baber/WOPTO huggingface dataset:
Patent TW-358979-B (TW)
Title: Method of detecting end point of plasma processing and apparatus for the same
Inventor: KOSHIMIZU CHISHIO
IPC: G01N21/68
Filed: 1997-11-05
Granted: 1999-05-21
Abstract: Method of detecting end point of plasma processing, including the procedure: an output glowing detection information work, by using plasma for application on the processed item, for detection of lighting intensity during designated period in said processing and of the specific wavelength of the first and the second active units, with output of the light detection information; a work for seeking similar A and B relationship, based on the detected information of the glowing and on the relationship of the glowing intensity and time, for the similar relationship A of the first active unit, and the similar relationship B of the second active unit; an A' work for simulated similar relationship, by using said first active similar relationship A and said second active similar relationship B, for the first active simulated relationship A'; a V differential work for the ratio, through said first active simulated relationship A and said simulated relationship A', for the ratio between the two (A/A') and the differential value of the ratio [d(A/A')/dt]; a work for average value and scattering trend by seeking said (A/A') during said period and the differential value [d(A/A')/dt] in average and scattering trend; setting of the rated area, by taking said ratio (A/A') as the horizontal axis and the differential value [d(A/A')/dt] as vertical axis and the average value of said ratio (A/A') during said period and the average value of said differential value [d(A/A')/dt] on the graphic chart and having the value of said (A/A') given by said scattering trend and said differential value [d(A/A')/dt] for setting of the rated area; and a plasma processing final determination, by using the first and the second active glowing detection information processed in said period, for the differential value [d(A/A')/dt] with the ratio (A/A') and (A/A') with the differential value [d(A/A')/dt] and on said chart, and from said rated area, for determination of final point of plasma processing.
Patent TW-420730-B (TW)
Title: Magnetic-field applied Czochralski crystal growth apparatus
Inventor: SASAKI TAKASHI
IPC: H01F6/00
Filed: 1997-11-05
Granted: 2001-02-01
Abstract: A magnetic-field applied Czochralski crystal growth apparatus having at least one growing furnace for containing molten semicondutor material, a pulling device for pulling a crystal from the molten semiconductor material in a perdetermined direction, and a magnetic field generator for generating a magnetic field to be applied to the molten semiconductor material. The magnetic field generator has a plurality of magnet units and a coupling mechanism coupling the magnet units together such that the growing furnace is located between said magnet units.
Patent TW-382749-B (TW)
Title: Liquid supplying device
Inventor: KIMURA YOSHIO
IPC: G03F7/30
Filed: 1997-12-15
Granted: 2000-02-21
Abstract: Disclosed herein is a device for supplying a liquid to a plurality of apparatuses which apply the liquid to substrates to process the substrates. The device comprises a tank containing the liquid, a supply passage for supplying the liquid from the tank to the apparatuses, branch passages connected to the supply passage, for supplying the liquid to liquid-applying members provided in the apparatuses, and valves provided on the branch passages, respectively. The valves are controlled each other, for opening and closing the branch passages such that the liquid-applying member of one apparatus applies the liquid to a substrate while the liquid-applying member of any other apparatus remains to apply the liquid to a substrate.
Patent TW-392231-B (TW)
Title: Rework method for wafers of manufacturing semiconductor devices using the same, and method of manufacturing semiconductor devices thereby
Inventor: JEON MI-SOOK
IPC: G03F7/30
Filed: 1998-04-16
Granted: 2000-06-01
Abstract: There are provided a rework method of wafers, and a method of manufacturing semiconductor devices. The rework process is carried out on the wafers having unsuccessfully-coated photoresist due to the mal-functioning during photo-etching process for the formation of a predetermined pattern by using a thinner composition comprising a mixture of 70 to 80 weight ethyl-3-ethoxy propionate (EEP), 23 to 17 weight percent of ethyl lactate (EL), and 7 to 3 weight percent of <gamma>-butyro lactone (GBL). The method of manufacturing semiconductor devices includes a rinsing step for removing the photoresist unsuccessfully-coated on the edge side or back side of wafer by using a thinner composition, wherein ethyl lactate (EL) and ethyl-3-ethoxy propionate (EEP), or ethyl lactate (EL) and <gamma>-butyro lactone (GBL) mix at appropriate rate respectively besides the above thinner composition.
