Patent SG-11201806263Y-A (SG)
Title: Negative type photosensitive composition curable at low temperature
Inventor: MISUMI MOTOKI
IPC: G03F7/40
Filed: 2017-01-20
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 24 August 2017 (24.08.2017) WIPO I PCT (10) International Publication Number WO 2017/140409 Al 1111111111111101110101011111010111110 01011111111111110110111011111111111 0111111 (51) International Patent Classification: GO3F 7/075 (2006.01) G03F 7/038 (2006.01) GO3F 7/027 (2006.01) GO3F 7/40 (2006.01) (21) International Application Number: PCT/EP2017/000071 (22) International Filing Date: 20 January 2017 (20.01.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 2016-030242 19 February 2016 (19.02.2016) JP (71) Applicant: AZ ELECTRONIC MATERIALS (LUX- EMBOURG) S.A. R.L. [LU/LU]; 46 Place Guillaume II, 1648 Luxembourg (LU). (72) Inventors: MISUMI, Motoki; 1039-1 -405, Kawai, Fukuroi-shi, Shizuoka 437-0064 (JP). YOKOYAMA, Daishi; c/o Merck Performance Materials Ltd., 3330, Chi- hama, Kakegawa-shi, Shizuoka 437-1412 (JP). TANIGU- CHI, Katsuto; c/o Merck Performance Materials Ltd., 3330, Chihama, Kakegawa-shi, Shizuoka 437-1412 (JP). KUZAWA, Masahiro; c/o Natoco Co., Ltd., 8-3, Futano- cho, Mizuho-ku, Nagoya-shi, Aichi 467-0861 (JP). (74) Agent: B2B PATENTS; c/o Merck Patent GmbH, 64271 Darmstadt (DE). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) W O 20 17 / 140 409 Al (54) Title: NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE (57) : To provide a negative type photosensitive composition curable at a low temperature and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability, and also to provide a pattern-formation meth- od employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising : an alkali-soluble resin, a compound having two or more (meth)acryloyloxy groups, a polysiloxane, a polymerization initiator, and a solvent. The alkali-soluble resin is a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit.