Patent EP-2474370-A1 (EP)
Inventor: HAINES DAN
IPC: B05D7/24
Filed: 2008-12-19
Abstract: Vapor phase deposition of layers on workpieces (30), comprises providing a liquid reservoir (3) with a first liquid process gas component, supplying the liquid process gas component into an evaporator (2), evaporating the first liquid process gas component in the evaporator and transforming into a gas phase, feeding the component to a reactor (20), generating a reactive zone (32) with the first process gas component by an energy source of the reactor, where a coating is deposited on the work piece with the reaction products of the first process gas component, controlling the mass flow. Vapor phase deposition of layers on workpieces (30), comprises providing a liquid reservoir (3) with a first liquid process gas component, supplying the liquid process gas component into an evaporator (2) via a metering device, evaporating the first liquid process gas component in the evaporator and transforming into a gas phase, feeding the first gaseous process gas component to a reactor (20), generating a reactive zone (32) with the first process gas component by means of an energy source in the filled region of the reactor, depositing a coating on the work piece with the reaction products of the first process gas component forming in the reactive zone, controlling the mass flow of the first process gas component in the reactor by means of a control device acting on the metering device through a control of the flow of the liquid process gas component into the evaporator. The flow of the liquid process gas component is measured in the feed line for the evaporator with a mass flow sensor, which comprises two temperature sensors arranged along the flow direction in the supply line, with which a temperature gradient in the liquid process gas component is measured. Independent claims are also included for: (1) a device for depositing layers on workpieces, comprising a liquid reservoir for a liquid first process gas component, a metering device, an evaporator, a conduit for directing the liquid process gas component into the evaporator, a reactor for receiving a workpiece to be coated, a gas exhaust connected to the reactor to remove volatile decomposition products from the coating area of the reactor, a feed line for supplying the first process gas component to the reactor, evaporated in the evaporator, an energy source, which is connected to the reactor, to produce a reactive zone in the area of the reactor filled with the first process gas components, so that with the reaction products of the first process gas component formed in the reactive zone, a coating is deposited on the workpiece, a regulating device for controlling the mass flow of the first process gas component in the reactor, where the metering device is employed for adjusting the mass flow of the flow of the liquid process components in the evaporator via the metering device, where a mass flow sensor arranged in the feed line for evaporator comprises the temperature sensors arranged along the flow direction in the feed line, with which a temperature gradient in the liquid process gas component is measured; and (2) a device for plasma-enhanced vapor deposition of layers on the workpieces, comprising the liquid reservoir, the metering device, the evaporator, the conduit, the reactor, a pump connected to the reactor to evacuate the coating area of the reactor, the feed line , the source for electromagnetic field and the regulating device; and (3) a coating produced by the above method, preferably the coating is polyethylene glycol containing or polyethylene glycol like coating.