baber/WOPTO huggingface dataset:
Patent JP-H0550536-A (JP)
Title: Manufacture of paper container having heat insulation property
Inventor: SUEHIRO TAISUKE
IPC: B31B50/00
Filed: 1991-08-26
Abstract: PURPOSE:To obtain a cheap paper container with a heat insulation property which is made by an extremely readily manufacturing process and is suitable for throwaway use by obtaining a blank plate in laminating an olefinic resin layer on the both surfaces of front and rear of a paper base material consisting of paper specified in its moisture content, and thereafter forming and then heating the paper container. CONSTITUTION:With respect to the surface of a paper container base material 2 consisting of a basis weight of 200g/m<2> and a moisture content of 5-12wt.% coat original paper, a color-printed layer 3 of 1.5g(dry)/m<2> is coated by printing ink consisting of a pigment of 10 pts.wt., rubber resin of 20 pts.wt. and a mixed solvent of 70 pts.wt. of toluene, ethyl acetate and methyl ethyl ketone, besides after that, on the both front and rear surfaces, respective polyethylene resin layers 4, 5 of 20mum are laminated by an extrusion-coating method of molten resin thus forming a blank plate of a paper container. In consequence, the blank plate 6 for a paper container is punched out and then formed in a predetermined case manufacturing process to make a paper cup 8.
Patent JP-H0979212-A (JP)
Title: Oil pressure system
Inventor: HIRATA TOICHI
IPC: F15B11/00
Filed: 1995-09-18
Abstract: PROBLEM TO BE SOLVED: To realize a confluent and preferential circuit in a simple structure by installing both first and second auxiliary valves, preventing pressure oil from flowing backward to both first and second hydraulic pumps, in both first and second feeder lines connecting these first and second hydraulic pumps to a directional control valve. SOLUTION: A directional control valve 9 for a boom is connected to two feeder lines 93a and 93b for a boom and another directional control valve 10 for an arm to two hydraulic pumps 1a and 1b via two feeder lines 103a and 103b for an arm and two pump lines 30a and 30b, respectively. In succession, two auxiliary valves 91a and 91b for the boom are set up in these feeder lines 93a and 93b and two auxiliary valves 101a and 101b in these lines 103a and 103b respectively, thereby any flowback of pressure oil to these hydraulic pumps 1a and 1b is prevented from occurring.  With this constitution, in time of the independent drive of an actuator 3, each pressure oil of both the hydraulic pumps 1a and 1b is joined together through the feeder lines 93a and 93b and thereby it is feedable to the actuator 3, and in time of the compound drive of both actuators 3 and 4, when load pressure of the actuator 3 is larger than that of the actuator 4, these actuators 3 and 4 can be operated by both the hydraulic pumps 1a and 1b.
Patent JP-2000065677-A (JP)
Title: Drop testing machine
Inventor: KINOUCHI TAKAO
IPC: G01N3/30
Filed: 1998-08-25
Abstract: PROBLEM TO BE SOLVED: To obtain a drop testing machine by which the drop test of an object to be tested can be performed in a state that an arbitrary posture is maintained and by which precise drop test data can be obtained by a method wherein a holder which holds the object, to be tested, in an arbitrary posture is dropped along a drop guide rail. SOLUTION: An accelerometer or a strain gage is attached to an object 6 to be tested, and the object 6 to be tested is suspended by a holder 4 by a plurality of stringline blanks or the like. At this time, the length of every stringlike blank is adjusted in such a way that the object 6 to be tested takes a desired posture. Then, in a state that the object 6 to be tested is suspended, the holder 4 is raised along a drop guide rail 3 so as to be held near a stopper 5. Then, when a test is started, the holder 4 is dropped along the drop guide rail 3. At this time, the object 6 to be tested is dropped while it is suspended by the holder 4 in the desired posture. When the holder 4 is hit against, and brought into contact with, a lower-part stopper 12, the object 6 to be tested collides with a foundation so as to be broken.  On the basis of the value of the strain gage or the accelerometer and on the basis of the broken state of the object 6 to be tested, test data can be obtained.
