baber/WOPTO huggingface dataset:
Patent JP-S63111137-A (JP)
Title: Sliding contact material
Inventor: YANAGISAWA HIDEKAZU
IPC: H02K13/00
Filed: 1986-10-29
Abstract: PURPOSE:To obtain a sliding contact material remarkably excellent in wear resistance and minimal in the amount of worn particles, by providing a surface layer consisting of one or more elements among Nb, In, Ba, and Cd to an alloy consisting of Au, Ag, and Cu by plating and by diffusing the surface layer to carry out alloying. CONSTITUTION:The surface layer consisting of one or more elements among Nb, In, Ba, and Cd is provided to the alloy consisting of, by weight, 60-65% Au, 5-10% Ag, and 27-33% Cu by means of sputtering, etc. It is preferable that the thickness of this surface layer is regulated to 0.01-5mum. Subsequently, diffusion treatment is applied to this surface layer under the conditions, e.g., of 100-500 deg.C and 0.5-1hr to carry out alloying of the surface layer, so that desired sliding contact material is obtained. By using this sliding contact material, a brush contact having low and stable contact resistance for an extremely long period can be obtained.
Patent JP-H01102291-A (JP)
Title: Air permeability regulator for sintering raw material layer
Inventor: KAWAGUCHI KATSUNORI
IPC: C22B1/20
Filed: 1987-10-13
Abstract: PURPOSE: To reduce a difference in aeration between an upper layer and a lower layer by a method wherein a plurality of scraper rods comprised of a plurality of rods arranged in parallel with a pallet advancing direction are arranged in a plurality of stages below the extremity ends of a group of slant slit bars and the scraper rod in each of the stages can be moved vertically and in a forward or a rearward moving direction of the pallet. CONSTITUTION: A sintering raw material within a hopper 1 is dropped by a feeder 2 onto a group 3 of slant slit bars and classified. Fine particle raw material is loaded into a pallet 4 running through slits in the group 3 of bars to form an upper layer 8U of raw material layer. The rough particle raw material rolls along the surfaces of the group 3 of bars up to a chute lower end, a point A, strikes against the scraper rods 7, thereafter the raw material is loaded into the pallet 4 to form a lower layer 8L of the raw material layer. At this time, in order to change a state of segregation of particle size in a layer height direction of the raw material layer 8, a chute angle θ is changed to cause a dropping position of the rough particle raw material on the pallet 4 to be varied, an amount of raw material passing through the slits is increased or decreased and the height of the lower layer 8L is varied. Accordingly, positions of the scraper rods 7 in their forward or rearward directions are changed, a screw shaft 17 is rotated to cause the scraper rod fixing frame 19 to be moved vertically by a nut 18 along a slide guide 20.
Patent JP-H08121745-A (JP)
Title: Dust feeding device
Inventor: ITO HISATAKA
IPC: B02C18/00
Filed: 1994-10-24
Abstract: PURPOSE: To permit the supply of constant volume of refuse into an incinerating furnace and stabilize the combustion of the refuse by a method wherein a dust feeding device is provided with a supplying amount restraining device, limiting the downflow of refuse into the downstream side of a screw in the charging port of a dust feeding machine, a crushing machine, crushing the refuse sent from the screw and guiding it into the incinerating furnace, and the like. CONSTITUTION: A hopper 11, having the refuse reserving unit 11a for charging refuse in a pit 1, and a refuse flow down unit 11b, is provided while the intake port 14 of a casing 13 for a refuse feeding machine 12 is connected to the lower end opening unit 11d of the refuse flow down unit 11b. The discharging port 15 of the casing 13 is connected to an incinerating furnace 10 through a charging passage 27. A hopper gate 28 is provided at a boundary between the refuse reserving unit 11a and the refuse flow down unit 11b while a supplying amount restraining device 29, including a swash plate unit 29 for limiting the downflow of refuse toward the downstream side of the screws 16, 17 for a dust feeding machine 12, is arranged near the lower end opening unit 11d of the refuse flow down unit 11b. Further, a crushing machine 30, crushing the refuse sent from the screws 16, 17, is provided in the casing 13.
