baber/WOPTO huggingface dataset:
Patent TW-335547-B (TW)
Title: Semiconductor device
Inventor: SUWA MAHITO
IPC: H01L27/108
Filed: 1997-04-15
Granted: 1998-07-01
Abstract: A sort of semiconductor device, having: resistor on the semiconductor of the first conductive type and formed by insulation films; the second conductive semiconductor region forming said resistor region in opposite direction, for use of said resistor formation region on said semiconductor surface, and voltage feeder for feeding of voltage to specific nodes to said semiconductor region.
Patent TW-377450-B (TW)
Title: Display device
Inventor: BEETESON JOHN
IPC: H04N5/68
Filed: 1997-05-14
Granted: 1999-12-21
Abstract: A display device comprises a cathode means for emitting electrons and a permanent magnet having a two-dimensional array of channels extending between opposite poles of the magnet. The magnet generates, in each channel, a magnetic field for forming electrons from the cathode means into an electron beam. A screen receives an electron beam from each channel, having a phosphor coating facing the side of the magnet remote from the cathode. The phosphor coating comprises a plurality of areas, each area being capable of illumination, at least one of the areas being capable of illumination by a plurality of the electron beams. Grid electrode means are disposed between the cathode means and the magnet for controlling flow of electrons from the cathode means into each channel. The grid electrode means are disposed between the cathode means and the magnet for controlling flow of electrons from the cathode means into each channel, the grid electrode means comprising a plurality of elements each element corresponding to a different area of the phosphor capable of illumination. First anode means is disposed between the magnet and the screen for accelerating the electron beam towards the screen.
Patent TW-337551-B (TW)
Title: Method for calibrating a differential pressure fluid flow measuring system
Inventor: SHANAHAN EUGENE MILES
IPC: G01F25/00
Filed: 1997-06-27
Granted: 1998-08-01
Abstract: A flow measurement system used for measurement of differential pressure fluid flow pressures comprising a primary flow sensor and a secondary electronic conversion apparatus for converting high and low fluid pressure signals from the primary flow sensor to an electronic signal output presentative of fluid flow, a process for calibrating the system as an integral unit, comprising the steps of applying a plyrality of known reference fluid flow rates to the primary flow sensor over the system^s operation range of flow conditions, sensing the electrical output of the secondary electronic conversion apparatus for each of the said plurality of reference fluid flow rates, establishing a correction factor for each of said recorded values of electrical output which will tend to linearize the relationship between fluid flow rate and the electrical output of the measuring system, and storing the correction factors in non-volatile memory in a microprocessor which is part of the secondary electronic conversion apparatus.
Patent TW-440466-B (TW)
Title: Process for the preparation of a micro-meso porous material with a high surface area and controlled distribution of the porosity
Inventor: PEREGO CARLO
IPC: B01J21/12
Filed: 1997-05-22
Granted: 2001-06-16
Abstract: The present invention relates to a process for the preparation of a micro-meso porous material which comprises: (a) preparing a mixture starting from a tetraalkylortho-silicate, a C3-C6 alkyl alcohol or dialcohol, a tetra-alkylammonium hydroxide having the formula R1(R2)3N-OH wherein R1 is a C3-C7 alkyl and R2 is a C1 or C3-C7 alkyl, optionally in the presence of one or more metal compounds, in which the molar ratios are within the following ranges: alcohol/sio2 < or equal to 20; R1(R2)3N-OH/sio2 = 0.05-0.4; H2O/sio2 = 1-40; metal oxides/sio2 = 0-0.02; (b) subjecting this mixture to hydrolysis and subsequent gelation at a temperature of between 20 DEG C and a temperature close to the boiling point of the alcohol or mixture of alcohols present; (c) subjecting the gel obtained to drying and calcination. The material thus obtained is characterized by a surface area of more than 500 m<SP>2</SP>/g, a pore volume of between 0.3 and 1.3 ml/g, an average pore diameter of less than 40 A and an X-ray diffraction spectrum (XRD) from powders which does not have a crystalline structure, but possibly a widespread ""scattering"" with angular values of not more than 2θ = 5 DEG. Said material can be conveniently used as a heterogeneous catalyst, as an adsorbent or as a carrier for catalysts in industrial processes, in the fields of refining, petrochemistry, basic chemistry and fine chemistry.
