Patent SG-11201810125T-A (SG)
Title: Liquid filtering in removing photoresist from a wafer
Inventor: MCHUGH PAUL
IPC: G03F7/20
Filed: 2017-05-26
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property 1111111111111011101111111111111111111111111111111111111111111111111111111111111111110111111 Organization International Bureau (10) International Publication Number (43) International Publication Date .....0\"\"\") WO 2017/218165 Al 21 December 2017 (21.12.2017) WIP0 I PCT (51) International Patent Classification: (81) Designated States (unless otherwise indicated, for every HO1L 21/027(2006.01) H01L 21/02 (2006.01) kind of national protection available): AE, AG, AL, AM, GO3F 7/20 (2006.01) AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, (21) International Application Number: CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, PCT/US2017/034685 DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, (22) International Filing Date: KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, 26 May 2017 (26.05.2017) MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, (25) Filing Language: English SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, (26) Publication Language: English TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (30) Priority Data: (84) Designated States (unless otherwise indicated, for every 62/350,078 14 June 2016 (14.06.2016) US kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, (71) Applicant: APPLIED MATERIALS, INC. [US/US]; UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, 3050 Bowers Avenue, Santa Clara, CA 95054 (US). TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, (72) Inventors: MCHUGH, Paul, R.; 127 Sherry Lane, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, Kalispell, MT 59901 (US). HANSON, Kyle, Moran; 110 MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, Greenbriar Drive, Kalispell, MT 59901 (US). KLOCKE, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, _ John, L.; 143 West Swift Creek Way, Kalispell, MT KM, ML, MR, NE, SN, TD, TG). — 59901 (US). BERGMAN, Eric, J.; 942 Birch Grove Rd., = Kalispell, MT 59901 (US). CRANE, Stuart; 15 Velva Dr., Published: Kalispell, MT 59901 (US). WILSON, Gregory, J.; 427 6th — with international search report (Art. 2 I (3)) = Avenue East, Kalispell, MT 59901 (US). = (74) Agent: OHRINER, Kenneth, H. et al.; Perkins Coie LLP, — P.O. Box 1247, Seattle, WA 98111-1247 (US). = = (54) Title: LIQUID FILTERING IN REMOVING PHOTORESIST FROM A WAFER = (57) : In systems and methods for removing a photoresist film = 80 off of a wafer, the wafer is moved into a bath of a process liquid in a = process tank. The process liquid removes the photoresist film from the = 64 wafer. The process liquid is pumped from the process tank to a filter = 92 a assembly and moved through filter media to filter out solids from the 17 _ 0 , 7 process liquid, and the filtered process liquid is returned to the process = = 68 _ = 70 = ir - e ,.. . 4111111 . 1 1 10 4 11 MS; ....„ 60 tank. A scraper scrapes the filter media to prevent clogging of the filter media by accumulated solids. 76 = = Cl a (C I C 62 '''Ir liroigt -1 4 9 / 1 , I ii 72 La w Agri 74 11 lit..„4, 111 90 82 X ir) 88 84 86 N I' 11 GC WM Ma 11 ei IN FIG. 3 1-1 0 ei C