ARRANGEMENT FOR POLISHING DISK-LIKE OBJECTS

Abstract: A polish head (3) for Chemical Mechanical Polishing comprises a backing film (5) made of silicone on a rigid support element (6, 7), preferably consisting of amorphous ceramic. The silicone backing film (5) is fabricated by molding, thereby enabling an appropriate cross-sectional shape for specific polishing needs. The invention provides a uniform polishing of a semiconductor wafer (4).

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J Hi CQ μ- Hi μ- tr 3 0 tr 3 PJ Pi 01 μ- • <; 0 0 ϋ rt 3 tr tr CQ z Ω Φ £ 3 Φ μ- Hi Φ 3 3 H- Ω μ- J CQ ii 3 Hi o Φ Ω 0 Φ φ tr PJ 0 ii μ- CQ ai J 0 Ω Xi I- 1 rt Hi 9* PJ S *d ii 0 rt P* Hi 3 rt S tr 3 ii rt ϋ ? Q Hi < CQ si Hi 3 φ Xi i J 3 tr tr 3 J φ 3 ω tr J J μ- Pi CQ fD rt φ PJ 3 tr - 1 3 Ω 0 μ- Ω Xi φ φ μ- φ ϋ 0 3 3 Hi 3 Xi ra 3 s tr ϋ 3 Xi Φ PJ Hi tr J rt ii ii J ω PJ 3 ii CQ P. Φ CQ J 0 CQ PJ tr J φ rt i 3 rt J J μ- rt CQ μ- CQ Hi 3 ii I- 1 μ- rr H- rt 3 OJ 0 Ω 3 ω Φ Q J 3 3 i J J CQ CQ i μ- cr Φ Ω rt LQ ii rt • rt μ- tr r μ- * μ- 0 0 ii H Ω ii 0 φ 0 CQ P- ϋ tr ) Φ rt 3 J J 3 Ω μ- Xi Φ 3 μ- CQ <! Hi Hi 0 Φ (-" 0 tr 3 l- 1 tr H- l-T CQ Φ Φ 3 ii PJ 3 0 rt CQ CQ Φ PJ Ω s; rt μ- μ- μ- H- PJ H- i PJ • Pi Φ μ- H 1 C y- • S ϋ P. rt Ω Φ Hi μ- J Ω ω 3 rr CQ 0 ii tr 3 μ- φ J rt o tr φ 01 Φ Φ 3 μ- O tr LQ ■ - . α. ► d tr PJ CQ i CQ tn Φ 0 rt J Φ • CQ J J LQ 3 3 • ■ < 3 o •<: Ω CQ 0 Φ tr 3 CQ CQ J Ω P. rt ai P- tr P. CQ ι-3 0 3 φ l- 1 x 3 * M 3 •d φ rt ϋ J ι-3 rt 3 0 3 φ μ- O i-i- o ϋ ω *<_ PJ CQ cr ϋ μ- μ- Φ rt φ rt Φ 0 0 tr O rt ii Hi J Ω J tn Φ 4 Φ m 3 μ- 0 w Ω Hi tr Ω tr CQ φ 0 Φ 3 rt i X? rr ii p. Ω t O Φ μ- φ CQ μ- μ- Pi O tr PJ Φ φ μ- 3 Hi ii Q 3 μ- 3 ii PJ 3 3 μ- J tr Hi 3 ΓT p. CQ Ω the force applied to the wafer backside results in an inhomo- geneous polishing result on the polished surface of the wafer. Another disadvantage of polyurethane backing films is that the film sucks liquid into its holes of the foam structure. Especially those holes which are cut and open on the surface of the backing film accept liquid from the slurry. The sucking of liquid into the polyurethane backing film results in a further introduction of non-uniformity to the polishing process . In US 6,012,964 a CMP apparatus is disclosed which seeks to improve uniformity. The polish head has a soft backing pad facing the backside of the wafer to be polished which is supported by a hard sheet. The hard sheet is applied with air pressure to adjust the shape of the hard sheet and compensate uniformity problems. The backing film can be made of various materials including silicone rubber. The shape of the surface of the hard sheet is controlled by the air pressure applied to the pressure chamber behind the hard