1C101 Materials or devices for reduced observables suchas radar
reflectivity, ultraviolet/infrared signatures and acoustic signa-
tures; other than those specified in 1C001, usable in "missiles"
and their subsystems;
1D103 "Software" specially designed for analysis of reduced observables
suchas radar reflectivity, ultraviolet/infrared signatures and
acoustic signatures;
1E101 'Technology' according to the GTN for the 'use'of goodsspecified
in 1C101 or 1D103.
1E102 'Technology' according to the GTN for the 'development' of
'software' specified in 1D103.
6B008 Pulse radar cross-section measurement systems having transmit
pulse widths of 100 ns or less and specially designed components
therefor;
NB: SEEALSO6B108
6B108 Systems specially designed for radar cross section measurement
usable for "missiles" and their subsystems;
ItemsoftheCommunitystrategiccontrol
1C239 High explosives, other than those specified in the military goods
controls, or substances or mixtures containing more than 2 %
thereof, with a crystal density greater than 1,8 gm per cm3and
having a detonation velocity greater than 8 000 m/s.
3A002.g.2 Atomic frequency standards having any of the following:
2. Being "space qualified".
3A229 Firing sets and equivalent high-current pulse generators, as
follows …
NB: SEEALSOMILITARYGOODSCONTROLS
3A232 Detonators and multipoint initiation systems, as follows …
NB: SEEALSOMILITARYGOODSCONTROLS
6A001 Acoustics, limited to the following:
6A001.a.1.b. Object detection or location systems having any of the following:
1. A transmitting frequency below 5 kHz ;
2. Sound pressure level exceeding 224 dB (reference 1 µPa at 1
m) for equipment withan operating frequency in th e band
from5 kHzto 24 kHz inclusive;
3. Sound pressure level …;4. Forming beams of …;2000R1334 — EN — 19.01.2002 — 003.001 — 201
(1) The differences in the wordings/scopes between Annex I and Annex IV are indicated
withbold italic text.
▼M3
5. Designed to operate …;
6. Designed to withstand …;
6A001.a.2.a.1. Hydrophones … Incorporating …
6A001.a.2.a.2. Hydrophones … Having any …6A001.a.2.a.5. Hydrophones … Designed for …6A001.a.2.b. Towed acoustic hydrophone arrays …
6A001.a.2.c. Processing equipment, specially designed for real time applica-
tionwith towed acoustic hydrophone arrays, having "user
accessible programmability" and time or frequency domain
processing and correlation, including spectral analysis, digital
filtering and beamforming using Fast Fourier or other transforms
or processes;
6A001.a.2.d. Heading sensors …
6A001.a.2.e. Bottom or bay cable systems having any of the following:
1. Incorporating hydrophones …
or
2. Incorporating multiplexed hydrophone group signal modules
…;
6A001.a.2.f. Processing equipment, specially designed for real time applica-
tionwith bottom or bay cable systems, having "user accessible
programmability" and time or frequency domain processing and
correlation, including spectral analysis, digital filtering andbeamforming using Fast Fourier or other transforms or processes;
6D003.a. 'Software' for the 'real time processing' of acoustic data;8A002.o.3. Noise reduction systems designed for use on vessels of
1 000 tonnes displacement or more, as follows:
a) systems that attenuate underwater noise at frequencies below
500 Hz and consist of compound acoustic mounts for the
acoustic isolation of diesel engines, diesel generator sets, gas
turbines, gas turbine generator sets, propulsion motors or
propulsion reduction gears, specially designed for sound or
vibration isolation, having an intermediate mass exceeding
30 % of the equipment to be mounted;
b) active noise reduction or cancellation systems, or magnetic
bearings, specially designed for power transmission systems,
and incorporating electronic control systems capable of
actively reducing equipment vibration by the generation of
anti-noise or anti-vibration signals directly to the source;
8A002.p. Pumpjet propulsion systems having a power output exceeding
2,5 MW using divergent nozzle and flow conditioning vane
techniques to improve propulsive efficiency or reduce propulsion-
generated underwater-radiated noise;
8D002 Specific 'software' specially designed or modified for the
'development', 'production', repair, overhaul or refurbishing (re-
machining) of propellers specially designed for underwater noise
reduction.
