LOW TEMPERATURE CVD PROCESSES FOR PREPARING FERROELECTRIC FILMS USING BI ALCOXIDES

Abstract: Chemical vapor deposition is used to form a film of Bi oxide, Sr oxide, and Ta oxide on a heated substrate by decomposing the precursors of these oxides at the surface of the substrate. The precursor of Bi oxide is a Bi complex which includes at least one alcoxide group and is decomposed and deposited at a temperature lower than 450 DEG C. The film of Bi, Sr, and Ta oxides obtained by low-temperature CVD is predominantly non-ferroelectric, but can be converted into a ferroelectric film by a subsequent heating process.

Description: LOW TEMPERATURE CVD PROCESSES FOR PREPARING FERROELECTRIC FILMS USING BI ALCOXIDES Cross Reference To Related Applications This application is related to U.S.S.N. 08/975,087, filed November 20, 1997, entitled "Low Temperature Chemical Vapor Deposition Process for Forming Bismuth-Containing Thin Films Useful in Ferroelectric Memory Devices." This application is related to co-pending applications U.S.S.N. 09/208,542, filed December 9, 1998, entitled "Low-temperature CVD processes for preparing ferroelectric films using Bi amides," U.S.S.N. 09/208,544, filed December 9, 1998, entitled "Low-temperature CVD processes for preparing ferroelectric films using Bi aryls," and U.S.S.N. 09/208,543, filed December 9, 1998, entitled "Low-temperature CVD processes for preparing ferroelectric films using Bi carboxylates." Background of the Invention This invention relates to chemical vapor deposition methods for providing a Bi oxide-containing film on a surface of a substrate by decomposing a precursor of Bi oxide. Interest in ferroelectrics has increased in recent years, due to the utility of these materials in applications such as non-volatile memories. Information in these memories is stored by the polarization of a thin ferroelectric film which is placed between the two plates of a capacitor. The capacitor is connected to a transistor to form a storage cell, which controls the access of read-out electronics to the capacitor. The information stored in the cell can be changed by applying an electric field to the thin ferroelectric film and flipping the polarization. Ferroelectric random access memories (FERAMs), unlike DRAMs (dynamic random access memories), retain the stored information if the power supply is turned off. In addition, they do not require refresh cycles. Desirable electrical properties for ferroelectrics used in memory applications include: (a) a low coercive field, which makes the use of as low a voltage supply as possible; (b) a high remanent polarization, which is needed for high reliability of information storage; (c) minimal fatigue, which is required for a long life-time; and (d) no imprint, as an imprint would alter the stored information. Strontium bismuth tantalate (SrBi 2 Ta2θ9) (SBT) is a ferroelectric material that meets all of these requirements. Significant efforts are therefore being made to integrate this material into memory devices. Capacitors in which SBT is incorporated using a sol-gel method have good electrical properties. The sol-gel method provides only a low integration density of SBT, however. To achieve a higher integration density of SBT, an alternative method, such as chemical vapor deposition (CVD), must be used. Summary of the Invention In one aspect, the invention features a method of forming a Bi- containing metal oxide film on a substrate, by dissolving a precursor of Bi oxide in a solution, decomposing the precursor to form Bi oxide, and depositing the Bi oxide on the substrate at a temperature lower than 450°C. Bi complexes which include at least one alcoxide group are used as the precursor of Bi oxide. Embodiments of this aspect of the invention may include one or more of the following features. The deposition temperature may be lower than 400°C. The Bi oxide- containing film may also be provided by adding the steps of decomposing a precursor of Sr oxide, and a precursor of Ta oxide to form Sr oxide and Ta oxide, respectively, and depositing the Bi oxide, the Sr oxide and the Ta oxide on the substrate. The film of Bi, Sr, and Ta oxides may be deposited as a ferroelectric film or can be converted into a ferroelectric film by an annealing process. The Bi-containing metal oxide film is formed by placing the substrate in a CVD chamber, heating the substrate to a deposition temperature lower than 450°C, introducing vapors of the precursors of Bi, Sr, and Ta oxides to the CVD chamber, decomposing the precursors of Bi, Sr, and Ta oxides, and depositing the oxides on the substrate. Precursors of Bi, Sr, and Ta oxides may be decomposed in the presence of an oxidizer by oxidative decomposition, where examples of the oxidizers include O2, singlet O2, O3, H2U2, N2O, NOx (1 <x<3), and downstream oxygen plasma, and where the concentration of the oxidizer is between 5% and 95% of the total gas and vapor flow into the CVD chamber. At least one of O2 and N2O may be used as the oxidizer. The oxidizer may be formed in the CVD chamber by converting an oxidizer molecule into an active oxidizer by applying to the CVD chamber plasma, UV light, heat, a sensitizer, or ion beams. The precursor of Bi oxide may have the formula Bi(OR) 3 , Bi(OR)2(OR'), or Bi(OR)(OR')(OR"), where each of R, R\ and R" is, independently, an alkyl, aryl, or silyl group. For example, R may be 'pentyl, pentyl, 'Bu, Bu, 'Pr, Pr, Et, Me, Ph, aryl, or SiR'" 3 , and R'" may be ( Bu, Bu, 'Pr, Pr, Et, or Me. Examples of precursors of Bi oxide further include Bi(θ'Bu)3 and Bi(OCMe2Et) 3 . The precursor of Bi oxide may also include an alkoxy group, a phenoxy group, or a donor atom such as N, O, or S. For example, the precursor may include the group -CH 2 CH2-N(CH 3 )2. The Bi-containing metal oxide deposited on the substrate may have the formula (Bi2θ 2 ) 2+ (A m -ιB m θ3m + ι) 2" I where A is Bi 3+ , L 3+ , L 2+ , Ca 2+ , Sr 2+ , Ba 2+ , Pb 2+ , or Na + , B is Fe 3+ , Al 3+ , Sc 3+ , Y 3+ , L 3+ , L 4+ , Ti 4+ , Nb 5+ , Ta 5+ , W 6+ , or Mo 6+ , and L is Ce 4+ , La 3+ , Pr 3+ , Ho 3+ , Eu 2+ , or Yb 2+ , and where 1 <m<5. The Bi-containing metal oxide may also have the formula B ' ^WOe; BiM0 3 , where M is Fe or Mn; Ba2BiMθ6, where M is V, Nb or Ta; Pb2BiMOe, where M is V, Nb or Ta; Ba 3 Bi2M09, where M is Mo or W; Pb3Bi2M0g, where M is Mo or W; BaeBiMOis, where M is Mo or W; PbeBiMOis, where M is Mo or W; KBiTi2θe; or These metal oxides can be obtained by decomposing precursors which contain the above-described metals. The Bi-containing metal oxide film can also be a SBT derivative. Examples of such derivatives include SrBi2Ta2θ9; SrBi2Ta2-xNb x Og, where 0<x<2; SrBi2Nb2θg; Srι- x BaχBi2Ta2-yNb y θ9, where 0<x<1 and 0<y<2; Srι.