Patent SG-11201908444R-A (SG)
Title: Apparatus for and method of manufacturing an article using photolithography and a photoresist
Inventor: BUBENDORFER ANDREA JOCELYN
IPC: H01L21/67
Filed: 2018-03-15
Abstract: Cartridgelid Figure Single Expose Cartridge put 1.9 \ME allinainfa MMVESEganitigiMft, 25 Digital Mirror 1 —.N s\ Dqvice Developer Tank 15 Ligbt Source 23 27 Collimating Lens 11 Substrate \ Pholorestat ,tom \\%, \ \ \‘‘,. \‘‘,\‘M, (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 20 September 2018 (20.09.2018) WIP0 I PCT 0111111010 0111 °nolo Oil IIIII mo IH mom° oimIE (10) International Publication Number WO 2018/169416 Al (51) International Patent Classification: GO3F 7/20 (2006.01) H01L 21/67 (2006.01) (21) International Application Number: PCT/NZ2018/050030 (22) International Filing Date: 15 March 2018 (15.03.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 730112 15 March 2017 (15.03.2017) NZ (71) Applicant: CALLAGHAN INNOVATION [NZ/NZ]; Gracefield Research Centre, 69 Gracefield Road, Lower Hutt, 5010 (NZ). (72) Inventors: BUBENDORFER, Andrea Jocelyn; Grace- field Research Centre, 69 Gracefield Road, Lower Hutt, 5010 (NZ). BEST, Andrew David; Gracefield Research Centre, 69 Gracefield Road, Lower Hutt, 5010 (NZ). (74) Agent: BALDWINS INTELLECTUAL PROPERTY; PO BOX 852, Wellington, 6011 (NZ). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, (54) Title: APPARATUS FOR AND METHOD OF MANUFACTURING AN ARTICLE USING PHOTOLITHOGRAPHY AND A = PHOTORESIST (57) : An apparatus configured to manufacture an article using a photoresist comprising photoresist material, the apparatus comprising: a. a housing configured to receive the photoresist and locate the photoresist in at least one operational position in the housing; b. an exposure system configured to emit radiation which is incident on the photoresist material when in the operational position, to induce a change in one or more properties of the area(s) of the photoresist material exposed to the radiation; and c. a heater configured to heat the photoresist material to cure the photoresist material to the substrate when the photoresist is in the operational position, or is in a different operational position in the housing; wherein d. the housing is radiation excluding such that external radiation cannot enter the housing at least to the extent that the external radiation is sufficiently excluded from the housing to prevent, or minimise polymerisation of the photoresist material, and further wherein the housing is a clean housing configured to prevent unwanted contamination from entering the housing, at least when the photoresist is located in the or each operational position. The apparatus may be a floor standing or desktop apparatus, for producing single or multi- layered articles. [Continued on next page] WO 2018/169416 Al MIDEDIMOMOIDEIREEMOMOHINEDIVOIROMEEN TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: with international search report (Art. 21(3)) in black and white; the international application as filed contained color or greyscale and is available for download from PATENTSCOPE