baber/WOPTO huggingface dataset:
Patent JP-H08102965-A (JP)
Title: Image coder
Inventor: MIHASHI SATOSHI
IPC: H04N19/50
Filed: 1994-09-30
Abstract: PURPOSE: To attain compression of an image efficiently without a luminance change spatially with a characteristic in color difference by detecting a motion vector from the sum of errors obtained from luminance data and color difference data. CONSTITUTION: A motion detector 41 and a motion vector generator 34 generate a total value ADy of absolute value sum AD of errors of luminance pixels of a macro blocks of a reference side and a search side and a total value ADc of absolute value sum AD of errors of color difference pixels to detect a motion vector in which the total values are minimized. The vector is used for an error of the macro block and a compression method selection circuit 32 estimates which of in-frame coding and inter-frame prediction coding is used for compression to provide high image quality and less bit quantity based on the mean absolute sum MAD and the error absolute sum AD to be obtained. Since luminance and color difference data are taken into account in the values, discrimination of which coding method provides more efficient compression is not mistaken.
Patent JP-2001062014-A (JP)
Title: Golf shaft
Inventor: HIGUCHI RYOJI
IPC: A63B102/32
Filed: 1999-08-25
Abstract: PROBLEM TO BE SOLVED: To provide a golf shaft which is light in weight and is improved in bending strength and impact strength while an increase in bending rigidity is suppressed as far as possible. SOLUTION: This golf shaft is formed by arranging a composite prepreg sheet 50, which is formed by paralleling pitch-base carbon fibers of modulus of elasticity in tension of 50 GPA and elongation at break of 2% as carbon fibers 51 of modulus of elasticity in tension of <=150 GPA and para-base aramid fibers of modulus of elasticity in tension of 50 GPA and elongation at break of 4% as organic fibers 52 to form a prepreg sheet, then bonding a cloth or paralleled protective prepreg sheet consisting of glass fibers on the outer side thereof, on the outermost layer on the front end side of the golf shaft made of FRP, in such a manner that a volumetric ratio attains 90:10.
Patent JP-H08102238-A (JP)
Title: Waterproof plate and switch apparatus
Inventor: YASUMOTO HIROMI
IPC: H01H23/06
Filed: 1994-09-30
Abstract: PURPOSE: To make the position of a switch easy to find, make the appearance of a switch good, make operating force and restoring force in each switch position uniform, and make operating touch good. CONSTITUTION: An open part 44 for a switch operation is formed in the center of a plate main body 41 and switch operating bodies 42 are installed in the open part 44. The switch operating bodies 42 are produced by dividually forming switch operation parts 51, which have operation plane parts 52 and rising upper edge parts 53, 54 in the peripheral edges of the operation plane parts 52, for respective switch positions. Consequently, since the switch operation parts 51 are divided dividually and formed respectively for every switch position, the position of a switch is made easy to find and the appearance is made good. Also, since rising upper edge parts 53, 54 are formed in the peripheral edge of an operation plane part 52 of each switch operation part 51, the operating force and the restoring force of each switch operation part 51 are made uniform and operating touch is made good.
Patent JP-H0794401-A (JP)
Title: Charged particle beam lithography device
Inventor: HATTORI SEIJI
IPC: H01L21/027
Filed: 1993-09-27
Abstract: PURPOSE:To provide a charged particle beam lithography device which can correct positional deviations caused by the tilting of the optical axis of an objective lens, can evaluate deflectional distortion at an arbitrary height, and can improve pattern accuracy. CONSTITUTION:An electron beam lithography device having a function for evaluating positional deviations caused by the tilting of the optical axis of an objective lens and anther function for evaluating deflectional distortion at an arbitrary height is provided with a mark table 14 which is provided as part of a sample table 12 and can be moved in the height direction, Z sensor 9 which optically measures the height of a part irradiated with an electron beam, and mechanism which measures the position of a mark on the table 14 by scanning the mark with the electron beam. By moving the sample table 12 to a plurality of locations in the deflecting area of the electron beam and measuring the position of the mark and the then height of the table 14 by changing the height of the table 14, the deflected and distorted amounts of the charge particle beam against a reference height are found.