χCa x Bi2Ta2-yNb y θ9 where 0<x<1 and 0<y<2; Srι -x Pb Bi2Ta2- y Nb y θ9, where 0<x<1 and 0<y<2; and Sn- x -y-zBa x Ca y PbzBi2Ta2-pNbpθ9, where 0<χ<1 , 0<y<1 , 0<z<1 , and 0<p<2. An element of the metal oxide may be substituted by a metal such as Ce, La, Pr, Ho, Eu, and Yb. The precursor of Sr oxide generally has the formula Sr(thd)2 or Sr(thd)2 adduct, and may include a polyether or a polyamine. The polyether has the formula R-0-(CH 2 CH2θ)n-R', where 2<n<6, and where each of R and R' may be, independently, an alkyl group, an aryl group, or hydrogen. The polyamine has the formula R-NR"-(CH 2 CH 2 NR") n -R', where 2<n<6, where each of R and R' may be, independently, an alkyl group, an aryl group, or hydrogen, and where R" is H, Me, Et, or Pr. The precursor of Sr oxide may also include tetraglyme, triglyme, N,N,N',N",N"-pentamethyl-diethylene-triamine, or N,N,N',N",N'",N"'- hexamethyl-triethylene-tetramine. The precursor of Sr oxide may also be Sr alcoxide, Sr alcoxide mixed with Ta and Nb alcoxides, or a Lewis base adduct of the alcoxide, where the Lewis base is tetraglyme, triglyme, N,N,N',N",N"- pentamethyl-diethylene-triamine, or N,N,N',N",N'",N'"-hexamethyl-triethylene- tetramine. The precursor of Ta oxide generally has the formula Ta(OR)5-n(X)n, where R is Me, Et, Pr, 'Pr, Bu, 'Bu, *Bu, pentyl, or 'pentyl, where X is β- diketonate, and where 1 <n<5. For example, the precursor may be Ta(0'Pr) 4 (thd). The precursor of Ta oxide may be an alcoxide including Ta pentakis (ethoxide), Ta pentakis ( propoxide), Ta pentakis ('butoxide), or Ta pentakis ( pentoxide). The precursors of the Bi, Sr, and Ta oxides are dissolved in a solution of an aliphatic, a cycloaliphatic, or an aromatic solvent that may include a functional group such as an alcohol, ether, ester, amine, ketone, or aldehyde group. For example, the precursors of Bi, Sr, and Ta oxides may be dissolved in a solvent such as an alcohol. For example, t-butanol may be used as a solvent for Bi(θ'Bu)3, and t-pentanol for Bi(OCMe 2 Et)3. Alternatively, the precursors may be dissolved in a mixture of THF, 'PrOH, and a Lewis base in a ratio of about 8:2:1 , respectively, or a mixture of octane, decane, and pentamethyl-diethylene- triamine in a ratio of about 5:4:1. Furthermore, the precursor of Bi oxide may be dissolved in a solution comprising Lewis base adducts. The solutions containing the precursors are evaporated by vaporizers. For example, the solution containing the precursor of Bi oxide is evaporated at a temperature from 130°C to 220°C, and the solution for the precursors of Sr and Ta oxides is evaporated at a temperature from 170°C to 240°C. An inert gas such as Ar, He, or N2 is added to the vapors of the solution, and a mixture of the inert gas and vapors is delivered to the CVD chamber. For example, the mixture includes vapors of the precursors of Bi oxide, Sr oxide, and Ta oxide in a ratio of about 2:1 :2. It is appreciated that the concentrations of the precursors in the vapor mixture depend on several factors, including vaporization temperature, pressure in the vaporizer, gas and vapor flow rate, desired film stoichiometry, and geometry of the CVD chamber. In the CVD chamber, the substrate is heated to the deposition temperature of 300°C to 450°C. The pressure in the CVD chamber is maintained between 0.001 torr and 760 torr, for example, between 0.1 torr and 10 torr. An additional inert gas is added to the CVD chamber, where the concentration of the inert gas may vary from 10% to 90% of the total gas and vapor flow into the CVD chamber, for example, 30% to 50%. Preferably, the vapors of the precursors, the oxidizers, and an inert gas are introduced to the CVD chamber at a total flow rate of 1 ml/min to 15,000 ml/min, measured at the standard condition. The desirable flow rate may also depend on the temperature and the pressure of the gas and vapor mixture, desired film stoichiometry, and geometry of the CVD chamber. The oxides are deposited onto the substrate over a time period between 2 minutes and 2 hours, for example, between 2 minutes and 15 minutes. After deposition, the film is heated to a temperature of 600°C to 800°C for a time period between 5 minutes and 3 hours. The substrate preferably includes Si, n-doped Si, p-doped Si, Siθ2, Si 3 N 4 , GaAs, MgO, AI2O3, Zr0 2 , SrTiOs, BaTiOs, or PbTiOs. The film of Bi- containing metal oxide is deposited on a bottom electrode disposed on the substrate which includes a transistor. The bottom electrode is connected to the transistor by a plug. The bottom electrode may include a metal such as Pt, Pd, Au, Ir, or Rh; a conducting metal oxide such as lrO x , RhO x , RuO x , OsO x , ReO x , or WOx, where 0<x<2; a conducting metal nitride such as TiN x , ZrN x , or WN y TaN y , where O≤x≤I .O and 0<y<1.7; or a superconducting oxide such as YBa 2 Cu30 . x where 0<x<1 , and Bi2Sr2Ca2Cu3θιo. The bottom electrode may be a Pt electrode. A first intermediate layer may be provided between the bottom electrode and the plug. Examples of the first intermediate layer include a Ti adhesion layer and a Ti nitride diffusion barrier layer. A second intermediate layer may also be provided between the bottom electrode and the metal oxide layer. Examples of the second intermediate layer include a seed layer, a conducting layer, and a dielectric layer of high permittivity. The plug may include W or Si, and is connected to the bottom electrode and to a source/drain of a MOS field effect transistor. The film may also be used as a thin ferroelectric film for a ferroelectric capacitor, a ferroelectric memory, and/or a ferroelectric field effect transistor, for example, a metal ferroelectric semiconductor and a metal ferroelectric insulating semiconductor. The substrate may be flushed with a mixture of an inert gas and the oxidizer before and/or after being exposed to the vapors of the precursors of the metal oxides. The processes of heating, decomposing, and depositing may be performed at least twice on the substrate. The substrate may also be removed from the chamber, treated by at least one intermediate process, such as a rapid thermal process, and returned to the chamber. The operating conditions of the CVD may also be changed. For example, the compositions of the precursors, oxidizers, and inert gas in the mixture may be varied while the substrate is positioned in the chamber. Deposition temperature as well as the chamber pressure may also be varied. The precursor of Bi oxide may be delivered to the CVD chamber during a period between the onset of deposition and 30 minutes thereafter; the concentration of the Bi oxide is then decreased. In other methods, the substrate may be heated inside the chamber at a temperature lower than 450°C at least twice, or the substrate may be heated inside the chamber at a temperature lower than 450°C in the presence of at least one of the oxidizers O2 and O3. In another aspect, the invention features a method of forming a metal oxide film on a substrate, by heating the substrate to a temperature lower than 450°C and introducing vapors of a precursor of Bi oxide to the substrate. Bi complexes which include at least one alcoxide group are used as the precursors of Bi oxide. The precursor of Bi oxide decomposes at the surface of the substrate to form Bi oxide, which is deposited on the surface of the substrate. As used herein, the term "precursor of Bi oxide" means any Bi complex which may be degraded to form Bi oxide. Examples of precursors of Bi oxide include Bi alcoxides, which have the structure Bi(OR)3, Bi(OR)2(OR') or Bi(OR)(OR')(OR"), where each of R, R\ and R" is, independently, an alkyl or an aryl group. Bi alcoxides also include derivatives of the above-described precursors. The use of Bi alcoxides as the precursors of Bi oxide in chemical vapor deposition offers numerous advantages. Bi alcoxides contain Bi-0 bonds which are relatively easy to cleave. Accordingly, Bi alcoxides can be decomposed at lower temperatures. Decomposition and deposition at a lower temperature decreases the migration of Bi oxide to the bottom electrode and the substrate. The degradation of the pre-existing structure is thereby minimized. Furthermore, Bi alcoxides do not require oxygen as a co-reactant for the formation of the Bi oxide layer. It is believed that this contributes to conformal deposition of Bi oxides. Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Although methods and materials similar or equivalent to these described herein can be used in the practice or testing of the present invention, suitable methods and materials are described below. All publications, patent applications, patents, and other references mentioned herein are incorporated by reference in their entirety. In case of conflict, the present specification, including definitions, will control. In addition, the materials, methods, and examples are illustrative only and not intended to be limiting. Other features and advantages of the invention will be apparent from the following detailed description, and from the claims. Brief Description of the Drawings Fig. 1 is a schematic diagram of a storage cell with a ferroelectric memory. Fig. 2 is a schematic diagram of a SBT layer incorporated into a stack capacitor with a transistor. Fig. 3 is a graph showing the STA results of Bi(OEt)3 in Ar (left) and O2 (right). Fig. 4 is a graph showing the STA results of Bi(0'Pr)3 in Ar (left) and 0 (right). Fig. 5 is a graph showing the STA results of Bi(θ'Bu)3 in Ar (left) and 0 2 (right). Fig. 6 is a graph showing the STA results of Bi(O l Pe)3 in Ar (left) and 0 2 (right). Detailed Description Chemical vapor deposition can be used to provide a thin film of Bi, Sr, and Ta oxides on a surface of a substrate. The substrate can then be used to manufacture devices such as storage cells. Referring to Fig. 1 , a storage cell is formed by placing a layer 1 of ferroelectric material between two plates of a capacitor 2. Capacitor 2 is connected to transistor 3 which has a bit-line 4 and a word-line 5, and which controls access of read-out electronics to capacitor 2. Ferroelectric layer 1 stores information by polarization in a non-volatile manner. Referring to Fig. 2, a ferroelectric SBT layer 9 is incorporated into a stack capacitor with a transistor to form a storage cell. The stack capacitor sits on top of the transistor, and the bottom electrode 6 of the capacitor is connected with a drain of the MOSFET (metal-oxide-semiconductor-field-effect-transistor) by a plug 8 which is made from either poly Si or W. Ferroelectric layer 9 is disposed between the bottom electrode 6 and the top electrode 10. Chemical vapor deposition (CVD) is used to provide the ferroelectric layers in Figs. 1 and 2. For example, CVD is used to deposit layers of metal oxides of Bi, Sr, and Ta on a Ptπ " i/SiO_>/Si substrate. During CVD, a substrate is placed in a CVD chamber at a low pressure, and is heated to a deposition temperature. Precursors are vaporized and then delivered to the CVD chamber. Vapors of the precursors are decomposed at the surface of the substrate, and metal oxide molecules are deposited on the substrate to form a thin film. Metal oxide films formed by the CVD process have higher conformality and better step coverage than films produced by other methods. Further advantages of the CVD process include high film uniformity, high film density, the capability to grow very thin films, a high throughput, and low manufacturing costs. PRECURSORS FOR BI OXIDES Bi alcoxides contain Bi-0 bonds which are relatively easy to cleave. Bi alcoxides also include other bonds which can be cleaved at a relatively low temperature. Furthermore, when Bi alcoxides are used as precursors of Bi oxide, oxygen is not required as a co-reactant for the formation of the Bi oxide layer. It is believed that these properties of Bi alcoxides contribute to the favorable decomposition mechanism of Bi alcoxides and conformal deposition of Bi oxides. Bi oxides can be deposited at low temperatures, for example, at 300°C. Oxides of Bi, Sr, and Ta can be deposited together in a desired film stoichiometry, such as Bi 2 θ3-SrO-Ta2θs. The SBT film obtained using Bi alcoxide as a precursor of Bi oxide exhibits high uniformity of composition within the wafer, high conformity to the structure of the surface, and high run-to-run repeatability. The film of Bi, Sr, and Ta oxides formed by the low temperature deposition is generally non-ferroelectric but can be transformed, by a post- deposition treatment such as annealing, into a ferroelectric Aurivilius phase. Bi alcoxides used as precursors of Bi oxides generally have the structure Bi(OR) 3 , Bi(OR) 2 (OR') or Bi(OR)(OR')(OR"), where each of R, R\ and R" is, independently, an alkyl, aryl, or silyl group. For example, R may be 'pentyl, pentyl, 'Bu, BU, 'Pr, Pr, Et, Me, Ph, aryl, or SiR'" 3 , where R'" is 'Bu, BU, 'Pr, Pr, Et, or Me. Examples of Bi alcoxides include Bi(OC5Hn) 3 , Bi(OCMe2Et)3, Bi(θ'Bu) 3 , and B O'Pr Bi alcoxides also include derivatives of the precursors discussed above. They also include derivatives in which the alkyl groups contain donor atoms, such as N, O, or S. For example, a -CH 2 CH2-N(CH3)2 group may be incorporated into a Bi alcoxide to provide the precursor, Bi(0-CH2CH2-N(CH3)2)3. All of these molecules are capable of undergoing oxidative decomposition at very low temperatures. Accordingly, these molecules yield Bi oxides in a controlled and reproducible manner. Additional information regarding the preparation of these precursors may be found in one or more of the following references. A.P. Pisarevskii et al., Inorg. Chem. 35(6), p.84 (1990); W.A. Hermann et al., Chem. Ber. 126, p.1127 (1993); R.G. Goel et al., J. Organomet. Chem. 