baber/WOPTO huggingface dataset:
Patent KR-20030047445-A (KR)
Title: Apparatus of generating reverse link traffic for testing smart sector system, and its method
Inventor: BYUN JAE WAN
IPC: H04B7/155
Filed: 2001-12-10
Abstract: PURPOSE: An apparatus for generating a reverse channel signal for certifying a smart sector system and a method therefor are provided to generate a multi-CDMA(Code Division Multiple Access) reverse channel signal in consideration of wireless channel environment and use the generated multi-CDMA reverse channel signal as an input signal for the certification test of the smart sector system. CONSTITUTION: A channel control module(400) calculates a reception power value by wireless channel parameters voluntarily set in consideration of wireless channel environment, and controls the generation of a reverse channel signal by the calculated reception power value. A channel source module(100) generates a source channel signal having a random bandwidth used in a mobile communication system by the control of the channel control module(400), and divides the generated source channel signal into the number of source channel signals which is identical to the number of sectors on wireless channel environment. A channel adjusting module(200) adjusts sector-classified channel signals divided in the channel source module(100) in consideration of each sector-classified different cell, signal interference by the sector, the signal distribution characteristic of sector-classified subscribers, a voice activity ratio, and power control. A reverse channel generating module(300) divides a power of the channel signal adjusted from the channel adjusting module(200) by the control of the channel control module(400), and generates the reverse channel signal through the attenuation and analysis of the divided channel signals.
Patent KR-20020062562-A (KR)
Inventor: KIM BYEONG CHEOL
IPC: H01L21/306
Filed: 2001-12-13
Abstract: PURPOSE: An apparatus for manufacturing a semiconductor is provided to restrain the mass loss, to stably and promptly perform a process by adopting many load lock chambers and plasma generators, to improve the etching speed of a wafer by installing a preheating unit in a reactor, and to exclude a cleaning process. CONSTITUTION: The apparatus comprises a cassette station loading the wafer, a standby transfer robot withdrawing the wafer of the cassette station, a load lock chamber(12) storing the wafer withdrawn by the standby transfer robot, and a reaction chamber. The reaction chamber includes a shuttle blade(20) neighboring to the load lock chamber, withdrawing the wafer stored in the load lock chamber in vacuum state and storing the etched wafer in the load lock chamber, a rotating robot(26) rotating and transferring the wafer placed on the shuttle blade from the load lock chamber, and a heater stage(24) etching the wafer transferred by the rotating robot by a plasma generator(28).
Patent KR-20030050096-A (KR)
Title: Method of trench type device isolation
Inventor: JUNG HUI GEUN
IPC: H01L21/76
Filed: 2001-12-18
Abstract: PURPOSE: A trench isolation method is provided to prevent a dent phenomenon chronically occurring in a conventional trench-type isolation process by performing a relatively simple additional process for recessing a pad layer. CONSTITUTION: The pad layer is formed on a substrate(100). An etch stop layer is formed on the pad layer. The etch stop layer, the pad layer and the substrate in a trench region are sequentially eliminated through a patterning process to form an etch stop layer pattern, a pad layer pattern and a substrate trench(140). An isotropic etch process is performed on the pad layer pattern to laterally recess the pad layer pattern. A silicon nitride layer liner(160) is formed on the substrate including the inner wall of the trench. A silicon oxide layer is stacked on the substrate to fill the trench. A chemical mechanical polishing(CMP) process is performed on the front surface of the substrate until the etch stop layer pattern is exposed. The etch stop layer pattern is removed to expose an active region through an etch process.