Patent TW-401555-B (TW)
Title: Control method for lot production flow in a tool group
Inventor: LIN LI-REN
IPC: G06F19/00
Filed: 1998-04-23
Granted: 2000-08-11
Abstract: A kind of control method for lot production flow in a tool group which can find the minimum loading in the tool group of the following processes in each process and move the material to the corresponding storage device with the tool to follow the next process. In the control method disclosed in the present invention is as follows: judge in advance and conclude whether the next process includes a tool group in the step of each process, so that if the next process includes only one tool, the material can be moved directly to the corresponding storage device to that tool; if the next process includes a tool group, then conclude whether the storage device of the tool group overlaps with the storage device of the one next to the next tool group; if the storage devices are overlapped, move the materials into the storage device with the minimum loading, but if not, move the materials into the smallest loading storage device of the next process so that the process can be proceeded under the conditions of reducing the numbers of transporting and of distributing equally the tool loading; therefore, it is capable of sharing the tools' loading between the peak and off-peak hours of the factory production.
Patent TW-428254-B (TW)
Title: Fabricating method of high voltage device having a plurality of kinds of voltage-resist combinations
Inventor: LI JIA-SHENG
IPC: H01L27/092
Filed: 1998-05-04
Granted: 2001-04-01
Abstract: For the fabricating method of high voltage CMOS device proposed in this invention, trench is used as the isolation insulation unlike the conventionally known technique that uses field oxide layer as the isolation insulation. In addition, vertical voltage drop structure is adopted so as to increase the drift region length per unit area of device. Therefore, this invention can be used to develop sub-micrometer high voltage complementary metal oxide semiconductor and increase the integration of integrated circuit (IC) on wafer. Additionally, this invention provides the fabricating method for high voltage device having a plurality of kinds of voltage-resist combinations such that several kinds of high voltage devices with different voltage-resist characteristics can exist simultaneously on the same IC. The description outlined above can be obtained by only slightly adjusting the height of N<SP>-</SP> region located below the source/drain region (N<SP>+</SP> region). The slight adjustment of N<SP>-</SP> region height can be completed by different level of etching procedures.
Patent TW-368711-B (TW)
Title: Semiconductor packaging technique
Inventor: CHOU LI-KUN
IPC: H01L21/60
Filed: 1998-05-26
Granted: 1999-09-01
Abstract: The invention relates to a kind of semiconductor packaging technique which is to position a plurality of pairs of ridges on the PCB or BGA substrate; allocating the semiconductor components in each pair of ridges and connecting them; proceeding the wire bonding process for each chip; bonding the cap or agglutinating on the ridges to be sealed; as a PCB or BGA packaging technique or adding bonding ball mesh on the back of substrate; cutting the substrate into units. The invention produces the ridges with off-line method and mounts those ridges on the PCB or BGA substrate that it can prevent the high temperature and high pressure using direct pressing on the substrate so as to increase the product reliability and greatly reduce the mold cost such that the packing cost is lowered and yield rate is increased.
Patent TW-459218-B (TW)
Title: Device provided with a recording unit and a memory
Inventor: MONTIE EDWIN ANDRE
IPC: G11B20/10
Filed: 1998-05-27
Granted: 2001-10-11
Abstract: The present invention relates to a device (1) for recording and/or reproducing information signals. The device has an input (2) for receiving an information signal to be recorded, a memory (9), a recording unit (3) which is suitable for loading a record carrier and input means (11) for supplying an instantaneous recording command. The device (1) is provided with means for storing the information signal in the memory (9), detection means (7) for detecting whether a record carrier is loaded, means for reading the relevant information signal from the memory in response to said detection and means for copying the information signal to the record carrier.
