baber/WOPTO huggingface dataset:
Patent KR-20000005678-A (KR)
Inventor: LEBINFRANKELROIT
IPC: G06F9/45
Filed: 1999-05-18
Abstract: PURPOSE: A method is provided to automatically optimize an application program on a specified hardware platform configuration while performing the optimizing when a final user requires. CONSTITUTION: A method for minimizing an affect of a long cache miss comprises the steps of initializing a computer-programmed performance watch hardware of observing a cache miss; profiling an application program using the performance watch hardware in order to collect cache miss data; constructing valid address tables in a computer memory from the cache miss data; optimizing the application program by determining a place to put pre-load instruction before valid address places of an appending instructions which producing long cache misses in an instruction sequence of the application program object code; constructing the optimized change file in the computer memory according to the determination of the places of the pre-load instructions in the instruction sequence; applying the optimized change file to the application program object code; testing an object code with regard to the optimized long cache misses; and repeating the step of initiating to the step of testing.
Patent KR-19990088534-A (KR)
Title: 금속제품
IPC: C23C10/02
Filed: 1999-05-25
Abstract: 본 발명은 금속 기재(4)를 제공하는 단계, 구리 또는 구리를 기본으로 하는 합금(6)을 상기 금속 기재에 적용하는 단계, 구리 또는 구리를 기본으로 하는 합금에 알루미늄을 분산시키는 단계로 이루어진 제품을 형성하기 위한 방법이다. 이 방법은 미적으로 만족스럽고 고내구성도 우수한  “알루미늄 청동”완제품을 가지는 주화 제작을 위한 현존하는 기술에 대해 편리하고 비용이 저렴한 방법으로서 이용할 수 있다.
Patent KR-20000075305-A (KR)
Inventor: KIM CHANG IL
IPC: H01L21/76
Filed: 1999-05-31
Abstract: PURPOSE: A method for manufacturing a trench type isolation layer using a polishing sacrificial layer is provided to mitigate a phenomenon that a polishing rate or polishing selectivity is decreased by a step difference generated after evaporating an oxidation layer in forming the isolation layer. CONSTITUTION: An anti-oxidizing pattern and a polishing stop pattern overlapping an active region of a silicon substrate(11) are formed. The exposed silicon substrate is etched to form a trench. An oxidation layer(13) for filling the trench is formed on the entire structure. A polishing sacrificial oxidation layer is formed on the oxidation layer for filling the trench to reduce a step difference generated in forming the oxidation layer for filling the trench. The polishing sacrificial oxidation layer and the oxidation layer for filling the trench are planarized by a chemical mechanical polishing(CMP) process using slurry having a high polishing selectivity.
Patent KR-20010001450-A (KR)
Inventor: LEE DONG DEOK
IPC: H01L21/28
Filed: 1999-06-04
Abstract: PURPOSE: A method for manufacturing a storage electrode of a semiconductor device is provided to improve an electrical characteristic, by forming a storage electrode having a vertical profile and a fine and dented shape. CONSTITUTION: An interlayer dielectric(13) having a storage electrode contact plug(15) is formed on a semiconductor substrate(11). A stacked structure of an etch blocking layer(17) and a sacrificial insulating layer is formed on the interlayer dielectric. The stacked structure is etched by using a storage electrode mask as an etching mask to form a contact hole exposing the storage electrode contact plug. A diffusion blocking layer(25) and a thin film(27) for a storage electrode are formed on the resultant structure. A photoresist layer is applied on the entire surface, filling the storage electrode contact hole for planarization. The photoresist layer is entirely etched to have a photoresist layer pattern remain only inside the storage electrode contact hole. The thin film for the storage electrode is entirely etched with a plasma to separate electrodes, and the photoresist layer pattern is removed. A cylindrical storage electrode having a vertical profile is formed by eliminating the sacrificial insulating layer.
Patent KR-20010001495-A (KR)
Inventor: NAM JAE UK
IPC: A23B7/10
Filed: 1999-06-04
Abstract: PURPOSE: A temperature sensor for a Kimchi storage device is provided, which indicates the change of temperature in the storage device precisely. CONSTITUTION: A temperature sensor(90) for a Kimchi storage device(10) is characterized in that it is located far away from evaporation pipes(40) whose temperature change is great, is placed on the bottom part of an inner container(80) with a heater(60), and is wrapped with insulating materials. The storage device(10) comprises a compressor(30) which compresses coolant by high pressure; evaporation pipes(40) evaporating the coolant supplied to the compressor(3), which is installed on the outer circumference of an inner container(80); a heater(60) which is installed on the outer circumference of an inner container(80) at the bottom part of the evaporation pipes(40); a temperature-controlling part(50) which is located between the evaporation pipes(40) or in another space; and a controlling part(70) regulating the operation of the device, which is connected to the temperature-controlling part(50). The temperature sensor(90) for indicating the inner temperature of the storage device is connected to the controlling part(70) with wiring.
