Corrosion-Resistant and Electrically Conductive Oxide Coatings for Metal Bipolar Plates for PEM Electrolyzers
Authors: Kolenaty David , Čapek Jiří , Rezek Jiří , Zeman Petr 
Published: February 2024

The PEM electrolyzers are considered a promising alternative to alkaline water electrolyzers, as the advantages of PEM technology are high efficiency, high power density, a wide range of power inputs, low operating temperatures, relatively quick start-up, and easy scale-up. The ability of PEM electrolyzers to function dynamically makes them particularly appealing in energy capture and storage systems where electrical energy is derived from renewable sources such as solar and wind power. The bipolar plates (BPPs) are essential components of the PEM electrolyzer stacks and account for the main fraction of the total weight and cost. The BPPs must be electrically conductive, highly corrosion-resistant, and maintain a low interface contact electrical resistance (ICR). The root causes of the BPPs corrosion issues are non-conductive oxides formation increasing electrical resistance, and metal ions out-diffusion poisoning the catalyst and electrolyte membrane. The US Department of Energy has set targets for bipolar plates in fuel cells, including corrosion current densities < 1 µA/cm2 and ICR < 10 mΩ·cm2. Even though these targets do not apply to BPPs in PEM electrolyzers, they provide an indication of acceptable values. The problems outlined above are being overcome or minimized by applying corrosion-resistant and simultaneously electrically conductive coatings.
This work, therefore, investigates various corrosion-resistant and electrically conductive oxide coatings prepared by reactive high-power impulse magnetron sputtering (HiPIMS) on SS316L substrates. Reactive HiPIMS is an advanced and progressive magnetron sputter deposition technique suitable for preparing high-quality oxide coatings. The main advantage of HiPIMS is a high degree of ionization of sputtered particles in the discharge plasma and the associated high ion-to-atom ratio in particle flux toward the substrate. This allows one to achieve coating densification and crystallinity at low substrate temperature and without applying a substrate bias voltage. In our case, the native oxide on the SS316L substrate surface was removed by employing plasma etching prior to the coating deposition utilizing HiPIMS-generated ions accelerated towards the substrate by an applied bias voltage. The oxide coatings were deposited using an unbalanced magnetron with a directly water-cooled planar target with a diameter of 100 mm in argon-oxygen gas mixtures at the argon pressure of 1 Pa in an ultra-high vacuum chamber. The oxygen partial pressure was controlled by a PID regulator at a given power density in a pulse. This allowed the deposition of the coatings with different stoichiometries and, thus, different electrical conductivity and corrosion resistance.
The electrical resistivity of oxide coatings was measured by a four-point probe system on a non-conductive glass substrate. The compaction pressure dependence of ICR between the test plate and a gas diffusion layer (GDL) was measured in a range from 0.3 to 2.0 MPa on a custom-designed device using gold-coated cylindrical copper electrodes. All electrochemical measurements were performed in an H2SO4 electrolyte solution with an acidity of pH 5.5, fluorine ions concentration of 5 ppm, and a temperature of 60 ℃ to simulate the PEM electrolyzer environment. Accelerated corrosion tests were carried out in extreme anodic conditions of the PEM electrolyzer via potentiostatic polarization at a potential of 2 V vs SHE. Open circuit potential, corrosion current, Tafel slopes, and polarization resistance were determined from potentiodynamic polarization curves measured from 0 to 2 V vs SHE recorded at a scan rate of 1 mV/s, this range should cover most of the potentials experienced inside a PEM electrolyzer. Potentiodynamic polarization and ICR versus compaction pressure were measured before and after the accelerated corrosion test.