baber/WOPTO huggingface dataset:
Patent JP-2000069836-A (JP)
Title: Reaping unit in combine harvester
Inventor: KATO HIDEKAZU
IPC: A01D34/28
Filed: 1999-09-17
Abstract: PROBLEM TO BE SOLVED: To provide the subject reaping unit so designed as to fix at a relevant position a pretreatment device in the front of a reaping section by a specific means along the transversely movable span for the pretreatment device so as to enable a relevant operator to conduct the unlocking operation for the position fixation and the operation of moving the pretreatment device left and right by one effort one-handed through his remote control from a control platform. SOLUTION: This reaping unit in a combine harvester is designed to enable a pretreatment device in the front of a reaping section to be movable left and right by manual operation, and has such a scheme that, a locking lever 55 for fixing at a relevant position the pretreatment device is set up on the upper part on the right side of the reaping section lying within the reach of a relevant operator sat on a control platform, and there is also provided a handle 61 for the operation of moving the pretreatment device left and right so as to enable the operator to grip the grip portion 61a of the handle 61 and the grip portion 55a on the end of the locking lever 55 as well. When the pretreatment device is to be moved left or right, the handle 61 and the lever 55 are gripped with one hand from the control platform to effect unlocking and moving the pretreatment device left or right, and during the movement, the operator's hand is detached off the lever 55, thereby fixing the pretreatment device at a relevant position.
Patent JP-H1199653-A (JP)
Title: Manufacture of ink jet recorder
Inventor: KADOWAKI AKIHIKO
IPC: B41J2/16
Filed: 1997-09-29
Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing an ink jet recorder excellent in reliability with high work safety and efficiency and low failure rate. SOLUTION: A holder 2 and a filter 3 and fused by pulse heat system. Since they are heated locally for a short time by pulse heat system, a side face projection 24a is reduced and residual bubbles can be suppressed at the time of introducing ink. Since the temperature is raised only during power conduction, alignment work can be facilitated. Furthermore, since preheating is not required, the work efficiency is enhanced.
Patent JP-H08106062-A (JP)
Title: Light beam scanner
Inventor: NISHIMURA KATSUMI
IPC: H04N1/113
Filed: 1994-10-03
Abstract: PURPOSE: To always stably obtain write start timing. CONSTITUTION: A scanning beam L' reflected by a reflection mirror 16a for detecting a write start timing signal is made incident on a condensing optical system 14 again, and converged to be flat in a specified direction. By setting the scanning direction of the reflected scanning beam L' with respect to a photodetector 16b so that it may be matched with the converging direction of the reflected scanning beam L', the entire spot of the reflected scanning beam L' is received by the photodetector 16b in a short time, and the rising characteristic of a write synchronizing signal outputted from the photodetector 16b is made steep so as to reduce jitter.
Patent JP-S63117467-A (JP)
Title: Manufacture of semiconductor device
Inventor: UCHIYAMA AKIRA
IPC: H01L21/265
Filed: 1986-11-05
Abstract: PURPOSE:To form more than one region having different impurity concentration on a substrate in a single doping process by a method wherein masks having different effects against doping are formed on the substrate and the impurity is injected into the whole surface from above the mask. CONSTITUTION:A pad oxide film 33 is formed on the surface of a silicon substrate 31 after the silicon substrate 31 acting as a base has been processed by a thermal oxidation method. Then, a silicon nitride film 35 is formed on this pad oxide film 33 by a CVD method. A channel stopper region 39 and an active region 40 can be formed during an identical impurity-injecting process, and, at the same time, the impurity concentration at each region can be set to the respective desired impurity concentration.
Patent JP-2001087186-A (JP)
Title: Vacuum cleaner
Inventor: OKUJIMA MASAFUMI
IPC: A47L9/24
Filed: 1999-09-17
Abstract: PROBLEM TO BE SOLVED: To provide a vacuum cleaner which is capable of stably executing electric connection and is simultaneously satisfactory in assembling, ability. SOLUTION: Even though a dust collecting chamber 4 comes to have negative pressure to deform a dust collecting room wall 5 toward the side of the dust collecting room, a holding plate 14 to which a connecting terminal 16 for executing electric connection is fixed is deformed slightly compared with the deformation of the wall 5 since it is held to the wall 5 in a temporarily fixed state. Thus, the positional relation of a cover 13 and a dust collecting hose 17 with an electric connection part 18 never varies remarkably, thereby a pressure welding quantity never varies to stably execute electric connection.