Patent JP-H01101625-A (JP)
Title: Manufacture of semiconductor device
Inventor: HATAKE YASUHIKO
IPC: H01L21/322
Filed: 1987-10-15
Abstract: PURPOSE:To make impurity diffuse uniformly and reproducibly by a method wherein laser rays low in energy density is made to be irradiated onto the surface of an impurity diffusion region of a semiconductor crystal immediately before a process which enables impurity to diffuse into a required region of the semiconductor crystal. CONSTITUTION:In case of the manufacture of a semiconductor device which comprises a process that makes impurity diffuse into a required region of a semiconductor crystal by a irradiating laser rays, the surface of an impurity diffusion region of the semiconductor crystal is irradiated by laser rays low energy density immediately before this process. By these processes, the surface is made to be cleansed just prior to an impurity diffusing process, so that the needless impurity other than a diffusion source is prevented from diffusing and the diffusion uniform in concentration and depth can be reproducibly performed.
Patent JP-H1189883-A (JP)
Title: Adhesive plaster carry case
Inventor: WATANABE YOSHIO
IPC: B65D83/08
Filed: 1997-09-24
Abstract: PROBLEM TO BE SOLVED: To provide an adhesive plaster carry case with which a stored adhesive plaster can be taken out without opening a lid. SOLUTION: Concerning a case 4 formed with a vessel 2 to be opened/closed with a hinge part 1 as a supporting point and a lid 3, a finger hole 6 is opened at the center of a top plate 5 of the lid 3, one short side is made into outlet 8, lid frames 7 are formed on remaining three sides, a projection 9 is protruded outside by the side of the outlet 8, the projection 9 also becomes an area for passing a string 11 in addition to the role of a handle and when the thumb is put in from the finger hole 6 and the adhesive plaster is pushed out in the state of closing the lid, the adhesive plaster can be put up to the position of the outlet by an up plate 13.
Patent JP-S61125429-A (JP)
Inventor: JIYOSEFU EI DEIREGORO
IPC: B01J4/02
Filed: 1985-11-18
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S63112742-A (JP)
Inventor: SATO YOSHIAKI
IPC: D02G3/36
Filed: 1986-10-31
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H01104589-A (JP)
Title: Handrail lighting apparatus for passenger conveyor
Inventor: NOSHITA AKIRA
IPC: B66B31/00
Filed: 1987-10-14
Abstract: PURPOSE: To prevent the danger of suffering a skin burn and electric shock while preventing an intentional or careless touch of a passenger utilizing a passenger conveyor on a ball lamp by extending a suspending lower end of a cover plate arranged outside the ball lamp downward lower than a lower end of the lamp. CONSTITUTION: Even in the case where a passenger utilizing a passenger conveyor tries to lean out of a handrail and separates his/her hand 10 from a rubber handrail 5 and tries to insert it to a lower surface side of a guide rail 4, the hand 10 is hindered by a cover plate 9 positioned outside of a ball lamp 6. As a result, easy touch of the hand 10 on the ball lamp 6 is prevented so as to prevent the suffering of a skin burn and electric shock of passengers.
Patent JP-H1190180-A (JP)
Title: Method for detoxifying nitrogen trifluoride
Inventor: JINBO TAKASHI
IPC: B01J23/755
Filed: 1997-09-24
Abstract: PROBLEM TO BE SOLVED: To treat NF3 in a safe and efficient manner by intermittently supplying NF3 -contg. waste gas to a catalyst bed when the NF3 -contg. waste gas is allowed to react with hydrogen in the presence of a catalyst to make the NF3 harmless. SOLUTION: When NF3 -contg. gas such as waste gas from a super-LSI etching device is detoxified, it is intermittently supplied to a catalyst bed. The catalyst used contains a 1st component selected from among Fe, Co, Ni, Cu, Zn, Ru, Rh, Pd, Ag, Pt, etc., and one or more of fluorides of alkali metals and alkaline earth metals as a 2nd component. It is preferable that the NF3 - contg. waste gas is supplied to the catalyst bed for a prescribed time, NF3 -free gas is then supplied for a prescribed time and this cycle is repeated. A high rate of conversion of NF3 is attained.
Patent JP-2000147131-A (JP)
Title: Remote control system for seismic signal acquisition
Inventor: SIGMAR AXEL
IPC: H04M11/00
Filed: 1999-09-13
Abstract: PROBLEM TO BE SOLVED: To remotely monitor and make controllable the seismic data acquisition by connecting a central command center supplying user interface to a local device connected to a remote device for seismic data acquisition and transmission. SOLUTION: In the monitoring system 430, a telephone system 702 is connected to PSTN 425 at an arbitrary number of commercial interfaces, a video meeting system 706 is connected to an interface 704 provided with an NT-1 adapter and the interface 704 is connected to an ISDN 420. Then, the ISDN router 708 connected with the ISDN 420 converts input data into IO base-T to send to a data analyzer 710. By constituting the monitoring system 430 in this manner and containing a plurality of local devices and remote location in a network, since the acquisition of seismic data at a plurality of remote locations can be administered in a plurality of command administration centers, the man power and time necessary for the administration can be reduced.
