baber/WOPTO huggingface dataset:
Patent JP-H02230702-A (JP)
Title: Method and circuit for current control
Inventor: ANSONII TOOMASU HAAKONBU
IPC: H01H47/04
Filed: 1989-12-21
Abstract: PURPOSE: To improve the operation of an actuator by a method wherein a current, which is made to flow through a solenoid, is corrected between the peak value of the current and the changeover from the current of the peak value to a holding current. CONSTITUTION: When switches SW1 and SW2 receive a control pulse, they are closed so that a winding wire 13 is directly connected with a power terminal. A current, which is made to flow through a solenoid, is rapidly increased and when the peak current value IP of the current is sensed at the end of a period A, the switch SW1 is turned on and a diode D1 acts as a flywheel diode so that a current, which is made to flow through the winding wire, is attenuated at a low speed. The switch SW2 is opened at the end of a period B, both diodes are made to have continuity with each other, the current is rapidly attenuated and the energy of the winding wire is returned to a power supply.  Both switches are turned off at the end of a period D, winding wire is again connected with the power supply so that the current is rapidly increased and when the hold value IH of the current is detected at the end of a period E, the switch SW2 is opened and a current control unit 17 starts action.
Patent JP-H11157821-A (JP)
Title: Activated carbon and its production
Inventor: IMAMURA RYOHEI
IPC: D01F9/14
Filed: 1997-12-03
Abstract: PROBLEM TO BE SOLVED: To produce the activated carbon capable of being effectively applied not only to conventional application but also for removing an absorbed component having a relatively high mol.wt. at a liq. phase and vapor phase and to provide a producing method capable of producing the activated carbon having a high specific surface area and a remarkably developed mesopore by an industrially extremely favorable method. SOLUTION: This activated carbon has the BET specific surface area of >=1,000 m<2> /g and a mesopore narrow pore volume of >=80 mm<3> /g. In the production method of the activated carbon, a phosphorus component-containing activated carbon precursor org. matter is prepared by allowing an organophosphorus compd. to react with the org. compd. reactive with the former compd, then a carbonated material is obtained by burning and carbonizing the precursor org. matter, then the carbonized material is subjected to activating treatment with steam at >=700 deg.C to obtain a reaction consumption ratio of the carbonizing material of >=30 wt.% and to obtain the activated carbon having a residual phosphorus component of <=1.0 wt.% expressed in terms of phosphorus.
Patent JP-H10163179-A (JP)
Title: Method of dry-etching platinum
Inventor: MASHITA KIMIKO
IPC: H01L21/3065
Filed: 1996-11-29
Abstract: PROBLEM TO BE SOLVED: To prevent generation of residue after etching and side wall deposit, by using gas containing at least chlorine, and CO gas or CO2 gas, as etching gas. SOLUTION: An mixed gas of Cl2 gas and CO gas is used as etching gas. The Cl2 gas is introduced in a vacuum chamber at a flow rate of 30sccm, and the CO gas is introduced in the vacuum chamber at a flow rate of 20sccm. The pressure of the vacuum chamber is set to be 0.26Pa. Source power of 500W is supplied to an antenna, and substrate bias power of 100W is supplied to a substrate holder. Under the above condition, a Pt film 16 and a TiN film 14 are etched in a batch. After that, a resist mask 18 is eliminated by ashing. As a result, etching residue is not left on the Pt film 16, and deposit films are not observed on pattern side walls of the Pt film 16 and the TiN film 14.
Patent JP-2001156062-A (JP)
Title: Semiconductor device and its manufacturing method
Inventor: MATSUZAKI KAZUO
IPC: H01L21/318
Filed: 1999-11-24
Abstract: PROBLEM TO BE SOLVED: To provide a surface protection film for semiconductor devices which is superior in water penetration resistance and etching resistance and not vulnerable to electric influences of impurity ions intruding from the outside. SOLUTION: A first oxide film is formed on an IC substrate 1, an SiO2 grain film having a high porosity is formed on the first oxide film, and a second oxide film and an NiO are formed on the SiO2 grain film. Owing to the SiO2 grain film, a surface protection film having a low permittivity is obtained.
