title: Ð Ð°Ð·ÑÐ°Ð±Ð¾ÑÐºÐ° Ð¸ ÑÐ¾Ð·Ð´Ð°Ð½Ð¸Ðµ ÑÑÑÐ°Ð½Ð¾Ð²ÐºÐ¸ ÑÐµÐ°ÐºÑÐ¸Ð²Ð½Ð¾Ð³Ð¾ Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ð³Ð¾ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ñ
title: Ð²ÑÐ¿ÑÑÐºÐ½Ð°Ñ ÐºÐ²Ð°Ð»Ð¸ÑÐ¸ÐºÐ°ÑÐ¸Ð¾Ð½Ð½Ð°Ñ ÑÐ°Ð±Ð¾ÑÐ° Ð±Ð°ÐºÐ°Ð»Ð°Ð²ÑÐ°
titleType: Subtitle
title: Development and creation of reactive magnetron sputtering plant
Creators: name: ÐÐµÐ»ÑÐ½Ð¾Ð², ÐÐ»ÑÑ
Publisher: name: Ð¡Ð°Ð½ÐºÑ-ÐÐµÑÐµÑÐ±ÑÑÐ³ÑÐºÐ¸Ð¹ Ð¿Ð¾Ð»Ð¸ÑÐµÑÐ½Ð¸ÑÐµÑÐºÐ¸Ð¹ ÑÐ½Ð¸Ð²ÐµÑÑÐ¸ÑÐµÑ ÐÐµÑÑÐ° ÐÐµÐ»Ð¸ÐºÐ¾Ð³Ð¾
Year: 2021
Subjects: Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ðµ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ðµ
ÑÐµÐ°ÐºÑÐ¸Ð²Ð½ÑÐµ Ð³Ð°Ð·Ñ
Ð¿Ð¾ÑÑÐ¾ÑÐ½Ð½ÑÐ¹ ÑÐ¾Ðº
Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½
Ð°Ð²ÑÐ¾Ð¼Ð°ÑÐ¸Ð·Ð°ÑÐ¸Ñ
magnetron sputtering
reactive gases
direct current
magnetron
automation

description: Ð¢ÐµÐ¼Ð° Ð²ÑÐ¿ÑÑÐºÐ½Ð¾Ð¹ ÐºÐ²Ð°Ð»Ð¸ÑÐ¸ÐºÐ°ÑÐ¸Ð¾Ð½Ð½Ð¾Ð¹ ÑÐ°Ð±Ð¾ÑÑ: Â«Ð Ð°Ð·ÑÐ°Ð±Ð¾ÑÐºÐ° Ð¸ ÑÐ¾Ð·Ð´Ð°Ð½Ð¸Ðµ ÑÑÑÐ°Ð½Ð¾Ð²ÐºÐ¸ ÑÐµÐ°ÐºÑÐ¸Ð²Ð½Ð¾Ð³Ð¾ Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ð³Ð¾ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸ÑÂ». Ð Ð´Ð°Ð½Ð½Ð¾Ð¹ ÑÐ°Ð±Ð¾ÑÐµ Ð±ÑÐ»Ð¾ Ð¿ÑÐ¾Ð²ÐµÐ´ÐµÐ½Ð¾ Ð¼Ð¾Ð´ÐµÐ»Ð¸ÑÐ¾Ð²Ð°Ð½Ð¸Ðµ Ð¼Ð°Ð³Ð½Ð¸ÑÐ½Ð¾Ð¹ ÑÐ¸ÑÑÐµÐ¼Ñ. ÐÑÐ±ÑÐ°Ð½Ð° Ð¾Ð¿ÑÐ¸Ð¼Ð°Ð»ÑÐ½Ð°Ñ Ð¼Ð°Ð³Ð½Ð¸ÑÐ½Ð°Ñ ÑÐ¸ÑÑÐµÐ¼Ð°, Ñ ÑÐ¾ÑÐºÐ¸ Ð·ÑÐµÐ½Ð¸Ñ ÑÑÑÐµÐºÑÐ¸Ð²Ð½Ð¾ÑÑÐ¸ ÑÐ°ÑÐ¿ÑÐ»ÐµÐ½Ð¸Ñ Ð¼Ð¸ÑÐµÐ½Ð¸ Ð¸ Ð¼Ð°Ð³Ð½Ð¸ÑÐ½Ð¾Ð¹ Ð¸Ð½Ð´ÑÐºÑÐ¸Ð¸ Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð°. Ð¡Ð¿ÑÐ¾ÐµÐºÑÐ¸ÑÐ¾Ð²Ð°Ð½Ð° Ð²Ð°ÐºÑÑÐ¼Ð½Ð°Ñ ÑÐ¸ÑÑÐµÐ¼Ð° Ð¸ ÑÐ¸ÑÑÐµÐ¼Ð° Ð¿Ð¾Ð´Ð°ÑÐ¸ ÑÐµÐ°ÐºÑÐ¸Ð²Ð½ÑÑ Ð³Ð°Ð·Ð¾Ð². ÐÑÐ±ÑÐ°Ð½Ð° Ð±ÐµÐ·Ð¼Ð°ÑÐ»ÑÐ½Ð°Ñ ÑÐ¸ÑÑÐµÐ¼Ð° Ð¾ÑÐºÐ°ÑÐºÐ¸ Ð´Ð»Ñ Ð´Ð°Ð»ÑÐ½ÐµÐ¹ÑÐµÐ³Ð¾ Ð¿Ð¾Ð»ÑÑÐµÐ½Ð¸Ñ Ð±Ð¾Ð»ÐµÐµ ÐºÐ°ÑÐµÑÑÐ²ÐµÐ½Ð½ÑÑ Ð¿Ð¾ÐºÑÑÑÐ¸Ð¹ Ð¿ÑÐ¸ ÑÐ¾Ð·Ð´Ð°Ð½Ð¸Ð¸ ÑÐ°Ð·Ð»Ð¸ÑÐ½ÑÑ Ð¿ÑÐ¸Ð±Ð¾ÑÐ¾Ð² ÑÐ»ÐµÐºÑÑÐ¾Ð½Ð½Ð¾Ð¹ ÑÐµÑÐ½Ð¸ÐºÐ¸. Ð Ð°Ð·ÑÐ°Ð±Ð¾ÑÐ°Ð½ Ð¸ ÑÐ¾Ð·Ð´Ð°Ð½ Ð¿Ð¾Ð´Ð»Ð¾Ð¶ÐºÐ¾Ð´ÐµÑÐ¶Ð°ÑÐµÐ»Ñ Ñ Ð²Ð¾Ð·Ð¼Ð¾Ð¶Ð½Ð¾ÑÑÑÑ ÑÐµÐ³ÑÐ»Ð¸ÑÐ¾Ð²ÐºÐ¸ Ð¿Ð¾ Ð²ÑÑÐ¾ÑÐµ Ð¸ Ñ ÑÑÐ½ÐºÑÐ¸ÐµÐ¹ Ð²ÑÐ°ÑÐµÐ½Ð¸Ñ. Ð Ð°Ð·ÑÐ°Ð±Ð¾ÑÐ°Ð½Ð° Ð¸ ÑÐ¾Ð·Ð´Ð°Ð½Ð° ÑÑÑÐ°Ð½Ð¾Ð²ÐºÐ° Ð¼Ð°Ð³Ð½ÐµÑÑÐ¾Ð½Ð½Ð¾Ð³Ð¾ Ð½Ð°Ð½ÐµÑÐµÐ½Ð¸Ñ ÑÐ°Ð·Ð»Ð¸ÑÐ½ÑÑ Ð¼Ð°ÑÐµÑÐ¸Ð°Ð»Ð¾Ð² Ñ Ð¸ÑÑÐ¾ÑÐ½Ð¸ÐºÐ¾Ð¼ Ð¿Ð¾ÑÑÐ¾ÑÐ½Ð½Ð¾Ð³Ð¾ ÑÐ¾ÐºÐ°. ÐÐ»Ñ ÑÑÑÐ°Ð½Ð¾Ð²ÐºÐ¸ ÑÐ¾Ð·Ð´Ð°Ð½Ð° ÑÐ¸ÑÑÐµÐ¼Ð° Ð°Ð²ÑÐ¾Ð¼Ð°ÑÐ¸Ð·Ð¸ÑÐ¾Ð²Ð°Ð½Ð½Ð¾Ð³Ð¾ ÑÐ¿ÑÐ°Ð²Ð»ÐµÐ½Ð¸Ñ ÑÐµÑÐµÐ· Ð¸Ð½ÑÐµÑÐ°ÐºÑÐ¸Ð²Ð½ÑÐ¹ Ð´Ð¸ÑÐ¿Ð»ÐµÐ¹. Ð¦ÐµÐ»ÑÑ ÑÐ°Ð±Ð¾ÑÑ ÑÐ²Ð»ÑÐ»Ð¾ÑÑ ÑÐ¾Ð·Ð´Ð°Ð½Ð¸Ðµ Ð¸ Ð´Ð°Ð»ÑÐ½ÐµÐ¹ÑÐµÐµ Ð¾Ð¿Ð¸ÑÐ°Ð½Ð¸Ðµ ÑÑÑÐ°Ð½Ð¾Ð²ÐºÐ¸, ÐµÐµ ÑÑÐ°Ð²Ð½ÐµÐ½Ð¸Ðµ Ñ Ð°Ð½Ð°Ð»Ð¾Ð³Ð°Ð¼Ð¸.
description: The subject of the graduate work is Â«Development and creation of reactive magnetron sputtering plantÂ». In this paper done a simulation of the magnetic system. The optimal magnetic system is selected in terms of the target sputtering efficiency and magnetron magnetic induction. A vacuum system and a jet gas supply system have been designed. An oil-free pumping system was selected for further obtaining higher-quality coatings during creating various electronic equipment devices. The substrate holder with the possibility of height adjustment and with the function of rotation were designed and created. The installation of magnetron deposition of various materials with a direct current source has been developed and created. An automated control system has been created for the installation using an interactive display. The purpose of the work was to create and further describe the installation, its comparison with analogues.