bluuebunny/crossref_metadata_2025_split huggingface dataset:
Charge stabilization and ion trapping under specimen isolation conditions during Sims analysis
Authors: van der Heide P. A. W. , Metson J. B. , Lau W. M. 
Published: May 2005

AbstractSpecimen isolation (SI), an extreme form of kinetic energy filtration, has been shown to be an effective tool for controlling the problems of sample charging and molecular interferences often encounted in secondary ion mass spectrometry (SIMS). In this study the mechanisms involved in the charge stabilization, under both positive and negative primary beam bombardment, were examined more closely. This was facilitated by the introduction of a resistor into the SI configuration, allowing for in situ sample potential control, and the use of computer simulations. The formation of low‐energy ion traps at the sample surface under extreme SI conditions was also directly recorded, showing good agreement with the computer simulations carried out.
Study of interface diffusion of Ti and TiN PVD layers by Bremsstrahlung‐induced AES
Authors: Meisel W. , Hanzel D. 
Published: May 2005

AbstractThe influence of heat treatment in ultrahigh vacuum (UHV) on Ti and TiN layers coated by physical vapour deposition (PVD) has been studied by AES, XPS and bremsstrahlung‐induced AES. It could be concluded that up to 500° C (1 h) the Ti layer does not change significantly. At the TiN/steel substrate interface, however, a counterdiffusion of nitrogen and adventitious oxygen takes place, resulting in partial nitridation of the steel substrate and oxidation of the coating.
Random uncertainties in AES and XPS: II: Quantification using either relative or absolute measurements
Authors: Cumpson P. J. , Seah M. P. 
Published: May 2005

AbstractOften, peak intensity measurements are quantified by using relative sensitivity factors to give the composition of a surface in percentage terms. This process affects the estimation of uncertainties; the uncertainty in the final quantification depends in a complex way on a sum involving the squares of the uncertainties in the measures for each element.We examine quantification in detail, and apply Bayesian statistical methods to this problem for the first time. We find that if the intensities are quantified by an absolute method rather than a relative one, the final uncertainties involve sums of the reciprocals of the squares of these individual uncertainties. Thus, the combination of uncertainties in quantification by an absolute method can improve the accuracy of the final quoted composition, whereas the combination of uncertainties in quantification by sensitivity factors always reduces the accuracy.
An area ratio method for RBS compositional analysis of thin films
Authors: Kusao Kenji , Satoh Minoru , Morita Kenji 
Published: May 2005

AbstractA simple and practical approach to determine the composition of binary thin films by RBS is proposed. It is shown in the single collision approximation that the composition ratio m/n of a uniform binary film Am Bn is determined with sufficiently high accuracy by the ratio between the peak areas AA/AB in the RBS spectrum and that the ratio AA/AB is not essentially influenced by the energy of the incident ion beam, the thickness of the film or the stopping power. The factor that is most sensitive to the accuracy is shown to be the statistical error in the total counts of peak areas AA and AB. It is experimentally demonstrated with an AlCu alloy film deposited on polycarbonate that the composition can be determined within an error of 0.63%.
Reactions of Au or Cr evaporated on Si wafers measured by the refracted x‐ray fluorescence method
Authors: Shoji T. , Hirokawa K. 
Published: May 2005

AbstractMeasurement of the x‐ray fluorescence intensity vs. take‐off angle distribution curve by the refracted x‐ray fluorescence method was used to investigate surface reactions of Au or Cr thin film evaporated on Si wafer substrates. The Au rapidly reacted at 440°C for 5 min, and Cr formed a silicide by annealing at 700°C for 3 h in a vacuum of 4 × 10−7 Torr. Thus, the method could be applied as an effective technique to study solid‐state reactions.
Technique for XPS measurements of volatile adsorbed layers: Application to studies of sulphide flotation
Authors: Kartio I. , Laajalehto K. , Suoninen E. , Karthe S. , Szargan R. 
Published: May 2005

