baber/WOPTO huggingface dataset:
Patent JP-H04199365-A (JP)
Title: Document data base control system
Inventor: NAKAGAITO KENJI
IPC: G06F17/30
Filed: 1990-11-29
Abstract: PURPOSE:To search a document related to the document in addition to the document by preparing a new ledger called a related document ledger separately from a document ledger, and registering the key information of the related document in the related document ledger. CONSTITUTION:When a user executes operation to request the execution of the related document command on the retrieval display screen on a document data base operating mechanism 15 on which the retrieved key information of the document A is displayed, the same command is delivered from the document data base operating mechanism 15 to a document data base control mechanism 14. Here, the document data base control mechanism 14 retrieves the related document ledger 13 by using the key information of the document A, and it obtains the key information of the related document stored in accordance with the document A as a searched result. This related document retrieved result is delivered from the document data base control mechanism 14 to the document data base operating mechanism 15, and the list of each key information of the related document of the document A is displayed on a dialog screen. Thus, the related document related to the specified document is retrieved together with that specified document.
Patent JP-H08300590-A (JP)
Title: Laminated polyester film and manufacture thereof
Inventor: TAKADA HAGUMU
IPC: B29K67/00
Filed: 1995-12-21
Abstract: PURPOSE: To improve adhesion to various inks by forming a surface layer of a laminated film by mainly an acrylic resin and a melamine crosslinker and forming an intermediate layer consisting mainly of a polyester resin in between the surface layer of the laminated film and a polyester film as a laminated film. CONSTITUTION: In this laminated polyester film 1, a laminated film 3 is provided on a polyester film 2. The laminated film 3 is formed of an intermediate layer 4 an inclusion phase area 5 and a surface layer 6 laminated in the described order from the side of the polyester film 2. The distinct existence of the inclusion phase area in a laminated polyester improves the adhesion at the interface of the surface layer of the laminated film and the intermediate layer. Further, it brings about an effect for improving a characteristic as a laminated polyester film having excellent adhesion. The inclusion phase area has, preferably, a thickness of about 0.00-2μm, and more preferably, about 0.02-0.4μm, so as to be preferably a laminated structure which exists as a distinct inclusion phase area.
Patent JP-2000151965-A (JP)
Title: Compound device
Inventor: NIIHARA TAKAYUKI
IPC: H04M11/00
Filed: 1998-11-09
Abstract: PROBLEM TO BE SOLVED: To provide a compound device that prints out received image data by the number of copies designated from an opposite party in the case of receiving facsimile data. SOLUTION: Upon the receipt of an incoming call, the communication control section of a compound device executes a conventional facsimile control procedure, receives image data and stores the data in an image information storage section temporarily. When the image information storage section completes storage of all the received image data, the compound device executes facsimile halting processing by the conventional facsimile control procedure and proceeds to a mode that enables reception of a DTMF signal from an opposite party according to, e.g. a prescribed facsimile control signal, and receives output copy number designation information in the DTMF signal sent from the opposite party.  The compound device uses a RAM to store the received output copy number designation information and conducts a prescribed facsimile control procedure to terminate the output copy number designation mode, interrupts the line and uses an image write section to print out the received image data stored in the image information storage section by the number of copies stored in the RAM (steps S101-S103).
Patent JP-H01176227-A (JP)
Title: High-purity chromium chloride water solution and production therefof
Inventor: IIZUKA SAKAE
IPC: C01G37/04
Filed: 1987-12-29
Abstract: PURPOSE:To obtain an aqueous solution having reduced content of impurity metal ion such as Na ion or Fe ion, by reacting a solution of chromic acid with an organic reducing agent capable of completely decomposing into carbon dioxide gas and water by reacting with hydrochloric acid and chromic acid. CONSTITUTION:An chromic acid solution is produced by using sodium chromate obtained by subjecting chromium ore to alkali oxidation and baking as a starting raw material. Then an organic reducing agent (e.g. ethyl alcohol) capable of completely decomposing into carbon dioxide and water by reacting with hydrochloric acid and chromic acid is added to the chromic acid solution. The reaction expressed by the formula is carried out under conditions always containing the organic reducing agent in excess of hydrochloric acid in the above-mentioned system. As a result, aqueous solution of high-purity chromium chloride having impurity metal ion content shown in the equation; Na<=30ppm and Fe<=20ppm and containing no other metal is obtained thereby. The resultant chromium chloride aqueous solution is preferably used as electrolyte of redox electric cell or a dye auxiliary, etc.
