baber/WOPTO huggingface dataset:
Patent KR-20040033342-A (KR)
Title: Macrocyclic compounds containing isoxazoline ring and fluorine and method for preparing same
Inventor: AHN BONG GEUN
IPC: C07D498/22
Filed: 2002-10-14
Abstract: PURPOSE: Macrocyclic compounds containing isoxazoline ring and fluorine and a method for preparing the same are provided. The macrocyclic compounds are useful as a host material in host-guest super molecule chemistry. CONSTITUTION: A method for preparing macrocyclic compounds containing isoxazoline ring and fluorine of the formula(I-a) or (I-b) comprises the steps of: adding a base into dihydroximoyl chloride of the formula(II) as a dipolar precursor in an organic solvent; and adding fluorine containing diacrylates of the formula(IV) as a dipolarophile, wherein n is 1 to 10. The dihydroximoyl chloride of the formula(II) is prepared by reacting isophthaldehyde with NH2OH HCl in an organic solvent and base to prepare dioxime, and reacting dioxime with N-chlorosuccinimide(NCS), and the diacrylates of the formula(IV) is prepared by reacting alkane diols with acryloyl chloride in organic solvent and base.
Patent KR-20030035908-A (KR)
Title: Device for receiving and/or transmitting electromagnetic signals with radiation diversity
Inventor: MINARD PHILIPPE
IPC: H01Q21/08
Filed: 2002-10-16
Abstract: PURPOSE: A device for transmitting and receiving electromagnetic signals having radiation diversity is provided to applied to a slot-type antenna fed by line/slot transition and obtain the radiation diversity. CONSTITUTION: Three annular slots(20,21,22) are adjacent at two points(P1,P2) in pair. The three annular slots(20,21,22) are fed by two feed lines(23,24) to cause a line-slot transition. One feed line(23) passes the point(P1) and the other feed line(24) passes the point(P2). The two feed lines(23,24) are connected at a common port(1) through a T-shaped junction. Diodes(25,26) are provided on free ends of the respective lines, for enabling the simulation of the open or short circuit at the end of one line and enabling the simulation of the open or short circuit at the end of the other line.
Patent KR-20040038144-A (KR)
Title: Method for fabricating capacitor
Inventor: CHUN YEONG IL
IPC: H01L27/108
Filed: 2002-10-31
Abstract: PURPOSE: A method for forming a capacitor is provided to enhance capacitance by widening the surface area of a lower electrode. CONSTITUTION: A semiconductor substrate(100) with a conductive plug(106) is prepared. An insulating layer(110) is formed on the resultant structure to expose the conductive plug. A metal film for a lower electrode is formed on the insulating layer. Grains are formed on the surface of the metal film by annealing. By selectively etching the metal film to expose the insulating layer, a lower electrode(113) with grains is formed. A dielectric film(114) and an upper electrode(116) are sequentially formed on the lower electrode.
Patent KR-20040039652-A (KR)
Inventor: JI YEONG HWAN
IPC: F16F1/36
Filed: 2002-11-04
Abstract: PURPOSE: A rubber bush of a vehicle is provided to absorb vibration from light load by deformation and the space of the embossed part and from heavy load by deformation of the entire rubber with forming the embossed part in the outer periphery of the rubber. CONSTITUTION: A rubber bush is used for a suspension system of a vehicle, and formed by fitting a rubber(12) around a cylindrical steel central shaft(11). An embossed part(13) is formed with protruding plural projections in the outer periphery of the rubber. Impact and vibration are absorbed, and noise is reduced with obtaining the volume of the space between the outer periphery of the rubber and the object in contacting with the embossed part. Shock and vibration from light load are absorbed through the space of the embossed part with deforming the embossed part, and impact from heavy load is absorbed with deforming the rubber entirely.
