baber/WOPTO huggingface dataset:
Patent JP-H06281363-A (JP)
Title: Recovery method for iron contents in steel-making slug and slug recycling method and apparatus
Inventor: HORII KAZUHIRO
IPC: C04B5/02
Filed: 1993-03-30
Abstract: PURPOSE:To efficiently recover iron contents from steel-making slug by a method wherein coarse crushed slug is further crushed by maintaining a specified relation between the steam pressure and processing time period in a pressure vessel using steam generated by contact of cooling water with high-temperature slug, and iron contents having quality levels within a specified range are recovered by means of magnetic dressing process. CONSTITUTION:High-temperature molten slug 4 discharged from a steel-making furnace is poured into a slug pan 3 made of steel plate. After the slug 4 discharged solidifies, a bucket 1 is lowered down and struck onto the solid slug to perform coarse crushing. The coarse crushed slug is put in a tank 5 and cooling water is sprayed from above in the tank 5 to maintain the inside of the tank 5 within a range of 3.50>=P<0.6>XT<0.4>>=1.48 (P<=15, T<=1), where P is steam pressure (kg/cm<2>) and T is processing period of time (hr), so that the solid slug is sharply cooled down and crushed into fine particle slug. Finally, the fine particle slug is processed by a magnetic dressing machine 8 to recover roughly-refined steel having quality levels of 40-80%. Thus, the iron contents can be efficiently recovered.
Patent JP-H09264265-A (JP)
Title: Gear pump
Inventor: HAMAZAKI YOSHIAKI
IPC: F04C2/18
Filed: 1996-03-27
Abstract: PROBLEM TO BE SOLVED: To reduce frictional resistance generated in a contact part between the outer circumference of a gear pair and the inner circumference of a gear chamber via an oil film so as to suppress a power consumption in a standby operation preparing for a normal use by eliminating substantial contact between the outer circumference of the gear pair and the inner circumference of the gear chamber. SOLUTION: A supporting hole B is formed in a side plate for supporting a gear pair with its center point B1 shifted from the center point A1 of on outer circumference circle A of the side plate toward a delivery chamber 6 side by a distance α and toward the opposite side of the other supporting hole of the gear pair by a distance β.  When the outer circumference circle A of the side plate, which is displaced by a working force working on the gear pair during the operation, is brought into contact with an inner circumference circle C of a gear chamber at the point A2 so as to be locked, the center point B1 of the supporting hole B is substantially matched with the center of the inner circumference circle C of the gear chamber, and between the outer circumference of the gear pair supported by the supporting hole B and the inner circumference of the gear chamber, a predetermined clearance is secured around the overall circumference, so that contact between them can be prevented.
Patent JP-H02250973-A (JP)
Title: Film forming device
Inventor: NARITA NORIYOSHI
IPC: C23C16/46
Filed: 1989-03-25
Abstract: PURPOSE:To inhibit the film forming reaction in the vicinity of a gas introducing means and to prevent film formation for the gas introducing means by providing a means for reducing heat rays reaching to the gas introducing means from a heating means in a treatment chamber. CONSTITUTION:The gas to be treated is introduced to a treatment chamber 1 from both an oxidative gas introducing mechanism 10 and a reductive gas introducing mechanism 11 in such a state that a semiconductor wafer 2 has been heated via a susceptor 3. The inside of the treatment chamber 1 is vacuumized and exhausted and a film is formed on the wafer 2. The heat rays radiated to the directions of the gas introducing mechanisms 10, 11 from the susceptor 3 and the wafer 2 are absorbed by the inside surface of a gas duct 13. The amount of the heat rays reaching to the gas introducing mechanisms 10, 11 is reduced. Therefore film formation on the mechanisms 10, 11 can be prevented. Generation of dust and unnecessary consumption of the gas to be treated are prevented and thereby good quality film forming treatment is effectively performed.
