PVD COATED CUTTING TOOL AND METHOD OF ITS PRODUCTION

Abstract: The present invention describes a coated cutting tool for metal machining and a process for producing such tools. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of nanocrystalline aluminum spinel of the type (Me)xAl2O3+x where Me is a second metal and 0 < x </=1, deposited by Physical Vapor Deposition (PVD).

Description: PVD coated cutting tool and method of its production The present invention relates to a cutting tool for metal machining comprising a body with at least on the functional parts of the surface thereof a hard and wear resistant refractory coating. The coating is adherently bonded to the body and covering all functional parts of the tool . The coating is composed of one or more layers of refractory compounds of which at least one layer consists of fine-crystalline aluminum spinel deposited by Physical Vapor Deposition (PVD) and the non spinel layer(s), if any at all, are metal nitrides and/or carbides with the metal elements chosen from Ti , Nb, Hf, V, Ta, Mo, Zr, Cr, and Al . It is well known that for e.g. cemented carbide cutting tools used m metal machining, the wear resistance of the tool edge can be increased considerably by applying thin, hard surface layers of metal oxides, car- bides or nitrides with the metal either selected from the transition metals from the groups IV, V and VI of the Periodic Table or from silicon, boron and aluminum. The coating thickness usually varies between 1 and 15 μm and the most widespread techniques for depositing such coatings are PVD and CVD (Chemical Vapor Deposition) . It is also known that further improvements of the performance of a cutting tool can be achieved by applying a pure ceramic layer such as AI2O3 on top of layers of metal carbides and nitrides (US 5,674,564 and US 5,487,625) . Cemented carbide cutting tools coated with alumina layers have been commercially available for over two decades. The CVD technique usually employed involves the deposition of material from a reactive gas atmosphere on an substrate surface held at elevated temperatures. AI2O3 crystallizes into several different phases such as (alpha) , K (kappa) and χ (chi) called the 'α-series' with hep (hexagonal close packing) stacking of the oxygen atoms, and into γ (gamma) , θ (theta) , η (eta) and δ (delta) called the 'γ-series' with fee (face centered cubic) stacking of the oxygen atoms. The most often occurring Al2θ3-phases m CVD coatings deposited on cemented carbides at conventional CVD temperatures, 1000- 1050°C, are the stable alpha and the metastable kappa phases, however, occasionally the metastable theta phase has also been observed. The CVD AI2O3 coatings of the α-, K- and/or θ-phase are fully crystalline with a gram size m the range of 0.5-5 μm and having well-facetted grain structures. The inherently high deposition temperature of about 1000 °C renders the total stress m CVD AI2O3 coatings on cemented carbide substrates to be tensile, hence the total stress is dominated by thermal stresses caused by the difference m thermal expansion coefficients between the substrate and the coating and less by intrinsic stresses which have there origin from the deposition process itself and are of compressive nature. The tensile stresses may exceed the rupture limit of I2O3 and cause the coating to crack extensively and thus degrade the performance of the cutting edge m e.g. wet machining where the corrosive chemicals m the coolant fluid may exploit the cracks m the coating as diffusion paths . In addition to AI2O3, other oxides, mixtures or combinations of oxides or compounds of the spinel type have been proposed as hard coatings deposited by CVD (GB 1 408 294) . They have not found a practical acceptance . Generally CVD-coated tools perform very well when machining various steels and cast irons under dry or wet cutting conditions. However, there exists a number of cutting operations or machining conditions when PVD- coated tools are more suitable e.g. m drilling, parting and threading and other operations where sharp cutting edges are required. Such cutting operations are often referred to as the 'PVD coated tool application area' . Plasma assisted CVD technique, PACVD, makes it possible to deposit coatings at lower substrate temperatures as compared to thermal CVD temperatures and thus avoid the dominance of the thermal stresses. Thin AI2O3 PACVD films, free of cracks, have been deposited on cemented carbides at substrate temperatures 450-700°C (DE 41 10 005, DE 41 10 