VACUUM PROCESSING APPARATUS WITH LOW PARTICLE GENERATING WAFER HOLDER

Abstract: A wafer holder (20) is provided for semiconductor wafer processing that is particularly useful where wafers are held and moved in other than upwardly facing orientations during handling and processing. The holder includes an annular wafer mounting ring (12) that is resiliently mounted to and biased against an annular wafer holder housing (11). A set of latches (20) is pivotally mounted to the mounting ring. The latches are formed of non-metallic latch bodies (31) and have non-metallic front and back rollers (35, 36) thereon which have rolling peripheries (37, 39) that roll over the surface of the mounting ring, along a circular path on which are formed spherical detents (42-44). The rolling peripheries of the rollers conform to the curvature of the detents. The front roller also has a gripping periphery (40) at the outer edge thereof that rolls onto the edge of a wafer held in the holder against the edge of the mounting ring. The mounting ring forms a seal with the backplane of the processing apparatus to prevent plasma from forming around the latches. The mounting ring also registers against a stop to space the wafer from the backplane to protect the device side of the wafer when backside wafer processing is being carried out.

Description: VACUUM PROCESSING APPARATUS W ITH LOW PARTICLE GENERATING WAFER HOLDER This invention lelates to high vacuum processing and particularly the handling and holding of wafers, particularly semiconductor wafers, for such high vacuum processing More particularly, this invention relates to the avoidance of watei damage, particulate contamination and other problems that arise in semiconductor device manufacturing piocesses in the handling and holding of semiconductor wafers in semiconductor wafer processing equipment Background ol the Invention: In semiconductor manufacturing piocesses such as, for example, the sputtering of thin films onto substrates such as silicone oi gallium arsenate w afeis, it is usually necessary to transfer wafers among different process chambeis In some systems, wafers are transferred in a horizontal plane where the wafer typically rests on a tiansfer arm lesembhng a paddle The gravitational force on the wafer and the resulting faction between the wafer and the undei lying supporting element, combined with controlled acceleration of the wafer on the support element, makes possible the use of clamp-free wafer transfer. In some systems, however, for process related and other reasons, wafers are moved in non-horizontal orientations or held in non-horizontal orientations during processmg In such systems, the wafer is locked to and carried by a device called a wafer holder that is equipped with clamping structure or other locking elements to hold the wafer in position on the holder The locking device of a wafer holder is typically referred to as a latch. The latch exerts pressure on the water to lock the wafer in a fixed position on the holder With certain spring biased latches, for example, the latches exert pressure against a wafer. \\ hich is supported by the multitude of independent tabs or by a wafer mounting ring Friction force betw een such elements and the wafer prevents the wafei from slipping during the motion of the wafer holder Some wafers of which semiconductois ate made are very fragile, either because of their small thicknesses or because of the nature of the substrate material of which they are made, for example, gallium arsenate wafers, which aie particularly fragile In the final stages of device fabrication, a large number of nearly completed semiconductor devices on a \\ afer adds substantial value to the basic wafer, however, making such wafers very expensive Any bieakage of a wafer at such later stages of fabrication represents a substantial economic loss and contributes a substantial cost to semiconductor device manufacturing Poor function or reliability of the latches that retain the wafers to the holders can result in such breakage as well as increase the equipment down-time and a loss ot equipment throughput Further, rough operation of the latches can cause the pioduction of paiticulates in the vacuum chambei causing contamination of the wafer, w hich can terfeie with the fabncation ot semiconductoi devices and result in the production of defective devices High vacuum systems aie widely used m technical and commercial applications such as semiconductor device manufactui ing piocesses, which require the performance of the particular process in the absence of air and airborne contaminants An example of such a process is the sputter deposition of thin films onto silicon wafeis. or substrates, in the manufacture of integrated circuit chips With the ongoing trend towaid device miniaturization in semiconductor manufacture where device features are currently assuming submicron dimensions and with integrated circuits increasing in functional size, complexity and value, particles ot a size and quantity heretofore tolerable in semiconductor manufacture are now capable of causing damage that can totally destroy expensive devices and, therefore, are no longer tolerable. Still further, in the process of manufacturing semiconductoi devices on silicon wafers, there are applications in which a need often exists foi sputtering onto the back side of the water For example, gold is sometimes applied on the back of wafeis to facilitate heat removal from the chip Where front side sputtering is taking place, the back side of the wafer is typically sealed against a heating surface built into the wafer holder. During backside sputtenng, however, the front side of the wafer, which contains the devices being manufactured, must not touch the backplane. Wafer holder latches act in concert with the physical elements that define the mounting plane of the wafer holder on which the wafer tests to clamp the wafer between the latches and those elements on the wafer holder. Such latches may include, for example, flexible tabs or a suitable wafer mounting ring The holders include an appropriate wafer exposure opening to permit etching or sputtering of the wafer. In the prior art wafer holders, the inteiaction of the latches and the mounting plane structure has produced a number of the problems discussed above. The holder of the wafer clamping device typically consists of a multitude of flexing tabs and a plurality of latches, for example, three latches, mounted to the wafer holder housing The flexible tabs define a wafer mounting plane on which the wafer rests When the wafer is loaded onto the wafer holder, a load arm of a robot typically positions the silicon wafer against the tabs in a precise and repeatable manner so as to minimize chipping and piovide tellable wafer latching The wafer is held in place on the holder with friction generated, foi example, by spring loaded rollers forcing the wafer against two adjacent tabs The force applied by such I oilers deflects the wafer locally a small amount in accordance with the thickness of the wafer. Thinner and more flexible wafers tend to induce less friction against the tabs and have a greater tendency to slide during acceleration. If such sliding happens to position a tab at or near the edge of a wafer, wafei chipping can result, particularly when the wafer is sealed against a backplane. The latch itself can cause problems The ma j or components of a typical latch assembly are the body of the latch with a front roller and one or more rear rollers mounted opposite the front roller or to its sides The teim "tiont" tollei leteis heiein to a lollei that tolls against a water to latch the wafer to a holdei, and the terms "leai ' lollei and "back" tollei tefei heiein to rolleis that lemain in contact with the holder to guide the latch ot to position the latch by legistiatton with detents on the holder The latch assembly customarily pivots aiound a πgidly fixed post anchored to the wafei holdei. and the assembly is usually held together by a helical spring The body of the latch typically contains a slot which is engaged by actuatoi pins on a loading aim The actuator pins are operated to rotate the latch through an arc of usually 90° to latch and unlatch the latches, moving the front roller into position against or retracted from the wafer In addition to applying force lor holding the wafer m place by urging the front roller against the wafer, the helical spring maintains the latch assembly in an upright position normal to the holder so that unobstructed engagement of the actuator pins with slots in the latch can occur When the latches are rotated, they slide against stationary wear shims hich are biased by the force of the latch spring The latched and unlatched positions of a typical latch are defined by three detents 90° apart Three equal depth detents ate typically provided on the surface of the holder into which the rollers of the latch assembly are pushed by the torce ot the spring, and a fourth detent, which is deeper, is provided closest to the edge of the wafei The deeper detent allows the wafer engaging portion of the front roller to lowet onto the wafer and apply positive pressure of the wafer against the tabs when the latches are in their latched positions The body of the latch is typically made out of metal, usually stainless steel The rollers are usually provided with a substantially smaller cross-sectional radius than the spherical radius of the detents in order to minimize traction resistance of the rollers All mutually moving elements are also typically made out of metal such as stainless steel and employ sliding pairs with various degrees of fπctional resistance In use, latch actuation is preceded by the loading of a water onto the wafer holder such that it rests against the tabs Simultaneously, the actuator pins on the transfer arm engage the slots of each of the latches, with the rollers expected to be in full detent and the latches in their open or unlatched positions While the wafer is held with the suction of a vacuum chuck or by some other clamping mechanism on the transfer arm, the latch actuator pms lotate the latches about their pivots. Both rollers of the latch rise out of and descend into a shallow pan: of detents, thus pulling the latches mto and keeping them in the desired orientations However, when the front roller is latched onto the wafer, this function is performed only by the rear roller Generous clearance between the pins and the slots is typical in order to avoid brushing of pms against the slots during the engagement, which is a frequent cause of wafer chipping Due to such oversized slots, the latch rotation is always less than 100% that of the actuator pins The force of the spring is expected to overcome fπctional tesistance of the sliding elements and to pull the rollers fully into the detents, thus completing 100% totation Every time the edge of a misaligned slot is struck by an actuator pin of the transfer arm, the impact is transmitted to the front roller, which can cause a piece of wafer to be chipped away by the roller bearing agamst the wafer. This results in significant w aste of devices and downtime for cleaning In high vacuum, the use of a slot wider than the pins is not always effective In many situations, high friction withm the latch pre\ ents the latch slot tiom being kept in alignment v\ ith the center ot the actuator pins Howevei misaligned slots ma\ be due to something as simple as the tilt of the latch caused bv a thin wafei It is. howevei oie often found that incomplete positioning ot the lolleis the detents is the cause of misaligned slots Many sliding joints in the design ot the latch lesult in high factional hysteresis within the latch mechanism which makes the slot position and its subsequent engagement unpredictable and unstable Friction among many mutualK interacting surfaces are the factors influencing completeness and repeatability ot the seating ot the lolleis in the detents which is needed to bring the latches fully to their latched and unlatched positions For example lesidual faction between the rollers and the body of the latch can lead to a tilt of the latch Faction tiom the rolleis combined with torsional friction between the body and the spring, contributes torsional lesistance, which the latch spring is unable to overcome so as to be able to push the rollers fullv into the detents Consequently, less than complete rotation of the latch occurs providing insufficient clamping paiticularly of very thin wafers, allowing them to slide on the holder and providing misalignment ot the actuatoi pins with their slots, thereby allowing them to strike the latch bodies instead ot entering the slots If stionger springs aie used to overcome such incomplete latch rotation, more wear is generated and the tiont toller can be caused to snap onto the wafer, which can shatter thinner wafers Furthermore, the faction coefficients of materials increase many times in vacuum, and the wear of most materials at temperatures of above 600°C significantly