baber/WOPTO huggingface dataset:
Patent TW-463469-B (TW)
Title: Digital subscriber line (DSL) based home gateway
Inventor: WANG RAY
IPC: H04B1/00
Filed: 2000-05-12
Granted: 2001-11-11
Abstract: A digital subscriber line based home gateway is disclosed. According to one embodiment of the present invention, a DSL modem, an analog modem, a wireless interface, and a home phone network are integrated to interface into a screen-phone for the broadband communication service to home users. Multiple users are able to access the Internet and the content services for conducting e-commerce, receiving content news, entertaining on-demand, making audio or video communications, and telecommuting or working at home. This screen-phone based DSL home gateway allows in-home communications for the purpose of resource sharing among home computing devices via the existing but not limited to phone wire, wireless or cable.
Patent TW-513291-B (TW)
Title: Helmet
Inventor: WATANABE YOSHINORI
IPC: A42B3/06
Filed: 2000-06-19
Granted: 2002-12-11
Abstract: This invention provides a helmet comprises first engaging means 11 comprising an engaging piece 14 on the side of a cover 4 and an engaging hole 13 on the side of a helmet body 2 so that a disengaging direction is arranged along the outer surface of the helmet body. The engaging piece 14 has a base portion 18 extending in the direction approximately perpendicular to the outer surface of the helmet body 12 and an engaging claw 19 extending from a tip of the base portion 18 toward the outer surface of the helmet body. The engaging hole 13 is formed so as to be engaged with the engaging claw 19. Second engaging means 12 comprises a circular hole 15 on the side of the helmet body 2 and a cylinder on the side of the cover 4 so that the disengaging direction is approximately vertical to the outer surface of the helmet body. The second engaging means 12 is arranged apart from the first engaging means 11 in the direction for releasing the engagement thereof. Furthermore, the whole portion of a helmet body top T that extends from a visor 2h of the helmet body 2 is made concave on form a full outside area with curvature gradually changed. An expansion 41 is integrally formed on the rear top side of the helmet body 2.
Patent TW-515109-B (TW)
Title: EL display device and electronic device
Inventor: YAMAZAKI SHUNPEI
IPC: H05B44/00
Filed: 2000-06-21
Granted: 2002-12-21
Abstract: An electroluminescence display device has a plurality of electroluminescence elements and a driver circuit formed over a substrate. At least a part of the driver circuit is disposed in a display portion of a substrate in order that the size of the display device can be reduced.
Patent TW-536469-B (TW)
Title: Retroreflective articles having multilayer films and methods of manufacturing same
Inventor: LASCH JAMES E
IPC: G02B5/124
Filed: 2000-09-08
Granted: 2003-06-11
Abstract: Retroreflective articles having multilayer films are useful for commercial graphics and retroreflective products, such as roll-up signs for highway transportation safety. The articles comprise multilayer films having at least one layer of polyurethane and at least one layer of a copolymer of alkylene and at least one non-acidic, polar co-monomer. Articles having the new multilayer films provide the same or improved performance, are less expensive, and offer improved methods for manufacturing, when compared to prior articles.
Patent TW-496079-B (TW)
Title: Interlace overlap pixel design for high sensitivity CMOS image sensors
Inventor: LEE SYWE N
IPC: H04N5/335
Filed: 2000-11-04
Granted: 2002-07-21
Abstract: A structure of image sensor for sensing the light of an image impinging thereupon and for translating the image into a standard television format is disclosed. The structure comprises a plurality of pairs of light-detecting elements arranged in rows and columns for generating respective analog signals in proportion to the intensity of the light impinging on respective one of the light-detecting elements, a first and second photodiodes in each pairs of light-detecting elements are coupled in parallel in the column direction at a floating sensing point through at least one turn-on transistor, and the first and second phododiodes in adjacent pairs of light-detecting elements are coupled in parallel in the column direction through at least one turn-on transistor such that the at least one turn-on transistors coupled to the first and second photodiodes are sequentially controlled by a first and second gate control lines coupled to the gate of the at least one turn-on transistors, respectively and analog signals acquired in the first and second photodiodes of one of the same pairs and the adjacent pairs presents at the floating sensing point in response to one of the first and second gate control lines, thereby enhancing the light sensitivity of the image sensor. The analog signals acquired in the photodiodes controlled by the first gate control lines constitute first field signals and the analog signals acquired in the photodiodes controlled by the second gate control lines constitute second field signals, wherein the components of the first field and second signals are correlated with one another and the time difference thereof is less than 1/60 second, thereby improving the quality of the image displayed in a television connected to the image sensor.
