MEASUREMENT ARRANGEMENT

Abstract: A measurement device (1), i.e. a metrology tool, and a vehicle (2) are combined to provide a mobile metrology in a fabrication facility. Peripheral equipment such as a device transfer unit (3), for, e.g., FOUPs in semiconductor manufacturing, an electronic control system (5) with, e.g., a PC, monitor and keyboard and optionally a vacuum pump (9) is also provided in module frames of the vehicle (2). The measurement arrangement particularly reduces bottleneck situations in equipment qualifying of processing tools (40) during fast ramp-up phases of, e.g., semiconductor manufacturing facilities, thereby saving costs. The construction is based on PGVs or AGVs and allows a fast operation directly at the location of a processing tool (40). With the possible exception of power supply or operator control, the measurement arrangement can operate fully autonomous.

Description: Description Measurement arrangement The present invention relates to a measurement arrangement, for performing a measurement of at least one of a length, width, depth or position of a structure, a thickness of a film or a defect, on a plate-like object. In the semiconductor manufacturing industry in order to retrieve an optimum Return-on-Invest (ROI) it is necessary to establish a fast ramp-up of new manufacturing facilities. Thereby, it is not only important to save costs by starting the regular production of devices as early as possible, but also to introduce new technologies to the market in a very short time. Besides the time needed to solve the logistic problems associated with a fab ramp-up, one main contributor to the ramp-up time is the equipment qualifying during ramp- up. When the test production of devices has started, these devices are inspected using various types of metrology tools, and the process tools involved are either furhter optimized in their setups or released for mass-production, when specifications are fulfilled. In production planning performed priorily to the ramp-up phase the capacity of metrology tools is adapted to the manufacturing needs of the process tools in order to preclude nonproductive equipment time, thereby saving costs. Unfortunately, since all the equipment, i.e. process tools, is to be qualified within a very short time, a larger metrology capacity is needed during the ramp-up phase than in the following production phase. Therefore, a metrology bottleneck develops during the ramp-up phase, which then inevitably will be prolonged. 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F- Φ CD 0 CO d Φ Φ tr 3 Hi F- Hi P Φ rt rt F- (i H- 1 CQ F- SD Hj CΩ LQ tr > P CD O Hi Φ Ω F- H-" Hj SD F- (D o P Φ Ci CD Ω F- CD SD ?V φ rt Ω < CD ^ LQ 13 3 SD - SD CO P P Hi Ci 3 φ SD fi P r F- Φ Ω 3- 0 rt *• 3 3 r O tr 0 F- P Φ Hi rt d o d φ SD P P Φ Φ LQ φ tr Φ Φ P O rt φ Φ O CD Φ rt Ω Hi Hj 3 3 CO P rt P- <! 0 SD Hj < 0 Φ rt h- ' O F- tr 0 tr ts • SD φ F- Φ φ rt r <! F- 13 φ 3 tr CO 13 Φ tr O a Φ t- 1 rt Ω Φ a φ O P 3 F" r CD Hj φ F- CD Ω Hj F- φ L_l. CD SD Hj P φ t- 1 SD 0 Ω F- o Hi Si Hi 0 CD φ 3 Φ CO • Q- tr P CD Φ 0 Φ ? CD Φ F- tr Φ rt O tr -> rt 3 0 P d SD o Hi P O Hi d Φ F- < F- - <; Ω φ CO Ω co H-* CD F- Ω o Hj Φ P CO rt Ω P 0 rt CD Hf F- Ω Φ (i F- rt d rt ^ Φ O O tr φ LQ O SD F- 3 rt CO Φ Hi σ F- O F- P CD Si Hj o Hi -. tr a a 3 SD ^ P O SD ϋ 0 > < o 13 3 Φ P Ω Φ r 3 SD φ F- tr Φ Φ Ω rt SD 13 Ω C Ω Φ Φ Hi O H F- φ F- CD LQ Φ F- Φ F- (i Ω L_l. 3 SD F- O I- 1 SD O rt 3 Hi Ω Hi O rt rt O a Φ O CD α CD φ Φ a P I- F- Hi P 3 0 F- F- d Φ CO Φ Ω SD 13 F- LQ Hj rt P CD 0 P P z H- 1 Ω P LQ P O φ LQ 13 0 Ω P Hi α 0 rt 3 0 X Φ Ω Φ tr 0 Hj CQ Φ F- rr rt Φ F- < rt SD Hi LQ SD H P F- Ω φ rt Hi Φ rt 3 F- rt 13 CO P Φ SD SD Ω O 0 Ω rt d rt SD rt tr H- 1 Φ Φ rt CO Hi φ tr 0 rt Φ rt Φ a 3 ≤ rt ^ CO rt • 