baber/WOPTO huggingface dataset:
Patent JP-S6382150-A (JP)
Title: Remote station control system for adding new service to existing communication network
Inventor: KOBAYASHI AKIRA
IPC: H04M3/00
Filed: 1986-09-26
Abstract: PURPOSE:To economically add a new service function by providing a 2nd exchange station controlling a new service to an existing exchange station additionally and providing one or over of remote stations controlled by the 2nd exchange station so as to connect the existing exchange station and the 2nd exchange station. CONSTITUTION:Remote stations a-d and a new exchange station Y having a new service function and having a function controlling the remote stations a-d are provided corresponding to existing exchange stations A-D and X. Then a subscriber NEW desiring a new service is accommodated in the remote stations to offer the new service to the subscriber under the control of the new station Y. The addition of new service is attained independently of the existing exchange stations A-D and X and the scale of station is decided by the number of subscribers desiring new service.
Patent JP-S61106106-A (JP)
Inventor: TAKEHARA SHOSUKE
IPC: A45D44/02
Filed: 1984-10-31
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H1074756-A (JP)
Title: Forming method of siof film and semiconductor device
Inventor: KOBAYASHI KINYA
IPC: H01L21/316
Filed: 1996-08-29
Abstract: PROBLEM TO BE SOLVED: To provide a method of forming an SiOF film of low permitivity. SOLUTION: SiH2 F2 gas 7a, O2 gas 7b, and Ar gas 7c introduced into a film forming vessel 3 are ionized by microwaves generated by a magnetron 1 and a magnetic field induced by an electromagnet 4 to turn into plasma. SiH2 F2 gas introduced into a reaction chamber is enhanced in flow rate, or the reaction chamber is enhanced in inner pressure, or microwaves are lessened in power. Plasma is lessened in electron temperature, and SiF2 radicals are increased in plasma. By this setup, an SiOF film which is lower in permittivity, moisture-absorption properties, and chemical reactivity than a conventional SiOF film can be obtained.
Patent JP-H04112607-A (JP)
Title: Outer ring enlarging come-along and locking unit
Inventor: UENO HIROAKI
IPC: H02G1/04
Filed: 1990-08-31
Abstract: PURPOSE:To eliminate danger in the work by forming a come-along, to be used when a transmission wire and a split wire are fed to a steel tower while being clamped, of inner and outer rings and pulling a locking mechanism mounted on the outer ring from the ground by means of a wire thereby unlocking the outer ring. CONSTITUTION:When a wheel K on a steel tower is connected with a wire E1, a clamp C1, a split wire W, a clamp C2 and a wire E2 and fed out from a drum D, a semi-wire S2 is temporarily fixed to the split wire W by means of a come-along B. The come along B holds an inner ring 2 having a flange 2a coupled with one end of an eye plate 1 rotatably by means of split outer ring pieces 3, 3. The outer ring piece 3 comprises a hinge 4, two links 7, a protrusion 3a and a side edge 3c and locked by means of a U-shaped metal 5, a base board 8, a lock lever 9 and a spring 10. When the tube 13 of a pusher 11 is pulled by means of a handle (not shown), the outer ring pieces are unlocked and fall down. Consequently, the come-along can be removed easily from the ground resulting in elimination of dangerous high position work.
Patent JP-S60120968-A (JP)
Title: Method and apparatus for thermal sterilization of sealed food
Inventor: TERAJIMA KOUKI
IPC: A23L3/10
Filed: 1983-12-02
Abstract: PURPOSE:To attain the sterilization effect comparable to the conventional sterilization process, and to enable the better maintenance of the quality of foods, by combining the preheating process at a temperature lower than the sterilization temperature, the main heating process at the sterilization temperature, and the cooling process to cool from the sterilization temperature to a specific temperature. CONSTITUTION:The objective apparatus is composed of the retort 12 having the inner temperature and pressure variable by the supply and the discharge of steam and air, the thermometer 26 to measure the inner temperature of the retort, and the pressure gauge 25 to measure the inner pressure of the retort. The output signals from the devices 26 and 25 are fed back to the controller 21, and compared with the output signal of the computer 22 to operate the steam and air valves 13' and 16' by the controller 21. The preheating process at a temperature lower than the sterilization temperature, the main heating process at the sterilization temperature (>=125 deg.C), and the cooling process to cool the food from the sterilization temperature to about 30 deg.C, are carried out by using the above apparatus. As a result, the quality of a sealed food can be maintained to a higher level while keeping the sterilization effect to a level comparable to the conventional process.
