baber/WOPTO huggingface dataset:
Patent JP-H05267285-A (JP)
Title: Manufacture of semiconductor device
IPC: H01L21/316
Filed: 1992-03-19
Abstract: PURPOSE:To achieve flattening in the formation of a layer insulation film of silicon dioxide. CONSTITUTION:In a process wherein the irregularities generated on a semiconductor substrate 1 by the formation of a wiring pattern on the substrate 1 are flattened out with a silicon dioxide film formed by a TEOS-O3 reaction, a magnet 4 is provided, opposite the substrate 1, on the head side where a reaction gas is supplied, and a gas phase reaction is accomplished with the magnet 4 being caused to approach to the substrate 1.
Patent JP-S60204530-A (JP)
Title: Start control device in original copy transfer device
Inventor: YAMAMOTO HARUO
IPC: G03G21/00
Filed: 1984-03-30
Abstract: PURPOSE:To aim at enhancing the efficiency of work, by providing a means for automatically resetting the condition of a paper feed device for a copying machine at a starting position when the machine is stopped during feed of an original copy due to a power failure, etc., in the start control device. CONSTITUTION:An original copy feed device 3, is composed of a paper feed starting roller 25 which may take two conditions, the contact condition with respect to an original copy D on an original copy tray 26 and a separating condition therefrom, an original copy feed roller 24a positioned downstream of the starting roller 25 in the direction of feed of the original copy, and an overlap- feed preventing roller 24b laid in parallel with and below the feed roller 24a, which rollrs are coupled together by means of a mechanical means, and is further composed of a clutch CL between the rollers and a drive source therefor to allow intermittent feed of original copies. A start control device for this original copy feed device 3 is composed of a means for driving the drive source for a predetermined time in association with a turn-on of a power source, a means for checking whether the terms of feed of original copies are satisfied or not after a predetermined time elapses, and a means for redriving the drive source after the terms of feed of original copies are satisfied.
Patent JP-S53149449-A (JP)
Title: Device for projecting trimming cutter of electric razor
Inventor: MAEDA TAKAO
IPC: B26B19/12
Filed: 1977-05-31
Abstract: PURPOSE: To provide a device for projecting a trimming cutter of an electric razor to be easily used by projecting the cutter from the body of the razor only when conducting an edge shaving operation. 
     COPYRIGHT: (C)1978,JPO&Japio
Patent JP-S52148699-A (JP)
Title: Preparation of low salt soy
Inventor: KUSUTO OSAMU
IPC: A23L27/50
Filed: 1976-05-31
Abstract: PURPOSE: To prepare low salt soy easily and economically by the dialysis of brewed soy with specific selective permeable membrane. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-S54156490-A (JP)
Title: Forming method of current path in semiconductor
Inventor: OOMURA KAZUMICHI
IPC: H01L21/3205
Filed: 1978-05-31
Abstract: PURPOSE: To realize complicated wiring between elements with high reliability, by forming the conductive region surrounded with insulator in the semiconductor substrate.  
     CONSTITUTION: 0 ions are injected to the opening 3 of the SiO 2  film 2 on the Si substrate 1, and the SiO 2  layer 4 is selectively formed to a given depth. Succeedingly, the diffusion layer 5 is made by doping the impurity of p or n type to constitute current path itself. Next, the film 2 is removed and the epitaxial layer 1a and SiO 2  6 are laminated. The layer 6 is selectively opened 7a,7b, 0 ions are injected, SiO 2  layer 8 is formed, the current path side surface is insulated and it is continued to the layer 4. The SiO 2  6 between the holes 7a and 7b is removed and the epitaxial layer and SiO 2  layer are again laminated. It is repeated until the thcikness of the diffusion layer and the height of the insulation wall 8 at the current path side surface reach desired value. Finally, the SiO 2  9 is deposited, 0 ions are injected to the opening, to form the SiO 2  10, and the diffusion layer 5 is the current path 11 surrounded with the insulation layer. The implanted current path 11 can be formed to an arbitrary depth, and resistance is low and the reliability is greater. 
     COPYRIGHT: (C)1979,JPO&Japio
Patent JP-S57181369-A (JP)
Title: Production of alloy wire for deposition hardening type spring
Inventor: ISHIDA KAZUNARI
IPC: C22F1/08
Filed: 1981-04-28
Abstract: PURPOSE: To reduce wear during heat treatment and pickling and to obtain an alloy wire for deposition hardening type springs having excellent workability by subjecting a prescribed alloy to a soln. heat treatment then to primary drawing followed by a deposition hardening treatment and again drawing.  
