Ions are produced via a multi-step process in a system such as that shown schematically in the figure below. Ions are initially formed by stripping electrons from source atoms in a plasma. The ions are then extracted and pass through a mass-analyzing magnet, which selects only those ions of a desired species, isotope, and charge state. The beam of ions is then accelerated using a potential gradient column. A series of electrostatic and magnetic lens elements shapes the resulting ion beam and scans it over an area in an end station containing the parts to be treated.
Ion implantation offers numerous advantages for treating component surfaces.
A primary benefit is the ability to selectively modify the surface without detrimentally affecting bulk properties, largely because the process is carried out at low substrate temperatures. The process is also extremely controllable and reproducible and can be tailored to modify different surfaces in desired ways. Components are placed in the vapor, and individual coating atoms or molecules condense and stick on the surface of the component to form the coating. The concurrent ion bombardment differentiates IBAD from other thin film deposition techniques. It significantly improves adhesion, and permits control over film properties such as morphology, density, stress level, crystallinity, and chemical composition.