This machine is used for TMAH and KOH etching of wafers that are clean enough to meet MTL s CMOS standards. This is an ICL hood located in the 5th floor EML metrology room. Resist is not allowed either.
Masks are usually nitride, although there is a moderately slow oxide etch rate.
Chemicals used in the TMAH-KOHhood are corrosive and toxic, and care must be taken in handling them. Besides the smock, hood, booties and vinyl gloves, which must be worn at all times in EML, you must also wear the face shield, latex gloves, vinyl sleeve protectors and splash apron, when using the hood. Know the location of the eye wash and safety shower, and become familiar with the MSDS for any chemical you use. Contamination control is of the utmost importance. Make sure you are using the correct KOH or TMAH labware, that it is clean and stored correctly at the beginning and end of your process.