It is hoped that by closely examining the films deposited as functions of total pressure, substrate bias, nitrogen partial pressure and magnetron current, an accurate description of CN films can be achieved. Further work will include the deposition of CNx onto steel substrates. Thin film coating by magnetron sputtering system has a wide variety of applications. Through proper control of reactive gas pressures, substrate bias, magnetron current etc. a successful thin film coating of various compositions can be achieved. This project will involve deposition of a number of coatings, including TiN and CNx.
TiN is used as a decorative thin film coating, but also has good wear characteristics.
C3N4 film, yet to be deposited is predicted to be harder than diamond, and thus from a tribological point of view beta-C3N4 coated tools would be very important. The aim of the project will be to deposit these films on steel, and then onto tool materials. Subsequently a study will be undertaken to deposit the thin films on corroded coated tool materials. It is necessary to establish the comparative deposition rate on the corroded and uncorroded parts of the coated tool. The film deposition will be undertaken in a closed field, unbalanced magnetron system.