baber/WOPTO huggingface dataset:
Patent TW-393588-B (TW)
Title: Stereoscopic projection film frame  and masking rate guiding device
Inventor: INABA MINORU
IPC: G03B21/64
Filed: 1996-03-09
Granted: 2000-06-11
Abstract: This invention provides stereoscopic projection film frame and masking rate guiding device. A base frame and a covering frame will assist operation and calibration. A window is equipped on the base frame, which can match up to the projection film screen. Locating pins are installed onto four window corners, matching with the predetermined perforations of projection film. Holes fitting to the locating pins of the base frame are provided on the covering frame such that it can be placed on the base frame. The covering frame has plural windows that can have the same width as the window of the base frame or a width reduced stepwise. Covering frame size is selected to fit the base frame so the masked area of the stereoscopic projection film can be adjusted. A collimation pattern is set on same position on left and right of the plural windows. A masking rate guiding device is equipped with plural collimation patterns in the same positions as the colimation patterns of the said plural windows. The focal point adjustment of the masking rate guiding device and the alignment of the collimation pattern of the window in the selected covering frame with the collimation pattern of the masking rate guiding device will facilitate a precise adjustment effect of the film's masking rate.
Patent TW-414783-B (TW)
Title: Advanced oxidation of water using catalytic ozonation
Inventor: ARMOR JOHN NELSON
IPC: C02F1/72
Filed: 1996-04-19
Granted: 2000-12-11
Abstract: Contaminants are removed from waste water (1) by an advanced oxidation process in which the waste water is contacted (7) with ozone (8) in the absence of a catalyst to oxidize-ozone-oxidizable contaminants and to dissolve ozone in the water, and the resultant ozone-containing water (3) is contacted with a solid ozone activating catalyst (5) to oxidize ozone refractory contaminants in the water. Effluent catalyst is an undoped monolithic structure of gamma alumina having low surface area, high porosity and low pressure drop. (6) from the catalyst treatment (5) can be contacted (7) with ozone and recycled (2) for further contact with the catalyst (5). The preferred catalyst is an undoped monolithic structure of gamma alumina having low surface area, high porosity and low pressure drop.
Patent TW-412535-B (TW)
Title: Anellated <beta>-carboline
Inventor: SEIDELMANN DIETER
IPC: C07D471/04
Filed: 1996-07-03
Granted: 2000-11-21
Abstract: Compounds of formula I, and their pharmeaceutically acceptable salts, in which R3 means formula II or formula III, R4 means hydrogen, C1-6 alkyl, C1-4 alkoxy-C1-2 alkyl. A represents a pyrazine, oxazole, thiazole, imidazole, pyrrole or benzol, and the ring can be substituted with R5 and R6, and R5 and R6 are the same or different and mean hydrogen, C1-6 alkyl optionally substituted with 1 to 2 hydroxy, C1-4 alkoxy-C1-2 alkyl, phenyl optionally substituted singly with halogen, C1-4 alkyl, or C1-4 alkoxyl, formula IV, or R5 and R6 together mean a -(CH2)n group and R1 means C1-6 alkoxy, R2 means C1-4 alkyl or C1-4 alkoxy-C1-2 alkyl, n means 3 or 4, R7 means hydrogen, R8 means hydrogen, C1-6 alkyl or C1-4 alkylcarbonyl.
