baber/WOPTO huggingface dataset:
Patent JP-2013169461-A (JP)
Title: Micro current generator
Inventor: TAKASHIMA HIROO
IPC: A61N1/20
Filed: 2012-02-22
Abstract: PROBLEM TO BE SOLVED: To provide a current micro limiter allowing the use of electricity flowing to the skin with intensity to the extent of not surprising a user to improve the capacity of eyes, a brain, etc.SOLUTION: A current micro limiter is adapted to change an alternating current into a direct current, to use the current at 0.1 W or less and to apply the end of a line connected to a positive pole, to the skin for use. The current micro limiter includes a circuit that connects a socket 1, a diode 2, a capacitor 4, a transformer 14, a bulb 17, etc. When an alternating current flows through the socket 1, a positive pole 10 and a negative pole 11 of a direct current are formed, and the end of an extension line of the positive pole 10 is applied to the skin for use.
Patent JP-2013189307-A (JP)
Title: Carrier device and substrate processing apparatus
Inventor: HORI MASAKAZU
IPC: H01L21/677
Filed: 2012-03-15
Abstract: PROBLEM TO BE SOLVED: To provide a carrier device capable of more efficiently performing drying treatment for a substrate, and a substrate processing apparatus.SOLUTION: A carrier device 30 for carrying a strip-shaped sheet substrate FB includes: a guide roller GR which guides the sheet substrate FB; a winding mechanism 80 for winding the sheet substrate FB around the guide roller GR more than once; and a heater HT which heats the guide roller GR. This enables drying treatment to be performed for the sheet substrate FB in a process in which the sheet substrate FB is carried. Consequently, the drying treatment can be more efficiently performed for the substrate without the need for separate provision of a drying device.
Patent JP-2013196758-A (JP)
Title: Led lighting device and illuminating fixture
Inventor: OTAKE HIROKAZU
IPC: H05B37/02
Filed: 2012-03-15
Abstract: PROBLEM TO BE SOLVED: To provide an LED lighting device capable of detecting arcs with certainty, and protecting a light source part with certainty.SOLUTION: A DC power supply device 22 has a pair of output lines 38 and 39. A light source part 16 has a pair of power lines 35 and 36 connected to the pair of output lines 38 and 39 of the DC power supply device 22 while being substantially short-circuited. The light source part 16 has a light-emitting diode D electrically connected between the power lines 35 and 36, and emitting light by a DC current outputted from the DC power supply device 22. A detection circuit 23 has a detection line 45 electrically connected to the power line 35 of the light source part 16, and detects arcs on the basis of a potential difference between the output line 38 and the power line 35, and a predetermined reference potential. A protection circuit 24 reduces or stops an output of the DC power supply device 22 when the detection circuit 23 detects arcs.
Patent JP-2013195088-A (JP)
Title: Inspection device, inspection method, and device manufacturing method
Inventor: FUKAZAWA KAZUHIKO
IPC: H01L21/66
Filed: 2012-03-15
Abstract: PROBLEM TO BE SOLVED: To provide an inspection device capable of measuring processing conditions of a device pattern.SOLUTION: A surface inspection device 1 includes: a stage 15 capable of holding a wafer 10 having a pattern formed on a surface according to predetermined processing conditions; an illumination system 21 for illuminating the surface of the wafer 10; and a detector 30 for detecting a first reference signal which is based on first diffracted light of a predetermined order reflected from the surface of the wafer at a first angle to a normal line of a holding surface 15a of the stage 15 by illumination of the illumination system 21, and a second reference signal which is based on second diffracted light of a predetermined order reflected from the surface of the wafer 10 at a second angle, different from the first angle, to the normal line by the illumination of the illumination system 21. The surface inspection device 1 determines the processing conditions for an inspection pattern formed on the surface of the wafer 10 being an inspection object, on the basis of first data indicating the relationship between known processing conditions and the first reference signal, and second data indicating the relationship between the known processing conditions and the second reference signal.