36, p.323 (1972); Y. Okuhara et al., 9th Int. Symp. on Int. Ferroelectrics, Development of New Ferroelectric Source Materials for MOCVD and MOD, p.133i (1997); Y. Kojima et al., Integrated Ferroelectrics, 18, p.183 (1997); JP 9067197; JP 9077592; JP 8339716; BI-CONTAINING METAL OXIDES Bi-containing metal oxides deposited on the substrate generally have the following structure: (Bi2θ2) 2+ (Am-lBm0 3 m + l) 2" , where A is Bi 3+ , L 3+ , L 2 \ Ca 2+ , Sr 2+ , Ba 2+ , Pb 2+ , or Na + , B is Fe 3+ , Al 3+ , Sc 3+ , Y 3+ , L 3+ , L 4+ , Ti 4+ , Nb 5+ , Ta 5+ , W 6+ , or Mo 6+ , where L represents a metal from the lanthanide series, such as Ce + , La + , Pr 3+ , Ho 3+ , Eu 2+ , or Yb 2+ , and m is 1 , 2, 3, 4, or 5. These Bi-containing metal oxides are predominantly non-ferroelectric, but can be transformed by an annealing process into ferroelectric oxides with a layered perovskite structure such as the one in the Aurivilius phase. Examples of Bi-containing metal oxides further include: Bi 2 W0 6 ; BiMθ3, where M is Fe or Mn; Ba2BiMOe, where M is V, Nb or Ta; Pb 2 BiM0 6 , where M is V, Nb or Ta; Ba3Bi 2 Mθ9, where M is Mo or W; Pb3Bi2MOg, where M is Mo or W; BaβBiMOis, where M is Mo or W; PbβBiMOis, where M is Mo or W; KBiTi 2 0 6 ; and Additional information regarding the preparation of these metal oxides may be found in one or both of the following references. T. Kodas and M.J. Hampden- Smith, The Chemistry of Metal CVD, Wiley (1994), and W.S. Rees, CVD of Nonmetals, Wiley (1996). PRECURSORS FOR SR OXIDES Sr(thd)2 or Sr(thd) 2 (tetraglyme) is generally used as the precursor of Sr oxide, where thd represents 2,2,6,6,-tetramethyl-heptane-2,5-dionate. Additional ligands of the adduct may be: polyethers, for example, R-0-(CH2CH2θ) n -R', where 2<n<6, and where each of R and R' is, independently, an alkyl group, an aryl group or hydrogen; or polyamines, for example, R-NR"-(CH2CH2NR") n -R', where 2<n<6, where each of R and R' is, independently, alkyl, aryl, or hydrogen, and where R" is H, Me, Et or Pr. Sr(thd)2 adducts may include adducts with tetraglyme (MeO- (CH 2 CH 2 0) 4 -Me), triglyme (MeO-(CH 2 CH 2 0)3-Me), N,N,N',N",N"-pentamethyl- diethylene-triamine (Me2N-(CH 2 CH 2 NMe) 2 -Me), or N,N,N',N",N" , ,N"'-hexamethyl- triethylene-tetramine (Me2N-(CH 2 CH2NMe)3-Me). Other examples of the precursors of Sr oxide include alcoxides, mixed alcoxides with Ta/Nb alcoxides, and a Lewis base adduct of the alcoxide, where the Lewis base is tetraglyme (MeO-(CH 2 CH 2 0) -Me), triglyme (MeO- (CH 2 CH 2 0)3-Me), N,N,N',N",N"-pentamethyl-diethylene-triamine (Me 2 N- (CH 2 CH 2 NMe)2-Me), or N,N,N',N",N'",N , "-hexamethyl-triethylene-tetramine (Me 2 N-(CH 2 CH2NMe)3-Me). PRECURSORS FOR TA OXIDES The precursor of Ta oxide generally has the structure Ta(OR)5-n(X)n, where R is Me, Et, Pr, 'Pr, Bu, 'Bu, 'Bu, pentyl, or 'pentyl, where X is β- diketonate, and where 1 <n<5. For example, Ta(0'Pr) 4 (thd) may be used as the precursor of Ta oxide. Alcoxides may also be used as the precursor of Ta oxide. Examples include, but are not limited to, Ta pentakis (ethoxide), Ta pentakis ( propoxide), Ta pentakis ('butoxide), Ta pentakis ( pentoxide), Ta alcoxides, and Ta complex including a mixture of these ligands. SBT Strontium bismuth tantalates generally have the structure SrBi2Ta2θg, or one of its derivatives, such as: SrBi2Ta2-χNb x Og, where 0<x<2; Srι- x Ba x Bi2Ta2-yNb y θ9, where 0<x<1 and 0<y<2; Srι-xCa x Bi2Ta2- y Nb y θ9 where 0<x<1 and 0<y<2; Srι- x Pb x Bi2Ta2-yNb y θ9, where 0<x<1 and 0<y<2; Srι- x - y -zBa x Ca y Pb z Bi2Ta2-pNbpθ9, where 0<x<1 , 0<y<1 , 0<z<1 , and 0<p<2. SBT's also include the above described compounds in which one or more elements are substituted and/or doped by a metal from the lanthanide series, such as Ce, La, Pr, Ho, Eu, and Yb. SOLUTION MIXTURES Preferably, liquid delivery CVD is used in the methods of the invention. During liquid delivery CVD, precursors of Bi, Sr, and Ta oxides are dissolved in a solvent or a mixed solution and are then delivered to a vaporizer in a liquid phase. Examples of solvents include, but are not limited to, aliphatic, cycloaliphatic or aromatic solvents, which may have functional groups such as alcohols, ethers, esters, amines, ketones, and/or aldehydes. Mixture of these solvents may also be used, for example, a mixture of THF, 'PrOH, and a Lewis base in a ratio of 8:2:1 , respectively, and a mixture of octane, decane, and pentamethyl-diethylene-triamine in a ratio of about 5:4:1. When homoleptic bismuth alcoxides (Bi(OR)3), such as Bi(0*Bu)3 and Bi(OC(Me)2Et)3, are used, Lewis base adducts are used to provide suitable solutions for the liquid delivery of the precursors of Sr, Bi, and Ta oxides. The excess alcohol facilitates transport of Bi alcoxide, and the excess Lewis base improves the stabilization and transport of the Group II species, namely Sr(thd)2 tetraglyme or Sr(thd)2 polyamine. The solution compatibility is critical in controlling the transport and delivery of the solution, and for prolonging the lifetime of the vaporizer. Precursors of Ta oxide may be altered for compatibility with Bi alcoxide in a solution. For example, the substitution of (O'Bu) ligands for (O'Pr) in the usual Ta(0'Pr) 4 (thd) may improve long-term compatibility and storage of the solution. Furthermore, the identity of the components of the solution can be maintained for extended periods of time without ligand exchange and ultimate uncontrolled degradation of the precursors. Further details are described in a currently pending patent application U.S.S.N. 09/107,861 , filed June 30, 1998, entitled "Amorphously deposited metal oxide ceramic films," which is hereby incorporated by reference. VAPORIZATION PROCESS Precursors of Bi, Sr, and Ta oxides are vaporized prior to the delivery of these oxides to a CVD chamber. The precursor solution is vaporized, for example, in one or more flash vaporizers. The precursor solution may contain all three precursors, or multiple solutions may be used in which each solution contains one or more precursors. In a CVD process with single-source liquid delivery, Bi alcoxide is vaporized in tandem with the precursors of Sr and Ta oxides. Accordingly, it is necessary to prepare a solution which contains all three precursors. Another approach is to evaporate Bi alcoxide in one vaporizer and precursors of Sr and Ta oxides in a second vaporizer. The first approach is preferred for manufacturing the SBT layer, because it is easier and because it allows for controlled deposition. Several delivery approaches may also be taken in the multiple vaporizer approach. The precursors are stored in separate solutions, each of which is evaporated in a separate vaporizer. The vapors are then mixed and delivered to the substrate surface in the CVD chamber. Alternatively, precursors