Patent KR-20030050136-A (KR)
Title: Method of controlling rpm flare on shifting for vehicles having a manual transmission
Inventor: LEE SANG SEOK
IPC: F02D41/04
Filed: 2001-12-18
Abstract: PURPOSE: A method for controlling rpm flare during gear shifting of a manual transmission vehicle is provided to improve the reliability of a vehicle by suppressing the generation of noise due to rpm flare during gear shifting. CONSTITUTION: A method for controlling rpm flare during gear shifting of a manual transmission vehicle comprises the steps of calculating an engine rpm acceleration(13), deciding if a TPS(Throttle Position Sensor) is closed(20), determining the open degree of an idle speed actuator as a predetermined value if the engine rpm acceleration is higher than a predetermined value(40), comparing an addition of a target rpm and an allowable rpm limit to an addition of an rpm and an allowable limit(50), performing ignition retardation control(60), comparing a present control ignition time to a maximum allowable ignition time(70), determining the ignition time as a maximum allowable ignition time(80), and deciding if a vehicle speed is lower than a predetermined value or the TPS is opened(90).
Patent KR-20030050174-A (KR)
Title: Cleaning solution for photoresist
Inventor: HWANG YEONG SEON
IPC: G03F7/32
Filed: 2001-12-18
Abstract: PURPOSE: Provided are a cleaning solution composition which is used for preventing the breakage of photoresist pattern, a method for forming a photoresist pattern by using the same, and a semiconductor device obtained by the method. CONSTITUTION: The composition comprises a compound of formula 1, an alcohol compound, and water. In the formula 1, each of R and R1 is hydrogen, C1-C10 alkyl, aryl, azine, aminoalkyl, aminoaryl, carboxylic acid group, or sulfonic acid group, R' is amino group, hydroxyl group, C1-C10 alkyl, aryl, azine, aminoalkyl, aminoaryl, carboxylic acid group, or sulfonic group, A is C1-C5 alkylene or C3-C10 aromatic ring, and n is an integer of 0-2. The ratio of the compound of formula 1: alcohol compound: water is 0.001-5:0.01-10:85-99.989(wt%).
Patent KR-20030050383-A (KR)
Title: Method for Make Bean Porridge Adding Ginseng
Inventor: EOM JAE YONG
IPC: A23L2/38
Filed: 2001-12-18
Abstract: PURPOSE: Provided is a method for making health drink using as main ingredient jujube and honey syrup which have beneficial components to the human body. Therefore, the beverage has abundant nutrients and a characteristic taste and flavor. CONSTITUTION: A method for making health drink using jujube and honey syrup comprises the steps of: mixing 80-80.24 % of purified water, 19-19.50 % of honey syrup, and 0.1-0.15 % of jujube concentrate; adding to the mixture thereof 0.01-0.20 % of royal jelly, 0.03-0.0 5% of glycine, 0.01-0.02 % of vitamin C, 0.01-0.02 % of stevioside, 0.03-0.06 % of honey flavor and 800.004-0.01% of polysorbate; filtering the mixture thereof; sterilizing the filtrate at over 95 deg.C for 30 minutes; and filling it into a container at 86-100 deg.C and vacuum sealing it.
Patent KR-20020050138-A (KR)
Inventor: NAGAI TADASHI
IPC: C08J9/00
Filed: 2001-12-19
Abstract: PURPOSE: A polyurethane porous substance, its preparation method and a method for preparing a polyurethane porous sheet formed structure are provided, to obtain effectively a polyurethane porous substance having a high strength without using a solvent or a drier. CONSTITUTION: The polyurethane porous substance is prepared by heating and melting an isocyanate group-containing urethane prepolymer which is semi-solid or solid at a room temperature, and a compound capable of being reacting with an isocyanate group and/or an urethane curing catalyst; mixing them with stirring; and mechanically foaming the mixture. Preferably the isocyanate group-containing urethane prepolymer has a melting index of 500-100,000 mPa·s at 120 deg.C; and the content of an isocyanate group is 0.5-10.0 wt.%. The melting process is preferably carried out at 60-250 deg.C.
