baber/WOPTO huggingface dataset:
Patent KR-20010021801-A (KR)
Title: 통신 시스템에 원격 유닛을 등록하기 위한 방법 및 그 장치
IPC: H04W88/06
Filed: 1998-07-14
Abstract: 제1 무선 통신 시스템(111) 및 제2 무선 통신 시스템(109)에 응답하는 원격 통신 유닛에서 운용되는 방법은 제1 무선 통신 시스템으로부터 시간 지연 파라미터를 수신하는 단계(210), 상기 시간 지연 파라미터를 저장하는 단계(215), 및 상기 시간 지연 파라미터에 기초하여 제2 무선 통신 시스템에 억세스하는 단계(240)를 포함한다.
Patent KR-20010022267-A (KR)
Title: 본질적으로 전도성인 중합체 및 금속으로 이루어진 화학적화합물
IPC: C08F38/02
Filed: 1998-07-24
Abstract: 본 발명은 전도성 중합체, 특히 폴리아닐린, 및 금속으로 이루어진 화합물에 관한 것이다.  본 발명은 또한 이들 화합물의 제조 방법 및 용도에 관한 것이다.
Patent KR-20010031919-A (KR)
IPC: C23C22/00
Filed: 1998-09-18
Abstract: The invention relates to a process for the coating of electric steel strips with an oxide powder as annealing separator by the application of an aqueous solution which contains mainly MgO and also at least one additive, including a chlorine-containing compound. The characterizing feature of the invention is that the additive added to the aqueous solution is ammonium chloride (NH4Cl or NH4Cl.nH2O).
Patent KR-20010034462-A (KR)
Title: 액정표시소자 및 이것에 적합한 투명 도전성 기판
IPC: G02F1/1333
Filed: 1999-11-26
Abstract: 본 발명은 액정표시소자 및 이 액정표시소자를 구성하는 전극기판으로서 적합한 투명 도전성 기판에 관한 것이다.     상기 투명 도전성 기판은 (ⅰ) 투명고분자 기판 (S), 가스 배리어층 (X), 경화수지층 (U) 및 투명 도전층 (E) 을 포함하여 이루어지고, (ⅱ) 경화수지층 (U) 과 투명 도전층 (E) 은 접해 있으며, (ⅲ) 상기 경화수지층 (U) 의 상기 투명 도전층 (E) 과 접하는 표면은 50 ℃ 30 % RH 환경 하에서의 표면저항값이 1.0 ×10 13 Ω/?이상이고, 50 ℃ 90 % RH 환경하에서의 표면저항값이 1.0 ×10 12 Ω/?이상이며, 높은 가스 배리어성 및 고온고습하에서 높은 안정성을 갖는다.
Patent KR-20010034917-A (KR)
IPC: A61P9/00
Filed: 1999-06-10
Abstract: The invention relates to a novel crystalline form of irbesartan to pharmaceutical compositions containing it, to processes for preparing it, and to a method for treating cardiovascular diseases utilizing it.
Patent KR-20010053204-A (KR)
Title: 가변 디스크 드라이브 실린더 기록 시스템
IPC: G11B21/00
Filed: 1999-06-25
Abstract: 전체 드라이브상에 행해지는 비싼 제조 재가공의 가능성을 감소시키기 위하여 디스크 드라이브에 대한 공지된 하위 수행 헤드를 동적으로 매핑하기 위한 방법에 관한 것이다.  평균보다 잘 수행하는 디스크 드라이브에서 헤드를 사용하면, 상기 방법은 특정 헤드상에서 밀도당 많은 비트를 기록할 수 있다.  이것은 특히 존 기록(300)이 행해지는 경우에 적절하며, 실린더 그룹(310,330,350,370)에 대한 기록 밀도를 한정하는 것으로 공지되어 있다.  실린더 내에서 헤드의 주파수 조절(기록 주파수를 낮게 함)은 사용자의 바람직한 데이터 액세싱 레이아웃에 상응하는 가변 논리 블록 어드레싱 구성을 허용한다.  여러개의 트랙이 액세스될 수 있으며, 반면 다른 것들은 시스템 데이터를 위해 보전될 수 있다.  기술한 방법은 헤더없는 아키텍처 환경에서 특히 잘 동작한다.  하위 수행 또는 "불량" 헤드의 성능은 개선될 수 있다.