Patent JP-H08122688-A (JP)
Title: Tilt angle adjusting method for dynamic pressure bearing, and optical deflecting device
Inventor: TAKAHASHI YUKO
IPC: G02B26/10
Filed: 1994-10-27
Abstract: PURPOSE: To stably obtain an image of high quality without requiring to enhance machining precision and assembly precision by adjusting balance weight at a proper position on a rotor, generating deflected swing rotation canceling a tilt angle, and minimizing the substantial tilt angle of a mirror at a photodetection position. CONSTITUTION: A polygon mirror is combined with a rotor base 121, a magnet 126, etc., to form the rotor 120, which rotates as a motor through the dynamic pressure bearing. At this time, such a swing rotation is generated under the influence of the unbalance of the rotor that appears as substantial tilt angle variation. For the purpose, the angle of the swing rotation due to the unbalance of the rotor after assembly and the tilt of the respective mirror surfaces of the polygon mirror at the photodetection position are measured, weight to be added to the rotor and its position are specified through calculation based upon the measurement results, and the weight is added to vary the swing rotation angle and phase of the rotor, thereby minimizing the substantial tilt angle of the mirror surfaces at a scanning position (photodetection position).
Patent JP-H03127436-A (JP)
Title: Projection-type television apparatus
Inventor: TETSUDA KOJI
IPC: H04N5/74
Filed: 1989-10-11
Abstract: PURPOSE:To correct the difference of luminance distribution in a display window owing to an iris diaphragm without increasing the number of multilayer interference filters by installing iris diaphragms to change photon ratio between the center and the periphery of a screen in a group of projection lens of a red cathode-ray tube having no mulatilayer interference filter. CONSTITUTION:An iris diaphragm 9 to change photon ratio between the center and the periphery of a screen is installed in a group of projection lens 2 of a red cathode-ray tube 1 having no multilayer interference filter. When a point 3 of a photon track on a display window 12 is observed, a photon (a) from the center part of the display window is not affected by the iris diaphragm 9, but the tracks of photons (b), (c) are largely converged by the iris diaphragm 9 as the photon goes to the periphery part of the display window. When an iris diaphragm is installed in a cathode-ray tube having a multilayer interference filter and no iris diaphragm, luminance distribution near to that of cathode-ray tube is achieved.
Patent JP-2001092051-A (JP)
Title: Radiation image reader
Inventor: SATO KIMIHIKO
IPC: H04N1/04
Filed: 1999-09-17
Abstract: PROBLEM TO BE SOLVED: To accurately estimate the radiation dose of radioactive rays which irradiate a stimulable phosphor sheet when photographing. SOLUTION: When a radiation picture is read from both sides of the stimulable phosphor sheet where the radiation picture is stored and recorded, a picture signal obtained in a PMT (photomultiplier) for read can be saturated if the quantity of stimulated phosphorescent light is large. Consequently, a radiation dose X of radioactive ray which irradiate the stimulable phosphor sheet when photographing is estimated by an estimation means 101 on the basis of the picture signal obtained b a PMT 51A which detects stimulated fluorescent light, of which the quantity of light is smaller, emitted from the rear side of the sheet.  A driving control means 102 adjusts the rotation speed of motors 94 and 96 driving rolls, which carry a sheet in an erasing part which erases remaining radiation energy of the stimulable phosphor sheet, on the basis of the estimated radiation dose X to control the erase time of remaining radiation energy of the sheet.
Patent JP-H10109983-A (JP)
Title: Production and purification of cyclic ester
Inventor: KURASHIMA HIDEJI
IPC: C07D319/12
Filed: 1996-10-04
Abstract: PROBLEM TO BE SOLVED: To easily obtain a high-purity cyclic ester of a low moisture and acid content in a high yield by the addition of an ortho ester during the cyclic ester production process. SOLUTION: Using an α-hydroxycarboxylic acid of the formula R<1> R<2> C(OH) COOR<3> (R<1> to R<3> are each H or a 1-6C alkyl) or its ester or a mixture thereof as raw material, an ortho ester of the formula R<4> C(OR<5> )3 (R<4> is H or a 1-6C alkyl; R<5> is a 1-6C alkyl) is added to the production process to convert the acid(s) and moisture existing in the product cyclic ester to alcohol(s) and ester(s) which are then removed from the system, thus purifying the final cyclic ester. The ortho ester is selected from methyl orthoformate, ethyl orthoformate and ethyl orthoacetate, etc. The reaction is preferably conducted at a temp of 50-250 deg.C under the atmospheric pressure for 0.2-5h. This cyclic ester is useful as e.g. a raw material for polymers.
