baber/WOPTO huggingface dataset:
Patent JP-H0341466-A (JP)
Title: Electrostatic latent image developer and method for developing the same
Inventor: NIHEI YOSHITO
IPC: G03G13/09
Filed: 1989-07-07
Abstract: PURPOSE:To obtain high transfer efficiency by specifying specific volumetric resistance ratios RT/RM, RC/RM when the specific volumetric resistances of a magnetic toner, carrier and magnetic particle are respectively designated as RT, RC and RM and the triboelectrostatic charge quantity of the carrier to respectively specific values. CONSTITUTION:The developer contains the magnetic toner contg. the magnetic powder and resin, the carrier and the magnetic particles and the specific volumet ric resistance ratio RT/RM is 1X10<8> to 1X10<12> and RC/RM is 10 to 1X10<7> when the specific volumetric resistances of a magnetic toner, carrier and magnetic particle are respectively designated as RT, RC and RM. The triboelectrostatic charge quantity of the carrier is -9 to -23muC/g. Since the thickening of characters is eliminated in this way, the consumption of the developer per one sheet decreases and the high transfer efficiency is obtd. The splashing of the toner to the white ground part around the printing part decreases and the high resolution of the electrostatic latent images is faithfully reproduced. The excellent resolution is obtd. and a change in the image density is lessened even if continuous printing is executed. Good image quality is thus obtd.
Patent JP-S5879140-A (JP)
Title: Cleaning device for detection chamber in measurement device of grain polishing degree
Inventor: SATAKE TOSHIHIKO
IPC: G01N21/15
Filed: 1981-11-05
Abstract: PURPOSE:To make it always possible to measure exactly the degree of grain polishing by installing a cleaner at the tip end of a measurement rod that is provided in the detection section chamber of a grain polishing measurement device with free entrance and exit and removing attached objects with the cleaner every time the measurement is made. CONSTITUTION:On the right side of an integration ball 1 a detection chamber 2 in which specimens flow and a light-receiving element 8 for light that passes through are provided, and below the ball 1 a light-receiving element 8' for reflected light, and on the left side a light source device that consists of a light source lamp 4, etc. Both wall faces of the chamber 2 are formed with quartz glass 18 and a measurement rod 20 at the tip end of which a cleaner 19 is provided is installed with free entrance into and exit from the chamber 2. When the degree of polishing is measured, the measurement rod 20 is inserted by a driving motor 23 and attached objects are cleaned by the cleaner 19, then a standard white plate 22 is inserted to set up the standard polishing by light-receiving elements 8 and 8'. Next, the degree of polishing is measured by means of a specified circuit. Accordingly, everytime the measurement is made, attached objects are removed, and the degree of polishing can be exactly measured.
Patent JP-S6241809-A (JP)
Title: Revetment construction using notched continuous block
Inventor: FUJII HIROSHI
IPC: E02B3/14
Filed: 1986-07-26
Abstract: PURPOSE:To improve the efficiency of work, by arranging continuous blocks up to the bending points of the face of slope, and by providing the upper end positions with notched continuous blocks. CONSTITUTION:After respective continuous blocks A, B, B'', C are arranged, the upper end or top positions are provided with notched continuous blocks B'. Then, slots are bored through the respective blocks A, B, B'', C, and reinforcements 8 are vertically inserted through, and the respective end sections of the reinforcements 8 are exposed and positioned at the respective notches 7 of the blocks B'. After that, the same blocks B' are arranged in opposition to blocks 7', and the respective blocks B. B'', C are arranged on the blocks. Besides, the reinforcements 8 are inserted through the blocks B, B'', C and the end sections are positioned at the notches 7, and the both reinforcements 8 are confronted in contact with each other to be welded. After that, the cavities of the notches 7 are filled up with mortar.