006, DE 42 09 975) . The PACVD process for depositing I2O3 includes the reaction bet- ween an Al-halogenide , e.g. AICI3, and an oxygen donor, e.g. CO2 , and because of the incompleteness of this chemical reaction, chlorine is trapped m the AI2O3 coating and its content could be as large as 3.5 %. Furthermore, these PACVD AI2O3 coatings are generally com- posed of, besides the crystalline α- and/or γ-Al2C>3 phase, a substantial amount of amorphous alumina which m combination with the high content of halogen impurities, degrades both the chemical and mechanical properties of said coating, hence making the coating material non-optimized as a tool material . The field of the present invention relates particularly to the art of PVD I2O3 coated carbide cutting tools or tools of similar hard materials such as cermets, ceramics and high speed steel or the superhard ma- terials such as cubic boron nitride or diamond. There exist several PVD techniques capable of producing refractory thin films on cutting tools and the most established methods are ion plating, DC and RF magnetron sputtering, arc discharge evaporation, IBAD (Ion Beam Assisted Deposition) and Activated Reactive Evaporation (ARE) . Each method has its own merits ana the intrinsic properties of the produced coatings such as microstructure/gram size, hardness, stare of stress, intrinsic cohesion and adhesion to the underlying su-D- strate may vary depending on the particular PVD method chosen. Early attempts to PVD deposit AI2C3 at typical PVD temperatures, 400-500°C resulted m amorphous alumina layers which did not offer any notable improvement m wear resistance when applied on cutting tools. PVD deposition by HF diode or magnetron sputtering resulted m crystalline CX- I2O3 only when the substrate temperature was kept as high as 1000 °C (Thornton and Chin, Ceramic Bulletin, 56(1977)504). Likewise, applying the ARE method for depositing AI2O3, only resulted in fully dense and hard AI2O3 coatings at substrate temperatures around 1000°C (Bunshah and Schramm, Thin Solid Films, 40 (1977) 211) . With the invention of the Pulsed Magnetron Sputtering especially m the mode of bipolar pulsed DMS tech- nique (Dual Magnetron sputtering) which is disclosed m DD 252 205 and DE 195 18 779, a wide range of opportunities opened up for the deposition of insulating layers such as AI2O3 and other oxides and, furthermore, the method has made it possible to deposit for instance crystalline AI2O3 layers at substrate temperatures in the range of 500 to 800 °C. In the bipolar dual magnetron system, the two magnetrons alternately act as an anode and a cathode and, hence, preserve a metallic anode over long process times. At high enough frequencies, possible electrical charging on the insulating layers will be suppressed and the otherwise troublesome phenomenon of 'arcing' will be limited. Hence, according to DE 195 18 779, the DMS sputtering technique is capab_e of depositing and producing high-quality well -adheren , crystalline C- I2O3 thm films at substrate temperatures less than 800°C. The 'α- l2θ3 layers', with a typical size of the α-grains varying between 0.2 and 2 μm, may partially also contain the gamma (γ) phase from the 'γ- series ' of the I2O3 polymorphs . The size of the γ- grains m the coating is much smaller than the size of the α-grains. The γ-Al2θ3 gram size typically varies between 0.05 and 0.1 μm. In the I2O3 layers where both modifications of γ- and α-phase were found, the γ-Al2C>3 phase showed a preferred growth orientation with a (440) -texture . When compared to prior art plasma assisted deposition techniques such as PACVD as described DE 42 09 975, the novel, pulsed DMS sputtering deposition method has the decisive, important advantage that no impurities such as halogen atoms, e.g. chlorine, are incorporated m the I2O3 coating. A disadvantage of films containing the α-phase is the relatively rough surface topography. The mam disadvantage of polytypes other than O-AI2O3 containing films is that the chemical instability is likely to be less. At very high cutting temperatures phase transformation into the α-phase occurs. These phase transformations are connected with a volume contraction, which causes cracks and delammation of the films. According to the present invention there is pro- vided a cutting tool for metal machining such as turning (threading and parting) , milling and drilling comprising a body of a hard alloy such as cemented carbide, cermet, ceramics or high speed steel or the superhard materials such as cubic boron nitride or diamond onto which a hard and wear resistant refractory coating is deposited by Pulsed Magnetron Sputtering at substrate temperatures of 400 to 700°C, preferably 500 to 600°C depending on the particular material of the tool body, and that said wear resistant coating is composed of one or more layers of refractory compounds of which at least one layer, prefe- rably the outermost layer, consists of a nanocrystalline aluminum spinel compound of the type (Me) J -AI2O3--- J - (0 < x ≤. 