Patent SG-11201806635X-A (SG)
Title: Lithographic apparatus and method for preventing peripheral exposure of a substrate
Inventor: VERMEER ADRIANUS JOHANNES PETRUS MARIA
IPC: G03F7/20
Filed: 2017-02-15
Abstract: FIG 1 W O 20 17 / 14240 1 Al (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (10) International Publication Number (43) International Publication Date WO 2017/142401 Al 24 August 2017 (24.08.2017) WIPO I PCT 111111111111110111011111111111010111110111010111110101111111111011111111111110111111 (51) International Patent Classification: GO3F 7/20 (2006.01) (21) International Application Number: PCT/NL2017/050088 (22) International Filing Date: 15 February 2017 (15.02.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 2016271 16 February 2016 (16.02.2016) NL (71) Applicant: LITEQ B.V. [NL/NL]; Esp 314, 5633 AE Eindhoven (NL). (72) Inventor: VERMEER, Adrianus Johannes Petrus Maria; c/o Esp 314, 5633 AE Eindhoven (NL). (74) Agent: JANSEN, C.M.; V.O., Carnegieplein 5, 2517 KJ Den Haag (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) before the expiration of the time limit for amending the claims and to be republished in the event of receipt of amendments (Rule 48.2(h)) — (54) Title: LITHOGRAPHIC APPARATUS AND METHOD FOR PREVENTING PERIPHERAL EXPOSURE OF A SUB- STRATE (57) : A lithographic apparatus (10) and method for preventing exposure of a peripheral portion (P) of a substrate (S). An edge mask (M) has a radial concave edge (E) that extends over less than half a circle arch. The edge mask (M) is con- nected to a mask carrier (4) that circumnavigates the projection system (2) to adjust a tangential co- ordinate (4:1)) and a radial coordinate (R) of the edge mask (M) with respect to the optical axis (A) of the projection system (2) for inserting the edge mask (M) at a variable distance into the beam of radi- ation (B). The tangential and radial positions (4:1),R) of the edge mask (M) are coordinated with a chan- ging position (X,Y) of the substrate (S) to prevent exposure of the peripheral portion (P) of the sub- strate (S) during exposure of the target region (T).