Patent SG-11201810119P-A (SG)
Title: Composition for post chemical-mechanical-polishing cleaning
Inventor: DAESCHLEIN CHRISTIAN
IPC: C11D1/722
Filed: 2017-05-31
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 14 December 2017 (14.12.2017) WIPO I PCT ill~~~~~~~~ 011101tIIl tun Hol om moll °nom oimIE (10) International Publication Number WO 2017/211653 Al (51) International Patent Classification: CHD 1/72 (2006.01) C11D 11/00 (2006.01) CHD 1/722 (2006.01) HO1L 21/02 (2006.01) CHD 3/37 (2006.01) (21) International Application Number: PCT/EP2017/063215 (22) International Filing Date: 31 May 2017 (31.05.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 16173998.2 10 June 2016 (10.06.2016) EP (71) Applicant: BASF SE [DE/DE]; Carl-Bosch-Strasse 38, 67056 Ludwigshafen am Rhein (DE). (72) Inventors: DAESCHLEIN, Christian; Markgrafenstr. 4, 44791 Bochum (DE). SIEBERT, Max; Voelklinger Strasse 20, 67063 Ludwigshafen (DE). LAUTER, Michael; Gontardstrasse 4, 68163 Mannheim (DE). LEUNISSEN, Leonardus; Buergermeister-Fries-Strasse 13a, 67069 Lud- wigshafen (DE). GARCIA ROMERO, Ivan; U4 7, 68161 Mannheim (DE). GUEVENC, Haci Osman; Langer Anger 109, 69115 Heidelberg (DE). PRZYBYLSKI, Peter; Lenaustr. 8, 67063 Ludwigshafen (DE). PROELSS, Ju- lian; Bennigsenstr. 40, 67549 Worms (DE). KLIPP, An- dreas; Viktoriaring 15, 67245 Lambsheim (DE). (74) Agent: BASF IP ASSOCIATION; BASF SE, G-FLP- C006, 67056 Ludwigshafen (DE). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) (54) Title: COMPOSITION FOR POST CHEMICAL-MECHANICAL-POLISHING CLEANING N O (I) (57) : Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) one or more water-soluble nonionic copolymers of the general for- mula (I) and mixtures thereof, formula (I) wherein R1 and R3 are idependently from each other hydrogen, methyl, ethyl, n-propyl, iso- propyl, n-butyl, iso-Butyl, or sec-butyl, R2 is methyl and x and y are an integer,1 (B)poly(acrylic acid) (PAA) oracrylic acid-maleic acid copolymer with a mass average molar mass (Mw) of up to 10,000 g/ mol, and (C)water, wherein the pH of the composition is in the range of from 7.0 to 10.5.