bluuebunny/crossref_metadata_2025_split huggingface dataset:
Retinol potentiates the inhibitory effect of ascorbic acid on uric acid assay
Authors: Bouvier Damien , Sapin Vincent , Bonnard-Gougeon Michèle , Marceau Geoffroy 
Published: March 2010

Abstract

Background: The interference of ascorbic acid in the determination of plasma uric acid concentrations, by decreasing the formation of chromophore in Trinder's reaction, is well known. By contrast, the effects of other antioxidant vitamins, such as retinol and α-tocopherol have not been investigated. Knowledge of the analytical interaction of these antioxidants in the uric acid assay would be useful.

Methods: The effect of a mix of vitamins (Cernevit®) on uric acid analysis in a patient hospitalized in a neurological intensive care unit was observed. The effects of the different antioxidant components of the mixture (retinol, α-tocopherol and ascorbic acid) on the concentration of uric acid from a pool of plasma were also tested.

Results: Among the different combinations of vitamins tested, only retinol potentiated the antioxidant effect of ascorbic acid. The most marked effect was observed with 80 IU/mL of retinol and 5.7 mmol/L of ascorbic acid.

Conclusions: We demonstrate for the first time the synergistic interference of ascorbic acid and retinol on the measurement of uric acid in plasma. We established that ascorbic acid interference is potentiated by regeneration of reduced ascorbic acid by retinol. Such interference must be kept in mind to avoid misinterpreting low plasma uric acid concentrations in patients in whom this analyte is critical.
Clin Chem Lab Med 2010;48:693–5.
Reviewing imagery in resemblance and non-resemblance metaphors
Authors: Ureña José Manuel , Faber Pamela 
Published: March 2010

Abstract
This article analyses the nature of mental imagery in metaphoric thought as envisaged by the contemporary theory of metaphor in Cognitive Linguistics (Lakoff, Cambridge University Press, 1993). Our study of metaphor in the field of marine biology draws on two crucial aspects of mental imagery, namely dynamicity and pervasiveness. Image metaphors and behaviour-based metaphors have generally been regarded as two different types of resemblance metaphor. In our view, the dynamicity of certain mental images highlights inherent similarities between these two types of metaphor, and makes the differences between them more apparent than real. For this reason, we propose a more refined description of resemblance metaphors in terms of the static or dynamic nature of the mental images underlying them. Our study also underlines the fact that mental images permeate all classes of metaphor, and that the pervasiveness and dynamicity of mental images affords insights into both resemblance metaphors and non-resemblance metaphors.
The interplay of humor and conflict in conversation and scripted humorous performance
Authors: Norrick Neal R. , Spitz Alice 
Published: March 2010

AbstractIn this article we explore the interrelationship of humor and conflict. We focus first on contexts where humor provides a constructive means of attenuating conflict and ending disagreements in conversation. Then we turn to conflict talk as a source of humor. We identify three characteristic strategies for constructing humor around patterns of conflict talk, both in everyday conversation and in professionally scripted dialogue. The momentum and coherence of argument structure tends toward automatization even in everyday talk, and this property lends itself especially well to the creation of humorous dialogue. We show both how humor can mitigate conflict, and how conflict talk can be funny.
Muller's Ratchet and the Degeneration of theDrosophila mirandaNeo-YChromosome
Authors: Kaiser Vera B , Charlesworth Brian 
Published: March 2010

AbstractSince its formation about 1.75 million years ago, the Drosophila miranda neo-Y chromosome has undergone a rapid process of degeneration, having lost approximately half of the genes that it originally contained. Using estimates of mutation rates and selection coefficients for loss-of-function mutations, we show that the high rate of accumulation of these mutations can largely be explained by Muller's ratchet, the process of stochastic loss of the least-loaded mutational class from a finite, nonrecombining population. We show that selection at nonsynonymous coding sites can accelerate the process of gene loss and that this effect varies with the number of genes still present on the degenerating neo-Y chromosome.
Nonallelic Gene Conversion in the Genus Drosophila
Authors: Casola Claudio , Ganote Carrie L , Hahn Matthew W 
Published: March 2010

