num_pages: 448
description: This book focuses on advances associated with generating processing-microstructure-property-performance relationships of coatings produced by chemical vapor deposition (CVD) and physical vapor deposition (PVD) methods. Various coating materials and applications are discussed, ranging from producing high-quality diamond coatings to developing large-scale or novel diamond-like carbon (DLC) processes, understanding metal-ceramic interface adhesion behavior in thermal barrier coatings, identifying corrosion-resistant ceramic coating materials for high-temperature structural applications, and preparing polymeric thin films for integrated circuits. Rapid advances in industrial process scale-up and the development of a large-scale DLC coating chamber, based on a novel process concept called 'plasma ion immersion process, ' is presented. Progress in understanding the reaction kinetics, particularly gas phase chemistry, of complex CVD processes is noted. Overall, the book clearly shows that vapor-deposited coatings are being actively pursued for diverse technological benefits, and that the coating community is increasingly relying on generating appropriate processing-microstructure-property relationships to guide integrated coating process and product development
language: English
title: Properties and Processing of Vapor-Deposited Coatings: Volume 555
titlecomplete: Properties and Processing of Vapor-Deposited Coatings: Volume 555 (MRS Proceedings)
publisher: Cambridge University Press