baber/WOPTO huggingface dataset:
Patent JP-S59173576-A (JP)
Title: Swash-plate type compressor
Inventor: SOEDA JIYUNICHI
IPC: F04B27/08
Filed: 1983-03-22
Abstract: PURPOSE:To obtain a swash-plate compressor which does not necessitate forming an intake chamber and a discharge chamber on the end plate of a casing, by installing an intake valve in a piston and a discharge valve in a cylinder. CONSTITUTION:When a piston 26 shifts in the direction of departure from an end plate 13, coolant is introduced into the chamber formed between the edge surface of the end plate 13 in a cylinder 17 and the head part of the piston 26 through an intake valve passage 29 and an intake valve body 30 which are installed on the piston 26. Further, when the piston 26 approaches the end plate 13, the intake valve body 30 is closed, and a discharge valve body 24 is opened, and the coolant is compressed by the piston 26 and discharged into a communication passage 19 through a discharge valve passage 23 and the discharge valve body 24. Then, the piston 26 proceeds to the intake cycle, and the discharge valve body 24 is closed, and the intake valve body is opened to inhale coolant.
Patent JP-S63215535-A (JP)
Title: Method for repairing wire flaw of automotive windshield
Inventor: NAKAJIMA TAKAYUKI
IPC: B24B37/00
Filed: 1987-02-28
Abstract: PURPOSE:To enable efficient repair of wiper flaws of automotive windshield, by using a cerium oxide-containing polishing liquid and polyurethane pad with a lightly adoptable polishing tool even in normal automotive maintenance factories. CONSTITUTION:Repair of wiper flaws of automotive windshield by the following process. That is (1) a polishing step of using a polishing liquid obtained by blending 3-20% cerium oxide, 0.5-10% ethylene glycol and a surfactant with water and polisher consisting of a polyurethane and having open cells and (2) a cleaning step following the polishing step. The cerium oxide is preferably fired at about 900 deg.C, since the polishing speed is the maximum.
Patent JP-S63212474-A (JP)
Title: Polisher for repairing front glass of automobile
Inventor: NAKAJIMA TAKAYUKI
IPC: B24D13/14
Filed: 1987-02-28
Abstract: PURPOSE:To adapt a disc pad well onto the curved face of front glass and to repair the front glass efficiently, by applying the disc pad made of polyurethane foam material containing continuous foam onto a base board where a fixing shaft to be mounted/dismounted onto/from the shaft end of a drive motor is projecting from the center of rear face. CONSTITUTION:A baseboard 11 is set through a fixing shaft 11a to the shaft end of a drive motor M, then a disc pad 12 is impregnated with proper polishing liquid containing cerium oxide. When the disc pad 12 is pushed against the surface of front glass of an automobile, it is adapted well to the curved face of the front glass because it is made of resilient polyurethane foam material having continuous porosity, and deforms while copying the profile of front glass. Under this condition, a drive motor M is driven to rotate the disc pad 12 so as to erase wiping scratch existing on the surface of front glass by cerium oxide contained in polishing liquid which is impregnated abundantly in the polyurethane foam material thus repairing the front glass.
Patent JP-H08222982-A (JP)
Title: Resonator and filter using it
Inventor: OKAMURA NAOTAKE
IPC: H01P1/20
Filed: 1995-02-10
Abstract: PURPOSE: To obtain a small sized resonator whose resonance characteristic is adjusted and a filter in which a signal loss in a pass band is small and an attenuation at the outside of the pass band is high. CONSTITUTION: The resonator includes a block 12 having dielectric layers 14, 18, 20, 24, 26, 30, 34, 38, 42. A ground electrode 16 and a pattern electrode 22 are formed respectively on the dielectric layers 14, 20. An input output capacitor electrode 28 is formed on the dielectric layer 26. Capacitor electrodes 32, 36, 40 are formed on the dielectric layers 30, 34, 38. An external electrode is formed to a side face of the block 12, the ground electrode 16, the pattern electrode 22 and the capacitor electrodes 32, 40 are connected. Furthermore, the pattern electrode 22 and the capacitor electrode 36 are connected. Two each of the pattern electrodes 22, input output capacitor electrodes 28, and capacitor electrodes 32, 36, 40 are formed on the dielectric layer and the two resonators obtained are coupled to form a filter.  In this case, the capacitor electrodes adjacent to each other on one and same dielectric layer are connected to the pattern electrode and the ground electrode in an opposite direction.
