Characteristics of optical components and their combination in lithographic systems, modulation transfer function, coherency. I A study of electrostatics and magnetostatics important to the understanding of the physics of semiconductor devices and microelectronic processing. II A study of time varying electromagnetic fields important to optical and electrical systems. Special emphasis is given to the relation between the structural parameters of these devices and their electrical characteristics. I Covers the chemical aspects of microlithography and resist processes.
Concentration is on single-layer resist materials and processing for optical lithography.
Material characterization is studied through experimental design techniques. Microlithography I Lab Laboratory to be taken concurrently with 0305-563. Topics emphasize optical lithography and single-layer resist materials. Material characterization is studied through experimental design techniques. 0305-599 Independent Study A supervised investigation within a microelectronic area of student interest.