Patent JP-H04140651-A (JP)
Title: Method for penetration test and penetrant used for the method
Inventor: MOTOYAMA MASAMI
IPC: G01N21/91
Filed: 1990-10-01
Abstract: PURPOSE:To enable highly accurate probing without causing pollution by performing penetration treatment using penetrant which is not compatible with water and does not contain base solvent with specific gravity less than 1 and surfactant such as diluent and by repetitively using water with the penetrant separated to blow it with a specific water pressure to perform cleaning. CONSTITUTION:After penetrant is applied on a surface of a specimen to be inspected and penetrated into a defect part to perform penetration treatment, cleaning treatment is performed wherein excessive penetrant which remains is cleaned off by using water. Then, after the specimen is dried, probing of the defect part is done. Penetration treatment is performed by using penetrant which is not compatible with water and which does not surfactant comprising base solvent with specific gravity less than 1 at normal temperature, similar diluent and oil soluble fluorescent dye. Cleaning treatment is performed by repetitively using water with the penetrant separated by a difference in specific gravities from the water container excessive penetrant caused by the cleaning so that the water is blown against the surface of the specimen to be inspected at a water pressure of at least 6 kg/cm<2> or higher. Thus pollution is not caused while highly accurate probing is possible.
Patent JP-H04139819-A (JP)
Title: Method and apparatus for selective growth of silicon epitaxial film
Inventor: TATSUMI TORU
IPC: H01L21/205
Filed: 1990-10-01
Abstract: PURPOSE:To enable growth of thick films by a method wherein Si atoms or Ge atoms formed on an SiO2 film or an Si3N4 film during selective growth using a silane-based gas or germanium-based gas are evaporated by means of Cl2 gas or Cl radical etching before polysilicon nucleates. CONSTITUTION:A substrate 33 having a silicon layer at least in the surface and provided selectively with silicon oxide films or silicon nitride films over the surface of the silicon nitride layer is arranged in a vacuum container 31. Under a container that vapor reaction does not occur, the surface of the silicon layer is irradiated simultaneously with at least either silane-baed gas molecular beams or germanium-based gas molecular beams and chlorine molecular beams or chlorine radicals to selectively grow silicon films or germanium-containing silicon films. That is, growth is stopped before polysilicon nucleation occurs so that the step of irradiation only with Cl radical molecular beams may be intervenient. This method allows no decay of selectivity even in growth of thick films and little decreases in growth speed.
Patent JP-H09106410-A (JP)
Title: Preparing and displaying method of computer graphic concerning building and its neighboring environment
Inventor: FUNAKI MINORU
IPC: G06T19/00
Filed: 1995-10-12
Abstract: PROBLEM TO BE SOLVED: To realize walk through similar to actually walking around the outside of a building and its neighboring environment by displaying the building and its neighboring environment by a computer graphic (CG) picture as still and moving pictures and instructing the direction, the speed, etc., of advance. SOLUTION: Three-dimensional shape data concerning the building Z1 and that concerning the neighboring environments Z2 and Z3, etc., of the building Z1 are prepared by each CAD system in advance. After synthesizing these three-dimensional shape data concerning the building Z1 and the neighboring environments, the position of eyes to be the reference of CG picture preparation is stopped or moved in a desired direction with respect to a three-dimensional model obtained by synthesizing according to an operator's input operation to generate data for the CG picture corresponding to the CG picture expressing a state obtained by looking at the building Z1 and/or its neighboring environment from the position of eyes. Then the CG picture expressing the building Z1 and/or its neighboring environment based on this data for the CG picture is displayed as still-moving pictures.
