bluuebunny/crossref_metadata_2025_split huggingface dataset:
Static SIMS imaging of the adsorption of diisobutyl dithiophosphinate on galena surfaces
Authors: Brinen J. S. , Reich F. 
Published: May 2005

AbstractThe spatial distribution of the molecular ion of diisobutyl dithiophosphinate on galena surfaces has been observed under static SIMS conditions using time‐of‐flight (ToF) SIMS measurements. The unequal spatial distribution observed is in accord with previous work which used fragment ions under non‐static conditions.
A comparison of Auger and STEM‐EDS quantification routines used in an investigation of intergranular segregation in long‐term aged nimonic PE16
Authors: Partridge A. , Tatlock G. J. 
Published: May 2005

AbstractThe grain boundary composition of long‐term aged Nimonic PE16 has been investigated by both Auger electron spectroscopy (AES) and scanning transmission electron microscopy‐energy dispersive spectroscopy (STEM‐EDS) analysis, and a detailed comparison made of the quantification routines developed for the two techniques.The investigation showed that Mo, Cr and P segregate to the grain boundaries of the alloy during the standard pre‐service heat treatment, and that on extended ageing, at 450°C for 10 000 h and 550°C for 5000 h, the concentration of these elements at the grain boundaries increases. Furthermore, it was shown that there was good agreement between the two quantification routines developed to interpret the EDX and Auger spectra, allowing for the errors inherent in each method.
A common data processing system for surface analysis
Authors: Yoshihara K. , Yoshitake M. , Community Vamas‐Sca 
Published: May 2005

AbstractIn 1990 the Japanese contingent working within the VAMAS framework started to program software in Quick Basic for the IBM‐PC or NEC‐PC with MS‐DOS to translate spectral data acquired on different machines to the VAMAS‐SCA Standard Data Transfer Format and to process AES and XPS spectra in a standard manner. We call this software the Common Data Processing System.The Common Data Processing System is designed to be a program to assess the data processing procedures proposed by scientists, to check a spectrum and to build both a spectra and a correction factor data bank. In this system, the spectral data acquired on different instruments and/or computers can be compared to one another.The Common Data Processing System is not commercially produced. It should be perpetuated by scientists and engineers who have an interest in surface analysis.
Treatment of poly(ether ether ketone) (PEEK) surfaces by remote plasma discharge. XPS investigation of the ageing of plasma‐treated PEEK
Authors: Jama C. , Dessaux O. , Goudmand P. , Gengembre L. , Grimblot J. 
Published: May 2005

AbstractThe effect of a cold remote N2 plasma (CRNP) or N2 + O2 plasma (CRNOP) on poly(ether ether ketone) (PEEK) is studied. The amount of nitrogen or oxygen uptake and functionalities are determined by x‐ray photoelectron spectroscopy (XPS). After CRNP treatment, the N/C and O/C atomic ratios are 0.301 and 0.333, respectively. Nitrogen functional groups are not detected by CRNOP treatment, and the O/C atomic ratio is then 0.785. The ageing process of the treated PEEK surface in the open air is investigated in both cases. For CRNOP treatment the O/C atomic ratio decreases by carbonate function departure, whereas for CRNP treatment the total amount of nitrogen and oxygen graft atoms goes through a maximum after 1 h of air exposure.
Correction of Peak Shift and Classification of Change of X‐ray Photoelectron Spectra of Oxides as a Result of Ion Sputtering
Authors: Hashimoto Satoshi , Hirokawa Kichinosuke , Fukuda Yasuo , Suzuki Ken‐ichi , Suzuki Toshiko , Usuki Noriaki , Gennai Norio , Yoshida Sizuo , Koda Mitsuru , Sezaki Hiroshi , Horie Hiroshi , Tanaka Akihiro , Ohtsubo Takashi 
Published: May 2005