Patent JP-S6354798-A (JP)
Inventor: HAYAKAWA HIROKI
IPC: H05K3/34
Filed: 1987-07-15
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S60100523-A (JP)
Inventor: AN BODONAA
IPC: A61K/
Filed: 1984-08-24
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H02270341-A (JP)
Title: Probing device
Inventor: KARASAWA WATARU
IPC: G01R1/067
Filed: 1989-07-07
Abstract: PURPOSE:To obtain a probing device, which is provided with a function equivalent to these of two units to the function of one unit, does never stop the following measurement even during marking and can be utilized to a temperature test as well, by a method wherein the measured results, which are measured by each measuring part, of subjects to be measured are stored and a mark is added to the subjects to be measured by one system of a marking mechanism on the basis of storage information stored in a storage means. CONSTITUTION:In a probing device, in which a measured subject 34 straddles at least two systems of measuring parts 2 and 3 from a housing container 5a and are measured, a storage means for storing the measured results, which are measured by each measuring part 2 and 3, of the subject 34 is provided and a mark is added to the subject 34 by one system of a marking mechanism provided at a previously prescribed position on the basis of storage information stored in the storage means. For example, the same type of semiconductor wafers 34 housed in the same cassette 5 straddle two measuring parts 2 and 3 and a measurement is executed. After such the measurement is executed about prescribed sheets of the wafers 34 at each measuring part 2 and 3, a marking treatment is exclusively conducted at the measuring part 2 provided with a marking part 20 and a measuring operation is successively executed at the other measuring part 3 during the marking treatment at the measuring part 2.
Patent JP-S6374546-A (JP)
Inventor: UIRIAMU EI EDEI
IPC: B23Q7/04
Filed: 1987-07-15
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S6069476-A (JP)
Inventor: NAKANISHI KEIJI
IPC: F25D11/00
Filed: 1983-09-27
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0924535-A (JP)
Title: Width regulator for extrusion die
Inventor: MATSUBAYASHI SABURO
IPC: B29C48/31
Filed: 1995-07-13
Abstract: PROBLEM TO BE SOLVED: To provide the width regulator for an extrusion die facilitating processing, assembling and regulating operations with the simple shapes of members. SOLUTION: A width regulating fitment 5 and a strip-like wedge piece 6 are arranged movably in a die widthwise direction in the opening 2c of a die formed of both side plates 3a, 3b and a lip 2 connected to a die body 1. The width regulator comprises support fittings 4 fixed to the plates 3a, 3b, two sets of feed screws 8, 9 spirally inserted into the fittings 4 to move the fitment 5 and the piece 6 in the die widthwise direction, and a fixture 7 engaged with the guide groove 3d provided at the end of the lip 2 to grasp the fitment 5 and the piece 6 to be movable in the die widthwise direction along the guide groove 2d.
Patent JP-H0838268-A (JP)
Title: Shelf board lifting mechanism
Inventor: TANIGUCHI TATSUO
IPC: A47B51/00
Filed: 1994-07-28
Abstract: PURPOSE:To prevent the rolling and the inclination after long time use of the shelf boards, by a mechanism wherein one end of a long narrow flat plate is fixed to a next shelf board and, a hanging bolt is floatingly fitted to a guide slot. CONSTITUTION:Guiding and hanging bolts 71 installed on the four corners of a shelf board 41, are floatingly fitted to guide slots 51A of long narrow flat steel plates 51 fixed, at one end, to a lower shelf board 42. When steel belts 28, 29 are rolled up by a driving motor 30, the upward movement of the shelf board 41 is performed in a stable condition between the right and left steel plates 51, since the guiding and hanging bolts 71 are guided and moved along the guide slots 51A. Since the guiding and hanging bolts 71 of the uppermost shelf board 41 are caught by the uppermost parts of the guide slots 51A, the lower shelf board 42 is pulled up at the same time as the shelf board 41 when the motor 30 is driven again. Consequently, the shelf boards do not incline after long time use, and do not roll when used.
Patent JP-2000010199-A (JP)
Title: Photographic sensitive material processor
Inventor: HIGASHIMOTO YOSHIHISA
IPC: G03B27/46
Filed: 1998-06-24
Abstract: PROBLEM TO BE SOLVED: To miniaturize a photographic sensitive material processor consecutively performing a series of processing from printing to developing. SOLUTION: A driving gear 27 is provided in a carrying unit 13 provided in a printing processing part 10 and pulled out to the outside from the aperture part of a housing 23. An idle gear 28 meshed with the gear 27 and the driven gear 37 of a feeding device 36 provided on a downstream side of the unit 13 is supported to freely rock centered on the shaft center of the gear 28. The gear 28 is rocked to the lower position of the gear 27 so as to prevent the gear 28 from interfering in a column frame 29 at the time of pulling out the unit 13 to the outside and eliminate the need of securing a wide space for avoiding the interference between the gear 28 and the frame 29, whereby the processor is miniaturized.
