Patent HR-P20220213-A1 (HR)
Inventor: WIDUCH ALEKSANDER
IPC: B01F23/234
Filed: 2020-07-17
Abstract: Predmet izuma je sustav za zasićenje tekućine plinom koji se sastoji od izvora tekućine (3), izvora plina (5), komore za otapanje plina (1) te spremnika za prihvat tekućine (4), pri čemu je izvor tekućine (3) povezan putem cjevovoda (11) koji je opremljen pumpom (8) sa kavitacijskim sustavom (14), koji je povezan putem cjevovoda (16) s komorom za otapanje plina (1), pri čemu je kraj cjevovoda (16) skup mlaznica za raspršivanje (7) smještenih u komori za otapanje plina (1) na koju je izvor plina (5) povezan putem plinovoda (10) sa mlaznicom (6); i komora za otapanje plina (1) je putem cjevovoda (12) s regulacijskim ventilom (9) povezana na komoru za zadržavanje (2) s naizmjenično raspoređenim, djelomično otvorenim pregradama (17), koja je putem cjevovoda (13) s ventilom (15), spojena na spremnik za prihvat zasićene tekućine (4).<BR/> <BR/>Postupak zasićenja tekućine plinom pomoću gore opisanog sustava, gdje se tekućina iz izvora tekućine (3) pumpa pomoću pumpe (8), podižući tlak tekućine na najmanje 4 bara, kroz cjevovod (11), u kavitacijski sustav (14) gdje je tekućina zasićena plinom u obliku mikro-nano mjehurića a zatim se kroz cjevovod (10) pumpa u skup mlaznica za raspršivanje (7) pomoću kojih se tekućina raspršuje u komori za otapanje plina (1), pri čemu je tekućina dodatno zasićena plinom koji dolazi iz izvora plina (5) kroz plinovod (10) i mlaznicu (6), gdje dovedeni plin ima tlak jednak tlaku tekućine, a zatim se kroz cjevovod (12) tekućina pumpa u komoru za zadržavanje (2) kroz koju teče u vremenu ne kraćem od 13 minuta i linearnom brzinom koja ne prelazi 0,5 m/s potrebnom za otapanje plina, nakon čega se kroz cjevovod (13) pumpa u spremnik za prihvat tekućine (4).The subject of the invention is a liquid with gas saturation system comprising of a liquid source (3), a gas source (5), a gas dissolution chamber (1) and a liquid receiving tank (4), where the liquid source (3) is connected by means of a pipeline (11) equipped in the pump (8) with the cavitation system (14) which is connected via a pipeline (16) to the gas dissolution chamber (1), where the end of the pipeline (16) is a set of atomizing nozzles (7) located in the gas dissolution chamber (1) to which a gas source (5) is connected via a gas pipeline (10) with a nozzle (6); and the gas dissolution chamber (1) by means of a pipeline (12) with a control valve (9) is connected to a retention chamber (2) with alternately arranged, partly open partitions (17), which via a pipeline (13) with a valve (15) is connected to the saturated liquid receiving tank (4).<BR/><BR/>The method of saturating the liquid with gas using the above system, where the liquid from the liquid source (3) is pumped by means of a pump (8), raising the liquid pressure to at least 4 bar, through the pipeline (11), to the cavitation system (14) where liquid is saturated with the gas in the form of micro-nano bubbles and then through a pipeline (10) it is pumped into a set of atomizing nozzles (7) with the help of which the liquid is sprayed in the gas dissolution chamber (1), where the liquid is additionally saturated with gas coming from a gas source (5) fed via the gas pipeline (10) and nozzle (6), where the gas is supplied with a pressure equal to the liquid pressure, then via the pipeline (12) the liquid is pumped into the retention chamber (2) through which it flows in not less than 13 minutes and the line speed not exceeding 0.5 m/s necessary to dissolved the gas is then pumped through the pipeline (13) to the liquid receiving tank (4).