bluuebunny/crossref_metadata_2025 huggingface dataset:
Effect of Cu and Gd on Structural and Magnetic Properties of Fe-Co-B-Si-Nb Metallic Glasses
Authors: Ramasamy Parthiban , Stoica Mihai , Calin Mariana , Eckert Jurgen
Published: September 2016

[(Fe0.5Co0.5)0.75B0.2Si0.05]96Nb4}100-x,y(Gdx, Cuy) (x = 0.5, 1 and 2), (y = 0.5) alloys with different diameters were prepared by copper mold casting. The structure, the thermal and the magnetic properties were studied by X-ray diffraction, differential scanning calorimetry and vibrating sample magnetometry, respectively. Minor Cu addition completely changes the crystallization behavior, and also the glass-forming ability decreases because of the decrease in the supercooled liquid region. However, the magnetic properties are significantly improved upon annealing because of the precipitation of (Fe,Co) phase. In case of [(Fe0.5Co0.5)0.75B0.2Si0.05]96Nb4}100-x (Gdx) glass, Gd addition does not change the crystallization behavior. In turn, it increases the supercooled liquid region when compared with [(Fe0.5Co0.5)0.75B0.2Si0.05]96Nb4, but even then the glass-forming ability is reduced (critical glassy diameter dc < 1.5 mm). The saturation magnetization of the glass is also decreased with increasing Gd content.
Microstructural Transformation during Dissimilar Friction Stir Welding (FSW) of Aluminum-Cooper Alloys
Authors: Radu Bogdan , Hulka Iosif , Cojocaru Radu , Ciucă Cristian
Published: September 2016

This paper presents some results obtained in Friction Stir Welding (FSW) of aluminum and cooper alloys, as a result of joint researches carried out in University Politehnica Timisoara and National R&D Institute for Welding and Material Testing – ISIM Timisoara. Microstructural investigations revealed a nugget zone well defined, in which the two materials are well mixed and adjacent zones (thermos-mechanically affected zones) in which thin vanes from one material is mixed into the other material. SEM and EDX analysis revealed the blending of the two materials which provides good continuity of the welded joint. The tool and welding technology developed during the researches provides a good quality FSW welded joint. which will give the possibility to engineer components with high electric current conductivity and in the same time low weight, needed by the automotive industry in developing the new generation of electric vehicles.
A Comparison between Hardness, Corrosion and Wear Performance of APS Sprayed WC-CoMo and WC-Co Coatings
Authors: Kazamer Norbert , Pascal Dragos Toader , Marginean Gabriela , Şerban Viorel Aurel , Codrean Cosmin , Uţu Ion Dragoş
Published: September 2016

In order to be competitive, it is demanded to have thin, tough and long lasting coatings. An important aspect is to use stable deposition technologies. As Cr assures wear, corrosion and high temperature resistance, the most employed coatings in industry generally contain Cr. Nevertheless, Cr is a hazardous element for the humans’ health, therefore, sustainable alternatives are needed to be implemented. The aim of this work is to investigate the microstructure, hardness, corrosion resistance and wear behavior of the novel WC-CoMo compared to conventional WC-Co coatings. So far, WC-CoMo coatings are not part of state of the art regarding the Atmospheric Plasma Sprayed (APS) coatings. WC-Co powder in plain form and mechanically mixed with Mo was deposited using the APS method on standardized Type A Almen Strips (C67 steel). The size of the powder grains varies between 5 µm and 30 µm. The obtained samples were investigated by means of Scanning Electron Microscopy, Energy Dispersive X-Ray Spectroscopy, X-Ray Diffraction, and hardness, wear and corrosion behavior were also evaluated. Results revealed formation of different intermetallic phases around the WC particles, which have a benefic influence on the coating characteristics and microstructure.
A Comparison of Flame Coating and Laser Cladding Using Ni Based Powders
Authors: Pascu Alexandru , Hulka Iosif , Tierean Mircea Horia , Croitoru Catalin , Stanciu Elena Manuela , Roată Ionut Claudiu
Published: September 2016

This paper addresses to the characterization of Ni based coatings realized by two different processes e.g. thermal spray coating and laser cladding. For the relevance of the experimental tests, the same base material, AISI 5140 and Metco 15E powder was used. The results highlight the advantages and disadvantages of the both techniques. The cladded layer obtained through laser cladding is pore and crack free, being characterized by a high hardness and a very good adherence to the substrate, while the flame coating presents oxides inclusions, high porosity, lower hardness and minimal dilution with the substrate as resulted from the EDS analyses. In depth characterization of the samples is made using optical and scanning electron microscopy, EDS analysis and microhardness testing.
Ti-Al Membranes for Microfiltration
Authors: Şuta Silvia , Thalmaier György , Sechel Niculina , Vida-Simiti Ioan , Petrescu Valentin
Published: September 2016