Patent JP-H0465870-A (JP)
Title: Manufacture of semiconductor device
Inventor: YANAI TETSURO
IPC: H01L21/28
Filed: 1990-07-06
Abstract: PURPOSE:To prevent the leak current caused by tunneling between bands, by forming a conductive layer on the substrate side of a trench which layer has a conductivity type opposite to the conductivity type of an element forming region. CONSTITUTION:A contact hole 7 is formed on a conductive layer 5. Polycrystalline silicon 8 of 0.4mum in thickness is formed on the whole surface, and phosphorus is thermally diffused. A trench 9 is formed by etching the polycrystalline silicon 8. Phosphorus is thermally diffused in the trench 9 by using phosphorus oxychloride, under the condition of 875 deg.C and 20 minutes. Thereby an N-type conductive layer 10 is formed which is a conductive layer of a conductivity type opposite to a substrate 1 of its region. Said layer 10 can be formed also by introducing phosphorus ions or arsenic ions by ion implantation method. After capacitor dielectric 11 is formed, polycrystalline silicon 12 is formed and patterned. Thereon an oxide film 13 is formed and flattened. After a contact hole 14 of other region is formed, an Al wiring 15 is formed.
Patent JP-H0688334-A (JP)
Title: Manufacturing apparatus for reinforcing bar basket for cast-in-place concrete pile
Inventor: HAINO TOSHIO
IPC: E02D5/36
Filed: 1993-06-23
Abstract: PURPOSE:To mechanize the manufacture of reinforcing bar basket for cast-in- place concrete executed by manual work. CONSTITUTION:An operation section 03a is positioned on both ends of a longer- sized base 01 where there is installed a reinforcing bar operation section which provides a suspension holding part 05 for a hoop bar ring, a holding function for reinforcing bars and an intermittent rotary function. The reinforcing bar ring is held at a specified position and what is more, main bars are welded at the outer peripheral parts of the reinforcing bars per intermittent rotary operation. When the welding of main bars are over, a vertical moving body of the operation section 03a and a center jack 04 are used to lift up a semi- product so that a hoop bar ring preliminarily suspended on the suspension holding part 05 may be out-fitted into the outer peripheral part of the main bars, thereby manufacturing a reinforcing bar basket.
Patent JP-2000008561-A (JP)
Title: Eaves gutter joint
Inventor: SUGIMOTO KENZO
IPC: E04D13/068
Filed: 1998-06-24
Abstract: PROBLEM TO BE SOLVED: To provide an eaves gutter joint causing no water leakage by uniformly applying an adhesive to a gap between the inner periphery of the eaves gutter joint and the outer peripheries of eaves gutters at an eaves gutter junction. SOLUTION: The eaves gutter junction 1 of an eaves gutter joint A is constituted of a bottom section 2 and side wall sections 3, 4 erected on both side edges of the bottom section 2. Lugs 21, 32, 42 are provided on the outer periphery at both end sections of the bottom section 2 and the side wall sections 3, 4. Projections 34, 44 are provided on the outer periphery in the eaves gutter direction of the eaves gutter joint A, and stoppers 35, 45 are provided on the outer peripheries of the projections 34, 44. The inner periphery of the end section of an eaves gutter 5 is kept in contact with the outer peripheries of the tip faces of the lugs 21, 32, 42 of the eaves gutter junction 1 and the projections 34, 44 of the eaves gutter joint A, and a gap section 7 is formed between the inner periphery of the eaves gutter 5 and the outer periphery of the eaves gutter joint A.
Patent JP-2001000366-A (JP)
Title: Nursing stand
Inventor: NOGAKI HISASHI
IPC: A61G5/00
Filed: 1999-06-23
Abstract: PROBLEM TO BE SOLVED: To provide a nursing stand easily installed, removed and replaced in the case of being installed in a washroom space for the handicapped, adjustable in the installation height of a transfer face and suitable for a user's passage-movement and safe, comfortable use. SOLUTION: A base 30 of a nursing stand is fixed to a floor so as to minimize projection on a floor face. The base 30 and a post 20 are separably formed, and a fitting height adjusting mechanism for the post 20, a fitting height adjusting mechanism for a transfer part 10, an opening/closing mechanism for the transfer part 10, a vertical moving mechanism for the transfer part 10 and a vertical movement synchronizing mechanism for the transfer part 10 are added. The nursing stand can thereby be used safely and comfortably in addition to facilitating body installation, replacement and removal work.