Patent JP-H1180996-A (JP)
Title: Electrode coating method
Inventor: SHIMA KENSHICHIROU
IPC: C25D13/00
Filed: 1997-09-08
Abstract: PROBLEM TO BE SOLVED: To remove the electrodeposition coating material infiltrating the joints of steel sheets by disposing a stage for blowing steam to a material to be coated after the material to be coated is immersed into the coating material before this material is baked. SOLUTION: After the material to be coated is immersed into the electrodeposition coating material, the steam is blown thereto, by which the coating material infiltrating the joint surfaces of the steel sheets is heated and the viscosity of the material is lowered. As a result, the outflow of the electrodeposition coating material from the joint surfaces of the steel sheets is eventually resulted. Condensed water is adhered to the surface of the material to be coated by blowing of the steam. This condensed water acts to draw out the electrodeposition coating material flowing out of the joint surfaces of the steel sheets and, therefore, the outflow of the coating material is accelerated.  The stage for heating the material to be coated at >=40 deg.C and <=100 deg.C is further disposed between the stage for blowing the steam and the stage for baking, by which the flowing out electrodeposition coating material is dried and removed. This heating may be executed by blowing the air of >=40 to <=100 deg.C.
Patent JP-H06112076-A (JP)
Title: Wound iron core annealing method and device
Inventor: AWA MIKIO
IPC: H01F41/02
Filed: 1992-09-29
Abstract: PURPOSE:To enable a wound iron core to be lessened in annealing cost and annealing time and improved in productivity by a method wherein a device and a method of quickly annealing the wound iron core by quickly heating or cooling the wound iron core from its surface to its deepest part. CONSTITUTION:A heating chamber 11 and a cooling chamber 12 are provided adjoining to coach other, a transfer mechanism 32 which is composed of many rollers 31 and others and transfers a wound iron core 29 from a heating chamber 11 to a cooling chamber 12 is provided, a turning mechanism 30 which turns the wound iron core 29 with turntables 25 and 26 located in the heating chamber 11 and the cooling chamber 12 respectively is provided, and the wound iron core 29 is heated in the heating chamber 11 and then cooled down in the cooling chamber 12 as it is rotated.
Patent JP-S62119189-A (JP)
Title: Device for producing single crystal
Inventor: NISHIO JOSHI
IPC: H01L21/208
Filed: 1985-11-19
Abstract: PURPOSE:To obtain a single crystal having controlled diameter and without any slip even in moderate environment while controlling the heating and cooling with the output of a temp. detector provided at the lower part of a crystal lifting shaft in the titled device by the Czochralski method wherein the shaft is cooled. CONSTITUTION:Ga and As, for example, are charged in a crucible 2, then a B2O3 capsuling material 5 is charged. The crucible is placed in a high-pressure vessel 1, and the inside of the vessel is pressurized with Ar and heated to form a GaAs melt 4. Then the pressure in the vessel 1 is reduced to a pressure at which a crystal is lifted. The thermal environment in the melt 4 and the material 5 is moderately set by the first and the second resistance heater 61 and 62 among the heaters 61 and 62 and the third heater 7. The oil 13 in an oil bath (cooling mechanism) 12 is circulated by a pump 15, the flow rate is regulated by a valve 16, and seeding is carried out. At this time, the regulation is performed so that the temp. distribution measured by a thermocouple (temp. detector) 11, namely the differential thermal pattern in the axial direction of a lifting shaft 10, is specified. Then lifting is started, the valve 16 is regulated, the power supply to the heaters 61, 62, and 7 is controlled while monitoring the output of the thermocouple 11 to form the specified differential thermal pattern.
