baber/WOPTO huggingface dataset:
Patent JP-S5214439-A (JP)
Title: Error eliminating circuit of detector using supersonic wave
Inventor: YAMAMOTO EIJI
IPC: G01S7/536
Filed: 1975-07-24
Abstract: PURPOSE: To prevent error information of a car in a parking lot by using two circuits, one of which detects the absence of the periodic reflexing supersonic wave signal from a stationary substance, and another receives the reflexing wave from the car. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-H11286080-A (JP)
Title: Synthetic resin molding with antibacterial properties
Inventor: KURAMOTO NAOHIKO
IPC: B32B27/18
Filed: 1998-04-02
Abstract: PROBLEM TO BE SOLVED: To continue surface antibacterial properties of a solid substance and to lesson scratchability of a surface by bringing a synthetic resin film obtained by blending an inorganic antibacterial agent with a spherical anti-blocking agent having a larger mean particle size than that of the antibacterial agent into close contact with the surface of the substance. SOLUTION: A synthetic resin film obtained by blending an inorganic antibacterial agent with a spherical anti-blocking agent having a larger mean particle size than that of the antibacterial agent is brought into close contact with a surface of a solid substance. As the anti-blocking agent, a spherical inorganic oxide or an organic polymer substance is used. Here, the spherical means a shape which has no sharp protrusion. An adding amount of the anti-blocking agent is, for example, 0.05 to 10 wt.%. Its particle size is about 1.05 times or more as large as a mean particle size of the antibacterial agent to be simultaneously blended or about 30 μm at the maximum. Thus, particularly, its antibacterial properties or a mildewproofing ability are excellent. Its surface is scarcely damaged.  Its external appearance is excellent and an antibacterial effectiveness can be continued for a long period.
Patent JP-S5355976-A (JP)
Title: Peripheral unit for semicnductor device
Inventor: SATOU YUTAKA
IPC: H01L23/04
Filed: 1977-07-28
Abstract: PURPOSE: To obtain a peripheral unit for a semiconductor device which excels in flatness and parallel property by reducing extremely the deformation caused by sintering, by slanting one side surface of the flange part and making flat other side surfaces. 
     COPYRIGHT: (C)1978,JPO&Japio
Patent JP-S5213677-A (JP)
Title: Lead line connector
Inventor: KAWASAKI ISAMU
IPC: H01R43/048
Filed: 1975-07-23
Abstract: PURPOSE: The works of arranging and twisting the core wire of more than one lead line, the injection of the molten resin to the tightly pressed terminals, the travelling of the terminals and the work of the collapsing pressure are automatically performed to economize the labor. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-H08289260-A (JP)
Title: Phase reference detector
Inventor: ITO HISAKATSU
IPC: H04N7/015
Filed: 1995-04-14
Abstract: PURPOSE: To provide a phase reference detector capable of surely detecting phase reference and without affecting on a reproduced decoded image even when fluctuation, a noise or waveform distortion occurs in an identification control signal separated from an EDTV-2 signal due to an unknown cause. CONSTITUTION: This detector is equipped with an LPF A12 which applies the band limitation of the identification control signal to a horizontal low-pass area, an IPF A14 which performs the horizontal interpolation of the output of the LPF A12, and a first edge detector which detects an edge from the output of the LPF A12, and also, it is equipped with a second edge detector A15 which detects the edge from the output of the IPF A14, a stabilization judging device A17 which judges stabilization for each detected result of the first and second edge detectors A13, A15, and a selector A16 which inputs the output of the first and second edge detectors A13, A15 and derives the output with higher stability selectively based on the judged result of the stability judging device A17. The output of the selector A16 is outputted as a phase reference signal.