Patent TW-328657-B (TW)
Title: Mechanism for component assembly and apparatus assembly
Inventor: HIRONO TETSUO
IPC: H01R13/631
Filed: 1996-07-22
Granted: 1998-03-21
Abstract: A kind of component assembly mechanism employs the first and second connectors and has the following parts: (a) the first component, which has the first connector and the guide pin with thick body part and thin body part (b) the second component, which has the second connector connecting to the first connector and the guide which leads the guide pin for the positioning of the first and the second connector (c) the frame, for installation of the first and the second components
Patent TW-366552-B (TW)
Title: Method of manufacturing DRAM capacitor components
Inventor: CHEN KUN-ZHUO
IPC: H01L21/70
Filed: 1996-08-06
Granted: 1999-08-11
Abstract: Method of manufacturing DRAM capacitor components by using the self-alignment technology to overcome the troubles caused by inaccurate alignment in the manufacturing process so as to increase the electrical capacity of the capacitor component by increasing the surface space of the electrode as a compact side to meet the design rule, including the manufacturing method the following steps: presentation of a silicon substrate having on it a transistor formed, including gate electrode, source/drain and an oxide area; forming a first insulation layer on the chip with etching for forming a contact opening protruding the substrate surface of the contact window and the first insulation layer; forming a second insulation layer on said first conductive layer, coating a photoresist layer on said second insulation layer before defining said second insulation layer using the know optic microfilm and etching technology, preserving the area above the contact window as mask for continuous etching for said first conductor layer; forming a third insulation layer on said first conductor layer and the second insulation layer on the contact window contacting the same; non-equivalent direction etching said third insulation layer for forming a sidewall spacing layer on said second insulation layer; using said second insulation layer on said contact window and said sidewall gap as mask for etching said conductor layer; removal of said second insulation layer; using said sidewall gap as mask for etching the surface of said first conductor layer, for forming a bump structure, for self-alignment with the edge of said sidewall gap layer, for the lower-level electrode of the capacitor; removal of said sidewall gap layer; forming a dielectric layer on said lower-level electrode and forming a second conductor layer on said dielectric layer, for upper-level electrode of the capacitor, thus accomplishing the making of the DRAM cell.
Patent TW-496913-B (TW)
Title: Process and apparatus for the preparation of single crystals
Inventor: TOMZIG ERIC DR
IPC: C30B15/00
Filed: 1996-08-07
Granted: 2002-08-01
Abstract: The invention relates to a process for the preparation of a single crystal from semiconductor material by the Czochralski method. It is distinguished by the fact that the melt is subjected to the influence of a magnetic field during the crystal growth and the magnetic field is generated by superposing a static magnetic field and an alternating magnetic field. The invention also relates to an apparatus for carrying out the process, having a magnetic means which comprises at least two coils which are arranged around a crucible, one coil generating a static magnetic field and the other coil an alternating magnetic field.
Patent TW-422938-B (TW)
Title: Low metals perfluorooctanoic acid and top anti-reflective coatings for photoresists
Inventor: RAHMAN M DALIL
IPC: G03F7/09
Filed: 1996-08-30
Granted: 2001-02-21
Abstract: The present invention provides methods for producing top anti-reflective coating compositions having a very low level of metal ions, utilizing a specially washed and modified ion exchange resin. A method is also provided for producing semiconductor devices using such ion exchange treated top anti-reflective coating compositions.
Patent TW-319878-B (TW)
IPC: H01H67/22
Filed: 1996-10-03
Granted: 1997-11-11
Abstract: A multiple relay arrangement comprises a common fixed part having permanent magnets, a common movable part having permanent magnets, and fixed coils having magnetically actuable movable cores connected to a respective contact means. To establish an electrical contact through the coupling means of the multiple relay arrangement, current is passed through the coil in one direction and through the remaining coils in the opposite direction. In the contact making state, the core will be repelled by the permanent magnet on the fixed part and attracted by the permanent magnet on the movable part. The coupling means connected to the core can then be used to connect together telecommunications conductors for instance. Remaining cores are attracted by the fixed permanent magnets and not moved, although the movable part will be moved away from the fixed part by virtue of the repulsion force acting between the cores and the magnets.
Patent TW-338223-B (TW)
Title: Data processor and the parts allocation method the invention relates to a parts allocation method in a base plate of a data processing device
Inventor: SUZUKI SHINICHI
IPC: G06F1/18
Filed: 1996-11-23
Granted: 1998-08-11
Abstract: A parts allocation method featuring the installation of the key parts of a plurality of processors in a frame forming a data processor featuring: arrangement in a line of the components of the processor and the first row of the key base plate and the I/O interface expansion board with its expansion slot as well as the memory board connector in the memory in relevant area of the plurality of processors in the other side of the first row and the expansion slot and said memory plate connector in a direction adjusted along the long side in parallel to the first row, with the expansion slot and the memory board connector^s long side being extended and in the allocation area of the expansion plate slot and the memory connector as well as the allocation area of the processor components in adjacency with te processor bus bars of the processor components for connection and the expansion boad I/O interface connection I/O bus bar agreement LSI for conversion and the memory access controller in the memory.