increases, causing non-metals to abrade and metals to gall, causing highly undesirable particle generation, which causes defective fabrication of semiconductoi devices oi possibly misalignment of latches and resulting wafer clipping Rollers ot the paoi an also piesent problems Small cioss-sectional radii of usually identical front and rear rollers contribute to wear, especially at elevated temperatures, which alter the trajectory of the front roller If the cross-sectional radius ot a roller is not identical to that of the spherical radius of the detents, contact stresses increase hen rollers roll into and out of the detents Metallic rollers provided on metallic shafts in ultra-high \ acuum of for example, more than 10 8 Torr, are subject to phenomenon known as "cold welding", which causes metal-to-metal pairs to stick together Where front rollers do not roll but, rather, slide, they gouge the rolling surface ot the base and also rub the wafer and either score or shift the wafer out of alignment Poor art uses of so called soft cetamics foi example, MACOR, produce low faction but exhibit very poor wear properties and do not possess requned structuial integrity where contact stresses are high, thus rendermg them unsuitable as highly moveable parts in particle conscious applications Rollers made out of these materials aie easily dented from the slightest snap into a detent, and, as a result, they must be frequently replaced due to the excessive wear of the shafts and toller surfaces and the formation of dents and flats on the gripping sui faces Excessn e \\ ear ot the front roller surfaces and msides of detents alters the trajectory of the front rollei causing the fiont roller to roll over the edge of the wafer rather than to descend gently onto the ater Rolling over the edge of the wafer is the major cause for the wafer shift The mateaal of which the fiont lollei is loimed and that comes into contact with the wafer has been of pai amount nnpoitance in the ait tiom a process point ot While hard ceramics, in geneial, aie available ith only minute tiaces ot sodium the soft machinable ceramics such as MACOR contain, in addition to high content of sodium potassium and fluoane which aie totally unacceptable elements foi some critical processes of semiconductoi devices It has also been found that the ctoss-secttonal shape of the water-contacting portion of the front loller has direct impact on wafei chipping and particle generation With rounded edge rollers, the tangent point of wafei contact can mo\ e close to the edge ot the wafei where it is more likely to cause the wafer to chip On the othei hand, a cylindrical 1 oiler can cause the roller to roll onto an edge, which can also generate particles by crumbling the edges of the ater or the roller The phenomenon of cold welding also occurs when the concentrated force of the metal spring is applied against a thin metal shim, and against the metal latch in high vacuum, resulting in a very high friction coefficient Higher spang toice must be used to overcome this faction force, causing excessive wear of the joint, geneiation of particles and failure to maintain accurate detent because of high residual latching torque Further, resulting toision on the spring causes the inner sides ot the coils to rub against the post, increasing wear and leading to potential spang failure Front metal lolleis, which aie part ot a metal latch used on tab wafer holdeis, are exposed to direct deposition in a coating process Some deposited materials (TiN, W, TiW) tend to flake off and jam the rollers, requiring frequent acid cleaning to keep particulate count down In systems which use tab wafer holders, the backside gas easily floods the gaps aiound the afer and the latch cavities, which can frequently ignite secondaiy plasma during etching or RF-bias sputtering This situation not only generates large amount of participates, but it is also a source tor te-sputteiing ot unwanted material onto the wafers In the case ot backside sputtering, that is, w here it is necessary to sputter a film onto the side of the wafer opposite the de\ ice side, which leaves the semiconductor devices facing into the backplane, the gap between the wafer and the backplane must be small enough to provide good thermal coupling between the wafer and the backplane yet, at the same time, be large enough to avoid semiconductor devices from coming into contact with the backplane With the wafer latched agamst a tab ring rigidly mounted to the wafer holder housing, both the wafer holdei and the backplane are sealed against same reference surface, which does not provide for the "giowth" of the backplane as a result of thermal expansion Depending on the temperature of the backplane, the afer gap may % ary significantly and impact the process results or completely close, causing damage to the devices on the wafer For the reasons stated above and tor other reasons, there remains a need for a better method and apparatus for holding wafeis tor processing and for latching and releasing wafers fiom wafer holders Summary ot the Invention: It is an objective ot the present invention to provide a high vacuum processing apparatus with improved wafer clamping in a piocessing chambei It is another objective of the present invention to reduce the production of particles that can lead to substrate contammation in semiconductor wafer vacuum piocessing. particularly in the ttanstei ot w afeis betw een a transfer aim and a watet holdei within a vacuum processing chamber Fiuthei objectn es ot the piesent invention aie to o\ eιcome each of the specific problems ot the paot ait set totth e It is a particular objective of the tn\ ention to provide a wafer holder that will clamp a wafei at high tempeiaruies Accoiding to the panciples of the piesent invention there is provided a semiconductor wafer processing apparatus hav ing watei holdei foimed of a rigid annular housing with a ater mounting ring having an annular w afer engaging siπface on the mnei edge of the back side thereof The ring is resiliently mounted on its back side to the housing at a pluiahty of points around the housing so that the ring translates tow aid and aw ay from the housing w ithout making sliding contact with the housing The holder includes a plurality of at least three latch assemblies each having a non-metallic latch body pivotally and resiliently mounted to the mounting ring so as to be biased toward the mounting ring The body is pivotally mounted to the back side of the mounting ring on a