We have successfully fabricated current-controlled SiO 2 microtips by using micromachining technique. Curling of tip takes place due to bimetallic stresses during fabrication. We have taken each of these dimensions of 3 values - smaller, nominal and larger. The L-9 array experiment has been laid down on the mask and fig. 8 shows the SEM micrograph of the same.
Results are still to be published.
The higher resolution shows better images. 10 micron bar Fig. 7. 100 micron bar Fig. 8. The objective is to obtain a 'pyramidal tip' of silicon that is pointing up and is very close to a metal pad that covers it from top. We attempt here to design a pad in such a way that it allows tip to be etched but does not fall off.