8E002.a. "Technology" for the "development", "production", repair, over-
haul or refurbishing (re-machining) of propellers specially
designed for underwater noise reduction.
Items of the Community strategic control — Cryptography — Category 5
Part2
5A002.a.2. Equipment designed or modified to perform cryptanalytic
functions.
5D002.c.1. Only software having the characteristics, or performing or
simulating the functions, of equipment specified in 5A002.a.2.
5E002 Only "technology" for the "development", "production" or "use"
of the goods specified in 5A002.a.2. or 5D002.c.1. above.
ItemsoftheMTCRtechnology
7A117 "Guidance sets", usable in "missiles" capable of achieving system
accuracy of 3,33 % or less of the range (e.g., a "CEP" of 10 km or
less at a range of 300 km), except "guidance sets" designed for
missiles with a range under 300 km or manned aircraft .2000R1334 — EN — 19.01.2002 — 003.001 — 202
▼M3
7B001 Test, calibration or alignment equipment specially designed for
equipment specified in7A117 above .
Note: 7B001 does not control test, calibration or alignment
equipment for Maintenance Level I or Maintenance
Level II.
7B003 Equipment specially designed for the "production" of equipment
specified in 7A117 above .
7B103 "Production facilities" specially designed for equipment specified
in 7A117 above.
7D101 "Software" specially designed for the "use" of equipment
specified in 7B003 or 7B103 above.
7E001 "Technology" according to the General Technology Note for the
"development" of equipment or "software" specified in 7A117,
7B003, 7B103 or 7D101 above.
7E002 "Technology" according to the General Technology Note for the
"production" of equipment specified in 7A117, 7B003 and 7B103
above.
7E101 "Technology" according to the General Technology Note for the
"use" of equipment specified in 7A117, 7B003, 7B103 and 7D101
above.
9A004 Space launchveh icles capable of delivering at least a 500 kg
payload to a range of at least 300 km .
N.B.: SEEALSO9A104.
Note 1: 9A004 does not control payloads.
9A005 Liquid rocket propulsion systemscontaining any of the systemsor
components specified in 9A006 usable for space launch vehicles
specifiedin9A004aboveorsoundingrocketsspecifiedin9A104
below.
N.B.: SEEALSO9A105and9A119.
9A007.a. Solid rocket propulsion systems, usable for space launch
vehicles specified in 9A004 above or sounding rockets specified
in9A104 below , withany of th e following:
N.B.: SEEALSO9A119.
a. Total impulse capacity exceeding 1,1 MNs.
9A008.d. Components, as follows, specially designed for solid rocket
propulsion systems:
N.B.: SEEALSO9A108.c.
d. Movable nozzle or secondary fluid injection thrust vector
control systems, usable for space launch vehicles specified in
9A004 above or sounding rockets specified in 9A104 below ,
capable of any of the following:
1. Omni-axial movement exceeding ± 5º;
2. Angular vector rotations of 20º/s or more; or
3. Angular vector accelerations of 40º/s2or more.
9A104 Sounding rockets, capable of delivering at leasta500kgpayload
toa range of at least 300 km.
N.B.: SEEALSO9A004.
9A105.a. Liquid propellant rocket engines, as follows:
N.B.: SEEALSO9A119.
a. Liquid propellant rocket engines usable in "missiles", other
than those specified in 9A005, having a total impulse capacity
of 1,1 MNs or greater; except liquid propellant apogee
engines designed or modified for satellite applications and
having all of the following :
1.nozzle throat diameter of 20 mm or less; and
2.combustionchamber pressure of 15 bar or less.2000R1334 — EN — 19.01.2002 — 003.001 — 203
▼M3
9A106.c. Systems or components, other than those specified in 9A006,
usable in "missiles", as follows, specially designed for liquid
rocket propulsion systems:
c. Thrust vector control sub-systems, except those designed for
rocket systems that are not capable of delivering at least a
500 kg payload to a range of at least 300 km .
