baber/WOPTO huggingface dataset:
Patent TW-I240484-B (TW)
Title: Circuitry for creating a spectral null in a differential output switching amplifier and method therefor
Inventor: MIDYA PALLAB
IPC: H03F1/26
Filed: 2002-08-27
Granted: 2005-09-21
Abstract: A modulated signal is connected to a full bridge switching amplifier (16, 18, 28, 30) and is compensated to remove a predetermined frequency and its odd harmonics. The compensation inverts and delays (26) a signal that is connected to a first half of the full bridge and applies the delayed inverted signal to a second half of the full bridge. By delaying by an odd number of half cycles, the carrier and its odd harmonics are cancelled because the same signal exists on both sides of the full bridge output. When these two same signals are subtracted by the full bridge action, the carrier and odd harmonics are suppressed. Spectral nulls may be provided for various signal applications, not just audio, and when various types of modulation techniques are used, such as PWM and PDM.
Patent TW-572809-B (TW)
Title: Multizone carrier with process monitoring system for chemical-mechanical planarization tool
Inventor: LAURSEN THOMAS
IPC: B24B37/10
Filed: 2002-09-27
Granted: 2004-01-21
Abstract: The invention improves a polishing process for a wafer retained in a multizone carrier in a chemical mechanical polishing tool. A light signal is communicated to the front surface of the wafer and the reflected light signal is captured by a metrology instrument. The metrology instrument communicates the intensity of the reflected light to a control system. The location or radial position corresponding to the reflected light signal from the front surface of the wafer may be determined by the control system. From the intensity measurements and corresponding locations, the control system is able to determine an approximate topography of the wafer. The control system may alter the pressure within one or more zones within the multizone carrier to improve the polishing process. The control system may also alter the initial pressures within the multizone carrier for future wafers based on the polishing results from the present wafer.
Patent TW-589684-B (TW)
Title: Method for depositing refractory metal layers employing sequential deposition techniques
Inventor: FANG HONGBIN
IPC: C23C16/02
Filed: 2002-10-09
Granted: 2004-06-01
Abstract: A method for forming a tungsten layer on a substrate surface is provided. In one aspect, the method includes positioning the substrate surface in a processing chamber and exposing the substrate surface to a boride. A nucleation layer is then deposited on the substrate surface in the same processing chamber by alternately pulsing a tungsten-containing compound and a reducing gas selected from a group consisting of silane (SiH4), disilane (Si2H6), dichlorosilane (SiCl2H2), derivatives thereof, and combinations thereof. A tungsten bulk fill may then be deposited on the nucleation layer using cyclical deposition, chemical vapor deposition, or physical vapor deposition techniques.
Patent TW-I221311-B (TW)
Title: Semiconductor substrate field effect transistor, and methods for producing the same
Inventor: NINOMIYA MASAHARU
IPC: H01L21/8232
Filed: 2002-11-29
Granted: 2004-09-21
Abstract: A semiconductor substrate and a field effect type transistor and a method of producing the same, which in order to lower the threading dislocation density and decrease the surface roughness, comprises a step of forming an SiGe layer on an Si substrate wherein the Ge compositional ratio has a gradient in the film forming direction and changes stepwise, by repeating a plurality of times: a step of epitaxially growing a layer of SiGe with a sloping composition wherein the Ge compositional ratio is gradually increased compared to the Ge compositional ratio of the base material, and a step of epitaxially growing, on the sloping composition layer, an SiGe layer of a fixed concentration, having the final compositional ratio of Ge of the inclined layer; a heat treating step of applying heat treatment at a temperature which exceeds the epitaxial growth temperature during the SiGe layer formation or after formation; and a polishing step of eliminating by polishing any irregularities on the surface generated by the heat treatment after the SiGe layer formation.
Patent TW-I225169-B (TW)
Title: Lens-holding frame
Inventor: HIRUNUMA KEN
IPC: G02B7/02
Filed: 2003-01-20
Granted: 2004-12-11
Abstract: A lens-holding frame comprises a frame body and a plurality of elastically deformable lens-holding arms. The arms are supported in a cantilever manner by the frame body and they circumscribe a circle having the same diameter as the lens. A positioning member is provided on the frame body along the circumference of the circle so that the positioning member abuts against the circumferential edge of the lens to define the lens holding position. Each arm is provided with a projection that penetrates inside the circle. The projection has a tapered surface, so that when the circumferential edge of the lens is engaged with the projections and the lens is pushed in toward the positioning member, the arms are elastically pushed open and the circumferential edge of the lens rides over the projections, whereby the lens is held.
