baber/WOPTO huggingface dataset:
Patent TW-561210-B (TW)
Title: Yarn carrier of weft knitting machine
Inventor: IKOMA KENJI
IPC: D04B7/26
Filed: 2001-02-21
Granted: 2003-11-11
Abstract: A yarn carrier, comprising a reciprocating movement means with a carrier base stand and an engagement face supported on the carrier base stand reciprocally relative to the moving direction of the carrier base stand and engage temporarily with an accompanying piece of a carrier accompanying means provided on the carrier base stand on the outside of an engaging part in the moving direction and a motion converting means allowing feeder parts with a main yarn feed port and a plating feed port at the tip thereof to be suspended from the carrier base stand, supporting at least either of the yarn feed ports rotatably using the longitudinal direction of the feeder parts as a rotating axis, allowing the engagement surface provided on the reciprocating movement means to be moved in engagement with the accompanying piece so as to rotatingly displace the yarn feed parts of the feeder parts, and converting the reciprocating motion of the reciprocating movement means into the rotating motion of the yarn feed ports provided in the feeder parts so as to change the positional relation between the main yarn feed port and the plating yarn feed port.
Patent TW-I247026-B (TW)
Title: Improved rubber composition
Inventor: VON HELLENS CARL WALTER
IPC: C08K5/098
Filed: 2001-05-11
Granted: 2006-01-11
Abstract: The invention relates to novel crosslinkable carboxylated nitrile rubber compositions that also comprise a multivalent salt of an organic acid and a peroxide crosslinking agent. The compositions may also contain nitrile rubber in admixture with the carboxylated nitrile rubber. The rubber may be hydrogenated. Cured compositions made from the crosslinkable compositions display improved properties, particularly an unexpectedly high modulus.
Patent TW-511146-B (TW)
Title: Evaluation method, position detection method, exposure method and device manufacturing method, and exposure apparatus
Inventor: KIKUCHI TAKAHISA
IPC: G03F7/20
Filed: 2001-05-31
Granted: 2002-11-21
Abstract: For a wafer earlier than a n'th wafer (n ≥ 2) in a lot, the positions of all exposed areas are detected, each of the position deviation amounts are separated into a nonlinear component and linear component, the nonlinear distortion of the wafer is evaluated based on the position deviation amounts and an evaluation function, and the nonlinear components of the position deviation amounts of all exposed areas are calculated according to the complement function (determined based on the evaluation results). On the other hand, the position coordinates of all exposed areas, having linear components of position deviation amounts thereof corrected by using EGA are calculated for the n'th or later wafer, and the positions of the exposed areas are detected based on the position coordinates having linear components thereof corrected and the nonlinear components calculated in the above.
Patent TW-548728-B (TW)
Title: MOS with high k gate dielectric layer
Inventor: WANG MING-FANG
IPC: H01L21/28
Filed: 2001-10-19
Granted: 2003-08-21
Abstract: A MOS with high k gate dielectric layer is suitable for being applied to a semiconductor manufacturing process. The MOS is located on an active region and comprises: two source/drain below the surface of the active region; a channel region located on top of the active region between source/drain; a spacer formed adjacent to the side wall of the channel region and electrically connected with the source/drain, in which the material used to form the spacer is a conductive material; a dielectric layer located on top of the channel region having the same width as the channel; a metal conductive layer on the dielectric layer, in which the dielectric layer and the metal conductive layer form the gate.
Patent TW-593067-B (TW)
Title: Apparatus for dispensing a roll of material
Inventor: KELDERS JOHANNES H J M
IPC: B65H35/00
Filed: 2001-11-13
Granted: 2004-06-21
Abstract: The present invention provides an apparatus for dispensing a roll of material such as a pressure sensitive adhesive tape. The apparatus includes an enclosable housing having a roll holding piece, a cover piece, and a hinge assembly for joining the roll holding piece and cover piece. The hinge assembly permits opening of the housing while the cover piece and roll holding piece remain connected by the hinge assembly. The apparatus also includes an applicator located proximate to the dispensing end for applying a material to a substrate; a discharge opening for the material, and a cutting member located proximate to the dispensing end for cutting the material. The apparatus of the present invention is particularly useful as a hand-held tape dispenser.
