baber/WOPTO huggingface dataset:
Patent TW-496786-B (TW)
Title: Liquidized gas cleaning system
Inventor: KUO TZU-CHEN
IPC: B08B3/08
Filed: 2000-12-16
Granted: 2002-08-01
Abstract: A low cost liquidized gas cleaning system removes contaminates from a selected object. The cleaning system includes a hermetically sealed pressure cleaning tank that contains a cleaning fluid for the liquidized gas, t and the object with contaminates. The cleaning tank has one inlet and one outlet. A storage tank supplies the cleaning fluid to the cleaning tank. A flow meter measures the cleaning fluid flow rate from the storage tank to the cleaning tank. A temperature controller controls the operating temperature of the cleaning tank to have the cleaning fluid following a chosen constant specific volume curve and changes between liquid state and supercritical state. A pressure controller connects with the outlet to control the pressure decrease rate of the cleaning fluid. A separator connecting with the pressure controller separates the contaminates from the cleaning fluid. A holder supports the object.
Patent TW-471112-B (TW)
Title: Method for forming silicon carbon nitride layer on low-k material
Inventor: BAU TIAN-YI
IPC: H01L21/76
Filed: 2001-01-11
Granted: 2002-01-01
Abstract: The present invention discloses a method for forming silicon carbon nitride layer on low dielectric constant (low-k) material which includes the following steps: (1) forming a first low-k dielectric layer on a semiconductor substrate, (2) forming silicon carbide layer on the first low-k dielectric layer, (3) conducting ion implantation on the silicon carbide layer to convert the silicon carbide layer into the silicon carbon nitride layer, in which the plasma ions comprise nitrogen ions, such as NH3 or N2; in which the material of the first low-k dielectric layer comprises FSG, SiLK, FLARE or nanoglass. The forming method for silicon carbide layer includes obtaining by conducting plasma enhanced chemical vapor deposition (PECVD) in an environment containing Si(CH3)4 (referred as 4MS in the industry), or SiH(CH3)3 (referred as 3MS in the industry), SiH2(CH3)2 (referred as 2MS in the industry), SiH3(CH3) (referred as MS in the industry).
Patent TW-503624-B (TW)
Title: Digital-to-analog converter
Inventor: NORO MASAO
IPC: H03M1/80
Filed: 2001-02-01
Granted: 2002-09-21
Abstract: The present invention provides a high-accuracy and multi-bit D/A converter which can be produced using a CMOS process. A resistor string is formed of a plurality of resistors connected in series. A switch matrix has switch strings each formed of switches each having one end thereof connected to a corresponding one of junctions of the resistors and having respective other ends commonly connected to one of common junctions. A decoder turns on and off the switches of the switch strings according to more significant bits of data for conversion. A less significant bits-conversion circuit generates a voltage corresponding to less significant bits of the data for conversion and outputs the voltage. An operational amplifier carries out addition or subtraction of a voltage at each of the common junctions and an output from the less significant bits-conversion circuit.
Patent TW-487952-B (TW)
Title: Method to recover the operational condition of the reaction chamber
Inventor: YANG DENG-JIUN
IPC: H01L21/00
Filed: 2001-02-07
Granted: 2002-05-21
Abstract: A method to recover the operational condition of the reaction chamber and control the critical dimension of etching layer is disclosed, wherein the reaction chamber after some quantity of etching operations is dry-cleaned or preventively maintained, a dummy wafer is put into the reaction chamber, and vent the reaction chamber with gas source formed of Nitrogen and Hydrogen gas. Then proceed the etching process, the photoresist on the dummy wafer will react with the gas source and quickly form minute amounts of polymer particles, so that the operational condition of the reaction chamber can be recovered in a very short time. When the said gas source reacts with the etching layer to be etched of the chip in the etching process, it is not necessary to put into the dummy wafer after dry cleaning to recover the operational condition of the reaction chamber in-situ at the time of proceeding a general manufacturing process. Also, when the said gas source reacts with the etching layers, it is easier to control the vertical sidewall and face width of the etching layer.
