Resist strip and residue removal are performed in the same chamber, providing high throughput and rapid parallel processing. The FusionGemini ES provides the lowest damage of any residue removal-capable plasma asher in the industry. A Fusion-proprietary designed plasma source, containing no tuning stubs, optimizes the plasma source over the entire operating range. The FusionGemini Plasma Asher is a dry photoresist removal tool that also offers process solutions for bulk strip and limited residue removal. The Fusion-proprietary designed microwave source provides high ash rates, and the lowest damage and widest process window of any asher available on the market today.
Radiant lamps deliver multi-temperature recipe control and uniform wafer heating.
No thermal chuck is used in the reactor chamber, ensuring wide process flexibility, and low particle contamination.