baber/WOPTO huggingface dataset:
Patent PT-115225-B (PT)
Title: Método ou metodologia para determinação do estado de maturação de fruta climatérica por ressonância magnética unilateral não invasiva
Inventor: ALEXANDRA MARIA FONSECA CASTELO DIAS DE CARVALHO
IPC: G01N24/08
Filed: 2018-12-21
Abstract: MÉTODO OU METODOLOGIA PARA DESCREVER ESTADOS DE DESENVOLVIMENTO FISIOLÓGICO DE CULTIVARES DE FRUTA CLIMATÉRICA COM APLICABILIDADE NA COLHEITA E NO DOMÍNIO DE PÓS-COLHEITA, BASEANDO-SE EM CONHECIMENTOS DO DOMÍNIO TÉCNICO DE CARACTERIZAÇÃO DE MATERIAIS. ESTA METODOLOGIA CONSISTE NO USO DA DETERMINAÇÃO DA VARIAÇÃO TEMPORAL OU ESPACIAL DE UMA GRANDEZA INFLUENCIADA PELA CAPACIDADE DA FRUTA DE REPARAR DANOS NAS CÉLULAS, POR EXEMPLO A TAXA DE RELAXAÇÃO LONGITUDINAL, OBTIDA POR RESSONÂNCIA MAGNÉTICA NUCLEAR UNILATERAL, OU OUTRO PARÂMETRO DETERMINADO POR OUTRA TÉCNICA DE CARACTERIZAÇÃO DE MATERIAIS. A EVOLUÇÃO DESTA VARIAÇÃO FORNECE INFORMAÇÃO SOBRE A CAPACIDADE DA FRUTA DE RESISTIR A STRESS DE ARMAZENAMENTO, COMO É O CASO DE PERA ROCHA DO OESTE SUBMETIDA A ATMOSFERA CONTROLADA DURANTE VÁRIOS MESES. 0 INTERESSE ECONÓMICO DESTA METODOLOGIA RESIDE NA POSSIBILIDADE DE PREVER ATEMPADAMENTE O MOMENTO ÓTIMO DE COLHEITA E O TEMPO DE ARMAZENAMENTO ATEÉ AO APARECIMENTO DE ACIDENTES FISIOLÓGICOS EM FRUTA CLIMATÉRICA MANTIDA EM DETERMINADAS CONDIÇÕES, MELHORANDO AS CAPACIDADES DE GESTÃO DE PRODUTOS, AUMENTANDO O SEU VALOR COMERCIAL E EVITANDO OU REDUZINDO PERDAS QUE PODEM SER DE GRANDE EXPRESSÃO.
Patent RO-86517-B (RO)
Title: Process for preparing hexahydroisoindolisoquinoleine-6-substituted
Inventor: KORNFELD EDMUND CARL
IPC: A61P25/08
Filed: 1982-03-18
Abstract: 8-dimethylaminomethylene compounds of the formula <CHEM>  wherein R is H, benzyl, (C1-C3)alkyl or allyol; and R<4> and R<5> are independently H or (C1-C3)alkoxy; and  7-oxo-hexahydrobenzo[de]quinolines of the formula <CHEM>  wherein  R<7> is (C1-C3)alkyl, ally, or benzyl; R<4> and R<5> are independently (C1-C3)alkoxy, or H, with the limitation that when R<4> and R<5> are both (C1-C3)alkoxy, then R<7> can not be methyl; are intermediates useful in the preparation of 6-substituted hexahydroindazolo or hexahydroisoindolo isoquinolines, having dopamine agonist and dopamine antagonist activity.