of Sr and Ta oxides are stored in separate solutions which are mixed prior to vaporization, for example, by a liquid delivery system. The mixed solution is delivered to a single vaporizer. The precursor of Bi oxide is delivered to a second vaporizer. After evaporating the precursors, the vapors are mixed and delivered to the CVD chamber. In yet another process, precursors of Sr and Ta oxides are stored as a precursor mixture in one solution and delivered to a single vaporizer. The precursor of Bi oxide is delivered to a second vaporizer. After evaporation of the precursors, the vapors are mixed and delivered to the CVD chamber. Alternatively, the precursor of Bi oxide may be vaporized in one vaporizer and precursors of Sr and Ta oxides in a second vaporizer. However, instead of having precursors of Sr and Ta oxides in two separate reservoirs, two solution mixtures are prepared where each contains precursors of Sr and Ta oxides in different concentrations. This allows more accurate mixing of the precursors of Sr and Ta oxides. Additional information regarding the CVD process may be found in one or more of the following references. U.S. Pat. Application U.S.S.N. 08/758,599, filed November 27, 1996, entitled "Multiple Vaporizer Reagent Supply System for Chemical Vapor Deposition Utilizing Dissimilar Precursor Composition"; U.S. Pat. No. 5,536,323; U.S. Pat. No. 5,337,651 ; U.S. Pat. No. 5,431 ,957; U.S. Pat. No. 5,362,328; and U.S. Pat. No. 5,204,314. OXIDIZER Precursors of Bi, Sr, and Ta oxides are decomposed in the presence of an oxidizer by oxidative decomposition. O2 is generally used as an oxidizer. However, deposition efficiency may be improved by using more reactive oxidizers during the film deposition. Examples of these alternate oxidizers include singlet O2, O3, H2O2, N2O, NO x (1 <x<3), and downstream oxygen plasma. The concentration of the oxidizer may be maintained at a level between 5% and 95% of the total gas and vapor flow into the CVD chamber. At least one of O2 and N2O may be used as the oxidizer. The oxidizer may be supplied to the CVD chamber from an external source such as a tank, or may be formed in the CVD chamber by converting a molecule therein into an active oxidizer by applying to the CVD chamber plasma, UV light, heat, a sensitizer, or ion beams. O3 can form oxygen radicals O which can react with the precursors of Bi oxide, Sr oxide, and/or Ta oxide. The reaction may occur in the boundary layer, for example, by inserting the O radical into the Bi-0 bonds or by undergoing an electrocyclical bimolecular reaction. When O3 reacts with a precursor containing a phenyl ring, O3 may attack the ring and crack the molecule from another side, yielding an intermediate product such as 0=BiPh3, which may either decompose back to BiPh3 or undergo a rearrangement to form a (PhO)BiPh2. Chemical properties of the substrate surface may also be affected by O3. For example, the amount of adsorbed O atoms may be increased, or the electrochemical potential of the surface and its electrical conductivity may be altered. O3 may also affect the chemical properties of the surface of the Bi-containing metal oxide film during its growth in the CVD chamber. NO and NO2 can react with the precursors already in the boundary layer, for example. In addition, NO and NO2 can be adsorbed on the substrate, react with intermediate products from the decomposition reaction of the precursors, or increase the substrate surface potential for further chemical reactions. H2O2 can react with the precursors in the boundary layer or at the heterogenous surface. H2O2 may form OH and OOH groups on the substrate and provide new decomposition pathways for the precursors. Singlet O2 (O2) is a very effective oxidizer which can be formed by light irradiation of triplet 3 θ2 in the presence of a sensitizer such as rose bengal or via direct irradiation of 3 θ2 below 200 nm by, for example, a low pressure Hg lamp/excimer laser. To form downstream oxygen plasma, the precursor vapor is mixed with an oxygen plasma. The reactive species in the plasma are single O atoms, activated O2 molecules, and O3. The plasma is generated before the oxidizer is mixed with the precursor vapor. This technique effectively modifies CVD processes without direct exposure of the precursors to the high translational energies present in the plasma. G. Lucovsky et al., J. Vac. Sci. Tech. A 4, 681 , [1986]; Van Buskirk et al., J. Vac. Sci. Tech. A 10(4), 1578, [1992]. The use of oxidizers offers a number of benefits in depositing the Bi- containing metal oxide film. In general, oxidizers allow low temperature deposition of Bi oxides on the substrate. Oxidizers also stabilize and enhance the deposition of Bi oxides at low pressures. Oxidizers also help in depositing the Bi-containing metal oxide film in a desirable phase. CVD PROCESS The substrate is heated to a deposition temperature ranging from 300°C to 500°C. Preferably, the substrate is heated to a temperature below 450°C. The pressure in the chamber is maintained between 0.1 and 10 torr. A carrier gas such as Ar, He, or N2, and oxidizers such as O2, singlet O2, O3, N2O, NOx (1 <x<3), and downstream oxygen plasma are also delivered to the CVD chamber. The total gas flow is maintained between 1 and 15,000 seem, where seem represents a volumetric flow rate in the unit of cc/min measured at the standard condition, that is, at 0°C and 1 atm. The deposition time ranges from 30 to 60 minutes. CVD processes for SBT can be carried out at different deposition temperatures. For example, the CVD process at a temperature such as 430°C yields a non-ferroelectric film in the fluorite phase. By annealing between 600°C and 820°C, for example, at 750°C for one hour, this film is converted into the ferroelectric Aurivilius phase. The structure of the deposited film depends on many different deposition parameters, although the deposition temperature has the most profound effect. For example, films deposited at lower temperatures, for example, at 350°C, are predominately amorphous. At high temperatures, for example, 650°C, the CVD process yields films which are in a crystalline non-ferroelectric phase, such as a fluorite phase, or which are already in the ferroelectric Aurivilius phase. By annealing at 800°C (ferroanπeal), the non-ferroelectric SBT layer can be transformed into the ferroelectric Aurivilius phase, or the electrical properties of the existing ferroelectric films can be enhanced. Alternatively, the deposition may be carried out under two different conditions. For example, it may be advantageous to deposit more Bi oxides in the beginning of the CVD process than during the rest of the process to compensate for a loss of Bi oxides due to depletion into the bottom electrode during deposition and/or annealing. It may also be helpful