baber/WOPTO huggingface dataset:
Patent TW-365574-B (TW)
Title: Method of manufacture of multi-layer forming plate for front, rear soles of shoes
Inventor: JUANG SU-JU
Filed: 1998-04-04
Granted: 1999-08-01
Abstract: Method of manufacture of multi-layer forming plate for front, rear shoesoles, especially when the forming plate for the front, rear shoesoles is made of a variety of materials by extrusion of sound rigidity and wide use, being the manufacture of various layers (3, 5 or 7 in extrusion), mainly consisting of: 2 adhesive external layers and the inward layers of thermal plastic of recyclable materials and the center layer of thermal plastics of sound rigidity as a 7-layer plate; being the 2 external layers of the 7-layer plate of adhesive substance and the 2nd layer from outside thermal plastic and the inward layers convertible into center layers of thermal plastic plus the recyclable materials and the center symmetrical layer of thermal plastic of sound rigidity as another 7-layer plate; further, another 5-layer plate of 2 outer adhesive and the inner corresponding layers of sound rigidity and the center layer thermal plastic plus the recyclable material; further, the 5-layer having the 2 outer layers adhered to the adhesive and the center layer of thermal plastic of sound rigidity and the 2 outward layers from the center of thermal plastic of recyclable material; being the method of manufacture having the different materials properly stirred at a preset rate before being led into the inlet of the extruder before properly blended and extruded to form a rigid structure of proper crack resistance.
Patent TW-402666-B (TW)
Title: Drive positioning mechanism, centrifugal compressor, and backlash adjustment mechanism
Inventor: SISHTLA VISHNU M
IPC: F04D27/02
Filed: 1998-07-14
Granted: 2000-08-21
Abstract: A drive positioning mechanism with backlash adjustment for use in a variable pipe diffuser for a centrifugal compressor. A rotational drive means is fixedly attached to the housing of a centrifugal compressor with a pinion gear mounted thereto. A rack gear is mounted to the inner ring and adapted to engage in meshing arrangement with the pinion gear. The rotational drive means is operable to position the inner ring between a fully open position and a partially closed position. A travel limiter is provided to positively limited the travel of the inner ring at the fully open and the partially closed positions. The backlash adjustment mechanism is comprised of a housing having a cylindrical body positioned concentrically about a first centerline and having a bore disposed axially though the body positioned about a second centerline. The drive shaft is rotatably disposed concentric with the second centerline within the bore. The inner ring is positioned such that it meshes with the pinion gear. The housing is disposed within the casing and is rotatably operable to effect an adjustment of the backlash between the pinion gear and the rack gear.
Patent TW-381057-B (TW)
Title: Semiconductor device
Inventor: USAMI MITSUO
IPC: G07F7/10
Filed: 1998-07-29
Granted: 2000-02-01
Abstract: The present invention provides a kind of effective method for preventing fakement and falsification of important data processing, such as IC cards, etc. On both sides of the IC chip and substrate, there are electrodes with amorphous scraggy surfaces and employing reversed mounting IC chips for connection between respective electrodes; and then, employing the connection impedance for the key of A/D conversion; and make the connection impedance as random values; and the key used as password can be used for preventing duplication.
Patent TW-434624-B (TW)
Title: Method for producing illuminating push key
Inventor: SHIE SHR-HUEI
IPC: H01H9/16
Filed: 1998-11-19
Granted: 2001-05-16
Abstract: A method for producing an illuminating push key is provided, which adds an illuminating agent into a soft solid silicone for being well mixed and molded by injecting, whereby the whole push key has an illuminating effect. Alternatively, the illuminating agent can be added into a liquid silicone, and the silicone mixture is then printed on the surface of the push key to form an illuminating push key.
Patent TW-434200-B (TW)
Title: Reforming material for fluid material
Inventor: SUGITA SHUICHI
IPC: B01D53/02
Filed: 1998-12-03
Granted: 2001-05-16
Abstract: With the vibration corresponding to a vibrational spectrum, the substrate portion of a reforming material liberates vibrational energy and transfers it to a fluid material. Then, the vibrational energy is transferred to a target molecule by excitation transfer, in particular, resonance transfer, thereby exciting the target molecule. Thereafter, hydrated electrons are liberated by the transition from the excited state to ground state of the molecule, and the decomposition of the molecule. In the presence of the hydrated electrons, the molecules and atoms in the fluid material repeat chemical bonding and dissociation until a chemical equilibrium point is reached, thereby reforming the fluid material.