Patent TW-548951-B (TW)
Title: Selective compress capacity for scanner
Inventor: SHIH CHEN-HSIANG
IPC: H04N1/00
Filed: 2001-11-23
Granted: 2003-08-21
Abstract: A selective compress capacity for scanner is used to increase scanning speed. Accordance with the present invention, the method for selective compress capacity comprises the following steps: detecting decompress rate of central process unit; determining to enable the compress capacity according to the decompress rate; scanning an original; generating an image data. The key point of the present invention is adjusting the corresponding compress capacity to decompress rate of CPU. Then decrease data quantity to speed up the rate of data transmission.
Patent TW-512125-B (TW)
Title: Variable spacing strand coating system and modular guide roller therefor
Inventor: BOLYARD EDWARD W
IPC: D06B23/06
Filed: 2001-11-29
Granted: 2002-12-01
Abstract: A strand coating apparatus having an applicator head with a coating material dispenser coupled thereto, a strand guide roller coupled to the applicator head adjacent a coating material orifice of the dispenser, the strand guide roller having one or more strand guides each having a corresponding annular groove disposed about a hub, the one or more strand guides disposed and retained between a shoulder flange and removable locking collar of the hub, and in some embodiments one or more spacers are disposed between adjacent strand guides of the strand guide roller.
Patent TW-548611-B (TW)
Title: Plasma display apparatus
Inventor: ISOHATA HIDEKI
IPC: H01J17/49
Filed: 2001-12-21
Granted: 2003-08-21
Abstract: A structure, in which the frame can be successfully fixed to the plasma display apparatus at a low cost, has been disclosed. The plasma display apparatus comprises a plasma display panel, circuit substrates having drive circuits to drive the plasma display panel, a main frame to mount the circuit substrates, and adhesive tapes to fix the plasma display panel to the main frame, and small holes are provided on the portion to which the adhesive tapes of the main frame are fixed so that they are arranged regularly at established intervals. When the adhesive tapes and the main frame are fixed, no air bubbles form between the adhesive tapes and the main frame because plural small holes are provided on the portion to which the adhesive tapes of the main frames are fixed.
Patent TW-544556-B (TW)
Title: System for supplying semiconductor manufacturing system control programs
Inventor: NAKANO MINORU
IPC: H01L21/02
Filed: 2001-12-31
Granted: 2003-08-01
Abstract: A system for supplying a semiconductor manufacturing system control program includes an administrative server, a communications circuit connecting the administrative server to a controller of a semiconductor manufacturing system, a facility provided in the controller for determining a time when a previously installed control program can be changed, and a facility provided in the controller responsive to a result of the determination for storing a new control program received from the administrative server through the communications circuit in a memory to be executable by a processor.
Patent TW-I256688-B (TW)
Title: Method for wet etching of high k thin film at low temperature
Inventor: HSIEH YUE-HO
IPC: H01L21/316
Filed: 2002-02-01
Granted: 2006-06-11
Abstract: The present invention discloses a method for wet etching of a high dielectric thin film (HfO2 or ZrO2). This method avoid using sulfuric acid or other acid which need to etch at high temperature. This needs high temperature endurable equipments and is very expensive. The other way is by using dry etching which suffers to produce defects on the surface of the active area and the un-doped silicon glass (USG) or thermal silicon dioxide (SiO2) on the isolation area. The present invention is related to wet etching of the high dielectric thin film by a mixture of hydrofluoride (HF) and perchloric acid (HClO4) (or perbromide, periodide), the etch rate of high dielectric film is more than 10 Å/min, but the etch rate of silicon dioxide, USG or poly silicon is below 10 Å/min. The selectivity can satisfy the requirement of the integrated circuit process. It is excellent to etch the high dielectric film of the gate dielectric of CMOS or the capacitor dielectric of a DRAM and satisfy the need of mass production.
Patent TW-553736-B (TW)
Title: Sanitary napkin with intergluteal strip and front flap
Inventor: GLASGOW TARA
IPC: A61F13/15
Filed: 2002-02-07
Granted: 2003-09-21
Abstract: A sanitary napkin having a front flap that adhesively attaches to the user's undergarment and a tail strip that extends rearwardly to reside in the user's intergluteal crevice. The pad thus fits more snugly against the body or the user. Further, because the strip provides improved body contact, similar protection is achieved with a smaller pad, thus providing a discretion.