to have a nucleation control in the beginning, even if this decreases the growth rate. After the nucleation step, the conditions are changed for a high growth rate in the second deposition step. Nucleation is very important for phase control and can be very important for composition control, for example, if the film composition depends on the nature of the surface. EXAMPLE 1 TGA AND DSC STUDY RESULTS STA, a combination of thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC) was performed in both argon and oxygen atmospheres. Using purified Bi alcoxides, a comparison of transport and stability was performed via controlled heating (10°C/min) in atmospheres of each gas. The STA results of Bi(OEt) 3 , Bi(0 J Pr)3, Bi(θ'Bu) 3 , and Bi(θ'Pe) 3 are shown in Figs. 3, 4, 5, and 6, respectively. The left columns show the STA results of the Bi alcoxides in Ar, and the right columns show the STA results of the Bi alcoxides in 0 2 . As illustrated by these Figures, the ethoxide and i-propoxide materials exhibited thermal decomposition during transport both in Ar, He, and 0 2 . It is believed that these processes produced oligomeric species that decomposed further upon continued heating. However, for Bi(θ'Bu)3 and Bi(OC(Me)2Et)3 in Ar, the data showed a sublimation point of 175°C for the butoxide and of 210°C for the pentoxide. Both compounds exhibited thermal transport in argon and were stable in O2 at temperatures up to 190°C. These Bi alcoxides had excellent evaporation characteristics and showed enough stability toward O2 to avoid formation of particles in the gas- phase. It was therefore believed that Bi alcoxides, along with alcoxides of Sr and Ta, or mixed Sr/Ta alcoxides, could be used for the single source solution and liquid delivery transport of the precursors for SBT. EXAMPLE 2 COMPATIBILITY STUDIES Under some conditions, Bi alcoxides can show a rapid ligand exchange with Sr(thd)2 in a solution mixture of THF, 'PrOH, and tetraglyme in a ratio of 8:2:1 , respectively. For example, the alcoxide ligands may be exchanged with the β-diketone ligands, resulting in a mixture of alcoxide β- diketonate precursors. Ligand exchange may also occur with the precursor of Ta oxide, where the rate of equilibration or ligand exchange is a function of the solvent composition and temperature. Equilibration may result in a changing precursor identity and, therefore, may affect the thermal stability and gas-phase transport during "flash" vaporization. If ligand exchange of the precursors is observed, precursors having the same ligand can be used. In order to avoid ligand exchange when alcohol is used as the solvent, a solvent containing the same alcoxy group as the alcoxide ligands for the alcoxides should be used. Alternatively, precursors can be stored in separate solutions which are evaporated in separate vaporizers. EXAMPLE 3 LOW-TEMPERATURE CVD PROCESS A Pt/Ti/SiOa/Si substrate (100 nm Pt on 10 nm Ti) is placed in a CVD chamber. The temperature of the substrate is maintained by a resistivity heater and kept between 300°C and 500°C, for example, 430°C. The chamber pressure is between 0.5 and 5 torr, for example, 1 torr. The total gas flow is between 500 and 2,000 seem, for example, 1 ,300 seem. 0 2 is used as an oxidizer. The amount of O2 is between 20% and 80% of the total gas flow, for example 40%. The deposition time is 30 to 60 min. Bi(θ'Bu) 3 (Bismuth tris ('butoxide)), Sr(thd) 2 (tetraglyme), and Ta(θ'Bu) (thd) are used as precursors of Bi oxide, Sr oxide, and Ta oxide, respectively. Precursors of Sr oxide and Ta oxide are stored in a solution of THF, 'PrOH, and tetraglyme in a ratio of 8:2:1 , respectively. The concentrations in the solution are 0.3 molar Ta precursor and 0.15 molar Sr precursor. This solution is delivered by a pump to a flash-vaporizer and evaporated on a stainless-steel frit at a temperature between 210°C and 230°C. A precursor solution delivery rate is 0.05-0.30 ml/min, for example, 0.15 ml/min. A carrier gas such as Ar is also delivered at a rate of 200-800 seem, for example, 400 seem. For a frit 1.6 cm in diameter, these flow rates give efficient evaporation results. In a second approach, Bi(0*Bu)3 is stored separately in a solution mixture of a decane, dodecane, and polyamine. The Sr source is changed to a polyamine adduct such as Sr(thd)2 polyamine for compatibility. The concentration of Bi alcoxide is, for example, 0.1 molar. This solution is delivered to a second vaporizer which is maintained at a temperature of 200°C. For a stainless steel frit 1.6 cm in diameter, a liquid delivery rate of 0.05-0.30 ml/min, for example, 0.15 ml/min is used, and a carrier gas flow of 200-800 seem, for example, 400 seem is used. After vaporization, vapors of the precursors of Sr oxide and Ta oxide are mixed with Bi alcoxide vapors. These vapors are delivered to a CVD chamber through a showerhead in which they are mixed with O2 and with additional Ar in order to adjust total gas flow and O2 content. Gas flow rates are 400 seem of Ar carrier for both precursors of Sr oxide and Ta oxide, 300 seem of Ar carrier for Bi alcoxide, 180 seem of additional Ar, and 520 After the CVD process, the film is annealed at 750°C for 60 minutes or at 800°C for 15 minutes to form the ferroelectric Aurivilius phase. EXAMPLE 4 HIGH-TEMPERATURE CVD PROCESS Chemical vapor deposition is also carried out at higher temperatures, for example, at 600°C. Precursors and deposition conditions are the same as those used in the low temperature process. The high-temperature process results in a film which is in a non-ferroelectric fluorite phase, in a ferroelectric Aurivilius phase, or in a mixture of these phases. After the CVD process, the deposited film is annealed at 750°C for 60 minutes or at 800°C for 15 minutes in order to form and/or to completely crystallize the ferroelectric Aurivilius phase. EXAMPLE 5 MULTI-STEP CVD PROCESS A multi-step process is also used, where a different deposition condition is applied for the first 2-10 minutes in order to yield a higher Bi content in the parts of the film adjacent to the Pt bottom electrode than in the rest of the film. An increased amount of the precursor of Bi oxide is delivered to the CVD chamber for the first 2-10 minutes, for example, by increasing the liquid delivery rate of the second, Bi alcoxide vaporizer. All other parameters in this step, and all parameters for the second step, are the same as those used in the single- step process. It is to be understood that while the invention has been described in conjunction with the detailed description thereof, the foregoing description is intended to illustrate and not limit the scope of the invention, which is defined by the scope of the appended claims. Other aspects, advantages, and modifications are within the scope of the following claims.

