title: ÐÐ¿ÑÐ¸Ð¼Ð¸Ð·Ð°ÑÐ¸Ñ Ð¿ÑÐ¾ÑÐµÑÑÐ° Ð¿Ð»Ð°Ð·Ð¼Ð¾Ñ Ð¸Ð¼Ð¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ð¼Ð¾Ð½Ð¾ÐºÑÐ¸ÑÑÐ°Ð»Ð»Ð¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÐºÐ²Ð°ÑÑÐ°
title: Ð¼Ð°Ð³Ð¸ÑÑÐµÑÑÐºÐ°Ñ Ð´Ð¸ÑÑÐµÑÑÐ°ÑÐ¸Ñ
titleType: Subtitle
Creators: name: Ð¯Ð½ÐºÐµÐ²Ð¸Ñ, ÐÐ»ÐµÐ±
Publisher: name: Ð¡Ð°Ð½ÐºÑ-ÐÐµÑÐµÑÐ±ÑÑÐ³ÑÐºÐ¸Ð¹ Ð¿Ð¾Ð»Ð¸ÑÐµÑÐ½Ð¸ÑÐµÑÐºÐ¸Ð¹ ÑÐ½Ð¸Ð²ÐµÑÑÐ¸ÑÐµÑ ÐÐµÑÑÐ° ÐÐµÐ»Ð¸ÐºÐ¾Ð³Ð¾
Year: 2016
Subjects: ÐÐ°Ð·Ð¾Ð²ÑÐ¹ ÑÐ°Ð·ÑÑÐ´
ÐÐ»Ð°Ð·Ð¼ÐµÐ½Ð½Ð°Ñ Ð¾Ð±ÑÐ°Ð±Ð¾ÑÐºÐ°
ÐÐ»Ð°Ð·Ð¼Ð° (ÑÐ¸Ð·.)
Ð¼Ð¾Ð½Ð¾ÐºÑÐ¸ÑÑÐ°Ð»Ð»Ð¸ÑÐµÑÐºÐ¸Ð¹ ÐºÐ²Ð°ÑÑ
Ð¿Ð»Ð°Ð·Ð¼Ð¾Ñ Ð¸Ð¼Ð¸ÑÐµÑÐºÐ¾Ðµ ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ðµ
monocrystalline quartz
plasma-chemical etching

description: ÐÐ¿ÑÐ¸Ð¼Ð¸Ð·Ð¸ÑÐ¾Ð²Ð°Ð½ Ð¿ÑÐ¾ÑÐµÑÑ Ð¿Ð»Ð°Ð·Ð¼Ð¾ÑÐ¸Ð¼Ð¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ð¼Ð¾Ð½Ð¾ÐºÑÐ¸ÑÑÐ°Ð»Ð»Ð¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÐºÐ²Ð°ÑÑÐ° Ð² ÑÑÑÐ°Ð½Ð¾Ð²ÐºÐµ Ð¿Ð»Ð°Ð·Ð¼Ð¾ÑÐ¸Ð¼Ð¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ñ Ð¸ÑÑÐ¾ÑÐ½Ð¸ÐºÐ¾Ð¼ ÐÐ§ Ð¸Ð½Ð´ÑÐºÑÐ¸Ð²Ð½Ð¾ ÑÐ²ÑÐ·Ð°Ð½Ð½Ð¾Ð¹ Ð¿Ð»Ð°Ð·Ð¼Ñ. ÐÐ¿Ð¸ÑÐ°Ð½Ñ ÑÐ°Ð·Ð»Ð¸ÑÐ½ÑÐµ Ð²Ð¸Ð´Ñ Ð³Ð°Ð·Ð¾Ð²ÑÑ ÑÐ°Ð·ÑÑÐ´Ð¾Ð², ÑÐ°ÐºÐ¶Ðµ Ð¿ÑÐ¾Ð²ÐµÐ´ÐµÐ½ Ð°Ð½Ð°Ð»Ð¸Ð· ÑÑÑÐµÑÑÐ²ÑÑÑÐ¸Ñ Ð¼ÐµÑÐ¾Ð´Ð¾Ð² ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ð¼Ð¾Ð½Ð¾ÐºÑÐ¸ÑÑÐ°Ð»Ð»Ð¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÐºÐ²Ð°ÑÑÐ°. ÐÐ¿Ð¸ÑÐ°Ð½ Ð¸ Ð¿ÑÐ¸Ð¼ÐµÐ½ÐµÐ½ Ð¼ÐµÑÐ¾Ð´ Ð¿Ð»Ð°Ð½Ð¸ÑÐ¾Ð²Ð°Ð½Ð¸Ñ ÑÐºÑÐ¿ÐµÑÐ¸Ð¼ÐµÐ½ÑÐ¾Ð² Ð½Ð° Ð¾ÑÐ½Ð¾Ð²Ðµ Ð¼Ð°ÑÑÐ¸ÑÐ½Ð¾Ð³Ð¾ Ð¼ÐµÑÐ¾Ð´Ð° Ð¢Ð°Ð³ÑÑÐ¸. ÐÑÐ¾Ð²ÐµÐ´ÐµÐ½Ð° ÑÐµÑÐ¸Ñ ÑÐºÑÐ¿ÐµÑÐ¸Ð¼ÐµÐ½ÑÐ¾Ð² ÑÐ¾Ð³Ð»Ð°ÑÐ½Ð¾ ÑÐ°Ð·ÑÐ°Ð±Ð¾ÑÐ°Ð½Ð½Ð¾Ð¼Ñ Ð¿Ð»Ð°Ð½Ñ Ð´Ð»Ñ Ð²ÑÑÐ²Ð»ÐµÐ½Ð¸Ñ ÑÑÐµÐ¿ÐµÐ½Ð¸ Ð²Ð»Ð¸ÑÐ½Ð¸Ñ ÑÐµÑÐ½Ð¾Ð»Ð¾Ð³Ð¸ÑÐµÑÐºÐ¸Ñ Ð¿Ð°ÑÐ°Ð¼ÐµÑÑÐ¾Ð² Ð½Ð° ÑÐºÐ¾ÑÐ¾ÑÑÑ ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ ÐºÐ²Ð°ÑÑÐ°. ÐÐ±ÑÐ°Ð±Ð¾ÑÐ°Ð½Ð½ÑÐµ Ð¾Ð±ÑÐ°Ð·ÑÑ Ð¸Ð·ÑÑÐµÐ½Ñ Ð½Ð° ÑÐ°ÑÑÑÐ¾Ð²Ð¾Ð¼ ÑÐ»ÐµÐºÑÑÐ¾Ð½Ð½Ð¾Ð¼ Ð¼Ð¸ÐºÑÐ¾ÑÐºÐ¾Ð¿Ðµ. ÐÐ¾Ð»ÑÑÐµÐ½Ð½ÑÐµ Ð´Ð°Ð½Ð½ÑÐµ Ð¾Ð±ÑÐ°Ð±Ð¾ÑÐ°Ð½Ñ Ð¿Ð¾ Ð¼ÐµÑÐ¾Ð´Ñ Ð¢Ð°Ð³ÑÑÐ¸ Ð² Ð¿Ð°ÐºÐµÑÐµ Minitab 17. ÐÐ¿ÑÐµÐ´ÐµÐ»ÐµÐ½Ñ Ð¾Ð¿ÑÐ¸Ð¼Ð°Ð»ÑÐ½ÑÐµ Ð¿Ð°ÑÐ°Ð¼ÐµÑÑÑ Ð´Ð»Ñ Ð¿ÑÐ¾ÑÐµÑÑÐ° Ð¿Ð»Ð°Ð·Ð¼Ð¾ÑÐ¸Ð¼Ð¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ð¼Ð¾Ð½Ð¾ÐºÑÐ¸ÑÑÐ°Ð»Ð»Ð¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÐºÐ²Ð°ÑÑÐ° Ð¸ Ð¿ÑÐ¾Ð²ÐµÐ´ÐµÐ½Ñ ÐºÐ¾Ð½ÑÑÐ¾Ð»ÑÐ½ÑÐµ ÑÐºÑÐ¿ÐµÑÐ¸Ð¼ÐµÐ½ÑÑ. ÐÐ¾Ð»ÑÑÐµÐ½Ñ ÑÑÑÑÐºÑÑÑÑ Ñ Ð¾ÐºÐ½Ð°Ð¼Ð¸ Ð³Ð»ÑÐ±Ð¸Ð½Ð¾Ð¹ 30 Ð¼ÐºÐ¼. ÐÑÐ¾Ð²ÐµÐ´ÐµÐ½ Ð¿ÑÐ¾ÑÐµÑÑ ÑÐºÐ²Ð¾Ð·Ð½Ð¾Ð³Ð¾ ÑÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ Ð¼Ð¾Ð½Ð¾ÐºÑÐ¸ÑÑÐ°Ð»Ð»Ð¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÐºÐ²Ð°ÑÑÐ°.
description: Optimized plasma chemical etching of single crystal quartz for installation of plasma-chemical etching with a source of high frequency inductively coupled plasma.Described various types of gas discharges, and the analysis of existing single-crystal quartz etching techniques. Described and applied the method of experiments design based on the Taguchi matrix method. Completed series of experiments in accordance with the plan to determine the degree of influence of technological parameters on the quartz etch rate. The samples were examined with scanning electron microscope. The data processed in the package Minitab 17 by the Taguchi method. The optimum parameters for plasma chemical etching of single crystal quartz and conducted control experiments. Obtained structure with windows 30 Âµm deep. Swipe through the process of etching the single crystal quartz.