Patent KR-20040040604-A (KR)
Title: Method of vacuum evaporation and apparatus the same
Inventor: KANG CHANG HO
IPC: H05B33/10
Filed: 2002-11-07
Abstract: PURPOSE: A method and an apparatus for depositing a thin film are provided to optimize the uniformity of the thickness of a deposition layer by limiting a diffusion angle of a deposition material. CONSTITUTION: An apparatus for depositing a thin film includes a deposition chamber(51), a substrate(10), a mask(20), a substrate supporter(60), a deposition port(71), a diffusion angle limit member(80), and a transferring unit(72). The substrate(10) is installed in the inside of the deposition chamber(51). The mask(20) is installed on the substrate. A predetermined pattern is formed on the mask. The substrate supporter(60) is used for supporting and rotating the substrate including the mask. The deposition port(71) is used for heating and vaporizing a deposition material. The diffusion angle limit member(80) is installed at the deposition port or between the deposition port and the mask in order to limit a diffusion angle of the deposition material. The transferring unit(72) moves radially the deposition port.
Patent KR-20040042395-A (KR)
Title: Assembly stairway
Inventor: PARK JEONG HO
IPC: E04F11/02
Filed: 2002-11-14
Abstract: PURPOSE: The prefabricated stairs are provided to shorten a period of construction, to simplify construction work, to reduce the cost required for materials and construction and to easy repair. CONSTITUTION: The prefabricated stairs comprise: many tread bodies(100), as a rectangular frame whose both sides and upper side are opened, provided with one or more finishing plate backing; many stair side plates(200) located/coupled to both sides of the step body(100) and provided with many coupling holes; a pair of stair lateral plates(300) located on both sides of the tread body(100) and coupled with the stair side plate(200); and a finishing plate(400) interposed to the upper part of the tread body(100) to be finished and replaced.
Patent KR-20040046029-A (KR)
Title: torsion beam axle mounting structure of a vehicle
Inventor: WOO SEUNG HUN
IPC: B60G11/18
Filed: 2002-11-26
Abstract: PURPOSE: A mounting structure of a torsion beam axle of a vehicle is provided to improve adjustment stability by inducing understeer of the vehicle with forming toe-in of a wheel against lateral force. CONSTITUTION: A torsion bean bush(7) is installed to a front end of a torsion beam axle(1). A sub frame(9) has the torsion beam bush and a rear extended portion(11) extended to a rear portion of a vehicle. A frame bush(13) fixes a front portion of the sub frame to a vehicle body. A frame rear bush(15) mounts the rear extended portion to the vehicle body further rear than a rotating shaft of a wheel(5) installed to the torsion beam axle.
Patent KR-20040046170-A (KR)
Title: continued prestressed composite beam having a slanted cross-section portion formed in steel and method for continuously constructing the composite beam
Inventor: KIM HOE JUN
IPC: E01D2/02
Filed: 2002-11-26
Abstract: PURPOSE: A continuous prestressed composite beam with an oblique open-cut part formed on steel is provided to keep structural stability by reducing bending moment added on a positive moment member, to secure clearance and conveyance widely and to construct a beautiful bridge by reducing the width of a girder. CONSTITUTION: In the continuous prestressed composite beam with an oblique open-cut part formed on steel, a positive moment member and a negative moment member are manufactured on a section of a span separately. The positive moment member is manufactured by having an upward camber, then adding preflextion load on the manufactured steel to change into downward camber and placing restraint concrete on the lower end of the steel to form lower casing concrete and removing the added preflextion load gradually to induce compressive force. The negative moment member is manufactured by placing lower concrete on steel, connecting steel mutually on a section of a span and placing, curing concrete on a joint.
Patent KR-20030045644-A (KR)
Title: Insulation-film Etching System
Inventor: SAGO YASUMI
IPC: H01L21/3065
Filed: 2002-12-03
Abstract: PURPOSE: To provide an insulating film etching system that can effectively prevent adhesion of particles to a substrate and is excellent in performance. CONSTITUTION: While the substrate 9 is held by a substrate holder 2 provided in a process chamber 1, an etching gas is introduced into the chamber 1 by a gas inlet system 3. An insulating film on the surface of the substrate 9 is etched by the action of an active species and ions contained in a plasma formed by a plasma forming means 4. After completion of the etching, a control section 8 takes out the substrate 9 from the process chamber 1 by a transport robot 51 and evacuates the chamber 1 by an exhaust system. Then the section 8 removes films deposited on exposed surfaces in the chamber 1 by the action of a plasma formed by the plasma forming means 4 by introducing a cleaning gas by the gas inlet system 3. A cooling trap 12 provided at a level lower than the substrate holding surface of the substrate holder 2 is forcibly cooled and causes many films to deposit by collecting gas molecules which tend to deposit. The trap 12 is replaceable and the surface of the trap 12 has irregularity sections to prevent the peeling of deposited films. The surfaces of the irregularity sections are composed of an oxide or insulator.