Technical Note:
Examples of methods of achieving thrust vector control specified
in 9A106.c. are:
1. Flexible nozzle;
2. Fluid or secondary gas injection;3. Movable engine or nozzle;4. Deflection of exhaust gas stream (jet vanes or probes);
or
5. Thrust tabs.
9A108.c. Components, other than those specified in 9A008, usable in
"missiles", as follows, specially designed for solid rocket
propulsion systems:
c. Thrust vector control sub-systems, except those designed for
rocket systems that are not capable of delivering at least a
500 kg payload to a range of at least 300 km .
Technical Note:
Examples of methods of achieving thrust vector control specified
in 9A108.c. are:
1. Flexible nozzle;
2. Fluid or secondary gas injection;3. Movable engine or nozzle;
4. Deflection of exhaust gas stream (jet vanes or probes);
or
5. Thrust tabs.
9A116 Reentry vehicles, usable in "missiles", and equipment designed or
modified therefor, as follows exceptforreentryvehiclesdesigned
for non-weapon payloads :
a. Reentry vehicles;
b. Heat shields and components therefor fabricated of ceramic or
ablative materials;
c. Heat sinks and components therefor fabricated of light-weight,
high heat capacity materials;
d. Electronic equipment specially designed for reentry vehicles.
9A119 Individual rocket stages, usable in complete rocket systems or
unmanned air vehicles, capable of delivering at least a 500 kg
payloadto a range of 300 km, other than those specified in 9A005
or 9A007.a. above.
9B115 Specially designed "production equipment" for the systems, sub-
systems and components specified in 9A005, 9A007.a., 9A008.d.,
9A105.a., 9A106.c., 9A108.c., 9A116 or 9A119 above.
9B116 Specially designed "production facilities" for the space launch
vehicles specified in 9A004, or systems, sub-systems, and
components specified in 9A005, 9A007.a., 9A008.d., 9A104,
9A105.a., 9A106.c., 9A108.c., 9A116 or 9A119 above.
9D101 "Software" specially designed for the "use" of goods specified in
9B116above.
9E001 "Technology" according to the General Technology Note for the
"development" of equipment or "software" specified in 9A004,
9A005, 9A007.a., 9A008.d., 9B115, 9B116 or 9D101 above.
9E002 "Technology" according to the General Technology Note for the
"production" of equipment specified in: 9A004, 9A005, 9A007.a.,
9A008.d., 9B115 or 9B116 above.
Note: For "technology" for the repair of controlled structures,
laminates or materials, see 1E002.f.2000R1334 — EN — 19.01.2002 — 003.001 — 204
▼M3
9E101 "Technology" according to the General Technology Note for the
"development" or "production" of goods specified in 9A104,
9A105.a., 9A106.c., 9A108.c., 9A116 or 9A119 above.
9E102 "Technology" according to the General Technology Note for the
"use" of space launchveh icles specified in 9A004, 9A005,
9A007.a., 9A008.d., 9A104, 9A105.a., 9A106.c., 9A108.c.,
9A116, 9A119, 9B115, 9B116 or 9D101 above.
Exemptions:
Annex IV does not control the following items of the MTCR technology:
1) that are transferred on the basis of orders pursuant to a contractual relationship
placed by the European Space Agency (ESA) or that are transferred by ESA to
accomplishits official tasks;
2) that are transferred on the basis of orders pursuant to a contractual relationship
placed by a Member State's national space organisation or that are transferred
by it to accomplishits official tasks;
3) that are transferred on the basis of orders pursuant to a contractual relationship
placed in connection witha Community space launchdevelopment and
production programme signed by two or more European governments;
4) that are transferred to a State-controlled space launching site in the territory of
a Member State, unless that Member State controls such transfers within the
terms of this Regulation.