mounting post fixed and perpendicular to the back side of the mounting ang to lotate thiough approximately 90° between a latched position and an unlatched position when actuated In the preferred embodiment ot the invention each latch assembly has a non-metallic front roller rotatable on the body about an axis perpendicular to and intersecting the mounting post The front roller has a gapping periphery at its outer end, which lies adjacent the wafer engaging surface of the mounting ring when the latch assembly is rotated to its latched position, and a rolling periphery at its inner end, which rolls in a circle around the mounting post on the back side of the wafer mounting ang At least one non-metallic rear roller is also provided, which is lotatable on the body about an axis perpendicular to and intersecting the mounting post The lear loller has a lolling periphery, preferably approximately equal to the rolling periphery of the tiont loller, which tolls on the same circle as the rolling periphery of the front roller A plurality of detents is provided on the back side of the wafer mounting ang on the circle on which the rolling peapheaes ot the rollers move The detents are preferably of the same diameter as the rolling peripheries of the rollers and receive the rolling peripheries of the rollers when the latch assembly is in the unlatched position or in the latched position to retain the latch assemblies in the respective positions Preferably, the wafer mounting ang is lesihently mounted on its back side to the housing at a plurality of six points approximately equally spaced aiound the housmg, with a set of three approximately equally spaced leaf spπngs and a set of three approximately equally spaced coil springs supporting the ring on the housing with one spring being mounted at each of the six points to bias the ring toward the housing Preferably also, a spang loaded ball bearing joint is provided at each mounting post foi biasing the latch assembly towaid the mounting ang and rotatably connecting the latch assembly to the mounting ring for rotation about the mounting post Each mounting post is removable for removing the latch assembly as a unit from the mounting ring Further, the g pping periphery of the front roller is preferably provided with an outwardly diverging conical axial cross-section with rounded edges The rolling periphery of the front roller is preferably also gieater than its gapping peaphery and the leai lollei is pieferablv lotatable about the same axis, and thiough the mounting post as the tiont tollei w ith the tolling periphery of the rear lollei approximately equal to the tolling penpheiv ot the tiont rollei The pluia ty ot detents in the back side of the wafer mounting ang pieteiablv includes a pan ot side detents on opposite sides of the mounting post to receive the rolling peapheaes ot the ftont and teat lolleis when the latch assembly is in an unlatched position and a front and back detent adapted to e the tolling peapheaes of the ιesρectι\e front and tear rolleis when the latch assembly is in a latched position Preferably the side and rear detents have equal depths and the front detent has a gieatei depth such that the 1 oiling periphery of the front roller is seated in the front detent only w hen the latch assembly is in a latched position with no water in the holder The apparatus also preferably includes a circular backplane centered on the axis of the housing and dimensioned to fit through the housing and in close pioximity to the backside of a wafer held between the latches and the wafer mounting ring A. spacer is also provided preferably on the backplane to foim with the mounting ring a pair of spacing connol sui faces that engage to function as a stop hich provides a predetermined space betw een the backside ot the wafer and the backplane The apparatus albo has a load aim with a wafei chuck thereon that is lelatively moveable perpendicular to a plane ot the w ater holdei and in a path through the center ot the holder between a rearward position on the backside of the holder outside of the chamber and a forward position at which a wafer held in the chuck is in contact with the clamping member A plurality of latch actuators supported on the load arm is provided, one corresponding to and aligned with each of the latch assemblies The actuators each have a plurality ot pins configured and located so as to fit loosely into the lecesses in the latch body upon movement ot the load arm to a torwaid position and are relatively moveable into and out of a coupling engagement w ith the latch assemblies when the load arm moves between its forward and rearward positions The acmators aie lotatable when coupled to the bodies of the latch assemblies to rotate the latch assemblies between their latched and unlatched positions With the present ention a wafer holder is provided with latch assemblies that function reliably at high vacuums and high temperauires Such a holder has a positive economic impact on semiconductor wafer manufacturing processes by I educing wafer breakage requiring lower maintenance and reducing downtime of the processing equipment Smooth and faction- free operation of the latch further improves yield by lowering the number ot particles present to contaminate the wafer These and other objec es of the present invention w ill be more readily apparent from the following detailed description ot the invention Briel Description ol the Drawings: Fig. 1 is a backside \ tew of a water holdei embodying p nciples of the present invention Fig. 2 is an exploded peispective v iew ot the wafei holdei of Fig. 1 Fig.3 is a cross-sectional v iew, taken along line 3-3 of Fig. 1 ot a latch assembly of wafer holdei of Figs. 1 and 2 Fig. 3A is a cioss-sectional v iew ot an embodiment of the w afer holder of Figs. 1-3 that is paiticulaily useful foi backside piocessing Detailed Description ol the Prelei red Embodiment: An example of a w fei handling and holding mechanism for the processing ot w aters in a vertical orientation is described and lllustiated in L S Patent No 4 915 564, hereby expressly incorporated herein by reference In that system individual w afeis aie gapped on their back surfaces bv \ acuum chucks on a transfei arm and tiansteaed de\ ιce side fust thiough the door of a loadlock chamber of a processing apparatus The aim mov es the wafei against tabs on a clamping ang earned bv the w afer holder in the loadlock wheieupon a pluiahtv ot latches three m numbei spaced at even intervals around the periphery