Patent SG-11201407907X-A (SG)
Title: Apparatus and method for film formation
Inventor: BARIK SATYANARAYAN
IPC: C23C16/52
Filed: 2013-07-15
Abstract: (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 16 January 2014 (16.01.2014) WIPOIPCT (10) International Publication Number WO 2014/008557 A1 (51) International Patent Classification: C23C16/44 (2006.01) C23C16/52 (2006.01) (21) International Application Number: PCT/AU2013/000786 (22) International Filing Date: 15 July 2013 (15.07.2013) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 2012903023 13 July 2012 (13.07.2012) AU 2012903455 10 August 2012 (10.08.2012) AU (71) Applicant: GALLIUM ENTERPRISES PTY LTD [AU/AU]; 74 Asquith Street, Silverwater, New South Wales 2128 (AU). (72) Inventors: BARIK, Satyanarayan; B101/42-50 Brick­ works Drive, Holroyd, New South Wales 2142 (AU). WINTREBERT EP FOUQUET, Marie-Pierre Fran- coise; CI- BluGlass Ltd, 74 Asquith Street, Silverwater, New South Wales 2128 (AU). MANN, Ian; 74 Asquith Street, Silvewater, New South Wales 2128 (AU). (74) Agent: FISHER ADAMS KELLY; Level 29, 12 Creek Street, Brisbane, Queensland 4001 (AU). (81) Designated States (unless otherwise indicated, for every kind of national protection available)'. AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available)'. ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, [Continued on next page] (54) Title: APPARATUS AND METHOD FOR FILM FORMATION 135 120 (57) Abstract: An apparatus and method for forming a thin film on a substrate by RPCVD which provides for very low levels of carbon and oxygen impurities and includes the steps of introducing Group a VA plasma into a first deposition zone of growth chamber, a intro­ ducing Group IIIA a reagent into second a deposition zone of the growth chamber which separate from is the first deposition zone and introducing an amount of an additional reagent selected from the group consisting of ammonia, hydrazine, di-methyl hydrazine and a hy­ drogen plasma through an additional reagent inlet into the second deposition zone such that the additional re­ agent and the Group IIIA reagent mix prior to depos­ ition. 155 FIG. 1 WO 2014/008557 A11 lllll llllllll II llllll III III lllll llll lllll III III lllll lllll lllll lllll llll llll lllllll llll llll UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))