Sputtering advance claimed Two researchers at the University of Michigan have built an instrument that allows engineers to observe the sputtering process in action for the first time. This method permits observers to watch the atom layers in real time as they arrange themselves on a surface. John Bilello and Steven Yalisove, researchers in the university's department of materials science and engineering, say their breakthrough could enable scientists to adjust sputtering processes as they happen in order to maximize the properties of the thin films they are using. Bilello and Yalisove designed their instrument for use with sputter plasmas. An additional highlight is a two-page time line of technological milestones since the invention of the transistor at Bell Labs in 1947.
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