Patent TW-486553-B (TW)
Title: Multi-way cock
Inventor: LOTZ NORBERT
IPC: F16K35/00
Filed: 2001-03-22
Granted: 2002-05-11
Abstract: A multi-way cock is provided comprising an approximately hollow-cylindrical housing with attachment bores on the circumference, and a plug which is mounted rotatably in the housing with a through-channel which is transverse to the axis of rotation and which can be aligned with the attachment bores in the housing, wherein axially protruding engagement elements are arranged on the base of the housing which is closed at the bottom, and wherein engagement elements cooperate with locking grooves and locking projections on the inner circumference of the hollow-cylindrical plug.
Patent TW-I236036-B (TW)
Title: System and method for improved throughput of semiconductor wafer processing
Inventor: KNAPIK BRIAN
IPC: B65G49/07
Filed: 2001-03-23
Granted: 2005-07-11
Abstract: A system and method for improved throughput of semiconductor wafer processing. In one aspect, a wafer carrier is provided having a flat zone capable of holding an additional lot of wafers for processing. In addition, a multiple fork wafer transfer mechanism is provided having a plurality of wafer forks for loading and unloading wafers in the wafer carrier at a reduced fork pitch.
Patent TW-512617-B (TW)
Title: Subscriber identification module switching system and method therefor
Inventor: JUANG YUNG-BIN
IPC: H04M1/02
Filed: 2001-03-26
Granted: 2002-12-01
Abstract: A subscriber identification module (SIM) switching system and method therefor are provided. When a subscriber uses a portable communication device, it is unnecessary to know the system pertaining to the dialing and receiving telephone number but directly perform system switching via an automatic switching module instead of shutting off system, thereby attaining the optimal performance of multiple SIMs. The system comprises the following procedures: providing multiple SIMs for being installed in portable communication devices, subsequently powering on the system and dialing/receiving a telephone number, then calling the phone number sample in a database, storing the subscriber-defined phone number in the database and comparing the phone number through a digital signal processing module, switching the subscriber identification module if the comparison result indicates that a switching is required, and finally terminating the communication and entering standby mode.
Patent TW-506199-B (TW)
Title: Synchronization of time advance and deviation
Inventor: TERRY STEVEN E
IPC: H04W56/00
Filed: 2001-04-04
Granted: 2002-10-11
Abstract: A system and method for reducing the latency from timing deviation (TD) measurement to time advance (TA) adjustment. The invention uses a deterministic procedure to coordinate time advance (TA) commands and timing deviation (TD) measurements so that failed transmissions or mobile terminals signal propagation changes can be recognized and corrected much more rapidly. Radio resource efficiency is maximized by minimizing signaling overhead through effectively reducing the frequency of time advance commands. This is accomplished by using TA command signals which include a connect frame number (CFN) to specify particular radio frames for time advance (TA) adjustment. The potential for timing deviation (TD) measurements to be incorrectly processed in conjunction with adjusting a physical reception window and calculating mobile termination location is minimized, without excessive command signaling requirements.
Patent TW-480619-B (TW)
Title: Cleaning method for dual damascene manufacture process
Inventor: WU JR-NING
IPC: H01L21/311
Filed: 2001-04-17
Granted: 2002-03-21
Abstract: This invention provides cleaning method for the application in the dual damascene process. A first metal layer, a cap layer and a dielectric layer are formed on order. A dual damascene opening is formed in the dielectric layer and the cap layer to expose the first metal layer. Subsequently, a post etch cleaning step is carried out, which can be either of following method. One uses fluorine containing organic solution to clean the dual damascene opening, while the other firstly uses a hydrogen peroxide containing solution to clean the dual damascene opening at certain temperature and then a hydrogen fluoric acid solution is used to clean the dual damascene opening. Before the formation of a second metal layer in the dual damascene opening, an argon plasma is employed to sputter the dual damascene opening and thus clean the dual damascene opening.
Patent TW-509555-B (TW)
Title: A uniformly shaped snack chip having raised surface features
Inventor: ZIMMERMAN STEPHEN PAUL
IPC: A23L1/164
Filed: 2001-08-28
Granted: 2002-11-11
Abstract: Uniformly shaped snack chips, preferably tortilla-type chips, having raised surface features and a method for preparing the same. The chips can be made from a dough-composition comprising pre-cooked starch-based material and pregelatinized starch. Preferably, the snack chips have raised surface features comprising from about 12% to about 40% large surface features; from about 20% to about 40% medium surface features; and from about 25% to about 60% small surface features. In one embodiment, the average thickness of the snack chip is from about 1 mm to about 3 mm; the average thickness of raised surface features is from about 2.3 mm to about 3.2 mm; the maximum thickness of the chip is less than about 5.5 mm; and the coefficient of variation of the chip thickness is greater than about 15%.
