baber/WOPTO huggingface dataset:
Patent JP-S60232803-A (JP)
Title: Method of chopping chip
Inventor: TAKENAKA HIROYUKI
IPC: B23B25/02
Filed: 1984-04-27
Abstract: PURPOSE:To improve the ability of removing chips, by injecting high-pressure fluid toward the cutting face of a cutting tool so as to provide a chip with a curvature and by further injecting high-pressure fluid for causing the chip to impinge against the work and for turning and breaking the chip. CONSTITUTION:High-pressure fluid 6 is injected from a first injection nozzle 3 toward the cutting face of a cutting tool 2. A chip 4' is turned upward by the fluid 6. High pressure fluid 6' injected from a second injection nozzle 5 hits on the chip 4' thus turned and causes it to impinge against the work 1. The chip 4' is thus turned inversely with the free face 7 on the back face and broken into small pieces, which are removed easily.
Patent JP-S57201172-A (JP)
Title: Polishing device
Inventor: HASEGAWA YOSHIMI
IPC: B24B55/02
Filed: 1981-06-02
Abstract: PURPOSE:To remove completely liquid from liquid detergent to prevent the surplus liquid detergent from dropping onto a work by dripping the liquid detergent injected at a polishing belt position other than a working position to collect  dripped liquid through a guide in a liquid collecting device. CONSTITUTION:Liquid detergent is injected to the surface of a polishing belt 5 from a liquid detergent injecting pipe 7 aranged on a spot other than a working position on the polishing belt 5 and then dripped by a dripping member 8 consisting of a press roller and the like. The dripped liquid detergent is distributed to a rear position in the advancing direction of the belt and guided to and collected in a liquid collecting device 9 provided with a liquid collecting guide 10 contacting said belt 5.
Patent JP-H06327239-A (JP)
Title: Switching regulator
Inventor: ERUHARUTO BAIERU
IPC: H02H9/02
Filed: 1994-03-30
Abstract: PURPOSE: To limit current through a simple circuitry by employing a saturation reactor where a saturation current is set to reach a predetermined threshold value of a comparator as the inductance of a filter circuit. CONSTITUTION: The switching regulator comprises a switching transistor T, and an output filter comprising a reactor L and a capacitor C, and a controller S switches the transistor T depending on a output current I2 . When voltage drop across a measuring resistor R exceeds the threshold level of a comparator V, the transistor T is interrupted through the comparator V and the controller S in order to limit short circuit current or overcurrent. The reactor L is set to be saturated at the threshold level of the comparator V. According to the arrangement, overcurrent limit of the output current I2 can be determined by simply setting the reactor L regardless of the allowance of the measuring resistor R.
Patent JP-S5714523-A (JP)
Title: Rapamycin injection composition
Inventor: SARENDORA NASU SEEGARU
IPC: A61K9/00
Filed: 1981-06-02
Abstract: Described is an injectable composition comprising rapamycin and a nonionic surfactant selected from polyoxyethylated fatty acids, polyoxyethylated fatty alcohols or polyoxyethylated glycerine hydroxy fatty acid esters and a method of preparing said compositions. The composition provides enhanced blood levels of rapamycin in a mammal following injected administration thereof.
Patent JP-S58203144-A (JP)
Inventor: ODA SHINGO
IPC: D03D47/36
Filed: 1982-05-20
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-S57199564-A (JP)
Title: Build-up welding method by belt-like electrode type multiple electrodes
Inventor: MINATO SHIYOUJI
IPC: B23K9/04
Filed: 1981-06-03
Abstract: PURPOSE:To perform build-up welding efficiently at low dilution rates on a steel material in the stage of build-up welding on the steel material to be welded by spraying a flux in the steel material, and subjecting the same to multiple electrode build-up welding by a strip-like consumable electrode of the compsn. differing from that of the steel material. CONSTITUTION:A flux F wherein metallic fluoride such as CaF2 or AlF3 is contained at >=40% or furthr TiO2 is added to contain these at >=40% is sprayed on a steel material 1 to be padded. The flux F is thoroughly melted with a preceding electrode 2a, and a belt-like consumable electrode 2b of the compsn. differing from that of the material 1 is placed behind said flux and in the position backward of the position C1 where molten metal 3a solidifies and forward of the position C2 where molten slag 4a solidifies, and the material 1 is padded with 2-6mm. per layer by the electroslag melting by the molten slag 4a. Since the molten part 3a of the material 1 by the electrode 2a has solidified to a layer 1a at the point of time of the build-up welding, the build-up weld zone of superior characteristics of <=10% rate of dilution with the overlaid metal is formed.