sheet. Since the surface shape of the hard sheet is not rigid and depends on the pressure applied to the pressure chamber, uniformity problems remain. It is an object of the present invention to provide a polishing arrangement for disk-like objects which provides better uniformity during polishing. This object is solved by an arrangement for polishing disklike objects comprising: a platen which contacts a first surface of the object which is to be polished; a polish head which comprises: a backing film which is removably attached to said polish head to directly contact a second surface of the object opposite to said surface to be polished; a support element carrying said backing film which is rigid; whereby said backing film comprises silicone. Ω rt rt rt Hi ω 3 Ω PJ <! ω en μ- rt l- J s: rt _- ■ μ- rt μ- CQ CQ tr l-h ii 3 Ω Ω Hi Ω Hi CO Hi Hi Φ μ- tr tr 0 3 0 0 3 μ- ► . 3 to 0 μ- J Φ μ- 3 0 3 rt rt φ μ- Φ 0 0 ϋ μ- μ- Φ μ- Φ μ- CQ <! μ- J li rt π 3 ^ P. ii ii rf Hi ii rt LQ μ- H_ rt l- 1 Pi rt 3 O ϋ 3 ii CQ φ 3 3 3 Φ φ Xi Φ 3 Hi Hi Φ tr φ 3 tr rt rt Ω 3 :> 3 3 rt 01 3 μ- Ω • 3 3 Φ φ PJ 0 PJ 0 CQ 0 ii μ- 0 - χ rt X Ω Φ Ω Ω 3 r rt μ- Φ μ- *< φ J Pi rt μ- 3 3 h- 1 Ω H μ- Q 3 LQ φ Φ tr rt Φ μ- Φ O Ω ϋ Hi J en 3 3 H rt tr 3 en ii 3 P. Φ 3 CQ H 3 Q ii Φ rr 3 3 CQ P. 3 rt 3 PJ rt rt 3 Ω μ- J Φ *< μ- Φ rt 3 PJ 3 3 cn 0 ii • rt Ω Ω Φ rt tr Pi μ- PJ μ- 0 CQ rt rt J 3 Pi Xi 3 3 xi 0 3 ≤ Φ Φ rt 3 rt rt μ- μ- Φ rt l-" rt rt 3 tr Φ . 3 LQ 3 tr 3 tr H 3 rt 3 tr Ω tr 3 3 rt Q Hi CQ rt ω <i 3 φ i "< J tr tr > Hi CQ ■ -<_ Pi Hi Hi tr μ- tr Φ tr rr φ ii LQ tr en μ- Φ μ- Φ 0 Ω rt ^ μ- 3 Φ μ- 3 Φ Φ rt 3 ii Φ Φ Φ rt μ- 3 Ω l rt Ω X 3 Ω Hi _V ii 3 * Ω rt Ω 3 Q 3 Ω li 3 Φ rt 3 . ct h- 1 3 Φ 3 cn μ- 1 Φ 0 3 0 φ Φ tr tr rr μ- rt CQ Φ tr Ω Ω tr PJ tr 3 tr ii ■ ; μ- H 3 PJ H φ 3 3 H O cn rt Φ 3 Ω Φ μ- 3 J Φ ^ Pi Φ Hi H3 φ Φ Ω rt rt Ω Ω • 3 rt • = > Ω cn Ω μ- ii 0 Xi Hi 0 cn Ω 3 Pi tr Φ tr 3 3 o ^ Φ μ- Φ 3 LQ μ- Φ 3 0 μ- tr CQ CQ μ- 3 ii Hi rT J Φ 3 ii Φ tr 0 rt 3 li <! 3 3 Hi ii ^ Xi μ- 3 3 Ω 0 cn μ- cr Φ CQ J PJ < rt φ φ Φ rt Hi 0 0 3 μ- μ- 3 φ li CQ 3 o 3 r ≤ 3 Φ CQ μ- Hi tr 3 Ω 3 PJ 3 J H-" Φ Φ rt ϋ rt li 0 Ω Ω LQ Hi Ω 3 tr μ- Q Φ 0 < Φ 3 μ- rX Ω tr Pi 3 H. ^ H tr 3 tr 3 O Xi PJ rt xi Φ rt J 3 φ ϋ Ω Ω CQ tr J μ- P. Φ φ μ- J Φ 1 CQ 3 rt 0 Ω ι-3 G J Ω Hi Ω φ ϋ rX H μ- O φ Ω 3 rt 3 rt 3 X 3 tr Φ tr CQ Φ 0 ii tr tr tr μ- Ω 3 φ Hi tr W 0 P. Hi Pi rX CQ Xi rt tr Ω tr > J 3 PJ Φ φ J μ- PJ Φ 0 rt i 0 PJ μ- cn Φ μ- H tr PJ Φ PJ PJ 3 μ- Xi tr Pi 0 J £ tr cn Ω P. 3 3 en 3 H Ω Pi rt rt rt 3 Ω 0 Φ 3 Ω 0 rt xi Hi Φ 3 3 Hi Ω PJ rX Xi Ω Ω φ ii 0 tr 0 CQ L-l. PJ Hi _- ■ 0 Ω 3 rt tr Hi Φ cn μ- o J 3 φ Φ en 3 Hi Φ 0 φ tr J 3 μ- μ- φ ii rt rX Xi O rt μ- Φ tr 3 Hi 3 μ- 3 P. μ- 3 Ω rt Hi cn Ω PJ rt P. 3 rt rt - 3 o μ- ϋ tr φ ii r J LQ Hi ■ ; CQ P. tr Pi 3 rt ct ^ tr μ- φ rt Ω LQ tr en μ- 3 0 0 φ <! 