baber/WOPTO huggingface dataset:
Patent TW-315386-B (TW)
Title: Fully-hydrolized ketimine silane/epoxide silane copolymer liquid hardcoating compositions & processes for dipcoating polycarbonate spectacle lenses
Inventor: GEORGE JOSEPH GALIC
IPC: B29D11/00
Filed: 1995-12-07
Granted: 1997-09-11
Abstract: Dipcoated polycarbonate Rx spectacle lenses require not merely cured coating film hardness and scratch resistance, but compatibility with subsequent tinting and/or AR coating processes. Chemically, fully-hydrolized copolymers of amino silane and epoxide silane form the basic chemical backbone of these novel heat-curing hardcoats, although polyfunctional organic resin modifiers which may also "co-cure" into the backbone during crosslinking are also contemplated so as to add especially desired properties to the cured hardcoating film. The liquid coating copolymer is made in three chemical reactions: (1) fully hydrolizing the two silane Components A & B separately (for later reaction together) with a stoichemetric excess of water; (2) ketimine formation, by reacting the fully hydrolized amino-functional silane Component B with stoichemetrically excessmolar amounts of a ketone volatile solvent, to latently cap the amine functionality; (3) "bodying" the liquid hardcoating to a desired degree of copolymerization, by reacting together the fully hydrolized ketimine silane Component B with the fully hydrolized epoxide-functional silane Component A. Dilution of this basic reaction mixture is preferrably with at least one polyfunctional co-reactive film-forming organic resin modifier, and with additional ketone volatile solvent but also at least some alcohol having a slower rate of evaporation than the chosen ketone volatile solvent. When formulated with certain co-reactive resin modifiers, very dark tintability is obtained with reasonable but somewhat reduced film hardness. The polyfunctional co-reactive film-forming organic resin modifier is selected from a chemical grouping in which each member of the chemical grouping has at least two organo-functional reactive groups per molecule. These two (or more) groups are of epoxide or melamine or hydroxyl or urea families. Better properties of the cured film result when heat forced drying/solvent devolitilization is used instead of ambient air drying.
Patent TW-313517-B (TW)
Title: Assembly for sealing a puncture in a vessel and method thereof
Inventor: PETER HENRY HANNAM
IPC: A61B17/04
Filed: 1996-03-01
Granted: 1997-08-21
Abstract: A bioabsorbable assembly for sealing an incision or puncture in the body of the patient including a first member which is positioned generally along the wall of the blood vessel, duct, body cavity or lumen of the patient and a gelationous material which is injected into the incision or puncture around a filament or clip member which is associated with the first member to seal the incision or puncture from the flow of fluids through the blood vessel, duct or lumen of the patient and the method therefore.
Patent TW-301760-B (TW)
Title: The assembling and manufacturing process of bulb
Inventor: LEU PERNG-JONG
IPC: H01K3/18
Filed: 1996-04-09
Granted: 1997-04-01
Abstract: An assembling and manufacturing process of bulb, its an automatic process for assembling the lamp cap on both ends of bare bulb. Its steps include:Arrange the lamp cap in series, fix the lamp cap; insert the Tin into lamp cap; paint glue on cap; turn the lamp cap; arrange bare bulb in series; clamp the bare bulb, insert the bare bulb into lamp cap; weld bare bulb & lamp cap in single side and dry it, then turn and fix the bare bulb. Meanwhile, another lamp cap is arranged in series, and through fixing the lamp cap, inserting Tin, painting glue, inserting the turned bare bulb into lamp cap, then drying, welding to finish the bare bulb united with two lamp caps, and send the bulb finally.
Patent TW-353776-B (TW)
Title: Processing method and processing apparatus
Inventor: KUMASAKA IWAO
IPC: B65G49/07
Filed: 1996-04-30
Granted: 1999-03-01
Abstract: A method for carrying a substrate to be treated, in a treatment vessel to carry out a predetermined treatment of the substrate to be treated, the method comprising the steps of: setting a treating cycle of an equipment monitoring substrate serving to monitor a state of a treatment equipment; taking the equipment monitoring substrate out of an exclusive carrier to carry the equipment monitoring substrate in the treatment vessel to treat the equipment monitoring substrate therein, in a preset treating cycle during treating the substrate to be treated; and carrying the treated equipment monitoring substrate in the exclusive carrier.
Patent TW-349034-B (TW)
Title: Control of metallic appearance in automotive cast paint films
Inventor: FLYNN MICHAEL D
IPC: B32B15/08
Filed: 1996-06-27
Granted: 1999-01-01
Abstract: A process for controlling the metallic appearance of a metallic automotive paint film containing reflective flakes to achieve a random orientation of the reflective flakes, the process comprising: casting a layer of a thermoplastic and thermoformable pigment-containing metallic automotive paint coat onto a carrier; the cast paint coat comprising a dispersion of a fluorinated polymeric material in a solvent-based solution of an acrylic resin, the dispersed fluorinated polymeric material having an average particle size less than about 35 microns and being uniformly dispersed in the solution of acrylic resin, the cast paint coat further comprising a pigment uniformly dispersed in the paint coat to provide coloration, and reflective flakes uniformly dispersed in the paint coat to impart to the paint film a metallic appearance; and drying the cast paint coat to fuse the paint coat and thereby form a finished metallic automotive paint film in which the parallel orientation of the reflective flakes to one another is inhibited such that the flake orientation of the finished paint film provides a randomly oriented distribution of the reflective flakes.
Patent TW-374203-B (TW)
Title: A method for forming a fine contact hole in a semiconductor device
Inventor: KIM SANG-WOOK
IPC: H01L21/28
Filed: 1996-08-28
Granted: 1999-11-11
Abstract: Disclosed is a method for forming a fine contact hole, and more particularly, a method capable of minimizing the loss of a silicon substrate. In the method for forming the contact hole according to the present invention, since the spacer is formed on the sidewall in the contact hole at the time of performing the dry etching process which makes it wide the approach to the contact hole, the contact area is hardly damaged by the etchant. Then, the dry etching process in accordance with the present invention can minimizes the loss of the substrate because the substrate to be exposed is under the protection of the insulating layer 43. The substrate can be less damaged than 100.
Patent TW-389739-B (TW)
Title: Facility for treating objects in a process tank
Inventor: POKORNY JOACHIM
IPC: H01L21/00
Filed: 1996-10-16
Granted: 2000-05-11
Abstract: A facility for treating objects in a process tank (1) in which at least one treatment fluid is charged  and/or discharged is introduced. An even fluid distribution and pressure distribution over the entire cross-section of the process tank (1) or treatment chamber with laminar flow conditions is assured by at least one fluid-distribution device (4, 8) through which the treatment fluid is introduced or removed. The fluid distribution system (4, 8) preferably comprises at least one porous rod (4), at least one porous plate (8), at least one capillary plate (8) and/or at least one single- or multi-layered fabric element (8).
Patent TW-379264-B (TW)
Title: Patterned float plated fabrics and methods for manufacturing aforesaid
Inventor: SCHMIDT WALTER RICHARD
IPC: D04B1/00
Filed: 1996-12-05
Granted: 2000-01-11
Abstract: The present invention relates to float plated fabrics which are patterned in adjoining areas of the fabric from one of at least two yarns knitted in a float plated relationship to the other yarn alternatively one another, herewith knitting sectional ground fabric portions from all yarns succeeding one another complementary to a complete ground fabric, so that a specific ground yarn is substituted or additionally used for plating effects. In a preferred method for manufacturing such fabrics the yarns are successively fed and engaged in the hooks of predetermined needles which will knit the yarns subsequent to the feeding to sectional loop portions and will knit the loop portions together to a complete course in the final knitting action (cast off).
Patent TW-345619-B (TW)
Title: Method for detecting communication card and device therefor
Inventor: JENQ TZER-HORNG
IPC: G01R31/28
Filed: 1997-01-16
Granted: 1998-11-21
Abstract: A method for detecting a communication card, which comprises the following steps: (A) inserting a normal communication card on a computer motherboard as a test standard among the communication cards under test; (B) connecting a test device with the normal communication card on the motherboard through wires; (C) mounting a communication card under test on a test device during the process the boot ROM contact, the communication joint contact and expansion bus joint contact of the communication card under test being separately connected to the probes mounted on the test device; (D) uniformly applying a force on the communication card under test thereby enabling each contact on the communication card to contact with each probe; and (E) switching on power and testing the communication card through the contact between the probes and the contacts.
Patent TW-324822-B (TW)
Title: Magnetic recording media having CrTiX underlayers to reduce circumferential/radial anisotropy and manufacturing method thereof
Inventor: TSAUR WEI
IPC: G11B5/62
Filed: 1997-03-26
Granted: 1998-01-11
Abstract: A magnetic recording media comprises: (1) one rigid substrate; (2) one underlayer disposed over the substrate, in which the underlayer comprises material selected from group constituted by CrTiCu and CrtiV; (3) one magnetic layer disposed over the underlayer, in which the magnetic layer is disposed over textured-surface.
