baber/WOPTO huggingface dataset:
Patent JP-H09316514-A (JP)
Title: Method for estimating carbon and chromium contents in molten steel in converter process of chromium-containing steel and device therefor and method for tapping molten steel thereof
Inventor: WAKATSUKI NOBUAKI
IPC: C21C5/28
Filed: 1996-05-24
Abstract: PROBLEM TO BE SOLVED: To accurately estimate carbon and chromium contents in molten steel after completing oxygen refining and to quickly tap the molten steel containing chromium without waiting the decision of component analyzed values. SOLUTION: A molten iron component analyzing means 23, molten iron wt. detecting means 24, alloy wt. detecting means 25 and molten iron temp. detecting means 26 measure the component analyzed values of the chromium-containing molten iron, molten iron wt., alloy wt. and molten iron temp., respectively and transfer to a calculating means 29. After completing the oxygen refining, a liquidus temp. detecting means 27 and molten steel detecting means 28 measure the liquidus temp. of the molten steel and the bath temp. and transfer to the calculating means 29. The calculating means 29 responds to the output of each means and the estimated values of the carbon and chromium contents in the molten steel after oxygen-refining are obtd. by calculating based on estimating equations stored in a memory 30 and transferred to a display means 31.  The discharging means 31 responds to the output of the calculating means 29 and displays the estimated values on a picture.
Patent JP-S63293948-A (JP)
Title: Forming method for interlayer insulating film
Inventor: MATSUO MUTSUMI
IPC: C23F1/00
Filed: 1987-05-27
Abstract: PURPOSE:To make a contact hole have a gentle inclination, and realize a multilayer interconnection having low resistance contact free from disconnection, by mixing, in a second layer, an element which is easily gasified and eliminated, in order to be turned into the same one-layer interlayer insulating film by heat- treating. CONSTITUTION:On a silicon wafer 8, a first interlayer insulating film 9 is formed, and thereon, a silicon oxide film is deposited by CVD method. A second layer 10 having an etching rate faster than the first layer is formed, by implanting fluorine ion on the whole surface. Then, a resist is spread, a pattern is formed, a contact hole 15 having a gentle inclination is made by applying a hydrofluoric acid system etching liquid, and a first wiring layer 13 is deposited to form a pattern. By heat-treating at a temperature of about 600 deg.C, fluorine is eliminated, and a first interlayer insulating film 17 is formed which is composed of a CVD silicon oxide film having the same film quality. In the similar manner, the first layer 11 and the second layer 12 of a second interlayer insulating film are formed, and a contact hole 16 is made. Next, a second wiring layer 14 is deposited and low resistance contact free from disconnection can be realized.
Patent JP-2000317387-A (JP)
Title: Method for forming anticlouding coating film by drying treatment under supercritical conditions
Inventor: YOSHIDA SHIGEO
IPC: C03C17/28
Filed: 1999-05-11
Abstract: PROBLEM TO BE SOLVED: To form a highly durable anticlouding coating film uniformly even on a base material such as a plastic not suitable for high heat treatment by applying an anticlouding hybrid composition to the base material and drying the coating film under supercritical conditions after it is set to touch. SOLUTION: In order to form an anticlouding coating film, first an anticlouding hybrid composition is applied to the surface of a base material and then the obtained coating film is set to touch. Next a residual solvent (water and an organic solvent) of the coating film is substituted by a supercritical fluid of CO2. In this case, glass, a plastic, a metal or the like can be used as the base material. At least one kind of a functional metal chelate compound and at least one kind of organic polymer containing a carboxylic group or a hydroxyl group are added to a moisture-containing organic solvent to obtain the anticlouding hybrid composition. Further, CO2 is made to flow over the surface of the coating film at temperatures of 31.1-80 deg.C and under atmospheric pressures of 100-200 atm as drying treatment procedures.
Patent JP-H07333838-A (JP)
Title: Rubber based photoresist composition
Inventor: TOMIZAWA SHIGERU
IPC: G03F7/004
Filed: 1994-06-13
Abstract: PURPOSE:To attain a uniform coating film thickness even when a large-sized substrate or a square mounted substrate is spin-coated with a rubber based photoresist compsn. by incorporating a solvent whose b.p. is within a specified range into the solvent of the compsn. CONSTITUTION:This rubber based photoresist compsn. is based on cyclized rubber and the solvent contains a solvent whose b.p. is within the range of 150-220 deg.C. In the case of <150 deg.C b.p., the difference in b.p. between the solvent and xylene is small and uniformity in coating film thickness is not attained. In the case of >220 deg.C b.p., the solvent remains in a thin film in a large quantity at the time of prebaking. The solvent, of this compsn. preferably contains 5-70wt.% of the solvent having 150-220 deg.C b.p. When xylene is used as the solvent of this compsn., decalin having a low volatility and satisfactory compatibility with xylene is most desirably used as the solvent having 150-220 deg.C b.p.
Patent JP-S62286631-A (JP)
Title: Manufacture of flange for container such as drum can
Inventor: MINEO HIROYUKI
IPC: B21D51/38
Filed: 1986-06-04
Abstract: PURPOSE:To efficiently mass-produce a flange having an excellent quality by pressing a flange bland material consisting of a cylindrical part and a flange part connected to its lower edge, and deforming it so that the cylindrical part is extended to the upper part. CONSTITUTION:A flange blank material 1 consisting of a short cylindrical part 2 and a flange part 2 connected to its lower edge is pressed by a cold forging work, and deformed so that the cylindrical part 2 is extended to the upper part. Subsequently, female screw forming thick wall part 4, an intermediate part which is connected to the upper edge of the thick wall part 4, and also, has the upper outward packing abutting inclined surface 6, and the upper projecting thin wall part 7 which is connected to the upper edge of the intermediate part 5 are formed. Next, the inside periphery of the upper edge part of the thin wall part 7 is brought to a cutting work by a cutting tool 15, and the upper outward inclined surface 8 is formed in the inside of the upper edge part. Thereafter, a female screw 9 is formed on the inside peripheral surface of a female screw forming thick wall part by a thread cutting tool 16, and a flange 10 of an inside screw type is obtained.
Patent JP-H07329420-A (JP)
Title: Thermal recording material
Inventor: AKUTSU MITSUO
IPC: B41M5/337
Filed: 1994-06-13
Abstract: PURPOSE:To prevent the discoloration of a developed color part and a background part by adding a specific hydroxybenzoic acid alkanolamide to a thermal recording layer. CONSTITUTION:At least one kind of a hydroxybenzoic acid alkanolamide derivative represented by formula (R1 is a hydrogen atom, a hydroxyl group, an alkyl group, an alkoxy group, an alkoxycarbonyl group, a halogen atom or a nitro group, R2 is a hydrogen atom, an alkyl group or a hydroxyalkyl group, R3 is a 2-4C alkylene group and m is 1 or 2) is added to a thermal recording layer. The hydroxybenzoic acid alkanolamide derivative is a component used for enhancing storage stability and has coupling properites in a thermal recording material. Therefore, the discoloration of a developed color part and a background part can be prevented.
Patent JP-H0424054-A (JP)
Title: Embroidery data processor
Inventor: SHIMIZU HIDEAKI
IPC: D05B21/00
Filed: 1990-05-21
Abstract: PURPOSE:To enable the quantity of hurriedly stitching data to be reduced, and diminish the capacity of a storage by setting partial candidate points among hurriedly stitching course regulating candidate points according to a plurality of respective blocks, at a hurriedly stitching course regulating point. CONSTITUTION:In an embroidery data processor, on the hurriedly stitching data creating means 2 of the embroidery data processor having an embroidery data creating means 1 and the hurriedly stitching data creating means 2, segments can be drawn without being positionally shifted from a closing area between it and hurriedly stitching starting points, from hurriedly stitching course regulating candidate points according to a plurality of respective blocks separated from the blocks of the set hurriedly stitching starting points, and the hurriedly stitching course regulating candidate points separated longest from the hurriedly stitching starting points are selected, and the hurriedly stitching course regulating candidate points are set at a hurriedly stitching course regulating point by a hurriedly stitching course regulating point setting means 3. when stitching does not yet come to the starting points even if the hurriedly stitching course regulating point is set, then the hurriedly stitching course regulating point is set as the hurriedly stitching starting point, and a following hurriedly stitching course regulating point is set.