Patent JP-2013198181-A (JP)
Title: Voltage control method of dynamo-electric generator
Inventor: OZEKI EMIKO
IPC: H02P9/14
Filed: 2012-03-16
Abstract: PROBLEM TO BE SOLVED: To solve the problem that a control loop of an AVR of a dynamo-electric generator causes overshoot and undershoot to be unstable control because of becoming an open loop when changing from start-up to normal control.SOLUTION: During a power generation voltage equal to or lower than voltage corresponding to a set value, an arithmetic result by a field current setter is fixed to a value corresponding to a field current Iof a value smaller than a maximum value of a field current detection range, and an integration term of a voltage control arithmetic part is calculated with a field current detection value. When voltage is equal to or larger than a set voltage value, the calculation of the integration term with the field current detection value in the voltage control arithmetic part is released. In addition, during a rated voltage or below by a rated voltage setter, a limiter upper limit value of the field current control arithmetic part is set to a limiter upper limit value of a ratio of the rated voltage or below, and when being equal to or larger than the rated voltage, the limiter upper limit value of the field current control arithmetic part is set to the limiter upper limit value of the ratio of the rated voltage or above.
Patent JP-2013197770-A (JP)
Title: Image processing device, image processing method, and program
Inventor: HOSAKA HAJIME
IPC: H04N15/00
Filed: 2012-03-19
Abstract: PROBLEM TO BE SOLVED: To make image corrections for two-dimensional image generation used for image generation applied to three-dimensional image display.SOLUTION: An image is input which has a one-eye view point pixel area comprising a left-eye and a right-eye view point image, and a center view point pixel area corresponding to an observed image from the center position between both the eyes, and pixel values of the one-eye view point pixel area are corrected into pixel values having the same luminance and view point position with the center view point pixel area. A direction having high correlation to a pixel to be corrected is detected by referring to circumferential pixels of a one-side view point pixel. When the high-correlation direction is a horizontal direction of the one-eye view point pixel area, a low frequency signal based upon a horizontal pixel having the same color with the corrected pixel and a pixel to be corrected is calculated while a high-frequency signal is calculated by applying a pixel signal of the center view point pixel area adjoining the one-eye view point pixel area included in the pixels to be corrected is calculated, and an addition result of a low frequency signal and the high frequency signal is defined as a corrected pixel value of the pixel to be corrected.
Patent JP-2012114478-A (JP)
Title: Lithographic apparatus and device manufacturing method
Inventor: KEMPER NICOLAAS R
IPC: H01L21/027
Filed: 2012-03-19
Abstract: PROBLEM TO BE SOLVED: To provide a device that effectively removes liquid from a vicinity of a substrate, and does not cause vibration and other disturbance.SOLUTION: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth an uneven flow. A pressure difference of the both ends of the porous member may be maintained at a bubble point or lower of the porous member, thereby a single-phase liquid flow can be obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Patent JP-2012110352-A (JP)
Title: Additive for yeast culture medium
Inventor: SHIMA JUN
IPC: C12N1/16
Filed: 2012-03-21
Abstract: PROBLEM TO BE SOLVED: To provide a yeast culture medium without using a component derived from blackstrap molasses and further identify and synthesize factors to be added to the medium for preparing the yeast culture medium.SOLUTION: The problem is solved by identifying a compound having the following structural formula as a factor for accelerating the proliferation of yeast in the blackstrap molasses. According to the invention, an additive for the yeast culture medium for reinforcing the high sugar dough-fermenting power, a yeast culturing medium, a synthetic medium, a semi-synthetic medium, a method for proliferating bread yeast, a method for producing bread yeast and bread produced by using the same method are provided. Further, according to the invention, the yeast culture medium containing flavonoids is also provided.