1) preferably (0.01 < x ≤. 1) , most preferably (0.05 < x .≤. 1) , where Me is formed of one or more of the metals of the group Mg, Zn, Mn, Fe, Co, Ni , Cd, Cu, Cr, Sn and that the innermost layer (s) , if any at all, between the tool body and the aluminum spinel compound layer, is composed of metal nitrides and/or carbides with the metal elements selected from Ti, Nb, Hf , V, Ta, Mo, Zr, Cr, W and Al . In contrast to the state of the art, the aluminum spinel compound layers consist of high-quality, dense, fine-grains crystalline aluminum spinel compound with a gram size less than 0.2 μm. Preferably, the spinel is m the form of crystallites having a lateral extension of 10 to 200 nm. Furthermore, the aluminum spinel compound layers are virtually free of cracks and halogen impurities . The aluminum spinel compound layers according to the invention further give the cutting edges of the tool an extremely smooth surface finish which, compared to prior art α- l2C>3 coated tools, results m an improved surface finish also of the workpiece being machined. The very smooth surface finish can be attributed to the very fine crystallmity of the coating. Identification of the aluminum spinel compound layers according to the invention can preferably be made by X-ray diffraction m combination with Energy Dispersive Spectrometry (EDS) . Strong reflexes of at least one of the (400) and (440) lattice planes can be identified Weaker reflexes from the (111) , (220) , (311) , (222) and (511) lattice planes of the aluminum spinel compound can occasionally be identified. Reflexes of the pure MeO phases do not occur . A second identification method for the aluminum spinel compound phases is based on electron diffraction m a Transmission Electron Microscope (TEM) again m combination with EDS, or a chemical analysis method. The diffraction patterns show rings from polycrystallme aluminum spinel . The nanocrystalline aluminum spinel compound according to the invention is strongly textured m the [440] -direction. A Texture Coefficient, TC, can be defined as: where I(hkl) = measured intensity of the (hkl) reflection I 0 (hkl) = standard intensity from the ASTM standard powder pattern diffraction data n = number of reflections used m the calculation (hkl) reflections used are (111), (311), (222), (400) and (440) . Whenever TC(hkl)>l there is a texture m the [hkl] - direction. The larger the value of TC(hkl), the more pronounced is the texture. According to the present invention, the TC for the set of (440) crystal planes -1.5. When the nanocrystalline aluminum spinel compound coated cemented carbide cutting tools according to the invention are used m the machining of steel or cast iron, several important improvements compared to prior art have been observed which will be demonstrated m the forthcoming examples. Surprisingly, the PVD aluminum spinel compound without containing any portion of the coarser and thermodynamically stable α-Al2θ3 phase, shows m certain metal machining operations, a wear resistance which is equal to the wear resistance found m coarser CVD α- l2θ3 coatings deposited at temperatures around 1000°C. It is believed that the reason for this behavior is the high chemical stability of the spinel o compound also at high temperatures up to 1000 °C m combination with a relatively high hardness of at least 16 GPa caused by the special nanocrystalline microstruc- ture . Furthermore, the fine-grained PVD aluminum spinel compound coatings show a wear resistance considerably better than prior art PVD coatings . These observations open up the possibility to considerably improve the cutting performance and prolong the tool lives of coated PVD tools. The low deposition temperature will also make it possible to deposit PVD aluminum spinel compound coatings on high speed steel tools and the superhard materials cubic boron nitride and diamond. A further improvement m cutting performance can be anticipated if the edges of the aluminum spinel compound coated cutting tools according to the invention are