Patent SG-11201807466P-A (SG)
Title: Negative type photosensitive composition curable at low temperature
Inventor: MISUMI MOTOKI
IPC: G03F7/038
Filed: 2017-03-27
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -, Organization 1111111101111011101010111110101111101110111111111110111101101111101111011111 International Bureau 0.. .1 j ..... ..or::,„, (10) International Publication Number (43) International Publication Date WO 2017/167690 Al 5 October 2017 (05.10.2017) IN I PO I P CT (51) International Patent Classification: (74) Agent: B2B PATENTS; c/o Merck Patent GmbH, 64271 GO3F 7/075 (2006.01) G03F 7/039 (2006.01) Darmstadt (DE). GO3F 7/40 (2006.01) GO3F 7/038 (2006.01) (81) Designated States (unless otherwise indicated, for every (21) International Application Number: kind of national protection available): AE, AG, AL, AM, PCT/EP2017/057195 AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, (22) International Filing Date: DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, 27 March 2017 (27.03.2017) HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, (25) Filing Language: English KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, (26) Publication Language: English NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, (30) Priority Data: RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, 2016-069100 30 March 2016 (30.03.2016) JP TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (71) Applicant: AZ ELECTRONIC MATERIALS (LUX- EMBOURG) S.A.R.L. [LU/LU]; 46 Place Guillaume II, (84) Designated States (unless otherwise indicated, for every 1648 Luxembourg (LU). kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, (72) Inventors: MISUMI, Motoki; 1039-1-405, Kawai, Fukur- TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, oi-shi, Shizuoka, 437-0064 (JP). YOKOYAMA, Daishi; TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, c/o Merck Performance Materials Ltd., 3330, Chihama, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, Kakegawa-shi, Shizuoka, 437-1412 (JP). TANIGUCHI, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, Katsuto; c/o Merck Performance Materials Ltd., 3330, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, Chihama, Kakegawa-shi, Shizuoka, 437-1412 (JP). KUZ- GW, KM, ML, MR, NE, SN, TD, TG). AWA, Masahiro; c/o Natoco Co., Ltd., 8-3 Futano-cho, Published: Mizuho-ku, Nagoya-shi, Aichi, 467-0861 (JP). — international 21(3)) with search report (Art. 1-1 © C:r IN (54) Title: NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE 1-1 ---.. (57) : [] To provide a negative type photosensitive composition developable with a low concentration alkali de - IN veloper and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability; and C further to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type N photosensitive composition comprising : (I) an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymeriza- O tion unit and an alkoxysilyl-containing polymerization unit, (II) a polysiloxane, (III) a compound having two or more (meth)ac - ryloyloxy groups, (IV) (i) a silicone derivative having a particular structure and/or (ii) a compound having two or more epoxy groups, (V) a polymerization initiator, and (VI) a solvent.