baber/WOPTO huggingface dataset:
Patent JP-H0987125-A (JP)
Title: Composite filler for dental purpose and dental material containing the same
Inventor: UEDA TERUSHI
IPC: A61K6/884
Filed: 1995-09-21
Abstract: PROBLEM TO BE SOLVED: To simply produce a dental material excellent in filling properties, low shrinkage, wearing resistance and polishing properties in low costs by dispersing fine particles of colloidal silica with particle sizes of a nano meter order in a resin in the primary particle dispersion. SOLUTION: Colloidal silica with an average particle size of <=50nm is stuck to the surface of polymer particles prepared by emulsion polymerization of a radically polymerizable vinyl compound in an aqueous medium to prepare composite particles. In the emulsion polymerization, a phosphate emulsifier or a carboxylate emulsifier is employed. The polymer particles recommendably contains at least one of group selected from alkoxysilyl groups and silanol groups. In addition, the polymer fine particles are preferably prepared by emulsion polymerization of a mixture of radically polymerizable vinyl compounds, and alkoxy silanes bearing a mercapto group or an ethylenically unsaturated group in an aqueous medium.  The objective composite filler is extremely useful as a dental material over a wide range of applications, for example, as a composite resin, a resin for tooth crown, hard resin and for artificial teeth.
Patent JP-S61120937-A (JP)
Title: Mtf measuring apparatus
Inventor: MOCHIDA YOSHIO
IPC: G01M11/02
Filed: 1984-11-19
Abstract: PURPOSE:To elevate the accuracy of the measured value and the reliability, by making a Ronchi grating scan continously having a pattern in the radial and tangential directions to reduce the measuring time of the MTF value. CONSTITUTION:First, light made parallel with a collimator lens 43 focuses on the surface of a Ronchi grating 29 with a lens 44 to be inspected. A rotating shaft 45 is set near the second main point of the lens 44 to make the lattice 29 scan continuously in the direction (a). Light passing through the lattice 29 is converted into an electrical signal with a photoelectric conversion stand 31 to calculate the MTF in the radial and tangential directions of an image and the lattice 29 is deforcused to detect the best focus position from the positional relationship between a scale 33 and a sensor 34 to maximize the MTF value whereby the deviation can be in the flange back of the lens 44. On the other hand, a table 30 is turned and the MTF value outside the axis is determined by turning the lens 44. A personal computer 38 receives a signal of the stand 31 and performs a specified computation to determine the MTF value of the lens 44 to be outputted.
Patent JP-H08107316-A (JP)
Title: Integrated microwave circuit
Inventor: YOSHII YASUSHI
IPC: H03F3/193
Filed: 1994-10-07
Abstract: PURPOSE: To reduce the number of components and to prevent an excessive current to a FET till a negative voltage is applied to a gate by a negative voltage generating circuit by adopting a specific circuit configuration for an amplifier. CONSTITUTION: An amplifier is provided with a FET 2, a resistor 22, a capacitor 21, and an inductor 20. One terminal of the resistor 22 connects to a drain electrode of the FET 2; the other terminal of the resistor 22 connects to a source electrode of the FET 2 and the inductor 20; and the other terminal of the inductor 20 connects to a low power supply (ground). The capacitor 21 short-circuits the source electrode and a constant power supply in terms of AC by connecting the constant power supply (ground) to the other terminal of the capacitor 21.  Since a potential of a drain electrode of the FET 2 and a potential of the source electrode ar kept almost the same till a prescribed time calculated by the resistance and inductance elapses after a voltage is applied to the source electrode of the FET 2 by a transient response by the resistor 22 and the inductor 20, it is prevented that an excessive current flows to the FET 2.
Patent JP-S61121664-A (JP)
Title: Image-forming device
Inventor: KAWAMURA HIDEAKI
IPC: H04N1/40
Filed: 1984-11-19
Abstract: PURPOSE:To make smooth the optimum parametor necessary to form an image by dividing an image-forming area into plural areas by an image-forming means at the time of test print mode, and having a control means to control an image- processing means so that the image processing can be executed by the different parameter for respective areas. CONSTITUTION:In the example, 640 samplings are executed in the horizontal scanning direction and 480 samplings are executed in the vertical scanning direction when the image is formed, and when the histogram is obtained, 64 samplings are executed at an interval of 10 samplings in the horizontal scanning direction. From the above, after dark and highlight points are set, the actual image-forming is executed. Normalized (RGB CMY is also converted.) C-M-Y data are sent to a masking circuit 7 to remove the non-uniform color component of ink to be printed next, and printed at an ink jet printer main body 9. When the test print mode is on, the histogram is obtained. The element, which changes a dark point only, is divided and printed.