Patent JP-H11287767-A (JP)
Title: Method for analyzing blemish in film
Inventor: HOSOI MASAHIRO
IPC: G01N21/88
Filed: 1998-04-02
Abstract: PROBLEM TO BE SOLVED: To rapidly detect and measure a foreign object being generated in a solution and to easily analyze the blemish of a solvent-cast film by observing the reflection of rays due to the foreign object in the solution from a direction on a surface at a specific angle to a projection direction for obtaining the image of the foreign object. SOLUTION: Projection beams 3 of a light source 2 are projected to a solution 1 to be measured, and reflection beams due to each kind of foreign object in the solution 1 is observed by a foreign object detection device 7 from a direction on a surface at 90 deg.±15 deg. in a projection direction. An appearance frequency and a size are analyzed and measured from the obtained images of the foreign objects. More specifically, by visually counting the number of foreign objects (illuminating points) in the projected beams 3, the amount of foreign objects can be recognized semi- quantitatively. Further, by inputting digital data that are obtained by A/D-converting an image through a digital camera or the like into an image analysis device for image processing and analysis, the size and the number of the foreign objects can be measured.  In this case, the maximum length of the foreign object that becomes a problem in terms of the blemish in film quality is approximately 20 μm or more and the minimum length is determined by performance such as the magnification of a microscope and a telescope.
Patent JP-S5213798-A (JP)
Title: Display use cell
Inventor: MIYAZAWA KANAME
IPC: G02F1/153
Filed: 1975-07-23
Abstract: PURPOSE: In order to obtain a display cell which provides the function of reflecting plate on a counter reference electrode and so on through cubically forming the display-use electrode and so on the identical substrate. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-S61249089-A (JP)
Inventor: SAKAMOTO NOBUAKI
IPC: G09G5/20
Filed: 1985-04-26
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H0364768-A (JP)
Title: Motion detector based on field
Inventor: TOOMASU SHII FUERUDAA
IPC: G03G9/13
Filed: 1990-04-04
Abstract: PURPOSE: To improve the flowability, electrostatic chargeability, shearing viscosity and image quality by incorporating thermoplastic resin particles and an ionic or amphoteric electric charge inducing compd., optionally together with a colorant and an auxiliary, into a nonpolar liq. having a specified kauri-butanol value. CONSTITUTION: A liq. electrostatic developer is composed essentially of a nonpolar liq. having a kauri-butanol value of <30, thermoplastic resin particles dispersed in the nonpolar liq. and an ionic or amphoteric electric charge inducing compd. The thermoplastic resin contains a PE homopolymer or a copolymer of PE with 0.1-20wt.% (meth) acrylic acid or its alkyl ester and a vinyl toluene- styrene or butadiene-acrylate random copolymer. Improved flowability, electrostatic chargeability, shearing viscosity and image quality are ensured.
Patent JP-S60234916-A (JP)
Title: Manufacture of stainless steel containing low nitrogen
Inventor: YAMAUCHI TAKASHI
IPC: C21C5/28
Filed: 1984-05-08
Abstract: PURPOSE:To obtain efficiently stainless steel contg. low nitrogen while preventing the adsorption of nitrogen by recarburizing the molten iron for Cr-contg. stainless steel in a bottom-blown converter and decarburizing it, thereaftaer feeding MgCO3 at the time of taking out the steel to a ladle and subjecting it to vacuum decarburization treatment. CONSTITUTION:Molten iron contg. >=10% Cr is recarburized in a converter provided with a bottom-blown tuyere so that the concn. of carbon is reached to >=4%. Then the flux consisting essentially of CaO and CaF2 is charged and the molten iron is bottom-blown with gaseous Ar or the like, decarburized and denitrified with the blowing of top-blown oxygen, thereafter the steel is taken out in a ladle. At this unloading of the steel, MgCO3 substance is fed in the ladle to generate gaseous CO2 and thereafter vacuum decarburization treatment is performed. In this process, since the steel is denitrified in a converter refining process and thereafter the steel is taken out while preventing the adsorption of nitrogen, the refining load can be decreased and the stainless steel contg. low nitrogen can be manufactured.
Patent JP-H04321228-A (JP)
Title: Manufacture of semiconductor device
Inventor: MURANAKA TERUKAZU
IPC: H01L21/316
Filed: 1991-04-22
Abstract: PURPOSE:To reduce a state that the film thickness at the end part of a gate oxide film formed on an element region for a semiconductor device becomes thin by a method wherein the film thickness of a second oxide film is made thinner than that of a first field oxide film. CONSTITUTION:A thermal oxide film is formed; a first field oxide film 111 having a film thickness of about 8000Angstrom  is formed selectively. At this time, a silicon nitride film 104 whose film thickness is thicker is used as an oxidation- resistant film to the first field oxide film. In succession, the silicon nitride film 104 and a polycrystalline silicon film 103 are retreated; the size of the pattern for the oxidation-resistant film is made small. In succession, a silicon nitride film 106 whose film thickness is thinner is used as an oxidation-resistant film to a second field oxide film, and the second field oxide film 112 having a film thickness of about 4000Angstrom  is formed. At this time, the time for oxidation is shortened to about 80 minutes as compared with a case where the first field oxide film is formed, and other conditions are set to be the same.