Patent TW-354258-B (TW)
Title: Mechanical clot treatment device
Inventor: ENGELSON ERIK T
IPC: A61M25/01
Filed: 1997-07-31
Granted: 1999-03-11
Abstract: A clot treatment device comprising a core member and a cage assembly, featuring: (a) the core member having a distal end and a proximal end and including a core wire passing through the core member which can rotate corresponding to the core member, but cannot be removed from the cage assembly, and (b) the cage assembly having a distal end and a proximal end and including a ultra-elastic braid roughly co-axial with the core member and having a first deployment shape and a second expansion shape which are different from each other; the proximal end of the cage assembly can rotatably attached to the rotatable core wire.
Patent TW-347501-B (TW)
Title: Memory and microcomputer
Inventor: TUCHIYA MASAHIRO
IPC: G06F1/32
Filed: 1997-09-25
Granted: 1998-12-11
Abstract: A memory characterized in comprising: a high speed mode capable of accessing data at a high speed while consuming more current; and a low current mode for accessing data at a speed lower than that of the high speed mode while consuming less current.
Patent TW-376575-B (TW)
Title: Method of making poly wires
Inventor: Chen zhi-bin
IPC: H01L23/48
Filed: 1997-10-29
Granted: 1999-12-11
Abstract: A method of making poly wires comprises controlling the performance of the over etching step, using a second over etching step to remove the poly remained on the surface of the device structure, forming a second polymer material layer on the device structure after the first over etching to have a polymer material with a sufficient thickness on the surface junction between the poly layer and the device structure thereby avoiding the formation of the notch which causes errors in the key dimensions.
Patent TW-393592-B (TW)
Title: Rinsing solution
Inventor: YAMAMOTO KENJI
IPC: H01L21/027
Filed: 1997-12-19
Granted: 2000-06-11
Abstract: A rinsing solution for lithography, which comprises a homogeneous solution of 100 parts by weight of a water-soluble organic solvent and 0.5 to 200 parts by weight of water.  The water-soluble organic solvent may be any water-miscible organic solvent that have been used as solvents or rinsing solutions for resists or anti-reflective coatings.  Preferred examples of the water-soluble organic solvent are a mixture of propylene glycol monomethyl ether and propylene glycol monometyl ether acetate, a mixture of propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate, and ethyl lactate.  This rinsing solution is useful for dissolving away or stripping away cured or non-cured unnecessary resists, anti-reflective coatings, etc. from substrates such as in integrated circuit elements, color filters, liquid crystal display elements, etc. or from a resist-applying apparatus.
Patent TW-463261-B (TW)
Title: Cleaning liquid and cleaning method for semiconductor substrates
Inventor: MATSUO CHIZUKO
IPC: H01L21/306
Filed: 1998-01-09
Granted: 2001-11-11
Abstract: The present invention relates to the cleaning solution and cleaning method of semiconductor substrate that can effectively remove both metal impurities and minute particles adhered to semiconductor substrate surface. The cleaning solution 15, which has a PH value of 2 to 4 and contains organic acid with 0.0001 to 0.1 weight percent and hydrofluoric acid with 0.005 to 0.25 weight percent, is used to clean semiconductor substrate 11. When the contaminated substrate 11 is soaked in the cleaning solution, the naturally oxidized film 12 on the substrate surface can be stripped by hydrofluoric acid so as to move the minute particles 13, metal impurity 14 on the film and metal impurity 14 in the film to the cleaning solution (b). Because the cleaning solution contains organic acid and acid solution with a PH value of 2 to 4, both minute particles and substrate surface have negative electric polarity. By using the state-distribution effects of organic acid, metal impurity ions in the solution become negative state-distribution ions. Consequently, surface potentials of minute particles and metal impurity have the same negative potential as that of substrate surface so as to prevent minute particles and metal impurities from adhering or re-adhering to the substrate.
