The ICP torch can operate with a wide variety of plasma gases providing an extremely clean and effective thermal reaction environment. A jet of nitrogen plasma gas generated during testing of TCC's ICP torch system. Compared to DC arc plasma systems, the induction-coupled plasma technology is more reliable, easier to control, and offers unique processing options for thermal conversion reactions. These characteristics make ICP technology amenable to the long-term operations required for industrial processing applications. Generic flowchart of TCC's ICP Reforming Process .
More detailed flowcharts are available.
Feed materials may be gases, liquids, or slurries introduced into the reactor near the plasma torch. The reactant stream concentration, reactor temperature, and mixing characteristics can be controlled independently. The reforming reactor is designed for thorough mixing of reactants at the desired temperature and overall gas residence time. This ensures thermodynamic equilibrium and complete conversion. Fluctuations in the feed composition can be adjusted with flow control of additional reactants, resulting in a consistent and predictable product quality.