baber/WOPTO huggingface dataset:
Patent JP-H11323563-A (JP)
Title: Deposited film forming apparatus and forming method by plasma cvd method
Inventor: TAKAI YASUYOSHI
IPC: H01L21/205
Filed: 1998-05-12
Abstract: PROBLEM TO BE SOLVED: To provide a deposited film forming apparatus by a plasma CVD method suitable for forming photoreceptive members utilizing non-crystalline deposited films, such as amorphous or polycrystalline films, on a substrate. SOLUTION: Plural gaseous raw material introducing pipes 103 comprise >=2 different gaseous raw material introducing systems. These pipes 103 respectively have plural gas release holes 104 in at least two directions and the blow- off directions 105 of the holes 104 are set in a specific range where the deposited films forming conditions are made uniform and an electric discharge is not disturbed.  The apparatus comprises a reaction vessel having a vacuum airtightly sealable reaction space composed of at least an upper wall, a circumferential wall in common use as a cathode electrode and a bottom wall, a means for holding the substrate for forming the deposited films within the reaction space, plural pipes 103 disposed around the substrate, a high-frequency energy introducing means for generating the glow discharge by exciting the gaseous raw material introduced therein and a discharge port and discharge means for discharging the inside of the reaction vessel to a vacuum.
Patent JP-H0312606-A (JP)
Title: Water soluble azo dye and polarizing film containing this dye
Inventor: KOTANI JUNJI
IPC: G02B5/30
Filed: 1989-06-12
Abstract: PURPOSE:To obtain a high polarization factor and thermal stability by using a specific water soluble dye or the copper complex salt dye thereof as a free acid. CONSTITUTION:The water soluble dye expressed by formula I or the copper complex dye thereof is used as the free acid. In the formula I, A denotes a benzene ring or naphthalene ring which may have a methyl group; R denotes an amino group, methyl amino group, ethyl amino group or phenyl amino group, respectively. Such water soluble dye is easily produced by a known diazotization and coupling method in compliance with the process for producing ordinary dyes. The water soluble trisazo dye which yields the polarizing film having the high polarization factor and high thermal stability is obtd. in this way.
Patent JP-S6039051-A (JP)
Title: Automatic detecting device of drilled surface
Inventor: WAKAMATSU KAZUHIKO
IPC: B23Q17/22
Filed: 1983-08-12
Abstract: PURPOSE:To eliminate the necessity for preparing an NC program, which gives a drilling start point required for controlling a drilling spindle to be driven, by providing a high-frequency induction coil in the vicinity of a spindle head and discriminating a change of inductance in this coil. CONSTITUTION:An induction coil 3 is equipped in the vicinity of a drill 1a. If the drill 1a is brought into contact with a work 2, a high-frequency electric current (a) is supplied to the induction coil 3 from a high-frequency oscillator circuit 6 through a characteristic adjusting circuit 5 and a matching transformer 4. Amplitude of this electric current (a) increases when the drill 1a is isolated from the work 2 while decreases if the drill 1a is brought into contact with the work 2 because inductance of the induction coil 3 is changed by forming a closed circuit consisting of the drill 1a, the main unit 1 of a machine tool and the work 2. A fine change of the high-frequency current (a) causes a large change as a detection output from an amplitude discriminating circuit 8, controlling a spindle to be driven in the machine tool.
Patent JP-S633873-A (JP)
Inventor: TATEBAYASHI TSUNEO
IPC: A61N5/067
Filed: 1986-06-23
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S633434-A (JP)
Title: Manufacture of semiconductor device
Inventor: IMAI HIROSHI
IPC: H01L27/04
Filed: 1986-06-23
Abstract: PURPOSE:To minimize over etching as required, by forming a thermal oxide film, which is thicker than a thermal oxide film on a high resistance polycrystalline silicon having low etching speed, on lowresistance polycrystalline silicon having higher etching speed by a self-alignment method. CONSTITUTION:A diffused mask pattern 4 is removed. Then, an oxide film is formed on the surface of polycrystalline silicon by a thermal oxidation method. A thermal oxide film 5' on low resistance polycrystalline silicon 5' is thicker than a thermal oxide film 5 on high resistance polycrystalline silicon 3. Then, the etching starting time of the silicon 3', whose etching speed is high, is delayed. The anisotropic etching of the silicon 3 and the silicon 3' having the different etching speeds are simultaneously finished. Thus, over ethcing, which is the cause of the side etching, is minimized as required.