Patent JP-H06286560-A (JP)
Title: Safety device of air bag module
Inventor: SUGIYAMA TOSHIYUKI
IPC: B60R21/20
Filed: 1993-03-31
Abstract: PURPOSE:To enlarge the range of confirmation for lock and unlock by providing a safe operation lever which is rotationally moved from a projecting position outside a housing to a position nearly along the wall on the housing side so as to drive a second cam to rotate. CONSTITUTION:In a second cam plate 14. the large diameter part 14a and the small diameter part 14b are connected together through a step part 14c, but respective ones are formed into circular arc faces, and hence as far as the large diameter part 13a of a first cam plate 13 is contacted with the circular arc face of the large diameter part 14a of the second cam plate 14, even if the second cam plate 14 is rotationally moved, the lock of a starting device is left to be unlocked. Further, as far as the cam face of the large diameter part 13a of the first cam plate 13 is contacted with the circular arc face of the small diameter part 14b of the second cam plate 14, even if the second cam plate 14 is rotationally moved, the starting device is maintained to be locked. Hereby, some surplus is given in the range of the rotational moving operation of a safe operation lever 15.
Patent JP-H11267951-A (JP)
Title: Production plan forming system of single continuous manufacturing process and production plan forming method
Inventor: YOKOYAMA MASAKI
IPC: G06Q50/04
Filed: 1998-03-20
Abstract: PROBLEM TO BE SOLVED: To prevent the bias of a manufacturing load and also properly keep the stock without being late for the appointed date of delivery by providing a second correcting means for transforming, to the production plan of the day discriminated by a second discriminating means, a part of the production plane of the day after this day to correct the production plan of the discriminated day. SOLUTION: A second discrimination part 24 retrieves the production plan corrected by a first correction part 23, and discriminates the day of the production plan not satisfying the operation time of one day. Since a prescribed operation time of one day is 24 hours, the first day is discriminated in the production period. The period to be retrieved is generally conformed to the target period of production plan formation. A second correction part 25 corrects the production plan corrected by the first correction part 23 by transferring at least a part of the production plan of the day after the day of the production plan discriminated by a second discrimination part 24 to this day. Since the first day is discriminated by the second discrimination part 24, the day after the first day, or two rots of the second day herein are moved to the first day.
Patent JP-S59199963-A (JP)
Inventor: YOSHIDA TOKUICHIROU
IPC: E04D13/00
Filed: 1983-04-25
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S61232292-A (JP)
Inventor: TAKEBAYASHI YUKIO
IPC: C05F7/00
Filed: 1985-04-08
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S58190022-A (JP)
Title: Surface processing with ion beam
Inventor: OKAMURA SHIGERU
IPC: H01L21/265
Filed: 1982-04-30
Abstract: PURPOSE:To observe wafer surface or to detect the mark for matching by utilizing ion beam of light weight element which does not show electrical activation even after it is implanted. CONSTITUTION:Monosilane is sprayed to the area near the needle-shaped electrode 1 which is cooled to a temperature arond liquid helium using a nozzle 10 and field electrolytic dissociatin into Si<+> and H<+> occurs when a high voltage is applied between such needle-shaped electrode 1 and leadout electrode 3. After any one ion is selected by an EXB mass filter 11 from both ion beams of them accelerated by the leadout electrode 3, it is focused by an electron lens 7 and irradiated to the location on a wafer 9 by a deflection lens. In this case, it is intended to determine the location for ion implantation by the H<+>. Therefore, at first only the H<+> beam is allowed to pass by the EXB mass filter 11 and matching is carried out by detecting the matching mark on the wafer 9. When, matching is carried out, only the Si<+> is allowed to pass by readjustment of the electric and magnetic fields. Thereafter, the beam is focused by an electron lens 7 and Si<+> is implanted to the desired location of the wafer 9 in the same way.
Patent JP-S58188619-A (JP)
Title: Method and apparatus for preparing damp-proof packaging container body
Inventor: KUSHIDA YASUHIRO
IPC: B29C51/00
Filed: 1982-04-30
Abstract: PURPOSE:To obtain a compact manufacturing device that does not require a separate half die cutting device by a method wherein half die cutting molding incorporating cut filaments into the metal foil of a laminated sheet and draw forming for that blank portion are performed on the same station. CONSTITUTION:The metal foil 17 and the thermoplastic resin film 15 are adhered with hotmelt adhesive to make a laminated sheet S. This sheet is pinched between the fixed mold 33 and the die 34 and the cut filament L having a blank shape is inserted into the metal foil 17 with the cutter 45. The blank portion of the laminated sheet S is clamped strongly between the bush surface of the crease suppressing bush 43 and the die 34, the forming punch 35 is lifted through the guide holes 38 of the mold 33 and the blank portion of the sheet S is pushed up to perform a draw forming.
