baber/WOPTO huggingface dataset:
Patent KR-20070030136-A (KR)
Title: Signal detection circuit of magnetic sensor
Inventor: KOBAYASHI KAZUYUKI
IPC: G01R33/04
Filed: 2006-09-11
Abstract: A signal detection circuit of a magnetic sensor is provided to restrict the variation in measuring and to reduce the number of parts or a chip area by processing the output voltage of plural detection coils through the same signal detection circuit. A signal detection circuit of magnetic sensors(11,12,13) is composed of a differential amplifier(33) receiving the output voltage of detection coils(113,123,133) of the magnetic sensors; a comparator(34) for receiving the output of the differential amplifier and outputting a digital signal adopting one logic value while outputting two adjacent spike type voltages included in the output voltage, respectively; and a counter(35) counting the number of pulses of a clock during the period that the output of the comparator gains one logic value.
Patent KR-20080023780-A (KR)
Title: System in chip type sram device and manufacturing method thereof
Inventor: PARK JIN HA
IPC: H01L21/8244
Filed: 2006-09-12
Abstract: A system-in-chip SRAM(Static Random Access Memory) device and a manufacturing method thereof are provided to reduce the numbers of ion implantation and photolithography processes, by depositing a first substrate having NMOS transistors and a second substrate having PMOS transistors to form a unit memory cell. A system-in-chip SRAM(Static Random Access Memory) device with a unit memory cell comprising four NMOS transistors and two PMOS transistors, the device comprises a first substrate(Sub1), a second substrate(Sub2), a first connection unit, and a third substrate(Sub3). The first substrate mounts the NMOS transistors comprising an access transistor and a drive transistor. The second substrate mounts the PMOS transistors used as a pull-up device. The first connection unit is formed one of the first and second substrates, for connecting the NMOS transistors and PMOS transistors with each other. The third substrate comprises a driving circuit(Op) for driving the memory cell, and a second connection unit for connecting the driving circuit to the unit memory cell. The four NMOS transistors on the first substrate and two PMOS transistors on the second substrate form a unit memory cell.
Patent KR-20080025875-A (KR)
Title: Organic thin film transistor comprising phosphate-based selfassembly monolayer and method for manufacturing the same
Inventor: PARK JEONG IL
IPC: G02F1/361
Filed: 2006-09-19
Abstract: An organic thin film transistor including a phosphate-based self-assembled monolayer and a method for fabricating the same are provided to reduce contact resistance between source/drain electrodes and an organic semiconductor layer by preventing cross-linking between molecules. Source and drain electrodes(4,5) are formed on a substrate(1). A phosphate-based self-assembled monolayer(6) not forming cross-linking between molecules is formed on the source/drain electrodes. An organic semiconductor layer(7) is formed on the self-assembled monolayer and the substrate. A gate insulating layer(3) is formed on the organic semiconductor layer. A gate electrode(2) is formed on the gate insulating layer.
Patent KR-20080028694-A (KR)
Title: Method for forming electrode of plasma display panel
Inventor: KIM YONG NAM
IPC: H01J11/44
Filed: 2006-09-27
Abstract: A method of forming an electrode on a plasma display panel is provided to prevent a pin-hole phenomenon on the surface of an address electrode by forming the address electrode in a precise structure. A resist layer is formed on a conductive transfer plate, and after a photomask is positioned on the resist layer, the photomask is exposed and developed to form the resist layer in a predetermined pattern. A portion of the transfer plate, on which the resist layer is not formed, is coated with an electrode material through a plating process. A film(230) having a film adhesive layer(231) is attached to the electrode material, and then is detached from the electrode material to transfer the electrode material to the film. The film with the transferred electrode material is attached to and detached from a substrate having a substrate adhesive layer(120a) to transfer the electrode material to the substrate.
Patent KR-20070037359-A (KR)
Inventor: MORI MICHIHIRO
IPC: E04H6/06
Filed: 2006-09-28
Abstract: 소형화  및  간략화를  가능하게  하는  주차 장치를  제공한다. 