Patent JP-H0427410-A (JP)
Title: Air filter
Inventor: SUZUKI HARUAKI
IPC: F24F13/28
Filed: 1990-05-21
Abstract: PURPOSE:To obviate the contamination of the outer side face of an outer frame with an adhesive and to make the appearance of the filter attractive by bonding the edge of a corrugated filter medium and the inner face of the frame into which the edge is inserted with a double coated adhesive tape. CONSTITUTION:A filter medium 11 is firstly corrugated, the first and second spacers 12 and 14 are inserted into the primary side face 13 and secondary side face 15 of the corrugated filter medium 11, and the corrugation of the filter medium 11 is transiently maintained. One side of a double coated adhesive tape 26 is stuck to the inclined surface 20 of the medium 11. The film stuck to the other side of the tape 26 is released to expose the other side 36, the inner side face 24 of the short frame 21 is pressed on the other side 36, and the inclined surface 20 of the medium 11 is fixed to the short frame 21. The edges 17 and 18 of the medium are fixed by a hot melt 23, hence the expansion is restrained, and the deformation of the corrugated medium 11 is prevented.
Patent JP-S5922675-A (JP)
Title: Mandrel provided with applying mechanism of coating agent
Inventor: ISOTANI KEIICHI
IPC: B05C7/02
Filed: 1982-07-27
Abstract: PURPOSE:To heighten efficiency of work and widen range of utilization of products remarkably by attaching a coating mechanism at the tip of a mandrel to form a composite tube and applying coating agent on its inner peripheral face. CONSTITUTION:A coating agent applying mechanism consisting of a thick cylindrical drum 11 having nearly the same diameter with a mandrel 6 is attached to the mandrel 6. A material tape is sent out to the mandrel 6 at a fixed angle and wound spirally to form a cylindrical body. Another material tape is laminated while rotating the cylindrical body, and a composite tube C is formed. At the same time, coating agent is pressed in from a supply nozzle 14, and discharged from several discharge holes through a connecting passage between a supply pipe 15 and a supply passage 12, and inner face of the tube C is coated. Drying of coating agent is accelerated by air discharged between the drum 11 and spindle 7 through an air vent 17.
Patent JP-H06340843-A (JP)
Title: Coating composition
Inventor: TAKESHITA KATSUYOSHI
IPC: C09D163/00
Filed: 1993-06-01
Abstract: PURPOSE:To obtain a coating composition which can give a coating film having good transparency, dyeability and durability and good adhesion to an antireflection film made of an inorganic substance and durability of adhesion. CONSTITUTION:The composition is prepared by using fine inorganic oxide particles of a particle diameter of 1-100mmum, a silane compound having at least one polymerizable reactive group, a polyfunctional polyepoxy compound, a polycarboxylic acid or its anhydride and a hindered amine light stabilizer as the essential components.
Patent JP-H11328835-A (JP)
Title: Motor and hard disk driving device provided with the same motor
Inventor: OBARA RIKURO
IPC: G11B19/20
Filed: 1998-05-14
Abstract: PROBLEM TO BE SOLVED: To provide a motor in which a sure seal function is obtained by improving a seal function by noncontact type sealed structures and which is suitable to the operation of a device HDD and the HDD whose reliability is high. SOLUTION: A double row bearing device 2 is provided with two rows of rolling elements 5a, 5b between a two-stage shaft 3 having a large diameter shaft part 3a and a small diameter shaft part 3b and a sleeve outer ring part 4 enclosing this two-stage shaft 3 and the rolling element for a first row is provided between the outer peripheral rolling groove 7 directly formed on the outer periphery of the large diameter shaft part of the two-stage shaft and the first inner peripheral rolling groove 4a formed on the inner peripheral surface of the sleeve outer ringe and the rolling element for a second row is provided between the outer peripheral rolling groove 6a formed on the outer periphery of the inner ring 6 fitted to the small diameter shaft part of the two-stage shaft and the second inner peripheral rolling groove 4b formed on the inner periphery of the sleeve outer ring and annular  inside sealing plates 13a, 14a and outside sealing plates 13b, 14b are attached to at least one side between the end parts of the sleeve outer ring and the large diameter shaft part at the side of the rolling element for the first row while making the space between the sleeve outer ring and the large diameter shaft part have a labyrinth seal function at the side of the rolling element for the first row.