Patent JP-H11256005-A (JP)
Title: Fluid and its production
Inventor: UEDA TAKEHARU
IPC: C09D5/04
Filed: 1998-03-06
Abstract: PROBLEM TO BE SOLVED: To obtain a fluid composition which can undergo a reversible change between liquid and solid states or between a state of a liquid of usual viscosity and a state of a liquid of high viscosity in such a manner that it gradually lowers in viscosity in a region in which the applied stress is small, and it rapidly increases in viscosity and gels when the stress exceeds a certain value or in such a manner that the gel lowers in viscosity and liquefies again as the stress lowers. SOLUTION: There is provided a fluid obtained by emulsion-polymerizing a hydrophilic monomer terminated with a radical-polymerizable functional group, which fluid is characterized in that its viscosity has a relatively constant small value in a region in which the shear rate or stress applied is small, increases relatively rapidly when the shear rate or stress applied exceeds a certain value, and returns to a relatively constant small value as a result of relaxation when the shear rate or stress applied lowers to the certain region.
Patent JP-S63238802-A (JP)
Inventor: KATSUYAMA SOICHI
IPC: A44B11/25
Filed: 1987-03-27
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S61232598-A (JP)
Inventor: TAMURA YASUAKI
IPC: H05B33/10
Filed: 1985-04-05
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H07277040-A (JP)
Title: Self-propelled vehicle
Inventor: NONOGAMI TORAHIKO
IPC: A63B55/60
Filed: 1994-04-12
Abstract: PURPOSE:To effectively utilize engine brakes and prevent early deterioration of brakes by providing a means to reduce the throttle opening to its lowest limit as well as to operate a brake actuator when the detected speed of a speed sensor lowers to a specified speed and the brake sensor is in a detecting condition. CONSTITUTION:When an accel pedal is not stepped in, throttle opening is reduced (S3), the detected value is taken in (S4) and the opening is made to be equal to a set opening S1 (S5). A speed V is then taken in (S6) and compared with the first standard speed V1 (S7). In case of V<=V1, when the brake pedal is stepped in, a brake motor M3 is caused to make a normal rotation in a specified quantity (S10), the present speed V is taken in again (S11), and, as comparing the present speed taken in with the second standard speed V2, which is lower than the standard speed V1 (S12), the brake motor M3 is continuously driven until it is V V2. The brake motor M3 is then cause to make further normal rotation (S13) and stopped.
Patent JP-S60215321-A (JP)
Inventor: SATOU HARUMATSU
IPC: A47C1/032
Filed: 1984-04-12
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H06326420-A (JP)
Title: Monolithic laser array
Inventor: TOMASU ERU PAORI
IPC: H01S5/042
Filed: 1994-04-12
Abstract: PURPOSE: To provide the monolithic array of exceeding two semiconductor lasers slightly separated and independently addressable having the least thermal, electrical and optical crosstalk. CONSTITUTION: A separating trench 46 formed between adjacent laser elements 12a, 12b is produced by etching away a mesa on a planar active multilayer waveguides to be segmented by the ribs 40a, 40b loaded with the waveguides. The separate electrical connection to the ribs 40a, 40b as well as the electrical connection common to the substrate 20 can make respective laser elements 12a, 12b addressable.
Patent JP-S56169785-A (JP)
Title: Anode for electrolysis of aqueous alkali chloride solution
Inventor: ODA YOSHIO
IPC: C25B9/23
Filed: 1980-06-03
Abstract: PURPOSE:To provide an alkali-resisting anode having a high activity and a low overvoltage, in the electrolysis of an aqueous alkali chloride solution using a cation exchange membrane, by specifying the active component of the anode. CONSTITUTION:The solid solution of ruthenium and iridium oxides is used as the active component of the anode for the electrolysis of an alkali. The ratio of Ru and Ir is preferably that Ru part is about 95-25% by weight while Ir part is about 5- 75%. If the ratio deviates from this range, there is the possibility that the alkali- resisting property of the anode would be insufficient or that its overvoltage would be highered during the electrolysis. In order to obtain this anode, aqueous Ru and Ir chloride solutions, for instance, are mixed and evaporated to dryness to form the solid solution of the two metal oxides. The powdery solid solution is mixed with a fluororesin as a binder, shaped under a pressure, and pressed onto a platinum wire gauze to form an electrode.