Patent JP-H0296049-A (JP)
Title: Mounting method of frc slab and frc slab used for method concerned and fixture
Inventor: SAKURAI SENTARO
IPC: E04B1/38
Filed: 1988-09-30
Abstract: PURPOSE:To uniformize the thickness of an FRC slab to enhance its strength and to increase the flexibility of a mounting position by exposing a mounting plate to the FRC slab and burying fixtures consisting of a plurality of coupling bars in parallel with each other and a plurality of mounting plates. CONSTITUTION:A steel mounting plate 13 in the shape of a shallow channel is buried into two steel coupling bars 11 in parallel with each other at a proper interval, and a fixture 11 to be welded at the side of the opening is buried into an FRC slab 14 in place, provided that the outside 13a of the mounting plate 13 is only exposed from the FRC slab 14. After that, the FRC slab 14 is mounted to the skeleton 2 of a building through the mounting plate 13, L-type 15 and 19. The fixture 11 is made thin to uniformize the thickness of the FRC slab 14, and the covering thickness of the coupling bars 12 is deepened by an interval between the outside surface 13a of the mounting plate 13 and coupling bars 12 to enhance its strength. Accordingly, a mounting area of the mounting plate 13 is so large that the flexibility of a mounting position can be increased.
Patent JP-S62105257-A (JP)
Title: Control system for data channel interruption
Inventor: MASUDA TAKESHI
IPC: G06F13/24
Filed: 1985-11-01
Abstract: PURPOSE:To limit an influence range by increasing data channels without increasing the number of interruption source flip-flops. CONSTITUTION:When an interruption occurs to one of data channel devices DCH21-DCH2n, the corresponding fF of the FFG 41 in an interruption control circuit 40 illuminates. Then, an interruption source flip-flop 11 is turned on through an interruption information line 400 to cause an interruption to a CPU 101. The CPU 10 sends out an input instruction to the DCH interruption control circuit 40 through a process bus 100 to discriminate the number of the data channel device. An output instruction is sent to the control circuit 40 after the interruption processing to reset the contents of the FFG 41.
Patent JP-H08111342-A (JP)
Title: Zinc deposited base material for metallized capacitor and production thereof
Inventor: IMAI MAKOTO
IPC: H01G4/015
Filed: 1994-10-07
Abstract: PURPOSE: To provide a new zinc deposited base material for metallized capacitor required for producing a zinc deposited capacitor having practically satisfactory moisture resistance and a production method thereof. CONSTITUTION: The zinc deposited base material for metallized capacitor has a zinc deposition layer at least on one side of a base body of a film or a thin paper for capacitor. A zinc nucleus adhesion layer composed of at least one kind of titanium and zirconium oxide, a zinc deposition layer, and a protective layer are formed sequentially on a base body. The zinc nucleus adhesion layer, composed of at least one kind of titanium and zirconium oxide, is formed at least on one side of the base body of film or thin paper for capacitor using at least one kind of silicon, titanium, zirconium or an oxide thereof as a deposition source. The zinc deposited layer is then formed thereon followed by formation of the protective layer.
Patent JP-H0295782-A (JP)
Title: Reciprocating and rocking type piston pump
Inventor: NAKANO HIROMITSU
IPC: F04B39/00
Filed: 1988-09-30
Abstract: PURPOSE:To perform the smoothness of intake air and the promotion of exhaust as well as to abate both intake and exhaust noises by installing each taper hole surface, pointing to each different specified direction, in an intake port and an exhaust port opening to the inside and outside of a pump case. CONSTITUTION:A piston pump 10 is provided with an exhaust port 23 and an intake port 24 opening to the inside and outside of a pump case and an exhaust reed valve 25 and an inlet reed valve 26 in its cylinder head 21. In a head cover 22, there are provided with an exhaust end connection 27 and an inlet end connection 28. In this case, a taper hole surface 31, with a specified angle theta, pointing to place nearer to a cylinder inner surface at the side where a capacity extending rate in the pump case becomes enhanced by rocking motion of a piston 15 at an inlet stroke starting stage, is installed in the intake hole 24. Likewise, in the exhaust port 23, there is provided with a taper hole surface 32, with a specified angle theta, pointing to place nearer to the cylinder inner surface at the side where a capacity contracting rate in the pump case becomes enhanced by rocking motion of the piston 15 at an exhaust stroke starting stage.
