The silicon nitride probes consist of a cantilever integrated with a sharp tip on the end. This is accomplished by making the cantilever short, to provide a high resonant frequency, and thin, to provide a small force constant. The ability to image steep sidewalls on a sample surface is determined by the sidewall angles of the tip . Thickness is cubed in the spring constant calculation, thus, actual values can vary substantially. Same as Model NP-020, but one wafer containing more than 500 tipless NanoProbes.
Thickness is cubed in the spring constant calculation, thus, actual values can vary substantially.
The oxide sharpening process is used to produce a tip with two end points, one which is 100nm higher than the other. 100nm in height. Thickness is cubed in the spring constant calculation, thus actual values can vary substantially. There are three different types of Olympus oxide-sharpened probes which are primarily differentiated by their cantilever thickness and cantilever shape. Contains 1 wafer of 500 Probes Contact Etched Silicon Probes Each contact etched silicon probe consists of an integrated single crystal silicon cantilever and tip.