Semiconductor laser and method of manufacturing the same

Abstract: A semiconductor laser has an active region which includes at least a quantum well layer and upper and lower optical waveguide layers and is of In x Ga 1-x As y P 1-y (0≦x≦1, 0≦y≦1). Upper and lower AlGaAs cladding layers are formed on opposite sides of the active region. At least one of the optical waveguide layers is not smaller than 0.25µm in thickness, and a part of the upper cladding layer on the upper optical waveguide layer is selectively removed up to the interface of the upper cladding layer and the upper optical waveguide layer.

Description: BACKGROUND OF THE INVENTION Field of the Invention This invention relates to a semiconductor laser, according to the preamble of claim 1, more particularly to a semiconductor laser having an active region which includes at least a quantum well layer and an optical waveguide layer and is of In x Ga 1-x As y P 1-y (0≦x≦1, 0≦y≦1). This invention further relates to a method of manufacturing such a semiconductor laser. Description of the Related Art A semiconductor laser has come to be used in wider and wider fields. Especially a semiconductor laser which has an GaAs substrate and oscillates in 0.7 to 1.1µm band has come to be used, as its output power increases, not only for an optical disc and a laser printer but also for a light source for pumping a solid state laser, a fiber amplifier and a fiber laser, a primary light source for generating a second harmonic, a light source for thermally recording an image on a heat-sensitive material, for instance, in printing, a light source for medical use, a light source for laser machining and laser soldering, and the like. In these applications, it is extremely important that the semiconductor laser can output high power. In a single mode laser which is narrow in width (not larger than about 5 µ m), those which are 500mW or more in the maximum light output and 150mW or more in the practical light output have been reported as, for instance, a light source for pumping a fiber amplifier oscillating, for instance, at 0.98µm or 1.02µm. Further it has been reported that, in multiple-mode lasers which are about 50 µ m or more in stripe width, the catastrophic optical damage (COD) when the oscillation wavelength is, for instance, 0.87µm is 11.3W in the case of an element which is 100 µ m in stripe width and is 16.5W in the case of an element which is 200 µ m in stripe width. See "Electronics Letters", vol.34, No.2, P.184 (1998), (S.O'Brien, H. Zhao and R. J. Lang). These inventors have proposed a semiconductor laser in which catastrophic failure due to oxidization of Al is prevented by freeing the vicinity of the light emission region (a quantum well layer and an optical waveguide layer which is adjacent to the quantum well layer and forms a barrier) from Al and at the same time, an AlGaAs layer is employed as a cladding layer in order to prevent deterioration in temperature characteristics due to leakage of electrons from the active region. With this arrangement, the semiconductor laser can operate at high output power. See "Japanese Journal of Applied Physics", vol. 34, No. 9B, p. L1175 (1995), (T. Fukunaga, M. Wada, H. Asano and T. Hauakawa). This will be referred to as "reference 1", hereinbelow. In the semiconductor laser which these inventors have proposed, the thickness of each InGaP cladding layer is 0.1µm and the optical confinement factor (Γ) to the active layer quantum well for a laser beam is relatively large. Accordingly, when a device which was 50 µ m in stripe width was aged under 500mW at 50° C in an APC (automatic power control) mode, deterioration rate of the drive current was relatively large and was 5x10 -5 h -1 in median. Further when a device which was 200 µ m in stripe width was aged under 2000mW at 25° C in an APC mode, deterioration rate of the drive current was also 5x10 -5 h -1 in median. Such high output power semiconductor lasers having a relatively wide stripe comes to stop oscillating when the drive current increases by about 5%. Accordingly the service life of the latter semiconductor laser is estimated at about 1000 hours in median, which is practically insufficient. Further since being of a gain waveguide type, the conventional semiconductor lasers are disadvantageous in that fundamental oscillation characteristics such as the current versus light output characteristics become unstable due to fluctuation in transverse mode. Further there has been known a semiconductor laser according to the preamble of claim 1, in which the output power is increased by employing Al-free material different from that disclosed in "reference 1" and at the same time reducing the optical confinement factor (r) to the active layer quantum well for a laser beam by increasing the thickness of the optical waveguide layer. See "Appl. Phys. Lett.", Vol. 