Wet oxidation of silicon is typically used to rapidly grow a thick oxides that are used as diffusion barriers. This also prevents contamination of the furnaces. The furnace operation is controlled by a Process Controller which can be programmed with 8 step recipes.
Gas flow is controlled by electronic mass flow controllers.
The furnace gets very hot and takes a long time to cool down. Never try to open the furnace after you have started it. Processed wafers will be removed at a subsequent lab session. Turn the oven on. The following procedure will program the furnace to ramp to your desired temperature, dwell at that temperarture for a given time, and turn itself off.