title: ÐÑÐ¸Ð¼ÐµÐ½ÐµÐ½Ð¸Ðµ ÑÐµÑ Ð½Ð¾Ð»Ð¾Ð³Ð¸Ð¸ Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ð³Ð¾ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ñ Ð´Ð»Ñ Ð½Ð°Ð½ÐµÑÐµÐ½Ð¸Ñ ÑÑÐ½ÐºÑÐ¸Ð¾Ð½Ð°Ð»ÑÐ½ÑÑ ÑÐ»Ð¾ÐµÐ²
title: Ð²ÑÐ¿ÑÑÐºÐ½Ð°Ñ ÐºÐ²Ð°Ð»Ð¸ÑÐ¸ÐºÐ°ÑÐ¸Ð¾Ð½Ð½Ð°Ñ ÑÐ°Ð±Ð¾ÑÐ° Ð±Ð°ÐºÐ°Ð»Ð°Ð²ÑÐ°
titleType: Subtitle
title: Application of magnetron sputtering technology for deposition of functional layers
Creators: name: ÐÐ°ÑÐ¸Ð»ÑÑÑÐº, ÐÐ¼Ð¸ÑÑÐ¸Ð¹
Publisher: name: Ð¡Ð°Ð½ÐºÑ-ÐÐµÑÐµÑÐ±ÑÑÐ³ÑÐºÐ¸Ð¹ Ð¿Ð¾Ð»Ð¸ÑÐµÑÐ½Ð¸ÑÐµÑÐºÐ¸Ð¹ ÑÐ½Ð¸Ð²ÐµÑÑÐ¸ÑÐµÑ ÐÐµÑÑÐ° ÐÐµÐ»Ð¸ÐºÐ¾Ð³Ð¾
Year: 2023
Subjects: ÐºÐ°ÑÐ¾Ð´Ð½Ð¾Ðµ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ðµ
Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ðµ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ðµ
Ð¿ÑÐµÐ·Ð¾ÑÑÑÐµÐºÑ
ÑÑÐ½ÐºÑÐ¸Ð¾Ð½Ð°Ð»ÑÐ½ÑÐ¹ ÑÐ»Ð¾Ð¹
Ð½Ð¸ÑÑÐ¸Ð´ Ð°Ð»Ð»ÑÐ¼Ð¸Ð½Ð¸Ñ
ÑÐµÐ·Ð¾Ð½Ð°ÑÐ¾Ñ Ð½Ð° Ð¾Ð±ÑÐµÐ¼Ð½ÑÑ Ð°ÐºÑÑÑÐ¸ÑÐµÑÐºÐ¸Ñ Ð²Ð¾Ð»Ð½Ð°Ñ
Ð»Ð¸Ð½Ð¸Ñ Ð·Ð°Ð´ÐµÑÐ¶ÐºÐ¸
cathode sputtering
magnetron sputtering
piezoeffect
functional layer
aluminum nitride
acoustic bulk wave resonator
delay line

description: ÐÐ°Ð½Ð½Ð°Ñ ÑÐ°Ð±Ð¾ÑÐ° Ð¿Ð¾ÑÐ²ÑÑÐµÐ½Ð° Ð¸ÑÑÐ»ÐµÐ´Ð¾Ð²Ð°Ð½Ð¸Ñ Ð²Ð»Ð¸ÑÐ½Ð¸Ñ Ð¿Ð°ÑÐ°Ð¼ÐµÑÑÐ¾Ð² Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ð³Ð¾ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ñ Ð² Ð¿ÑÐ¾ÑÐµÑÑÐµ ÑÐ¾ÑÐ¼Ð¸ÑÐ¾Ð²Ð°Ð½Ð¸Ñ ÑÑÐ½ÐºÑÐ¸Ð¾Ð½Ð°Ð»ÑÐ½ÑÑ ÑÐ»Ð¾ÐµÐ² Ð² Ð¿ÑÐµÐ·Ð¾ÑÐ»ÐµÐºÑÑÐ¸ÐºÐ°Ñ. ÐÐ°Ð´Ð°ÑÐ¸, ÐºÐ¾ÑÐ¾ÑÑÐµ ÑÐµÑÐ°Ð»Ð¸ÑÑ Ð² ÑÐ¾Ð´Ðµ Ð¸ÑÑÐ»ÐµÐ´Ð¾Ð²Ð°Ð½Ð¸Ñ: 1. ÐÐ·ÑÑÐµÐ½Ð¸Ðµ Ð¾ÑÐ¾Ð±ÐµÐ½Ð½Ð¾ÑÑÐµÐ¹ Ð¼ÐµÑÐ¾Ð´Ð¾Ð² ÐºÐ°ÑÐ¾Ð´Ð½Ð¾Ð³Ð¾ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ñ. 2. ÐÐ·ÑÑÐµÐ½Ð¸Ðµ Ð¿ÑÐ¾ÑÐµÑÑÐ° Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ð³Ð¾ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ñ ÐºÐ°Ðº ÑÐ°ÑÑÐ½Ð¾Ð³Ð¾ ÑÐ»ÑÑÐ°Ñ ÐºÐ°ÑÐ¾Ð´Ð½Ð¾Ð³Ð¾ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ñ. 3. ÐÑÐ¸Ð¼ÐµÐ½ÐµÐ½Ð¸Ðµ ÑÐµÑÐ½Ð¾Ð»Ð¾Ð³Ð¸Ð¸ Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ð³Ð¾ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ñ Ð² Ð¿ÑÐ¾ÑÐµÑÑÐµ ÑÐ¾ÑÐ¼Ð¸ÑÐ¾Ð²Ð°Ð½Ð¸Ñ ÑÑÐ½ÐºÑÐ¸Ð¾Ð½Ð°Ð»ÑÐ½Ð¾Ð³Ð¾ ÑÐ»Ð¾Ñ Ð² Ð¿ÑÐµÐ·Ð¾ÑÐ»ÐµÐºÑÑÐ¸ÐºÐ°Ñ. 4. ÐÑÑÐ»ÐµÐ´Ð¾Ð²Ð°Ð½Ð¸Ðµ Ð¿Ð¾Ð»ÑÑÐµÐ½Ð½ÑÑ ÑÐµÐ·ÑÐ»ÑÑÐ°ÑÐ¾Ð² Ð¸ Ð°Ð½Ð°Ð»Ð¸Ð· ÑÐ²Ð¾Ð¹ÑÑÐ² ÑÑÐ½ÐºÑÐ¸Ð¾Ð½Ð°Ð»ÑÐ½Ð¾Ð³Ð¾ ÑÐ»Ð¾Ñ ÐÐ¾Ð¼Ð¸Ð¼Ð¾ ÑÑÐ¾Ð³Ð¾, Ð² ÑÐ°Ð±Ð¾ÑÐµ ÑÐ°ÑÐºÑÑÐ²Ð°ÐµÑÑÑ Ð¿Ð¾Ð½ÑÑÐ¸Ðµ Ð¿ÑÐµÐ·Ð¾ÑÐ»ÐµÐºÑÑÐ¸ÑÐµÑÐºÐ¾Ð³Ð¾ ÑÑÑÐµÐºÑÐ° Ð¸ ÐµÐ³Ð¾ Ð¿ÑÐ¸Ð¼ÐµÐ½ÐµÐ½Ð¸Ñ Ð² ÑÑÐµÑÐµ Ð¼Ð¸ÐºÑÐ¾ÑÐ¸ÑÑÐµÐ¼Ð½Ð¾Ð¹ ÑÐµÑÐ½Ð¸ÐºÐµ. ÐÐ°ÐµÑÑÑ Ð¿Ð¾Ð½ÑÑÐ¸Ðµ Ð¾ ÑÐµÐ·Ð¾Ð½Ð°ÑÐ¾ÑÐµ Ð½Ð° Ð¾Ð±ÑÐµÐ¼Ð½ÑÑ Ð°ÐºÑÑÑÐ¸ÑÐµÑÐºÐ¸Ñ Ð²Ð¾Ð»Ð½Ð°Ñ Ð¸ Ð¾ÑÐ¾Ð±ÐµÐ½Ð½Ð¾ÑÑÑÑ ÐµÐ³Ð¾ ÑÐ¾Ð·Ð´Ð°Ð½Ð¸Ñ. Ð Ð°Ð±Ð¾ÑÐ° Ð¿ÑÐ¾Ð²ÐµÐ´ÐµÐ½Ð° Ð½Ð° Ð±Ð°Ð·Ðµ ÐÐ Â«ÐÐÐ¢Ð Â«ÐÐÐÐÐÐÐ ÐÂ»Â», Ñ Ð¸ÑÐ¿Ð¾Ð»ÑÐ·Ð¾Ð²Ð°Ð½Ð¸ÐµÐ¼ Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ð¹ ÑÑÑÐ°Ð½Ð¾Ð²ÐºÐ¸ Ð½Ð° Ð¿Ð¾ÑÑÐ¾ÑÐ½Ð½Ð¾Ð¼ ÑÐ¾ÐºÐµ Â«SemiTEq STEÂ» Â«MS900SÂ». ÐÑÐµÐ´Ð¾ÑÑÐ°Ð²Ð»ÐµÐ½Ñ ÑÑÐ»Ð¾Ð²Ð¸Ñ Ð¿Ð¾Ð»ÑÑÐµÐ½Ð¸Ñ ÑÐ»Ð¾ÐµÐ² Ð½Ð¸ÑÑÐ¸Ð´Ð° Ð°Ð»ÑÐ¼Ð¸Ð½Ð¸Ñ Ð¸Ñ Ð¸ÑÐ¾Ð³Ð¾Ð²ÑÐµ Ð°Ð¼Ð¿Ð»Ð¸ÑÑÐ´Ð½Ð¾-ÑÐ°ÑÑÐ¾ÑÐ½ÑÐµ ÑÐ°ÑÐ°ÐºÑÐµÑÐ¸ÑÑÐ¸ÐºÐ¸. Ð Ð´Ð°Ð½Ð½Ð¾Ð¹ ÑÐ°Ð±Ð¾ÑÐµ ÑÐ°ÑÑÐ¼Ð°ÑÑÐ¸Ð²Ð°ÐµÑÑÑ Ð¿ÑÐ¾ÑÐµÑÑ ÑÐ¾Ð·Ð´Ð°Ð½Ð¸Ñ Ð»Ð¸Ð½Ð¸Ð¸ Ð·Ð°Ð´ÐµÑÐ¶ÐºÐ¸, Ð¸ ÑÐ¾Ð»Ð¸ Ð½Ð¸ÑÑÐ¸Ð´Ð° Ð°Ð»ÑÐ¼Ð¸Ð½Ð¸Ñ Ð² Ð´Ð°Ð½Ð½Ð¾Ð¼ Ð¿ÑÐ¾ÑÐµÑÑÐµ Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ð³Ð¾ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ñ. ÐÐ°Ð½ÐµÑÐµÐ½Ð¸Ðµ ÑÐ»Ð¾ÐµÐ² Ð¿ÑÐ¾Ð¸ÑÑÐ¾Ð´Ð¸Ð»Ð¾ Ñ ÑÐ°Ð·Ð½ÑÐ¼ Ð²ÑÐµÐ¼ÐµÐ½Ð½ÑÐ¼ Ð¸Ð½ÑÐµÑÐ²Ð°Ð»Ð¾Ð¼, ÑÑÐ¾ Ð¿Ð¾Ð·Ð²Ð¾Ð»Ð¸Ð»Ð¾ Ð¾ÑÐµÐ½Ð¸ÑÑ Ð¿ÑÐ¸Ð³Ð¾Ð´Ð½Ð¾ÑÑÑ Ð²ÑÐ±ÑÐ°Ð½Ð½ÑÑ Ð¿Ð°ÑÐ°Ð¼ÐµÑÑÐ¾Ð² Ð¿ÑÐ¸ Ð·Ð°Ð´Ð°Ð½Ð½ÑÑ Ð¿ÑÐ¾Ð¸Ð·Ð²Ð¾Ð´ÑÑÐ²Ð¾Ð¼ ÑÐµÑÐ½Ð¸ÑÐµÑÐºÐ¸Ñ Ð¿Ð°ÑÐ°Ð¼ÐµÑÑÐ°Ñ.
description: Topic of the final qualification work: "Application of magnetron sputtering technology for deposition of functional layers." This work is devoted to the study of the influence of magnetron sputtering parameters in the process of formation of functional layers in piezoelectrics. Tasks that were solved in the course of the study: 1. Studying the features of cathode sputtering methods. 2. Study of the process of magnetron sputtering as a special case of cathode sputtering. 3. Application of magnetron sputtering technology in the process of formation of a functional layer in piezoelectrics. 4. Study of the obtained results and analysis of the properties of the functional layer In addition, the paper reveals the concept of the piezoelectric effect and its application in the field of microsystem technology. The concept of a resonator based on bulk acoustic waves and the features of its creation is given. The work was carried out on the basis of JSC "NITI "AVANGARD"", using a DC magnetron installation "SemiTEq STE" "MS900S". The conditions for obtaining aluminum nitride layers and their final amplitude-frequency characteristics are provided. This paper discusses the process of creating a delay line, and the role of aluminum nitride in this process of magnetron sputtering. The layers were applied at different time intervals, which made it possible to assess the suitability of the selected parameters with the technical parameters specified by the production.