The course takes students through the various steps involved in CMOS processing. There are two lectures each week describing the underlying theory. During the laboratory sessions we explore the individual processes such as thermal oxidation, chemical vapor deposition, reactive ion etching etc. Students work in groups of 3 or 4 and there is a large 'hands-on' component. By the end of the semester we will have completed a 2 micron, single-poly, single metal CMOS process.
Students use a probe station to measure the electrical properties of the devices.
More information can be found from the Course Synopsis . Lab Groups Final Report Course Details Required Text Silicon VLSI Technology by Plummer, Deal and Griffin. The following schedule is provisional and may change slightly as we proceed through the semester. The links are to lecture notes etc. Please print copies of the lectures in advance and bring the notes with you.