Equipment includes a hot isostatic press for firing at temperatures up to 2,300 C and an ultrasonic machine tool for drilling, planing, and milling ceramic particles. This laboratory contains spectrophotometer systems for determining optical properties of materials, including photoluminescence, photoconductivity, and photocapacitance. A Fourier transform infrared system is available for high-resolution studies. A variable-pressure SEM, capable of imaging and analysis of wet and pristine materials. Two highly qualified microscopists manage the EPIC facilities, and regular training sessions and short courses are offered.
All chambers are part of single vacuum system operating under ultraclean conditions.
This facility offers equipment and expertise for producing metals, alloys, oxides, semiconductors, and other nonmetallic compounds in polycrystalline, single-crystal, or bicrystal form. The facility houses the Electronic Materials Laboratory, with equipment for chemical vapor deposition and molecular beam epitaxy for growth of III-V semiconductor and oxide thin films and for epitaxial growth of metals. Other available techniques include Czochralski and floating zone methods, arc melting, vacuum casting, chemical vapor transport, and evaporation. These methods can be used in a vacuum or a variety of controlled atmospheres and allow selective doping of the materials. Equipment is also available for zone refining, zone leveling, and vacuum filtration of medium melting-point materials.