baber/WOPTO huggingface dataset:
Patent TW-202041957-A (TW)
Inventor: LIN YU-CHEN
IPC: G03B21/14
Filed: 2019-05-13
Abstract: A projection device includes a light source, a light homogenization element, an LCD panel and a projection lens. The light homogenization element is disposed downstream. The light homogenization element has a light-emitting surface and a light incident surface at two ends. A cross-section of the light homogenization element crosses an edge of the light incident surface to form a first point and crosses an edge of the light-emitting surface to form a second point. At least a part of a track between the first point and the second point through a reflective surface of the light homogenization element is an arc line.
Patent TW-202044932-A (TW)
Title: Heat dissipation structure and neutron beam generating device using the same
Inventor: YEH JYI-TYAN
IPC: A61N5/10
Filed: 2019-05-16
Abstract: A heat dissipation structure includes a housing. The housing has a bottom surface, a liquid inlet channel, a liquid outlet channel, and a rising portion. The liquid inlet channel and the liquid outlet channel are located at two opposite ends of the housing and above the bottom surface, and the liquid inlet channel and the liquid outlet channel extend along a first direction. The rising portion is located between the liquid inlet channel and the liquid outlet channel and above the bottom surface, and the 
rising portion rises away from the bottom surface. The rising portion has a rising surface facing away from the bottom surface, and a distance between the rising surface and the bottom surface is increased first and then decreased along the first direction.
Patent TW-202000599-A (TW)
Title: 被處理水中之硼除去方法、硼除去系統、超純水製造系統及硼濃度之測定方法
Inventor: NAKAMURA YUKI
IPC: C02F1/58
Filed: 2019-05-17
Abstract: 一種被處理水中之硼除去方法，包含以下步驟：將該被處理水進行逆滲透膜處理的步驟；將該逆滲透膜處理之滲透水的至少一部分進行去陽離子處理的步驟；及測定該去陽離子處理後之該滲透水中的硼濃度的步驟。該硼除去方法，係基於該硼濃度測定值，而控制以下(a)～(e)中的至少一者：(a)該逆滲透膜處理中之該被處理水的回收率；(b)該被處理水的溫度；(c)該被處理水的pH值；(d)施加於該逆滲透膜處理之逆滲透膜的該被處理水的供給壓力；及(e)用於該逆滲透膜處理之逆滲透膜的更換時期。
Patent TW-202046536-A (TW)
Title: Active material of anode of lithium ion battery, anode of lithium ion battery and lithium ion battery
Inventor: CHANG JUI-SHEN
IPC: H01M4/38
Filed: 2019-06-12
Abstract: Active material of anode of lithium ion battery includes silicon, tin and copper-zinc alloy, in which the tin is substantially an elemental state.
Patent TW-202019087-A (TW)
Title: 橫向激發薄膜體聲波共振器
Inventor: PLESSKI VIKTOR
IPC: H03H9/25
Filed: 2019-06-14
Abstract: 本發明揭示聲波共振器器件及濾波器。一濾波器包含一基板及一壓電板，該壓電板具有平行之前表面及後表面，該後表面附接至該基板。一導體圖案形成於該前表面上，該導體圖案包含各自複數個共振器之複數個交叉指形傳感器(IDT)，其中該複數個IDT之各者之交錯指狀部安置於懸置於形成於該基板中之一或多個腔上方之該壓電板之各自部分上。該複數個共振器包含一並聯共振器及一串聯共振器。安置於該並聯共振器之該IDT之該等指狀部之間的一第一介電層之一第一厚度大於安置於該串聯共振器之該IDT之該等指狀部之間的一第二介電層之一第二厚度。
Patent TW-202005997-A (TW)
Title: Modified conjugated diene-based polymer and rubber composition including the same
Inventor: LEE RO-MI
IPC: C08K3/04
Filed: 2019-07-10
Abstract: The present invention relates to a modified conjugated diene-based polymer, and more particularly, a modified conjugated diene-based polymer with the following conditions of (i) to (v): (i) a glass transition temperature: -90 DEG C to -50 DEG C, (ii) a mooney viscosity measured in ASTM D1646 conditions: 50 to 100, (iii) a 1,2-vinyl bond content with respect to a total weight of a polymer: 30.0 wt% or less, (iv) molecular weight distribution (PDI; MWD): 1.5 to 3.5, and (v) a mooney relaxation ratio measured at 110 DEG C: 0.7 or less, and a rubber composition including the same.