Patent KR-20010001524-A (KR)
Inventor: KANG BYEONG HA
IPC: F28F25/08
Filed: 1999-06-04
Abstract: PURPOSE: A hydrophilic filler is provided to achieve an improved heat or material transfer performance of a cooling tower by increasing direct contact area of gas and liquid. CONSTITUTION: A filler(4) where a cooling water and an air directly contact for a heat or material transfer, is characterized in that the filler has a surface which is hydrophile-treated using an ion beam or plasma. Thus, the cooling water flows widely all over the surface of the filler, improving heat or material transfer efficiency. In addition, a scale is prevented from being formed at the surface of the hydrophile-treated filler due to the improved fluidity, to thereby eliminate clogging problem. An adhesive property between the surface of the hydrophile-treated filler is enhanced, thus allowing filler packing construction to be carried out in an easy and convenient manner.
Patent KR-19990068643-A (KR)
Title: 휴대용미니보일러
IPC: F24H1/06
Filed: 1999-06-08
Abstract: 본 발명의 휴대용 미니보일러(1)는 등산이나 낚시 또는 야영 시 버너나 가스레인지와 함께 휴대하여서 이들의 열원을 이용하여 본 발명의 미니보일러를 가열하여서 난방호스를 통하여 소규모 지역을 난방하여 야외에서 사용자가 누워 잘 수 있을 정도의 적은 면적을 따뜻하게 난방할 수 있도록 한 것이다. 
     본 발명의 휴대용 미니보일러(1)는 버너나 가스레인지 위에 재치하여서 온수를 가열시키는 하부수조(2)와, 상기한 하부수조의 상단에 연결관(5)으로 연결되어서 하부수조(2)에서 가열된 온수를 난방호스(12)쪽으로 공급하는 상부수조(3)와, 상기한 하부수조(2)와 상부수조(3)의 사이에 설치되어서 하부수조에서 가열된 난방용 온수를 일정온도 이하가 되도록 열을 외부로 방열시키고 외주연에 다수의 방열구멍(11)을 구비하는 방열기(4)와, 상기한 상부수조(2)에서부터 연결관(5)을 거쳐 하부수조(2)의 상부면까지 연하도록 설치되어서 하부수조(2)의 내부 공기를 밖으로 배출하는 공기배출관(8)으로 구성하여서 된 것이다.
Patent KR-20010001893-A (KR)
Inventor: YOON YUN MO
IPC: E02D3/10
Filed: 1999-06-09
Abstract: PURPOSE: A draining member for soft ground improvement is provided to easily absorb the reserve gap water in the ground even without applying a vertical load. CONSTITUTION: High absorptive fabric is continuously charged in drain holes(13,13') of a general plate type draining member to form a vertical draining member(10) covered with a filter(12) of high permeability. The high absorptive fabric is made of simple polyacryl or polyvinyl alcohol or by mixing with wool or cotton. The high absorptive fabric absorbs the reserve gap water in the ground and has a high absorptive function by capillarity. With the high absorptive fabric, a need of filling is eliminated. Further, with the capillarity, the horizontal drainage is possible.
Patent KR-20010002389-A (KR)
Inventor: LEE BYEONG HEON
IPC: B23P17/00
Filed: 1999-06-15
Abstract: PURPOSE: A filleting equipment for edges of a stiffener is provided to set up the offset of a processing roller freely, and prevent the stiffener from getting of the processing roller. CONSTITUTION: In a filleting equipment, a couple of processing rollers for a lower edge(17) and a cylindrical support roller for an upper part(18) are installed as one group, and a couple of processing rollers for upper edge(16) and a cylindrical support roller for lower part(19) are installed as one group. A processing roller(17) is driven by a driving motor for the rollers(17), and the side of outside diameter of the rollers is processed to have a filleting angle and then the rollers(17) are installed to face each other. The cylindrical support roller(18) supports the stiffener on the upside of the stiffener, and the center of the roller is placed in a vertical upper-part of the center of the roller(17). The processing rollers(16) are driven by the driving motor to have a filleting angle, and the side of the outside diameter(D2) of the roller is processed to be slid and then the rollers are installed to face each other. The cylindrical support roller(19) supports the stiffener, and the center of the rollers(16) is placed in the vertical lower-part of the center of the rollers(16).