Porous membranes made of Ti – 48 at. % Al intermetallic compound was obtained by elemental powder synthesis. These disks can be used as microfiltration membranes due to their low pores size and interconnected porosity. During this study titanium (purity 99.5%) and aluminum (purity 99 %) with low particle size range were mixed in corresponding ratios. The powder mixture was pressed at 500 MPa and the samples were heat treated in two stages. In the first step is the forming of Al3Ti compound by a solid state reaction at a temperature of 640 °C, slightly below the melting point of aluminum. In the second step the Ti-Al compound was formed at the temperature of 1300 °C and the sintering the porous structure was accomplished too. The obtained membranes were characterized by X-ray diffraction and scanning electron microscopy (SEM).
A Study of Ti-Ta Library and Microstructure Manufactured by Magnetron Sputtering
Authors: Barbos Sergiu , Novac Andrei , Sprincenatu Roxana , Condel Madalin , Mitelea Ion , Craciunescu Corneliu
Published: September 2016

Ti-Ta films were deposited out of Ti and Ta targets on glass and kapton substrates. The co-deposition leaded to the formation of a compositional spread in the Ti-Ta system, a continuous variation of the Ta/Ti ratio along the full range of the film. The typical microstructure observed for the films deposited at RT consisted of columnar grains with dotted Ta-rich particles, reflecting a relatively nonhomogenous structure. Annealing at 400 °C leaded to the individualization of grain boundaries and to a coalescence of the Ta-rich particles. Annealing at 500 °C further reduced the amount of particles, but also appeared to be associated with the cracking in the stressed area of the film/kapton structure.
Deep Trench Isolation and through Silicon via Wetting Characterization by High-Frequency Acoustic Reflectometry
Authors: Virgilio C. , Broussous Lucile , Garnier Philippe , Carlier J. , Campistron P. , Thomy V. , Toubal M. , Besson Pascal , Gabette L. , Nongaillard B.
Published: September 2016

Wetting efficiency of microstructures or nanostructures patterned on Si wafers is a real concern in integrated circuits manufacturing. We present here a high-frequency acoustic method which enables the local determination of the wetting state of a liquid on real DTI and TSV structures. Partial wetting states for non-hydrophobic surfaces or low surface tension liquids are detectable with this method. Filling time of TSV structures has also been measured.
Pattern Collapse of High-Aspect-Ratio Silicon Nanostructures - A Parametric Study
Authors: Vrancken Nandi , Vereecke Guy , Bal Stef , Sergeant Stefanie , Doumen Geert , Holsteyns Frank , Terryn Herman , de Gendt Stefan , Xu Xiu Mei
Published: September 2016

This work focuses on capillary-induced collapse of high-aspect-ratio silicon nanopillars. Modification of the surface chemistry is demonstrated to be an efficient approach for reducing capillary forces and consequently reduce pattern collapse. Special effort is spent on determination of the wetting state of chemically modified surfaces as complete structure wetting is of utmost importance in wet processing. In light of this, an ATR-FTIR based method has been developed to unambiguously distinguish between wetting and non-wetting states.
Some Critical Issues in Pattern Collapse Prevention and Repair
Authors: Xu Xiu Mei , Vrancken Nandi , Vereecke Guy , Suhard Samuel , Pourtois Geoffrey , Holsteyns Frank
Published: September 2016

In semiconductor fabrication, pattern collapse of high aspect ratio structures after wet processing is a major problem that could reduce production yield. In this work, several critical issues which limit our understanding of pattern collapse phenomenon are discussed together with some recent results of experiment and modeling. Special efforts have been put to update some of the most recent developments in characterization techniques.
Removal of Bull’s Eye Signature by Optimizing Wet Cleans Recipe
Authors: Bhattacharyya Dhiman , Muralidhar Pranesh , Conrad Mark
Published: September 2016

As the semiconductor device technology is moving toward increasingly smaller nodes, it is becoming more challenging to keep the wafers free from contamination of even smaller particles. Wet cleaning process takes a major role in keeping the wafers clean, especially in post-RIE cleans. However, as every other process, wet cleaning also contributes some defects as adders which can potentially cause significant yield killer defects. A cluster of defects, classified as incomplete etch, was observed at the center of the wafer with a wet clean recipe (CIP1) since the adders from this recipe were not allowing the etch process and rendering incomplete etch defects. In this work, we optimized this CIP1 recipe to eliminate defects with the bull’s eye signature at the wafer center and widened the process window of this type of wet cleaning process. The new recipe (CIP2) showed 100% success rate while CIP1 recipe had an occurrence of 35% failure for the bull’s eye signature on the similar quality and quantity of wafers.
Post-CMP Cleaners for Tungsten at Advanced Nodes
Authors: Lieten Ruben R. , White Daniela , Parson Thomas , Jenq Shi Ning , Frye Don , White Michael , Teugels Lieve , Struyf Herbert
Published: September 2016

