baber/WOPTO huggingface dataset:
Patent TW-397839-B (TW)
Title: Process for the synthesis of nucleic acids on a solid support and compounds which are useful in particular as solid supports in the said process
Inventor: BARANOVA LUDMILLA
IPC: C08F8/08
Filed: 1994-11-18
Granted: 2000-07-11
Abstract: Process for the preparation of a nucleic acid by synthesis on a solid support, characterized in that an inorganic or organic polymer is used as solid support, which polymer is connected via a divalent hydrocarbon radical to an epoxide group or a group of the glycol type, the latter group consisting of two adjacent saturated carbons on which an OH group and a nucleophilic group are respectively substituted; and compounds represented by the following formulae: in which: - one of R1, R'1, R""1, R2 and R'2 represents an inorganic or organic polymer or a hydrocarbon radical substituted with an inorganic or organic polymer, and the others are identical or different and represent, independently of each other, H or an inert group such as an alkyl group which is optionally substituted, in particular with one or more halogen(s), -Nu represents a nucleophilic group such as NH2, Halogen -OAlk, -SAlk, -NHAlk, -NHAc, -OAc, -SAc or -N(Alk)2, where Alk and Ac respectively represent an alkyl and acyl group, which is optionally substituted, in particular with one or more halogen(s).
Patent TW-363900-B (TW)
Title: Electrostatic spraying
Inventor: NOAKES TIMOTHY JAMES
IPC: A61M15/02
Filed: 1995-09-26
Granted: 1999-07-11
Abstract: A method and device (20, figure 2) for spraying particulate materials in which a high voltage is applied to a mass of the particulate material so as to cause particles to issue from the mass. High voltage from a source (16) is applied to a mass of material (36) stored in a container. A surface of the mass (36) is exposed to the surroundings and the applied voltage is conducted through the bulk material to particles located at the exposed surface which are thereby projected as an electrically charged spray from the mass under the influence of the electric field substantially without any accompanying corona discharge.
Patent TW-288177-B (TW)
Title: Process of growing SiO2 layer including fluorine on silicon substrate
Inventor: HU JENN-GWO
IPC: H01L21/36
Filed: 1996-03-28
Granted: 1996-10-11
Abstract: A process of growing SiO2 layer including fluorine on silicon substrate by anode oxidization under ambient temperature comprises of conducting one electrolysis reaction under ambient temperature, and forming SiO2 layer on silicon substrate used as anode, in which H2SiF6 solution, whose volume ratio of H2SiF6 to water is in the range of 1:10~1:2000, is used as electrolysis liquid of the electrolysis reaction, and current density of the electrolysis reaction is among 0.05~100 mA/cm2.
Patent TW-399083-B (TW)
Title: Fluorine-contained resin molded articles
Inventor: NAKAHARA AKIHIKO
IPC: C08J7/044
Filed: 1996-06-26
Granted: 2000-07-21
Abstract: The present invention relates to novel fluorine-contained resin molded articles having antistatic property, and specifically, the invention relates to fluorine-contained resin molded articles which exhibit good antistatic effect while maintaining properties inherent in the fluorine-contained resin and are fouled very little, owing to the provision of an antistatic layer of a fluorine-contained resin of which the surfacee resistivity is adjusted to be not larger than 10<13><OMEGA> by making present the ion-exchange groups on the surface layer of a base material composed of a fluorine-contained resin which does not substantially contain ion-exchange group.
Patent TW-385511-B (TW)
Title: Method for inspecting process defects occurring in semiconductor devices
Inventor: BAE SANG MAN
IPC: G03F1/36
Filed: 1996-09-25
Granted: 2000-03-21
Abstract: A method for inspecting process defects occurring in a semiconductor device, which utilizes the phenomenon that even when photo shield film patterns are used, patterns of an etchable layer have different dimensions at different positions in a field region. A first etchable layer is patterned using positive photoresist film patterns. A second etchable layer is then patterned using negative photoresist film patterns formed by use of the same light exposure mask used for the positive photoresist film patterns. The second etchable layer patterns have a dimension larger than the first etchable layer patterns on one side of the field region, thereby exhibiting low reflection. On the other side of the field region, the first etchable layer patterns are partially exposed, thereby generating high reflection. Based on the result of the detection, the defect inspection device measures positions, density and dimensions of the first etchable layer patterns having different critical dimensions at different positions. Accordingly, a variation in dimension of patterns caused by a proximity effect can be derived by quantitatively measuring the difference in critical dimension of the patterns at different positions in the field region, the characteristic of the lens of the stepper and errors occurring in the formation of photoresist film patterns of the mask.