AbstractNonallelic gene conversion has been proposed as a major force in homogenizing the sequences of paralogous genes. In this work, we investigate the extent and characteristics of gene conversion among gene families in nine species of the genus Drosophila. We carried out a genome-wide study of 2855 gene families (including 17,742 genes) and determined that conversion events involved 2628 genes. The proportion of converted genes ranged across species from 1 to 9% when paralogs of all ages were included. Although higher levels of gene conversion were found among young gene duplicates, at most 1–2% of the coding sequences of these duplicates were affected by conversion. Using a second approach relying on gene family size changes and gene-tree/species-tree reconciliation methods, we estimate that only 1–15% of gene trees are misled by gene conversion, depending on the lineage considered. Several features of paralogous genes correlate with gene conversion, such as intra-/interchromosomal location, level of nucleotide divergence, and GC content, although we found no definitive evidence for biased substitution patterns. After considering species-specific differences in the age and distance between paralogs, we found a highly significant difference in the amount of gene conversion among species. In particular, members of the melanogaster group showed the lowest proportion of converted genes. Our data therefore suggest underlying differences in the mechanistic basis of gene conversion among species.
Recognition and Absorption of the Water-soluble X-ray Contrast Medium Iodixanol using Molecularly Imprinted Polymers for Biomedical Applications
Authors: Liu Zhan , Bucknall David G. , Allen Mark G. 
Published: March 2010

AbstractThis work presents the study on the recognition and absorption of the water-soluble X-ray contrast medium iodixanol in aqueous solution using synthetic molecularly imprinted polymers (MIPs). A non-covalent imprinting technique was applied to prepare iodixanol-imprinted polymers using 4-vinylpyridine as the functional monomer and ethylene glycol dimethacrylate as the cross-linker. The effects of quantity of iodixanol templates, the crosslink density, and the solvent were studied in terms of the binding capacity and imprint effect of the polymers. UV-vis spectrometric analysis shows that the highest binding capacity achieved is 284 mg iodixanol per gram of dry polymer, which is 8.8 times higher than the binding capacity of the non-imprinted control polymers (NIPs). SEM and BET surface analysis have also been performed to investigate the effect of morphology and porosity on the binding capacities of polymers.
Optimizing Pad Groove Design and Polishing Kinematics for Reduced Shear Force, Low Force Fluctuation and Optimum Removal Rate Attributes of Copper CMP
Authors: Sampurno Yasa , Philipossian Ara , Theng Sian , Nemoto Takenao , Gu Xun , Zhuang Yun , Teramoto Akinobu , Ohmi Tadahiro 
Published: March 2010

AbstractThe effect of polisher kinematics on average and standard deviation of shear force and removal rate in copper CMP is investigated. A ‘delamination factor’ consisting of average shear force, standard deviation of shear force, and required polishing time is defined and calculated based on the summation of normalized values of the above three components. In general, low values of the ‘delamination factor’ are preferred since it is believed that they minimize defects during polishing. In the first part of this study, 200-mm blanket copper wafers are polished at constant platen rotation of 25 RPM and polishing pressure of 1.5 PSI with different wafer rotation rates and slurry flow rates. Results indicate that at the slurry flow rate of 200 ml/min, ‘delamination factor’ is lower by 14 to 54 percent than at 400 ml/min. Increasing wafer rotation rate from 23 to 148 RPM reduces ‘delamination factor’ by approximately 50 percent and improves removal rate within-wafer-non-uniformity by appx. 2X. In the second part of this study, polishing is performed at the optimal slurry flow rate of 200 ml/min and wafer rotation rate of 148 RPM with different polishing pressures and platen rotation rates. Results indicate that ‘delamination factor’ is reduced significantly at the higher ratio of wafer to platen rotation rates.
Understanding Multi Scale Pad Effects in Chemical Mechanical Planarization
Authors: Chandra Abhijit , Bastawros Ashraf. F. , Karra Pavan K. 
Published: March 2010