72, No.1, P. 4, (J.K. Wade, L. J. Mawst, D. Botez. R.F. Nabiev, M. Jansen and L. A. Morris) (reference 2) and "SPIE Proceeding", Vol. 3001, p. 2 (1997), (M.A. Emanuel, J. A. Skidnore and R. J. Beach) (reference 3). However, as disclosed in "reference 1", especially in the wavelength range not longer than 850nm, temperature characteristics deteriorate due to leakage of electrons into a p-type cladding layer when the cladding layer is formed of a material free from Al. This is because electron barrier cannot be sufficient even if InGaP is used which is the largest in forbidden band width in materials which can be lattice-matched with the GaAs substrate. Further when producing such a refractive index waveguide type element, it is difficult to stop etching at the interface of an InGaP cladding layer and an InGaAsP optical waveguide layer since these layers resemble each other in chemical properties. Further there has been reported an element in which the cladding layer is formed of InGaAlP for the purpose of suppressing deterioration in temperature characteristics due to leakage of electrons into the p-type cladding layer, as disclosed in "reference 2". However in "reference 2", only the gain waveguide type is mentioned and optimization for the refractive index waveguide type is not mentioned. Further, the p-type InGaAlP is generally disadvantageous as compared with AlGaAs in that it is high in electric resistance and thermal resistance. Reliability when such a material is used has not been discussed. When the active layer is exposed to atmosphere on a GaAs substrate during production of a refractive index waveguide type element, crystallizability on the surface thereof deteriorates and remarkable deterioration of the exposed part of the crystal interface due to non-emission recombination of carriers is generated. Accordingly, a method in which etching is carried out up to a portion immediately above the active layer has been generally employed. In this case, as in a ridge waveguide type laser shown in Figure 2, etching is carried out so that the upper cladding layer is left in a small thickness (about 0.1 to 0.3µm) by controlling the etching time. However such etching time control is disadvantageous in that reproducibility deteriorates due to fluctuation in etching conditions and thickness of the cladding layer from wafer to wafer. In order to overcome this problem, there has been proposed a structure in which an etching stop layer is inserted as shown in Figure 3. See United States Patent No. 4,567,060 (reference 4). For example, in the case where an AlGaAs cladding layer and an InGaAsP active region are combined, by inserting an InGaP etching stop layer (about 1 to 5nm in thickness), which is lattice-matched with the GaAs substrate, into the upper cladding layer as shown in Figure 3, it becomes feasible to stop etching of the AlGaAs at the InGaP etching stop layer in various etching methods. However an InGaP layer inserted into a p-type AlGaAs cladding layer sometimes deteriorates crystallization, which results in increase in electric resistance and/or built-in voltage. This is supposed because As on the surface of the AlGaAs is substituted by P to form AlGaAsp on the crystal interface of AlGaAs and InGaP at the beginning of crystal growth. SUMMARY OF THE INVENTION In view of the foregoing observations and description, the primary object of the present invention is to provide a high power semiconductor laser in which the service-life elongating effect of using an Al-free active layer material is enhanced and the long-term reliability is improved. Another object of the present invention is to provide a method of manufacturing such a high power semiconductor laser. The semiconductor laser in accordance with the present invention comprises the features of claim 1. The method of manufacturing a semiconductor laser in accordance with the present invention comprises the features of claim 3. In the semiconductor laser of the present invention with arrangement described above, the light density (r/d) in the quantum well portion is reduced by virtue of the optical waveguide layer not smaller than 0.25 µ m in thickness, whereby internal loss is reduced and the deterioration rate in the drive current during APC aging which increases in proportion to the fourth or more power of the light density is reduced. The semiconductor laser of the present invention is a refractive index waveguide type element since a part of the upper cladding layer on the upper optical waveguide layer is selectively removed up to the interface of the upper cladding layer and the upper optical waveguide layer. When such a refractive index waveguide type element structure, the upper cladding layer is removed by etching inside or outside the stripe. When removing by etching a part of the upper cladding layer, conventionally, there