baber/WOPTO huggingface dataset:
Patent TW-457246-B (TW)
Title: Dimeric small molecule selectin inhibitors comprising of (mannopyranosyloxy)biphenyl-substituted carboxylic acid
Inventor: KPGAN TIMOTHY P
IPC: A61K31/70
Filed: 1996-12-19
Granted: 2001-10-01
Abstract: The present invention provides compounds having the structure below: wherein X is selected from the group consisting of -CH, -(CH2)nCO2H, -(CH2)nCONHOH, -O(CH2)mCO2H, -O(CH2)mCONHOH, -(CH2)nCONHNH2, -(CH2)nCOZ, -(CH2)nZ, -CH(CO2H)(CH2)mCO2H, -(CH2)nO(CH2)mCO2H, -CONH(CH2)mCO2H, -CH(OZ)(CO2H), -CH(Z)(CO2H), -(CH2)nSO3H, -(CH2)nPO3D1D2, -NH(CH2)mCO2H, -CONH(CHR3)CO2H, (1-H-tetrazoly1-5-alkyl-), and -OH; for divalent structures, Y is -(CH2)f-, -CO(CH2)fCO-, -(CH2)fO(CH2)f-, -CO(CH2)fO(CH2)fCO-, -(CH2)gS(O)b(CH2)fS(O)b(CH2)g-, -CO(CH2)gS(O)b(CH2)fS(O)b(CH2)gCO-, -(CH2)fV(CH2)f-, -(CH2)fCOVCO(CH2)f-, -CO(CH2)COVCO(CH2)fCO-, -CO(CH2)fV(CH2)fCO-, -CONH(CH2)fNHCO-, -CO(CH2)fW(CH2)fCO-, -(CH2)fWSW(CH2)f-, -(CH2)fCONH(CH2)fNHCO(CH2)f-, -(CH2)fCOW(CH2)fWCO(CH2)f-, or -CH2(CH2)fW(CH2)fCH2- where V is -N[(CH2)q]2N- and q is independently 2 to 4, and W is aryl or heteroaryl; for trivalent structures, Y is: and T is selected from the group consisting of -(CH2)f-, -CO(CH2)f-, -(CH2)gS(O)b(CH2)f-, and -CO(CH2)gS(O)b(CH2)f-, where the carbonyl group is positioned contiguous to the biphenyl unit; R1 and R2 are independently selected from the group consisting of hydrogen, alkyl, halogen, -OZ, -NO2, -(CH2)nCO2H, -NH2 and -NHZ; R3 is selected from the group consisting of hydrogen, alkyl, aralkyl, hydroxyalkyl, aminoalkyl, alkyl carboxylic acid and alkyl carboxamide; f is 1 to 16, g is 0 to 6, n is 0 to 6, m is 1 to 6, p is 0 to 6, b is 0 to 2, Z is alkyl, aryl or aralkyl, and D1 and D2 are independently hydrogen or alkyl, and the pharmaceutically acceptable salts, esters, amides and prodrugs thereof. The present invention further provides a method of inhibiting the binding of E-selectin, P-selectin, or L-selectin to sLex or sLea comprising administering to a patient an effective amount of a compound of the present invention and to pharmaceutical compositions containing a compound of the present invention.
Patent TW-361039-B (TW)
Title: Adaptive anti-flicker method for VGA to TV data conversion
Inventor: HUANG JIAN-XIU
IPC: H04N5/21
Filed: 1997-02-18
Granted: 1999-06-11
Abstract: An adaptive anti-flicker data conversion system for converting picture data in a video graphic adapter for displaying on a television. The conversion system reduces flickers adaptively according to the luminance of a pixel and neighboring pixels one line above and below. Contrast difference and mean value are defined based on the luminance of three neighboring pixels. A contrast ratio is computed by dividing the contrast difference by the mean value. Three threshold values are defined for examining the contrast ratio and selecting an appropriate anti-flicker filter. Pixels having higher contrast ratio are processed with filters having stronger anti-flicker effect. The adaptive anti-flicker method reduces flickers without blurring every pixel in the picture data.