We discuss several mechanistic approaches and experimental data for improving post-CMP cleaning of W plugs with TiN as barrier liner, and dielectric substrates SiO2 and Si3N4 for use at the 10 nm technology node (metal pitch of 40 nm). Particle charge in the low pH, W CMP slurries are usually positive, and the W surface is always negatively charged at pH >3. Therefore, a strong electrostatic attraction is expected to occur between the W surface and the residual particles during post-CMP cleaning. Two main approaches were chosen to break down the strong particles-W surface post-CMP electrostatic interactions, as well as particles dispersion and prevention of redeposition: (1) using cleaning additives able to adsorb at the W surface and reverse the W surface charge; (2) using organic additives to reverse the particle charge. The latter approach results in two strongly negative charged surfaces, which are able to repulse each other, and leads to the best cleaning.
Advanced Cryogenic Aerosol Cleaning: Small Particle Removal and Damage-Free Performance
Authors: Mbanaso Chimaobi , Butterbaugh Jeffery W. , Becker David Scott , Printz Wallace P. , Rotondaro Antonio L.P. , Bassett Derek W. , Thomes Gregory P. , Schwab Brent D. , Rathman Christina Ann , Lauerhaas Jeffrey M.
Published: September 2016

The performance of a new cryogenic aerosol process was evaluated for cleaning nanoparticles and providing damage-free processing. Particle Removal Efficiency (PRE) tests conducted with wet deposited 40 nm, 30 nm and 18 nm silica particles on 300 mm wafers demonstrated cleaning efficiencies above 80%. Damage-free capability of the cryogenic aerosol process was evaluated with poly-silicon lines with an aspect ratio of approximately 9:1. These results highlight the potential of this new cryogenic aerosol to provide semiconductor device yield benefits by reducing small particulate contamination without causing pattern damage.
Characterization of Cavitation in a Single Wafer or Photomask Cleaning Tool
Authors: Chen Xi , Yam Petrie , Keswani Manish , Okada Nagaya , Zanelli Claudio I.
Published: September 2016

A novel transducer for megasonic cleaning of photomasks presents an approach that differs from previous configurations, and appears to have unique features for cleaning while minimizing damage. As the cleaning and damage processes are determined by the presence of cavitation, a thorough acoustic analysis was performed on the device, by using a calibrated hydrophone scanned at the photomask location, and a quartz photomask with embedded sensors.
Optimization of Cu/Low-k Dual Damascene Post-Etch Residue and TiN Hard Mask Removal
Authors: Kabansky Alexander , Westwood Glenn , Tan Samantha , Kovacs Frederic , Lou David , Han Joe , Delgadino Gerardo , Chang H.W.
Published: September 2016

For advanced technology nodes TiN hard mask integration into Cu/low-k via/trench DD process requires the mask to be fully stripped after DD etching. The one-step H2O2 containing wet chemical clean aiming to removing TiN mask often failed to simultaneously clean etch residue. We developed more reliable two-step wet chemical process combining a solvent-based post-etch residue clean followed by a solvent/H2O2 mixture strip for TiN mask removal. Bath lifetime optimization was also demonstrated.
Minimizing Wafer Surface Charging for Single-Wafer Wet Cleaning for 10 nm and beyond
Authors: Sano Ken-Ichi , Dylewicz Rafal , Man Xia , Mui David , Zhu Ji , Kawaguchi Mark
Published: September 2016

Wafer charging has become an issue since single-wafer wet clean has been introduced and multiple aspects could be potential root causes. In chemistry and DIW process factors, typical process parameters; flow rate and time were re-evaluated. As an alternative solution, dilute NH4OH could reduce the wafer surface charging. Hardware parts were also investigated and wafer holding chuck-pin material was revealed to become a risk of discharging failure at edge of wafer. Ionizer has been known to discharge wafer surface; however, it is not enough to remove pre-existing charge from post DIW rinsed wafer. Soft X-ray is challenged to remove pre-existing charge and obtained initial positive result.
Silica Formation during Etching of Silicon Nitride in Phosphoric Acid
Authors: Bassett Derek W. , Rotondaro Antonio L.P.
Published: September 2016

The etching of silicon nitride using phosphoric acid with silicon dioxide as a mask is an important process step used in the production of 3D NAND devices. This paper examines the theory of formation of a silica film onto the silicon dioxide surface during this etching step by performing a shell balance analysis of silica species in the etched out liquid volume of the 3D NAND structures. The method of moments is used to solve for the moments of the distribution of particle sizes, and this is used to solve for the potential energy barrier for silica particles to adhere to the silicon dioxide surface.
Electrical Characterization of As-Processed Semiconductor Surfaces - Invited Paper
Authors: Ruzyllo Jerzy , Drummond Patrick J.
Published: September 2016

The paper is concerned with electrical characterization of as-processed semiconductor surfaces and near-surface regions for the purpose of process development and monitoring. The methods of electrical characterization based on Surface Photovoltage (SPV) and Photoconductance Decay (PCD) effects are discussed as being particularly conducive with the needs of as-processed semiconductor surface characterization and experimental results demonstrating merits of the proposed methodology are presented.
Wet Selective SiGe Etch to Enable Ge Nanowire Formation
Authors: Sebaai Farid , Witters Liesbeth , Holsteyns Frank , Wostyn Kurt , Rip Jens , Yukifumi Yoshida , Lieten Ruben R. , Bilodeau Steven , Cooper Emanuel
Published: September 2016

