The use of high level sources is a moderate level of concern. Portable heaters are used in this area to maintain the air temperature and are a low level concern. A small quantity of potassium hydroxide is used in the film development area. This is a low level of concern. The annealing oven used to develop the TLD personal dosimeters and is totally automatic.
Interlocks prevent the operator comming into contact with hot surfaces.
The balance of this area is office space where there is a low level hazard potential of repetive motion or ergonomic concern. Almost negligable secondary hazards include potential for internal and external exposures from loose contamination and fire. Facility content material and construction almost eliminate the fire potential. There is a very low LOC for toxic chemical exposure from fluxes and lead containing solder. Portable heaters may be used in this area and there is a low LOC for trip hazards.