baber/WOPTO huggingface dataset:
Patent JP-H1091238-A (JP)
Title: Method and system for controlling operation of tracked carriage
Inventor: OCHI NOBUO
IPC: B65G43/08
Filed: 1996-09-11
Abstract: PROBLEM TO BE SOLVED: To improve the conveyance efficiency of a conveyance system where carriages travel on a track cyclically in a fixed direction by managing the standby time when a carriage waits at an unloading part. SOLUTION: When the carriage reaches an unloading station, a minimum standby time Tmin is set (S10). The minimum standby time Tmin is the time left from the time of last unloading onto the conveyor of the unloading station until the specific time of the necessary time needed to carry a load out from the conveyor plus a slight margin is elapsed. If there is a load left on the conveyor and unloading operation can not be done, the carriage stands by as it is until unloading becomes possible (S20 and S40). The carriage stands by preferentially until the minimum standby time Tmin is elapsed (S60), but when there is a carriage which desires to go ahead the standing-by carriage, the standing-by carriage starts circulating operation for making a round of the track so as to make way for the following carriage on condition that the minimum standby time Tmin is elapsed.
Patent JP-H0289052-A (JP)
Title: Color reversal image forming method
Inventor: DEGUCHI HISAYASU
IPC: G03C5/50
Filed: 1988-09-26
Abstract: PURPOSE:To improve graininess, sharpness and image preservable property by incorporating one kind of 2-equiv. magenta couplers into the layer bearing the gradation of the lowest density part and the layer bearing the gradation of the highest density part of green-sensitive layers and specifying the relative coupling rate of the 2-equiv. magenta couplers and the concn. of the aldehyde compsn. in the final chamber of a rinsing bath. CONSTITUTION:Respectively one kind of the 2-equiv. magenta couplers are incorporated into the layer bearing the gradation of the lowest density part and the layer bearing the gradation of the highest density part of the green-sensitive layers. The relative coupling rate of the 2-equiv. magenta couplers is >=1 to 1.2 and the concn. of the aldehyde compd. in the final chamber of the rinsing bath is <=1.0X10-<2>mol/l. The 2-equiv. magenta couplers are incorporated into the green-sensitive layer bearing the gradation of the lowest density part and the green-sensitive layer bearing the gradation of the highest density part in such a manner and the relative coupling rate is specified to >=1:1.2. The degradation in the adhesive strength between the adhesive layers is then obviated even if the aldehyde compd. in the final rinsing bath is decreased. The graininess and sharpness are improved in this way and the image preservable property at and under a high temp. and high humidity are improved in this way.
Patent JP-H0552705-A (JP)
Title: Backlash measuring apparatus of gear
Inventor: KUMAZAWA TADASHI
IPC: G01M13/02
Filed: 1991-08-26
Abstract: PURPOSE:To obtain an apparatus which can accurately measure the backlash of a gear. CONSTITUTION:When backlash is measured, a supporting plate 48 is lowered. After a cylinder 86 for pushing the main body of an apparatus pushes a frame 28 to a block 18, a center 82 is slightly lifted and inserted into the center hole of a first balance shaft 24. At the same time, a chuck 80 is slightly lifted and holds the first balance shaft 24. The shaft 24 is rotated into a backlash measuring position with a balance-shaft rotating and driving motor 76. A crank shaft 10 is fixed with a crank-shaft fixing chuck 56. Under the state wherein the shaft part of the first balance shaft 24 is pushed to the lowermost end part of the inner surface of a bearing with a pushing member 100, rotating torques, which are different in two stages in both in the forward and reverse directions, are applied on the first balance shaft 24. The backlash is computed based on the rotating torques and the rotating position when each rotating torque is applied.
