baber/WOPTO huggingface dataset:
Patent JP-H05303096-A (JP)
Title: Production of liquid crystal display device
Inventor: KURAMOCHI OSAMU
IPC: G02F1/1337
Filed: 1992-04-27
Abstract: PURPOSE:To enable the formation of uniform oriented films on electrodes having level differences by subjecting the level differences between the electrodes to an operation to fill the level differences to smooth the surfaces thereof, then forming the oriented films. CONSTITUTION:The transparent conductive electrodes 3, 4 consisting of, for example, ITO(indium tin oxide) are formed on the respective one main surface 1a, 2a side of a first substrate 1 and second substrate 2 which are glass substrates. The oriented films 5, 6 are respectively so formed as to cover these ITO electrodes 3, 4. Printing and baking of PI (polyimide) are first executed in the parts of the level differences 6a formed by the ITO patterns to bury the level differences 6a. After the level differences 6 are annihilated in such a manner, the printing and baking of the PI are executed again to form the oriented films 5, 6 having no level differences on the ITO electrodes 3, 4. As a result, the oriented films 5, 6 of the PI having a uniform film thickness are formed on the ITO electrodes 3, 4 having the level differences 6a and, therefore, the electrostatic breakdown thereof is prevented.
Patent JP-S5631458-A (JP)
Title: Flotation of sulfide ore containing pbs
Inventor: SHIYOUJI KISHIO
IPC: C22B13/00
Filed: 1979-08-24
Abstract: PURPOSE: To recover refined lead ore as settled ore effectively by a method in which sulfide ores containing PbS are added with sulfuric acid for selectively fulfating PbS present and then treated by the conventional flotation method.  
     CONSTITUTION: Middle ore and H 2 SO 4  are put in the reaction tank 1 for selectively sulfating Pb components present in the middle ore, and the resultant pulp is properly treated, cooled, neutralized, and then subjected to a floatation process using the flotation apparatus 2, during which process the sulfides of Cu, Zn, Fe, etc., are recovered floated ores, and the components containing sulfated Pb are recovered as settled ores which are, however, sent in the form of pulp to the stirring tank 6 where it is mixed with pulp drawn out of the bottom of the adsorption tower 5 with stirring. H 2 S generated in the reaction tank 1 is sent to the sulfiding tower 3 to bring it into contact with the pulp, and gas in the sulfiding tower 3 is sent to the absorption tower 5 where H 2 S is absorbed and removed and then discharged to the outside. The pulp on the bottom of the sulfiding tower 3 is sent to a thickener where it is dehydrated and to form refined lead ore. 
     COPYRIGHT: (C)1981,JPO&Japio
Patent JP-2000298259-A (JP)
Title: Drive method for liquid crystal display device
Inventor: EGUCHI TOSHIYASU
IPC: G02F1/133
Filed: 1999-04-15
Abstract: PROBLEM TO BE SOLVED: To provide a drive method for a liquid crystal display device having a short response time for rising, satisfactory gradations, and a high contrast ratio, by applying an image signal voltage after applying an exciting signal voltage during a single frame period. SOLUTION: A scanning signal voltage is applied to a gate of a MOS-type transistor connected with scanning signal wiring, to turn the transistor on. After that, an exciting signal voltage Va is applied to a source and is applied to a liquid crystal cell via this source. Thus, with the liquid crystal layer in the liquid crystal cell excited state, the scanning signal voltage is applied to the gate again, to turn the MOS transistor on, and after that an image signal voltage Vb is applied to the liquid crystal cell via the source. In such a manner, since the rising response time τr of liquid crystal molecules can be made extremely short, it is possible to extend the time in which the liquid crystal layer has reached a sufficient degree of optical modulation, and to display accurate gradations corresponding to the degree of modulation of the liquid crystal layer.
