num_pages: 224
description: This text constitutes the proceedings from the International Symposium on Plasma Process-Induced Damage, which took place in 1999. Topics covered include plasma equipment, electron shading, device characterization and backend process integration.
language: English
title: 1999 4th International Symposium on Plasma Process-Induced Damage
titlecomplete: 1999 4th International Symposium on Plasma Process-Induced Damage
publisher: IEEE