Patent JP-2001064778-A (JP)
Title: Plasma treating device and plasma treating method
Inventor: TAKEUCHI HIROAKI
IPC: C23C16/505
Filed: 1999-08-26
Abstract: PROBLEM TO BE SOLVED: To simultaneously satisfy three requests of the speeding-up of plasma treatment, the increase of the quality of the plasma treating face and the uniformization of the plasma treatment in plasma treatment of film formation, working, surface treatment or the like. SOLUTION: In a 1st space SC as the opposite part between at least a part of a 1st electrode 2 and a part of a 2nd electrode 3, plasma of a small size is generated. To the plasma, the 2nd electrode 3 and a substrate 50 mounted on the surface are moved, and uniform plasma treatment is executed to the whole face of the substrate. A cover body 23 composing a main gas flow passage FR together with the 2st electrode 2 and the 2nd electrode 3 or the substrate 50 without being contacted with the 2nd electrode 3 and the substrate 50 is formed. The 1st electrode 2, the 2nd electrode 3 and the cover body 23 are arranged in such a manner that a rapid change is not applied to the flow line of the main gas flow passage FR of gas for plasma treatment going toward a communicating exhaust port 27 of the cover body 23 through the 1st space SC from a communicating introduction port 26 of the cover body 23, the plasma space is stably fed with gas for plasma treatment of a large flow rate, and the gas after the treatment is exhausted at a high speed.
Patent JP-H0291001-A (JP)
Title: Internal organ-storing system
Inventor: TATSUMI KOICHI
IPC: A01N1/02
Filed: 1988-09-28
Abstract: PURPOSE:To obtain the title system of reduced weight and small size by providing the carrier unit with a chamber necessary for perfusion circuit, a reservoir, and pumps and the driving unit with the heat exchanger and the artificial lungs so that appropriate perfusion of the organ can be maintained and it can be readily carried with simple operations. CONSTITUTION:The carrying unit 1 is connected through connectors 15 and 25 to the driving unit 22, further connected to tubes 20 and 31 integrally, then the sub-flow path 16 is cut to form the closed perfusion circuit containing the heat exchanger 23 and the artificial lung 24 on the driving unit side. After the organ to be preserved 6 is placed in a chamber 7, perfused with the organ- preserving solution. When the organ is transported, the carrying unit is separated from the driving unit 22 and the sub-flow path 16 is opened to form the perfusion circuit only on the driving unit side. The battery is used as a driving power source to drive pump 9, meters 17 and displays 18 and the solution is perfused, as it is cooled with ice in the chamber 4.
Patent JP-H0959492-A (JP)
Title: Conductive resin composition
Inventor: NOSE MINORU
IPC: C08L67/02
Filed: 1995-08-25
Abstract: PROBLEM TO BE SOLVED: To obtain a conductive resin composition which is excellent in pliability, resiliency, flexing fatigue resistance, and conductivity, has a high luster and high sliding property, and can be colored in various tints by adding colorants thereto. SOLUTION: 100 pts.wt. polyester block copolymer comprising as the main structural components one or more high-melting crystalline polymer segments consisting mainly of crystalline aromatic polyester units and one or more low- melting polymer segments consisting mainly of aliphatic polyether units and/or aliphatic polyesker units is compounded with 10-150 pts.wt. acicular conductive titanium oxide and/or conductive potassium titanate whiskers.
Patent JP-H03105018-A (JP)
Title: Controller for engine equipped with supercharger
Inventor: TAKADA MINORU
IPC: F02B37/00
Filed: 1989-09-19
Abstract: PURPOSE:To improve the reliability in trouble by carrying out change from the operation of only a primary supercharger to the operation with the added secondary supercharger under a specific condition and fixing the selection condition in a low intake region side when a specific condition detecting means is in trouble. CONSTITUTION:Exhaust passages 2 and 3 in which the turbines 5 and 7 of the primary and secondary turbosuperchargers 4 and 6 are arranged are allowed to communicate through a communication passage 22 on the upstream of superchargers 4 and 6, and an exhaust cut valve 23 is installed on an exhaust passage 3 side. Further, in a branched passage in which the blower 13 of the supercharger 6 is arranged, an intake cut valve 32 is arranged, and an intake relief valve 35 is arranged midway in a relief passage 34 which makes a detour around the blower 13. Though the operation of only the supercharger 4 and the operation of the both superchargers 4 and 6 are selected by opening/closing- controlling the valves 23, 32, 35, etc., the selection condition is changed freely when a specific condition is satisfied, and when a specific condition detecting means is in trouble, the above-described selection condition is fixed to a low intake region side.
