Now we would estimate the chances of success as being in the range of 90 percent. We still have a little bit of work to do, but we've demonstrated most of the elements of the technology. Initially there were a whole series of showstoppers. It's been a lot of gradual progress, but I think we've made steady progress over the last three years. And we've got some very bright people working in the laboratory on the problem.
Lithography is a process of transferring circuit geometries to the silicon surface.
EUV lithography works in much the same way, except that we have to use a different wavelength of light and we need to use different lenses. No, not really, because it's all enclosed. Of course the vacuum chamber is very thick steel, so none of the UV radiation can escape. Basically, conventional lithography, which the industry has used for a number of years, won't be useful as we continue to shrink the geometries to a smaller process. We have to continue scaling the wavelength of light that is used.