Patent JP-H0980981-A (JP)
Title: Safety device for image forming device
Inventor: SHIBAKI HIROYUKI
IPC: G03G15/20
Filed: 1995-09-18
Abstract: PROBLEM TO BE SOLVED: To provide the safety device of an image forming device which prevents the light quantity fluctuation of an exposure lamp and by which such components as a heating roller are not broken. SOLUTION: A cycle from when the signal (c) of an energizing forcedly stopping means is turned off by a reset signal (f) till the signal (c) is secondaly turned off is defined as TB, the time when the signal (c) is turned off is defined as tOFF, the time required by an exposure means for scanning an original having a maximum size is defined as tS, and operation limit time required by an on/off condition detecting means for operating an energization interrupting means is defined as tL; each time is set to realize the relation of tS<(TB-tOFF)<tL. Thus, the energizing to the fixing heater is performed in the timing shown by the signal (e), so that the heater is prevented from being turned on/off while the exposure lamp is turned on as shown in the signal (a).
Patent JP-H0555470-A (JP)
Title: Manufacture of integrated circuit
Inventor: ISHIDA MAMORU
IPC: H01C17/14
Filed: 1991-08-26
Abstract: PURPOSE:To enable manufacture of an integrated circuit as designed by restraining lowering of a resistance value of a load resistance element of polycrystalline silicon in a metal alloy process and by restraining generation of resistance value difference inside the load resistance element after formation of the load resistance element of polycrystalline silicon. CONSTITUTION:In a manufacture process of an integrated circuit which uses a load resistance element of polycrystalline silicon, hydrogen or fluorine are introduced in advance to polycrystalline silicons 22, 22' to form load resistance elements 22A, 22A'. In a following process, metal patterns 25, 26 are formed which become an upper layer wiring of the load resistance elements 22A, 22A' and a metal alloy process is performed in gas atmosphere containing hydrogen for the metal pattern 25, 26.
Patent JP-H04119661-A (JP)
Title: Semiconductor device lead frame
Inventor: FUJITA YOSHIAKI
IPC: H01L25/07
Filed: 1990-09-11
Abstract: PURPOSE:To lessen a circuit board in size and to improve a lead frame in degree of freedom of pattern layout by a method wherein a resin layer is provided to the lead frame where the circuit board is bonded, and lead frame terminals are provided to the resin layer concerned as buried. CONSTITUTION:A resin layer 13 of thermosetting resin such as epoxy resin or the like or thermoplastic resin such as PBT(Poly Butylene Terephtalate) or PPS(Polyphenylene Sulfide) is made to adhere to a lead frame 9, and lead frame terminals 11 wire-bonded to the emitter of a power transistor 3 are provided to the resin layer 13 as buried. The lead frame terminals 11 insulated from the lead frame 9 by resin can be arranged near to the power transistor 3, the wire bonded to the emitter of the power transistor 3 is directly bonded to the lead frame terminal without taking advantage of a circuit board as a relay.
Patent JP-H1088011-A (JP)
Title: Composition containing acid-amine latex
Inventor: TYSAK THEODORE
IPC: C08F8/32
Filed: 1997-08-20
Abstract: PROBLEM TO BE SOLVED: To obtain a water-base polishing composition for building floors, having wear resistance, resistance to scuff mark, and resistance to black heel mark by using as the constituent an acid-amine latex which is self-crosslinkable, ambient curing, and capable of forming a film. SOLUTION: An amine-strippable washing-resistant water-base polishing composition containing an acid-amine latex which is self-crosslinkable, ambient curing and capable of forming a film and which has acid functional groups and amine functional groups respectively in amounts of 0.5-12.5wt.% and 1.0-22.5wt.% based on the total weight of monomers. This latex has both of acid and amine functional groups in the dispersed polymer particles and preferably comprises a polymer having the acid and amine in the polymer chain, but it may be one wherein the dispersed polymer particles have both of the functional groups. The polymer is preferably one obtained by reacting a specified diamine with an acid anhydride polymer emulsion to form both of acid and amine groups in the emulsion polymer.
Patent JP-H0288601-A (JP)
Title: Production of alpha-starch and apparatus therefor
Inventor: YOSHINO ZENICHI
IPC: C08B30/16
Filed: 1988-09-24
Abstract: PURPOSE:To obtain alpha-starch with saved energy in a simple apparatus without using an additive and heating operation by continuously compressing raw starch grains containing a specific amount of moisture at ordinary temperature and continuously compressing alpha-starch with generated heat following the compaction. CONSTITUTION:A raw starch granular material (D) containing 5-40wt.% moisture are fed to a raw material hopper 9 and a screw 10 provided in the hopper 9 is rotated with a motor 11 mounted on the hopper 9 to push the raw starch material (D) into a prepressurizing chamber 2. The resultant densified raw starch material (D) is subsequently passed between a pair of cylindrical rolls (1A) and (1B) provided under the prepressurizing chamber 2 to apply a pressure thereto with a hydraulic cylinder 4. The raw starch material (D) is continuously compressed at ordinary temperature, pregelatinized with generated heat following the compaction and then continuously squeezed out to afford the objective alpha-starch.
