Patent SG-11201804115U-A (SG)
Title: Lithographic apparatus and method of operating a lithographic apparatus
Inventor: KANEHARA JUNICHI
IPC: G03F7/20
Filed: 2016-09-30
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property - Organization International Bureau (43) International Publication Date .... ....r .....1 26 May 2017(26.05.2017) WIPO I PCT ID Hit (10) WO International 2017/084797 111111111111111111111111111111111111111111111111111111111111RIIIIIIIIIIIIIII Publication Al Number (51) International Patent Classification: (81) Designated States (unless otherwise indicated, for every GO3F 7/20 (2006.01) kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, (21) International Application Number: BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, PCT/EP2016/073380 DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, (22) International Filing Date: HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, 30 September 2016 (30.09.2016) KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, (25) Filing Language: English OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, (26) Publication Language: English SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, (30) Priority Data: ZW. 15195532.5 20 November 2015 (20.11.2015) EP 16157155.9 24 February 2016 (24.02.2016) EP (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, Box 324, 5500 AH Veldhoven (NL). TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, (72) Inventors: KANEHARA, Junichi; P.O. Box 324, 5500 TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, AH Veldhoven (NL). BUTLER, Hans; P.O. Box 324, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, 5500 AH Veldhoven (NL). DE WIT, Paul , Come, Henri; P.O. Box 324, 5500 AH Veldhoven (NL). VAN DER SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, PASCH, Engelbertus, Antonius, Fransiscus; P.O. Box GW, KM, ML, MR, NE, SN, TD, TG). 324, 5500 AH Veldhoven Published: (NL). (74) Agent: RAS, Michael; P.O. Box 324, 5500 AH Veld- — with international search report (Art 21(3)) hoven (NL). (54) Title: LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING A LITHOGRAPHIC APPARATUS : A lithographic (57) method of operating a ap- paratus that comprises: a projection system configured to provide exposure radiation for patterning a substrate un- derneath the projection system; a first stage configured to 21 -- --.., — support a first substrate; a second stage configured to sup- a and a third accommodating port second substrate; stage a component that includes at least one of a sensor and a PS cleaning device; wherein the method comprises starting a -exposure scrum sweep operation after starting a sub- CS —..._ 1 pre during strate exchange operation; wherein the pre-expos- ure scrum sweep operation, the third stage moves away W2 WT2 from underneath the system while the second projection stage moves to underneath the system; wherein projection 23 during the substrate exchange operation, the first substrate is unloaded from the first stage. W1 UP3 -- x x -- -UP2 1-1 .4t It-- tz' UPI (..-.... WT1 It-- o n o X 22---- o It-- 1-1 o ei LP o