Patent JP-H07192035-A (JP)
Title: Computer-aided design device
Inventor: NAGAO MAKOTO
IPC: G06F17/50
Filed: 1993-12-27
Abstract: PURPOSE:To make it possible to carry out circular-arc generation processing in a short time by the computer-aided design. CONSTITUTION:The device is provided with an end point setting means 11 commanding two straight lines bent at an optional angle or its end point, a parameter setting means 12 inputting the commanded two lines or a radius (r) tangent to the end point, a circular-arc arithmetic means 13 calculating center coordinate drawn by a circle whose radius is (r) and cross point of two lines, a cross point circular-arc memory circuit 14 storing the calculated cross pint and the center of the circular-arc, a judging means 15 judging the propriety of generation of the circular-arc and a circular-arc registration means 16 updating the cross point of the circular-arc with the line when generation is possible as a new end point and registering newly the circular-arc. Thus, since sophisticated expert knowledge and complicated equation are not required, the device is formed inexpensively and mis-input of a numeral and malfunction attended therewith are reduced.
Patent JP-H06179895-A (JP)
Title: Fungi-cleaning agent
Inventor: ISHII KAZUHIKO
IPC: C11D7/50
Filed: 1992-12-14
Abstract: PURPOSE:To obtain a fungi-cleaning agent which effectively cleans fungi, etc., growing on the walls, tile joints, etc., of a bathroom, kitchen, etc., where the moisture content or humidity is high without adversely affecting a human body, clothing, etc., by incorporating an extract of a specific sea weed into the agent. CONSTITUTION:At least one red alga selected from the group consisting of Eucheuma denticulatum, Eucheuma serra, Ceramium tenerrimum, Ceramium paniculatum, and Ceramium japonicum is washed and then treated with water at 80-95 deg.C or extracted with an org. solvent such as alcohol. The alga is separated from the extraction liq. by filtration to give an algal extract. The extract is used as it is or after being diluted to 1-10wt.%. According to requirements, a surfactant, a polishing powder, etc., are added, 1-10wt.% vegetable oil is added to give an emulsion, or an org. acid is added to adjust the pH to 2 to 5. The obtd. mixture is impregnated into a piece of cloth, and fungi are removed by rubbing with the cloth. When fungi are strong and old, then the mixture is sprayed onto the fungi and is left standing for several to tens of minutes before rubbing with the cloth contg. the mixture.
Patent JP-H06180235-A (JP)
Title: Navigation apparatus
Inventor: HIJIKATA MAKOTO
IPC: G01C21/30
Filed: 1992-12-14
Abstract: PURPOSE:To provide a navigation apparatus wherein it can store and display a running track which is more accurate and continuous. CONSTITUTION:A navigation apparatus is provided with a candidate storage means which stores a plurality of groups of own-position candidate data as candidates of own-position data in individual groups corresponding to one movement track and with a movement track replacement means wherein own-position candidate data belonging to another own-position candidate data group is judged to be more reliable than an own-position candidate data group to which own- position data corresponding to present position display data belongs by a map matching means and which replaces a movement track by using the own-position candidate data group to which own-position candidate data corresponding to the present-position display data belongs by using the high-reliability own- position candidate data.
Patent JP-H10195186-A (JP)
Title: Continuous production of polyester polymer
Inventor: IIYAMA HISASHI
IPC: C08G63/78
Filed: 1997-11-18
Abstract: PROBLEM TO BE SOLVED: To obtain a high-quality polyester polymer continuously without encountering many difficulties resulting from an increase in the viscosity of the reaction mixture by using a tower-type continuous reactor in the production of a high-molecular-weight polyester polymer by ring opening polymerization. SOLUTION: A polymerization material comprising at least one lactone is fused in an inert gas atmosphere, continuously fed into a tower-type continuous reactor and polymerized through ring opening to continuously produce a polyester polymer. If required for the purpose of e.g. viscosity control, at most 20 pts.wt., per 100 pts.wt. polymerization component, solvent is added, and the reaction is performed. After the polymerization, the residual monomer and/or the solvent are removed from the formed polymer by means of a devolatilizer contiguous to the reactor and recovered. Alternatively, a polymerization material comprising a cyclic ester formed from two molecules of at least one hydroxycarboxylic acid and at least one polymer having hydroxyl groups and/or ester bonds is continuously fed into a tower-type continuous reactor and copolymerized to continuously produced a polyester polymer.
