title: ÐÑÑÐ»ÐµÐ´Ð¾Ð²Ð°Ð½Ð¸Ðµ Ð¿ÑÐ¾ÑÐµÑÑÐ° Ð±ÐµÐ·Ð¼Ð°ÑÐ¾ÑÐ½Ð¾Ð¹ Ð»Ð¸ÑÐ¾Ð³ÑÐ°ÑÐ¸Ð¸
title: Ð²ÑÐ¿ÑÑÐºÐ½Ð°Ñ ÐºÐ²Ð°Ð»Ð¸ÑÐ¸ÐºÐ°ÑÐ¸Ð¾Ð½Ð½Ð°Ñ ÑÐ°Ð±Ð¾ÑÐ° Ð±Ð°ÐºÐ°Ð»Ð°Ð²ÑÐ°
titleType: Subtitle
title: Investigation of the processes of maskless photolithography
Creators: name: ÐÑÑÐ¸Ð¿ÐµÐ½ÐºÐ¾, ÐÐ¸ÐºÑÐ¾ÑÐ¸Ñ
Publisher: name: Ð¡Ð°Ð½ÐºÑ-ÐÐµÑÐµÑÐ±ÑÑÐ³ÑÐºÐ¸Ð¹ Ð¿Ð¾Ð»Ð¸ÑÐµÑÐ½Ð¸ÑÐµÑÐºÐ¸Ð¹ ÑÐ½Ð¸Ð²ÐµÑÑÐ¸ÑÐµÑ ÐÐµÑÑÐ° ÐÐµÐ»Ð¸ÐºÐ¾Ð³Ð¾
Year: 2021
Subjects: Ð±ÐµÐ·Ð¼Ð°ÑÐ¾ÑÐ½Ð°Ñ Ð»Ð¸ÑÐ¾Ð³ÑÐ°ÑÐ¸Ñ
3D Ð¿ÑÐ¸Ð½ÑÐµÑ
ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑ
ÑÐ¾ÑÐ¾Ð»Ð¸ÑÐ¾Ð³ÑÐ°ÑÐ¸Ñ
maskless lithography
3D printing
photoresist
photolithography

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description: The paper considers the basics of the photolithography process, its main types and methods. The use of AnycubicPhoton S photopolymer 3D printer for maskless photolithography on silicon substrates is suggested. Experiments were conducted to create photoresistive masks using a 3D printer. The dependences of the properties of the obtained mask from the photoresist depending on the volume of the photoresist, the rotation time of the centrifuge, the exposure time on the 3D printer, and the development time are investigated. The study of the samples after the process of maskless lithography was carried out on a scanning electron microscope.As a result of experiments, the conditions of the optimal regime on the silicon surface were revealed, a photoresist film with a low percentage of unevenness and a high percentage of solubility in the developer was obtained. The samples were studied after the maskless lithography processes using a scanning electron microscope. An analysis of the experimental data was carried out, according to the results of which it was determined how the technological parameters affect the obtained structures in silicon.