The objective of this course is to introduce the principles of selected semiconductor fabrication equipment processes through a combination of direct laboratory experience, lectures, computer simulation, and written material. It is intended for engineers and scientists who wish to develop a deeper understanding of the equipment and processes used in semiconductor fabrication.
Enrollment is limited and advance enrollment is required.
His research interests focus on modeling and diagnostics of low-pressure materials processing plasmas, environmental aspects of semiconductor processing, and experimental and numerical studies of surface interactions. He has taught thin films processing at UC Berkeley for more than 14 years, and teaches a short course on plasma processing through the American Vacuum Society. He received an S.B. in chemical engineering from M.I.T. in 1996. He was a summer intern at Intel in 1996 and 1997.