AbstractRound‐robin experiments have been performed to correct binding energy shifts of XPS spectra for oxides by charge‐up which results from irradiation of x‐rays or ion sputtering and to determine criteria for the change of chemical state resulting from Ar ion sputtering. Al2O3, SiO2, MgO, TiO2 and NiO, in plate and powder form, were used for the experiments. We have revealed that the binding energy difference between the Al 2p (Si 2p or Mg 1s) line and the O 1s line gives a better correction for the measurements of Al2O3 (SiO2 or MgO) than that between the Al 2p (Si 2p and Mg 1s) line and the C 1s line. After Ar ion sputtering, TiO2 and NiO are reduced and new components appear in the XPS spectra. For Al2O3 and SiO2, the damage is induced by sputtering and the full width at half‐maximum (FWHM) values of XPS spectra increase, while MgO is unchanged. We have shown that the changes of oxides caused by ion sputtering depend on the change of free formation enthalpy and ionicity. We have also shown that both plate and powder samples are useful as standards to determine the binding energy from XPS spectra.
A round robin test of energies and chemical effects of Auger spectra from Fe, Ni and Al metals and their oxidized surfaces
Authors: Hirokawa K. , Ohtsubo T. 
Published: May 2005

AbstractAuger spectra were measured using different pieces of the same specimen of Au, Fe, Ni, Al and their oxides by eight participating laboratories. The following points were found: by adjusting the specimen position with respect to the cylindrical mirror analyser using the elastic peak. Auger peak energy values obtained with each instrument were almost identical; Auger line shapes varied from instrument to instrument and from one operating condition to another; the variation of intensity ratio of LVV to LMM of Fe, Ni and their oxidized surfaces may be employed to identify chemical states.
Auger depth profiling of silicon dioxide on silicon: A factor analysis study
Authors: Sarkar M. , Calliari L. , Gonzo L. , Marchetti F. 
Published: May 2005

AbstractAn Auger sputter profile across the SiO2/Si interface is analysed by means of factor analysis (FA). As compared to conventional treatments of Auger data, more information is obtained in this way. In particular, the L2,3VV spectrum and the depth distribution of silicon atoms in an oxygen‐deficient situation with respect to the silicon dioxide stoichiometry are provided, thereby allowing a closer insight into the chemistry of this system.
SIMS depth resolution studies in AlxGa1−xAs using specially grown MBE samples
Authors: Houlton M. R. , Blackmore G. W. , Emeny M. T. , Whitehouse C. R. , Chew A. , Sykes D. E. 
Published: May 2005

AbstractA quantitative analysis of the effect that the surface roughening due to oxygen ion bombardment has on the depth resolution of SIMS profiles has been carried out for the semiconductor alloys AlxGa1−xAs (x = 0, 0.175, 0.384 and 0.69) for a range of bombardment energies from 2 keV to 10.5 keV in two Cameca IMS 3F instruments. The loss of depth resolution is greater (and occurs at greater depths) with higher impact energies but occurs more rapidly with increasing x values. Good correlation is observed with the secondary ion signal intensity changes caused by surface roughening. No change of sample erosion rate is observed. No similar effect could be found with Cs, Ar, Xe, N or N2 bombardment.
Use of AES to determine sputter‐induced concentration profiles in Cu–Ni alloys
Authors: Roos W. D. , van Wyk G. N. , du Plessis J. 
Published: May 2005

AbstractThe difference in escape depth of Auger electrons of different energies was used to determine sputter‐induced concentration profiles in Cu‐Ni alloys. Alloys with Cu/Ni concentrations of 70/30, 50/50 and 30/70 at.% were bombarded with 2 keV Ar+ ions. After equilibrium has been reached, an AES spectrum for the alloy was recorded using a 12‐bit analogue‐to‐digital converter interfaced with a computer. Spectra for the pure elements, Cu and Ni, were recorded under identical conditions and were used to generate Auger spectra for the alloys that could be compared with the experimental data. The layer concentration values for which the best fit was obtained were used to construct a concentration profile. The results indicate a Cu‐enriched first layer followed by a depleted zone. It is concluded that the bombardment of Cu‐Ni alloys by 2 keV Ar+ ions leads to the segregation of copper and that AES can be used to determine sputter‐induced profiles if the necessary experimental precautions are taken.
Study of the oxygen treatment of high‐modulus polyethylene fibres
Authors: Woods D. W. , Ward I. M. 
Published: May 2005

