Xenon Difluoride silicon etch process. Analytical Measurements Thin-film reflectometry and other thickness measurements, optical microscopy, and grooving and staining. Applications Small quantities of specialized semiconductor test specimens, experimental samples, prototype devices, and processed materials can be produced. The processes and processing equipment can be monitored during operation to study the process chemistry and physics. The effects of variations in operating conditions and process gases and chemical purities can be investigated.
Research is performed under well-controlled conditions.
Rather, the laboratory emphasizes breadth and flexibility to support a wide variety of projects. Currently, research projects address many aspects of microelectronic processing steps and materials as well as silicon micromachining. A simple CMOS process has been established. Recent work has also begun in the field of molecular electronics. Availability Facility staff welcome collaborative research projects consistent with the research goals of the NIST semiconductor program.