Patent SG-11201806100P-A (SG)
Title: Apparatus of plural charged-particle beams
Inventor: REN WEIMING
IPC: H01J37/28
Filed: 2017-01-27
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 111111110111101110101011111 HO 11111011101110010101111111011111011110111111 International Bureau .. .... ..Yejd ..... .....1 (10) International Publication Number (43) International Publication Date WO 2017/132435 Al 3 August 2017 (03.08.2017) WI P0 I P CT (51) International Patent Classification: (74) Agent: KING, Justin; WPAT, P.C., 8230 Boone Blvd, GO6T 7/00 (2017.01) H01J 37/26 (2006.01) Suite 405, Vienna, VA 22182 (US). H01J 37/252 (2006.01) H01J 37/06 (2006.01) HO1J 37/20 (2006.01) HO1J 37/04 (2006.01) (81) Designated States (unless otherwise indicated, for every H01J 37/28 (2006.01) H01J 37/10 (2006.01) kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, (21) International Application Number: BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, PCT/US2017/015223 DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, (22) International Filing Date: KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, 27 January 2017 (27.01.2017) MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, (25) Filing Language: English NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, (26) Publication Language: English TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, (30) Priority Data: ZA, ZM, ZW. 62/287,626 27 January 2016 (27.01.2016) US (84) Designated States (unless otherwise indicated, for every (71) Applicant: HERMES MICROVISION INC.; 7F, No. 18, kind of regional protection available): ARIPO (BW, GH, Puding Road East Dist., Hsinchu City, 300 (TW). GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, (72) Inventors; and TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, (71) Applicants : REN, Weiming [CN/US]; 2069 Kiwi Walk- DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, way, San Jose, CA 95133 (US). LIU, Xuedrang [CN/US]; LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, = 5458 Ora Street, San Jose, CA 95129 (US). HU, Xuerang SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, = [CN/US]; 1363 Danby Avenue, San Jose, CA 95132 (US). GW, KM, ML, MR, NE, SN, TD, TG). — CHEN, Zhongwei [US/US]; 1561 Blaney Avenue, San Jose, CA 95129 (US). [Continued on next page] (54) Title: APPARATUS = = 500A — _ vr = = OF PLURAL CHARGED-PARTICLE BEAMS (57) : A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples ob- servable. More specifically, as a yield management tool to inspect and/or re- view defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and = = 7 detect more kinds of defects. = = = F ' = = — 1 1 1 VS40 A L SV , r r ' kr) M 7r :1: 10. . ':,, ei M 11 Figure 5B °mention) N 11 © ei O WO 2017/132435 Al 1#11101MOHNOIRME30111101010EMOMEMOVOIMIE Published: — with international search report (Art. 21(3))