     1대분의  주차  공간에  전장  방향으로  입·출고하는  차량의  반출(搬出)을  제한하는  주차 장치1은,  주차  공간의  상부  공간이면서  동시에  주차  공간의  전장(全長)  방향에서의  전후의  적어도  어딘가에  승강시킬  수  있도록  배치되는  차량접촉부13과,  소정의  감지신호에  응답하여  차량의  입·출고를  자유롭게  하는  높이와  차량의  반출을  제한하는  높이의  사이로  차량접촉부13을  승강시키는  승강 기구와,  주차  공간의  차폭  방향에서의  좌우  어딘가에  설치되는  지주5를  구비한다.  승강 기구는,  지주5에  일단(一端)이  접속되고  또한  차량접촉부13에  타단(他端)이  접속되는  암부(arm部)3과,  암부가  움직이기  위한  모터부15를  구비한다.
Patent KR-20070038002-A (KR)
Inventor: MIURA HIROTSUNA
IPC: B05C9/12
Filed: 2006-09-29
Abstract: 토출 헤드 부근에는 레이저 헤드가 설치되어 있다.  레이저 헤드로부터 조사된 레이저광은, 기판 표면의 기판 반사 위치에 임계각(臨界角)으로 입사된 후, 토출 헤드를 향하여 전반사된다.  그리고, 기판에서 반사된 레이저광은 노즐 플레이트의 반사면에 의해 기판을 향하여 전반사되어, 기판 표면의 조사 위치에 조사각(임계각)으로 입사된다. 
       
     기판 스테이지, 액적 토출 헤드, 레이저 헤드, 캐비티
Patent KR-20080030757-A (KR)
Title: A refrigerator
Inventor: SHIN YOUNG SHIK
IPC: F25D25/02
Filed: 2006-10-02
Abstract: A refrigerator is provided to prevent dewdrops from forming in the surface of an insulating member, which is disposed between a main body and the shelves installed in the main body. A refrigerator comprises a main body(10), a high voltage generator installed on one side of the main body, and a high voltage application shelf(40). The high voltage application shelf is installed within the main body, spaced apart from the main body, and connected with the high voltage generator. An insulating member(60) is installed between the main body and the high voltage application shelf in order not to electrically conduct the high voltage applied on the shelf toward the main body. The insulating member is provided at the inside thereof with a heater(70) to prevent dewdrops from forming in the surface of the insulating member.
Patent KR-20070037428-A (KR)
Inventor: MASAI TAKU
IPC: H01F10/00
Filed: 2006-10-02
Abstract: (과제) 
     도전성막의 밀착성 및 자성막의 자기 특성을 확보함으로써 작동 성능을 확보하는 것이 가능한 박막 디바이스를 제공한다. 
     (해결 수단) 
     지지체 (1) 의 표면 조도 (산술 평균 조도 (Ra)) 가, X㎛≤Ra≤0.1㎛의 범위내이다.      이 표면 조도 (Ra) 의 하한 (X) 은, 도전성막 (2) 의 내부 응력 (б), 두께 (T) 및 단위 길이당 부착력 (P) 를 포함한 일련의 파라미터에 기초하여 결정되는 값이다.     엥커 효과를 이용하여 도전성막 (2) 의 밀착성을 확보함과 함께, 표면 요철 구조를 갖는 지지체 (1) 에 자성막 (3) 이 형성되어 있는 경우에 자기 특성 (투자율) 을 확보한다. 