Patent TW-344890-B (TW)
Title: Process for producing a gas insulative multilevel metallic interconnections on integrated circuits
Inventor: LII WEY-YAN
IPC: H01L23/50
Filed: 1997-03-28
Granted: 1998-11-11
Abstract: A process for producing a gas insulative metallic interconnection on a substrate, which comprises the following steps: preparing a substrate, the element regions thereon being surrounded by a field oxide region, each being electrically isolated from each other, the element regions having a layer of a to-be-finished element formed by a first polysilicon layer; depositing a layer of first insulative layer on the to-be-finished element; planarizing the first insulative layer; depositing a second insulative layer on the first insulative layer; forming a contact to the defined first polysilicon layer and to the element regions on the substrate in the first and second insulative layers; selectively filling the contact with a first conductive layer thereby forming a metal locking rod; depositing a first negative photoresist layer on the second insulative layer and the metal locking rod; defining a pattern of the first negative photoresist layer, forming an aperture region extending to the metal locking rod; conformally depositing a second conductive layer on the first negative photoresist layer and in the aperture region electrically contacting the metal locking rod; depositing a third conductive layer on the second conductive layer; planarizing the third conductive layer; depositing a positive photoresist layer on the metallic interconnection; defining a pattern of the second negative photoresist layer; exposing and developing the positive photoresist layer; conformally depositing a fourth conductive layer on the second negative photoresist layer and in the aperture of the second negative photoresist layer; depositing a fifth conductive layer on the fourth conductive layer; planarizing the fifth conductive layer; removing all photoresists; conformally depositing a protective film on the surface exposed from the first and second metallic interconnection thereby completing the gas insulative metallic interconnection.
Patent TW-427880-B (TW)
Title: Fungicidal mixture
Inventor: MUELLER BERND
IPC: A01N47/20
Filed: 1997-04-25
Granted: 2001-04-01
Abstract: Fungicidal mixture, comprising (a) a carbamate of the formula I, where T is CH or N, n is 0, 1 or 2 and R is halogen, alkyl or haloalkyl, it being possible for the radicals R to be different when n is 2, and at least one compound selected from (b) oxime ethers of the formula II, where the substituents have the following meanings: X is oxygen or amino (NH); Y is CH or N; Z is oxygen, sulfur, amino (NH) or-C1-C4-alkylamino (N-alkyl); R' is alkyl, haloalkyl, alkenyl, haloalkenyl, alkynyl, haloalkynyl, cycloalkylmethyl, or unsubstituted or substituted benzyl; (c.1) the oxime ether carboxylate of the formula IIIa, (c.2) the oxime ether carboxamide of the formula IIIb, (c.3) the methoxyacrylate of the formula IIIc, and (d) one or more azole derivatives - 1-[(2RS,4RS;2RS,4SR)-4-bromo-2-(2,4-dichlorophenyl)tetra-hydrofuryl]-1H-1, 2, 4-triazole (IV.1); - 2-(4-chlorophenyl)-3-cyclopropyl-1-(1H-1,2,4-triazol-1-yl)-butan-2-ol (IV.2); - (+)-4-chloro-4-[4-methyl-2-(1H-1,2,4-triazol-1-ylmethyl)-1,3-dioxolan-2-yl)phenyl 4-chlorophenyl ether (IV.3); - (E)-(R,S)-1-(2, 4-dichlorophenyl)-4, 4-dimethyl-2-(1H-1, 2, 4-triazol-1-yl)pent-1-en-3-ol (IV.4); - (Z)-2-(1H-1,2,4-triazol-1-ylmethyl)-2-(4-fluorophenyl)-3-(2-chlorophenyl)oxirane (IV.5); - 4-(4-chlorophenyl)-2-phenyl-2-(1H-1,2,4-triazolylmethyl)-butyronitrile (IV.6); - 3-(2,4-dichlorophenyl)-6-fluoro-2-(1H-1,2,4-triazol-1-yl)quinazolin-4(3H)one (IV.7); - bis(4-fluorophenyl)(methyl)(1H-1,2,4-triazol-1-ylmethyl)-silane (IV.8); - (R,S)-2-(2,4-dichlorophenyl)-1-(1H-1,2,4-triazol-1-yl)-hexan-2-ol (IV.9); - (1RS,5RS;1RS, 5SR)-5-(r-chlorobenzyl)-2, 2-dimethyl-1-(1H-1,2,4-triazol-1-ylmethyl)cyclopentanol (IV.10); - N-propyl-N-[2-(2,4,6-trichlorophenoxy)ethyl]imidazole-1-carboxamide (IV.11); - (+)-1-[2-(2,4-dichlorophenyl)-4-propyl-1,3-dioxolan-2-yl-methyl]-1H-1,2,4-triazole (IV.12); - (R,S)-1-(4-chlorophenyl)-4,4-dimethyl-3-(1H-1,2,4-triazol-1-ylmethyl)pentan-3-ol (IV.13); - (+)-2-(2,4-dichlorophenyl)-3-(1H-1,2,4-triazolyl) propyl 1,1,2,2-tetrafluoroethyl ether (IV.14); - (E)-1-[1-[[4-chloro-2-(trifluoromethyl)phenyl]imino]-2-propoxyethyl]-1H-imidazole (IV.15); - (R,S)-2,4'-difluoro-Α-(1H-1,2,4-triazol-1-ylmethyl)benz-hydryl alcohol (IV.16) and - 2-p-chlorophenyl-2-(1H-1,2,4-triazol-1-ylmethyl)hexano-nitrile (IV.17) in a synergistically active amount.