0 Xi tr 0 Φ Pi 3 tr J Φ μ- rX μ- Ω Φ rt rt rt LQ rt Xi φ CQ Φ Hi 3 φ ii si . H Φ Hi 3 rr 3 μ- rt J Hi φ tr ^ tr Φ rt 3 3 J μ- H 0 Pi Φ μ- Pi tr Φ Φ tr O LQ 3 01 3 μ- $ 3 Φ Φ Hi Ω μ- 0 rt li Ω tr K Ω rt μ- m PJ Z ii 3 P. LQ PJ P. O μ- rt Ω tr Hi h- 1 J 3 Φ φ rt Φ tr 3 tr cn ^ J Ω O rt Xi Ω tr 3 Hi 3 Hi tr Φ 3 Pi Φ 3 μ- 3 tr cn CQ Φ PJ Hi rt Φ tr PJ Hi μ- Φ φ O J PJ 3 Pi μ< μ- Ω ct tr 3 s; J cn PJ ii ϋ CQ Φ tr μ- cn Φ ii μ- H μ- li ϋ Hi rt Ω 3 3 Φ tr tr > μ- tr rt φ 3 rt Φ φ ii Φ 3 rt Ω Hi CQ Φ tr x μ- 3 ii LQ μ- 0 Φ Ω Φ Pi tr r Ω Φ LQ 3 tr CQ 3 3 0 rr <! li φ μ- rt H. 3 Ω Pi LQ 3 ii 3 rt 3 Φ ■-<. φ 3 μ- 01 0 PJ 3 rt tr μ- 3 Φ i μ- i 3 li xi 0 tr Φ 13 cn tr ra 3 Hi rt Ω J tr Hi 3 tr φ Ω 3 s: LQ μ- J μ- ω 0 ii J ii Ω CQ rt Φ Xi s: rt en 3 i μ- rt J Φ Φ μ- φ Φ PJ CQ CQ x 3 ω μ- Xi 0 O rt tr Φ ii PJ tr Φ 3 Xi Hi en li P. Ω tr Φ Hi Hi rt en rr 3 tr Pi 3 H Φ £ 3 0 Hi Φ Pi Ω ii 3 3 φ w μ- Φ X PJ <! φ μ- Xi 0 μ- 3 ii CQ 3 Xi 3 3 φ xi φ Φ 0 Ω 3 3 rt J 3 Ω Φ Ω φ CQ li 0 Hi 0 cr 3 Ω H Ω <! Hi 3 H. ii Ω φ i < φ >X ii en Ω 0 H ii 3 CQ 3 - Ω cn CQ Φ φ rt J Φ rt μ- o μ- H Hi 3 Φ 3 μ- en rt r cn rt Φ rt φ rt P. 3 3 Ω ii CQ PJ J 3 Φ Φ Pi 0 3 ) 3 Ω PJ Ω PJ 3 J 0 Φ μ- μ- tr Ω 3 3 φ φ ii 3 rt rt rt 3 φ Hi 3 Ω μ- Ω PJ rt LQ • 3 tr φ ι-3 rt li μ- Xi cr 3 Φ 3 Pi 0 Φ 3 φ Φ 0 ^ Φ ii ii ii <! tr xs \-> 3" Φ Φ Ω • ; rt 3 O Hi rt Ω 3 3 rt H Ω O φ φ μ- H> m Φ o O φ 3 φ Pi o Hi J μ- Φ ii tr rr rt Φ ^ tr Pi PJ O 3 en αi •- rr μ- o 1— " ii o ri- 3 o J ii m l-h cn rT Φ ω cn 3 μ- Φ m μ- Hi 3 Ω Xi 01 xi μ- Pi rt CQ rt t Pi ii Xi ^ 0 tr J rt rt ii ii Hi O Φ Φ - 3 Ω 0 en Φ 0 Pi rt 0 i 3 Xi 3 ii 3 Φ 3 tr ii rt CQ tr tr rr Φ Xi Ω • o 1-" tr ii μ- ii 0 Ω Xi CQ •o 0 rt PJ Φ tr 3 rt rt tr H μ- 1 LQ Ω Ω μ- Φ Xi 3 3 J 3 rt PJ ^ tr Xi tr rt • 3 μ- Ω PJ PJ £, 3 Ω 0 tr φ Φ Ω Φ J Xi cn P. rr ϋ CQ Ω LQ O rt μ- 3 h- 1 0 μ- 0 X rt T x Φ 3 3 3 Φ tr tr 0 rt Xi tr ii 1 3 Xi μ- I- 1 Ω 3 μ- μ- μ- 3 μ- Hi 3 Ω ii rt 3 Φ μ- 3 1 3 tr LQ Φ Φ Pi ii 3 cn Pi Ω μ- 3 PJ ^ J Φ Φ Φ tr 1 i 01 rt ii 0 P. 1 0 LQ 0 1 tr 1 CQ 1 PJ 1 ii Φ Φ 1 PJ 1 1 The center recess does not touch the backside of the wafer whereas the projecting parts contact the wafer. Thereby a vacuum is enclosed at the center of the backing film. The projecting parts can also be provided with the microstruc- ture. Any other conceivable shape of the surface facing the backside of the wafer can be manufactured by an appropriate complementary shape of the molding. Another solution to compensate for already known non- uniformities of the wafer to be polished is to provide the backing film with zones of different hardness. Preferably those zones have concentric shape with respect to the center of the