Patent TW-326124-B (TW)
Title: Heat-shrinkable jacket for EMI shielding
Inventor: WEN-SHIAN V TZENG
IPC: H01B9/02
Filed: 1997-01-30
Granted: 1998-02-01
Abstract: A heat-shrinkable electromagnetic interference (EMI) shielding jacket sheathable over a generally elongated object of a given outer diameter extent, the jacket comprising: a tubular outer member of an indefinite length and an expanded inner diameter which is greater than the outer diameter of the object, in which the outer member is heat-shrinkable to a contracted inner diameter smaller than the expanded inner diameter for substantially conforming the jacket to the outer diametric extent of the object; an electrically-conductive inner member received coaxially within the outer member and extending coextensive therewith; and a generally continuous, thermoplastic interlayer interposed between the outer and inner members and extending coextensive therewith, in which the interlayer bonds the inner member to the outer member along substantially the entire length thereof for consolidating the jacket into an integral structure.
Patent TW-327664-B (TW)
Title: Lint implanting method for circular fabric webbing
Inventor: PERNG JYI-BEEN
IPC: D06C11/00
Filed: 1997-02-19
Granted: 1998-03-01
Abstract: A kind of method for lint implanting for circular fabric webbing which is to lead the circular fabric webbing to be implanted into a bond storing tank that it can be equably bonded with a layer of bond. Then, the webbing is led into the first lint tank which has lint and electric net in it. The net is connected to a static electric generator. The link is implanted into the bond on the fabric webbing by static electricity method through the electric net. Then the webbing goes through a kneading device which comprises at least two laths in parallel and moving reciprocally so that the lint can be pressed into the bond and the webbing can be kneaded more circular. But after the pressing and kneading, there will be some voids on the lint webbing so that it will be led into the second lint tank and proceeded the static electric lint implanting process as the first lint tank to fill the voids. Finally, the webbing is led through a drier to be formed and the circular lint webbing with smooth and beautiful appearance is produced.
Patent TW-341587-B (TW)
Title: Process for the preparation of polymeric mixtures based on EP(D)M elastomer copolymers
Inventor: TIZIANO TANAGLIA
IPC: C08L23/00
Filed: 1997-04-03
Granted: 1998-10-01
Abstract: A process of at least two steps for the preparation in suspension of a mixture of ethylene-propylene (EPM) elastomer copolymers or a mixture of ethylene-propylene-diene (EPDM) elastomer terpolymers comprising the steps of: a) polymerizing in a first step monomers for the first step in the presence of a catalyst of Vanadium, a cocatalyst and optionally an activator to a conversion degree of at least 1,000 grams of polymer per gram of Vanadium; in which the catalyst of Vanadium is consists essentially of a compound of Vanadium or a compound of Vanadium supported on an inert carrier; in which the cocatalyst consists essentially of an Aluminum alkyl having the formula; Rn- AlXm, where R is a C1 -C20 alkyl radical, X is a halogen, m+n=3, m is an integer from 0 to 2; and in which the molar ratio of cocatalyst/Vanadium is from 5 to 500; and obtaining a polymer suspension in a liquid phase; b) admixing with the polymer suspension obtained in step (a) monomers for step (b) and polymerizing the monomers for step (b) in a second or subsequent steps together with further activator in order to have a molar ratio between activator, sum of the optional activator of step (a) and the activator of step (b), and Vanadium of from 4 to 50; and with further cocatalyst so as to have a ratio between the cocatalyst of step (b) and Vanadium of step (a) of from 5 to 500; in which a polymerization reaction is continued up to a conversion of at least 3000 grams of polymer per gram of catalyst.