Patent JP-S60231053-A (JP)
Title: Creep preventer for automatic transmission
Inventor: YAGI YOUICHI
IPC: F16H61/10
Filed: 1984-05-01
Abstract: PURPOSE:To prevent a starting shock from occurring, by making a variation rate for orifice opening smaller in a region where hunting is liable to happen. CONSTITUTION:A variable orifice 93 of a creep preventer 100 is constituted so as to make a variation rate for orifice opening smaller at a region where the clamping force is liable to come into hunting during the operation progress of a friction element. With this constitution, the hunting of output rotational frequence in a torque converter comes to nothing, thereby making the hunting of torque in an output shaft eliminatable, so that a woobly vibratile starting shock is preventable from occurring.
Patent JP-H11151090-A (JP)
Title: Plant having low sensitivity to ethylene
Inventor: EOMO HIROSHI
IPC: C12N5/00
Filed: 1998-03-31
Abstract: PROBLEM TO BE SOLVED: To obtain a new protein consisting of an ethylene receptor which is a hormone associated with the maturation of a plant, having a specific amino acid sequence, of which gene can suppress the function of the ethylene receptor, and useful for the production of a plant having a low sensitivity to ethylene. SOLUTION: This new protein having an amino acid sequence as described in formula I or II, having an binding activity with ethylene and useful for producing a plant having a low sensitivity to ethylene as a receptor of ethylene and as a hormone associated with the maturation of a plant, and capable of giving agricultural crops having a good preserving property by introducing a gene thereto, is obtained by aseptically seeding a melon on a culturing medium, growing in a 25% dark place, harvesting at 55th day after mating, extracting a RNA of the melon with a phenol method, preparing a DNA library by using the RNA, screening the library by using a probe consisting of a partial sequence of the protein, incorporating the obtained ethylene receptor gene into an expression vector for transforming host cells, and culturing the transformed cells.
Patent JP-S63251332-A (JP)
Title: Throttle control device
Inventor: HATA YASUAKI
IPC: B60K31/00
Filed: 1987-04-06
Abstract: PURPOSE:To enable successive change-over control into a normal running mode, a traction control mode and a constant speed control mode by disposing an eccentric pulley on a sheath for an intermediate wire part connecting between first and second pulleys. CONSTITUTION:The rear end of an accelerating wire part 4a is connected to a first pulley 5. Further, an intermediate wire part 4b is coupled between first and second pulleys 5, 6 while a throttle wire part 4c is connected between the second pulley 6 and a throttle valve 12. A flexible sheath 7 covers the outer periphery of the intermediate wire part 4b. Further, an eccentric pulley 8 having its rotary shaft which is coupled at one end with a motor 10 through the intermediary of a clutch 9, is laid on the sheath 7. The other end of the rotary shaft of the eccentric pulley 8 is coupled with a rotating angle sensor 11.
Patent JP-H02264862-A (JP)
Title: Elution tester
Inventor: INOUE HAYAO
IPC: G01N33/15
Filed: 1989-04-04
Abstract: PURPOSE:To enhance measuring accuracy by washing a filter with a new solution when the new solution is replenished to an elution tank and reducing the pore size of the filter to prevent the passage of an insoluble particle. CONSTITUTION:A filter part 20 is loaded with a membrane filter 22 having a pore size of about 0.45mum. In the case of the backwashing operation of the filter part, when a three-way valve 84 is changed to a new solution pipeline 86, a new solution 82 is sucked from a replenishing solution tank 80 by a replenishing syringe pump 70. Next, the three-way valve 84 is changed over to a replenishing pipeline 88 and a three-way valve 26 is changed over to a tube pipeline 16 to generate the discharge operation of the pump 70. By this method, the flow of a liquid in the direction reverse to that at the time of suction is generated with respect to the filter part 20 and an elution tank 10. At this time, the backwashing of the filter 22 with the new solution, replenish ment of the liquid 14 to the elution tank 10 and the return of the undissolved substance sucked in the filter 22 at the sucking time of the liquid to the elution tank 10 are performed. By this method, measuring accuracy can be enhanced.
