FLUOROPHENYL RESIN COMPOUNDS

Abstract: This invention is directed to a fluorophenyl resin compound, to methods of its preparation; and to its use in the solid phase synthesis of amides, peptides, hydroxamic acids, amines, urethanes, carbonates carbamates, sulfonamides and alpha -substituted carbonyl compounds.

Description: FLUOROPHENYL RESIN COMPOUNDS FIELD OF THE INVENTION This invention is directed to a fluorophenyl resin compound and its derivatives, to methods of its preparation and to its use in the solid phase synthesis of amides, peptides, hydroxamic acids, amines, urethanes, carbonates, carbamates, sulfonamides and a-substituted carbonyl compounds. BACKGROUND OF THE INVENTION Solid-phase synthetic techniques, in which a reagent is immobilized on a polymeric material which is inert to the reagents and reaction conditions employed, as well as being insoluble in the media used, are important synthetic tools for preparing amides and peptides as well as for effecting various functional group transformations. For solid phase peptide synthesis, a summary of the many techniques may be found in J. M. Stewart and J. D. Young, Solid Phase Peptide Synthesis, 2nd. Ed., Pierce Chemical Co. (Chicago, IL, 1984); J. Meienhofer, Hormonal Proteins and Peptides, vol. 2, p. 46, Academic Press (New York), 1973; and E. Atherton and R. C. Sheppard, Solid Phase Peptide Synthesis : A Practical Approach, IRL Press at Oxford University Press (Oxford, 1989). For the use of solid phase methodology in the preparation of non-peptide molecules see Leznoff, C. C., Acc. Chem. Res., 11,327-333 (1978). For the use of polymeric reagents in functional group transformations see A. Akelah and D. C. Sherrington, Application of Functionalized Polymers in Organic Synthesis, Chem Rev., 81,557-587 (1981) and W. T. Ford and E. C. Blossey, Polymer Supported Reagents, Polymer supported Catalysts, and Polymer Supported Coupling Reactions, in Preparative Chemistry using Supported Reagents, Pierre Laszlo, ed., Academic Press, Inc., 193-212 (1987). For the use of polymeric reagents in oxidation reactions see J. M. J. Frechet et al., J. Org. Chem., 43,2618 (1978) and G. Cainelli et al., J. Am. Chem. Soc., 98,6737 (1976). For the use of polymeric reagents in halogenation reactions see J. M. J. Frechet et al., J. Macromol. Sci Chem., A-11, 507 (1977) and D. C. Sherrington et al., Eur. Polym. J., 13,73, (1977). For the use of polymeric reagents in epoxidation reactions see J. M. J. Frechet et al., Macromolecules, 8,130 (1975) and C. R. Harrison et al., J. Chem. Soc. Chem. Commun., 1009 (1974). For the use of polymeric reagents in acylation reactions see M. B. Shambhu et al., Tet. Lett., 1627 (1973) and M. B. Shambhu et al., J. Chem. Soc. Chem. Commun., 619 (1974). For the use of polymeric reagents in Wittig reactions see S. V. McKinley et al., J Chem. Soc. Chem. Commun., 134 (1972). Polymeric reagents also have found widespread use in combinatorial synthesis and for preparing combinatorial libraries. See F. Balkenhohl et al., Angew. Chem. Int. Ed. Engl., 35,2288-2337 (1996) and L. A. Thompson et al., Chem Rev., 96,555-600 (1996). A 4-hydroxy-tetrafluorophenoxy resin compound of formula EMI2.1 is disclosed by H. Shao et al., in Abstract No.: 072, Development of TFP Resin for Combinatorial Library Synthesis, Division of Organic Chemistry, 213th ACS National Meeting, April 13-17,1997. SUMMARY OF THE INVENTION This invention is directed to a fluorophenyl resin compound of formula I EMI2.2 wherein EMI2.3 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI2.4 EMI2.5 L is a chemical bond, EMI2.6 m is 1 to 5; p is 0,1 or 2; B is F, OW or SO, Z; D is CH or N; W is hydrogen, tripyrrolidinophosphonium, C (O) V, C (O) Ra, C (O)NRbRc, C (O) Ora, SO2Ra or EMI3.1 V is Cl or imidazol-1-yl; Y is O or N R3 ; Z is Cl,-OH, ORa or NRaRj ; Ra and Rf are independently aliphatic or aromatic; Rb and R, are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl; Rjis C H2Rf; Ro, R, and R2 are a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl ; R3 is H or lower alkyl; R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R"and R, 2 are independently alkyl, heteroaryl, or aryl. The fluorophenyl resin compounds of this invention possess a unique advantage over other solidphase synthesis reagents in that the fluorine atom ortho to the B substituent permit the absolute loading of the resin to be determined using'9F NMR. The large chemical shift differences seen in the spectrum due to the different environments of the ortho fluoro atoms depending whether the chemical species is a phenolate anion, a phenol or a phenolate ester, is extremely useful to monitor the extent of loading of reagents on the tetrafluoro polymer (TFP) resin. The progress of reactions performed on the fluorophenyl resin compounds of this invention may also be monitored by'9F NMR, providing a useful analytical method for reaction optimization. This is especially useful in the case of the activated sulfate esters where there is not a simple diagnostic IR signal to monitor the reaction. In another aspect, this invention is directed to a fluorophenyl activated ester resin compound of formula EMI4.1 wherein Ra is aliphatic or aromatic; EMI4.2 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI4.3 EMI4.4 L is a chemical bond, m is 1 to 5; EMI4.5 Y is NR3; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl. In another aspect, this invention is directed to a process for preparing an amide of formula EMI5.1 wherein Ra is aliphatic or aromatic; and Rb and R are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting a fluorophenyl activated ester resin compound of formula EMI5.2 wherein Ra is aliphatic or aromatic; EMI5.3 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI5.4 EMI5.5 L is a chemical bond, EMI6.1 m is 1 to 5; Y is N R3; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl with a compound of formula HNRbRC. In another aspect, this invention is directed to a process for preparing a fluorophenyl activated ester resin compound of formula EMI6.2 wherein Ra is aliphatic or aromatic; EMI6.3 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI6.4 EMI6.5 L is a chemical bond, EMI7.1 m is 1 to 5; Y is NR3 ; Ro, R, and R, are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl, comprising coupling a 4-hydroxyfluorophenyl resin compound of formula EMI7.2 EMI7.3 A, Ro, R, and R2 are defined above, with a carboxylic acid compound of formula RaCO2H, wherein Ra is defined above, optionally in the presence of an activating agent selected from the group consisting of diisopropylcarbodiimide in the presence of 4-dimethylaminopyridine, and bromotripyrrolidinophosphonium hexafluorophosphate (PyBroPTM) in the presence of triethylamine (TEA). In another aspect, this invention is directed to a process for preparing an amine compound of formula EMI8.1 wherein Ra is aliphatic or aromatic; Rb and Rc are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting a 4- (oxysulfonyl) fluorophenyl resin compound of formula EMI8.2 wherein Ra is defined above; EMI8.3 is a solid support; A is selected from-L-SO2-,-L-NR3SO2-, EMI8.4 EMI8.5 L is a chemical bond, EMI8.6 m is 1 to 5; Y is NR3; and Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl, with a compound of formula HNRbRc. In another aspect, this invention is directed to a process for preparing a 4- (oxysulfonyl) fluorophenyl resin compound of EMI9.1 wherein Ra is aliphatic or aromatic; EMI9.2 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI9.3 EMI9.4 L is a chemical bond, EMI9.5 m is I to 5; Y is NR3 ; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl, comprising reacting a fluorophenyl-4-sulfonyl chloride resin compound of formula EMI10.1 EMI10.2 A, Ro, R, and R, are defined above, with a hydroxy compound of formula RaOH, wherein Ra is defined above. In another aspect, this invention is directed to a process for preparing a sulfonamide compound of formula EMI10.3 wherein Ra is aliphatic or aromatic; and Rb and are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting a 4- (sulfonyloxy) fluorophenyl resin compound of formula EMI10.4 Ra is aliphatic or aromatic; EMI10.5 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI11.1 EMI11.2 L is a chemical bond, EMI11.3 m is I to 5; Y is N R3 ; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl, with an amine compound of formula HNRbRC. In another aspect, this invention is directed to a process for preparing a 4- (sulfonyloxy) fluorophenyl resin compound of formula EMI11.4 Ra is aliphatic or aromatic; EMI11.5 is a solid support; A is selected from-L-SO2-,-L-NR3SO2-, EMI11.6 EMI12.1 L is a chemical bond, EMI12.2 m is 1 to 5; Y is NR3; Ro, R, and R, are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R, are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; comprising reacting a 4-hydroxyfluorophenyl resin compound of formula EMI12.3 EMI12.4 A, Ro, R, and R2 are defined above, with a sulfonyl chloride compound of formula RaSO2CI in the presence of a base. In another aspect, this invention is directed to a process for preparing a 4 (sulfonyloxy) fluorophenyl resin compound of formula EMI12.5 Ra is aliphatic or aromatic; EMI13.1 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI13.2 EMI13.3 L is a chemical bond, EMI13.4 m is I to 5; Y is NR3; Ro, R, and R, are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; comprising coupling a 4-hydroxyfluorophenyl resin compound of formula EMI13.5 EMI13.6 A, Ro, R, and R2 are defined above, with a sulfonic acid compound of formula RaSO3H, wherein Ra is defined above. In another aspect, this invention is directed to a process for preparing a 4- (sulfonyloxy) fluorophenyl resin compound of formula EMI14.1 Ra is aliphatic or aromatic; EMI14.2 is a solid support; A is selected from-L-SO2-,-L-NR3S0,-, EMI14.3 EMI14.4 L is a chemical bond, EMI14.5 m is I to 5; Y is NR3; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; comprising reacting a 4-hydroxyfluorophenyl resin compound of formula EMI14.6 EMI15.1 A, Ro, R, and R2 are defined above, with a sulfonic anhydride compound of formula (RaSO2) 2O. In another aspect, this invention is directed to a process for preparing a compound of formula EMI15.2 wherein T is Ra0- or RdReN- Ra is aliphatic or aromatic; and Rb, Rc, Rd and Re are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, or Rd and Re taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl,, comprising reacting a 4- (aminocarbonyloxy) fluorophenyl resin compound of formula EMI15.3 wherein EMI15.4 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI15.5 EMI15.6 L is a chemical bond, EMI16.1 m is 1 to 5; Y is NR3; RoX R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; with an alcohol of formula RaOH, wherein Ra is defined above, or a compound of formula RdReNH, wherein Rd and Re are defined above, in the presence of base. In another aspect, this invention is directed to a process for preparing a compound of formula EMI16.2 wherein U is RfO-or RbRCN- Ra and Rf are independently aliphatic or aromatic; and Rb and R are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting a 4- (oxycarbonyloxy) fluorophenyl resin compound of formula EMI16.3 wherein Ra is aliphatic or aromatic; EMI17.1 is a solid support; A is selected from-L-SO2-,-L-NR3S0,-, EMI17.2 EMI17.3 L is a chemical bond, EMI17.4 mislto5; Y is NR3 ; Ro, R, and R, are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; with an alcohol of formula RfOH, wherein Rf is defined above, or a compound of formula RbRCNH, wherein Rb and R are defined above, in the presence of base. In another aspect, this invention is directed to a process for preparing a 4- (aminocarbonyloxy) fluorophenyl resin compound of formula EMI17.5 wherein EMI17.6 is a solid support; A is selected from-L-SO2-,-L-NR3SO2-, EMI18.1 EMI18.2 L is a chemical bond, EMI18.3 m is 1 to 5; Y is NR3 ; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; Rb and R are independently H, aliphatic or aromatic, or Rb and Rcv taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising converting a 4-hydroxyfluorophenyl resin compound of formula EMI18.4 EMI18.5 A, Ro, R, and R2 are defined above, to a 4- (carbonyloxy) fluorophenyl resin compound of formula EMI18.6 wherein V is Cl or imidazol-1-yl; and reacting the 4- (carbonyloxy) fluorophenyl resin compound of formula EMI19.1 with a compound of formula RbRCNH, wherein Rb and R are defined above, optionally in the presence of base. In another aspect, this invention is directed to a process for preparing a 4- (aminocarbonyloxy) fluorophenyl resin compound of formula EMI19.2 wherein EMI19.3 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI19.4 EMI19.5 L is a chemical bond, m is I to 5; EMI19.6 Y is NR3; Ro, R, and R2 are independently a ring system substituent; or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; R4, R5, R6 and R, are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and Rb and Rc are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting a 4-hydroxyfluorophenyl resin compound of formula EMI20.1 EMI20.2 A, Rov R, and R2 are defined above, with a carbamoyl chloride compound of formula EMI20.3 wherein Rb and Rc are defined above, optionally in the presence of base. In another aspect, this invention is directed to a process for preparing a 4- (aminocarbonyloxy) fluorophenyl resin compound of formula EMI20.4 wherein EMI20.5 is a solid support; A is selected from-L-S02-,-L-NR3S02- EMI21.1 EMI21.2 L is a chemical bond, EMI21.3 m is I to 5; Y is NR3; Ro, R, and R are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; R4, R5, R6 and R, are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and Rb is aliphatic or aromatic, comprising reacting a 4-hydroxyfluorophenyl resin compound of formula EMI21.4 EMI21.5 A, Ro, R, and R2 are defined above, with an isocyanate compound of formula O=C=N Rb, wherein Rb is defined above, optionally in the presence of base. In another aspect, this invention is directed to a process for preparing a disubstituted amine compound of formula EMI21.6 wherein Ra is aliphatic or aromatic; R ; is CH2Rf; and Rf is aliphatic or aromatic, comprising reacting an N, N-disubstituted fluorophenyl-4-sulfonamido resin compound of formula EMI22.1 wherein Ra and Ri are defined above; EMI22.2 is a solid support; A is selected from-L-SO2-,-L-NR3S0,-, EMI22.3 EMI22.4 L is a chemical bond, EMI22.5 m is I to 5; Y is NR3 ; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R, are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; with a thiol. In another aspect, this invention is directed to a process for preparing an N, N-disubstituted fluorophenyl-4-sulfonamido resin compound of formula EMI23.1 wherein Ra is aliphatic or aromatic; Ri is CH2Rf ; Rf is aliphatic or aromatic; EMI23.2 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI23.3 EMI23.4 L is a chemical bond, EMI23.5 m is I to 5; Y is NR3 ; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and comprising reacting a 4-fluorophenyl sulfonyl chloride compound of formula EMI24.1 EMI24.2 A, Ro, R, and R2 are defined above, with a compound of formula H2NRa, wherein Ra is defined above, to form a N-substituted 4- (aminosulfonyl) fluorophenyl resin compound of formula EMI24.3 and converting the N-substituted 4- (aminosulfonyl) fluorophenyl resin compound to the N, N-disubstituted 4- (aminosulfonyl) fluorophenyl resin compound. In another aspect, this invention is directed to a process for preparing a 4-hydroxyfluorophenyl resin compound of formula EMI24.4 wherein EMI24.5 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI24.6 EMI25.1 L is a chemical bond, EMI25.2 m is I to 5; Y is NR3; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; comprising reacting a 4-fluorofluorophenyl resin compound of formula EMI25.3 EMI25.4 A, Ro, R, and R2 are defined above, with hydroxide. In another aspect, this invention is directed to a process for preparing a 4-fluorofluorophenyl resin compound of formula EMI25.5 EMI26.1 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI26.2 EMI26.3 L is a chemical bond, EMI26.4 m is 1 to 5; Y is NR3 ; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; comprising acylating a resin compound of formula EMI26.5 with a 4-fluorofluorobenzoyl chloride compound of formula wherein Ro, R, and R2 are defined above. EMI26.6 In another aspect, this invention is directed to a process for preparing a 4-fluorofluorophenyl resin compound of formula EMI27.1 wherein EMI27.2 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI27.3 EMI27.4 L is a chemical bond, EMI27.5 m is I to 5; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; R3 is H; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; comprising reacting an amino resin of formula EMI27.6 with a 4-fluorofluorophenylsulfonyl chloride compound of formula EMI28.1 wherein Ro, R, and R2 are defined above, in the presence of base. In another aspect, this invention is directed to a process for preparing a 4-hydroxyfluorophenyl resin compound of formula EMI28.2 wherein EMI28.3 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI28.4 EMI28.5 L is a chemical bond, EMI28.6 m is 1 to 5; Y is NR3, Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; R3 is H; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; comprising coupling an amino resin of formula EMI29.1 with a 4-hydroxyfluorophenyl carboxylic acid compound of formula EMI29.2 wherein Ro, R, and R2 are defined above. In another aspect, this invention is directed to a process for preparing a fluorophenyl-4-sulfonic acid resin compound of formula EMI29.3 wherein EMI29.4 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI29.5 EMI29.6 L is a chemical