Patent TW-202139237-A (TW)
Title: Charged particle beam inspection apparatus and charged particle beam inspection method
Inventor: TAKEKOSHI HIDEKAZU
IPC: H01J37/147
Filed: 2020-12-15
Abstract: A charged particle beam inspection apparatus comprising: a movable stage, configured to hold a substrate placed on the movable stage; a stage control circuit, configured to continuously move the movable stage in a direction opposite to a first direction; a deflection control circuit, configured to control a deflector to collectively deflect multiple beams to an N*N' small region group including N small regions (N being an integer equal to or greater than 2) arranged at a pitch p in the first direction and N' small regions (N' being an integer equal to or greater than 1) arranged at the pitch p in a second direction orthogonal to the first direction on the substrate among a plurality of small regions obtained by dividing an inspection region of the substrate, each small region having a size of p/M (M being an integer equal to or greater than 2) in the first direction and a predetermined size in the second direction, the multiple beams being composed of a plurality of charged particle beams arranged in N columns and N' rows in the first direction and the second direction at the same pitch p on a surface of the substrate, the collective deflection comprising performing tracking deflection of the multiple beams so as to follow a continuous movement of the movable stage by a distance of N/M·p in the direction opposite to the first direction, and collectively deflecting the multiple beams to a new group of N*N' small regions arranged at the pitch p in the first direction to perform a tracking reset until the continuous movement of the movable stage by the distance of N/M·p in the direction opposite to the first direction is completed, the new N*N' small region group being located away from the N*N' small region group by N small regions in the first direction, and sequentially perform a first step and a second step in each of the small regions with each of the multiple beams while the tracking deflection of the multiple beams is performed so as to follow the continuous movement of the movable stage to collectively deflect the multiple beams so as to scan the N*N' small region group, the first step comprising repeating the collective deflection of the multiple beams along the second direction from an end of each of the small regions in the direction opposite to the first direction to an end of each of the small regions in the first direction, using the end of each of the small regions in the direction opposite to the first direction as a starting point and the end of each of the small regions in the first direction as an end point, and the second step comprising repeating the collective deflection of the multiple beams along a direction opposite to the second direction from the end of each of the small regions in the direction opposite to the first direction to the end of each of the small regions in the first direction, using the end of each of the small regions in the direction opposite to the first direction as a starting point and the end of each of the small regions in the first direction as an end point; and a detector configured to detect secondary electrons emitted from the substrate due to irradiation of the substrate with the multiple beams, wherein combinations of a value of N and a value of M are set such that the greatest common divisor of the value of N and the value of M is 1.