Patent JP-H10239627-A (JP)
Title: Optical scanner
Inventor: HIJI NAOKI
IPC: G02B5/32
Filed: 1997-02-28
Abstract: PROBLEM TO BE SOLVED: To provide an optical scanner which performs free optical scanning, like scanning while drawing a free locus in the space, scanning discretely from one place to another, or the change of the scanning sequence. SOLUTION: First to eleventh reference light beams 102 are used to successively record first to eleventh write light beams 101, which form condensed light spots P1 to P11 on a line 90 respectively, in a hologram medium one over another. With respect to reference light beams 102, an oscillating beam of 488nm from an Ar<+> laser as a light source 41 is made incident on an acousto-optical deflector 3, and light deflected in this deflector 3 by diffraction is led to the hologram medium 1 by lenses 13 and 12, and they are obtained by stepwise changing the modulation frequency of the acousto-optical deflector 3.  In the state that 11 holograms are recorded in the hologram medium 1, only reference light 102 is made incident on the hologram medium 1 without incidence of write light 101, and the modulation frequency of the acousto-optical deflector 3 is changed to reproduce condensed light spots P1 to P11 in order or an arbitrary order, thus performing optical scanning.
Patent JP-H04263868-A (JP)
Title: In-trachea tube and its manufacture
Inventor: KOZAI TADASHI
IPC: A61M16/04
Filed: 1991-02-18
Abstract: PURPOSE:To offer the in-trachea tube for suppressing surely transmission of laughing gas, and having sufficient pressure resistance and strength as a cuff, and its manufacturing method. CONSTITUTION:The objective in-trachea tube 1 is the in-trachea tube having a tube main body 2 having a lumen 3 in the inside, a cuff 6 freely expandable/ contractable provided so as to surround annularly a part of the outside peripheral surface in the vicinity of the tip part of the tube main body concerned 2, and an inflation lumen 5 of the cuff 6 which communicates with the inside of the cuff concerned, and also, is provided in parallel to the lumen 3 of the tube main body, and the cuff 6 is formed by a partial bridging object of a resin difficult in penetration of laughing gas.
Patent JP-H01218808-A (JP)
Title: Manufacture of optical element press molding die
Inventor: UMETANI MAKOTO
IPC: B29L11/00
Filed: 1988-02-29
Abstract: PURPOSE:To manufacture press molding dies easily in mass production by applying photosensitive resin on the surface of a press molding die, irradiating ultraviolet rays from the rear face of a matrix until resin is cured, removing the matrix and uniformly anisotropic etching from the surface of a resin layer. CONSTITUTION:Ultraviolet curing bisazide compound resin 21 is applied on the surface of a spherical press molding die, and ultraviolet rays are irradiated from the rear face of a matrix 22 until said coating material is cured, and after resin is cured, the matrix 22 is removed and a non-spherical resin is formed on the surface of the unprocessed spherical molding die. Said molding die is set in a dry etching device, and anisotropic etching is carried out uniformly on the surface of the cured resin layer, and a mold is released after the resin layer is etched. When the etching speed of the resin layer and that of protective layer 12 are same, the surface shape of the protective film surface shape after etching is same as the surface shape of the resin layer, while when the etching speed of the resin is different from that of the protective film 12, said shape takes the surface shape corresponding to the etching speed ratio, and the molds of same shape can be manufactured in mass production with good reproducibility.
Patent JP-H05218213-A (JP)
Title: Semiconductor device and manufacture thereof
Inventor: KAWASAKI KAZUE
IPC: H01L23/522
Filed: 1992-01-31
Abstract: PURPOSE:To enable a long distance wiring to be made while increasing the yield by a method wherein a reinforcement rib is formed integrally with a bridge body so as to enhance the rigidity in the flexure direction. CONSTITUTION:The whole surface of a substrate 1 with two electrodes formed thereon is coated with a bridge girder resist 6 to expose the parts 7 to be bridge girder parts 4a. The resist between said parts 7 as the parts 12 whereon a reinforcement rib is to be formed is exposed in specific depth and width. Next, the resist 6 is developed to remove the part 7B to be bridge girder part 4a of the air bridge as well as the part 12 to be the reinforcement rib to form a power supply layer 3. Next, the whole surface is coated with another resist 8 to expose the part 9 to be the bridge body 5b. Next, the resist 8 is developed to remove the part 9 to mold an air bridge 5. Next, the power supply layer 3 is fed with current to perform the Au plating step. Finally, the bridge body resist 8, etc., is removed to complete the air bridge 5.