Patent JP-H0758103-A (JP)
Title: Self-biased plasma coating method
Inventor: TSUJI OSAMU
IPC: H01L21/205
Filed: 1993-08-19
Abstract: PURPOSE:To provide a method capable of coating a silicon nitride and a silicon oxide without heating a substance to be coated. CONSTITUTION:An upper electrode 12 and a lower electrode 13 are provided approximately in parallel in a reaction chamber 11. And the upper electrode 12 is grounded, and a high-frequency power source 15 is connected to the lower electrode 13 through a matching circuit 14. A gaseous raw material containing monosilane is let in the reaction chamber 11, and a substance to be coated 21 is arranged in the vicinity of the lower electrode 13. And high-frequency power is supplied from the lower electrode 13 without heating the lower electrode 13.
Patent JP-H01100038-A (JP)
Title: Protection light conductive path
Inventor: ENRIIKU KIYUURAA
IPC: C03C25/106
Filed: 1988-09-12
Abstract: PURPOSE: To impart a high refractive index and static fatigue resistance to an optical fiber and to facilitate the peeling of a buffer layer coating from the fiber by constituting the protected fiber optic waveguide of a core, a clad on its outer surface and the buffer layer coating consisting of a specific polysliloxane material on its outer surface.  
     CONSTITUTION: The polysiloxane material is obtd. by compounding (A) 5 to 85 pts.wt. polydimethylsiloxane having a vinyl or hydride (-Si-H) terminal group and (B) 95 to 15 pts.wt. copolysiloxane consisting of (a) 10 to 80 mol methyl phenyl siloxane repeating unit, (B) 90 to 20 mol dimethyl siloxane repeating unit or (a') 5 to 50 mol diphenyl siloxane repeating unit and 95 to 50 mol (b) component. Next, the clad 3 is formed on the outer surface of the core 2 in contact therewith and thereafter, the uncured buffer layer coating consisting of the polysiloxane described above is formed on its outer surface in contact therewith and is cured by heating at 100 to 250°C to form the buffer layer coating 4, by which the protected fiber optic waveguide 1 is obtd. 
     COPYRIGHT: (C)1989,JPO
Patent JP-S61106804-A (JP)
Inventor: UCHIYAMA SHINICHIRO
IPC: E01C23/12
Filed: 1984-10-30
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H1073257-A (JP)
Title: Cooker
Inventor: TANAKA KAZUKO
IPC: F24C7/02
Filed: 1996-08-29
Abstract: PROBLEM TO BE SOLVED: To eliminate a problem that moisture in a food is evaporated excessively and too much dry finish is obtained when respective executing periods of time of microwave heating and heater heating are obtained from only the weight of the food, in a cooking course wherein the mixed heating of the microwave heating and the heater heating is effected and, thereafter, only the heater heating is carried out. SOLUTION: The total cooking period of time of a cooking course is determined by a time determining unit 24 based on the weight of a food, which is detected by a weight sensor 13, and the driving time rate between mix heating and heater heating is determined by a rate determining unit 25 while a magnetron 14 as well as upper and lower heaters 16, 18 are controlled by a cooking control unit 26 through a first heating control unit 21, a second heating control unit 22 and an additional heating control unit 23 based on the determined conditions and an input information from an operating unit 6 to carry out the cooking. According to this method, soft finish, in which moisture is remaining optimally in the food after cooking, can be obtained.
Patent JP-H0785868-A (JP)
Title: Nickel-hydrogen storage battery and manufacture thereof
Inventor: SERI HAJIME
IPC: H01M10/24
Filed: 1993-09-14
Abstract: PURPOSE:To provide a nickel-hydrogen storage battery excellent in a high temperature shelf life. CONSTITUTION:This nickel-hydrogen storage battery is provided with a negative electrode comprising a surface layer composed of a hydrogen storage alloy transformed into an amorphous form by hydrogenation and an inner layer composed of a hydrogen storage alloy which is not transformed into an amorphous form even by hydrogenation. This battery is manufactured by a method wherein after an electrode group is inserted into a battery jar, hydrogen is introduced prior to liquid injection so as to transform a surface layer of the negative electrode into an amorphous form; or by a method wherein a hydrogen storage alloy used for a surface layer of the negative electrode is transformed into an amorphous form by hydrogenation, and at the same time pulverized to form a paste together with a binding agent, which is charged or applied onto the inner layer.