Patent JP-2000077082-A (JP)
Title: Solid electrolyte fuel cell
Inventor: YAMASHITA SHOJI
IPC: H01M8/12
Filed: 1998-08-31
Abstract: PROBLEM TO BE SOLVED: To provide a fuel cell capable of increasing sintering property of a current collecting layer even in simultaneous sintering with an LaMnO3 base air electrode material, and suppressing the decomposition of the current collecting layer caused by moisture. SOLUTION: A current collecting layer 4 has a perovskite composite oxide containing at least La and Cr as metal elements as main components. In addition, 0.5-3.0 wt.% La2O3 is included, and an La2O3 low concentration layer 9 is arranged on a free surface 8 side not connected to an air electrode 1 of the current collecting layer 4, and an La2O3 high concentration layer 11 whose La2O3 concentration is higher by 0.7 wt.% or more than the La2O3 low concentration layer 9 is arranged on the air electrode 1 side of the current collecting layer 4.
Patent JP-S61124133-A (JP)
Title: Plasma treating device
Inventor: KAKEHI YUTAKA
IPC: H01L21/302
Filed: 1984-11-21
Abstract: PURPOSE:To uniformly treat a sample by arranging magnets on a magnet securing plate so that the mean of a magnetic flux density distribution at one revolution time becomes uniform at radial positions, and rotatably providing magnet elements in a plane perpendicular to an electric field. CONSTITUTION:A wafer 20 is conveyed in vacuum state into a treating chamber 10, and mounted on a wafer mounting surface of a sample electrode 30 in upward direction to be treated. When power is applied from a high frequency source to the electrode 30, a glow discharge is generated in a discharge space 40 to obtain a plasma. Since N-pole 62a and S-pole 63a of a magnet element 60a are disposed perpendicularly to an electric field formed by the electrode 30 and an opposed electrode 50 in a magnetic field direction, a strong plasma is obtained at the upper position of the surface to be treated of the wafer 30 corresponding between the poles 62a and 63a. It is formed to expand from the vicinity of the center of the surface to be treated of the wafer 20 to the peripheral edge at he center, and the element 60a is rotated. Thus, the surface to be treated of the wafer 20 is exposed entirely with uniform and strong plasma, and the surface to be treated of the wafer 20 is uniformly etched at a high speed.
Patent JP-H04124826-A (JP)
Title: Semiconductor production device
Inventor: OTAKE TOSHIHIRO
IPC: H01L21/306
Filed: 1990-09-14
Abstract: PURPOSE:To obtain a wet-etching device, in which no etching unevenness is generated in a treating surface, by providing a treating tank opened upward in a diameter larger than the diameter of a wafer, a liquid supply means supplying the inside of the treating tank with an etchant and a specific impeller horizontally turned in the etchant in the treating tank. CONSTITUTION:A semiconductor production device, in which an etchant 2 is brought into contact with the underside of a wafer 1 and the underside of the wafer 1 is etched, has a treating tank 11, which has a diameter larger than the diameter of the wafer 1 and is opened upward, a liquid supply means 15 supplying the inside of the treating tank 11 with the etchant 2, and an impeller 13 horizontally rotated in the etchant 2 in the treating tank 11 including a shaft 13a and blades 13b installed around the upper section of the shaft, and the shaft 13a has a central hole 13aa enabling the flowing of the etchant 2 along the axis of the shaft. Said impeller 13 has auxiliary blades 13c in the lower section of the shaft 13a, and the liquid supply port 15a of the liquid supply means 15 are faced oppositely to the auxiliary blades 13c and arranged near the blades 13c so as to be turned by the liquid flow of the etchant 2.
Patent JP-S6397502-A (JP)
Inventor: TAKEUCHI SUSUMU
IPC: B65F3/20
Filed: 1986-10-14
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S6490104-A (JP)
Title: Controller for violet root rot
Inventor: OTOMO YOSHIMITSU
IPC: A01N35/06
Filed: 1987-09-30
Abstract: PURPOSE:To obtain an inexpensive and simple controller against violet root rot using high antimicrobial action thereof without leading to environmental pollution, comprising hinokitiol of natural occurring substance as an active ingredient. CONSTITUTION:A natural controller which comprises natural or synthetic hinokitiol (beta-thujaplicin) shown by the formula as an active ingredient, has extremely weak toxicity to organisms, is simply usable, has great effects even with a very small amount and shows excellent effects on prevention and treatment of fire blight of plants.