Patent TW-463315-B (TW)
Title: Forming method of self-aligned contact window
Inventor: LIAU WEI-WU
IPC: H01L21/768
Filed: 2000-12-04
Granted: 2001-11-11
Abstract: A forming method of self-aligned contact window is disclosed, wherein the semiconductor substrate comprises at least a memory device region and a logic device region. The logic device region comprises two gate structures. A cap layer is formed on the gate structure. A spacer is formed on the sidewall of the gate structure. The method comprises: first, forming an amorphous salicide barrier layer; next, forming an inter-metal dielectric layer on the barrier layer of salicide; exposing the inter-metal dielectric layer located between the gate structure and on top of the source/drain; then, etching the inter-metal dielectric layer until reaching the surface of the substrate, i.e., exposing the barrier layer of salicide which has a polymer layer on the surface at this moment; then, removing the photoresist layer by etching and removing the polymer layer on the surface to expose the barrier layer of salicide on the surface of source/drain; and removing the barrier of salicide to expose the source/drain for forming the self-aligned contact window.
Patent TW-473913-B (TW)
Title: Method for manufacturing interlayer dielectric layer in a semiconductor device
Inventor: KIM SUN-OO
IPC: C23C16/40
Filed: 2000-12-27
Granted: 2002-01-21
Abstract: A method for manufacturing an interlayer dielectric layer begins with a preparation of an active matrix provided with a substrate and interconnections formed on the substrate and then the prepared active matrix is set on a chamber. Thereafter, a silicon source material, e.g., a tetra-ethyl-ortho-silicate (TEOS) or modified TEOS and a hydrogen peroxide (H2O2) in a gaseous state are sprayed on the active matrix. And finally, the interlayer dielectric layer is formed on the active matrix by a condensation reaction of the silicon source material and the H2O2.
Patent TW-512258-B (TW)
Title: Electrophotographic method
Inventor: KIMOTO KEIZO
IPC: G03G5/06
Filed: 2001-02-08
Granted: 2002-12-01
Abstract: An electrophotographic method which uses a single-layer organic photosensitive material drum having a single organic photosensitive layer of a thickness of not smaller than 25 μm formed on an electrically conducting blank tube with a surface roughness Ra of not larger than 0.6 μm and rotates the photosensitive material drum at a peripheral speed of not smaller than 400 mm/sec, in order to execute an image-forming processing that includes electric charging, exposure to image-bearing light, developing, transfer, cleaning by a blade and removal of electric charge. Though the photosensitive material drum rotates at a high speed and a large frictional force is exerted on the cleaning blade, damage to the blade is effectively suppressed, and image is stably formed for extended periods of time without permitting the cleaning to become defective.
Patent TW-535210-B (TW)
Title: Phase shift mask and its manufacturing method
Inventor: TANAKA TOSHIHIKO
IPC: G03F1/68
Filed: 2001-02-08
Granted: 2003-06-01
Abstract: The present invention is related to the mask for use in the manufacture of minute apparatus such as semiconductor device, semiconductor integrated circuit apparatus, super-conducting apparatus, micro-machine, and the electronic device. The subject of the present invention includes the followings: (1) to provide a method of manufacturing halftone phase shift masks in less steps to save time and cost and to increase the yield; and (2) to provide a halftone phase shift mask with higher phase- and size controllability. To achieve this, the halftone phase shift mask includes a structure having a shade band of resist film formed on the halftone film delineating fine patterns and around the area of fine pattern.