Patent TW-342449-B (TW)
Title: Ultrasonic flaw detection apparatus and ultrasonic flaw detection method
Inventor: KIMURA TOMONORI
IPC: G01N29/38
Filed: 1997-02-26
Granted: 1998-10-11
Abstract: An ultrasonic flaw detection apparatus, which comprises: a probe (7) which is driven by a transmission signal and which transmits an ultrasonic pulse at an angle with respect to a surface of a test object and receives the ultrasonic pulse, which has been reflected by a defect in the test object, as an echo; a scanner mechanism (9) for scanning the probe (7) over a predetermined scanning zone on the test object and for outputting a spatial position of the probe (7); a transmitter-receiver (8) which has a transmitter (82) for generating a transmission signal and outputting it to the probe (7); a receiver (83) for accepting an echo received from the probe (7); a position detector (85) for receiving a spatial position of the probe (7) from the scanner mechanism (9); a signal processor (84)for detecting the defect according to the stored spatial position of the probe (7) and the stored echo, taking the spread of an ultrasonic beam attributable to diffraction into account; and a controller (810 for controlling the devices (82~85).
Patent TW-341577-B (TW)
Title: New piping-grade polypropylene composition
Inventor: MIKA HARKONEN
IPC: C08F4/649
Filed: 1997-05-30
Granted: 1998-10-01
Abstract: A process for the preparation of a polypropylene, containing from 1.0 to 10.0% by weight of ethylene or C4-C10-α-olefin repeating units and having a MFR2 value of between 0.05 and 0.40 g/10 min by polymerizing propylene and ethylene in the presence of a catalyst system, the procatalyst component of which is a reaction product of at least a tetravalent titanium compound and a magnesium halide compound and the cocatalyst component of which comprises an organoaluminium compound, and hydrogen as a molecular weight regulating agent, to give the polypropylene, the creep-resistance of the polypropylene being improved by performing the process by means of the following steps: (a) copolymerizing propylene and ethylene into a random copolymer at 40 to 110 ℃ using: a catalyst system of the above-mentioned type; a portion of ethylene or C4-C10-α-olefin leading to 1.0 to 10.0 % by weight of ethylene repeating units in the random copolymer; and no or a minimal amount of hydrogen leading to a MFR10 value of between 0.01 and 5.0 g/10 min for the random copolymer, if this step is performed first, or to a MFR2 value for the polypropylene of between 0.05 and 0.40 g/10 min, if this step is performed after step (b); the proportion of random copolymer of this step being from 20 to 80 % by weight of the polypropylene, (b) polymerizing propylene at 40 to 110 ℃ using: a catalyst system of the abovementioned type; no or a minimal portion of ethylene leading to 0.0 to 1.0% by weight of ethylene repeating units in the polymer resulting from this step; and an amount of hydrogen leading to a MFR2 value of between 30 and 300 g/10 min for the polymer, if this step is performed first, or to a MFR2 value for the polypropylene of between 0.05 and 0.40 g/10 min, if this step is performed after step (a); the proportion of polymer of this step being from 80 to 20% by weight of the polypropylene.
Patent TW-436782-B (TW)
Title: Method and means for glass mastering binary data
Inventor: GUENTHER CHRISTIAN
IPC: G11B27/34
Filed: 1997-07-01
Granted: 2001-05-28
Abstract: A system concept and the components integrated therein for storing useful and control information as well as feature items, general components for data flow control of all components integrated in the system concept as well as special components for data flow and process control of interface systems for laser-beam recorders permit handling of useful and control information as well as feature items independently of physical music/data carriers within premastering and the production of glass masters (mastering) in CD plants. All the varuous types of information are stored in on-line compatible mass storages and automatically transferred into the sectors calling for the information concerned by general data flow control components. Requests for information can be generated manually or automatically. The time needed to transfer to the requesting sectors or machines is shortened, the premastering expense reduced, the mastering actions automated with the aid of special control components and considerably speeded up as compared to conventional methods by using a network as the carrier medium.
Patent TW-329549-B (TW)
Title: The manufacturing method for increasing capacitance of capacitor in DRAM
Inventor: LIOU CHWEN-MING
IPC: H01L21/70
Filed: 1997-07-04
Granted: 1998-04-11
Abstract: A manufacturing method for increasing capacitance of capacitor in DRAM includes the following steps: (a) Provide a substrate, which has already formed MOS device that includes gate, a source/drain region and a word line; (b) Sequentially form dielectric and silicon-nitride on substrate surface; (c) Define the pattern of dielectric and silicon-nitride layer, and form contact window on top of source/drain region to expose the source/drain region of MOS device; (d) Fill 1st conductor to full contact to form plug; (e) Form plurality of 1st and 2nd oxide layers on surface of silicon-nitride layer and plug, and those 1st & 2nd oxide layers are alternately stacked each other; (f) Define the pattern of those 1st and 2nd oxide layers, and use the different etching ratio on 1st and 2nd oxide layers to form opening with plurality of notches on sidewall to expose plug and silicon-nitride that is surrounding the plug; (g) Form 2nd conductor on above surface to fill notches; (h) Define the pattern of 2nd conductor to form crown-shaped 2nd conductor as bottom electrode plate of capacitor; (I) Use etching to remove those 1st and 2nd oxide layers, and use silicon-nitride layer as stop layer; (j) Sequentially form insulating and 2nd conductor on 2nd conductor surface to finish the manufacturing of capacitor.