Patent JP-H10158438-A (JP)
Title: Stabilization of polyolefin to be used on permanent contact with extraction solvent
Inventor: KROEHNKE CHRISTOPH
IPC: C08K5/00
Filed: 1997-11-18
Abstract: PROBLEM TO BE SOLVED: To stabilize a plyolefin to be used in permanent contact with an extraction solvent by mixing it with a benozofuran-2-one compound. SOLUTION: The polyolefin is exemplified by polypropylene, polyisobutylene, polybut-1-ene, poly-4-methylpent-1-ene, polyisobutylene, polybutadiene or poly(cycloolefin). The benzofuran-2-one compound is represented by the formula (wherein R1 is naphthyl, thienyl, quinolyl, acridinyl, biphenyl or the like where n=1; and is a 1-4C alkyl, a hydroxyl-substituted phenylene or naphthylene or the like when n=2; R2 to R5 are each H, Cl, OH or a 1-25C alkyl) and is exemplified by 3-[4-(2-acetoxyethoxy]phenyl]-5,7-di-tert-butylbenzofuran-2-one. Its amount of addition is 0.0005-5wt.% based on the polyolefin.
Patent JP-H11148169-A (JP)
Title: Single swinging ditch cover
Inventor: TANAKA TOSHIMICHI
IPC: E03F5/06
Filed: 1997-11-17
Abstract: PROBLEM TO BE SOLVED: To provide a single swinging ditch cover, in which the impossibility of the opening of a grating cover by the freezing of the grating cover is prevented. SOLUTION: The single swinging ditch cover consists of left-right frames installed in the crossing-over direction of a ditch 1, receiving frames 3, 4 mounted so as to be placed along the both sides of the ditch 1, combined with the left-right frames and formed in an L-shaped cross section, a cover-receiving square bar 6 fixed onto the top faces of the horizontal pieces of the receiving frames 3, 4 and a grating cover 15, in which one side is screwed to one receiving frame 4 and which can be swung singly. Receiving packings 7 composed of a rubber or a resin are fixed onto the top faces of the cover receiving square bars 6 while abutting packings 26 placed and abutted to the receiving packings T are fastened onto the undersides of the grating cover 15.
Patent JP-H08169751-A (JP)
Title: Basic refractory
Inventor: TERAJIMA HIDETOSHI
IPC: C04B35/043
Filed: 1994-12-16
Abstract: PURPOSE: To provide a basic refractory having high hot strength, high corrosion resistance and slag penetration resistance. CONSTITUTION: This basic refractory is based on MgO and contain 1-7wt.% TiO2 and such an amt. of CaO as to regulate the weight ratio of CaO to TiO2 to 0.7-1.0 in the average compsn. When the refractory is used, the useful life of a molten metal refining vessel, especially a vacuum degassing vessel is considerably prolonged and the consumption of furnace materials can be considerably reduced. Disposal treatment necessary for magnesia-chromia refractories used so far is not required.
Patent JP-H01179339-A (JP)
Title: Evaluation of thin-film manufacturing process
Inventor: KOMIYAMA YUZURU
IPC: H01L21/66
Filed: 1987-12-30
Abstract: PURPOSE:To evaluate the aptitude of a manufacturing process and a processing condition while a measuring operation is executed immediately without a need for a formation process of an electrode or the like by a method wherein the amount of an electric charge to be generated by irradiating a pulsed beam on a thin film immediately after a treatment process such as a formation process of a thin film or the like is measured and the magnitude relationship of its measured value is obtained. CONSTITUTION:When a measuring operation is executed, a thin film 1 which has been applied to a substrate 2 is inserted between insulating layers 3a and 3b inside a dark box 6 and is pressure-bonded. Then, a voltage is impressed between a transparent electrode 4 and a metal electrode 5, in this state, a beam from a light source 7 is transformed into a pulsed beam 11 via a pulse generator 6 and is transmitted into the dark box 6. The pulsed beam 11 is conducted through the transparent electrode 4, the insulating layer 3a and the thin film 1 and reaches the substrate 2. An electron and a positive hole which are generated by irradiation with the pulsed beam 11 are influenced by a processing condition such as a formation process of the thin film 1 and the thin film inside the substrate 2 or the like; accordingly, an electric charge induced by irradiation with the pulsed beam 11 exists on both surfaces of the insulating layers 3a and 3b; the electric charge is output as a voltage value or an electric current value by using the transparent electrode 4 and the metal electrode 5; the aptitude of a method and a condition of the formation process of the thin film can be obtained on the basis of the magnitude relationship of the value.