Patent KR-20030054108-A (KR)
Title: method and apparatus for optimizing hardware graphics acceleration board operation for real time rendering
Inventor: CHOI BYEONG TAE
IPC: G06T15/00
Filed: 2001-12-24
Abstract: PURPOSE: An operation optimizing system in a hardware graphic acceleration board for real-time rendering and an operation optimizing method are provided to improve output speed when a three-dimensional object is output on a computer screen using the hardware graphic acceleration board. CONSTITUTION: An operation optimizing system in a hardware graphic acceleration board for real-time rendering includes a hardware optimization pre-processor(100), a triangle aligner(300), and a triangle selection and outputting unit(400). When geometrical information and surface attribute information of a three-dimensional object are inputted to the hardware optimization pre-processor, the pre-processor analyzes the geometrical information to form a surface attribute list and analyzes triangles constructing the object to generate a group of triangles as many as the number of surface attributes. The triangle aligner aligns the triangles according to camera information. The triangle selection and outputting unit extracts the aligned triangles one by one, selects triangles to be output on a screen among the extracted triangles, and outputs the selected triangles to an output device(500).
Patent KR-20030054787-A (KR)
Inventor: CHOI CHI HONG
IPC: H01L27/04
Filed: 2001-12-26
Abstract: PURPOSE: A method for forming a capacitor of a semiconductor device is provided to minimize the area of a chip by obtaining a high resistant value of two or more times from the same area. CONSTITUTION: A lower plate poly layer(6) is formed on a semiconductor substrate. An ion implantation process is performed on the lower plate poly layer. An insulating layer(7) is formed on the lower plate poly layer. An upper plate poly layer(8) is formed on the insulating layer. The ion implantation process is performed on the upper plate poly layer. The upper plate poly layer and the insulating layer are etched by using the first mask pattern. The lower plate poly layer is etched by using the second mask pattern. An inter-metal dielectric(10) is formed on the resultant. A contact hole is formed by etching the inter-metal dielectric. The contact hole is buried by forming a metal layer thereon. The lower plate poly layer is electrically connected to the upper plate poly layer by patterning the metal layer.
Patent KR-20030056752-A (KR)
Title: UV-curable type urethane acrylate oligomer and paint composition containing it
Inventor: KIM JANG UK
IPC: C08G18/62
Filed: 2001-12-28
Abstract: PURPOSE: An UV curable urethane acrylate oligomer having excellent heat resistance is provided to obtain an UV curable paint composition having improved heat resistance, anti-fouling property, adhesion property, curing property and chemical resistance. CONSTITUTION: The UV curable urethane acrylate oligomer(formula 1) is obtained by reacting a polyether polyol(formula 3) optionally with a polyester polyol(formula 2) and a part of isocyanate functional groups of an isocyanate compound selected from the group consisting of aliphatic, alicyclic and aromatic isocyanates and oligomers thereof, and then carrying out an addition reaction of the remaining part of the isocyanate functional groups with a mixture of hydroxy-containing fluoro-monomer(formula 5) which has excellent heat resistance, a hydroxy-containing acrylate(formula 4) and a polyalkylene glycol macromer(formula 6). The UV curable paint composition comprises the UV curable urethane acrylate oligomer, a reactive monomer and a photo-initiator.
Patent KR-20030056934-A (KR)
Title: Apparatus and method for transmitting/ receiving information
Inventor: JUNG CHEOL YONG
IPC: G11B20/10
Filed: 2001-12-28
Abstract: PURPOSE: An apparatus and a method for transmitting and receiving information are provided to normally process video and voice streams of a broadcasting signal received through a channel changed by a source device even if the channel of the source device is directly changed. CONSTITUTION: A source device reports changed information of a receiving channel to a display device when the source device changes the receiving channel. A control unit(260) of the source device includes hardware(261), an IEEE(Institute of Electrical and Electronics Engineer) 1394 transaction layer(262), an IEC(International Electrotechnical Commission) 61883 FCP(Function Control Protocol) layer(263), and an application layer(265) in order. An event generating layer(264) is placed between the IEC 61883 FCP layer and the application layer for generating and transmitting the changed information of the receiving channel to the display device in the case that a user inputs a receiving channel change order. A control unit of the display device includes hardware, an IEEE 1394 transaction layer, an IEC 61883 FCP layer, and an application layer in order. An event processing layer is placed between the IEC 61883 FCP layer and the application layer for resetting video PID(Packet IDentification) and voice PID in the case of receiving channel change information, so that a stream processing unit processes video and voice streams according to the set video PID and voice PID.