Patent JP-2001011606-A (JP)
Title: Vapor deposition equipment having co-axial vacuum arc vapor deposition source
Inventor: AGAWA YOSHIAKI
IPC: C23C14/24
Filed: 1999-06-24
Abstract: PROBLEM TO BE SOLVED: To provide a co-axial vacuum arc vapor deposition source capable of forming a thin film of high quality. SOLUTION: A cylindrical magnet 31 is disposed on the outside periphery of an anode 30 of a co-axial vacuum arc vapor deposition source 5. Electrons leaked through the opening of the anode 30 wind around the lines of magnetic force formed by the magnet 31 to form electron clouds. Because the fine particles of a vapor deposition material have positive charges, they are attracted to the electron clouds and reach, in a state collected by the lines of magnetic force, the surface of a substrate 22 to grow a thin film. No coarse particles are collected and mixed into the thin film because of their large mass as compared with their electric charge.
Patent JP-S6071059-A (JP)
Inventor: ANATORII IWANOUITSUCHI ZUBEREF
IPC: B05B7/24
Filed: 1984-08-28
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H1020448-A (JP)
Title: Injection molded product for photographic sensitive material
Inventor: AKAO MUTSUO
IPC: G03C3/00
Filed: 1996-07-08
Abstract: PROBLEM TO BE SOLVED: To obtain a good injection molding property, a complete light-shielding property, higher physical strength and good dimensional accuracy by injection molding a styrene resin containing each specified amt. of ethylbenzene, rubber- state material and light-shielding material. SOLUTION: A polystyrene resin compsn. containing 0.001 to 1wt.% ethylbenzene, 0.1 to 15wt.% rubber-state material and 0.1 to 10wt.% light- shielding material and having 1 to 50g/10min melt-flow index is used for injection molding. As for the styrene resin, a shock-resistant polystyrene resin which contains 0.1 to 15wt.% synthetic rubber resin and is produced by continuous block polymn. is preferable considering the photographic property, product quality and cost. As for the rubber-state material, an ethylene-propylene polymer or the like is preferable, and its average particle size is 0.1 to 10μm, preferably 0.2 to 7μm. The amt. of the light-shielding material to be added depends on the thickness of the injection molded product and is preferably 0.2 to 8wt.%, and more preferably 0.3 to 6wt.% considering the molding property and economic viewpoint.
Patent JP-S6335225-A (JP)
Inventor: MAGAI SHIGETO
IPC: G02B23/24
Filed: 1986-07-30
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S6160704-A (JP)
Inventor: RIYUDEIGAA MUTSUSHIYU
IPC: C08F2/06
Filed: 1985-08-14
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0846286-A (JP)
Title: Optical semiconductor device
Inventor: KURAKAKE HIROHIDE
IPC: H01S5/00
Filed: 1994-07-29
Abstract: PURPOSE:To counteract the effect of irregularities gained by the abnormal growth of an InP clad layer surface by the formation of an excellent active layer by specifying the phosphorus composition and film thickness of a photowaveguide layer for flattening the surface of the active layer thereof. CONSTITUTION:In order to flatten the surface of an active layer 9, within the photowaveguide layer 6 as a near side layer to a substrate 1 between a clad layer 5 and the active layer 9, P composition such as InGaAsP etc., of composite material is lessened not to exceed 0.25 while the film thickness is increased exceeding 0.1mum. Through these procedures, the photo-waveguide layer 6 in less P composition and increased film thickness is formed on the clad layer 5 such as InGaP etc. formed as a buffer layer 4, thereby enabling the photowaveguide layer 6 to compensate the irregularities gained by the abnormal growth on the surface of the clad layer 5. Accordingly, the effect of irregularities in the active layer 9 can be counteracted thereby enabling the excellent active layer 9 to be formed.
Patent JP-S6077891-A (JP)
Inventor: YOSHIKAWA HIROBUMI
IPC: B65D90/00
Filed: 1983-09-26
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H05209322-A (JP)
Title: Pitch-based active carbon yarn
Inventor: ENDO MORINOBU
IPC: D04H1/4242
Filed: 1992-06-12
Abstract: PURPOSE:To obtain pitch-based active carbon yarn having excellent adsorbing performance from optically isotropic pitch as a raw material. CONSTITUTION:Optically isotropic pitch-based active carbon yarn having a great number of pores with substantially 0.15-2.5nm diameter and >=500m2/g specific surface area wherein the pores exist approximately in a uniform density on the surface layer part of the yarn and in the interior of the yarn and the pares are communicated mutually in a three-dimensional state, at least partially. The active carbon yarn has 2.1-2.9 fractal dimension of pore structure.
