William M. Miller, Sandia National Labs. A packet of lecture notes and interesting reprints will be provided, as well as light refreshments. If paying by check, please make payable to Stanford University and contact Ms. Plewa for mailing and registration instructions. We need to have your registration confirmed by February 11th, 1998. There will be no registration at the door.
Registration is limited, so please sign up as soon as possible.
Post-CMOS micromachining technology 1.1 CMOS compatible bulk and surface micromachining. 1.2 Dielectric membranes and stress compensation. 1.3 Silicon membranes and silicon cantilever beams. 1.4 Technology transfer to CMOS IC manufacturers. 2.3 Infrared intrusion detector.