Claims: What Is Claimed Is: 1. A method of forming a film comprising Bi oxide on a substrate, said method comprising: dissolving a precursor of Bi oxide in a solution, wherein said precursor of Bi oxide comprises at least one alcoxide group; decomposing said precursor of Bi oxide to form Bi oxide at a temperature lower than 450°C; and depositing said Bi oxide on said substrate at a temperature lower than 450°C. 2. The method of claim 1 , wherein said step of decomposing said precursor and depositing said Bi oxide takes place at temperature lower than 400°C. 3. The method of claim 1 , further comprising: decomposing a precursor of Sr oxide and a precursor of Ta oxide and depositing said Sr oxide and said Ta oxide on said substrate at a temperature lower than 450°. 4. The method of claim 3, wherein said precursors of Sr oxide and Ta oxide are dissolved in a solution prior to being decomposed. 5. The method of claim 1 , further comprising converting said film into a ferroelectric film by an annealing process. 6. The method of claim 1 , wherein said film is deposited as a ferroelectric film. 7. The method of claim 4, wherein said method further comprises: placing said substrate in a chamber; heating said substrate to a deposition temperature lower than 450°C; introducing vapors of said precursor of Bi oxide, said precursor of Sr oxide, and said precursor of Ta oxide into said chamber; decomposing said precursors of Bi oxide, Sr oxide, and Ta oxide into said oxides thereof; and depositing said oxides on said substrate. 8. The method of claim 7, wherein the decomposition of said precursors comprises: introducing an oxidizer into said chamber; and converting said precursors into said oxides by oxidative decomposition. 9. The method of claim 8, wherein said oxidizer comprises at least one of O2, singlet O2, O3, H 2 0 2) N2O, NO x , where x is 1 , 2, or 3, and downstream oxygen plasma. 10. The method of claim 9, wherein said oxidizer occupies between 5% and 95% of the total gas and vapor flow into said chamber. 1 1. The method of claim 8, wherein at least two different oxidizers are introduced into said chamber. 12. The method of claim 9, wherein said oxidizer comprises at least 13. The method of claim 8, wherein said oxidizer is formed by converting a molecule in said chamber into an active oxidizer by applying at least one of a plasma, UV light, heat, a sensitizer, and ion beams. 14. The method of claim 1 , wherein said precursor of Bi oxide has the formula Bi(OR) 3 , Bi(OR) 2 (OR'), or Bi(OR)(OR')(OR"), wherein each of R, R', and R" is, independently, an alkyl, aryl, or silyl group. 15. The method of claim 14, wherein said precursor of Bi oxide is Bi(OR) 3 , wherein R is 'pentyl, pentyl, 'Bu, BU, 'Pr, Pr, Et, Me, Ph, aryl, or SiR'" 3 , wherein R'" is 'Bu, BU, J Pr, Pr, Et, or Me. 16. The method of claim 15, wherein said precursor of Bi oxide is Bi(θ'Bu) 3 or Bi(OCMe 2 Et) 3 . 17. The method of claim 1 , wherein said precursor of Bi oxide comprises an alkoxy group, phenoxy group, a silyl group, or a donor atom selected from the group consisting of N, O, and S. 18. The method of claim 17, wherein said precursor of Bi oxide comprises the group -CH 2 CH2-N(CH 3 )2. 19. The method of claim 1 , wherein said film comprises at least one of Ca, Ba, Pb, Na, Fe, Al, Sc, Y, Ti, Nb, W, Mo, Ce, La, Pr, Ho, Eu, and Yb. 20. The method of claim 19, wherein said film comprises a compound having the formula (Bi2θ2) 2+ (Am-lBm0 3 m + l) 2" , wherein A is Bi 3+ , L 3+ , L 2+ , Ca 2+ , Sr 2+ , Ba 2+ , Pb 2+ , or Na\ B is Fe 3+ , Al 3+ , Sc 3+ , Y 3+ , L 3+ , L 4 \ Ti 4+ , Nb 5+ , Ta 5+ , W 6+ , or Mo 6 \ wherein L is selected from the group consisting of Ce 4+ , La 3+ , Pr 3+ , Ho 3+ , Eu 2+ and Yb 2+ , and m is 1 , 2, 3, 4, or 5. 21. The method of claim 20, wherein said film comprises a compound selected from the group consisting of: Bi W0 6 ; BiMθ3, where M is Fe or Mn; Ba2BiMOe, where M is V, Nb or Ta; Pb2BiMOe, where M is V, Nb or Ta; Ba3Bi 2 M09, where M is Mo or W; Pb3Bi2MOg, where M is Mo or W; BaeBiMOia, where M is Mo or W; PbeBiMOis, where M is Mo or W; KBiTi 2 0 6 ; and K 2 BiNb 5 0ι 5 . 22. The method of claim 1 , wherein said film comprises a compound having a formula selected from the group consisting of: SrBi Ta 2 0 9 ; SrBi2Ta2- x Nb Og, wherein 0<x<2; Srι. Ba x Bi2Ta2- y Nbyθ9, wherein 0<x<1 and 0<y<2; Srι- x Ca x Bi2Ta2-yNbyOg wherein 0<x<1 and 0<y<2; Srι- x Pb x Bi 2 Ta2- y Nb y θ9, wherein 0<x<1 and 0<y<2; and Srι- x - y -zBa x Ca y PbzBi2Ta2-pNb P Og, wherein 0<x<1 , 0<y<1 , 0<z<1 , and 0<p<2. 23. The method of claim 22, wherein at least one element of said compound is substituted by a metal selected from the group consisting of Ce, La, Pr, Ho, Eu, and Yb. 24. The method of claim 3, wherein said precursor of Sr oxide is Sr(thd) 2 or Sr(thd) 2 adduct. 25. The method of claim 24, wherein said precursor of Sr oxide comprises at least one of a polyether and a polyamine. 26. The method of claim 25, wherein said polyether has the formula wherein 2<n<6, and wherein each of R and R' is, independently, an alkyl group, an aryl group, or hydrogen. 27. The method of claim 25, wherein said polyamine has the formula R-NR"-(CH 2 CH 2 NR")n-R', wherein 2<n<6, wherein each of R and R" is, independently, an alkyl group, an aryl group, or hydrogen, and wherein R" is H, Me, Et or Pr. 28. The method of claim 27, wherein said precursor of Sr oxide comprises at least one of tetraglyme, triglyme, N,N,N',N",N"-pentamethyl- diethylene-triamine, and N,N,N',N",N'",N'"-hexamethyl-triethylene-tetramine. 29. The method of claim 27, wherein said precursor of Sr oxide is Sr alcoxide, Sr alcoxide mixed with Ta and Nb alcoxides, or a Lewis base adduct of Sr alcoxide, wherein the Lewis base is tetraglyme, triglyme, N,N,N',N",N"- pentamethyl-diethylene-triamine, or N,N,N',N",N'",N'"-hexamethyl-triethylene- tetramine. 30. The method of claim 3, wherein said precursor of Ta oxide has the formula Ta(OR)s-n(X)n, wherein R is Me, Et, Pr, 'Pr, Bu, 'Bu, 'Bu, pentyl, or 'pentyl, wherein X is β-diketonate, and wherein n is 1 , 2, 3, 4, or 5. 31. The method of claim 30, wherein said precursor of Ta oxide is Ta(O i Pr) 4 (thd). 32. The method of claim 30, wherein said precursor of Ta oxide is an alcoxide comprising at least one of Ta pentakis (ethoxide), Ta pentakis ( propoxide), Ta pentakis ('butoxide), and Ta pentakis ( pentoxide). 33. The method of claim 4, wherein at least one of said precursors is dissolved in a solution comprising at least one of an aliphatic, cycloaliphatic, and an aromatic solvent, said solvent including a functional group comprising at least one of an alcohol, ether, ester, amine, ketone, and aldehyde group. 34. The method of claim 33, wherein said precursors of Bi oxide, Sr oxide, and Ta oxide are dissolved in said solution. 35. The method of claim 34, wherein said solvent is an alcohol. 36. The method of claim 35, wherein said alcohol is t-butanol and said precursor of Bi oxide is Bi(θ'Bu)3. 37. The method of claim 35, wherein said solvent is t-pentanol and said precursor of Bi oxide is Bi(OCMe 2 Et)3. 