     CONSTITUTION: A Cu-Ni-Si alloy or the like is subjected to a soln. heat treatment then to drawing of ≥50% reduction of area. Thence, it is subjected to a deposition hardening treatment, then to ≥95% drawing, whereby an alloy wire for springs is obtd. According to this method, wear during hardening and pickling is reduced. While high reduction ratios are employed overall, the alloy wire for deposition hardening type springs that withstands severe bending is obtained. 
     COPYRIGHT: (C)1982,JPO&Japio
Patent JP-S62221421-A (JP)
Title: Drying agent
Inventor: UCHIKAWA HIROSHI
IPC: B01D53/28
Filed: 1986-03-22
Abstract: PURPOSE:To prepare a drying agent of superb basic performance as a drying agent and applicable to a wide range of substances to be dried by using sepiolite as major content. CONSTITUTION:After crushing a sepiolite raw ore and adjusting grain sizes or forming fragments or crushings by granulation, etc., a product is prepared by heat treatment. Also, acid treatment is effective in enhancing drying performance. The drying agent thus prepared is safe and easy to handle, applicable over a wide range of use, having superb basic performances such as dehumidification speed, drying strength, drying capacity and the like and economical because of its simplified manufacturing process.
Patent JP-S58181124-A (JP)
Title: Controlling method of reactive power
Inventor: SHIMOMURA MASARU
IPC: G05F1/70
Filed: 1982-04-15
Abstract: PURPOSE:To average loads of respective turbines, by controlling the reactive power in combined cycle power generation in consideration of a capacity curve and the average value of respective turbines. CONSTITUTION:If some turbine is stopped to cause the imbalance of the reactive power, the operation state of each turbine is moved onto a curve RS indicating the reactive electric energy of a constant ratio from the maximum reactive electric energy, and thus, the ratio of the reactive electric energy to the maximum reactive electric energy is a ratio a/b at a point E in any turbine. Consequently, when one turbine is stopped, the reactive power is distributed to other turbines on the average.
Patent JP-H03269110-A (JP)
Title: Cation-dyeable fiber
Inventor: HIRAKAWA SEIJI
IPC: D01D5/30
Filed: 1990-03-14
Abstract: PURPOSE:To obtain the subject fiber, composed of a modified copolymer having groups, electrolyzable into anions in water in a specific proportion and bonded to side chains of an ethylene-vinyl alcohol-based copolymer and having excellent hand. CONSTITUTION:The objective fiber obtained by spinning an ethylene-vinyl alcohol-based copolymer with 30-70mol% ethylene unit content or carrying out conjugate spinning of the aforementioned copolymer and other crystalline thermoplastic polymers (preferably nylon 6, etc.) at (10:90)-(90:10) weight ratio, preferably forming a fabric from the resultant fiber or conjugate fiber and then introducing or bonding groups (preferably sulfuric acid ester, etc.) electrolyzable into anions in water in an amount of 0.5-30mol% based on the total number of mol of ethylene units and vinyl alcohol-based units into side chains of the ethylene-vinyl alcohol-based copolymer according to acetalization, etc.
Patent JP-S58187802-A (JP)
Title: Optical type profiling device
Inventor: DEYURE FURANSOWA
IPC: A61C9/00
Filed: 1983-04-14
Abstract: Dental prostheses, such as crowns, inlays or dentures are produced automatically based upon an optical impression taken of the oral region wtih nontraumatic radiation. The reflected waves are transformed into numerical data which is used directly to operate a numerically controlled machine in the fabrication process. The process is pertinent to other medical applications as well.
Patent JP-S60207680-A (JP)
Inventor: MIMURA AKIYOSHI
IPC: A63B69/36
Filed: 1984-03-30
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H07246675-A (JP)
Title: Laminated sheet for extrusion tube and extrusion tube container
Inventor: SAKAMOTO HISASHI
IPC: B32B27/30
Filed: 1994-03-08
Abstract: PURPOSE:To provide a laminated sheet for an extrusion tube leaving no ash when subjected to incineration treatment and having excellent characteristics in barrier properties and an extrusion tube container having-excellent action even in aroma retention. CONSTITUTION:A laminated sheet 1 for an extrusion tube is characterized by that a vapor deposition film 3 of inorg. oxide is used on an intermediate resin layer and a rear surface resin layer 4 is formed from a non-crystalline-low crystalline polyester resin, a polyacrylonitrile resin or an ethylene/vinyl alcohol copolymer resin. An extrusion tube container is produced from the laminated sheet for the extrusion tube.