Patent JP-H08292457-A (JP)
Title: Method for sealing electrochromic element
Inventor: SHIRASAWA ATSUSHI
IPC: G02F1/161
Filed: 1995-12-21
Abstract: PURPOSE: To make it possible to use a thermosetting material as a sealing material of a higher curing temp. as a sealing material and to improve the durability of an EC(electrochromic) element by well preventing the damage of the EC element by evaporation of moisture in the EC element at the time of thermal curing of the thermosetting material of the sealing material. CONSTITUTION: This method consists of a stage for disposing the thermosetting material 4 prior to thermal curing around the EC element 2 disposed on a substrate 1, a stage for widening the optimum range of the temp. and humidity of such an atmosphere which does not damage the EC element 2 and does not affect the thermal curing of the thermosetting material 4 by setting the pressure of the atmosphere at least at a pressure exceeding the atm. pressure and a stage for thermally curing the thermosetting material 4 by heating prior to thermal curing while maintaining the temp. and humidity of the atmosphere within the optimum range. As a result, the use of the thermosetting material 4 having the curing temp. higher than before is made possible while the damage of the EC element 2 is suppressed and the sealability by the thermosetting material 4 is well assured. A contribution is thus made to the improvement in the durability of the EC element 2.
Patent JP-H04206290-A (JP)
Title: Built-in type heating cooker
Inventor: MIYAGAWA JUNICHI
IPC: H05B6/12
Filed: 1990-11-29
Abstract: PURPOSE:To improve an external appearance and simplify installation work by fixing upper and lower heating units utilizing a space between a front end part of a top plate and an upper part of the lower heating unit, and then removably attaching a decoration plate to engaging parts to cover the space. CONSTITUTION:An upper heating unit 3 built in a system kitchen by utilizing a space 18 of a front end part 6 of a top plate 1 and a lower heating unit 7 are fixed by adapting respective metal fittings 16, 17 to each other and a machine screw 19. A decoration plate 20 thereafter is inserted into the space 18 from the front of the top plate 1, and notched parts 24 of the decoration plate 20 are fitted to engaging parts 12, 13, that is to perform fixations of the upper heating unit 3 and the lower heating unit 7 by utilizing the space 18 and to cover the space with the decoration plate 20 free removable. With this constitution, the installation work is facilitated and an external appearance is improved because machine screws and the like for the fixation does not appear on the surface of a system kitchen.
Patent JP-2001155443-A (JP)
Title: Disk reproducing device
Inventor: TAKECHI YASUHAYA
IPC: G11B19/28
Filed: 1999-11-25
Abstract: PROBLEM TO BE SOLVED: To monitor a data read state and to perform control so as to automatically lower the rotation speed of a disk corresponding to an error rate even in the case of the disk of a format to which data for error correction for a CD-ROM are not added. SOLUTION: At the time of reproducing the disk 1 to which information for the error correction for the CD-ROM is not added at a high speed, a microcomputer 8 reads the data through an optical pickup 3, a demodulation circuit 4 and a signal processing circuit 5 and stores them in a buffer memory 10. When the error correction code of the CD-ROM is present, an error correction circuit 7 performs the error correction. When signal error information is outputted from the signal processing circuit 5, the microcomputer 8 counts the number of times of the generation for each sector, and when a counted value becomes a stipulated value or higher, lowers the rotation speed of the disk 1 to a standard speed.
Patent JP-H10172921-A (JP)
Title: Manufacture of semiconductor device
Inventor: YAMAMOTO YOSHIAKI
IPC: H01L21/336
Filed: 1996-12-13
Abstract: PROBLEM TO BE SOLVED: To provide a method of forming Ti silicide adapted for manufacture of a semiconductor device or the like for forming a stable and good-quality semiconductor device in which a defect is not caused by electrical short-circuit between a diffusion layer and a gate electrode or diffusion layer. SOLUTION: A field oxide film 2, a gate oxide film 3, a gate electrode 4, and a side wall film 5 are formed on a silicon substrate 1 and a protective oxide film 7 for ion implantation is formed on the whole surface. After that, for example, in order to form a P-type diffusion layer,<49> BF2 <+> ions are implanted. In order to activate impurity ions, a diffusion layer 9 is activated by performing a heat treatment of about 1000 deg.C. Subsequently, the protective oxide film 7 is removed and, further, a spontaneous oxide film on the diffusion layer 9 and the gate electrode 4 is removed before Ti sputtering. After that, a Ti film is formed on the whole surface and is subjected to a heat treatment at 700 deg.C or lower, an unreacted Ti film on the field oxide film and the side wall film is removed, and a heat treatment is performed at 800 deg.C or higher.  In the Ti silicide film formed as mentioned above, a rise onto the field oxide film and the side wall film is suppressed, a desired resistance value is obtained, and increase in the device operation speed can be realized.
