Photolithography is the main technique for microstructuring of electronic devices in microelectronics. Laser lithography started to develop as an independent optical patterning technique in the early eighties. Some specific features of the laser radiation allow the local activation of a number of physico-chemical processes, which led to direct structuring the surface of a solid without using photoresists as in conventional photolithography. In some cases laser lithography allows to combine in one step the lithographic process with other laser induced technological processes as deposition, etching, oxidation, diffusion, etc. The physico-chemical basis of laser lithography as a technique for direct micropatterning is an object of my studies.
Lasers can play a key role in creating three-dimensional microstructures.
Optimizing the interaction between laser and material during the ablation process of important ceramic electro-optic and piezoelectric materials can lead to the fabrication of devices based on such microstructures with unique characteristics.