Patent JP-S63255201-A (JP)
Title: Method for fixing plant in transparent state
Inventor: YAMADA SHOGO
IPC: B44C5/06
Filed: 1987-04-13
Abstract: PURPOSE:To fix a plant useful for the production of a preparation, etc., keeping the natural form and color of the plant in beautiful appearance with transparent feeling, using a simple process and short treatment time, by filling a clearing medium into a plant, making the plant to absorb a specific monomer and curing the monomer. CONSTITUTION:A plant is dehydrated by immersing in an organic solvent to promote the impregnation of a clearing medium. The treated plant is filled with a clearing medium having a refractive index of 1.4-1.7, a boiling point of >=150 deg.C and excellent impregnation property to a plant and compatible with cyanoacrylate monomers, e.g. phthalic acid ester, dibasic acid ester, glycol ester and fatty acid ester. A cyanoacrylate monomer is absorbed in the plant, polymerized and cured to fix the plant in transparent state. The fixed plant is useful as ornaments, etc. When the plant is decolored by using a pigment- dissolving solvent (e.g. methanol and dimethylformamide) or a bleaching agent before the clearing treatment, a colorless glassy transparent product useful as a unique ornament can be produced.
Patent JP-S61244632-A (JP)
Inventor: PEETAA SHIEEFUAA
IPC: B60K37/00
Filed: 1986-04-21
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H02268010-A (JP)
Title: Constant current circuit using mos transistor
Inventor: SAKURAGI KOSEI
IPC: H01L27/092
Filed: 1989-04-10
Abstract: PURPOSE:To obtain a stable setting current by devising the circuit such that a threshold level voltage of a transistor(TR) used by a constant current circuit as a reference is designed so as not to changed largely depending on temperature, bias condition of the TR or process change of manufacturing the TR or the like. CONSTITUTION:Same ratio of length L to width W is provided to P-channel MOS TRs 2, 3, which constitute a current mirror circuit causing the same drain current to flow. Moreover, the ratio of L/w of an N-channel MOS TR 4 is set different from that of an N-channel MOS TR 5. Then the drain current in the saturation region is expressed in equations I, II, where VGS4, VGS5 are gate-source voltages of the TRs 4, 5 and Vt is a threshold voltage. Furthermore, the drain current of the TRs 4, 5 is made the same and the electric circuit almost without being affected by the power voltage, the bias condition of the TRs, the change in the manufacture process and temperature is obtained with a few element number and an integrated circuit with excellent current consumption, circuit operation and stability of performance is obtained.
Patent JP-S5519317-A (JP)
Title: Underdrain joint
Inventor: YOSHIDA KUNIO
IPC: E02B9/06
Filed: 1978-07-24
Abstract: PURPOSE: The invention provides an underdrain capable of absorbing much of uneven settlement at a very little displacement resistance while holding perfect water-tightness, under condition of large differential water pressure between outside and inside of underdrain, and large water pressure.  