AbstractIt has been found that three possible mechanisms can contribute to the improvement in fibre/resin adhesion when high‐modulus polyethylene fibres are subjected to oxygen gas plasma treatment. These mechanisms are surface oxidation, cross‐linking and surface etching. In this paper it is attempted to estimate the relative importance of these three mechanisms in the improvement of the interlaminar shear strength (ILSS) of polyethylene fibre/epoxy resin composites.From a comparison of plasma treatment in oxygen gas and nitrogen gas it is concluded that surface oxidation makes a major contribution to the initial increase in ILSS for short treatment times. Examination of fibres cross‐linked by γ‐irradiation has demonstrated the effect of cross‐linking on ILLS independently of the surface oxidation and etching that accompany oxygen gas plasma treatment. Finally, scanning electron microscopy has shown the presence of micro‐surface cracks after relatively short plasma treatment times, and confirmed the unique cellular structures produced at long treatment times.A comparison of the results from both batch and continuous plasma treatment processes for a range of melt‐ and gel‐spul fibres shows that the effect of oxygen plasma treatment for all these fibres are broadly similar in terms of ILSS, fibre strength and surface appearance.
Characterization of adhesive and coating constituents by time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS). Part 1: Epoxy‐terminated diglycidyl polyethers of bisphenol‐A and propal‐2‐ol
Authors: Treverton J. A. , Paul A. J. , Vickerman J. C. 
Published: May 2005

AbstractA series of epoxide resins typically used in adhesive and coating applications have been characterized by time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS). Using thin‐film silver cationization, oligomers containing up to 16 bisphenol‐A groups were detected for the epoxide‐terminated diglycidyl polyethers of bisphenol‐A and propan‐s‐ol that comprise the bulk resins. For the higher molecular weight resins, the results indicate the additional presence of monoglycol‐, diglycol‐ and phenol‐terminated oligomers. For thicker film specimens, the spectra exhibit signals characteristic of the terminal epoxide and the bisphenol‐A components comprising the oligomer chains. Furthermore, the relative intensities of these diagnostic signals reflect the compositions of the epoxide resins in a quantitative manner.
Characterization of films of organofunctional silanes by ToF‐SIMS. Part II. Films of γ‐APS, AEAPS and FPS on cold‐rolled steel and cold‐rolled zinc substrates
Authors: van Ooij W. J. , Sabata A. 
Published: May 2005

AbstractThe structure, composition and thickness of thin films of various functional silanes formed on cold‐rolled steel or cold‐rolled zinc surfaces have been studied by high‐resolution time‐of‐flight SIMS and AES. The silanes were γ‐APS (aminopropyltriethoxy silane), AEAPS [N‐(2‐aminoethyl)‐3‐aminopropyltrimethoxy silane] and FPS (perfluorinated propyltrimethoxy silane), which were deposited from dilute solutions by dipping or spin‐coating. Variables were the pH of the solution and the silane concentration. The objective of the studies presented here was to improve our understanding of the structure and orientation of silane films on metals, in view of possible applications of such coupling agents in areas where corrosion control and durable paint adhesion is required.
The SPLINT technique for sample preservation using liquid nitrogen transfer
Authors: Love C. J. , Cayless R. A. , Hazell L. B. 
Published: May 2005

AbstractA simple, fast and convenient cryogenic method is described for avoiding post‐treatment oxidation and preserving the sample chemistry of iron during transfer from aqueous solution to ultrahigh vacuum (UHV) surface analysis instrumentation. It is recommended that others try this method and report on its wider applicability.
Valence band x‐ray photoelectron spectroscopic studies of carbonate, bicarbonate and formate interpreted by Xα calculations
Authors: Thomas Sajan , Sherwood Peter M. A. 
Published: May 2005

AbstractThe valence band and core‐level x‐ray photoelectron spectroscopy (XPS) of carbonate, bicarbonate and formate is reported. There is little difference between these ions in the core XPS spectra. The valence band spectra of carbonate and formate are similar (with some differences in relative intensities) and agree well with the spectrum calculated by multiple‐scattered‐wave Xα calculations. The valence band spectra of carbonate and bicarbonate are found to be identical at ambient temperature, despite the fact that the valence band spectra calculated by Xα calculations are predicted to be different. The carbonate valence band spectrum agrees well with the calculated spectra. When the bicarbonate data are recorded at liquid nitrogen temperature, however, the valence band region agrees well with the calculated spectra. These results indicate that bicarbonate is readily decomposed at ambient temperatures in normal XPS instruments, and that carbonate and bicarbonate can be distinguished by differences in the valence band region if the latter is prevented from decomposition by recording the data at low temperatures.
Scanning tunnelling microscope studies of sputtering
Authors: Wilson Ian H. 
Published: May 2005