backing film, although different radial sections of the backing film may also have different hardness. All de- pends on the flexibility of the molding process to fabricate the silicone backing film. The hardness is controllable by the addition of solid particles like silicon particles or aluminum oxide particles. Other solid materials are possible. Depending on the electrical behavior of the added material any electrostatic fields introduced during the polish process can be eliminated. The invention is now described with respect to the figures in the drawings. Respective elements in different figures are referenced by the same numerals. Figure 1 shows a first embodiment of an arrangement for polishing a semiconductor wafer; Figure 2 shows a second embodiment of the arrangement; Figure 3 shows different views of a molding form for the fabrication of a silicone backing film; Figure 4 shows various embodiments of a microstructure of the surface of a silicone backing film; and c co to M H M σi o in o cn o in ra Hi tr tr PJ Hi rt ∞ 3 3 m ^ μ- tr rt Ω rt CO 0 £ 0 3 3 rt rt μ- rt Hi 3 Ω rt <! Φ μ- μ- μ- PJ μ- tr to 0 0 tr Φ P> m 3 tr tr tr μ> rt 3 tr Hi μ- CQ tr 0 μ- μ- Ω tr 0 3 ϋ cr <! μ j Φ I- 1 l- 1 Φ 3 Ω Ω Φ 3 Φ • tr Φ ii Φ Φ ^ LQ (- ■ ii 3 Ω J l- 1 3 μ- μ- μ- 3 Pi Pi Pi 3 rt X Ω Φ 3 3 rt Pi J tr 3 o Ω 01 3 rt Φ rt 3 Λ rt X μ- μ- tr 3 μ- CQ tr rX <! < ii Pi tr tr tr tr rt m rX 3 3 0 Ω ^ LQ 3 o μ- 3 3 3 ω 3 LQ μ- i PJ PJ Pi rt Φ 3 cr 3 xi ^ CQ Ω 3 ii rt 3 μ- α Xi _Q LQ LQ Ω • tr o -J Ω Ω <1 μ- tr r PJ Ω 0 ^ cn -J >X • 0 3 cn P. 3 3 >x J rt Φ rX 3 3 PJ rt φ Ω cr Ω rX μ- 1 CQ μ- rt μ- >τ} 3 Φ 3 μ- 0 Hi μ- Hi CQ PJ 3 3 Ω μ- φ rX μ- s: tr 3 tr rt μ- 3 H • tr 3 r 3 Pi K 0 3 rt ^ 0 μ- en 3 3 3 0 i ϋ Φ μ- 3 3 μ- Φ Ω Φ tr rt tr ii Φ i ra rt rt P ii LQ Φ Hi Pi 3 3 0 3 ra 3 LQ ϋ rt φ Φ rt Φ 0 rt rt - 0 ra Ω 3 ii tr Φ £ Ω rt 3 3 3 LQ Φ Ω P. ω rt - <! 3 tr 3 Φ rr μ- 3 Hi Φ rr φ tr 3 μ- μ- φ Hi rt tr ra 3 <! O Φ Ω μ- P. Φ 3 rt tr cn CQ μ- Xi tr o PJ tr Ω cn Ω 3 Hi μ- tr μ- o μ- ii PJ Φ Pi 3 H rt en tr Φ μ- rt tr 0 Pi φ Hi 3 φ tr <! tr Ω μ- μ-> PJ 3 3 Hi Ω rt Ω ii Φ Xi μ- 0 φ Ω μ- 0 3 H Ff ra 3 3 Ω (- ■ 3 3 LQ μ- 3 3 tr tr 3 rt 3 tr 0 3 3 μ- rt £ rt 3 Φ 3 Ω tr tr 0 3 Φ rt Ω Ω 3 Φ 3 3 rt Φ rt μ- Hi o 3 LQ 3 σi CQ O J tr en ii ιo 3 3 Φ 3 cn rt 0 tr 0 Φ 3 μ- tr Pi tr P- J rt φ tr Hi Φ in φ 3 J Ω φ μ- O cr Hi Φ 3 Ω Ff Ω Φ Φ < Ω rt Hi μ- μ- μ- rt Φ rt u> 3 p. ?r Pi CQ 3 Hi φ -J μ- Φ Φ rt CQ rt 0 μ- 0 3 ra 3 tr ii ≤ tr H li rt Ω Ω μ> 3 li ri Ω 01 O Ω 3 μ- 3 ra H. LQ Φ PJ Φ PJ co Ω CO μ- cr Hi tr rX rt φ Pi 3 tr 3 ii 0 rt 3 Ω Hi Hi PJ 3 .