Patent KR-20020063722-A (KR)
Title: Temperature control system of plunger for glass forming apparatus
Inventor: CHOI SEONG YUL
IPC: H01J9/24
Filed: 2001-01-30
Abstract: PURPOSE: A plunger temperature managing system for a glass product molding equipment is provided to optimally design the plunger by managing temperature of every location point of the plunger depending on thickness, size and kind of the plunger. CONSTITUTION: A plunger temperature managing system for a glass product molding equipment comprises a pre-heating furnace(10) having a heating element, a plunger(17) having a cooling water distributing element, a lifting driver, many temperature sensors(38), and a data recording unit(40). The lifting driver alternatively changes the location of the plunger(17) between a heating location and a cooling location. The temperature sensors(38) measures temperature at every location point of the plunger(17) after selectively altering the plunger(17) depending on the thickness, size and kind of the plunger(17). The measured data are recorded by the data recording unit(40) and used to reduce design error.
Patent KR-20020064013-A (KR)
Title: A bake apparatus
Inventor: CHOI IL JUNG
IPC: F27D3/00
Filed: 2001-01-31
Abstract: PURPOSE: A bake apparatus is provided to improve a yield by deciding whether a wafer is exactly mounted on a heating plate or not. CONSTITUTION: A bake apparatus(100) comprises a chamber(110) having a gate(112), a heating plate(120) mounted with a wafer(200), a lift part for loading or unloading the wafer(200) to or from the heating plate(120), guide pins(140) formed on the heating plate(120) for preventing a slide of the wafer(120) and a detecting part for detecting whether the wafer(200) is parallel with the upper surface of the heating plate(120). The detecting part further includes sensors(152) installed in sensor mounting holes separated a defined distance form the upper surface of the heating plate(120) and a controller(154) connected with the sensors(152).
Patent KR-20020064534-A (KR)
Title: Vibration control apparatus for electrode of wire-cut discharge machine using electro-rheological fluid
Inventor: CHOI SEMG BOK
IPC: G05D19/02
Filed: 2001-02-02
Abstract: PURPOSE: An apparatus for controlling vibration of electrodes in a wire cut electric discharging machine is provided which is capable of improving straightness of a machined surface of a workpiece by controlling uneven vibration of a wire using electrorheological fluid. CONSTITUTION: A wire guide(4) makes a wire(2) has an even straightness. A reel(18) for transferring a wire(2) provides tensile force to the wire(2). A servomechanism is controlled by a CNC system(8). A detector(14) for checking a vibration of the wire(2) during cutting of a workpiece(7), of which detected signal is amplified by an amplifier(15). A voltage amplifier(16) applies a high voltage to a controller(17) for controlling the electrorheological fluid. When the wire is released by a motor(10) from a reel(1) for supplying the wire, the wire(2) is guided by a reel(18) for transferring the wire(2) and the wire guide(4) to cut the work piece(7), which is finally wound around a winding reel(11).
Patent KR-20020066586-A (KR)
Title: Method for forming the bit line in semiconductor device
Inventor: WOO TAK GYUN
IPC: H01L21/28
Filed: 2001-02-12
Abstract: PURPOSE: A formation method of a bit line of a semiconductor device is provided to prevent a short between contacts due to an increase of a contact margin by connecting a bit line with an active region on a semiconductor substrate. CONSTITUTION: After depositing the second interlayer dielectric(150), the second photoresist pattern having a bit line contact formation region is formed. After forming a bit line contact hole(165) by performing a bit line contact etching using the second photoresist pattern as a mask, a short prevention layer(170) is formed on the resultant structure. At this time, the bit line contact hole(165) is used to connect a bit line with an active region on a semiconductor substrate(100) by forming a direct contact without a formation of a land plug poly. Then, spacers are formed on both sidewalls of the bit-line contact hole by polishing the short prevention layer(170). Then, bit line layer is formed on the resultant structure.