treated by a gentle wet -blasting process or by edge brushing with brushes based on e.g. SiC as disclosed US 5,861,210. Another advantage for using spinel compounds according to the invention is the possibility of deposition of colored layers either because of the intrinsic property of the spinel or by incorporating a small amount of other cations like Fe, Cu, Co or Cr . The colour is of great practical importance for the visual evaluation of the wear state of a coated cutting tool . The total coating thickness according to the present invention varies between 0.5 and 20 μm, preferably between 1 and 15 μm with the thickness of the non-aluminum spinel compound layer (s) varying between 0.1 and 10 μm, preferably between 0.5 and 5 μm. The fine-grained aluminum spinel compound coating can also be deposited directly onto the cutting tool substrate of cemented carbide, cermet, ceramics, high speed steel or supernard materials and the thickness of said aluminum spinel compound varies then between 0.5 and 15 μm, preferably bet- ween 1 and 10 μm. Likewise can further coatings of metal nitrides and/or carbides with the metal elements selected from Ti, Nb, Hf , V, Ta, Mo, Zr, Cr, W and Al be deposited on top of the aluminum spinel compound layer, particularly an outer layer of TiN, Ti (CN) , TiN or (Tι,Al)N. In a preferred embodiment a first coating of at least one layer said first coating having a total thickness of 0.1 to 10 μm preferably 0.5 to 5 μm comprising metal nitrides or carbides or carbonitrides with the metal elements selected from the group Ti , Nb, Hf , V, Ta, Mo, Zr, Cr, W and Al is deposited. Preferably, said first coating consists of TiC, Ti (CN) , TiN or (Tι,Al)N. In yet a preferred embodiment the tool according to the invention the first coating and/or the outer layer comprise a multilayer portion with a periodic or aperiodic sequence of at least two different layers chosen from TiC, TiCN, TiN or TiAlN . The aluminum spinel layer according to the invention is deposited by pulsed magnetron sputtering at a substrate temperature of 400-700°C, preferably 500- 600°C, using elementary or alloyed targets of the metals and a mixture of a rare and a reactive gas, preferably argon and oxygen. A preferred solution to carry out the pulsed magnetron sputtering process is the usage of a Dual Magnetron System (DMS) . Additionally the process according to the invention is characterized m cyclic interruptions of the flux of particles, impinging onto each individual substrate. This flux consists of neutrals, ions, electrons, photons etc. It seems that these interruptions cause renucleation processes resulting m the observed very fine grained structure of the spinel layer. Easy ways to realize said interruptions are swinging or rotating types of substrate movement connected with a cyclic leaving of the deposition zone. A further characteristic of the process consists m set- ting the flow of the reactive gas for such a value that the impedance of the magnetron discharge lies between 150 % and 250 % of the impedance of a discharge burning between totally oxide-covered target electrodes. This totally oxide-covered state of the targets is indicated by a drastically reduced deposition rate and the presence of oxygen lines m the optical emission spectrum of the plasma. Further improvement of the microstructure and phase composition of the spinel layer will be achieved by applying a bipolar pulsed bias voltage to the substrates during the deposition. This leads to an alternating flux of ions and electrons necessary for the cyclic discharge of the growing insulating layer. Preferred is a bias voltage level between 20 and 200 V, preferably between 50 and 100 V at a frequency m the range of 1-5 kHz. Depending on the geometric conditions of the deposition arrangement, an asymmetric bias pulsing with regard to the parameters voltage level and pulse duration can be useful . In this case the duration of the positive polarity should be significantly lower than or at most equal to the duration of the negative polarity. The layer (s) described m the present invention, comprising metal nitrides and/or carbides and/or car- bonitπdes and with the metal elements selected from Ti , Nb, Hf, V, Ta, Mo, Zr, Cr, W and Al can be deposited by PVD-technique, CVD- and/or MTCVD- technique (Medium Temperature Chemical Vapor Deposition) . The superiority of the fine-grained aluminum spinel compound PVD layers according to the present invention, compared to prior art PVD coatings is demonstrated m Example 1. Example 