Patent TW-496909-B (TW)
Title: Method and device for processing leather film of wire
Inventor: JANG CHI-AN
IPC: C23F4/00
Filed: 1997-06-12
Granted: 2002-08-01
Abstract: The present invention provides a method and a device for processing leather film of wire. The purpose of this invention is to reduce the environmental pollution of wire surface treatment using a continuous process method and device thereof. Before forming the leather film of the wire, the wire is rubbed to remove the wire attachments by a rust remove device. There are at least two rub wheels parallel to each other in the rust remove device case. These rub wheels are driven synchronously by transmission members. When the wire sequentially passes through chambers which are in the rubber wheels, the smut, spot or rust on the wire surface can be removed against the small pieces of metal that are stored in the chamber in each rub wheel. The small pieces of metal are environmental pollution free, so as to prevent the process of leather film from polluting the environment and achieve the purpose of continuous process.
Patent TW-362004-B (TW)
Title: Milling apparatus
Inventor: GERSPACHER HELMUT
IPC: A46D1/05
Filed: 1997-06-20
Granted: 1999-06-21
Abstract: A kind of milling apparatus used to mill the bristles and bristle beams of different length to form a rugged surface and have a milling plate for both rotation and twisting motion. There are saliences raised from the operation plane that, in different time interval, the long bristles being contact with the milling plane is longer than the contact time of milling plane, or, at least, is milled at different contact angles.
Patent TW-503240-B (TW)
Title: Prenyl transferase inhibitors
Inventor: KIM SUN H
IPC: A61K31/33
Filed: 1997-06-28
Granted: 2002-09-21
Abstract: A family of compounds capable of inhibiting the activity of prenyl transferases. The compounds are covered by either of the two following formulas. Each of the R groups is defined in the disclosure.
Patent TW-349102-B (TW)
Title: Process for the controlled radical polymerization or copolymerization of (meth)acrylic, vinyl, vinylidene and diene monomers, and (co)polymers obtained
Inventor: SENNINGER THIERRY
IPC: C08F14/00
Filed: 1997-06-28
Granted: 1999-01-01
Abstract: A process for the controlled radical polymerization or copolymerization of (meth)acrylic, vinyl, vinylidene and diene monomers, which is characterized in that at least one of the monomers is polymerized or copolymerized in bulk, solution, emulsion or suspension, at a temperature which may be as low as 0 DEG C, in the presence of at least one radical-generator compound and at least one metal complex catalyst of formula Maa(L)n (M=Cu, Ag or Au; A=Hal, pseudohalogen or carboxylate; L = ligands of M chosen from those of formula (formula) (Y = N or P0; R1, R2, R3, R4, R5 and R6 independently represent hydrogen atom, C1-C10-alkyl, aryl or heteroaryl; Z1, Z2 and Z3 each independently represent one of the following groups (groups).
Patent TW-331016-B (TW)
Title: Laser-aided low temperature etching method
Inventor: SHY MING-CHANG
IPC: H01L21/02
Filed: 1997-07-07
Granted: 1998-05-01
Abstract: A laser-aided low-temperature etching method includes the following steps: Cool a sample to a specific temperature; Put the sample in an environment with specific pressures of chlorine gas and methane; Radiate the sample using a laser pulse with a specific illumination and a specific repeating frequency.