0 3 Ω 0 SD Hi F- Φ rt rt Hi O Ω z 0 Φ Ω SD (i rt Si F- ≤ Ω tr F- rt Hi 3 0 0 Ω Ω tr Hi SD rt Hj rt CD φ <; ft tr F- rt Φ SD Φ 0 Φ 0 tr Ω d F- Hi 3 Hj rt F- O P tr Hj 13 Hj CQ F- Hj z o SD t F- 3 • 13 Φ Hi Hi 3 a F- φ Φ O Ω Φ h- 1 CD Φ 13 o $D CD Ω o φ F- a h- 1 iQ LQ Φ o. 0 Φ Φ SD rt 3 Hi 3 t O ω t • O Φ CO SD CQ CO SD r 3 Φ Φ φ ϊ • O 13 HJ P Ω rt F- Φ p r LQ LQ 0 Ω 0 F- φ O ϋ F- rt t rt P 0 rt 13 13 rt P Ω - O F- O Hj rt rt rr Φ * • Hi 0 <; Ω CQ Ω 0 tT Φ 3 0 φ ^ ~. rt Hi 0 c 0 Hi tr Φ CO rt F- CD 3 CD < φ φ O Hj CD CΛ tr d o 13 d Hi a 0 O D HJ CO SD rr F- r ϋ Ω φ CD φ Ω Ω φ O 3 r 13 M Ω <i Φ CD F- CO Hi 0 P O P F- F- 0 CD F- CD rt 0 SD tr φ Φ P * SD Φ S 13 r Φ CD F- P Hi 0 0 13 0 LQ P P P Ω i CD Hj p Hj F- SD C ω tr Ω — Hj C Hj P LQ H- 1 rt LQ H 0 Hi CD CD LQ r 3- d SD rt H Ω Ω CO P 0 I- 1 F- 0 Hj LQ F- t-T 3 *< O Hi H( rt rr Hj 3 Hj P Hj ■ "< h- 1 0 c Si 3 φ SD 0 Hi φ SD H rt Φ φ o < rt CD tr F- SD O Hi Φ Φ CD 0 φ 3 Hj Hi Φ Hj F- O • < tr 0 tr φ CD 3 Φ F- O (D 0 F 1 0 CD φ 3 H H- 1 rt CD Φ Φ F- 1 ^ Φ 13 CO P φ n Ω P Hj O φ Φ t - • " Φ d 3 CD *< H- 1 F- d P Hj Φ O CO SD φ rt rt metrology tool and its peripherals. Preferably the vehicle is a personal guided vehicle (PGV) or an automatic guided vehicle (AGV) , which have a structure based on similar vehicles used in cleanroom areas for transporting wafer carriers. The vehicle comprises at least one of shelves, slide-in units or other plug-in options for receiving the metrology tool and its peripherals. It is therefore adapted in its form to carry the weight and the volume of said equipment. The inserted equipment accordingly is fixed, mounted or just placed and held by gravity inside the vehicle module frames. The vehicle can be guided by an operator or, as in the case of AGVs, be driven by an electric motor, a sensor and a control unit for detecting the position and controlling the movement. The arrangement additionally comprises peripherals necessary to perform a metrological measurement of plate-like objects with the measurement device. One of them is a transfer unit, by which a plate-like object is introduced to the metrology tool on the vehicle. In the case of the plate-like object being a semiconductor wafer, the transfer unit preferably is asscociated with a carrier plate provided with pins to accurately place and position a wafer carrier on the vehicle in front of the metrology tool. In this preferred configuration an electrically-driven mechanical means transfers the wafer into the metrology tool, i.e. a automatic wafer handling system. The plate-like objects are considered to be at least one of semiconductor wafers, masks or reticles, flat panels, photovoltaic devices, hard disks, DVDs, CD-ROMs, optical data storage means or the like. The exact transfer unit configuration may vary from type to type of the plate-like object. Another peripheral necessary for performing a measurement is the means for providing electrical power. This may be established by at least one of a mains power supply, an on-vehicle LO LO t to F" F 1 Ul O LΠ 0 LΠ 0 Ul to LO w NJ LΠ O Π O LΠ O LΠ ≤ φ F- tr rt F- tr Ω < Φ SD Ω F- d CO d 3 Ω 0 Hi P 0 rt H{ Hi 0 tr F 1 0 F 1 F J φ (i F- a SD ua d rt It O tr 3 Φ 0 3 CO o Φ d 3 O F- F- 1 Ω > < 0 a Z a F- d rt Ω tr rt 0 r Hi tr Φ Z SD Φ Hi X Φ Ω Hj Φ • 13 r CΛ F- F- O 3 P Ω Φ 0 Hi rt tr rt φ tr Φ power supply, the vacuum pump is controlled by the electronic control system. In a further aspect the vehicle is considered to comprise a drive for moving, a brake and steerable wheels. In this form, it very much like an AGV. It therefore moves autonomously along predefined paths in the fab to the location of a process tool, where it is just needed for a measurement. The position of such a vehicle can be controlled via inductive loops connected to a