Patent TW-538312-B (TW)
Title: Chemical amplification, positive resist compositions
Inventor: OHSAWA YOUICHI
IPC: G03F7/075
Filed: 2001-03-06
Granted: 2003-06-21
Abstract: The chemical amplification positive type resist material contains (A) a photo-acid generating agent and (B) a resin having a substituent of the formula Ph(CH2)nOCH(CH2CH3)-(1) (where Ph is phenyl and (n) is 1 or 2) and having a solubility in an alkali developing solution varied by the action of an acid. Since the resin has the substituent as in the formula (1), the resist material is excellent in resolution, hardly causes line width change and the deterioration of shape even in the case of long-time PED, ensures little foreign matter after coating, after development and after peeling and is excellent in the shape of pattern profile after development. The resist material retains rectangularity, ensures a slight membrane reduction of pattern profile and is excellent in focus latitude even in the case of a focus shift and it is suitable for microfabrication and is effective in various lithographies, particularly far UV lithography.
Patent TW-I263466-B (TW)
Title: Method for manufacturing printed wiring board
Inventor: YAMAMOTO TAKUYA
IPC: B23K26/382
Filed: 2001-03-28
Granted: 2006-10-01
Abstract: A printed wiring board manufacturing method is provided which is so constituted that when a carbon dioxide leaser is used to form holes such as via holes in a copper clad laminate, copper foils and resin layers may be processed at the same time, without having to perform an etching treatment on the cooper foil. Namely, a carbon dioxide laser is used to form recess portions such as via holes in a copper clad laminate, followed by plating to form interlayer electrical connections, forming etching resist layers, and exposing and developing the etching resist layers, thereby effecting a circuit etching treatment. In particular, the copper clad laminate is a laminate formed by using waved copper foils to form external copper foils.
Patent TW-517223-B (TW)
Title: Voice coding method and device
Inventor: TASAKI HIROHISA
IPC: G10L19/125
Filed: 2001-04-20
Granted: 2003-01-11
Abstract: The invention targets at providing high quality voice coding method and device that generate less partially singular voice of coding voice. To achieve the goal, the method and device comprise driving vector generation device 13 that creates multiple driving vectors, the first distortion calculation part 23 that calculates the waveform distortion defined in between the coding target signal obtained from the input voice and the resulting vector obtained from the driving vector as the first distortion, the second distortion calculation part 24 that calculates the second distortion different from the first distortion and defined in between the resulting vectors obtained from the coding target signal and driving vector with respect to all driving vectors, the estimated value calculation part calculates the preset search estimated value using the first distortion and the second distortion with respect to each driving vector, and the search device 20 that outputs the selected corresponding code of driving vector beforehand after choosing to make the search estimated value minimum.
Patent TW-I221542-B (TW)
Title: Process for forming resist pattern and composition for reducing development defect
Inventor: TAKANO YUSUKE
IPC: G03F7/004
Filed: 2001-05-22
Granted: 2004-10-01
Abstract: The invention attempts to provide a method for forming a resist pattern which reduces the imperfection of resist pattern during developing on a large size substrate having a diameter more than 8 inches, as well as no deterioration of pattern figuration such as T-top, round-top and so on being inconvenient for etching process, especially for chemical amplified photo-resist, is carried out by the effect of treated atmosphere and inter-mix between surface coating and resist. The invention provides a method for forming resist pattern, which comprises onto a chemical amplified resist film formed on the substrate having a diameter more than 8 inches, for examples, by coating an imperfect-development reduced composition made form acidic composition containing a surfactant so as to hydrophilize the surface of the resist as well as no any indissoluble layer to the developing solutions on the surface of resist be formed, and by means of the appropriate diffusion of acidity from an imperfect-development reduced composition, the reduction of the thickness of aforesaid chemical amplified photoresist is 10 Å to 500 Å larger than which under the conditions without coating an imperfect-development reduced composition.
