Patent SG-11201806330U-A (SG)
Title: Positive type photosensitive siloxane composition
Inventor: MISUMI MOTOKI
IPC: G03F7/075
Filed: 2017-01-20
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 31 August 2017 (31.08.2017) WIPO I PCT (10) International Publication Number WO 2017/144148 Al 111111111111110111011111111111010111110111010111111111101011111110111111111110111111 (51) International Patent Classification: G03F 7/004 (2006.01) GO3F 7/075 (2006.01) G03F 7/023 (2006.01) (21) International Application Number: PCT/EP2017/000070 (22) International Filing Date: 20 January 2017 (20.01.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 2016-032209 23 February 2016 (23.02.2016) JP (71) Applicant: AZ ELECTRONIC MATERIALS (LUX- EMBOURG) 5.A R.L. [LU/LU]; 46 Place Guillaume II, 1648 Luxembourg (LU). (72) Inventors: MISUMI, Motoki; c/o Merck Performance Materials Manufacturing G.K., 3330, Chihama, Kakegawa- shi, Shizuoka 437-1412 (JP). YOKOYAMA, Daishi; c/o Merck Performance Materials Manufacturing G.K., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). TAKA- HASHI, Megumi; c/o Merck Performance Materials Man- ufacturing G.K., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). NONAKA, Tshiaki; c/o Merck Perform- ance Materials Manufacturing G.K., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). (74) Agent: B2B PATENTS; c/o Merck Patent GmbH, 64271 Darmstadt (DE). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) W O 20 17 / 144148 Al (54) Title: POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION (57) : To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability.The present invention provides a positive type photosensitive siloxane compos - ition comprising : a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-gen- erator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.