Patent TW-446808-B (TW)
Title: Table device for low-temperature operation
Inventor: MASE TOKUTARO
IPC: F27D99/00
Filed: 1998-12-16
Granted: 2001-07-21
Abstract: The topic of this invention is to provide a table device for low-temperature work that can prevent food being processed from deteriorating and at the same time improve the working environment when processing the food. A table device 1 for low-temperature operation is provided with a body 3 that is constituted of a heat-insulating wall 2, a cooling device 4 that is accommodated in the body 3, a duct 8 that is raised from the deep part of the body 3, a cooler 17 of a cooling device that is provided in the duct 8, a cold air discharge port 9A that is formed at the upper end part of the duct 8, a work table 5 that is provided on the upper surface of the body in front of the duct, a blower 23 for supplying cold air that is subjected to heat exchange with the cooler 17 from the cold air discharge port 9A onto the work table 5, flow-dividing plates 31 for dividing cold air that is supplied from the blower 23 in three directions of the front surface and both side surfaces of the body, and a cold air suction port 11 for sucking cold air from the surrounding of the work table 5 into the body.
Patent TW-527546-B (TW)
Title: A word segmentation method for Chinese documents
Inventor: YANG LI-WEI
IPC: G06F17/00
Filed: 1999-01-11
Granted: 2003-04-11
Abstract: The invention relates to a word segmentation method for Chinese documents, which proceeds division with respect to the inputted Chinese sentence to be segmented in accordance with the possible ways, then conduct weighing estimation procedure processing to each segmentation method using the word composition probability, word length and continuous strength of word to obtain the weighing value of each segmentation method. The segmentation method with highest weighing value is taken as the best segmentation method that effectively solves the drawback of segmentation method that long word has higher priority to conduct correct segmentation of Chinese sentence, ensuring the acquisition of word division result in compliance with document meaning.
Patent TW-426917-B (TW)
Title: Method for manufacturing semiconductor device having a small dimensioned gate structure
Inventor: JANG SHR-CHANG
IPC: H01L21/3213
Filed: 1999-04-02
Granted: 2001-03-21
Abstract: There is disclosed a method for manufacturing semiconductor device having a small dimensioned gate structure. The present invention comprises a arc-shaped slot. The semiconductor substrate has a field oxide layer. There are sequentially formed with a gate oxide layer, a polysilicon layer, a first dielectric layer and a photoresist layer on the surface of the semiconductor substrate. Next, a wet etching process is used to etch the photoresist layer and part of the first dielectric layer so as to form an arc-shaped slot. Then, a silicide is formed on a position of the polysilicon layer where the gate is to be formed. Subsequently, a second dielectric layer is formed on the first dielectric layer and the polysilicon layer. A wet etching process is performed to etch the second dielectric layer and the first dielectric layer. Finally, a gate structure is formed by wet etching.
Patent TW-405020-B (TW)
Title: Device to produce a fine oil mist
Inventor: GEISS ARTUR
IPC: B05B7/04
Filed: 1999-06-09
Granted: 2000-09-11
Abstract: A device to produce a fine oil mist, in particular for the lubrication of tools used when removing metal by machining, comprising a vapourising chamber into which a supply line conveying oil and air under pressure enters, a vapourising nozzle provided within the vapourising chamber at the end of the supply line and an outlet line for the transport of the aerosol produced in the chamber to its place of application, characterized in that the vapourising chamber (11) has a connection (17) to a second chamber (12) at a place which is distanced from the vapourising nozzle (15) and that the outlet line (19) is introduced into the second chamber (12) and extends almost along its entire length.