Patent TW-214612-B (TW)
Title: A production method for high density high speed read-only memory
Inventor: YANG MING-TZONG
IPC: H01L31/042
Filed: 1993-05-31
Granted: 1993-10-11
Abstract: A production method for high density high speed read-only memory, which comprises the steps of: proceeding on the base a collective pole mask and implanting to form a collective pole area; precipitating the contact area oxidation layer; precipitating a silicon nitride layer and etching the layer into alternate silicon nitride construction; in the area corresponding to the adjacent silicon nitride, letting the contact area oxidation layer grow into a field oxidation layer; removing silicon nitride; covering base mask and proceeding ion implantation to form base pole area in adjacent field oxidation layers; growing a thin oxidation layer above each base pole area; covering emmiter opening first mask (first coding mask); corresponding to the base area which is to be channeled through, proceeding with thin oxidation layer etching; precipitating first composite silicon wafer; proceeding with ion dope on the first composite silicon to form emmiter area; precipitating oxidation layer/first composite silicon mask/oxidation layer etching and etching the first composite silicon wafer and accordingly forming interval odd numbered bit lines; precipitating/etching the oxidation layer to form oxidation layer on the surrounding of each composite silicon bit lines; on the interval area adjacent to the odd numbered bit lines, growing second thin oxidation layer above each exposed base pole area; covering emmiter opening second mask (second coding mask); corresponding to the base area which is to be channeled through, proceeding with second thin oxidation layer etching; precipitating second composite silicon wafer; proceeding with ion dope on the second composite silicon to form emmiter area; second composite silicon mask/second composite silicon wafer etching and accordingly forming interval odd numbered bit lines; through above two emmiter opening mask and related processes to separately form dual polarity ROM with odd numbered bit lines and even numbered bit lines, which are inserted between odd numbered bit lines.
Patent TW-262471-B (TW)
IPC: A61K31/421
Filed: 1993-10-02
Granted: 1995-11-11
Abstract: PCT No. PCT/FR93/00968 Sec. 371 Date Apr. 4, 1995 Sec. 102(e) Date Apr. 4, 1995 PCT Filed Oct. 4, 1993 PCT Pub. No. WO94/07878 PCT Pub. Date Apr. 14, 1994Method of preparing taxane derivatives of general formula (I) by esterification of protected baccatine III or 10-deacetyl-baccatine III by means of an acid of general formula (VII), deprotection of the side chain and elimination of the hydroxy function protection groupings. In general formulae (I) and (VII): Ar stands for aryl, R is hydrogen or acetyl, R1 is benzoyl or R2-O-CO- in which R2 is alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkenyl, bicycloalkyl, phenyl or heterocyclyl, and R3 is hydrogen, alkoxy, optionally substituted aryl.    <IMAGE>  (I)   <IMAGE>  (VII)
Patent TW-272352-B (TW)
Title: A packing method for setting a die on printed circuit boards
Inventor: SHEEN MING-DONG
IPC: H01L23/28
Filed: 1993-11-10
Granted: 1996-03-11
Abstract: A packing method for setting a die onto printed circuit boards, comprises the following steps: providing with a die, on which there are pads for bonding with leads of other circuits; and providing with at least one piece of printed circuit board for shaping a pit after stacking up. The die can be set in the pit inversely so as to expose upward its pads of the center array. The pads then can be welded togather with leads of outside circuit and be coated with gluey layer for protection after the die has been fixed.
Patent TW-261694-B (TW)
Title: Stress free field oxide process of integrated circuit
Inventor: LU HUOO-TIEE
IPC: H01L21/76
Filed: 1994-04-22
Granted: 1995-11-01
Abstract: A stress free field oxide process of integrated circuit includes the following steps: (1) supplying one substrate; (2) forming one pad oxide on the substrate surface; (3) etching the specified area of pad oxide till the substrate bottom for forming opening to expose the substrate area on which field oxide will be formed; (4) with the pad oxide as mask etching the substrate to form one deep trench in the opening; (5) depositing one Si3N4 layer on the pad oxide surface and in the trench; (6) depositing one Al-Si alloy layer covering on the Si3N4 layer; (7) etching off the Al-Si alloy layer, thereby forming multiple silicon nodules on the Si3N4 layer surface; (8) oxidizing the silicon nodules to form multiple SiO2 nodules; (9) with the SiO2 nodules as mask etching the Si3N4 layer and the substrate part uncovered by the pad oxide, used for forming multiple Si pillars in the opening of the substrate; (10) through those Si pillar gaps implanting selectively ion into the substrate to form channel stop layer; (11) oxidizing those Si pillars into SiO2 in which the increased volume by oxidization compensates those Si pillar gaps and the trench depth, constituting one flat field oxide area; (12) removing those SiO2 nodules, the Si3N4 layer and the pad oxide layer to complete stress free field oxide area of the integrated circuit.