AbstractA multi-physics model encompassing chemical dissolution and mechanical abrasion effects in CMP is developed. This augments a previously developed multi-scale model accounting for both pad response and slurry behavior evolution. The augmented model is utilized to predict scratch propensity in a CMP process. The pad response delineates the interplay between the local particle level deformation and the cell level bending of the pad. The slurry agglomerates in the diffusion limited agglomeration (DLA) or reaction limited agglomeration (RLA) regime. Various nano-scale slurry properties significantly influence the spatial and temporal modulation of the material removal rate (MRR) and scratch generation characteristics. The model predictions are first validated against experimental observations. A parametric study is then undertaken. Such physically based models can be utilized to optimize slurry and pad designs to control the depth of generated scratches and their frequency of occurrence per unit area.
Chemical-Mechanical Polishing of Optical Glasses
Authors: Becker Elisabeth , Prange Andreas , Conradt Reinhard 
Published: March 2010

AbstractThis paper presents the Chemical-Mechanical Polishing of optical and fine-optical glasses, which is employed to fulfill the optical requirements for the surfaces of optical lenses. We present the effect of chemical interactions in the polishing process of optical lenses and show how these interactions can be influenced by the additions of certain chemicals. Furthermore, we present a thermodynamic simulation tool, by which these interactions can be modeled. Thus it is possible to understand the chemistry in the suspension and to simulate recent polishing processes in advance, with new additives or with various intrinsic glass ions from different glasses.
Accuracy Improvements in LPC Measurements for CMP Slurries
Authors: Tolla Bruno , Boldridge David 
Published: March 2010

AbstractWe have examined the Large Particle Count (LPC) analytical method to see whether there are opportunities to improve both the accuracy and precision in hope of improving the utility of the LPC measurement. We have identified weaknesses in the current method that limit both its accuracy and its precision, and which can introduce count errors in excess of a factor of 10. We propose modifications to the current method which result in both accuracy and precision improvements. We recommend these improvements as absolutely necessary for any experiments designed to test the correlation between LPC and defectivity.
Novel Ceria-Polymer Composites for Reduced Defects during Oxide CMP
Authors: Coutinho Cecil , Mudhivarthi Subramanya , Kumar Ashok , Gupta Vinay 
Published: March 2010

AbstractTo meet the stringent requirements of device integration and manufacture, surface defects and mechanical stresses that arise during chemical mechanic planarization (CMP) must be reduced. Towards this end, we have synthesized multiple hybrid and composite particles on micron length scales consisting of siloxane co-polymers functionalized with inorganic nanoparticles. These particles can be easily tailored during synthesis, leading to softer or harder abrasion when desired. Upon using these particles for the planarization of silicon oxide wafers, we obtain smooth surfaces with reduced scratches and minimal particle deposition, which is an improvement from conventional abrasive materials like pure silica, ceria and alumina nanoparticle slurries. Tribological characteristics during polishing were examined using a bench top CMP tester to evaluate the in situ co-efficient of friction. Characterization of the hybrid and composite particles has been done using infrared spectroscopy, dynamic light scattering, and electron microscopy. Surface roughness of the wafers was examined using atomic force and optical microscopy while removal rate measurements were conducted using ellipsometry at multiple angles.
Study of Conditioner Abrasives in Chemical Mechanical Planarization
Authors: Manocha Chhavi , Kumar Ashok , Gupta Vinay K. 
Published: March 2010

AbstractChemical Mechanical Planarization (CMP) has emerged as the central technology for polishing wafers in the semiconductor manufacturing industry to make integrated multi-level devices. Both chemical and mechanical processes work simultaneously to achieve local and global planarization. Although extensive research has been carried out to understand the various factors affecting the CMP process, many aspects remain unaddressed. One such aspect of CMP is the role of abrasives in the process of conditioning. Abrasives play an important role during conditioning to regenerate the clogged polishing pads. This research is focused on the study of abrasives in the process of conditioning with a focus on the size of abrasives. With diamond being widely used as an abrasive for conditioning the polishing pad, five different sizes of diamonds ranging from 0.25μm to 100μm were selected to condition the commercially available IC 1000 polishing pad. Properties like pad roughness and pad wear were measured to understand the effect of the abrasive size on the pad morphology and pad topography. In-situ ‘coefficient of friction’ was also monitored on the CETR bench top tester. The final impact was seen in the form of surface defects on the polished copper wafers using optical microscopy.
Optimization of Material Removal Efficiency in Low Pressure CMP
Authors: Bozkaya Dinçer , Müftü Sinan 
Published: March 2010