Patent TW-347516-B (TW)
Title: Browse by prompted keyword phrases with an improved user interface
Inventor: SEYMOUR IVAN RUBINSTEIN
IPC: G06F17/30
Filed: 1997-08-26
Granted: 1998-12-11
Abstract: A method for identifying one of a plurality of documents stored in a computer-readable medium, the method comprising the computer-implemented steps of: automatically identifying for a user keyword phrases in the plurality of documents; displaying a tabbed index indicative of content of the keyword phrases; prompting the user to construct a query expression in which at least one of the keyword phrases is an operand; and identifying one of the plurality of documents based on the query expression.
Patent TW-460558-B (TW)
Title: Pressure-sensitive adhesive polymers
Inventor: VANHOYE DIDIER
IPC: F16J15/00
Filed: 1997-07-28
Granted: 2001-10-21
Abstract: This pressure-sensitive adhesive polymer is obtained by emulsion polymerization of the mixture of the following monomers, for a total of 100% by weight: (A) 40 to 95% by weight of at least one (meth)acrylic or vinyl monomer capable of resulting in a homopolymer which has a glass transition temperature lower than or equal to -40 DEG C; (B) 2 to 50% by weight of at least one (meth)acrylic or vinyl monomer capable of resulting in a homopolymer which has a glass transition temperature higher than or equal to 0 DEG C; (C) 0.5 to 6% by weight of at least one carboxylic (meth)acrylic monomer; (D) 0 to 5% by weight of at least one (meth)acrylic monomer ethoxylated with 1 to 20 moles of ethylene oxide; (E) 0.05 to 1% by weight of at least one (meth)acrylic or vinyl monomer containing a ureido group; and (F) 0 to 2% by weight of at least one acrylic or vinyl monomer carrying a sulphonate functional group, the said polymer having a glass transition temperature lower than or equal to -25 DEG C.
Patent TW-467984-B (TW)
Title: Method for producing elastic synthetic leather
Inventor: LUO SHI-CHIN
IPC: D06N3/00
Filed: 1997-08-30
Granted: 2001-12-11
Abstract: The present invention provides a method for producing an elastic synthetic leather, which mainly comprises forming a polymer on at least one face of a knitted substrate containing an elastic fiber, thereby endowing the product with a better elasticity and forming property.
Patent TW-345499-B (TW)
Title: Fine bubbling device for gas in gas-mixed liquid
Inventor: SUGIURA EICHI
IPC: C02F1/78
Filed: 1997-09-18
Granted: 1998-11-21
Abstract: A device for fining bubbles of gas contained in liquid, comprising: at least two flow channel members confronting each other to form a flow channel therebetween; an inlet and an outlet provided on one side and the other side of the flow channel members; and a recess surface including a first recess and a second recess and formed on at least one of confronting surfaces of the flow channel members, the first recess and the second recess extending from the inlet to the outlet, respectively, and intersecting each other at plural positions where the flow of the liquid premixed with gas in the first recess collides with that in the second recess.
Patent TW-343373-B (TW)
Title: Process for producing a semiconductor component
Inventor: HAGIWARA HIDETOSHI
IPC: H01L21/70
Filed: 1997-11-25
Granted: 1998-10-21
Abstract: A process for producing a semiconductor component used as a capacitor, which comprises the following steps: forming a plug-shape conductive semiconductor layer on a conductive semiconductor substrate, in which the plug-shape conductive semiconductor layer is surrounded by an insulation layer; forming a semiconductor oxide layer on the insulation layer, the semiconductor oxide layer having an opening located on a position corresponding to the plug-shape conductive semiconductor layer; forming a conductive semiconductor layer and a conductive semiconductor layer with a rough surface on the plug-shape conductive semiconductor layer and the semiconductor oxide layer; forming an etch mask layer on the conductive semiconductor layer with a rough surface; etching back the etch mask layer until exposing the top surface of the conductive semiconductor layer with a rough surface, thereby forming the etch mask layer into an etch mask; contacting the conductive semiconductor layer with a rough surface with an etchant to react with a semiconductor oxide, thereby removing the top surface deposited on the conductive semiconductor layer, and the residual space between the grooves of the conductive semiconductor layer with a rough surface; using the etch mask to etch the conductive semiconductor layer with a rough surface, the conductive semiconductor layer and the semiconductor oxide layer, thereby forming an electrode having a vertical columnar shape, the vertical column having an open top and sealed bottom; forming a dielectric layer at least covering the electrode having a vertical columnar shape; and forming another electrode with a conductive material covering the dielectric layer.
