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Several new variations on this old technique have made micron spot sizes possible. Second, the attachment of the mirrors to the springs has been refined to minimize induced strain. Finally, to increase photon flux at the sample, the mirror systems are designed to accept light from the largest possible aperture. Of the two systems in use so far, one for hard x-ray diffraction is being developed for measuring strain in thin films. Researchers use it to examine surface defects and the local-area surface chemistry of microstructures for the semiconductor industry.