AbstractIn chemical-mechanical polishing (CMP) the material removal efficiency (MRE) can be defined as the fraction of the total pressure distributed on the abrasives, and it depends on the interplay between the direct contact of the pad-to-wafer, and the contact of the abrasives with the wafer. The MRE can be increased by minimizing pad-wafer direct contact, as this is not likely to help material removal, significantly. The objective of this work is to investigate parameters that control MRE. This may be especially important for low-pressure CMP used in the polishing of (ultra-low-k) ULK dielectric materials. The optimization of CMP parameters to maximize the MRE is described by modeling the contact interactions between pad, abrasives and wafer. A relationship for optimal abrasive concentration is presented for the external load values that mark the transition from pure pad-wafer-abrasive contact to mixed contact (combination of pad-wafer-abrasive and pad-wafer contacts) and for given pad porosity and pad surface parameters.
Optical properties and carrier dynamics of ensembles of InP nanowires grown on non-single-crystal platforms
Authors: Onishi Takehiro , Lohn Andrew J. , Kobayashi Nobuhiko P. 
Published: March 2010

AbstractOptically active InP nanowires were grown on a quartz substrate covered with a layer (100 nm) of hydrogenated amorphous silicon (a-Si:H) by metalorganic chemical vapor deposition (MOCVD), demonstrating that single-crystal semiconductor nanowires can be formed on non-single-crystal surfaces. Scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy, cathodoluminescence (CL), and photoluminescence (PL) were used to characterize the structural and optical properties of the nanowires. The nanowires on a-Si:H grew in random directions with high density. The XRD suggests that nanowires having either hexagonal-close-packed or face-centered cubic lattices co-exist. The Raman spectrum shows peaks associated with transverse optical (TO) and longitudinal optical (LO) branches of InP. The CL intensity does not vary signi?cantly along the growth direction and appears to be originated from the entire structure of the nanowire when probed at various positions. The CL data suggests that recombination is slow enough to allow the carriers to diffuse the complete length of the nanowires (˜2 m in length) before recombining. The PL spectrum suggested the nanowire had a part that contributes to the observed blue shift while the other part had nearly bulk feature in their structure.
Executive Functioning, Treatment Adherence, and Glycemic Control in Children With Type 1 Diabetes
Authors: McNally Kelly , Rohan Jennifer , Pendley Jennifer Shroff , Delamater Alan , Drotar Dennis 
Published: March 2010

OBJECTIVE
The primary aim of the study was to investigate the relationship among executive functioning, diabetes treatment adherence, and glycemic control.

RESEARCH DESIGN AND METHODS
Two hundred and thirty-five children with type 1 diabetes and their primary caregivers were administered the Diabetes Self-Management Profile to assess treatment adherence. Executive functioning was measured using the Behavior Rating Inventory of Executive Functioning and glycemic control was based on A1C.

RESULTS
Structural equation modeling indicated that a model in which treatment adherence mediated the relationship between executive functioning and glycemic control best fit the data. All paths were significant at P &lt; 0.01.

CONCLUSIONS
These results indicate that executive functioning skills (e.g., planning, problem-solving, organization, and working memory) were related to adherence, which was related to diabetes control. Executive functioning may be helpful to assess in ongoing clinical management of type 1 diabetes.
Association of A1C Levels With Vitamin D Status in U.S. Adults
Authors: Kositsawat Jatupol , Freeman Vincent L. , Gerber Ben S. , Geraci Stephen 
Published: March 2010

OBJECTIVE
Data relating vitamin D status with indices of glucose homeostasis as manifested by A1C in the U.S. adult population are few.

RESEARCH DESIGN AND METHODS
We examined the association between serum 25 hydroxyvitamin D [25(OH)D] and A1C levels in 9,773 adults (age ≥18 years old) participating in the 2003–2006 National Health and Nutrition Examination Survey. Multivariate linear regression analyzed the association after accounting for potential confounders.

