Title: Precursor chemistry of advanced materials : CVD, ALD and nanoparticles /
Authors: Fischer, Roland A.
Publisher: Springer,
Year: 2005
Subjects: Organometallic chemistry.; Materials science.; Chemical vapor deposition.
Contents: Gas-phase thermochemistry and mechanism of organometallic tin oxide CVD precursors / M.D. Allendorf [and others] -- Materials chemistry of group 13 nitrides / A. Devi [and others] -- Single-source-precursor CVD: Alkoxy and siloxy aluminum hydrides / M. Veith -- CVD deposition of binary AlSb and GaSb material films -- a single-source approach / S. Schulz -- Organometallic precursors for atomic layer deposition / M. Putkonen [and others] -- Surface reactivity of transition metal CVD precursors: Towards the control of the nucleation step / P. Serp [and others] -- Organometallic and metallo-organic precursors for nanoparticles / M.A. Malik [and others].