bond, EMI29.7 m is I to 5; Y is NR3; Ro, R, and R, are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R, are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; comprising reacting a 4-fluorofluorophenyl resin compound of formula EMI30.1 wherein Ro, R, and R, are defined above, with an S03-equivalent. In another aspect, this invention is directed to a process for the preparation of a fluorophenyl-4sulfonyl chloride resin compound of formula EMI30.2 wherein EMI30.3 is a solid support; A is selected from-L-SO2-,-L-NR3S02-, EMI30.4 EMI30.5 L is a chemical bond, EMI31.1 m is I to 5; Y is NR3; Ro, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; comprising reacting a fluorophenyl-4-sulfonic acid resin compound of formula EMI31.2 wherein Ruz R, and R2 are defined above, with an inorganic acid chloride. In another aspect, this invention is directed to a process for preparing an a-substituted carbonyl compound of formula EMI31.3 wherein Ra is aliphatic or aromatic; and Rg is H, aliphatic or aromatic and Rh is aliphatic or aromatic, comprising reacting a fluorophenyl activated ester resin compound of formula EMI32.1 wherein Ra is aliphatic or aromatic; EMI32.2 is a solid support; A is selected from-L-SO2-,-L-NR, SO,-, EMI32.3 EMI32.4 L is a chemical bond, EMI32.5 m is 1 to 5; Y is NR3; R0, R, and R2 are independently a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and R4, R5, R6 and R7 are independently ring system substituents, or R4 and RS taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; RIRmCH (E) with a carbon nucleophile of formula DETAILED DESCRIPTION OF THE INVENTION Definitions of Terms As used above and throughout the description of the invention, the following terms, unless otherwise indicated, shall be understood to have the following meanings: "Solid support"means a substrate which is inert to the reagents and reaction conditions described herein, as well as being substantially insoluble in the media used. Representative solid supports include inorganic substrates such as kieselguhr, silica gel, and controlled pore glass; organic polymers including polystyrene, including 1-2% copolystyrene divinyl benzene (gel form) and 20-40% copolystyrene divinyl benzene (macro porous form), polypropylene, polyethylene glycol, polyacrylamide, cellulose, and the like; and composite inorganic/polymeric compositions such as polyacrylamide supported within a matrix of kieselguhr particles. See J. M. Stewart and J. D. Young, Solid Phase Peptide Synthesis, 2nd. Ed., Pierce Chemical Co. (Chicago, IL, 1984). In addition,"solid support"includes a solid support as described above which is affixed to a second inert support such as the pins described in Technical Manual, MultipinT SPOC, Chiron Technologies (1995) and references therein which comprise a detachable polyethylene-or polyproylenebased head grafted with an amino functionalized methacrylate copolymer and an inert stem. In addition,"solid support"includes polymeric supports such as the polyethylene glycol supports described by Janda et al., Proc. Natl. Acad. Sci. USA, 92,6419-6423 (1995) and S. Brenner, WO 95/16918, which are soluble in many solvents but can be precipitated by the addition of a precipitating solvent. "Polyfluorophenyl resin compound"means a solid support as defined above which is chemically modified as is known in the art to incorporate a plurality of fluorophenyl groups. The fluorophenyl groups are covalently bound directly to the solid support or attached to the solid support by covalent bonds through a linking group. The fluorophenyl resin compounds according to this invention are designated herein as EMI33.1 wherein A, Ro, RI, R2and B are defined herein, and EMI33.2 denotes a solid support, as defined herein, or the combination of a solid support and a linking group. "Polyfluorophenyl group"means a group of formula EMI33.3 wherein A Ro, R,, R2 and B are defined herein. "Linking group"and"linker"mean a group through which the fluorophenyl group may be covalently linked to the solid support. The linking group is substantially inert to the reagents and reaction conditions described herein and generally comprises an inert polymeric material such as polyethylene glycol (PEG, also commonly referred to as polyoxyethylene). "Amine protecting group"means an easily removable group which is known in the art to protect an amino group against undesirable reaction during synthetic procedures and to be selectively removable. The use of N-protecting groups is well known in the art for protecting amino, and other reactive nitrogen containing groups, against undesirable reactions during a synthetic procedure and many such protecting groups are known, See, for example, T. H. Greene and P. G. M. Wuts, Protective Groups in Organic Synthesis, 2nd edition, John Wiley & Sons, New York (1991), the contents of which are hereby incorporated herein by reference. Preferred N-protecting groups are acyl, including formyl, acetyl, chloroacetyl, trichloroacetyl, o-nitrophenylacetyl, o-nitrophenoxyacetyl, trifluoroacetyl, acetoacetyl, 4chlorobutyryl, isobutyryl, o-nitrocinnamoyl, picolinoyl, acylisothiocyanate, aminocaproyl, benzoyl and the like, and acyloxy including methoxycarbonyl, 9-fluorenylmethoxycarbonyl, 2,2,2-trifluoroethoxycarbonyl, 2-trimethylsilylethxoycarbonyl, vinyloxycarbonyl, t-butyloxycarbonyl (BOC), 1, l-dimethylpropynyloxycarbonyl, benzyloxycarbonyl (CBZ), p-nitrophenylsulfinyl, p-nitrobenzyloxycarbony, 2,4-dichlorobenzyloxycarbonyl, allyloxycarbonyl (Alloc), and the like. "Carboxylic acid protecting group"and"acid protecting group"mean an easily removable group which is known in the art to protect a carboxylic acid (-C02H) group against undesirable reaction during synthetic procedures and to be selectively removable. The use of carboxylic acid protecting groups is well known in the art and many such protecting groups are known, See for example, T. H. Greene and P. G. M. Wuts, Protective Groups in Organic Synthesis, 2nd edition, John Wiley & Sons, New York (1991), the contents of which are hereby incorporated herein by reference. Examples of carboxylic acid protecting groups include methoxymethyl, methylthiomethyl, tetrahydropyranyl, benzyloxymethyl, substituted and unsubstituted phenacyl, 2,2,2-trichloroethyl, tert-butyl, cinnamyl, substituted and unsubstituted benzyl, trimethylsilyl, allyl, and the like, and amides and hydrazides groups including N, Ndimethyl, 7-nitroindolyl, hydrazide, N-phenylhydrazide, and the like. Especially preferred carboxylic acid protecting groups are tert-butyl and benzyl. "Carbon nucleophile,"as used herein, refers to an electron pair donor resided on an carbon atom. "Hydroxy protecting group"means an easily removable group which is known in the art to protect a hydroxy group against undesirable reaction during synthetic procedures and to be selectively removable. The use of hydroxy protecting groups is well known in the art and many such protecting groups are known, see., for example, T. H. Greene and P. G. M. Wuts, Protective Groups in Organic Synthesis, 2nd edition, John Wiley & Sons, New York (1991), incorporated herein by reference. Examples of hydroxy protecting groups include ether groups such as methyl ether; substituted methyl ethers such as methoxymethyl (MOM) ether, methylthiomethyl (MTM) ether, 2-methoxyethoxymethyl (MEM) ether, bis (2-chloroethoxy) methyl ether, tetrahydropyranyl (THP) ether, tetrahydrothiopyranyl ether, 4-methoxytetrahydropyranyl ether, 4-methoxytetrahydrothiopyranyl ether, tetrahydrofuranyl ether, tetrahydrothiofuranyl ether, and the like; substituted ethyl ethers such as 1-ethoxyethyl ether, I-methyl 1-methoxyethyl ether, 2- (phenylselenyl) ethyl ether, t-butyl ether, allyl ether, benzyl ether, o-nitrobenzyl ether, triphenylmethyl ether, a-naphthyldiphenylmethyl ether, p-methoxyphenyldiphenylmethyl ether, 9- (9-phenyl-10-oxo) anthranyl (tritylone) ether, and the like; silyl ethers such as trimethylsilyl (TMS) ether, isopropyldimethylsilyl ether, t-butyldimethylsilyl (TBDMS) ether, t-butyldiphenylsilyl ether, tribenzylsilyl ether, tri-p-xylylsilyl ether, triisopropylsilyl ether, and the like; esters such as formate, acetate, trichloroacetate, phenoxyacetate, isobutyrate, pivaloate, adamantoate, benzoate, 2,4,6-trimethylbenzoate, and the like; and carbonates such as methyl, 2,2,2trichloroethyl, allyl, p-nitrophenyl, benzyl, p-nitrobenzyl, S-benzyl thiocarbonate, and the like. "Amino acid"means an amino acid selected from the group consisting of natural and unnatural amino acids as defined herein. "Natural amino acid"means an a-amino acid selected from the group consisting of alanine, valine, leucine, isoleucine, proline, phenylalanine, tryptophan, methionine, glycine, serine, threonine, cysteine, tyrosine, asparagine, glutamine, lysine, arginine, histidine, aspartic acid and glutamic acid. "Unnatural amino acid"means an amino acid for which there is no nucleic acid codon. Examples of unnatural amino acids include, for example, the D-isomers of the natural a-amino acids as indicated above; aminobutyric acid (Abu), aminoisobutyric acid (Aib), 3-aminoisobutyric acid (bAib), norvaline (Nva), P-Ala, 2-aminoadipic acid (Aad), 3-aminoadipic acid (bAad), 2-aminobutyric acid (Abu), y-aminobutyric acid (Gaba), 6-aminocaproic acid (Acp), 2,4-diaminobutryic acid (Dbu), a- aminopimelic acid, trimethylsilyl-Ala (TMSA), allo-isoleucine (aIle), norleucine (Nle), tert-Leu, citrulline (Cit), ornithine (Orn), 2,2'-diaminopimelic acid) (Dpm), 2,3-diaminopropionic acid (Dpr), a-or (3-Nal, cyclohexyl-Ala (Cha), hydroxyproline, sarcosine (Sar), and the like; cyclic amino acids; Na-alkylated amino acids such as Na-methylglycine (MeGly), Na-ethylglycine (EtGly) and N-ethylasparagine (EtAsn); and amino acids in which the a-carbon bears two side-chain substituents. "Equivalent amino acid"means an amino acid which may be substituted for another amino acid in the peptides according to the invention without any appreciable loss of function. In making such changes, substitutions of like amino acids is made on the basis of relative similarity of side chain substituents, for example regarding size, charge, hydrophilicity, hydropathicity and hydrophobicity as described herein. "Peptide"and"polypeptide"mean a polymer in which the monomers are natural or unnatural amino acid residues joined together through amide bonds. The term"peptide backbone"means the series of amide bonds through which the amino acid residues are joined. The term"amino acid residue" means the individual amino acid units incorporated into the peptides or polypeptides. "Aliphatic"means a radical derived from a non aromatic C-H bond by removal of the hydrogen atom. The aliphatic radical may be further substituted by additional aliphatic or aromatic radicals as defined herein. Representative aliphatic groups include alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkenyl, heterocyclyl, heterocyclenyl, aralkenyl, aralkyloxyalkyl, aralkyloxycarbonylalkyl, aralkyl, aralkynyl, aralkyloxyalkenyl, heteroaralkenyl, heteroaralkyl, heteroaralkyloxyalkenyl, heteroaralkyloxyalkyl, heteroaralkynyl, fused arylcycloalkyl, fused heteroarylcycloalkyl, fused arylcycloalkenyl, fused heteroarylcycloalkenyl, fused arylheterocyclyl, fused heteroarylheterocyclyl, fused arylheterocyclenyl, fused heteroarylheterocyclenyl, and the like. "Aromatic"means a radical containing one or more groups of atoms in a cyclic array that contains clouds of delocalized 7r electrons above and below the plane of the atoms; furthermore, the n clouds must contain a total of (4q+2) 7 electrons, where q is any positive integer."Aromatic"includes both aryl and heteroaryl rings as defined herein. The aryl or heteroaryl ring may be further substituted by additional aliphatic or aromatic radicals as defined herein. Representative aromatic groups include aryl, fused cycloalkenylaryl, fused cycloalkylaryl, fused heterocyclylaryl, fused heterocyclenylaryl, heteroaryl, fused cycloalkylheteroaryl, fused cycloalkenylheteroaryl, fused heterocyclenylheteroaryl, fused heterocyclylheteroaryl, and the like. "Acyl"means an H-CO-or alkyl-CO-group wherein the alkyl group is as herein described. Preferred acyls contain a lower alkyl. Exemplary acyl groups include formyl, acetyl, propanoyl, 2 methylpropanoyl, butanoyl and palmitoyl. "Acylamino"is an acyl-NH-group wherein acyl is as defined herein. "Alkenoyl"means an alkenyl-CO-group wherein alkenyl is as defined herein. "Alkenyl"means a straight or branched aliphatic hydrocarbon group of 2 to about 15 carbon atoms which contains at least one carbon-carbon double bond. Preferred alkenyl groups have 2 to about 12 carbon atoms; more preferred alkenyl groups have 2 to about 4 carbon atoms. The alkenyl group is optionally substituted with one or more alkyl group substituents as defined herein. Representative alkenyl groups include ethenyl, propenyl, n-butenyl, i-butenyl, 3-methylbut-2-enyl, n-pentenyl, heptenyl, octenyl, cyclohexylbutenyl and decenyl. "Alkenylenyl"denotes a divalent group derived from a straight or branched chain hydrocarbon containing at least one carbon-carbon double bond. Representative alkenylenyl include-CH=CH-, CH2CH=CH-,-C (CH3) =CH-,-CH2CH=CHCH2-, and the like. "Alkenyloxy"means an alkenyl-O-group wherein the alkenyl group is as herein described. Representative alkenyloxy groups include allyloxy or 3-butenyloxy. "Alkoxy"means an alkyl-O-group wherein the alkyl group is as defined herein. Representative alkoxy groups include methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, heptoxy, and the like. "Alkoxyalkylenyl"means an alkyl-O-alkylenyl-group wherein alkyl and alkylenyl are as defined herein. Representative alkoxyalkylenyl groups include methoxyethyl, ethoxymethyl, nbutoxymethyl and cyclopentylmethyloxyethyl. "Alkoxyalkoxy"means an alkyl-O-alkylenyl-O-group. Representative alkoxyalkoxy include methoxymethoxy, methoxyethoxy, ethoxyethoxy, and the like. "Alkoxycarbonyl"means an ester group; i. e. an alkyl-O-CO-group wherein alkyl is as defined herein. Representative alkoxycarbonyl groups include methoxycarbonyl, ethoxycarbonyl, tbutyloxycarbonyl, and the like. "Alkoxycarbonylalkylenyl"means an alkyl-O-CO-alkylenyl-group wherein alkyl and alkylenyl are as defined herein. Representative alkoxycarbonylalkyl include methoxycarbonylmethyl, and ethoxycarbonylmethyl, methoxycarbonyl ethyl, and the like. "Alkyl"means an aliphatic hydrocarbon group which may be straight or branched having about 1 to about 20 carbon atoms in the chain. Preferred alkyl groups have 1 to about 12 carbon atoms in the chain. Branched means that one or more lower alkyl groups such as methyl, ethyl or propyl are attached to a linear alkyl chain."Lower alkyl"means about 1 to about 4 carbon atoms in the chain which may be straight or branched. The alkyl may be substituted with one or more"alkyl group substituents"which may be the same or different, and include halo, cycloalkyl, hydroxy, alkoxy, amino, carbamoyl, acylamino, aroylamino, carboxy, alkoxycarbonyl, aralkyloxycarbonyl, or heteroaralkyloxycarbonyl. Representative alkyl groups include methyl, trifluoromethyl, cyclopropylmethyl, cyclopentylmethyl, ethyl, n-propyl, i-propyl, n-butyl, t-butyl, n-pentyl, 3-pentyl, methoxyethyl, carboxymethyl, methoxycarbonylethyl, benzyloxycarbonylmethyl, and pyridylmethyloxycarbonylmethyl. "Alkylenyl"means a straight or branched bivalent hydrocarbon chain of 1 to about 20 carbon atoms. Alkylenyl may be substituted by one or more alkyl group substituents as defined herein. Preferred alkylenyl groups are the lower alkylenyl groups having 1 to about 4 carbon atoms. Representative alkylenyl groups include methylene, ethylene, and the like. "Alkylsulfinyl"means an alkyl-SO-group wherein the alkyl group is as defined above. Preferred alkylsulfinyl groups are those wherein the alkyl group is lower alkyl. "Alkylsulfonyl"means an alkyl-SO2-group wherein the alkyl group is as defined herein. Preferred alkylsulfonyl groups are those wherein the alkyl group is lower alkyl. "Alkylsulfonylcarbamoyl"means an alkyl-S02-NH-CO-group wherein alkyl group is defined herein. Preferred alkylsulfonylcarbamoyl groups are those wherein the alkyl group is lower alkyl. "Alkylthio"means an alkyl-S-group wherein the alkyl group is as defined herein. Preferred alkylthio groups are those wherein the alkyl group is lower alkyl. Representative alkylthio groups include methylthio, ethylthio, i-propylthio, heptylthio, and the like. "Alkynyl"means a straight or branched aliphatic hydrocarbon group of 2 to about 15 carbon atoms which contains at least one carbon-carbon triple bond. Preferred alkynyl groups have 2 to about 12 carbon atoms. More preferred alkynyl groups contain 2 to about 4 carbon atoms."Lower alkynyl" means alkynyl of 2 to about 4 carbon atoms. The alkynyl group may be substituted by one or more alkyl group substituents as defined herein. Representative alkynyl groups include ethynyl, propynyl, n-butynyl, 2-butynyl, 3-methylbutynyl, n-pentynyl, heptynyl, octynyl, decynyl, and the like. "Alkynylenyl"refers to a divalent group derived by the removal of two hydrogen atoms from a straight or branched chain acyclic hydrocarbon group containing a carbon-carbon triple bond. Representative alkynylenyl include -CH=CH-,-CHECH-CH2-,-CHECH-CH (CH3)-- the like. "Alkynyloxy"means an alkynyl-O-group wherein the alkynyl group is defined herein. Representative alkynyloxy groups include propynyloxy, 3-butynyloxy, and the like. "Alkynyloxyalkylenyl"means alkyny-O-alkylenyl-group wherein alkynyl and alkylenyl are defined herein. "Amidino"or"amidine"means a group of formula EMI38.1 wherein R8 