2 demonstrates the surprisingly good wear resistance properties of the fine-grained aluminum spinel compound layers compared to traditionally CVD- layers composed of K-AI2O3 and α-Al2C>3. F-xampl e 1 A) Commercial PVD-TiN coated cemented carbide drilling inserts of style LCMX 040308-53 with a coating thickness of approximately 3 μm having a cemented carbide composition of 10 w% Co and balance WC . B) TiN coated tool from A, coated with a 2 μm finegrained aluminum magnesium spinel (MgAl 2 0 4 ) layer m a separate experiment with the pulsed magnetron sputtering technique using a DMS system with one magnesium target and one aluminum target operating at 50 kHz an oxygen argon mixture. The power density m time average was set for 24 W/cm 2 on the aluminum target and 14 W/cm 2 on the magnesium target, respectively. All inserts were fixed on a rotating drum during deposition, the angle of incidence was limited by shields the surrounding of DMS to ± 30°. The deposition temperature was 600°C. A symmetrical bipolar pulsed bias voltage of 80 V at a frequency of 3 kHz was applied to the substrates. The reac- tive working point of the discharge was stabilized at an impedance of 200 % of that impedance measured for totally oxide-covered target electrodes. The aluminum magnesium spinel coating from B) appeared milky-white and had a very smooth surface. SEM studies of a cross section showed a glassy-like fracture without porosity. The TEM investigation leads to a gram size between 50 nm and 100 nm. EDS measurements showed the presence of a nearly stoichiometπc compound according to the formula MgAl 2 0 4 with an argon content below 0.3 w% . The XRD investigation clearly identified the cubic spinel structure with the reflexes (220) , (311) , (400) and (440) . The calculated Texture Coefficient for the (440) reflexes amounted to 2.5. Coated tool inserts from A) and B) were then tested m a drilling operation m a workpiece material of the low alloyed, non-hardened steel SS 2541. Both flank and crater wear were developed on the cutting edges. The extent of the flank wear determined the life time of the cutting tool. The results of the cutting tests showed that the inserts coated with a spinel layer according to the invention were able to drill more holes and showed a smaller extent of the flank wear m comparison to A) . Example 2 C) Cemented carbide inserts of style CNMA 120412-KR having a composition of 6 w% Co and balance WC, coated with a first layer of 8 μm TiCN and thereafter with a top layer of 4 μm K- and α- l2<33. Both layers were deposited by conventional CVD technique. The gram size of the K- and α-phase lies between 0.5 and 1.2 μm. D) Cemented carbide inserts of the same style and composition as m C) were first coated with an approximately 3 μm thick TiCN layer and thereafter with a 2.5 μm thick fine-grained magnesium aluminum spinel with a partial substitution of 3 wt% Mg by Fe . Both layers were deposited by a DMS sputter process without vacuum interruption. To obtain a partial substitution of Mg by Fe a mosaic magnesium target with iron plugs was used. The substrate temperature was 550 °C. All other parameters corresponded to those reviewed for B) . The coating from D) appeared blue and showed a very smooth surface. SEM investigations showed no porosity. The gram size was evaluated by TEM investigations to less than 50 nm. The EDS measurement gave the following composition aluminum 27 at % magnesium 13 at % argon 0.2 at % oxygen balance The electron diffraction pattern shows the rings of the nanocrystalline cubic spinel structure. The hardness of the nanocrystalline aluminum magnesium spinel amounts 20 GPa and the intrinsic stress is 3 GPa compressive. Coated inserts from C) and D) were then tested m a contmuos turning operation m a ball bearing steel (Ovako 825) . The crater wear of the cutting edges was measured an optical microscope The machining time until the top layer was worn through, was registered (i.e. when the inner TiCN πust becoming visible) . At a cutting speed of 200 m/mm, a feed of 0.25 mm/rev and a depth of cut of 2 mm using coolant the machining time of inserts deposited according to the m- vention was higher by a factor of 1.5 compared to the prior art coated inserts. The improvement can be explained by the higher chemical stability of the magnesium aluminum spinel layer m comparison to the CVD alumina layer. In addition, the blue color of the spinel coating allows to detect the end of the service life of the inserts with good accuracy m a simple way.