     CONSTITUTION: When ground pressure is applied to the periphery of the joint, outer cylinder pressure-withstand member 7-1, 7-2 directly support ground pressure, allowing its load to be transmitted to the concrete blocks 1,1'. Meanwhile, external water pressure such as underground water is transmitted through the gap f between the withstand member 7-1, 7-2 and force is applied to flexible member 4 located all over inside the member 7-1, 7-2. The flexible member 4 is supported by the continuous withstand member 6 that covers all over the inner area of the member 4, and the force is transmitted through connecting member 2,2' by anchor bolts to the concrete blocks 1,1' to be stopped. When internal water pressure is higher than external, the flexible member 4 receives force from the inside through the gap e between the withstand member 6, and its force is supported by the member 7-1, 7-2 that covers all outer area of the flexible member 4 and transmitted to the concrete 1,1' to be stopped. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-H04321226-A (JP)
Title: Wafer manufacturing apparatus
Inventor: KUBO RYUJI
IPC: B28D5/00
Filed: 1991-04-22
Abstract: PURPOSE:To further enhance the degree of smoothness on the edge of an ingot by a method wherein a means to turn the ingot performs a grinding operation according to an in-feed system in conjunction with a means to turn an abrasive wheel. CONSTITUTION:An ingot 1 is turned to the direction of B by a rotation means connected to an ingot fixation part 2. A blade 4 is attached to the upper part of a hollow spindle 3 provided at the lower part of the ingot fixation part 2. The blade 4 is provided, at its inside, with a blade 4a used to slice the ingot. The blade 4 is turned at high speed as the hollow spindle 3 is turned. A cup abrasive wheel 6 is fixed to the upper part of a holding shaft arranged in the central part of the hollow spindle 3. A rotation means is connected to the holding shaft; the holding shaft 5 and the cup abrasive wheel 6 which is fixed to the holding shaft are turned to the direction of C by the rotation means. Thereby, the tip face 1b of the ingot 1 is grounded.
Patent JP-S63259305-A (JP)
Inventor: YAMAMOTO KAZUYOSHI
IPC: F22B37/42
Filed: 1987-04-13
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S57206040-A (JP)
Title: Wire bonding method
Inventor: UEHARA KOUICHI
IPC: H01L21/60
Filed: 1981-06-12
Abstract: PURPOSE:To obtain high bonding accuracy by setting a plurality of bonding regions with respect to a substrate having a broad bonding area, rotating a rotary table for said bonding regions, and sequentially performing bonding in said regions. CONSTITUTION:The bonding regions 1A-1D are set by dividing the bonding area into four parts. When the substrate 1 is sent to the rotary table 4 from a loader magazine 2 and positioned, the bonding region 1A is placed at the bonding position of a bonding device 5. A bonding head 9 is driven in the X and Y directions by an XY driving device 6. The bonding is performed in a bonding region 1A of the positioned substrate by a capillary 7. When the bonding is finished, a motor 18 is driven based on the finish signal and the rotary table is rotated by 90 deg.. The bonding region 1B is placed at the bonding positions. Then the bonding is performed in the same way.
Patent JP-S59218164-A (JP)
Inventor: MASAKI KAZUMI
IPC: A61N2/00
Filed: 1983-05-25
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S57204641-A (JP)
Title: Phase synchronizing oscillating circuit
Inventor: MUTOU HIROSHI
IPC: H03L7/00
Filed: 1981-06-11
Abstract: PURPOSE:To increase the reliability of the titled oscillating circuit in case it has a double structure and to ensure the smooth switching between the using and spare circuits, by controlling the two voltage control oscillators based on the difference of phase between the output and input signals as well as the difference of phase between the output signals of both oscillators. CONSTITUTION:A selecting circuit 60 usually selects the output of a voltage control oscillator 4. In this case, a switch circuit 52 functions to apply the output signl of a phase comparator 51 to a voltage adder 20. A voltage adder 2 transmits the output signal of a phase comparator 1 directly to a low pass filter 3. The 1st loop comprising the comparator 1, the adder 2 and the oscillator 4 performs the normal oscillation which synchronizes with the signal applied to a terminal 100. While the 2nd loop comprising a phase comparator 10, the adder 20 and a voltage control oscillator 40 performs the oscillation synchronizing with the oscillator 4. Thus on jump of phase is caused although the circuit 60 is switched when a fault occurs.
Patent JP-H08286817-A (JP)
Title: Coordinate input device
Inventor: TOKIOKA MASAKI
IPC: G06F3/043
Filed: 1995-04-17
Abstract: PURPOSE: To stably input a coordinate with high accuracy by generating a gate signal based on a difference between a base signal and a reference signal each having the same period but the deviated phase to each other and measuring a vibration speed for the gate signal so as to detect a coordinate. CONSTITUTION: An elastic wave vibration from a vibration entry pen entered on a vibration delivery board is detected by a vibration sensor 6, amplified by a preamplifier circuit 51, an envelope generating circuit 52 extracts only an envelope of a signal waveform and given to a gate signal generating circuit 60 as a base signal via a delay circuit 61. Simultaneously the envelope signal is attenuated at a reference level generating circuit 62 by a prescribed attenuation factor and a prescribed offset voltage is added to the attenuated signal and the result is converted into a reference level signal and it is given to the gate signal generating circuit 60. The gate signal generating circuit 60 and a monostable multivibrator 57 process a difference between the base signal and the reference level signal to generate a gate signal.  Then the vibration speed is measured for the period of the gate signal to detect a coordinate of the vibration entry pen.