AbstractExperimental results are reported that improve our understanding of processes that initiate surface roughness from a single ion bombardment event.The results are from a scanning tunnelling microscopy (STM) study of the ion bombardment of silicon at implantation energies. Also reported is an atom by atom analysis of a single sputtering event—8 keV krypton on a cleaved crystal of PbS. In both cases a very low ion dose was used to minimize the overlap of cascades. Recent results on the bombardment of gold and graphite will also be reviewed. The results show that every impact leaves its mark on the surface, indicating that surface roughening processes can be uncleated at the atomic level.
K‐Shell Auger transitions induced by Mo x‐rays
Authors: Kövér L. , Némethy A. , Cserny I. , Varga D. 
Published: May 2005

AbstractFor exciting K‐Auger transitions of elements with atomic number between 13 and 26, Mo x‐rays (Mo bremsstrahlung + Mo Lα,β) from a high voltage (max. 30 kV) source were used. High‐resolution K‐Auger spectra were measured by the help of a high luminosity hemispherical electron spectrometer. Spectral intensities obtained using the Mo x‐ray source are compared to the respective intensities measured using an Al anode and source parameters usual for electron spectrometers. The attainable gain in Auger yields is between 2 and 15 for most elements investigated and reaches a factor of 20.5 in the case of P KLL. Optimum conditions of K‐Auger excitation (regarding the atomic number region mentioned) are also discussed.As an example for applications, the phosphorus K‐Auger parameter has been determined for GaP, taking an advantage of the presence of the P 1s (Mo Lα) photoelectron line in the spectra excited by Mo x‐rays. The higher analytical sensitivity, attainable by measuring Mo x‐ray‐induced P KLL Auger electrons compared to the sensitivity of the conventional XPS (Al Kα excited P 2p), is demonstrated in the case of a phosphoric compound (corrosion inhibitor) adsorbed on a polycrystalline Fe surface.
Development of an angle‐resolving electron spectrometer
Authors: Huang M. , Harland C. J. , Venables J. A. 
Published: May 2005

AbstractAn angle‐resolving electron spectrometer has been developed for use with an ultra high vacuum scanning electron microscope. A large cylindrical mirror analyser has been equipped with a parallel detection system for simultaneous recording of electron energy spectra and angle‐resolved images. Two different models have been developed to simulate the spectrometer. Angle‐resolved images and energy spectra of different electron emission functions can be simulated. The angle‐resolved images from amorphous samples were used to check the two simulation models and the performance of the spectrometer. Some initial results of applying the spectrometer on Ag/Ge(111) and Ag/α‐Ge are discussed.
New advancements in the theory of the Auger parameter: Applications to the characterization of small metallic particles
Authors: Moretti Giuliano , Porta Piero 
Published: May 2005

AbstractA simple electrostatic model permits the calculation of the Auger parameter shifts of core‐ionized atoms in compounds with respect to the free atom in the gas phase. It is shown that the Auger parameter shift is a function of the number, distance, electronic polarizability and local geometry of the nearest‐neighbour ligands around the coreionized atom.We have investigated the relationship between the Pd Auger parameter shifts and the nuclearity of Pd clusters entrapped in Y zeolites. It is shown that our model is useful to estimate this dependence. It is demonstrated that the Auger parameter shift depends not only on the nuclearity and geometry of the cluster but also on the nature of the heteroatoms in its close vicinity. This result could be explained by the influence of these heteroatoms on the electronic polarizability of the surface Pd atoms of the cluster.The model has been applied also to the characterization of small copper clusters entrapped in A zeolite and supported on (0001) α‐alumina surfaces. In any case, we demonstrate that the screening properties of both metal bulk and clusters of very low nuclearity are very similar.
Dielectric loss function of Si and SiO2 from quantitative analysis of REELS spectra
Authors: Yubero F. , Tougaard S. , Elizalde E. , Sanz J. M. 
Published: May 2005