AbstractA system for treating XPS samples containing easily volatile and reactive adsorption layers is described. Desorption and reactions with atmospheric gases prior to the measurement are avoided by repeated exposure of the sample to an inert atmosphere at room temperature followed by cooling to liquid nitrogen temperature and subsequent evacuation to spectrometer vacuum.The method has been applied to pyrite (FeS2) samples treated in aqueous potassium ethyl xanthate (dithiocarbonate) solutions. In agreement with previous indirect predictions of infrared and electrochemical measurements, the results confirm, under certain conditions of sample preparation, the presence of dixanthogen adsorption layers on FeS2 that have not been found previously on XPS measurements.Application of the method to surface studies related to sulphide flotation is especially important because of the volatility of several species possibly existing in the collector adsorption layer. Other potential applications are corrosion and catalysis studies.
An XPS and AES study of the ageing of a Co–20%Ni metal‐evaporated tape
Authors: Mitton D. B. , Walton J. , Thompson G. E. 
Published: May 2005

AbstractThe initial oxidation behaviour of a Co–20%Ni alloy exposed to air and the longer term oxidation of a metalevaporated magnetic recording tape (MET) of the same composition have been studied using XPS and AES.Air exposure of the alloy for 24 h showed the formation of a mixed hydroxide/carbonate layer over a relatively small amount of oxide. The hydroxide‐containing layer was composed of both Co(OH)2 and Ni(OH)2, with the outer surface enriched in Co(OH)2. The carbonates are believed to originate from the hydration of carbides present in the alloy. Analysis of MET showed the presence of the oxides Co3O4 and NiO in addition to the hydroxides and carbonates.An Auger depth profile through MET indicated the presence of significant oxygen below the surface oxide, which increased in concentration towards the metal/polymer interface. This is explained by penetration of oxygen/water vapour into both voids and cracks formed during the manufacturing process.
Surface study of a chromate pretreatment before coil coating of Al–43.4Zn–1.6Si coated steel
Authors: Hörnström S. E. , Hedlund E. G. , Klang H. , Nilsson J.‐O. , Backlund M. 
Published: May 2005

AbstractChromating is frequently used for temporary corrosion protection and as a pretreatment before organic coating of aluminium, zinc and aluminium/zinc alloys. In this work we have studied the composition and the chemical state of pretreated Al–43.4Zn–1.6Su‐coated strip steel. Auger and x‐ray photoelectron spectroscopy were used to characterize the surface of samples exposed to the chemicals from the different processing steps. In the first step, which is alkaline cleaning, hydroxy ions in the cleaner dissolve aluminium oxide from the surface of the strip and make the surface richer in zinc. In the chromating step that follows, the chromic acid causes dissolution of Al and Zn from the surface and precipitation of a complex chromium hydroxide layer containing small amounts of fluoride, aluminium, tungsten and molybdenum ions. Chromium exists in the valance states Cr3+ and Cr6+. In the final pretreatment step, which consists of a chromic acid after‐rinse, additional, mainly hexavalent, chromium is deposited. The chromate coating is thicker in regions indented by the temper rolling than in surrounding areas. The temper rolling, which is performed with textured rolls after metallization of the strip, breaks the surface aluminium oxide film and increases the reactivity of indented regions. The chromate coating is also thicker in the Zn‐rich interdendritic regions than on the Al‐rich dendrite arms. This is probably due to the microstructure of the metal coating in interdendritic areas.
Reaction of aniline with chemisorbed pyromellitic dianhydride on Cu(110): A model for controlled organic film growth
Authors: Frederick B. G. , Richardson N. V. , Unertl W. N. , El. Farrash A. 
Published: May 2005

AbstractThe reaction of aniline with pyromellitic dianhydride (PMDA) chemisorbed on Cu(110) has been followed by high‐resolution electron energy‐loss spectroscopy (EELS) and XPS. The PMDA is adsorbed via opening of one anhydride ring to permit a strong carboxylate link to the copper surface but with an unperturbed anhydride unit directed away from the substrate. The reaction with aniline takes place in a two‐step process: formation of an amic acid intermediate; and loss of H2O with heating to 440 K, leading to the imide. The process demonstrated here is a model reaction that represents a successful initial step in the growth of complex, tailored, organic thin films by the sequential deposition/reaction of carefully selected bifunctional molecules, starting with a clean, well‐defined, single‐crystal substrate. One functionality of the molecule is used to bond to the growing film and the second provides the terminating surface ready to accept the next molecular layer.
Surface modification of plastics by plasma treatment and plasma polymerization and its effect on adhesion
Authors: Carlsson C. M. Gilbert , Johansson Kenth S. 
Published: May 2005

