Patent SG-11201807282S-A (SG)
Title: Photosensitive siloxane composition
Inventor: TAKAHASHI MEGUMI
IPC: C09D183/04
Filed: 2017-03-23
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 111111110111101110101011111010111110111011111010111111111011011111101111011111 International Bureau 0.. .... .. (10) International Publication Number (43) International Publication Date ..... ..or::,„, WO 2017/162831 Al 28 September 2017 (28.09.2017) WIP0 I PCT (51) International Patent Classification: (74) Agent: B2B PATENTS; Merck Patent GmbH, 64271 C08L 83/04 (2006.01) CO9D 183/04 (2006.01) Darmstadt (DE). (21) International Application Number: (81) Designated States (unless otherwise indicated, for every PCT/EP2017/057005 kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, (22) International Filing Date: 23 March 2017 (23.03.2017) BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, (25) Filing Language: English HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, (26) Publication Language: English MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, (30) Priority Data: 2016-062385 25 March 2016 (25.03.2016) JP NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, (71) Applicant: AZ ELECTRONIC MATERIALS (LUX- ZA, ZM, ZW. EMBOURG) S.A.R.L. [LU/LU]; 46 Place Guillaume II, 1648 Luxembourg (LU). (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, _ (72) Inventors: TAKAHASHI, Megumi; c/o Merck Perform- ance Materials Ltd., 3330 Chihama, Kakegawa-shi, Shizuoka, 437-1412 (JP). YOKOYAMA, Daishi; c/o Mer- ck Performance Materials Ltd., 3330, Chihama, Kakegawa- shi, Shizuoka, 437-1412 (JP). YOSHIDA, Naofumi; c/o GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, — _ Merck Performance Materials Ltd., 3330, Chihama, Kakegawa-shi, Shizuoka, 437-14112 (JP). TANIGUCHI, Katsuto; c/o Merck Performance Materials Ltd., 3330, Chihama, Kakegawa-shi, Shizuoka, 437-1412 (JP). KUZ- SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: AWA, Masahiro; c/o Natoco Co., Ltd., 8-3 Futano-cho, Mizuho-ku, Nagoya-shi, Aichi, 467-0861 (JP). — with international search report (Art. 21(3)) = = = = = = = = = 1-1 Il M GC ei 1-1 (54) Title: PHOTOSENSITIVE SILOXANE COMPOSITION 1-1 C (57) : [] To provide a composition capable of forming a cured film having low permittivity and excellence in chemic - N al resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] en. ) The present invention provides a composition comprising : an alkali-soluble resin, namely, a polymer comprising a carboxyl-con- taining polymerization unit and an alkoxysilyl- containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.