Claims: Claims 1. Cutting tool comprising a body with at least on the functional parts of the surface thereof a 0.5 to 20 μm thick hard and wear resistant coating c h a r a c t e r i z e d m that said coating includes at least one 0.5 to 10 μm thick layer showing a nanocrystalline microstructure and consisting of an aluminium spmel compound of the type ( e) l2θ3 +x (0<x≤.l) , where Me is formed of one or more of the metals of the group Mg, Zn, Mn, Fe, Co, Ni , Cd, Cu, Cr and Sn. 2. Cutting tool according to claim 1 c h a r a c t e r i z e d m that said at least one spmel layer shows pronounced X-ray diffraction reflexes of at least one (hkl) indices (400) and (440) , has a hardness of at least 16 GPa, compressive intrinsic stress of at least 1 GPa and is free from any halogen impurities . 3. Cutting tool according to claims 1 or 2 , c h a r a c t e r i z e d m that the spmel layer has a preferred growth orientation m the [440] direction with a texture coefficient TC-1.5 defined as: where I (hkl) = measured intensity of the (hkl) reflection I 0 (hkl) = standard intensity from the ASTM standard powder pattern diffraction data n = number of reflections used m the calculation (hkl) reflections used are: (111), (311), (222), (400) and (440) . 4. Cutting tool according to any of the preceding claims, c h a r a c t e r i z e d m that the spmel layer consists of crystallites with a lateral extension of 10 to 200 nm. 5. Cutting tool according to any of the preceding claims, c h a r a c t e r i z e d m that the sp el layer completely consists of the magnesium- aluminium sp el w th the composition MgAl2C>4. 6. Cutting tool according to any of the preceding claims, c h a r a c t e r i z e d m that the spmel layer is coloured and consists mainly of the magnesium aluminium spmel where a part of the aluminium and/or magnesium cations is replaced by cations of the metals Fe, Cu, Co or Cr . 7. Cutting tool according to any of the previous claims c h a r a c t e r i z e d m having a first coating of at least one layer said first coating having a total thickness of 0.1 to 10 μm preferably 0.5 to 5 μm comprising metal nitrides or carbides or carbomtrides with the metal elements selected from the group Ti , Nb, Hf, V, Ta, Mo, Zr, Cr, W and Al . 8. Cutting tool according to claim 7, c h a r a c t e r i z e d m that said first coating consists of TiC, Ti (CN) , TiN or (Tι,Al)N. 9. Cutting tool according to any of the previous claims 1-8, c h a r a c t e r i z e d m that said tool is provided with an outer layer of TiN, Ti (CN) , TiN or (Tι.Al)N. 10. Cutting tool according to any of the claims 7-9 c h a r a c t e r i s e d that the first coating and/or the outer layer comprise a multilayer portion with a periodic or aperiodic sequence of at least two different layers chosen form TiC, TiCN, TiN or TiAlN. 11. A method of making a cutting tool comprising a body with at least on the functional parts of the surface thereof a 0.5 to 20 μm thick hard and wear resis- tant coating c h a r a c t e r i z e d m depositing at least one refractory layer consisting of a nanocrystalline Al-sp el compound of the type (Me) X A1 2 0 3+X (0<x≤.l), where Me is formed of one or more of the metals of the group Mg, Zn, Mn, Fe , Co, Ni , Cd, Cu, by reactive pulsed magnetron sputtering m a mixture of a rare and a reactive gas under the following conditions, - the pulse frequency is set for 10 to 100 kHz, preferably 20 to 50 kHz, - the deposition occurs with a rate of at least 1 nm/s with reference to a stationarily arranged substrate, - the flux of the impinging particles onto each individual substrate is cyclically interrupted, - the magnetron power density m time average is set for at least 10 W/cm2, - the flow of the reactive gas is set for such a value that the impedance of the magnetron discharge lies between 150 % and 250 % of the impedance of a discharge burning between totally oxide-covered target electrodes and - the substrate temperature is set m the range of 400 to 700°C, preferably m the range of 500 to 600°C depending on the material of the tool body being coated. 