Patent JP-H10111659-A (JP)
Title: Liquid crystal display device with utterance body
Inventor: MURAKAMI FUMIKAZU
IPC: G02F1/1333
Filed: 1996-10-04
Abstract: PROBLEM TO BE SOLVED: To make a glass substrate for a liquid crystal display an utterance body, to share a boosting coil with both for driving both, to miniaturize a device and to reduce the cost by mounting a piezoelectric element for making utter this glass and the element related to the drive of the piezoelectric element on a part of liquid crystal displaying glass. SOLUTION: Liquid crystal material is injected into a gap between upper glass 1 and lower glass 2 arranged oppositely to each other, and the end surfaces of the glass 1, 2 are fixed to a case holding a plastic packing inbetween. Further, a liquid crystal driving IC 4, the boosting coil 5, the piezoelectric element 6, a boosting IC 8 and a connection substrate 7 are mounted on the lower surface of the projected part 3 of the upper glass 1. By impressing an intermittent signal of an audible area frequency to the piezoelectric element 6, the upper glass 1 performs bending vibration to utter.  A liquid crystal driving data signal, etc., is inputted from the connection substrate 7, and the liquid crystal driving IC 4 and the boosting IC 8 are controlled, and the boosting IC 8 performs a function of a liquid crystal driving power source and the function of piezoelectric element drive, and the boosting coil 5 acts to both roles in time-division.
Patent JP-S62125700-A (JP)
Inventor: OKAYASU HIROSANE
IPC: H05K3/30
Filed: 1985-11-27
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-2001089847-A (JP)
Title: Deposition of silicon or silicon compound film
Inventor: TOYOSHIMA TAKAYUKI
IPC: C23C14/32
Filed: 1999-09-20
Abstract: PROBLEM TO BE SOLVED: To solve the conventional problems that discharge voltage becomes drastically elevated and arc discharge plasma cannot be stably maintained and resultantly stable film cannot be performed in the deposition of a silicon film on a substrate by evaporating an evaporation material of electrical insulating silicon by an ion plating method using arc discharge plasma or in the reactive deposition of a silicon dioxide film on a substrate while introducing oxygen gas. SOLUTION: Any of boron, phosphorus and aluminum is incorporated in an amount of 0.1 ppm to 100 ppm into an evaporation material of silicon metal to be evaporated by being irradiated with arc discharge plasma to form an evaporation material of electrical conducting silicon metal. When oxygen or nitrogen is used as reactive gas in film deposition, a silicon dioxide film and a silicon nitride film can be stably deposited.
Patent JP-H04145200-A (JP)
Title: Particle containing polymer
Inventor: MAURIJIO PASUTORI
IPC: C11D3/60
Filed: 1990-10-02
Abstract: A granulate useful in detergent formulations is disclosed, which comprises at least 10% by weight of polymer useful in such formulations and at least 20% by weight of at least one inorganic component which is also useful in such formulations. The granulate has a bulk density of at least 700 g/l, and possesses low hygroscopicity. A process formaking such a granulate is also disclosed.
Patent JP-H10111670-A (JP)
Title: Liquid crystal display device and its driving method
Inventor: UENO SATOSHI
IPC: G02F1/133
Filed: 1996-10-04
Abstract: PROBLEM TO BE SOLVED: To obtain excellent display quality without shadowing and double come-out due to a dull waveform by providing plural scan electrodes and data electrodes and superimposing a correction voltage on a scan signal imparted to plural scan electrodes when plural scan electrodes are selected simultaneously to be driven. SOLUTION: In a matrix type liquid crystal display device provided with plural scan electrodes and data electrodes, a timing generation circuit 41 of a scan driver control circuit 34 generates a correction timing signal and rise, fall timing signals of a selection pulse. Further, a data count circuit 42 counts the number that a video data signal read out from a memory temporarily storing an input video data signal is in an on state. Then, a correction signal generation circuit 43 generates a correction signal of a pulse width for making a correction voltage value according to the data related to the number of pixels to be turned on on respective scan electrodes at the timing according to a correction timing signal outputted from the timing generation circuit 41.