Patent JP-S63274401-A (JP)
Title: Evaporation apparatus
Inventor: NODA TAKEKAZU
IPC: B01D3/00
Filed: 1987-04-30
Abstract: PURPOSE:To assure the prevention of entrainment and recover high quality solvent in an evaporation apparatus for solvent recovery by disposing detachably therein a plurality of baffle plates which collect the liquid droplets entrained in the evaporated vapor between the liquid surface in a tank and a vapor outlet. CONSTITUTION:A condensing element 50 having a vapor inlet 40 which draws the boiling vapor is connected with an evaporation apparatus possessing a heating unit 20 in the interior of a tank 10 with a vapor outlet 11. This condensing element 50 is provided with a tank 60 which receives the condensed recovery solvent and a pump 80 which supplies cooling water from a cooling water reservoir 70. Two stainless baffle plates 30a and 30b which close the opening of the tank 10 are disposed detachably by means of supporting legs 32, with the lower plate 30b parallel to waste solvent surface and the upper plate 30a inclined thereto at an approximately 10 deg.. The cover plate 30a and 30b have a plurality of openings 31a and 31b, respectively. The opening 31a in the upper plate 30a and the openings 31b in the lower plate 30b, which are so arranged as not to register with one another in the vertical direction, permits a thorough removal of the droplets.
Patent JP-H01278089-A (JP)
Title: Electronic circuit device
Inventor: TSUNEHIRO KIMIHARU
IPC: H05K1/18
Filed: 1988-04-28
Abstract: PURPOSE:To prevent a semiconductor device from being dislocated and shifted and to make a thickness of a whole electronic circuit device thin by housing the semiconductor device inside a dislocation-preventing hole in a wiring substrate. CONSTITUTION:This is constituted of the following: a printed-wiring substrate 11 where two or more wiring parts 11a and wiring parts 11b have been formed individually on the surface and rear of an insulating main body 11c; a semiconductor device 12 having two or more lead parts 14. A dislocation-preventing hole 16 corresponding to an outer periphery shape of the semiconductor device 12 is made in a mounting region of the semiconductor device 12 in the printed-wiring substrate 11; in a state that the semiconductor device 12 has been housed in the dislocation-preventing hole 16, the two or more lead parts 14 are constituted in such a way that they face the individual prescribed wiring parts 11a, 11b. By this setup, even when the semiconductor device 12 is about to be displaced, the semiconductor device 12 is caught at an inner periphery face of the dislocation-preventing hole 16 and its dislocation is prevented. In addition, since the semiconductor device 12 is housed inside the dislocation- preventing hole 16, a thickness size of a whole device is reduced and a high-density mounting operation becomes possible.
Patent JP-2000307408-A (JP)
Title: Semiconductor device
Inventor: OKI TETSUO
IPC: H01L21/8234
Filed: 1999-04-15
Abstract: PROBLEM TO BE SOLVED: To adjust the output size without altering a mask. SOLUTION: An output buffer circuit which has 1st and 2nd MOS transistors(TR) 6 and 7 connected in series with each other has, for example, the 2nd MOS TR 7 and a gate connected together in parallel and is equipped with a 3rd MOS TR 10 which has the same conductivity type with the 2nd MOS TR 7 and is turned on and off with a switching signal and a 4th MOS TR 11 which is connected in common to the drain D2 of the 3rd MOS TR 10, has its drain D1 connected to an output (load 9), and is further turned on and off with a switching signal inputted to its gate; and the output TR size of the 2nd MOS TR 10 is varied according to the on/off state of the 4th MOS TR 11.
Patent JP-H10287476-A (JP)
Title: Surface treatment of basic refractory raw material and production of basic prepared unshape refractories excellent in slaking resistance
Inventor: UCHINOKURA KATSUMI
IPC: C04B35/66
Filed: 1997-04-11
Abstract: PROBLEM TO BE SOLVED: To provide a method for the surface treatment of a basic refractory raw material capable of suppressing slaking reaction without causing the deterioration of its performance and a method for producing a basic prepared unshaped refractories. SOLUTION: The surface of a basic refractory raw material containing at least one selected from between MgO and CaO is coated with a silane coupling agent dissolved in an organic solvent and cured for 1 hr or more at a temperature of 30 deg.C or less, and then the treated basic refractory raw material is dried at a temperature of 100-200 deg.C for 1 hr or more to improve the slaking resistance of the basic refractory raw material. Further, to the surface-treated basic refractory raw material, a binder and a surfactant, whose amount is 0.2-5.0 by outer pts.wt. based on 100 pts.wt. of the kneaded material, are added and the mixture is kneaded after adding an appropriate amount of water. Thus, a basic prepared unshaped refractories, whose workability is retained, is obtained.
Patent JP-S5735188-A (JP)
Title: Capacity controlled compressor
Inventor: SERIZAWA YUKIO
IPC: F04C18/356
Filed: 1980-08-08
Abstract: PURPOSE: To have a large control ratio by shifting the valve body directly with a solenoid and by setting the angular position of a lateral hole, which is provided in the cylinder and in which the valve seat including valve element is fitted by pressure, larger than the angle at the completion of compression during rated operation.  