Patent JP-S62247243-A (JP)
Title: Medium material for electrophoresis
Inventor: SUGIMOTO NAOHIKO
IPC: G01N27/447
Filed: 1986-04-19
Abstract: PURPOSE:To obtain a polyacrylamide gel film-based electrophoretic medium material using a resin film as the support with the resolution equal to or more than that of the electrophoretic medium material produced using a glass plate as the support, by providing a resin intermediate layer made of a resin material having the oxygen transmission coefficient lower than the support material between a medium layer for electrophoresis and a support layer. CONSTITUTION:A medium material for electrophoresis which includes a medium layer for electrophoresis made of a polyacrylamide-based water gel produced by crosslinked polymerization of an acrylamide-based compound and a cross linking agent in the presence of water and a resin support is provided with a resin intermediate layer made of a resin material with the oxygen transmission coefficient lower than the support material between the medium layer for electrophoresis and the support layer. The resin intermediate layer is preferably made of a resin material with the oxygen transmission of below 15cc/m<2>.atm per day in the form of a film made at a thickness of 20mum. The resin material herein applicable is a vinylidene-vinylchloride copolymer, polyvinyl alcohol or the like.
Patent JP-S61250473-A (JP)
Inventor: YANO MIKIO
IPC: F25B49/00
Filed: 1985-04-26
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H02270282-A (JP)
Title: Plane-type heating apparatus
Inventor: OOKAMITO YASUNARI
IPC: H05B3/00
Filed: 1989-04-12
Abstract: PURPOSE:To correct the temperature of the surface of a cover to be constant automatically by correcting a main temperature set value of a main temperature setting means so as to make the temperature of the surface of a cover based on the Metsuke of the cover. CONSTITUTION:In the case that a plane-type heating apparatus main body is covered with a cover, the main temperature set value which is set by a main temperature setting means 13 based on the room temperature detected by a room temperature detecting means 14 is corrected by a set temperature correcting means 15 and the temperature of the surface of the cover is controlled to be constant. The period since the starting of electric conduction to the heater until a heater temperature detecting means 12 detects that the temperature of the heater reaches the temperature corrected by the set temperature correcting means 15 is measured by a timer 16. The measured time of the timer is sent to a set temperature cover correcting means 17 and the Metsuke of the cover is determined based on the measured value by the timer and the main temperature set value is re-corrected based on the Metsuke. By this method, the temperature of the surface of the cover is controlled to be constant independently of the Metsuke of the cover.
Patent JP-H10286702-A (JP)
Title: Throwaway type cutting tip made of surface coating thermet having hard coating layer excellent in defect resistance
Inventor: FUJISAWA TAKASHI
IPC: C23C14/06
Filed: 1997-04-09
Abstract: PROBLEM TO BE SOLVED: To improve the defect resistance of a hard coating layer by including a specific wt.% of Co and/or Ni, and adjusting the hardness of each part of a thermet base, and the thickness of the hard coating layer of the surface after the sintering, within the specific ranges. SOLUTION: When a thermet base is sintered, a content of Co and/or Ni as a binder phase component, is adjusted to be 0.5-6.5 wt.%. The cooling atmosphere is 1-5 Torr nitrogen atmosphere in the sintering conditions. Whereby the thermet base after the sintering, has 1600-2000 Hv, and a cutting ridge part has the maximum hardness of 3000-3400 Hv. On the other hand, a surface hardened layer having 2200-2600 Hv of the maximum surface hardness, is formed on a flank and a cutting face. A hard coating layer of 1-20 μm of average layer thickness, is deposited on a surface of a titanium carbon nitride thermet base by physical evaporation method or chemical evaporation method. Whereby the hard coating layer is provided with the high defect resistance.