Patent TW-294818-B (TW)
Title: Method of positioning and constructing the electron gun in the CRT
Inventor: CHEN GWO-JENG
IPC: H01J29/82
Filed: 1994-09-12
Granted: 1997-01-01
Abstract: A method of positioning and constructing the electron gun for the CRT includes the electron gun, the convergence cup, the elastic flakes, the air-capturing ring, and the support of the air-capturing ring. The electron gun has a gun set at the rear part and a convergence cup in the front part near the CRT screen. The cathode and the plural number of electron-pole slices are aligned to the gun set and fixed by a pair of glass rods. The convergence cup is arranged in front of the electron gun. Plural number of elastic flakes and the support of the air-capturing ring were soldered around the outside of the convergence cup. The air-capturing ring is then soldered on the support of the air-capturing ring and located in the awl tube of the CRT. The elastic flakes are arranged symmetrically to the center axis with equal space. These flakes can be made of various thickness or different materials such that the force produced by elastic flakes can be used to balance the force produced by the air-capturing ring.
Patent TW-270224-B (TW)
Title: Probe apparatus
Inventor: SANO KUNIO
IPC: H01L21/66
Filed: 1994-09-21
Granted: 1996-02-11
Abstract: A probe apparatus, which is used to check the electrical properties of articles with multiple electrode packings and comprises: a working table with table surface for placement of the article; a wiring plate installed on the working table which comprises a base, which is supported by the frame of the probe apparatus and has high rigidity, and plate wires which are installed on the base and electrically connected to the tester; a probe card supported by the wiring plate which comprises flexible and insulative membrane and flexible card wires formed on the membrane and electrically connected to the plate wires of the wiring plate; in which the probe card has a main area, which is installed corresponding to the front side of the table surface for separately contacting the multiple contact elements of the electrode packings of the article, and contact elements electrically connected to the card wires; an installation element which is used to install the probe card on the wiring plate; an expandable chamber installed behind the main area of the probe card; a supply element which supplies fluid to the expandable chamber; a discharge element which discharges fluid from the expandable chamber; a rigid flat plate installed between the expandable chamber and the main area of the probe card in which all contact elements are located within the contour of the flat plate.
Patent TW-328939-B (TW)
Title: Process for preparation of sulfur by selective-oxidation of hydrogen sulfide in the presence of iron based catalysts
Inventor: LII GWO-JEN
IPC: C01B17/20
Filed: 1995-09-07
Granted: 1998-04-01
Abstract: A process for preparation of sulfur of selectively oxidizing hydrogen sulfide to elemental sulfur, in which a H2S-containing gas mixture contacts with an oxygen-containing gas at 50~400 deg.C in the presence of an iron-based catalyst. The reaction product mixture contains substantially no sulfur dioxide. The iron-based catalyst, in addition to iron atom, further contains a promoter of cerium, tin, or antimony.
Patent TW-412577-B (TW)
Title: Stencil printing emulsion ink of water-in-oil type
Inventor: OKUDA SADANAO
IPC: C09D11/00
Filed: 1995-10-04
Granted: 2000-11-21
Abstract: A stencil printing emulsion ink of a water-in-oil type is disclosed which contains in an oil phase 1 to 50 % by weight, based on the weight of a water phase, of a volatile solvent having a distillation starting temperature of 275 DEG C or higher and having a viscosity of 10 mm<2>/s  40 DEG C or less, and has a weight ratio of the oil phase/water phase of 20 to 50/80 to 50.