Patent JP-2013194198-A (JP)
Title: Epoxy resin composition for sealing semiconductor and semiconductor device using the same
Inventor: IWASHIGE ASAHITO
IPC: C08G59/62
Filed: 2012-03-22
Abstract: PROBLEM TO BE SOLVED: To provide an epoxy resin composition for sealing a semiconductor, which serves as a sealing material capable of yielding a semiconductor device excellent in reliability characteristics to copper wire under high-temperature high-humidity conditions and retains high adhesion to a semiconductor element with a surface treated with a polyimide passivation film.SOLUTION: An epoxy resin composition for sealing a semiconductor comprises (A) an epoxy resin, (B) a phenol resin, (C) an imidazole curing accelerator and (D) an inorganic filler. When a cured product obtained by curing the epoxy resin composition in conditions (x) below and performing a moisture absorption treatment in conditions (y) below is subjected to a dielectric relaxation measurement and a peak of dielectric loss caused by ionic polarization is obtained, the frequency number of the point at which the dielectric loss becomes 0.81±0.05 is ≤25 Hz. Condition (x): performing heat-curing at 175±10°C for 120±40 s and subsequently performing post-cure at 175±10°C for 3±2 h. Condition (y): performing moisture absorption treatment at 130°C×85% RH for 80±30 h.
Patent JP-2013197511-A (JP)
Title: Support base plate, semiconductor device manufacturing method and semiconductor device inspection method
Inventor: EZAKI AKIRA
IPC: H01L21/683
Filed: 2012-03-22
Abstract: PROBLEM TO BE SOLVED: To provide a support base plate, a semiconductor device manufacturing method and a semiconductor device inspection method, which can consistently reinforce a wafer from thinning of the wafer to inspection of electric characteristics of the semiconductor device.SOLUTION: A support base plate according to an embodiment comprises: a first support substrate which has an outer diameter larger than a diameter of a semiconductor substrate and an inner diameter smaller than the diameter of the semiconductor substrate by 2-6 mm; and a second support substrate which has an outer diameter not exceeding the inner diameter of the first support substrate, and in which a plurality of through holes piercing from a surface to a rear face are formed, and which is made of the same material and has the same thickness with the first support substrate.
Patent JP-2013201864-A (JP)
Title: Communication apparatus and home appliance control method and program
Inventor: KITAURA YOSHIHIRO
IPC: H02J13/00
Filed: 2012-03-26
Abstract: PROBLEM TO BE SOLVED: To provide a communication apparatus which, when executing demand control, can notify information relating to that control by a simple method.SOLUTION: A communication apparatus is communicably connected to household appliances installed in a home and a watt-hour meter equipped with communication functions to be able to control the household appliances. The communication apparatus comprises a processor and a communication interface connected to the processor. Using the communication interface, the processor receives a cut-down directive to reduce the in-house power consumption via the watt-hour meter from a power grid on the outside of the house. When executing demand control on the household appliances to reduce the in-house power consumption according to the cut-down directive by using the communication interface, the processor transmits a control directive to the household appliances so that a designated operation pattern which was preset pertaining to the cut-down directive is executed.
Patent JP-2013061624-A (JP)
Title: Activating-light-sensitive or radiation-sensitive resin composition, activating-light-sensitive or radiation-sensitive film using the composition, and method for forming patterns
Inventor: IIZUKA YUSUKE
IPC: G03F7/004
Filed: 2012-03-28
Abstract: PROBLEM TO BE SOLVED: To provide an activating-light-sensitive or radiation-sensitive resin composition capable of improving roughness performance and pattern collapse, an activating-light-sensitive or radiation-sensitive film using the composition, and a method for forming patterns.SOLUTION: The composition includes a resin (A) effected by an acid to increase the solubility to an alkaline development liquid, and compounds (C) expressed by formulae (ZI-3), (ZI-4) and (ZI-5) that produce an acid due to irradiation of an activating light or radiation. The resin (A) includes at least one kind of repeating unit that has a group being decomposed due to acid. A group released by decomposition of the acid decomposable group has a ring structure, the ring structure has a polar group as a substituent, or the ring structure has a polar atom as a part of the ring structure, and the logP value of the compound derived from the release of the releasing group is equal to or larger than 0 and less than 2.8.
Patent JP-2013204726-A (JP)
Title: Vibration damping device
Inventor: YAMAMOTO NORIYUKI
IPC: F16F1/38
Filed: 2012-03-28
Abstract: PROBLEM TO BE SOLVED: To provide a vibration damping device that can suppress intermediate plate members from entangling with each other during blast treatment.SOLUTION: In a part where a slit-like slit part 41 over the whole area in an axis O direction is configured in an intermediate plate member 40, an interval dimension of the slit part 41 is set smaller than a plate thickness dimension of the intermediate plate member 40 so as to prevent a part of another intermediate plate member 40 from being inserted into the slit part 41 of one intermediate plate member 40. As a result, it is possible to suppress the intermediate plate members 40 from entangling with each other via the slit part 41 during blast treatment.