12. A process according to claim 11, c h a r a c t e r i z e d that the (Me) - ^ Al^-O^., layer is deposited by reactive sputtering of alloyed or mosaic targets with the total composition (MeJ -JA-l., . 13. A process according to claim 11, c h a r a c t e r i z e d m that the (Me) x Al 2 0 3+x layer is deposited by reactive sputtering using a Dual Magnetron System with one aluminium target and one target made from the other metal or from an alloy of this metal and aluminium. 14. A process according to claim 11, c h a r a c t e r i z e d m that the rare gas is argon. 15. A process according to claim 11, c h a r a c t e r i z e d m that the reactive gas is oxygen . 16. A process according to claim 11, c h a r a c t e r i z e d m that the cyclic interruption of the flux of impinging particles occurs peπodi- cally with a frequency m the range of between 0.1 per minute and 10 per minute. 17. A process according to claim 11, c h a r a c t e r i z e d m that the duration of the interruption of the flux of the impinging particles is at least 10 % of the duration of the whole period. 18. A process according to claim 11, c h a r a c t e r i z e d m that the cyclic interruption of the flux of impinging particles occurs aperiodi- cally . 19. A process according to at least one of the claims 11-18. c h a r a c t e r i z e d m that a bipolar pulsed bias voltage is applied to the substrates. 20. A process according to claim 19, c h a r a c t e r i z e d m that the applied bipolar bias voltage is asymmetric for both polarities with regard to at least one of the parameters voltage level and pulse duration. 21. A process according to claim 19, c h a r a c t e r i z e d m that the maximum value of the bias voltage m each pulse lies m the range of 20 to 200 V, preferably between 50 V and 100 V. 22. A process according to claim 19, c h a r a c t e r i z e d that the pulse bias frequency lies m the range of 100 Hz to 10 kHz, preferably m the range of 1 kHz to 5 kHz, and the duration of the positive polarity of the substrate is at most equal to, preferably 5 to 20 times lower than the duration of the negative polarity. 23. A process according to claim 19, c h a r a c t e r i z e d m that the additional non- spmel-layers are also deposited by physical vapor deposition (PVD) process, particularly by pulsed magnetron sputtering . 24. A process according to claim 23, c h a r a c t e r i z e d m that all layers are deposited m the same process without vacuum interruption. 25. A process according to claim 23, c h a r a c t e r i z e d m that additional inner layers are applied by a chemical vapor deposition (CVD) process . AMENDED CLAIMS [received by the International Bureau on 18 September 2000 (18.09.00); original claims 1-25 replaced by new claims 1-16 (5 pages)] 1. Cutting tool comprising a body of sintered cemented carbide or cermet, ceramic or hign speed steel, cubic boron nitride or diamond, and on which at least on the functional parts of the surface thereof, a 0.5 to 20 μm thick hard and wear resistant coating is applied, and said coating is c h a r a c t e r i z e d in comprising a structure of one or more refractory compound layers, of which at least one layer with a thickness of 0.5 to 10 μm is deposited by a reactive , bipolar pulseα magnetron sputtering technique with a magnetron target power density in time average of at least 10 W/cm 2 , and the pulse frequency is set for 10 to 100 kHz, preferably 20 to 50 kHz, and at a substrate temperature in the range 400 to 700 °C, preferably in the range 500 to 600 °C, depending on the material to be coated, and said layer consists of a nanocrystalline al uminium spmel compound of the type (Me) r,Al 2 0 3+ (0<x<l ) with a grainsize less than 0.2 μm and wnere Me is formed of one or more of the metals n the group Mg, Zn, Mn, Fe, Co, Ni, Cd and Cu, said nanocrystalline aluminium spinel layer exhibiting significant X-ray diffraction reflexes from at least one of the (440) and (400) crystal planes, having a hardness of at least 16 GPa, a compressive stress of at least 1 GPa ana is free from any halogen impurities. 