The engineer can address and rectify the situation before wafers are damaged or the system shuts down. This automated process can also operate with other instruments to maintain consistent concentrations of the chemicals used throughout the polishing process. Over time, these volatile chemicals can degrade from simple exposure to environmental conditions. Instruments used to gauge the chemical concentration within the slurry can signal subsystems to deliver precise amounts of the required chemical dosage to replenish the main delivery system. RSView32 displays the particulate levels throughout the system and automatically collects the data for historical reports.
Users can then compile productivity reports based on the graphical data and find correlations.
For example, if a high percentage of nonideal particles cyclically develops near a certain pump and the frequency of yield-impacting microscratches peaks during these intervals, users can adjust the SLC alarm set points of this pump to signal this situation when it develops. With all of the historical data now automatically available to our customers, they can monitor the distribution systems to look at circumstances in every blend that comes through the distribution stations. We have provided them with a powerful tool that increases yield, reduces labor, and improves data collection. All rights reserved.