       
     도전성막, 박막 디바이스, 포면 조도, 자성막
Patent KR-20080032552-A (KR)
Title: Method fabricating the aspheric lens
Inventor: SONG MOON KOOG
IPC: G02B3/02
Filed: 2006-10-10
Abstract: A method for manufacturing an aspheric lens is provided to etch a surface of a photosensitive lens material according to a change of the transmitting amount of light penetrating a full light-transmitting region and a partial light-transmitting region. A photosensitive lens material of a constant thickness is formed on an upper surface of the substrate. A mask(30) having a light shielding region(31), a full light-transmitting region(32), and a partial light-transmitting region(33) is arranged on the substrate. The photosensitive lens material is exposed through the full light-transmitting region and the partial light-transmitting region. An aspheric lens is formed by etching a surface of the photosensitive lens material according to a change of the transmitting amount of light penetrating the full light-transmitting region and the partial light-transmitting region.
Patent KR-20070050346-A (KR)
Inventor: TAKEI YOSHIKI
IPC: G02F1/16753
Filed: 2006-10-12
Abstract: 본 발명은 전기 영동(泳動) 표시 적층체를 케이싱(casing)에 고정시킬 때에 전기 영동 표시 적층체에 스트레스를 주지 않고, 또한 밀봉부의 신뢰성을 높이며, 우수한 표시 품질 및 전기 특성을 갖는 전기 영동 표시 모듈을 제공하는 것을 과제로 한다. 
     본 발명의 전기 영동 표시 모듈은 전기 영동 표시 적층체와, 상기 전기 영동 표시 적층체의 양단부 부근에 설치된 ITO막으로 이루어지는 도통(導通) 부분과, 상기 전기 영동 표시 적층체를 수용하는 케이싱과, 상기 케이싱에 설치된 상기 전기 영동 표시 적층체를 유지하기 위한 유지부를 적어도 구비하며, 상기 유지부가 상기 도통 부분 중 적어도 일부를 접촉 유지하고, 상기 전기 영동 표시 적층체를 케이싱에 대하여 위치 결정한다. 
       
     전기 영동 표시 적층체, 도통 부분, 유지부, EPD 표시부
Patent KR-20080033634-A (KR)
Title: Plasma display panel
Inventor: JUNG EUN YOUNG
IPC: H01J11/34
Filed: 2006-10-12
Abstract: A plasma display panel is provided to lower discharge voltages by arranging a pair of sustain discharge electrodes to surround at least one corner portion of edge regions, which are opposed to discharge cells. A plasma display panel includes plural substrates(101,102), a dielectric wall(103), and plural discharge electrode pairs(106). The substrates are opposed to each other. The dielectric wall is arranged between the substrates and defines plural discharge cells. The discharge electrode pairs are buried in the dielectric wall and separately arranged to be opposed to each other in respective discharge cells. The discharge electrode pairs include a main electrode portion and a protrusion electrode portion. The protrusion electrode portion is protruded in an opposing direction of the main electrode toward the discharge cells. Distances between end portions of the protrusion electrode portions are different from each other according to adjacent discharge cells.
Patent KR-20080034224-A (KR)
Title: An elastic member fixing device of slide opening and closing mechanism for cellular phone
Inventor: KUM KI HYUN
IPC: H04B1/38
Filed: 2006-10-16
Abstract: An apparatus for fixing an elastic member of a slide type opening and closing device for a portable terminal is provided to join an end portion of the elastic member to a plate easily and facilitate a reworking operation, thereby improving the assembling performance of the apparatus. An apparatus for fixing an elastic member comprises a first plate fixed to a main body, a second plate fixed to a sub body, and an elastic member for sliding the second plate on the first plate through pressurization. A cylinder-shaped bearing(120) is joined to an end portion of the elastic member. A rivet(130) has a hook(132), wherein the hook is joined to the bearing while passing through the first plate or the second plate such that the bearing is rotatable in the center of the bearing.