^ tr 01 • ; 3 Φ μ- tr ϋ O s; rt 3 CO 3 ϋ < 0 μ- tr Xi μ- li PJ rt tr Φ tr _- ■ LQ J μ- Ω 3 φ J Φ tr tr μ- I- 1 Ω Hi J ra <! Ω 3 3 3 00 0 tr tr 3 rt ii ) 01 Φ μ- g CQ ^ rt μ- m CQ 3 CQ μ- Φ Ω x 3 ϋ 01 3 0 rt li m CQ ϋ Φ Ω tr Ω 0 m cr μ- tr 3 <! μ- Ω rt Ω μ- 1 H 3 rt φ tr CQ μ- >X ii . . Hi Φ i d LQ Φ μ- Xi Hi PJ Ω 3 tr Ω Ω 0 -J Φ O cn μ- Φ rt ra H PJ Ω => μ- o . μ- xi ii PJ ii ϋ μ- rt Xi μ- Ω 0 tr tr - 3 φ J tr rt ra CQ 3 J 3 3 3 i 0 ii φ P. CQ PJ o 3 Ω rt Ω PJ 3 ϋ O CQ Ω rt tr Φ 3 Φ Φ rt Hi LQ LQ s; LQ 0 3 ii co en rt H 3 3 tr 0 3 Ω Φ tr Hi rt μ- 3 3 Pi 3 Ω Φ Φ tr tr rt 3 ω m 3 3 Φ rt 3 3 I- 1 3 ø" x J Φ ϋ μ- o Ω CQ P. rt α li Hi Φ Hi ii rr 3 φ 3 Φ P. Ω Φ rt Φ Ω μ- rt Φ o 3 rX μ- rt cr μ- μ- rt 3 μ- 3 tr LQ Xi Pi P. -j 3 μ- rX 3 3 ii -J tr 3 tr Λ 3 μ- μ- tr o 0 tr μ- tr Pi Φ Φ i J PJ 0 3 W Ω LQ Φ 3 3 μ- 3 μ- CQ ϋ rt 3 ■ <: ra 3 Φ 3 3 μ- Pi 0 0 tr ii 3 CQ -J rt CO rt μ- 3 LQ Ω 0 rt 3 3 < <! 3 PJ Φ P. 0 LQ r PJ CQ μ> si tr 3 ra H 0 rt 3 O 1— ' J ii in <J < in LQ J J μ- rt CQ l— 1 tr J μ- μ- Φ 3 μ- Φ ra Pi Hi 3 H CQ 3 φ J PJ Ω tr Pi 0 J 3 rt 3 φ 3 H rt μ- rt O 3 tr Φ μ- Φ 3 tr <! 3 Ω Ω rr 3 0 Φ 3 <J 0 tr Φ Pi tr ra tr ra ii μ- Φ 3 3 3 Xi μ- 0 φ s! 3 3 ι-3 tr 3 < i rt 0 3 3 Ω Φ μ- Xi Ω 3 Xi cn 3 Hi CQ 3 3 φ J tr 3 3 tr ii 3 φ * Ω μ- 1 rt μ- tr Ω rt Φ rt tr O rt Φ μ- μ- Hi H S Pi CQ Φ 3 3 Φ 0 £ Φ 0 Pi 3 CQ J PJ tr ra <! tr μ- o 3 01 rt μ- 0 Ω rt μ- φ 3 3 Ω rt μ- 3 φ 3 3 3 Φ μ- φ Φ Ω 3 φ • 0 ^ CQ 3 ii tr μ- 3 P. rt μ- rt LQ tr rt xi CQ P. μ- 3 r 3 0 CQ Hi 3 3 ∞ 3 CQ CQ 3 ra 3 tr 3 Φ tr H rt ι-h li Φ Φ r σ μ- 3 3 tr μt 3 <! μ- φ 3 μ> Hi 3 tr tr 3 3 3 0 Φ Ω li Φ 3 Ω ■ <: 3 φ 3 rt rt 3 φ m Pi 3 Hi •Ό ii μ- Φ 3 Φ rt < 3 rt 3 ι-3 ii Xi Φ Ω 0 0 Φ Ω tr Pi ii φ J μ- ϋ O rt 0! Xi ra tr Φ PJ Φ rt tr 3 I- 1 CQ ι H X 3 P. li tr 3 X μ- Φ ^ Xi rt M 3 LQ 0 3 Ω Xi Φ ii Ω < 3 φ μ- 3 CQ H φ μ- φ μ- Xi 3 3 μ- ra Ω ϋ 0 Pi 3 Ω tr 10 co 3 J en rt Ω 3 I- 1 3 CQ tr Ω tr 3 tr O tr 0 CO ii φ rt μ- in μ- n Ω co 3 Ω μ> tr CQ μ- Φ ϋ φ CQ tr rt o • rX CQ 3 3 0 Pi 3 CO PJ Φ cn tr 3 φ Φ IO 3 3 3 3 φ 3 O P ) J H 3 μ- Φ Ω xi 3 3 CQ φ LQ rt Pi 3 ii 3 Xi i 01 Φ 0 ra Hi Ω μ- CQ 3 ra Hi m >x ii o Ω CQ tr rt 10 tr li PJ rt Ω 3 φ Hi 3 rt 3 φ μ- r tr LQ μ- 0 μ- Φ LQ φ 0 φ 0 • μ- Xi 0 Φ rt Φ 3 ^ tr 3 P- rt 0 Xi i μ- 3 Ω rt 3 cn φ Pi rt Xi 3 o Hi o μ- ii PJ r Φ Ω 3 J 3 3 rt Φ Hi tr 3 Xi CQ en 3 μ- £ ι-3 Hi £, O Ω 0 g ■ : < Φ Φ 0 01 ii φ LQ Φ ii μ- φ o μ- Φ Hi P. Φ Xi ^ PJ μ- J rt 3 3 ø* φ Hi rt φ 3 LΠ P. J cn 1 0 li Φ PJ Φ 01 rt Hi tr LQ φ PJ 3 -J rt μ- CQ 1 3 3 3 0 3 ii tr tr φ Φ 3" ii 3 0 3 Ω 1 μ- μ- CQ 3 rt φ u 1 W ra Ω in which is facing the backside of the wafer to be polished, with a microstructure as explained below. Further, it is possible to insert additional components into the silicone to adopt specific hardness requirements to various radial and/or concentric zones of the silicone backing film. The silicone backing film 5 is impermeable for air. In order to ease the