Patent JP-S63229854-A (JP)
Title: Manufacture of bipolar transistor
Inventor: NISHIO FUMINOBU
IPC: H01L29/72
Filed: 1987-03-19
Abstract: PURPOSE:To facilitate the control of an active region and to contrive the speedup of a device by a method wherein an SiO2 layer is doped with Ga, which is diffused in an N-type Si layer, and after self-formation of a P<+> base contact region, base and emitter regions are independently formed. CONSTITUTION:An SiO2 layer 4 which is a field insulating layer, a CVD SiO2 layer 6, a CVD SiN layer 7 and so on are laminated on an N-type Si layer 3 grown on a P-type Si substrate 1. Then, the layer 6 is doped with Ga<+> via the outward diffusion preventing layer 7 and the layers 7 and 6 are patterned to open an active region and a contact region. CVD SiN layers 8 are each formed in these opening parts and when a necessary annealing is performed, the Ga<+> of the layer 6 is activated and diffused in the layer 3 and a P<+> base contact region 3BB is automatically formed. After that, a base region 3B and an emitter region 3E are formed through polysilicon layers 9, wherein B<+> for forming a base and As<+> for forming an emitter are each implanted, independently of the region 3BB. Thereby, the active region is easily controlled, the low- resistance base of a thin thickness can be made and the speedup of a device can be contrived.
Patent JP-H03265129-A (JP)
Title: Manufacture of semiconductor device
Inventor: TAKASU HIROAKI
IPC: H01L21/265
Filed: 1990-03-15
Abstract: PURPOSE:To manufacture a semiconductor element formation layer in specific impurity concentration all over the whole semiconductor surface by a method wherein, in order to introduce impurities in the element formation layer, the ion implantation process in differentiated peak positions of impurity concentrationin in the depth direction is separately performed several times. CONSTITUTION:A semiconductor substrate in a structure having a semiconductor element formation layer 1 on a holding substrate 3 through the intermediary of an insulating layer 2 is formed. Next, the element formation layer 1 is implanted with impurities by ion implantation process. At this time, the ion implantation process is separately performed several times so that the peak impurity positions may be differentiated in the depth direction. For example, within the impurity profile in the five time repeated ion-implantation processes, even if the film thickness of the formation layer 1 is dispersed in the substrate 3, a semiconductor device in even impurity concentration (c) all over the whole substrate surface can be manufactured. Through these procedures, an element can be formed in high yield all over the whole substrate surface.
Patent JP-H01238061-A (JP)
Title: High frequency transistor
Inventor: MITSUMOTO KAZUFUMI
IPC: H01L29/73
Filed: 1988-03-17
Abstract: PURPOSE:To reduce both of the operation resistance and the collector junction capacity by increasing an area of an emitter region and the peripheral length without increasing an area of a base region. CONSTITUTION:Without making the action of each stripe-shaped emitter region independent, the respective stripe-shaped emitter regions are connected by an expanded emitter region E so as to increase the area of the whole emitter region, while extending the whole peripheral length of the outer periphery and the inner periphery of the emitter region. Since a current concentrates on the side near the base contact 8b of the emitter region, the expanded emitter region E effectively acts as an active region. Thereby, the emitter saturated voltage drops and the operation resistance is reduced. Here, the base region 1 is needless to be expanded so that the collector junction capacity does not increase.
Patent JP-S61225020-A (JP)
Title: Method for controlling injection molding machine using servo motor
Inventor: SAKAMOTO KEIJI
IPC: B29C45/77
Filed: 1985-03-30
Abstract: PURPOSE:To output constant torque even if the voltage of a power source varies, by operating a function generator corresponding to an actual speed and controlling a torque restricting circuit on the basis of the output of the function generator when the actual speed increases. CONSTITUTION:The output of an error amplifier 5 is inputted to multipliers 6, 7 through a torque restricting circuit 17 while the torque restricting circuit 17 is controlled by a function generator 16 which is, in turn, operated by the output from an absolute value circuit 15 for outputting the absolute value of the actual speed of a servo motor M being the output of an F/V converter 4. The output of the function generator 16 is set so as to issue the output for restricting torque so as to coincide with the torque curve generated by the lowering in the max. voltage of a power source expected by variation. Because torque capable of being outputted, when the voltage of a power source is lowered, is always restricted by this mechanism, the torque order to the servo motor M, that is, an armature current value thereto becomes constant even if the voltage of the power source varies up and down and constant output torque is always obtained.
