Patent DE-102009023288-A1 (DE)
Title: Method for calibrating a parameter of a laser-engraver, comprises a layer-system, and a device for positioning an engrave-substrate related to an angle of the substrate during engraving and for changing the influence of illumination
Inventor: BERTHE BENOIT
IPC: H04N1/00
Filed: 2009-05-29
Abstract: The method for calibrating a parameter of a laser-engraver (1), comprises a layer-system, and a device for positioning an engrave-substrate related to an angle of the substrate during engraving and for changing the influence of illumination (2b) during the reception of the visibility system on the engrave-substrate through providing a measurement of parameter through the layer-system with a new angle. The laser-engraver has an engraver-system with a focusing lens, positioned in an interval from the surface of a substrate that is engraved. The method for calibrating a parameter of a laser-engraver (1), comprises a layer-system, and a device for positioning an engrave-substrate related to an angle of the substrate during engraving and for changing the influence of illumination (2b) during the reception of the visibility system on the engrave-substrate through providing a measurement of parameter through the layer-system with a new angle. The laser-engraver has an engraver-system with a focusing lens, positioned in an interval from the surface of a substrate that is engraved. The laserable substrate is produced from a component that consists of a color changeable according to the energy provided by laser-engraving. The engraving device of the laser is arranged so that the engraving device causes in order to engrave a certain engraving arrangement on the substrate in accordance with a variation of a parameter and the layer system is connected with a comparison arrangement for comparing a measured engrave parameter with the comparison value of a stored data in a storage device (2c) connected with an engrave-correction-arrangement. The data stored in the storage device corresponds to the value of the stored parameter by an engrave-calibration-card used as a reference element and positioned at the place of the engrave-substrate. The calibration card provides a checked pattern, where each square of the pattern has a defined position, and a variation represents a parameter different from another square of the pattern. The parameter of the laser-engraver is a gradation corresponding with the energy or size of the engraver-surface determined through the interval between the laser head and the engraver substrate, provided by the laser. The calibration of the marking interval is carried out through a process-position-test-card having several grey patterns, where each pattern has same grey color and same value of point-per-toll but the engraving of different marking interval represents between the focusing line of the laser of the engraving system and the engraving substrate. The focal length of the focusing line is defined as the reference for the alignment of the engrave-process-position. The interval of the focusing lens is defined in related to a local maximum of the darkness of grey pattern elements, when the marking interval is changed, as the reference for the alignment of the engrave-process-position. The reference value of the stored data in the storage arrangement connected to the layer-system-correction-arrangement is linked with an angle-value corresponding with the angle of the position of the engraving-substrate during the measuring process. An independent claim is included for a method for calibrating a parameter of a laser-engraver.