title: ÐÑÑÐ»ÐµÐ´Ð¾Ð²Ð°Ð½Ð¸Ðµ Ð¸ ÑÑÐ°Ð²Ð½ÐµÐ½Ð¸Ðµ ÑÐ²Ð¾Ð¹ÑÑÐ² ÑÐ°Ð·Ð»Ð¸ÑÐ½ÑÑ ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑÐ¾Ð², Ð¸ÑÐ¿Ð¾Ð»ÑÐ·ÑÐµÐ¼ÑÑ Ð² Ð¿ÑÐ¾Ð¸Ð·Ð²Ð¾Ð´ÑÑÐ²Ðµ Ð¸Ð·Ð´ÐµÐ»Ð¸Ð¹ Ð¼Ð¸ÐºÑÐ¾ÑÐ¸ÑÑÐµÐ¼Ð¾ÑÐµÑ Ð½Ð¸ÐºÐ¸
title: Ð²ÑÐ¿ÑÑÐºÐ½Ð°Ñ ÐºÐ²Ð°Ð»Ð¸ÑÐ¸ÐºÐ°ÑÐ¸Ð¾Ð½Ð½Ð°Ñ ÑÐ°Ð±Ð¾ÑÐ° Ð±Ð°ÐºÐ°Ð»Ð°Ð²ÑÐ°
titleType: Subtitle
title: Research and comparison of the properties of various photoresists used in the production of microsystem products
Creators: name: ÐÑÑÐ¼Ð°Ð½, ÐÐ°Ð½Ð¸Ð¸Ð»
Publisher: name: Ð¡Ð°Ð½ÐºÑ-ÐÐµÑÐµÑÐ±ÑÑÐ³ÑÐºÐ¸Ð¹ Ð¿Ð¾Ð»Ð¸ÑÐµÑÐ½Ð¸ÑÐµÑÐºÐ¸Ð¹ ÑÐ½Ð¸Ð²ÐµÑÑÐ¸ÑÐµÑ ÐÐµÑÑÐ° ÐÐµÐ»Ð¸ÐºÐ¾Ð³Ð¾
Year: 2023
Subjects: ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑ
ÑÐ¾ÑÐ¾Ð»Ð¸ÑÐ¾Ð³ÑÐ°ÑÐ¸Ñ
Ð»Ð°Ð·ÐµÑÐ½Ð°Ñ Ð»Ð¸ÑÐ¾Ð³ÑÐ°ÑÐ¸Ñ
Ð°Ð½Ð°Ð»Ð¾Ð³ ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑÐ° SPR-955
photoresist
photolithography
laser lithography
analog photoresist SPR-955

description: Ð ÑÑÐ¾Ð¹ ÑÐ°Ð±Ð¾ÑÐµ Ð±ÑÐ»Ð¸ ÑÐ°ÑÑÐ¼Ð¾ÑÑÐµÐ½Ñ ÑÑÐ´ ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑÐ¾Ð² Ð¾ÑÐµÑÐµÑÑÐ²ÐµÐ½Ð½Ð¾Ð³Ð¾ Ð¿ÑÐ¾Ð¸Ð·Ð²Ð¾Ð´ÑÑÐ²Ð° Ð¸ Ð¸Ñ ÑÐ¾Ð¾ÑÐ²ÐµÑÑÑÐ²ÑÑÑÐ¸Ñ Ð¿ÑÐ¾Ð¸Ð·Ð²Ð¾Ð´Ð¸ÑÐµÐ»ÐµÐ¹. ÐÑÐ¾Ð¼Ðµ ÑÐ¾Ð³Ð¾, Ð±ÑÐ»Ð¸ Ð¿ÑÐµÐ´ÑÑÐ°Ð²Ð»ÐµÐ½Ñ ÑÐ²ÐµÐ´ÐµÐ½Ð¸Ñ Ð¾Ð± Ð¸Ð¼Ð¿Ð¾ÑÑÐ½ÑÑ ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑÐ°Ñ, ÐºÐ¾ÑÐ¾ÑÑÐµ ÑÑÐµÐ±ÑÑÑ Ð·Ð°Ð¼ÐµÐ½Ñ Ð² ÑÐµÐ°Ð»ÑÐ½Ð¾Ð¼ Ð¿ÑÐ¾Ð¸Ð·Ð²Ð¾Ð´ÑÑÐ²Ðµ. Ð­ÑÐ¸ ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑÑ Ð¸ÑÐ¿Ð¾Ð»ÑÐ·ÑÑÑÑÑ ÐºÐ°Ðº Ð´Ð»Ñ Ð»Ð°Ð·ÐµÑÐ½Ð¾Ð¹, ÑÐ°Ðº Ð¸ Ð´Ð»Ñ ÐºÐ¾Ð½ÑÐ°ÐºÑÐ½Ð¾Ð¹ Ð»Ð¸ÑÐ¾Ð³ÑÐ°ÑÐ¸Ð¸. ÐÐ»Ð°Ð³Ð¾Ð´Ð°ÑÑ Ð´ÐµÑÐ°Ð»ÑÐ½Ð¾Ð¼Ñ Ð°Ð½Ð°Ð»Ð¸Ð·Ñ ÑÐ°Ð·Ð»Ð¸ÑÐ½ÑÑ ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑÐ¾Ð² Ð±ÑÐ»Ð¸ Ð¾Ð¿ÑÐµÐ´ÐµÐ»ÐµÐ½Ñ Ð¿Ð¾Ð´ÑÐ¾Ð´ÑÑÐ¸Ðµ Ð°Ð»ÑÑÐµÑÐ½Ð°ÑÐ¸Ð²Ñ, ÐºÐ¾ÑÐ¾ÑÑÐµ Ð¼Ð¾Ð³ÑÑ Ð²ÑÐ¿Ð¾Ð»Ð½Ð¸ÑÑ ÑÑÐµÐ±ÑÐµÐ¼ÑÐµ Ð·Ð°Ð´Ð°ÑÐ¸. ÐÑÐ½Ð¾Ð²Ð½ÑÐ¼Ð¸ ÐºÑÐ¸ÑÐµÑÐ¸ÑÐ¼Ð¸ Ð²ÑÐ±Ð¾ÑÐ° ÑÐ²Ð»ÑÐ»Ð¸ÑÑ ÑÐ¿ÐµÐºÑÑÐ°Ð»ÑÐ½Ð°Ñ ÑÑÐ²ÑÑÐ²Ð¸ÑÐµÐ»ÑÐ½Ð¾ÑÑÑ, ÑÐ°Ð·ÑÐµÑÐ°ÑÑÐ°Ñ ÑÐ¿Ð¾ÑÐ¾Ð±Ð½Ð¾ÑÑÑ Ð¸ ÑÐµÐ¶Ð¸Ð¼Ñ ÑÑÑÐºÐ¸. Ð§ÑÐ¾Ð±Ñ Ð¿Ð¾Ð´ÑÐ²ÐµÑÐ´Ð¸ÑÑ Ð¿ÑÐ°Ð²Ð¸Ð»ÑÐ½Ð¾ÑÑÑ Ð²ÑÐ±Ð¾ÑÐ° Ð°Ð»ÑÑÐµÑÐ½Ð°ÑÐ¸Ð²Ñ, Ð±ÑÐ» Ð¿ÑÐ¾Ð²ÐµÐ´ÐµÐ½ ÑÐºÑÐ¿ÐµÑÐ¸Ð¼ÐµÐ½Ñ Ñ Ð¸ÑÐ¿Ð¾Ð»ÑÐ·Ð¾Ð²Ð°Ð½Ð¸ÐµÐ¼ ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑÐ° Ð¤Ð-9120 Ð¸ ÑÑÐ°Ð²Ð½ÐµÐ½Ð¸Ðµ Ð´Ð°Ð½Ð½ÑÐ¹ Ñ SPR-955. ÐÐ»Ñ ÑÐºÑÐ¿ÐµÑÐ¸Ð¼ÐµÐ½ÑÐ° ÑÐ¾ÑÐ¾ÑÐµÐ·Ð¸ÑÑ Ð½Ð°Ð½Ð¾ÑÐ¸Ð»ÑÑ Ð¼ÐµÑÐ¾Ð´Ð¾Ð¼ ÑÐµÐ½ÑÑÐ¸ÑÑÐ³Ð¸ÑÐ¾Ð²Ð°Ð½Ð¸Ñ, ÑÑÑÐ¸Ð»ÑÑ Ð¸ ÑÐºÑÐ¿Ð¾Ð½Ð¸ÑÐ¾Ð²Ð°Ð»ÑÑ Ñ Ð¿Ð¾Ð¼Ð¾ÑÑÑ ÑÑÑÐ°Ð½Ð¾Ð²ÐºÐ¸ Ð´Ð»Ñ ÐºÐ¾Ð½ÑÐ°ÐºÑÐ½Ð¾Ð¹ Ð»Ð¸ÑÐ¾Ð³ÑÐ°ÑÐ¸Ð¸. Ð ÐµÐ·ÑÐ»ÑÑÐ°ÑÑ ÑÑÐ¾Ð³Ð¾ ÑÐºÑÐ¿ÐµÑÐ¸Ð¼ÐµÐ½ÑÐ° Ð¿Ð¾Ð´ÑÐ²ÐµÑÐ´Ð¸Ð»Ð¸ ÑÐµÐ»ÐµÑÐ¾Ð¾Ð±ÑÐ°Ð·Ð½Ð¾ÑÑÑ Ð¸ÑÐ¿Ð¾Ð»ÑÐ·Ð¾Ð²Ð°Ð½Ð¸Ñ Ð¤Ð-9120 Ð² ÐºÐ°ÑÐµÑÑÐ²Ðµ Ð·Ð°Ð¼ÐµÐ½Ñ SPR-955. ÐÐ±Ð»Ð°ÑÑÑÑ Ð¿ÑÐ¸Ð¼ÐµÐ½ÐµÐ½Ð¸Ñ ÑÑÐ¾Ð¹ ÑÐ°Ð±Ð¾ÑÑ Ð±ÑÐ»Ð¾ Ð²Ð½ÐµÐ´ÑÐµÐ½Ð¸Ðµ Ð¤Ð-9120 Ð² Ð¿ÑÐ¾Ð¸Ð·Ð²Ð¾Ð´ÑÑÐ²ÐµÐ½Ð½ÑÐ¹ Ð¿ÑÐ¾ÑÐµÑÑ Ð½Ð° Ð¿ÑÐµÐ´Ð¿ÑÐ¸ÑÑÐ¸Ð¸.
description: In this work, several photoresists of domestic production and their respective manufacturers were considered. In addition, information was provided about imported photoresists that require replacement in real production. These 5 photoresists are used for both laser and contact lithography. Thanks to a detailed analysis of various photoresists, suitable alternatives have been identified that can perform the required tasks. The main selection criteria were spectral sensitivity, resolution, and drying modes. To confirm the correctness of the choice of an alternative, an experiment was conducted using a photoresist FP-9120 and comparing this with SPR-955. For the experiment, the photoresist was applied by centrifugation, dried, and exposed using a contact lithography unit. The results of this experiment confirmed the feasibility of using the FP-9120 as a replacement for the SPR-955. The scope of this work was the introduction of the FP-9120 into the production process at the enterprise.