AbstractThe Adhesion between plasma‐modified polyethylene (PE) and different polar polymers, as well as aluminium and steel, has been studied. The PE was modified by either oxygen plasma treatment or plasma polymerization of acrylic acid. The result show the importance of introducing polar groups on the surface of the non‐polar PE in order to improve the adhesion to polar polymers as well as metals. Laminates made of plasma‐modified PE ad polyamide 6 (PA‐6) or poly(ethylene vinyl alcohol) (EVAL‐G) showed failure in PA‐6 or EVAL‐G when delaminated. Poly(ethylene terephthalate) (PET), which is not as polar as PA‐6 or EVAL‐G, showed an adhesive failure when the PE was treated with either of the plasma methods. However, when both the PET and the PE were modified, the failure occurred in the PET upon delamination. Oxygen plasma treatment of PE resulted in an increased adhesion when laminated with cellophane, with no observed material failure. The laminates composed of plasma‐modified PE and aluminium or steel showed cohesive failure in the PE.
ToF‐SIMS and XPS studies of the interaction of silanes and matrix resins with glass surfaces
Authors: Wang D. , Jones F. R. 
Published: May 2005

AbstractThe interface between glass, glass fibres and epoxy resin in a composite has been studied using time‐of‐flight secondary ion mass spectrometry in static and scanning modes in combination with x‐ray photoelectron spectroscopy. The presence of a multilayer of the polymeric hydrolysed γ‐aminopropyltriethoxysilane (HAPS) on the glass surfaces has been confirmed. After extraction with hot water or toluene only a monomolecular interfacial layer of HAPS is chemically bound to the immediate glass surface through siloxane bonds, leaving the amino groups at the outer surface and available for reaction. It has been demonstrated that this interfacial layer plays an essential role in the coupling reaction between the amino group of the HAPS deposit and the epoxide group of the epoxy resins, diglycidyl ether of bisphenol A or S (DGEBA or DGEBS). These interfacial reactions were complicated by the presence of polydimethylsiloxane and the incorporation of substrate aluminium into the HAPS deposit. The aluminium sites appeared not to be involved in the coupling reaction.
Evaluation of AES depth profiles of thin‐film systems by application of novel graphically interactive factor analysis software
Authors: Scheithauer U. , Hösler W. , Riedl G. 
Published: May 2005

AbstractFactor analysis has proved to be a powerful tool for the full expolitation of the chemical information included in the peak shapes and peak positions of spectra measured during AES depth profiling. Owing to its ability to extract the number of independent chemical components, their spectra and depth distributions, it is increasingly used in routine analysis. However, one has to be aware of the crucial role of the analyst in selecting the physically relevant result from the indefinite number of mathematical solutions. For this reason, he must be put in a position to define the matrix rotation and to check the resulting factors in a fast, flexible and transparent way. Therefore, factor analysis software offering a graphically interactive user interface has been devleoped. During the necessary rotations in factor space both the depth distributions and the corresponding spectra are displayed simultaneously, so that the analyst can judge the physical relevance of the solution and can quickly respond with the necessary adjustments.To demonstrate the capabilities of the software in the evaluation of AES depth profile data, a TiN/Ti/SiO2 layer sequence form microelectronics technology was chosen. As an important result, additional layers are recognized at the interfaces. This example demonstrates the advantages of factor analysis and emphasizes the necessity of the analyst's knowledge on both AES spectra and hte investigated material systems. In addition, it shows the importance of a fast, direct, transparent and interactive interface between the analyst and the mathematical tool of factor analysis.
Photoelectron and ion scattering spectroscopy of zeolites under reduced surface‐charge conditions
Authors: Grünert Wolfgang , Schlögl Robert , Karge Hellmut G. 
Published: May 2005

AbstractFor zeolites that exhibit ion conductivity, the surface charge in the application of surface spectroscopy (XPS, UPS, ISS) may be significantly reduced by using elevated measurement temperatures. On this basis, a measurement technique has been developed that allows the application of ISS and UPS to zeolites and the detection of differential charging effects in XPS. Both the new perspectives and the limitations of this technique are illustrated by examples of Y zeolites exchanged with lanthanum and with silver.
A method to subtract the transmission and dispersion analyser effect from high‐intensity, low‐resolution XPS spectra
Authors: Battistoni Claudio , Mattogno Giulia , Righini Guido 
Published: May 2005