of the holdei. move behind the wafer to clamp the wafer between the latches and the clamping ring tabs To avoid sliding faction of the latches acioss the backs of the wafers, the latches have rollers at the tips which roll onto the wafer back surface into a latching position while applying a force to the wafer that is resisted by the clamping ring tabs The latches aie held in their latching positions bv spherical spang loaded detents so that the latches do not mov e out ot their latching positions after the loading arm chucks have disengaged the water and the loading aim is withdra n from the loadlock The detents hold the latches in position for the additional leason that the latches must be positioned for engagement by latch actuators on the loading arm when the ami is letu ied to the loadlock chamber to lemove the wafer after piocessing Referring to Fig. 1, one piefe ed embodiment of a wafer holder 10 according to the present invention is illustrated The holder 10 includes an annular housing 11 to which a wafer mounting ring 12 is resiliently attached by an airay of springs that include a set of three equally spaced leaf springs 13 and a set of three equally spaced conical coil springs 14 arranged so that the leaf and coil springs alternate aiound the holder 10 The springs 13 and 14 function to uniformly urge the mounting ring 12 toward and against the holder 11 Pivotally mounted to the mounting ring 1 1 at equally spaced intervals aiound the holder 10 are three latch assemblies 20 The latch assemblies 20 are configured to rotate through approximately 90° between latched positions in which two ot the latch assemblies 20 are illustrated in Fig. 1, and unlatched positions in which the other one of the latch assemblies 20 is illustrated in Fig. 1 The latch assemblies 20 are recessed into cutouts in the housing 11 and the mounting ang 12 forms a seal with the backplane to isolate the latch assemblies 20 from the plasma and prevent the ignition of secondary plasma within the latch cavities and around the wafer While the latch assemblies 20 aie illustrated in different positions in Fig. 1, they aie so presented to facilitate the understanding of then motion In practice, the three latches will be moved in unison between their latched and unlatched positions by a latch actuator mechanism (not shown) The construction of the latch actuator mechanism is moie particularly described in the commonly assigned and copendmg U S patent application serial no 08 82 7 .690, filed April 10. 1997, and expressly incorporated herein by reference and in U S Patent No 4 915 564 referred to above In a piocessing apparanis the holdei 10 is mounted to a camei or index plate that positions the holdei 10 among piocessing stations ot the piocessing machine The holdei 10 is held to the index plate bv one fixed pin earned by the plate and o spang-loaded pins 22 earned bv the housing 11 of the wafer holdei 10. more pamculailv lllustiated in Fig. 2 The fixed pm ot the plate is leceived by a notch 23 in the housing 1 1 while the spang loaded pins aie ed by ladial lecesses in the edge ot an opening of the index plate The wafei mounting ang 12 has a cnculai opening 24 theiein that is slightly smaller than a wafer 17 that is to be held the holdei 10 for piocessing As a result, the ring 12 has an inner annular surface 25 against which the edge ot the wafei 17 tests w hen it is being held by the holdei 10 The housing 1 1 has an opening 15 in its centei that is lai ei than the w afei 17 that is to be held in the holder 10 for processing Such a water 17 is inserted by a watei transfer arm to hich the water 17 is held by a chuck, for example a vacuum chuck, through the opening 15 until its outei edge lies m contact with the surface 25 The movement of the wafer 17 against the surface 25 may move the ang 12 slightly away from the housing 11 against the force exerted by the spangs 13 and 14 When moved by the actuators to then latched positions, as illustrated in more detail in Fig. 3, the latch assemblies 20 clamp edge ot the w afei 17 against the annular surface 25 around the opening 24 in the wafer holding ring 12 Each latch assembly 20 is pivotally mounted to the ang 12 at a mounting post 30 fixed to the ring 12 The post 30 is configuied to attach to and release tiom the ring 12 so as to permit the latch assembly 20 to be removed as an assembled unit from the ring 12 The latch assembly 20 mcludes a non-metallic latch body 31 foimed of a material such as high purity zirconia The body 31 is pivotally mounted on the post 30 thiough a tungsten carbide ball bearing 32, and is biased against the mounting ring 12 by a conical spang 33 that suπounds the mounting post 30 The latch bodies 31 each have a pair ot actuator pin teceiving slots 34 therein, equally spaced from the mounting post 30, to receive actuator pms of the actuator mechanism on the tiansfer arm These slots 34 are oversized to insure engagement by the acmator pins. At opposite ends of the latch body 31 are rotatably mounted a pair of non-metallic rollers, including a front roller 35 and a back roller 36, both rotatable about an axis 68 that is parallel to the mounting ring 12 and intersects the centerhne of the mounting post 30 approximately at a right angle The back roller or rear roller 36 has a roller diameter 37 on which the roller 36 rolls in a circle 38 aiound the mounting post 30 as the latch assembly is oted by the latch actuator The roller diameter 37 has a surface that lies on the surface of a spheie The front roller 35 also has a roller diameter 39 that is of the same diameter as the lollei diameter of the back roller 36 and is also spheacal The roller diameter 37 of the back loller 36 is spaced on the body 31 at the same distance from the mounting post 30 as the toller diameter 39 of the tiont rollei 35 so that the roller diameters 37,39 of the rollers 35,36 move on the same circle 38 on the back surface of the mounting ring 12 The front rollei 35 of each latch assembly 20 has a gripping periphery 40 on the outer end of the roller 35 spaced farther fiom the mounting post 30 than the rolling peripheries 37,39 of the rollers 36.35 The gapping peapheiv 40 is ot smallei diametei than the lolling peripheries 37,39 and, as a lesult does not contact the back suitace of the mounting ang 12 w hen the latch body 31 is lotated bv the actuators to the latched position If theie is a wafei 17 lesting on the annulai surface 25 on the back side of the mounting ang 12 the gapping peapheiv 40 is dimensioned to contact the