Patent JP-H02224357-A (JP)
Title: Manufacture of semiconductor device
Inventor: NAKATANI MITSUNORI
IPC: H01L21/762
Filed: 1989-02-27
Abstract: PURPOSE:Not only to remarkably lessen processes in number but also to improve a resist pattern in dimensional accuracy by a method wherein a photosensitive resin is provided to a step formed through etching in such a state tat both its ends overhang the ends of the step, an insulating film is deposited on the whole face nearly as high as the step, and then the insulating film and the photosensitive resin left on the step are removed to flatten the step. CONSTITUTION:An overhung photosensitive resin 3 is formed on mesa steps 2a and 2b formed through etching on the primary face of a semiconductor substrate 1 or on a step occurred through the formation of a wiring metal. Then, insulating films 4a-4c are deposited nearly as high as the steps 2a and 2b through a CVD method executed at a low temperature, and therefore the films 4a-4c becomes discontinuous at the step 2a and 2b. Then, the photosensitive resin 3 and the insulating film 4c formed on the step are removed through a lift-off method to make the step flat. By this setup, in an after process that an element is formed, not only a resist coating film can be improved in uniformity of thickness but also a resist pattern can be improved in dimensional accuracy so that a required element can be formed excellent in reproducibility.
Patent JP-H04282714-A (JP)
Title: Cursor movement processor
Inventor: MARUYAMA MICHIKO
IPC: G06F3/0481
Filed: 1991-03-12
Abstract: PURPOSE:To obtain a cursor movement processor capable of easily designing and changing a field and efficiently processing cursor movement in respect to field processing for the display screen input or the like of a display device or the like. CONSTITUTION:The cursor movement processor is provided with a field definition table 2 and a movement processing part 3 to be used at the time of moving a cursor between fields formed on a display screen 1. The table 2 has items corresponding to respective prescribed display units on the screen 1 and a field identification(ID) number is stored in the item corresponding to the display unit constituting each field in all fields. The movement processing part 3 is constituted so as to determine a field formed on a relative position determined by a cursor movement instruction to a current field position on which the cursor is positioned by retrieving the table 2 and move the cursor display to a prescribed position in the determined field.
Patent JP-S53130968-A (JP)
Title: Electron gun for color picture receiving tube
Inventor: MURANISHI HIDEO
IPC: H01J29/50
Filed: 1977-04-20
Abstract: PURPOSE: To improve the heat dissipation and to reduce the thermal distortion, by adopting a flat through construction for a control electrode and opening the both ends. 
     COPYRIGHT: (C)1978,JPO&Japio
Patent JP-H02226075-A (JP)
Title: Peak detecting circuit
Inventor: TAKEUCHI HIROSHI
IPC: G01R19/04
Filed: 1989-02-27
Abstract: PURPOSE:To improve rectification efficiency by a method wherein a voltage follower is constituted of first to third transistors, a current source and a resistor. CONSTITUTION:Charging impedance of a capacitor 5 is determined by a current value flowing in a transistor 3, while discharged impedance of the capacitor 5 is determined by impedance from a base side of a transistor 2 and current flowing in a transistor 1. As potential of an input terminal 9 approaches the peak value, charging to the capacitor 5 is started. Since current flows in the transistor 1 and also in the transistor 3 at this time, charging impedance is small irrespective of voltage of an output terminal 10. If potential of the input terminal 9 lowers, the capacitor 5 is discharged, but current does not flow to the transistor 1 at this time resulting in large discharging impedance. Therefore irrespective of the input potential charging impedances is small and discharging impedance is large. This allows high rectification efficiency to be obtained.
Patent JP-H03248110-A (JP)
Title: Zoom lens driving mechanism
Inventor: OGASAWARA YUJI
IPC: G02B7/04
Filed: 1990-02-26
Abstract: PURPOSE:To reduce the size and cost of a lens barrel by providing a member integrally with a cam which is so shaped as to stop a specific lens group at plural positions in the direction of the optical axis and a cam which is so shaped as to adjust the focus by moving a corresponding lens group. CONSTITUTION:An annular cam 2 in a cylindrical shape is provided with the 1st groove cam 2a which is so shaped as to adjust the focus of the lens group, the 2nd groove cam 2b which is so shaped as to stop the lens group at the positions in the cam shape, and a driven gear 2c, and is fitted rotatably onto the outer periphery of a fixed frame 1. Then the ring is positioned in the direction of the optical axis O with a stopper ring 15, etc. The annular cam 2 for lens driving is integrated, the driving mechanism for the lens group for focus adjustment is simplified, and only one driving system such as a driving motor is required. Consequently, the mechanism can be made compact and reduced in cost.