Patent JP-H0572111-A (JP)
Title: Fixation of fine particle detector nozzle
Inventor: SHINPO SENJI
IPC: G01N15/14
Filed: 1991-09-11
Abstract: PURPOSE:To obtain a method for fixing a nozzle in which the need of position readjustment work is obviated, for an injection nozzle or exhaust nozzle which is demounted for cleaning, in the detection cell of a fine particle detector. CONSTITUTION:Auxiliary plates 126 and 136 having fitting holes 127 and 137 for the fitting of the trunk parts 122 and 132 having each circular section of the nozzles with high precision are interposed between installation flanges 123 and 133 for an injection nozzle 12 and an exhaust nozzle 13 and the case body 11 of a detection cell 1. Each trunk part is inserted into each fitting hole and the flanges are screw-fixed in airtight form and in freely demountable manner through O-rings 124 and 134 for the auxiliary plates. The injection hole or exhaust nozzle and the auxiliary plate are formed integrally, and after injection hole or exhaust hole is positioned for laser beam, each auxiliary plate is fixed on a case body in airtight form through O-rings 129 and 139. Since the auxiliary plate and each nozzle are positioned as integral form, each nozzle which is demounted for cleaning work and reinstalled on the auxiliry plate is positioned as it is, and the need of readjustment is obviated, and the maintenance performance for the detection cell is improved.
Patent JP-H01102924-A (JP)
Title: Heat treatment of semiconductor substrate
Inventor: TAKEUCHI RYOICHI
IPC: H01L21/265
Filed: 1987-10-16
Abstract: PURPOSE:To enhance uniformity of a concentration value of a carrier in an active layer and a thickness value of the active layer by controlling a temperature raise operation for heat treatment and a cooling rate after implantation of ions into a semiconductor substrate. CONSTITUTION:An ion-implanted semiconductor substrate is placed inside an electric furnace; a gas atmosphere of, e.g., about 3 atm. of arsine is produced; a temperature is raised at a temperature raise rate within a range of 100-20 deg.C/min. After the temperature has been raised to 700 deg.C or higher, the furnace is kept at a prescribed temperature for 10-25 min and is then cooled at a cooling rate within a range of 40-2 deg.C/min. Uniformity of an electrical characteristic inside the substrate is deteriorated at the cooling rate outside the range. If a temperature gradient becomes gentle, a region whose concentration value of a carrier is low in the circumference of a wafer is narrowed, and a region whose carrier concentration value is equal is expanded concentrically from the center.
Patent JP-H09101979-A (JP)
Title: Virtual wiring length estimating method
Inventor: MAE YOICHIRO
IPC: G06F17/50
Filed: 1995-10-06
Abstract: PROBLEM TO BE SOLVED: To perform high-accuracy wiring delay prediction on the early stage of design by providing a method for estimating a wiring length for predicting wiring delay on a certain stage before layout design. SOLUTION: This method is provided with a wiring length extracting means 1 for finding the wiring length from a layout designed model circuit 72, wiring length calculation expression generating means 2 for generating a wiring length calculation expression 75 from the extracted wiring length, model circuit structural feature extracting means 3 for extracting a structural feature 73 of the model circuit 72, object logic circuit structural feature extracting means 4 for extracting a structural feature 74 of an object logic circuit 71, and virtual wiring length generating means 5 for generating a virtual wiring length from the wiring length calculation expression, object logic circuit structural feature and model circuit structural feature.
Patent JP-H03121093-A (JP)
Title: Selection assisting device for embroidery frame
Inventor: TAJIMA IKUO
IPC: D05B21/00
Filed: 1989-10-04
Abstract: PURPOSE:To improve the operation performance by displaying an embroidery pattern and the drawing of the embroidery pattern on an image display device so that the centers of the drawings coincide, changing the shape and dimension of the embroidery frame by an input device, and displaying the dimension of the drawing of the embroidery frame when the drawing of the embroidery frame is larger than the drawing of the embroidery pattern. CONSTITUTION:A paper tape 16 is read by a tape reader 15, and the embroidery pattern data is inputted. Then, the center coordinates of the embroidery pattern is calculated by using the inputted embroidery pattern data. The drawing of the embroidery pattern is displayed on a display 32 so that the center coordinates of the obtained embroidery pattern coincide with the center coordinates of the screen of the display 32. Then, the size of the drawing (supposed frame) 38 of the embroidery frame shown on the screen 32 is calculated on the basis of the coordinate position information in inputted from a mouse 30. Then, the obtained supposed frame 38 is shown on the screen 33, and it is judged if the dimension of the supposed frame 38 is larger than the dimension of the drawing 34 of the embroidery frame, and if the dimension of the supposed frame 38 is judged large, the information 40 related to the dimension of the supposed frame 38 is displayed on the screen 33.