Patent KR-20030058593-A (KR)
Title: Slurry for chemical mechanical polishing of semiconductor device and manufacturing method for metal line contact plug using the same
Inventor: AHN GI CHEOL
IPC: H01L21/304
Filed: 2001-12-31
Abstract: PURPOSE: A method for fabricating a metal interconnection contact plug using chemical mechanical polishing(CMP) slurry of a semiconductor device is provided to easily separate the metal interconnection contact plug by reducing a polishing rate of a metal layer while adding a complexing agent to metal slurry. CONSTITUTION: A bitline(103) in which a mask insulation layer pattern(105) is stacked is formed on a semiconductor substrate(101) having a predetermined underlying structure. An interlayer dielectric is formed on the resultant structure. The interlayer dielectric is etched to form a metal interconnection contact hole by using a metal interconnection contact mask as an etch mask such that the metal interconnection contact mask exposes a portion reserved for a metal interconnection contact in a cell region of the semiconductor substrate. An insulation layer is formed on the resultant structure and is blanket-etched to form an insulation layer spacer on the sidewall of the metal interconnection contact hole and the bitline. A metal layer is formed on the resultant structure. The metal layer, the interlayer dielectric and the mask insulation layer pattern are removed through a CMP process to for the metal interconnection contact plug(115) wherein the CMP process is performed by using metal slurry containing a complexing agent so that polishing selectivity of an oxide layer becomes similar to that of the metal layer.
Patent KR-20010099603-A (KR)
IPC: C10G1/10
Filed: 1999-07-28
Abstract: 염소함유 수지, 염소를 함유하는 유기 화합물 또는 이들을 함유한 폐 플라스틱을 열분해 시켜 발생되는 염소계 가스를 포함한 열분해 가스와 암모니아를 함유한 기체 또는 액체와를 접촉시켜 열분해 가스 중의 염소분을 염화 암모늄으로서 수중에서 취하고 추가로 강염기를 첨가하여 상기 염소분을 강염기 염으로 전환시키는 것이다.
Patent KR-20010072142-A (KR)
IPC: A61P25/14
Filed: 1999-07-22
Abstract: The present invention relates to new substituted 2,3,3a,4,9,9a-hexahydro-8-hydroxy-1H-benz[f]indole derivatives, processes for preparing them and their use as pharmaceutical compositions. The indole derivatives according to the invention correspond to general formula 1:
Patent KR-20010072891-A (KR)
Title: 전극재 및 그 제조방법
IPC: H01M4/583
Filed: 1999-08-23
Abstract: 고정전용량, 대전류방전특성을 가지는 전지 및 전기이중층 캐패시터용으로 사용되는 전극재는, 메소포어영역에서 세공직경 X ± α㎚ (3.0 ≤X〈10, α=1.0 : 이 세공크기분포 범위로 함) 범위의 세공용적이 세공직경 2.0 ∼ 50 ㎚ 범위의 전체 메소포어용적의 15% 이상을 차지한다.    상기 전극재는, 탄소재 또는 탄소재 전구물질에 천이금속의 적어도 1종 또는 천이금속 화합물의 적어도 1 종을 첨가한 후, 이들을 600℃ 이상의 온도에서 열처리하여 제조한다.