Patent TW-499589-B (TW)
Title: Method of fabricating an optical connector, device for carrying out the method and a connector for use in such a method
Inventor: MARJETIC IGOR
IPC: G02B6/44
Filed: 2001-05-30
Granted: 2002-08-21
Abstract: In a method of fabrication of an optical connector, where the fiber-optic waveguide with the exposed optical fiber is immersed into a powdered adhesive and then pulled out again, while particles of the powdered adhesive adhere to the surface of the fiber; the fiber with the adhering particles is inserted into the borehole of the ferrule of the connector and secured there, and the ferrule is heated to and kept at a temperature greater than or equal to the melting point of the adhesive, a special suitability for field use is achieved by performing the bonding of the fiber to the ferrule in a battery-operated hand-held device (130); the plug with the ferrule is first inserted into a receptacle (160) provided on the hand-held device (130) and is held there, in said receptacle (160) the ferrule is surrounded by a battery-operated heating element; then the fiber-optic waveguide together with the fiber is inserted into the plug and is secured in the plug by operating means (129, 136, 137, 141, 143, 151) arranged in the hand-held device (130); and finally adhesive bonding is performed by heating the ferrule with the heating element.
Patent TW-I246634-B (TW)
Title: Radiation-sensitive resin composition
Inventor: NISHIMURA YUKIO
IPC: H01L21/027
Filed: 2001-06-08
Granted: 2006-01-01
Abstract: A radiation-sensitive resin composition used as a chemically amplified positive tone resist responsive to short wavelength active radiation such as KrF excimer laser and ArF excimer laser is disclosed. The resin composition comprises: (A) an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, the resin comprising a lactone cyclic structure of the following formula (1), wherein a is an integer from 1-3, b is an integer from 0-9, and R1 represents a monovalent organic group, and (B) a photoacid generator. The composition has high transmittance of radiation, exhibits high sensitivity, resolution, and pattern shape, and can produce semiconductors at a high yield without producing resolution defects during microfabrication.
Patent TW-I234321-B (TW)
Title: Memory card connector
Inventor: NISHIO ATSUSHI
IPC: H01R13/41
Filed: 2001-06-28
Granted: 2005-06-11
Abstract: A memory card connector (11) has a housing (12), a plate (14), a guide plate (16) a lock mechanism (18) and a connector pin holder (20). When a memory card (24) is pushed further in an insertion direction (a Ya direction) from a full lock position and moved to a maximum insertion position, a movable tab (42B) provided on a slider (54) contacts a fixed tab (42A) mounted on the connector pin holder (20), turning an eject detection switch (42) ON and outputting an eject detection signal. As a result, a control circuit can determine when the memory card (24) has been ejected.
Patent TW-511294-B (TW)
Title: Active matrix substrate, display device and method for manufacturing active matrix substrate
Inventor: TSUJIMURA TAKATOSHI
IPC: G02F1/136
Filed: 2001-06-29
Granted: 2002-11-21
Abstract: Disclosed is an active matrix substrate capable of preventing corrosion and the like of a lead-out wiring by covering the wiring with a gate insulating film and an ITO film without increasing the number of patterning processes, improving a yield in manufacturing, and increasing a reliability thereof. The active matrix substrate of the present invention comprises: source and drain electrodes 14 and 15 which are disposed on an insulating substrate 11 and spaced apart from each other with a predetermined gap; an a-Si layer 17 deposited on the source and drain electrodes 14 and 15; a gate insulating film 18 deposited on the a-Si layer 17; a gate electrode 19 deposited on the gate insulating film 18; and an ITO film 20 having first and second portions, the first portion being deposited on the gate electrode 19 having the substantially same pattern as that of the gate electrode and the second portion deposited on a portion of either the source electrode or the drain electrode 14 and constituting a pixel electrode 19; and a data line 16 connected to the drain electrode 15, which is covered with the gate insulating film 18 so as to be interposed by the a-Si film 17 therebetween.