Patent TW-I258189-B (TW)
Title: Thermal treatment apparatus and thermal treatment method
Inventor: OSE HIROKI
IPC: C23C16/458
Filed: 2003-01-22
Granted: 2006-07-11
Abstract: The invented thermal treatment apparatus is provided with the followings: sensor (2) of carrying wafer (W), which is capable of rotating and is provided inside thermal treatment container (1); pre-heating ring (3), which is supported by the platform (4) installed inside heat treatment container (1) to closely surround but not contact the periphery of the sensor (2); and heating apparatus for heating the wafer (W) carried on the sensor (2). The invention is featured with the followings. The pre-heating ring is formed in the way such that the inner periphery center (31a) is deviated from the outer periphery center (32) of the pre-heating ring. The pre-heating ring (3) is moved to the periphery of sensor (2) so as to position the pre-heating ring (3) to have the smallest distance between the inner periphery center (31a) of the pre-heating ring (3) and the center (2b) of the sensor (2). After that, thermal treatment is conducted onto the wafer (W).
Patent TW-595057-B (TW)
Title: Laser apparatus, exposure apparatus and method
Inventor: NAGAI YOSHIYUKI
IPC: H01S3/225
Filed: 2003-01-28
Granted: 2004-06-21
Abstract: There is to provide a laser apparatus that emits a laser beam by exciting gas enclosed in a chamber, including a gas characteristic detecting mechanism for detecting a characteristic of the gas in the chamber, and a calculation mechanism for calculating an oscillation wavelength and/or a wavelength spectral bandwidth of the laser beam based on a detected result by the gas characteristic detecting mechanism.
Patent TW-I248926-B (TW)
Title: Bacterium-inhibiting ceramics manufacturing method
Inventor: LIOU YI-CHENG
IPC: C04B35/63
Filed: 2003-02-24
Granted: 2006-02-11
Abstract: This invention provides a kind of bacterium-inhibiting ceramics manufacturing method, which comprises manufacturing steps of: (1) forming a slurry type raw material by mixing 25% silicon oxide, 25% aluminum oxide, 25% calcium oxide and 25% barium oxide with water; (2) molding the slurry type raw material into a blank by molding machine, (3) drying all molded blanks, (4) sintering all dried molded blanks at high temperature of 1200-1350 DEG C for 8-12 hours, followed by cooling to form ceramics, (5) soaking the cooled ceramics in a mixed solution of titanium and silver for about 10 seconds to allow the solution to infiltrate into fine pores of the ceramics, (6) drying the ceramics soaked with the mixed solution of titanium and silver, and (7) sintering all the above-mentioned dried ceramics at temperature of 350-450 DEG C, followed by cooling to form the invented bacterium-inhibiting ceramics with the effect of inhibiting bacterium multiplication.
Patent TW-I223076-B (TW)
Title: Probe unit and its manufacture
Inventor: TERADA YOSHIKI
IPC: G01R1/073
Filed: 2003-03-19
Granted: 2004-11-01
Abstract: A probe unit to be fixed to a probe device for testing functions of a test body. The probe unit includes: a substrate; probe pins formed on the substrate by lithography, the probe pins having distal ends protruded from the substrate and being made in contact with electrodes of the test body; and a positioning member formed on the substrate by lithography at a predetermined position relative to the probe pins, the positioning means abutting upon a member for positioning the substrate relative to the probe device.
