Claim: There’s a “direct correlation” between North Carolina’s mask requirement and COVID-19 stabilization.
Verdict: SUPPORTS

Retrieved passages:
title: Multiple patterning
text: according to the polarity. Neither exposure patterns the target features directly. This approach was also implemented by IMEC as two "keep" masks for the M0A layer in their 7nm SRAM cell. Self-aligned blocking or cutting is currently being targeted for use with SAQP for sub-30 nm pitches. The lines to be cut are divided into two materials, which can be etched selectively. One cut mask only cuts every other line made of one material, while the other cut mask cuts the remaining lines made of the other material. Although EUV has been projected to be the next-generation lithography of choice,

title: Multiple patterning
text: reduction expected with Moore's Law. EUV is more expensive than three 193i exposures (i.e., LELELE), considering the throughput. Moreover, EUV is more liable to print smaller mask defects not resolvable by 193i. Some aspects of other considered multi-patterning techniques are discussed below. Self-aligned triple patterning has been considered as a promising successor to SADP, due to its introduction of a second spacer offering additional 2D patterning flexibility and higher density. A total of two masks (mandrel and trim) is sufficient for this approach. The only added cost relative to SADP is that of depositing and etching the second spacer. The

title: Extreme ultraviolet lithography
text: one dimension and 4X in the other, and the angle of reflection will increase. Higher demagnification will increase the mask size or reduce the size of the printed field. Reduced field size would divide full-size chip patterns (normally taking up 26 mm × 33 mm) among two or more conventional 6-inch EUV masks. Large (approaching or exceeding 500 mm) chips, typically used for GPUs or servers, would have to be stitched together from two or more sub-patterns from different masks. Without field stitching, die size would be limited. With field stitching, features that cross field boundaries would have alignment errors,

title: Extreme ultraviolet lithography
text: and the extra time required to change masks would reduce the throughput of the EUV system. With the natural Poisson distribution due to the random arrival and absorption times of the photons, there is an expected natural dose (photon number) variation of at least several percent 3 sigma, making the exposure process susceptible to stochastic variations. The dose variation leads to a variation of the feature edge position, effectively becoming a blur component. Unlike the hard resolution limit imposed by diffraction, shot noise imposes a softer limit, with the main guideline being the ITRS line width roughness (LWR) spec of

title: Wavefront coding
text: then removes the blur and introduces noise depending upon the physical characteristics of the processor. Dynamic range is sacrificed to extend the depth of field depending upon the type of filter used. It can also correct optical aberration. The mask was developed by using the ambiguity function and the stationary phase method The technique was pioneered by radar engineer Edward Dowski and his thesis adviser Thomas Cathey at the University of Colorado in the United States in the 1990s. After the university showed little interest in the research they have since founded a company to commercialize the method called CDM-Optics.

title: Respirator assigned protection factors
text: facepiece respirators were 11, 18 and 26. So, the new standards limit usage of these respirators up to 40 OEL in UK (after this study). Fit testing of tight-fitting masks of negative-pressure respirators became widely used in US industry in 1980-s. At the beginning, it was thought that the half-mask fit quite well to the worker's face, if during a fit test the protection factor (fit factor) is not less than 10 (later, experts began to use "safety factor" = 10 during the fit test; threshold fit factor become 10 × 10 = 100). The widespread use of fit testing

title: PROMPT Telescopes
text: and high school education throughout the State of North Carolina. PROMPT consists of six 0.41-m Ritchey-Chrétien telescopes by RC Optical Systems on rapidly slewing (9°/sec) Paramount ME mounts by Software Bisque, each under a clamshell dome by Astro Haven. Five of these telescopes use rapid-readout (<2 sec) Alta U47+ cameras by Apogee, which make use of E2V CCDs. The sixth is being outfitted with an LN2-cooled Micro-Cam by Rockwell Scientific for NIR imaging. Each mirror and camera coating combination has been optimized for a different wavelength range, including a u-band optimized telescope. Although other filters are available, PROMPT automatically observes

title: Respirator assigned protection factors
text: little of such research. Therefore, it may be that some countries do not take full account of results of foreign researches (that showed a significant difference between the effectiveness of respirators in a laboratory environment; and in applying them in the workplaces). For example, after the study in 1990, the APF value of negative pressure full face masks was reduced from 900 to 40 (1997) in UK. But in other countries, similar research was not carried out; and a similar decrease did not occur. The study showed that the three models of full face masks had a significant leakage of

title: Extreme ultraviolet lithography
text: exposures of the same mask are also expected for defect management without pellicles, limiting productivity similarly to multiple patterning. A return to extended generations of single exposure patterning would be possible with higher numerical aperture (NA) tools. An NA of 0.45 using 13.5 nm wavelength could require retuning of a few percent. Increasing demagnification could avoid this retuning, but the reduced field size severely affects large patterns (one die per 26 mm × 33 mm field) such as the many-core multi-billion transistor 14 nm Xeon chips. by requiring field stitching. In 2015, ASML disclosed details of its anamorphic next-generation EUV

title: Film capacitor
text: years or more, and are therefore exposed to overvoltages and transients which could damage the capacitors. For this reason, suppression capacitors must comply with the safety and inflammability requirements of international safety standards such as the following: RFI capacitors which fulfill all specified requirements are imprinted with the certification mark of various national safety standards agencies. For power line applications, special requirements are placed on the inflammability of the coating and the epoxy resin impregnating or coating the capacitor body. To receive safety approvals, X and Y powerline-rated capacitors are destructively tested to the point of failure. Even when exposed