Patent JP-H02106173-A (JP)
Title: Voltage sensing circuit and power supply
Inventor: SAKO KENICHI
IPC: G01R19/165
Filed: 1988-10-14
Abstract: PURPOSE:To prevent the ratio of a detected voltage to a rated voltage from varying by providing a clip means taking out only the upper part of an input voltage waveform, an integrating means averaging only voltages of the upper component, and a comparator means judging whether the averaged voltage exceeds a reference value. CONSTITUTION:An averaged voltage takes a value obtained by averaging components of a section where the output voltage of a rectifier 2 is E or more, and the end voltage of an integrating circuit 8 depends only upon the upper component of the output voltage of the rectifier 2. Further, when the same voltage as a rated one is supplied in case of any of AC100V and AC200V, the waveforms of upper parts of output voltages of the rectifier 2 are almost equal, and even if an input waveform at the time of a rated voltage 200V is deformed, the deformation is limited almost only to the part below the upper component and there is little difference in the averaged voltage obtained by the averaging of only upper components.
Patent JP-H06112510-A (JP)
Title: Semiconductor pressure sensor
Inventor: SAKAI MINEICHI
IPC: G01L9/00
Filed: 1992-09-29
Abstract: PURPOSE:To contrive a smaller miniaturization of a semiconductor pressure sensor as well as to provide the sensor, which does not require a protective film for a circuit. CONSTITUTION:A diaphragm 21 consisting of silicon is arranged on the surface of a P<-> single crystal silicon substrate 14. A pressure reference chamber R1 is formed of the surface of this substrate 14 and the diaphragm 21. P<+> diffused layers 10, which are used as piezoresistance layers, are formed in the diaphragm 21 in the chamber R1. In the chamber R1, an integrated circuit consisting of a bipolar transistor 15 and the like is formed on the surface of the substrate 14 and the integrated circuit is electrically connected with the layers 10.
Patent JP-H0572684-A (JP)
Title: Silver halide color photographic sensitive material and method for processing same
Inventor: UCHIDA MINORU
IPC: G03C7/38
Filed: 1991-09-12
Abstract: PURPOSE:To enhance color reproduction performance, sharpness, rapid processing aptitude, and storage stability of a color image by incorporating a pyrazoloazole type compound for releasing a development inhibitor in at least one layer. CONSTITUTION:This silver halide color photographic sensitive material has each at least one of red-sensitive, green-sensitive, and blue-sensitive silver halide emulsion layers formed on a support and the total silver amount of 1.0-4.9g/m<2>, and at least cane layer contains the compound represented by formula I in which R is H or a substituent; Z is a nonmetallic atomic group necessary to form a 5-membered optionally substituted azole ring having 2-4 N atoms: and X is an atomic group to be allowed to release the development inhibitor or its precursor by coupling with the oxidation product of a developing agent or to release a compound to be allowed to release the develop-ment inhibitor or its precursor after being released by the first coupling and the second coupling with the oxidation product car to do so further after the third coupling.
Patent JP-H04139373-A (JP)
Title: Refrigerator cabinet
Inventor: IMAIZUMI TOSHIMASA
IPC: F25D23/06
Filed: 1990-09-28
Abstract: PURPOSE:To enable a rigidity of an entire cabinet to be increased by a method wherein reinforcing plates are disposed at both a rear edge of a bottom plate and a bottom part of an outer box and both ends of the reinforcing plates at the bottom plate are fixed to the reinforcing plates for the outer box. CONSTITUTION:Angle-shaped reinforcing plates (outer box reinforcing plates) 4 are fixed to both right and left sides at a bottom part of an outer box 1 by a plurality of screws 5. Reinforcing plates (bottom plate reinforcing plates) 6 are fixed to the bottom plate 3 at its rear edge by some spot weldings. The reinforcing plates 6 at the bottom plate are formed in advance with a predetermined number of recesses 7 for use in inserting pipes at its rear edge part. In this way, the bottom plate 3 is fixed to the outer box 1 by fixing both ends of the bottom plate reinforcing plates 6 to the outer box reinforcing plates 5 with screws 8. In this way, since a rigidity of the bottom plate 3 can be increased by the reinforcing plates 6 arranged at the rear edge of it, the bottom plate 3 is easily handled and its fixing to the outer box 1 can also be easily performed. In addition, since the bottom plate 3 of which rigidity is increased is fixed to the outer box 1, it is also possible to increase a rigidity of an entire cabinet.