Patent TW-498138-B (TW)
Title: Pump device
Inventor: NAKASONE TAKESHI
IPC: F04D1/14
Filed: 2001-06-04
Granted: 2002-08-11
Abstract: The purpose of this invention is to provide a pump device having a structure in which idling of an impeller is less prone to occur by the cavitation phenomenon even in the case where the impeller having the large outside diameter is rotated at low speed, in order to efficiently feed hot water with saved power. The solution of this device is as follows. This pump device is provided with an impeller 2 to be rotated so that the rotational horizontal surface L may be parallel to the liquid level of liquid to be sucked or discharged and a pump chamber 3 for rotatably housing the impeller 2. This pump chamber 3 is provided with a suction port 32 for sucking liquid into the pump chamber by the rotation of the impeller 2, and a discharge port 33 arranged outward in the radial direction of the impeller 3 in order to discharge sucked liquid. A tilting part 36 to be radially and outward tilted in the direction opposite to gravity is provided on the surface (partition wall) 31 facing on upper end side of the impeller 2 in the pump chamber 3.
Patent TW-558486-B (TW)
Title: Material feeder for manufacture of resin concrete tube
Inventor: MATSUO IWANE
IPC: B29K101/10
Filed: 2001-06-28
Granted: 2003-10-21
Abstract: The object of the present invention is to smoothly transport an aggregate 7 without clogging a resin concrete-manufacturing aggregate-feeding screw conveyor 1 with the aggregate. In a resin concrete tube manufacturing apparatus 13 in which a rotary framework 12 is provided on a floor surface 11 and the aggregate 7 and resin solution are fed into the gramework 12, a mixer 2 for the aggregate, resin solution and curing agent is freely detachably attached to a tip of the aggregate feeding screw conveyor 1. Rotation of the mixer 2 and rotation of the screw conveyor 1 are independently carried out and both rotary shaft 1' and 2' are provided on a common rotary axis C. A mixed liquid injection opening 3' of a mixer 3 for the resin liquid and curing agent is opened to the conveyor 1 side of an attaching and detaching part 4"" of outer cylinders 4 and 4' of the mixer 2 and the screw conveyor 1. Washing agent can be fed to the mixer 3. A plurality of notches 6 for enlarging a clearance (t) to an inner surface of the outer cylinder 4 are formed on an outer periphery of a spiral vane 5 of the screw conveyor 1.
Patent TW-535303-B (TW)
Title: Semiconductor light emitting device and method for manufacturing same
Inventor: FURUKAWA CHISATO
IPC: H01L33/32
Filed: 2001-07-18
Granted: 2003-06-01
Abstract: A semiconductor light emitting device ensuring an uniform color tone comprises a semiconductor light emitting element that emits light of a first wavelength upon injection of a current, a fluorescent material portion that contains a fluorescent material excited by light of the first wavelength to emit light of a second wavelength, and a diffuser mixed in an appropriate material around the semiconductor light emitting element.
Patent TW-496014-B (TW)
Title: Electrical connector
Inventor: MASUMOTO TOSHIO
IPC: H01R12/57
Filed: 2001-08-09
Granted: 2002-07-21
Abstract: In an electrical connector having at least one contact (2) held in at least one contact accommodating groove (3a) formed in an insulator (3), the contact (2) comprises a base portion (21) press-fitted in the contact accommodating groove (3a), a contact portion (22) projecting (2a) from the contact accommodating groove (3a) upward, and a U-shape spring portion (2b) connecting the base portion (21) and the contact portion (22). The contact accommodating groove (3a) comprises a relatively large width section (3a-1) adjacent to the end wall (3e) and a relatively small width section (3a-2) adjacent to the open end. Opposite side walls at the relatively small width section (3a-2) are formed with press-fit grooves (3d) adjacent to the bottom wall (3c). The base portion (21) of the contact (2) is formed with lateral projections (2c) laterally projecting from the opposite sides of the base portion (21), and the lateral projections (2c) are press-fit in the press-fit grooves (3d) respectively. The base portion (21) of the contact (2) has a slender part which extends between the U-shape spring portion (2b) and the lateral projections (2c) and which is smaller in width than the width of the relatively small width section (3a-2) of the contact accommodating groove (3a).