Patent JP-H09255714-A (JP)
Title: Method for treating resin composition, and resin material
Inventor: MIZUTA KEIICHIRO
IPC: C08K5/06
Filed: 1996-03-21
Abstract: PROBLEM TO BE SOLVED: To provide a method for treating a resin compsn. whereby a free thiol compd. contained in the compsn. is effectively deactivated, a resin material which can solve the problem of odor due to a thiol compd., and a resin material which is obtd. by treating a monomer-contg. resin compsn., is excellent in storage stability, can be cured in a short time, and provides a molding excellent in resistances to heat, solvents, weather, and water. SOLUTION: In this method, a vinyl ether compd. and/or a vinyl thioether compd. is added to a resin compsn. A (meth)acrylic syrup formed by copolymerizing a monomer component contg. a (meth)acrylic ester in the presence of a thiol compd. is pref. as the monomer-contg. resin compsn. The resin material is obtd. by treating the resin compsn. by this method.
Patent JP-S61275307-A (JP)
Inventor: AYLWARD DAVID E
IPC: C08F4/00
Filed: 1986-03-25
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S59183755-A (JP)
Inventor: DEIBUITSUDO JIYOZEFU FUIIRUDO
IPC: A47B67/00
Filed: 1984-03-30
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H04299140-A (JP)
Title: Manufacture of laminated metallic sheet
Inventor: FUNAKI MICHIHIRO
IPC: B32B37/15
Filed: 1991-03-28
Abstract: PURPOSE:To provide a method manufacturing at favorable yield a laminated metallic sheet having excellent corrosion resistance and adhesion. CONSTITUTION:A flexible thin material 15 is interposed between a cooling roll 1 and metallic plate 3, overcoated resin is prevented from adhering to the cooling roll 1, through which a laminated metallic sheet 8 can be manufactured at favorable yield, in manufacturing of a laminated metallic sheet 8 where the preheated metallic sheet 3 wound round the cooling roll 1, to which a nip roll 2 is pressure contacted is coated with molten thermoplastic resin 6.
Patent JP-S61227524-A (JP)
Title: Prazosin preparation and production thereof
Inventor: NARA TAKESHI
IPC: A61K47/00
Filed: 1985-03-30
Abstract: PURPOSE:To obtain a prazosin preparation useful as an antihypertensive, having prazosin dispersed in an amorphous state in a compounding base, by dissolving prazosin and a specific compounding base in an organic solvent and removing the solvent. CONSTITUTION:Prazosin and one or more compounding bases selected from PVP, PEG, propylene glycol, water-soluble gel high polymer (e.g., hydroxypropyl cellulose, MC, etc.), base soluble in the stomach (e.g., polyvinylacetal diethylaminoacetate, etc.), enteric base (e.g., hydroxypropylmethyl cellulose phthalate, etc.) is dissolved in an organic solvent and the solvent is removed, to give the titled preparation. A blending ratio of prazosin to the compounding base is preferably 1:10 (weight ratio). Prazosin is dispersed and dissolved in an amorphous state in the base and the preparation has more improved solubility and absorption properties than alpha form of prazosin hydrochloride.
Patent JP-S58181830-A (JP)
Title: Circulating-type vacuum degasifier
Inventor: TAKENAKA MASAKI
IPC: C22B9/04
Filed: 1982-04-19
Abstract: PURPOSE:To obtain the titled degasifier which enables to continuously measure the circulating rate of steel melt even during operations and consequently to perform the efficient treatment of the steel melt, by detecting distances to the surface parts of the steel melt in a vacuum vessel just above a suction pipe and an exhaust pipe, and then obtaining the difference between outputs from two telemeters. CONSTITUTION:A vacuum vessel 14 equipped with a suction pipe 12 and an exhaust pipe 13 at its bottom is provided at the upper side of a ladle 10 to be filled with steel melt 11. In addition, two telemeters (e.g. microwave level meters) 15, 16 are provided just above these pipes 12, 13, respectively. The telemeters 15, 16 measure the levels of the circulating steel melt just below them and supply the resulting outputs to a subtracting unit 19 through filters 17, 18, respectively, for removing noises. Then, the subtracting unit 19 obtains the difference between the outputs from the telemeters 15 and 16 and dispatches the signal of the resulting difference to an arithmetic unit 20. The circulating rate of the steel melt 11 is obtained from the differential output from the subtracting unit 19 by the arithmetic unit 20 and then indicated at an indicating unit 21. Thus the circulating rate of the steel melt can be continuously measured, and a product of good quality can be obtained.
