Patent SG-11201805416R-A (SG)
Title: A photocurable resin composition for stereolithographic manufacturing, three-dimensional articles produced with said composition and a relative manufacturing method
Inventor: HAGIWARA TSUNEO
IPC: G03F7/00
Filed: 2017-01-27
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (10) International Publication Number (43) International Publication Date WO 2017/130153 Al 3 August 2017 (03.08.2017) WIPO I PCT 11111111111111011101111111111101011111011101110111111110111101101111111110111111 (51) International Patent Classification: G03F 7/00 (2006.01) GO3F 7/038 (2006.01) B29C 67/00 (2017.01) (21) International Application Number: PCT/IB2017/050449 (22) International Filing Date: 27 January 2017 (27.01.2017) (25) Filing Language: Italian (26) Publication Language: English (30) Priority Data: 102016000008951 28 January 2016 (28.01.2016) IT (71) Applicant: DWS S.R.L. [IT/IT]; Via della Meccanica, 21, 36016 Thiene (VI) (IT). (72) Inventors: HAGIWARA, Tsuneo; Yoyogi 2-34-2, Shibuya-ku, Tokyo (JP). IKETANI, Satoshi; Strada del Megiaro, 30, 36100 Vicenza (IT). (74) Agent: MARCHIORO, Paolo; Studio Bonini Srl, Corso Fogazzaro, 8, 36100 Vicenza (IT). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: with international search report (Art. 21(3)) before the expiration of the time limit for amending the claims and to be republished in the event of receipt of amendments (Rule 48.2(h)) W O 20 17 / 130 15 3 Al (54) Title: A PHOTOCURABLE RESIN COMPOSITION FOR STEREOLITHOGRAPHIC MANUFACTURING, THREE-DI- MENSIONAL ARTICLES PRODUCED WITH SAID COMPOSITION AND A RELATIVE MANUFACTURING METHOD (57) : The invention refers to a liquid photocurable resin composition for stereolithography, comprising (i) at least one rad- ical polymerizable compound (A) represented by the following general formula (I): R 40 -CO-NH-R -NH-C-O-R-O-CO-NH-R 2 1 3 -NH- CO-OR 4 (I), wherein R 1 is a linear or branched polytetramethylene glycol residue having an average molecular weight from 200 to 3,000 g/mol; R is a diisocyanate compound residue; R is a diisocyanate compound residue being the same as or different from R 2 3 2 ; and R 4 is selected from AcrO-CH 2 -CH-, (AcrO-CH2)2CH-, (AcrO-CH2)3C-CH2- AcrO-CH2-CHCH3-, AcrO-CH2-GHG2H5- and (AcrO-CH2)2C(C2H5)CH2-, preferably from AcrO-CH2-CH2- and (AcrO-CH 2 2 ) CH-, more preferably is AcrO-CH-CH-; wherein Acr 2 is CH2=C(R)-CO- and R is a hydrogen atom or a methyl group; (ii) at least one radically polymerizable organic compound (B) dif- ferent from compound (A); and (iii) a photosensitive radical polymerization initiator (C), wherein the content of said radical poly- merizable compound (A) varies from 5% to 70% by weight based on the total amount of compounds (A) and (B). The invention fur- ther describes a corresponding stereolithographic use and method and three-dimensional articles produced therewith.