Patent KR-20080035734-A (KR)
Title: Ferritic stainless steel having excellent formability of welded zone and corrosion resistance, and method for manufacturing the same
Inventor: WOO IN SU
IPC: C22C38/00
Filed: 2006-10-20
Abstract: A ferritic stainless steel is provided to improve corrosion resistance by controlling components and sizes of oxides of steel and improve formability of the welded zone by refining solidified grains in a welded zone, and a method for manufacturing the ferritic stainless steel is provided. A method for manufacturing a ferritic stainless steel having excellent formability of a welded zone and corrosion resistance of steel comprises the steps of manufacturing stainless steel melt in an electric furnace, refining the manufactured stainless steel melt, continuously casting the refined melt, rolling the cast steel ingot, and annealing the rolled material to manufacture a stainless steel comprising, by mass percent, 0.01% or less of C, 0.01% or less of N, 1.0% or less of Si, 1.0% or less of Mn, 10.0 to 20.0% of Cr, 0.15% or less of Al, 0.0005 to 0.002% of Ca, 0.0018 to 0.01% of Zr, 0.004 to 0.008% of O, 0.01 to 0.5% of Ti and the balance of Fe and other inevitable impurities, wherein the refining step includes a step of controlling the content of oxygen in the melt to 0.01% or less, injecting Zr into the melt, and then charging Ca into the melt.
Patent KR-20080040209-A (KR)
Title: Semiconductor manufacturing equipment
Inventor: KIM JUNG NAM
IPC: H01L21/304
Filed: 2006-11-02
Abstract: A semiconductor manufacturing apparatus is provided to clean a lower empty end of a gas supply nozzle by sealing the lower empty end of the gas supply nozzle with a cap. A semiconductor substrate(90) is loaded into a chamber. A gas supply nozzle(140) is installed in the inside of the chamber to apply a reaction gas to the inside of the chamber to process the semiconductor substrate. The gas supply nozzle includes a nozzle body(142) arranged from an upper side to a lower side within the chamber, a plurality of gas holes(144) formed at a side of the nozzle body along a longitudinal direction of the nozzle body, and a cap(146) coupled with the nozzle body to seal a lower end of the nozzle body.
Patent KR-20080042622-A (KR)
Title: Plasma display apparatus
Inventor: KIM HYUN SOO
IPC: G09G3/296
Filed: 2006-11-10
Abstract: A plasma display apparatus is provided to reduce a time required for inspection by displaying erroneous operation information at a screen in the erroneous operation mode of an image processing board. A plasma display apparatus includes a plasma display panel(120), an image processing board(100), and a control board(110). The image processing board processes inputted image signals. The control board displays images on a screen of the plasma display panel according to the image signals processed in the image processing board and displays erroneous operation information of the image processing board on the screen in the erroneous operation mode of the image processing board.
Patent KR-20080043531-A (KR)
Title: Light emission device and display device provided with the same
Inventor: LEE SANG JIN
IPC: G02F1/13357
Filed: 2006-11-14
Abstract: A light emitting device and a display device having the same are provided to radiate heat without blocking light from the light emitting device by forming a radiation plate on a noneffective region between a second substrate and a diffusion plate. A first substrate(12) and a second substrate(14) are arranged to face to each other. An electron emission unit(110) is provided in the first substrate. A fluorescence layer is formed on an inner surface of the second substrate and emits light by an electron from the electron emission unit. An anode electrode is formed on a surface of the fluorescence layer. A spacer(18) maintains an interval between the first substrate and the second substrate. A diffusion plate(20) is formed on the second substrate to disperse the light emitted from the fluorescence layer. A radiation plate(22) is formed between the second substrate and the diffusion plate. The second substrate is divided into an effective region(A) and a noneffective region(NA). The radiation plate is located on the noneffective region.