Patent TW-202013522-A (TW)
Title: Method fabrication of a multi-gate semiconductor device
Inventor: CHIANG KUO-CHENG
IPC: H01L21/336
Filed: 2019-07-11
Abstract: A method for fabricating a semiconductor device includes providing a fin in a first region of a substrate. The fin includes a plurality of a first type of epitaxial layers and a plurality of a second type of epitaxial layers. A portion of a layer of the second type of epitaxial layers in a channel region of the first fin is removed to form a first gap between a first layer of the first type of epitaxial layers and a second layer of the first type of epitaxial layers. A first portion of a first gate structure is formed within the first gap and extending from a first surface of the first layer of the first type of epitaxial layers to a second surface of the second layer of the first type of epitaxial layers. A first source/drain feature is formed abutting the first portion of the first gate structure.
Patent TW-202010821-A (TW)
Title: Slurry, polishing solution production method, and polishing method
Inventor: KUKITA TOMOMI
IPC: H01L21/304
Filed: 2019-07-24
Abstract: This slurry comprises abrasive grains and a liquid medium, wherein: the abrasive grains include first particles and second particles that are in contact with the first particles; the first particles contain cerium oxide; the second particles contain a cerium compound; and the value of Rsp calculated by formula (1) is at least 1.60. Formula (1): Rsp=(Tb/Tav)-1 [in the formula, Tav represents a relaxation time (unit: ms) obtained by performing pulse NMR measurement on the slurry when the content of the abrasive grains is 2.0 mass%, and Tb represents a relaxation time (unit: ms) obtained by performing pulse NMR measurement on a supernatant resulting from subjecting the slurry containing the abrasive grains in an amount of 2.0 mass% to centrifugation at a centrifugal acceleration of 2.36*105 G for 50 minutes].
Patent TW-202017930-A (TW)
Inventor: DIEV VIACHESLAV V
IPC: C08G73/10
Filed: 2019-08-06
Abstract: Disclosed is a polyanhydride having Formula I: .
In Formula I: R 1 
and R 2 
are the same or different at each occurrence and are F, CN, alkyl, fluoroalkyl, alkoxy, fluoroalkoxy, silyl, siloxy, unsubstituted or substituted hydrocarbon aryl, unsubstituted or substituted heteroaryl, or unsubstituted or substituted aryloxy; R 3 
and R 4 
are the same or different and are A 3 
, A 4 
, H, F, CN, alkyl, fluoroalkyl, alkoxy, fluoroalkoxy, silyl, siloxy, unsubstituted or substituted hydrocarbon aryl, unsubstituted or substituted heteroaryl, or unsubstituted or substituted aryloxy; R 5 
and R 6 
are the same or different and are H, F, CN, alkyl, fluoroalkyl, alkoxy, fluoroalkoxy, silyl, siloxy, unsubstituted or substituted hydrocarbon aryl, unsubstituted or substituted heteroaryl, and unsubstituted or substituted aryloxy; R 8 
is selected from the group consisting of alkyl, silyl, unsubstituted or substituted hydrocarbon aryl, or unsubstituted or substituted heteroaryl; c and d are the same or different and are an integer from 0 to the maximum available; m and n are the same or different and are 0 or 1; A 1 
to A 4 
are the same or different and have the formula  ; single dashed lines between two rings indicate that the rings are joined by a single bond or fused together at any available position; L is a bond or a hydrocarbon aryl; and at least two A groups are present.
Patent TW-202107108-A (TW)
Title: Residual power estimation method
Inventor: CHEN CHUAN-YI
IPC: G01R31/36
Filed: 2019-08-08
Abstract: A residual power estimation method is applied to a lithium battery. The estimation method includes the following steps: monitoring a charging current of the lithium battery, and corresponding to a charging rate according to the charging current; after the charging of the lithium battery, Estimating a maximum discharge amount according to the magnitude of the charging current and the charging rate; and estimating a residual amount of the lithium battery by using the maximum discharge amount and a discharge current of the lithium battery.