Patent KR-20040051987-A (KR)
Title: Printer having menu editng function and method of menu editing thereof
Inventor: HAN CHANG MIN
IPC: B41J25/02
Filed: 2002-12-13
Abstract: PURPOSE: A printer having a menu edit function and a menu edit method are provided to improve convenience of use for the printer by setting menu lists according to the order of the frequency of use. CONSTITUTION: A printer(100) includes a control panel section(110), an interface section(120), a storing section(130), a printing section(140) and a control section(150). The control panel section(110) has an input section(112) provided with a plurality of keys for setting various functions of the printer(100) and a display section(114) for displaying an operational state of the printer(100). The display section(114) includes an LCD display window. The interface section(120) is interposed between the control section(150) and a computer. The storing section(130) has a ROM(132) and a RAM(134).
Patent KR-20040054340-A (KR)
Title: Fabrication method of semiconductor device
Inventor: LEE DAE GEUN
IPC: H01L21/308
Filed: 2002-12-18
Abstract: PURPOSE: A method for manufacturing a semiconductor device is provided to uniformly carry out a hole etching process regardless of the etching rate of etching chemical and the thickness of an interlayer dielectric by applying an EPD(End Point Detector) system under the hole etching process. CONSTITUTION: A nitride layer(12) is formed on an interlayer dielectric(11). A photoresist layer is formed on the nitride layer. A photoresist pattern(13) is formed by exposing and developing the photoresist layer. The nitride layer is selectively etched by using the photoresist pattern as an etching mask. Then, the photoresist pattern and the interlayer dielectric are simultaneously etched. The nitride layer exposing point is set as an etching end point. Preferably, the nitride layer has a thickness of 200-800 angstrom. Preferably, the thickness of the photoresist pattern is in the range of 2500-3500 angstrom.
Patent KR-20030053055-A (KR)
Title: A mask layer and dual damascene interconnect structure in a semiconductor device
Inventor: HUANG ROBERT YS
IPC: H01L21/768
Filed: 2002-12-20
Abstract: PURPOSE: A method for fabricating an interconnect structure of a semiconductor device is provided to reduce via contact and chain resistance and improve reliability and yield of a deteriorated device by using a mask layer having four mask films. CONSTITUTION: The first mask film(58) and the third mask film(60) have substantially equal etch rates. The second mask film(59) and the fourth mask film(61) have substantially equal etch rates and are different from that of the etch rate of the first and third mask films. A via is etched to the first mask film. A trench is etched to the third mask film of the mask layer(57). The via and trench are etched in a dielectric material. The second, third and fourth mask films are removed and the first mask film remains a passivation layer for the dielectric material. A conductive metal is deposited in the via and trench.
Patent KR-20040055460-A (KR)
Title: Method for forming LDD region in semiconductor device
Inventor: KWAK NO YEOL
IPC: H01L29/78
Filed: 2002-12-21
Abstract: PURPOSE: A method for forming an LDD(lightly doped drain) of a semiconductor device is provided to form a p-type LDD junction by using a thickness difference of the remaining oxide layer between an open region formed by a corrected spacer and an unopened region. CONSTITUTION: An isolation layer(13) for defining an active region and an isolation region is formed on a silicon wafer(11). A gate oxide layer(15) and a gate electrode(17) are formed on the active region of the silicon wafer. An insulation layer spacer(19) is formed on a part of the surface of the active region of the silicon substrate including the gate electrode and the gate oxide layer. An ion implantation process is performed on the active region of the silicon wafer by using the insulation layer spacer as a mask so that an ion implantation layer is formed in the silicon wafer. The ion implantation layer is activated by an annealing process to form an LDD region(21a) and a source/drain region(21) in the silicon wafer.