Patent TW-439062-B (TW)
Title: Memory-cells arrangement, in which the resistance of a memory-element represents an information and can be affected by a magnetic field, and its production method
Inventor: BERTAGNOLLI EMMERICH
IPC: G11C11/00
Filed: 1999-07-12
Granted: 2001-06-07
Abstract: A memory-cell includes a memory-element, the resistance of which represents an information and can be affected by a magnetic field, and a transistor, wherein the transistor can be used to select the related memory-cell under the memory-cells at reading out the information. In order to write the information is provided a write-line (SLa) and a bit-line (Ba), which cross each other in the region of the memory-cell and can generate said magnetic field. The memory-element and the transistor can be connected in series. The memory-cell can be connected between the bit-line (ba) and a voltage-terminal common for the memory-cells. The memory-cell can be connected between the bit-line (Ba) and the write-line (SLa). The write-line can coincide with a gate-line (GLa), which control the transistor. The transistor can be planar or vertical. The memory-element and the transistor can be arranged adjacently or superimposedly.
Patent TW-436967-B (TW)
Title: Prevention of photoresist poisoning from dielectric antireflective coating in semiconductor fabrication
Inventor: TOBBEN DIRK
IPC: H01L21/3205
Filed: 1999-07-20
Granted: 2001-05-28
Abstract: A method of forming a patterned conductive multilayer arrangement on a semiconductor substrate is provided which prevents photoresist poisoning by reactive nitrogenous substances from a silicon oxynitride layer forming a dielectric antireflective coating (DARC) for an overlying photoresist layer. The substrate has a first level conductive layer, e.g., of a metal, disposed in a region thereon, and is coated in turn with a dielectric insulation layer, e.g., of silicon dioxide, which overlies the first level conductive layer region, a dielectric antireflective coating (DARC) silicon oxynitride layer, an essentially reactive nitrogenous substance-free dielectric spacer layer, e.g., of spin-on glass (SOG), and a photoresist layer. The dielectric spacer layer prevents reactive nitrogenous substance transport therethrough from the DARC silicon oxynitride layer to the photoresist layer, thereby preventing poisoning of the photoresist layer. The photoresist layer is exposed and developed to uncover pattern portions of the dielectric spacer layer. The uncovered portions of the dielectric spacer layer and corresponding portions of the DARC silicon oxynitride layer are removed together, and then corresponding portions of the insulation layer, e.g., by a pair of tandem etching steps, to expose portions of the first level conductive layer for subsequent metallization.
Patent TW-445434-B (TW)
Title: System and method for automatically extracting facial features
Inventor: LIN JIUN-HUNG
IPC: G06K9/00
Filed: 1999-08-04
Granted: 2001-07-11
Abstract: A system for automatically extracting facial features is provided to analyze a face image and find the featured portion of the face. In the pre-process, a second-chance region growing method is used to determine the facial area data. In the feature extraction, the left eye, right eye and mouth are first extracted, so as to locate the other featured portion. In the process for searching featured points, a simple featured sample can be used to calculate the cost function for each point, and the genetic algorithm can be used to speed up the task of searching the featured points.
Patent TW-446952-B (TW)
Title: Circuit-arrangement with temperature dependent semiconductor element test and repair logic
Inventor: MC CONNELL RODERICK
IPC: G11C29/00
Filed: 1999-10-08
Granted: 2001-07-21
Abstract: This invention relates to a circuit-arrangement with temperature-dependent semiconductor-element-test-and repair-logic, in which at least a temperature-source (3) exists in a semiconductor-chip (1) of a semiconductor-element. In addition, in the semiconductor-chip (1) a semiconductor-element (2) has the temperature-sensor (3) and is connected with the self-test-and repair-logic (4).
Patent TW-527492-B (TW)
Title: Anti-reflection material and polarized film using the same
Inventor: MURATA CHIKARA
IPC: G02B1/11
Filed: 1999-10-14
Granted: 2003-04-11
Abstract: The present invention is to provide and anti-reflection material and a polarized film using the same, which can exhibit excellent anti-reflection properties, prevent the reflection of an outer light such as sunlight and fluorescent lamp into the display, and will not decrease the image contrast, can obtain clear but not glittery images, is optically stable, and exhibit excellent wear resistance, chemical resistance and pollution resistance. On one or two sides of a transparent substrate, a hard coat layer is put directed or via another layer. On the surface of the hard coat layer, an anti-reflection film having an index of refraction lower than that of the hard layer coat is put. The hard coat layer comprises at least (1) a polymer which uses a (meth)acrylate compound having a fluorene skeleton as a polymerization component, (2) a polymer which uses an urethane (meth)acrylate compound as a polymerization component and extra-fine particles having a high index of refraction, or (3) a radiation ray-and/or heat-setting resin and surface-treated extra-fine particles.
