This laboratory has equipment which supports the synthesis and processing of thin film systems ranging from ultra thin films to multi-layers and superlattices. Both physical deposition systems, such as sputtering and electron beam equipment, as well as chemical vapor deposition systems, such as metalorganic chemical vapor deposition equipment, are available. The laboratory also provides a means of forming metastable materials with a laser, and is equipped with a scanning ellipsometer which can be used from near IR through the visible range.
Software is available to perform simulation on multi-layer structures.
C Mechanical pump with a molecular sieve trap. This system can handle up to eight solid or liquid sources for deposition. All the source materials are fed into the main chamber via computer controlled valves. Microwave power is available to sustain a gas discharge at 10-3 torr. Thus complex oxides and nitrides can be made by this machine with precise stoichiometry.