control unit. The control unit then organizes the necessary steps by managing the drive or the brakes and by steering the wheels in order to reach the destined location, e.g. a process tool. In a further aspect the use of an accumulator for electrical power supply is considered. This feature advantageously enhances the mobility of the measurement arrangement, because no manual power connection provided by an operator is necessary, then. Moreover, the arrangement is not dependent on the existence of a free power connector in the vicinity of a measurement loaction. In a further aspect the establishment of a mini-environment is considered. It comprises a filter system inside the metro- logy tool for preserving advanced cleanroom conditions inside the metrology tool and the wafer transfer area. A laminar air-flow is also provided. In a further aspect a docking/undocking interface for a wafer carrier to the metrology tool is considered. The interface preserves the mini-environment conditions inside the wafer carrier and other metrology tools, which is accomplished by completely enclosing the inner area of the docked system from the outside area. In a further aspect an interface for opening or closing the wafer carrier door as being part of the mini-environment is LO LO t CO F 1 F 1 LΠ O LΠ o LΠ O in Ω CD CO Hi FI d Ω rt HJ z Ω Φ Ω d 13 F- Ω O ϋ Z a rt Ft a CO FI 13 13 CD Ω Ω rt Ω tr 3 φ HJ F- 3 F 1 CD tr Φ F- 0 3 Φ a tr CQ 0 O (D tr F- 0 P F- • a Hi Hi CO CD CD O 0 SD Ci a 0 tr ft (t Φ 3 hj 3 13 CQ F- SD 3 d It F- Ω Ω CD 0 F- 13 P Hf 0 a p ft 3 Hi CD Hj F- (i φ CD F 1 O ft CQ SD Φ hf CD Ω Ω SD Ω SD Ω CQ φ Hj F" O F- Ω F- SD CD O O Φ F- 0 - φ 13 Ω tr Ω 0 Ω Φ Φ Φ Ω F- F- Ω 0 SD < rt Hi CO 3 d Hj Φ ^ It • Ό Φ Φ CD 0 3 Hi 0 Hi α ft 0 Φ 13 CD 3 F- F- d 0 O hf CQ CO φ φ 0 z CQ 3 rt 3 13 d 3 Hi d d CD SD Hj Hf φ -> Hi F 1 tr o Hj 3 Hf CO hf α O tr F- CQ ft ϋ F- ><; H a ft F- rt O Φ . 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Hi Hj Φ Ω Ω It CO Ω LQ tr CO Hi Hi 3 o F- <! Ω x φ Φ 1 u F- Ό LQ ω O Φ Φ μQ 0 tr 3 tr d It d z Φ o CQ SD Φ φ Ω a Φ d F- Si Φ F> Φ 3 hj tr μQ Ω d 3 SD Φ Φ Hj Φ a SD 0 ^ CD Ω Hi SD d It tr Hi 3 3 3 rt 3 CD F- F- d SD F- 3 3 SD Hi φ F- Hi d φ CQ Ω ft CΩ 3 φ F- CD LQ φ CD <i tr SD fi ft 13 Ω φ P 13 Φ 3 a 3 ft Φ CO It Ω O d d Φ Hf Ω rt rt ft CO a F- φ 3 rt hi F" P 3 Ω φ CO SD Φ rt Hi - Hi φ Φ Hj 3 Hj 3 F" Φ F- Hj H F- φ Φ Φ Φ Ω tr Φ ft F 1 CD P O Ω CQ CD 3 CD ; F- Φ rt tr Φ F* 3 O O Z O o CD Si <; F- Φ a F- . ft 13 rt CD F- Ω CD 1 (t 3 F- φ ^ ft F J rt 3 SD P 3 CO Φ F- Φ rt 3 o φ CD CD a F- Hi F- Z φ 3 F- F- φ o tr 3 Hi d tr a CQ CO 13 LQ H Ω Hj F 1 Ω a F" rt F- z It F- Hi a LQ 3 CΩ Ω Hj LQ Φ Φ Φ ft rt Hf ^ rr • Φ CD tr ft ft o 0 0 rt LQ O Hi • ; 3 hj tr tr Φ F- Ω hi 3 d F- hf hj O o rt tr (t Hj Φ Hi ft Ω a CD CD ft SD Φ 3 rt a O Hi Si 3 CO CD ft CD Ω 3 tr Φ ^ rt (D tr Ω o ft Ω rr d Ω rt Φ tr LQ a 0 3 3 tr 3 13 φ 1 tr Ω Ω hj Φ 0 3 Hi Φ 0 rt Ω CD Hi 3 Φ CO Hj ft Φ Hi O Φ LQ F J Hj 3 F- Φ 0 0 Hj 3 CD 0 0 o 0 Hj F- Hi rt rt F- 3 tr Ω Φ Hi φ F- d φ F 3 3 3 SD 3 3 F- H- 1 F- F 1 3 3 H o φ - < tr Ci φ Φ Φ CD Φ fi 3 Ω CQ CQ CD tr 1 T 3 3 3 Φ φ (i F 1 CQ . SD fi F- μQ Φ Φ Φ ϋ CO ft Hj fD Φ 0 Φ d O F- 13 Hj d Φ LQ SD Ω Φ F- rr F- Φ z d SD tr Hj Ω CO d rt 3 3 SD d ω H 0 3 Ω Φ CO ft Hj 3 Ω Ft F- |t Hi F- Φ a F- 3 Φ F- F 1 SD Hi ft SD rt a SD F 1 Hf O i F- rt 3 d φ Φ LQ 0 3 Ω F- CQ a α Ω φ α P φ Hf Φ tr φ φ Hi LQ d Ω F- Φ Hj Si Si 3 0 ft tr Ω F J CD SD • : Φ rt F- Ω Ω 3 3 φ Hj Ω (D 3 3 φ ft CQ CD tr 3 0 φ F- rt Φ CQ rt F- 3 • CD H CO ft SD SD Φ CD Φ ft ft LQ It 3 ft r tr F- SD CO Φ 3- d 0 3 Hf . SD 0 tr 3 3 ft CQ F- φ O O φ fi CD a rt CQ φ Hj Hi o D <J D 3 Ω hi F 1 d rt d CQ CO 0 rt F- a Φ (t fi rt tr rt H Φ Ω Hf 0 Φ SD rt CO d Φ Hi Hj — 13 3 tr CΩ rt rr Ω i Hj F- F 1 tr φ o O 3 tr 3 0 SD 3 T3 a SD Hi Hi SD SD SD