Patent KR-20060126885-A (KR)
Title: Hot blast producing system using waste heat of regenerative thermal oxidizer
Inventor: YU MUN HA
IPC: F23L15/02
Filed: 2006-11-21
Abstract: A hot blast producing system is provided to significantly reduce costs by using waste heat bypassed from a combustion chamber as hot blast for a dryer in an industrial field. A hot blast producing system comprises a combustion chamber(10) for burning noxious gas; a plurality of thermal accumulation chambers(20) arranged in a lower portion of the combustion chamber, shield by a separation wall, and equipped with a thermal accumulation material(21); and a channel converting unit(70) for connecting a noxious gas inlet pipe(33) and a clean air outlet pipe(36) to each thermal accumulation chamber. The combustion chamber is equipped with an overheat prevention bypass pipe. The hot blast producing system further includes a hot air mixer(41) and a hot blast pipe(42). The hot air mixer is connected with a bypass recovery pipe(31) directly extracted outwardly from the combustion chamber and an exhaust branch pipe(37) branched off from the clean air outlet pipe, so that the hot air mixer mixes air of high temperature variation. The hot blast pipe is connected to the hot air mixer, and supplies mixed hot blast to a dryer(2).
Patent KR-20080048349-A (KR)
Title: Method for fabricating liquid crystal display device
Inventor: KWACK HEE YOUNG
IPC: G02F1/13
Filed: 2006-11-28
Abstract: A method for manufacturing an LCD device is provided to dispose LCD panels of various sizes optimally on a single substrate to use the single substrate efficiently, thereby simplifying a manufacturing process and reducing production cost. A method for manufacturing an LCD(Liquid Crystal Display) device comprises the following steps of: disposing each of plural first substrates(101) on a first substrate support(102) to form a first complex substrate; disposing each of plural second substrates(101') corresponding to each first substrate on a second substrate support(102') to form a second complex substrate; proceeding an array process for the first complex substrate and proceeding a color filter process for the second complex substrate; attaching the each first substrate and each second substrate; and separating an attached LCD panel(111) from the first and second supports.
Patent KR-20080055496-A (KR)
Title: One body type spray washer nozzle with housing for vehicle
Inventor: KIM CHOONG YEUL
IPC: B60S1/52
Filed: 2006-12-15
Abstract: A spray washer nozzle in one body with a vehicle housing is provided to be easily designed and manufactured with a simple structure by forming a washer nozzle in one body with a housing. A spray washer nozzle(10) in one body with a vehicle housing includes a nozzle main body(100). The nozzle main body includes a washer liquid inlet(110), a divergent part(130), a sub spray unit(140), washer liquid guides(150), and a main spray unit(120). The washer liquid inlet receives washer liquid from a washer container. The divergent part divides the washer liquid. The sub spray unit has a narrower diameter than the main spray unit for increasing washer liquid flow speed. The washer liquid guides guide the washer liquid between the divergent part and the sub spray unit. The main spray unit is formed on a nozzle main body and sprays the washer liquid.
Patent KR-20080060110-A (KR)
Title: Liquid crystal display device
Inventor: PARK JAE SUNG
IPC: G02F1/1333
Filed: 2006-12-26
Abstract: An LCD(Liquid Crystal Display) is provided to minimize the thickness of a main support by sufficiently ensuring a screw fastening space by forming a screw fastening protrusion unit in an upper cover, thereby minimizing penetration of impurities into the LCD. A main support(102) receives an LC panel(101). An upper cover(103) surrounds the main support. In the upper cover, a screw fastening protrusion unit(103a) protruded to the outside from a side is formed. In a side of a system case, a fixing hole(104a,105a) is located at a location corresponding to the screw fastening protrusion unit. The system case includes at least one of a system front case(105) and a system rear case(104). The system front case is disposed in an upper part and a side part of the LC panel. The system rear case is disposed in a lower part and a side part of the LC panel.
Patent KR-20080061085-A (KR)
Title: High density plasma-chemical vapour deposition chamber
Inventor: LEE SUNG WON
IPC: H01L21/205
Filed: 2006-12-28
Abstract: A high density plasma CVD chamber is provided to increase the yield and quality of a semiconductor device by making uniform the deposition rate and the etch rate at the center and edge of a wafer during a high density plasma CVD process. A plurality of gas supply modules(120) are installed in a high density plasma CVD chamber(110) to supply process gas, cleaning gas and purge gas to the inside of the chamber. First and second injection pipes(121,122) are installed in the gas supply modules to inject the process gas, the cleaning gas and the purge gas respectively supplied from a process gas supply part, a cleaning gas supply part and a purge gas supply part that are positioned in the outside. A heater can be installed in the inner surface of the first injection pipe to remove byproducts. A filter for collecting byproducts can be installed in the first injection pipe.