Patent TW-328973-B (TW)
Title: Method and apparatus for fabricating a single-crystal semiconductor
Inventor: HIRAISHI YOSHINOBU
IPC: C30B15/00
Filed: 1996-11-13
Granted: 1998-04-01
Abstract: A method for fabricating a single-crystal semiconductor, which comprises pulling the single-crystal semiconductor from a melt in a crucible in the upper vertical direction, and isolating the growing single-crystal semiconductor from external atmosphere in a main chamber; which is characterized in that, the ratio between the flow rate of an inert falling gas introduced from the top of the main chamber and the flow rate of a whirling inert gas introduced into the main chamber in a tangential direction to the main chamber is controlled in order to regulate the oxygen concentration in the single-crystal semiconductor.
Patent TW-313696-B (TW)
Title: Method of forming contact window
Inventor: JEAN RONG-WU
IPC: H01L21/768
Filed: 1996-12-18
Granted: 1997-08-21
Abstract: A method of forming polymer spacer on photoresist sidewall to form one recess in-situ comprises of the steps: (1) supplying one semiconductor substrate, on which there is one overlapped non-conductive layer; (2) on the non-conductive layer, depositing and defining one photoresist pattern, so as to expose one reserved area used to form the recess; (3) depositing one polymer layer to overlap the photoresist layer and the reserved recess area; (4) anisotropically etching the polymer to form polymer spacer on the photoresist sidewall; (5) etching the non-conductive layer until the semiconductor substrate is exposed, so as to form the recess.
Patent TW-342489-B (TW)
Title: Music box
Inventor: IZUMIKAWA SHINROKU
IPC: G10F1/06
Filed: 1997-02-04
Granted: 1998-10-11
Abstract: A music box the frame thereof supporting: a vibration diaphragm having comb-like vibration valves; a drum for flicking the vibration diaphragm to play music; a driving source for driving and rotating the drum; and a speed control means for controlling the rotation speed of the drum; which is characterized in that: the speed control means comprises a position holding means which is arranged on the frame at a position forming an integral body with the frame, the position holding means comprising: a speed increasing gear train which has two stages of worms and a braking means provided atop of the speed increasing gear train; which stops at least the 1st worm positioned on a driving source side between the two worms from moving towards the advancing direction.
Patent TW-364163-B (TW)
Title: A dummy wafer
Inventor: SAITO KAZUO
IPC: H01L21/02
Filed: 1997-06-23
Granted: 1999-07-11
Abstract: A dummy wafer used in the process for film formation on the wafer, consists of a silicon carbide formed from the reaction of glassy carbon with silicon or silicon-containing gas, or of (1) a silicon carbide which is formed from the reaction of glassy carbon with silicon or silicon-containing gas, and (2) a silicon carbide layer formed by CVD. Such a dummy wafer has no disadvantage known in the prior art, doesn't warp, doesn't contain metallic semiconductor contaminants, has heat resistance, is not corroded by acid, such as hydrofluoric acid or hydrochloric acid, can be subjected to a plurality of heat treatment and inexpensive.
Patent TW-444035-B (TW)
Title: Aqueous dispersion polymers
Inventor: CONNORS EDWARD J
IPC: C08L57/00
Filed: 1997-11-15
Granted: 2001-07-01
Abstract: Water soluble, aqueous salt solution dispersible polymers and aqueous salt solutions containing dispersed polymers are produced by polymerization of ethylenically unsaturated soluble monomers in an aqueous salt solution in the presence of at least one carbohydrate. The polymers and aqueous salt solutions containing the dispersed polymers are useful for paper making, water clarification and emulsion breaking.