AbstractThe quality of XPS and AES data in terms of both peak position and intensity is critically dependent on the experimental conditions. It is known that when using the electron energy analyser‐detector system under different experimental conditions, the relative intensity peak ratios change remarkably. The knowledge of the energy dependence of the spectrometer's intensity response function is important for quantitative analyses.In order to handle experimental conditions (e.g. small‐area XPS) a methodological procedure to estimate the effect of individual parameters is proposed. According to this procedure the spectra are manipulated using a modified deconvolution routine that contemporaneously takes into account the relative transmission function and analyser broadening function.
Sudden surface roughening followed by levelling observed in SIMS analysis of InP‐containing III–V multilayers
Authors: Miethe K. , Kuphal E. 
Published: May 2005

AbstractAn epitaxially grown III‐V multilayer system with an InP overlayer (80 nm thick) subjected to secondary ion mass spectrometry (SIMS) depth profiling was found to develop an extreme topography in the overlayer. As this topography was levelled in subsequent layers an improvement of depth resolution with depth was observed in the SIMS profile. The topography features seen by scanning electron microscopy on the InP overlayer agree with those reported and interpreted previously for bulk InP. Here, the fact is emphasized that during SIMS analysis extreme topography is likely to develop even on thin layers of InP, but that topography levelling (as described extensively in earlier work) may lead to an improvement of depth resolution if further layers of InP are absent.
Auger electron spectroscopy and principal component analysis of the first stages of oxidation in GaAs(100)
Authors: Passeggi M. C. G. , Vaquila I. , Ferrón J. 
Published: May 2005

AbstractThe first stages of oxidation in GaAs(100) have been studied using Auger electron spectroscopy and principal component analysis. We found that at low oxygen exposures (<104 Langmuirs) and in the presence of excited oxygen produced by electron bombardment, GaAs oxidizes via a one‐phase process only. This phase involves the simultaneous oxidation of both the elements Ga and As.
Quantitative XPS analysis of leached layers on optical glasses
Authors: Sprenger D. , Bach H. , Meisel W. , Gütlich P. 
Published: May 2005

AbstractThe corrosion of optical glasses often reduces the utility of uncoated glasses as well as the adhesion of resistive coatings deposited onto corroded glasses. Photoelectron spectroscopy (XPS) was applied to study glass surfaces with respect to their surface corrosion. In particular, leaching by the influence of polish slurries, pure water, air and even residual gases inside a vacuum device was studied in detail. Pure quartz glass and different sodium and barium silicate glasses were broken in ultrahigh vacuum (4 × 10−10 mbar) for the determination of sensitivity factors of the different XPS signals. It was found that a quantitative determination of the surface composition of corroded and leached layers is possible by determination of the intensities of the XPS O 1s, Si 2p, Si 2s, B 1s, Na 1s, Na 2s, Na 2p, Ba 3d and Ba 4d signals. After leaching in aqueous solutions, the barium is exchanged by hydrogen via an interdiffusion mechanism, resulting in an enrichment of different hydrogen bonds (H2O/H3O+, OH−, SiOH) in the leached layer. An iterative algorithm is shown, which allows, in addition to the content of all other elements, the hydrogen content to be determined quantitatively in the leached layers. Furthermore, the calculation of the density of surface layers becomes possible. For an exact analysis of the leached layers the intensity loss by contamination layers is considered and the calculated density is used to perform matrix‐dependent intensity corrections for the attenuation length.
Etchant for chemical thinning of InP and its application in the fabrication of InP diffused junction solar cells
Authors: Faur Mircea , Faur Maria , Jayne D. T. , Bailey S. , Goradia M. 
Published: May 2005

AbstractA new etchant, which we have called ‘PNP’, with the composition (o‐H3PO4)u: (HNO3)v: (H2O)(2)t: (H2O)100−(u+v+t)has been developed for thinning, after contacting, the n+and p+emitter layer of n+p and p+n InP structures made by thermal diffusion. By varyingu,vandt, reproducible etch rates of 5–10 nm min−1have been obtained. After thinning the 2.5–4.5 μm thick p+InP layer down to 60–250 nm, specular surfaces have been obtained at up to 80 nm min−1etch rates. Owing to its intrinsic qualities, the residual phosphorus‐rich oxide after thinning the emitter layer provides surface passivation of p+InP surfaces and can also serve as a first‐layer antireflective coating. Very high quality p+n InP structures were also obtained using a thin (30–40 Å thick) phosphorus‐rich chemical oxide, grown using this etchant as a diffusion cap layer.
X‐ray induced AES study of the effect of chemically bound hydrogen on the oxidation kinetics of an Si3N4 powder
Authors: Wang Pu Sen , Malghan Subhas G. , Hsu Stephen M. , Wittberg Thomas N. 
Published: May 2005