Patent JP-2001140316-A (JP)
Title: Heat insulating structure for molding
Inventor: SATO HIROSHI
IPC: F16L59/02
Filed: 1999-08-31
Abstract: PROBLEM TO BE SOLVED: To provide a heat insulating structure for a molding capable of realizing a sufficient heat insulation effect and capable of easily coping with recycling. SOLUTION: A heat insulating space is formed by ribs in this heat insulating structure for the molding, and the heat insulating structure is provided with granular members stored in the space and a holding member removably fitted to the opening section of the space to hold the granular members in the space. The granular members can be extracted from the space by removing the holding member. The granular members are resin foam beads with the grain size of 1-8 mm, for example, or the granular members different in grain size may be mixed for use, and the molding is the waterproof pan of a system bath unit.
Patent JP-2001068552-A (JP)
Title: Semiconductor integrated circuit device
Inventor: MATSUMURA YOICHI
IPC: H01L21/82
Filed: 1999-08-31
Abstract: PROBLEM TO BE SOLVED: To prevent a temporary voltage drop which is caused locally, in a circuit of a standard cell type semiconductor integrated circuit device. SOLUTION: A power terminal 11 is provided at one end part of a standard cell 10 of the semiconductor integrated circuit device, and a ground terminal 12 is provided at the other end part facing the terminal part. Along the gate length of the cell 10, an N-type diffused layer 15 is formed on the side of the power terminal 11 and a P-type diffused layer 16 is formed on the side of the ground terminal 12 with mutual intervals inbetween. In one region of the N-type diffused layer 15 about a gate electrode 14, an in-cell power line 11a extending from the power terminal 11 is formed. An upper-layer wiring pattern 19, having a via hole 18 interposed with the in-cell power line 11a, is formed covering an in-cell ground line 12a, and consequently a capacity part 20 is formed which has the in-cell ground line 12a as a lower electrode and the upper-layer wiring pattern 19 as an upper electrode.
Patent JP-H0960111-A (JP)
Title: Joint of column and beam
Inventor: SHOJI ETSUJI
IPC: E04B1/58
Filed: 1995-08-17
Abstract: PROBLEM TO BE SOLVED: To reduce welding work when combining a column with a beam, thereby cut down cost and enhance productivity and enhance strength stability of a structure as well. SOLUTION: The outside surface of a column is restrained by an integrally cast cylinder-shaped joint 1 with a collar which restrains the column and is capable of binding a beam with the column, thereby combining the stresses of the column and the beam by the application of compression and friction forces so as to enable working and assembling to be executed easily. In addition to that, a wedge-like friction piece 2 is interposed so as to enhance the friction force and facilitate assembling as well.
Patent JP-H0292547-A (JP)
Title: Base for liquid jet recording head and liquid jet recording head equipped with such base
Inventor: ASAI AKIRA
IPC: B41J2/14
Filed: 1988-09-29
Abstract: PURPOSE:To improve quality of an image by improving reproducibility of boiling by a method wherein an electricity-heat converter of a shape of increasing a thickness is established in a part containing a position at which a bubble to be generated in recording liquid on a recording liquid contact surface corresponding to a heat generation part disappears, and a temperature difference between inside and outside the position at which the bubble disappears attains a specific value. CONSTITUTION:A bubble disappearing position is determined by a shape of a liquid path 1 to which a heating resistor is arranged, an arranged position, temperature, other ambient conditions, etc., is influenced by an inertia component Z of hydrodynamic impedance in a bubble peripheral drainage basin, and the bubble disappears near a position at which the heating resistor is proportionally allocated by an reverse ratio of Z. The bubble disappearing position is obtained by the formulas [I], [II] from the inertia component Z of impedance of the drainage basin. Herein, lengths of the drainage basin are l1, l2, sectional area of the liquid path is S, and density of liquid is rho. The bubble disappears near a position to be determined by those relation formulas. Then, by increasing a thickness of a heating resistor 107 layer at a part containing said position, heat flux transmitted to upper liquid decreased. Then, a difference in temperature between a peak value of surface temperature of the heating resistor and a peak value of surface temperature of an area in which the layer thickness is increased is 25 deg.C or higher up to and including 100 deg.C.