For the Ge nanowire formation in a gate-all-around (GAA) integration scheme, a selective etch of Si0.5Ge0.5 or Si0.3Ge0.7 selective to Ge is considered. Two wet process approaches were evaluated: a boiling TMAH as a commodity chemistry is compared with a formulated chemistry using a multi-stack SiGe/Ge layer as a test vehicle. The boiling TMAH exhibits an anisotropic etch of the SiGe whereas the formulated semi-aqueous chemistry removes the sacrificial SiGe by an isotropic etch which makes the process suitable for a Ge nanowire release process.
Specification of Trace Metal Contamination for Image Sensors
Authors: Mertens Paul W. , Lavizzari Simone , Guerrieri Stefano
Published: September 2016

CMOS image sensors can suffer from background noise in absence of any light. In order to suppress this it is important to keep this noise, referred to as dark-current low. This implies that the internal generation current should be very low. Trace metal impurities have been reported to increase the generation current. In this study the trap-assisted generation current contributions due to 7 different metal impurities have been calculated. It was concluded that Cu and Mn impurities yield the highest generation current contribution.
Metal Removal Efficiency in High Aspect Ratio Structures
Authors: Garnier Philippe , Fontaine Hervé
Published: September 2016

An extremely low level of metal contamination is required for specific devices like memories and CMOS Image sensors. Most of past work in the literature has focused on blanket wafer decontamination, since metrology is mostly adapted to flat surfaces. Metal removal efficiency has been compared between blanket wafers versus high aspect ratio deep trenches wafers. Two different metrology technics enable a quantitative and spatial metal removal determination on patterned wafers. Efficient cleaning in high aspect ratio structures requires much longer cleaning recipes than on flat surfaces.
Contamination Control for Wafer Container Used within 300 mm Manufacturing for Power Microelectronics
Authors: Schneider Germar , Nguyen Thi Quynh , Taubert Matthias , Bounouar Julien , Le-Guet Catherine , Leibold Andreas , Richter Helene , Pfeffer Markus
Published: September 2016

This paper gives an overview about all activities performed within a common project between industrial and academic partners to define clean room concepts for the first worldwide high volume semiconductor front end facility IFD for 300 mm power semiconductors. The investigation within this study is the base for the 300 mm container strategy resulting in new innovative manufacturing and automation concepts.
Comparison of the Chemical Passivation of GaAs, In0.53Ga0.47As, and InSb with 1-Eicosanethiol
Authors: Contreras Yissel , Mancheno-Posso Pablo , Muscat Anthony J.
Published: September 2016

Self-assembled 1-eicosanethiolate layers were deposited on the oxide-free (100) crystal planes of GaAs, In0.53Ga0.47As, and InSb to protect the surfaces. The layer prevented re-oxidation in air for 30 min on GaAs but only 8 min on In0.53Ga0.47As based on the O 1s x-ray photoelectron spectroscopy state. The layer protected InSb from reoxidation for only 4 min based on the O Auger state. Well-ordered monolayers formed on GaAs and In0.53Ga0.47As based on transmission Fourier transform infrared (FTIR) spectroscopy. A partially ordered layer was formed on InSb based on attenuated total reflection FTIR. The increased reoxidation rate of InGaAs and InSb is due to the larger lattice parameter of these surfaces and their In content, which forms weaker bonds to S, Ga, and Sb compared to Ga bonding to As and S.
Titanium Nitride Hard Mask Removal with Selectivity to Tungsten in FEOL
Authors: Wu Hsing Chen , Tu Sheng Hung , Yang Min Chieh , Cooper Emanuel
Published: September 2016

This paper describes etching of titanium nitride (TiN) highly selective to tungsten (W), where the TiN etch rate (E/R) was about 100 Å/min and W E/R was less than 1 Å/min at 60°C. The formulation concept was adapted from the Entegris TK-10 series, but it was modified to fit the criteria for front-end application. No damage to tantalum nitride (TaN) was required during the etching process but silicon oxide compatibility requirement was relaxed. By replacing W inhibitors with more suitable ones, W loss was well controlled, while the particle issue previously found in the scale up lots was also solved.
Biological Networks for Cancer Candidate Biomarkers Discovery
Authors: Yan Wenying , Xue Wenjin , Chen Jiajia , Hu Guang
Published: September 2016

Due to its extraordinary heterogeneity and complexity, cancer is often proposed as a model case of a systems biology disease or network disease. There is a critical need of effective biomarkers for cancer diagnosis and/or outcome prediction from system level analyses. Methods based on integrating omics data into networks have the potential to revolutionize the identification of cancer biomarkers. Deciphering the biological networks underlying cancer is undoubtedly important for understanding the molecular mechanisms of the disease and identifying effective biomarkers. In this review, the networks constructed for cancer biomarker discovery based on different omics level data are described and illustrated from recent advances in the field.
Basics Fashion Design 05: Fashion Drawing
Authors: Hopkins John
Published: September 2016

To become a successful fashion designer, you will need to develop your drawing skills, but for any career in fashion it is important to have an understanding of the basic principles of good fashion drawing.

