Spin-polarized reflection of electrons in a two-dimensional electron system

We present a method to create spin-polarized beams of ballistic electrons in a two-dimensional electron system in the presence of spin-orbit interaction. Scattering of a spin-unpolarized injected beam from a lithographic barrier leads to the creation of two fully spin-polarized side beams, in addition to an unpolarized specularly reflected beam. Experimental magnetotransport data on InSb/InAlSb heterostructures demonstrate the spin-polarized reflection in a mesoscopic geometry, and confirm our theoretical predictions. PACS: 72.25.Dc ; 73.23.Ad ; 73.63.Hs *Corresponding author: Department of Physics and Astronomy, Clippinger Laboratories, Ohio University, Athens OH 45701 (heremans@ohiou.edu) Hong Chen et al. Page 1 of 14 9/12/2003 The spin of electrons and holes in semiconductor heterostructures has attracted much interest, as a factor to realize new spin-based electronic device concepts [1], and for its potential in realizing quantum computational schemes [2]. In heterostructures, spin can manifest itself through strong and tunable spin-orbit interaction terms [3]. Recent studies have often regarded spin-orbit interaction (SOI) as deleterious, since it can lead to short spin-coherence times. However, semiconductor heterostructures can be fabricated with a long carrier mean free path, longer than lateral dimensions within reach of present lithographic techniques. If the mean free path is longer than the lateral dimensions, charge transport in the geometry occurs ballistically, i.e. the preponderant scattering events involve the device boundaries [4]. In such mesoscopic devices, the decoherence due to SOI is minimized, and SOI, together with the device geometry, can be exploited for spin manipulation, and for the preparation of spin-polarized carrier states. Theoretical studies have explored the effect of SOI on one-dimensional mesoscopic transport, and on vertical transport through heterostructures [5]. Here we present a method to create spinpolarized beams of ballistic electrons by utilizing elastic scattering off a barrier in a straightforward open geometry, and present experimental results verifying the realization of the method. As illustrated in the upper panels of Fig. 1, a beam of two-dimensional electrons in a heterostructure is injected towards a barrier. Both energy and the momentum parallel to the barrier are conserved during the scattering event off the barrier. However, in the presence of SOI, scattering off the barrier leads to spin-flip events, and results in different reflection angles for different spin polarizations. The spin-polarized reflected beams can then be captured through suitably positioned apertures (upper left panel in Fig. 1). The multi-beam reflection process can be utilized to create spinHong Chen et al. Page 2 of 14 9/12/2003 polarized electron populations, without the use of ferromagnetic contacts [6], and toward the preparation of specific spin states for quantum computational purposes. The lower left panel in Fig. 1 shows the sample geometry. Equilateral triangles of inside dimensions 3.0 μm feature apertures, of conducting widths of ~ 0.2 μm , on two sides, while the left side forms the scattering barrier. Several triangles are measured in parallel [7]. The triangles were wet etched into n-type InSb/InAlSb heterostructures after electron beam lithography. The gentle wet-etching procedure affords highly reflecting barriers in III-V heterostructures [4]. Carriers enter the geometry from the top, travel ballistically to the left barrier, reflect off the latter, and exit through the bottom aperture. The total distance, including the reflection, between the apertures, amounts to 2.6 μm . The heterostructures were grown by molecular beam epitaxy on GaAs substrates, and consisted of a 20 nm wide InSb well, where the two-dimensional electron system (2DES) resides, flanked by In0.91Al0.09Sb barrier layers [8]. Electrons are provided by Si δ -doped layers on both sides of the well, separated from the 2DES in the well by 30 nm spacers. A third Si doped layer lies close to the heterostructure surface. All measurements were performed at 0.5 K, and at this temperature, a density cm 11 10 6 . 2 × = S N -2 and a mobility of 150,000 cm/Vs provide a mean free path of ~ 1.3 μm . Although shorter than the distance between the two apertures in Fig. 1, this mean free path is sufficiently long to ensure observation of a signal due to a ballistic trajectory. Indeed, the cutoff of the signal at the mean free path is not abrupt, but rather is characterized by a gradual decay of the signal amplitude [4,7]. The InSb well material features a narrow energy gap, a small effective mass, and also a strong SOI. Two SOI mechanisms can lead to the spindependent reflection effect: the Bychkov-Rashba mechanism, originating in the inversion Hong Chen et al. Page 3 of 14 9/12/2003 asymmetry of the 2DES confining potential, and the Dresselhaus mechanism, from the bulk inversion asymmetry [3]. Experimental values for the SOI parameters in InSb-based heterostructures have only recently been accessed by optical measurements, and the preliminary data confirms SOIs larger than in most other III-V materials [9]. In our measurements, a current is drawn between the two apertures (Fig. 1), and the resulting voltage drop is measured as a function of a magnetic field applied perpendicular to the plane of the 2DES. In the semi-classical limit, the magnetic field B serves to slightly deflect the ballistic carriers from linear trajectories, and thus to sweep the trajectories over the exit aperture. As an illustration of the role of B , the upper left panel of Fig. 1 shows trajectories calculated for our sample geometry and electron density (details of the calculation follow). The interaction with the barrier gives rise to three reflection angles, and the exit (lower) aperture is sufficiently wide to accommodate the three resulting exiting beams. For a narrow range of B , all three beams can be aimed to pass through the aperture. Varying B in either direction causes the beams to be sequentially cut off, either by one side of the aperture or by the other. Each cutoff results in a stepwise rise in the potential or resistance measured over the structure. We expect 3 cutoffs on each side of the sweep, or 6 steps in total. In the experimental realization, the cutoffs will not be sharp, since we expect an angular spread at the injection aperture, albeit narrowed by the previously observed collimating effect of mesoscopic apertures [10]. Figure 2 contains experimental data for two separate samples ( and ), plotted as the four-contact resistance measured over the triangular structures, versus applied 1 S 2 S B . For sample , 6 minima appear at low 1 S B , superimposed on a negative magnetoresistance weak-localization background. The 6 minima are interpreted to result Hong Chen et al. Page 4 of 14 9/12/2003 from the stepwise increase in resistance as B is varied, added to the negative magnetoresistance background. We also note here that the wet-etching process results in uncertainty in the structure’s dimensions, and that therefore a non-zero may have to be applied to center the three beams on the exit aperture. Hence, the 6 minima need not be centered around . Sample underwent a deeper wet-etch, resulting in narrower apertures, as betrayed by the higher resistance values. Hence, the range of where three beams fit into the exit aperture of is reduced as compared to . Two steps in resistance occur in such a narrow range of that they are observed as one, resulting in 5 observable minima. Assuming that the Bychkov-Rashba mechanism leads to the observed minima, the data can be used to estimate the magnitude of the spin splitting. SOI can be evaluated by the spin-splitting B