Patent TW-280907-B (TW)
Title: Counter-balance for disk texturizing apparatus
Inventor: JON A HOSHIZAKI
IPC: B24B41/06
Filed: 1995-10-19
Granted: 1996-07-11
Abstract: An apparatus and method is disclosed for texturizing magnetic storage disks in which the vibration due to forces imparted by oscillating motion is greatly decreased. Typically, the oscillating motion is caused by an oscillating spindle assembly which is slidably mounted on a base. The disclosed apparatus and method utilizes a counter-balance slidably mounted to the base which is caused to move in an opposite direction to the oscillating assembly. The apparatus uses a mechanical linkage which includes a yoke attached to the oscillating assembly, and a pulley and cable arrangement, attached to the counter-balance.
Patent TW-505706-B (TW)
Title: Method of forming minute pattern in metal workpiece
Inventor: KANG SEUNG-OUN
IPC: C25F3/14
Filed: 1996-03-11
Granted: 2002-10-11
Abstract: A method of forming a minute pattern in a metal workpiece uses a photolithography process and an electro-chemical etching process, thereby providing several benefits: (a) the electro-chemical etching does not generate heat, so that oxidation can be prevented; (b) various minute patterns as well as a circle can be easily manufactured; (c) the process is performed by readily available equipment according to a simple principle, so that product cost can be reduced due to the simplified manufacturing process; and (d) equal-sized openings are formed on both sides of the workpiece. Here, it should be especially appreciated that various minute patterns can be easily manufactured as desired, using the photolithography process and the electro-chemical etching process.
Patent TW-387946-B (TW)
Title: Continuous pickling tank with expandable seals
Inventor: PUGH WILLIAM H
IPC: C09K3/10
Filed: 1996-07-13
Granted: 2000-04-21
Abstract: The present invention discoloses a continuous, shallow bath plastic picking tank for carbon or stainless steel strip or product. The present invention provides first and second end stands spaced from each other and secured to foundation with a trough extending between the end stands anchored at the center and adapted to receive a pickling acid therein. An expandable seal according to the present invention couples each end stand with the trough with the seal specifically allowing for the thermal expansion of the trough relative to the stands while prohibiting the escape of pickling acid or fumes. The invention includes a deivce to allow for cleaning of the seal with cleaning fluid such as flushing water.
Patent TW-567187-B (TW)
Title: Peptidyl heterocycles useful in the treatment of thrombin related disorders
Inventor: COSTANZO MICHAEL J
IPC: C07D417/06
Filed: 1996-07-08
Granted: 2003-12-21
Abstract: A compounds of the formula I, useful in the treatment of thrombin and trypsin related disorders.
Patent TW-367326-B (TW)
Title: Pyrimidine derivative, process for the preparation thereof and a pharmaceutical composition containing same
Inventor: NOBBS MALCOLM STUART
IPC: A61P25/04
Filed: 1996-09-05
Granted: 1999-08-21
Abstract: A pyrimidine of formula (I) which is pharmaceutically acceptable acid addition salts thereof are useful as analgesics, as anticonvulsants or in the treatment of irritable bowel syndrome or bipolar disorder.
Patent TW-334660-B (TW)
Title: Full CMOS auto-frequency micro-control bias controller IC
Inventor: JANG YIH-LONG
IPC: H04N3/16
Filed: 1996-10-18
Granted: 1998-06-21
Abstract: A methos by combining two ICs of CMOS micro-controller on multi-frequency monitor and auto-frequency bias controller with bipolar analogy design into single chip IC.This method is by changing auto-frequency bias controller with bipolar analogy design into IC designed by CMOS technology.It should consider cost and quality. The vertocal bias controller of CMOS auto-frequency bias controller is designed by using digital way , and the horizontal bias controller is designed by using analogy way.The bias controller has same CMOS process with micro-controller , therefore ,both can combine into single chip IC.