Basics Fashion Design 05: Fashion Drawing presents a fresh perspective on the basic principles and practices of contemporary drawing styles, applied to a fashion context.

The book takes a practical approach in discussing the process of fashion drawing, offering advice on the selection of materials and media and advising on their different uses and applications. It also considers the theory and history of fashion drawing, and the range of styles used by contemporary designers; from quick sketches to sophisticated digital pieces.

This discussion is accompanied by interviews with designers and illustrators, a glossary, resources directory and templates.
Basics Fashion Design 09: Designing Accessories
Authors: Lau John
Published: September 2016

Long since regarded as an inessential object that simply adds to the beauty, convenience or effectiveness of an outfit, accessories are now considered key items in a fashion collection and as stand-alone pieces worthy of our undivided attention. Basics Fashion Design 09: Designing Accessories is filled with important information that any designer will need to know, examining four key items from concept to production: the bag, footwear, jewellery and millinery. The key accessories are dissected to clearly display the core components, giving a clear view of how each connects.

The design process is explored by looking at creative product development, from gathering research to generating ideas into key products, construction techniques and the essential tools of the trade used in modern accessories design. 2D pattern and 3D modelling techniques are described in detail with explanations of traditional and rapid prototyping tools in use today. Bespoke and commercial production is examined and creative solutions to technical challenges are presented.

Designing Accessories also explores specialist finishing techniques, such as hand-finishing and machine embellishment and contains descriptions of contemporary techniques that break new boundaries in accessories design. A detailed explanation of small accessories, essential to the accessories designer, will broaden the reader’s knowledge and provide them with the dexterity of skills to enter the fashion industry.

This title is filled with images of beautiful accessories to inspire young designers. It is essential reading for fashion students and all those interested in accessories design. The book also includes a whole chapter on small accessories (eyewear, scarves, ties, wristwatches, belts and gloves).
Basics Fashion Design 10: Jewellery Design
Authors: Galton Elizabeth
Published: September 2016

Basics Fashion Design 10: Jewellery Design is an introduction to the world of jewellery. It explores how inspiration and research can be used to build a jewellery collection. It provides a brief overview of how the design process evolves, and demonstrates that even on a limited budget it is possible to carve out a niche in this exciting genre.

Each chapter includes interviews with some of the world's most famous jewellery designers, giving an insight into the creative process and exploring their brands. Projects and case studies ensure that students are given a practical and inspirational introduction to the world of jewellery design.
Fashion Design: The Complete Guide
Authors: Hopkins John
Published: September 2016

Fashion Design: The Complete Guide is a modern and stylish introduction to working within the fashion industry today. Catwalk images show the latest trends and contributions from industry professionals span centres of fashion across London, Paris and New York. A fabulous selection of images and plenty of suggestions of further resources make this a useful and exciting springboard into a successful career in fashion. This behind-the-scenes guide to the study of fashion is for current and aspiring designers, fashion lovers and students. It provides an all-inclusive overview of the entire design process, covering the history of fashion, fashion illustration, colour and fabrics, the journey from concept to finished garment, research processes, presenting a collection and professional practice. It is generously illustrated throughout with images from famous designers, includes promising graduate work and showcases original artwork from a variety of studios.

The new essential text for aspiring fashion designers, Fashion Design: The Complete Guide is filled with practical advice at every stage, including help with portfolios, personal promotion and career opportunities. With an attractive and colourful layout, every chapter also includes interviews, discussion questions, activities and further reading. The book is illustrated with beautiful examples of work from both established and up-and-coming designers, including Alexander McQueen, Viktor & Rolf, Jean-Paul Gaultier, Christian Dior, Anna Sui, Jonathan Saunders, Mary Katrantzou and Elie Saab, and pictures of style icons such as Tilda Swinton and Gwen Stefani.
Sourcing and Selecting Textiles for Fashion
Authors: Cadigan Erin
Published: September 2016

Written with the innovative fashion student in mind, Sourcing and Selecting Textiles for Fashion gives a full overview of the current textile market and shows how to apply this knowledge when creating a fashion collection.

Following a brief look at the historical growth of fashion textiles in industry and culture, the book explores the manufacturing, design, sourcing and end-use of fashion textiles. Natural and man-made fibres are discussed along with current woven, knit and non-woven production methods. A variety of industrial and custom surface design techniques including dye, print, embellishment and fabric manipulation are covered. Trend, inspiration, colour, creating the collection and how to enhance design through textile choice and surface design are included. A perspective of current innovation and sustainability is offered in each area.

Colour photographs, illustrations and designer spotlights supplement informative text throughout the book, and the text includes a bonus section of interviews with designers at different levels of their career and marketplace, focusing on how they select and source fabrics and apply them to their designs.
Developing a Fashion Collection
Authors: Renfrew Elinor , Renfrew Colin
Published: September 2016

Fully updated with new interviews and inspiring images, the 2nd edition of Developing a Fashion Collection covers everything the fashion student needs to know before designing their own collections.

