Such standards are essential for quality control of the latest lithographic products, as well as for the present intense research and development effort in nanofabrication. To take advantage of these nanometer-sized defects, it is necessary that the target be a good insulator, nearly atomically smooth over a region of several square microns. Feasibility studies for various materials are currently possible. Mica-based standards for scanning probe microscopes in the range of 1 to 100 nm are currently being developed.
Lithographic applications require further studies on ion positioning mechanisms.
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