Patent JP-H0956952-A (JP)
Title: Shuttle support structure of sewing machine
Inventor: TAJIMA IKUO
IPC: D05B57/14
Filed: 1995-08-25
Abstract: PROBLEM TO BE SOLVED: To provide a shuttle support structure, by which maintenance can be made very easy. SOLUTION: A projected part 16 is provided on a suitable place on the side directed to a shuttle support 14 in a rotating hook bobbin case holder 6, and the shuttle support 14 is provided with a recessed part 17 which can be fitted to the projected part 16 in a position thereof opposite to the projected part 16 at the time of holding the rotating hook bobbin case holder 6. The rotating hook bobbin case holder 6 can be held not to be rotatable even during the rotation of a rotating hook 5 by loosely fitting the projected part 16 of the rotating hook bobbin case holder 6 to the recessed part 17 of the shuttle holder 14.  A needle thread captured by the rotating hook 5 in the timing of sewing needle's rising by a designated amount after the needle is lowered to the lower dead center, is locked on the side end surface of the projected part 16 while being moved to the front of the rotating hook bobbin case holder 6, and after that, the needle thread is moved on the side end surface to be moved to the other side end surface before the needle thread is forced to go out between the projected part 16 and the recessed part 17 by the lifting action of a thread take-up lever.
Patent JP-H0692749-A (JP)
Title: Production of sliding parts
Inventor: KURODA FUTOSHI
IPC: F01L1/18
Filed: 1992-09-09
Abstract: PURPOSE:To make it possible to adjust crowning at a low cost. CONSTITUTION:A buffer material 3 for adjusting the difference in thermal expansion between a metallic body 1 and the ceramics 2 is provided between the metallic body and the ceramics at the time of joining the ceramics 2 under heating to the sliding surface of the metallic body 1 and cooling the joined part to crown the sliding surface.
Patent JP-H04119665-A (JP)
Title: Semiconductor memory device and manufacture thereof
Inventor: YAMAMOTO HIDETSUGU
IPC: H01L27/112
Filed: 1990-09-10
Abstract: PURPOSE:To lessen a memory cell in area by a method wherein a MOSFET is made to serve as a memory cell, where the impurity diffusion, region of either a source electrode or a drain electrode of the MOSFET is not located just under the gate electrode. CONSTITUTION:A gate oxide film 22 is deposited on a silicon substrate 21, and a gate electrode 23 is provided thereon. A photoresist film 24 is patterned on the gate electrode 23 in accordance with memory data, and a cover is provided to one of a source and a drain region which sandwiches the gate electrode 23 between them. Using the photoresist mask 24 as a mask, phosphorus ions are implanted. Then, a side wall is formed on both the side faces of the gate electrode 23, and furthermore arsenic ions are implanted. An N<-> diffusion layer 28 and an N<+> diffusion layer 29 are formed through the thermal treatment of the implanted ions and the ion implantation conditions. The offset region of a MOSFET is formed by the use of a memory cell side wall, so that the offset width is determined basing on the width of a side wall and the conditions of a thermal treatment, in result an offset MOSFET can be easily and stably formed.
Patent JP-H0794264-A (JP)
Title: Electromagnetic induction heating device
Inventor: ONO YUKIYOSHI
IPC: H05B6/06
Filed: 1993-09-28
Abstract: PURPOSE:To prevent overheating of a pan and generating temperature unevernness by measuring a temperature of a heated object through changing a resistance value of a resistor, and controlling electromagnetic induction based on a measured result. CONSTITUTION:Resistors 4A, 4B, 4C are connected to a temperature detecting circuit 3A, and based on changing a resistance value due to changing a temperature of the resistors 4A to 4C, the respective temperature is detected. In the circuit 3A, a signal corresponding to the largest temperature, detected by the resistors 4A to 4C, is output and applied to a comparator circuit 3C. In a circuit 3B, a desired temperature is left as preset, and a signal corresponding to this temperature is applied to the circuit 3C. Both the signals are compared in the circuit 3C, to apply a result compared signal to a coil control circuit 3D, and based on this compared signal, an AC current applied to an electromagnetic induction coil 1 is controlled. Then by generating a strong magnetic field in the periphery of the coil 1, a heated object 10, placed on a glass plate 2 to consist of ferromagnetic material, is quickly heated by electromagnetic induction action, and a resistance value is changed to control the current to the coil 1.
