The chamber is available for deposition of various silane and TEOS-based dielectric CVD films. The hydrophobic filter is compatible with a wide range of process acids, bases, solvents, and etchants. Small-flow elements are available for use with process gases. The filter is staged, assembled, tested, and packaged in an automated Class 1000 cleanroom. A proprietary thermal bonding technique involves no binders, adhesives, or other foreign substances, minimizing extractable content and maximizing effluent cleanliness.
Units are integrity tested prior to release.
The wafer stage is maintenance free. The 710PT pinch valve provides tight control over microliter shots or continuous application of fluids of low or medium viscosity. The unit can be mounted to a production stand or attached to the supplier's dispensing robots or rotary dispensing systems. Flow rates and shot sizes can be adjusted by varying the dispense-time interval. The valve uses disposable tubes and accommodates materials such as cyanoacrylates.