DOI: 10.57760/sciencedb.14628
title: Measuring_Technological_Innovation_Among_Lithography_Machine_Enterprises_A_Perspective_from_Patent_Claim_Structures
title: Measuring_Technological_Innovation_Among_Lithography_Machine_Enterprises_A_Perspective_from_Patent_Claim_Structures

description: According to the Key Digital Technology Patent Classification System (2023) issued by the China National Intellectual Property Administration of China, the photolithography technology of semiconductor devices in high-end chips (keywords include EUV lithography, extreme ultraviolet lithography, immersion lithography and ArFi lithography) is selected as the research object, and its IPC classification number includes G03F7/00; G03F7/20；G03F7/207；G03F7/213；G03F7/22；G03F7/23；G03F7/24；H01L21/027；H01L21/033；H0L21/31；H01L21/312；H01L21/47；H01L41/332；H05G2/00；H05K3/06；H05K3/07。 Select the Zhihuiya Global Patent Database (www.zhihuiya. com) to search for information on lithography machine technology patents authorized in China: dated October 25, 2023, including application number, publication number, title, legal status/event, independent claims, claims, number of inventors of the original application (patent right), application year, authorization year, IPC classification number, number of patents in the same family, citation index, citation index, etc. Data cleaning removes duplicate and invalid data, and determines 26905 valid patent information, among which the top five important enterprises with the highest number of original applications have a total of 5135 patents. The tables titled ASML Patent, SMEE Patent, SMIC Patent, Tokyo Electron Patent, and Nikon Patent provide the raw data for enterprise patents and preliminary statistical results on the structure of claims.The table titled ASML Independent Claims, SMEE Independent Claims, SMIC Independent Claims, Tokyo Electron Independent Claims, and Nikon Independent Claims presents the statistical results of the independent claims structure for corporate patents. The table titled ASML Dependent Claims, SMEE Dependent Claims, SMIC Dependent Claims, Tokyo Electron Dependent Claims, and Nikon Dependent Claims presents the statistical results of the dependent claim structure for enterprise patents. The table named Chart is an analysis of the number of patent claims, the length of each part in the independent claim structure, and the length of each part in the dependent claim structure, as well as the analysis results obtained directly from SPSS software. 
description: According to the Key Digital Technology Patent Classification System (2023) issued by the China National Intellectual Property Administration of China, the photolithography technology of semiconductor devices in high-end chips (keywords include EUV lithography, extreme ultraviolet lithography, immersion lithography and ArFi lithography) is selected as the research object, and its IPC classification number includes G03F7/00; G03F7/20；G03F7/207；G03F7/213；G03F7/22；G03F7/23；G03F7/24；H01L21/027；H01L21/033；H0L21/31；H01L21/312；H01L21/47；H01L41/332；H05G2/00；H05K3/06；H05K3/07。 Select the Zhihuiya Global Patent Database (www.zhihuiya. com) to search for information on lithography machine technology patents authorized in China: dated October 25, 2023, including application number, publication number, title, legal status/event, independent claims, claims, number of inventors of the original application (patent right), application year, authorization year, IPC classification number, number of patents in the same family, citation index, citation index, etc. Data cleaning removes duplicate and invalid data, and determines 26905 valid patent information, among which the top five important enterprises with the highest number of original applications have a total of 5135 patents. The tables titled ASML Patent, SMEE Patent, SMIC Patent, Tokyo Electron Patent, and Nikon Patent provide the raw data for enterprise patents and preliminary statistical results on the structure of claims.The table titled ASML Independent Claims, SMEE Independent Claims, SMIC Independent Claims, Tokyo Electron Independent Claims, and Nikon Independent Claims presents the statistical results of the independent claims structure for corporate patents. The table titled ASML Dependent Claims, SMEE Dependent Claims, SMIC Dependent Claims, Tokyo Electron Dependent Claims, and Nikon Dependent Claims presents the statistical results of the dependent claim structure for enterprise patents. The table named Chart is an analysis of the number of patent claims, the length of each part in the independent claim structure, and the length of each part in the dependent claim structure, as well as the analysis results obtained directly from SPSS software.