Patent JP-H1183744-A (JP)
Title: Emission spectral analysis of ni and cr in stainless steel
Inventor: YAMAMOTO AKIRA
IPC: G01N21/67
Filed: 1997-09-10
Abstract: PROBLEM TO BE SOLVED: To provide an emission spectral analysis method for stainless steel which can combine the quantitative analysis of molten stainless steel which has been conducted in two different systems into one system. SOLUTION: At the time of determining the Ni and Cr elements contained in a metal sample, by causing spark discharge many times between the metal sample and a counter electrode in an inert gas atmosphere, selecting the natural spectral lines of the Ni and Cr elements from the spectral lines obtained from each discharge, and then, comparing the intensities of the natural spectral lines with analytical curves prepared in advance by using standard samples for indicating the relations between the intensities and the concentrations of the Ni and Cr elements, the spark discharge is performed with such an energy output that may reduce the quantity of generated plasma and, at the same time, the wavelengths of the natural spectral lines of the selected Ni and Cr elements are respectively adjusted to 227.7 nm and 298.9 nm.
Patent JP-S61124164-A (JP)
Title: Well manufacture of semiconductor device
Inventor: OKUMURA NOBUO
IPC: H01L27/08
Filed: 1984-11-20
Abstract: PURPOSE:To simplify the steps by opening a recess at the intermediate between the first and the second regions of a semiconductor substrate, and implanting impurity ions from the surface side of the substrate to simultaneously implant the impurity ions to the first region and the recess. CONSTITUTION:The first resist films 2, 3 remain on the surface of a semiconductor substrate 1, the substrate 1 is then placed on a hot plate, far ultraviolet ray is emitted while raising the temperature, and the films 2, 3 are cured. Then, a photoresist is coated on the entire substrate 1, an alignment is performed to allow a resist film 5 to remain on the layer 3 on the second region, a development is performed, and recesses 6, 7 are opened by anisotropically etching by ion reactive etching in the intermediate between the first and the second regions. The layers 5, 2, 3 are removed, the resist layer 12 is removed, the oxide film 13 is dry oxidized on the substrate, and an oxide 14 is buried in the recesses 6, 7. Thus, the well and a channel stop region are formed in the substrate by one ion implantation to simplify the steps.
Patent JP-S62107219-A (JP)
Title: Oil pump driving device for engine
Inventor: ODA HIDETSUGU
IPC: F01M1/02
Filed: 1985-10-31
Abstract: PURPOSE:To prevent the load due to the driving of a balancer shaft from acting on an oil pump by driving the balancer shaft on one side to one direction via an idle gear by means of a power transmission member, and driving directly the balancer shaft on the other side to the other direction respectively. CONSTITUTION:When a crankshaft 17 is turned, respective upper and lower stage sprockets 22 and 21 are driven. And a camshaft 33 is driven by the first chain 35 interlocked with the lower stage sprocket 21 via a sprocket 34. On the other hand, an idle gear 24 is driven by the second chain 38 interlocked with the upper stage sprocket 22 via a sprocket 25, and the left balancer shaft 18 is driven in the counterclockwise direction via a drive gear 23 which is engaged with the idle gear 24, and at the same time the right balancer shaft 19 is driven in the clockwise direction via a sprocket 27. Furthermore, a pump shaft 29 is driven via a pump gear 28 which is engaged with a drive gear 26.
Patent JP-2000073995-A (JP)
Title: Work execution method of casing for rotary pump, and method of and device for centering work execution position
Inventor: KAMIMURA HIDEMI
IPC: F04D29/52
Filed: 1998-08-31
Abstract: PROBLEM TO BE SOLVED: To improve the finishing accuracy of a surface of a casing by turning a turning arm so as to work a surface to be placed with cement of an inner surface of the casing along a turning arc, and moving the position of the turning arm along a core of a pump. SOLUTION: Length of a telescopic mechanism part 46 of a turning arm 42 is set at the maximum, and the turning circular orbit is adjusted so as to coincide with the pre-forming dimension. Cement is placed in the inner surface of a casing groove 20, and a turning arm 42 is oscillated for turning, and evened so that the surface is formed at the execution dimension. Mesh is stretched in the surface so as to hold the shape, and an execution carrier 30 is lowered along the casing groove 20, and the same work is repeated to a lower end. A pre-forming layer 22 is thereby concluded. The execution carrier 30 is reset to the upper end position, and length of the turning arm 42 is shortened by the thickness of an intermediate forming layer 24. Finally, a mortar layer 26 is placed by repeating the same work from over, and a surface formed along the turning circle is finished by a trowel 44.