Patent JP-S55165110-A (JP)
Title: Antifoaming method of amine solution
Inventor: OOTA KAZUO
IPC: B01D53/40
Filed: 1979-06-12
Abstract: PURPOSE: To suppress foaming by letting the specific alcohol-modified silicone exist at the time of letting the acidic gas accompanying pretroleum refining contact an aqueous amine solution and absorbing away H 2 S and CO 2 .  
     CONSTITUTION: The acidic gas exhausted in various refining processes of petroleums is sent into a contact absorption tower where it is continuously contacted with the aqueous amine solution containing about 10W30% of diethanolamine or diisopropanol amine, whereby H 2 S or CO 2  is abosrbed away. If at this time the alcohol- modified silicone obtained by substituting part of the R 1 WR 8  of the silicone shown by formula with -R 9 OH (R 9  is residual organic groups of C 1W10 ) is added as a auti-foaming agent at about 3W200ppm into the aqueous amine solution, foaming is considerably suppressed and cleaning efficiency accelerated. Further, if the aqueous amine solution is treated with active carbon before or after the addition of the antifoaming agent, the anti-foaming efficiency becomes much higher. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-H04221222-A (JP)
Title: Heating and ventilating device for automobile
Inventor: RU DEIDEIE
IPC: B60H1/00
Filed: 1991-03-14
Abstract: PURPOSE: To provide at least 5 types of distribution modes from a distribution valve in a heating and ventilating apparatus for automobiles, which selectively distribute the air discharged from an exhaust port. CONSTITUTION: This apparatus includes a housing 10 provided with a first conduit 58 including at lest either partition wall 76 or 78 and a second conduit 74 having an exhaust port 62. The distribution valve 86 installed between both conduits 58 and 74 is provided with vanes 92 and 94 which are axially and circumferentially eccentric for selectively controlling the air from the first conduit 58 and a vane 98 for controlling the air from the second conduit.
Patent JP-H03275725-A (JP)
Title: Production of photoconductive polymer
Inventor: ASAYAMA JUNKO
IPC: G02F1/135
Filed: 1990-03-23
Abstract: PURPOSE:To inexpensively obtain the title polymer useful as a photosensitive layer of electrophotographic photoreceptor of light printer, having high photosensitivity and crystallizability, by using a carboxylic acid prepared by reacting a diamine compound with a tetracarboxylic acid in a specific ratio. CONSTITUTION:A compound shown by formula I {A is group shown by formula II [Xi is (substituted) aromatic group; Yi is O, S, Se, Te or group shown by formula III; n>=1; i is 1-n]} and a compound shown by formula IV (Z is group containing aromatic group) in a blending molar ratio of diamine to dicarboxylic acid of 1:1+M) (M>0) are subjected to condensation reaction to give a polyamic acid, which is applied to a substrate, then immersed in a solution (preferably <=50wt.% pyridine is added) containing acetic anhydride and heat treated to give the objective polymer.
Patent JP-S58191005-A (JP)
Title: Model standard type adaptive control method with amplitude limit of plant input
Inventor: KOZUKA GOROU
IPC: G05B13/04
Filed: 1982-04-30
Abstract: PURPOSE:To obtain the suitable control performance, by saturating th scale of a control input signal at the value less than the limit amplitude of a plant and at the same time by shifting the control input signal toward the direction where the output error is set at 0 in response to a model output signal and a plant output signal. CONSTITUTION:The internal state is changed for a target input signal r(k) supplied to a standard model 10, and a model output signal Y*(k) is applied to an adaptive controller 14. The controller 14 usually consists of a digital computer along with an adaptive input generator 15 and a saturation element 16 which delivers an output signal U(k) by the signal Uc(k) of the generator 15. The element 16 feeds saturation value R to a plant 12 as an output signal when the absolute value of the input signal Uc(k) exceeds the R. The plant 12 has both saturation characteristics 12a and linear characteristics 12b of an operating device and delivers a plant output signal y(k) showing the state of the plant to the controller 14.
Patent JP-S57188813-A (JP)
Title: electrical insulating method for bobbin of superconductive coil
Inventor: OOKURA KENGO
IPC: H01F6/06
Filed: 1981-05-15
Abstract: PURPOSE:To enable electrical insulation simply by applying ceramic cream obtained by dissolving the powder of alumina or silica into a weak alkaline solvent onto the bobbin made of stainless steel, drying the cream in air and heating and curing it by means of a burner. CONSTITUTION:Alumina or silica is changed into powdered form, the ceramic cream obtained by dissolving it into the weak alkaline solvent is applied onto the bobbin made of stainless steel, dried in air for time such as fifteen min or more, and heated and cured for time such as thirty min or more by means of the burner in air. Accordingly, an oven for curing is unnecessitated, and the electrical insulation of the bobbin is enabled simply and as strength is given.