Patent JP-H04119541-A (JP)
Title: Apparatus for producing information recording carrier
Inventor: OGOSHI KUNIZO
IPC: G11B7/26
Filed: 1990-09-10
Abstract: PURPOSE:To improve the release property between a resin layer and a stamper and to improve a yield by forming the outer peripheral edge of a mask member to a discontinuous shape. CONSTITUTION:The outer peripheral edge of the planar mask member 26 for shielding radiations 28 and partially suppressing the curing of a radiation curing resin layer 30 is formed as the discontinuous shape and the edge part of the cured part formed by this projection is formed as the discontinuous shape. Then, the projecting part of the discontinuous shape triggers the peeling at the time of peeling the cured radiation curing resin layer 30 together with a transparent substrate 24 from the stamper 24. The resin layer is easily peeled by the small force in this way and the deformation and destruction of the substrate 24 are prevented, by which the yield is improved.
Patent JP-S6393145-A (JP)
Title: Manufacture of semiconductor device
Inventor: KOMATSU MICHIO
IPC: H01L21/8238
Filed: 1986-10-07
Abstract: PURPOSE:To perform the formation of inversion prevention layers without using a double application method by a method wherein the patternings of regions that become the active regions of an N-MOS and a P-MOS are individually performed. CONSTITUTION:An N-type well 11 is formed and thereafter, an oxide film 12 is formed on the surface of a substrate. Then, a patterning of nitride films 13A and 13B is performed. At this time, the N-MOS 13A only is patterned and the nitride film 13B of a P-MOS is held being left. Accordingly, the region where the nitride films are etched becomes a region where inversion prevention layers of the N-MOS are formed. After this, ions are implanted using the nitride films 13A and 13B and a photo resist 14 as masks and the inversion prevention layers 15 are formed in the substrate 10. Subsequently, the resist 14 is removed, a resist 16 is anew applied to perform a patterning and a nitride film region 13c that becomes an active region of the P-MOS is formed. After this the resist 16 is removed, a selective oxidation is performed using the nitride film patterns as masks and hereafter, a semiconductor device is manufactured by a normal process.
Patent JP-H0982983-A (JP)
Title: Semiconductor device and manufacture of semiconductor device
Inventor: KUNIYONE KAZUO
IPC: H01L21/306
Filed: 1995-09-19
Abstract: PROBLEM TO BE SOLVED: To make a semiconductor device smaller than and make an integration degree higher than conventional devices by forming a cavity section under an insulating layer containing a section, to which a semiconductor element is formed, through etching from a surface, to which the insulating layer is shaped. SOLUTION: An opening section 7 is formed onto an oxide film 2 and a nitride film 3, a cavity section is formed just under a section, to which a single crystal silicon layer 4 is formed, and the cavity section functions as a diaphragm 8. Electronic circuits 9 and 10 are formed to sections, to which the oxide film 2 and the nitride film 3 are not shaped, and connected electrically through the single crystal silicon layer 4 and aluminum electrodes 5. The internal resistance value of the single crystal silicon layer 4 is changed by the physical displacement of the diaphragm 8 by pressure generated from the outside, the change is detected as the fluctuation of voltage and transmitted to the electronic circuits 9, 10, signal processing such as amplification, temperature compensation, dispersion correction, etc., is conducted, and a pressure value is output.
