The handle adjusts from 36 to 72 in. The system is visually coded to reduce the risk of cross-contamination, and it can be sterilized using gamma, EtO, and autoclave methods. Etch Bath Filter Pall Port Washington, NY The Ulti-Etch filter's crescent shape combines high voids volume with a large filter area for efficient operation in recirculating etch applications. To maintain low levels, the inherently hydrophobic PVDF medium is modified chemically to make it hydrophilic. The tool buffer allows 300-mm wafer pods to be stored at the process tool, thus decreasing load times and fab storage area requirements.
Scaleable architecture minimizes the footprint for each process tool.
The wafer management system maintains a Class 1 or better environment during handling functions such as wafer lot splitting, sorting, merging, and batch transfers. At the start of each process cycle, the MegaSonics cleaner's automatic tuning feature self-tunes each crystal in the bath to its natural frequency. The constant tuning reduces heat generation and minimizes process degradation, preventing failures caused by high reflected power. A temperature sensor on the crystal provides real-time feedback for temperature monitoring and characterization. This programmable switching feature enables the use of standard or customized recipes.