His research group invents, models and simulates manufacturing processes, particularly those where process physics and geometrical design complexity interact strongly to determine manufacturing performance. CAL is one example of such a process; another particular focus has been on nanoscale manufacturing, including nanoimprint lithography, 2D materials exfoliation, and semiconductor wafer polishing and etching process flows. He holds a Ph.D. in EECS from MIT and a B.A. and M.Eng. from Cambridge University.