Patent JP-H11128646-A (JP)
Title: Plant for separating gas by adsorption and its use for treating air stream
Inventor: MONEREAU CHRISTIAN
IPC: B01D53/04
Filed: 1998-08-25
Abstract: PROBLEM TO BE SOLVED: To provide a novel plant for separating gas by adsorption. SOLUTION: A plant of a PSA type for separating gas by adsorption contains at least one annular bed of a granular substance supported on a lower part wall 9, itself held with an opened columnar wall mounted on the dome shaped lower end 2 of a container 1 in the vertical container 1 and the lower part wall 9 without having a portion forming angles (α, β) being over 15 deg. against a horizontal surface in a favorably extremely wider reverse V shape form.
Patent JP-H0769727-A (JP)
Title: Production of carbon substrate
Inventor: YAMAMURO HIDEKI
IPC: C04B35/52
Filed: 1993-08-30
Abstract: PURPOSE:To provide a carbon substrate production process effective for suppressing the generation of substrate defects and facilitating the shortening of the substrate forming time and the simplification of the forming work. CONSTITUTION:The raw material to be used in this production process is a powdery thermosetting resin having particle diameter of >=150mum, HPF of 80-150mm, water content of 1.0-3.0wt.% and the contents of Fe, Ni, Si and Ca of <=5ppm each. The raw material is pressed under normal temperature in the form of a tablet and preheated in a high-frequency preheating oven 4. The preheated tablet is formed in the form of a carbon substrate with forming presses 7,8.
Patent JP-H0553582-A (JP)
Title: Automatic accompaniment device
Inventor: KONISHI SHINYA
IPC: G10H1/36
Filed: 1991-08-27
Abstract: PURPOSE:To provide the automatic accompaniment device which plays an automatic accompaniment according to chords detected according to information inputted from an external device. CONSTITUTION:This automatic accompaniment device consists of a storage means stored with performance data, an input means 19 which inputs information from outside, a 1st converting means 18 which converts the information inputted by the input means 19 into chord information, a 2nd converting means 16 which converts the performance data read out of the storage means corresponding to the chord information converted by the 1st converting means 18, and a musical sound generating means 21 which generates a musical sound according to the performance data converted by the 2nd converting means 16.
Patent JP-H0772601-A (JP)
Title: Photosensitive material processing device and development processing method
Inventor: NAKAMURA TAKASHI
IPC: G03D3/00
Filed: 1993-08-31
Abstract: PURPOSE:To provide the photosensitive material processing device which is capable of preventing the evaporation, change in properties and deterioration of a processing liquid by hermetically closing this processing liquid with simple constitution and does not hinder the transportation of photosensitive materials and the development processing method. CONSTITUTION:This photosensitive material processing device for processing the silver halide photographic sensitive materials F has a processing tank 1 which is opened above and below and in which the processing liquid 9 is put, an upper low-sp.gr. nonaq. soln. 12 which hermetically closes the front surface of the processing liquid 9 in this processing tank 1, a lower high-sp.gr. nonaq. soln. 8 which hermetically closes the rear surface of the processing liquid in the processing tank 1 and a transporting means 13 which transports the photosensitive materials F to the lower high-sp.gr. nonaq. soln. 8, the processing liquid 9 and the lower high-sp.gr. nonaq. soln. 8 in this order in a manner as to prevent the contact of the materials with the upper low-sp.gr. nonaq. soln. 12.
Patent JP-S61117347-A (JP)
Inventor: NISHIO KAZUNORI
IPC: E04F15/00
Filed: 1984-11-13
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S61117394-A (JP)
Inventor: KIKUCHI KIMIO
IPC: E21B47/024
Filed: 1984-11-13
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H04120277-A (JP)
Title: Plasma cvd device
Inventor: MURATA MASAYOSHI
IPC: H01L21/205
Filed: 1990-09-10
Abstract: PURPOSE:To intensify and uniformize the electric field near an electrode and to form a large-area thin film at a high speed with the above device which forms an amorphous film on a substrate parallel with an electrode for discharge by forming the electrode for discharge of a spiral type plane type coil. CONSTITUTION:The rectangular spiral type plane coil electrode 11 for generating glow discharge plasma is disposed in a reaction vessel 1. The electrode 11 has a structure consisting of a wire wound at specified intervals to a rectangular shape. The inside of the reaction vessel 1 is evacuated by a vacuum pump 9 and a gaseous mixture composed of monosilane and Ar is supplied through a reaction gas introducing pipe 7 to maintain the inside of the vessel 1 at a prescribed pressure. A voltage is impressed from a high-frequency power source 14 to the electrode 11 via an impedance matching circuit 12. The glow discharge plasma is generated around the electrode 11 in this way. The emitted light exhibits approximately uniform intensity between the electrode 11 and the substrate 10 and, therefore, the amorphous Si thin film deposited the surface of the substrate 10 has a uniform film thickness distribution.