Patent TW-353205-B (TW)
Title: Polishing pad and apparatus for polishing a semiconductor wafer
Inventor: FUJITA TAKASHI
IPC: H01L21/304
Filed: 1997-11-27
Granted: 1999-02-21
Abstract: An apparatus for polishing a semiconductor wafer, which includes: a polishing pad to be in contact with the semiconductor wafer; a turn table which rotates the polishing pad; and an elastic member which is arranged between the turn table and the polishing pad; in which the polishing pad includes a polishing layer which is made of a material having a good characteristic of slurry holding; and a support layer which is made of a rigid material having an optimum thickness to prevent the polishing layer from loosening, the polishing pad is attached to the turn table by a stretch-holding technique without adhesive bonding.
Patent TW-482756-B (TW)
Title: Process for the manufacture of intermediates for epoxy compounds, process for the manufacture of epoxy compounds and epoxy compounds obtained therewith
Inventor: SMITS JOZEF JACOBUS TITUS
IPC: C07D303/23
Filed: 1998-02-04
Granted: 2002-04-11
Abstract: Process for the preparation of compounds of the formula, wherein Hal represents chlorine, bromine or iodine and preferably chlorine, wherein Ra represents a residue comprising one or more additional groups of the formula, from compounds wherein R2 represents a residue comprising one or more additional groups of the formula, by reaction with gaseous hydrogen halide in the presence of a catalytic amount of an organic acid; process for the preparation of epoxy compounds starting from the reaction, and epoxy resins obtained via this process showing a significantly lower content of intermingled halogen.
Patent TW-358942-B (TW)
Title: Semiconductor memory having excessive circuits
Inventor: KWAK CHOONG-KEUN
IPC: G11C8/00
Filed: 1998-02-12
Granted: 1999-05-21
Abstract: A semiconductor memory having excessive circuits, for replacement of defective memory cells, including: a first node, for receiving a chip selection signal; a second node; a first flip-flop, having an input connected to the first node; a fuse, connected to between the first and the second node; a current path, connected to between the second node and a grounding, for flow of current of less than a few Amp through the first current path; a second flip-flop, having an input connected to the second node; a device, having a circuit and an address input, where the circuit being for saving a service address for replacement of defective memory circuits by the excessive memory cells, the address input for receiving a row/line address, for generation of an excessive preset decoding signal, for marking whether the row/line address matches the service address; and a device, having a plurality of input, for respective receiving of the chip selection signal, the output signal of the second flip-flop and the excessive front decoder signal, for generation of an excessive enabling signal for logic configuration of the input signal; where the excessive circuits being enabled by the excessive enabling signal.
Patent TW-410455-B (TW)
Title: Forming method for dual damascene structure
Inventor: LIN SZ-MIN
IPC: H01L21/768
Filed: 1998-02-16
Granted: 2000-11-01
Abstract: A kind of forming method for dual damascene structure which employs insufficient exposure energy to leave the photoresist in the vertical window after developing. The residual photoresist can protect the substrate exposed in the vertical window so that the substrate can be protected from etching damage in the followed etching process for defining horizontal trench.
Patent TW-376543-B (TW)
Title: Substrate temperature control equipment and method
Inventor: SUGAYA MASAKAZU
IPC: H01L21/00
Filed: 1998-03-24
Granted: 1999-12-11
Abstract: To make temperature of a substrate uniform and shorten temperature rising (temperature falling) time, by installing a temperature control member wherein protruding parts making the same plane are arranged on the surface, and a substrate compression-bonding mechanism which fixes the substrate on the protruding parts by pressing the substrate in the direction of the temperature control member.
Patent TW-391066-B (TW)
Title: Erasable optical memory apparatus and method of fabricating the same
Inventor: HUNG RUEI-HUA
IPC: H01L31/0304
Filed: 1998-07-31
Granted: 2000-05-21
Abstract: An erasable optical memory apparatus and method of fabricating the same are disclosed in the invention. Non-single crystal thin film of IIIA group metal nitride is first applied in the erasable optical memory apparatus, in which data is written by radiating the short wavelength of ultra violet light on the thin film area to be written. Additionally, data is erased by shining long wavelength infrared light on the thin film area to be erased, or by heating the photo memory apparatus to erase all of the data. The apparatus and fabrication method of this invention has the characteristics of simple fabrication process, easy data storing and erasing.
