Patent SG-11201906817T-A (SG)
Title: Chuck systems and methods having enhanced electrical isolation for substrate-biased ald
Inventor: SERSHEN MICHAEL J
IPC: C23C16/458
Filed: 2018-01-23
Abstract: FIGB 200 100,, 110 112 116 160 150 120 152 42 ,202 40 4 156 122 154 126 (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 02 August 2018 (02.08.2018) WIP0 I PCT olimion °nolo olomoiminimommo oimIE (10) International Publication Number WO 2018/140394 Al (51) International Patent Classification: C23C 16/455 (2006.01) B33 Y 80/00 (2015.01) C23C 16/458 (2006.01) (21) International Application Number: PCT/US2018/014840 (22) International Filing Date: 23 January 2018 (23.01.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/451,377 27 January 2017 (27.01.2017) US (71) Applicant: ULTRATECH, INC. [US/US]; 3050 Zanker Road, San Jose, CA 95134 (US). (72) Inventors: SERSHEN, Michael J.; 18 Mt. Vernon Street, Cambridge, MA 02140 (US). BERTUCH, Adam; 27 Boardman Lane, South Hamilton, MA 01982 (US). (74) Agent: HELLER, II, Morgan S.; Downs Rachlin Mar- tin PLLC, 199 Main Street, P.O. Box 190, Burlington, VT 05402-0190 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, (54) Title: CHUCK SYSTEMS AND METHODS HAVING ENHANCED ELECTRICAL ISOLATION FOR SUBSTRATE-BIASED ALD (57) : A chuck system for performing a substrate-biased atomic layer deposition process that forms an electrically conductive film on a substrate includes an electrically conductive substrate holder configured to support the substrate and an electrically conductive base that supports the substrate holder. An electrical isolating layer is sandwiched between the substrate holder and the base. The electrical isolating layer has an outer end and an edge recess formed in and that runs around the outer edge. The edge recess is configured to prevent the electrically conductive film from coating the entire interior of the edge recess, thereby maintaining electrical isolation between the substrate holder and the base. [Continued on next page] WO 2018/140394 Al MIDEDIMOMOIDEIRDEIDIOMOIOM011110HOMMOVOIMIE TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))