Patent JP-H1092710-A (JP)
Title: Resist coater
Inventor: ISHIKAWA HIDEKAZU
IPC: G03F7/16
Filed: 1996-09-10
Abstract: PROBLEM TO BE SOLVED: To minimize generation of dust from resist hose holding means and suction-holding means, even when the suction-holding means for sucking and holding the resist hose holding means is provided, so that the resist hose holding means is sucked and held by the suction-holding means. SOLUTION: In resist coating, a resist is supplied to a resist hose 2. Vacuum generating means and an electromagnet are energized to cause suction-holding means 40 to suck and hold, a resist hose holding means 30. Then, the suction- holding means is make to operate in the horizontal direction. Thus, a resist nozzle 2a provided on the resist hose holding means 30 is moved onto a semiconductor wafer. In suction-holding of the resist hose holding means 30 by the suction-holding means 40 of such resist coater, generation of dust may be prevented.
Patent JP-H0576834-A (JP)
Title: Film structure
Inventor: HIRONAKA KAZUO
IPC: C09D5/36
Filed: 1991-09-19
Abstract: PURPOSE:To provide a film structure capable of obtaining the same depth as a multilayered coating layer by a reduced number of coatings. CONSTITUTION:A plurality of clear film layers 6-10 are applied to a color base film layer 5 and two layers 6,9 among the clear film layers 6-9 are composed of bright material-containing layers wherein bright materials are scattered and the bright material 11B contained in the upper layer 9 among the layers 6,9 has brightness higher than that of the bright material 11A contained in the lower layer 6.
Patent JP-S60131914-A (JP)
Title: Batch-type heat treating device
Inventor: HIRAMATSU SADAO
IPC: C21D9/00
Filed: 1983-12-19
Abstract: PURPOSE:To economize heat energy to be consumed by constituting a titled device of a batch-type heating furnace and a heat exchanging chamber which has at least twice the volume of said heating furnace and contaons treated materials and the materials to be treated. CONSTITUTION:A heat exchanging chamber 8 which is freely movable in the transverse direction is provided in the section of a heating furnace 1 which faces the inlet and outlet port for treated materials. The chamber 8 is constituted by connecting two bodies 8a and 8b to each other by a duct 9 and has twice the volume of the furnace 1 as a whole. While treated materials 6 are heated in the furnace 1, the treated materials 15 and materials 17 to be treated next in the chamber 8 are subjected to a heat exchange and when the heat treatment in the furnace 1 ends, the chamber 8 is moved in such a way that the chamber body 8b coincides with a discharge table 20. The treated products 15 are then discharged to the table 20. The chamber 8 is returned to the home position and the treated materials 6 heated in the furnace 1 are put into the chamber body 8b and the chamber 8 is again moved to put the materials 17 into the furnace 1. The chamber 8 is returned to the home position and the materials to be treated next on a charging table 19 are put into the chamber body 8a.
Patent JP-H1187056-A (JP)
Title: Manufacture of optical element
Inventor: KIJIMA YASUNORI
IPC: H05B33/14
Filed: 1997-09-04
Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical element wherein an amorphous luminous layer can be formed surely with good controllability even in the case of using a luminous material or the like such as one which decomposes partly when it is vaporized. SOLUTION: A luminous layer has a stratified region containing a host luminous material and guest luminous material, the host luminous material has a vaporization temperature higher than that of the guest luminous material, and of electron/hole transportability at least the electron transportability is provided in an optical element, in a method of its manufacture by using a physical gas phase growth device 40 provided with a luminous material storage vessel (heating board) 30, so as to prevent mixing of the host luminous material with the guest luminous material, and so as to bring the host/guest luminous material into contact, after the host/guest luminous material is stored in the luminous material storage vessel 30, by heating it, the stratified region of the luminous layer is formed by the physical gas phase growth method.