is hydrogen; R' 02C-wherein R' is hydrogen, alkyl, aralkyl or heteroaralkyl; R' O-; R' C (O)-; cyano; alkyl; nitro; or amino, and R9 is selected from hydrogen; alkyl; aralkyl; and heteroaralkyl. "Amino"means a group of formula YÚYêN- wherein YÚand Yê are independently hydrogen; acyl; or alkyl, or YÚ and Yê taken together with the N through which YÚ and Yê are linked form a 4 to 7 membered azaheterocyclyl or azaheterocyclenyl. Representative amino groups include amino (H2N-), methylamino, dimethylamino, diethylamino, and the like. "Aminoalkylenyl"means an amino-alkylenyl-group wherein amino and alkylenyl are defined herein. Representative aminoalkylenyl groups include aminomethyl, aminoethyl, dimethylaminomethyl, and the like. "Aralkenyl"means a aryl-alkenylenyl-group wherein aryl and alkenylenyl are define herein. Preferred aralkenyls contain a lower alkenyl moiety. A representative aralkenyl group is 2-phenethenyl. "Aralkyloxy"means an aralkyl-O-group wherein aralkyl is defined herein. Representative aralkoxy groups include benzyloxy, naphth-1-ylmethoxy, naphth-2-ylmethoxy, and the like. "Aralkyloxyalkylenyl"means an aralkyl-O-alkylenyl-group wherein aralkyl and alkylenyl are defined herein. A representative aralkoxyalkylenyl group is benzyloxyethyl. "Aralkyloxycarbonyl"means an aralkyl-O-CO-group wherein aralkyl is defined herein. A representative aralkoxycarbonyl group is benzyloxycarbonyl. "Aralkyloxycarbonylalkyl"means an aralkoxycarbonyl group attached to the parent molecular moiety through an alkylene. Representative aralkoxycarbonylalkyls include benzyloxycarbonylmethyl, benzyloxycarbonylethyl. "Aralkyl"means an aryl-alkylenyl-. Preferred aralkyls contain a lower alkyl moiety. Representative aralkyl groups include benzyl, 2-phenethyl, naphthlenemethyl, and the like. "Aralkyloxyalkenylenyl"means an aralkyl-O-alkenylenyl-group wherein aralkyl and alkenylenyl are defined herein. A representative aralkyloxyalkenylenyl group is 3-benzyloxyallyl. "Aralkylsulfonyl"means an aralkyl-SO2-group wherein aralkyl is defined herein. "Aralkylsulfinyl"means an aralkyl-SO-group wherein aralkyl is defined herein. "Aralkylthio"means an aralkyl-S-group wherein aralkyl is defined herein. A representative aralkylthio group is benzylthio. "Aroyl"means an aryl-CO-group wherein aryl is defined herein. Representative aroyl include benzoyl, naphth-l-oyl and naphth-2-oyl. "Aryl"means an aromatic monocyclic or multicyclic ring system of 6 to about 14 carbon atoms, preferably of about 6 to about 10 carbon atoms. The aryl is optionally substituted with one or more"ring system substituents"which may be the same or different, and are as defined herein. Representative aryl groups include phenyl and naphthyl. "Aralkynyl"means an aryl-alkynylenyl-group wherein aryl and alkynylenyl are defined herein. Representative aralkynyl groups include phenylacetylenyl and 3-phenylbut-2-ynyl. "Aryldiazo"means an aryl-N=N-group wherein aryl is defined herein. Representative aryldiazo groups include phenyldiazo and naphthyldiazo. "Arylcarbamoyl"means an aryl-NHCO-group, wherein aryl is defined herein. "Carbamyl" means a group of formula YÚYêNCO- wherein YÚ and Yê are defined herein. Representative carbamyl groups include carbamyl (H2NCO-), dimethylaminocarbamoyl (Me2NCO-), and the like. "Fused arylcycloalkenyl"means a radical derived from a fused aryl and cycloalkenyl as defined herein by removal of hydrogen atom from the cycloalkenyl portion. Preferred fused arylcycloalkenyls are those wherein aryl is phenyl and the cycloalkenyl consists of about 5 to about 6 ring atoms. The fused arylcycloalkenyl is optionally substituted by one or more ring system substituents, wherein"ring system substituent"is as defined herein. Representative fused arylcycloalkenyl include 1,2- dihydronaphthylene, indene, and the like, in which the bond to the parent moiety is through a nonaromatic carbon atom. "Fused cycloalkenylaryl"means a radical derived from a fused arylcycloalkenyl as defined herein by removal of hydrogen atom from the aryl portion. Representative fused cycloalkenylaryl are as described herein for a fused arylcycloalkenyl, except that the bond to the parent moiety is through an aromatic carbon atom. "Fused arylcycloalkyl"means a radical derived from a fused aryl and cycloalkyl as defined herein by removal of a hydrogen atom from the cycloalkyl portion. Preferred fused arylcycloalkyls are those wherein aryl is phenyl and the cycloalkyl consists of about 5 to about 6 ring atoms. The fused arylcycloalkyl is optionally substituted by one or more ring system substituents, wherein"ring system substituent"is as defined herein. Representative fused arylcycloalkyl includes 1,2,3,4tetrahydronaphthyl, and the like, in which the bond to the parent moiety is through a non-aromatic carbon atom. "Fused cycloalkylaryl"means a radical derived from a fused arylcycloalkyl as defined herein by removal of a "Fused heterocyclenylaryl"means a radical derived from a fused arylheterocyclenyl as defined herein by removal of a hydrogen atom from the aryl portion. Representative fused heterocyclenylaryl are as defined herein for a fused arylheterocyclenyl radical, except that the bond to the parent moiety is through an aromatic carbon atom. "Fused arylheterocyclyl"means a radical derived from a fused aryl and heterocyclyl as defined herein by removal of a hydrogen atom from the heterocyclyl portion. Preferred fused arylheterocyclyls are those wherein aryl is phenyl and the heterocyclyl consists of about 5 to about 6 ring atoms. The prefix aza, oxa or thia before heterocyclyl means that at least a nitrogen, oxygen or sulfur atom respectively is present as a ring atom. The fused arylheterocyclyl is optionally substituted by one or more ring system substituents, wherein"ring system substituent"is as defined herein. The nitrogen or sulphur atom of the heterocyclyl portion of the fused arylheterocyclyl is optionally oxidized to the corresponding N-oxide, S-oxide or S, S-dioxide. Representative preferred fused aryllheterocyl ring systems include indolinyl, 1,2,3,4-tetrahydroisoquinoline, 1,2,3,4-tetrahydroquinoline, IH-2,3-dihydroisoindolyl, 2,3-dihydrobenz [flisoindolyl, 1,2,3,4-tetrahydrobenz [g] isoquinolinyl, and the like, in which the bond to the parent moiety is through a non-aromatic carbon or nitrogen atom. "Fused heterocyclylaryl"means a radical derived from a fused aryheterocyclyl as defined herein by removal of a hydrogen atom from the heterocyclyl portion. Representative preferred fused heterocyclylaryl ring systems are as described for fused arylheterocyclyl, except that the bond to the parent moiety is through an aromatic carbon atom. "Carboxy"means a HO (O) C- group (i. e. a carboxylic acid). "Carboxyalkyl"means a H02C-alkylenyl-group wherein alkylenyl is defined herein. Representative carboxyalkyls include carboxymethyl and carboxyethyl. "Cycloalkyloxy"means a cycloalkyl-O-group wherein cycloalkyl is defined herein. Representative cycloalkyloxy groups include cyclopentyloxy, cyclohexyloxy, and the like. "Cycloalkyl"means a non-aromatic mono-or multicyclic ring system of about 3 to about 10 carbon atoms, preferably of about 5 to about 10 carbon atoms. Preferred cycloalkyl rings contain about 5 to about 6 ring atoms. The cycloalkyl is optionally substituted with one or more"ring system substituents"which may be the same or different, and are as defined herein. Representative monocyclic cycloalkyl include cyclopentyl, cyclohexyl, cycloheptyl, and the like. Representative multicyclic cycloalkyl include 1-decalin, norbornyl, adamantyl, and the like. "Cycloalkenyl"means a non-aromatic mono-or multicyclic ring system of about 3 to about 10 carbon atoms, preferably of about 5 to about 10 carbon atoms which contains at least one carbon-carbon double bond. Preferred cycloalkylene rings contain about 5 to about 6 ring atoms. The cycloalkenyl is optionally substituted with one or more"ring system substituents"which may be the same or different, and are as defined herein. Representative monocyclic cycloalkenyl include cyclopentenyl, cyclohexenyl, cycloheptenyl, and the like. A representative multicyclic cycloalkenyl is norbornylenyl. "Cycloalkylenyl"means a bivalent, saturated carbocyclic group having about 4 to about 8 carbon atoms. Preferred cycloalkylenyl groups include 1,2-, 1,3-, or 1,4- cis or trans-cyclohexanylene. "Diazo"means a bivalent-N=N-radical. "Chemical bond"means a direct bond. "Ethylenyl"means a-CH=CH-group. "Halo"or"halogen"mean fluoro, chloro, bromo, or iodo. "Heteroaralkenyl"means a heteroaryl-alkenylenyl-group wherein heteroaryl and alkenylenyl are defined herein. Preferred heteroaralkenyls contain a lower alkenylene moiety. Representative heteroaralkenyl groups include 4-pyridylvinyl, thienylethenyl, pyridylethenyi, imidazolylethenyl, pyrazinylethenyl, and the like. "Heteroaralkyl"means a heteroaryl-alkylenyl-group wherein heteroaryl and alkylenyl are defined herein. Preferred heteroaralkyls contain a lower alkylenyl group. Representative heteroaralkyl groups include thienylmethyl, pyridylmethyl, imidazolylmethyl, pyrazinylmethyl, and the like. "Heteroaralkyloxy"means an heteroaralkyl-O-group wherein heteroaralkyl is defined herein. A representative heteroaralkyloxy group is 4-pyridylmethyloxy. "Heteroaralkyloxyalkenyl"means a heteroaralkyl-O-alkenylenyl-group wherein heteroaralkyl and alkenylenyl are defined herein. A representative heteroaralkyloxyalkenyl group is 4-pyridylmethyloxyallyl. "Heteroaralkyloxyalkyl"means a heteroaralkyl-O-alkylene-group wherein heteroaralkyl and alkylene are defined herein. A representative heteroaralkyloxy group is 4-pyridylmethyloxyethyl. "Heteroaralkynyl"means an heteroaryl-alkynylene-group wherein heteroaryl and alkynylene are defined herein. Preferred heteroaralkynyls contain a lower alkynylene moiety. Representative heteroaralkynyl groups include pyrid-3-ylacetylenyl, quinolin-3-ylacetylenyl, 4-pyridylethynyl, and the like. "Heteroaroyl"means an means a heteroaryl-CO-group wherein heteroaryl is defined herein. Representative heteroaroyl groups include thiophenoyl, nicotinoyl, pyrrol-2-ylcarbonyl, pyridinoyl, and the like. "Heteroaryl"means an aromatic monocyclic or multicyclic ring system of about 5 to about 14 ring atoms, preferably about 5 to about 10 ring atoms, in which one or more of the atoms in the ring system is/are element (s) other than carbon, for example nitrogen, oxygen or sulfur. Preferred heteroaryls contain about 5 to about 6 ring atoms. The"heteroaryl"may also be substituted by one or more"ring system substituents"which may be the same or different, and are as defined herein. The prefix aza, oxa or thia before heteroaryl means that at least a nitrogen, oxygen or sulfur atom respectively is present as a ring atom. A nitrogen atom of a heteroaryl may be oxidized to the corresponding N-oxide. Representative heteroaryls include pyrazinyl, furanyl, thienyl, pyridyl, pyrimidinyl, isoxazolyl, isothiazolyl, oxazolyl, thiazolyl, pyrazolyl, furazanyl, pyrrolyl, pyrazolyl, triazolyl, 1,2,4-thiadiazolyl, pyridazinyl, quinoxalinyl, phthalazinyl, imidazo [1,2-a] pyridine, imidazo [2,1-b] thiazolyl, benzofurazanyl, indolyl, azaindolyl, benzimidazolyl, benzothienyl, quinolinyl, imidazolyl, thienopyridyl, quinazolinyl, thienopyrimidyl, pyrrolopyridyl, imidazopyridyl, isoquinolinyl, benzoazaindolyl, or 1,2,4-triazinyl. "Heteroaryldiazo"means an heteroaryl-N=N-group wherein heteroaryl is as defined herein. "Fused heteroarylcycloalkenyl"means a radical derived from a fused heteroaryl and cycloalkenyl as defined herein by removal of a hydrogen atom from the cycloalkenyl portion. Preferred fused heteroarylcycloalkenyls are those wherein the heteroaryl and the cycloalkenyl each contain about 5 to about 6 ring atoms. The prefix aza, oxa or thia before heteroaryl means that at least a nitrogen, oxygen or sulfur atom respectively is present as a ring atom. The fused heteroarylcycloalkenyl is optionally substituted by one or more ring system substituents, wherein"ring system substituent"is as defined herein. The nitrogen atom of the heteroaryl portion of the fused heteroarylcycloalkenyl is optionally oxidized to the corresponding N-oxide. Representative fused heteroarylcycloalkenyl include 5,6-dihydroquinolyl, 5,6-dihydroisoquinolyl, 5,6-dihydroquinoxalinyl, 5,6-dihydroquinazolinyl, 4,5-dihydro-lH-benzimidazolyl, 4,5-dihydrobenzoxazolyl, and the like, in which the bond to the parent moiety is through a non-aromatic carbon atom. "Fused cycloalkenylheteroaryl"means a radical derived from a fused heteroarylcycloalkenyl as defined herein by removal of a hydrogen atom from the heteroaryl portion. Representative fused cycloalkenylheteroaryl are as described herein for fused heteroaylcycloalkenyl, except that the bond to the parent moiety is through an aromatic carbon atom. "Fused heteroarylcycloalkyl"means a radical derived from a fused heteroaryl and cycloalkyl as defined herein by removal of a hydrogen atom from the cycloalkyl portion. Preferred fused heteroarylcycloalkyls are those wherein the heteroaryl thereof consists of about 5 to about 6 ring atoms and the cycloalkyl consists of about 5 to about 6 ring atoms. The prefix aza, oxa or thia before heteroaryl means that at least a nitrogen, oxygen or sulfur atom is present respectively as a ring atom. The fused heteroarylcycloalkyl is optionally substituted by one or more ring system substituents, wherein"ring system substituent"is as defined herein. The nitrogen atom of the heteroaryl portion of the fused heteroarylcycloalkyl is optionally oxidized to the corresponding N-oxide. Representative fused heteroarylcycloalkyl include 5,6,7,8-tetrahydroquinolinyl, 5,6,7,8-tetrahydroisoquinolyl, 5,6,7,8-tetrahydroquinoxalinyl, 5,6,7,8-tetrahydroquinazolyl, 4,5,6,7-tetrahydro-1H-benzimidazolyl, 4,5,6,7-tetrahydrobenzoxazolyl, I H-4-oxa-1, 5-diazanaphthalen-2-onyl, 1,3-dihydroimidizole- [4, 5]-pyridin-2-onyl, and the like, in which the bond to the parent moiety is through a non-aromatic carbon atom. "Fused cycloalkylheteroaryl"means a radical derived from a fused heteroarylcycloalkyl as defined herein by removal of a hydrogen atom from the heteroaryl portion. Representative fused cycloalkylheteroaryl are as described herein for fused heteroarylcycloalkyl, except that the bond to the parent moiety is through an aromatic carbon atom. "Fused heteroarylheterocyclenyl"means a radical derived from a fused heteroaryl and heterocyclenyl as defined herein by the removal of a hydrogen atom from the heterocyclenyl portion. Preferred fused heteroarylheterocyclenyls are those wherein the heteroaryl thereof consists of about 5 to about 6 ring atoms and the heterocyclenyl consists of about 5 to about 6 ring atoms. The prefix aza, oxa or thia before heteroaryl or heterocyclenyl means that at least a nitrogen, oxygen or sulfur atom is present respectively as a ring atom. The fused heteroarylheterocyclenyl is optionally substituted by one or more ring system substituents, wherein"ring system substituent"is as defined herein. The nitrogen atom of the heteroaryl portion of the fused heteroarylheterocyclenyl is optionally oxidized to the corresponding N-oxide. The nitrogen or sulphur atom of the heterocyclenyl portion of the fused heteroarylheterocyclenyl is optionally oxidized to the corresponding N-oxide, S-oxide or S, S-dioxide. Representative fused heteroarylheterocyclenyl include 7,8-dihydro [1,7] naphthyridinyl, 1,2-dihydro [2,7] naphthyridinyl, 6,7-dihydro-3H-imidazo [4,5-c] pyridyl, 1, 2-dihydro-1, 5-naphthyridinyl, 1,2-dihydro-1,6-naphthyridinyl, 1,2-dihydro-1,7-naphthyridinyl, 1,2-dihydro-1,8-naphthyridinyl, 1,2-dihydro-2,6-naphthyridinyl, and the like, in which the bond to the parent moiety is through a non aromatic carbon or nitrogen atom. "Fused heterocyclenylheteroaryl"means a radical derived from a fused heteroarylheterocyclenyl as defined herein by the removal of a hydrogen atom from the heteroaryl portion. Representative fused heterocyclenylheteroaryl are as described herein for fused heteroarylheterocyclenyl, except that the bond to the parent moiety is through an aromatic carbon or nitrogen atom. "Fused heteroarylheterocyclyl"means a radical derived from a fused heteroaryl and heterocyclyl as defined herein, by removal of a hydrogen atom from the heterocyclyl portion. Preferred fused heteroarylheterocyclyls are those wherein the heteroaryl thereof consists of about 5 to about 6 ring atoms and the heterocyclyl consists of about 5 to about 6 ring atoms. The prefix aza, oxa or thia before the heteroaryl or heterocyclyl portion of the fused heteroarylheterocyclyl means that at least a nitrogen, oxygen or sulfur atom respectively is present as a ring atom. The fused heteroarylheterocyclyl is optionally substituted by one or more ring system substituents, wherein"ring system substituent"is as defined herein. The nitrogen atom of the heteroaryl portion of the fused heteroarylheterocyclyl is optionally oxidized to the corresponding N-oxide. The nitrogen or sulphur atom of the heterocyclyl portion of the fused heteroarylheterocyclyl is optionally oxidized to the corresponding N-oxide, S-oxide or S, S-dioxide. Representative fused heteroarylheterocyclyl include 2,3-dihydro-lH pyrrol [3,4b] quinolin-2-yl, 1,2,3,4-tetrahydrobenz [b] [1,7] naphthyridin-2-yl, 1,2,3,4-tetrahydrobenz [b] [1,6] naphthyridin-2-yl, 1,2,3,4-tetrahydro-9H-pyrido [3,4-b] indol-2yl, 1,2,3,4-tetrahydro-9H-pyrido [4,3-b] indol-2yl, 2,3,-dihydro-I H-pyrrolo [3,4-b] indol-2-yl, I H-2,3,4,5-tetrahydroazepino [3,4-b] indol-2-yl, I H-2,3,4,5-tetrahydroazepino [4,3-b] indol-3-yl, I H-2,3,4,5-tetrahydroazepino [4,5-b] indol-2 