Patent DE-102012007503-A1 (DE)
Title: Filter medium, useful for purifying gases and/or gas mixtures, comprises first filter elements with a first adsorption material in the form of adsorbent particles, and second filter elements different from the first filter elements
Inventor: BOEHRINGER BERTRAM
IPC: B01D39/00
Filed: 2012-04-17
Abstract: The adsorptive filter medium (FM) comprises first filter elements (1) with a first adsorption material (3) in the form of adsorbent particles, and second filter elements (2) different from the first filter elements, where: the second filter elements have a second adsorption material in the form of adsorbent particles; and the first and second filter elements comprise pressure drops different from each other and/or flow resistances different from each other. The first filter elements are arranged upstream to the second filter elements. The adsorptive filter medium (FM) comprises first filter elements (1) with a first adsorption material (3) in the form of adsorbent particles, and second filter elements (2) different from the first filter elements, where: the second filter elements have a second adsorption material in the form of adsorbent particles; and the first and second filter elements comprise pressure drops different from each other and/or flow resistances different from each other. The first filter elements are arranged upstream to the second filter elements, and the second filter elements are arranged downstream to the first filter elements. The filter element with the lower pressure drop and/or the lower flow resistance is arranged upstream to other filter element in comparison with the filter element arranged upstream to the higher pressure drop and/or higher flow resistance. The FM is limited upstream of the first filter element. The filter element having the lower pressure drop and/or lower flow resistance is arranged downstream of a first positioned first filter element and a last positioned first filter element. The filter element having the higher pressure drop and/or flow resistance is arranged downstream of last positioned second filter element. The first and second filter elements are: stacked on top of each other; periodically arranged in a stack-shaped manner; arranged in the form of block; and/or arranged in immediate succession to one another. The FM is limited upstream of the block of the first filter elements. The block of the first filter elements is arranged downstream of a first positioned block. The FM is limited downstream of the block of the second filter elements. The block of the second filter elements is arranged downstream of a last positioned block. The FM, the first filter element and/or the second filter element is formed in a cylindrical-shaped manner. The first and second filter elements: comprise two planar and/or flat boundary surfaces and/or main extension planes that are arranged parallel to each other and perpendicular to a main flow direction; and have identical widths, depths and/or diameters based on the expansion transverse and/or vertical to the main flow direction. A height of the first filter element at a factor of 2 is larger than the height of the second filter element related to the expansion parallel to the main flow direction.