Patent JP-S5479698-A (JP)
Title: Continuous measuring apparatus of ammonia concentra tion
Inventor: YOKOYAMA SHIGEO
IPC: G01N31/10
Filed: 1977-12-07
Abstract: PURPOSE: To measure NH 3  concentration in a gas continuously with a existing NOx meter, by applying current and heating the metal possessing catalytic action, in a reducing and purifying process of NOx with NH 3 .  
     CONSTITUTION: NH 3  oxidation vessel 2 is filled with catalyst 3 composed of coiled Pt wire, and the charge voltage is adjusted by a voltage regulator 4, and the temperature is kept at 500°C. In this state, flue gas containing NH 3  and O 2  is sampled by a sampling probe 1, and is transformed into NO in the oxidation vessel 2. Further, NO 2  in the gas is transformed into NO by NO 2  converter 5. On the other hand, NO 2  in the same flue gas is transformed into NO by the coneverter 5. The both gases are dehumidified by precooler 6 and are led into analytical part 10 alternately by the flow changer 8 in an analytical meter 7. Then, their chemi-luminescence quantity with O 3  generated by O 3  generator 9 is detected, and the respective NO concentration is deducted at an arithmetic unit 11, so that the NH 3  and NO concentrations may be calculated. 
     COPYRIGHT: (C)1979,JPO&Japio
Patent JP-S627446-A (JP)
Title: Catalyst for liquid phase synthesis of beta-acetoxystyrene
Inventor: HIRAYAMA HIDEJI
IPC: B01J31/28
Filed: 1985-07-05
Abstract: PURPOSE:To enhance catalytic activity, by supporting metal palladium, metal antimony, alkali metal acetate and/or one kind of a metal selected from copper, uranium iron and vanadium or oxide thereof by a support. CONSTITUTION:0.1-10wt% of metal palladium, 0.01-20wt% of metal antimony, 0.1-20wt% of alkali metal acetate and/or 0.01-20wt% at least one kind of a metal selected from copper, uranium, iron and vanadium or oxide thereof are supported by a carrier such as activated carbon, a silica gel, silica/alumina, alumina, silicon carbide or magnesia to obtain a catalyst. Styrene, acetic acid, oxygen or oxide are subjected to liquid phase reaction by using this catalyst to prepare beta-acetoxystyrene. The reaction temp. at this time is 40-200 deg.C, pref., 60-150 deg.C.
Patent JP-S5269904-A (JP)
Title: Coke oven
Inventor: YOSHIMI KATSUHIDE
IPC: C10B29/00
Filed: 1975-12-09
Abstract: PURPOSE: A coke oven, wherein the width of each combustion chamber at the end sides of the carbonixation chamber is designed to be smaller than taht of the remaining combustion chamber, whereby generation of serious trouble is prevented even if the bricks of the end side wall are deteriorated and damaged. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-S62297535-A (JP)
Inventor: EDOWAADO EDOGAA HAATO JIYUNIAA
IPC: F16C33/12
Filed: 1987-06-12
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-2000291287-A (JP)
Title: Earthquake resistant building structure encircled by seismically isolated structure
Inventor: MAEDA SEIICHIRO
IPC: E04H9/02
Filed: 1999-04-08
Abstract: PROBLEM TO BE SOLVED: To cut costs of an earthquake resistant building structure by constructing a seismically isolated structure which externally supports the building structure, encircles an upper portion, side surface portions, and a lower portion of the structure while maintaining a slight interval with respect to the structure, and is isolated from the ground. SOLUTION: A seismically isolated structure 2 is constructed while maintaining a slight interval from a building structure 1, and rolling supporters 3 are secured to bottom surfaces of column bases of a foundation of side surfaces of the seismically isolated structure 2, which bottom surfaces are to make contact with the ground. Each supporter 3 is equipped with a viscous damper having a plurality of downward ball casters. Part of horizontal beams of the seismically isolated structure 2 is penetrated through foundation beams of the building structure 1, and steel plates are fixed to the front ends of the respective horizontal beams, to thereby form stoppers 5.  Further, shock absorbers 6 formed of rubber, silicon gel, or the like are secured to some of portions of intervals between the seismically isolated structure 2 and the stoppers 5 or the building structure 1, at which portions the seismically isolated structure 2 can make contact with the stoppers 5 or the building structure 1. Further, a damper 9 is attached to the seismically isolated structure 2 at a portion corresponding to a large interval between the structure 2 and the building structure 1. Thus, vibration proof of the building structure 1 can be enhanced, and construction costs of the same can be reduced.