Patent TW-I241463-B (TW)
Title: Monitoring method, exposure method, manufacturing method of semiconductor device, etching method and exposure treatment apparatus
Inventor: ASANO MASAFUMI
IPC: H01L21/027
Filed: 2003-03-25
Granted: 2005-10-11
Abstract: The purpose of the present invention is to provide the monitoring method capable of measuring processing size of fine pattern with high precision. The invention contains the following steps: forming a monitoring photoresist (PR) pattern 13 of the inclined sidewall 20 that contains at least one side inclining relative to the surface of the bottom layer film 2, and measuring the width of monitoring PR pattern 13 in the direction perpendicular to the crossing direction between the inclining sidewall 20 and the bottom layer film; using the monitoring PR pattern 13 as a mask to selectively etch the bottom layer film 2 so as to form the monitoring bottom layer film pattern 12, and measuring the width of monitoring bottom layer film pattern 12 in the direction perpendicular to the crossing direction between the inclining sidewall 20 and the bottom layer film; and using the difference between the width of monitoring photoresist pattern 13 and the width of monitoring bottom layer film pattern 12 to obtain the deviation width Deltas.
Patent TW-I234168-B (TW)
Title: Semiconductor memory
Inventor: NAKAMURA TOSHIKAZU
IPC: G11C8/18
Filed: 2003-03-28
Granted: 2005-06-11
Abstract: A timer receives an external access signal for causing a memory core to execute a read operation, then measures a predetermined time and outputs, after the predetermined time, an access request signal for operating the memory core. The predetermined time is set to be longer than a core operation time in which the memory core operates once. For this reason, the memory core does not operate when the external access signal varies within a time shorter than the predetermined time. Accordingly, even when the external access signal is supplied at intervals not adequate for the memory core to normally operate, malfunction of the memory core can be prevented, and data stored in a memory cell can be prevented from being destroyed.
Patent TW-594740-B (TW)
Title: Destructive-read random access memory system buffered with destructive-read memory cache
Inventor: JI BRIAN L
IPC: G06F12/08
Filed: 2003-04-02
Granted: 2004-06-21
Abstract: A memory storage system is disclosed. In an exemplary embodiment, the memory storage system includes a plurality of memory storage banks and a cache in communication therewith. Both the plurality of memory storage banks and the cache further include destructive read memory storage elements.
Patent TW-I221524-B (TW)
Title: Diffraction-based diagnostic devices
Inventor: COHEN DAVID
IPC: G01N33/543
Filed: 2003-04-22
Granted: 2004-10-01
Abstract: A biosensor includes a substrate with a layer of receptive material disposed thereon. The receptive material is specific for an analyte of interest. A pattern of active and inactive areas of the receptive material are defined in the receptive material layer by a masking process.
Patent TW-I270939-B (TW)
Title: Discharge plasma processing system
Inventor: UCHIDA TAIJIRO
IPC: H01J37/32
Filed: 2003-06-10
Granted: 2007-01-11
Abstract: The present invention provides a magnetic neutral line plasma discharge processing system that makes it no longer necessary to use an insulator wall in the vacuum chamber and metal such as stainless steel may alternatively be used, while maintaining the features including both time/space and space controllability relative to the size and the location of low pressure, low temperature and high density plasma to be generated. Thus, the cost of the system can be reduced remarkably. As a result, the scope of application of discharge plasma systems can be broadened. A magnetic neutral line plasma discharge processing system according to the invention comprises a magnetic field generating means for generating a magnetic neutral line formed by a succession of zero magnetic field positions existing continuously in the vacuum chamber and corresponding to the shape and the size of the object of processing and an electric field generating means for generating discharge plasma in a space containing the magnetic neutral line by applying a radio frequency electric field to the magnetic neutral line generated in the vacuum chamber by said magnetic field generating means at an inclined angle, said inclined angle possibly being rectangle.
Patent TW-I226102-B (TW)
Title: Method for forming excellent electrical contact between conduction layer and electrode of capacitor
Inventor: WU CHIA-YANG
IPC: H01L21/762
Filed: 2003-06-24
Granted: 2005-01-01
Abstract: A method for forming excellent electrical contact between a conduction layer and an electrode of a capacitor comprises the steps of: providing a semiconductor substrate having a surface formed thereon a trench, a bottom section of the trench being filled with a conductor to serve as an electrode of the capacitor, the trench having an exposed sidewall; forming an insulation layer uniformly covering the exposed sidewall and a top side of the conductor; in a condition of not affecting the insulation layer on the exposed sidewall, implanting ions into the insulation layer that is located on the top side of the conductor to form a doped insulation layer; removing the doped insulation layer to expose the conductor with the insulation layer so that the insulation layer remained on the exposed sidewall forms a circumferential insulation layer; and forming a conduction layer in the region surrounded by the circumferential insulation layer, wherein the conduction layer is isolated from the semiconductor substrate and the conduction layer is in electrical contact with the conductor.
