Perform multiple implants and sum any or all of the resulting profiles to achieve uniform distributions. Save costly implanter and analysis time by modeling implants first. This allows the user to model the affect of a thermal anneal cycle on a given distribution profile. Anneal cycle ramp up, ramp down, and constant temperature segments are dictated by the user. The High Dose Module models the effect of changing substrate composition when implanting to high doses.
Migration occurs more rapidly toward the surface due to radiation damage effects.
A separate plot displays the target growth due to swelling.