Send us your feedback . One of the most difficult contaminants to control is moisture in silane gas, which can cause particle generation in tubing and chambers and can adversely affect the quality of thin films, which have become increasingly thinner with each process generation.
Filtration is a standard practice for maintaining the particulate cleanliness of process gases.
In the case of anhydrous silane, particles are expunged by classical methods, ensuring removal of those particles generated upstream in the gas delivery lines. However, if moisture contaminates the gas, particles will form downstream of the filter because of silicon dioxide nuclei formation, which can be followed by nuclei condensing and particle formation. The clustering of siloxane molecules can also lead to particle formation. The chemistry is an integral composite of intercalate reactive metal compounds in reduced form. Schematic of the next-generation purifier.