Patent JP-H06181544-A (JP)
Title: Solid-state image pickup device
Inventor: YONEYAMA JUICHI
IPC: H04N5/374
Filed: 1992-12-15
Abstract: PURPOSE:To simplify circuit constitution and to reduce chip size by sharing the gate voltage of a reading period with that of a reset period and driving the gate voltage by two values in a storing period and the reading/resetting period. CONSTITUTION:A MOS QR is turned on by PHIPR immediately before a reading period, the source voltage of an SIT is connected to a power supply VPR and a MOS QT is simultaneously turned on to charge an accumulation capacitor CT with the same voltage, the SIT is driven in the reading mode and the C7 is charged with voltage corresponding to signal charge. In the reset period, the gate voltage is set up to OV similarly to the reading period, the source voltage is grounded through the MOS QR and the electrostatic charge of the gate part is discharged to its initial state. An inverter is allowed to be used for an output stage of a vertical scanning circuit and can be constituted of an N-channel MOS and a P-channel MOS, so that the area of the device can sharply be reduced.
Patent JP-H05138519-A (JP)
Title: Pressure application mechanism of polishing device
Inventor: SAKAMOTO MASASHI
IPC: B24B13/00
Filed: 1991-11-22
Abstract: PURPOSE:To make low load act on a work stably at the time of the polishing processing of the work. CONSTITUTION:A theta axis mechanism portion 2 and a Z axis mechanism portion 8 are provided on an X axis mechanism portion 1. A work spindle 3 is fitted to the theta axis mechanism portion 2, and a work 6 is retained at a work retainer 7 at the tip of the work spindle 3. An arm 11 is provided at the Z axis mechanism portion 8 so as to be able to move up and down, and a spindle 20 is fitted to the arm 11. The work 6 is processed by fitting a polisher 9 to the tip of the spindle 20. A screw rod 14 is horizontally supported at the arm 11, and a weight 13 is fitted to one end of the screw rod 14, and a handle 15 is fitted to the other end of the rod 14. A distance to the support shaft 12 of the arm 11 is adjusted by moving the weight 13 by the rotary operation of the handle 15. As load to the surface of the work 6 acts on it through the support shaft 12 of the arm 11, making low load act on the work 6 stably can be realized.
Patent JP-H01177917-A (JP)
Title: Manufacture of female screw
Inventor: AISAKA TADASHI
IPC: B23G1/16
Filed: 1987-12-29
Abstract: PURPOSE:To make is possible to pull thread cutting blade parts of a thread cutting device at a time by making them face concave grooves after thread cutting work by forming the concave grooves in a base material to be escape grooves for the thread cutting blade parts of the thread cutting device preliminarily. CONSTITUTION:A plurality of concave grooves 4, for which distance l from the center of a prepared hole 3 to its bottom surface is larger than the radius of a thread cutting device, are formed along the inner wall of the prepared hole 3, each corresponding to a cutting thread blade part 2a. The concave grooves 4 can be formed by forming a plurality of protrusions 6 in the outer circumference of a punch 5 for forming the prepared hole. By thus forming the concave grooves 4 preliminarily, a cutting device 2 can be pulled at a time by rotating the thread cutting blade parts 2a to the positions facing the concave grooves 4 respectively after completion of thread cutting work, thereby work efficiency is improved.