Patent JP-S61246569-A (JP)
Inventor: YAGI HIROYUKI
IPC: G05B17/02
Filed: 1985-04-24
Abstract: (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。
Patent JP-H04318999-A (JP)
Title: Part mounting construction and fixing tool
Inventor: TANIKADO MITSUO
IPC: H05K7/12
Filed: 1991-04-18
Abstract: PURPOSE:To reduce the number of parts and make the part mounting work easier by cutting and bending a fixed projection to a position adjacent to a part to be mounted, said projection having a pressing surface with an inverted-L- shaped side view and having a tip end bent upward from the projection with a supporting hole made outside of the projection. CONSTITUTION:A fixed projection 12a with an inverted-L-shaped side view placed at the pressing surface 12b is cut and bent to a position adjacent to a mounting area for a part to be mounted 1, and the tip end of the pressing surface 12b is bent upward. Rectangular supporting holes 12c are made in a frame 12 outside of respective projections, and the part to be mounted 1 is placed in the mounting area. Then, using the supporting hole 12c as a support, the rising face of the fixed projection 12a is pressed and a plastic deformation is given to its inner side. Thus, the part to be mounted 1 can be pinched with the mounting face of the frame 12 and the pressing surface 12b of the fixed projection 12a. By doing this, a part can be mounted very easily with an extremely simple configuration, and the number of parts can be reduced.
Patent JP-H11286333-A (JP)
Title: Substrate housing device and substrate housing method
Inventor: FUKUSHIMA MASAHIKO
IPC: B65G1/00
Filed: 1998-03-31
Abstract: PROBLEM TO BE SOLVED: To provide a substrate housing device and a substrate housing method, which can restrain a substrate housed in the substrate housing device from being deflected, and can automatically carry the substrate in/out of the substrate housing device by means of a carrying device without degrading a housing efficiency for the substrate. SOLUTION: A supporting part 3 is provided for holding a substrate 2 to be housed in a substrate housing device 1 one by one while being mutually spaced, supporting members 3a are disposed at specified pitches on one side face of paired side face located in the direction perpendicularly intersected with an opening surface through which the substrate 2 of a substrate housing device 1 is carried in/out, supporting members 3b are disposed at specified pitches identical to that of the supporting members 3a on the other side, and concurrently, the paired supporting members 3a and 3b holding one piece of the substrate 2 and disposed so as to be stepped in such a way that an inclined angle θ is formed with respect to a horizontal plane, so that the substrate to be housed in is thereby held so as to be inclined with respect to the horizontal plane. Besides, the inclined angle θ shall be 30 deg.±5 deg..
Patent JP-S62244431-A (JP)
Title: Lowly irritable surfactant
Inventor: TANAKA HIROSHI
IPC: C09K23/54
Filed: 1986-04-15
Abstract: PURPOSE:To obtain a surfactant which is lowly irritable for skin and high in stability and used for cosmetics or the like by using polyoxyalkylene denatured organosiloxane having both polyoxyalkylene group content and average mol.wt. of specified amount. CONSTITUTION:Polyoxyalkylene denatured organopolysiloxane (shown in formulas I, II or III) which has 2-40wt% polyalkylene group in a molecule and 5,000-20,000 average mol.wt. is obtained by properly selecting charge amount of alkyleneoxide and degree of polymerization of polysiloxane group. Further in the formulas, R is methyl group or phenyl group, R' is H or alkyl radical, p is 1-5, q is 2-3. Emulsion composition obtained by blending the above- mentioned compd. of about 0.1-90wt% to oil material is extremely low in irritation for skin and suitable for cosmetics and a detergent.
Patent JP-S5212098-A (JP)
Title: Method of tieing thread to coil-like body
Inventor: MURAYA TERU
IPC: B65B13/02
Filed: 1975-07-15
Abstract: PURPOSE:A method of tieing a thread to a coil-like body, by which the thread can be tied without stopping the coil-like body.
Patent JP-S5313144-A (JP)
Title: Inverter power source equipment
Inventor: KATAYAMA TADASHI
IPC: H02J9/06
Filed: 1976-07-21
Abstract: PURPOSE: To reduce capacity of AC filter equipment by installing interrupter at the output of AC filter equipment and separating AC filter equipment in failed power source unit from power supply system. 
     COPYRIGHT: (C)1978,JPO&Japio
Patent JP-S63253939-A (JP)
Title: Process for forming resist pattern
Inventor: BAN KOJI
IPC: G03F7/004
Filed: 1987-04-10
Abstract: PURPOSE:To improve resistance to plasma etching by using a specified organogermanium polymer for a resist material constituting a resist layer. CONSTITUTION:A organogermanium polymer expressed by formula I is used as a resist material constituting a resist layer. In formula I, each R1-R4 is either one of substituting alkyl group, aryl group, wherein the aryl group may be substituted or unsubstituted by alkyl group; each of (n) and (m) is a positive integer. Since the organogermanium polymer has high resistance to oxygen plasma etching, a satisfactory pattern may be formed in a two layer type resist system.