Patent TW-202109757-A (TW)
Title: Circuit arrangement structure of edge of glass substrate and manufacturing method thereof
Inventor: WOO KYEONG-KEUN
IPC: C23C14/34
Filed: 2019-08-21
Abstract: A circuit arrangement structure of edge of glass substrate and a manufacturing method thereof are provided. The circuit arrangement structure of edge of glass substrate includes a glass substrate and a plurality of metal lines. Each side of the glass substrate has a inclined plane, and a leading angle is formed between the front surface and the inclined plane of the glass substrate, and the angle of the lead angle is 45 ∘ to 89 ∘. A plurality of metal lines are disposed on the glass substrate from the front surface of the glass substrate via the inclined surface to the back surface of the glass substrate.
Patent TW-202038439-A (TW)
Title: Three-dimensional memory devices and fabrication methods thereof
Inventor: XIAO LI-HONG
IPC: H01L27/11551
Filed: 2019-08-26
Abstract: The embodiment of method of forming three-dimensional memory includes following steps. First, forming initial channel holes in a stack structure of alternating first layers and second layers on a substrate. Forming shift features between lateral surfaces of each first layer and each second layer on sidewalls of the initial channel holes to form channel holes. Further forming semiconductor channels by filling the channel holes with channel forming structures. The semiconductor channel is provided with memory layer including first memory portions surrounding bottom of each second layer and second memory portions connecting adjacent first memory portions. The first memory portions and the second memory portions may stagger along a vertical direction.
Patent TW-202025778-A (TW)
Inventor: YE YAN
IPC: H04N19/577
Filed: 2019-08-28
Abstract: Video encoding and decoding techniques for bi-prediction with weighted averaging are disclosed. According to certain embodiments, a computer-implemented video signaling method includes signaling, by a processor to a video decoder, a bitstream including weight information used for prediction of a coding unit (CU). The weight information indicates: if weighted prediction is enabled for a bi-prediction mode of the CU, disabling weighted averaging for the bi-prediction mode.
Patent TW-201946047-A (TW)
Title: Display device and electronic device including the same
Inventor: UMEZAKI ATSUSHI
IPC: H03K19/003
Filed: 2009-11-26
Abstract: It is an object to decrease the number of transistors connected to a capacitor. In a structure, a capacitor and one transistor are included, one electrode of the capacitor is connected to a wiring, and the other electrode of the capacitor is connected to a gate of the transistor. Since a clock signal is input to the wiring, the clock signal is input to the gate of the transistor through the capacitor. Then, on/off of the transistor is controlled by a signal which synchronizes with the clock signal, so that a period when the transistor is on and a period when the transistor is off are repeated. In this manner, deterioration of the transistor can be suppressed.
Patent TW-202112147-A (TW)
Inventor: TANAKA HIROSHI
IPC: H04R31/00
Filed: 2019-09-11
Abstract: 本發明之課題在於提供一種彎曲振動板揚聲器系統，其係具有滿足聽力障礙者以及聽力正常者之性能更高的性能且高品質者。
 
     
     
       本發明之解決手段為，一種揚聲器單元10，係至少具備形成為錐狀之第一振動板1、彎曲之片狀的第二振動板2、及一起驅動第一振動板與第二振動板之驅動器單元3。第一振動板之小徑側1a及第二振動板之一端側2a係與驅動器單元連接。該揚聲器單元在裝設於框體50並作為揚聲器100時，第一振動板之大徑側1b係與構成框體一部分之支撐構件51之支撐板511連接，第二振動板之另一端側2b係與構成框體一部分之支撐構件之支腳513連接。
Patent TW-202020221-A (TW)
Title: Vacuum processing apparatus
Inventor: SUZUKI KOJI
IPC: C23C16/56
Filed: 2019-09-18
Abstract: Provided is a vacuum processing apparatus configured so that a movable deposition-preventing plate provided inside a vacuum chamber can be cooled with a simple structure. This vacuum processing apparatus SM, which has a vacuum chamber 1 and performs a prescribed vacuum processing on a substrate Sw to be processed that has been set inside said vacuum chamber, is provided with deposition-preventing plates 8 inside the vacuum chamber, the deposition-preventing plates being configured from a fixed deposition-preventing plate 81, which is fixedly disposed in the vacuum chamber, and a movable deposition-preventing plate 82, which moves freely in one direction, and also comprises: a metal block member 9, which is erected on an inner wall surface 13 of the vacuum chamber; and a cooling means 11 for cooling the block member. The apparatus is configured so that the top surface 91 of the block member approaches or contacts the movable deposition-preventing plate at the processing position of the movable deposition-preventing plate at which the prescribed vacuum processing is performed on the substrate on which a film is being formed.