38. The method of claim 33, wherein said solution comprises a mixture of THF, 'PrOH, and a Lewis base in a ratio of about 8:2:1 , respectively. 39. The method of claim 33, wherein said solution comprises a mixture of octane, decane, and pentamethyl-diethylene-triamine in a ratio of about 5:4:1 , respectively. 40. The method of claim 33, wherein said precursor of Bi oxide is dissolved in a solution comprising Lewis base adducts. 41. The method of claim 33, wherein said solution is evaporated by at least one vaporizer. 42. The method of claim 41 , wherein said solution is evaporated at a temperature from 130°C to 220°C. 43. The method of claim 41 , wherein said solution is evaporated at a temperature from 170°C to 240°C. 44. The method of claim 41 , wherein an inert gas is added to the vapors of said solution and a mixture of said inert gas and vapors is delivered to said chamber, said inert gas comprising at least one of Ar, He, and N2. 45. The method of claim 44, wherein said mixture comprises vapors of said precursors of Bi oxide, Sr oxide, and Ta oxide in a ratio of about 2:1 :2. 46. The method of claim 7, wherein said oxides are deposited at a temperature between 300°C and 450°C. 47. The method of claim 7, wherein the pressure in said chamber is between 0.001 torr and 760 torr. 48. The method of claim 47, wherein the pressure in said chamber is between 0.1 torr and 10 torr. 49. The method of claim 8, wherein an additional inert gas is added to said chamber, said inert gas comprising at least one of Ar, He, and N2, and wherein said additional inert gas occupies between 10% and 90% of the total gas and vapor flow into said chamber. 50. The method of claim 3, wherein said oxides are deposited onto said substrate over a time period between 2 minutes and 2 hours. 51. The method of claim 3, wherein said oxides are deposited onto said substrate over a time period between 2 minutes and 15 minutes. 52. The method of claim 5, wherein said film is heated to a temperature between 600°C and 800°C for a time period between 5 minutes and 3 hours. 53. The method of claim 41 , wherein said vapors consisting essentially of said precursor of Bi oxide are delivered to said chamber during a period between the onset of deposition and 30 minutes thereafter. 54. The method of claim 1 , wherein said substrate comprises at least one of Si, n-doped Si, p-doped Si, Siθ2, Si3N , GaAs, MgO, AI2O3, Zr0 2 , SrTi0 3 , BaTiOs, and PbTiOs. 55. The method of claim 1 , wherein said film is deposited on a bottom electrode disposed on said substrate, said substrate comprising a transistor therein, said bottom electrode being connected to said transistor by a plug. 56. The method of claim 55, wherein said bottom electrode comprises at least one of: a metal selected from the group consisting of Pt, Pd, Au, Ir, and Rh; a conducting metal oxide selected from the group consisting of lrO x , RhO x , RuOx, OsO x , ReOx, WO x , wherein x is 0, 1 or 2; a conducting metal nitride selected from the group consisting of TiN x , ZrN x , and WN y TaN y , wherein O≤x≤I .O and 0<y<1.7; and a superconducting oxide selected from the group consisting of YbBa2Cu3θ - x wherein 0<x<1 , and BJ2Sr 2 Ca2Cu3θιo. 57. The method of claim 55, wherein said bottom electrode is a Pt electrode. 58. The method of claim 55, wherein at least one first intermediate layer is provided between said bottom electrode and said plug, said first intermediate layer comprising at least one of an adhesion layer and a diffusion barrier layer. 59. The method of claim 55, wherein at least one second intermediate layer is provided between said bottom electrode and said metal oxide film, said second intermediate layer comprising at least one of a seed layer, a conducting layer, and a dielectric layer. 60. The method of claim 55, wherein said plug is connected to said bottom electrode and to a drain of a MOS ferroelectric effect transistor, said plug consisting essentially of W or Si. 61. The method of claim 55, wherein said film is used as a thin ferroelectric film for a ferroelectric capacitor. 62. The method of claim 55, wherein said film is used as a thin ferroelectric film for a ferroelectric memory. 63. The method of claim 62, wherein said film is used as a thin ferroelectric film for a ferroelectric field effect transistor. 64. The method of claim 8, wherein said substrate is flushed with a mixture of an inert gas and said oxidizer before being exposed to said vapors of said precursors of said metal oxides. 65. The method of claim 8, wherein said substrate is flushed with a mixture of an inert gas and said oxidizer after being exposed to said vapors of said precursors. 66. The method of claim 7, wherein at least one of said processes of heating, decomposing and depositing is performed at least twice on said substrate. 67. The method of claim 8, wherein said substrate is removed from said chamber, treated by at least one intermediate process, and returned to said chamber. 68. The method of claim 41 , wherein the composition of said precursors in said mixture is varied while said substrate is positioned in said chamber. 69. The method of claim 44, wherein the composition of said inert gas in said mixture is varied while said substrate is positioned in said chamber. 70. The method of claim 8, wherein the composition of said oxidizer is varied while said substrate is positioned in said chamber. 71. The method of claim 7, wherein said deposition temperature is varied while said substrate is positioned in said chamber. 72. The method of claim 7, wherein the pressure in said chamber is varied while said substrate is positioned in said chamber. 73. The method of claim 7, wherein said substrate is heated inside said chamber at a temperature lower than 450°C at least twice. 74. The method of claim 7, wherein said substrate is heated inside said chamber at a temperature lower than 450°C in the presence of at least one 75. The method of claim 8, wherein said vapors of said precursors, said oxidizers, and an inert gas comprising at least one of Ar, He, and N2 are introduced to said chamber at a total flow rate of 1 ml/min to 15,000 ml/min, measured at the standard condition. 76. A method of forming a film on a substrate, said method comprising: heating said substrate to a temperature lower than 450°C; and introducing vapors of a precursor of Bi oxide to said substrate, wherein said precursor of Bi oxide comprises at least one alcoxide group, said precursor decomposing at the surface of said substrate to form Bi oxide, said Bi oxide being deposited on the surface of said substrate.

Inventors: BAUM THOMAS H, DESROCHERS DEBRA A, HENDRIX BRYAN C, HINTERMAIER FRANK S, ROEDER JEFFREY F, VAN BUSKIRK PETER C, BAUM, THOMAS, H., DESROCHERS, DEBRA, A., HENDRIX, BRYAN, C., HINTERMAIER, FRANK, S., ROEDER, JEFFREY, F., VAN BUSKIRK, PETER, C.
Applicants: ADVANCED TECH MATERIALS, INFINEON TECHNOLOGIES AG, ADVANCED TECHNOLOGY MATERIALS, INC.
Application year: 1999
Main classification: C23C16
IPC codes: C23C16, H01L21