Eindhoven, The Netherlands. Arrays of thousands parallel metallic nanowires are fabricated on V-groove patterned InP substrates using two novel techniques. The first technique consists of depositing a thin metallic film onto the patterned substrate and subsequent wet etching of this film into nanowires down to 50 nm in width. The second technique is more general and involves oblique evaporation of metal onto the patterned substrate, naturally resulting in wires as narrow as 20 nm.
Resistance measurements show that wires made with both techniques are electrically continuous.