Patent JP-H073456-A (JP)
Title: Method for controlling internal stress of silicon film
Inventor: KURATANI NAOTO
IPC: C23C14/54
Filed: 1993-06-18
Abstract: PURPOSE:To control the internal stress caused in a silicon film by controlling the transportation ratio of silicon atoms and inert gaseous ions at the time of forming the thin film by making combination use of silicon vapor deposition and irradiation with the inert gaseous ions. CONSTITUTION:A substrate S of a silicon wafer installed in a vacuum vessel 1 for film formation is irradiated with argon ions 4a under the conditions of specified irradiation energy from an ion source 4 while the silicon 3a is deposited by evaporation from an evaporating source 3 on this substrate. The internal compressive stress caused in the silicon film increases with a decrease in the transportation ratio = (the number of the silicon atoms arriving at the substrate S)/(the number of the argon ions arriving at the substrate S) and, therefore, the silicon film having the internal stress meeting the purposes of use is formed by controlling the transportation ratio. The control of the transportation ratio is executed by properly changing either or both of the number of the silicon atoms and the argon ions. The ions for irradiation may be of the other inert gases as well.
Patent JP-S6037782-A (JP)
Title: Field effect transistor
Inventor: OOTA KAZUNARI
IPC: H01L29/812
Filed: 1983-08-10
Abstract: PURPOSE:To contrive to reduce the gate-source series resistance by a method wherein the gate electrode of a Schottky barrier gate EFT with a III-V group compound semiconductor as an active layer is formed of the alloy of Ta, W and Si. CONSTITUTION:The gate metallic layer made of the alloy of Ta, W and Si is formed on the N type GaAs active layer 11 on a semi-insulation GaAs substrate, and then patterned into the gate electrode 12. Next, the source-drain region 13 is formed by the ion implantation of N type impurity. High temperature annealing is necessary to activate the implanted impurity, since the electrode 12 is formed of the alloy of Ta, W and Si, the collapse of Schottky barrier due to the reaction with GaAs does not generate even by annealing. Thereby, the low gate- source series resistance and a high speed FET element can be obtained.
Patent JP-S6040616-A (JP)
Inventor: YAMAZAKI MASAYOSHI
IPC: B65H19/12
Filed: 1983-08-13
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H01314541-A (JP)
Title: Vacuum cleaner
Inventor: TAKASHIMA YOSHINORI
IPC: A47L9/28
Filed: 1988-06-15
Abstract: PURPOSE:To allow users to perform comfortable cleaning work suitable to the floor material and their actual feeling of cleaning work by furnishing a dust sensor and a control device that increase the rotational speed of an electric fan, and a setting device on the control device to change the dust detecting characteristics. CONSTITUTION:A dust sensor consists of an infrared-ray light-emitting diode 12 and an infrared-ray photo-transistor 14. When dust flows through the dust sensor, the intensity of infrared rays reaching the transistor 14 is changed causing changed in the amount of electric current that flows through the transistor 14. The alternative current component is solely picked up by a capacitor 15 and amplified by an amplifier 19. Being determined by the ratio of a variable resistor 16 to a resistor 20, the amplifying degree of the amplifier 19 can be changed by changing the resistance value of the variable resistor 16. The dust sensitivity of the dust sensor is increased with an increase in the amplifying degree of the amplifier 19 causing the sensor to detect smaller dust. Therefore, when users freely operate the variable resistor 16, an adequate detecting sensitivity can be obtained depending upon user's feeling of cleaning work and the conditions of a surface to be cleaned.
Patent JP-H05337665-A (JP)
Title: Laser beam machine
Inventor: AKABOSHI ATSUSHI
IPC: B23K26/082
Filed: 1992-06-08
Abstract: PURPOSE:To provide the laser beam machine constituted so that even if a laser beam machining head and a work interfere with each other, the laser beam machining head is not damaged, and laser beam machining can be restarted easily. CONSTITUTION:A connecting tube 23 for holding a laser beam machining head 41 is supported so as to be turnable by at least three pieces of positioning pins 19 provided in a carriage 1, therefore, when the laser beam machining head 41 comes into collision with a work W at the time of working, the connecting tube 23 is inclined and one positioning pin 19 is detached from the connecting tube 23. When a CNC device (control part) 21 connected to the positioning pin 19 detects it, it is detected that the laser beam machining head 41 is inclined. Subsequently, the CNC device 21 allows the work W to avoid by allowing the laser beam working head 41 to ascend, and executes control in order to restart the working, when it is detected that the connecting tube 23 is returned to a state that it is supported by all the positioning pins 19 again.