Patent JP-H03102321-A (JP)
Title: Liquid crystal display device
Inventor: MAKINO NAOKI
IPC: G02F1/1333
Filed: 1989-09-18
Abstract: PURPOSE:To make the appearance bright and make a color display by providing a photoconductor between a liquid crystal cell and an optical anisotropic body and irradiating the photoconductor with light with specific wavelength through a light selecting means and not through an upper polarizing plate. CONSTITUTION:The photoconductor 12 is provided between the liquid crystal cell 2 as the optical anisotropic body and the liquid crystal cell 6 which makes a display by voltage application. Then the photoconductor 12 is irradiated with light having 450, 550, and 650nm wavelengths through the prism array of a selective light projector 13 and not through the upper polarizing plate 1 repeatedly at constant intervals and the light is transmitted through a path shown by arrows in a figure. At this time, the selective light projector 13 with the R, G, and B wavelengths and the display pattern of the liquid crystal cell 6 are synchronized and light of R is projected in R display mode to make a multicolor display. Consequently, the appearance becomes >=50% brighter as before and the color display is made.
Patent JP-H0578150-A (JP)
Title: Method for producing ink jet head
Inventor: KONDO YOSHIHIRO
IPC: C03C15/00
Filed: 1991-09-20
Abstract: PURPOSE:To readily form complex ink flow channels and dented parts in the front, to uniform flying directions of ink particles and to improve printing qualities. CONSTITUTION:In a process A, a photo mask 2 having formed an exposure pattern 2a and a shielding part 2b is arranged opposingly to an end face 1a of the photosensitive glass plate 1 and the photosensitive glass plate is exposed to light rays to form an exposure part for front dented part at the middle part of the front 1b of the photosensitive glass plate. In a process B, a photo mask 3 having formed an exposure pattern 3a and a shielding part 3b is arranged opposingly to the surface 1b of the photosensitive glass plate and the photosensitive glass plate is exposed to light rays to form exposure parts for channels on both the surface and the back. In a process C, both the exposure parts are heat-treated to form a crystal part 11 for front dented part and a crystal part 12 of channels. In a process D, the front except the crystal part 11 for the front dented part is covered with a masking material 6 and etched to form a dented part 4 in the front and channel parts 5 on both the surface and the back. The masking material 6 is removed to yield a flow channel substrate of ink jet head and vibration plates 7 are bonded to both faces of the surface and the back.
Patent JP-H08105390-A (JP)
Title: Gear pump
Inventor: HIRASAWA HIROYUKI
IPC: F04C15/00
Filed: 1994-10-05
Abstract: PURPOSE: To provide a gear pump which does not allow residual water to accumulate by changing the shape of a clearance groove and the depth of the groove. CONSTITUTION: In a clearance groove which is formed in the case surface from the end faces 10, 11 in the direction close to the imaginary line 16 toward the discharge side 14 and the suction side 15 with the center line 8 of engagement being as the symmetrical line, the clearance groove is deep at the position of the end faces 10, 11 while being gradually shallower toward the discharge side 14 and the suction side 15. As a result, the volume of the residual water becomes the smaller as the distance from the imaginary plane 16 becomes the larger. Thus, not only the clearance groove but also the inside of the case are difficult to be corroded, or the water is difficult to be deteriorated.
Patent JP-H04120785-A (JP)
Title: Semiconductor laser element and manufacture thereof
Inventor: IKETANI AKIRA
IPC: H01S5/00
Filed: 1990-09-12
Abstract: PURPOSE:To always uniformly manage the height of a ridge waveguide without depending upon etching condition, the shape of a wafer by previously forming an InGaAsP ultrathin film layer as an etching stop layer in an InP clad layer to become the desired height of the waveguide. CONSTITUTION:A stripe pattern is formed on a p-type InGaAs contact layer 7 by using resist 8. Then, the layer 7 is etched by using mixture solution of tartaric acid and hydrogen peroxide. With the stripe of the layer 7 as a mask the ridge of an InP clad layer 6 is formed by etching. As the etchant of this step, mixture solution of hydrochloric acid and phosphoric acid is used. The etching speed of the InP with the solution is 100 times as fast as that of the InGaAsP. When the etchant having high selectivity is used, the layer 6 of 1.5Angstrom  is etched for 4min of twice as long as etching time to be presumed from its etching rate, a mesa and the surface of an etching stop layer 5 are not roughed, but becomes a flat mirror-surface of atomic layer order.