Patent TW-202040750-A (TW)
Inventor: CHU SCHUBERT
IPC: H01L21/762
Filed: 2019-09-23
Abstract: Embodiments described herein generally provide improved silicon-on-insulator (SOI) substrates for RF integrated circuits and methods for fabricating the same. In one embodiment, a method for forming a multilayer structure is provided. The method includes forming an intrinsic silicon layer on a handle substrate in a process chamber, wherein the handle substrate is a standard semiconductor substrate having a first resistivity, and the intrinsic silicon layer having a second resistivity higher than the first resistivity, forming a charge trapping layer on the intrinsic silicon layer in the process chamber, bonding the handle substrate to an active substrate comprising a device layer and an insulating layer, wherein the insulating layer of the active substrate is in physical contact with the charge trapping layer, and removing at least a portion of the handle substrate.
Patent TW-202023719-A (TW)
Title: End mill and manufacturing method thereof
Inventor: NAKAICHI MAKOTO
IPC: B23C5/10
Filed: 2019-09-23
Abstract: An end mill which has excellent strength and durability, and which, while having a small diameter, comprises multiple cutting blades well attached to the main body, and a simple manufacturing method thereof are provided. This end mill comprises: a main body in which multiple embedding areas are provided and which rotates around a rotation axis; and multiple cutting blades which are embedded and fixed in the multiple embedding areas and which are configured as the outermost diameter. In this end mill, the cutting blades include a sintered diamond, the twist angle of the cutting blades is 0 DEG, and the outer diameter is less than 10 mm. The cutting blades are embedded and fixed in the embedding areas such that the extension lines of the cutting blades do not pass through the rotation axis. This end mill manufacturing method involves embedding the cutting blades in the embedding areas of the main body, and fixing the cutting blades in the embedding areas by vacuum brazing or high-frequency brazing in a state in which the cutting blades have been embedded in the embedding area.
Patent TW-202028344-A (TW)
Title: Thermosetting resin composition
Inventor: MINEZAKI CHIKA
IPC: H01L23/31
Filed: 2019-09-26
Abstract: Provided is a thermosetting resin composition which exhibits low water absorption and excellent reflow resistance properties without compromising heat resistance or moldability. This thermosetting resin composition contains a polyalkenylphenol compound (A), a polymaleimide compound (B), a liquid polybutadiene compound (C) and a radical initiator (D). The liquid polybutadiene compound (C) has structural units represented by formula (1)-1 and, optionally, structural units represented by formula (1)-2 and, optionally, structural units other than the structural units represented by formula (1)-1 and formula (1)-2. If the average number of structural units represented by formula (1)-1 per molecule is denoted by m, the average number of structural units represented by formula (1)-2 per molecule is denoted by n and the average number of structural units other than the structural units represented by formula (1)-1 and formula (1)-2 is denoted by w, the value of m/(m+n+w) is 0.15-1.
Patent TW-202027143-A (TW)
Inventor: YEONG SAI-HOOI
IPC: H01L21/28
Filed: 2019-09-27
Abstract: A method of forming a semiconductor device includes providing a substrate; forming mandrel patterns over the substrate; forming sacrificial patterns in openings between the mandrel patterns; removing the mandrel patterns; forming a dielectric layer in openings between the sacrificial patterns; removing the sacrificial patterns, resulting in a plurality of trenches; and forming a gate stack in each of the plurality of trenches.