Patent KR-20010090597-A (KR)
IPC: H04W80/04
Filed: 1999-10-26
Abstract: 네트워크화된 장치가 별개의 네트워크화된 장치와 한개의 IP 어드레스를 공유한다. 상기 네트워크화된 장치는 수신된 IP 패킷의 포트 번호를 조사한다. 네트워크화된 장치는 상기 수신된 IP 패킷의 포트 번호가 애플리케이션에  대응하는 경우에는 상기 네트워크화된 장치 상의 애플리케이션으로 상기 IP 패킷을 라우팅한다. 상기 네트워크화된 장치는 또한 개시(origination) 어드레스로 상기 별개의 네트워크화된 장치에 할당된 IP 어드레스를 포함하는 IP 패킷을 발생시킨다. 마찬가지로, 상기 IP 어드레스는 상기 별개의 네트워크화된 장치에서 시작하는 전송된 IP 패킷을 차단하고, 개시 어드레스로 상기 별개의 네트워크화된 장치에 할당된 IP 어드레스를 포함하는 IP 패킷을 시작하므로써 상기 네트워크화된 장치 및 별개의 네트워크화된 장치 사이로 "시프트(shift)"될 수 있다.
Patent KR-20010101458-A (KR)
IPC: H04L29/08
Filed: 2000-11-13
Abstract: 무선통신장치(3)와 호스트기기(4)가 장착되고, 근거리 무선통신망(30)을 거쳐서 공중통신망(40)과 데이터를 수수한다.    무선통신장치(3)에는, 공중통신망(40)에 관한 정보인 네트워크 설정정보, 공중통신망(40) 내의 네트워크서버의 처리를 제어하기 위한 SMTP나 POP을 실장한 퍼러토콜스택(12)을 가지고 있다.    이 무선통신장치(3)는, 네트워크 설정정보에 의거하여, 근거리 무선통신망(30)을 거친 공중통신망(40)과의 접속관계를 설정하고, SMTP나 POP에 따라서 네트워크서버와 호스트기기(4)와의 사이에서의 데이터의 송수신을 제어하도록 동작한다.    이와 같이하여, 복수의 호스트기기를 취급할 때라도, 네트워크 애플리케이션을 사용할 때의 네트워크설정 등에 대한 사용자의 부담을 경감한다.
Patent KR-20010093254-A (KR)
IPC: B01J4/00
Filed: 1999-12-15
Abstract: The invention relates to a device for introducing active substances into the flushing water of a toilet pan or the like. The inventive device is made up of a holder which can be fixed to the edge of a toilet pan or the like. Said device is provided with a first chamber for receiving the active substance and a second chamber for enabling the flushing water to be flushed through. At least one connecting opening, a connecting slit or the like is provided between the two chambers so that the active substance can be introduced into the second chamber. A device is provided between the two chambers for maintaining a predetermined water level in the second chamber.
Patent KR-20010101935-A (KR)
Title: 측면 에어백
IPC: B60R21/21
Filed: 1999-12-08
Abstract: 충돌시에 차량 탑승자를 보호하기 위한 측면 충격 또는 전복 에어백(20)은 팽창시에 차량 탑승자와 차량의 인접부 사이에 위치된 팽창가능한 쿠션(22, 24)을 가진다.  팽창가능한 큐션은 제 1 및 제 2 측면(50a, 50b), 상부(26) 및 하부(28)를 가진다.  팽창가능한 튜브(30, 31)는 쿠션의 완전한 전방 팽창 전에 팽창가능한 쿠션을 완전히 직립한 길이로 연장시키기 위해 팽창가능한 쿠션에 인접하게 위치된다.
Patent KR-20010102189-A (KR)
Title: Process to separate linear alkyl 5-formylvalerate
IPC: C07C67/347
Filed: 2000-02-03
Abstract: The invention relates to a process to separate linear 5-formylvalerate compound from a crude mixture comprising 5-formylvalerate compound and 2-, 3- and/or 4-formylvalerate compound by vacuum distillation, wherein the distillation is performed in the presence of a phenolic compound with a boiling point which is at least 10 DEG C higher than the boiling point of the 5-formylvalerate at 0,1-100 kPa.
