Patent SG-181572-A1 (SG)
Title: Plasma ignition system, plasma ignition method, and plasma generating apparatus
Inventor: UTANO TETSUYA
Filed: 2010-07-29
Abstract: Latest bibliographic data on le with the International Bureau Submit observation; Pub. No.: WO/20111070819Publication Date: 16.06.2011IPC: H05H 1/46 (2006.01), HOU Applicants: SHINKAWA LTD. [JP/JP]; 51- Designated States Except US). UTANO, Tetsuya [JP/JP]; (JP) (FMAEDA, Toru [JP/JP]; (JP) (For US nly). TAKAHIRA, Jun'ichi [JP/JP]; (JP) (Foy US On/y). HAMAJIMA, Masanori [JP/JP]; (JP) (Fb US Only)Inventors: UTANO, Tetsuya; (JP).MAEDA, Toru; (JP).TAKAHIRA, Junlichi; (JP).HAMAJIMA, Masanori; (JP) INABA, Yoshiyuki; TMI ASSOCIATES, 23rd Floe. , Roppongi Hills Mod Tower, 6-10-1, Roppongi, Minato ku, Tokyo 1066123 (JP)2009-280581 10.12.2009 JP(EN) PLASMA IGNITION DEVICE, PLASMA IGNITION THOD, AND PLASMA GENERATION DEVICE (FR) DISPOSITIF D'AMORCAGE DE PLASMA, PROCED D'AMOKAGE DE PLASMA ET DISPOSITIF DE GENERATION DE PLASMA(JA) 15X7 AgE, /5X7kfl5S, 8ekt5i5X75E(EN)Disclosed is a plasma ignition technology capable of easily and reliably igniting and reigniting plasma without monitoring or human intervention thereupon. The plasma ignition device comprises a high-frequency power supply device (101) that generates and supplies a prescribed high-frequency signal (HS) to an anode (114) for plasma generation; a coordination device (105) that coordinates the impedance upon the high-frequency power supply device and the anode; a progressive wave/reflected wave detection device (102) that detects the progressive waves and the reflected waves of the high-frequency signal (HS); a high-voltage generation device (103) that generates a prescribed high voltage (HV); and a control device (100) that superimposes the high voltage (HV) upon the high-frequency signal (HS) when the ratio of reflected waves to progressive waves exceeds a first threshold.(FR)L'invention porte sur une technologie d'amorgage de plasma capable d'amorcer et de reamorcer un plasma de facon aisee et liable sans surveillance ni intervention humaine. Le dispositif d'amorcage de plasma comprend un dispositif d'alimentafion electrique haute frequence (101) qui genere et fournit un signal haute frequence (HS) prescrit a une anode (114) pour generer un plasma; un dispositif de coordination (105) qui coordonne 'Impedance sur le dispositif d'alimentafion electrique haute frequence et l'anode; un dispositif de detection d'ondes progressives/ondes reflechies (102) qui detecte lesondes progressives et les ondes reflechies du signal haute frequence (HS); un dispositif de generation dehaute tension (103) qui genere une haute tension (FIV) prescrite; et un dispositif de commande (100) quisuperpose la haute tension (HV) au signal haute frequence (HS) lorsque le rapport des ondes reflechiessur les ondes progressives depasse un premier seuil.(JA)IMAKAL41:9A.*Wl.t.t L.P4-ZaLtSCgAtztv")?iMIzi1X7a.l.±1.14(AAL.t.t.91-Zat teaTtgia/"XvigARIIWAitt-no ifiTA*RDIEZONEMAEtr-4HSegE±L15X7ftt-±t.tabo) citto111417.908-4-ZWataTigN101, riarThxzzsgagjeginagieoc.,e—y:..one-g P2010062780 PLASMA IGNITION DEVICE, PLASMA IGNITION METHOD, AND PLASMA GENERATION D... Page 2 of 2ZwkagfEl 05. aiffigir*HSORtilk8cktIVICAVA±t4.1-1-ift.angiftni o2, pinzOYMM 11Hvt5ttl-ZAZERgE103, Mila0EtTg1:34-4-ZaShiZ101-1..Ntackt)fltNtAt-izAwfjDesign ed AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, States: DE, DK, DM, DO, DZ, EC, EE, EG, ES, Fl, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG,KM, KN, NP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA,G, NI, NO, NZ, OM, PE, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH,TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.Afn n Regional Intellectual Property Org. (ARIPO) (BW, GH, GM, NE, LR, LS, MW, MZ, NA, SD, SL, SZ,TZ„ ZM, ZW)Eurasi Patent Organization (EAPO) (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)Europea Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, Fl, FR, GB, GR, HR, HU,1E, IS, IT, T, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR)African Inte ctual Property Organization (0API) (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR,NE, SN, TD, G).Publication Language: Japanese (JA)Japanese (JA)Provided is a plasma ignition technique allowing easy and reliable ignition and reignition of plasma without monitoring or manual handling. A plasma ignition system according to this technique is provided with a radio-frequency power supply configured to supply a predetermined high frequency signal to an applied electrode for generating plasma; a matching device configured to match impedance on a side of the radio-frequency power supply and impedance on a side of the applied electrode; a forward wave/reflected wave detector configured to detect a forward wave and a reflected wave of the high frequency signal; a high-voltage generator configured to generate a predetermined high voltage; and a controller configured to superimpose the high voltage on the high frequency signal when a ratio of the reflected wave to the forward wave is greater than a first threshold value.Figure 1