Patent JP-S6481342-A (JP)
Title: Semiconductor device
Inventor: SUGIMOTO NAOAKI
IPC: H01L21/3205
Filed: 1987-09-24
Abstract: PURPOSE:To improve the later circular adherence of the contact of a wiring layer and to improve the yield of a semiconductor device of high quality by forming a taper on the lower part of a contact hole in addition to the upper part. CONSTITUTION:A taper is etched by isotropically etching on a base oxide film 12. Then, it is postbaked by a hot plate to slightly deform a patterned positive type resist 11 toward the center of a contact hole. When it is anisotropically etched by plasma etching with Freon, the resist 11 is deformed to incline the thickness. Accordingly, the etching amount of the film 12 is inclined, the film 12 is not vertically etched to the lower layer contact face 13, and etched so that the taper slightly remains at the lower part of the hole. When the resist 11 is exfoliated in this state and wired 14, a wiring layer 14 is not reduced in thickness at the lower part of the hole, and the disconnection occurrence rate of the wiring layer is reduced.
Patent JP-S60131922-A (JP)
Title: Production of high tension cold rolled steel plate for press forming having excellent characteristic to absorb impact energy
Inventor: YASUDA AKIRA
IPC: C21D9/46
Filed: 1983-12-21
Abstract: PURPOSE:To produce a titled steel plate having an excellent characteristic to absorb impact energy by subjecting a steel slab having a specific compsn. to hot rolling and finish rolling under specific conditions then to descaling and cold rolling followed further by annealing under specific conditions. CONSTITUTION:A steel slab which contains, by weight %, 0.008-0.014% C, <=0.08% Si, <=0.20% Mn, <=0.10% Ti, <=0.06% Al, <=0.008% N, 0.08-0.07% P and <=0.02% S and in which [C%]X[P%]>=3.5X10<-4> and the effective Ti content subtracted of Ti existing in the form of sulfide and nitride is >=4 times C% is prepd. Such steel slab is hot rolled at >=1,150 deg.C and is finish rolled at the temp. above the Ar3 transformation point. The rolled steel plate is coiled at >=620 deg.C. The steel slab is then subjected to descaling and cold rolling by the conventional method and is then subjected to the annealing to the ultimate templ of 750- 950 deg.C in a continuous annealing furnace. The cold rolled steel plate having excellent press formability and about >=38kgf/mm.<2> tensile strength is produced.
Patent JP-S6299834-A (JP)
Title: Selection and control system for system constitution
Inventor: YAMADA KENJI
IPC: G06F11/20
Filed: 1985-10-25
Abstract: PURPOSE:To shorten the time needed for obtaining a normal system constitution even with a system having large redundancy and many types, by starting a means that applies a selection indicating signal to a selection means for information on system constitution in case an element of the system constitution has a fault. CONSTITUTION:In a normal working mode any one of information of holding registers 200-230 for information on system constitution pattern is selected by a selection circuit 100 which works in response to an emergency control counter 500 of an emergency control circuit 1 and then set to an emergency control state register 300. The the combination of a system constitution is selected among the processors, main memories and their peripheral devices 700, 800, 900-720, 820 and 920 respectively. The working normalness accordance with said selection is decided by resetting of a timer circuit 600. Then an overflow signal is delivered from the circuit 600 if an element of the system constitution has a fault. Thus a counter 500 is started to supply the count-up signal to the circuit 100 as a new selection indicating signal. In such a way, a normal system constitution is obtained automatically in a short time.
Patent JP-S60131408-A (JP)
Title: Image scanning type automatic measuring device for flying height
Inventor: TANAKA KATSUYUKI
IPC: G11B5/60
Filed: 1983-12-21
Abstract: PURPOSE:To measure the flying height of a magnetic head automatically by using a glass disk, and detecting the contour shape of a magnetic head and light- part and dark-part peak generation positions of interference fringes and deciding on the degree from the detection signal of an interference image on a photoelectric surface during homogeneous wavelength irradiation. CONSTITUTION:Luminous flux from a xenon light source 15 is made incident on a monochromator 16 and split into two by a half-mirror 4 through a removal lens 17 for light quantity unevenness and lens 18. One is incident on a floating spacing part between the glass disk 5 and a slider 6 through the glass disk 5 and reflected as interference light corresponding to the flying height. Then, an interference pattern is formed on a light quantity converting part 21 through the half- mirror 4, mirror 19, and lens 20 to output an electric signal corresponding to interference fringes. Then the output signal of the photoelectric converting part 21 is inputted to a converting part 23 to perform horizontal and vertical synchronous separation. Those timing signals are inputted to an A/D converter 24 and the memory address control circuit 29 of a frame memory 30. Then, an arithmetic part 32 calculates the flying height from brightness data.