Patent KR-20020001790-A (KR)
IPC: B41F35/00
Filed: 2000-06-13
Abstract: 본 발명의 용제-함유물 제거용 점착 시이트는, 기재와 상기 기재의 적어도 한쪽 면에 형성된 점착제 층으로 구성시킴으로써, 제거 대상물에 함유되는 용제에 3분 동안 침지시 점착제 층의 상기 용제 흡수량이 20g/m 2 이상이고, 제거 대상물에 함유되는 용제에 1초 동안 침지했을 때 점착제 층의 상기 용제 흡수량이 5g/m 2 이상이고, 흡수한 후의 점착력이 1cN/25㎜ 이상인 것을 특징으로 한다.  이에 의하면, 스크린 판의 뒷편에 묻어있는 페이스트 등의 피처리체에 부착된 용제-함유물을 확실히 부착시켜서 제거할 수 있고, 손상에 의한 인쇄 불량을 경감시킬 수 있다.  또한, 각종 인쇄기의 롤류의 청소에도 적절하고, 청소 시간을 단축시킬 수 있다.
Patent KR-20020003215-A (KR)
IPC: A61P9/00
Filed: 2000-03-22
Abstract: 본 발명은 신규한 레트로바이러스 벡터를 제공하고자 한다.   특히, 본 발명은 하나 이상의 원하는 타겟 사이트에서 하나의 NOI - 또는 다수의 NOIs - 의 효과적인 발현을 할 수 있는 신규한 레트로바이러스 벡터를 제공하고자 한다.   또한 본 발명은 생체 내에서의 사용에 안전한 형상을 통합시키고, 하나 이상의 원하는 타겟 사이트에서 하나의 NOI - 또는 다수의 NOIs - 의 효과적인 발현을 제공할 수 있는 벡터 비리온의 높은 적정량을 준비하기 위한 신규한 시스템을 제공하고자 한다.
Patent KR-20010110786-A (KR)
IPC: C12N1/21
Filed: 2000-04-19
Abstract: 만노오스 이소머라아제(isomerase) 활성을 가진 단백질, 그 단백질을 코딩하는 DNA, 그 DNA를 함유하는 재조합 벡터, 그 재조합 벡터를 숙주 세포에 트랜스펙션하여 수득된 함유하는 형질전환체 및 상기 단백질, 및 그 단백질을 사용하여 프룩토오스, 만노오스, 자일로오스 및 릭소오스를 제조하는 방법을 제공한다.
Patent KR-20020079361-A (KR)
Title: 냉각 회로
IPC: F01P7/16
Filed: 2001-02-21
Abstract: 본 발명은, 적어도 하나의 열원(12), 냉각기(14), 및 바이패스 관(22)을 갖고 있으며, 상기 바이패스 관은 냉각기 유입로(18)를 냉각기 환류로(20)와 연결하고 분기점(24)에는 제어 밸브(26)가 배치되어 있고, 상기 제어 밸브의 드로틀체(58)는 작동 변수들 및 환경 변수들에 따라 적어도 하나의 제어 유닛(40, 42)에 의해 전기적으로 제어되고 냉각제 흐름을 냉각기 유입로(18)와 바이패스 관(22)으로 분할하는 냉각 회로(10)에 관한 것이다. 
     제어 유닛(40, 42)은 제어 밸브(26)의 특성곡선에 따라, 냉각기 체적 유량 대 제어 밸브(26)에서의 전체 냉각제 유량의 비를 조절하는 드로틀체(58)의 위치조절을 위해 설정치(50)를 구하고, 그런데 그 비는  바이패스 관(22) 출구(36)에서의 온도에서 열원(12) 입구에서의 설정 온도를 감산한 차이와 바이패스 관(22) 출구(36)에서의 온도에서 냉각기(14) 출구에서의 온도를 감산한 차이 사이의 비와 같고, 거기에 있어 냉각기 체적 유량 대 전체 냉각제 유량의 비는, 부(負)의 값일 때에는 영으로 설정되고, 1을 초과하는 값일 때에는 1로 제한될 것이 추천되어 있다.