Patent TW-448077-B (TW)
Title: Composition for metal surface treating, surface treating liquid and surface treating method
Inventor: NAKADA KAZUYA
IPC: C23C22/57
Filed: 1999-10-20
Granted: 2001-08-01
Abstract: Disclosed is to provide-chromate type composition for metal surface treating, used to providing excellent anti- corrosion and coating film adhesion onto the aluminium (alloy), magnesium (alloy), zinc (alloy) metal surface. This composition for metal surface treating is characterized by containing one or more than one metal acetyl acetonate selected from the group of Al(C5H7O2)3, V(C5H7O2)3, VO(C5H7O2)2, Zn(C5H7O2)2 and Zr(C5H7O2)4, and one or more than one selected from the group of water soluble inorganic zirconate compound and water soluble titanate compound in weight ratio of 1:5000 to 5000:1.
Patent TW-441120-B (TW)
Title: Semiconductor integrated circuit device
Inventor: ISHIBASHI KOICHIRO
IPC: H01L21/8238
Filed: 1999-10-21
Granted: 2001-06-16
Abstract: The metal layers 36, 39 buried in the contact holes of various shapes are used as the interconnection, and they are treated as the wiring of the substrate bias, so that the first layer of metal wiring layers 16, 19 is made thinner, and which is used as the wiring for controlling the substrate bias voltage. Furthermore, the second layer of metal wiring layer 17, 18 is used as the copper wiring layer. Thereby, a low power, small area semiconductor circuit which is capable of high speed operation can be realized without adding masks.
Patent TW-490474-B (TW)
Title: Phosphorus group containing flame retardant hardener, advanced epoxy resins and cured epoxy resins thereof
Inventor: WANG CHUEN-SHAN
IPC: C07F9/52
Filed: 2000-01-04
Granted: 2002-06-11
Abstract: The present invention discloses an active-hydrogen-containing curing agent having a phosphorus group, and a flame retardant advanced epoxy resin and cured epoxy resin which can be prepared via an addition reaction between the active hydrogen and the epoxide group of an epoxy resin. The cured flame retardant epoxy resin is environmentally friendly and is suitable for printed circuit board and semiconductor encapsulation applications. The phosphorus group of the curing agent has a chemical structure as follows: formula, wherein Ar is a substituted or un-substituted phenyl or phenoxy.
Patent TW-455760-B (TW)
Title: Method and system for monitoring configuration changes in a data processing system
Inventor: MUELLER MARK WAYNE
IPC: G06F1/26
Filed: 2000-03-14
Granted: 2001-09-21
Abstract: A method and system for monitoring and adapting to configuration changes in a data processing system having a known configuration, while power is applied thereto. In response to a configuration change in the data processing system, values are calculated for multiple system operating factors. An alert is provided to a user if at least one of said calculated values, among the multiple system operating factors is not within a predetermined range of values for the multiple system operating factors. In addition, the operation of the data processing system is restricted to accommodate for any system operating factors which are not within the predetermined range of values, such that the data processing system is guarded from damage due to an unstable configuration.
Patent TW-442841-B (TW)
Title: Method of photoresist rework
Inventor: LI TZUNG-HAN
IPC: H01L21/00
Filed: 2000-05-04
Granted: 2001-06-23
Abstract: A method of photoresist rework is provided. When the critical dimension of the photoresist is detected to be smaller and does not meet the specification, and which needs to be reworked, the photoresist is not necessary to be removed in the ""after development inspection (ADI)"" quality control procedure. It needs only to form a polyimide resin thin film layer which has a high bonding degree and which is not easy to be dissolved and melted on the surface of the exposed photoresist, so that the critical dimension of the photoresist meets the size of specification. Therefore, it is able to not only reduce the cost of the photolithography process, but also perform the rework procedure more efficiently.