Patent JP-S59126175-A (JP)
Title: Directional control valve
Inventor: MATSUMURA SHIZUO
IPC: F16K11/07
Filed: 1982-12-29
Abstract: PURPOSE:To give no affection to the slide resistance of a spool even though the center of the spool is aligned with the center of the valve member, by separately providing the spool and a valve member formed therein with a damper orifice. CONSTITUTION:The rod section 23 of a spool 22 which is normally held in its neutral position under the influence of a spring 29, is disposed in a pressure chamber 27 defined in a cylinder member 25 outside of a valve member 24. Further, a relay chamber 32 is formed in a holding section 26. A valve member 33 is urged by a spring 36 so that the small diameter section 33a and projecting part 33c of the valve member 33 project into the pressure chamber 27. The projecting part 33c of this valve member 33 abuts against the end face of the rod section 23 when the spool 22 is in its neutral position, and further, the stepped part 33d of the valve member 33 abuts against the wall surface of a holding hole 34 when the spool 22 moves rightward. A check valve 38 disposed in a communication hole 37 which is formed in the valve member 33, allows the communication only from the relay chamber 32 to the pressure chamber 27. Further, a damper orifice 40 formed in the valve member 33 normally communicates the pressure chamber 27 with the relay chamber 32 through a clearance 35.
Patent JP-H07118734-A (JP)
Title: Production of high strength and high toughness martensitic stainless steel excellent in cavitation erosion resistance and wear resistance
Inventor: HIRAI TATSUYUKI
IPC: C22C38/00
Filed: 1994-08-30
Abstract: PURPOSE:To inexpensively produce a stainless steel for a welding structure excellent in strength, toughness, CE resistance and wear resistance. CONSTITUTION:A martensitic stainless steel contg. by weight, <=0.05% C, <=1.0% Si, <=1.0% Mn, <=5.0% Cu, 1.5 to 7.0% Ni, 12.0 to 17.5% Cr, 0 to 2.0% Mo (including the case of no addition) and <=0.02% N is subjected to hot working in which the draft at <=1000 deg.C is regulated To >=10% and finished at >=700 deg.C. Immediately after the hot working, it is cooled to the vicinity of a room temp. at >=3 deg.C/min cooling rate, by which the subsequent hardening treatment is obviated. In the case 0.05 to 0.5% Nb is furthermore added as the chemical componental compsn. of the stainless steel, the heating temp. is regulated to T ( deg.C) in the following inequality (1). Moreover, in succession to the same, tempering treatment can directly be executed: T >={7600/(3.54-log[Nb(%)] [C(%)+N(%)])}-273-(1).
Patent JP-H1167097-A (JP)
Title: Method for processing cathode-ray tube under high pressure
Inventor: TOMITA TAKASHI
IPC: H01J9/44
Filed: 1997-08-26
Abstract: PROBLEM TO BE SOLVED: To avoid damage to electron-gun electrodes and to neck glass to enhance withstand voltage characteristic by varying in each processing step the pulse widths of the induction transformer outputs of plural power supplies which generate high application voltages. SOLUTION: The anode side terminal 9 and cathode side terminal 8 of an induction transformer 7 are connected, respectively, to the anode terminal 5 of a cathode-ray tube 2 and to a gold terminal conducting socket 3 to which each electrode other than an anode is electrically connected. An output voltage which the induction transformer 7 applies to the anode terminal 5 of the cathode-ray tube is made higher as processing steps proceed, and withstand voltage characteristic is enhanced by increasing the voltage in steps. At the same time, output pulse width in each step is decreased in steps to suppress discharge power to avoid damage to electron gun electrodes, etc. When output pulse width in the final processing step is reduced to one-fifth, the output voltage can be raised by several KV to over ten KV.
Patent JP-H0972986-A (JP)
Title: Bevel surface observing device for stub tube
Inventor: USUBA YUKIO
IPC: G21C19/20
Filed: 1995-09-06
Abstract: PROBLEM TO BE SOLVED: To make an imaging device face straight the bevel surface of a stub tube. SOLUTION: With the use of a guiding member 10, an aligning mechanism 11, a rotational rise-fall rod 27, a rack gear 28 and a travel gear 29, an imaging device 13 is, with a specified interval kept, revolved along a bevel surface 9 of a stub tube 6, and, with a bevel surface following member 39, an air oil cylinder 40, conversion cylinders 41 and 42 and tilting cylinder 43, the imaging device 13 is tilted according to the tilt of the bevel surface 9 of the stub tube 6. Thus, presence of defects at the bevel surface 9 is found surely.