Patent KR-20010004081-A (KR)
Inventor: KIM SEONG YUN
IPC: H01L21/027
Filed: 1999-06-28
Abstract: PURPOSE: A method for forming a photoresist pattern of a semiconductor device is provided to form the photoresist pattern having a desired size by depositing an oxide film after curing the photoresist pattern. CONSTITUTION: An anti-reflection film(5) is coated on an upper surface of a thin film(1) or a semiconductor substrate. A photoresist film is coated on the upper surface of the anti-reflection film. Then, a part of the photoresist film is selectively exposed to the beam. The exposed photoresist film is developed so as to form a photoresist pattern. Then, OH radical is created on the surface of the photoresist pattern by curing the photoresist pattern. After that, silicon ions are implanted into the photoresist pattern thereby forming an oxide film(4) of the surface of the photoresist pattern.
Patent KR-20010004583-A (KR)
Inventor: HWANG SEUNG MIN
IPC: H01L21/027
Filed: 1999-06-29
Abstract: PURPOSE: A method for forming an alignment key for a bit line contact of a semiconductor device is provided to prevent a failure in alignment or misalignment due to a difference in depth of the alignment key. CONSTITUTION: A die area(not shown) and a scribe area(S) are defined in a semiconductor device. In particular, the scribe area(S) includes a region(AK) for an alignment key(200). The first interlayer dielectric(21) on a semiconductor substrate(20) is etched, so that the first contact holes for plugs are formed in the die area, but the alignment key region(AK) is exposed in the scribe area(S). A polysilicon layer is then deposited on overall surfaces and etched to produce the plugs in the die area and further to form a polysilicon pattern(22) on the exposed alignment key region(AK) in the scribe area(S). Thereafter, the second interlayer dielectric(23) is formed and etched. Therefore, while the second contact holes for exposing the plugs are formed in the die area, the alignment key(200) is formed in the scribe area(S). Since the polysilicon pattern(22) acts as an etch stopper at the etch of the second interlayer dielectric(23), the alignment key(200) has a uniform depth.
Patent KR-20010004604-A (KR)
Inventor: CHOI DO HYEON
IPC: H01L29/786
Filed: 1999-06-29
Abstract: PURPOSE: A thin film transistor array substrate and a method for manufacturing the same are provided to prevent the deterioration of an operational characteristic due to an optical leakage current. CONSTITUTION: A thin film transistor array substrate and a method for manufacturing the same comprises the following structure. A gate line is crossed vertically to a data line. A thin film transistor(10) having a back channel etching structure is formed on a crossing portion of the gate line and the data line. A protective layer(11) is formed on the thin film transistor(10). A pixel area is defined by the gate line and the data line. A pixel electrode(13) contacted with a signal electrode of the thin film transistor(10) is formed the defined pixel area. An optical absorbing layer(14) is formed on the protective layer(11).
Patent KR-20000011586-A (KR)
Inventor: ETERS HARIEN
IPC: H01R13/6592
Filed: 1999-07-08
Abstract: PURPOSE: An electric connector is provided to electrically connect the shielded plane flexible circuit conductor with compensate combination connection device conductor. CONSTITUTION: The iron-shaped connector(16) includes a iron-shaped main body member(24) surrounded by a plane flexible circuit(12) around the edge(22) of the front end. The iron-shaped main member is flat and long, and includes a pair of cantilever type latch arm(26) integrated located in the facing end. The cantilever type latch arm(26) is integrally connected to the main member at the end(26a) contacted around the front end edge(22) of the connector. So, the free end(26b) of the latch arm can be bent to the both direction arrow 'B' direction. A raised rib or a flange(28) is vertically extended along the rear edge of the upper part of the main member(24) to form a slot under the rib and the flange, and the plane flexible circuit(12) is extended through the slot.
Patent KR-20010010066-A (KR)
Title: Apparatus for guiding a ribbon of printer
Inventor: SONG JONG WON
IPC: B41J33/22
Filed: 1999-07-15
Abstract: PURPOSE: An apparatus for feeding a ribbon of a printer is provided to reduce the unit cost and improve the assembling efficiency by reducing the number of gears, and to make a compact product. CONSTITUTION: In feeding a carriage slidably fed from side to side and a ribbon having ink to print in one direction according to the feed of the carriage, an apparatus for feeding the ribbon of a printer includes a case; a motor(120) positioned at one side of the case and slidably feeding the carriage from side to side; a pair of pulleys(130,140) connected with each other by a belt with being positioned at both sides of the case, rotated by the motor backward and forward, and having gears(g) in the lower part; a feeder(150) rotatably installed in the front surface of one side of the case and upward exposed in a predetermined length for being combined with the ribbon; and an element(160) for supplying power to the feeder.
