Certification data are taken at the wafer center and also around circles of 5 mm and 10 mm radius from the center. NIST Special Publication 260-131 fully documents the measurement and certification process. This SRM is intended for calibration of infrared absorption measurements for interstitial oxygen in silicon. Each silicon piece is 2.5 cm x 2.5 cm square and 0.2 cm in thickness, double-side polished and mounted in a carrier for insertion into IR instruments. Certification of SRM 2551 was performed by calibrating against a master set of specimens retained from the Grand International Round Robin from which the IOC-88 conversion coefficient was derived.
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The SRM Semiconductor brochure is a collation from the NIST SRM Catalog of those SRMs developed specifically for the semiconductor industry and those developed for other applications but that are expected to be of value to the semiconductor industry. The following is a description of potential future SRMs currently in the planning or development stages. Currently a NIST calibration service for customer supplied artifacts. The specimen was primarily designed for Magnetic Force Microscopy, however, it can also be used with Scanning Electron Microscopy with Polarization Analysis. MIRS is based on thin-film CoCr hard disk media, found in typical commercial hard drives.