yl, 5,6,7,8-tetrahydro [1,7] napthyridinyl, 1,2,3,4-tetrhydro [2,7] naphthyridyl, 2,3-dihydro [1,4] dioxino [2,3-b] pyridyl, 2,3-dihydro [1,4] dioxino [2,3-b] pryidyl, 3,4-dihydro-2H-1-oxa [4,6] diazanaphthalenyl, 4,5,6,7-tetrahydro-3H-imidazo [4,5-c] pyridyl, 6,7-dihydro [5,8] diazanaphthalenyl, 1,2,3,4-tetrahydro [1,5] napthyridinyl, 1,2,3,4-tetrahydro [1,6] napthyridinyl, 1,2,3,4-tetrahydro [1,7] napthyridinyl, 1,2,3,4-tetrahydro [1,8] napthyridinyl, 1,2,3,4-tetrahydro [2,6] napthyridinyl, and the like, in which the bond to the parent moiety is through a non-aromatic carbon or nitrogen atom. "Fused heterocyclylheteroaryl"means a radical derived from a fused heteroarylheterocyclyl as defined herein, by removal of a hydrogen atom from the heteroaryl portion. Representative fused heterocyclylheteroaryl are as described herein for fused heterarylheterocyclyl, except that the bond to the parent moiety is through an aromatic carbon atom. "Heteroarylsulphonylcarbamoyl"means a heteroaryl-S02-NH-CO-group wherein heteroaryl is defined herein. "Heterocyclenyl"means a non-aromatic monocyclic or multicyclic ring system of about 3 to about ring atoms, preferably about 5 to about 10 ring atoms, in which one or more of the atoms in the ring system is/are element (s) other than carbon, for example nitrogen, oxygen or sulfur atoms, and which contains at least one carbon-carbon double bond or carbon-nitrogen double bond. Preferred heterocyclenyl rings contain about 5 to about 6 ring atoms. The prefix aza, oxa or thia before heterocyclenyl means that at least a nitrogen, oxygen or sulfur atom respectively is present as a ring atom. The heterocyclenyl may be optionally substituted by one or more ring system substituents, wherein"ring system substituent"is as defined herein. The nitrogen or sulphur atom of the heterocyclenyl is optionally oxidized to the corresponding N-oxide, S-oxide or S, S-dioxide. Representative monocyclic azaheterocyclenyl groups include 1,2,3,4- tetrahydropyridine, 1,2-dihydropyridyl, 1,4-dihydropyridyl, 1,2,3,6-tetrahydropyridine, 1,4,5,6-tetrahydropyrimidine, 2-pyrrolinyl, 3-pyrrolinyl, 2-imidazolinyl, 2-pyrazolinyl, and the like. Representative oxaheterocyclenyl groups include 3,4-dihydro-2H-pyran, dihydrofuranyl, fluorodihydrofuranyl, and the like. A representative multicyclic oxaheterocyclenyl group is 7-oxabicyclo [2.2.1] heptenyl. Representative monocyclic thiaheterocyclenyl rings include dihydrothiophenyl, dihydrothiopyranyl, and the like "Heterocyclyl"means a non-aromatic saturated monocyclic or multicyclic ring system of about 3 to about 10 ring atoms, preferably about 5 to about 10 ring atoms, in which one or more of the atoms in the ring system is/are element (s) other than carbon, for example nitrogen, oxygen or sulfur. Preferred heterocyclyls contain about 5 to about 6 ring atoms. The prefix aza, oxa or thia before heterocyclyl means that at least a nitrogen, oxygen or sulfur atom respectively is present as a ring atom. The heterocyclyl is optionally substituted by one or more"ring system substituents"which may be the same or different, and are as defined herein. The nitrogen or sulphur atom of the heterocyclyl is optionally oxidized to the corresponding N-oxide, S-oxide or S, S-dioxide. Representative monocyclic heterocyclyl rings include 1,3-dioxolanyl, 1,4-dioxanyl, tetrahydrofuranyl, tetrahydrothiophenyl, tetrahydrothiopyranyl, and the like. Representative monocyclic azaheterocyclyl rings include piperidyl, pyrrolidinyl, piperazinyl, morpholinyl, thiomorpholinyl, thiazolidinyl and the like.. "Heterocyclylalkyl"means a heterocyclyl-alkylene-group wherein heterocyclyl and alkylene are defined herein. Preferred heterocyclylalkyls contain a lower alkylene moiety. A representative heteroaralkyl group is tetrahydropyranylmethyl. "Heterocyclylalkyloxyalkyl"means a heterocyclylalkyl-O-alkylene group wherein heterocyclylalkyl and alkylene are defined herein. A representative heterocyclylalkyloxyalkyl group is tetrahydropyranylmethyloxymethyl. "Heterocyclyloxy"means a heterocyclyl-O-group wherein heterocyclyl is defined herein. Representative heterocyclyloxy groups include quinuclidyloxy, pentamethylenesulfideoxy, tetrahydropyranyloxy, tetrahydrothiophenyloxy, pyrrolidinyloxy, tetrahydrofuranyloxy, 7-oxabicyclo [2.2.1] heptanyloxy, hydroxytetrahydropyranyloxy, hydroxy-7-oxabicyclo [2.2. I] heptanyloxy, and the like. "Hydroxyalkyl"means an alkyl group as defined herein substituted with one or more hydroxy groups. Preferred hydroxyalkyls contain lower alkyl. Representative hydroxyalkyl groups include hydroxymethyl and 2-hydroxyethyl. "N-oxide"means a EMI46.1 group. "Phenoxy"means a phenyl-O-group wherein the phenyl ring is optionally substituted with one or more ring system substituents as defined herein. "Phenylene"means a-phenyl-group wherein the phenyl ring is optionally substituted with one or more ring system substituents as defined herein. "Phenylthio"means a phenyl-S-group wherein the phenyl ring is optionally substituted with one or more ring system substituents as defined herein. "Pyridyloxy"means a pyridyl-O-group wherein the pyridyl ring is optionally substituted with one or more ring system substituents as defined herein. "Ring system substituents"mean substituents attached to aromatic or non-aromatic ring systems inclusive of hydrogen, alkyl, aralkyl, heteroaryl, aryl, heteroaralkyl, hydroxy, hydroxyalkyl, alkoxy, aryloxy, aralkoxy, acyl, aroyl, halo, nitro, cyano, formyl, carboxy, alkoxycarbonyl, aryloxycarbonyl, aralkoxycarbonyl, alkylsulfonyl, arylsulfonyl, heteroarylsulfonyl, alkylsulfinyl, arylsulfinyl, nitrile, NO2 heteroarylsulfinyl, alkylthio, arylthio, heteroarylthio, aralkylthio, heteroaralkylthio, cycloalkyl, cycloalkenyl, heterocyclyl, heterocyclenyl, aryldiazo, heteroaryldiazo, amidino, amino, aminoalkyl, carbamyl and sulfamyl. When a ring system is saturated or partially saturated, the"ring system substituent"further comprises methylene (H2C=), oxo (O=) and thioxo (S=). Preferred ring system substituents are hydrogen, CF3, fluoro, alkyl, alkoxy, nitrile or NO2. "Sulfamyl"means a group of formula Yl Y2NS02-wherein Y 1 and Y2 are defined herein. Representative sulfamyl groups are aminosulfamoyl (H2NS02-) and dimethylaminosulfamoyl (Me2NS02-). Preferred Embodiments The preparation of the fluorophenyl resin compound of formula EMI47.1 wherein A is-YC (O)- and B is-OH is shown in Scheme 1. Scheme 1 EMI47.2 <tb> <SEP> Ruz <SEP> Ro <SEP> O <SEP> ruz <tb> <SEP> Pro <tb> aNHR3 <SEP> + <SEP> HO2CVOH <SEP> R3 <tb> <SEP> C <tb> aminoresin <SEP> 1 <SEP> R <SEP> F--R <SEP> OH <tb> <SEP> F <tb> EMI48.1 <tb> <SEP> R, <SEP> Ro <SEP> 0 <SEP> R, <tb> <SEP> -"u <tb> SOH <SEP> + <SEP> HOZC <SEP> OH <tb> hydroxy <SEP> resin <SEP> 4 <SEP> R <SEP> F <SEP> 2 <SEP> F <tb> <SEP> F <tb> EMI48.2 EMI48.3 According to the foregoing Scheme 1, amino resin 1 or hydroxy resin 4 is coupled with the 4- hydroxyfluorobenzoic acid derivative 2 in a suitable organic solvent such as dichloromethane, DMF, DMSO or THF to form the 4-hydroxyfluorobenzamido resin compound 3 or 4-hydroxyfluorobenzoyloxy resin compound 5. Coupling times range from about 2 to about 24 hours, depending upon the amino resin and 4-hydroxyfluorobenzoic acid derivative to be coupled, activating agent, solvent and temperature. The coupling is accomplished at from about-10 C to about 50 C, preferably at about ambient temperature. The carboxylic acid moiety is activated with an appropriate activating agent (for a list of activating agents, with specific references, see Arrieta et al., Synn. Commun. 13,471, 1983) such as isopropyl chloroformate in the presence of N-methylmorpholine, diisopropylcarbodiimide (DIC) in the presence of 1-hydroxybenzotriazole (HOBT), diisopropylcarbodiimide (DIC) in the presence of 4-dimethylaminopyridine (DMAP), bis (2-oxo-3-oxazolidinyl)-phosphonic chloride (BOP CI) in the presence of triethylamine, bromotripyrrolidinophosphonium hexafluorophosphate (PyBroPTM) in the presence oftriethylamine (TEA), 2- (IH-benzotriazole-1-yl)-1,1,3,3-tetramethyluronium tetrafluoroborate (TBTU) in the presence of diisopropylethyl amine, N-hydroxysuccinimide in the presence of N, N'-dicyclohexylcarbodiimide (DCC),, pyridinium salts-Bu3N, phenyl dichlorophosphate PhOPOCI2,2-chloro-1,3,5-trinitrobenzene and pyridine, polyphosphate ester, chlorosulfonyl isocyanate CISO2NCO, chlorosilane, MeSO2CI-Et3N, PH3P-CCI4-Et3N, and the like. A preferred amino resin 1 for preparing the 4-hydroxyfluorobenzamido resins of this invention is aminomethyl polystyrene. Depending on the size of the particles, (200 or 400 mesh), aminomethyl polystyrene has loading ranges of from about 0.5 to about 1.2 mmol/g and from about 0.1 to about 0.5 mmol/g, respectively. A preferred hydroxy resin 4 is hydroxymethyl resin. In a preferred method of preparing the 4-hydroxyfluorobenzamido resin 3, a mixture of the 4hydroxyfluorobenzoic acid derivative 2, aminomethyl polystyrene, diisopropylcarbodiimide (DIC) and 4-dimethylaminopyridine (DMAP) in anhydrous DMF is stirred at about ambient temperature for about 18 hours. The 4-hydroxyfluorobenzamido resin 3 is then filtered, washed with one or more solvents and dried. The preparation of the fluorophenyl resin compound of formula EMI49.1 D is CH or N and B is OH is shown in Scheme 2. Scheme 2 EMI49.2 azacycloalkyl resin 6 As shown in the Scheme 2 above, coupling of the azacycloalkyl resin compound 6 with the 4-hydroxyfluorobenzoic acid compound 2 provides the 4-hydroxyfluorobenzoyl-azacycloalkyl resin compound 7. The coupling is accomplished using the reagents and conditions described in Scheme 1 above. A preferred azacycloalkyl resin compound is (piperidinomethyl) polystyrene, designated herein as EMI49.3 (piperidinomethyl) polystyrene The preparation of the fluorophenyl resin compound of formula EMI49.4 and B is F, OH, S03H or SO2CI is shown in Scheme 3. Scheme 3 EMI50.1 <tb> <SEP> Ri <SEP> ru <tb> <SEP> 1 <SEP> ru <tb> S- <SEP> + <SEP> CI <SEP> XF <tb> polystyrene <SEP> 2 <SEP> 8 <SEP> F <tb> <SEP> R <tb> <SEP> 2 <SEP> 8 <tb> <SEP> OU <tb> <SEP> if <tb> <SEP> R2 <SEP> F <SEP> R2 <SEP> F <tb> <SEP> Ro <SEP> Ri <SEP> Ro <tb> <SEP> 0 <SEP> r"O <tb> <SEP> -'S <SEP> S2ci <tb> <SEP> 11 <SEP> ZF <SEP> 12 <tb> As shown in Scheme 3, Friedel-Crafts acylation of polystyrene with the 4-fluorofluorobenzoyl chloride derivative 8, in the presence of a Lewis acid such as FeCl3, SnCl4 or AlCl3 in a suitable organic solvent provides the 4-fluorofluorobenzoyl resin compound 9. Reaction of 9 with hydroxide provides the 4-hydroxyfluorobenzoyl resin compound 10. In a preferred aspect, polystyrene is acylated with the 4-fluorobenzoyl chloride derivative 8 in the presence of AICI3 in nitrobenzene to provide the 4-fluorobenzoyl resin compound 9. A mixture of 9 in water/cyclohexane is treated with sodium hydroxide and tetrabutylammonium hydrogen sulfate according to the procedure of Feldman et al., J. Org. Chem., 56 (26), 7350-7354 (1991), to provide the 4hydroxypolyfluorobenzoyl resin co EMI51.1 wherein A is-NR3S0,-and B is F or OH is outlined in Scheme 4. Scheme 4 EMI51.2 <tb> <SEP> R <SEP> Ro <SEP> O., <SEP> O <SEP> Rt <tb> <SEP> Ri <SEP> Ro <SEP> 0 <SEP> 0 <SEP> R, <tb> <SEP> S-NHR3+ <SEP> CI-SH <SEP> F2 <SEP> I <tb> <SEP> O <SEP> 13 <SEP> 14 <SEP> R2 <SEP> OH <tb> amino <SEP> resin <SEP> 0 <SEP> R <SEP> Ro <tb> <SEP> R <SEP> F <tb> <SEP> F <tb> <SEP> -u <tb> <SEP> R, <SEP> Ro <SEP> 0 <SEP> R, <tb> <SEP> O <SEP> 15 <SEP> 16 <SEP> R <SEP> F <tb> <SEP> amino <SEP> resin <SEP> R <SEP> F <tb> <SEP> R <tb> <SEP> J <SEP> OSO <SEP> R <tb> <SEP> 0 <SEP> 0 <SEP> R, <tb> <SEP> R3 <SEP> I <tb> <SEP> am! <SEP> nores! <SEP> n"R <SEP> F <SEP> <tb> <SEP> oo <SEP> Ri <tb> <SEP> f <SEP> Q) <SEP> Q <SEP> JL <SEP> 0 <tb> <SEP> 3 <SEP> JJ.. <SEP> 1 <tb> <SEP> 14 <SEP> Cí <SEP> OH <tb> <SEP> F <tb> As shown in Scheme 4, reaction of amino resin I with the 4-hydroxyfluorophenylsulfonyl chloride compound 13 in the presence of base such as N-methylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF, provides the 4-hydroxyfluorophenylsulfonamide resin compound 14. The reaction is preferably conducted in dichloromethane in the presence of collidine. Alternatively, amino resin 1 is reacted with the 4-fluorofluorophenylsulfonyl chloride compound 15 as described above to give the 4-fluorofluorophenylsulfonamide resin compound 16 which is converted to the desired 4-hydroxyfluorophenylsulfonamide resin compound 14 under reaction conditions analogous to those described for the conversion of 9 to 10, as described in Scheme 3 above. * The preparation of the fluorophenyl resin compound of formula EMI52.1 wherein A is-C6H4-and B is F, OH, S03H or SOUCI is shown in Scheme 5. Scheme 5 EMI52.2 <tb> <SEP> (10- <SEP> (0- <tb> polystyrene <tb> <SEP> Ro <tb> B <SEP> (OH), <SEP> L < F <tb> <SEP> 18 <SEP> R2 <SEP> F <SEP> 19 <tb> <SEP> L=Br, <SEP> CI, <SEP> I <tb> <SEP> R <SEP> Ro <SEP> R <SEP> Ro <tb> <SEP> S <SEP> F <SEP> S <SEP> OH <tb> <SEP> R, <SEP> F <SEP> R, <SEP> F <tb> <SEP> Ri <SEP> Ro <SEP> Ri <SEP> Ro <tb> <SEP> s <SEP> so3H-s <SEP> so2ci <tb> <SEP> 22 <SEP> R2 <SEP> 23 <SEP> R2 <tb> As shown in Scheme 5, bromination of polystyrene, for example using Br2 in the presence of FeCI3, Tl (OAc) 3 or BF3 gives the brominated polystyrene resin compound 17. Metal halogen exchange, for example using an alkyllithium reagent such as n-butyllithium in benzene or TMEDA; addition of trimethylborate; and acidic workup provides the polystyryl boronic acid resin compound 18. Coupling of compound 18 with the fluorophenyl halide compound 19 using Suzuki conditions (catalytic Pd (0), basic conditions; See Frenette et al., Tetrahedron Lett., and Brown et al., J. Amer. Chem. Soc., provides the 4-fluorofluorophenyl polystyrene resin compound 20. Conversion of 20 to the 4-hydroxyfluorophenyl polystyrene resin compound 21, fluorophenyl-4-sulfonic acid polystyrene resin compound 22 or the fluorophenyl-4-sulfonyl chloride polystyrene resin compound 23 is accomplished under reaction conditions analogous to those described in Scheme 3 above. The preparation of the fluorophenyl resin compound of formula EMI53.1 wherein A is-C6H4-SO, and B is F or OH is outlined in Scheme 6 which describes the preparation of 4-hydroxy-polyfluorophenylsulfonyl-polystyrene resin. It is understood that the methodology described below may be readily adapted to the preparation of additional 4hydroxyfluorophenylsulfonyl resin compounds. Scheme 6 EMI53.2 <tb> <SEP> F <SEP> Ro <SEP> F <SEP> Ro <tb> <SEP> (SH <SEP> + <SEP> Fw <SEP> F- <SEP> ()-s-o <SEP> : <SEP> F <tb> thiopolystyrene <SEP> F <SEP> F <SEP> 24 <SEP> F <SEP> F <tb> <SEP> '\ <SEP> Po <tb> <SEP> 25 <SEP> F <SEP> F <tb> <SEP> 25 <SEP> F <SEP> F <tb> <SEP> F <SEP> Ro <tb> <SEP> s <SEP> oh <tb> <SEP> 26'' <tb> <SEP> O <tb> <SEP> 26 <SEP> F <SEP> F <tb> As shown in the foregoing Scheme 6, reaction of thiopolystyrene with hexafluorobenzene results in formation of the polyfluorophenylthio-polystyrene resin compound 24. The reaction is preferably carried out in a suitable solvent such as toluene, dioxane, DMF or DMSO, in the presence of base, preferably catalytic pyridine or N-methylmorpholine. Conversion of 24 to the 4-hydroxy polyfluorophenylthio-polystyrene resin compound 25 is accomplished as described in Scheme 3 above. Oxidation of 25, for example using m-chloroperbenzoic acid (MCPBA) provides of 4-hydroxy polyfluorophenylsulfonyl-polystyrene resin 26. Preferred fluorophenyl resin compounds of this invention have formula I wherein Ro, R, and R2 are independently nitro, monohaloalkyl, dihaloalkyl, trihaloalkyl (e. g., CF3), bromo, chloro, fluoro, cyano, alkoxy, formyl, lower alkanoyl, lower alkylsulfonyl, lower alkylsulfinyl, and the like. Preferably, fluoro. Preferred fluorophenyl resin compounds of this invention have formula I wherein Ro, R, and R2 are F; R4, R5, R6 and R7 are H; and B is OH, S03H or SO, CL. Representative preferred fluorophenyl resin compounds include, but are not limited to: 4-hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-polystyrene resin, designated herein as EMI54.1 4- (N, N'-didisopropyl-isourea)-2,3,5,6-tetrafluorotetrafluorobenzamidomethyl-copoly (styrene-I %- divinylbenzene)-resin, designated herein as EMI54.2 4- (tripyrolidinium-0-phosphonium)-2,3,5,6-tetrafluorotetrafluorobenzamidomethyl- copoly (styrene-1%-divinylbenzene)-resin, designated herein as EMI54.3 2,3,5,6-tetrafluorobenzamidomethyl-4-sulfonic acid-polystyrene resin, designated herein as EMI54.4 2,3,5,6-tetrafluorobenzamidomethyl-4-sulfonyl chloride-polystyrene resin, designated herein as EMI55.1 4-hydroxy-2,3,5,6-tetrafluorobenzoyloxymethyl-polystyrene resin, designated herein as EMI55.2 2,3,5,6-tetrafluorobenzoyloxymethyl-4-sulfonic acid-polystyrene resin, designated herein as EMI55.3 2,3,5,6-tetrafluorobenzoyloxymethyl-4-sulfonyl chloride-polystyrene resin, designated herein as EMI55.4 4-hydroxy-2,3,5,6-pentafluorobenzoyl-polystyrene resin, designated herein as EMI55.5 2,3,5,6-tetrafluorobenzoyl-4-sulfonic acid-polystyrene resin, designated herein as EMI56.1 2,3,5,6-tetrafluorobenzoyl-4-sulfonyl chloride-polystyrene resin, designated herein as EMI56.2 4-hydroxy-2,3,5,6-tetrapolyfluorophenylsulfonamidomethyl-polystyrene resin, designated herein as EMI56.3 2,3,5,6-tetrapolyfluorophenylsulfonamidomethyl-4-sulfonic acid-polystyrene resin, designated herein as EMI56.4 2,3,5,6-tetrapolyfluorophenylsulfonamidomethyl-4-sulfonyl chloride-polystyrene resin, designated herein as EMI56.5 N- (4-hydroxy-2,3,5,6-tetrafluorobenzoyl)-piperidinomethyl-polystyrene resin, designated herein as EMI57.1 N- (2,3,5,6-tetrafluorobenzoyl-4-sulfonic