Patent TW-372952-B (TW)
Title: Process for dehydrocyclization of a diaryl compound
Inventor: POGUE RANDALL F
IPC: C07C43/275
Filed: 1997-01-08
Granted: 1999-11-01
Abstract: A process for dehydrocyclization of diaryl compounds of the formula: Ar-X-Ar', to corresponding tricyclic product, wherein x is CR'R", O or NR; Ar and Ar' were substituted or unsubstituted monocyclic or polycyclic aromatic rings and R, R', R" and substituents on the Ar and Ar' rings were selected independently from H and hydrocarbyl of 1 to 20 carbon atoms; provided that each of Ar and Ar' has a hydrogen at the position ortho to X; comprising heating the diaryl compound in the liquid phase at an elevated temperature in the presence of a supported metal catalyst comprising at least one group VIII metal for a time sufficient to accomplish ring closure. There is also a gas phase process for dehydrocyclization diaryl compounds where the diaryl compound is heated, for a time sufficient to accomplish ring closure, to an elevated temperature in the gas phase in the presence of a metal catalyst comprising at least one group VIII metal, supported on a non-carbonaceous or non-siliceous support.
Patent TW-379479-B (TW)
Title: Tuned amplifier
Inventor: NAKANISHI TSUTOMU
IPC: H03G3/30
Filed: 1997-03-10
Granted: 2000-01-11
Abstract: A tuned amplifier which has no changes of gain in case of frequency changes can tune and amplify the signal amplitudes. A tuned amplifier (1) includes an oscillator (10) which includes amplifier (11) and a feedback circuit (12), an input circuit which inputs the signal to the oscillator (10), and an auto gain control circuit (16) which controls output amplitude of the oscillator (10). The tuning operation which passed only the signal near around the oscillatory frequency is performed by inputting the signal through the input circuit (14) when the oscillator is in action.
Patent TW-350806-B (TW)
Title: Nail puncher
Inventor: RAMELLA ANGELO
IPC: B25C1/00
Filed: 1997-05-02
Granted: 1999-01-21
Abstract: A sort of nail puncher, having a conveyor (7) for band-type cartridge (11), where elements (12) of fixed interval (A), conveyor (7) having the front end (8) and a twin-arm conveyor joystick (13) swinging on the front end (8), with the front end (8) being parallel to the casing cover (1) for movement in the punching direction and a guiding channel (10), with the first joystick arm (14) of the twin-arm conveyor joystick (13) with a cartridge (11) and a swinging handle (16), while the second joystick arm (15) and the casing cover (1) baffle (2) for the casing cover (1) baffle (2) and the twin-arm conveying joystick (13) second joystick arm (15) containing a swinging one-arm conveying joystick (22) for shift in one path, which equals at least the conveying strip of the twin-arm joystick (13), and the one-arm conveying joystick (22) available on the front end (8) for compensation of the shift created by the punching of the spring (23).
Patent TW-386116-B (TW)
Title: Filaments of polyester and process for fabrication of filament of polyester
Inventor: BOUQUEREL FRANCK
IPC: D01F6/62
Filed: 1997-07-15
Granted: 2000-04-01
Abstract: The invention discloses semicrystallic polyester filaments and method for manufacturing same. The polyester is polyethylene glycol terephthalate or polyethylene glycol isonaphthalate having high mechanical properties, and a method for stretching polyester filaments. It is obtained by a stretching process comprising two steps including a first step in which a low stretching ratio is applied, to cause minimal crystallization of the polymer and, a second step with a high stretching ratio. The global stretching ratio can reach values higher than 12. The filament has in particular an expanded elastic range that enables the improvement of its useful properties, for instance for manufacturing screen printing grids.
