Patent SG-11201805393R-A (SG)
Title: Method and apparatus for deposition cleaning in a pumping line
Inventor: HILL GORDON
IPC: H01J37/32
Filed: 2017-01-12
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau „ (10) International Publication Number (43) International Publication Date ^ ^ WO 2017/123704 A4 20 July 2017 (20.07.2017) WIPO I PCT (51) International Patent Classification: H01J37/32 (2006.01) (21) International Application Number: PCT/US2017/013114 (22) International Filing Date: 12 January 2017 (12.01.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 14/994,668 13 January 2016 (13.01.2016) US (71) Applicant: MKS INSTRUMENTS, INC. [US/US]; 2 Tech Drive, Suite 201, Andover, MA 01810 (US). (72) Inventors: HILL, Gordon; 175 Lowell St, Arlington, MA 02474 (US). BENEDICT, Scott; 2 Clocktower Place #312, Nashua, NH 03060 (US). WENZEL, Kevin; 11 Glenn Rd„ Belmont, MA 02478 (US). (74) Agents: RASMUSSEN, Xin, Hu et al.; Proskauer Rose LLP, One International Place, Boston, MA 02110 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available)'. AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available)'. ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, [Continued on next page] (54) Title: METHOD AND APPARATUS FOR DEPOSITION CLEANING IN A PUMPING LINE 1300 1316 1302 = Axis A o i> m CJ 1306 1314 1312 FIG. 13b (57) : A vacuum pumping line plasma source is provided. The plasma source includes a body defining a gen­ erally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an out­ put pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielec­ tric barrier discharge structure formed from the supply elec­ trode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to gener­ ate a plasma in the generally cylindrical interior volume. 1308 WO 2017/123704 A4 III llll IIII III Hill III III III III fill III 111 II Hill llll mill 111 llll llll LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with amended claims and statement (Art. 19(1)) Date of publication of the amended claims and statement: 14 September 2017 — with international search report (Art. 21(3))