Patent TW-I257551-B (TW)
Title: Bus arbitration system and method
Inventor: KITAGAWA MASAHIKO
IPC: G06F15/177
Filed: 2002-03-01
Granted: 2006-07-01
Abstract: Objects of the present invention are to reduce a bus access latency and to assign priorities-arbitrarily to devices. A bus arbitration system comprises: a bus arbiter 12 which is connected directly to the devices DSP 0, 1, 2 and 3 without using a shared local bus and which provides an access grant to any of the devices that request access to the bus in accordance with the order of priority; and priority assigning means (DSP 0) for assigning priorities to the devices DSP 0, 1, 2 and 3.
Patent TW-569286-B (TW)
Title: Method and apparatus for wafer exchange employing stacked robot blades
Inventor: PERLOV ILYA
IPC: H01L21/677
Filed: 2002-04-16
Granted: 2004-01-01
Abstract: A wafer to be processed is loaded into a processing chamber in the same operation in which a processed wafer is unloaded from the processing chamber. As part of this operation, a set of lift pins lifts the processed wafer from a processing platform. A set of storage pins is extended above the lifted wafer and defines an upper wafer transfer position. A robot arm having a stacked set of wafer handling blades is inserted into the processing chamber with a wafer to be processed on the upper blade. The storage pins may lift the wafer to be processed off the upper blade at the same time that the lift pins lower the processed wafer onto the lower blade of the robot arm. The robot arm retracts, withdrawing the processed wafer from the processing chamber. The wafer to be processed may be lowered to the processing platform by the storage pins.
Patent TW-I221867-B (TW)
Title: Method for processing uni-transversal highly extended nonwoven clothes
Inventor: TSAI DE-SHING
IPC: D04H5/04
Filed: 2002-05-07
Granted: 2004-10-11
Abstract: A method for processing uni-transversal highly extended non-woven clothes comprises: using a processing device to heat a thermally adhered non-woven cloth to a temperature above the softening point of the thermoplastic fiber; meanwhile, subjecting the non-woven cloth to a longitudinal drawing at a specific draw ratio in a condition where the drawing rate of less than 10 meters per minute, based on 1 meter of the original cloth, such that the width of the original cloth is reduced to less than 60%, and a nonwoven cloth product with a smooth surface, a transversal elongation of more than 100%, and more than 50% of elasticity.
Patent TW-535207-B (TW)
Title: Method for automatically controlling defect-specification in manufacturing process of semiconductors
Inventor: WANG SHENG-REN
IPC: H01L21/00
Filed: 2002-05-08
Granted: 2003-06-01
Abstract: A method for automatically controlling defect-specification in manufacturing process of semiconductors is provided. The method provides a module to detect a position, number, size, and intensity signals of defects on the processed patterned wafers. The module further compares the patterned wafer with a normal wafer to preliminarily classify the patterned wafer, and creates a defect map. Then, a defect manager system is provided to execute a spatial pattern recognition procedure to determine whether the corresponding special pattern can be recognized or not. Finally, messages will be automatically sent to inform related e-mail accounts by the defect manager system according to results of the recognition of the special pattern.
Patent TW-I238156-B (TW)
Title: Process for treating an aqueous medium containing phosphate, cyclohexanone and cyclohexanone oxime
Inventor: BENNEKER ARNO
IPC: B01D11/04
Filed: 2002-05-30
Granted: 2005-08-21
Abstract: The invention relates to a process for treating an aqueous medium containing (i) phosphate and (ii) cyclohexanone and/or cyclohexanone oxime, said process comprising: feeding the aqueous medium to a stripping zone; passing steam through the aqueous medium in the stripping zone; and discharging a vapor stream from said stripping zone; wherein the joint content cyclohexanone and cyclohexanone oxime in the aqueous medium entering the stripping zone is less than 0.08 wt.%.
Patent TW-556300-B (TW)
Title: Direct determination of interface traps in MOSFET's
Inventor: CHUNG STEVE S
IPC: H01L21/66
Filed: 2002-06-04
Granted: 2003-10-01
Abstract: A low leakage charge pumping (CP) method has been implemented for direct determination of the interface traps in ultra-short gate length MOSFET's with ultra-thin gate oxide in the direct tunneling regime (< 30 Å). The leakage current even in a 12 Å to 16 Å gate oxide can be removed from the measured CP current, which enables accurate determination of the interface traps. This method has been demonstrated successfully for various ultra-thin RTNO-grown and RPN-treated gate oxides in CMOS devices. Moreover, it can be used as a good monitor of ultra-thin gate oxide process and the evaluations of device reliabilities in relation to the interface trap generation.