RESULTS
Serum 25(OH)D levels were inversely associated with A1C levels in subjects age 35–74 years (P = 0.0045) and those who did not report a history of diabetes (P = 0.0282).

CONCLUSIONS
These findings support a mechanistic link between serum vitamin D concentrations, glucose homeostasis, and the evolution of diabetes in a large segment of the U.S. adult population. Screening people with elevated A1C levels for vitamin D insufficiency should be considered.
Association of Vitamin D With Insulin Resistance and β-Cell Dysfunction in Subjects at Risk for Type 2 Diabetes
Authors: Kayaniyil Sheena , Vieth Reinhold , Retnakaran Ravi , Knight Julia A. , Qi Ying , Gerstein Hertzel C. , Perkins Bruce A. , Harris Stewart B. , Zinman Bernard , Hanley Anthony J. 
Published: March 2010

OBJECTIVE
To examine cross-sectional associations of serum vitamin D [25-hydroxyvitamin D, 25(OH)D] concentration with insulin resistance (IR) and β-cell dysfunction in 712 subjects at risk for type 2 diabetes.

RESEARCH DESIGN AND METHODS
Serum 25(OH)D was determined using a chemiluminescence immunoassay. Insulin sensitivity/resistance were measured using the Matsuda insulin sensitivity index for oral glucose tolerance tests (ISOGTT) and homeostasis model assessment of insulin resistance HOMA-IR. β-Cell function was determined using both the insulinogenic index (IGI) divided by HOMA-IR (IGI/IR) and the insulin secretion sensitivity index-2 (ISSI-2).

RESULTS
Linear regression analyses indicated independent associations of 25(OH)D with ISOGTT and HOMA-IR (β = 0.004, P = 0.0003, and β = −0.003, P = 0.0072, respectively) and with IGI/IR and ISSI-2 (β = 0.004, P = 0.0286, and β = 0.003, P = 0.0011, respectively) after adjusting for sociodemographics, physical activity, supplement use, parathyroid hormone, and BMI.

CONCLUSIONS
Vitamin D may play a role in the pathogenesis of type 2 diabetes, as 25(OH)D concentration was independently associated with both insulin sensitivity and β-cell function among individuals at risk of type 2 diabetes.
Maternal Glucose at 28 Weeks of Gestation Is Not Associated With Obesity in 2-Year-Old Offspring
Authors: Pettitt David J. , McKenna Sonia , McLaughlin Ciara , Patterson Christopher C. , Hadden David R. , McCance David R. 
Published: March 2010

OBJECTIVE
Diabetes during pregnancy is a strong risk factor for obesity in the offspring, but the age at which this association becomes apparent is unknown. The purpose of this study was to examine the relation of glycemia during pregnancy with anthropometry in offspring of nondiabetic pregnant women from the Belfast U.K. center of the multinational Hyperglycemia and Adverse Pregnancy Outcome (HAPO) Study.

RESEARCH DESIGN AND METHODS
Women from the HAPO Study were invited to participate in follow-up of their offspring aged 2 years. Measurements included height, weight, and thickness of triceps, subscapular, and suprailiac skinfolds.

RESULTS
A total of 1,165 offspring (73% of eligible children; 598 boys and 567 girls) were seen from ages 22–30 completed months. The only association that reached statistical significance was between categories of maternal 1-h glucose and BMI Z score ≥85th percentile at 2 years (P = 0.017). Overall the correlations between maternal glucose during pregnancy and BMI Z score at age 2 years were weak (fasting glucose r = 0.05, P = 0.08; 1-h glucose r = 0.04, P = 0.22; 2-h glucose r = 0.03, P = 0.36; and area under the curve for glucose r = 0.04, P = 0.18).

CONCLUSIONS
This study found little association between maternal glucose during pregnancy and obesity in the offspring at this young age. These findings are not unexpected given that study results for young offspring whose mothers had diabetes during pregnancy were indistinguishable from those for normal offspring at this age. It will be interesting to see whether, as these children age, maternal glucose during pregnancy in the ranges included in the HAPO Study will be associated with obesity in their children.