Nanospec film thickness system. Coherent Radiation 15 W krypton ion laser. Coherent Radiation 8 W argon ion laser. Coherent Radiation 5 W argon ion laser. Coherent Radiation 3 W argon ion laser.
Capabilities range from epitaxial growth to materials characterization to device fabrication.
Metallization facilities, including sputtering systems and E beam evaporation equipment. Reactive ion etching 2 chamber system with F and Cl etching capability. Surface and thin film analysis. Secondary ion mass spectrometry. Scanning Auger microprobe.