Patent TW-361057-B (TW)
Title: Apparatus and method for automatically inputting component information in automatic mounting device
Inventor: JIN SANGHUN
IPC: H05K13/08
Filed: 1997-11-27
Granted: 1999-06-11
Abstract: An apparatus and a method for automatically mounting component information in an automatic mounting device automatically store all position information and model information of electronic components to be mounted on a printed circuit board and mount the electronic component on the printed circuit board base on the information. In the method, image data of a printed circuit board are read out. The image data of a printed circuit are received and display. Position information and a component number re inputted. A center coordinate of a corresponding component, component list database is searched to thereby produce model information of the component, and the component list database including position and model information of the component are produced and stored. Equipment for mounting respective components from the information which is recorded in the component list database is determined, numerical control data according to a format of respective equipment is produced, stored, and is outputted into corresponding equipment. The method automatically inputs model and position information with respect to electronic component to be mounted in a device for mounting electronic components on a printed circuit board.
Patent TW-416261-B (TW)
Title: Process and apparatus for the treatment of coated printed circuit boards
Inventor: KUSTER KASPAR
IPC: F26B21/00
Filed: 1998-03-12
Granted: 2000-12-21
Abstract: In a process and an apparatus for the treatment of flat-form material, especially of coated printed circuit boards, wherein the printed circuit boards are subjected to various treatment processes in succession, such as airflow treatment, drying, cooling and the like, while they are being transported through a housing in which the various treatment processes are carried out, there are provided in the housing, for the purpose of improving control of the process and increasing the adaptability of the treatment installation, individual treatment zones separate from one another, and the printed circuit boards are conveyed into the individual treatment zones in groups, a separate treatment process being carried out in each treatment zone.
Patent TW-410260-B (TW)
Title: Microwave oven
Inventor: FURUTA KAZUHIRO
IPC: F24C7/02
Filed: 1998-05-14
Granted: 2000-11-01
Abstract: The objective of the present invention is to improve heating efficiency, eliminate heating unevenness, and simplify the structure of a microwave oven. To achieve the objective, a rotary disc 9 provided on the bottom of a heating chamber 2 is provided with vertical bars 9b continuously expanding in one direction and horizontal bars 9c with a length of less than 1/2 of wavelength <lambda> of microwave, and square openings 9e. An optical sensor is provided so as to detect whether or not the rotary disc 9 is positioned at the reference position, and it can be stopped at a desired stopping position by controlling the energizing time of RT motor on the basis of its starting time. When 'heating rice' is selected, the rotary disc 9 turns by an angle A and stops there to be heated, and when 'heating sake' is selected, it turns by an angle B and stops there to be heated. The stopping position of the rotary disc 9 where the optimal electric boundary distribution can be obtained according to the kind of food is obtained experimentally in advance, and its result is stored.
Patent TW-400529-B (TW)
Title: Field emission element
Inventor: NIIYAMA TAKAHIRO
IPC: H01J1/304
Filed: 1998-06-09
Granted: 2000-08-01
Abstract: This invention provides a electrical field emission element which could prevent the out of control condition of the cathode electode line1due to the short of the emitter electrode and the gate electrode, etc. A cathode electode line is composed of cathode wiring 2 of the stripe shaped and a plurity of island shaped electrode 3 which is lined and settled in its single side, the cathode electode 8 is settled on the insulative layer 6 of the upper region of each  island shaped electrode 3. At the resistor layer for the current control, there settled the first portion with various resistor coefficient and the 4th and the 5th portion of the second resistor layer of the laminated layer. When the emitter grain passes through the current, the film thick portion of the laminated layer is being destructed, thus it could only cut off the island shaped electrode 3 wiring in the emitter grain 3 from the cathode wiring 2. The second resistor layer 5 is to make the local laminated layer on the first resistor layer 4 individually toward a plurity of the island shaped electrode 3.
Patent TW-369586-B (TW)
Title: Cooling control device and cooling control method for internal combustion engine
Inventor: SANO MITSUHIRO
IPC: F01P7/16
Filed: 1998-07-01
Granted: 1999-09-11
Abstract: A cooling control device that processes high precision temperature management with forecast status of temperature changes of cooling water, and realizes raising life and reliability of device and to lower the overall price of the device. From DC motor 31, clutch member 32, speed reducing member 33 control to control butterfly valve 34b movement to adjust flow rate of cooling water, to cool the engine down to an optimal temperature. The ECU supplies to the DC motor 31 a PWM signal generated by fast response control and PI control based on at least the loading information of the internal combustion engine, and controls the rotation of the butterfly valve 34b. The opening of the butterfly valve 34b used for controlling the cooling water flow rate is controlled by a thermocouple element 35 sealed by thermal-expansive object such as wax. A PTC heater 40 is installed with the thermocouple element 35 and an electric power is supplied to the PTC heater 40 based on the engine rotation parameters to control cooling efficiency of cooling water. Therefore, one can use the characteristics of butterfly valve with a very small rotational torque and with less element of bearing mechanical stress, to raise life and reliability of the device. Therefore, can use the characteristics of butterfly valve to enable rotating thread distance to be very small, also with less important element of bearing mechanical stress, to raise life and reliability of the device.