Patent TW-I224256-B (TW)
Title: Information processing apparatus
Inventor: AINO SHIGEYUKI
IPC: G06F11/20
Filed: 2003-07-03
Granted: 2004-11-21
Abstract: An information processing apparatus of the present invention includes first and second computer elements which execute the same instructions substantially simultaneously and which are substantially synchronized with each other. The first computer element includes first and second memory elements, which are written by the first and second computer elements, respectively, during a first state. The information processing apparatus has a control element which makes the first computer element read from the second memory element during a second state. Another information processing apparatus has the first and second computer elements, and first and second memory areas which are provided in the first computer element. The first and second memory areas are written by the first computer element and the second computer element, respectively, during a first state. A control element makes the first computer element read from the second memory area during a second state.
Patent TW-593974-B (TW)
Title: Micro-mirror inspecting method and its inspecting apparatus
Inventor: KUO CHIEN-FONG
IPC: G01B11/26
Filed: 2003-07-03
Granted: 2004-06-21
Abstract: A kind of micro-mirror inspecting method includes the following steps. Micro-mirror devices are first disposed on the micro-mirror supporting face of the support stand. Then, a light source is used to emit light beam toward the micro-mirror devices. Light beam is reflected from the micro-mirror to the target face, so as to project a second light spot on the target face. The distance X of the second light spot relative to the reference point is measured so as to calculate the inclined degree of the micro-mirror device on the support stand.
Patent TW-I230952-B (TW)
Title: Testing method for electronic part and testing device
Inventor: KAMITANI GAKU
IPC: G01R31/01
Filed: 2003-09-19
Granted: 2005-04-11
Abstract: A testing method for an electronic part in which a predetermined load is set, which is determined by burn-in temperature, burn-in voltage, and a burn-in period of time, and burn-in of an electronic part is carried out in such a manner that a load equal to the set load is applied to the electronic part, includes a first step of placing an electronic part with a negative resistance-temperature characteristic under a predetermined temperature condition, the temperature being lower than the burn-in temperature so that the electronic part has the predetermined temperature, a second step of supplying constant current to flow through the electronic part so that the predetermined temperature of the electronic part is controlled to be raised to the burn-in temperature, and a third step of comparing the actually impressed voltage applied to the electronic part having the burn-in temperature to the burn-in voltage, correcting the burn-in time-period based on the comparison to determined a corrected burn-in time-period, and applying constant current to flow through the electronic part based on the corrected burn-in time-period.
Patent TW-I226774-B (TW)
Title: Clock and data recovery circuit
Inventor: WU CHING-YEN
IPC: H03L7/081
Filed: 2003-10-15
Granted: 2005-01-11
Abstract: A clock and data recovery circuit for generating a re-timed clock according to input data and a reference clock corresponding to the input data has a phase shifter for generating M discrete clocks according to the reference clock, a data sampler for generating a select signal according to the input data and the M discrete clocks, a primary phase selector for outputting two consecutive discrete clocks and at least an intervening clock according to the select signal a multiplexer for selecting and outputting a select clock selected from a group consisting of the two consecutive discrete clocks and the intervening clock, a phase detector, and an advanced phase selector.
Patent TW-I273787-B (TW)
Title: Method and apparatus for using multi-dimensional trellis codes over multi-path channels
Inventor: WEI LEE-FANG
IPC: H03M13/25
Filed: 2003-10-24
Granted: 2007-02-11
Abstract: An approach for using multi-dimensional trellis codes in a communication system over a multi-path channel, such as a wireless local area network, is provided. In this approach, the received signal is equalized and decoded by a joint decision feedback equalizer and multi-dimensional trellis decoder that is based on a multi-stage trellis diagram. The multi-stage trellis diagram used by the decoder comprises at least two stages of state transitions for each stage of state transitions in the encoder. The multi-stage trellis diagram makes the joint decision feedback equalizer and multi-dimensional trellis decoder possible, which in turn makes the use of multi-dimensional trellis codes in such a communication system advantageous.
