Patent SG-11201900996V-A (SG)
Title: Optical near-field metrology
Inventor: PASKOVER YURI
IPC: G01B11/02
Filed: 2017-07-10
Abstract: 130 111 65 -i n 80 150 Controller /5/--\A Position 152H Height 159H p ocessor 90 Illumination Detection ive Objec ----------- ---- Substrate 115 115A 110_, ‘.. 152 - sr Optical micro cavity sensor(s) Optical micro cavity sensor(s) T -J 140 Fluorescent medium (optional) Control of scan height (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 05 April 2018 (05.04.2018) WIP0 I PCT ill~~~~~~~~ 011101010VIIIOH olo omolio111 Ho 111E1111°111 (10) International Publication Number WO 2018/063471 A3 (51) International Patent Classification: G01B 11/02 (2006.01) G01B 9/02 (2006.01) (21) International Application Number: PCT/US2017/041404 (22) International Filing Date: 10 July 2017 (10.07.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/400,627 28 September 2016 (28.09.2016) US 15/599,881 19 May 2017 (19.05.2017) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Dept., 1 Technology Drive, Milpitas, California 95035 (US). (72) Inventors: PASKOVER, Yuri; 10 Schoham Str., 38900 Caesarea (IL). MANASSEN, Amnon; 10 Golda Meir, 34892 Haifa (IL). LEVINSKI, Vladimir; Hermon 9, 23100 Migdal HaEmek (IL). (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corp., Legal Dept., 1 Technology Drive, Milpitas, California 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) (88) Date of publication of the international search report: 26 July 2018 (26.07.2018) (54) Title: OPTICAL NEAR-FIELD METROLOGY W O 20 18/063 47 1 A3 100 (57) : Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal be- tween reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features. Wafer 8 () 5 Figure 3