Patent JP-2013203625-A (JP)
Title: Release material for manufacturing silicon crystal ingot, and method for forming release material for manufacturing silicon crystal ingot
Inventor: YOSHIZAWA AKIRA
IPC: C23C24/08
Filed: 2012-03-29
Abstract: PROBLEM TO BE SOLVED: To prevent a release material from exfoliating from a container during growth of a silicon crystal by improving durability against thermal stress of the release material.SOLUTION: Slurry obtained by suspending powder of silicon nitride into aqueous solution including an organic binder is applied onto the inside wall surface of a heat-resistant container, and the slurry applied onto the heat-resistant container is heated and sintered under an inactive atmosphere. In a release material for manufacturing silicon crystal ingot formed in this way, the atomic ratio [C/Si] between carbon and silicon is ≤2.5, and the sintering density of each portion is uniform.
Patent JP-2012221951-A (JP)
Title: Negative electrode material for lithium secondary battery, method for manufacturing the same, negative electrode for lithium secondary battery, and lithium secondary battery
Inventor: SUZUKI KIYOSHI
IPC: C01B31/04
Filed: 2012-03-29
Abstract: PROBLEM TO BE SOLVED: To provide an electrode material for a lithium secondary battery excellent in discharge load characteristics and charge-discharge efficiency, and capable of contributing to a high battery capacity.SOLUTION: A negative electrode material for a lithium secondary battery is composed of spheroidal graphite particles derived from natural flake graphite particles, and the spheroidal graphite particles satisfy all the following requirements (A)-(E). (A) The mean volume diameter (50%D) is equal to or larger than 10 μm and equal to or smaller than 50 μm. (B) The true specific gravity is equal to or higher than 2.22 g/cm. (C) The bulk density is equal to or higher than 0.800 g/cm. (D) The BET specific surface area is equal to or larger than 2.0 m/g and equal to or smaller than 6.0 m/g. (E) The R value (I/I) is equal to or lower than 0.15, where the R value is the ratio of a peak intensity Iat a second peak indicating the maximum intensity in the wave number range of 1350 to 1370 cmto a peak intensity Iat a first peak indicating the maximum intensity in the wave number range of 1580 to 1620 cm, obtained by Raman spectrum analysis using laser light with a wavelength of 532 nm.
Patent JP-2013206432-A (JP)
Title: Image processing device, image processing method and image processing program
Inventor: DOI KAZUMI
IPC: G06T7/00
Filed: 2012-03-29
Abstract: PROBLEM TO BE SOLVED: To appropriately determine a characteristic point pair even if a deviation of two images is not even.SOLUTION: The image processing device includes an extraction unit, a preparation unit and a determination unit. The extraction unit extracts a characteristic point from each of a first image and a second image. The preparation unit prepares, as for each of the characteristic points of the first image and the second image, a characteristic amount matrix associating information about a difference between a luminance value of a pixel in an area and a luminance value of the characteristic point with each area of an elliptic matrix using a first direction to be determined on the basis of the characteristic point and a second direction to be determined on the basis of the first direction as respective axes and centering around the characteristic point. The determination unit compares the characteristic amount matrix of the characteristic point of the first image with the characteristic amount matrix of the characteristic point of the second image, and determines a similar characteristic point pair.
Patent JP-2013209803-A (JP)
Title: Portable workbench
Inventor: ABE TOMOFUMI
IPC: E04G1/34
Filed: 2012-03-30
Abstract: PROBLEM TO BE SOLVED: To provide a portable workbench which can be smoothly elevated and lowered while improving safety.SOLUTION: A portable workbench 1 includes: a work floor 2 in a roughly rectangular plate shape; a ladder-like leg part 3 extended downwards respectively from a pair of short side parts 2a facing each other of the work floor 2, and capable of supporting the work floor at a prescribed height position; and hand hooking rods 4 projected upwards from the leg part 3 corresponding to four corners of the work floor 2. On upper ends of the pair of hand hooking rods 4 provided corresponding to both ends of the respective short side parts 2a of the work floor 2, reporting bars 14 projected to an upper area of the work floor 2 along the short side part 2a of the work floor 2 are provided. The reporting bar 14 is elastic, is deflected so as to allow passing of an operator by being pressed by the operator going up and down between the work floor 2 and the leg part 3, and is restored to the original state of extending along the short side part 2a of the work floor 2 by the operator separating.