Patent JP-H0845808-A (JP)
Title: Aperture for electron beam lithography
Inventor: NOZUE HIROSHI
IPC: H01L21/027
Filed: 1994-07-29
Abstract: PURPOSE:To form an aperture for electron beam lithography in which lithography aperture patterns are formed with high precision so that the size of a resist pattern to be drawn can be easily controlled, and to design and manufacture the aperture itself easily at low costs. CONSTITUTION:Electron amount control apertures 16 and 17 of simple rectangular shape are provided, which are arranged away at a predetermined distance from outermost lithography aperture patterns 11 and 15, respectively, and adapted for correcting proximity effect by controlling the amount of electrons passing through an aperture having a width within a resolution limit. The amount of electrons passing through the electron amount control apertures 16, 17 moderately influences the proximity effect to a pattern to be drawn, so that the size of the pattern to be drawn is easily controlled.
Patent JP-S6237926-A (JP)
Title: Epitaxial growth equipment
Inventor: AOKI MASAHIKO
IPC: H01L21/203
Filed: 1985-08-12
Abstract: PURPOSE:To increase mass-productivity and to largely improve throughput, by installing a plurality of treatment lines and performing collectively heating and epitaxial growth of substrates. CONSTITUTION:A cassettes 21 in which a substrates 1 not epitaxially grown is accommodated is set previously in a preparatory chambers 2 made vacuous. The substrates 1 in the cassettes 21 are taken out sequentially one by one, and carried to pretreatment chambers 4, where the surfaces are cleaned and annealing is performed. Then, they are carried to a film-formation chamber 6, where amorphous films are formed on the surfaces of the substrates 1 by vacuum deposition, and doping is performed by ion implantation. The above treatments in each treatment line L1-Lm are expedited simultaneously and substrates 1 after treatment are sequentially delivered to a heating chamber 10. When the predefined number of substrates 1 are stored in heating chamber 10, they are collectively heated in the atmosphere of inactive gas, and the solid phase eptiaxial growth is progressed. Each substrate 1 after growth is suitably stored into each cassette 12.
Patent JP-H0344592-A (JP)
Title: Positioning apparatus
Inventor: SUZUKI RYOICHI
IPC: G12B5/00
Filed: 1989-07-12
Abstract: PURPOSE:To make the whole of an apparatus small in size by moving a table in two directions of the axis X and the axis Y intersecting each other at right angles within a plane of this table, in the direction of rotation around the axis Z intersecting the plane of the table at a right angle and in the direction of tilting intersecting the plane of the table at a right angle. CONSTITUTION:By making linear actuators of elevation drive mechanisms 24a, 24b and 24c operate in expansion and contraction simultaneously in the same direction, a table 1 as moved in elevation in parallel with the direction of the axis Z intersecting the plane of this table 1. By making the linear actuator of the elevation drive mechanism 24b operate in the reverse direction, besides, the table 1 is moved in the direction of tilting around the axis Y. Since the single table 1 is moved in a multi-axial manner within the plane of this table 1, in this way, the whole of an apparatus can be made smaller in size and thinner in shape than a conventional multi-axis table.
Patent JP-H0842664-A (JP)
Title: Differential gear device
Inventor: YAMAZAKI SHINJI
IPC: F16H48/28
Filed: 1994-07-29
Abstract: PURPOSE:To reduce size and weight and to perform reliable support of a pinion gear by mounting first and second gear parts and a shaft part, intercoupling the gear parts, on one pinion gear and mounting, extending to the first and second gear parts and the side wall side of a differential gear case, on the other pinion gear. CONSTITUTION:A pinion gear (one pinion gear) 11 comprises first and second gear parts 11a and 11b, engaged with a left side gear 3, and a shaft part 11c to interconnect the first and second gear parts, and is slidably rotatably contained in the containing hole 7 of a case body 1a. A pinion gear (the other pinion gear) 13 is slidably rotatably contained in the containing hole 9 of the case body 1a. A first gear part 13a is engaged with a right side gear 5, and a second gear part 13b is engaged with the second gear part 11b of the mating pinion gear 11. Further, an extension gear part (an extension part) 13 extending further rightward than an engaging part with the pinion gear 11 is arranged to the pinion gear 13.