Patent TW-347511-B (TW)
Title: Key board
Inventor: IKEGAMI MASAFUMI
IPC: G06F3/023
Filed: 1997-08-04
Granted: 1998-12-11
Abstract: A key board comprising: a key top (250) having first guide pieces (251) and second guide pieces (252) installed thereon; a key frame (210) installed in opposing facing relation to the key top (250) with the guide pieces formed therebetween; an actuation rubber sheet (242) having an actuation rubber (240) arranged integrally thereon to transmit upward and downward actuating movement of the key top (250) to a switching part (260); a movable contact (261) and a fixed contact (264) respectively disposed on opposite sides of the switching part (260) and being contactable with each other through the switching part (260) by movement of the actuation rubber (240); and a link plate (220) disposed between the key top (250) and the key frame (210), and having a connecting plate (230) integrally and movably connecting a first link part (221) to a second link part (222) thereof.
Patent TW-345615-B (TW)
Title: Diffractive grating rotary optical encoder with high tolerance to grating defects and misalignment
Inventor: LII SHYH-GUANG
IPC: G01B11/02
Filed: 1997-11-08
Granted: 1998-11-21
Abstract: A diffractive grating rotary optical encoder with high tolerance to grating defects and misalignment, having a unique structural design described in the embodiments of the invention; two light beams being incident in two different directions on an identical light point on the diffractive grating or forming two light points on the grating using a minute shifting of the light source, the angles between the two incident directions and the normal direction of the grating plane separately being approximately equal to the positive/negative first step diffraction angles of the grating; when inference stripes are formed by the diffraction beams generated by the incident lights on the diffraction grating, the conversion of photoelectrical signals of the system being used to obtain the displacement of the diffractive grating; the assembly components comprising: a diffractive grating attached to a moving article and having a relative motion with the incident light point as the measurement ruler of displacement; a measurement light beam sub-system generating first and second light beams and directly impinging on the diffractive grating thereby generating a diffractive light; a set of Fourier transform optical sub-system located on a common light path of the positive/negative first step diffractive light generated by the diffractive grating; a set of signal receiving optical sub-system for detecting the inference light signals generated by the secondary diffraction light of the diffractive grating.
Patent TW-503112-B (TW)
Title: Skin care compositions containing combinations of compounds for mimicking the effect on skin of retinoic acid
Inventor: GRANGER STEWART PATON
IPC: A61Q19/00
Filed: 1997-12-16
Granted: 2002-09-21
Abstract: Compounds which sufficiently inhibit LRAT or ARAT catalyzed esterification of retinol into inactive retinyl esters, have the same effect on keratinocytes as retinoic acid. Thus, effects of retinol or retinyl esters in combination with these compounds are analogous to treatment with retinoic acid.
Patent TW-404001-B (TW)
Title: Method for manufacturing shallow trench isolation by high-density plasma chemical gas-phase deposition technique
Inventor: JANG SHIUN-MING
IPC: H01L21/76
Filed: 1998-03-10
Granted: 2000-09-01
Abstract: Recently, the manufacturing process of shallow trench isolation region has been considered as important semiconductor manufacturing technique. Conventionally, it utilizes the chemical vapor-phase deposition (CVD) process to form a dielectrics to fill-in the trench in the substrate. However, as the density of the integrated circuit is increasing continuously and the size of device is gradually decreased, the above-mentioned deposition technique could not fill up easily the trench, which causes the isolation effect of the device being influenced. In order to eliminate the above-mentioned problem, a high-density plasma chemical vapor-phase deposition (HDPCVD) technique is provided, which is mainly to use O2 and SiH4 as the reactant to deposit the dielectrics. Meanwhile, Ar plasma is used to sputter and remove the overhang portion on the dielectrics layer of the upper-half portion of the trench sidewall, which could efficiently improve the effect of the dielectrics filling-in the trench. However, the Ar plasma sputtering in the high-density plasma chemical vapor-phase deposition (HDPCVD) process causes easily the damage and the pollution of the metal impurities on the sidewall of the trench, which brings new problem of the device performance. Therefore, this invention provides an improved manufacturing method of the shallow isolation region. Before applying the high-density plasma chemical vapor-phase deposition (HDPCVD) process, a low pressure chemical vapor-phase deposition (LPCVD) process is used to form a tetra-ethyl-ortho-silicate oxide layer (TEOS), or the sub-atmospheric pressure chemical vapor-phase deposition (SACVD) process is used to form a ozone-tetra-ethyl-ortho-silicate oxide layer (O3-TEOS) covering on the surface of the trench as the bottom layer. Thus, it does not only maintain the excellent trench fill-in result of the high-density plasma chemical vapor-phase deposition (HDPCVD) process but also further avoid the damage and the pollution of the metal impurities on the sidewall of the trench.