back side of the wafer 17 and latch the wafei 17 between the gapping peapheiv 40 ot the fiont lollei 35 and the annular suiface 25 on the mounting ang 12 as lllustiated Fig. 3 The gapping periphery 40 of the fiont roller 35 is an outwardly flared conical suitace that is tapeied so that only the outer edge contacts the water 17 regardless of the thickness ot the w afei 17 thus maintaining lepeatable latching trajectory of the gapping periphery 40 of fiont rollei 35 tiom and onto the mounting ring surtace and onto and off of the water 17 The inner and outer edges ot the gripping peapheiv 40 aie rounded to av oid concentrated loading of the wafer 17 when contacted bv the tiont roller 33 To hold the latch assemblies 20 stable in latched and unlatched positions when the actuators are not engaged vv ith the latch bodies 31 a set of foui detents is provided around the circles 38 on the back side of the mounting ring 12 Three ot these detents including a back detent 42 and a pair ot side detents 43, are the same depth and size, and of the same spherical shape and diameter as the rolling peripheries 37 39 ot the back and fiont lolleis 36 35 The fourth detent is a front detent 44, which is of the same spherical shape and diameter as the rolling peapheaes 37 39, but is of greater depth and size As such, the rolling periphery 39 of the front roller 35 only fully seats in the front detent 44 if there is no wafer 17 on the mounting suitace 25 of the mounting ang 12 If a water 17 is present on the surface 25, the gripping peapheiv 40 of the fiont tollei 35 of the latches rolls onto the back surface of the wafer 17 and prevents the rolling pe phery 39 from dioppmg into the detent 44 when the front roller 35 is centered on the detent 40 It the latch body 31 were to rotate slightly out of the latched position, the rolling periphery 39 of the tiont toilet 35 would nonetheless engage the side walls of the fiont detent 44 thereby assisting the tear roller 36 in piev entmg the latch body 31 from rotating further out of its latched position When the holdei 10 is used to piocess the back sides of wafers 17, the front side of the wafer 17, which may have partially foi med devices on the side thereof is facing a backplane 50 To prevent contact between the device side of such a wafer 17 and the backplane 50, a pair of abutting contact surfaces 47 48 is provided, as illustrated in Fig. 3A Preferably, one surface is carried on a stop 52 extending from, for either the mountmg ring 12 or the backplane 50, to hold the mountmg rmg 12 away from the backplane 50 and allow a gap 54 to be maintained between the ater 17 and the backplane 50 Those skilled in the art will appieciate that the applications of the present invention herein are varied, and that the invention is described in pieferred embodiments Accordingly, additions and modifications can be made without departing fiom the principles of the invention What is claimed is

Claims: 1. A wafer holdei tor a semiconductoi piocessing apparatus comprising a rigid annulai housing hav ing a cential axis, a wafer mounting ring having a back side and a fiont side and an annulai afei engaging suiface on the inner edge of its back side the ang being centeied on the axis and resiliently mounted on its back side to the housing at a plurality ot points aiound the housing so that the ring tianslates towaid and away from the housing without making sliding com act with the housing, a plurality of at least tluee latch assemblies each pivotally mounted to the back side of the mounting ang aiound the axis, each latch assembly hav ing a mounting post fixed and perpendtculai to the back side of the mounting ring, a non-metallic latch body pivotally and resiliently mounted to the mounting ring at the mounting post so as to be biased towaid the mounting ang and rotatable through approximately 90° between a latched position and an unlatched position. a non-metallic front roller lotatable on the body about an axis perpendicular to and intersecting the mounting post, the fiont roller having a gripping periphery which lies adjacent the wafer engaging surface of the mounting lmg when the latch assembly is lotated to its latched position and a rolling periphery which lies on a circle around the mounting post on the back side of the wafer mounting ring, and at least one non-metallic rear roller I datable on the body about an axis perpendicular to and intersecting the mounting post, the leai lollei having a rolling periphery lying on the circle, and a plurality of detents in the back side ot the w afer mounting ring lying on said circle to receive the rolling peripheries of the lolleis w hen the latch assembly is in the unlatched position and the latched position 2. The wafer holder ot claim 1 vvheiem the wafer mounting ang is centered on the axis and resiliently mounted on its back side to the housing at a plurality of six points approximately equally spaced around the housing 3. The wafer holder of claim 2 further comprising a set of three approximately equally spaced leaf sprmgs and a set of three approximately equally spaced coil sprmgs, one spring being mounted at each of the six points, to bias the ring toward the housing 4. The wafer holder of claim 1 wherein each mounting post includes a spring loaded ball bearing joint biasing the latch assembly toward the mounting ring and rotatably connecting the latch assembly to the mounting ring for rotation about the mounting post 5. The wafer holdei ot claim 1 vvheiem each mounting post is leleasable foi lemov g the latch assembly as a unit from the mounting rmg 6. The wafei holdei ot claim 1 w heiein each latch assembly has a non-metallic latch body hav ing a plurality of oveisize actuator pin receiving slots therein equallv spaced aiound the mounting post 7. The wafer holdei ol claim 1 vv heiem the gapping peapheiv has an outvvaidlv div eigmg conical axial cioss-section with rounded edges 8. The afer holdei ot claim 1 vvheiem the rolling peapheiv is greater than the gapping periphery 9. The wafer holdei ot claim 1 vvheiem the rear roller is lotatable about the axis of the front roller 10. The wafer holder of claim 1 wherein the rolling periphery ot the rear l oiler is appioximately equal to the rolling periphery of the front roller 11. The wafei holder ot claim 1 wherein the plurality ot detents in the back side of the wafer mounting ring include a pair of side detents on opposite sides ot said mounting post to receiv e the lolling peapheaes of the front and rear rollers when the latch assembly