Patent JP-H07198640-A (JP)
Title: Method of inspecting honeycomb panel
Inventor: KAGEYAMA MASAO
IPC: G01N25/72
Filed: 1993-12-28
Abstract: PURPOSE:To provide a honeycomb panel inspecting method which can easily, rapidly and surely inspect a soundness of joint parts of a honeycomb panel. CONSTITUTION:One of a pair of surface plates of a honeycomb panel 1 in which a metal honeycomb core 5 is held between the surface plates, is heated, and just after the heating, a temperature distribution at the other surface plates are measured by a radiation thermometer 4. Thus, since the temperature of parts of the honeycomb panel 1, where the soundness of the joint between the honeycomb core 5 and the surface plate is satisfactory, is high, and accordingly, an inferior part where the joint between the honeycomb core 5 and the surface plates is inferior can be inspected.
Patent JP-H01176064-A (JP)
Title: Formation of thermal sprayed film having excellent buildup resistance
Inventor: YAMAGAMI YOSHIAKI
IPC: C23C4/06
Filed: 1987-12-28
Abstract: PURPOSE:To form the title film having excellent resistance to wear and peeling by heating a mixture having the specified contents of the Al-Cr alloy having a specified composition and chromium carbide powder in the gaseous N2 atmosphere contg. a specified amt. of O2. CONSTITUTION:The mixture of an Al-Cr alloy contg. 10-30% Al and the balance Cr and 50-90wt.% chromium carbide powder is thermally sprayed on the surface of a substrate, and the thermal sprayed film is heated to 800-950 deg.c in the gaseous N2 atmosphere contg. 24-30vol.% O2. Since the Al-Cr alloy is used as a binder metal, resistance to buildup and oxidation, etc., are imparted to the thermal sprayed layer, the effect is enhanced as the Al amt. is increased, however the adhesion to the substrate is decreased at >30%. Meanwhile, the chromium carbide is highly resistant to buildup, oxidation, etc., and extremely hard, and has good wettability with the alloy. More than 50% is required to realize its characteristic, and peeling and cracking are easily caused at >90%. In addition, the O2 content in N2 must be controlled to >=24vol.%, and the film is deteriorated by oxidation at >30%.
Patent JP-H01175769-A (JP)
Title: Bipolar element with trench electrode
Inventor: UEDA KEITOKU
IPC: H01L29/732
Filed: 1987-12-29
Abstract: PURPOSE:To provide a bipolar element in which a large current can flow without increasing the size of the element, by providing a trench at an electrode part and forming a p-n junction by doping the side wall of the trench. CONSTITUTION:Trenches 14 and 15 are provided at an electrode part and a p-n junction is formed by doping the side wall of the trenches. For example, the trench 14 is formed at an emitter electrode part and the trench 15 is formed at a collector electrode part in an epitaxial layer 3 surrounded by an isolation 7 of a trench structure. A p-n junction is formed by doping the side walls of the trenches 14 and 15 with a P-type impurity such as boron. The trenches 14 and 15 are filled with metal such as titanium and tungsten or polycrystalline silicon and serve as electrodes. The depth D of the trenches 14 and 15 is approximately 5-6mum and the width thereof is approximately 0.5-several mum.
Patent JP-H11177093-A (JP)
Title: Manufacture of semiconductor device
Inventor: KONO MICHIHIRO
IPC: H01L27/12
Filed: 1997-12-05
Abstract: PROBLEM TO BE SOLVED: To narrow a base width and to improve the cut-off frequency of a bipolar transistor by forming a side wall at the upper portion of a bipolar transistor region and then implanting ions. SOLUTION: A side wall S2 consisting of a silicon nitride film 14 is formed on both side surfaces of a side wall S1 at the side of a MOSFET, and a side wall S3 consisting of the silicon nitride film 14 is formed on both side surfaces of a silicon oxide film 11 being located at an emitter part at the side of a bipolar transistor. Then, an entire surface at the side of the MOSFET is masked by resist and the silicon oxide film 11 is etched, and then ions are implanted on the entire surface region on the MOSFET and the bipolar transistor. A source/drain region at the MOSFET side and an emitter/collector region at the bipolar transistor side are simultaneously formed by ion implantation, thus forming a base width corresponding to the width of the side wall S3.