Developing a Fashion Collection focuses on the process of designing a collection, and explores different types of research, fabric sourcing, the key roles within a design team and the many sources of inspiration available to designers. Different market levels from ready-to-wear to online shopping are covered in-depth, and are given real-world context through insightful interviews with practising contemporary designers. Collections for niche markets, including knitwear, childrenswear and footwear are also discussed.

The 2nd edition of Developing a Fashion Collection features interviews with high-profile international contemporary fashion designers, including Sister by Sibling, Holly Fulton, Todd Lynn, thefuturelaboratory, People Tree, Leutton Postle and Insley & Nash.
The Fashion Designer’s Sketchbook
Authors: Rothman Sharon
Published: September 2016

The Fashion Designer's Sketchbook is a must-have resource for both fashion students and practising designers who wish to learn new ways of generating design ideas in order to create successful fashion collections, and who wish to develop their own creative aesthetic. It demonstrates how the fashion design sketchbook serves as a crucial creative tool for professional development - and a valuable portfolio of design work to present to potential employers.

This book identifies four distinct types of creative journal, each representing a different phase in the design process: the inspiration diary, the working journal, the presentation journal and the design log; and it explores how one develops out of the other, each stage in the idea generation process moving the process forward organically from discovery, to direction, to design development and delivery.
Designing with Smart Textiles
Authors: Kettley Sarah
Published: September 2016

If you want to understand, and be a part of, the creative revolution in materials design, then Designing with Smart Textiles is the complete toolkit you need to get started.

Beginning by introducing the terminology and key applications, the book goes on to examine the key design processes needed to develop interactive textile design concepts, with detailed projects and examples to help you apply these approaches in your own practice.

Case studies and interviews with innovative designers introduce you to different artistic and technological practices, and demonstrate how world-leading researchers are creating new technologies, yarns, fabrics, and applications. Practitioners share unique insights into their processes, and "Tech Tips" so you can build on their research in your own work.
Accessory Design
Authors: Genova Aneta
Published: September 2016

This comprehensive introduction to accessory design gives the aspiring designer an overview of the history of fashion accessories, including a look at important contributions by brands both classic and contemporary. Genova presents a model for accessory design, from inspiration through manufacturing, and relates that process to the design of handbags and small leather goods, footwear, hats, gloves, belts, neckwear, and pocket squares. For each accessory, the text explains how the designer’s creativity can be channeled into the development of styles that enhance a brand’s appeal to its target market.
Apparel Making in Fashion Design
Authors: Kim Injoo , Uh Mikyung
Published: September 2016

This text offers a complete picture of the process of individual garment construction following the exact techniques used in the industry. The unique feature of this book is its presentation of each garment as a whole concept. With numerous diagrams and easy-to-follow instructions, students master the principles of design and flat pattern to create an individual item of apparel. Each chapter begins with the introduction of a basic sloper and follows with an explanation of the whole production process-making a garment from pattern drafting to garment construction, including lining, interfacing and markers. The balance of each chapter covers techniques for altering separate pattern pieces.
Apparel Merchandising
Authors: Rosenau Jeremy A. , Wilson David L.
Published: September 2016

Apparel Merchandising: The Line Starts Here analyzes the evolution and development of the merchandising function in branded apparel companies and retail private label apparel. It describes today’s challenges for both apparel manufacturers and retailers in meeting the consumer’s demands for the right products at the right prices - and at the right times. Approached from the perspective of the apparel product manager, Rosenau and Wilson cover men’s and women’s sportswear and activewear and children’s wear in both domestic and international markets.

The text follows the evolution of the merchandising function with emphasis on product development and production efficiency, highlighting the philosophies of industry executives and the effective integration of the merchandising, marketing, and manufacturing functions along the way. The third edition emphasizes the increased importance of retailer’s private brands, explores how companies apply technology to all facets of product development and supply chain management, and addresses the impact of social media on both retailers and apparel manufacturers.
Apparel Quality Lab Manual
Authors: Bubonia Janace E.
Published: September 2016

This student lab manual reinforces the chapter
content and lecture material from Apparel Quality, but may also be used as a
standalone product in conjunction with another apparel quality textbook. With more
than 30 hands-on lab activities and projects to enhance learning, the lab manual
offers a greater understanding of quality issues that arise with apparel production
and end use. Designed for courses that emphasize textile testing or offer a
laboratory component, Apparel Quality Lab Manual includes supply lists; extensive
reference tables; assignments for analyzing products, testing and evaluating
materials and garments; project sheets for product comparison testing; worksheets to
record data; directions for mounting specimens after testing; and templates for
cutting specimens.