Φ φ φ • tr o o Φ F 1 F- Φ Hi SD F- φ 3 Hi Φ it φ Hi It Ω Ω hf D Ω CO Ω Φ 3 Ω ϋ F 1 hi a 3 tr rt O 3 13 Φ CO a CD hi Φ O It Φ Φ ft Hj SD z a F- "< φ 0 13 X LQ Φ (t Si 13 (i LQ F- a 3 d (D F- Hi CO φ Hj F- rt Hi z a CD it tr Hi F- F- Φ F- Φ SD c r 3 Hf 3 F 1 F- ft φ CD F 1 F- 3 0 d CO Hi Hj CD Φ F- CD fi CD H Ω 3 0 3 F 1 13 Φ F- LQ i-> Hj Ω φ Ω F- φ CQ LQ Hf ^ Φ o tr SD Φ Φ F- F- LQ d SD F- ■ <: hi Ω 3 φ Φ D 3 it Si Ω Φ Ω It CO Hj F 1 CO 3 F 1 Φ < LQ Hi CD rt 0 rt CQ 3 tr 1 ft H{ Φ rt O tr rt 0 o Φ CO F- tr F- o F 1 1 F- Φ Φ F- 0 Hi hf SD 3 φ Φ LQ Hj 1 Ω rr 1 3 • ; F- 0 3 1 0 1 Φ 0 1 Hf 3 : 1 Φ co P It 3 fi bed. One example implementation is to position a granite plate upon rubber material, which is mounted on the chassis of the vehicle. Also pneumatic cylinders and the like can be used to absorb vibration. The granite plate is not necessa- rily needed. In a further aspect a means is considered, to which the vehicle can dock at a location in front of a process tool or at other suitable locations in a fabrication facility. This pre- vents the vehicle from rolling away if it is accidentally hit, e.g. by an operator. Moreover, the corresponding external docking means marks a predefined location for a vehicle, where it does not disturb other manufacturing processes and cleanroom area traffic. In a further aspect the weight of the vehicle carrying the equipment and its peripherals is considered to be in the range of 20 kg to 50 kg. Vehicles having such a weight can be easily controlled by electric motors suitable for cleanroom areas or operator staff. A typical weight of a preferred measurement arrangement is about 100 kg. In a further aspect a means for controlling the mini-environment during power-off state is considered. The means compri- ses a sensor for detecting missing power supply and immediately stops the air-cycle inside the mini-environment with the laminar air stream. Also, any connection of the air cycle system to the space outside the metrology tool is closed. This preserves the diffusion of contaminating particles into the mini-environment . In a further aspect the vehicle is considered to comprise at least one rollers for easily moving the vehicle from one location to another. Cleanroom specific materials are pre- ferably used for the rollers. In a further aspect a method for performing a measurement of a feature of a plate-like object using the measurement arrangement is considered. It comprises the steps of moving the measurement arrangement from a first location to the location in front of a loadport of a process tool, loading said platelike object from the loadport of said process tool to said measuring device using the wafer carrier, performing the measurement on said plate-like object without a phyiscal connection with the exception of at least one of electrical po- wer supply, wireless data transfer or docking connection with the surroundings, unloading said plate-like object from the measuring device using the wafer carrier, moving said measurement arrangement to a third location The invention is now described with reference to an embodiment taken in conjunction with the accompanying drawings, wherein Figure 1 shows an embodiment of the measurement arrangement, carried by an operator to a docking position in front of a process tool . Figure 2 shows a side view of the measurement device according to an embodiment with a mini-environment in a status of no power connection (a) , and having a laminar air-flow during power connection (b) . Figure 3 shows a vehicle according to the present invention with a measurement device positioned on vibration- damping means. Figure 4 shows a door-opening mechanism according to an embodiment of the present invention, prior to door- opening (a) , and after door opening (b) using a le- ver mechanism. LO LO to to F 1 LΠ o LΠ o LΠ O LΠ Ω t 13 13 Hj 13 CQ F> Ω F- 3 Ft ft Ω tr F- 3 F- ft hf 3 CD Ω ft α 13 Φ It CO > >*. 