Patent KR-20080062036-A (KR)
Title: Method for forming semiconductor device
Inventor: JOO SUNG JOONG
IPC: H01L21/31
Filed: 2006-12-29
Abstract: A method for forming a semiconductor device is provided to prevent dishing and use a metal pad as a metal line by preventing a step difference of the metal pad. After forming an insulating layer on a semiconductor substrate(200), a via hole or a trench is formed by performing a damascene process. A metal line(210) is formed by filling a metal into the trench and the via hole, and performing a planarization process thereto. A SiN pattern(212a) is formed by etching, after forming a SiN film on the upper plane of the semiconductor substrate including the metal line. A metal pad(224) is formed by etching, after forming the metal line above the SiN film pattern.
Patent KR-20080062705-A (KR)
Title: Audio encoding and decoding apparatus and method thereof
Inventor: LEE GEON HYOUNG
IPC: G10L19/02
Filed: 2006-12-29
Abstract: An apparatus and a method for encoding and decoding audio signals are provided to code additional base vector components by determining the transmission of the additional base vector components based on coding rates. At least one sine wave is detected from audio signals which are inputted(501). Additional base vector components are calculated using the rest audio signals and an additional base vector of the sin wave(502). It is determined whether or not the additional base vector components are transmitted(503). When the additional base vector components are transmitted, frequency, phase, and/or amplitude of the sine wave and the additional base vector components are coded. The rest audio signals are audio signals except sine waves detected from the inputted audio signals.
Patent KR-20060060660-A (KR)
Title: Fluorescent x-ray analyzer
Inventor: SUMII KOUSHI
IPC: G01N23/223
Filed: 2004-03-31
Abstract: A fluorescent X-ray analyzer for analyzing a sample in an inert gas atmosphere, wherein a spectral chamber need not be substituted with an inert gas, does not communicate with a sample chamber, and can provide a sufficiently intensive secondary X-ray and an analyzer having a long-life partition. The analyzer comprises a sample chamber (1) for storing a sample (4), an irradiation chamber (2) for storing an X-ray source (7) for applying a primary X-ray (6) to the sample (4) and communicating with the sample chamber (1), a spectral chamber (3) for storing a detection means (9) that spectrally separates and detects a secondary X-ray (8) generated from the sample (4), and a partition (10) disposed so as to partition the irradiation chamber (2) from the spectral chamber (3) and allowing the secondary X-ray (8) to pass therethrough, wherein the sample chamber (1) and the irradiation chamber (2) are substituted with an inert gas, and the spectral chamber (3) is vacuum-evacuated.
Patent KR-20060063906-A (KR)
Title: Method for the production of cyclic phosphonic acid anhydrides
Inventor: WEHNER MARK
IPC: C07C237/22
Filed: 2004-07-08
Abstract: Disclosed is a method for producing cyclic phosphonic acid anhydrides of formula (III) by a) reacting phosphonic acid derivatives of formula (I) with acetic anhydride at a temperature ranging between 30 and 150 °C while separating a mixture of ethanoic acid and acetic anhydride by means of distillation, b) then reactively distilling the oligomeric phosphonic acid anhydrides of formula (II) obtained in step a) and transforming the same into the corresponding cyclic trimeric phosphonic acid anhydrides of formula (III), n representing a number between 0 and 300 while R represents allyl, aryl, or open-chain, cyclic, or branched C1 to C8 alkyl radicals, aryloxy, allyloxy, or alkoxy comprising open-chain, cyclic, or branched C1 to C8 alkyl radicals. Preferably, the cyclic trimeric phosphonic acid anhydrides formed in step b) are immediately dissolved in an organic solvent that exhibits an inert behavior relative thereto.