Patent JP-H0311803-A (JP)
Title: Manufacture of ceramic electronic component
Inventor: ISHIKAWA YOHEI
IPC: H01P1/203
Filed: 1989-06-08
Abstract: PURPOSE:To improve the efficiency of electrode forming to a ceramic board and to improve the accuracy and reliability of the electrode forming by impregnating the entire component into an etching liquid and removing the conductive film while leaving the resist film and the part covered with a flexible tape. CONSTITUTION:A ceramic board 2 with two resist films 24, 24 formed onto two major faces 3, 6 and with a side face 8 protected by a flexible tape 25 is impregnated in an etching liquid, a conductive film 21 is removed while the part covered with the resist films 24, 24 and the flexible tape 25 are left, the resist films 24, 24 and the flexible tape 25 are removed to obtain an element 16 of a strip line filter 1. Thus, the electrolytic film of the two major faces 3, 6 and the side face 8 of the ceramic board 2 is formed at once.
Patent JP-H11341694-A (JP)
Title: Charging method of secondary battery
Inventor: TSUJI TETSUO
IPC: H02J7/04
Filed: 1998-05-28
Abstract: PROBLEM TO BE SOLVED: To prevent the overcharging of a secondary battery and shorten its charging time, by performing its constant-current charging until its voltage reaches a fixed level, and by performing then its constant-voltage charging at a constant voltage higher than the fixed level, and further, by stopping its charging when the constant- voltage charging has been performed during a fixed time. SOLUTION: During performing the constant-current charging of a secondary battery 30, measuring its charging current, its feedback control is performed to hold its charging current at a value I10 . When the voltage of the battery 30 is increased to a predetermined value V10 , a microcomputer 23 stops a current controlling circuit 24, and instead of this, operates a voltage controlling circuit 22 to begin its constant-voltage charging at a higher voltage value than V10 . During the constant-voltage charging, when a timer measures the lapse of a predetermined time T10 , the microcomputer 23 makes OFF the voltage controlling circuit 22 to stop the charging of the battery 30. At this time of stopping the charging, respective constituent lithium-ion batteries 33 of the battery 30 are brought into the fully charged states of 100%.  In this case, performing the constant-voltage charging during the fixed time T10 after the voltage of the battery 30 is increased to V10 , its charging is stopped to prevent its overcharging.
Patent JP-S5480607-A (JP)
Title: Decentralized control system of automatic exchanger
Inventor: FUJITA KAZUNORI
IPC: H04Q3/58
Filed: 1977-12-09
Abstract: PURPOSE:To enable to use th same control system independently of the line capacity and number of functions, by constituting the central control circuit of the exchanger with a plurality of small sized processors. CONSTITUTION:The signal control processors 711 to 7ml have the functional blocks as the line control block, attendant board control block, and trunk control block, and they are provided corresponding to the line circuit, main line attendant board and trunks. The connection control processors 911 to 9P1 are the processors performing connection control such as call connection, subscriber connection, main line incoming and outgoing connection, automatic transfer connection, and abbreviated dial connection, and it is constituted so that the control information transfer with all the signal control procesors can be made, and the processor having the function depending on the starting types is started and processing is made. The information required for the system is memorized in the data memory 101.
Patent JP-H0314527-A (JP)
Title: Thermal decomposition of 1,2-dichloroethane
Inventor: SHIRAKAWA TADAYOSHI
IPC: C07C21/06
Filed: 1989-06-09
Abstract: PURPOSE:To control thermal decomposition temperature by calculating thermal decomposing rate from pressure and temperature of column top part of quenching column immediately after thermal decomposing furnace and temperature of refluxing solution returning to the column top part in obtaining vinyl chloride monomer and HCl with decomposing the subject substance. CONSTITUTION:1,2-dichloroethane (EDC) is supplied to thermal decomposing reaction tube 106-1 in thermal decomposing furnace 106-2 and a part of the EDC is thermally decomposed, then vinyl chloride monomer (VCM), HCl and undecomposed EDC are sent to quenching column 107. A part of distillate at column top is condensed by condenser 108 and stored in tank 109, then uncondensed gas is sent to hydrochloric acid column 110. A part of condensed solution in the tank is refluxed to the quenching column and residual part is introduced to the hydrochloric acid column Then HCl is recovered from the column top, thus VCM and EDC are sent to the vinyl chloride column 11 from bottom of the hydrochloric acid column. Thermal decomposing rate of EDC is calculated by pressure gauge PI 107 and thermometer TI 107 at the column top of the quenching column and thermometer of refluxing solution TI 109 or flow meter of refluxing solution FI 107. Then thermal decomposing temperature is changed in referring to difference with desired thermal decomposing rate, thus thermal decomposing rate is controlled.
