In many applications plasmas are used to promote or induce chemical reactions.
Examples are plasma etching and plasma enhanced chemical vapor deposition.
These techniques are widely used in the manufactoring of integrated circuits in order to add or remove material from the substrates. The possible use of the plasma-state of gases in galvanic cells is investigated in the present study. In model experiments the substrate and the plasma react chemically, leading to a solid product between the electrodes and the gaseous electrolyte. The experimental setup is depicted. Ag-Cl 2 are presented.