Patent TW-416887-B (TW)
Title: Tool for removing adhesive residues or the like from substrates
Inventor: FRANK UWE
IPC: B24D7/16
Filed: 1998-08-12
Granted: 2001-01-01
Abstract: A tool for removing adhesive residues, films or the like from a metal surface contains a shank, which can be rotated by a drive mechanism. A disk made from rubber or a plastics material is clamped in non-rotary manner to the shank.
Patent TW-503258-B (TW)
Title: Process for naphtha reforming
Inventor: WALSH JOHN F
IPC: C10G59/06
Filed: 1999-04-22
Granted: 2002-09-21
Abstract: A process comprises separating a naphtha feed into a fraction comprising C7- hydrocarbons and a heavy C8+ fraction, separating the C8+ traction into a light fraction comprising C8 and/or C8-C9 which then is reformed to produce gasoline and/or a desired distribution of aromatics.
Patent TW-391887-B (TW)
Title: Disposable filter element
Inventor: LUO LANG
IPC: B01D29/21
Filed: 1998-11-04
Granted: 2000-06-01
Abstract: A filter element for a permanent perforated core hydraulic fluid filter system comprises a rigid resin mesh tube having a thickness of at least 0.050 inch with an inner diameter enabling a sliding fit over the permanent core, filter media in a tubular shape abutting the rigid resin mesh tubing, end caps secured to the axial ends of the rigid resin mesh tube and the media, and means for sealing the end caps to the permanent perforated core.
Patent TW-I230615-B (TW)
Title: Method and compositions for in situ formation of protective and/or medicated films on body tissue
Inventor: DRUMMOND WILLIAM H
IPC: A61L26/00
Filed: 1998-11-20
Granted: 2005-04-11
Abstract: Methods and compositions for forming protective and/or medicated films on body tissue. Liquid compositions contain a hydrophobically modified polymer, other than an esterified lower-hydroxyalkyl-substituted cellulose, suspended or dissolved in a solvent. The modified polymer is soluble in the solvent but insoluble in body fluids. The compositions may optionally contain a separate medicinal component, i.e., one which is present in addition to any medications, if any, present in the solvent, in the modified polymer and in any other additive components such as flavors, skin penetrants, preservatives, other solvents for the additives, etc. A protective and/or medicated film is formed in situ upon body tissue by applying the liquid composition to the tissue and separating the solvent from the composition, e.g., by vaporization.
Patent TW-417106-B (TW)
Title: Optical pickup device using hologram pattern and hologram pattern generation method
Inventor: HIRAGA TAKAYOSHI
IPC: G11B7/1353
Filed: 1999-02-01
Granted: 2001-01-01
Abstract: Astigmatism and coma are suppressed in an optical pickup device of the type that light from a single real laser light source is diffracted and divided by a hologram module into a plurality of light spots which are focussed upon a plurality of tracks of an optical disk to read data on the tracks at the same time. A non-diffraction hologram pattern and diffraction hologram patterns of the hologram module are determined so that light diffracted by the hologram module is given inverse aberration of that to be caused by optical elements in an optical path from the real laser light source to the optical disk.
Patent TW-430549-B (TW)
Title: Cord lock
Inventor: TAKAHASHI HIROSHI
IPC: A44B11/16
Filed: 1999-02-11
Granted: 2001-04-21
Abstract: To improve locking force to a cord even without strengthening the energizing force of a slider and to provide an expected locking force without damaging operability even when the thickness of the cord is changed. This lock has a case body 1 with a housing space in which a slider 2 is housed so as to move, and an energizing means for protruding one end side of the slider 2 outward from an opening 10 with the pushing-in operation of the slider 2. The slider 2 has two inserting spaces 20 and 20 for a cord W. On the case body 1, an inserting hole 11 for the cord W is formed so as to be communicated into both two inserting spaces 20 and 20 for the cord W with the pushing-in operation of the slider 2. A gap between the two inserting spaces 20 and 20 for the cord W makes a corner part 21a for abutting to a bent inside part Wa of the cord W, which is passed through the inserting hole 11 to one inserting space 20, inserted through the other inserting space 20 later and pulled out of the inserting hole 11, and the corner part 21a functions as a bridge part 21 provided on an energizing head side 22 of the slider 2.