Students will be actively engaged in their
learning and participate in determining the quality level of apparel products,
allowing them to simulate how apparel products are analyzed in the industry.
CAD for Fashion
Design and Merchandising
Authors: Smith Stacy Stewart
Published: September 2016

It takes more than raw talent and passion to make it in today’s global apparel and accessories markets—excellent computer-aided design skills are a prerequisite. CAD for Fashion Design and Merchandising allows students to immediately begin creating digital fashion presentations using Adobe Illustrator® and Photoshop®. This book takes an integrated approach, allowing students to master the three-dimensional benefits of combining the two software programs. Colorful illustrations accompany easy, step-by-step tutorials that are geared toward students at the beginner and intermediate levels. Because the book uses fashion photography rather than hand-drawn illustrations as a basis for demonstrating the proportion of fashion croquis, instructors will be able to evaluate students’ mastery of digital illustration regardless of their hand-drawing skills, and students will benefit from a seamless transition from creative thought to digital rendering.
Designer’s Guide to Fashion Apparel
Authors: Brannon Evelyn L.
Published: September 2016

Designer’s Guide to Fashion Apparel explores the creative process of apparel design and the development of a collection. From budget to couture, children’s to men’s and women’s, fashion-forward to traditional and formal to active, the text demonstrates the proper application of design principles in creating aesthetically pleasing apparel while emphasizing the importance of production parameters as dictated by the needs of the target consumer. Written from an industry perspective, the book is intended to nurture the student’s interest in design while providing the thorough grounding needed for a successful career in the business.
Designing and Patternmaking for Stretch Fabrics
Authors: Richardson Keith
Published: September 2016

Stretch fabrics are more popular than ever, from Juicy Couture's sweats to the trendy, ready-to-wear styles found at H&M. Stretch fabrics have long been a staple of designer fashion as well–from Missoni's colorful knits to Donna Karan's basics. Designing and Patternmaking for Stretch Fabrics provides the design student or working designer with the essential information for understanding the specifics of knit fabrics and the patternmaking process for different garments. Fibers, dyes, treatments, care, and fabric sources are discussed, along with the principles of sizing and measuring for women's, men's, petite, plus, and half sizes. Chapters focusing on particular garments begin with a draft of a sloper. Numerous illustrations and diagrams demonstrate the effects of draping, gathering, shirring, ruffling, and making adjustments as needed to flatter the wearer. These instructions will put students' skills and creativity to work with everything they need to turn an ordinary garment into one of original designer quality.
Draping Basics
Authors: Di Marco Sally M.
Published: September 2016

With step-by-step written instructions, Draping Basics provides the fundamentals of designing foundation garments by draping fabric on a dress form. Photographs clearly demonstrate the details of the process, and CAD drawings show how the draping is transferred to paper patterns. The text covers the foundation skirt, bodice, and set-in sleeve, as well as foundation bodice variations; dart equivalent bodice styles; bodice designs; and skirt, dress, and collar styles.
Essentials of Exporting and Importing
Authors: Shoemack Harvey R. , Rath Patricia Mink
Published: September 2016

International business, especially export-import trade, is no longer an option, but a necessity for today’s apparel industry to grow and generate profits or just to survive in the global marketplace. The decision to export or import is best based on a company or individual entrepreneur’s careful and thorough analysis of its internal and external resources and capabilities. Essentials of Exporting and Importing provides the merchandising, marketing, or business student a practical, basic guide for importing and exporting products, services, or technology, while maintaining compliance with government policies. Calling upon the knowledge and expertise of industry professionals and government officials as sources, the authors focus on the policies, procedures, and practices essential for success in the dynamic and expanding field of international trade.
Fashion Branding
Authors: Hameide Kaled K.
Published: September 2016

Fashion Branding Unraveled introduces and explains the concept of brand and the process of brand development. The book clarifies misconceptions, introduces new concepts, and proposes a step-by-step roadmap for developing an effective brand, all within the context of the fashion industry. Using an easy-to-understand approach, relevant examples, and case studies, it applies the theories and concepts covered, such as “mass customization” and “M-branding,” to a variety of industry segments, from luxury brands to private labels. The book includes an examination of the latest technologies, their applications, and—most important—their effects on the future of branding.
From Pencil to Pen Tool
Authors: Armstrong Jemi , Ivas Lorrie , Armstrong Wynn
Published: September 2016

In today’s fashion industry, the
traditional skills of forecasting, cutting, sewing and drafting are no longer
enough. Students must be able to transform their two-dimensional plans into
computer-generated images. From Pencil to Pen Tool: Understanding Creating the
Digital Fashion Image teaches Adobe PhotoShop CS and Illustrator CS techniques
applicable to both fashion students entering the field and established
fashion-industry professionals seeking to stay current with technology. This book
includes technical instruction about sketching and image production, as well as
practical advice about creating a computer-generated portfolio and entering the
fashion marketplace. Instructor’s Guide available on request
Functional Clothing Design
Authors: Watkins Susan M. , Dunne Lucy E.
Published: September 2016

Functional Clothing Design is a book about how and why clothing works. This interdisciplinary text introduces new ways to look at the human body, the environment and clothing and to explore the relationships between them by looking at the ways clothing achieves goals such as protecting the body, increasing health and safety, improving a workers efficiency on the job or increasing body function.

Watkins and Dunne present technical material using clear, simple language that can be readily understood by beginning design students with no science or engineering background. Building on the groundbreaking text by Watkins, Clothing: The Portable Environment, this text covers a full range of factors involved in designing functional clothing: protection from thermal, impact and other environmental hazards; enhancing movement and visibility and increasing body function with smart clothing; designing clothing for people with handicaps and designing protective clothing for groups such as the military, who face multiple hazards.