     CONSTITUTION: Behind the valve element 11 is installed a compressive coil spring 13 to press the valve element 11 against the valve seat 19 lying in front, while a solenoid 17 is not energized, i.e. during rated operation. During capacity-controlled operation, on the other hand, the solenoid 17 is energized to shift the valve element 11 bakcward. Under this situation, the gas will pass through a small hole 18 in the valve element 11 to leak to the low pressure side through a coupler pipe 20. If the minimum load on the compressive coil spring 13 is, during rated operation, set over the return force due to the pressure in the cylinder 4 to move the valve element 11 back, the installation angle α of the lateral hole 10 can be determined freely. That is to say, the ratio of the capacity at the time of rated operation to that at the time of capacity-controlled operation can be raised because the α can be set larger than the angle θ at the completion of compression of rated operation. 
     COPYRIGHT: (C)1982,JPO&Japio
Patent JP-S62266014-A (JP)
Inventor: MIWA YOSHIYUKI
IPC: A47J27/00
Filed: 1986-05-12
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H04312293-A (JP)
Title: Variable angle support device for camera
Inventor: FUKUMORI KEITA
IPC: F16M11/12
Filed: 1991-04-12
Abstract: PURPOSE:To provide the variable angle support device for a camera, which reduces the burden of a motor, and thereby enhance durability as well as to make the responsiveness of the whole of a device quicker. CONSTITUTION:A device is provided with a pedestal support shaft 5 at least at one end section of which a camera pedestal 4 is fixed, and with a pedestal hold member 3 rotatably holding the pedestal support shaft 5. And the device is equipped with a first motor 1 which is connected to the pedestal hold member 3, and concurrently rotates the pedestal hold member 3 to the direction that the member runs straight ahead to the pedestal support shaft 5, and is also equipped with a second motor 2 the rotating shaft 26 of which is coaxial with the rotating shaft 1A of the first motor, and also energizes the pedestal support shaft 5 in torque. In this case, the first and the second motor are fixed onto a base section 6.
Patent JP-H045038-A (JP)
Title: Preparation of vibration-damping composite material
Inventor: ISONO MASAAKI
IPC: B21C37/00
Filed: 1990-04-24
Abstract: PURPOSE:To prepare a vibration-damping composite material with excellent processability, spring characteristics and vibration-damping properties with a low cost by pinching a polymer resin layer between two steel alloy sheets obtd. by performing a specified cold processing on a specified steel alloy raw material and annealing them at a specified condition. CONSTITUTION:A steel alloy sheet is obtd. by performing a cold processing of a steel alloy raw material contg. 3-9wt.% Sn and 0.03-0.35wt.% P and the remaining consisting of Fe and unavoidable impurities with a processing ratio of 3-90%. A vibration-damping composite material is prepd. by pinching a polymer resin layer between two steel alloy sheets and annealing them by heating at 180-300 deg.C for 10sec-120min. The annealing treatment not only improves furthermore spring characteristics of the steel alloy sheets but provides excellent adhesive properties between the steel alloy sheets and the polymer resin layer. Therefore, processability of the vibration-damping composite material is improved and as the manufacturing process can be shortened by performing simultaneously annealing process of the steel alloy sheets and adhering process between the steel alloy sheets and the polymer resin layer, the manufacturing cost for the vibration-damping material can be reduced.
Patent JP-H04315023-A (JP)
Title: Method for detecting substance such as liquid and gas
Inventor: MATSUDA YOSHIKAZU
IPC: G01M3/38
Filed: 1991-04-12
Abstract: PURPOSE:To obtain a method for detecting a substance with a lower refractive index than that of crystal by an eccentricity core fiber of a crystal material. CONSTITUTION:An amount of phase shift of a fiber 1 for detection where a propagation constant of a light wave to be guided when the substance to be detected such as liquid or gas changes and an amount of phase shift of a fiber for reference 2 where a propagation constant of light wave to be guided even if the substance to be detected contacts are detected and the substance to be detected such as liquid and gas is detected based on a change in amount of phase shift when the fiber for detection 1 contacts the substance to be detected.