Patent TW-533058-B (TW)
Title: Solid mixtures based on sulfonylureas and adjuvants
Inventor: BRATZ MATTHIAS
IPC: A01N47/36
Filed: 1998-02-05
Granted: 2003-05-21
Abstract: Solid mixtures comprising (a) an active ingredient from the group of the sulfonylureas and (b) a sulfate- or sulfonate-containing surfactant. A solid mixture comprising (a) from 0.5 to 75% by weight, based on the total weight of the solid mixture, of an active ingredient from the group of the sulfonylurease and (b) from 1 to 75% by weight, based on the total weight of the solid mixture, of a sulfate- or sulfonate-containing surfactant.
Patent TW-407196-B (TW)
Title: A fiducial system and method for conducting an inspection to determine if a second element is properly aligned relative to a first element
Inventor: GIBSON BRUCE DAVID
IPC: G01B21/00
Filed: 1998-04-01
Granted: 2000-10-01
Abstract: A fiducial system is provided for use during an alignment inspection of first and second adjacent elements. The fiducial system comprises an inspection opening in the second element. It further comprises first and second fiducial portions on the first element positioned and sized to provide an accurate indication when viewed through the inspection opening of whether the second element is properly positioned relative to the first element regardless of the size of the inspection opening as long as the opening has a size greater than or equal to a lower limit dimension. The first element may comprise an ink jet printhead heater chip and the second element may comprise an ink jet printhead nozzle plate.
Patent TW-555694-B (TW)
Title: Tetrahydroisoquinolinyl amides, their preparation and pharmaceutical composition containing the same
Inventor: THOMPSON MERVYN
IPC: A61P25/06
Filed: 1998-03-20
Granted: 2003-10-01
Abstract: Compounds of formula (I) and pharmaceutically acceptable salts thereof: where Q is a monocychc or bicyclic aryl or heteroaryl ring, R1 is hydrogen, C1-6alkyl (optionally substituted by hydroxy or C1-4alkoxy), C1-6alkenyl. C1-6alkynyl, C1-6alkylCO-, formyl, CF3CO- or C1-6alkylSO2-, R2 is hydrogen or up to three substituents selected from halogen, NO2, CN, N3, CF3O-, CF3S-, CF3CO-, trifluoromethyldiazirinyl, C1-6alkyl, C1-6alkenyl, C1-6alkynyl, C1-6perfluoroalkyl, C3-6cycloalkyl, C3-6cycloalkl-C1-4alkyl-, C1-6alkylO-, C1-6alkylCO-, C3-6cycloalkylO-, C3-6cycloalkylCO-, C3-6cycloalkyl-C1-4alkylO-, C3-6cycloalkyl-C1-4alkylCO-, phenyl, phenoxy, benzyloxy, benzoyl, phenyl-C1-4alkyl-, C1-6alkylS-, C1-6alkylS02-, (C1-4alkyl)2NSO2-, (C1-4alkyl)NHSO2-, (C1-4alkyl)2NCO-, (C1-4alkyl)NHCO- or CONH2; or -NR3R4 where R3 is hydrogen or C1-4alkyl, and R4 is hydrogen, C1-4alkyl. formyl, -CO2C1-4alkyl or -COC1-4alkyl; or two R2 groups together form a carbocyclic ring that is saturated or unsaturated and unsubstituted or substituted by -OH or =O; and X is hydrogen, halogen, C1-6alkoxy, C1-6alkyl, amino or trifluoroacetylamino; but when X is hydrogen excluding compounds in which R2 is 2-alkoxy and when X is halogen excluding the compounds N-(7-iodo-2-methyl-1,2,3,4-tetrahydroisoquinolin-5-yl)-5-benzoyl-2-methoxybenzamide, N-(7-iodo-1,2,3,4-tetrahydroisoquinolin-5-yl)-5-benzoyl-2-methoxybenzamide, N-(5-iodo-1,2,3,4-tetrahydroisoquinolin-7-yl)-5-benzoyl-2-methoxybenzamide,N-(5-iodo-1,2,3,4-tetrahydroisoquinolin-7-yl)-2-methoxy-4-trifluoromethyldiazirnylbenzamide, N-(5-iodo-1,2,3,4-tetrahydroisoquinolin-7-yl)-2-methoxy-5-trifluoromethyldiazirinylbenzamide, N-(7-iodo-1,2,3,4-tetrahydroisoquinolin-5-yl)-2-methoxy-5-trifluoromethyldiazirinyl benzamide and N-(8-fluoro-2-methyl-1,2,3,4-tetrahydroisoquinolin-5-yl)-4-t-butyl-2-methoxybenzamide, are useful inter alia in the treatment and prophylaxis of epilepsy.