is in an unlatched position and a front and back detent adapted to receive the rolling peripheries ot the respective front and lear rollers when the latch assembly is in a latched position 12. The wafer holder of claim 1 wherein the rolling periphery of the rear roller is approximately equal to the rolling periphery of the front roller, and the plurality of detents in the back side of the wafer mounting rmg include a pair of side detents on opposite sides of said mounting post to lecerv e the rolling peripheries of the front and rear rollers when the latch assembly is in an unlatched position and a front and back detent adapted to receive the rolling peripheries of the respective front and reai rollers vv hen the latch assembly is in a latched position, the side and rear detents having equal depths and the front detent having a greater depth such that the rolling periphery of the front roller is seated in the front detent only when the latch assembly is in a latched position with no water in the holdei 13. A semiconductor wafer piocessing apparatus comprising a vacuum chamber having therein a wafer holder according to of claim 1. 14. The apparatus of claim 13 further comprising- a load arm having a wafer chuck theieon and relatively moveable perpendicular to the plane in a path through the center of the holder between a learvvard position on the backside of the holder outside of the load chamber and a forward position at w hich a afer held in the chuck is in contact with the- clamping member and is a spaced distance foi w ard of the plane and at which the clamping member is spaced forward of the holder and is resiliently biased rear ardly against the wafer; the body having a actuator pin receiving structure thereon around the mounting post, a plurality of latch actuators supported on the load arm, one corresponding to and aligned with each of the latches, the actuators having a plurality of surfaces thereon configured and located so as to engage the actuator pin receiving structure on a latch body upon movement of the load arm to its forward position being relatively moveable into and out of coupling engagement with the latches when the load arm moves respectively to its forward and rearward positions, and the actuators being rotatable. when coupled to the bodies of the latch assemblies, to rotate the latch assemblies between their latched and unlatched positions. 15. A wafer holder for a semiconductor processing apparatus comprising: a rigid annular housing having a central axis; a wafer mounting ring having a back side and a front side and an annular wafer engaging surface on the inner edge of the back side thereof, the ring being centered on the axis and resiliently mounted on its back side to the housing at a plurality of six points approximately equally spaced around the housing to translate toward and away from the housing w ithout making sliding contact with the housing; a set of three approximately equally spaced leaf springs and a set of three approximately equally spaced coil springs, one spring being mounted at each of the six points, to bias the ring toward the housing; a set of three latch assemblies each pivotally mounted to the back side of the mounting ring and equally spaced around the axis, each latch assembly having a mounting post fixed and perpendicular to the back side of the mounting ring and having a spang loaded ball bearmg joint biasing the latch assembly toward the mounting ring and rotatably connecting the latch assembly to the mounting ring for rotation about the mounting post, each mounting post being releasable for removing the latch assembly as a unit from the mounting ang, each latch assembly being rotatable tlirough approximately 90° between a latched position and an unlatched position; each latch assembly having: a non-metallic latch body having a plurality of oversize actuator pin receiving slots therein equally spaced around the mounting post. a non-metallic tiont lollei rotatable on the body about an axis perpendicular to and intersecting the mounting post, the fiont toiler having a gapping peapheiv hich lies adjacent the wafer engaging surface of the mounting ang w hen the latch assembly is rotated to its latched position and having an outwaidly div eiging conical axial cioss-section vv ith rounded edges, and a rolling peapheiv gieatei than the gapping periphery and which lies adjacent a circle aiound the mounting post on the back side of the wafer mounting ring, a non-metallic rear iollei lotatable on the body about the axis of the front roller perpendiculai to and lnteisecting the mounting post, the tear roller having a rolling peπpheiy approximately equal to the rolling peapheiv ot the tiont roller and w hich lies adjacent the same circle around the mounting post on the back side of the wafer mounting ring, and a plurality ot detents in the back side of the wafer mounting rmg lying on said circle, including a pair of side detents on opposite sides of said mounting post to receive the rolling peapheaes of the front and rear rollers when the latch assembly is in an unlatched position and a front and back detent adapted to leceive the rolling peripheries of the respective front and rear rollers when the latch assembly is in a latched position, the side and rear detents having equal depths and the front detent having a greater depth such that the rolling periphery of the front roller is seated in the front detent only when the latch assembly is in a latched position with no wafer in the holder 16. The wafer holder of claim 15 fuithei compasing a circular backplane centered on the axis of the housing and dimensioned to fit through the housing and in close proximity to the backside of a wafer held between the latches and the wafer mounting ring, and a pair of spacing control surfaces, one on the housing and one on the backplane, to form a stop which provides a predetermined space between the backside of the afer and the backplane 17. A semiconductor wafer processing apparatus comprising a load chamber, a wafer holder in the chamber having a rigid annular housing having a central axis, a wafer mounting ring having a back side and a front side and an annular wafer engaging surface on the inner edge of the back side thereof, the ring being centered on the axis and resiliently mounted on its back side to the housing at a plurality of points around the housing so that the ring translates toward and away from the housing without making sliding contact with the housing, a plurality of at least