acid)-piperidinomethyl-polystyrene resin, designated herein as EMI57.2 N- (2,3,5,6-tetrafluorobenzoyl-4-sulfonyl chloride)-piperidinomethyl-4-polystyrene resin, designated herein as EMI57.3 N- (4-hydroxy-2,3,5,6-tetrapolyfluorophenylsulfonyl)-piperidinomethyl-polystyrene resin, designated herein as EMI57.4 N- ( (2,3,5,6-tetrapolyfluorophenyl-4-sulfonic acid) sulfonyl)-piperidinomethyl-polystyrene resin, designated herein as EMI57.5 N- ( (2,3,5,6-tetrapolyfluorophenyl-4-sulfonyl chloride) sulfonyl)-piperidinomethyl-polystyrene resin, designated herein as EMI58.1 4-hydroxy-2,3,5,6-tetrapolyfluorophenyl-polystyrene resin, designated herein as EMI58.2 2,3,5,6-tetrapolyfluorophenyl-4-sulfonic acid-polystyrene resin, designated herein as EMI58.3 2,3,5,6-tetrapolyfluorophenyl-4-sulfonyl chloride polystyrene resin, designated herein as EMI58.4 4-hydroxy-2,3,5,6-tetrapolyfluorophenylsulfonyl-polystyrene resin, designated herein as EMI58.5 2,3,5,6-tetrapolyfluorophenylsulfonyl-4-sulfonic acid-polystyrene resin, designated herein as EMI58.6 2,3,5,6-tetrapolyfluorophenylsulfonyl-4-sulfonyl chloride-polystyrene resin, designated herein as EMI59.1 More preferred polyfluorophenyl resin compounds have formula I wherein A is selected from-L-SO2-,-L-NR3S02-, EMI59.2 EMI59.3 L is a chemical bond, EMI59.4 m is 1 to 5; Y is NR3 or NR3S02; B is-OH,-SO3H, or-SO2CI; and R3 is H. Representative more preferred fluorophenyl resin compounds include, but are not limited to 4-hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-polystyrene resin, 2,3,5,6-tetrafluorobenzamidomethyl-4-sulfonic acid-polystyrene resin, 2,3,5,6-tetrafluorobenzamidomethyl-4-sulfonyl chloride-polystyrene resin, 4-hydroxy-2,3,5,6-pentafluorobenzoyl-polystyrene resin, 2,3,5,6-tetrafluorobenzoyl-4-sulfonic acid-polystyrene resin, 2,3,5,6-tetrafluorobenzoyl-4-sulfonyl chloride-polystyrene resin, 4-hydroxy-2,3,5,6-tetrapolyfluorophenylsulfonamidomethyl-polystyrene resin, 4- (tripyrolidinium-0-phosphonium)-2,3,5,6-tetrafluorotetrafluorobenzamidomethyl- copoly (styrene-1 %-divinylbenzene)-resin, 4- (N, N'-didisopropyl-isourea)-2,(N, N'-didisopropyl-isourea)-2, 3,5, 6-tetrafluorotetrafluorobenzamidomethyl-copoly (styrene-1 %- divinylbenzene)-resin 2,3,5,6-tetrapolyfluorophenylsulfonamidomethyl-4-sulfonic acid-polystyrene resin and 2,3,5,6-tetrapolyfluorophenylsulfonamidomethyl-4-sulfonyl chloride-polystyrene resin. The preparation of fluorophenyl activated ester resin compounds using the fluorophenyl resin compounds of this invention is shown in Scheme 7. In Scheme 7, Ra represents any aliphatic or aromatic group amenable to coupling of the carboxylic acid compound 27 with the fluorophenyl resin compound IA using the reaction conditions described herein. The group Ra may be further substituted and may contain functional groups suitable for further chemical transformations while attached to the resin. It is understood that these functional groups may be suitably protected to prevent interference with the coupling reaction and subsequent cleavage reaction described below. For a comprehensive treatise on the protection and deprotection of common functional groups see T. H. Greene and P. G. M. Wuts, Protective Groups in Organic Synthesis, 2nd edition, John Wiley & Sons, New York (1991), incorporated herein by reference. Scheme 7 EMI60.1 According to the foregoing Scheme 7, carboxylic acid compound 27 is coupled to the fluorophenyl resin compound IA using coupling conditions analogous to those described in Scheme 1 above to form the fluorophenyl activated ester resin compound II. Coupling times range from about 2 to about 24 hours depending on the nature of the fluorophenyl resin compound 1, carboxylic acid 27, solvent, reaction temperature and activating agent. Coupling is preferably accomplished using diisopropylcarbodiimide (DIC) optionally in the presence of catalytic 4-dimethylaminopyridine (DMAP), or bromotripyrrolidinophosphonium hexafluorophosphate (PyBroPTM) in the presence of triethylamine (TEA). The coupling reaction being carried out in a suitable solvent such as benzene, dichloromethane, dichloroethane, dioxane, THF or DMF at about ambient temperature over about 18 hours. A preferred solvent is anhydrous DMF. The fluorophenyl activated ester resin compound II is then washed with a suitable organic solvent or solvents to remove excess reagents. The fluorophenyl activated ester resin compound II may be dried and stored for future use or used directly in subsequent reactions. The fluorophenyl activated ester resin compound II is odorless, air stable and free flowing. It is stable to storage at ambient temperature, and may be handled without any special precautions. A slurry of the fluorophenyl activated ester resin compound II in a solvent mixture such as DMF: dichloromethane may be used to distribute the resin via pipette, thereby facilitating automation. In contrast many acid chlorides and sulfonyl chlorides decompose under similar conditions, and are usually unstable to moisture in the air. The cleavage of the fluorophenyl activated ester resin compound 11 with an amine is shown in Scheme 8. In Scheme 8, Rb and R represent independently H, an aliphatic group or an aromatic group, or Rb and Rc, together with the N-atom to which they are attached form an optionally substituted azacycloalkyl ring or azacycloalkenyl ring, wherein Rb and R. are amenable to the reaction of the amine 28 with the carbonyl moiety of the fluorophenyl activated ester resin compound II to effect the cleavage reaction described below using the reaction conditions described herein, Scheme 8 EMI61.1 <tb> <SEP> 1 <SEP> Ro <SEP> O <tb> (i} <SEP> A <SEP> 9oA <SEP> HNRbRC <SEP> (28) <SEP> RbN) <SEP> 4R <tb> <SEP> --'o <tb> <SEP> Ra <SEP> R <SEP> 29 <tb> <SEP> il <tb> <SEP> a) <SEP> H2NOI <tb> <SEP> a) <SEP> a) <SEP> H2NOP <SEP> (30) <tb> <SEP> O <tb> <SEP> b) <SEP> deprotect <tb> <SEP> 1 <SEP> 31 <tb> <SEP> H As shown in Scheme 8, the fluorophenyl activated ester resin compound II is cleaved by reaction with anamine of formula HNRbRC in an organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF at from about 20 C to about 60 C to prepare the amide 29. The reaction temperature and amount of time required for the cleavage reaction depends on the nature of the substituents Rb and Rc. Cleavage is generally accomplished at about ambient temperature over about 2 to about 48 hours. A catalyst such as 4-dimethylaminopyridine is optionally added to accelerate the cleavage reaction. In a similar manner, the fluorophenyl activated ester resin compound II is cleaved by reaction with a hydroxylamine of formula H2NOP wherein P is a hydroxy protecting group, preferably tetrahydropyranyl (THP). Removal of the hydroxy protecting group, for example using trifluoroacetic acid/dichloromethane when P is THP, provides the hydroxamic acid 31. The reactivity of the fluorophenyl activated ester resin compound II toward cleavage by amines is comparable to the reactivity of the corresponding unsupported acylating reagent. Many amines possessing varying reactivities, including deactivated anilines such as 4-nitroaniline, react with the fluorophenyl activated ester resin compound II to give amide products. Typically less than one equivalent of the nucleophile is required to afford quantitative acylation of the nucleophile. Polyfluorophenyl activated ester resin compounds possess further advantages over unsupported activated esters (i. e. pentafluorophenol, 4-nitrophenol) as well as acylating agents such as acid chlorides or acid anhydrides, including product isolation comprising simple filtration and solvent evaporation. There is no salt by-product or phenol by-product. The proton generated during the cleavage reaction is scavenged by the resin-bound fluorophenolate anion, therefore, in general, no excess base is required. The fluorophenyl resin compounds of this invention are also useful for the preparation of peptides. In general, this method involves coupling the carboxyl group of a suitably N-protected first amino acid to the resin to form the resin-bound N-protected fluorophenyl activated ester resin compound, followed by cleavage of the fluorophenyl activated ester resin compound with a carboxy protected second amino acid to form a dipeptide which is protected at the carboxy and N termini. If desired, a third amino acid is added by removing the N-protection from the dipeptide prepared as described above to form the carboxy protected dipeptide and cleaving the fluorophenyl activated ester resin compound of the third amino acid (suitably N-protected) to form the tripeptide which is protected at the carboxy and N termini. This process is then repeated until the desired amino acid residues have been incorporated in the peptide. Alternatively, peptides comprising multiple amino acids are prepared by coupling a suitably N-protected peptide subunit comprising two or more amino acids to the fluorophenyl resin compound to form the fluorophenyl activated ester resin compound, and cleaving the fluorophenyl activated ester resin compound with a carboxy protected amino acid or second peptide subunit. Thus, in addition to the sequential addition of amino acids described above, a polypeptide may be prepared using the fluorophenyl resin compounds of this invention by coupling a N-protected peptide to the resin and cleaving the N-protected peptide fluorophenyl activated ester resin compound with a carboxy protected amino acid or peptide, or by coupling a N-protected amino acid to the resin and cleaving the N-protected amino acid fluorophenyl activated ester resin compound with a carboxy protected peptide. N-protecting groups suitable for use in peptide synthesis using the fluorophenyl resin compounds of this invention should have the properties of being stable to the conditions of coupling to the amino acid or peptide to the fluorophenyl resin compound and cleavage of the fluorophenyl activated ester resin compound, while being readily removable without destruction of the growing peptide chain or racemization of any of the chiral centers contained therein. Suitable protecting groups include 9 fluorenylmethyloxycarbonyl (Fmoc), t-butyloxycarbonyl (Boc), benzyloxycarbonyl (Cbz), biphenylisopropyloxycarbonyl, t-amyloxycarbonyl, isobornyloxycarbonyl, (a, a) dimethyl-3, 5-dimethoxybenzyloxycarbonyl, o-nitrophenylsulfenyl, 2-cyano-t-butyloxycarbonyl, and the like. Carboxy protecting groups suitable for use in peptide synthesis using the fluorophenyl resin compounds of this invention should have the properties of being stable to cleavage of the resin-bound fluorophenyl activated ester, while being readily removable without destruction of the growing peptide chain or racemization of any of the chiral centers contained therein. Examples of carboxy protecting groups include esters such as methoxymethyl, methylthiomethyl, tetrahydropyranyl, benzyloxymethyl, substituted and unsubstituted phenacyl, 2,2,2-trichloroethyl, tert-butyl, cinnamyl, substituted and unsubstituted benzyl, trimethylsilyl, allyl, and the like, and amides and hydrazides including N, Ndimethyl, 7-nitroindolyl, hydrazide, N-phenylhydrazide, and the like. Especially preferred carboxylic acid protecting groups are tert-butyl and benzyl. The fluorophenyl resin compounds of this invention are also useful for the preparation of amines as outlined in Schemes 9a and 9b. In scheme 9a, A, Ro, R"R2, Ra) Rb and Rc are as defined herein. Scheme 9a EMI63.1 As shown in Scheme 9a, the 4- (oxysulfonyl) fluorophenyl resin compound 33 is prepared by reacting the fluorophenyl-4-sulfonyl chloride resin compound III with the hydroxy compound RaOH 32. The reaction is preferably carried out at ambient temperature in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF, in the presence of a base such as N-methylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine. Reaction of the 4- (oxysulfonyl) fluorophenyl resin compound 33 with the amine 28 provides the amine 34. An alternative preparation of amines using the fluorophenyl resin compound of this invention is shown in Scheme 9b. In Scheme 9b, A, Ruz R,, R2, and Ra is as defined herein and Ri represents a group of formula-CH2Rf wherein Rf is an aliphatic or aromatic group amenable to reaction with the N- substituted fluorophenyl-4-sulfonamido resin compound 36 to form the N, N-disubstituted fluorophenyl4-sulfonamido resin compound 39, and reaction of 39 with a thiol, using the reaction conditions described below. Scheme 9b EMI64.1 As shown in Scheme 9b, reaction of the fluorophenyl-4-sulfonyl chloride resin compound III with the primary amine 35 in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF, in the presence of a base such as N-methylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine provides the N-substituted fluorophenyl-4-sulfonamido resin compound 36. Reaction of 36 with an alkylating agent of formula RiX wherein X is Br or Cl, in a suitable organic solvent such as THF or DMF, in the presence of a base such as triethylamine or cesium carbonate ; or with an alcohol of formula RIOH using Mitsunobu conditions (diethylazodicarboxylate or diisopropylazodicarboxylate and triphenylphosphine or tributylphosphine) provides the N, N-disubstituted fluorophenyl-4-sulfonamido resin compound 39. The secondary amine 40 is then displaced by treatment of the N, N-disubstituted fluorophenyl-4-sulfonamido resin compound 39 with a thiol compound such as thiophenol or ethanethiol. The fluorophenyl resin compounds of this invention are also useful for the preparation of sulfonamides wherein Ru Rb and R are as defined herein is outlined in Scheme 10. Scheme 10 EMI65.1 As shown in Scheme 10, reaction of the fluorophenyl resin compound IA with the sulfonyl chloride compound 41 or the sulfonic anhydride 42 results in formation of the 4- (sulfonyloxy) fluorophenyl resin compound 44. The reaction is preferably conducted at about ambient temperature in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF in the presence of a base such as N-methylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine. The 4- (sulfonyloxy) fluorophenyl resin compound 44 is also prepared by coupling of IA with the sulfonic acid compound 43, using analogous reagents and reaction conditions as described in Scheme 7, above. A preferred activating agent is diisopropylcarbodiimide (DIC). Reaction of the 4- (sulfonyloxy) fluorophenyl resin compound 44 with the amine 28 in a suitable organic solvent as described above, preferably a polar aprotic solvent such as DMF, results in formation of the sulfonamide 45. The preparation of carbamates 47 and urethanes 48 using the fluorophenyl resin compound of this invention is outlined in Scheme 11. In Scheme 11, Ras Rb and Rc are defined herein and Rd and Re represent independently H, an aliphatic group or an aromatic group amenable, or Rd and Re together with the N-atom to which they are attached form an optionally substituted azacycloalkyl ring or azacycloalkenyl ring, wherein Rd and Re are amenable to the reaction conditions described herein for cleavage of the 4- (aminocarbonyloxy) fluorophenyl resin compound 46. Scheme 11 EMI66.1 As shown in Scheme 11, reaction of the 4- (aminocarbonyloxy) fluorophenyl resin compound 46 with the hydroxy compound RaOH in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF, in the presence of a base such as N-methylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine results in formation of the carbamate 47. Likewise, reaction of 46 with an amine of formula HNRdRe in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF, in the presence of a base such as Nmethylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine results in formation of the urethane 48. The 4- (aminocarbonyloxy) fluorophenyl resin compound 46 is prepared by reaction of the fluorophenyl resin compound IA with phosgene or 1,1'-carbonyldiimidazole in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF, optionally in the presence of a base such as N-methylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine, results in formation of the (4-carbonyloxy) fluorophenyl resin compound 49. Reaction of 49 with the amine of formula HNRbR, in a suitable organic solvent and base as described above gives the 4- (aminocarbonyloxy) fluorophenyl resin compound 46. The 4- (aminocarbonyloxy) fluorophenyl resin compound 46 is may also be prepared in a single step by reaction of the fluorophenyl resin compound IA with a carbamoyl chloride of formula CIC (O) NRbRc. The reaction is performed in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF, in the presence of a base such as N-methylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine. In cases in which one of Rb and R is H and the other is aliphatic or aromatic, the 4- (aminocarbonyloxy) fluorophenyl resin compound 46 may be prepared by reaction of I with the isocyanate of formula O=C=N-Rb or O=C=N-R, in a suitable organic solvent optionally in the presence of a base as described above The use of the fluorophenyl resin compound of this invention for the preparation of carbonates and in an alternative route to carbamates is shown in Scheme 12. In Scheme 12, Ra, Rb, R and Rf are as defined herein. Scheme 12 EMI67.1 As shown in Scheme 12, reaction of the fluorophenyl resin compound IA with a chloroformate of formula ClC (O) ORa in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF, optionally in the presence of a base such as N-methylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine provides the 4- (oxycarbonyloxy) fluorophenyl resin compound 49. Reaction of 49 with the amine HNRbRC as described in Scheme 11 results in formation of the carbamate 