title: Respirator assigned protection factors
text: of the in-facepiece concentration of contaminants, and subsequent calculations of fit factors - the latter is often much smaller than the "measured" value. So, specialists recommend not allowed usage negative pressure half mask respirators then harmful substances' concentrations exceeds 10 PEL. Therefore, OSHA standards require to restrict using of half-mask negative-pressure respirators up to 10 PEL after obtaining fit factor greater than or equal to 100 during the mask selection for the worker (they used a safety factor = 10). The table lists the APF values for the most common respirator types (for US and UK). "US particle filters N95

title: Respirator assigned protection factors
text: of negative pressure full face masks with high-efficiency filters in the laboratory revealed a risk of decrease in protective properties to a small values. Therefore, the use of such respirators has been limited to the values 50 or 100 PEL in the United States. However, the experts in the UK believed that the quality of their masks is higher than American masks, and were allowed to use up to 900 OEL. But the study showed that the value of the protection factor of > 900 has been achieved in practice infrequently. Minimum protection factors of 3 different models of full

title: Respirator assigned protection factors
text: unfiltered air through the gaps between the mask and the face. The minimum values of the workplace protection factors (WPF) of each of the three negative pressure full face mask models were 11, 17 and 26. The maximum value of the WPF from one of the models did not exceed 500 no times at all. And for all results together, the WPF was not more than 100 in ~ 30% of the measurements. So, for this reason, the values of the APFs for this RPD type in Germany (400), Finland (500), Italy (400), and Sweden (500), may not fully take

title: Optical head-mounted display
text: 2008 with the PD-18: a top-down, transparent monocular display with SVGA resolution 32 degree FoV, and full color. The PD-18 and its derivative, the PD-14, were aimed at professional and military markets. In 2010 Lumus' technology received high-level validation when the US Air Force selected Gentex's Scorpion Helmet Mounted Cueing System (which employs the Lumus PD-14), with Raytheon as the primary contractor, for the HMIT program for A-10 and F-16 Aircraft. This display and contract win marked the first time a full-color HMD was selected for combat aviation. Subsequently, Lumus' display as part of Thales Visionix's (formerly Gentex) Helmet Mounted

title: Respirator assigned protection factors
text: concentration for corresponding harmful substances in the breathing zone. If this requirement is not met, the employer needs to choose a different type of respirator, which has a greater APF value. In all cases, if employer select respirator with tight-fitting facepiece (full face mask, elastomeric half-mask or quarter-mask, or filtering facepiece respirator), all employee must be fit tested ("to prevent leakage unfiltered polluted air through gaps between their faces and the tight-fitting masks, which may not match to their faces"). Appendix A provides a detailed description of this testing. Values of IDLH concentrations and detailed recommendations for the selection of

title: Extreme ultraviolet lithography
text: EUV tools need a pellicle to protect the mask from contamination. Currently, the pellicle is not yet guaranteed to withstand 250 W power necessary for high volume manufacturing; the specification is 40 W. Pellicles are normally expected to protect the mask from particles during transport, entry into or exit from the exposure chamber, as well as the exposure itself. Without pellicles, particle adders would reduce yield, which has not been an issue for conventional optical lithography with 193 nm light and pellicles. However, for EUV, the feasibility of pellicle use is severely challenged, due to the required thinness of the

title: Armstrong limit
text: 20.95% oxygen. At , breathing pure oxygen through an unsealed face mask, one is breathing the same partial pressure of oxygen as one would experience with regular air at around above sea level. At higher altitudes, oxygen must be delivered through a sealed mask with increased pressure, to maintain a physiologically adequate partial pressure of oxygen. If the user does not wear a pressure suit or a counter-pressure garment that restricts the movement of their chest, the high pressure air can cause damage to the lungs. For modern military aircraft such as the United States’ F22 and F35, both of

title: Mental health reform in North Carolina
text: Intra-departmental Monitoring Teams, an Executive Management Team, and MHDDSA Quality Improvement Steering Committee. On the local level, LMEs are required by their contract with DMA to "submit data and measurements to DMA annually for quality of care and service measures and performance improvement projects for 27 measures in 7 broad areas." The reporting areas are: NC DHHS reports that based on the pilot 1915 (b)(c) Waiver Program results to date, "North Carolina has demonstrated that the State can provide quality mental health, developmental disabilities, and substance abuse services through private and public sector cooperation and at a lesser or comparable

title: Digital image correlation and tracking
text: finishes from machining and polishing provide the needed contrast to correlate images well. However, these methods for applying surface contrast do not extend to the application of freestanding thin films for several reasons. First, vapor deposition at normal temperatures on semiconductor grade substrates results in mirror-finish quality films with RMS roughnesses that are typically on the order of several nanometers. No subsequent polishing or finishing steps are required, and unless electron imaging techniques are employed that can resolve microstructural features, the films do not possess enough useful surface contrast to adequately correlate images. Typically this challenge can be circumvented by

title: Extreme ultraviolet lithography
text: deformation, the narrower the defect edge extension, the greater the loss in reflectivity. EUV mask defect repair is also more complicated due to the across-slit illumination variation mentioned above. Due to the varying shadowing sensitivity across the slit, the repair deposition height must be controlled very carefully, being different at different positions across the EUV mask illumination slit. Multiple EUV pulses at less than 10 mJ/cm could accumulate damage to a Ru-capped Mo/Si multilayer mirror optic element. The angle of incidence was 16° or 0.28 rads, which is within the range of angles for a 0.33 NA optical system. Production