PARTII
(noNationalGeneralAuthorisationforintra-Communitytrade)
ItemsoftheCWC(ChemicalWeaponsConvention)
1C351.d.4. Ricin1C351.d.5. Saxitoxin
ItemsoftheNSGtechnology
AllCategory0ofAnnexIisincludedinAnnexIV,subjecttothefollowing:
— 0C001: this item is not included in Annex IV.
— 0C002: this item is not included in Annex IV, with the exception of special
fissile materials as follows:
(a) separated plutonium;
(b) "uranium enriched in the isotopes 235 or 233" to more than 20 %.
— 0D001 (software) is included in Annex IV except in so far as it relates to
0C001 or to those items of 0C002 that are excluded from Annex IV.
— 0E001 (technology) is included in Annex IV except in so far as it relates to
0C001 or to those items of 0C002 that are excluded from Annex IV.
N.B.:For0C003and0C004, only if for use in a "nuclear reactor" (within
0A001.a.).
1B226 Electromagnetic isotope separators designed for, or equipped
with, single or multiple ion sources capable of providing a total
ion beam current of 50 mA or greater.
Note: a. Capable of enriching stable isotopes;
b. With the ion sources and collectors both in the
magnetic field and those configurations in which they
are external to the field.
1C012 Materials as follows:
Technical Note:
These materials are typically used for nuclear heat sources.
a. Plutonium in any form witha plutonium isotopic assay of
plutonium-238 of more than 50 % by weight;
Note: 1C012.a. does not control:
a. Shipments with a plutonium content of 1 g or less;
b. Shipments of 3 "effective grammes" or less when
contained in a sensing component in instruments.
b. "Previously separated" neptunium-237 in any form.2000R1334 — EN — 19.01.2002 — 003.001 — 205
▼M3
Note: 1C012.b. does not control shipments with a neptu-
nium-237 content of 1 g or less.
1B231 Tritium facilities or plants, and equipment therefor, as follows:
a. Facilities or plants for the production, recovery, extraction,
concentration, or handling of tritium;
b. Equipment for tritium facilities or plants, as follows:
1. Hydrogen or helium refrigeration units capable of cooling
to 23 K (− 250 ºC) or less, withh eat removal capacity
greater than 150 W;
2. Hydrogen isotope storage or purification systems using
metal hydrides as the storage or purification medium.
1B233 Lithium isotope separation facilities or plants, and equipment
therefor, as follows:
a. Facilities or plants for the separation of lithium isotopes;
b. Equipment for the separation of lithium isotopes, as follows:
1. Packed liquid-liquid exchange columns specially designed
for lithium amalgams;
2. Mercury or lithium amalgam pumps;3. Lithium amalgam electrolysis cells;
4. Evaporators for concentrated lithium hydroxide solution.
1C233 Lithium enriched in the lithium-6 (
6Li) isotope to greater than its
natural isotopic abundance, and products or devices containing
enriched lithium, as follows: elemental lithium, alloys,
compounds, mixtures containing lithium, manufactures thereof,
waste or scrap of any of the foregoing.
Note: 1C233 does not control thermoluminescent dosimeters.
Technical Note:
The natural isotopic abundance of lithium-6is approximately 6 ,5
weight % (7,5 atom %).
1C235 Tritium, tritium compounds, mixtures containing tritium in which
the ratio of tritium to hydrogen atoms exceeds 1 part in 1 000, and
products or devices containing any of the foregoing.
Note: 1C235 does not control a product or device containing
less than 1,48 × 103GBq (40 Ci) of tritium.
1E001 "Technology" according to the General Technology Note for the
"development" or "production" of equipment or materials
specified in 1C012.