removal of the wafer 4 from the backing film 5 after polishing the surface 51 of the silicone backing film 5 facing to the backside of the wafer 4 is provided with a microstructure. Preferred embodiments of the microstructure are shown in figure 4A, 4B and 4C. The microstructure has projecting or enhanced portions 52 and recessed portions 53. The enhanced portions 52 make contact to the backside 42 of the wafer 4, whereas the recessed portions 53 do not contact the backside wafer surface 42. With enhanced and recessed portions 52, 53 forming a microstructure, the contact area between the backing film 5 and the wafer backside surface 42 is reduced. The height 54 of the projections is to be adjusted in the range 5 to 500 μm. The sequence of projections and recesses is regular. Two neighboring projections repeat after 100 to 1000 μm. A cross-section through a projecting element can be of rectangular shape as shown in figure 4A or of tapered shape as shown in figure 4B or of triangular shape as shown in figure 4C. The complementary shape of the microstructure is provided by the molding or casting form 8 of figure 3 comprising a bottom part 81 and a top part 82. The top part 82 is provided with the microstructure 51. The microstructure is formed by a lithography process. The top part 82 is preferably a metal plate or a glass plate. The top part 82 is coated with a photoresist and structured by light exposure. After developing the photoresist and removal of the developed portions (or un- developed portions depending on the type of the photoresist) the exposed metal or glass sections are etched by a wet etching chemical or by dry etching (plasma etch) . As a result the structures as shown in figure 4A through 4C are achieved. Liquid silicone is feed into the moulding form 8 through feeding channel 83 and is then moulded. By appropriate macroscopic shaping of the molding in figure 3 the various cross-sectional shapes as shown in figure 5A through 5C are obtained. The convex form shown in figure 5A has a cross-sectional shape where the thickness decreases from the center to the circumference. Polishing a wafer with the backside film of figure 5A in a polish head of figures 1 or 2 provides faster polishing at the center of the wafer than at the outside portions of the wafer. The macroscopic shape is easily achieved by the appropriate shaping of the top part 82 of the molding form 8. The convex cross-sectional shape of the backing film in figure 5B has a smaller thickness in the center which increases radially to its circumference. The concaveness of the backside film can be obtained by an appropriate shape of the top part 82 of the molding form 8. With the concave backing film as