Patent TW-505585-B (TW)
Title: Electroluminescent dashboard
Inventor: BAGNOLI ALESSANDRO
IPC: B60Q3/04
Filed: 2000-05-05
Granted: 2002-10-11
Abstract: A transparent electroluminescent dashboard which consists of a portion of front shell (12) and a portion of rear shell (13), hermetically sealed together by means of a gasket (14) set in between, and inside which is set a plate (15) made of transparent material bearing the characters (16) of a tachymetric scale (17) which co-operate with a corresponding mobile and oscillating pointer (18), which is set in front of the plate and is actuated by a motor (22), at least the plate (15) made of transparent material having associated to it a plurality of LED (21) for supplying light.
Patent TW-538091-B (TW)
Title: Electroconductive resin composition
Inventor: SAKAMOTO HIROSHI
IPC: C08L63/00
Filed: 2000-06-05
Granted: 2003-06-21
Abstract: A conductive polythiol-based epoxy resin composition which is improved in pot life and storage stability as compared with conventional polythiol-based epoxy resin compositions is disclosed. The conductive resin composition comprises as essential components (1) an epoxy resin having two or more epoxy groups per molecule, (2) a polythiol compound having two or more thiol groups per molecule, (3) a latent curing accelerator of the solid dispersion type, (4) a boric ester compound, and (5) conductive particles. It is suitable for use as a conductive material in a wide range of fields, including the field of electronics, where low-temperature rapid-setting properties are required.
Patent TW-526387-B (TW)
Title: Positive type resist composition
Inventor: MORIUMA HIROSHI
IPC: G03F7/022
Filed: 2000-06-14
Granted: 2003-04-01
Abstract: A positive resist composition excellent in resolution, having a good balance with other performances required to resists and comprising an alkali-soluble resin, a radiation-sensitive ingredient and a hydroxyphenyl ketone compound represented by the following formula (I): wherein R1, R2, R3, R4 and R5 independently represent hydrogen, alkyl or alkoxy and n represents an integer of 1 to 3 is provided.
Patent TW-525137-B (TW)
Title: Display method for background mapping
Inventor: TAN HAN-YUN
IPC: G09G5/00
Filed: 2000-06-23
Granted: 2003-03-21
Abstract: A display method for background mapping is provided, which is suitable for a display with small memory storage. The method uses the first memory for storing a plurality of monochrome fonts, the second memory for storing a plurality of color backgrounds, and the third memory for displaying the monochrome fonts in the first memory and the color backgrounds in the second memory on the display, and changes anytime according to the loading of monochrome fonts or color backgrounds. The present invention not only reduces the required storage in memory, but also effectively reduces the loading amount for changing the display content of the system.
Patent TW-480583-B (TW)
Title: Reduction of resist poisoning
Inventor: LEE GILL-YONG
IPC: G03F7/09
Filed: 2000-09-11
Granted: 2002-03-21
Abstract: A silicon-rich layer is provided beneath a resist to prevent resist poisoning by an underlying device layer. In fabrication of device, a method for reducing resist poisoning comprising: providing a substrate; forming an antireflective layer comprising silicon over the substrate; forming a cap layer on the antireflective layer by altering a surface morphology of the antireflective layer to form excess silicon dangling of bonds thereon, resulting in a cap layer with a silicon rich composition; and forming a resist layer over the silicon-rich cap layer, wherein the silicon-rich cap layer reduces resist poisoning.
Patent TW-454327-B (TW)
Title: ESD protection circuit triggered by substrate
Inventor: KER MING-DOU
IPC: H01L27/02
Filed: 2000-08-08
Granted: 2001-09-11
Abstract: The present invention provides an ESD protection circuit triggered by substrate and the related technology. The ESD protection circuit of the present invention comprises a first MOS transistor of the first type and an ESD detection circuit. The first MOS transistor has a base, gate, source and drain. The source couples to the first power line, the drain couples to a bonding pad, and the source, base, and drain form a double junction transistor. The ESD detection circuit is coupled between the first power line and the bonding pad. In the normal operation, the ESD detection circuit makes the base be coupled to the first power line. When an electrostatic discharge event occurs on the bonding pad, the ESD detection circuit is used to bias the base to trigger the double junction transistor and to release an electrostatic discharge current. Experiments have proven that the base-triggering technology can greatly enhance the ESD robustness of MOS devices.