0 Hf O Φ hi Φ O φ 3 φ 3 hj tr F 1 φ F- 3 O 3 Hi φ F- O tr Φ Hf Hi rt F- 3 tr O fi ϋ 0 ft a O Φ Φ 3 CO 3 Ω CD 3 3 Hi F- 1 F- CD Hj < LQ 3 > ; Ω (D CD r Hi 3 CD fi LQ F- F- F 1 3 φ F- hi 13 Ω F- CQ 0 a d Φ d Φ F- . (t Φ 0 3 Z F- ft 3 3 0 Ω- rt d CQ 3 1 0 hf X 3 Φ Ci CO Ω tr Hf Ω Ω fi 0 CO Hi fi tr CQ SD LQ Φ Hf Ω 3 φ 0 Si Hi rt Φ 3 F- 3 O F- 13 It F- Φ rt o φ 3 CO Φ F- Hi d o CD O Φ hf F- Φ a rt CO Φ d 3 o d Ω 0 3 tr Z φ 3 F- hi rr Hj Hi Hi O 0 φ SD ft 3 Hf fi < 1 Φ O 3 SD Φ Hj H LΠ Hj 3 13 Φ SD fi Φ rt Φ d SD Φ d 3 fi a tr Π LQ Φ F- O CQ CQ F- 3 rt φ Φ Φ 0 Hi CD CO (D 3 CD hi CO φ CD d <: Hf 13 rt 3 It F- F 1 rt CO 3 Ω Z P Φ F- CQ CD ft LQ F> Φ Hi rt ~ SD 3 F- 0 Φ CD 0 CO 0 3 CO z Φ 0 tr Hj rt Φ Φ hj 3 d Ω a F- φ F 1 3 O F Φ F- Ω a 3 Hi . fi 0 LQ F- F- < 0 0 F- hj X Hi o O 3 CD o Φ O O F 1 CD 13 It Φ 3 F- CO d Hi 3 ft Φ SD rt z < 3 Ω 13 Φ d o a φ 3 CD 3 o fD F- Φ φ a 13 CD H F 1 z F- tr Hj 3 CΩ F- LQ CQ CD hi 3 3 13 3 ϋ rr Hf F- 13 <; Hi -J F 1 a LQ CD tr Φ rt CD F 1 d CO Hf o Φ rt Φ o rt CD 13 Ω CD CO CD CO *• ^ It 1 Ω O Φ tr Hi CD SD 13 Φ rt Φ rt 13 rt hf Ω 3 Φ hj Hi 13 o SD F- o o Ω o d Φ Φ CD Hi Φ Φ hj Hj i- tr α tr 13 Φ F- Φ rt hi SD SD 13 hj hj 3 Hi 3 3 d 3 CD F- F- P 3 φ H Hj Ω F- φ Φ 13 Φ CO CD 13 rt It Ω rt Hi Hf O Φ c SD 3 F- Hi F- CD 13 ft tr 0 0 F- •<; hj CQ CD o 3 Ω F- SD Hi Φ d ct 3 13 Φ O Hi O Ω CD 3 hj Ω O SD H fi Z 3 13 it o Hj Hi O Ω *- a Hj CQ 3 φ Hj • F- F- Hj o Hi Φ Φ CD CD F- SD rt 0 ) ft Hi ft F- Hi CD F LQ O 13 rt hi 13 Ω F- fi Φ 3 Φ CΩ Hj CD CO It 3 Hi ft d 0 O 0 LΠ Ω fi rt φ a o Φ d 0 3 CO Φ ϋ Hj Ci ≤ φ Hf F- O Φ Φ tr LQ tr ^ o CQ o o CD F- F- o 3 rt a Si F 1 3 3 rt CD Φ d CD F- 3 F- 13 CΩ 3 Hj φ 1 rt Φ F 1 Φ 3 F 1 a O Hi φ fi - 13 13 Φ F- O 13 Ω Ω 3 rr rt Φ φ α It F- tr F- 3 F- LQ 3 3 0 F- o d Hf fi CD O Φ ft tr Hf hj CD 0 Ω Ω 3 Φ 13 • ^ F- rt CO d CO rt Hi 3 3 CD vo ft F- fi F- 0 φ F- CO CO 3 Ω 0 SD Φ Φ o Ω tr It ft 0 CD LQ 3 φ *• Φ fi < hj F" CD P • 0 ϋ x Hi Hi Φ o Φ Hi • ^ O Φ SD F- 0 Hi F- F- CD rt Ci Hi Hi •* F 1 ^ - F- F 1 φ < 3 F- CD Hi μQ Hi 3 tr F 1 3 Ci tr 0 F- ^ F- < Φ F] CD CD 3 ft d 0 CD CD ϋ Ω o F- rt SD It 13 0 Φ SD Hf CD 13 z 3 CD o LQ z SD >"- 3 13 φ P a- LQ tr Φ ' Hj It F- Hi d d N tr 3 13 0 Hj Ω Ω 3 CO Hi α Hi CO Hf rt φ 1 CD Φ H 0 tr 13 3 ^ 3 Ω φ rt CD Φ Hj o < 3 CD o 0 Φ 13 CD Φ 0 CD F- LQ Φ .— -. 0 Φ 3 φ o d rt CD ft φ 0 CD Ω F- Φ CD d 3 Φ 3 Hf — Hj 3 F> 0 d ft CD 13 3 φ fi a 0 3 rt F- 13 Ω Φ 3 tr F- 13 3 φ "• Z Φ 3 φ F- — Hi 0 3 3 13 Hj 0 O Hf rj" φ 13 CD LQ F- 3 13 Φ Φ ft Ω CD rt CQ tr fi 0 - Φ Ω Hi SD It tr φ Hi a φ 0 CQ Hi CD Ω CO F 1 Ω Ω φ SD CD Hi CD Φ 13 CD F- Φ Hi CQ X F- >< .—- hj z 0 ϋ - CQ Si CQ φ 3 ^ rt rt Hi Hj Φ Hj D CΩ Ω (i SD Φ F- 0 3 3 Hi CD 0 o φ F- ϋ ft Φ Φ 13 F- Φ H{ Hj 3 Hi ft Ω F 1 Hi 3 3 3 0 O 0 it Hj 0 Hi 3 Ω Φ a 3 ft φ O CD 0 3 fi 0 F- φ Hi H Φ ID Φ <! 0 ft LQ Hj d tr 0 Hi Φ rt φ 0 Hi 0 3 Ω Z LQ 3 CD Φ CD Ω SD O tr Φ d 13 3 Φ 3 Hj Hi LQ 3 0 F- F 1 CD tr Φ rt F- Hf 3 CD 3 Hi 0 CD tr Hj tr F- 3 tr 0 rt ft z CO F 1 ft • F- rt F 1 3 SD Hj It 0 Ω z O Hj CQ 0 Hi Z Ω F- CD a Φ Φ Z φ o tr o o a φ ^ 3 O tr F- LO Hf Hi hf o a Ω Ω z < <^ Ω 3 Φ fi 13 o F- z o CQ < 0 J fi O o CO O φ $D Ω Hj O Hi F- Φ Hf O tr F- φ tr Φ Hf Φ 13 Ω tr hi CD ^ Φ Hi O d F- C 0 Φ 0 Φ Hi 3 F- Hj Φ Φ 3 a SD CD 0 Hi Φ tr F- CO a • 13 Hi a cα 13 < 3 SD Hi Hj φ Hj 3 i Φ LQ It 3 rt CO a CD a Ω Hi fi ft rt ft O 0 It 13 SD Φ It Φ a d CD Φ F- ^ — , F< F- F- tr d rt F- F- tr O o φ F- tr CD hi φ to F 1 Ω < hf O 13 LO a CO Ω Hi 3 13 CΩ Si o O 13 rt 0 3 CQ Hi Ω 3 0 Φ F- fi - ^ d tr 0 CO hf O F- d φ F- LQ O O 3 3 rt 13 tr Hi LQ tr 3 ft tr c 0 rt 0 ~ (t hf F- LQ tr Ω tr h- J Φ rt CD O F- 3 3 F- Hf it Z F 1 3 CD Si tr < F- < d ft CD X d CD φ LΠ d