Etching and delayering can be performed on the same tool. The planar plasma tool is a versatile system that allows independent control of RF power, gas flow, gas mixing, pressure, substrate temperature, and electrode spacing.
Most devices remain functional after overlay removal.
This allows active probing to be performed. A recipe list which includes the specific plasma chemistry and other parameters is maintained at the tool for easy programming. All ICs, r-pacs, discrete power drivers, and resistors can be processed through the plasma system. Special fixturing is available to control the plasma field in order to minimize electrical degradation effects. This tool is a parallel plate reactive ion etching system with a 5-inch quartz electrode and a 1 KW, 14.56 MHz RF generator.