We believe that customers will benefit immensely from these offerings as they move to embrace new materials and advance the performance capabilities of their process tools. The product utilizes quadrupole mass spectrometry and it has been extensively tested during continuous on-line monitoring of the entire copper CVD process at pressures up to 5 Torr.
Continuous monitoring maintains repeatability and controls process drift.
This minimizes sensor drift and provides repeatable data. Calibration can be automatic via a manometer signal input. The result is a longer time between preventative maintenance cycles, faster maintenance of the exhaust system and pump, and the elimination of expensive clog-induced pump failures. However, a disadvantage of the TEOS process is a propensity to create solid and viscous-liquid effluent byproducts, which can cause obstructions in the vacuum pump line. Consequently, the result is increased particle levels, impeded gas flow, and potentially catastrophic pump failure.