Patent TW-202028877-A (TW)
Inventor: TIEN FU-AN
IPC: G03F7/20
Filed: 2019-09-27
Abstract: In a method of optimizing a lithography model in a lithography simulation, a mask is formed in accordance with a given layout, a wafer is printed using the mask, a pattern formed on the printed wafer is measured, a wafer pattern is simulated using a wafer edge bias table and the given mask layout, a difference between the simulated wafer pattern and the measured pattern is obtained, and the wafer edge bias table is adjusted according to the difference.
Patent TW-202015385-A (TW)
Title: System and method for receiving quadrature amplitude modulation symbol
Inventor: ETEZADI FARROKH
IPC: H04L27/38
Filed: 2019-10-08
Abstract: A system and method for receiving a quadrature amplitude modulation symbol. In some embodiments, the symbol has a plurality of bits and is associated with a point in a constellation of quadrature amplitude modulation points, each point of the constellation having associated with a binary word. The method includes receiving a first analog signal carrying a modulation; performing initial estimation, to generate a first initial modulation estimate, for a portion of the first analog signal carrying a modulation; identifying, based on the first initial modulation estimate, a row of an initial candidate lookup table, the row corresponding to a region of the constellation; and reading from the row of the initial candidate lookup table a first plurality of initial candidate points of the constellation.
Patent TW-202017468-A (TW)
Title: Cutting tool
Inventor: SCHENK CHRISTOPH
IPC: B26B13/16
Filed: 2019-10-17
Abstract: A cutting tool (100) includes a first lever (110) having a first cutting blade (114). Further, the cutting tool (100) includes a gear portion (116) associated with the first cutting blade (114). The cutting tool (100) includes a second cutting blade (124) pivotally coupled to the first lever (110). The cutting tool (100) includes a gear lever (130) pivotally coupled to the second cutting blade (124) and the second handle portion (122). The cutting tool (100) is characterized in that the second lever (120) includes a first cut-out portion (202). The gear lever (130) includes a second cut-out portion (204). Further, the adjustment mechanism (140, 500) includes at least one protrusion (210, 506) to selectively abut with any of the first cut-out portion (202) and the second cut-out portion (204). The cutting tool (100) includes a selection mechanism (142, 502) to selectively align the at least one protrusion (210, 506).
Patent TW-202031800-A (TW)
Title: Fiber-reinforced resin material and production method therefor
Inventor: FUSE Mitsuki
IPC: C08J5/04
Filed: 2019-10-24
Abstract: A fiber-reinforced resin material which comprises a matrix resin and reinforcing fiber bundles A comprising chopped fiber bundles each including 100 or more single fibers and is for use in molding fiber-reinforced resins, characterized in that the product of the average porosity within the fiber bundles Pfav (-) and the average fiber-bundle thickness tfav (mm) is 0-0.01 mm and the composite has a porosity Pc (-) of 0.02-0.4; and a method for producing the fiber-reinforced resin material. It is possible to provide a fiber-reinforced resin material as a molding material excellent in terms of production efficiency and reduction in LCA, the resin material being capable of giving molded objects with high mechanical properties and having excellent flowability during molding.
Patent TW-202116495-A (TW)
Title: Lockable torque wrench with indication function
Inventor: GUO WUN-JIN
IPC: B25B23/143
Filed: 2019-10-25
Abstract: A lockable torque wrench with indication function includes a shaft, a handle, a plurality of rollers, rotary ring, and an engagement member. The shaft is inserted into the handle, and rotatable and stretchable with respect to the handle for adjusting the operation torque of the head portion. The rotary ring is mounted around the metal pipe of the handle from the outer side of the rollers, and able to rotate with respect to the metal pipe and switched between a press position and a release position. When the rollers ascend, the first and second grooves provide an allowance space with a deep section for the rollers to ascend. When the rollers descend, the first and second grooves resists the rollers against the shaft with a shallow section, and the engagement member pressurizes the rollers, so as to generate a stage sensation during the rotation between the handle against the shaft.