Patent KR-20020068180-A (KR)
Title: Fork Arm of Wafer Transfer
Inventor: KIM HYEOK GI
IPC: H01L21/68
Filed: 2001-02-20
Abstract: PURPOSE: A fork arm for a wafer transferring apparatus is provided to prevent scratch and contamination of the fork arm caused by a frequent contact with a wafer, by reducing a contact area with the wafer so that a direct contact with the wafer is minimized. CONSTITUTION: The fork arm(20) is composed of a circular arc of which the end portion has a predetermined radius of curvature. The radius of curvature of the fork arm is expanded to increase the breadth of a wafer settling unit. A penetration part is formed in the almost center of the wafer settling part to reduce a real contact area with the wafer(W).
Patent KR-20010067642-A (KR)
Inventor: JUN HYUNG SUNG
IPC: H04M1/26
Filed: 2001-02-27
Abstract: PURPOSE: A method for automatically and repeatedly making a call when a callee is in busy state is provided to periodically perform a repeat transmission. CONSTITUTION: After pressing a repeat transmission calling button, according to a message for setting up an initial repeat transmission time, a repeat transmission standby time is set up. According to a message for inputting a receiver telephone number, the telephone number is inputted. According to a message for inputting a calling name, when the calling name is inputted, a telephone detects a communication available person through a repeat transmission, and calls a transmitter. If communication is completed, the communicated telephone number is deleted, and a call is transmitted to a next receiver. The telephone repeats the repeat transmission standby time, and constantly performs the repeat transmission until communication with inputted numbers is performed, or until the transmitter cancels a call.
Patent KR-20020069776-A (KR)
Title: Video Advertisement System in Subway
Inventor: KIM SANG BUM
IPC: G06F15/00
Filed: 2001-02-27
Abstract: PURPOSE: A system for a moving image AD(Advertisement) in a subway is provided to broadcast the moving image AD in the subway by a central supply method using an LCD monitor and a DVD(Digital Versatile Disk) player. CONSTITUTION: The LCD monitor is easy to install to a small and narrow place because the LCD monitor is smaller and lighter than a general monitor. The LCD monitor consumes less electricity for displaying the image than a conventional Brown tube monitor. The DVD-player realizes the high-definition/high quality sound and records a lot of high-definition images. Thus, the DVD-player provides more high-definition resolution than a conventional magnetic videotape and realizes the continuous playback without the rewind time. One DVD-player can supply the same AD to all subways.
Patent KR-20020069837-A (KR)
Title: The manufacturing method for the antenna of a communication terminal
Inventor: JUNG CHEOL HO
IPC: H01Q9/16
Filed: 2001-02-28
Abstract: PURPOSE: A method for fabricating an antenna of a communication terminal is provided to enhance work efficiency and productivity and reduce a manufacturing cost by removing only a defective coating layer. CONSTITUTION: A drawing and injecting process is performed(S1). The drawing and injecting process is to form a core line and a coating layer. A cutting process is performed(S2). The cutting process is to cut the core line and coating layer according to a predetermined interval. A core line removal process is performed(S3). The core line removal process is to remove the core line except for the coating layer. A defective part removal process is performed(S4). The defective part removal process is to remove the defective part from the coating layer by cutting the defective part of the coating layer. A shape memory alloy line inserting process is performed(S5). The shape memory alloy line inserting process is to insert a shape memory alloy into the coating layer.
