Theoretical examination of the laser damage threshold of thin coatings. Development of a new optical technique for monitoring wafer temperature and oxide film growth on silicon wafers. Development of nonintrusive laser sensor technology. The Microscale Heat Transfer Laboratory is one of only a few laboratories in the world capable of measuring changes in surface temperature with subpicosecond temporal resolution. Computational facilities include both personal computers and an IBM RS-6000.
Current research is sponsored by a variety of private and public institutions.
For More Information Researchers at the Microscale Heat Transfer Laboratory welcome additional collaborations with industry.