Patent KR-20010011010-A (KR)
Title: Rocker arm shaft
Inventor: KIM JAE SU
IPC: F01M11/03
Filed: 1999-07-24
Abstract: PURPOSE: A rocker arm shaft is provided to prevent a foreign matter of oil from being supplied to the rocker arm from an engine by installing an oil filter inside the rocker arm shaft, so that preventing trouble of a hydraulic lash adjuster. CONSTITUTION: A rocker arm(200) transferring the movement of a cam shaft to the valve is rotatably fixed on the outer surface of a rocker arm shaft(100). Space(110) for passing engine oil is formed longitudinally inside the rocker arm shaft. An oil filter(150) is installed at the space of the rocker arm shaft. Oil is refiltered by the oil filter inside the rocker arm shaft so that the oil circulating inside engine is supplied inside an adjuster without foreign matter.
Patent KR-20000011968-A (KR)
Inventor: ULSH ERIC J
IPC: C01B15/037
Filed: 1999-07-26
Abstract: PURPOSE: An etching method of an upper and a lower layer is provided to reduce the analysis of H¬2O¬2, to control or maintain the temperature of the etching solution mixture and to minimize or reduce all of the re-evaporation of the Pb and the undercut of the whole metallizing stack. CONSTITUTION: The manufacturing method of a semiconductor is formed by the steps of: arraying an upper metal layer(502) made by soldering on a lower metal layer(201, 202) made up of titanium or tungsten; and selectively etching the lower metal layer(201, 202) to the upper metal layer(502) with an etching mixture(601) including an etching solution, an adding agent for controlling the temperature of the etching mixture(601) and other adding agent for reducing the re-evaporation of the upper layer(502).
Patent KR-20000012053-A (KR)
Inventor: HASOMOTO MASAHIRO
IPC: H04N19/467
Filed: 1999-07-29
Abstract: PURPOSE: A picture attribution exchange system is provided to exchange an attribution of an input picture after detecting the attribution of the input picture by a discrete cosine transformation(DCT). CONSTITUTION: The picture attribution exchange system comprises: a picture input part(101) for inputting a picture to which an electronic watermark is buried; a discrete cosine transformation part(201) for converting the picture; a judgement part for calculating a statistical similarity between the electronic watermark and a predetermined electronic watermark; an attribution detecting part(102) for outputting an attribution of the picture on the basis of an output from the judgement part; a plurality of memories(301, 302) for storing insertion data, respectively; a selector for selecting one of the insertion data; an insertion data register(306) for storing an output from the selector; a brightness register(304) for storing a brightness signal of the picture; a color differential register(305) for storing a color differential signal of the picture; and an adder for adding an output of the brightness register and an output of the color differential register.
Patent KR-20010018727-A (KR)
Inventor: KWON GYEONG GUK
IPC: H01L27/02
Filed: 1999-08-21
Abstract: PURPOSE: An electrostatic discharge(ESD) protection circuit is provided to protect a device even when positive or negative ESD charge is induced from the exterior in the device using a tripolar power supply such as a charge coupled device(CCD) or bipolar power supply such as a dynamic random access memory(DRAM). CONSTITUTION: A bipolar transistor of the first conductivity type and a bipolar transistor of the second conductivity type are connected between an input terminal and a ground. A VP voltage is applied to the base terminal of the bipolar transistor of the first conductivity type. A VDD voltage is applied to the base terminal of the bipolar transistor of the second conductivity type. Respective collectors and emitters are connected to the input terminal and the GND. The VP voltage is the lowest voltage(minus 9V) of negative voltages, and the VDD voltage is the highest voltage(plus 15V) of positive voltages.
Patent KR-20010019348-A (KR)
Inventor: LEE SANG HUN
IPC: H01J9/227
Filed: 1999-08-26
Abstract: PURPOSE: A fluorescent screen of a cathode-ray tube and a method of fabricating the same are provided to maximize the radiating area of a fluorescent film to effectively improve the brightness of screen without reducing the with of a black matrix layer. CONSTITUTION: A fluorescent screen(2) of a cathode-ray tube includes green, blue and red fluorescent layers(18) arranged on the inner surface of a panel(4), having a predetermined interval, and a black matrix(20) which is formed of a light absorbing material and located between the fluorescent layers to separate the fluorescent layers from one another. The fluorescent screen further has an aluminum layer(22) placed on the fluorescent layers and black matrix to reflect rays of light radiated from the fluorescent layers to a director opposite to the panel toward the panel, and a means(24) for making the inner side of the panel uneven to increase the radiating area of the fluorescent layers. The means has the same pattern as that of the black matrix layer and is formed of a transparent material below the black matrix layer.