Patent JP-H03192348-A (JP)
Title: Silver halide color photographic sensitive material
Inventor: TSUKAHARA JIRO
IPC: G03C7/34
Filed: 1989-12-22
Abstract: PURPOSE:To provide the silver halide color photographic sensitive material contg. cyan couplers which impart high coupling reactivity and high dye absorbing density to the material by incorporating the specific cyan dye forming couplers into the material. CONSTITUTION:The cyan dye forming couplers expressed by general formula (I) are incorporated into the silver halide color photographic sensitive material having silver halide emulsion layers on a base. (In the formula, R<1>, R<2> denote a group which can be bonded to a hydrogen atom or nitrogen atom; R<3> denotes a group which can be substd. with a benzene ring; R<4> denotes an aryl group; Z denotes a hydrogen atom or coupling elimination gorup.) The photosensitive material formed by using this invention may contain a hydroquinone deriv., aminopherol deriv., gallic acid deriv., ascorbic acid deriv., etc., as a color fog ging preventive agent.
Patent JP-H02179245-A (JP)
Title: Commutator
Inventor: MATSUYAMA TAKASHI
IPC: H02K13/00
Filed: 1988-12-28
Abstract: PURPOSE:To reduce components of the specific frequency and to lower jarring sounds by having two or more kinds of width dimensions of commutator segments on the circumferential surface of commutators. CONSTITUTION:Commutators 1 consist of commutators having three kinds of widths l1, l2 and l3, and they are held on a commutator sleeve 2 by molds. When a motor turns one time at constant speed, segment widths l of the commutators 1 are not constant, so that timing upon completion of the commutation is not constant, the components of the specific frequency of electric current is reduced, and the vibration force of the specific frequency is reduced accordingly. A brush sound generating in case brushes are brought into contact with the commutator segments is not the specific frequency, and jarring sounds are lowered.
Patent JP-H06180203-A (JP)
Title: Position detector
Inventor: NAKAZATO MASAKAZU
IPC: G01B7/00
Filed: 1992-12-15
Abstract: PURPOSE:To change a limit position easily. CONSTITUTION:The title detector is provided with a pair of magnetic sensors 5 for outputting sinusoidal waves with a phase difference of 90 degrees corresponding to the pitch of a magnetic scale 3, a means 53 for updating and storing the output peak values of each sensor for each pitch of the magnetic scale 3, a means 54 for calculating the center of signal wave for each pitch from each peak value, and a means 55 for calculating a rough position based on the comparison result of the center of signal wave and the center output. Further, it is also provided with a means 56 for calculating the normalization coefficient of the sensor output from the peak value and the center of signal wave. a means 57 for compensating the sensor output based on the normalization coefficient, a means 58 for calculating the rough position by an inverse trigonometric function using the biphase compensated normalization signal, a means 59 for outputting the position signal by adding the rough position and an accurate position, a means for setting a limit position. and a means 52 for outputting the limit signal when signals agree by comparing the limit position with the position signal.
Patent JP-H04204665-A (JP)
Title: One component system magnetic developer
Inventor: YAMADA SHIGEKI
IPC: G03G9/083
Filed: 1990-11-30
Abstract: PURPOSE:To improve the electrification, stability and fluidity of a developer, and to enhance the stability of an image density by specifying an area covering rate to the particle diameter of a silica system additive and to a toner particle, on a one component system magnetic developer composed of a one component magnetic toner particle and a component property silica or hydrophilic silica additive. CONSTITUTION:The silica additive made into a particle whose diameter is 20-100nm, is stuck to the surface of the toner grain so that an area covering rate to the toner grain is 3-30%. When it is >100nm, an additive particle is separated from the toner particle, sufficient electrification and electrifying stability can not be obtained, and the fluidity has a tendency not to be enough, as well. On the other hand, when the diameter of the particle of the additive is <20nm, there is the tendency for the electrification and stability to be dropped, and further, there is the tendency for the area covering rate (C) to be reduced, as well. On the other hand, when the area covering rate (C) is <3%, a toner electrifying quantity is reduced, and the image density is fairly reduced compared with that of the present invention. When the rate (C) is> 30%, the toner electrifying quantity is too high, and the image density is reduced also.