Patent TW-I239567-B (TW)
Title: Method of manufacturing semiconductor device
Inventor: TOBIMATSU HIROSHI
IPC: H01L21/60
Filed: 2001-09-07
Granted: 2005-09-11
Abstract: The present invention is to provide a method of manufacturing a semiconductor which enables an improvement in the dimensional accuracy of processing of a passivation film and in the quality of the film. An interconnection is formed on a semiconductor substrate having a semiconductor element formed thereon. Next, a passivation film is formed on the semiconductor substrate including the interconnection. Further, a polyimide film, which is served as a buffer coating film, is formed on the passivation film. Further, the polyimide film is patterned. Next, the passivation film is subject to etching while the patterned polyimide film is taken as a mask. Next, a hardened layer, which is formed on the surface of the polyimide film as a result of etching, is removed through ashing process. Next, the semiconductor substrate after ashing process is cured so as to transform the polyimide film into imide.
Patent TW-546970-B (TW)
Title: Method and apparatus for measuring timing of signals received from multiple base stations in a CDMA communication system
Inventor: GRILLI FRANCESCO
IPC: H04B1/7117
Filed: 2001-10-11
Granted: 2003-08-11
Abstract: Techniques to more accurately measure the arrival times of transmissions received at a remote terminal from a number of base stations. In one aspect, unassigned finger processors are used to process and measure the arrival times of transmissions from base stations not in the active set. In another aspect, if no finger processors are available for assignment, the arrival times can be measured in the time period between updates of a reference oscillator used for the measurements. In accordance with a method for determining a position of a remote terminal, a first set of one or more base stations in active communication with the remote terminal is identified and each base station in the first set is assigned at least one finger processor. A second set of one or more base stations not in active communication with the remote terminal is also identified and an available finger processor is assigned to each of at least one base station in the second set. A (signal arrival) time measurement is then performed for each base station, and outputs indicative of the measurements are provided for further processing. To improve accuracy, the measurements can be performed within a narrow time window.
Patent TW-558856-B (TW)
Title: Lithographic type microelectronic spring structures with improved contours
Inventor: ELDRIDGE BENJAMIN N
IPC: G01R1/073
Filed: 2001-11-08
Granted: 2003-10-21
Abstract: Improved lithographic type microelectronic spring structures and methods are disclosed, for providing improved tip height over a substrate, an improved elastic range, increased strength and reliability, and increased spring rates. The improved structures are suitable for being formed from a single integrated layer (or series of layers) deposited over a molded sacrificial substrate, thus avoiding multiple stepped lithographic layers and reducing manufacturing costs. The present invention additionally provides a lithographic type spring contact that is corrugated to increase its effective length and elastic range and to reduce its footprint over a substrate, and springs which are contoured in plan view. The present invention further provides combination (both series and parallel) electrical contacts tips for lithographic type microelectronic spring structures. The microelectronic spring structures according to the present invention are particularly useful for making very fine pitch arrays of electrical connectors for use with integrated circuits and other substrate-mounted electronic devices.
Patent TW-543020-B (TW)
Title: Method of driving display apparatus and plasma display apparatus
Inventor: YAMAMOTO AKIRA
IPC: G09G3/28
Filed: 2001-11-15
Granted: 2003-07-21
Abstract: The method of driving a display apparatus, in which the gradation scale is represented, by the subfield method, with less flicker even when driven at a frequency of 50 Hz has been disclosed. In this method, the two most weighted subfields (subfields of Bn brightness and Bn-1 brightness when it is assumed that the frame is composed of n subfields and the brightness of n subfields is Bi (i=1-n; B1 <= B2 ... Bn-1 <= Bn)) are arranged at the interval of about half the length of the frame. Because of this, there exist two peaks of the light emission intensity in a frame, the interval being about half the length of the frame, and if the display apparatus is driven at a frequency of 50 Hz and the length of the frame is 20 ms, the variation period of the light emission intensity is 10 ms and the light emission intensity varies at 100 Hz, therefore, flicker is not detected.
