As such, any CVD process is possible to some degree in the helical resonator device. It is also possible to etch materials, with appropriate gas-phase chemistries, and to oxidize substrates, by switching to an oxidizing medium. Such applications are also the focus of research in the semiconductor industry, for potential application in biomedical science and separation technology as well as by industries dealing with small particles, such as catalysts. The first application involves the surface modification of granules, pellets, and powders for paints, metals, and fibers. In the second application, chemical functionality in thin membranes is of interest both in separation technologies and in biomedical uses.
Surface roughness is a controllable feature in plasma polymerization.
The ability to modify the surface roughness could be desirable for increasing surface areas, which in turn could possibly have a major impact on catalyst design. This technology is available now. LLNL is looking for industrial partners interested in working with us to further develop and apply these processing techniques. The Industrial Partnerships and Commercialization Office at Lawrence Livermore National Laboratory invites industries to explore the possibility of a match between their technological needs and our Laboratory's multidisciplinary capabilities. Our specialists know how to connect industry representatives with researchers in their field of interest.