is employed a method in which a part of the upper cladding layer is left unetched by providing an etching stop layer which differs from the upper cladding layer in composition and/or component atoms and is etched at a rate greatly smaller than the upper cladding layer ("reference 4"), or a method in which a part of the upper cladding layer is left unetched by controlling the etching time (See "reference 5": "Applied Physics Letters", Vol. 51, Bo. 10, p. 707 (1987), (T. Hayakawa, T. Suyama, K. Takahasi, M. Kondo, S. Yamamoto, and T. Hijikata)). To the contrast, in accordance with the method of the present invention, the upper cladding layer is removed up to the optical waveguide layer having an increased thickness. By using an organic etching solution such as of sulfuric acid or citric acid, etching can be stopped at the optical waveguide layer. By stopping etching without use of an etching stop layer which adversely affects properties of the elements, the refractive index waveguide structure can be produced with good reproducibility, whereby fundamental oscillation characteristics can be stabilized. Conventionally since the optical waveguide layer is small in thickness, i.e., about 0.1µm, the cladding layer is left in a thickness of 0.1 to 0.2pm in order to suppress deterioration in crystallization without deteriorating the quality of the active layer. However, when the thickness of the optical waveguide layer is not smaller than 0.25µm, deterioration in crystallization does not occur even if the cladding layer is removed to the optical waveguide layer. Further in the method of the present invention, since the distance between the quantum well in the active layer and the surface of the optical waveguide layer at the part where the cladding layer is removed is increased, damage to the active layer during formation of the refractive index waveguide structure can be suppressed. As can be understood from the description above, the service-life elongating effect of using an Al-free active layer material can be enhanced and the long-term reliability is greatly improved in accordance with the present invention. Especially, since the semiconductor laser of the present invention has high quality properties as a refractive index waveguide type laser and, at the same time, is very small in variation of properties with time, it can improve system reliability when used as a light source for the field of image forming where noise and/or change in intensity and/or shape of the beam give rise to a problem. As application to the field of image forming, the semiconductor laser of the present invention can be applied, for instance, to a printing system where a semiconductor laser pumped solid state laser is employed, or to a visible or ultraviolet light source for a printer or an image scanner where a semiconductor laser pumped solid state laser is employed in combination with a SHG. In the field of a printer using heat-sensitive recording material where a semiconductor laser beam is used as a writing light beam, several to about one hundred high power semiconductor lasers are used in one system, and accordingly, the semiconductor lasers of the present invention greatly contribute to improvement of system reliability. Further in the semiconductor laser of the present invention, increase of the thickness of the optical waveguide layer reduces trailing of evanescent light oozing into the cladding layer and accordingly, the upper cladding layer can be reduced in thickness without adverse influence of absorption of the capping layer. Accordingly, the thickness of the upper cladding layer, which conventionally should be not smaller than 1.5µm, may be reduced to not larger than 1 µ m. When the upper cladding layer is of such a small thickness, unevenness after etching which the refractive index waveguide structure inherently has can be small, which facilitates the subsequent lithography process and improves the accuracy of the lithography process. Further since the irregularity on the surface of a finished device is reduced, uniform wax wetting is obtained during chip bonding, which improves heat dissipation properties. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing the layer arrangement of a ridge waveguide type semiconductor laser in accordance with a first embodiment of the present invention, Figure 2 is a schematic view showing the layer arrangement of an example of a conventional ridge waveguide type semiconductor laser, Figure 3 is a schematic view showing the layer arrangement of another example of a conventional ridge waveguide type semiconductor laser, Figure 4 is a view showing the dependency on the thickness of the optical waveguide layer of d/Γ which is a value proportional to the reciprocal of the light density in the quantum well, Figure 5 is a view showing change with time of the drive current for a ridge waveguide type semiconductor laser in accordance with the present invention where the optical waveguide layer is 0.4µm in thickness, Figure 6 is a view showing change with time of the drive current for a conventional ridge waveguide type semiconductor laser, Figure 7 is a view showing change with time of the drive current for a ridge waveguide type semiconductor laser in accordance with the present invention where the optical waveguide layer is 0.25µm in thickness, Figure 8 is a view showing change with time of the drive current for a ridge waveguide type semiconductor laser in accordance with the present invention where the optical waveguide layer is 0.6µm in thickness, Figure 9 is a view showing the dependency on the thickness of the optical waveguide layer of the drive current deterioration rate in a ridge waveguide type semiconductor laser, Figure 10 is a view showing the dependency on the thickness of the optical waveguide layer of the catastrophic optical damage of a ridge waveguide type semiconductor laser, Figure 11 is a view showing the relation between the drive current deterioration rate and the internal light power in a conventional ridge waveguide type semiconductor laser, Figure 12 is a view showing comparison of measured values of catastrophic optical damage (COD) and the calculated value of internal light power at the front end face of a conventional ridge waveguide type semiconductor laser for various reflectances of the coating applied to the front end face, Figure 13 is a view showing comparison of measured relation between the number of quantum wells and the slop efficiency and theoretical relation of the same, Figure 14 is a view showing measured values and calculated values of dependency on the thickness of the optical waveguide layer of the slope efficiency of a single quantum well semiconductor laser and a double quantum well semiconductor laser, Figure 15 is a view showing the current versus light output characteristics of a ridge waveguide type semiconductor laser in accordance with the present invention, Figure 16 is a schematic view showing the layer arrangement of a ridge waveguide type semiconductor laser in accordance with an example useful for the understanding of the present invention, and Figure 17 is a schematic view showing the layer arrangement of a ridge waveguide type semiconductor laser in accordance with a second embodiment of the present invention. DESCRIPTION OF THE PREFERRED EMBODIMENTS In Figure 1, a semiconductor laser in accordance with a first embodiment of the present invention comprises an n-GaAs buffer layer 2 (doped with 1x10 18 cm -3 Si, 0.5 µ m thick), an n-Al 0.63 Ga 0.37 As lower cladding layer 3 (doped with 1x10 18 cm -3 Si, 1 µ m thick), an undoped SCH active layer 4, a p-Al 0.63 Ga 0.37 As upper cladding layer 5 (doped with 1x10 18 cm -3 Zn, 1 µ m thick), a p-GaAs capping layer 6 (doped with 2x10 19 cm -3 Zn, 0.3 µ m thick), a SiO 2 insulating film 7 and a p-side electrode 8 formed one on another on one side of an n-GaAs substrate 1 (doped with 2x10 18 cm -3 Si) and an n-side electrode 9 formed on the other side of the substrate 1. The undoped SCH active layer 4 comprises an In 0.48 Ga 0.52 P lower optical waveguide layer 4a (undoped, 0.4 µ m in thickness Wg), an In 0.13 Ga 0.87As0.75 P 0.25 quantum well layer 4b (undoped, 10nm thick) and an In 0.48 Ga 0.52 P upper optical waveguide layer 4c (undoped, 0.4µm in thickness Wg). A method manufacturing this semiconductor laser will be described, hereinbelow. An n-GaAs buffer layer 2, an n-Al 0.63 Ga 0.37 As lower cladding layer 3, an undoped SCH active layer 4, a p-Al 0.63 Ga 0.37 As upper cladding layer 5 and a p-GaAs capping layer 6 are first formed one on another in this order on one side of an n-GaAs substrate 1 by low-pressure MOCVD. Then a mesa stripe structure which is 200 µ m in bottom width is formed by photolithography and chemical etching by use of a 20:1:1 mixture of H 2 SO 4 , H 2 O 2 and H 2 O. At this time, the p-Al 0.63 Ga 0.37 As upper cladding layer 5 is etched at a rate 20-th or more as large as that at which the In 0.48 Ga 0.52 P upper optical waveguide layer 4c is etched. By virtue of this fact, the mesa etching can be stopped just above the In 0.48 Ga 0.52 P upper optical waveguide layer 4c with good reproducibility. Thereafter, a SiO 2 insulating film 7 is formed by plasma CVD, and a part of the SiO 2 insulating film 7 on the upper surface of the mesa in a region within 1 to 5 µ m from opposite edges of the mesa is etched and removed by photolithography and etching by use of dilute HF. Then a p-side electrode 8 (Ti/Pt/Au) is formed by deposition and heat treatment, and the bottom surface of the GaAs substrate 1 is polished to thin the GaAs substrate 1 to about 100 to 150 µ m. Finally an n-side electrode 9 (AuGe/Ni/Au) is formed by deposition and