Patent KR-20020032429-A (KR)
IPC: F02D45/00
Filed: 2001-04-05
Abstract: 본 발명은 측정 변수를 검사할 경우에 에러를 검출하고 교정하기 위한 방법에 관한 것이며, 검사하고자 하는 변수는 평가 장치, 즉 컴퓨터에서 개연성에 대해 조사되고, 개연성이 없는 것으로 검출되면 에러가 추론된다.  또 다른 검사에서 에러가 더 이상 존재하지 않는 것이 나타나면, 에러는 교정된다.  에러는, 검사하고자 하는 변수의, 에러가 발생된 범위가 곧 실제 에러가 더 이상 발생되지 않는 범위인 조건 하에서 교정된다.  더 확대된 방법에서는, 서로 다른 에러 사이가 부가적으로 구별되고, 에러는 동일한 에러가 있을 때에만 교정될 수 있다.
Patent KR-20020020732-A (KR)
IPC: B60R25/24
Filed: 2000-05-05
Abstract: ID 시스템의 두개 장치 간 거리 결정방법에 있어서, 상기 장치들 중 제1 장치는 소정의 진폭 프로파일과 소정의 지속시간을 가진 진동 곡선에 의해 형성되며, 그 진폭이 상기 진동 곡선의 종점을 향하여 연속적으로 감소하는 전자기 신호를 발생시킨다. 신호가 수신되고, 소정의 진폭 문턱치를 초과하는 수신신호 일부의 지속시간이 측정된다. 상기 장치간의 거리는 이 측정된 지속시간으로부터 결정된다.
Patent KR-20020015710-A (KR)
Title: Method for Producing Hexanediol
IPC: C07B61/00
Filed: 2000-06-21
Abstract: A process for preparing 1,6-hexanediol from a carboxylic acid mixture comprising adipic acid, 6-hydroxycaproic acid and small amounts of 1,4-cyclohexanediols which is obtained as by-product in the oxidation of cyclohexane to cyclohexanone/cyclohexanol after water extraction of the reaction mixture followed by extraction with aqueous sodium hydroxide solution, by esterification of the acids and hydrogenation comprisesa) liberating the carboxylic acids from the alkaline extract by addition of a mineral acid,b) fractionating the organic phase comprising carboxylic acids to give a distillate comprising the low molecular weight monocarboxylic acids and a residue comprising adipic acid and 6-hydroxycaproic acid,c) reacting the monocarboxylic an dicarboxylic acids present in the aqueous dicarboxylic acid mixture with a low molecular weight alcohol to give the corresponding carboxylic esters,d) freeing the esterification mixture obtained of excess alcohol and low boilers in a first distillation step,e) fractionating the bottom product in a second distillation step to give an ester fraction essentially free of 1,4-cyclohexanediols and a fraction comprising at least the major part of the 1,4-cyclohexanediols,f) catalytically hydrogenating the ester fraction which is essentially free of 1,4-cyclohexanediols andg) isolating 1,6-hexanediol from the hydrogenation product in a manner known per se in a final distillation step.
Patent KR-20030064057-A (KR)
Title: halogen-substituted ESCAP and t-BOC type of DUV resist compound
Inventor: AHN DEOK GEUN
IPC: G03F7/004
Filed: 2002-01-25
Abstract: PURPOSE: A halogenated ESCAP-t-BOC-combined compound for deep ultraviolet (DUV) resist and a photolithography method using the compound are provided, to minimize the loss of resist, to enable an etching process to be performed easily and to improve the CD uniformity. CONSTITUTION: The compound comprises a halogenated ESCAP part and a t-BOC part and is represented by the formula, wherein n1 is an integer of 0-10; n2 is an integer of 0-2; and R' is an aromatic group or an aliphatic group. Preferably R' is -(CH2)n3-CX3, -(CH2)n3-CH(CX3)2 or -(CH2)n2-C(CX3)3, wherein n3 is an integer of 0-10; and X is at least one selected from the group consisting of F, Cl and Br. Preferably the pattern of semiconductor is prepared by using the resist containing the compound of the formula, and can be developed by using only deionized water without using a basic developer.