Patent JP-H073055-A (JP)
Title: Method for treating surface of polyimide film
Inventor: OGINO ATSUSHI
IPC: H05K3/38
Filed: 1991-01-25
Abstract: PURPOSE:To readily obtain a film improved in adhesive strength by treating the surface of a polyimide film with an alkali solution and successively with an acid solution. CONSTITUTION:The surface of a polyimide film is treated with an alkali solution, preferably, an aqueous solution of potassium hydroxide or sodium hydroxide and successively with an acid solution such as aqueous solution of boric acid, hydrochloric acid, sulfuric acid, acetic acid, etc., to provide the objective film.
Patent JP-S58205926-A (JP)
Title: Magnetic disc
Inventor: HONDA YOSHINORI
IPC: C09D179/08
Filed: 1982-05-25
Abstract: PURPOSE:To obtain a magnetic disc having reduced time necessary for manufacture and flat surface and remarkably improved recording density, by providing a resin layer formed with plasma discharge between an aluminum alloy substrate and a magnetic substance layer. CONSTITUTION:After the atmospheric pressure in a chamber 2 is reduced in the case of a plasma polymerization method, a monomer gas used as a raw material of a resin layer 7 is introduced from a gas introducing inlet 6, high-frequency voltage is applied between electrodes 3 and 4 to generate plasma, the monomer gas is polymerized to form the resin layer 7. In case of a sputtering method, after the atmospheric pressure in the chamber 2 is reduced, a sputtering atmospheric gas (Ar, N2, O2 and the like) is introduced from the gas introducing inlet 6 and a target for forming the resin layer 7 is fitted between the electrodes 3 and 4. Then, the target is sputtered by applying high-frequency voltage between both the electrodes 3, 4 to generate plasma, and the resin layer 7 is formed on the aluminum alloy substrate 1.
Patent JP-H04300783-A (JP)
Title: Steering angle control device for vehicle
Inventor: ITO TAKESHI
IPC: B62D113/00
Filed: 1991-03-28
Abstract: PURPOSE:To provide the effective control of an steering angle in an area where wheels to be controlled is not always saturated by eliminating saturation of control steering angle even in the case that a fixed regulation is made of the maximum value of vontrollable steering angle quantity of 4WS. CONSTITUTION:As a yaw rate target value setting unit 4 of a control device in the case that a quantity to be controlled is at a yaw rate and wheels to be controlled is rear wheels, a standard model is used, and a stationary characteristic is set by a linear yaw rate stationary target6 value setting unit 4a, a stationary rear wheel steering angle computing unit 4b, a stationary rear wheel steering angle limiter 4c, and a yaw rate stationary target value setting unit 4d. At this stage, a stationary gain of the yaw rate is given as a function of a steering angle, and the non-linear characteristic for changing the stationary gain in response to largeness of the input of the steering angle is given to the stationary characteristic of the standard model, and the control device controls the steering angle in an area where the rear wheels are not always saturate.
Patent JP-S5211867-A (JP)
Title: Manufacturing method of a semiconductor device
Inventor: YAZAWA KAZUHIKO
IPC: H01L21/331
Filed: 1975-07-18
Abstract: PURPOSE: By forming the oxide film on the surface of a semiconductor device optionally except for the photoresist process, the simplification and integration of the manufacturing process shall be improved. 
     COPYRIGHT: (C)1977,JPO&Japio
Patent JP-H05291889-A (JP)
Title: Pulse power supply employing complete solid-state component employing saturable transformer
Inventor: YATSUI KIYOSHI
IPC: H03K3/57
Filed: 1992-04-09
Abstract: PURPOSE:To reduce a switching loss of a semiconductor switch and to improve a current increasing ratio by applying magnetic assist comprising series connection of a saturable reactor to the semiconductor switch, boosting the pulse current with a saturable transformer and compressing the pulse with the operation of a magnetic switch whose timing is adjusted. CONSTITUTION:A switching loss is reduced by applying magnetic assist to a semiconductor switch SW by a saturable reactor SO1 to attain switching to increase a current increasing ratio. Then the pulse current boosted by the operation of a saturable transformer ST is obtained and the pulse is compressed by the operation of a magnetic switch at a post-stage to supply a short width pulse of a high voltage and a large current to a discharge tube DT. The timing switched from the boosting operation of the saturable transformer ST to the operation of the magnetic switch is optimized by the adjustment of the inductance of a variable reactor L0.