AbstractA recently proposed model for quantitative analysis of reflection electron energy‐loss spectra (REELS) has been applied to evaluate the dielectric loss function of Si and SiO2 in the 4‐100 eV energy range, and to determine inelastic scattering properties for these materials for low‐energy electrons (500‐10000 eV). Appropriate trial energy‐loss functions (i.e. Im{1/ϵ}) are used and the best loss function is found from the criterion that a satisfactory quantitative agreement is obtained between the simulated and experimental inelastic scattering cross‐sections at several primary electron energies. The fact that the energy‐loss functions determined in this work agree remarkably well with optical data gives some confidence in the applied procedure. In addition, the effective inelastic mean free paths of the electrons as a function of the primary energy and the path travelled inside the medium have also been determined in terms of the respective energy‐loss functions.
Practical energy scale calibration procedure for auger electron spectrometers using a spectrometer offset function
Authors: Fujita Daisuke , Yoshihara Kazuhiro 
Published: May 2005

AbstractIn order to share AES spectral data and to develop an Auger spectra database, a practical and simple procedure for calibratiing the energy scale of Auger electron spectrometers has been developed. The procedure is based on the use of a spectrometer offset function, which enables transformation of measurements on the uncalibrated energy scale to a Fermi‐level‐referenced energy scale. In order to evaluate the effectiveness of this calibration method, a round‐robin test involving twelve spectrometers of various types has been performed. From a comparison of Ni L3VV and M3VV peak positions, it was found that the scatter among the measurements after calibration was reduced to 20–30% of the scatter before calibration.
Surface characterization with ion‐induced desorption and multiphoton resonance ionization
Authors: Ervin Matthew H. , Winograd Nicholas 
Published: May 2005

AbstractIt is known that high‐molecular‐weight, thermally labile molecules can be desorbed intact using keV ion beams. This knowledge has led to numerous applications of fast atom bombardment and secondary ion mass spectrometry (SIMS) by mass spectrometric detection of the desorbed ions. Here we show that these measurements can be enhanced significantly by using resonance‐enhanced laser ionization to softly ionize the neutral component of the desorbed flux. This experimental configuration can produce sensitivity improvements of several orders of magnitude over SIMS while adding a certain degree of selectivity to the ionization process itself. Examples of this performance will be presented using a wide variety of molecules, including polycyclic aromatic hydrocarbons, organic polymers, molecular salts and biologically important molecules. Results from model systems to complex samples are discussed, along with their implications for submicron molecular imaging using this technique.
Towards the ultimate limits of depth resolution in sputter profiling: Beam‐induced chemical changes and the importance of sample quality
Authors: Wittmaack K. 
Published: May 2005

AbstractRecent progress in materials characterization by sputter profiling is discussed, with particular emphasis on a critical evaluation of the parameters that determine the depth resolution. The net effect of beam‐induced material transport and sputtering can be studied in a straightforward manner using abrupt doping distributions embedded in the matrix of interest, parallel to its flat surface. It is shown that the quality of the data that can be obtained with modern instruments is sufficient to identify lack of sample quality in terms of either surface flatness or abruptness of the doping distributions. Except for the presence of special artefacts, the depth resolution is always improved by using as low a bombardment energy as possible. The optimum angle of beam incidence depends on the crystalline structure of the sample as well as on the chemical identity of the primary ions. With oxygen primary ions a rather complex situation is encountered. Compared to inert gas ions, an improvement or a degradation in depth resolution may be achieved, depending on the impurity–matrix system under study. The merits of sample rotation are also discussed.
Scanning force imaging of organic multimolecular films
Authors: Cavalleri O. , Ricci D. , Rolandi R. 
Published: May 2005

AbstractScanning force microscopy (SFM) inspection shows that stearic acid deposited on a glass slide by evaporation of an organic solvent forms a layered structure. Scanning force microscopy images covering areas of a few square micrometres show a stack of bimolecular layers. Molecular resolution images of the layer surface shows ordered hexagonal patterns extending over areas as large as several unit cells. An accurate analysis of several images based on the evaluation of the Fourier transform made it possible to measure the unit mesh constant of the surface lattice with an accuracy of 1%. After samples are annealed slightly above melting temperature, the unit mesh constant decreases significantly, indicating a more compact arrangement of the molecules.