Patent TW-401440-B (TW)
Title: Polymer compositions having improved elongation
Inventor: JIALANELLA GARY L
IPC: H04N5/44
Filed: 1998-04-14
Granted: 2000-08-11
Abstract: The subject invention is directed to polymer compositions which comprise a homogeneous ethylene/<alpha>-olefin interpolymer, a wax and a nucleating agent, wherein the nucleating agent is provided in an effective amount such that the percent elongation at break of the polymer composition is at least four times greater than the percent elongation at break of a comparative composition which lacks the nucleating agent. The polymer compositions of the invention will find utility in applications requiring high elongation at break, while maintaining a high onset of crystallization temperature, such as in the high-speed coating of fabrics, carpet backing, floor tile and sheeting, and adhesives.
Patent TW-470696-B (TW)
Title: Process for producing molded article
Inventor: KIMURA HIDENORI
IPC: B29C49/00
Filed: 1998-05-13
Granted: 2002-01-01
Abstract: A process for producing molded article is included in this invention, which is divided formed molds 3, 4 individually holding produced articles 9 inside. After cooling, when they are taken away from formed molds 3, 4, they will connect with the extruded burr 7, coming from the process of produced article 9 taken away from divided formed molds 3, 4. Using the chucks 6 of picking device for produced article to hold divided formed molds 3, 4, till they are opened.
Patent TW-432608-B (TW)
Title: Method for forming shallow trench isolation in integrated circuit
Inventor: HUANG CHANG-CHI
IPC: H01L21/76
Filed: 1998-06-06
Granted: 2001-05-01
Abstract: A method for forming shallow trench isolation in integrated circuit comprises sequentially forming a silicon nitride layer and a titanium nitride layer on the semiconductor substrate; using the photolithography and ion etching technique to form the shallow trench; and forming a silicon oxide to fill up the shallow trench. The silicon oxide uses the ozone/TEOS as the reaction gas and is formed by multi-deposition with sub-atmospheric chemical vapor deposition method. The process will appropriately adjust the ratio of ozone/TEOS to increase the depositing speed on silicon substrate surface but reducing the speed on the titanium nitride surface. Then, a chemical mechanical polishing is employed to conduct back etching process on the silicon oxide using the titanium nitride as the etching stop layer.
Patent TW-378296-B (TW)
Title: Method of detection for the network connection status of computer system and device therefore
Inventor: WEI YI-SHENG
IPC: G06F13/14
Filed: 1998-06-24
Granted: 2000-01-01
Abstract: The present invention relates to a method of detection for the network connection status of a computer system and a device therefore. If the connection status is ""connected"", the intelligent automatic detection mechanism for the connection status allows the system to operate at the normal operation mode. If the connection status is ""disconnected"", the system operates at a suspended operation mode. The mechanism comprises an automatic connection polling controller and a polling pulse cycle generator. Said generator is used to generate a sequence of polling pulse cycle to repeatedly poll the connection status of the network facility. In a polling pulse cycle, a medium-independent interface management frame having a preamble field is generated. Said improved preamble field ensures the integrity and correctness of the polling pulse cycle.