Patent TW-373045-B (TW)
Title: Method and apparatus for cutting needle thread and shuttle thread
Inventor: GRIES FRANZ
IPC: D05B65/02
Filed: 1998-05-27
Granted: 1999-11-01
Abstract: A method for cutting needle thread on the ladder type thread orbit sewing machine; the said sewing machine comprises a thread clamp (2) rotating on a horizontal level, and a thread cutting device, which consisting of a shuttle (21), with a cutting edge, a small cutting knife (44) and a thread clamp (47); when the cutting process begins, the shuttle (210 moves to return from the stationary position, bringing along with the cutting knife (44) and the thread clamp (47), and passes the thread eye (4) to approach cutting position; while the cut thread is grasped, the shuttle (21) returns to the stationary position, at the same, after the needle thread is cut, the shuttle (21), the cutting knife (44) and the thread clamp (470 will go back the stationary position too, where the thread clamp (47) will pull another section of needle thread out of the shuttle (21); because the cutting position is very close to thread eye, it save lot in thread consumption.
Patent TW-484296-B (TW)
Title: Checksum device used in cryptography
Inventor: YAN SUNG-MING
IPC: H04L9/14
Filed: 1998-06-19
Granted: 2002-04-21
Abstract: A checksum device used in cryptography comprises a keystream generator to generate a keystream output in accordance with an input of secret key. In addition, a postfix device is used for adding several bits behind the original message, thereby composing the message to be in the postfix form. A demultiplexer is employed to separate the message into several arrays by the control of keystream. Several mixers are used to receive each array. And, several compressors receive the output from each mixer. Each output of the compressors is used as the checksum output. The outputs of the compressors are cross feedback to multiple transmission gates for further connection to each mixer by the control of message. By the checksum device used in cryptography, the message has less postfix bits and extremely low hacking probability such that the transmitter and the receiver can use a common secret key for a long time to reach the purpose that the message cannot be arbitrarily modified.
Patent TW-470651-B (TW)
Title: Thickened film-forming composition and cosmetic process for treating keratinous material and/or mucous membrane by using thereof
Inventor: RAMIN ROLAND
IPC: A61K8/00
Filed: 1998-08-07
Granted: 2002-01-01
Abstract: The invention relates to a thickened film-forming composition comprising a film-forming polymer and, as thickener, a polysaccharide alkyl ether formed of units containing at least two different saccharide rings, each unit containing at least one hydroxyl group substituted with a saturated hydrocarbon-based alkyl chain. The polysaccharide alkyl ether preferably has a molecular weight of greater than 200,000 and is in particular a guar gum alkyl ether having a degree of substitution of from about 2 to 3, in particular 2.5. The composition obtained can be used in particular in the cosmetics fields for keratinous material and is intended more especially to treat and care for the nails.
Patent TW-372863-B (TW)
Title: Method for controlling and operating a multi-function, dynamic and static bed assembly
Inventor: WANG YI-LONG
IPC: A47C20/08
Filed: 1998-06-30
Granted: 1999-11-01
Abstract: The present invention relates to a method for controlling and operating an apparatus for a multi-function, dynamic and static bed assembly which mainly comprises a reciprocating motion main body mechanism linking with the bed assembly permitting an up and down hopping movement and a forward and backward sliding movement; the sliding roller channel of the bed frame is directly coupled with the top wheel of the hoisting member for up and down adjustment; a simple manual control can put the bed assembly in the static manner as a flat bed,, skew position, chaise lounge, and lying bed; it can also be operated by the remote control and sound control to make a dynamically diverse sectional and wave type movement as the recreation purpose entails.
