Patent SG-11201906413X-A (SG)
Title: Exposure apparatus
Inventor: KANEHARA JUNICHI
IPC: G03F7/20
Filed: 2018-01-30
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 09 August 2018 (09.08.2018) WIPO I PCT ill 1111u°11101VIIIVIIIVIIIolo mil How olli nium oimiE (10) International Publication Number WO 2018/141713 Al (51) International Patent Classification: G03F 9/00 (2006.01) GO3F 7/20 (2006.01) (21) International Application Number: PCT/EP2018/052211 (22) International Filing Date: 30 January 2018 (30.01.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 17154551.0 03 February 2017 (03.02.2017) EP 17169025.8 02 May 2017 (02.05.2017) EP 17193990.3 29 September 2017 (29.09.2017) EP 17201092.8 10 November 2017 (10.11.2017) EP (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324, 5500 AH Veldhoven (NL). (72) Inventor: KANEHARA, Junichi; P.O. Box 324, 5500 AH Veldhoven (NL). (74) Agent: RAS, Michael; PO Box 324, 5500 AH Veldhoven (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, = (54) Title: EXPOSURE APPARATUS Figure 9 910 920 930 (57) : There is provided an exposure apparatus comprising a first substrate holder, a second substrate holder, a sensor holder, a projection system, a measurement device and a further measurement device. The first substrate holder is configured to hold a substrate. The second substrate holder is configured to hold the substrate. The sensor holder is configured to hold a sensor. The projection system is configured to expose the substrate with an exposure beam. The measurement device is configured to provide measurement information of the substrate. The further measurement device is configured to provide further measurement information of the substrate. The sensor is configured to measure a property of the exposure beam and/or the projection system. The projection system is configured to expose the sensor with the exposure beam. [Continued on next page] WO 2018/141713 Al MIDEDIMOMMIONEEMOMOMMMOMORIEVOIS TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))