Plasma Etching : Fundamentals and Applications (Series on Semiconductor Science and Technology, 7)
by Minoru Sugawara, Barry L. Stansfield
Category: Technology & Engineering

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.