The department of physics has various laboratories involved in fundamental and applied research. Physics of Thin Films and Interfaces The Laboratory of Physics of Thin Films and Interfaces is headed by Prof. Bernard Equer. Research activities are mainly focused on amorphous and microcrystalline semiconductor thin-films and interfaces. The objective is to expand the basic knowledge of these semiconductors, to improve their material properties, and to use them in various device applications. The driving force is the growing industrial utilization of reactive plasma techniques within the electronics industry.
Industrial applications demand a solid scientific basis for plasma and plasma-surface processes.
The research approach combines studies of plasma physics and chemistry, with material characterization. In-situ characterization techniques are the main tools and a large part of the research program is devoted to these methods. Such studies have provided a better understanding of physical, optical, and chemical properties of the plasma deposited layers and have contributed to improved plasma reactor design. Emphasis on amorphous semiconductors and crystalline materials, semiconductors or metals. Center of excellence in ellipsometry Ellipsometry is an optical technique used to determine the optical properties of thin films with very high degree of precision.