2. Cutting tool according to claim 1 c h a r a c t e r i z e d in that the spinel layer has a preferred growth orientation in the[440]-dιrectιon with a texture coefficient TC > 1.5 defined as: TC(hkl) = (I (hkl) /Io(hkl) ) { (l/n)Σ(I(hkl)/I 0 (hkl) ) } _1 Where I (hkl) = measured intensity of the (hkl) reflection Io(hkl) = standard intensity from ASTM standard powder pattern diffraction data n = number of reflections used in the calculation (hkl) reflections used are: (111), (311), (222), (400) and (440) . 3. Cutting tool according to any of the previous claims, c h a r a c t e r i z e d in that the spinel layer completely consists of the magnesium-aluminium spinel with the composition MgAl 2 0- 3 . 4. Cutting tool according to any of the previous claims, c h a r a c t e r i z e d in that the coating thereof having at least one layer of thickness 0.1 - 10 μm, preferably 0.5 - 5 μm, comprising metal nitrides or carbides or carbonitrides with the metal elements selected from the group Ti, Nb, Hf, V, Ta, Mo, Zr, Cr, W and Al . 5. Cutting tool according to claim 4, c h a r a c t e r i z e d in that said layer consists of TiC, TiN, TiCN or TiAlN. β. Cutting tool according to any of the previous claims, c h a r a c t e r i z e d in that the outer layer is the nanocrystalline aluminium spinel compound. 7. Cutting tool according to any of the claims 1 - 5, c h a r a c t e r i z e d in that the outer layer is TiN. 8. A method for producing a coated cutting tool, wherein at least one refractory layer consisting of a nanocrystalline aluminium spinel compound of the type (Me) x Al 2 0 3+x (0<x<l) , with a thickness of 0.5 to 10 μm and a grainsize less than 0.2 μm, is deposited by reactive, bipolar pulsed magnetron sputtering as per claim 1, c h a r a c t e r i z e d in that - the process pressure is held at 1 - 5 μbar, - the process gas is a mixture of a rare and a reactive gas, - the flow of reactive gas is set for such a value that the impedance of the magnetron discharge lies between 150% and 250% of the impedance of the discharge burning between totally oxide-covered target electrodes, - the deposition occurs with a rate of at least 1 nm/s with reference to a stationary arranged substrate. 9. A process according to claim 8, c h a r a c t e r i z e d in that the rare gas is argon. 10. A process according to claim 8, c h a r a c t e r i z e d in that the reactive gas is oxygen. 11. A process according to claim 8, c h a r a c t e r i z e d in that the (Me) x Al 2 0 3+x layer is deposited by reactive magnetron sputtering of alloyed or mosaic targets with the total composition (Me) x Al 2 . 12. A process according to claim 8, c h a r a c- t e r i z e d in that the (Me) x Al 2 0 3+x layer is deposited by reactive sputtering using a Dual Magnetron System with one aluminium target and one target made from the other metal or from an alloy of this metal and aluminium. 13. A process according to at least one of the claims 8 - 12, c h a r a c t e r i z e d in that a bipolar pulsed bias voltage is applied to the substrates. 14. A process according to claim 13, c h a r a ct e r i z e d in that - the bipolar pulsed bias frequency applied to the substrates is set for 0.1 to 10 kHz, preferably 1 to 5 kHz, - the duration of the positive bias voltage pulse on the substrates is at most equal to, preferably 5 to 20 times shorter than the duration of the negative bias voltage pulse, - the applied bipolar bias voltage is asymmetric for both polarities with regard to at least one of the parameters voltage level and pulse duration, - the maximum value of the bias voltage in each pulse is set for 20 to 200 V, preferably 50 to 100 V. 15. A process according to claim 13, c h a r a c t e r i z e d in that the additional non- spinel layers are also deposited by a Physical Vapor Deposition (PVD) process, particularly by pulsed magnetron sputtering. 16. A process according to claim 15, c h a r a c t e r i z e d in that all the layers are deposited in the same coater without vacuum interruption.

Inventors: AHLGREN MATS, FIETZKE FRED, GOEDICKE KLAUS, SCHILLER SIEGFRIED, SELINDER TORBJOERN, ZYWITZKI OLAF, AHLGREN, MATS, FIETZKE, FRED, GOEDICKE, KLAUS, SCHILLER, SIEGFRIED, SELINDER, TORBJOERN, ZYWITZKI, OLAF
Applicants: SANDVIK AB
Application year: 2000
Main classification: C23C14
IPC codes: B23B27, B23P15, C04B41, C23C14, C23C30