Patent JP-H02264905-A (JP)
Title: Production of optical compensation plate
Inventor: HORIGUCHI HIROSADA
IPC: G02B5/30
Filed: 1989-04-06
Abstract: PURPOSE:To easily produce the optical compensation plate by using a high-polymer film which forms a refractive index anisotropic body exhibiting positive double refractiveness when stretched and biaxially stretching this film. CONSTITUTION:The molecules of the high-polymer film, such as polycarbonate film or polyethylene film, which forms the refractive index anisotropic body exhibiting the positive double refractiveness when stretched elongate in the main chain direction and since the groups, such as benzene rings, to increase the refractive index exist in the main chains, the refractive index in the main chain direction is larger than the refractive index in the direction perpendicular thereto if the main chains are uniformed in the stretching direction by stretching the film. The optically anisotropic body 13 exhibiting the positive double refractiveness in the stretching direction is, therefore, obtd. if the film is stretched. Such high-polymer film 11 is consequently stretched in an arrow direction 12 and is then stretched in the direction perpendicular to the direction 12. The refractive index anisotropic body 13 is then increased in the refractive index in the stretching direction by the 2nd stretching so as to have the refractive index of about the same degree as the refractive index in the direction perpendicular to the stretching direction. The optically negative uniaxial optically anisotropic body is eventually formed.
Patent JP-H06302293-A (JP)
Title: Microwave ion source
Inventor: SEKI TAKAYOSHI
IPC: H01L21/265
Filed: 1993-04-14
Abstract: PURPOSE:To provide a microwave ion source for obtaining a large current of ion beams by canceling magnetic field dispersion at the slit position of an ion beam outlet and in front of the slit of the ion beam outlet. CONSTITUTION:In a microwave ion source for generating plasma in a discharging box 7 by microwave discharge in a magnetic field and for pulling out ion beams through a slit 8a' by means of pulling out electrodes 8a, 8b pole pieces 21, 22 for correcting at least a pair of magnetic fields formed of a magnetic substance are installed on the sides of the discharging box 7 in such a way that the discharging box 7 may be sandwiched. Thus, magnetic force components at the slit position and in the narrow slit width direction in front of the slit position are canceled to parallel pulling out ion beams, obtaining a large current of ion beams.
Patent JP-H01261226-A (JP)
Title: Production of scheibler's compound
Inventor: YAMAMURA KOJI
IPC: H01B13/00
Filed: 1988-04-08
Abstract: PURPOSE:To inexpensively mass produce a Scheibler's compound, by calcining a mixture of molybdenum sulfide, molybdenum and a specific metal under reduced pressure or in the presence of a reducing gas. CONSTITUTION:Metallic molybdenum is blended with molybdenum sulfide and metal powder (at least one element of Li, Na, Mg, Ca, Sc, Cr, Mn, Fe, Co, Ni, Cu, Zn, Sr, Y, Pd, Ag, Cd, In, Sn, Ba, La, Pb, Ce, Pr, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu). Then the mixture is calcined under reduced pressure or in a gas flow of a hydrogen-containing argon, helium or nitrogen gas to produce a Scheribler's compound. By the production method, sealing of reaction tube is not required and the reaction tube can be used many times. Since the raw materials contain no sulfur and the reaction tube of quartz glass is opened, the reaction tube of quartz glass will not be broken even if the amount of the compound per time is increased.
Patent JP-H08257337-A (JP)
Title: System for environment improvement and maintenance for exhibition or storage facility
Inventor: MURAMATSU MORINORI
IPC: E04H3/06
Filed: 1995-03-20
Abstract: PURPOSE: To protect articles for exhibition or storage from pollution by grasping the degree of pollution (degree of purification) of exhibition or storage environment quantitatively and maintaining the improved environment and post- improvement environment state. CONSTITUTION: Adsorptive sheets 5 for a wall surface 2a and a floor surface 2b of an exhibition room 1 are set facing each other closely for a given period to adsorb and remove pollution factors such as volatile components, water content and the like discharged from the wall surface 2a and the floor surface 2b by the adsorptive sheets 5. Pollution factor sensors are provided on the wall surfaces of the exhibition room improved to the environment suitable for exhibition, and when the amount of pollution factors in the atmosphere reaches the given level, a filter type air cleaner is driven for a given time based on a signal from the sensor to recover the environment.