Patent SG-11201807703Y-A (SG)
Title: Substrate heat treatment apparatus
Inventor: WANG HUI
IPC: H01L21/67
Filed: 2016-03-18
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property —, Organization 111111110111101110101011111010111110111011111011111111011101111101111011111 International Bureau ... ..51 jd ......... (10) International Publication Number (43) International Publication Date WO 2017/156758 Al 21 September 2017 (21.09.2017) WIP0 I PCT (51) (21) (22) (25) Filing Language: (26) Publication Language: (71) (72) International Patent Classification: (74) Agent: SHANGHAI PATENT & TRADEMARK LAW HO1L 21/67 (2006.01) OFFICE, LLC; 435 Guiping Road, Shanghai 200233 (CN). International Application Number: PCT/CN2016/076681 (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, International Filing Date: AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, 18 March 2016 (18.03.2016) BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, English DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, English KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, Applicant: ACM RESEARCH (SHANGHAI) INC. MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, [CN/CN]; Bld. 4, No. 1690 Cailun Road, Zhangjiang PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, High-Tech Park, Shanghai 201203 (CN). SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. Inventors: WANG, Hui; Bld. 4, No. 1690 Cailun Road, Zhangjiang High-Tech Park, Shanghai 201203 (CN). (84) Designated States (unless otherwise indicated, for every YANG, Hongchao; Bld. 4, No. 1690 Cailun Road, kind of regional protection available): ARIPO (BW, GH, Zhangjiang High-Tech Park, Shanghai 201203 (CN). WU, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, Jun; Bld. 4, No. 1690 Cailun Road, Zhangjiang Hi Tech TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, Park, Shanghai 201203 (CN). WANG, Wenjun; Bld. 4, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, No. 1690 Cailun Road, Zhangjiang High-Tech Park, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, Shanghai 201203 (CN). CHEN, Fuping; Bld. 4, No. 1690 LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, Cailun Road, Zhangjiang High-Tech Park, Shanghai SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, 201203 (CN). FANG, Zhiyou; Bld. 4, No. 1690 Cailun GW, KM, ML, MR, NE, SN, TD, TG). Road, Zhangjiang High-Tech Park, Shanghai 201203 Published: (CN). — with international search report (Art. 21(3)) = = Title: (54) = 1041 SUBSTRATE HEAT TREATMENT APPARATUS 1042 1043 104 7 1044 \ (57) : A substrate heat treatment apparatus for heat treating a substrate, corn- prising a bake plate, a plurality of support components, a baffle plate, and a driving device. The bake plate defines at least one gas passage. The plurality of support com- ponents support the substrate. The baffle plate is fixed on a top surface of the bake plate. The baffle plate surrounds the sub- strate and a gap is formed between an inner circumferential wall of the baffle plate and the substrate. A driving device drives the plurality of support components to move up or down. When heat treating the substrate, a hot gas is supplied to the space between the substrate and the top surface of the bake plate through the gas passage of the bake plate, and the hot gas flows out through the gap for-med between the inner circumferen- tial wall of the baffle plate and the sub- strate. 114 _= — = - = $ 13 110 1021 110 115 1031 \ 3 7. , . i 108 = = = ° . . . , ''\7 - ' '\%\V ' .' / 111 , . . 1 11 102 101 112 1-1 kin IN kin ,—, IN ,—, © ei 109 106 FIG 1 O