Patent TW-576736-B (TW)
Title: Underpants type disposable diaper
Inventor: ISHIKAWA HIROKI
IPC: A61F13/514
Filed: 2002-08-12
Granted: 2004-02-21
Abstract: The subjection of this invention is to provide an underpants type disposable diaper in which a pad can make a close contact with to adhere the skin of a wearer and the contact of the pad is maintained even when the underpants slip down. The underpants type disposable diaper 1A comprises the underpants 2 and a liquid absorbing pad 3 located inside the underpants 2; the pad 3 comprises two end parts 3a, 3a fixed near a trunk periphery 9 of the underpants 2, and two side parts 3b, 3b extending longitudinally from a crotch bottom part 7 to the trunk periphery 9. First and second longitudinally extending elastic parts 23, 24 are fixed to the surface of a back sheet 19 in a stretched state; the area between the two end parts 3a, 3a are raised from an inner surface of the underpants 2 due to shrinkage of the elastic parts 23, 24.
Patent TW-544342-B (TW)
Title: Cooling apparatus, manufacturing method, and manufacturing line for hot rolled steel strip
Inventor: FUJIBAYASHI AKIO
IPC: B21B45/02
Filed: 2002-08-13
Granted: 2003-08-01
Abstract: The present invention relates to a cooling apparatus for hot rolled steel strip comprising: an upper means for cooling an upper side of a steel strip transported by transporting rolls after hot rolling, located above the upper side of the steel strip; and a bottom means for cooling the bottom side of the steel strip, located under the bottom side of the steel strip, each means for cooling including: a protecting member having at least one cooling water hole slotted thereon, located near the surface of the steel strip; at least one cooling water header, located across the steel strip from the protecting member; and cooling water injection nozzles for injecting cooling water vertically onto the surface of the steel strip through the cooling water hole, projected on the cooling water header, wherein the top of the cooling water injection nozzle is positioned at a longer distance from the surface of the steel strip than the surface of the protecting member facing to the surface of the steel strip. The present invention allows to constantly transport the steel strip after hot rolling and to rapidly and homogeneously cool it.
Patent TW-593342-B (TW)
Title: Method for reducing endotoxin contained in chitosan
Inventor: SHEN JR-LUNG
IPC: C08B37/08
Filed: 2002-09-04
Granted: 2004-06-21
Abstract: A method for reducing endotoxin contained in chitosan comprises: (a) dissolving chitosan containing endotoxin in an aqueous solution; (b) contacting the aqueous solution obtained in Step (a) with a surfactant to form an insoluble solid and an aqueous solution reduced in the content of the endotoxin; and (c) using a solid/liquid separation means to separate the solid from the aqueous solution reduced in the content of the endotoxin.
Patent TW-I224079-B (TW)
Title: Material with nanometric functional structure on its surface and method for producing such a material
Inventor: CHEN I-CHENG
IPC: C30B11/12
Filed: 2002-10-25
Granted: 2004-11-21
Abstract: The present invention relates to a material with a nanometric functional structure on the surface thereof and a method for producing such a material. The invented method comprises using the properties of a supercritical fluid to form a nanometric structure on the surface of a substrate in order to form a material with a nanometric functional structure on the surface thereof. A supercritical fluid is used to carry a precursor of a functional material for the precursor to form a the reaction equilibrium with the substrate in a high pressure container. Next, the pressure is relieved at a suitable rate, and the CO2 supercritical fluid correspondingly forms a vaporization reaction, thereby enabling the precursor to be dispersed and adhered on the surface of the substrate to form a material with a nanometric functional structure on its surface. Together with a method for growing a nanometric filament by a repetitive vapor-liquid-solid procedure, a one-dimensional and two-dimensional composite nanometric functional filament structure is produced.
Patent TW-594033-B (TW)
Title: An in-car intrusion detection system
Inventor: SASAKI YOSHIHIRO
IPC: B60R25/31
Filed: 2002-11-28
Granted: 2004-06-21
Abstract: In an in-car intrusion detection system for detecting intrusion into a car, based on a reflection of a transmitted wave which had been sent into the car and then reflected by an object in the car, the system does not detect an intrusion when the level of said reflected wave becomes higher than a second level which is higher than a first level within a predetermined period of time after the level of said reflected wave exceeds said first level.