Patent JP-H11167093-A (JP)
Title: Projection type display device
Inventor: KARASAWA JIYOUJI
IPC: G02F1/1333
Filed: 1998-09-18
Abstract: PROBLEM TO BE SOLVED: To obtain a display device which can be miniaturized by using a small-sized cooling fan, in which an incident side polarizing plate is efficiently cooled, which is made light, thin, short and small and which obtains high emitted luminous flux by constituting the device so that both back and front surfaces of the incident side polarizing plate of a liquid crystal light valve are cooled with the current of air from below by the cooling fan. SOLUTION: The liquid crystal light valve 3R is fastened on the liquid crystal light valve plate 11R by a screw, the light valve plate 11R is fastened on a guide plate 6R by the screw, and the plate 6R is fastened on an up plate 14 by the screw, so that the light valve 3R is held. As for the light valve 3R, the light incident side polarizing plate 12R is stuck to the surface of the plate 6R on a prism 4 side and a light emitting side polarizing plate 13R is stuck to the prism 4. The current of air generated by the cooling fan 7 is converged on a ventilation hole 9R, takes away the heat of the surfaces of the polarizing plates 12R and 13R, and blows upward from a hole formed on the plate 14.
Patent JP-S61144059-A (JP)
Title: Semiconductor memory storage
Inventor: KIHARA HIDETAKA
IPC: H01L27/04
Filed: 1984-12-18
Abstract: PURPOSE:To obtain a small-sized dRAN cell having large capacitance by forming a projecting section in substantially the same width as a groove to a frame-shaped capacitor electrode surrounding a cell, shaping a similar configuration gate electrode to the inner wall of the projecting section through self- alignment and integrally forming the gate electrode with a gate electrode for an adjacent memory cell through a breaking section in the projecting section. CONSTITUTION:A silicon nitride film 21 is formed to a P<-> type silicon substrate 11, the substrate is etched in a latticed and striped manner while using the nitride film 21 as a mask, boron ions are implanted to the base, and a field oxide film 13 is buried flatly. The whole surface of the field oxide film 13 is etched, a thin oxide film 14 is shaped by thermally oxidizing the surface of a groove 12 while being left only on the bottom of the groove 12, and N<+> polycrystalline silicon is buried flatly to form a capacitor electrode 15. A projecting section in the capacitor electrode 15 is removed. The whole surface of N<+> polycrystalline silicon 24 is etched in the vertical direction through reactive ion etching. Accordingly, a frame-shaped /gate electrode (a word line) self- aligned with the inner wall of the capacitor electrode 15 blocks a capacitor removing section, and is shaped integrally regarding a cell in the line direction.
Patent JP-S62204723-A (JP)
Inventor: SATO MASARU
IPC: G02B21/20
Filed: 1986-11-07
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H03130405-A (JP)
Title: Shield for helmet
Inventor: YOSHIOKA SHUNICHI
IPC: A42C1/00
Filed: 1989-10-12
Abstract: PURPOSE:To obtain the subject shield having excellent transparency, impact resistance, weather resistance, freeze resistance, oil resistance, chemical resistance, moldability and hinge property, free from strain and exhibiting balanced physical properties by punching an amorphous thermoplastic polyester sheet. CONSTITUTION:The objective shield is produced e.g. by using an amorphous polyester sheet made of a polyethylene terephthalate polymer containing polyethylene phthalate unit as >=80% of the recurring unit, punching the polyester sheet in the form of a shield and hot-pressing at <=100 deg.C for several seconds to form a curved surface.
Patent JP-S62117479-A (JP)
Inventor: CHIYAARUZU JIYOFUREI TOMURIN
IPC: G02B27/14
Filed: 1986-11-07
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S62125808-A (JP)
Title: Filter device
Inventor: ITO HAYAMIZU
IPC: B01D29/62
Filed: 1985-11-26
Abstract: PURPOSE:To enable backwash washing to be easily and completely performed and to enable filtering operation for a long period by using a filter medium which is formed by boring proper numbers of through-holes having a proper diameter on a freely extensible and contractible base body. CONSTITUTION:Liquid contg. e.g. a solid dirty substance is filtered by a filter medium 1 consisting of silicone rubber and urethan rubber or the like which is formed by boring proper numbers of through-holes 3 having a proper diameter on a freely extensible and contractible base body 2 and also the through-holes 3 are extended in a time of backwash and contracted in case of refiltering it after finish of backwash. As a result, backwash washing can be easily and completely performed. When stopping feed of washing water after finish of backwash washing, it is easily restored and filtering operation is enabled for a long period by repeat this operation.