Patent JP-H0238702-A (JP)
Title: Hydraulic actuator
Inventor: HANSU PEETERU HIRUDORU
IPC: B63H25/30
Filed: 1989-06-09
Abstract: PURPOSE: To save space by forming a spherical hub as an integrated part of a guide passage, and composing the guide passage close to bearing surfaces of an upper part and a lower part. CONSTITUTION: A circular guide passage formed by recessed surfaces of an upper part 1 and a lower part 2 is disposed around a spherical hub 4 in a circumferential direction, and the guide passage is defined radially inward by a spherical surface of the spherical hub 4. Space can thus be saved by an extremely simple structure.
Patent JP-H11300098-A (JP)
Title: Clothes drying utensil having reflector
Inventor: FURUKAWA YASUO
IPC: D06F58/26
Filed: 1998-04-20
Abstract: PROBLEM TO BE SOLVED: To quickly dry laundry even when sunshine is insufficient by attaching to the pole parts of a clothes drying utensil main body a reflector device wherein a reflector is fitted to a reflector frame, and the reflector is manually opened/ closed, in such a manner that the attaching angle is variable. SOLUTION: A metal fitting 2 having a slit is respectively attached to four pole parts of the clothes drying utensil main body 1. Also, on a reflector frame 3, the same number of sheets of reflectors 4 each are attached in such a manner that they may be spread to both sides with a reflector housing part of the reflector frame 3 as the center, and at the same time, a handle 5 is attached to the reflector 4 on the outermost side. Also, the reflectors 4 are constituted into a structure by which the reflectors 4 come out while being connected under an expanded state when they are pulled out by holding the handle 5. The upper surface of each reflector 4 is finished into a mirror surface, e.g. by using a polished stainless steel sheet or applying a tin plating on a steel plate or the like.  A reflector device which is constituted in such a manner is slidably attached to the reflector sliding metal fitting 2 with fixing screws 6, and the reflector device is positioned and fixed at a location where sunshine can be taken in to the maximum, and laundry is dried.
Patent JP-H01143713-A (JP)
Title: Apparatus and method for arranging thick and thin wall parts to stretched pipe wall
Inventor: JIEFURII DEIBITSUDO KIYARUFUUN
IPC: B21C1/22
Filed: 1988-06-17
Abstract: PURPOSE: To correctly dispose a plurality of thick wall parts and thin wall parts in a tube wall by measuring a transfer distance increment of a tube, outputting a signal and controlling the insertion and withdrawal of a bulb by a controller in response to the signal at the time of drawing the tube through a die. CONSTITUTION: An encoder 38 is rotated in proportion to the transfer of the tube 16 and pulses are transmitted to the controller 34. The number of pulses from the encoder 38 is calculated with the controller 34, an actuator 32 is commanded at a proper transfer quantity of the tube, and the bulb 14 is sufficiently inserted into the die 12. The material of the tube 16 is thinned by the bulb 14 and a drawing surface of the die 12, the pulses are calculated with the controller 34, and the thin wall parts or sections 20 are provided. When the number of calculated pulses is equivalent to the length selected as the thin section, the actuator 32 is commanded by the controller 34 so that the bulb 14 is withdrawn out of the die 12. The wall of the tube 16 is drawn, by the quantity for obtaining a prescribed thickness of the thick section 18, with the die 12.  Thus, the plural thick wall parts and thin wall parts which are correctly arranged in the tube wall are provided in the longitudinal direction of the tube.
Patent JP-H08191149-A (JP)
Title: Connecting structure of photodetector module
Inventor: HAMADA KAZUFUMI
IPC: H01L31/02
Filed: 1994-06-07
Abstract: PURPOSE: To provide a photodetector module connection structure which enables the photodetector module to display its photodetective performance sufficiently. CONSTITUTION: A photodetector module 1 is equipped with a lens 12 which concentrates light emitted from a prescribed region on a photodetective element 1a on the front 11a of a package 11, wherein a socket 2 is not connected to the front 11a of the package 11 but the rear side 11b so as not to impede the lens 12 in collecting light emitted from a prescribed region. Recesses 14 are provided to the side faces 11e of the package 11, and projections 21 fitted to the recesses 14 are provided to the inner side faces of the socket 2 corresponding to the recesses 14.