Patent TW-492888-B (TW)
Title: Bubble coloring structure with normal ink-jet printing device
Inventor: LIAU TING-CHAU
IPC: A63H27/10
Filed: 2001-07-03
Granted: 2002-07-01
Abstract: A bubble structure for coloring of normal ink-jet printing device, which is to configure with an ink absorption layer on a side surface of the substrate composed of ethylene resin (EVOH/ethylene and ethylene alcohol copolymer resin) and LLDPE, and adhered with a soft pad on another surface. The retraction agent is configured between the soft pad and the substrate. The overall thickness can be suitably increased by the soft pad to be applied for the paper feeding structure of a normal ink-jet printing device, so that the ink-jet printing device can directly print the text and the pattern on the ink absorption layer. Then, by peeling off the soft pad and with thermal sealing and cutting, a structure for printing special text, pattern or image on the bubble can be formed through a normal ink-jet printing device.
Patent TW-498425-B (TW)
Title: Method for measuring horizontal slant of image field
Inventor: CHEN JR-WEI
IPC: H01L21/027
Filed: 2001-08-08
Granted: 2002-08-11
Abstract: A kind of method for measuring horizontal slant of image field is disclosed in the present invention. The dice in the image field is provided with the asymmetric integrated circuit layout pattern, which is composed of at least two pattern regions with different density. These two pattern regions with different density are the first pattern region and the second pattern region that has a lower density than the first pattern region. The invented method contains at least the following steps. At first, energy is added and focused on the entire dices in the image field. Then, the scanning electronic microscopic (SEM) image of the first pattern region or the second pattern region in the image field is taken. After that, the outline of SEM image is analyzed in order to obtain the focus difference in between the first pattern regions of the first sampling dice and the second sampling dice along the asymmetric layout pattern direction of dice in the image field. All the first pattern regions and the second pattern regions in the direction are arranged in a straight line. The distance between two of the first pattern regions is measured. A ratio value of the focus difference to the distance is then calculated; and the ratio value is the horizontal slant of the image field. After that, the horizontal slant direction of the image field is located. The horizontal slant direction of the image field can be found by using the right-hand spiral principle, in which the pointing direction of four straight fingers of right palm is the same as the direction that points from the first sampling dice toward the second sampling dice, and the palm center is pointed toward the bottom portion of dice. If the horizontal slant of the image field is a positive value, then the horizontal slant direction of the image field is the bending direction of four straight fingers toward the back of palm. If the horizontal slant of the image field is a negative value, then the horizontal slant direction of the image field is the bending direction of four straight fingers toward the center of palm.
Patent TW-I237101-B (TW)
Title: Process of installing roof mounted oxygen-fuel burners in a glass melting furnace
Inventor: SIMPSON NEIL G
IPC: F23M5/02
Filed: 2001-09-07
Granted: 2005-08-01
Abstract: A process for installing a refractory burner block (24) in a glass furnace crown (11), wherein the glass furnace crown comprises a second refractory material different than the burner block refractory, includes installing a refractory crown block (33) in the furnace crown, wherein the crown block refractory is compatible with the burner block refractory and the second refractory material, wherein the crown block is provided with a hole for accepting the burner block; and disposing the burner block into the crown block hole in sealing engagement therewith. A process for installing a refractory burner block (24) in a hot glass furnace crown (11), wherein the glass furnace crown comprises a second refractory material different than the burner block refractory, includes removing crown insulation (12) from the exterior of the furnace crown; inserting a patch of refractory material (23) compatible with the furnace crown second refractory material into the crown in the vicinity of the removed insulation, drilling a hole into the crown through the refractory patch, optionally with a water cooled diamond drill; and, inserting the refractory burner block into the hole in the furnace crown through the refractory patch. A process for installing a refractory burner block (24) in a glass furnace crown (11), wherein the glass furnace crown comprises a highly Thermally conductive fused cast refractory material, includes installing an insulating barrier mounting block (43) on the upper surface of the furnace crown, wherein the mounting block is compatible with the burner block refractory and the fused cast refractory material, wherein the mounting block is provided with a hole for accepting the burner block, and wherein the insulating barrier mounting block is prepared when the furnace crown is not hot; and disposing the burner block into die mounting block hole in sealing engagement therewith.