Patent JP-H05327129-A (JP)
Title: Semiconductor laser device and photo pickup device using the same
Inventor: IKEGAME TETSUO
IPC: H01S5/00
Filed: 1992-05-22
Abstract: PURPOSE:To obtain a semiconductor laser device wherein the manufacturing cost is low, the freedom of shape of a light beam reflecting surface formed on a semiconductor substrate is high, and the device thickness can be reduced. CONSTITUTION:A semiconductor laser chip (laser diode 2) is fixed on a metal base (block 1), and a reflecting surface 3 for reflecting a light beam from the laser chip in the necessary direction is formed on the base. Thereby the freedom of shape of the reflecting surface 3 is increased. By outputting the light beam from a semiconductor laser device via the reflecting surface 3, the size of a device in the light emission direction is reduced. By simplifying the constitution, the manufacturing cost is lowered.
Patent JP-H11293254-A (JP)
Title: Apparatus and process for reductive pyrolytic carbonization of combustible waste
Inventor: ISHIKAWA KAZUYOSHI
IPC: C10B53/00
Filed: 1998-04-06
Abstract: PROBLEM TO BE SOLVED: To treat wastes without causing environmental pollution upon incineration by providing a reduction chamber having double-doors having a structure not permitting simultaneous opening at the inlet and outlet of a carbonization apparatus and filled with nitrogen, filling the carbonization chamber with e.g. heated oxygen-free air to keep the chamber at a specified temperature, and continuously carbonizing combustible wastes moved with e.g. a conveyor system. SOLUTION: Combustible wastes are carbonized by a reduction system instead of incineration. The wastes are fed into the reduction chamber provided at the inlet of the apparatus. The reduction chamber has doors at its outlet and inlet, is filled with nitrogen to establish an oxygen-free state, and the wastes are sent to the carbonization apparatus. The carbonization apparatus is a reduction zone with a combustion gas from petroleum or the like and kept at an inside temperature of 400-500 deg.C. The vaporized waste components are discharged through a duct. The residue in the carbonization apparatus is moved with a conveyor, a turn table, a bucket elevator, or the like, and carbonized by heating for 60-200 min. The carbonized residue is discharged via the reduction chamber on the side of the exit. The char can find utility in soil improvement and water purification.
Patent JP-2000317214-A (JP)
Title: Flocculating and settling device
Inventor: SHIMIZU KAZUHIKO
IPC: B01D21/02
Filed: 1999-05-12
Abstract: PROBLEM TO BE SOLVED: To provide a flocculating and settling device which is low in a production cost and small in installation space, has no intermediate tank, can be subjected to high speed treatment at a settling tank and can efficiently flocculate into flocks of size suitable to be settled with weak agitation force at a flocculating tank. SOLUTION: This device is provided with the flocculating tank 2 for flocculating suspensions in raw water into flocks by adding a flocculating agent and granular powder and agitating with a agitator 11 and the settling tank 3 for settling flocks in the water to be treated introduced from an overflow weir 12 of the tank 2 and separating the flocks from the treated water. The tank 2 having an impeller 11a of the agitator 11 and the overflow weir 12 is designed so that an accompanied coefficient of the water by the impeller is below 0.7, a rising flow rate is 30-100 m/h or/and the height of a moderately flocculating zone 22 is preferably over 0.5 m. The accompanied coefficient of the water by the impeller is defined by the ratio of the number of horizontal revolution of the water to the number of revolution of the impeller.
Patent JP-S62287167-A (JP)
Title: Ac wattmeter
Inventor: KANEKO SEIJI
IPC: G01R21/06
Filed: 1986-06-05
Abstract: PURPOSE:To accurately measure electric power supplied to a load in a state of connection of an electric power source with a load by multiplying the output of a voltage probe by the output of a current probe and eliminating the AC component from the result of multiplication. CONSTITUTION:The voltage impressed across a load 21 by the electric power source 28 is detected by the probe 1 and the current which flows in the load 21 is detected by the probe 22 respectively. If a reactance component is contained in the load 21, the detected voltage signal is obtained by the probe 1 and the detected current signal is obtained by the probe 22 to be supplied to a converter 10, voltage divider 11, converter 23. The signals proportional to the respectively detected signal are multiplied by a multiplier 20 and impressed to a filter 25, where the AC component is eliminated from the multiplication result. The component proportional to effective power is thus supplied to an indicator 27.
