This document establishes the procedures for plasma enhanced chemical vapor deposition of thin films on silicon, GaAs, and other substrates in the Nanoelectronics Laboratory.
All films are silane based.
4.2 Vacuum Integrity Maintenance Maintaining a low background pressure is necessary to deposit quality thin films. A cleanroom mask must be worn while the chamber is open. 4.2.4 Load only clean substrates into the vacuum chamber. In the event of an emergency, shut off the system power with the emergency power off button on the front of the system. This checklist must be done before venting the chamber.