Patent JP-2013210554-A (JP)
Title: Evaluation method of retardation film, manufacturing method of retardation film, and retardation film
Inventor: KANBARA KUMIKO
IPC: G02B5/30
Filed: 2012-03-30
Abstract: PROBLEM TO BE SOLVED: To provide an evaluation method of a retardation film which is capable of simply evaluating solvent resistance and reworkability of a retardation film, a manufacturing method of a retardation film which is capable of manufacturing a retardation film superior in solvent resistance and reworkability by using the evaluation method, and a retardation film superior in solvent resistance and reworkability.SOLUTION: The evaluation method of a retardation film includes: a step of preparing a retardation film having an alignment layer and a retardation layer laminated in this order on one surface side of a triacetyl cellulose substrate; a step of dropping a solvent to a surface on the side where the retardation layer is laminated, of the retardation film and measuring the time elapsed until detection of the solvent from a surface on the triacetyl cellulose substrate side of the retardation film to calculate an average solvent penetration time in a laminate comprising the alignment layer and the retardation layer; and a step of evaluating the retardation film on the basis of the calculated average solvent penetration time.
Patent JP-2013213263-A (JP)
Title: Plating apparatus, plating method, and storage medium
Inventor: IWASHITA MITSUAKI
IPC: H01L21/768
Filed: 2012-04-03
Abstract: PROBLEM TO BE SOLVED: To provide a plating apparatus which can form a seed film entirely over a barrier film.SOLUTION: A plating apparatus 20 includes: a cleaning liquid jetting mechanism 44 which jets a cleaning liquid toward a substrate 2; a rinse liquid jetting mechanism 45 which jets a rinse liquid toward the substrate; and a plating liquid jetting mechanism 30 which jets a plating liquid toward the substrate. The rinse liquid jetting mechanism 45 is connected with a rinse liquid supply mechanism 74 which supplies the rinse liquid to the rinse liquid jetting mechanism 45. The rinse liquid supply mechanism 74 is configured to supply a deoxygenated rinse liquid to the rinse liquid jetting mechanism 45.
Patent JP-2013215484-A (JP)
Title: Slot machine
Inventor: OGURA TOSHIO
IPC: A63F5/04
Filed: 2012-04-11
Abstract: PROBLEM TO BE SOLVED: To provide a slot machine capable of changing a player's expectation during the performance of specific presentation and increasing the game entertainment.SOLUTION: A slot machine is configured such that after predictive presentation indicating the expectation of drawing an AT prize is performed, an enemy character is selected to perform presentation of a battle with the enemy character, and whether or not a game is controlled to an AT status is notified of according to whether a friend character defeats the enemy character or is defeated by the enemy character. The predictive presentation is configured to be switched to presentation b in a manner that expectation degree is different according to the timing switching presentation (a) to the presentation b having a higher expectation degree.
Patent JP-2013222256-A (JP)
Title: Energy usage visualization device and method
Inventor: OSAWA NANAHO
IPC: G05B19/418
Filed: 2012-04-13
Abstract: PROBLEM TO BE SOLVED: To grasp when and where waste of energy occurs by using production state information and energy usage information.SOLUTION: An energy usage visualization device includes: an energy usage acquisition part 1 for acquiring energy usage of each device; a production facility information acquisition part 2 for acquiring production state information of each device; a graph creation part 4 for creating a graph of energy usage associated with the production state information of each device; and a parallel display part 5 for performing parallel display of the created graphs following a time axis and the flow of production. Thus, it is possible to grasp when and where waste of energy occurs from the graphs displayed in parallel. Also, it is possible to specify the occurrence factor of the waste of energy, and to analyze tendency following the flow of the production of a manufacturing line.