Patent KR-20010044844-A (KR)
Inventor: HUH TAEK GYUN
IPC: D03D15/00
Filed: 1999-09-10
Abstract: PURPOSE: A process for preparing the title filament yarn woven fabric capable of generating the maximum shrinkage difference between high and low shrinkage yarn by generating a soft loop on the fabric surface and decreasing in shrinkage difference during processing after the production of fabrics is provided. Therefore, the fabrics have external appearance similar to natural worsted fabrics and excellent repulsive elasticity and drape properties. CONSTITUTION: Dissolution type polyester ultrafine yarn and high shrinkage polyester yarn having a thermal shrinkage rate(100W) of 25 to 35% are air textured to be an interlace number of 50 to 80/m to produce combined filament yarn woven fabric having different shrinkage, which is doubled with conventional polyester multifilament yarns having a single yarn fineness of 1.5 to 2.5 denier to produce doubled yarn. The titled fabric is prepared by using the doubled yarn as a warp thread and conventional polyester multifilament yarns as weft yarn.
Patent KR-20010028671-A (KR)
Inventor: KIM GI HONG
IPC: G11B5/48
Filed: 1999-09-22
Abstract: PURPOSE: An assembly of a full width erase head of a tape recorder is provided to firstly fix the full width erase head in a main circuit plate, and to install a main deck on the main circuit plate, and simultaneously connect the full width erase head to the main deck. Therefore, the assembly of the full width erase head is simplified. CONSTITUTION: In a full width erase head(50), an erase head block(52) mounted on an upper part thereof is connected with a tape. A pin(53) mounted in a lower end of the full width erase head(50) delivers a high frequency signal to the erase head block(52), and a guide part(54) is mounted in the lower end of the full width erase head(50). A hooking projection(55) is formed in a middle part of the full width erase head(50) by being extended on both sides. In a main circuit plate(60), a connection hole(61) electrically connects with the pin(53). The guide part(54) of the full width erase head(50) is inserted in a guide hole(62) of the main circuit plate(60). In a main deck(70), a perforating hole(71) and a guide plate(72) are formed. The erase head block(52) of the full width erase head(50) is projected from an upper part of the main deck(70) through the perforating hole(71). The guide plate(72) contacted with a side part of the full width erase head(50) is formed around the perforating hole(71).
Patent KR-20000063118-A (KR)
Inventor: JEONG SEOK HWA
IPC: H01Q1/27
Filed: 1999-09-29
Abstract: PURPOSE: An antenna device of a cellular phone is provided to reduce the damage which is generated by electric waves generated through an end portion of an antenna. CONSTITUTION: An antenna which is composed of a conductive material is installed on a front cover or in a battery of a cellular phone. The antenna installed on the front cover or in the battery of the cellular phone has a zigzagged or open loop shape. The antenna installed on the front cover or in the battery of the cellular phone comprises one selected from a printed pattern, a short wire, or a flexible wire. The antenna is installed in the front cover or a battery case of the cellular phone.
Patent KR-20000067781-A (KR)
Inventor: KO JEONG WAN
IPC: H04L25/49
Filed: 1999-09-30
Abstract: PURPOSE: A method of aligning RLL(run length limited) code with improved DC restricting function, encoding/decoding method and decoding apparatus efficiently restrict a DC component of a code word stream, and reduce a bit number of code word using a part or all of an existing code word. CONSTITUTION: A method of aligning RLL code with improved DC restricting function comprises steps of arranging a pair of code groups for performing a DC(direct current) restriction control of a code line, and arranging a parameter showing a signal of a DC value in a code word and a feature of a parameter for estimating a DSV(digital sum value) direction of a next code word to be opposite to each other. An encoding method comprises steps of encoding an input data of m bits using a code word of controlling DSV, or encoding the input data of m bits using one out of a main code group and a code group for distinguishing a repeated code word, wherein the main code group has a first parameter having the repeated code word and in which each code group shows a DC value in the code word, and a second parameter for estimating a DSV direction of a next code word, a signal of the first parameter and a feature of the second parameter are arranged to be opposite to each other.