Patent JP-H0899839-A (JP)
Title: Nail polish remover
Inventor: FARYNIARZ JOSEPH RAYMOND
IPC: C11D7/50
Filed: 1995-09-19
Abstract: PROBLEM TO BE SOLVED: To obtain a polish-lacquer remover satisfying an emission standard of a volatile organic substance decided by the government or far superior than the standard, and having excellent lacquer removing effect by mixing respectively specific volatile organic solvent and a diester with a specified amount of water. SOLUTION: This polish-lacquer remover contains (A) a 2-10C volatile organic solvent (preferably acetone or ethyl acetate) having >=0.1 mm vapor pressure at 20 deg.C, (B) a 4-30C diester [preferably a diester of the formula  R is a 1-6C alkyl or phenyl; (n) is 1-10}] having <0.1 mm vapor pressure at 20 deg.C and (C) water, in which a weight ratio of the components (B/C) is (30/1)-(1/30) and the component C is contained so as a weight ratio of (the total amount of the components A and C/the component B) to be (10/1)-(6/1). Preferably, a mixture of 15-20 wt.% of dimethyl succinate, 55-65 wt.% of glutaric acid dimethyl and 12-23 wt.% of dimethyl adipate is used as the diester of the formula.
Patent JP-S61118607-A (JP)
Title: Method for measuring line thickness of writing brush
Inventor: YOKOYAMA HARUHIKO
IPC: G01B13/02
Filed: 1984-11-14
Abstract: PURPOSE:To facilitate the measurement of the thickness of a line drawn by a robot, by detecting the flow amount of a writing solution supplied to a writing brush and increasing the detected value by a fixed number to calculate the thickness of the line drawn by the writing brush. CONSTITUTION:Writing solution is supplied to a drawing brush pen 1 from a writing solution sump 5 by a supply pipe 2 and the rotary speed of the valve 4 mounted in a writing solution flow amount sensor 3 provided on the way of said pipe 2 is calculated. The rotary speed is multiplied by a fixed number due to the relation of a preliminarily calculated flow amount and the rotary speed and the relation of the flow amount and the thickness of the drawn line to calculate the thickness of the line. The writing brush is kept away from paper or allowed to approach the same by the increase or decrease in the supply amount of the writing solution based on a reference value. By this method, the thickness of the line drawn by the a robot is easily measured and can be kept constant.
Patent JP-2001062021-A (JP)
Title: Strap for ball capturing implement and ball capturing implement
Inventor: UCHIDA KAZUMI
IPC: A63B71/14
Filed: 1999-08-26
Abstract: PROBLEM TO BE SOLVED: To prevent the breakage and elongation of straps for a ball capturing implement which connect and/or reinforce the respective parts of ball capturing implement bodies, such as baseball gloves, during use by continuously sewing reinforcing yarn into belt-like strap bodies along their longitudinal direction. SOLUTION: The gloves for baseball as the ball capturing implements are by formed by connecting the adjacent finger bags of the glove badies to each other by using the straps 1 and closing the apertures of ball receiving surface leather and the inside leather by using the straps 1. The straps 1 used in the manner described above are formed of the belt-like strap bodies 2 and the reinforcing yarn 3 continuously sewn along the longitudinal direction of the strap bodies 2. Also, the strap bodies 2 are formed to a belt form of about 7 mm in width by using natural leather. The reinforcing yarn 3 is formed as fluorescent color yarn like colored polyester by kneading, for example, a fluorescent coating material or pigment therein and is disposed by rectilinearly sewing the reinforcing yarn by a sewing machine in two rows in the transverse direction of the strap bodies 2.
Patent JP-H0992144-A (JP)
Title: Frame member welding jig
Inventor: SUZUKI KIMIO
IPC: H01J9/14
Filed: 1995-09-19
Abstract: PROBLEM TO BE SOLVED: To provide a jig of accurately determining a position and an inclination of mutual constitutive members of a frame member by arranging a rotation moment negating means and a position-inclination regulating means in a frame member welding jig. SOLUTION: Two L cross sectional bar-shaped members (A members) 11-1 are arranged so as to extend along the image screen upper and the lower end of a cathode-ray tube, and square cross-sectional bar-shaped members (B members) 11-2 to be positioned in a prescribed position and at an angle are welded and connected, and a frame shape is formed. Here, the A members 11-1 are respectively supported by a height directional fulcrum A on a base stand 18 of a welding jig, and height direction support pins 13 to be positioned are arranged. Inclination regulating mechanisms 15 are arranged in two places with respective A members 11-1, and an inclination of the A members 11-1 is regulated, and auxiliary mechanisms 17 are arranged in an almost central position of the respective A members 11-1, and the rotation moment is negated.  Therefore, when a frame member is welded, a position and an inclination of mutual constitutive members of the frame member are accurately determined.