Patent TW-374934-B (TW)
Title: A cable and a cable jacket comprising a polyethylene composition
Inventor: KALE LAWRENCE T
IPC: C08L23/08
Filed: 1997-04-09
Granted: 1999-11-21
Abstract: The present invention discloses a cable comprising a layer of a polyethylene composition characterized in that the polyethylene composition comprises: (A) from 5% to 95% by weight of the total composition of at least one first polymer which is an ethylene/alpha-olefin interpolymer having: (i) a density from 0.865 g/cm<SP>3</SP> to 0.95 g/cm<SP>3</SP>, (ii) a molecular weight distribution (Mw/Mn) from 1.8 to 3.5, (iii) a melt index (I2) from 0.001 g/10 min to 10 g/10 min, and (iv) a CBDI greater than 50%, (B) from 5% to 95% by weight of the total composition of at least one second polymer which is a heterogeneously branched ethylene polymer or homogeneously branched ethylene homopolymer having a density from 0.9 g/cm<SP>3</SP> to 0.965 g/cm<SP>3</SP>. The cable of the present invention has superior mechanical properties and processability relative to conventional cable using current polymers such as low density polyethylene (LDPE), linear low density polyethylene (LLDPE), and polyvinylchloride (PVC).
Patent TW-339462-B (TW)
Title: Vertical sidewall nitride etch process
Inventor: MING YE
IPC: H01L27/108
Filed: 1997-04-15
Granted: 1998-09-01
Abstract: A sort of method of manufacture of IC devices, having the following steps: a) formation of the conductor structure by means of the top silica nitride layer on the semiconductor substrate and the silicaa diode sidewall; b) settlement of a silica nitride insulation layer on the substrate, the sidewall and the surface of the conductor structure; and c) etching the silica nitride layer for formation of the opening from the silica nitride to the surface of the semiconductor substrate, without forming circular shoulders on the silica nitride covering the sidewall of the conductor.
Patent TW-340148-B (TW)
Title: System and method for measuring crimp characteristics of fibers in a moving crimped tow
Inventor: YEJIA WU
IPC: G01N21/89
Filed: 1997-04-15
Granted: 1998-09-11
Abstract: A system for measuring crimp characteristics of fibers in a moving crimped tow, having: a processor with relevant and stored programs; lighting device, disposed above the moving crimped tow for illumination of one section of the moving crimped tow; at least one camera, for capturing at least one of the crossed video image of the section of the moving crimped tow; digitizer for conversion of at least one crossed video image digits into digital data; analyzer for analyzing the digital data into analyzed data representing the first and the second non-crossed video photograph, where the program and relevant stored programs are for processing of analyzed data; and a display for displaying characteristics of the crimp based on the processing of said analyzed data.
Patent TW-356579-B (TW)
Title: Planar trenches
Inventor: SOEDERBAERG ANDERS KARL S
IPC: H01L21/76
Filed: 1997-04-18
Granted: 1999-04-21
Abstract: A kind of method for forming trench in the semiconducting material (2) bottom material having plane surface (3), it comprises the following steps: by using a mask (4), processing mask treating at an appropriate location of the treating trench (1) in the plane surface (3) of the bottom layer (2), in the plane surface (3), etch the desired trench (1) depth, treating a partial or all the plane surfaces of the exposed bottom material (2), for forming first isolation layer (9), leaving the second isolation material layer (6) on the first isolation layer (9), wherein the said second isolation material layer (6) has thickness equal or greater than the trench (1) width, back etch the second isolation material layer (6), until the first isolation layer (9) on the plane surface (1) is exposed, making the actual vertical difference (8) in a height h to form on surface layer the trench (1), its characteristics is as shown the following step: placing isolation layer (21) on the surface layer exposed by the crystal particles (2) and trench (1); non-waiting directional back etch isolation layer (21), thereby isolation layer (21) depth d left on the second isolation material layer (6) in the trench (1) located at the edge region of the trench (1) shall be lower than or equal to the differing value (8) height h.