AbstractSilicon nitride powders manufactured by the pyrolysis of silane and ammonia were found to contain chemically bound hydrogen. Most of this hydrogen could be removed by vacuum annealing at 1000°C. In the present study, x‐ray‐induced AES has been used to determine the oxidation kinetics for vacuum‐annealed Si3N4 powders that were heated in air at temperatures between 850 and 975°C. The average oxide thickness on the surface of the powder particles for each temperature and oxidation time was calculated from the ratio of the SiO2 to Si3N4 Si KLL peak intensities. The results are compared with those for the as‐manufactured powder, which contained the hydrogen impurity. For both annealed and unannealed powder, the oxidation rate was linear within the temperature range 850–1000°C. Within this temperature range, the oxidation rate was significantly higher for the vacuum‐annealed Si3N4 powder.
Compositional analysis of CdS/SnO2 films after heat treatments and CdCl2 pretreatments
Authors: Swartzlander Amy B. , Niles David W. , Hasoon Falah S. , Al‐Jassim Mowafak M. 
Published: May 2005

AbstractWe used Auger electron spectroscopy (AES) to perform a systematic study of CdS thin films grown from solution on SnO2‐coated glass. The effects of heat treatments and CdCl2 pretreatments on the stoichiometry of the CdS and the diffusivity of the CdS/SnO2 interface have been investigated. The results show that CdS thin films not treated in CdCl2 become sulphur‐deficient with heat treatments above 350°C, where CdS thin films treated in CdCl2 must be heated above 350°C to be smooth and stoichiometric. We did not observe interdiffusion of atomic species at the CdS/SnO2 interface after heat treatments of 350, 450 or 550°C.
Use of image depth profiling SIMS for the study of tinplate corrosion
Authors: Lu S. F. , Mount G. R. , McIntyre N. S. , Fenster A. 
Published: May 2005

AbstractFour tinplate specimens with different corrosion properties were studied using secondary ion mass spectrometry (SIMS) image analysis. The continuity of the structure of the interfacial iron‐tin alloy was able to be examined using a volume rendition computer program, which generates a three‐dimensional representation of the stack of ion images. The surface coverage of tinplate was found to vary widely on some specimens; those exhibiting poor corrosion characteristics were found to have little or no elemental tin covering the raised regions between the rolling grooves.
Calibration procedure for quantitative surface analysis by total reflection X‐ray fluorescence
Authors: Torcheux L. , Degraeve B. , Mayeux A. , Delamar M. 
Published: May 2005

AbstractTotal reflection x‐ray fluorescence analysis (TXRF) is a new technique able either to achieve elemental analysis of microquantities deposited on a very flat reflecting surface or to detect very low levels of surface contamination on reflecting substrates like silicon wafers. In this paper we report a calibration procedure to achieve an impurity quantification in the range of one hundredth of an atomic monolayer and below.To reach this goal, it is necessary to distinguish between two types of surface deposits: submonolayer surface atoms and particulate matter deposited onto the reflector surface. We show how these two situations can be differentiated, both theoretically and experimentally.For surface contamination, calibration curves were obtained from nickel submonolayer standards prepared by a method of quantitative contamination. These standards were certified by Rutherford backscattering analysis (RBS). Results show that linear regression is suitable for calibration. For elements other than nickel it is shown that the correlation between TXRF and RBS is good, except for concentrations of <5 × 1011 atoms cm−2. This is mainly owing to the difficulty of obtaining certified low contamination levels with RBS. Quantification limits for TXRF analysis are found to be extremely low in comparison to most surface analysis techniques, and TXRF is able to detect metallic impurities like Fe, Ni, Cr, Zn and Cu at ∼2 × 1010 atoms cm−2 in a short time (1000 s) without any sample preparation.