The magnetron head is mounted remotely near the applicator and connected via a protected cable set. Options include a watertight cable set, and an enclosure design that allows the DC section and the magnetron head to be mounted in a single NEMA enclosure. Continuous monitoring of critical operating parameters enables the system to protect itself in the event of load mismatch and process arc downs. A manually controlled stub tuner enables the user to tune a broad range of load impedance, and an auto-tuner module is available as an option. External user interface connections enable the MW6 to be controlled via the user's PLC or host computer.
Local operation is available through the use of an optional control panel.
These sources may also be used in conjunction with sputter deposition sources to enable tighter process control and enhanced reactive film properties. In conjunction with specialized high pressure processing equipment, the Series MW can be used to grow diamond like films. Actual Weight 60 lbs. Actual Weight 7 lbs. We'll help you select the right model for your application.