Patent JP-H04197842-A (JP)
Title: Door trim
Inventor: IMAI HIDEKI
IPC: B60J5/04
Filed: 1990-11-29
Abstract: PURPOSE:To surely prevent dust from being accumulated in a handle portion by integrally forming an arm rest portion from a swelling portion formed when one part of a door trim main body is made to swell in the horizontal direction, and providing on the lower face of the arm rest portion a handle portion which is open to the lower side. CONSTITUTION:This door trim A comprises a door trim main body 1 mounted on a door panel B and the door trim main body 1 comprises different surface materials 2, 3 and a base material 4 made of a foaming body formed integrally on the reverse face of each of the surface materials 2, 3. At the middle part of the length of the door trim one part of the door trim main body 1 is made to swell in the horizontal direction and an arm rest portion 5 is integrally molded by this swelling portion. A handle portion 6 open to the lower side is provided on the lower face of the arm rest portion 5. The handle portion 6 is formed by a box-shaped recess 7 and the recess 7 is inserted from the opening of the lower face of the arm rest portion 5 of the door trim main body 1 into a bracket 10 mounted on the door panel B and is fixed thereto by a grommet 8 and a screw 9.
Patent JP-H07176468-A (JP)
Title: Projecting exposure method
Inventor: NISHI TAKECHIKA
IPC: H01L21/027
Filed: 1993-12-28
Abstract: PURPOSE:To accurately make a reticle coordinate system correspond to a wafer coordinate system by reducing influence of a lithographic error of a reticle when it is exposed by a slit scanning system. CONSTITUTION:Two rows of alignment mark images 29AW-29DW and 30AW-30DW are projected on a projected image 12W of a reticle in a scanning direction, and two rows of reference marks 35A-35D and 36A-36D are formed as well on a reference mark plate 6 of the wafer stage side in the scanning direction. The reticle and the plate 6 are moved in the scanning direction, an error of the images 29AW, 30AW and the marks 35A, 36A is obtained by a reticle alignment microscope, an error of the other image and the reference mark is similarly obtained, these errors are corrected by a measuring error of a coordinate measuring system, thereby obtaining a conversion parameter between a reticle coordinate system and a wafer coordinate system.
Patent JP-H01171975-A (JP)
Title: Print control system
Inventor: ISHII HIROSHI
IPC: B41J29/46
Filed: 1987-12-28
Abstract: PURPOSE:To print smoothly, by providing a flag to be set upon extinction of an ink ribbon, a register for holding the position and a means for determining the print resume position according to a print start command, thereby eliminating the necessity to start printing again onto a new sheet upon extinction of ribbon. CONSTITUTION:A CPU1 develops a line of dot pattern onto a line buffer 3 and sets print start position and print end position respectively in a print start register 4 and a print end digit register 5. Then the CPU1 issues an instruction for moving a carriage to the print start position stored in the print start position register 4 to a printer 2, thus executing printing. Thereafter, the CPU1 reads out the state of an ink ribbon from the printer 2 and checks whether ribbon end state is set: if the ribbon end state is set a ribbon end flag 7 is set. If ribbon end state is not set, the CPU1 moves heads down to the printer 2 and executes printing. By such print control function, it is not required to start printing again even upon occurrence of ribbon end in the way of printing, resulting in an efficient printing.
Patent JP-2001114930-A (JP)
Title: Apparatus for decomposing and reusing disposed plastics
Inventor: KOJIMA SHINICHIRO
IPC: C08J11/16
Filed: 1999-10-19
Abstract: PROBLEM TO BE SOLVED: To provide an apparatus for recycling disposed plastics by decomposing plastics with an α-wave having a specific wave length generated by heating mica. SOLUTION: The apparatus comprises a means for pulverizing plastics (1), a radiant tube (10) to heat mica, a blower (8) to heat the radiant tube (10), a water-cooling condenser (12) to separate decomposed material into light oil, naphtha, acids and the like and a cooling jacket (9) to cool the apparatus as major construction members.