Patent SG-11201902595U-A (SG)
Title: A method of depositing a tin layer on a metal substrate and a use of a structure comprising a nickel/phosphorous alloy underlayer and said tin layer with said method
Inventor: NEOH DIN-GHEE
IPC: H01R13/03
Filed: 2017-10-24
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property MD 1101111 0 DOI HIM 0111 110 1 0 0111111111H111111111111111111111111111111111 Organization International Bureau (10) International Publication Number (43) International Publication Date .....0\"\"\") WO 2018/077874 Al 03 May 2018 (03.05.2018) WI P0 I P C T — (51) (21) (22) (25) Filing Language: (26) (30) (71) (72) International Patent Classification: Berlin (DE). RUTHER, Robert; c/o Atotech Deutsch- C25D 5/18 (2006.01) H01R 13/03 (2006.01) land GmbH, Patent Management, ErasmusstraBe 20, C25D 5/14 (2006.01) C25D 5/12 (2006.01) 10553 Berlin (DE). BARTHELMES, Jurgen; c/o Atotech C23C 18/16 (2006.01) Deutschland GmbH, Patent Management, ErasmusstraBe International Application Number: 20, 10553 Berlin (DE). KURTZ, Olaf; c/o Atotech PCT/EP2017/077156 Deutschland GmbH, Patent Management, ErasmusstraBe 20, 10553 Berlin (DE). International Filing Date: (74) Agent: SCHULZ, Hendrik; c/o Atotech Deutschland 24 October 2017 (24.10.2017) GmbH, Patent Management, ErasmusstraBe 20, 10553 English Berlin (DE). Publication Language: English (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, Priority Data: AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, 16195351.8 24 October 2016 (24.10.2016) EP CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, Applicant: ATOTECH DEUTSCHLAND GMBH DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, [DE/DE]; ErasmusstraBe 20, 10553 Berlin (DE). HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, Inventors: NEOH, Din-Ghee; c/o Atotech Deutschland MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, GmbH, Patent Management, ErasmusstraBe 20, 10553 OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, Berlin (DE). TAN, Chee-Chow; c/o Atotech Deutsch-SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, land GmbH, Patent Management, ErasmusstraBe 20, 10553 TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. Berlin (DE). LIM, Jen Joo; c/o Atotech Deutschland GmbH, Patent Management, ErasmusstraBe 20, 10553 —TR, = = Title: A METHOD : To achieve is devised, on at least depositing said tin layer comprising using a pulse plating method. PRISING A NICKEL/PHOSPHOROUS ALLOY UNDERLAYER AND SAID TIN LAYER WITH SAID METHOD ce) _ = ---.. substrate GC underlayer OF DEPOSITING A TIN LAYER ON A METAL SUBSTRATE AND A USE OF A Figure 4 STRUCTURE COM- a tin layer on a metal alloy alloy underlayer = (54) = = — 3 E ...c 46 25 C lu 20 tIO E- 15 ,.. n -1. i .....0 J c c co -' a) 30 . Example _ = = — 5 8 = = = _ 9 = - = 1-1 ii- IN cc IN IN (57) 0 1-1 © by N 6 7A 7B tin deposits being largely free of pressure induced whiskers, a method of depositing wherein said method comprises: (a) providing said metal substrate; (b) depositing a nickel/phosphorous one surface of said metal substrate; and (c) depositing said tin layer on said nickel/phosphorous C [Continued on next page] WO 2018/077874 Al MIDEDIMOMOIDEIREIDIONOMMOHOHNEVOIS (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))