Patent TW-392342-B (TW)
Title: Integrated circuit fabrication method and structure
Inventor: SCHREMS MARTIN
IPC: H01L27/108
Filed: 1998-09-02
Granted: 2000-06-01
Abstract: A method for forming a dielectric for a capacitor. The method includes providing a semiconductor; forming a non-uniform layer on a surface of the semiconductor; subjecting the semiconductor and the non-uniform layer thereon to heat and pressure producing pits in a surface of the semiconductor; forming a second dielectric over the pitted surface of the semiconductor to provide the dielectric for the capacitor. With such method, the dielectric has increased surface area for formation of a capacitor electrode having a corresponding increased surface area to thereby increase the capacitance of the capacitor. Thus, the usually detrimental effect of pit formation is used to increase the surface area of the electrodes of a capacitor. The step of subjecting the semiconductor to heat and pressure producing pits in a surface of the semiconductor comprises the step of subjecting the semiconductor with the dielectric layer thereon to a first anneal and wherein the step of rounding the pits produced in the surface of the semiconductor comprises the step of subjecting the semiconductor comprises the step of subjecting the semiconductor to a second anneal. A DRAM cell is provided having a single crystal body. The body has formed therein a transistor and a capacitor coupled to the capacitor, The capacitor includes a doped single crystal semiconductor portion formed in the body, such portion having a pitted surface. The doped semiconductor portion provides a first electrode for the capacitor. A dielectric is disposed over the pitted surface of the semiconductor. A second electrode for the capacitor is disposed over the dielectric and electrically is connected to the transistor.
Patent TW-480169-B (TW)
Title: Dental implant for implantation in living jawbone having overlying gingiva
Inventor: ROGERS DAN PAUL
IPC: A61C13/00
Filed: 1998-10-02
Granted: 2002-03-21
Abstract: A single stage dental implant for implantation in living jawbone having overlying gingiva comprises a generally cylindrical body section having an exterior surface for confronting the jawbone and a head section attached to the body section for extending through the overlying gingiva when the body section is confronting the jawbone. The head section has an end portion which is generally near an outer layer of the gingiva. The implant further includes a bore within the head section extending to an opening at the end portion of the head section. The bore is defined by first, second, and third walls. The first wall has internal threads. The second wall has a larger diameter than the first surface and is substantially cylindrical. The second wall extends from the first wall toward the end portion. The third wall extends from the second wall to the opening and flares toward the opening to a diameter that is wider than a diameter of the second wall. The implant is delivered to the site is the patient's mouth with a carrier that is expanded into the second wall of the bore thereby developing a tight engagement capable of withstanding the insertion torque. The implant can be fitted with posts which extend above the upper portion of the implant. The post can be fitted with gingival forming components and temporary posts.
Patent TW-455790-B (TW)
Title: File format transformation method and file system, information process systems, and electronic transaction systems thereof
Inventor: INOHARA SHIGEKAZU
IPC: G06F17/30
Filed: 1998-10-09
Granted: 2001-09-21
Abstract: The present invention relates to a computer system, especially a file format transformation method for file system that can provide information to the user by means of multiple file formats. More specifically, it relates to an appropriate file format transformation method and the file system and various information process systems and electronic transaction systems thereof applied during information exchange through world-wide web (hereinafter referred to as WWW) between computers by means of multiple file formats. In order for the user not to get involved in the format transformation between files of multiple file formats, the file system (100) will carry out the format transformation process at the same time as the publication of the file operation API by keeping the relationship between the original transformation file (130) and the destination transformation file (131). The user needs only to carry out the previous operations carried out by other on-line users. All file transformations (1-stage or multi-stage) necessary to be carried out in the process will be carried out without involvement of the user. Then, the user can always use the most updated original transformation file without having to appoint an original transformation file or specify the format transformation timing.
Patent TW-526201-B (TW)
Title: Novel FT-0554 substance and its production
Inventor: OMURA SATOSHI
IPC: C12P17/18
Filed: 1998-11-03
Granted: 2003-04-01
Abstract: The present invention is to obtain novel FT-0554 substance which is useful for treatment of helminthiasis. The present invention comprising the steps of culturing the microorganism belonging to fungi having producing activity of FT-0554 substance represented by the following formula [I] subjected to accumulation of FT-0554 substance in the cultured medium, and isolating FT-0554 substance from the said cultured mass. The medicament useful for treatment of parasitic infection, specifically helminthiasis can be obtained.