Patent JP-H07268153-A (JP)
Title: Heat-resistant and impact-resistant resin composition
Inventor: MORI HIROSHI
IPC: C08L23/00
Filed: 1994-04-01
Abstract: PURPOSE:To obtain the subject resin composition containing a maleimide-based copolymer, a rubber-reinforced resin synthesized by conducting graft polymerization of acrylonitrile, styrene, etc., on a butadiene-based rubber and another thermoplastic resin, excellent in heat resistance and impact resistance and resistive to thermal degradation. CONSTITUTION:With (A) 5 to 95wt.% maleimide-based copolymer composed of a copolymer of a monomer such as a maleimide-based monomer, an aromatic vinyl monomer and a methacrylic acid ester monomer and another vinyl monomer and having <=3 Mw/Mn, i.e., ratio of the weight-average molecular weight (Mw) of this copolymer to the number-average molecular weight (Mn) and 0.3 to 1.5dl/g intrinsic viscosity, (B) 5 to 95wt.% rubber-reinforced resin synthesized by conducting a two stage graft polymerization in the presence of a butadiene-based rubber using acrylonitrile, styrene and alpha-methylstyrene in a specified ratio and (C) <=75wt.% thermoplastic resin other than these resins are blended, thus affording the objective resin composition excellent in heat resistance and impact resistance and resistive to thermal degradation.
Patent JP-S56161797-A (JP)
Title: Manufacture of core material for plane diaphragm plate
Inventor: SHIMADA KUNIHIKO
IPC: H04R31/00
Filed: 1980-05-19
Abstract: PURPOSE:To make cores with high accuracy through a simple facility, by bonding the part other than folded parts of a plurality of folded sheet members, extending a part of the folded part to shape of chrysanthemum flower after cutting off a part of the folded part, and bonding the members at both ends. CONSTITUTION:A plurality of sheet members 10a folding thin material with light weight like aluminum foil are overlaid, and after they are bonded with an adhesives 10c except around a folded part 10b, they are cut off by leaving a part of the folded part 10b, e.g., at the position shown in chain lines in figure. Next, the opposite side of the folded part 10b is compressed to one point, the folded part is opened and extended into shape of chrysanthemum flower, the sheet members at the both ends are bonded to form the core member in which the external circumference is circular and the thickness changes along a radial line. When the part is cut off at the position shown in chain lines in figure, the cross section of the core member is a chevron type. Other shapes can be obtained depending on the cut position. The similar result can be obtained by folding in zigzag for one sheet member in place of a plurality of sheet members.
Patent JP-H06273609-A (JP)
Title: Production of color filter
Inventor: ONO NORIKATSU
IPC: G02B5/20
Filed: 1993-03-24
Abstract: PURPOSE:To provide the process for production of the color filter capable of efficiently producing the color filter provided with a light shielding layer having a sufficient optical density with high accuracy. CONSTITUTION:A photosensitive resin compsn. layer 15 is formed via a conductive layer 13 on a substrate 12. This photosensitive resin compsn. layer 15 is exposed and developed via a photomask having prescribed patterns to expose the prescribed regions of the conductive layer 13. Nonconductive resin compsn. layers 17R are formed in a part of the exposed surfaces of the conductive layer 13. Desired colored layers 14R are formed by electrodeposition only on the exposed surfaces of the conductive layer 13 not provided with the nonconductive resin compsn. layers 17R and thereafter, only the nonconductive resin compsn. layers 17R are removed. The colored layers 14R consisting of a prescribed number of colors are formed by repeating these operations. Further, the colored layers 14R are formed by electrodeposition on the surface of the conductive layer on which neither the photosensitive resin compsn. layer 15 nor the colored layers 14R are formed and thereafter, the light shieldable colored layers are formed on the exposed surfaces of the conductive layers generated by removing only the photosensitive resin compsn. layer 15.