Patent JP-H02254989-A (JP)
Title: Method of calculating composite flux
Inventor: MIYASHITA ICHIRO
IPC: H02P21/36
Filed: 1989-03-28
Abstract: PURPOSE:To execute stable control over a wide range by calculating voltage model magnetic flux and current model magnetic flux independently and installing a function generator specially. CONSTITUTION:A three-phase induction motor 6 driven from a dc voltage source 1 through a PWM inverter 3 is equipped with a voltage detector 2, current detectors 5, a position sensor 6a, and a controller 7. The controller 7 includes a current model operation block 706, a low-order priority block, 708, a magnetic flux vector length phi1 calculation block 710, and control flags ftheta-ftau operation blocks 715 and 716. Thereby current model magnetic flux can be used together in a low-frequency band and setting of the switching characteristic thereof is not restricted.
Patent JP-S553003-A (JP)
Title: Pattern recognizing device
Inventor: KITANO YOSHITO
IPC: G06K9/62
Filed: 1978-06-21
Abstract: PURPOSE: To absorb the size fluctuation of the characters by forming the standard and differential patterns suited for the input pattern and then carrying out decision based on these patterns.  
     CONSTITUTION: The characters written on slip 13 are separated with every character to be converted into the black and white binary-coded patterns through photoelectric conversion part 14, quantization part 15, pre-process part 16 and cut-out part 17 each and then put into input pattern register 18. in register 18 the addresses of the input and standard patterns are set to XK and YK plus XM and YM respectively. And difference calculation 20 is given with input pattern 18 every area and via the address-converted standard pattern; the value of the difference is calculated every area; registering 23 and deciding 24 are given to the minimum and the next minimum differences plus each normalized pattern; the differential pattern is produced 26 based on the normalized standard pattern; and the difference is calculated 27 and decided 28. As a result, the size fluctuation of the characters can be absorbed. 
     COPYRIGHT: (C)1980,JPO&Japio
Patent JP-S58196202-A (JP)
Inventor: KURAUSU BARUZAA
IPC: C08B11/193
Filed: 1983-04-28
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H01248519-A (JP)
Title: Resist coating device
Inventor: IWASAKI HIDEO
IPC: B05C11/08
Filed: 1988-03-30
Abstract: PURPOSE:To enable a uniform resist film over the entire area of substrate to be formed by providing a plurality of supply ports of resist liquid solution. CONSTITUTION:A resist liquid solution supply port is located directly above the rotary center of a substrate 3 which is retained by a spinner 4 and the other resist liquid solution supply port 10 is provided at an area other than directly above the rotary center. Since resist liquid solution is supplied also from this supply port 10, nonuniform area of resist film expanding radially from the rotary center is relaxed. In this manner, nonuniform area of resist film extending in the direction of radius of substrate caused by the difference in recessed and projecting stages of etching pattern is relaxed and a resist film with uniform composition and film thickness can be obtained.
Patent JP-H09266667-A (JP)
Title: Overcurrent/overload protection circuit, power supply apparatus, electric machine and duplicator
Inventor: NAGANO NOBUHISA
IPC: G03G21/00
Filed: 1996-03-28
Abstract: PROBLEM TO BE SOLVED: To stop the operation of a switching device when an overcurrent is applied, by a method wherein the output voltage of a rectifying/smoothing circuit connected to a flyback winding for a control power supply is detected to determine whether a secondary output current is an overcurrent or not. SOLUTION: A rectifier diode 10 is connected to the winding end of a flyback winding 8 for a control power supply and a smoothing capacitor 11 is connected between the cathode of the diode 10 and the winding start of the flyback winding 8 to compose a rectifying/smoothing circuit 12. The output voltage of the flyback winding 8 which is converted into a DC voltage is detected by an overcurrent detection circuit 31 provided on the next stage of the rectifying/ smoothing circuit 12 and it is detected that a secondary side load 34 is an overload and a secondary side output current 11 is an overcurrent. If a control circuit 7 receives an overcurrent detection signal, the control circuit 7 stops a control output signal supplied to the gate of a field effect transistor 5 to turn off the field effect transistor 5 and protects the switching device from the overcurrent.