shown in figure 5B the center of the wafer is polished more slowly as compared to the outer parts of the wafer. Another preferred shape of the backside film is depicted in figure 5C. The macroscopic cross-sectional structure of the circular backing film is U- shaped and has a macroscopic recess 55 at the center and a projecting portion 56 at the circumference. The surface touching the backside of the wafer 4 of the projecting portion 56 has a microstructure as is explained with respect to figure 4. The recess section 55 encloses an air cushion behind the wafer. As shown in principle in figure 5D the backing film 5 can have portions of different hardness. For example, the portion 58 in the center of the backing film 5 is harder and has less compressibility than the circular portion 57 surrounding the inner portion 58. The center is polished faster than the outer part of the wafer. Different hardness is achieved by adding particles to the silicon rubber. The particles are mixed into the liquid silicone before the molding form 8 is filled with liquid silicone. The particles may comprise silicon or aluminum-oxide or a mixture of both. Other particles which do not introduce any contamination to silicon wafers are also possible. The invention as disclosed above achieves better uniformity of Chemical Mechanical Polishing of semiconductor wafers by various effects. The silicone backing film can easily be suck to the ceramic chuck or support plate within the polish head by the application of a vacuum thereby avoiding any glue. This provides a uniform adhesion of the silicone backing film to the polish head. The replacement of a used and mature backing film is easy and safe enabling high turnaround time by simply switching the vacuum on and off provided through the amorphous ceramic chuck. The ability to manufacture silicone by molding in an appropriately designed molding/casting form enables the backing film to be adopted to specific polishing characteristics. By appropriate macroscopical shape of the silicone backing film achieved by the molding form, different removal speeds of the material to be polished can be achieved across the wafer surface. A comparable effect can be achieved by an appropriate adding of particles into the silicone. In addition, a microstructure on the contact surface of the backing film to the backside of the wafer serves for good adhesion to the backing film during polishing and easy re-" moval from the backing film when the polish process is finished. Overall, the use of a silicone backing film in a polish arrangement according to the invention provides a more accurate polishing, a high turnaround time thereby providing better quality integrated circuits.