47. Likewise, reaction of 49 with an alcohol of formula RfOH in a suitable organic solvent such as dichloromethane, dichloroethane, dioxane, THF or DMF, optionally in the presence of a base such as N-methylmorpholine, pyridine, collidine, triethylamine or diisopropylethylamine provides the carbonate 50. Additionally, the fluorophenyl resin compounds of this invention are useful for constructing arrays of amide, peptide, hydroxamic acid, amine or sulfonamide combinatorial libraries or arrays of amides, peptides, hydroxamic acids, amines or sulfonamides as reagents in combinatorial library synthesis, for example reagents for the Ugi 4-component condensation (Ivar Ugi, in Isonitrile Chemistry, 1971, p. 145, Academic Press). The fluorophenyl resin compounds of this invention may be used for single functional group transformations and multiple step solid phase synthesis to generate combinatorial libraries. The cleavage of the fluor dioxane or dimethoxyethane at a temperature of from about-78 C to about ambient temperature. Reaction of 53 with the fluorophenyl activated ester resin compound 11 results in formation of the asubstituted carbonyl compound 54. Alternatively, the carbon nucleophile 53 may be generated using a polymeric base such as the polymeric trityllithium reagent described by Cohen et al., J. Amer. Chem. Soc., 1977,99,4165. Preferred a-acidic carbon compounds suitable for use as carbon nucleophiles include Meldrum's acid, benzyl cyanide, acetophenone, ethyl phenylacetate, ethyl acetoacetate, triethyl phosphonoacetate and (carbethoxymethylene) triphenylphosphorane, Most preferred carbon nucleophile is a lithium enolate of a ketone, e. g. a lithium enolate of acetophenone, as exemplified in example 7.. The use of the fluorophenyl resin compounds of this invention for the parallel synthesis of a multiplicity of different amide, peptide, hydroxamic acid, amine, carbamate, urethane or sulfonamide end products is illustrated by the preparation of a multiplicity of amides shown in Schemes 14a and 14b below. In Schemes 14a and 14b, Ra Rb and R are as defined herein and n is an integer which represents the total number of different amide products being prepared. Scheme 14a EMI69.1 The parallel synthesis of a multiplicity of amides using a multiplicity of carboxylic acid compounds Ra, CO2H to RanCO2H and a single amine HNRbRC is shown in Scheme 14a. According to Scheme 14a, the fluorophenyl resin of this invention is divided into n portions. Each portion of resin is then coupled with a different carboxylic acid compound to give n portions of fluorophenyl activated ester resin compound. Each portion of fluorophenyl activated ester resin compound is then cleaved with an amine of formula HNRbRC to give n portions of amide derived from a single amine but having different carbonyl group substituents. Scheme 14b EMI70.1 The parallel synthesis of n amides having variable N-substituents R, to is outlined in Scheme 14b above. According to Scheme 14b, the fluorophenyl resin compound of this invention is coupled with a carboxylic acid of formula RaCO2H. The resulting fluorophenyl activated ester resin compound is then divided into n portions, and each portion of fluorophenyl activated ester resin compound is cleaved with a different amine HNRbRc, to HNRRen to give the n different amide compounds derived from a single carboxylic acid. The fluorophenyl resin compounds of this invention are also useful for constructing a combinatorial library of amide, peptide, hydroxamic acid, amine or sulfonamide end products as illustrated for the simple amide library prepared from 4 carboxylic acids and 4 amines outlined in Scheme 15. Scheme 15 EMI71.1 <tb> <SEP> (R)-OH <SEP> 1 <SEP> Ro <tb> <SEP> ( <tb> <SEP> O-jazz <tb> <SEP> R2 <SEP> F <tb> <SEP> O <SEP> O <SEP> O <SEP> 0 <tb> <SEP> aOJtRa, <SEP> (i} <SEP> ARa2 <SEP> (+ < Ra3 <SEP> (P <SEP> Ran <tb> combine <tb> <SEP> combine <tb> <SEP> O <SEP> O <tb> <SEP> (i} <SEP> 0 <tb> <SEP> O <SEP> O <tb> <SEP> 0 <SEP> Ra3 <SEP> 0--JL <SEP> Ra4 <tb> <SEP> divide <tb> Scheme 15, cont. EMI72.1 As shown in the foregoing Scheme 15, the fluorophenyl resin compound is divided in 4 portions, and each portion is coupled with a different carboxylic acid compound to prepare 4 different fluorophenyl activated ester resin compounds. The fluorophenyl activated ester resin compounds are then mixed together to form a single portion which is divided into 4 portions of fluorophenyl activated ester resin compound, in which each portion contains approximately equal amounts of each individual fluorophenyl activated ester resin compound. Each of the 4 portions of fluorophenyl activated ester resin compound is then cleaved with a different amine to give 4 portions of amide, each of which contains 4 compounds representing the products of cleavage of the 4 different fluorophenyl activated ester resin compound with a single amine. In this manner a combinatorial library containing a multiplicity of amides may be quickly constructed. In a similar manner, a combinatorial library of peptides may be assembled by repeating the dividing-recombining sequence for each amino acid or peptide building block. The methodology described above for solid phase synthesis on resins is readily extended to synthesis on pins wherein the pins comprise a detachable polyethylene-or polyproylene-base head and an inert stem. The heads are grafted with a functionalized methacrylate copolymer on which the synthesis takes place. Synthesis on pins offers several advantages over resin-based solid phase synthesis techniques because it readily lends itself to automation and reduces the handling difficulties associated with conventional resin-based solid phase synthesis. Synthesis on pins is especially useful for the rapid construction of combinatorial libraries of amides or peptides. Solid phase synthesis pins is described in Technical Manual, MultipinT' SPOC, Chiron Technologies (1995) and references therein. The preparation of amides on amino-functionalized pins is outlined in Scheme 16. In Scheme EMI73.1 represents the polyethylene or polypropylene head described above on which is grafted a methacrylic acid-dimethylacrylamide copolymer substituted with a plurality of amino groups. The Fmoc-protected functionalized pin 5 is available from Chiron Mimotopes, San Diego, CA. It is understood that while the preparation of amides is exemplified below, the methodology described in Schemes 1-14 above for the resin compounds of this invention is equally applicable to pins. Scheme 16 EMI74.1 According to the foregoing Scheme 16, the Fmoc protected amino polymer 55 is deprotected by treatment with a basic amine, preferably 20% piperidine/DMF or 2% DBU/DMF. The free amino polymer 56 is functionalized by coupling with the 4-hydroxyfluorocarboxylic acid compound 2, for example using 1-hydroxybenzotriazole (HOBT) in the presence of N-methylmorpholine (NMM), diisopropylcarbodiimide (DIC) in the presence of HOBT or dicyclohexylcarbodiimide (DCC) in the presence of HOBT in a suitable solvent such as dichloromethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone (NMP), or dichloromethane/DMF mixtures, to prepare the functionalized pins 57. Coupling of 57 with the carboxylic acid compound 27 to form the polymer bound polyfluorophenyl activated ester 58, followed by cleavage of 58 with the amine 28 provides the amide 29 under reaction conditions analogous to those described in Schemes 7 and 8 above. It is to be understood that this invention covers all appropriate combinations of the particular and preferred groupings referred to herein. The foregoing may be better understood by reference to the following examples, which are presented for illustration and are not intended to limit the scope of this invention. 9F NMR '9F NMR spectra were obtained on a Varian unityplus spectrometer operating at a'H frequency of 500MHz. The'H nanoprobe was tuned to'9F frequency. Typically, spectra were acquired with a (delay-pulse-acquire) sequence repeated for a number of transients (nt). Typical spectral width was IOO, OOOHz and the chemical shifts were referenced relative to CFC13 using the transmitter frequency. The spectra were acquired using a nanoprobe in which the sample was oriented at a magic angle (54.7 degrees) relative to the magnetic field and the sample was spun at a rate of 1000-1 50OHz. The samples were prepared by swelling 1-2mgs of resin with about 40ul of deuterated dimethylformamide (DMF). EXAMPLE 1 Preparation of 4-hvdroxy-2, 3, 5, 6-tetrafluorobenzamidomethvl-copoly(styrene-l %-divinylbenzene)-resin. EMI75.1 Aminomethyl polystyrene (0. 39 mmol/gm); 2.0 gm; 0.78 mmol) is swelled in DMF (15 mL) for five minutes in a polypropylene syringe cartridge fitted with a bottom and top enclosure. To the resin suspension is added diisopropylcarbodiimde (492 mg; 3.9 mmol), 2,3,5,6,-tetrafluoro-4-hydroxybenzoic acid (819. 35 mg; 3.9 mmol) and 4-dimethylaminopyridine (50 mg). The resulting mixture is shaken gently at room temperature overnight. Then the reaction mixture is filtered and thoroughly washed with DMF (3 x 20 mL), THF (3 x 20 mL), and CH2CI2 (3 x 20 mL). The resin is dried in vacuo overnight at 40 C. IR 1764,1691,1653 cm-'. Elemental analysis: calcd: N, 0.46; F, 2.51. Found: N, 0.57,0.56; F, 3.65 3.68. The resin is then placed in a polypropylene cartridge and treated with a 10% piperdine solution in DMF (3 mL) and shaken gently overnight. Then the reaction mixture is filtered and thoroughly washed with DMF (3 x 20 mL), THF (3 x 20 mL), and CH2CI2 (3 x 20 mL). The resin is dried in vacuo overnight at 40 C. The IR spectrum of the resin showed the loss of the carbonyl signal at 1764 cm-', which is due to the formation of phenolic ester. EXAMPLE 2 Preparation of 4-hydroxv-2, 3, 5, 6-tetrafluorobenzamidomethvl-copolv (stvrene-l %-divinvlbenzene)-resin. EMI75.2 To a stirred slurry of aminomethyl polystyrene (0.82 mmol/g, 800 g, 656 mmol) in DMF (8 L) is added a solution of 2,3,5,6-tetrafluoro-4-hydroxybenzoic acid (234 g, 984 mmol) in DMF (1 L), a solution of 1-hydroxybenzotriazole (133 g, 984 mmol) in DMF (250 mL) and diisopropylcarbodiimide (124 g, 984 mmol) and the mixture is stirred overnight at ambient temperature. The reaction mixture is then filtered and the resin washed with DMF (1 x 1 L; 5 x 2 L), THF (3 x 2 L; 2 x 3 L) and CH2CI2 (3 x 3 L). The resin is then air-dried in trays for 2 days. The resin (995 g) is then added to a mixture of piperidine (125 mL) and DMF (6 L). DMF (2 L) is added to facilitate stirring and the mixture is stirred for I hour. The mixture is then filtered and the resin is washed with DMF (10 x 500ml) and dried in vacuo. The resin is then suspended in DMF (4 L) and a solution of 2M HCI (750 mL) in DMF (2 L) is added and the mixture is stirred for 0.5 hours. The resin is then filtered, washed with DMF (10 L) and THF (10 L) and dried overnight in vacuo at ambient temperature. Example 3 Preparation of 4- (tripyrolidinium-O-phosphonium)-2, 3,5,6-tetrafluorotetrafluorobenzamidomethylcopoly (styrene-1 %-divinylbenzene)-resin. EMI76.1 4-Hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-1%-divinylbenzene)-resin (1.0 g, 0.97 mmol), prepared as in Example 1, was swelled with CH2CI, (40 mL) for five minutes. Then bromotripyrrolidinophosphonium hexafluorophosphate (PyBroPT"'') (0.904 g, 1.94 mmol) and TEA (0.272 mL, 1.94 mmol) was added and the mixture was stirred for 15 h at room temperature and filtered. The resin was washed with CH2CI2 (10 x 10 mL) and dried in vacuo at 20 C to give 4- (tripyrolidinium O-phosphonium)-2,3,5,6-tetrafluorotetrafluorobenzamidomethyl-copoly (styrene-1 %-divinylbenzene)- resin.'HNMR 8: 2.00 (s, CH2,12H); 3.30 (s, NCH2,12H); 4.50 (NCH2Ar). IR 3082,2977,1651,1452, 1317,1220,1108,991,847,758. 19F NMR d:-75 (3F);-78 (3F);-141 (2F);-156 (2F). Example 4 Loading of a carboxylic acid to resin using 4- (tripyrolidinium-0-phosphonium)-2,3,5,6- tetrafluorotetrafluorobenzamidomethyl-copoly (styrene-1 %-divinylbenzene)-resin. Preparation of 4- (benzoyl) oxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-I %-divinylbenzene)resin EMI77.1 To the mixture of 4- (tripyrolidinium-O-phosphonium)-2, 3,5,6-tetrafluorotetrafluorobenzamidomethylcopoly (styrene-1%-divinylbenzene)-resin (71.5 mg, 50 umo)) in 1 mL of DMF were added benzoic acid (6.1 mg, 50 pmol) and diisopropylethylamine (DIEA) (43.5 uL, 250 mol). The mixture was stirred for 15 h at 20 C and filtered. The resin was washed with DMF (5 x 1 mL) and with CH2CI2 (5 x 1 mL) and dried in vacuo at 20 C to give product 3 (52 mg, 90%).'HNMR 8: 4.50 (NCH2Ar), 7.50 (ArH, 2H), 7.60 (ArH, lH), 8.20 (ArH, 2H). IR 3318, 1944,1874,1764,1601,1584,1420,1348,1320,1180,1108, 993,889,795,615. Example 5 Preparation of 4- (3-methoxy-benzoyl) oxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-1 %- divinylbenzene)-resin. EMI77.2 4-Hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-1%-divinylbenzene)-resin (740 mg; 0.28 mmol), prepared as in Example 1, is swelled in DMF for five minutes. Diisopropylcarbodiimide (181 mg; 1.4 mmol), 3-methoxy-benzoic acid (109 mg; 1.4 mmol) and DMAP (50 mg) are added to the resin slurry and shaken in a polypropylene tube for 8 h at ambient temperature. The resin is then filtered and washed thoroughly with DMF (3 x 20 mL), THF (3 x 20 mL), and CH2CI2 (3 x 20 mL). The resin is dried in vacuo overnight at 40 C. IR: 1766,1682 cm-'. Example 6 Cleavage of4- (benzoyl) oxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-1%-divinylbenzene)- resin with aniline. EMI78.1 To the mixture of 4- (tripyrolidinium-O-phosphonium)-2,3,5,6-tetrafluorobenzamidomethyl- copoly (styrene-1%-divinylbenzene)-resin (71.5 mg, 50 llmol) in 1 mL of DMF were added benzoic acid (6.1 mg, 50 jumol) and DIEA (43.5 pL, 250 mol). The mixture was stirred for 15 h at 20 C and filtered. The resin was washed with DMF (5 x 1 mL). Solution of aniline in 1 mL of DMF and TEA (21 pL, 150 pmol) were added into the resin and the resulting mixture was stirred for 15 h overnight at room temperature. After filtration the amide was characterized by LCMS retention time 4.25 min [M+H] + = 198 purity > 80%. Example 7 Cleavage of 4- (3-methoxy-benzoyl) oxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-l %divinylbenzene)-resin with the lithium enolate of acetophenone. EMI78.2 Preparation of 1- (3-methoxyphenyl)-3-phenyl-1,3-dione. To a suspension of the resin (2 mg; 0.50 mmol) in dry THF (0.75 ml) was added the solution of acetophenone enolate (see below for preparation) in THF (0.45 mmol). The resin was shaken for 1 hour at room temperature. The solution was filtered into a tared vial and the solvent removed on a turbovap, residual solvent was removed in vacuo. MS m/z = 255 [M] +. The resin was then washed with THF (x3), THF: H20 (3: 1, x3), THF (x3) and DCM (x3) and dried in vacuo at 40 C overnight. IR showed the lost of the carbonyl stretch at 1766 cm-'. Preparation of enolate solution. To a solution of the acetophenone (60mg; 2 mmol) in dry THF (2 ml) at 0 C was added LDA dropwise (1 mL of a 2. OM solution in heptane/tetrahydrofuran/ethylbenzene). The solution was stirred at 0 C for 30 minutes. The solution was used directly as a 0.67M solution without characterization. Loading of the acyl group is typically accomplished using the diiospropyl activated ester, followed by incubation with the 4-hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-1%-divinylbenzene)resin. Alternative activation of resin via a pyridine phosphonium salt intermediate is also possible and sometimes advantageous. EXAMPLE 8 Preparation of 4-(3-bromobenzoVl) oxy-23. 56-tetrafluorobenzamidomethyl-copoly (styrene-l %divinvlbenzene)-resin. EMI79.1 4-Hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-l %-divinylbenzene)-resin (740 mg; 0.28 mmol), prepared as in Example 1, is swelled in DMF for five minutes. Diisopropylcarbodiimide (181 mg; 1.4 mmol), 3-bromobenzoic acid (290 mg; 1.4 mmol) and DMAP (50 mg) are added to the resin slurry and shaken in a polypropylene cartridge for 18 hours at ambient temperature. The resin is then filtered and washed thoroughly with DMF (3 x 20 mL), THF (3 x 20 mL), and CH2CI2 (3 x 20 mL). The resin is dried in vacuo overnight at 40 C. IR: 1765,1692,1649 cm-'. EXAMPLE 9 Cleavage of 4-(3-bromobenzovl) oxv-23 *5*6-tetrafluorobenzamidomethvl-copoly (styrene-1 %- divinvlbenzene)-resin with anilines: EMI79.2 4- (3-bromobenzoyl)oxy-2,3,5,6-tetrafluorobenzam idomethyl-copoly (styrene-1 %- divinylbenzene)-resin (50 mg; 0.015 mmol), prepared as in Example 8, is swelled in dichloroethane for five minutes followed by addition of aniline (equiv.; 1.4 mg; 0.015 mmol) or 4-nitroaniline (1 equiv.; 2.07 mg; 0.015 mmol). The reaction mixture is stirred for 2 days at ambient temperature. The reaction mixture is then filtered and the filtrate is concentrated in vacuo to give N-phenyl-3-bromobenzamide or N- (4-nitrophenyl)-3-bromobenzamide. EXAMPLE 10 Preparation of an array of 4-carboXv-2n356-tetrafluorobenzamidomethvl-copoly (stvrene-1 %- divinylbenzene) polvfluorophenvl activated ester resin derivatives. EMI80.1 Forty 20 mL polypropylene cartidges are placed in a rack and 4-hydroxy-2,3,5,6 tetrafluorobenzamidomethyl-copoly (styrene-1%-divinylbenzene)-resin (0.47 mmol/g, 0.5 g) and DMF (4 mL) are added to each tube. Diisopropylcarbodiimide (0.186 mL) is then added to each tube using an Eppendorf pipette, followed by 1.0 mL of a stock solution prepared by dissolving dimethylaminopyridine (1.72 g) in DMF (40 mL). Five equivalents of carboxylic acid (0.24 mmol) is then placed in each tube and the rack of tubes is shaken overnight at ambient temperature. The resin in each tube is then filtered, washed with DMF (5 x 5 mL), THF (5 x 5 mL) and CH2CI2 (5 x 5mL) and dried overnight at 35 C in a vacuum oven. EXAMPLE 11 Preparation of2, 3, 4, 5, 6-pentafluorobenzovl-copolv (stvrene-1%-divinvlbenzene)-resin. EMI80.2 To a mixture of copoly (styrene-1 %-divinylbenzene) resin (100-200 mesh, 10 g) and pentafluorobenzoyl chloride (25 g) in nitrobenzene (250 mL) is added AIC13 (1. 