Patent JP-H03197746-A (JP)
Title: Lightweight foamed concrete curtain wall
Inventor: SASAKI TAKAHARU
IPC: E04B2/94
Filed: 1989-12-25
Abstract: PURPOSE:To simplify a structure by providing steps at the edges of respective panels, mutually superimposing the steps of the adjacent panels, arranging fitting members at the superimposed part and connecting the panels via the fitting members. CONSTITUTION:A plurality of lightweight foamed concrete panels 11 are arranged on the external face of a frame 2 to form a curtain wall 10 with a panel 11 which is fixed by a plurality of supporting members 12 with an L-cross section. Next, a step 14A is provided at the endface 13A of the upper panel 11 and at the inside of the step 14A, a long size fitting member 15A is arranged. Next, a step 14B is arranged at the lower panel 11 and a fitting member 15B is arranged every specified distance respectively. The fitting member 15A is put between the step 14B and the tongue 19B of the fitting member 15B to connect the panel 11 in a pressed condition. In this way, the structure is simplified and the edges can be securely connected.
Patent JP-H04205894-A (JP)
Title: Nonvolatile semiconductor storage device
Inventor: NOJIRI ISAO
IPC: G11C16/02
Filed: 1990-11-29
Abstract: PURPOSE:To suppress an increase in erasing time even when the number of repeated rewriting times increases so as to improve the usability of on-board rewriting carried out under the control of a CPU by raising an erasure voltage for extracting electrons from a floating gate following the increase in the repeated rewriting times. CONSTITUTION:When the number of repeated rewriting times, namely, the value of a counter 20 is small, a booster circuit 21 does not work and external power supply VPP or an erasure voltage which is dropped in level by several volts from the power supply VPP is outputted to a source line switch 3. When the number of repeated rewriting times increases to such a degree that the erasing time starts to become longer, the circuit 21 works to raise the erasure voltage. As the value of the counter 20 increases further, the circuit 21 further raises the erasure voltage. Therefore, an increase in the erasing time can be prevented after the number of repeated rewriting times increases and the usability of on-board rewriting can be improved under the control of a CPU.
Patent JP-H08242296-A (JP)
Title: Call connection system to subscriber with individual telephone number
Inventor: RARUFU KAARUSEN
IPC: H04M3/42
Filed: 1995-12-25
Abstract: PROBLEM TO BE SOLVED: To provide a system capable of easily accessing a personal telephone number. SOLUTION: Information indicating the final time (date) of subscriber's presence on a terminal such as intelligent terminals 101-2, 101-3, a facsimile equipment 101-4, or a similar device 101-1 is stored in the terminal and the stored information is remotely extracted from the terminal without executing telephone connection. A central processor 114 has a list of intelligent terminals previously specified so as to be used for the subscriber and inquires of all terminals on the list. When the personal telephone number of the subscriber is dialed, a specific intelligent terminal on the subscriber's list is inquired of by the processor 114 in response to the subscriber's call to determine the final time of subscriber' presence in each terminal. Then the processor 114 delivers the call to the terminal most recently visited by the subscriber.
Patent JP-2000163723-A (JP)
Title: Method and device for detecting clogging of recording head
Inventor: YODA HIROSHI
IPC: G11B5/455
Filed: 1998-11-27
Abstract: PROBLEM TO BE SOLVED: To confirm the recording state of a recording head without using a reproducing head in a clogging detector used for a VTR. SOLUTION: A test signal 5 of frequency lower than the erase frequency is recorded before and after the information signal 2 by an erase head 4. The test signal 5 is reproduced before and after the information signal 2 is recorded by the recording head 3, and this reproduced output is detected by a detecting circuit 10 and compared with a preliminarily set level by a comparison circuit 11. When the output is decreased than the level of set value, the alarm is given from an alarm circuit 15, thereby the recording fault caused by the clogging of the head is prevented.
Patent JP-H06186812-A (JP)
Title: Transfer device
Inventor: KIDO AKISHI
IPC: G03G21/08
Filed: 1992-12-16
Abstract: PURPOSE:To efficiently and surely remove photosensitive toner adhering to a transfer roller. CONSTITUTION:An electrostatic latent image formed on the thin layer of the photosensitive toner formed on a conductive drum 10 by the exposure of image light is transferred on recording paper 13 by the transfer roller 41. After the toner adhering to the surface of the roller 41 is irradiated with the light by a halogen lamp 44 and made conductive, it is carried to an area opposed to a recovering roller 45. The voltage of -400V is impressed on the roller 41, and the voltage of -700 to -800V is impressed on the roller 45, so that the toner made conductive on the roller 41 is shifted to the roller 45 by electric field formed between both of them, and recovered in a recovering container 42 by a recovering blade 43.