Patent TW-I255525-B (TW)
Title: Method of bonding and transferring a material to form a semiconductor device
Inventor: JONES ROBERT E
IPC: H01L21/20
Filed: 2002-12-16
Granted: 2006-05-21
Abstract: A donor substrate (12) which is patterned to include a donor mesa (18) is bonded to a receiving substrate (20). In a one embodiment, a bulk portion of the donor substrate is removed while leaving a transferred layer (26) bonded to the receiving substrate. The transferred layer is a layer of material transferred from the donor mesa. A portion of receiving substrate can be processed to form a recess (27, 28, or 32) to receive the donor mesa. Alternatively, the transferred layer can be formed over a dummy feature (46) formed on the receiving substrate, either with or without the use of mesas on the donor substrate. In a preferred embodiment, the transferred layer is used to form an optical device such as a photodetector in a semiconductor device. With the invention, bonding can be achieved despite having a non-planar surface on the receiving substrate.
Patent TW-594158-B (TW)
Title: Structure of liquid crystal display and manufacture method thereof
Inventor: LEE YU-CHI
IPC: G02F1/133
Filed: 2003-01-06
Granted: 2004-06-21
Abstract: A structure of liquid crystal display and manufacture method thereof are described. The liquid crystal display is manufactured by a one-drop fill process. The display comprises a first substrate, a second substrate, a conductive pattern layer, a black matrix layer, a liquid crystal layer and an ultraviolet type of seal glue. The metal pattern layer is made of indium tin oxide and formed on the first substrate. Therefore, the metal pattern layer is a transparent layer allowed the ultraviolet light passing through. The ultraviolet type of seal glue is pro-cured by the ultraviolet light from the first substrate direction to the seal glue, and then cured by a heating process. Hence, the liquid crystal pollution problem is reduced.
Patent TW-I263303-B (TW)
Title: Manufacturing method of semiconductor device
Inventor: KUDO HIROSHI
IPC: H01L21/3065
Filed: 2003-01-15
Granted: 2006-10-01
Abstract: The purpose of the invention is to prevent from the occurrence of recessing inward and trench in the dual metal damanscene method. For the semiconductor device having the manufacturing process of the cross section structure shown in figure 2(A), one part of the copper film (26) is oxidized to form oxide (43) as shown in figure 2(B) where an etching process is conducted onto silicon nitride and is followed by depositing CFx deposition (44) on top of the oxide (43). However, by using hydrogen plasma to etch the organic insulation film as shown in figure 2(C), the oxide (43) is reduced to form copper. In addition, the CFx deposition is changed into the volatile compound and can be removed.
Patent TW-I285696-B (TW)
Title: Elastic nonwoven sheet
Inventor: MARTIN KENNETH E
IPC: B32B5/04
Filed: 2003-04-15
Granted: 2007-08-21
Abstract: This invention relates to stretchable nonwoven sheets prepared by substantially uniformly impregnating a necked nonwoven substrate with an elastomeric polymer by treatment with an elastomeric polymer solution. The nonwoven sheet is useful in the manufacture of diapers and other hygiene articles.
Patent TW-I258644-B (TW)
Title: Electric charge control agent
Inventor: UENO RYUZO
IPC: C07C235/46
Filed: 2003-04-23
Granted: 2006-07-21
Abstract: The present invention provides a safe electric charge control agent with excellent negative chargeability, which is readily dispersed and soluble in the binder resin, and it also can be used as a color toner. Specifically, the present invention provides an electric charge control agent comprising the naphthol derivatives represented by formula (1) and their salts, as well as a toner containing said electric charge control agent for electric photos.
Patent TW-I265789-B (TW)
Title: Method of modified atmosphere storage by utilizing microorganism
Inventor: CHENG CHING-CHING
IPC: A23L3/00
Filed: 2003-04-30
Granted: 2006-11-11
Abstract: This invention relates to a method of modified atmosphere storage by utilizing microorganism. Air composition in a package container can be altered by carbon dioxide generated by carbohydrate fermentation through microorganism metabolism. The steps comprise (a) preparing hydrocarbon into an aqueous solution; (b) adding an adequate amount of microorganism into the aqueous solution of the step (a); (c) performing a reaction in the aqueous solution of the step (b) at an adequate temperature; and (d) introducing the gas generated in the step (c) into a package container. Alternatively, the aqueous solution of the step (b) can be wrapped by a material that is gas-permeable but not water-permeable, which is then placed into a package container requiring modified atmosphere storage so that modified atmosphere storage can be conducted.