hi < rt 3 SD F- φ 0 F- o tr F" h( CQ SD Φ F- Z LO P F- Hj 0 CΩ Φ CQ Ω < o 3 CD Φ SD LQ F- CO SD 3 3 F- Ω Ci ft fi tr LQ 3 Φ Hi fi F- Ω Ω rr Φ F- 3 Hi 3 O LQ rt Ω tr CQ CD 3 F- F- z LQ ft 0 SD 3 0 0 tr F- H CQ tr rt 3 rt CD d F- F- tr tr > d CD ft φ 3 Ω tr CD H tr Hj ^ - ^ LQ Hi φ F- CD F- Hi Φ F- φ Φ tr Hj 3 3 Φ Ω 3 Φ SD LQ tr F- CΩ Φ tr r CD α SD Ω Φ Φ Φ 3 SD 3 0 φ LQ Ω (i fi 3 CD Ω H Ω SD — CD F- 3 * ft ϋ hj 3 LQ 3 Z 1 SD o d CD F- tr F- F- O CO 3 1 Φ 0 3 3 3 rV CΩ 1 3 μ- LQ SD 1 1 3 1 Ω LO LO to to F 1 F* LΠ O < 1 o O LΠ LO LO to F 1 F> LΠ O LΠ o LΠ O LΠ Ω h{ LO F 1 tr ≤ z F" rt Φ CQ LO CΩ Hi H F- CQ Z Φ CD Ω CO ft o F- O F- O ^ fD CD d Φ 3 tr Φ O < Hi Φ 3 tr F- P 3 fD tr F- p φ Hi Ω Hi Hi 3 Ci <i Φ a CQ 0 Hj rt o CO < Hj 0 Ω 3 hi F- It 3 Φ φ φ F- CO SD ft 3 0 -• Φ F- Φ Hi z Φ CQ Φ F- φ Hj Hj CQ Hf α 0 3 Φ Ω p Hf F- 3 Φ Ω fi Si 3 CD o Φ 0 0 hf ϋ 3 It SD SD Ω 0 Φ CQ rt o 3 LQ 3 Ω Ω Hi a 3 Ω tr Hi It 0 3 F- Hj F- F- Ω o tr CΩ SD D CQ 3 x CD rt Hi Φ Hi fi O 3 3 13 3 F- O < ^ F- Hi Hj ft o φ F- Hj Hj Hj F- F- O 13 φ C LO 3 3 co φ CO 0 hi hj tr Hj 3 3 Φ SD Φ Hi Φ z tr Hi 3 O O Hi CΩ fi z Hi F- F- Φ It LQ CD a Φ Hi 3 Φ F- r 3 F- F- SD ft tr F- Φ Φ (D CO 13 1 W Φ F- LQ fi 3 o rt F- F 1 CD hj Hi Z Hj en 3 F 1 Hi 13 0 fi 13 F- F- σ\ ft O d Φ Si 0 Ω SD Φ φ CD Φ CD CD O 0 P P - φ Hj ft Z tr d 13 CO Hi CD Ό SD - Hj CD F- 0 CD LQ Hj CD Φ ft CO tr CD CO Φ F" O Φ Hj a hj O rt hi F- CD Hf Φ tr F- Φ Hj It It D Hi F> O CQ z F- CD F- ft ft Φ F> Φ ifc. Φ Q fi tr Hi Φ ft CD < tr 3 LQ 0 LO F- Ω tr CΩ ~ 3 3 Si CQ Φ SD hj Φ rt Ω - F- CO F- LQ Φ 3 F 1 O Φ 13 F- φ SD 0 It tr SD Si 00 Ω •>• 3 0 φ 0 rt 3 F- 1 Ω It Ω Φ to to CD z Φ tr F- ft CO fi Ω Hi 0 F 1 CO X tr CD Si O CT It hj CD CΩ 0 ft o rt d Φ o ft LQ F- F- Φ Hi *» CD •* F- Hi Hi F- tr 3 ft Ci 0 F- ft tr hj 13 CD 3 hi . F- Φ Φ SD CD ft d Φ F 1 tr Hi <; tr CD Φ ω LQ Si F- z Ω CO hj hj ft o 3 Hi 0 Φ 13 φ Φ CD 0 -> o Φ tr M CD tr tr CO F> Φ Ω 0 o F 1 φ ft 3 0 3 Ω Hi F- 3 3 13 LO rt Φ φ tr rr o σ ?r ti O 13 Φ φ Ω O *< 3 φ X F" hi Hi o tr SD tr CD • *< CD o F- φ φ Ci Hj rt X SD F- 13 Φ Hi SD 3 3 z Φ fi 0 rt 3 CD 0 φ F- 3 3 F 1 F- Φ Ω 3 φ φ 3 LQ F- Hi F- φ F] 3 Ω fi Hj 3 CΩ LQ SD F- LQ Φ Ft CΩ rt CD z fD F- It o Hj tr O * Φ Q • It 3 d Ci Ci 3 Hi F- 3 F- SD <; o 3 Φ φ It M 3 Φ Hi 0 Φ Ω CO P Hi z F- CD T3 Hi Hi i CD o > φ Hi Φ Ω O Hi Hj Φ CD 3 3 Φ o Φ 0 F- CD Hi SD to F- rV 3 F- Φ Hi Hi Hi Hi LQ fi 3 O Hf F- 1 Hj rt F 1 3 CΩ 3 en LQ LΠ φ LQ CD 3 o F- Φ Φ 13 F 1 0 . fi It Φ CO d CD fi X d Hi Ω Hj LQ ft Hi ft tr Hj Φ rt F- • tr 3 Z Hj F- Hi Φ H c Hf tr 0 ri tr 13 Hf ft Ft (t F- CD to F- Φ SD ft 3 Φ CD 0 13 Hj SD Hi Φ rt t CD Φ CQ 0 tr 3 tr CΩ 0 CD It 0 φ CΩ hj Φ 3 Hi tr LΠ It 0 < Φ Φ hi 3- LΠ CQ 3 LΠ F> Φ 0 CO 0 CD F- Z 3 F- Hi Ω d tr F- rt CD tr 3 < Hi 3 d Ω 3 CD Φ fi F- z 0 Ω 3 It rt tr r F- Φ F- tr Φ rt 0 0 LQ Hi it F- 0 LQ CD 3 CD rt tr ft d Φ F- tt SD a α • hj rt o 0 a Φ φ 3 Ω d Hi 3 3 F- φ tr CD Ω 3 rt F- tr 3 Hi 3 rt Hj Hf LQ x Hj Φ φ Φ rr α SD F- Ci 3 CD φ CD CO Φ tr F- Φ Hj Ω Ci z F- o F" CQ o LQ hf rt Ω φ Ω fi fD 3 ft φ It SD F 1 O Ω rt Hi Φ z F- CD rt CD O LQ ^ Ω F- rt tr hti Φ 3 ?r 13 CO tr CD CD CD Ω Hi CO Hj 0 3 CD fD 0 Φ φ Φ <J F- F- tr φ ft Hi φ φ Hi hf F- 3 Hj a Ω Hj Φ 13 a 3 o tr 3 F φ tr It F- 3 Φ CD Hi ft z Hj Hj LQ CQ ≤ F- Φ F- tr hf SD Hi O φ Φ t F- CD F- SD Ω F- a a 3 a φ Hj Hf LΠ a z Φ ft Hi SD to 0 3 to a Ω F- CD Ω P- 3 rt - O CD H{ tr Φ Hi O hi φ ^J tr Φ 0 1 3 SD H 0 tr to Si Hi F- Hj Hj SD CD 0 Hj 3 Si Hi F- < φ o 0 F 1 t Φ LO CQ F- rt 3 0 z 3 Hi 3 φ tr 0 F- CD Hj O Ω Φ F- 0 CD Hi < Φ rt F- LQ Ci z hf SD Hj CD CD 0 Ω tr Φ CD Φ 0 F- hj to CD 1 CD 1 Φ Hi 1 F- 1 Hi CO CΩ Data needed from a product or work in progress database 72 in order to perform a film thickness measurement can be retrieved from a sender or receiver unit of the factory-wide communication system 70 by