In addition to the many computers located in individual research areas, the Department of Chemical Engineering has a Computational Laboratory . The Department of Chemical Engineering has a longstanding commitment to research in colloid science. After Pattern Photobleaching instrument have also been implemented in a department laboratory devoted to CPS research. The surface science laboratory currently consists of five UHV chambers equipped with instrumentation for surface preparation and various types of surface analysis. The system comprises a gas distribution network, a reactor, an exhaust treatment subsystem, and a rack of control electronics.
Standard bubblers provide precursors for reaction.
The concentrations of the precursors are measured with ultrasonic binary gas analyzers. The reactor features an impinging jet flow geometry characterized by uniformity of deposition and high mass transfer rates. A load-lock chamber connected to the reactor by a gate valve minimizes the contamination of the reactor during sample introduction. A substrate processing area, including a laminar flow hood that provides a particle-free environment and facilities for polishing wafers, is located in an adjoining laboratory. Who's Who in the Dept.