The vapor deposits on the surrounding surfaces. Chemically, titanium a is very reactive substance. The film deposited on the surface combines with many residual gases to form solid compounds like titanium hydrides, oxides, and nitrides. This is a form of chemical pumping. The ion pump is a gas capture device.
Ion pumps are clean operating devices.
11 Torr range with overnight bake-out of the system. The bake-out process drives residual gas off the surface walls. This gas is then pumped by the ion pumps. The process in which a gas particle leaves a surface and moves into the volume of the vacuum chamber is referred to as outgassing. Outgassing can keep a system from reaching satisfactory pressure.