Patent TW-515824-B (TW)
Title: Process for preparing an asphalt composition
Inventor: HENDRIKS HENRICUS ENGELBERTUS
IPC: E01C7/18
Filed: 1998-06-29
Granted: 2003-01-01
Abstract: The present invention provides a process for preparing an open-graded asphalt composition which comprises adding a very hard binder component to a mixture of a non-emulsified very soft binder component and aggregate at a temperature of less than 140 DEG C.
Patent TW-388818-B (TW)
Title: Method and system for single cycle direct execution of floating-point status and control register instructions
Inventor: OLSON CHRISTOPHER HANS
IPC: G06F9/38
Filed: 1998-07-21
Granted: 2000-05-01
Abstract: A method and system for providing direct execution of a serializing instruction in a processor is disclosed. The processor has the serializing instruction and a nonserializing instruction. The processor includes execution logic having a pipeline for executing the nonserializing instruction. The processor also includes logic separate from the exceution logic for executing the serializing instruction. The method and system include recognizing the serializing instruction, recognizing the nonserializing instruction, providing the nonserializing instruction to the execution logic, and providing the serializing instruction to the separate logic. The serializing instruction is executed without providing the serializing to the pipeline.
Patent TW-415853-B (TW)
Title: A method for decomposing nitrogen fluoride or sulfur fluoride, and reagent for decomposing thereof
Inventor: IZUMIKAWA CHIAKI
IPC: B01D53/68
Filed: 1998-08-07
Granted: 2000-12-21
Abstract: A method for decomposing nitrogen fluoride or sulfur fluoride completed by bringing solid reagent containing monomer carbon, at least one or more alkali earth metal element and if necessary at least one or more alkali metal element to contact with gassy nitrogen fluoride or sulfur fluoride, in which fluoride component of nitrogen fluoride is fixed on said reagent.
Patent TW-418083-B (TW)
Title: Disposable absorbent articles providing a skin condition benefit
Inventor: ELDER GRETCHEN LOUISE
IPC: A61F13/514
Filed: 1998-09-10
Granted: 2001-01-11
Abstract: The present invention relates to absorbent articles which provide improved protection against skin overhydration. A particularly preferred embodiment of an absorbent article of the present invention comprises a body contacting surface having a skin care composition thereon that, when at least a portion of the composition is transferred to a wearer's skin by normal body motion or body heat, the material is effective in providing a skin condition benefit and a backsheet having a MVTR of at least about 500 g/m<2>/24 hr. An alternative preferred embodiment of the absorbent article further includes a liquid impermeable, breathable backsheet having a mass vapor transmission rate value (MVTR) of at least about 1300 g/m<2>/24 hr and an absorbent core having a post acquisition collagen rewet method value (PACORM) with a PACORM:MVTR ratio is less than 0.05 mg/(g/m<2>/24 hr).