0 M in nitrobenzene, 38 mL) and the reaction mixture is stirred at 60 C for 18 hours. The reaction mixture is then poured into a mixture of DMF (30 mL), concentrated HCI (20 mL) and ice (80 g). The mixture is stirred for 30 minutes, filtered, and the resin is washed with 3: 1 DMF-H, O until the washings are colorless. The resin is then washed with warm DMF and 2: 1 dichloromethane-methanol (6 x) and dried in vacuo.'9F NMR 8 -146.5 (2F),-157 (1F),-165.5 (2F). EXAMPLE 12 Preparation of 4-hvdroxv-2, 3, 5, 6-pentafluorobenzoyl-copolv (stvrene-1 %-divinylbenzene)-resin. EMI81.1 The title resin is prepared by treating a mixture of 2,3,4,5,6-pentafluorobenzoyl-copoly (styrene l %-divinylbenzene)-resin in water/cyclohexane with sodium hydroxide and tetrabutylammonium hydrogen sulfate as described by Feldman et al., J. Org. Chem., 1991,56 (26), 7350-7354. EXAMPLE 13 Preparation of 2, 3, 5, 6-tetrafluorobenzoyl-4-sulfonic acid-copolv (stvrene-I %-divinylbenzene)-resin. EMI81.2 A mixture of 2,3,4,5,6-pentafluorobenzoyl-copoly (styrene-1%-divinylbenzene)-resin (325 mg), prepared as in Example 11, dichloromethane (3 mL), H20 (1 mL), triethylamine (1.2 mL) and potassium metabisulfite (560 mg) is stirred for 3 days. The resin is then washed with dichloromethane (6 x) and dried in vacuo at 40 C.'9F NMR 8-142 (2F),-147 (2F). EXAMPLE 14 Preparation of 23 56-tetrafluorobenzovl-4-sulfonvl ch loride-copolv (styrene-l %-divinylbenzene)-resin. EMI82.1 The 2,3,5,6-tetrafluorobenzene-4-sulfonic acid-copoly (styrene-1%-divinylbenzene)-resin (300 mg), prepared in Example 13, is swelled in carbon tetrachloride (3 mL) and chlorosulfonic acid (I mL) is added. The reaction mixture is stirred for 24 hours and then is quenched with acetic acid. The resin is filtered, washed with dichloromethane (6 x) and ether (4 x) and dried in vacuo at 40 C.'9F NMR 8-142 (2F),-146.5 (2F). EXAMPLE 15 Preparation of 2, 3, 5, 6-tetrafluorobenzovl-4- 4-fluorobenzvloxv) sulfonyl-copolv (stvrene-1%- divinylbenzene)-resin. EMI82.2 2,3,5,6-Tetrafluorobenzoyl-4-sulfonyl chloride-copoly (styrene-1 %-divinylbenzene)-resin (100 mg), prepared as in Example 13, is swelled in dichloromethane and triethylamine (0.1 mL) and 4fluorobenzyl alcohol (0.087 mL) are added and the reaction mixture is stirred for 18 hours. The resin is then filtered, washed with dichloromethane (6 x) and dried in vacuo. '9F NMR Ï-115 (1F),-142.5 (2F), -146 (2F). EXAMPLE 16 Cleavageof 2, 3, 5, 6-tetrafluorobenzoyl-4- (4-fluorobenzvloxv) sulfonyl-copoly (stvrene-1%- divinylbenzene)-resin with anilines: EMI83.1 2,3,5,6-tetrafluorobenzoyl-4-(4-fluorobenzyloxy) sulfonyl-copoly (styrene-1 %-divinylbenzene)resin, prepared as in Example 15, is swelled in dichloroethane and aniline (lequiv) or4-nitroaniline (l equiv.) is added. The reaction mixture is stirred for 2 days at ambient temperature. The reaction mixture is then filtered and the filtrate is concentrated in vacuo to give N- (4-fluorobenzyl)-N-phenylamine or N- (4-fluorobenzyl-N- (4-nitrophenyl) amine. EXAMPLE 17 Preparation of 4-(naphth-l-vlsulfonvl) oxv-23 5 6-tetrafluorobenzam idomethel-copolv (styrene-l %- divinylbenzene)-resin. EMI83.2 MethodA: 1-Naphthyl sulfonic acid (500 mg; 2.4 mmol) is dissolved in 3 mL of dichloromethane. Diisopropyl carbodiimide (151.2 mg; 1.2 mmol) is added to the reaction vessel and the mixture is stirred for 1 hour at ambient temperature. 4-Hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-1% divinylbenzene)-resin is added (500 mg; 0.47 mmol/g; 0.24 mmol) to the reaction vessel and the reaction mixture is shaken overnight at ambient temperature. The reaction mixture is filtered and the resin is washed with 20% aqueous DMF (5x 2 mL), DMF (5x 2 mL), THF (5 x 2 mL) and dichloromethane (5 x 2 mL), then dried in vacuo at ambient temperature overnight. Method B: 4-Hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-l%-divinylbenzene)-resin (1 g; 0.76 mmol/g; 0.76mmol) is swelled in 10 mL of dichloromethane. Diisopropylethylamine (0.523 mL; 3.04 mmol) is added to the reaction vessel followed by 1-naphthalene sulfonyl chloride (0.510 g; 2.28 mmol). The reaction mixture is shaken at ambient temperature for 2 hours and then is filtered and the resin is washed with 20% aqueous DMF (5x 2 mL), DMF (5x 2 mL), THF (5 x 2 mL), and dichloromethane (5 x 2 mL), then dried in vacuo at ambient temperature overnight. IR (cm-'): 1675 (amide carbonyl stretch), 5. TFP Resin unsubstituted'9F NMR 8-164.5;-146.5 EXAMPLE i 8 Preparation of 2-(piperidinvlsulfonyl) naphthalene. EMI84.1 4- (Naphth-1-ylsulfonyl) oxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-I %- divinylbenzene)-resin, prepared as in Example 17, (100 mg; ca. 0.047 mmol) is swelled in DMF for 5 minutes. Piperdine (3.1 mg; 0.037 mmol) is added to the reaction vessel and the reaction mixture is shaken for 12 hours at ambient temperature. The reaction mixture is then filtered and the filtrate is collected and concentrated to yield 2- (piperidinylsulfonyl) naphthalene. MS m/z 276 [M+H] +. EXAMPLE 19 Preparation of 4-(toluene-4-vlsulfonvl) oxy-2n3456-tetrafluorobenzamidomethvl-copoly (stvrene-1 %- divinvlbenzene)-resin. EMI84.2 4-Hydroxy-2,3,5,6-tetrafluorobenzam idomethyl-copoly (styrene-1 %-divinylbenzene)-resin (200mg; 0.47 mmol/g; 0.094mmol) is swelled in 3 mL of dichloromethane. Diisopropylethylamine (0.122 mL; 0.705 mmol) is added to the reaction vessel followed by tosyl chloride (89 mg; 0.47 mmol). The reaction mixture is shaken at ambient temperature for 2 hours. The reaction mixture is then filtered and the resin is washed with 20% aqueous DMF (5x 2 mL), DMF (5x 2 mL), THF (5 x 2 mL), and dichloromethane (5 x 2 mL), then dried in vacuo at ambient temperature overnight. IR (cm-'): 1693 (amide carbonyl stretch), 1397,1195 (S02 stretch). EXAMPLE 20 Preparation of 4- (piperidinylsvl) toluene. EMI85.1 The 4- (toluene-4-ylsulfonyl) oxy-2,3,5,6-tetrafluorobenzamidomethyl-copoly (styrene-l%divinylbenzene)-resin prepared in Example 19 (100 mg; ca. 0.047 mmol) is swelled in DMF for 5 minutes. Piperdine (3.1 mg; 0.037 mmol) is added to the reaction vessel and the reaction mixture is shaken for 12 hours at ambient temperature. The reaction mixture is then filtered and the filtrate is collected and concentrated to yield 4- (piperidinylsulfonyl) toluene. MS m/z 240 [M+H] +. EXAMPLE 21 P EXAMPLE 22 Preparation of2,3,4,5,6-pentafluorophenylsulfonamidomethyl-copoly(styrene-1%-divinylbenzene)-resin. EMI86.1 Aminomethyl polystyrene (1 g, 1.2 mmol) is swelled with dichloromethane and 2,4,6-collidine (0.475 mL, 3.6 mmol) and 2,3,4,5,6-pentafluorophenylsulfonyl chloride (1.44 mmol) are added. The reaction mixture is stirred for 5 hours and the resin is filtered, washed with dichloromethane (6x) and dried in vacuo at 40 C. EXAMPLE 23 Preparationof 4-hydroxy-2, 3, 5, 6-pentafluorophenvlsulfonamidomethyl-copoly (slyrene-l%divinvlbenzene)-resin. EMI86.2 The title resin is prepared according to the method of Example 12, except substituting 2,3,4,5,6 pentafluorophenylsulfonamidomethyl-copoly (styrene-1%-divinylbenzene)-resin, prepared as in Example 22, for 2,3,4,5,6-pentafluorobenzoyl-copoly (styrene-1 %-divinylbenzene)-resin. EXAMPLE 24 Parallel synthesis of an array of (aryl or heteroaryl)-sulfonic acid r2-oxo-I- (lH-pyrrolo [3 2-blpvridin-2ylmethvl)-pyrrolidin-3- (S)-vll-amide trifluoroacetates. EMI87.1 Reaction vessels are charged with 4-hydroxy-2,3,5,6-tetraflurobenzamidomethyl-copoly (styrene-1%-divinylbenzene)-resin (0.20 g, 0.15 mmol). Each container is treated with methylene chloride (2 mL) for 10 minutes followed by an aromatic sulfonyl chloride (0.45 mmol) and diisopropylethyl amine (0.104 ml, 0.60 mmol). The containers are sealed and agitated for about 16 h. The reaction mixtures are individually filtered and sequentially washed with 20% aqueous DMF (10 X), THF (5 X) and dichloromethane (5 X), then dried in vacuo at ambient temperature overnight. By way of example 6-chlorobenzothiophene-2-sulfonyl) oxy-2,3,5,6-tetrafluro-benzamidomethyl-copoly- (styrene 1%-divinylbenzene)-resin showed:'9F-NMR Ï-144.572,-145.608; IR (cm-1) 1684 (C=O stretch), 1391, (asymmetric S02 stretch) 1195,1177 (symmetric SO, stretch). EMI87.2 Reaction vessels are charged with arylsulfonyloxy-2,3,5,6-tetrafluro-benzamidomethyl-copoly- (styrene-1%-divinylbenzene)-resins (0.024 g, 0.012 mmol), prepared as described above. The resins are swelled with DMF, then treated with a 0.01 M solution of an amine (1 mi, 0.01 mmol) in DMF. The containers are covered with aluminum foil and agitated for 72 h. The progress of the reaction is monitored by TLC; for sluggish reactions 1,5,7-triazabicyclo [4.4.0] dec-5-ene resin is added. The reaction mixtures are individually filtered and the resins washed with methanol. The filtrates are concentrated with a stream of nitrogen. The residues are redissolved in methanol and reconcentrated twice more. The resulting residues are treated with 20% trifluoroacetic acid in methylene chloride (1 ml) and agitated overnight. The reaction mixture is concentrated by a stream of nitrogen. Methylene chloride (1 ml) is added and concentrated with a stream of nitrogen. Methanol (I ml) is added; concentrate with a stream of nitrogen. The final residues are analyzed by LC/mass spec; evidence of desired product was obtained in each case. By way of example, the product from the reaction of 6-chlorobenzothiophene-2- sulfonyl) oxy-2,3,5,6-tetrafluro-benzamidomethyl-copoly- (styrene-1%-divinylbenzene)-resin with 2- (3- (S)-amino-2-oxopyrrolidin-1-ylmethyl)-pyrrolo [3,2-b] pyridine-1-carboxylic acid tert-butyl ester and subsequent deprotection with 20 % TFA in methylene chloride showed: M+H = 461. This material had an IC50 against Factor Xa of less than 500 nM. By the methods described in this preparation, 2- (3- (S)-amino-2-oxopyrrolidin-I-ylmethyl)pyrrolo [3,2-b] pyridine-1-carboxylic acid tert-butyl ester, 2- (3- (S)-amino-2-oxopyrrolidin-1-ylmethyl)- pyrrolo [3,2-c] pyridine-I-carboxylic acid tert-butyl ester and 2- (3- (S)-amino-2-oxopyrrolidin-1ylmethyl)-pyrrolo [2,3-c] pyridine-I-carboxylic acid tert-butyl ester are reacted with fourteen arylsulfonyloxy-2,3,5,6-tetrafluro-benzam idomethyl-copoly-(styrene-l %-divinylbenzene)-resins to obtain, after deprotection, compounds encompassed by the following formula: EMI88.1 EMI88.2 and Ra is: EMI89.1 LCMS: M + H = 461, LCMS : M + H = 428, LCMS: M+H=454' EMI89.2 LCMS: M + H = 462 , LCMS: M + H = 428, LCMS: M+H=444, EMI89.3 LCMS: M + H = 462, LCMS: M + H = 493, LCMS: M+H=427' EMI89.4 LCMS: M + H = 462 , LCMS: M + H = 454, LCMS : M+H=475, EMI89.5 LCMS: M + H = 462, or LCMS: M + H = 445. EXAMPLE 25 Parallel svnthesis of an array of (aryl or heteroaryl)-sulfonic acid f2-oxo-I- (IH-vrrolo 3, 2-clpvridin-2- ylmethyl)-pyrrolidin-3-(S)-yl]-amide trifluoroacetates. The title array of compounds is prepared from 2- (3- (S)-amino-2-oxopyrrolidin-1-ylmethyl)- pyrrolo [3,2-c] pyridine-1-carboxylic acid tert-butyl ester as described from Example 24. EMI89.6 Ra is: EMI90.1 LCMS: M + H = 461, LCMS: M + H = 428 , LCMS : M+H=454' EMI90.2 LCMS: M + H = 462 r LCMS: M + H = 428, LCMS : M+H=444, EMI90.3 LCMS: M+H=462, LCMS: M + H = 493, LCMS: M + H = 427' EMI90.4 LCMS: M + H = 462, LCMS: M + H = 454 , LCMS : M+H=475, EMI90.5 LCMS: M + H = 462, or LCMS: M + H = 445. EXAMPLE 26 Parallel svnthesis of an array of (aryl or heteroaryl)-sulfonic acid [2-oxo-1-(lH-pyrroloF2, 3-clpyridin-2ylmethvl)-pyrrolidin-3- (S)-vll-amide trifluoroacetates. The title array of compounds is prepared from 2- (3- (S)-amino-2-oxopyrrolidin-1-ylmethyl) pyrrolo [2,3-c] pyridine-1-carboxylic acid tert-butyl ester as described from Example 24. EMI90.6 and Ra is: EMI91.1 LCMS: M + H = 461, LCMS: M + H = 428, LCMS: M+H=454' EMI91.2 LCMS: M + H = 462 a LCMS: M + H = 428, LCMS: M+H=444. EMI91.3 LCMS: M + H = 462 a LCMS: M + H = 493, LCMS: M + H = 427' EMI91.4 LCMS: M + H = 462 , LCMS : M + H = 454, LCMS : M+H=475, EMI91.5 LCMS: M + H = 462, or LCMS: M + H = 445. EXAMPLE 27 Preparation of triple!ysine-!oaded4-hvdroxv-2J.5,6-tetraftuorobenzoy!-functiona!izedpins. Step 1: Piperidine cleavage: To a 20% piperidine/DMF (w/w) solution (360g) are added 689 non-functionalized methacrylic acid/dimethylacrylamide Multipin TM crowns from Chiron Technologies with an estimated loading of 6.0 mmol/crown. The mixture is gently mixed with orbital shaking for 75 minutes and filtered. The crowns are soaked in DMF (350 mL) for 30 minutes, then filtered. After repeating the DMF wash (350 mL, 30 min) the crowns are washed with methanol (2 x 350 mL, 30 min each). The crowns are dried under vacuumfor 2 hours. Step 2: FMOC-Lvs- (FMOC) loading : A mixture of FMOC-Lys- (FMOC) (11.8 g, 20 mmol) and 1-hydroxybenzotriazole (HOBT) (4.0 g, 30 mmol) is dissolved in a mixture of DMF/dichloroethane (1: 3, v/v) (450 mL). 1,3 Diisopropylcarbodiimide (DIC) (2.45 g, 19.5 mmol) is added over 20 seconds with mixing. After mixing 10 minutes the crowns from step 1 are added in portions over 1 minute. After gentle orbital mixing for 14 hours, the crowns are filtered, washed with DMF (350 mL, 30 min, 2x) and methanol (350 mL, 30 min, 2x) and dried under vacuum for 2 hours. Step 3: Piperidine cleavage: To a 20% piperidine/DMF (w/w) solution (360g) are added the crowns from step 2. After gentle orbital mixing for Ihour the crowns are filtered, washed with DMF (350 mL, 30 min, 2x) and methanol (350 mL, 20 min, 2x) and dried under vacuum for 2 hours. Step 4: FMOC-Lvs-(FMOC) loading: A mixture of FMOC-Lys- (FMOC) (8.16 g, 13.8 mmol) and 1-hydroxybenzotriazole (HOBT) (2.8 g, 21 mmol) is dissolved in a mixture of DMF/dichloroethane (1: 2, v/v) (400 mL). 1,3- Diisopropylcarbodiimide (DIC) (1.70 g, 13.5 mmol) is added and after mixing for 10 minutes the crowns from step 3 are added in portions over 2 minutes. After gentle orbital mixing for 14 hours, the crowns are filtered, washed with DMF (350 mL, 30 min, 2x) and methanol (350 mL, 30 min, 2x) and dried under vacuum for 2 hours. Step 5: Piperidine cleavage: To a 20% piperidine/DMF (w/w) solution (360g) are added the crowns from step 4. After gentle orbital mixing for lhour, the crowns are filtered, washed with DMF (350 mL, 30 min, 2x) and methanol (350 mL, 20 min, 2x) and dried under vacuum for 2 hours. Step 6: FMOC-Lys-FMOC) loading: A mixture of FMOC-Lys- (FMOC) (13.0 g, 22 mmol) and 1-hydroxybenzotriazole (HOBT) (4.4 g, 33 mmol) is dissolved in a mixture of DMF/dichloroethane (1: 2, v/v) (400 mL). 1,3 Diisopropylcarbodiimide (DIC) (2.77 g, 22 mmol) is added and after mixing for 12 minutes, the crowns from step 5 are added in portions over 1 minute. After gentle orbital mixing for 14 hours, the crowns are filtered, washed with DMF (350 mL, 30 min, 2x) and methanol (350 mL, 30 min, 2x) and dried under vacuum for 2 hours. Step 7: Piperidine cleavage : To a 20% piperidine/DMF (w/w) solution (360g) are added the crowns from step 6. After gentle orbital mixing for 1.5 hours, the crowns are filtered, washed with DMF (350 mL, 30 min, 2x) and methanol (350 mL, 20 min, 2x) and dried under vacuum for 2 hours. Step 8: Functionalization of the triple lysine loaded crowns. To a solution of 4-hydroxytetrafluorobenzoic acid (10.0 g, 47.6 mmol) in DMF/dichloroethane (1: 2, v/v) (400 mL) is added 2- (lH-benzotriazol-l-ly)-1, 1, 3,3,-tetramethyluronium tetrafluoroborate (TBTU) (15.2 g, 47.6 mmol) with mixing. After 2 minutes, N-methyl morpholine (7.2 g, 71 mmol) is added and after mixing for 1 minute, the triple lysine loaded crowns (step 7 above) are added over 1 minute. After gentle orbital mixing for 14 hours, the crowns are filtered and washed with DMF (350 mL, 10 min). The crowns are soaked with 10% piperidine/DMF (400 mL, I h) and then washed with DMF (350 mL, 20 min), 20% 2N HC1/DMF (400 mL, 20 min), DMF (350 mL, 30 min, 2x) and methanol (350 mL, 30 min, 2x) and dried under vacuum for 2 hours. EXAMPLE 28 Carboxvlic acid loading to form triple lvsine-loaded 4-hvdroxY-2*356-tetrafluorobenzovl- polyfluorophenvl activated esters. To a mixture of carboxylic acid (RCO2H; 0.040 mmol) and DMF (0.35 mL) is added a solution of DIC (0.04 mmol) and 4-dimethylaminopyridine (DMAP) (0.004 mmol) in DMF (0.05 mL) followed by a triple lysine loaded crown prepared as in Example 24. After 5 hours, the crown is washed with DMF (10 mL, 2 min, 3x) and THF (10 mL, 2 min) and air-dried. EXAMPLE 29 Cleavage of triple lysine-loaded 4-hydroxe-2*356-tetrafluorobenzoyl-polyfluorophenyl activated esters with amines. A triple lysine-loaded 4-hydroxy-2,3,5,6-tetrafluorobenzoyl-polyfluorophenyl activated ester crown, prepared as in Example 28, is soaked in a 0.01 M DMF solution of amine (0.5 mL) for 12 hours. The crown is removed and the solution concentrated to yield the amide product. EXAMPLE 30 Quantification of TFP-polyfluorophenvl activated ester loading. A 0.05 M DMF solution of N- (2, 4-dinitrophenyl)-ethylenediamine (DNP-NH2) is accurately measured (1.5-2.5 mL) and a TFP-polyfluorophenyl activated ester crown is added and allowed to react for 2 hours. The sample is examined by reverse phase-high pressure liquid chromatography (RP-HPLC) to measure the area under the curve (AUC) for the product amide at 350 nm. Comparison to a standard curve generated from the 0.05M stock solution of DNP-NH2 allows for an accurate measurement of the quantity of amide.