thiee latch assemblies each pivotally mounted to the back side of the mounting ring around the axis, each latch assembly having a mounting post perpeπdiculai to the back side of the mounting ring, a non-metallic latch body pivotally and lesihently mounted to the mounting rmg at the mounting post so as to be biased towaid the mounting ring and rotatable through approximately 90° between a latched position and an unlatched position the body having a plurality of oversize actuator pm receiv ing lecesses theiein equally spaced aiound the mounting post a non-metallic front tollei rotatable on the body about an axis perpendicular to and intersecting the mounting post, the front roller having a gapping peπpheiy which lies adjacent the wafer engaging smface of the mounting ang when the latch assembly is rotated to its latched position and a rolling periphery which lies on a circle around the mounting post on the back side of the wafer mounting ang, and at least one non-metallic lear roller rotatable on the body about an axis perpendicular to and intersecting the mounting post, the teai rollei having a rolling periphery approximately equal to the rolling periphery ot the front rollei and lying on said circle, and a plurality of detents in the back side of the wafer mounting ring lying on said circle to receive the rolling peripheries of the rollers vv hen the latch assembly is in the unlatched position and the latched position, a load arm having a wafer chuck theieon and relatively moveable perpendicular to the plane in a path through the center of the holder between a rearward position on the backside of the holder outside of the load chambei and a forward position at which a wafer held in the chuck is in contact with the clamping member and is a spaced distance forward of the plane and at which the clamping member is spaced forward of the holder and is resiliently biased rearwardly against the wafer, a plurality of latch actuatois supported on the load aim, one coιτespondιng to and aligned with each of the latches, the acmators having a plurality of pins theieon configured and located so as to fit loosely into the recesses in the latch body upon movement of the load arm to its foi ward position being relatively moveable into and out of coupling engagement with the latches when the load aim moves respectively to its forward and rearwaid positions, and the actuators being rotatable, when coupled to the bodies of the latch assemblies, to rotate the latch assemblies between their latched and unlatched positions 18. A wafer holder for a semiconductor processing apparatus comprising a rigid annular housing having a central axis, a wafer mounting ring having a back side and a front side and an annular wafer engaging surface on the inner edge of its back side, the ring being centered on the axis and resiliently mounted on its back side to the housing at a plurality of points around the housing so that the ring translates toward and away from the housing without making sliding contact w tth the housing, pivotal latching means mounted to the back side of the mounting ring, including a non-metallic latch body, a non-metallic front roller rotatable on the body and having a gapping periphery which lies adjacent the ater engaging surface of the mounting ring when the latching means is rotated to a latched position and a rolling peapheiv in rolling contact with the back side of the wafer mounting rmg and at least one non-metallic leai rollei rotatable on the body m rolling contact with the back side of the wafer mounting ring and means for retaining the latching means is in its latched 01 an unlatched position 19. A method of supporting semiconductoi w ater in a processing apparatus the method comprising the steps of providing a wafer holdei ha ing a w afer mounting ring lesiliently mounted thereon in the vacuum chamber, providing a pluia tv of latches rotatablv mounted to the afer mounting ring moving a wafer on a transfer aim against the mounting ring, then rotating the latches with actuatois on the transfer arm to bang a first rolling surface on the latches into rolling contact with the wafer and to gap the wafer between the rollers and the mounting ring, then releasing the w afer from the transfer arm and to the holder, and the latch rotating step including the step of maintaining rolling contact between a second rolling surface of the latches and the mounting ring while simultaneously moving each of the latches from a stable unlatched position on the ring to a stable latched position on the ring 20. A latch assembly for a wafei holdei hav ing a water mounting rmg with an annular water engaging surface on an inner edge theieot the assembly comprising a non-metallic latch body contiguied to piv otally mount to the mounting rmg at a mounting axis perpendicular thereto a non-metallic front roller rotatable on the body and having a gapping periphery positioned to lie adjacent the wafer engaging suiface of the mounting ring when the latching assembly is rotated to a latched position and having a rolling periphery positioned to e m rolling contact with the wafer mounting ring, and at least one non-metallic rear roller rotatable on the body in rolling contact with the back side of the wafer mounting ring 21. The latch assembly of claim 20 furthei comprising a mounting post defining the axis and configured to removably pivotally connect the latch body assembly to the mounting ring, and a spring loaded ball bearing joint foi biasing the latch assembly toward the mounting ring and rotatably connecting the latch assembly to the mounting ring for rotation about the mounting post 22. The latch assembly of claim 20 herein: the non-metallic front rollei is rotatable on the body about a transverse axis peipendicular to and intersecting the mounting axis: and the at least one non-metallic rear roller is rotatable on the body about the transverse axis. 23. The latch assembly of claim 20 wherein: the g pping periphery has an outwardly diverging conical axial cross-section with rounded edges.. 24. The latch assembly of claim 20 wherein: the rolling periphery is greater than the gapping periphery. 25. The latch assembly of claim 20 wheiein: the rolling periphery of the rear roller is approximately equal to the rolling periphery of the front roller.

Inventors: JELINEK VACLAV, JELINEK, VACLAV
Applicants: TOKYO ELECTRON ARIZONA INC, TOKYO ELECTRON LTD, TOKYO ELECTRON ARIZONA, INC., TOKYO ELECTRON LIMITED
Application year: 1999
Main classification: H01L21
IPC codes: H01L21