This seminar covers the basic principles of the design, construction and theory behind high current, medium current and high energy implanters. Particular attention is given to process issues and how they interact with device effects. Advice is given on how to extract the best performance from the equipment and how to match process requirements to implant parameters.
Active participation is encouraged.
Participants' inquiries often lead to very useful discussions for all. If you're involved in ion implantation, don't miss this opportunity. As a new or returning participant, you'll acquire new techniques and information on implantation processes and applications, access new contacts and renew industry connections.