Patent TW-385434-B (TW)
Title: Compound-playback apparatus
Inventor: OCHIAI YOSHIO
IPC: G10H1/36
Filed: 1997-09-25
Granted: 2000-03-21
Abstract: A compound- playback apparatus is provided which is capable of making playback reservation in respect to both video tapes and VCDs, capable of adding the next reservation while a reservation playback is being executed, and which is structure in such a way that a lyrics caption section is not blocked out while the reservation screen is being displayed. The compound-playback apparatus includes a tape-playback control device for controlling the playback of magnetic recording tapes, a compact-disk playback control device for controlling the playback of compact disks, and a main control device for controlling the tape-playback control device and the compact-disk playback device, with a playback reservation device for making reservation of the playback sequence of the recorded contents in respect of video tapes and VCDs being provided in the main control device.
Patent TW-362123-B (TW)
Title: Cleaning method for sullage in the drainage
Inventor: LIU REN-RUI
IPC: E03F7/10
Filed: 1997-11-03
Granted: 1999-06-21
Abstract: A kind of cleaning method for sullage in the drainage which includes the preparation, drilling, installation and cleaning steps. There are also the windlass, guiding machine, extractor, drilling machine and filter tank. The windlass is dragging the dragline and let it down into the drainage and agitate the sullage and extract the effluent into the filter tank, then circumfluence to the drainage. This provides a convenient and rapid cleaning method for sullage in the drainage.
Patent TW-368723-B (TW)
Title: Shallow trench isolation process for integrated circuit
Inventor: LIN CHIEN-TING
IPC: H01L21/76
Filed: 1997-11-14
Granted: 1999-09-01
Abstract: The invention relates to a kind of shallow trench isolation process for integrated circuit which is used to improve the kink's effect and increase the quality of gate oxide. The method is that forming a sacrificed oxide on the substrate; proceeding channel ion implantation and well ion implantation on the substrate; removing the sacrificed oxide; forming gate oxide, a first polycide metal layer and a silicon nitride layer on the substrate; defining the component and etching a trench deep into the substrate; removing photoresistant mask and filled oxide in the trench with high density plasma; employing chemical mechanical polishing to polish the oxide; removing silicon nitride layer and depositing the second polycide metal layer; forming the gate and source/drain and proceeding the metalization process and accomplishing the manufacturing of components.
Patent TW-385519-B (TW)
Title: Method for forming shallow trench isolation in integrated circuit
Inventor: SU JAU-SHIN
IPC: H01L21/76
Filed: 1997-12-05
Granted: 2000-03-21
Abstract: A method for forming the shallow trench isolation in integrated circuit is provided. First, a first silicon oxide layer and a nitride silicon layer are formed on the substrate, and they are defined to form a shallow trench region. Then a sidewall is formed at the shallow trench region. By using the first oxide silicon layer, the nitride silicon layer and the sidewall as a hard mask, the semiconductor substrate is etched to make a shallow trench and then processes a thermal oxidation step. Then a second silicon oxide layer is deposited to fill the shallow trench up, and the planarization process is proceeded by chemical mechanical polishing method. After nitride silicon layer is removed, part of the second oxide silicon layer, the sidewall and the first oxide silicon layer are then removed.
Patent TW-413816-B (TW)
Title: Semiconductor memory device
Inventor: MATSUURA YOSHIAKI
IPC: G11C11/412
Filed: 1997-12-15
Granted: 2000-12-01
Abstract: In a semiconductor memory device including a plurality of memory cells, in which when an address of any one of the memory cells is input, data is read out from the memory cell corresponding to the address so as to be output, the semiconductor memory device includes null addresses having no corresponding memory cells; and predetermined data is output in response to input of the null addresses.
Patent TW-568907-B (TW)
Title: Imidazo pyridine derivatives for inhibition of gastric acid secretion
Inventor: AMIN KOSRAT
IPC: C07D235/00
Filed: 1998-02-17
Granted: 2004-01-01
Abstract: The present invention relates to imidazo pyridine derivatives of the formula (I), in which the phenyl moiety is substituted with lower alkyl in 2- and 6-position, which inhibit exogenously or endogenously stimulated gastric acid secretion and thus can be used in the prevention and treatment of gastrointestinal inflammatory diseases.