Patent JP-S61109434-A (JP)
Inventor: TAKEDA MASATOSHI
IPC: H02J15/00
Filed: 1984-10-31
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H1073216-A (JP)
Title: Waste treatment system
Inventor: SHICHIRI MASATAKA
IPC: F23G5/027
Filed: 1996-08-30
Abstract: PROBLEM TO BE SOLVED: To use carbonized gas generated in a rotary kiln as fuel by liquefying and extracting a tar component in the carbonized gas by a tar extracting device and supplying the extracted tar to a surface melting furnace as the fuel. SOLUTION: In a surface melting furnace 4 for melting carbonized residue 1, tar 8 extracted from carbonized gas 2 is used as fuel for heating. The tar 8 is extracted by a tar extracting device 7 on the way of a carbonized gas conveye passage 12. The tar extracting device 7 is provided between a rotary kiln 3 and the surface melting furnace 4 and comprises a guide part for guiding the carbonized gas 2 while it is maintained at high temperature so as to suppress the condensation of the tar 8, a cooling part for cooling the carbonized gas 2 for condensing the tar and a tar storing part for retaining the heat of the condensed tar so as to keep the tar in a fluidal state. Then, the liquefied and extracted tar 8 is conveyed to the surface melting furnace 4 by a tar supply passage, sprayed, the sprayed tar is ignited and burnt by luminous flame and the burnt tar radiates high temperature radiation energy and melts the carbonized residue 1.
Patent JP-H0550129-A (JP)
Title: Method for controlling thickness of thick steel plate
Inventor: KUWABARA SATOSHI
IPC: B21B37/18
Filed: 1991-08-16
Abstract: PURPOSE:To improve the control accuracy for the thickness of a thick steel plate by using an automatic plate thickness control according to the absolute value AGC based on a gagemeter model. CONSTITUTION:The diameter of a working roll of a rolling mill is measured to find the inherent value in the rigidity of the mill from a function for the mill rigidity, the value of the gagemeter model is corrected based on the mill rigidity and the plate thickness is controlled by adding the correction to the gagemeter model.
Patent JP-H0972443-A (JP)
Title: Spring safety valve
Inventor: FUJIE JOJI
IPC: F16K17/06
Filed: 1995-09-07
Abstract: PROBLEM TO BE SOLVED: To easily make both blowoff and blowout actions better. SOLUTION: A back pressure relieving chamber 2 communicated with a valve body-back pressure chamber 6 is provided, and a back pressure adjusting floating body 1 is provided in the back pressure relieving chamber 2. The back pressure adjusting floating body 1 is supported to a valve stem 3 so that it can move up and down. An orifice 8 is provided at the upper part of the back pressure relieving chamber 2. A stopper 4 for limiting the lowermost and uppermost positions of the back pressure adjusting floating body 1 is fixed to the valve stem 3, and an adjusting nut 5 is mounted to the valve stem 3 so that its upper and lower positions can be adjusted. A back pressure relieving pipe 7 is connected to the orifice 8.
Patent JP-H0784458-A (JP)
Title: Liquid developing device
Inventor: YAGI ATSUSHI
IPC: G03G15/10
Filed: 1993-09-16
Abstract: PURPOSE:To prevent a toner replenishing quantity from being insufficiently decided and an image from being soiled, without making the size of a device large by providing first/second developing rollers, applying the voltages of a different polarity to an electrode in proximity to the developing rollers and them and carrying a developing liquid between the first and second rollers. CONSTITUTION:A developing liquid tank 42 housing the developing liquid 45 inside and provided with the first and second developing rollers 46 and 47, a blade 48, a developing liquid sucking port 49, an electrode plate 50 and a developing liquid supplying port 51, a recording head 43 and a transfer device 44 with a recording paper 53 are arranged in an adjacent relation around a dielectric drum 41. A bias circuit 52 supplies the voltages to the first and second developing rollers 46 and 47 holding a prescribed gap with respect to the dielectric drum 41 and the electrode plate 50 respectively.