Patent JP-H09241215-A (JP)
Title: Purification of acrylic ester derivative
Inventor: NAGANO HIDEAKI
IPC: C07C69/54
Filed: 1996-03-04
Abstract: PROBLEM TO BE SOLVED: To obtain a purified acrylic ester derivative low in impurities content, prevented from crosslinking during its polymerization, suppressed in its gelling, copolymerizable with other monomer(s) in and proportion, thus useful in various applications. SOLUTION: This purified acrylic ester derivative is obtained by washing an acrylic ester derivative contaminated with a crosslinkable component having two or more double bonds in the molecule as impurities and expressed by the formula (R1 and R2 are each H or an organic residue; R3 is an organic residue; (n) is a positive number of 1-3; (m) is a positive number of 1-100) with such an organic solvent (<=8.5 in solubility parameter) as to be more soluble for the crosslinkable component than this derivative, or a cleaning agent containing at least water (containing an organic solvent subject to two-layer separation with water and <=10 in solubility parameter).
Patent JP-S58162211-A (JP)
Inventor: GOTOU NOBUO
IPC: F01N5/02
Filed: 1982-03-23
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H06254095-A (JP)
Title: Complex mti filter
Inventor: SHINAMI AKIRA
IPC: G01S15/52
Filed: 1993-03-08
Abstract: PURPOSE:To obtain the complex MTI filter of a small circuit scale and a low cost by constituting the filter so that inputted complex number data is rotated, a prescribed filtering processing is executed by a conventional real number type MTI filter, and thereafter, it is subjected to reverse rotation. CONSTITUTION:The complex MTI filter is constituted fundamentally of a first phase rotating means 1, a first and a second real number type MTI filers 2, 3, and a second phase rotating means 4. To a first phase rotating means 1, angle data and complex number data are allowed to correspond to each other and inputted, and in a first phase rotating means 1, a phase of a complex number Ii+jQi for showing the inputted complex number data is rotated by an angle thetai for showing the angle data. Each rotated data thereof is inputted to a first and a second real number type MTI filters 2, 3, and inputted to a second phase rotating means 4 after a prescribed filtering processing. In such a state, the phase of the complex number of each data is rotated by an angle whose absolute value is the same as thetai, and also, of a reverse code.
Patent JP-S60189978-A (JP)
Title: Manufacture of surface light emission type led
Inventor: IMOTO YASUMASA
IPC: H01L33/40
Filed: 1984-03-12
Abstract: PURPOSE:To contrive the improvement in manufacturing yield by a method wherein a circular mesa is formed on the side of the photo output lead out plane, and an ohmic electrode is formed by using an etching mask used for mesa formation, then, the circular mesa is processed into a convex lens form. CONSTITUTION:A circular mesa 5 is formed on the photo lead out side 3 of a double hetero structural wafer made of InP 1 and InGaAsP 2 by using the first photo resist 4 as a mask with an etchant composed of Br2 and CH3COOH. Next, a metal turning to the first ohmic electrode 6 is evaporated to the part except the circular mesa 5, and the resist 4 is removed, then, alloying is performed. Thereafter, Au turning to a cover electrode 7 is evaporated, and etching is performed with an etchant composed of KI and I2 by using the second photo resist 8 as a mask. Further, the circular mesa 5 is etched into the form of a convex lens 9 with an etchant composed of Br2 and CH3OH not by removing the second photo resist 8. At this time, the eaves of the first ohmic electrode 6 and the cover electrode 7 generated by side etch are removed with another etchant.
Patent JP-2000245457-A (JP)
Title: Avermectin aglycon synthetase
Inventor: OMURA SATOSHI
IPC: C07D493/22
Filed: 1999-02-24
Abstract: PROBLEM TO BE SOLVED: To obtain a DNA capable of producing an avermectin-related compound useful as a medicine, a veterinary drug or an agrochemical by encoding avermectin aglycon synthetase. SOLUTION: This DNA encodes avermectin aglycon synthetase (domain). Furthermore, the DNA has a base sequence selected from a group comprising nucleotide numbers 1-11916 and 11971-30688 of formula I and nucleotide numbers 1-14643 and 14824-31419 of formula II or the DNA encodes a polypeptide hybridized under condition which is stringent to the DNA and having avermection aglycon synthetase activity. The avermectin aglycon synthetase (domain) is obtained by culturing a transformant obtained by introducing a recombinant vector containing the DNA into a host cell which is avermectin producing microbial strain such as Streptomyces avermitilis K 2038 (FERM BP-2775) in a culture medium.
