Patent SG-11201808095R-A (SG)
Title: Glass substrate with reduced internal reflectance and method for manufacturing the same
Inventor: NAVET BENJAMINE
IPC: C03C23/00
Filed: 2017-03-13
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 1111111101111011101010111110101111101110101111111111011111011101111101111011111 International Bureau ... ..... ..Yi j ...... .... (10) International Publication Number (43) International Publication Date WO 2017/178166 Al 19 October 2017(19.10.2017) WIPO I PCT (51) International Patent Classification: (81) Designated States (unless otherwise indicated, for every CO3C 23/00 (2006.01) kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, (21) International Application Number: BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, PCT/EP2017/055847 DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, (22) International Filing Date: HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, 13 March 2017 (13.03.2017) KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, (25) Filing Language: English NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, (26) Publication Language: English RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, (30) Priority Data: ZA, ZM, ZW. 16164911.6 12 April 2016 (12.04.2016) EP (84) Designated States (unless otherwise indicated, for every (71) Applicants: AGC GLASS EUROPE [BE/BE]; Avenue kind of regional protection available): ARIPO (BW, GH, Jean Monnet, 4, 1348 Louvain-La-Neuve (BE). AGC GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, GLASS COMPANY NORTH AMERICA [US/US]; TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, 11175 Cicero Drive Suite 400, Alpharetta, GA TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, Georgia/Georgia 30022-1167 (US). ASAHI GLASS CO DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LTD [JP/JP]; Shin-Martmouchi Building1-5-1 Marun- LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, ouchiChiyoda Ku, Tokyo, Tokyo/Tokyo 100-8405 (JP). SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, QUERTECH INGENIERIE [FR/FR]; 9, me de la Girafe, GW, KM, ML, MR, NE, SN, TD, TG). 14000 Caen (FR). Declarations under Rule 4.17: — (72) Inventors: NAVET, Benjamin; Avenue des Musiciens, — of inventorship (Rule 4. 1 7(iv)) 18, 1348 Louvain-La-Neuve (BE). BOULANGER, Pierre; Rue de la Medaille, 12, 4218 Couthuin (BE). Published: = (74) Agent: AGUSTSSON, Sveinn Otto; me Louis Bleriot 12, — with international search report (Art. 2 1 (3)) 6041 Gosselies (BE). = (54) Title: GLASS SUBSTRATE WITH REDUCED INTERNAL REFLECTANCE AND METHOD FOR MANUFACTURING THE SAME FIG 1 _ 11 1 ... 11 GC Ir ... ' 5 6 { .. 7 , ,,,,C 0 0 ) CD , o OC ) Ceo ( Do o 0 0 ,p,_., ..--, 00 0 0 ,.., c , 0 0 0 U { : ° ?2° . 22N..2F.\" 7 -: S°2:12'297. olin - Z'of SSE° E. G°2-2 , 17 : D2 01 11 N (57) : The invention concerns a method for manufacturing glass substrates with reduced internal reflectance by ion implant- I-1 ation, comprising ionizing a source gas of N2, 02, Ar, and/or He so as to form a mixture of single charge and multicharge ions of N, N 0, Ar, and/or He forming a beam of single charge and multicharge ions of N, 0, Ar, and/or He, by accelerating with an acceleration O voltage comprised between 15 kV and 60 kV and an ion dosage comprised between 10 17 ions/cm 2 and 10 18 ions/cm 2 . The invention further concerns glass substrates having reduced internal reflectance, comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.