Patent JP-H11239416-A (JP)
Title: Lightweight culture medium and mixed culture medium using the same
Inventor: HARADA NORIAKI
IPC: C05F5/00
Filed: 1998-04-06
Abstract: PROBLEM TO BE SOLVED: To obtain a lightweight culture medium of low water content and reduced water repellency by including coconut shell flour having an intrinsic density in a specific range. SOLUTION: This lightweight culture medium contains coconut shell flour whose intrinsic density d1 is 1.5 g/cm<3> <=d1<=3.0 g/cm<3> , determined by a soil three-phase meter. Preferably, the medium has an overall intrinsic density d2 of 1.5 g/cm<3> <=d2<=3.5 g/cm<3> determined by the same meter, is produced by a method which can apply a shear and/or compressive stresses to the medium, and contains a fertilizer and/or carbide. Also preferably the coconut shell flour is coir dust.
Patent JP-S5732864-A (JP)
Title: Method for foreseeing breakout
Inventor: TSUJITA SUSUMU
IPC: B22D11/16
Filed: 1980-08-06
Abstract: PURPOSE: To surely foresee breakout by directly detecting the change in the contact resistance between a mold and an ingot from the load fluctuations of the mold.  
     CONSTITUTION: Respectively half the own weight of a mold 1 including the weight of a support frame 5 and the drawing force of an ingot and the tightening force of bolts 11 are exerted upon and left load cells 6. Hence, if the outputs of two cells 6 are inputted to a dynamic strain gage 8 and the sum thereof is detected, the total load R of a mold 1 exerted upon an oscillation frame 7 is measured. If the difference thereof is taken out, the unbalance between the right and left loads R of the mold is detected. Since the rate of fluctuation ΔR=R-R 0  of the mold load R with respect to the steady value R 0  is determined in accordance with burn on and the degree of cracking, the rates of fluctuations ΔR exceeding the constant upper and lower limits provided to the steady value R 0  are compared in an alarm device 10 as have the possibility for causing breakout, whereby they are selected and alarmed. 
     COPYRIGHT: (C)1982,JPO&Japio
Patent JP-H11343570-A (JP)
Title: Material depositing method for material depositing device
Inventor: EDWARD C CORNEY III
IPC: C23C14/34
Filed: 1999-04-15
Abstract: PROBLEM TO BE SOLVED: To obtain a method for uniformly depositing a thin film on a substrate and to obtain a device therefor. SOLUTION: This invention contains a step in which a wafer 100 is placed on a wafer check 110 and a step in which liq. nitrogen is fed through the check, and the wafer and the wafer check are cooled to about <=+20 deg.C. The coating of a thin film is executed while the temps. of the wafer and the wafer check are held to about <=+20 deg.C by using the sputtering deposition of a source metal 130 to the cooled wafer. In the preferable executing form, liq. nitrogen is used as a supercooling soln., and copper is used as the material to de deposited by sputtering. More preferably, the wafer and the wafer check are cooled to about <=-100 deg.C. The device has a physical vapor depositing chamber, a wafer check, a source of the material to be deposited, a wafer and a cooling line passing through the wafer check and carrying a cooling soln. to the check.
Patent JP-S63274216-A (JP)
Title: Method for multiplication by double integral
Inventor: UEHARA SHIGEO
IPC: H03M1/52
Filed: 1987-05-01
Abstract: PURPOSE:To improve the accuracy and to simplify the constitution by using a double integral type A/D converter according to the dual ramp principle so as to convert a 1st unknown time into a time proportional to the unknown voltage, integrating a 2nd unknown voltage by a proportional time only and obtaining a digital quantity corresponding to the result of multiplication of the two unknown voltages from the double integral type A/D converter. CONSTITUTION:An integration device consists of a resistor(R), a capacitor(C) and an operational amplifier (QA1) and a comparator QA2 detects a zero level. A switch SW1 is turned on for a prescribed period T to integrate the 1st unknown voltage VX, and a reference power supply VR of opposite polarity to that of the unknown voltage VX is integrated till the zero level of the integration device (the time during the integration of -VR is T1). Moreover, the 2nd unknown voltage VY is integrated during the time T1 and the reference voltage VR opposite in polarity to that of the unknown voltage VY is integrated till the output of the integration device reaches the zero level after that (the time when the VR is integrated is T2). The time T2 is expressed in equation T2=-(T/VR<2>)VX.VY. Since the values VR, T are constant in the equation, it means that the result of multiplication of the unknown voltages VX, VY is converted into a time, and the digital value is obtained by counting the time by means of a counter.