Patent JP-S61117874-A (JP)
Title: Piezoelectric element unit
Inventor: KAINO KIKUO
IPC: H01L41/113
Filed: 1984-11-14
Abstract: PURPOSE:To obtain products stable in performance both structurally and functionally even under abnormal high-temperature atmosphere, by using mechanical- structure ceramic for the receiver. CONSTITUTION:One side surface is provided with an aperture 1a, and a plastic insulation case 1 having through-holes 1b, 1c opening at both end surfaces is inserted. A patch 2 is inserted into the one-end surface through-hole 1b of the case 1, and a receiver 3 made of mechanical-structure ceramic is inserted into the other end surface through-hole 1c; besides, a piezoelectric element 4 is arranged on the patch 2 side, and a receiver metal 5 with a voltage take-out terminal 5a provided on the side surface on the receiver 3 side. Then, the titled unit of simple structure, easy assembly, low cost, and high energy can be obtained by fixing those components through filling with insulation adhesive 6.
Patent JP-H03102292-A (JP)
Title: Manufacture of nuclear fuel pellet
Inventor: ITO KENICHI
IPC: G21C3/62
Filed: 1989-09-18
Abstract: PURPOSE:To decrease a discharging rate of FP gases and to intend improvement of creep resistivity characteristics by adding powder of an eutectic body obtained by heating, at higher temperature than an eutectic point, an inter- metallic compound or a mixed oxide compound which has the eutectic point lower than the highest sintering temperature. CONSTITUTION:For example, a homogeneous aluminum silicate glass obtained by coasely mixing around 30wt.% of an Al2O3 with around 80wt.% of an SiO2, by heating upto 2,100 deg.C in a gas flow of around 8%-H2/N2 mixed gas and then by cooling down, is crushed down to produce homogenous powder. Then, this powder is added to a UO2 powder at a rate of around 0.25% with a lubricating agent (d) and is powder-compression-molded to produce green pellets (g), and finally, is sintered (f) at 1,700 deg.C, for 2 hours and in an around 8%-H2/N2 gaseous atmosphere after being defatted (h). The pellet obtained in this way, is of a coarse crystalline particle of a sintered powder size of around 50 to 60mum, and also an aluminous silicate glass phase is recognized at crystalline granular interfaces and therewith a creep velocity increases upto 5 to 10 times of the velocity of a pellet without such addition. By this process, an FP gas discharging rate decreases and an interaction between pellet claddings can be suppressed.
Patent JP-S61119032-A (JP)
Title: Manufacture of semiconductor device
Inventor: SUZUKI KUNIHIRO
IPC: H01L21/306
Filed: 1984-11-14
Abstract: PURPOSE:To prevent narrowering of the space of the diffusion region to be formed in a substrate by a method wherein the unnecessary part of the poly Si containing no impurity is removed first, and then the impurity atoms contained in high density poly Si are diffused on the poly Si containing no impurities. CONSTITUTION:A poly Si layer 25 containing no impurity, excluding the deposition part located under an overhang, is removed by performing an etching. In this case, as the homogenous poly Si only is the objective substance of removal, the etching process can be progressed in a simple form, and the etching can be controlled easily. Subsequently, a diffusion region 16 is formed by performing a heat treatment. In this case, as the impurity diffusion through poly Si 15 does not spread in lateral direction, the distance between diffusion regions 16 and 16 is not narrowered. As a result, an estimation of the extent of narrowering of the space between the diffusion regions is unnecessitated, thereby enabling to improve the degree of integration.
Patent JP-S6393398-A (JP)
Title: Bottom-part filter
Inventor: SHIMA KIMIKO
IPC: C02F3/06
Filed: 1986-10-08
Abstract: PURPOSE:To enhance filtration capacity, by providing a bottom-part filter to the bottom of a water tank. CONSTITUTION:The inside of a water tank 1 is completely partitioned with a partition plate 5 and a bottom-part filter 3. Therefor since the amount of water in a pump side is constant, water pressure in total of both total water pressure charged on the cross-sectional area of small holes 14 and water pressure charged on the bottom of the water tank is caused in a water pressure generation place 6. Thereby the pressure is stored at the water pressure generation place 6 to apply pressure on all small holes 14 opened to the bottom-part filter 3. Therefore flow is hardly generated in the water tank 1 and natural environment (a lake) is presented. Thereby it becomes a breeding water tank wherein water as natural water is contained, and a fry or the like can be bred.