Patent TW-421978-B (TW)
Title: Ballast
Inventor: GRADZKI PAWEL M
IPC: H05B41/392
Filed: 1998-07-17
Granted: 2001-02-11
Abstract: A light source including a ballast characterized by a resonant frequency and including a reference bus and a transformer having a secondary winding. A fluorescent lamp is partially covered by a shield, connected to the reference bus and coupled to the secondary winding. The ballast further includes a current sensor connected between the secondary winding and reference bus for sensing current flow through at least the lamp including that portion of lamp current attributable to parasitic capacitances affecting the resonant frequency.
Patent TW-379267-B (TW)
Title: Dyeing processes synchronous automatical dispensing control system
Inventor: WU JUNG-FU
IPC: D06B23/26
Filed: 1998-07-22
Granted: 2000-01-11
Abstract: A kind of dyeing process synchronous automatical dispensing control system, for use in liqud dyeing machine for automatical dispensing control with high-temperature discharge, cleaning features without conventional dispensing operations, or additional controls such as dispensing drum, dispensing pump, control valve, controller etc., while integrating the high-temperature discharge, cleaning and automated dispensing as control features, without additional control systems, for significant reduction of the manufacture cost and upgrading the automation speed of the during mill and, when used in synchronization with any dyeing process, this system would be of optimal industrial performance.
Patent TW-426990-B (TW)
Title: High impedance bias circuit for AC signal amplifiers
Inventor: STANCHAK CARL M
IPC: G05F1/573
Filed: 1998-09-17
Granted: 2001-03-21
Abstract: The present invention discloses an integrated constant bias voltage generator using only active devise to simulate a high impedance node, as seen from a capacitively coupled input signal. A reference current source an MOS device are coupled in series between Vcc and ground with the drain electrode of the MOS device being the constant bias voltage output. An input signal capacitively coupled to said drain electrode introduces an error current monitored by a current monitoring means. A feedback means responsive to the current monitoring means modulates the control input of the MOS device to select a IDS vs. VDS characteristic curve which will maintain the VDS voltage constant for any given IDS current, including the error current. The feedback means also compensates for voltage fluctuations in Vcc.
Patent TW-516965-B (TW)
Title: A cosmetic light-screening composition for protecting human skin or human hair against ultraviolet radiation and novel sunscreening agents
Inventor: BRINGHEN ALAIN
IPC: A61K8/00
Filed: 1998-10-01
Granted: 2003-01-11
Abstract: The invention relates to a cosmetic light-screening composition for protecting human skin or human hair against ultraviolet radiation containing at least one compound of formula I wherein R1 represents a C1-8 straight or branched alkyl chain, and R2 and R3 each independently represent a C1-8 straight or branched alkyl chain.