Patent JP-H11291311-A (JP)
Title: Mold clamping device of injection molding machine
Inventor: FUJIKAWA MISAO
IPC: B29C45/82
Filed: 1998-04-03
Abstract: PROBLEM TO BE SOLVED: To reduce the friction resistance in mold opening/closing operation, to enhance the straightness of mold opening/closing motion, to apply mold clamping force to the axis of a mold clamping device without deviating the same with respect to the axis and to easily adjust a mold thickness in the mold clamping apparatus wherein mold opening/closing operation is performed electromotively by a ball screw and mold clamping operation is hydraulically performed. SOLUTION: A mold clamping shaft 3 having annular projected parts 31a having a square cross section or the like formed thereto at a constant pitch is provided on the axis of a movable platen 4 and the half-split device 20 having the half-split nut engaged and disengaged with respect to the shaft 31 is coaxially attached to the mold clamping ram 51 built in a support platen 3. A cylindrical member positionally adjustable so as to be capable of advancing and retreating is built in the support platen 3 to prescribe the retreat position of the mold clamping ram 51 to adjust a mold thickness. The rear end of the mold clamping shaft 31 is lubricated in an oil bath on the inner cylindrical surface of a rear surface support member 40 to slide.
Patent JP-H04312881-A (JP)
Title: Stamp pad
Inventor: UMEZAWA KEIJI
IPC: D06M13/144
Filed: 1991-04-11
Abstract: PURPOSE:To improve durability by enabling high quality printing to be performed by a method wherein knitting fabrics of synthetic fiber filament of one denier or under in single yarn fineness is used for a board surface cloth. CONSTITUTION:After knitting by using composite fiber knitting fabrics consisting of each portion having a radial form and a form supplementing it, fine size filaments are formed by fibrilation. Density in knitting product is 64 warps/inch, 62 wefts/inch and 81900 single yarn fibers per 1 inch. A board surface cloth 4 is formed by cutting in 6X9.5cm, which is laminated above wool felt 2 to construct a stamp pad. Since speckling of ink in sealing is almost gone and discharge of the ink can be also controlled to a suitable quantity, a clear sealed impression can be obtained. Besides, clogging in a seal is decreased by restraining fuzzing from felt, and durability of the baord surface cloth itself can be improved.
Patent JP-S61267071-A (JP)
Title: Developing device
Inventor: SUGAWARA YUKIO
IPC: G03G15/09
Filed: 1985-05-21
Abstract: PURPOSE:To supply toner into a casing uniformly at any time by providing a mechanism which supplies toner into the casing when the toner concn. of a developer decreases and a mechanism which scoops up part of a developer in the casing and supplies it into a toner conveyance path. CONSTITUTION:When the toner concn. of the developer D decreases below a constant value as a development stroke is repeated, that is detected by a toner concn. detecting mechanism 10 and the scooping-up mechanism 22 and a screw 13 for toner conveyance are driven. The scooping-up mechanism 22 is driven to attract part of the developer D which is scraped off a developing roller 3 and slides down on a recovery plate 9 to the outer periphery of a sleeve 25, and this developer D is supplied from a guide plate 27 into the toner conveyance path 11 through a lead-in opening by a constant amount at every time. Toner is conveyed successively into the toner conveyance path 11 through the screw 13 and mixed with the developer D, and the mixture falls in the casing 2 from each supply hole 12, thus supplying toner to the developer D in the casing 2.
Patent JP-S58224285-A (JP)
Inventor: TAKEZAWA YOSHIO
IPC: F25D23/04
Filed: 1982-06-23
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0848521-A (JP)
Title: Dielectric composition for high frequency
Inventor: KIN KEIRIYUU
IPC: C01G25/00
Filed: 1995-05-02
Abstract: PURPOSE: To give an excellent dielectric property and a Q coefficient even if burning is carried at a low temperature.  
     CONSTITUTION: The objective composition has a base composition (Zr,Sn)TiO 4  system consisting of 37.6≤ZrO 2 ≤47.2, 14.5<SnO 2 <24.8, 37.6≤TiO 2 ≤38.3 in 100 total weight of ZrO 2 , SnO 2  and TiO 2  and additionally contains 0.3-1.0 wt.% La 2 O 3 , 0.5-2.0 wt.% NiO and 0.3-2.0 wt.% B 2 O 3  or 0.3-2.0 wt.% P 2 O 5  for the total weight of the base composition. 
     COPYRIGHT: (C)1996,JPO