Patent TW-I254734-B (TW)
Title: Coating composition
Inventor: MASUTANI TETSUYA
IPC: C09D127/12
Filed: 2004-01-27
Granted: 2006-05-11
Abstract: There is provided a coating composition comprising (A) a synthetic resin having functional group, (B) a stain-proofing component which is a liquid polydialkylsiloxane having functional group or a liquid fluoropolyether having functional group and as case demands, (C) a curing agent. The coating composition is excellent in stain-proofing property, particularly removability of oily stain and therefore scribbling can be easily erased, and is excellent in weather resistance and adhesion and is suitable for various outdoor coating applications.
Patent TW-I236716-B (TW)
Title: Window ball grid array semiconductor package with substrate having opening and method for fabricating the same
Inventor: TSAI CHUNG-CHE
IPC: H01L21/56
Filed: 2004-02-20
Granted: 2005-07-21
Abstract: A window ball grid array (WBGA) semiconductor package and a fabrication method thereof are provided. This WBGA package includes: a substrate having a through opening; a chip mounted on an upper surface and over the opening of the substrate via an adhesive, and electrically connected to a lower surface of the substrate via bonding wires through the opening, with gaps, not applied with the adhesive, formed between the chip and the substrate; a first encapsulation body made of a resin material for encapsulating the chip and the bonding wires, allowing the resin material to pass through the gaps to fill the opening of the substrate and the gaps; a second encapsulation body for covering the part of the first encapsulation body on the lower surface of the substrate; and a plurality of solder balls bonded to area free of the second encapsulation body on the lower surface of the substrate.
Patent TW-I263695-B (TW)
Title: Atomic layer deposition of oxide film
Inventor: CONLEY JOHN F JR
IPC: C23C16/34
Filed: 2004-02-26
Granted: 2006-10-11
Abstract: An atomic layer deposition method to deposit an oxide thin film is provided. The method employs a nitrate ligand in a first hafnium precursor as an oxidizer for a second hafnium precursor to form the hafnium oxide. Using a hafnium nitrate precursor and a hafnium chloride precursor, the method is well suited for the deposition of a high k hafnium oxide dielectric for gate dielectric or capacitor dielectric applications on a hydrogen-terminated silicon surface.
Patent TW-I233334-B (TW)
Title: Cylinder dough surface smoothness enhancing apparatus
Inventor: HUANG LIAN-FU
IPC: A21C11/16
Filed: 2004-03-05
Granted: 2005-06-01
Abstract: Provided is a kind of cylinder dough surface smoothness enhancing apparatus including: a nozzle for extruding the dough with a longitudinal path and an outlet which is characterized by having at least one lateral a ring-like fillister on the pipe wall above the outlet. Between each neighboring fillisters a protruding part is formed, and the surface of moving dough rubs against the ring-like fillisters and protruding parts when the dough is extruded via the longitudinal path toward the outlet. The surface of cylinder coming out from the outlet is smooth. Thus the surface smoothness of cylinder dough could be enhanced when it is continuously output via the nozzle outlet.
Patent TW-I268185-B (TW)
Title: A method and an apparatus for rolling a metal plate
Inventor: OGAWA SHIGERU
IPC: B21B37/28
Filed: 2004-03-18
Granted: 2006-12-11
Abstract: The present invention provides a method and an apparatus for rolling a metal plate in which a metal plate having no or little camber can be stably produced, wherein a metal plate rolling mill has, at least, a work roll and a backup roll. The forces in the rolling direction, exerted on roll chocks on the work side and the drive side of the work roll are measured to calculate a difference between the forces on the work side and the drive side so that a lateral asymmetry component of a roll gap of the rolling mill can be controlled, based on the difference.
Patent TW-I240558-B (TW)
Title: Method and apparatus for determining video signals
Inventor: CHAO PO-WEI
IPC: H04N5/14
Filed: 2004-03-22
Granted: 2005-09-21
Abstract: A method for determining video signals, the video signals includes three fields which are sequentially related, the method involves: determining whether field motion between the first field and the second field and generating a first detection signal corresponding to the second field; and determining whether the first field is capable of combining with the second field according to the first detection signal.