Functional Clothing Design focuses on the full range of activities needed to develop functional clothing from analysis of user needs to choosing appropriate materials to design and design evaluation. The text includes case studies throughout as well as new content on smart textiles and all the latest developments in wearable technology. Designers and others seeking clothing solutions to problems in many fields will find a common language linking a number of disciplines through which they can explore both problems and solutions.
Know Your Fashion Accessories
Authors: Stall-Meadows Celia
Published: September 2016

This comprehensive study of women’s and men’s fashion accessories provides fashion merchandising students with a detailed analysis of the fashion accessory categories. Broken into three units, the text not only covers the major categories but provides an overview of the accessories business and discusses the materials used in the production of a variety of accessories.
Marker Rendering for Fashion, Accessories, and Home Fashion
Authors: Abling Bina
Published: September 2016

With the growing trend of licensing apparel, accessories, and home fashions under a single logo, today’s students must expand their portfolios to include concepts with broader applications. Marker Rendering for Fashion, Accessories, and Home Fashions provides detailed instructions for marker rendering methods relevant to a variety of products. Allowing designers to express their ideas immediately, the marker is an essential tool for the design professional. The author’s step-by-step instructions provide a sound introduction to the skills that students need, and teaches methods of overlapping media applications for an assortment of colors, patterns, and materials. The lessons are taught as a progression of skills, building slowly from basic to complex rendering methods used in the design industry today.
Merchandise Buying and Management
Authors: Donnellan John
Published: September 2016

The fourth edition of Merchandise Buying and Management has been updated to cover the most current information on merchandising and retailing. Written for college-level courses dealing with retail buying and the management for retail inventories, the text covers topics relevant to future buyers and store management personnel. The material is presented within the context of a contemporary retail environment-with examples from both fashion and non-fashion retailers-in which buyers often act as fiscal managers as well as product developers, and store managers play important roles in sales productivity and assortment planning. Retail technology is a theme that runs throughout the book, tied to topics such as space management, electronic data exchange, point-of-sale systems, and floor ready merchandise. Merchandise Buying and Management has been updated to cover the most current information on merchandising and retailing. Written for college-level courses dealing with retail buying and the management for retail inventories, the text covers topics relevant to future buyers and store management personnel. The material is presented within the context of a contemporary retail environment-with examples from both fashion and non-fashion retailers-in which buyers often act as fiscal managers as well as product developers, and store managers play important roles in sales productivity and assortment planning. Retail technology is a theme that runs throughout the book, tied to topics such as space management, electronic data exchange, point-of-sale systems, and floor ready merchandise.
Modaris and Diamino for Apparel Design
Authors: Black Catherine
Published: September 2016

A step-by-step guide to Lectra System’s two related software programs, Modaris and Diamino for Apparel Design gives students and professionals working in apparel design and product development the technical know-how they need to succeed. Modaris is used for all phases of pattern development, including pattern manipulation, drafting, and grading. After the patterns are created, they are transferred to Diamino, the marker-making program. Together these programs create the final project.
Perry’s Department Store: An Importing Simulation
Authors: Reamy Donna W. , Steele Cynthia W.
Published: September 2016

Perry’s Department Store: An Importing Simulation teaches business in the dynamics of the international marketplace by placing the reader in the role of a retail buyer importing jeans into the United States. The import process is divided into eight steps: profiling suitable countries for export, developing sourcing strategies, recognizing differences in working across cultures, understanding the policies and laws governing importing, classifying imported product, financing the import purchase, determining shipping procedures for imports, and completing the entry process. Resources and worksheets for the simulation are included on the accompanying CD-ROM.
A Practical Approach to Merchandising Mathematics Revised First Edition
Authors: Cushman Linda M.
Published: September 2016

A Practical Approach to Merchandising Mathematics, Revised 1st Edition, is dedicated to helping students master the mathematical concepts, techniques, and analysis utilized in the merchandise buying and planning process. Students will review basic maths concepts; learn how to use typical merchandising forms; become familiar with the application of computerized spreadsheets in retailing; and recognize the basic factors of buying and selling that affect profit. This peer-reviewed new edition of the text brings together assortment planning, vendor analysis, markup and pricing, and terms of sale into one comprehensive resource for students who will be involved with the activities of merchandise buying in the retail industry.
The Practical Guide to Patternmaking for Fashion Designers: Juniors, Misses, and Women
Authors: Knowles Lori A.
Published: September 2016

The Practical Guide to Patternmaking for Fashion Designers: Juniors, Misses, and Women offers an in-depth look into the techniques and theories of pattern drafting for women’s garments. Covering a wide variety of styles, textiles, and sizes, this book is useful for a wide range of pattern courses from introductory to advanced. It provides a sound introduction to the concepts and the processes of patternmaking, as well as a more advanced analysis of style and design. The author offers helpful techniques on taking measurements and adjusting the fit of garments for all body sizes, patterns, and types of fabrics.