Patent SG-11201809376W-A (SG)
Title: Self assembled patterning using patterned hydrophobic surfaces
Inventor: WU YIR-SHYUAN
IPC: G03F7/40
Filed: 2017-05-17
Abstract: PUBLISHEDUNDER THE PATENT COOPERATION TREATY (PCT) WIPO I PCT () International Patent Classification: G03F 7/40 (2006.01) C12Q 1/68 (2006.01) B82Y 30/00 (2011.01) G01N 33/52 (2006.01) (21) International Application Number: PCT/US2017/033169 (22) International Filing Date: 17 May 2017 (17.05.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/338,394 18 May 2016 (18.05.2016) US (71) Applicant: ILLUMINA, INC. [US/US]; 5200 Illumina Way, San Diego, CA 92122 (US). (72) Inventors: WU, Yir-shyuan; 5200 Illumina Way, San Diego, CA 92122 (US). LIN, Yan-you; 5200 Illumina Way, San Diego, CA 92122 (US). BOWEN, M., Shane; 5200 Illumina Way, San Diego, CA 92122 (US). DELAT- TRE, Cyril; 5200 Illumina Way, San Diego, CA (US). ABEILLE, Fabien; 5200 Illumina Way, San Diego, CA 92122 (US). KHURANA, Tarun; 5200 Illumina Way, San Diego, CA 92122 (US). RIVAL, Arnaud; 5200 Illumina Way, San Diego, CA 92122 (US). SABOUNCHI, Poorya; 5200 Illumina Way, San Diego, CA 92122 (US). YUAN, Dajun; 5200 Illumina Way, San Diego, CA 92122 (US). ROGERT BACIGALUPO, Maria, Candelaria; 5200 Il- lumina Way, San Diego, CA 92122 (US). (74) Agent: FULLER, Michael, L.; Knobbe Martens Olson & Bear LLP, 2040 Main Street, Fourteenth Floor, Irvine, CA 92614 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Declarations under Rule 4.17: as to applicant's entitlement to apply for and be granted a patent (Rule 4.17(ii)) as to the applicant's entitlement to claim the priority of the earlier application (Rule 4.17(iii)) — (54) Title: SELF ASSEMBLED PATTERNING USING PATTERNED HYDROPHOBIC SURFACES P5-P7 Oligo/TET (57) : Embodiments provided herewith are directed to self- assembled methods of preparing a patterned surface for sequencing applications including, for example, a patterned flow cell or a pat- terned surface for digital fluidic devices. The methods utilize pho- tolithography to create a patterned surface with a plurality of mi- croscale or nanoscale contours, separated by hydrophobic intersti- tial regions, without the need of oxygen plasma treatment during the photolithography process. In addition, the methods avoid the use of any chemical or mechanical polishing steps after the deposition of a gel material to the contours. W O 20 17 / 20 1198 Al FIG. 26 [Continued on next page] (12) INTERNATIONAL APPLICATION (19) World Intellectual Property Organization International Bureau (43) International Publication Date 23 November 2017 (23.11.2017) IiiimmomiolollmolommiolollmolomimioluovoimIE (10) International Publication Number WO 2017/201198 Al WO 2017/201198 Al MIDEDIMOMMIDIRMEM0010101ROEHMEHMOVOIMIE Published: — with international search report (Art. 21(3))