Patent KR-20020071062-A (KR)
Title: Cmos thinfilm transistor have a offsetarea and manifacture method there of
Inventor: PARK SANG IL
IPC: H01L29/786
Filed: 2001-03-02
Abstract: PURPOSE: A CMOS TFT having an offset region and a method for fabricating the same are provided to simplify a fabrication process by reducing the number of mask and improve characteristics of by reducing leakage current in an off state. CONSTITUTION: A buffer layer(41) is formed on a substrate(40). A polysilicon layer is formed on the buffer layer(41). The first mask is formed on the polysilicon layer. Polysilicon layer patterns(42a,42b) are formed on an N type TFT region(40a) and a P type TFT region(40b), respectively. A gate insulating layer, a gate electrode material, and a capping layer are formed sequentially on the buffer layer(41). The second mask layer is formed on the capping layer including the polysilicon layers(42a,42b). A gate electrode(44a) of an N type TFT is formed by patterning the capping layer and the gate electrode material. An insulating layer is formed on a whole surface of the substrate(40). A spacer(47a) is formed on a sidewall of the gate electrode(44a) and a sidewall of the gate electrode material. A high density source/drain region(48) of an N type TFT is formed on the polysilicon layer(42a). The third mask is formed on the substrate(40). A gate electrode(44b) of the P type TFT is formed on the third mask. A high density source/drain region(51) is formed by implanting P type dopants of high density. Gate electrodes(44a,44b) of the N type and the P type TFTs are formed by forming and etching an insulating layer(52). Spacers(52b) are formed on sidewalls of capping layers(45a,45b). A source/drain electrode(53a) of the N type TFT and a source/drain electrode(53b) of the P type TFT are formed by etching the fourth mask.
Patent KR-20010100809-A (KR)
Title: 비휘발성 반도체 기억 장치
IPC: G11C16/02
Filed: 2001-03-07
Abstract: 캐시 기능이나 다치 논리 동작 기능을 각각 최적 조건에서 실현 가능한 재기입/판독 회로를 포함하는 EEPROM을 제공한다. 
     재기입/판독 회로(140)는, 메모리셀 어레이에 선택적으로 접속되는 동시에, 상호 데이터 전송이 가능한 제1 래치 회로(1)와 제2 래치 회로(2)를 포함하고, 2비트의 4치 데이터를 하나의 메모리셀에 다른 임계치 전압 범위로서 기억하도록 하여, 제1 및 제2 래치 회로(1 및 2)를 이용하여 4치 데이터의 상위 비트와 하위 비트의 재기입/판독을 행하는 다치 논리 동작 모드와, 하나의 메모리셀에 기억되는 1 비트의 2치 데이터에 관하여, 제1 어드레스에서 선택된 메모리셀과 제1 래치 회로(1)와의 사이에서 데이터 송수신이 행해지는 기간에, 제2 어드레스에 대하여 제2 래치 회로(2)와 입출력 단자의 사이에서 데이터 송수신이 행해지는 캐시 동작 모드를 갖는다.
Patent KR-20020071997-A (KR)
Title: Apparatus for automatic manufacturing of shaft of side brake in car
Inventor: LEE SANG YEON
IPC: B23D41/00
Filed: 2001-03-08
Abstract: PURPOSE: An automatic shaft processing apparatus is provided to improve the productivity of articles by automatically performing loading, processing and withdrawing processes. CONSTITUTION: A supplying roller(13) is installed at an inner portion of a hopper(12) equipped with a handle. Two-stepped slide lifters, which are operated by an air cylinder(14), are installed at a side of the hopper(12). X and Y-axis pushers(16') are mounted on an upper end of a loading hopper section(1). A loading section is provided to sequentially convey and process workpiece by using a conveying cylinder. A processing section includes clamping jigs, a turning jig, and a main cylinder(33). A tool mounted on tool holders(34) is moved up and down by means of the main cylinder(33). When the workpiece is conveyed into the loading section, a withdrawing section withdraws the workpiece into a conveyer(43).
Patent KR-20020072678-A (KR)
Title: Shunt trip device
Inventor: YOO WON JONG
IPC: H01H83/00
Filed: 2001-03-12
Abstract: PURPOSE: A voltage trip device is provided to prevent a disassembling phenomenon of a movable core due to a tilt angle of the movable core by minimizing an aperture between an inside diameter of a bobbin and an outside diameter of the movable core. CONSTITUTION: A coil(12) is wound around an outside of a cylindrical bobbin(11). A left yoke(13) and a right yoke(13') are formed at a left side and a right side of the cylindrical bobbin(11). A fixed core(14) is fixed to one side of the outside of the bobbin(11). A movable core(15) is installed at the other side of the outside of the bobbin(11). A pin(16) is formed in the right yoke(13'). A rear end part of the movable core(15) is combined with one end part of a lever(17). The lever(17) is elastically supported by a torsion spring(19). A plurality of air exhaustion grooves(20) is formed to a longitudinal direction of an outer circumference of the movable core(15).