1E201 "Technology" according to the General Technology Note for the
"use" of goods specified in 1B226, 1B231, 1B233, 1C233, 1C235
and 1C239.
3A201 Electronic components, other than those specified in 3A001, as
follows;
a. Capacitors having either of the following sets of character-
istics:
1. a. Voltage rating greater than 1,4 kV;
b. Energy storage greater than 10 J;
c. Capacitance greater than 0,5 µF; and
d. Series inductance less than 50 nH; or
2. a. Voltage rating greater than 750 V;
b. Capacitance greater than 0,25 µF; and
c. Series inductance less than 10 nH;
3A228 Switching devices, as follows:
a. Cold-cathode tubes, whether gas filled or not, operating
similarly to a spark gap, having all of the following
characteristics:
1. Containing three or more electrodes;
2. Anode peak voltage rating of 2,5 kV or more;3. Anode peak current rating of 100 A or more;
and2000R1334 — EN — 19.01.2002 — 003.001 — 206
▼M3
4. Anode delay time of 10 µs or less;
Note: 3A228 includes gas krytron tubes and vacuum
sprytron tubes.
b. Triggered spark-gaps having both of the following character-
istics:
1. An anode delay time of 15 µs or less; and
2. Rated for a peak current of 500 A or more;
c. Modules or assemblies with a fast switching function having
all of the following characteristics:
1. Anode peak voltage rating greater than 2 kV;
2. Anode peak current rating of 500 A or more; and
3. Turn-on time of 1 µs or less.
3A231 Neutron generator systems, including tubes, having both of the
following characteristics:
a. Designed for operation without an external vacuum system;
and
b. Utilising electrostatic acceleration to induce a tritium-
deuterium nuclear reaction.
3E201 "Technology" according to the General Technology Note for the
"use" of equipment specified in 3A201, 3A228, 3A229, 3A231
ando 3A232.
6A203 Cameras and components, other than those specified in 6A003, as
follows:
a. Mechanical rotating mirror cameras, as follows, and specially
designed components therefor:
1. Framing cameras withrecording rates greater th an 225 000
frames per second;
2. Streak cameras withwriting speeds greater th an 0,5 mm per
microsecond;
Note: In 6A203.a. components of such cameras include
their synchronising electronics units and rotor
assemblies consisting of turbines, mirrors and
bearings.
b. Electronic streak cameras, electronic framing cameras, tubes
and devices, as follows:
1. Electronic streak cameras capable of 50 ns or less time
resolution;
2. Streak tubes for cameras specified in 6A203.b.1.;
3. Electronic (or electronically shuttered) framing cameras
capable of 50 ns or less frame exposure time;
4. Framing tubes and solid-state imaging devices for use with
cameras specified in 6A203.b.3., as follows:
a. Proximity focused image intensifier tubes having the
photocathode deposited on a transparent conductive
coating to decrease photocathode sheet resistance;
b. Gate silicon intensifier target (SIT) videcon tubes, where
a fast system allows gating the photoelectrons from the
photocathode before they impinge on the SIT plate;
c. Kerr or Pockels cell electro-optical shuttering;
d. Other framing tubes and solid-state imaging devices
having a fast-image gating time of less than 50 ns
specially designed for cameras specified in 6A203.b.3.
6A225 Velocity interferometers formeasuring velocities exceeding 1km/
s during time intervals of less than 10 microseconds.
Note: 6A225 includes velocity interferometers such as VISARs
(Velocity interferometer systems for any reflector) and
DLIs (Doppler laser interferometers).
6A226 Pressure sensors, as follows:
a. Manganin gauges for pressures greater than 10 GPa;
b. Quartz pressure transducers for pressures greater than 10 GPa.2000R1334 — EN — 19.01.2002 — 003.001 — 207
▼M3
6E201 "Technology" according to the General Technology Note for the
"use" of equipment specified in 6A203.a, 6A203.b, 6A225 or
6A226.2000R1334 — EN — 19.01.2002 — 003.001 — 208