Patent TW-408447-B (TW)
Title: The formation method of semispherical grained silicon (HSG-Si)
Inventor: CHEN SHR-CHING
IPC: H01L21/8242
Filed: 1999-01-04
Granted: 2000-10-11
Abstract: A method of forming semispherical grained silicon (HSG-Si). There forms a layer of patterned amorphous silicon on the wafer; then, soak it with the mixing aqueous solution of HF and oxidation agent for a period of time to achieve the purpose of seeding. Then, wash it with HF aqueous solution, proceed the annealing to form the semispherical grained silicon (HSG-Si).
Patent TW-420758-B (TW)
Title: Manufacturing method of matrix formed on substrate and matrix of this kind especially a matrix for LCD addressable by the active matrix
Inventor: GLUECK JOACHIM
IPC: G03F7/20
Filed: 1999-01-26
Granted: 2001-02-01
Abstract: A manufacturing method of matrix formed on substrate, especially a matrix for LCD addressable by the active matrix, it comprises a structure of transparent image pixels (3) (4) (11) (12) (13) (14), e.g. circuit (conducting lead), contact point region or similar objects and image pixel electrodes (17) installed insulatively on top of it, the image pixel electrode is completely or partially transparent. The image pixel electrode has at least one portion of it generated from the range of a structured layer of a photosensitive layer which is automatically adjusted, wherein the photosensitive layer is exposed from the back side. In addition, it also relates to a substrate specially for an LCD which is addressable by the active matrix, which has a transparent image pixel structure and complete or paritally transparent image pixel electrodes installed insulatively on top of it, they are sealed by the opaque image pixels underneath approximately precisely.
Patent TW-431992-B (TW)
Title: Liquid coating container
Inventor: SAEGUSA KATSUMI
IPC: B65D47/42
Filed: 1999-02-12
Granted: 2001-05-01
Abstract: A liquid coating container characterized in allowing liquid to appropriately penetrate into a part to be coated in a liquid coating container for pouring content liquid in a container body from a pouring port of a coating nozzle and coating the content liquid by a diffusing work face around the pouring port of the coating nozzle by placing a protrusion on the coating work face of the coating nozzle.
Patent TW-423231-B (TW)
Title: Multiple carrier transmission system and the method thereof
Inventor: OKAMURA YUSAKU
IPC: H04J1/06
Filed: 1999-02-23
Granted: 2001-02-21
Abstract: A multiple carrier transmission system and method which is to calculate one set of SNR values at different timings as calculating one set of SNR values in the same timing but different frequencies, and by implementing the transmission speed from one set of SNR values calculated from different timings and maximizing the performance limit that it can solve the above problem using bit distribution method. A multiple carrier transmission system which includes a SNR estimator for estimating the SNR of each carrier of the multiple carriers in different timings in the corresponding noise environment so as to get a set of SNR values; and, a bit distribution device, for accomplishing the bit distribution of each carrier as one set of SNR values in the same timing but different frequencies based on one SNR set in a set of SNR sets.
Patent TW-409110-B (TW)
Title: A device for positioning products in succession and spaced equally apart on a conveyor belt
Inventor: ROMAGNOLI ANDREA
IPC: B65G47/29
Filed: 1999-03-23
Granted: 2000-10-21
Abstract: A device for positioning products (6) in succession and equally spaced on a conveyor belt (2) comprises: a first rotor (3) which rotates about a fixed horizontal axis of rotation (4), with a radial pusher (5) which, when the first rotor (3) rotates, intercepts the back of a product (6), accelerating it along a feed line (7) towards the conveyor belt (2); and a second rotor (8) which rotates about a fixed axis of rotation (9) parallel with the axis (4) of the first rotor (3) and has a stop (10) which, when the second rotor (8) rotates, periodically intercepts the product (6) feed line (7). The second rotor (8) is located above the conveyor belt (2) and rotates in such a way that, when it intercepts the feed line (7), it causes the stop (10) to rotate at a peripheral speed (V2) identical to the belt (2) feed speed (V). The stop (10) on the second rotor (8) intercepts the products (6) accelerated by the first rotor (3), slowing them and depositing them on the belt (2) in succession and spaced equally apart.