Patent TW-513556-B (TW)
Title: Planar mechanical resonator sensitive along an axis perpendicular to its plane
Inventor: BEITIA JOSE
IPC: G01C19/5684
Filed: 2002-02-01
Granted: 2002-12-11
Abstract: The invention relates to a mechanical resonator having a planar monolithic vibrating structure that extends according to a closed contour which sensitivity axis is substantially perpendicular to the plane of said structure, characterized in that the planar structure (1) is polygonal regular convex with 4k apexes (3) (k being the order of the vibrating mode implemented when the resonator is vibrating) and is suspended to a fixed socle (4, 5) by means of n suspension arms (2) with an extension substantially radial disposed substantially symmetrically.
Patent TW-I286041-B (TW)
Title: Film formation apparatus and film formation method
Inventor: YAMAZAKI SHUNPEI
IPC: C23C14/04
Filed: 2002-02-07
Granted: 2007-08-21
Abstract: There is provided a film formation apparatus for forming an organic compound film including a plurality of functional regions. A plurality of evaporation sources (203a to 203c) are included in a film formation chamber (210), functional regions made of respective organic compounds are successively formed, and a mixed region can be further formed in an interface between the functional regions. Also, when means for applying energy to an organic compound molecule to be formed into a film in a molecular activation region (213) is provided in such a film formation chamber, a dense film can be formed.
Patent TW-565830-B (TW)
Title: Tray locking apparatus of disc drive
Inventor: BAE BYOUNG-YOUNG
IPC: G11B17/056
Filed: 2002-03-07
Granted: 2003-12-11
Abstract: A tray locking apparatus of a disc drive for locking a tray on which a disc is placed and which is inserted into a main body of a disc drive, includes a locking boss provided at the main body, a locking plate installed at the tray capable of sliding and having a locking portion provided at one side thereof which is caught by the locking boss as the tray enters the main body, an elastic member to elastically biasing the locking plate in a direction in which the locking portion is caught by the locking boss, and a driving mechanism for making the locking plate slide to be out of a position where the locking portion is caught by the locking pin when the tray is drawn. Thus, even when an external impact is applied, the locking state can be firmly maintained. Also, electric power consumed for locking and unlocking operations can be quite reduced.
Patent TW-593724-B (TW)
Title: Method for the formation of the multilayer film and the device thereof
Inventor: HARADA JINPEI
IPC: G01B15/02
Filed: 2002-04-18
Granted: 2004-06-21
Abstract: The object of the present application is to provide a method for the formation of the multilayer film by producing the thickness of the film of at least the specific layer in the film production on the substrate in accordance with the precision of less than 0.5 nm to improve the yield of the multilayer film, and the device thereof. In the method for the formation of the multilayer film according to the present application, the X-ray is irradiated with the angle of 0 to 1.5 DEG from the X-ray irradiated apparatus 6 to the surface of the multilayer film in the film production on the substrate W, and the obtained reflective X-ray is measured by changing the incident angle theta and using the X-ray measuring apparatus 7, and then the reflectivity curve is obtained by plotting the intensity of the reflective X-ray versus the scattering angle 2theta. The thickness of the film in the film production is calculated by analyzing the reflectivity curve of the scattering angle of from 0 to 1 DEG in the reflectivity curve. The film with a defined thickness is formed by using the calculated result and controlling the thickness of the film in the film production.
Patent TW-I246529-B (TW)
Title: Ink set for inkjet printer
Inventor: SHEN YU-CHANG
IPC: C09D11/00
Filed: 2002-04-18
Granted: 2006-01-01
Abstract: The invention is to provide an ink set for an inkjet printer. The ink set according to the invention includes a black-pigmented ink and at least one non-black dyed ink. The black-pigmented ink includes at least one first non-ionic surfactant which each has a first HLB value. The non-black dyed ink includes at least one second non-ionic surfactant which each has a second HLB value. Moreover, the first HLB value is smaller than or equal to the second HLB value. With respect to enhancement of print quality, the inkjet printer, using the ink set according to the invention, can shorten drying time, fasten print speed, and prevent from ink bleeding between the black-pigmented ink and the at least one non-black dyed ink.