Patent JP-S62101265-A (JP)
Inventor: ITSUBO MASANOBU
IPC: A63B22/02
Filed: 1985-10-26
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-2001067165-A (JP)
Title: Control for display of subwindow
Inventor: KABAYA MUTSUO
IPC: G06F3/0481
Filed: 1999-08-26
Abstract: PROBLEM TO BE SOLVED: To make it unnecessary to manually operate a window and a subwindow, to speed up operation and to restore the state of the subwindow even when a cursor or a mouse pointer for the original window is stayed in an original subwindow display area without interrupting the display of the working area of the original window by the subwindow. SOLUTION: Before hiding a cursor or a mouse pointer for an original window by a subwindow, subwindow is pushed out to the outside of a client area of the original window. Therefore the subwindow is displayed at first (1), an area A in which the subwindow is overlapped with the original window is extracted (2), the position of the cursor or mouse pointer of the original window is detected (3), whether the cursor or the mouse pointer is entered into the area A or not is discriminated (4), and when the cursor or the pointer enters, the subwindow is controlled (5).
Patent JP-2000079729-A (JP)
Title: Method for processing image
Inventor: CAMPBELL RUSSELL
IPC: G06F3/12
Filed: 1999-08-26
Abstract: PROBLEM TO BE SOLVED: To improve a page throughput by carrying out a data memory management task to a page being constituted in accordance with a feedback generated by a memory management task to be executed to a page of a page pipe waiting for being imaged. SOLUTION: When a predetermined state of a memory because of a memory allocation fault, falling in a memory insufficiency state threshold value or the like is detected, at least one specific memory management task is carried out to data of the memory without waiting for imaging completion of a page 145 being video imaged at present and flashing of a page pipe 120. When data of pages 125, 130, 135, 140, 145 of the page pipe 120 are executed by the memory management task, a feedback is generated so that an expected memory management task is further carried out to pages 110, 115 being constituted at present. A page throughput is improved accordingly.
Patent JP-H06192316-A (JP)
Title: Catalyst for alpha olefin polymerization
Inventor: ENRIKO ARUBITSUZATEI
IPC: C08F4/02
Filed: 1993-09-02
Abstract: Catalysts for the polymerization of alpha-olefins, which comprise the product of the reaction between:a) a metallorganic compound of Al;b) an electron-donor compound reactive towards MgCl<sub>2</sub> but which results not to be completely complexed with AlEt<sub>3</sub> at the equivalent point of a potentiometric titration under standard conditions;c) a solid comprising a halogenated Ti compound and an electron-donor compound, both supported on a Mg dihalide, the electron-donor belonging to particular classes of compounds and being extractable with AlEt<sub>3</sub> for at least 70% by mols from the solid, the surface area of which after extraction is higher than 20 <sub>m2/</sub>g.
Patent JP-H0687808-A (JP)
Title: New amine salt, its production and amidamine as intermediate
Inventor: TATEZAWA OSAMU
IPC: D06M13/405
Filed: 1992-09-09
Abstract: PURPOSE:To provide a new amine salt useful as a soft base excellent in softness and high in biodegradability. CONSTITUTION:The amine salt of formula I[R<1> and R<2> are each 1-4C alkyl or hydroxyalkyl; R<3> and R<4> are each (OH-substituted) alkyl or alkenyl; n is 2-6; X is halogen, sulfate or (OH-substituted) carboxylate], e.g. a diamidamine salt of formula II. The amine salt of the formula I can be obtained by reaction of an acidic compound of formula HX with a new amidamine of formula III. The compound of the formula III can be obtained by reaction of acrylonitrile with a diamine of formula IV followed by hydrogenation and then reaction with a fatty acid or fatty acid ester of formula R<3>COOR<5> and/or formula R<4> COOR<5> (R<5> is H or 1-3C alkyl).
Patent JP-H04120143-A (JP)
Title: Vibration-damping material
Inventor: MURAMATSU YOSHITAKA
IPC: C08L9/02
Filed: 1990-09-10
Abstract: PURPOSE:To obtain the title material small in Young's modulus change with temperature, excellent in damping characteristics by incorporating a filler in a blend comprising natural rubber etc., specific nylon fiber and acrylonitrile- butadiene rubber at specified proportion followed by curing. CONSTITUTION:The objective material can be obtained by curing a composition prepared by incorporating a filter in a blend comprising (A) 40-90wt.% of natural or chloroprene rubber, (B) 5-30wt.% of a natural rubber-grafted nylon fiber and (C) 5-30wt.% of an acrylonitrile-butadiene rubber 10-30wt.% in acrylonitrile content.