Patent JP-S62204712-A (JP)
Inventor: ITO HISAKATSU
IPC: A47G27/02
Filed: 1986-03-04
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S59172777-A (JP)
Title: Semiconductor device
Inventor: ISHIDA TOSHIMASA
IPC: H01L21/338
Filed: 1983-03-23
Abstract: PURPOSE:To enable to realize high speed characteristic by alleviating the influence of a surface depletion layer by a method wherein a high purity GaAs or GaAlAs single crystal layer or a semi-insulation GaAs or GaAlAs single crystal layer is formed on the surface of a semi-insulation GaAs substrate wherein an active layer is formed. CONSTITUTION:A semi-insulation GaAs epitaxial layer 25 is formed on an active layer 24. Therefore, the influence by the expansion of a depletion layer caused by the surface level that has been a problem in the conventional example becomes small. In other words, when the thickness (d) (normally 600-800Angstrom ) of the expansion of the depletion layer in the conventional example, if the thickness of the semi-insulation GaAs epitaxial layer 25 is selected at 2d or more, it is possible to restrain the expansion of the depletion layer in the N-GaAs active layer 24 (assumed as uniformly doped) to about 25% or less, and to about 12% or less if selected at 4d or more. Thereby, the channel resistance becomes small, and accordingly the high speed characteristic can be realized.
Patent JP-H05248484-A (JP)
Title: Liquid-sealed type mount
Inventor: DAINO KAZUTO
IPC: F16F13/00
Filed: 1992-03-04
Abstract: PURPOSE:To prevent the rise of a dynamic spring during switching of an orifice. CONSTITUTION:A main liquid chamber 3 surrounded with a resilient body 2 is formed on the upper surface side of a partition wall 1 and an auxiliary liquid chamber 5 surrounded with a diaphragm 4 is formed on the under surface side thereof. Meanwhile, a large orifice having the one end communicated with the main liquid chamber 3 and the other end communicated with the auxiliary liquid chamber 5, and a small orifice 10 having the one end communicated with the main liquid chamber and the other end communicated to a large orifice 7 are formed in the partition wall 1. Further, an on-off valve 12 to open and close a communicating state between the large orifice 7 and the small liquid chamber 3 and between the small orifice 10 and the main liquid chamber 3 is rotatably arranged at the partition wall. When a communicating state between the main liquid chamber 3 and the auxiliary liquid chamber 5 is switched from the large orifice 7 to the small orifice 10 through rotation of the on-off valve 12, the length of the large orifice 7 is gradually decreased in a state that the section of the flow passage of a communicating part between the main liquid chamber 3 and the large orifice 7 is kept at an initial value within the given rotation angle of the on-off valve 12.
Patent JP-S6016691-A (JP)
Inventor: RICHIYAADO EICHI GURATSUPENDOR
IPC: E21B47/18
Filed: 1984-03-14
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S59172656-A (JP)
Title: Dichroic electrophotographic method
Inventor: MIYAGI KOUJI
IPC: G03G15/01
Filed: 1983-03-23
Abstract: PURPOSE:To eliminate fogging at a background part during transfer by equalizing the polarity of black toner to that of red toner and making the polarity of toner sticking to the background part opposite to said polarity. CONSTITUTION:A latent image which is opposite in polarity between red and black is dveloped with toner having the polarity opposite to that of the latent image as shown by (d), and entire-surface exposure is carried out, so that the surface potential of a photosensitive body 1 changes from (a) to (b). Then, when AC corona discharge is carried out while a DC voltage is superposed, the current flowing to the photosensitive body changes in polarity according to the potential of the photosensitive body. The polarity changing point (potential V0) of the inflow current to the photosensitive body is set a little bit larger than that of the background potential to flow current with the opposite polarity (+) to the black part and red part, and charges (-) having the same polarity with the black part and red part flow to the background part, so no fogging toner at a nonimaged part is transferred when black toner and red toner at an imaged part are transferred, realizing excellent dichroic electrophotography.