Patent SG-11201407646X-A (SG)
Title: Polishing composition for nickel-phosphorous-coated memory disks
Inventor: PALANISAMY CHINNATHAMBI SELVARAJ
IPC: B24B57/02
Filed: 2013-05-22
Abstract: (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 28 November 2013 (28.11.2013) WIPOIPCT (10) International Publication Number WO 2013/177251 A1 (51) International Patent Classification: B24B 37/04 (2006.01) H01L 21/304 (2006.01) B24B 57/02 (2006.01) (21) International Application Number: (22) International Filing Date: (25) Filing Language: (26) Publication Language: PCT/US2013/042168 22 May 2013 (22.05.2013) English (30) Priority Data: 13/478,292 23 May 2012 (23.05.2012) (71) Applicant: CABOT MICROELECTRONICS COR­ PORATION [US/US]; Legal Department, 870 North Commons Drive, Aurora, Illinois 60504 (US). (72) Inventors: PALANISAMY CHINNATHAMBI, Selva- raj; c/o Legal Department, Cabot Microelectronics Corpor­ ation, 870 North Commons Drive, Aurora, Illinois 60504 (US). SIRIWARDANE, Haresh; c/o Legal Department, Cabot Microelectronics Corporation, 870 North Commons Drive, Aurora, Illinois 60504 (US). (74) Agents: WESEMAN, Steven et al.; Cabot Microelectron­ ics Corporation, 870 North Commons Drive, Aurora, Illinois 60504 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available)'. AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. US English (84) Designated States (unless otherwise indicated, for every kind of regional protection available)'. ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG). Declarations under Rule 4.17: — as to applicant's entitlement to apply for and be granted a patent (Rule 4.17(H)) — as to the applicant's entitlement to claim the priority of the earlier application (Rule 4.17(iii)) Published: — with international search report (Art. 21(3)) CJ i> i> i-H cn i-H o CJ (54) Title: POLISHING COMPOSITION FOR NICKEL-PHOSPHOROUS-COATED MEMORY DISKS (57) Abstract: The invention provides chemical-mechanical polishing composition containing wet-process silica, an oxidizing a agent that oxidizes nickel-phosphorous, a chelating agent, polyvinyl alcohol, and water. The invention also provides a method of chemically-mechanically polishing substrate, especially nickel-phosphorous substrate, a a by contacting substrate with polishing a a pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.