Patent KR-20040059522-A (KR)
Title: Method for cooling sinter
Inventor: JUNG JIN GYEONG
IPC: C22B1/26
Filed: 2002-12-27
Abstract: PURPOSE: A method for cooling sintered ore is provided to prevent damage of sintered ore transporting facility due to cooling defect by separately spraying mist and cooling water together with cold air onto sintered ore in cooling car and improve energy use efficiency by supplying high temperature air into boiler, thereby recycling the air. CONSTITUTION: The method comprises first cooling step of cooling sintered ore by supplying and spraying cold air and mist onto sintered ore from a lower part of transfer car of cooler for cooling sintered ore(120); a temperature measuring step of measuring surface temperature of sintered ore passing through the first cooling step; second cooling step of additionally cooling red-heat part of sintered ore by supplying and spraying cold air and cooling water onto sintered ore from an upper part of the transfer car of cooler if the surface temperature of sintered ore is higher than discharge temperature of sintered ore; and a step of using heat of high temperature by supplying high temperature air generated in the first and second cooling steps into boiler(160), wherein mist (m) sprayed in the first cooling step is sprayed through a plurality of mist nozzles(20) installed at a lower side of transfer car(102) of cooler(100) and electrically connected to control part (C), the surface temperature of sintered ore passing through the first cooling step is measured by a non-contact type infrared temperature sensor(10) electrically connected to the control part, wherein discharge temperature of sintered ore is 100 deg.C or less, and cooling water sprayed in the second cooling step is sprayed through cooling water spray nozzle(30) installed in an upper part of the cooler and electrically connected to the control part.
Patent KR-20040058632-A (KR)
Title: Plasma display panel having getter within
Inventor: KANG GYEONG DU
IPC: H01J11/52
Filed: 2002-12-27
Abstract: PURPOSE: A plasma display panel is provided to lengthen the useful life of the panel by effectively removing impurity gases generated from an effective screen. CONSTITUTION: A plasma display panel comprises a front substrate(10) and a rear substrate(20) opposed each other with a gap formed therebetween; a plurality of address electrodes(21) arranged on the surface of the rear substrate opposed to the front substrate; a plurality of discharge sustain electrodes(12) arranged on the surface of the front substrate opposed to the rear substrate, in the direction crossing the address electrodes; a barrier rib(25) interposed between the front substrate and the rear substrate so as to define a plurality of discharge cells(27R,27G,27B), wherein the discharge cells form a display area in which address electrodes and the discharge sustain electrodes cross with each other and bring about a display discharge, and a non-display area arranged in the vicinity of the display area; and a getter(32) arranged in the non-display area so as to remove impurity gases.
Patent KR-20040058950-A (KR)
Title: Method of forming a metal wiring in a semiconductor device
Inventor: KO CHANG JIN
IPC: H01L21/28
Filed: 2002-12-27
Abstract: PURPOSE: A method for forming a metal line of a semiconductor device is provided to prevent a dishing phenomenon and an erosion phenomenon due to a CMP process by forming the metal line without the CMP process. CONSTITUTION: A metal barrier layer(203) and a metal seed layer(204) are formed on a semiconductor substrate(201). Photoresist patterns including a metal line region are formed on the metal seed layer. A gap between the photoresist patterns is buried by a metal plating layer(206). The photoresist patterns are removed therefrom. The exposed metal seed layer is removed. The exposed metal barrier layer is removed. An insulating layer is formed on the entire surface of the semiconductor substrate including the metal line.
Patent KR-20040061858-A (KR)
Title: Delay circuit capable of adjusting a delay rate
Inventor: LEE JONG CHEON
IPC: H03K17/00
Filed: 2002-12-31
Abstract: PURPOSE: A delay circuit capable of controlling a delay rate is provided to increase accuracy of delay adjustment by controlling a delay rate according to a control signal for controlling a gate voltage. CONSTITUTION: A resistor(R11) is provided between inverters(INV11,INV12). A resistor(R12) is provided between inverters(INV12,INV13). A MOS(Metal Oxide Semiconductor) capacitor(MC11) is provided between the resistor(R11) and the inverter(INV12). A drain and a source of the MOS capacitor(MC11) are commonly connected to a node between the resistor(R11) and the inverter(INV12). A control signal(CON) is applied to a gate of the MOS capacitor(MC11). A MOS capacitor(MC12) is provided between the resistor(R12) and the inverter(INV13). A drain and a source of the MOS capacitor(MC12) are commonly connected to a node between the resistor(R12) and the inverter(INV13). The control signal(CON) is applied to a gate of the MOS capacitor(MC12).
