Patent SG-11201811673Y-A (SG)
Title: Device for vertical galvanic metal deposition on a substrate
Inventor: WEINHOLD RAY
IPC: C25D17/12
Filed: 2017-08-18
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property :::` , Organization 03 111111111111111111 11111111110111110100111111001111111101010111111111011110111111 International Bureau (10) International Publication Number (43) International Publication Date .....•\"\" WO 2018/036924 Al 01 March 2018 (01.03.2018) W I P0 I P C T (51) International Patent Classification: DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, C25D 17/00 (2006.01) C25D 5/08 (2006.01) HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, C25D 17/12 (2006.01) C25D 5/02 (2006.01) KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, (21) International Application Number: MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, PCT/EP2017/070942 OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, (22) International Filing Date: TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. 18 August 2017 (18.08.2017) (84) Designated States (unless otherwise indicated, for every (25) Filing Language: English kind of regional protection available): ARIPO (BW, GH, (26) Publication Language: English GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, (30) Priority Data: TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, 16185396.5 23 August 2016 (23.08.2016) EP EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, (71) Applicant: ATOTECH DEUTSCHLAND GMBH MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, [DE/DE]; ErasmusstraBe 20, 10553 Berlin (DE). KM, ML, MR, NE, SN, TD, TG). (72) Inventor: WEINHOLD, Ray; c/o Atotech Deutschland GmbH, Patent Management, ErasmustraBe 20, 10553 Berlin Published: (DE). — with international search report (Art. 21(3)) (74) Agent: SCHULZ, Hendrik; c/o Atotech Deutschland GmbH, Patent Management, ErasmusstraBe 20, 10553 Berlin (DE). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, (54) Title: DEVICE FOR VERTICAL GALVANIC METAL DEPOSITION ON A SUBSTRATE (57) : The present invention is related to a device for vertical gal- vanic metal, preferably copper, deposition on a substrate comprising at least a first device element and a second device element, which are arranged in a vertical manner parallel to each other; wherein the first device element comprises at least a first anode element having a plurality of through-going 1 conduits and at least a first carrier element having a plurality of throughgo- ing conduits; wherein said at least first anode element and said at least first carrier element are firmly connected to each other; wherein the second de- 12 : I I' ` s 11 vice element comprises at least a first substrate holder which is adapted to receive at least a first substrate to be treated, wherein said at least first sub- strate holder is at least partially surrounding the at least first substrate to be treated along its outer frame after receiving it, wherein the at least first device - element further comprises a plurality of plugs, wherein each plug comprises least is in Il 71' ei 1 Kt • 1 i 10 at a through-going channel, and wherein each plug arranged such a way that each plug is running from the backside of the at least first carrier element through a through-going conduit of the at least first carrier element 6 and further through the respective in front lying through-going conduit of the at least first anode element, and wherein all of the plugs are detachably connected to the at least first device element. Further, the present invention is generally directed to a method for vertical galvanic metal deposition on a 01 device. en substrate using such a 0 i --.... . GC 1-1 t 4 0 ei Figure 2 C