Deposition discusses how two methods of vapor deposition are used for depositing silicon films onto substrates. It gives some ideas on what these films are used for in the devices when built. Next we have planar technology , which discusses processes that are involved in fabrications of semiconductors. Processes that are listed are Epitaxial growth , Oxidation , Doping , and Pattern definition . Epitaxial growth explains how three types of techniques can be used to grow thin crystalline films onto a crystalline substrate.
Oxidation deals with growing silicon dioxide films on the substrate for a variety of purposes.
Doping discusses how impurities are introduced into the wafers for obtaining the required resistivity and conductivity it needs for certain applications. Lastly, Pattern Definition only deals with how patterns are created on the wafers with the use of photoresist, masking, and exposure. The next section of the tutorial shows and explains the CMOS process . This tutorial shows cross-section illustrations of the step by step CMOS IC fabrication. The last section of the tutorial discusses the vacuum technology process used in creating these devices.