a wireless infrared communication chan- nel. Data transfer unit 7 transmits or receives the signals to the electronic control system 5. After the measurement corresponding data or work-in-progress transactions can be sent back to the sender or receiver 70, which transfers the information to the CIM system (computer-integrated manufactu- ring) . List of reference numerals 1 measuring device, ellipsometer la sensor area lb wafer transfer area 2 vehicle 3 transfer unit 4 printer 5 electronic control system 5a keyboard and monitor 6 means for providing mini-environment 6a filter unit 6b slide area 7 data transfer unit 9 vacuum pump 10 means for docking a vehicle 11 means for providing power supply, mains power supply 15 vibration damping means 20b lever for docking wafer carrier to measurement device 20b lever for opening wafer carrier door 25 door opener for wafer carrier door 26 wafer carrier plate 27 pin 28 interface for docking/undocking a wafer carrier 30 wafer carrier 31 wafer carrier door 40 process tool 41 loadport 50 operator 70 sender and receiver of factory wide communication system 71 CIM-system 72 product and IP database

Claims: Claims : 1. Measurement arrangement, for performing a measurement of a feature of a plate-like object, comprising: - a measurement device (1) for measuring said feature, in particular at least one of a length, width, depth or position of a structure, or a thickness of a film, or a defect, ' on said plate-like object (1), - an electronic control system (5) for controlling said mea- surement device (1) , - a transfer unit (3) for providing said plate-like object to said measurement device (1) , - a means for providing electrical power (11) to said measurement arrangement , - a vehicle (2) for providing mobility to the arrangement, the vehicle being provided with spaces each for receiving said measurement device (1) , said electronic control system (5) , said transfer unit (3) and said means for providing electrical power (11) . 2. Arrangement according to claim 1, c h a r a c t e r i s e d i n t h a t said plate-like object is a semiconductor wafer or mask. 3. Arrangement according to claim 2, c h a r a c t e r i s e d i n t h a t said measurement arrangement has a width of more than 300 millimeters and a width less than 1000 millimeters. 4. Arrangement according to claim 3, c h a r a c t e r i s e d b y a vacuum pump (9) being connected to a chuck of the measurement device (1) , which holds the semiconductor wafer, said vehicle (2) being provided with a space for receiving the vacuum pump (9) . 5. Arrangement according to anyone of claims 1 to 4 , c h a r a c t e r i s e d b y a drive, a brake and at least one steerable wheel mounted to the vehicle 2) , for providing a self-powered movement of the arrangement . 6. Arrangement according to anyone of claims 2 to 5, c h a r a c t e r i s e d i n t h a t said means for providing electrical power (11) to said measurement arrangement comprises an accumulator. 7. Arrangement according to anyone of claims 2 to 6, c h a r a c t e r i s e d b y a means for providing a mini-environment (6) comprising a filter system (6a) , for reducing the density of contaminating particles surrounding said semiconductor wafer during a wafer measurement, said vehicle (2) being provided with a space for receiving the means for providing a mini-environment (6) . 8. Arrangement according to claim 7, c h a r a c t e r i s e d i n t h a t said means for providing a mini-environment (6) comprises an interface for docking or undocking (28) a wafer carrier (30) to said measurement device (1) , for preserving a low density of contaminating particles surrounding said semiconductor wafer during a wafer transfer. 