Reaction is a stepwise procedure in which alkoxy species react to form silanol groups which then intercondense with liberation of alcohol to form organofunctional three-dimensional network films. The polysiloxane film formed may be 50-1000 D thick depending on the amount of water present on the substrate surface. This film effectively modifies the surface and permits the subsequent reaction with the photoresist. The AP400 Series are best applied to a substrate by spinning at 3000-5000 rpm. Approximately 3-5 mls of AP400 solution is applied.
Centrifugal forces produce even distribution across the surface.
Photoresist is then applied in standard manner following manufacturer's recommendations. The AP400 Series of materials is stable for 6 months in unopened containers when stored at room temperature in a dry, dark area. Please consult our Material Safety Data Sheet for more information.