Patent TW-422889-B (TW)
Title: Process for depositing a bond coat for a thermal barrier coating system
Inventor: ZHENG XIAOCI MAGGIE
IPC: C23C4/06
Filed: 1998-09-10
Granted: 2001-02-21
Abstract: A method of depositing a bond coat (16) of a thermal barrier coating (TBC) system (14) for components designed for use in a hostile thermal environment, such as turbine, combustor and augmentor components (10) of a gas turbine engine. The method yields a bond coat (16) having an adequate surface roughness for adhering a plasma-sprayed ceramic layer (18) while also producing a bond coat (16) that is dense with low porosity, thereby yielding a thermal barrier coating system (14) that is highly resistant to spallation. The method generally entails forming the bond coat (16) by depositing two metal powders on the substrate (12) using either a vacuum plasma spraying (VPS) or high velocity oxy-fuel (HVOF) technique. The particle size distributions of the two powders are chosen to yield a bimodal (dual-peak) particle size distribution that will produce a VPS and HVOF bond coat (16) characterized by a macro-surface roughness of at least about 350 microinches Ra attributable to particles of the coarser powder. The particles of the finer powder fill the interstices between particles of the coarser powder to achieve a density of at least about 95% of theoretical density, and contribute to a micro-surface roughness that, in combination with the macro-surface roughness provided by the coarser particles, enhances adhesion of the ceramic layer (18).
Patent TW-380306-B (TW)
Title: Manufacturing method and structure for low resistance SAC poly landing pads
Inventor: JUANG KUEN-RUNG
IPC: H01L23/50
Filed: 1998-09-11
Granted: 2000-01-21
Abstract: The invention provides a kind of manufacturing method and structure for low resistance SAC poly landing pads which is to form the self-aligned polycide landing pads on the semiconductor substrate with electric components in which at least one layer of barrier metal layers is formed below and on sidewall of the polycide landing pads and at least one self-aligned salcide layer is formed on top of polycide landing pads. The invention can effectively reduce the resistance of polycide landing pads and the energy waste of circuits and increase the processing speed of circuits.
Patent TW-430722-B (TW)
Title: Cooled screw-vacuum-pump
Inventor: BAHNEN RUDOLF
IPC: F04C29/04
Filed: 1998-09-25
Granted: 2001-04-21
Abstract: This invention relates to a cooled screw-vacuum-pump (1) with two rotary systems (5, 6), said rotary systems (5, 6) consist of a screw-rotor (5) and a shaft (6); with a movable rotor-supporter which has two bearings (7, 8), which are separately located on each shaft; and with a bearing-side open hollow-space (31) in each rotor (5), in which the rotor-interior-cooling device is located; in order to improve the cooling in the rotor, it is suggested that the rotor-side bearing (7) of the supporter is located outside of the hollow-space (31) in rotor (5), so that more space can be provided for an effective cooling.
Patent TW-466127-B (TW)
Title: Analysis system for cleanroom environment and analysis method thereof
Inventor: YOU NAM-HEE
IPC: G01N15/00
Filed: 1998-10-21
Granted: 2001-12-01
Abstract: There are provided an analysis system for the cleanroom environment and an analysis method of analyzing the water-soluble contaminants of the cleanroom by condensing the vapor in the air of the cleanroom. The analysis system comprises: a condensing unit for condensing the water-soluble contaminants contained in the reference air of a cleanroom by contacting the reference air with cooled surface; and an analyzing unit for analyzing the condensed water received from the condensing unit. The analysis method comprises the steps of: (a) condensing the water-soluble contaminants contained in the reference air by cooling the reference air to be analyzed; (b) supplying the condensed water to the analyzing unit by a certain amount; and (c) analyzing the supplied condensed water in the analyzing unit.
Patent TW-396546-B (TW)
Title: The structure and manufacturing method of the capacitor's bottom plate
Inventor: CHEN SHR-CHING
IPC: H01L21/8242
Filed: 1998-10-31
Granted: 2000-07-01
Abstract: This is the capacitor bottom plate's structure and producing method. A layer of doped Poly-silicon is formed on the dielectric layer of the substrate provided. Afterward, a layer of insulation on the Poly-silicon doping layer is formed and a layer of amorphous silicon is formed on said insulation layer. Then, the amorphous layer, the insulation layer and the substrate are defined to form a bottom plate main structure. After that, the main structure's side-wall has a layer of amorphous silicon gap wall formed and there is a layer of hemispherical grain silicon formed on the amorphous silicon layer and the amorphous silicon gap wall.