Patent TW-401347-B (TW)
Title: Three-dimensional sheet material and method of making same, and forming structure and method of making same
Inventor: HAMILTON PETER WORTHINGTON
IPC: B29C51/22
Filed: 1997-06-12
Granted: 2000-08-11
Abstract: The present invention relates three-dimensional sheet materials which resist nesting of superimposed layers into one another. More particularly, the present invention provides a three-dimensional, nesting-resistant sheet material having a first side and a second side. The first side comprises at least one region having a plurality of spaced three-dimensional protrusions extending outwardly from the first side which  are preferably unitarily formed from the sheet material. To provide the nesting-resistant advantages of the present invention, the protrusions form an amorphous pattern of a plurality of different two-dimensional geometrical shapes. Preferably, the second side comprises a plurality of spaced, three-dimensional hollow depressions corresponding to the protrusions, such that the protrusions are hollow. Of particular interest for certain applications, such as a carrier for an adhesive, the protrusions are separated by an interconnected network of three-dimensional spaces between adjacent protrusions. The three-dimensional, nesting-resistant sheet materials are preferably manufactured in accordance with the present invention utilizing a three-dimensional forming structure comprising an amorphous pattern of spaced three-dimensional recesses separated by interconnected lands. The recesses form an amorphous two-dimensional pattern of interlocking two-dimensional geometrical shapes. The amorphous pattern of interlocking shapes is preferably derived from a constrained Voronoi tessellation of 2-space in accordance with the present invention, wherein the tessellation is constrained by a constraint factor which controls the range of permissible center-to-center spacing of the interlocking shapes. To manufacture the three-dimensional, nesting-resistant sheet materials in accordance with the present invention, a sheet of deformable material is introduced onto the forming structure and permanently deformed into compliance with the forming structure. If desired, the interconnected lands of the forming structure may be coated with a substance before the sheet of deformable material is introduced onto the forming structure.
Patent TW-381966-B (TW)
Title: Multiple-needle combination method for brow-tattooing needles
Inventor: HUANG DE-SHR
IPC: A45D44/00
Filed: 1997-09-11
Granted: 2000-02-11
Abstract: A method of combining multiple needles for the brow tattooing: A heat-resistant plate together with multiple penetrating holes in it becomes a fixed plate set. The bottom ends of the multiple short needle sets are allocated in the above penetrating holes and the upper ends of each short needle set are capped by a heat-shrink cannula before a long needle is inserted into each short needle set. The tips of all long and short needles are aligned together on top of the heat-resistant plate. Then the whole fixed plate set is heated in the oven to contract the cannula holding onto the needles. Each needle set is drawn out of the fixed plate set after the heating. Insert the tips of each needle set into the positioning and forming holes inside a fixture containing guiding holes to achieve best positioning and formation. Employ the spot-welding on the needle set exposing out from the guiding holes to stabilize the multiple brow-tatooing needle sets as a whole and to enhance the matching of the needle tips.
Patent TW-434802-B (TW)
Title: Method of manufacturing shallow trench isolation
Inventor: HUANG GUO-TAI
IPC: H01L21/762
Filed: 1997-10-09
Granted: 2001-05-16
Abstract: The method of manufacturing shallow trench isolation comprises: first form a pad oxide and a mask layer on the substrate sequentially, then define the mask layer and pad oxide layer and form an opening in the mask layer, wherein the side wall of mask layer forms an angle with the substrate surface covered by the mask layer, and a trench is formed along the etched substrate of the opening. Then fill an insulating layer into the trench, so that the surface of insulating layer is not lower than the surface of the mask layer, and there is a protrusion part by the side of the insulating layer. Then remove the mask layer and some portion of pad oxide layer to form a spacer by the side of insulating layer. Finally remove the pad oxide layer on the surface of the substrate to form a shallow trench isolation structure. The trench isolation layer adjacent to the substrate surface has better resistance to etching process due to the formation of spacer to thereby avoid the over etching of the insulating layer which can result in the kink effect.
Patent TW-341671-B (TW)
Title: Timepiece including luminous elements
Inventor: SCHNEIDER ROLF
IPC: G04B47/04
Filed: 1997-10-20
Granted: 1998-10-01
Abstract: A wristwatch including a case (1) for accommodating a movement (4), luminous elements carried by the bezel or by the middle part of the case, a source of energy (44,45) and an electronic circuit (33) housed in the case to control the power supply of the luminous elements and at least one control element (5), in which at least one luminous element is formed by a finger (11-15) made of flexible materials, supported by the case and extending beyond the latter.