Slide 9 For more information on specific silicon wafer products, please visit the Client Services area. Epi reactors are programmed to deposit or grow the Epi layer using a dopant gas for specific resistivity, trichlorosilane gas for Epi growth, and hydrogen for proper mixture. Wafers are cleaned in a solution of ammonia and hydrogen peroxide.
Sound waves pulsate through the solution to dislodge particles from the wafer.