Refers to devices ranging in size from a nanometer to a micron. The combination of silane and nitrogen in a CVD process to form an insulating thin film. A colorless, odorless gas used in a variety of fabrication processes etching, deposition and anneal. Optical cross-connects work entirely at the optical layer and may be able to operate without having to convert to electrical and back again. The cause of bandwidth limitations in a fiber.
Dispersion causes the spreading or broadening of light pulses as they travel through a fiber.
The three major types are modal dispersion, chromatic dispersion and waveguide dispersion. The passivation layer is patterned and etched to open up on the bonding pads. This determines if the photo pattern was produced optimally. If it is determined that the photo pattern is satisfactory, the wafers are passed on to etching. A device that receives optical power and changes it to an electrical signal.