Patent TW-585854-B (TW)
Title: D-proline derivatives
Inventor: HERTEL CORNELIA
IPC: A61K31/00
Filed: 1998-10-29
Granted: 2004-05-01
Abstract: The invention relates to D-prolines of the formula, wherein R is SH, benzyl or phenyl, optionally substituted by hydroxy or lower alkoxy or formula the group R1 is hydrogen or halogen; X is -(CH2)n-; -CH(R2)(CH2)n-; -CH2O(CH2)n-; -CH2NH-; benzyl, -C(R2)=CH-; -CH2CH(OH)-; or thiazol-2,5-diyl; Y is -S-S-; -(CH2)n-; -O-; -NH-; -N(R2)-; -CH=CH-; -NHC(O)NH-; -N(R2)C(O)N(R2)-; -N[CH2C6H3(OCH3)2]-; -N(CH2C6H5)-; -N(CH2C6H5)C(O)N(CH2C6H5)-; -N(alkoxyalkyl)-; -N(cycloalkyl-methyl)-; 2,6-pyridyl; 2,5-furanyl; 2,5-thienyl; 1,2-cyclohexyl; 1,3-cyclohexyl; 1,4-cyclohexyl; 1,2-naphthyl; 1,4-naphthyl; 1,5-naphthyl; 1,6-naphthyl; biphenylen; or 1,2-phenylen, 1,3-phenylen and 1,4-phenylen, wherein the phenylen groups are optionally substituted by 1-4 substituents, selected from halogen, lower alkyl, lower alkoxy, hydroxy, carboxy, -COO-lower alkyl, nitrilo, 5-tetrazol, (2-carboxylic acid-pyrrolidin-1-yl)-2-oxo-ethoxy, N-hydroxycarbamimidoyl, 5-oxo-[1,2,4]oxadiazolyl, 2-oxo-[1,2,3,5]oxathiadiazolyl, 5-thioxo-[1,2,4]oxadiazolyl and 5-tert-butylsulfanyl-[1,2,4]oxadiazolyl; X' is -(CH2)n-; -(CH2)nCH(R2)-; -(CH2)nOCH2-; -NHCH2-; benzyl, -CH=C(R2)-; -CH(OH)CH2; or thiazol-2,5-diyl; R2 is lower alkyl, lower alkoxy or benzyl and n is 0-3, and to pharmaceutically acceptable salts and mono- and diesters thereof. The D-prolines of formula I-A and I-B can be used in the treatment or prevention of all forms of central and systemic amyloidosis.
Patent TW-512257-B (TW)
Title: Projection exposure apparatus and exposure method
Inventor: FURTER GERHARD
IPC: G03F7/20
Filed: 1998-11-26
Granted: 2002-12-01
Abstract: The invention provides a projection exposure apparatus for the flat panel display (FPD) manufacture having an objective array and magnifying objectives (O1 to O5).
Patent TW-436638-B (TW)
Title: Wide field of view projeciton lenses for compact projection lens systems employing pixelized panels
Inventor: MOSKOVICH JACOB
IPC: G02B27/18
Filed: 1998-11-30
Granted: 2001-05-28
Abstract: A projection lens for use with LCD panels is provided. The lens has a first lens unit(U1) which includes a strong negative lens element (E1) having an aspherical surface which provides distortion correction and a second lens unit (U2) which includes a strong positive power first lens subunit (U2s1) separated by an airspace from a weaker power second lens subunit (U2s2). The second lens subunit can include a negative lens element, followed by a positive lens element, followed by a plastic lens element having an aspherical surface. The projection lens has a field of view of at least 30 degree so that the overall projection lens system has a compact size.
Patent TW-406487-B (TW)
Title: Single cable transmission device used for signal and power monitoring and control system
Inventor: LIOU YAN-SZ
IPC: H04B3/54
Filed: 1998-12-31
Granted: 2000-09-21
Abstract: This invention provides a single cable transmission device used for signal and power monitoring and control system, which only uses a single cable enabling transmission of various signals and power source. A carrier method is employed to transmit the signals, enabling longer distance transmission, and a frequency division method is employed to perform a full duplex signal transmission. Also, a status display is provided for showing the power source voltage and output loading to assist user to judge directly the cause of a fault, allowing to quickly remove it.
Patent TW-428033-B (TW)
Title: Manufacture of iron-nickel alloy for electron gun parts
Inventor: YUKI NORIO
IPC: C21D6/00
Filed: 1999-01-18
Granted: 2001-04-01
Abstract: To provide a method for manufacturing an Fe-Ni alloy for electron gun parts, improved in blankability without causing the problem of deterioration in die life. The Fe-Ni alloy for electron gun part is manufactured by subjecting an Fe-Ni alloy, having a composition consisting of, by weight, 30 to 55% Ni, ≦0.8% Mn, 0.01 to 0.050% S, 0.005 to <0.5, in total, of one or ≧2 elements among Ti, Mg, Ce, and Ca, and the balance Fe with inevitable impurities, to a process consisting basically of melting, casting, hot working, cold rolling, and annealing. In this case, 0.00005 ≦ [%X][%S] ≦ 0.0100 is satisfied where [%S] and [%X] represent the content of S and the total content of Ti, Mg, Ce, and Ca, respectively, and further, hot working is performed by carrying out heating up to a temperature T shown by the following inequality. 1,050 ≦ T(DEG C) ≦ 19,500/(8.5-log[%X][%S])-350.