Patent IE-39231-B1 (IE)
Title: Improvements in or relating to light sensistive material
IPC: C08G85/00
Filed: 1974-04-22
Abstract: 1466252 Light-sensitive polymeric material VICKERS Ltd 25 April 1974 [26 April 1973] 19994/73 Headings C3R C3P and C3B [Also in Divisions G2 and C2] A light sensitive material comprises the reaction product of a polymer containing a plurality of epoxide groups, hydroxyl groups or primary and/or secondary amino groups with a halosulphonyl group containing compound of the formula wherein R represents an aromatic radical; a is 0 or 1, R 1 , R 2 and R 3 each represents a hydrogen atom, a halogen atom or a cyano, alkyl, aryl, alkoxy, aryloxy, aralkyl or aralkoxy group; and R 4 is an alkoxy carbonyl group, a carboxyl group, a phenyl group substituted with a deactivating group or a halosulphonyl substituted phenyl group when a is 0 or 1 and additionally when a is 1 a hydrogen atom or an alkyl or cyano group, and X represents a halosulphonyl group except when R 4 is a halosulphonyl phenyl group in which case X is a deactivating syrup, e.g. a halogen atom. Suitable polymers are epoxy and novolak/epoxy resins, phenol/aldehyde resins, phenoxy resins, poly(vinylalcohol), cellulose or a cellulose derivative, a partially hydrolysed poly(vinyl ester), poly(hydroxyethylacrylate), poly(hydroxyethyl methacrylate), a partially hydrolysed acetal, a phenoxy alkanol/aldehyde condensate, poly- (vinyl amine), an aniline/formaldehyde resin, poly(ethyleneimine) or the condensation product of a styrene/maleic anhydride copolymer or an alkyl vinylether/maleic anhydride copolymer with an excess of an aliphatic or aromatic diamine. The polymer may be additionally reacted before, during or after the reaction with the halosulphonyl group containing compound, with a halide of an aromatic sulphonic acid, an aliphatic or aromatic carboxylic acid, the halide containing no free carboxylic acid groups. Suitable halides are those of p-toluene sulphonic acid, acetic acid, propionic acid, benzoic acid, p-azido-benzoic acid or cinnamic acid. In the examples the following light-sensitive materials are prepared: (1) the reaction product of chlorosulphonylcinnamylidene malonic acid and either (i) a resorcinol/HCHO resin, or (ii) an epoxide resin prepared by condensing 2,2- bis - (p - hydroxyphenyl)propane with excess epichlorohydrin, or (iii) 2-phenoxyethanol- HCHO resin, or (iv) the reaction product of a phenol/HCHO resin and p-azidobenzoyl chloride, or (v) a styrene-maleic anhydride copolymer that has been reacted with excess ethylene diamine; or (vi) a polyethylene imine; (2) the reaction product of α-(chlorosulphonylphenyl)- chlorocinnamic acid, chlorosulphonylcinnamylidene malonic acid and a resorcinol/HCHO resin; (3) the reaction product of chlorosulphonylcinnamylidenecyanoacetic acid and a resorcinol/HCHO resin; (4) the reaction product of chlorosulphonyl-delta-chlorocinnamylidene malonic acid and a resorcinol-HCHO resin. The light sensitive materials are used to produce printing plates by applying a solution thereof in DMF and 2-ethoxyethanol to an aluminium sheet, drying the plate and then image-wise exposing the plate. A developer, e.g. trisodium phosphate or sodium metasilicate solution is then applied to remove the non- light-struck areas of the layer.
[GB1466252A]