9. Arrangement according to anyone of claims 7 to 8 , c h a r a c t e r i s e d i n t h a t said means for providing a mini-environment (6) comprises an interface for opening or closing (25) a wafer carrier door (31) of said wafer carrier (30) . 10. Arrangement according to anyone of claims 8 to 9, c h a r a c t e r i s e d i n t h a t said interface for opening or closing a wafer carrier door (25) and/or said interface for docking or undocking (28) comprise an electrical driving means. 11. Arrangement according to anyone of claims 1 to 10, c h a r a c t e r i s e d i n t h a t said measurement device (1) is at least one of: a defect in- spection tool, an ellipsometer, a particle counter, a reflectometer, a Fourier transform spectrometer, a CD- measurement tool, an overlay measurement tool, a scanning electron microscope. 12. Arrangement according to anyone of claims 1 to 11, c h a r a c t e r i s e d b y a printer (4) connected to the electronic control system (5) , said vehicle (2) being provided with space for receiving said printer (4) . 13. Arrangement according to anyone of claims 1 to 12, c h a r a c t e r i s e d b y a data transfer unit (7) for transferring data between the electronic control system (5) and a factory wide communica- tion system (71) , said vehicle (2) being provided with space for receiving said data transfer unit (7) . 14. Arrangement according to claim 13, c h a r a c t e r i s e d i n t h a t said data transfer unit (7) has a means to transfer the data via a wireless communication channel . 15. Arrangement according to anyone of claims 1 to 14, c h a r a c t e r i s e d b y a set of vibration damping means (15) for preventing the measurement device (1) from vibration being transmitted by the vehicle (2) . 16. Arrangement according to anyone of claims 1 to 15, c h a r a c t e r i s e d b y a means for docking said vehicle (10) at a location in a fabrication system. 17. Arrangement according to anyone of claims 1 to 16, c h a r a c t e r i s e d i n t h a t the measurement arrangement has a total weight of more than 20 kg and less than 150 kg. 18. Arrangement according to anyone of claims 7 to 17, c h a r a c t e r i s e d i n t h a t said means for providing a mini-environment (6) comprises: - a sliding area (6b) for providing a laminar air flow inside the measurement device, - a sensor for detecting electrical power connection, - a means for hermetically enclosing at least a sensor area inside the measurement device, which is connected to said sensor for detecting electrical power connection. 19. Arrangement according to anyone of claims 1 to 15, c h a r a c t e r i s e d i n t h a t said vehicle comprises at least one wheel for rolling the vehicle between two locations. 20. Method for performing a measurement of a feature of a plate-like object using the measurement arrangement according to claims 2 to 19, comprising the steps of: - moving the measurement arrangement from a first location to the location in front of a loadport (41) of a process tool (40), - loading said plate-like object from the loadport (41) of said process tool (40) to said measuring device (1) using the wafer carrier (30) , - performing the measurement on said plate-like object without a phyiscal connection with the exception of at least one of electrical power supply, wireless data transfer or docking connection with the surroundings, - unloading said plate-like object from the measuring device (1) using the wafer carrier (30) , - moving said measurement arrangement to a third location.

Inventors: ABRAHAM MICHAEL, MARX ECKHARD, ABRAHAM, MICHAEL, MARX, ECKHARD
Applicants: ABRAHAM MICHAEL, INFINEON TECHNOLOGIES SC300, MARX ECKHARD, ABRAHAM, MICHAEL, INFINEON TECHNOLOGIES SC300 GMBH & CO. KG, MARX, ECKHARD
Application year: 2001
Main classification: H01L21
IPC codes: H01L21