Patent KR-20020040787-A (KR)
Title: New effectors of dipeptidyl peptidase Ⅳ for topical use
IPC: C07K5/037
Filed: 2000-08-20
Abstract: Amino acid cyclic amide derivatives (I) are new. Amino acid cyclic amide derivatives of formula (I) are new. B-A-C (I) A : an alpha -amino acid with a side-chain functional group; B : a molecule covalently bonded to the side-chain functional group of A, selected from oligopeptides with a chain length of up to 20 amino acids, polyethylene glycol (PEG) with a molecular weight of up to 20,000, optionally substituted organic amines, amides, alcohols, acids or aromatics with 8-50 C atoms; C : a thiazolidine (Thia), pyrrolidine, hydroxyproline, dehydroproline or piperidine group forming an amide bond with A. ACTIVITY : Antiinflammatory; antiallergic; dermatological; antiarthritic; antipsoriatic; immunomodulator; cytostatic. MECHANISM OF ACTION : Dipeptidyl peptidase IV (DP IV) modulator. The serum DP IV activity of rats after oral administration of 5 mu M Glu(PEG)-Thia was increased by almost 10% after 20 minutes and then decreased to 90% of the initial level over the next 100 minutes.
Patent KR-20020042665-A (KR)
Title: Colloidal photonic crystals
IPC: G02B6/12
Filed: 2000-09-05
Abstract: A method of growing robust large area colloidal photonic crystals and devices produced thereby. A suspension of monosized colloidal spheres (1) is subjected to a composite shear (6) by applying a sequential set of shearing forces. The crystalline layers within the colloid experience shearing forces with components in both x and y directions, forcing the colloid into a singe face-centered-cubic structure in preference to a twinned face-centered-cubic structure. The method may also comprise the use of a dispersion medium which is capable of undergoing a controllable phase change from a liquid phase to a solid phase. The crystal may be fixed into a single face-centered cubic structure.
Patent KR-20020059422-A (KR)
IPC: A61B5/06
Filed: 2000-11-28
Abstract: 본 발명은 미리선택된 내부 개구부의 제 1 및 제 2 신장 직경의 빠르고 정확한 결정을 제공하도록 환자의 미리선택된 내부 개구부를 측정하기 위한 치수 카테터(10) 및 방법에 관한 것이다.  치수 카테터(10)는 얇고 팽창가능한 가소성 재료로 구성된 팽창 풍선(26)을 포함하고, 상기 풍선은 팽창가능하고, 미리선택된 개구부의 크기를 결정하는데 이용된다.  팽창 풍선(26)은 관형축(12)의 말단부(16)에 인접하여 관형축(12)에 부착되어 있다.  팽창 풍선(26)은 팽창 역치로 팽창하고, 팽창 풍선(26)은 미리선택된 개구부 주위에서 변형해서, 미리선택된 개구부에 인접한 팽창 풍선(26)의 크기는 미리선택된 개구부의 제 1 신장 직경에 접근하게 된다.  치수 카테터(10) 및 방법은 미리선택된 개구부내에 위치되는 적절한 크기의 장치를 결정하는데 이용될 수 있다.
Patent KR-20020077365-A (KR)
IPC: H01M4/38
Filed: 2000-12-20
Abstract: 본 발명은 (ⅰ) 리튬을 함유하는 애노드; (ⅱ) 전기활성 황-함유 물질을 함유하는 캐쏘드; 및 (ⅲ) 상기 애노드와 캐쏘드 사이에 삽입된 액체 전해질을 포함하는, 방전된 리튬 전기화학 전지의 사이클 수명을 증가시키는 방법으로, 하기의 단계를 포함하는 방법을 제공한다: (a) 전지를 전지 전압이 2.1 내지 2.3 V의 범위에 이르도록 0.2 mA/㎠ 미만의 초기 저속에 이어서 (b) 이어지는 상기 전지를 전지 전압이 2.4 V 이상에 이르도록 0.2 mA/㎠ 초과의 고속으로 충전시킴.
