Patent SG-11201809429Y-A (SG)
Title: A photoelectrochemical cell for wastewater treatment and method of fabricating the photoelectrochemical cell
Inventor: LEFEBVRE OLIVIER PATRICK
IPC: H01L31/0224
Filed: 2017-05-05
Abstract: FIGTi0 2 -coated stirred glass reactor 3D-printed flow-cell reactor .— -- Carbon felt (-) lnter.electrode distance (1 cm) Solution inlet Air inlet improvement of UV-based processes (NM, EVA *mak. Solution outlet * FTO glass (+) Diffusing holes 6 sources of 'OH fiV,V.UP40.6 4(JeRco O O\ 11 N 11 O C (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 09 November 2017 (09.11.2017) WIPO I PCT omit IIl Hot o olollm 0II iflo oimIE (10) International Publication Number WO 2017/192101 Al (51) International Patent Classification: CO2F 1/32 (2006.01) CO2F 1/467 (2006.01) CO2F 1/70 (2006.01) HOlL 31/0224 (2006.01) CO2F 1/72 (2006.01) (21) International Application Number: PCT/SG2017/050236 (22) International Filing Date: 05 May 2017 (05.05.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/332,563 06 May 2016 (06.05.2016) US (71) Applicant: NATIONAL UNIVERSITY OF SINGA- PORE [SG/SG]; 21 Lower Kent Ridge Road, Singapore 119077 (SG). (72) Inventors: LEFEBVRE, Olivier Patrick; c/o National University of Singapore, Faculty of Engineering, Depart- ment of Civil & Environmental Engineering, 21 Lower Kent Ridge Road, Singapore 119077 (SG). MOUSSET, Em- manuel; c/o National University of Singapore, Faculty of Engineering, Department of Civil & Environmental Engi- neering, 21 Lower Kent Ridge Road, Singapore 119077 (SG). WANG, Zuxin; c/o National University of Singa- pore, Faculty of Engineering, Department of Civil & Envi- ronmental Engineering, 21 Lower Kent Ridge Road, Singa- pore 119077 (SG). (54) Title: A PHOTOELECTROCHEMICAL CELL FOR WASTEWATER TREATMENT AND METHOD OF FABRICATING THE PHOTOELECTROCHEMICAL CELL (57) : A photoelectrochemical cell and method of fabricating such a cell for wastewater treatment is disclosed. The photoelec- trochemical cell for wastewater treatment comprising at least one cathode and at least one anode, wherein the anode comprises a material configured for an anodic oxidation reaction in the presence of the wastewater, wherein at least one of the anode and cathode comprises an optically pervious material, the cathode configured for cooperating with the anode to drive one or more cathodic reduction reactions in the presence of the wastewater, and wherein the anode and the cathode are disposed to allow irradiation of at least a portion of a space between the anode and the cathode by a light source through the optically pervious material to activate at least one photon based reaction in the wastewater. The invention advantageously provides multiple sources of hydroxyl radicals for wastewater treatment. [Continued on next page] WO 2017/192101 Al MIDEDIMOMOIDEIROIDEMOMOHIllinilflOVOIMIE (74) Agent: VIERING, JENTSCHURA & PARTNER LLP; P.O Box 1088, Rochor Post Office, Rochor Road, Singapore 911833 (SG). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))