Patent JP-H0425837-A (JP)
Title: Photosensitive material processing device
Inventor: KUROKAWA TOSHIO
IPC: G03D3/02
Filed: 1990-05-21
Abstract: PURPOSE:To shorten crossover time and to prevent the carry over of a processing liquid by adopting the structure in which the liquid levels of adjacent processing tanks are respectively specified and a photosensitive material passes between a pair of blades provided on a partition wall. CONSTITUTION:A communicating passage 7 in which the photosensitive material S passes is provided on the partition wall 4 between a preprocessing tank (e.g. a developing tank) and post processing tank (e.g. a bleach/fixing tank) 3 of this device. The communicating passage 7 is liquid tightly shielded by a pair of the blades 8. The liquid level of the tank 2 is set in the position higher than the tight contact surfaces of the thin parts 82 of the blades 8 and the liquid level of the tank 2 is set lower than the above-mentioned tight contact surface. The photosensitive material S passes the communicating passage 7 if this device is constituted in such a manner and, therefore, the route length of the crossover is shortened and since the processing liquid is removed by the thin part 82, the carry over of the processing liquid is decreased. A leaking developer 20 is preferably recovered by providing a trough 9 on the partition wall 4.
Patent JP-S5558342-A (JP)
Title: Manufacture of sintered hard alloy
Inventor: DAIMON MAMORU
IPC: C22F3/02
Filed: 1978-10-26
Abstract: PURPOSE: To obtain a sintered hard alloy with high impact resistance by applying a high energy density heat source to the surface of a sintered hard alloy manufactured by powder metallurgy to facilitate refining of WC grains, etc. as well as to reduce internal deffects such as blow holes.  
     CONSTITUTION: A high energy density heat source such as laser, electron beam or plasma is applied to the surface of a sintered hard alloy manufactured by conventional powder metallurgy and suitable for use as a material for a cutting tool, dies, etc. to remelt the alloy under proper conditions. As a result, internal deffects of the alloy such as fine holes and microcracks are eliminated to enhance the wear resistance, so the tip of a tool made of this alloy is slightly broken in intermittent cutting or hot rolled steel cutting. A throw away tip is also slightly broken owing to a temp. rise in heavy cutting, resulting in a long tool life. In case of throw away, treatment layer 3 may be formed on the rake surface of flank alone of sintered hard alloy 1. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-S61288499-A (JP)
Inventor: SHIMAZAKI SHINJI
IPC: H05K3/46
Filed: 1985-06-17
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S5757872-A (JP)
Title: Mask sputtering method
Inventor: AMEMORI KAZUHIKO
IPC: H01L21/285
Filed: 1980-09-20
Abstract: PURPOSE:To form beautiful metallic film patterns suppressing the spread of patterns by providing photoresist patterns on substrate side, setting a mask on the resist and performing sputtering. CONSTITUTION:Photoresist 5 is beforehand patterned on the surface of a substrate 4 in conformity with the patterns to be subjected to mask sputtering, and a metallic mask 6 is set, thence mask sputtering is carried out. Then, sputter particles enter through the windows of the mask 6, and form sputter films 8 on the substrate 4. If the resist 5 is removed after the film formation, the spread is suppressed and the beautiful patterns of superior electrical insulation between the adjacent patterns are obtained.
Patent JP-S5921514-A (JP)
Title: Manufacture of activated carbon composition
Inventor: MARUMO CHIAKI
IPC: B01J21/18
Filed: 1982-07-27
Abstract: PURPOSE:To manufacture an activated carbon composition having high strength and superior adsorbing power by activating a porous body consisting of fine ceramic powder, synthetic polyvinyl acetal resin and a resin convertible into glassy carbon after calcination in a nonoxidizing atmosphere. CONSTITUTION:A mixture of fine ceramic powder with PVA, phenolic resin and a pore forming material is reacted with a cross-linking agent such as formaldehyde, and the resulting polous body is combined with a resin convertible into glassy carbon by thermal decomposition such as phenolic resin to obtain a composite porous body having continuous pores and contg. 4-25wt% synthetic polyvinyl acetal resin such as polyvinyl formal, 70-90% fine ceramic powder and 5-25% resin convertible into glassy carbon. The composite porous body is calcied at >=1,000 deg.C in a nonoxidizing atmosphere and activated by heating to 500- 1,200 deg.C in an atmosphere of steam or gaseous CO2 to obtain an activated carbon composition having high strength, superior adsorbing power and continuous pores.