In a more analytical mode the system takes more slices through the feature, providing more sidewall information. When drawing profiles, any unusual characteristic becomes obvious. If desired, the platform does not preclude the use of the model library analytical method. Although designed to do measurements on the fly, it can use models in much the same way it does film thickness measurements, by curve-fitting to theoretical, ideal model curves. The system's main differentiation from other platforms is that it is not library-dependent.
Libraries can be cumbersome, expensive and, at times, difficult to transfer.
Another issue with a library is that considerable support may sometimes be required from its manufacturer, particularly if the library is something that the user is unwilling to generate himself. Copyright 2001 Cahners Business Information , A Division of Reed Elsevier, Inc . Privacy Policy .