Patent TW-202109804-A (TW)
Title: Bonding structure and method of forming same
Inventor: CHEN HSIEN-WEI
IPC: H01L21/50
Filed: 2019-10-25
Abstract: A device includes an interconnect structure over a substrate, multiple first conductive pads over and connected to the interconnect structure, a planarization stop layer extending over the sidewalls and top surfaces of the first conductive pads of the multiple first conductive pads, a surface dielectric layer extending over the planarization stop layer, and multiple first bonding pads within the surface dielectric layer and connected to the multiple first conductive pads.
Patent TW-202030406-A (TW)
Title: Composite rebar
Inventor: Li shou-jie
IPC: B29C70/40
Filed: 2019-10-30
Abstract: An improved shaped composite rebar is disclosed.
Patent TW-202119770-A (TW)
Title: Transceiver device
Inventor: LEE CHIA-YI
IPC: H04B1/38
Filed: 2019-11-07
Abstract: A transceiver device includes a digital baseband circuit, a first circuit portion, and a second circuit portion. The digital baseband circuit is configured to analyze a power of an input signal, in order to generate a first control signal and a second control signal. The first circuit portion has a first gain, and is configured to be selected according to the first control signal, in order to process the input signal to generate output signals. The second circuit portion has a second gain higher than the first gain, and is configured to be selected according to the second control signal, in order to process the input signal to generate the output signals. The first circuit portion includes an N-way filter circuit, and the N-way filter circuit is configured to modulate the input signal according to first oscillating signals to perform a filtering operation.
Patent TW-202033684-A (TW)
Inventor: KOSHIJI Kenjiro
IPC: C09D11/54
Filed: 2019-11-15
Abstract: 本發明為關於一種導電基板，其具備基材及含有銀或銅的至少任1種的金屬配線。該導電基板在金屬配線的一部分或全部的表面上形成有抗反射區域。該抗反射區域係以含有銀或銅的至少任1種的粗化粒子及埋設於粗化粒子之間的較粗化粒子更微細的黑化粒子來構成。黑化粒子含有銀或是銀化合物、銅或是銅化合物、或碳或是含碳率25重量%以上的有機物。然後，抗反射區域的表面的中心線平均粗糙度為15nm以上70nm以下。以形成粗化粒子的金屬印墨來形成金屬配線後，再與包含黑化粒子的黑化印墨塗佈，藉此來製造本發明相關的導電基板。本發明的導電基板的金屬配線係抑制了光反射，故難以辨識金屬配線的存在。
Patent TW-202031515-A (TW)
Inventor: STUDER ANTHONY D
IPC: B41J2/175
Filed: 2019-11-15
Abstract: 本說明書揭示一種可列印液體供給匣，其包含一包圍一內部容積的殼體。該殼體具有一前端部以連接至一列印機以及由該前端部延伸至一後端部的第一及第二側邊。該前端部具有一可列印液體出口較為接近該底部而非該頂部以及具有一氣體入口位在該可列印液體出口上方，該可列印液體出口及該氣體入口之每一者用以促進一個別的流體筆插入於其中。具有一位在該氣體入口上方該前端部中的凹部，該凹部係藉由具有一內部側邊及一外部側邊的一係為該第一側邊之一部分的第一壁劃定。一I2C數據介面，其包含至少三電氣連接墊在該第一壁面向該凹部的該內部側邊上露出，該等連接墊係沿著頂部至底部的一方向布置。
Patent TW-202029232-A (TW)
Title: Laminated transformer and making method thereof
Inventor: DAI KE
IPC: H01F41/04
Filed: 2019-12-10
Abstract: The invention provides a laminated transformer comprising magnetic layers, winding layers laminated between the two magnetic layers, and non-magnetizer layers being arranged between the two adjacent winding layers and being used for increasing the coupling coefficient between the windings. According to the invention, the non-magnetizer layers are arranged between the adjacent winding layers to increase the coupling coefficient between the winding layers; and with the lamination technique, the size of the module of the transformer is reduced.