Atomic Layer Depostion within Polymers Templates for Spatially Controlled Growth and Doped Materials
Authors: Azoulay Rotem , Segal-Peretz Tamar 
Published: February 2024

Today’s nanofabrication techniques require multistep and costly processes in order to fabricate complex, multi-materials nanostructures. Performing atomic layer deposition (ALD) within polymeric templates can offer a simple solution for nanostructure fabrication. In this process, named sequential infiltration synthesis (SIS), high partial pressures and long exposures times lead to inorganic materials growth within polymers. Sequential polymer removal results in polymer-templated inorganic nanostructure. While SIS shows great potential in fabricating large variety of structures, it is currently limited to a single material growth process.

In our research, we utilized SIS properties to achieve two different objectives: selective spatial growth and homogenous growth for doped materials. We demonstrated, for the first time, multi-material SIS process with control over the spatial location of each material and fabricate heterostructure nanorods and nanowires. Doping materials were fabricated using simultaneously growth of two precursors.

We studied SIS within self-assembled block copolymer (BCP) films and electrospun polymer fibers and developed multi-material SIS, where two metal oxides are grown together in a single process, with precise control over their location within the polymer template. We used cylinder forming poly (styrene-block-methyl methacrylate) (PS-b-PMMA) films and electrospun PMMA as the polymeric template and DEZ (diethyl zinc), TMA (trimethyl aluminum) as the organometallic precursors. We achieved control over the growth location of each metal oxide by tuning the organometallic precursors diffusion time, forming heterostructures after polymer removal. A short exposure of the first precursor resulted in a limited growth only at the outer part of the polymer, while a long exposure of the second precursor enabled it to reach the full depth of the polymer besides the section which was already occupied by the first precursor. An exposure to water completed the cycle. We demonstrated this process on BCP films to achieve AlOx-ZnO nanorods arrays (Figure 1A-B) and on polymer fibers to achieve AlOx-ZnO fibers (Figure 1C-D). We performed structural characterization using scanning and transmission electron microscopy (SEM and TEM, respectively) to characterize the nanowires and nanorods as well as three-dimensional characterization scanning TEM (STEM) tomography and energy-dispersive X-ray spectroscopy (EDS) STEM tomography in order to probe the structure and the chemical composition in 3D. To fabricate doped materials, we applied SIS process with TMA and DEZ in the same exposure within homopolymer film. We preformed SEM-EDS to quantify each element and evaluate the doping percentage. This research opens new pathways for multi-materials nano scale structure fabrication through ALD-based growth within polymers.

Figure 1 caption: AlOx-ZnO nanorods array: cross-sectional views using A) EsB detector and B) secondary electron in-lens detector. AlOx-ZnO fibers C) EDS map D) HAADF image

[1] R. Azoulay et al., Small, 15, 1904657 (2019).

[2] R. Azoulay et al., ACS Appl. Nano Mater., 5, 7228 (2022).

Figure 1