Patent JP-S6485599-A (JP)
Title: Drive control system for printer motor
Inventor: MUKAI SHIGEO
IPC: H02P8/30
Filed: 1987-09-25
Abstract: PURPOSE:To decrease a power consumption as a whole by applying a given level of hold reinforced current to an exciting coil in addition to a hold current for certain periods of time directly before the application of a driving current and directly after the stop of rotation. CONSTITUTION:When power is applied to a printer, a driving phase signal P3 is outputted and a switching transistor Q3 is in the ON state. Accordingly, a field coil L3 is selected as a holding coil and a given level of hold current IH is applied from a braking circuit 1 thereto. Said hold current IH is determined by the value of a resistance RA. Then, when a common signal Pc is outputted together with a driving phase signal P3, a hold reinforced current is outputted from an electric power circuit 3 and applied to a field coil L3 so that a rotation before starting is fixed firmly. Then, the driving phase signal is successively inputted to switching transistors Q1, Q3 and a stepping motor rotates.
Patent JP-H06211107-A (JP)
Title: Seatbelt retractor
Inventor: RUISU AARU BURAUN
IPC: B60R22/44
Filed: 1993-09-28
Abstract: PURPOSE: To provide a retractor having a mechanism for reducing a tension of a seat belt. CONSTITUTION: A retractor 10 has a frame 16, a spool 14, a spring 68, a sun gear 52, a gear means, a ring gear 80, a means having a cam 110, and a pawl 90. The spool has a belt webbing wound thereon. The spring biases the spool in the belt retraction direction. The gear means is supported rotatably on a planet carrier in meshing engagement with the sun gear. The ring gear has internal teeth in meshing engagement with the gear means mounted rotatably on the planet carrier and a ratchet external teeth 84. The pawl is movable between a first position to block the rotation of the ring gear in the direction of the belt retraction and a second position not to block the rotation of the ring gear in the direction of the belt retraction. The means having the cam 110 rotates the pawl from the first position to the second position thereby to shift the retractor from the low tension mode.
Patent JP-H0797576-A (JP)
Title: Method for production shaped coke
Inventor: SAKAMOTO SEIJI
IPC: C10B53/08
Filed: 1993-09-28
Abstract: PURPOSE:To obtain a shaped coke little in the generation of fine powder, excellent in cold strength, abrasion resistance and oxidation resistance, and suitable for metallurgy, etc., in a high yield by adding a binder such as coal tar to fine coal, kneading and shaping the mixture, and subsequently carbonizing the obtained briquett under a specific condition. CONSTITUTION:All or a part of a carbonization gas discharged from the upper part of a carbonization over 1 is introduced into the carbonization oven through a cooling gas tuyere disposed at the lower part of the carbonization oven 1 as a gas for cooling the red heated coke in the carbonization oven 1, and the carbonization gas is finally heated to 800-900 deg.C. The briquett obtained by adding a binder such as coal tar, pitch or petroleum asphalt to fine coal and subsequently kneading and shaping the mixture is subsequently continuously carbonized to obtain the objective shaped coke. Hydrocarbons such as coal tar and methane in the carbonization gas are decomposed into thermally decomposed carbon by their thermal decomposition in the heating process., and the produced carbon is made to adhere to the surface of the shaped coke and into the pores of the coke for filling the fine cracks, thereby improving the strength and acid resistance of the coke.
Patent JP-2001064774-A (JP)
Title: Raw material for producing silicon series thin film
Inventor: AZUMA MASANOBU
IPC: F25J3/02
Filed: 1999-08-27
Abstract: PROBLEM TO BE SOLVED: To eliminate the need of gas mixing operation in the use and to simplify a refining stage at the time of production by allowing monochlorosilane by an amt. equal to or above the specified amt. to be contained in a silane series compsn. SOLUTION: This raw material for producing a silicon series thin film is composed of a silane series compsn. contg. monochlorosilane of >=10 ppm by a weight standard. The silane series compsn. may contain the other silanes such as a silane halide and monosilane, but, desirably, it contains monosilane of the amt. by which the molar ration between it and monocholorosilane is controlled to 1:99 to 95:5. By using such raw material, by a plasma CVD method, a silicon series thin film is produced. The amorphous silicon film in which residual chlorine content is controlled to 0.005 to 5 atomic % and exhibiting excellent photodeterrioration resistance and sufficient photoelectric characteristics and easily and stably be obtd. at a high speed. The raw material can be produced by distilling the one obtd. by subjecting silane chloride hydride to disproportionation.