Claims: What is claimed is: 1. A fluorophenyl resin compound of formula EMI95.1 wherein EMI95.2 is a solid support; A is selected from-L-S02-,-L-NR3SO2-, EMI95.3 EMI95.4 L is a chemical bond, EMI95.5 mislto5; p is 0,1 or 2; B is F, OW or SO2Z; D is CH or N; W is hydrogen, tripyrrolidinophosphonium, C (O) V, C (O) Ra, C (O) NRbR, C (O) Ora, SO, Ra or EMI96.1 V is Cl or imidazol-1-yl; Y is O or NR3; Z is C !,-OH, OR, or NR, R,; Ra and Rf are independently aliphatic or aromatic; Rb and Rc are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl; Ri is CH2Rf ; Ro, R, and R2 are a ring system substituent, or Ro and R, taken together with the adjacent carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl ; R3 is H or lower alkyl; R,, R5, R6 and R, are independently ring system substituents, or R4 and R5 taken together with the carbon atoms through which they are linked form a 6 membered aryl or 5 to 6 membered heteroaryl; and Rl, and R, 2 are independently alkyl, heteroaryl, or aryl. 2. The fluorophenyl resin compound of claim 1 wherein Ro, R, and R2 are F and R3, R4, R5, R6 and R7 are H. 3. The fluorophenyl resin compound of claim 2 wherein A is A is selected from EMI96.2 L is a chemical bond, EMI97.1 m is 1; or NR3SO2, wherein Y is O or NR3. 4. The fluorophenyl resin compound of claim 3 wherein Y is NR3 and R3 is H. 5. The fluorophenyl resin compound of claim 4 wherein B is-OH. 6. The fluorophenyl resin compound of claim 4 wherein B is-SO3H or-SO2CI. 7. A fluorophenyl resin compound according to claim 1 selected from 4-hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-polystyrene resin, 2,3,5,6-tetrafluorobenzamidomethyl-4-sulfonic acid-polystyrene resin, 2,3,5,6-tetrafluorobenzamidomethyl-4-sulfonyl chloride-polystyrene resin, 4-hydroxy-2,3,5,6-tetrafluorobenzoyloxymethyl-polystyrene resin, 2,3,5,6-tetrafluorobenzoyloxymethyl-4-sulfonic acid-polystyrene resin, 2,3,5,6-tetrafluorobenzoyloxymethyl-4-sulfonyl chloride-polystyrene resin, 4-hydroxy-2,3,5,6-pentafluorobenzoyl-polystyrene resin, 2,3,5,6-tetrafluorobenzoyl-4-sulfonic acid-polystyrene resin, 2,3,5,6-tetrafluorobenzoyl-4-sulfonyl chloride-polystyrene resin, 4-hydroxy-2,3,5,6-tetrafluorophenylsulfonamidomethyl-polystyrene resin, 2,3,5,6-tetrafluorophenylsulfonamidomethyl-4-sulfonic acid-polystyrene resin, 2,3,5, 6-tetrafluorophenylsulfonamidomethyl-4-sulfonyl chloride-polystyrene resin, N- (4-hydroxy-2,3,5,6-tetrafluorobenzoyl)-piperidinomethyl-polystyrene resin, N- (2,3,5,6-tetrafluorobenzoyl-4-sulfonic acid)-piperidinomethyl-polystyrene resin, N- (2,3,5,6-tetrafluorobenzoyl-4-sulfonyl chloride)-piperidinomethyl-4-polystyrene resin, N- (4-hydroxy-2,3,5,6-tetrafluorophenylsulfonyl)-piperidinomethyl-polystyrene resin, N- ( (2,3,5,6-tetrafluorophenyl-4-sulfonic acid) sulfonyl)-piperidinomethyl-polystyrene resin, N- ( (2,3,5,6-tetrafluorophenyl-4-sulfonyl chloride) sulfonyl)-piperidinomethyl-polystyrene resin, 4-hydroxy-2,3,5,6-tetrafluorophenyl-polystyrene resin, 2,3,5,6-tetrafluorophenyl-4-sulfonic acid-polystyrene resin, 2,3,5, 6-tetrafluorophenyl-4-sulfonyl chloride polystyrene resin, 4-hydroxy-2,3,5,6-tetrafluorophenylsulfonyl-polystyrene resin, 4- (tripyrolidinium-O-phosphonium)-2,(tripyrolidinium-O-phosphonium)-2, 3,5,6-tetrafluorotetrafluorobenzamidomethylcopoly (styrene-1 %-divinylbenzene)-resin, 4- (N, N'-didisopropyl-isourea)-2,3,5,6-tetrafluorotetrafluorobenzamidomethyl-copoly (styrene-1 %- divinylbenzene)-resin, 2,3,5,6-tetrafluorophenylsulfonyl-4-sulfonic acid-polystyrene resin, and 2,3,5,6-tetrafluorophenylsulfonyl-4-sulfonyl chloride-polystyrene resin. 8. A fluorophenyl resin compound according to claim 1 selected from 4-hydroxy-2,3,5,6-tetrafluorobenzamidomethyl-polystyrene resin, 2,3,5,6-tetrafluorobenzamidomethyl-4-sulfonic acid-polystyrene resin, designated herein as 2,3,5,6-tetrafluorobenzamidomethyl-4-sulfonyl chloride-polystyrene resin, 4-hydroxy-2,3,5,6-pentafluorobenzoyl-polystyrene resin, 2,3,5,6-tetrafluorobenzoyl-4-sulfonic acid-polystyrene resin, 2,3,5,6-tetrafluorobenzoyl-4-sulfonyl chloride-polystyrene resin, 4-hydroxy-2,3,5,6-tetrafluorophenylsulfonamidomethyl-polystyrene resin, 4- (tripyrolidinium-0-phosphonium)-2,3,5,6-tetrafluorotetrafluorobenzamidomethyl- copoly (styrene-1 %-divinylbenzene)-resin, 4- (N, N'-didisopropyl-isourea)-2,3,5,6-tetrafluorotetrafluorobenzamidomethyl-copoly (styrene-1 %- divinylbenzene)-resin, 2,3,5, 6-tetrafluorophenylsulfonamidomethyl-4-sulfonic acid-polystyrene resin and 2,3,5,6-tetrafluorophenylsulfonamidomethyl-4-sulfonyl chloride-polystyrene resin, 9. The fluorophenyl resin compound of claim 4 wherein B is OC (O) Ra. 10. A process for preparing an amide of formula EMI98.1 Ra is aliphatic or aromatic; and Rb and R are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting the fluorophenyl resin compound of claim 9 with a compound of formula HNRbRc wherein Rb and R are defined above. 11. A process for preparing the fluorophenyl resin compound of claim 9 comprising coupling the fluorophenyl resin compound of claim 5 with a carboxylic acid compound of formula RaCO2H wherein Ra is aliphatic or aromatic, optionally in the presence of an activating agent. 12. The fluorophenyl resin compound of claim 4 wherein B is SO3Ra. 13. A process for preparing an amine compound of formula EMI99.1 wherein Ra is aliphatic or aromatic; and Rb and Re are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting the fluorophenyl resin compound of claim 12 with a compound of formula HNRBR,, wherein Rb and Rc are defined above. 14. A process for preparing the fluorophenyl resin compound of claim 12 comprising reacting the fluorophenyl resin compound of claim 6 wherein B is SO, CI with a hydroxy compound of formula RaOH wherein Ra is aliphatic or aromatic. 15. The fluorophenyl resin compound of claim 4 wherein B is OSO2Ra. 16. A process for preparing a sulfonamide compound of formula EMI100.1 wherein Ra is aliphatic or aromatic; and Rb and Rc are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting the fluorophenyl resin compound of claim 15 with a compound of formula HNRbRC wherein Rb and Rc are defined above. 17. A process for preparing the fluorophenyl resin compound of claim 15 comprising reacting the fluorophenyl resin compound of claim 5 with a sulfonic anhydride compound of formula (RaS02) or with a sulfonyl chloride compound of formula RaSO2CI, wherein Ra is aliphatic or aromatic, in the presence of base. 18. A process for preparing the fluorophenyl resin compound of claim 15 comprising coupling the fluorophenyl resin compound of claim 5 with a sulfonic acid compound of formula RaSO3H wherein Ra is aliphatic or aromatic. 19. The process of claim 18 wherein the coupling is carried out in the presence of an activating agent. 20. The process of claim 19 wherein the activating agent is diisopropylcarbodiimide optionally in the presence of 4-dimethylaminopyridine, or bromotripyrrolidinophosphonium hexafluorophosphate (PyBroPTM) in the presence of triethylamine (TEA). 21. The fluorophenyl resin compound of claim 4 wherein B is OC (O) NRbR. 22. A process for preparing a compound of formula EMI101.1 wherein T is Ra0- or RdReN- Ra is aliphatic or aromatic; and Rb, R, Rd and Re are independently H, aliphatic or aromatic, or Rb and Rcv taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting the fluorophenyl resin compound of claim 21 with an alcohol of formula RaOH, wherein Ra is defined above, in the presence of base or reacting the fluorophenyl resin compound of claim 21 with an amine of formula RdReNH, wherein Rd and Re are defined above, optionally in the presence of base. 23. The fluorophenyl resin compound of claim 4 wherein B is OC (O) ORa. 24. A process for preparing a compound of formula EMI101.2 wherein U is RfO-or RbRCN- Rf is aliphatic or aromatic; and Rb and R, are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, comprising reacting the fluorophenyl resin compound of claim 23 with an alcohol of formula RfOH, wherein Rf is defined above, or reacting the fluorophenyl resin compound of claim 23 with a compound of formula RbRCNH, wherein Rb and Rc are defined above, in the presence of base. 25. A process for preparing the fluorophenyl resin compound of claim 21 comprising acylating the fluorophenyl resin compound of claim 5 with an acylating agent of formula C (O) V, wherein V is Cl or imidazol-1-yl, to the yield the acylated fluorophenyl resin compound wherein B is OC (O) V; and reacting the acylated fluorophenyl resin with a compound of formula RbRNH, wherein Rb and R are defined above, optionally in the presence of base. 26. The process of claim 25 wherein the acylating is optionally carried out in the presence of base. 27. A process for preparing the fluorophenyl resin compound of claim 21 comprising reacting the fluorophenyl resin compound of claim 5 with a carbamoyl chloride compound of formula EMI102.1 wherein Rb and R are independently H, aliphatic or aromatic, or Rb and Rc, taken together with the N atom through which they are attached, form an azaheterocyclyl or azaheterocyclenyl, optionally in the presence of base. 28. The fluorophenyl resin compound of claim 4 wherein B is OC (O) NHRa. 29. A process for preparing the fluorophenyl resin compound of claim 28 comprising reacting the fluorophenyl resin compound of claim 5 with an isocyanate compound of formula O=C=N-Ra, optionally in the presence of base. 30. The fluorophenyl resin compound of claim 4 wherein B is SO2NRaRj. 31. The fluorophenyl resin compound of claim 4 wherein B is SO2NHRa. 32. A process for preparing a disubstituted amine compound of formula EMI103.1 wherein Rh is aliphatic or aromatic; Ri is CH2Rf; and Rf is aliphatic or aromatic, comprising reacting the fluorophenyl resin compound of claim 30 with a thiol. 33. The process of claim 32 wherein the thiol is thiophenol or ethanethiol. 34. A process for preparing the fluorophenyl resin compound of claim 31 comprising reacting the fluorophenyl resin compound of claim 6 wherein B is SO2CI with a compound of formula H2NRa wherein Ra is aliphatic or aromatic. 35. A process for preparing the fluorophenyl resin compound of claim 30 comprising reacting the fluorophenyl resin compound of claim 31 with an alkylating agent of formula R ; X wherein X is Br, Cl or 1, in the presence of base. 36. A process for preparing the fluorophenyl resin compound of claim 30 comprising reacting the fluorophenyl resin compound of claim 31 with an alcohol of formula RIOH in the presence of triphenylphosphine or tributylphosphine and diethylazodicarboxylate or diisopropylazodicarboxylate. 37. The fluorophenyl resin compound of claim 4 wherein B is F. 38. A process for preparing the fluorophenyl resin compound of claim 5 comprising reacting the fluorophenyl resin compound of claim 37 with hydroxide. 39. The process of claim 38 wherein the reacting is under phase-transfer conditions in the presence of a phase transfer catalyst. 40. The process of claim 39 wherein the phase transfer catalyst is tetrabutylammonium hydrogen sulfate. 41. A process for preparing the fluorophenyl resin compound of claim 2 wherein B is F and A is EMI104.1 R4, R5, R6 and R, are hydrogen, comprising acylating a resin compound of formula EMI104.2 with a 4-fluorofluorobenzoyl chloride compound of formula EMI105.1 42. The process of claim 41 wherein EMI105.2 is polystyrene. 43. The process of claim 42 wherein the acylating is in the presence of a Lewis acid. 44. The process of claim 43 wherein the Lewis acid is A'C'3. 45. The fluorophenyl resin compound of claim 37 wherein A is-NR3S02-wherein R3 is H. 46. A process for preparing the fluorophenyl resin compound of claim 45 comprising reacting an amino resin of formula EMI105.3 with a 4-fluorofluorophenylsulfonyl chloride compound of formula EMI105.4 in the presence of base. 47. The process of claim 46 wherein the amino resin is aminomethyl polystyrene. 48. The fluorophenyl resin compound of claim 5 wherein A is-NR3C (O)-wherein R3 is H. 49. A process for preparing the fluorophenyl resin compound of claim 48 comprising coupling an amino resin of formula EMI106.1 with a carboxylic acid compound of formula EMI106.2 50. The process of claim 49 wherein the coupling is in the presence of an activating agent. 51. The process of claim 50 wherein the activating agent is diisopropylcarbodiimide optionally in the presence of 4-dimethylaminopyridine, or bromotripyrrolidinophosphonium hexafluorophosphate (PyBroPT"') in the presence of triethylamine (TEA). 52. The process of claim 51 wherein the amino resin is aminomethyl polystyrene. 53. The fluorophenyl resin compound of claim 6 wherein B is S03H. 54. A process for preparing the fluorophenyl resin compound of claim 53 comprising reacting the fluorophenyl resin compound of claim 37 with an SO3-equivalent. 55. The process of claim 54 wherein the SO3-equivalent is potassium metabisulfite. 56. The fluorophenyl resin compound of claim 6 wherein B is SOUCI. 57. A process for preparing the fluorophenyl resin compound of claim 56 comprising reacting the fluorophenyl resin compound of claim 54 with an inorganic acid chloride. 58. The process of claim 57 wherein the inorganic acid chloride is chlorosulfonic acid. 59. A process for preparing an a-substituted carbonyl compound of formula EMI107.1 wherein Ra is aliphatic or aromatic; Rg is H, aliphatic or aromatic; and Rh is aliphatic or aromatic, comprising reacting the fluorophenyl resin compound of claim 9 with a carbon nucleophile of formula RgRhCH60. The fluorophenyl resin compound of claim 1 wherein B is OH, SO3H or SO2CI. 61. The fluorophenyl resin compound of claim 1 wherein B is-OC (O)-aryl. 62 The fluorophenyl resin compound of claim 1 wherein B is-S (O) 20-aralkenyl. 63 The fluorophenyl resin compound of claim I wherein B is-OS (O) 2-aryl or-OS (O) 2-heteroaryl. 64 The fluorophenyl resin compound of claim 1 wherein B is-OS (O) 2- (phenyl substituted heteroaryl),-OS (O) 2- (phenyl substituted phenyl),-OS (O) 2- (heteroaryl substituted heteroaryl) or OS (O) 2- (heteroaryl substituted phenyl). 65. The fluorophenyl resin compound of claim 1 wherein R4, R5, R6 and R, are independently H, alkyl, alkoxy, halogen, CN or NO : ; 66 The process of claim 11 wherein the activating agent is diisopropylcarbodiimide optionally in the presence of 4-dimethylaminopyridine, or bromotripyrrolidinophosphonium hexafluorophosphate (PyBroPT"') in the presence of triethylamine (TEA). 67. A process for preparing a compound of formula EMI108.1 wherein Ra is aliphatic or aromatic; and EMI108.2 comprising reacting the fluorophenyl resin compound of claim 15 with a compound of formula EMI108.3 68. A process according to claim 66, wherein and Ra is: EMI109.1

Inventors: AIREY JOHN E, BEZARD DANIEL NOEL ANDRE, CLERC FRANCOIS-FREDERIC, GRONEBERG ROBERT D, LABAUDINIERE RICHARD F, MCGEEHAN GERARD M, POLI GREGORY B, SALVINO JOSEPH M, AIREY, JOHN, E., BEZARD, DANIEL, NOEL, ANDRE, CLERC, FRANCOIS-FREDERIC, GRONEBERG, ROBERT, D., LABAUDINIERE, RICHARD, F., MCGEEHAN, GERARD, M., POLI, GREGORY, B., SALVINO, JOSEPH, M.
Applicants: AIREY JOHN E, BEZARD DANIEL NOEL ANDRE, CLERC FRANCOIS FREDERIC, GRONEBERG ROBERT D, LABAUDINIERE RICHARD F, MCGEEHAN GERARD M, POLI GREGORY B, RHONE POULENC RORER PHARMA, SALVINO JOSEPH M, AIREY, JOHN, E., BEZARD, DANIEL, NOEL, ANDRE, CLERC, FRANCOIS-FREDERIC, GRONEBERG, ROBERT, D., LABAUDINIERE, RICHARD, F., MCGEEHAN, GERARD, M., POLI, GREGORY, B., RHONE-POULENC RORER PHARMACEUTICALS INC., SALVINO, JOSEPH, M.
Application year: 1999
Main classification: C07D257
IPC codes: C07C45, C07C49, C07C209, C07C211, C07C231, C07C233, C07C235, C07C269, C07C273, C07D471, C07D495, C07F9, C08F8, C08F212, G01N24