Patent KR-20020067563-A (KR)
IPC: C08G63/88
Filed: 2000-11-29
Abstract: 지방족 폴리에스테르 중합체의 제1 성분 및 멀티카르복실산의 제2 성분을 제공하고, 제1 성분인 지방족 폴리에스테르 중합체 및 제2 성분인 멀티카르복실산을 혼합하여 미반응된 특정 열가소성 조성물을 형성시키고, 압출기 또는 혼합기 중에서 미반응된 특정 열가소성 조성물을 용융 블렌딩시키는 것을 포함하는 합성 섬유의 제조 방법이 기재된다.  제2 성분인 멀티카르복실산은 압출기를 윤활시키고, 특정 열가소성 조성물을 결정화시켜 약 120 옹스트롬 미만의 평균 결정 크기를 형성시키기 위한 핵제를 제공한다.  특정 열가소성 조성물로 구성된 섬유는 약 120 옹스트롬 미만의 평균 결정 크기를 갖는다.  섬유는 약 55 ℃ 미만의 유리 전이 온도(Tg)를 갖는다.  한 면에서, 폴리락트산 제1 성분 및 아디프산 제2 성분은 체액의 흡수 및 제거를 위한 생분해성 및 퇴비화가능한 일회용 흡수 제품에 사용되는 부직 구조물 중의 합성 섬유를 제공한다.
Patent KR-20020071945-A (KR)
Title: Packaging material made of a biaxially oriented polyolefin film
IPC: B65D65/16
Filed: 2001-01-23
Abstract: The invention relates to a packaging material made of a multilayer oriented polyolefin film, which comprises a base layer and at least one first outer layer, whereby the first outer layer is placed in contact with itself or in contact with the opposing surface of the film or in contact with the surface of another film. This first outer layer contains an additive which absorbs light within the wavelength range of a laser such that when the film is locally irradiated by the laser, the area of irradiation experiences an increase in temperature that causes the polyolefin of the first outer layer to soften or melt in the irradiated area and to bond to another layer when cooled.
Patent KR-20020086606-A (KR)
IPC: F03D80/00
Filed: 2000-11-28
Abstract: The invention concerns a wind power installation comprising a rotor which is coupled to a generator within a machine housing. Such wind power installations have already long been known, for example the wind power installations of types E-40 and E-66 from Enercon, Aurich.
Patent KR-20020093942-A (KR)
IPC: A61K31/506
Filed: 2001-04-26
Abstract: Compounds according to formula (1), wherein R<SUP>1 </SUP>is H or CN, X<SUP>1 </SUP>is S, O, SO<SUB>2 </SUB>or CH<SUB>2</SUB>, X<SUP>2 </SUP>is CO, CH<SUB>2 </SUB>or a covalent bond, Het is a nitrogen-containing heterocycle and n is 1-5 are new. The compounds of the invention are inhibitors of dipeptidyl peptidase IV. Pharmaceutical compositions of the compounds of the invention, or pharmaceutically acceptable salts thereof, are useful in the treatment of, inter alia, type 2 diabetes
Patent KR-20030007695-A (KR)
IPC: H04N5/232
Filed: 2002-03-13
Abstract: 본 발명은 자동 비디오 추적 시스템에서 목표물을 선택하기 위한 방법에 관한 것이다. 본 방법은, 추적될 목표물이 있는 장면의 비디오 이미지 데이터를 디스플레이하는 단계와; 상기 비디오 이미지 데이터의 한 프레임을 디스플레이하기 위해 상기 비디오 이미지 데이터를 정지시키는 단계와; 상기 비디오 이미지 데이터의 상기 프레임에서 원하는 목표물을 선택하는 단계를 포함한다. 또한, 자동 비디오 추적 시스템에서 목표물을 선택하기 위한 장치와, 이러한 방법 및 장치를 사용하는 자동 비디오 추적 시스템이 제공된다.
Patent KR-20030020292-A (KR)
IPC: H01M50/417
Filed: 2001-06-04
Abstract: 전기화학소자에 넓은 온도범위에 있어서의 뛰어난 밀봉성을 부여하기 위해서, 고무성분 및 점착부여제로 이루어지는 전기화학소자용 봉지제로서, 상기 고무성분이 부틸 고무 및 폴리이소부틸렌 고무의 적어도 하나로 이루어지며, 상기 점착부여제가 테르펜계 수지, 지방족계 석유수지 및 지환식계 석유수지로 이루어진 군에서 선택된 적어도 1종으로 이루어지는 봉지제를 사용한다.