Patent JP-H0393313-A (JP)
Title: Level correction circuit
Inventor: SEKINE MASATOSHI
IPC: H03M1/18
Filed: 1989-09-05
Abstract: PURPOSE:To control a signal level by connecting a comparator, a register and a counter to an output stage of an A/D converter so as not to allow an analog signal level to exceed an input permissible range of the A/D converter. CONSTITUTION:An output of an A/D converter 4 is compared with an upper limit set in advance in a register 7 and with a lower limit set in advance in a register 9 simultaneously at comparators 6, 8, and when the result of count is larger than the upper limit, the counter 10 counts in a decreasing way and when the result of count is smaller than the lower limit, the counter 10 counts in an increasing way conversely. Since the count is a control signal of an attenuator 3 via a D/A converter 12, an output whose level is corrected is obtained at an output terminal 5 of the A/D converter output. Thus, the signal level is controlled so that the level does not exceed the input permissible range of the A/D converter.
Patent JP-2000058090-A (JP)
Title: Operation of solid electrolyte fuel battery
Inventor: TAKEUCHI HIROAKI
IPC: H01M8/04
Filed: 1998-07-31
Abstract: PROBLEM TO BE SOLVED: To restrict the deposition of carbon onto a catalyst in operation while restricting the electromotive power with the quantity of the steam when needed of power generation to the minimum when reforming the steam, while using hydrocarbon of the town gas as a fuel by temporarily conducting the operation at a ratio S/C of the steam S to the carbon C higher than that of the rated operating condition, when the power demand is small. SOLUTION: Methane 7 as a fuel is humidified by the water 9 in a liquid feeding pump 8 and an evaporator 6, and thereafter, led into a cylindrical SOFC cell 2 from a cell sealing side through a flow straightening part 5 in the condition that the pre- stage reforming is not performed. After the inner reforming on an anode film 10, the methane 7 as a fuel is consumed by power generation.  For the relation between a temporary S/C at continuous operation for 5,000 hours at 40% of fuel utilization factor and at 0.3 A/cm2 of the current density and the carbon weight per unit area of the anode, carbon deposited quantity can be reduced by temporarily setting the S/C high with respect to the base operation at 1.5 of S/C, and when operated at a large S/C, since the output is lowered, the operation at S/C higher than that of the rated operating condition is conducted temporarily when the power demand is small to enable stable supply of power.
Patent JP-H1073142-A (JP)
Title: Liquid seal type vibration control device and manufacture thereof
Inventor: ITO MASAAKI
IPC: F16F13/14
Filed: 1996-08-30
Abstract: PROBLEM TO BE SOLVED: To produce a vibration control device easily and in a short time and reduce a production cost. SOLUTION: An intermediate cylinder 23 is combined with the outer periphery of an inner cylinder 21 through a rubber elastic body 22. An orifice constitution body 32 is inserted in the intermediate cylinder 23. Liquid chambers 26, 29 and an orifice passage 37 are formed in the inside and outer periphery area of the intermediate cylinder 23. A partition wall 38 not crossed the orifice passage 37 is installed on one part of the periphery direction of the outer periphery surface of the intermediate cylinder 23. An outer cylinder 24 is formed in a shape having a slit 41 along an axial direction. The outer cylinder 24 is fitted and fixed to the outer periphery of the intermediate wall 23 and the orifice constitution body 37 so that the slit 41 is positioned on the wall 38, in a liquid. The outer cylinder 24 is pressed in the cylinder part 25a of a bracket 25.
Patent JP-H0786515-A (JP)
Title: Formation of polycrystalline silicon resistor
Inventor: SHISHIGUCHI SEIICHI
IPC: H01L27/04
Filed: 1993-09-16
Abstract: PURPOSE:To improve the uniformity of resistance of a polysilicon resistor by supplying dopant gas and nitrous oxide gas together with silane gas, and depositing a silicon film involving the dopant and oxygen at a specific deposition temperature by making use of a chemical vapor growth process and annealing the silicon film at a specific temperature. CONSTITUTION:A p-type silicon substrate 101 is used on which an oxide film 102 is in turn formed into the thickness of about 100nm. Then, an N type silicon film 106 which is doped with oxygen and phosphorus simultaneously is formed by about 200nm at the deposition temperature of 600 deg.C or lower using an ordinary longitudinal LPCVD apparatus. A heat treatment is applied to the resulting sample at the temperature of 600 deg.C or higher (95 deg.C, 30 minutes) using an electrical oven to form a polysilicon film 103 involving oxygen and phosphorus. Successively, the plysilicon film is patterned using photolithography to form polysilicon resistors 104, 105. Accordingly, there is ensured a resistor which has a reduced crystal grain diameter and has sufficiently low resistance (2mOMEGAcm) irrespective of the oxygen doping, and in which no crystal grain diameter change takes plase in later processes.