Claims: Claims 1. Arrangement for polishing disk-like objects comprising: - a platen (2) which contacts a first surface (41) of the object (4) which is to be polished; - a polish head (3) which comprises: a backing film (4) which is removably attached to said polish head (3) to directly contact a second surface (42) of the object (4) opposite to said surface (41) to be polished; a support element (6, 7) carrying said backing film which is rigid; whereby said backing film (5) comprises silicone. 2. Arrangement according to claim 1, c h a r a c t e r i s e d i n t h a t said object (5) is a semiconductor wafer, especially a silicon wafer. 3. Arrangement according to claims 1 or 2 , c h a r a c t e r i s e d i n t h a t said support element (7) comprises an amorphous ceramic. 4. Arrangement according to claim 3 , c h a r a c t e r i s e d i n t h a t said polish head (3) has a vacuum generator (32) to supply a vacuum to said ceramic support element (7) to hold said backing film (5) on said ceramic support element (7) . 5. Arrangement according to claim 4, c h a r a c t e r i s e d i n t h a t said polish head (3) has a first vacuum chamber (31) to supply a vacuum to the ceramic support element (7) , and has a second vacuum chamber (33) above said first vacuum chamber (31) , and has a plurality of tubes (35) projecting from said second vacuum chamber (33) through said first chamber (31) and through said ceramic support element (7) and through said backing film (5) ending above said second surface (42) of said object (4) to supply a vacuum to said second surface (42) of said object (4) to hold said object onto said backing film. 6. Arrangement according to any of claims 1 to 5, c h a r a c t e r i s e d i n t h a t said backing film (4) has a surface which contacts said second surface (42) of said object (4) directly, said surface of said backing film having a microstructure (52, 53) comprising a plurality of enhanced portions (52) to contact said second surface (42) of said object (4) and a plurality of recessed portions (53) which do not contact said second surface (42) of said object (4) . 7. Arrangement according to claim 6, , c h a r a c t e r i s e d i n t h a t said surface of said backing film (5) being concave or being convex or having a U-shape with a macroscopic recess in the center (55) which does not contact the object (4) . 8. Arrangement according to any of claims 1 to 7 , c h a r a c t e r i s e d i n t h a t said backing film (5) has concentric zones (58; 57) of dif- ferent hardnesses. 9. Arrangement according to any of claims 1 to 8, c h a r a c t e r i s e d i n t h a t said backing film (5) comprises solid particles, especially made of silicon or aluminum oxide.

Inventors: EBNER KATRIN, GLASHAUSER WALTER, EBNER, KATRIN, GLASHAUSER, WALTER
Applicants: EBNER KATRIN, GLASHAUSER WALTER, INFINEON TECHNOLOGIES SC300, EBNER, KATRIN, GLASHAUSER, WALTER, INFINEON TECHNOLOGIES SC300 GMBH & CO. KG
Application year: 2001
Main classification: B24B37
IPC codes: B24B37, B24B41, H01L21