heat treatment. A laser bar which is 1.5mm in resonator length and about 1.5cm in length is cut out from the wafer by scribe with a diamond needle and cleavage, and the light radiating end face and the back end face are applied with optical coating films so that their reflectances are 20% and 95%, respectively. Finally the laser bar is cut into a plurality of laser chips by scribe with a diamond needle and cleavage. Each laser chip is fixed to a copper block by soldering the p-side electrode to the copper block by In solder. The semiconductor laser produced in this manner oscillates at about 809nm by a threshold current of 660 to 700mA and can operate at a high output power of not lower than 2W. Figure 5 shows change with time of the drive current for this laser when the laser is driven under 2W at 25° C in an APC mode. As can be seen from Figure 5, the laser operates very stably. In order to prove the effect of the present invention, detailed comparison experiments were carried out. The result is as follows. In a first experiment, comparison semiconductor laser elements which were the same as the semiconductor laser of the first embodiment except that the thickness Wg of the InGaP optical waveguide guide layer differed from that of the first embodiment were produced and their reliability was evaluated. Figures 6 to 8 show change with time of the drive current for the comparison lasers, which were 0.11µm, 0.25µm and an 0.6µm in thickness Wg of the optical waveguide guide layer respectively, when the lasers were driven under 2W at 25° C in an APC mode. As can be seen from Figures 6 to 8, when the thickness Wg of the optical waveguide guide layer was smaller than 0.25µm, deterioration of the drive current was large (Figure 6), while when the thickness Wg of the optical waveguide guide layer was not smaller than 0.25µm, deterioration of the drive current was relatively small and the lasers operated stably (Figures 7 and 8). Figure 9 shows the relation between the deterioration rate of the drive current (increase of drive current/drive current/time) in median and the thickness Wg of the optical waveguide layer in a stabilized state after the lasers are operated for 200 hours. As can be seen from Figure 9, the deterioration rate of the drive current is very low. Figure 4 shows calculated values of the relation between d/r which is a value proportional to the reciprocal of the light density in the quantum well of the active layer of the structure in accordance with the present invention (d: thickness of the quantum well in µ m, r: optical confinement factor to the active layer quantum well for a laser beam) and the thickness Wg of the optical waveguide layer. As can be seen from Figure 4, when the thickness Wg of the optical waveguide layer was in the range of not smaller than 0.25µm, the light density in the quantum well decreased monotonically with increase of the thickness Wg of the optical waveguide layer, which proved improvement in reliability. When the thickness Wg was 0.6µm, the deterioration rate was larger than when the thickness Wg was 0.4µm due to increase of the drive current by about 10%. Further when the thickness Wg was not smaller than 0.25µm, an excellent reliability was obtained, which proved that reliability was not deteriorated even if an insulated film such as SiO 2 was formed in contact with the optical waveguide layer without intervening therebetween an upper cladding layer left there in a small thickness as a protective layer as in the conventional semiconductor lasers shown in Figures 2 and 3. Further as shown in Figure 15, current versus light out characteristics without kink could be obtained up to a high output range and both the far-field image and the near-field image were stable. In a second experiment, the catastrophic optical damages of the aforesaid laser elements were measured. As shown in Figure 10, the catastrophic optical damage hardly changed with change of the thickness Wg of the optical waveguide layer. This proves that with the arrangement of the present invention, the catastrophic optical damage does not increase with increase of the thickness Wg of the optical waveguide layer as in the example disclosed in "reference 2", that is, the catastrophic optical damage is independent from the light density in the active layer. In a third experiment, three kinds of laser elements which were the same as the conventional element shown in Figure 6 in structure, were 0.11µm in thickness Wg of the optical waveguide layer and were respectively 11%, 20% and 30% in reflectance R f of the light radiating end face were prepared and compared. The relation between the drive current deterioration rate in median and the internal light density at the light radiating end face when the laser was driven under 1.8W at 25° C in an APC mode was measured for each laser. As can be seen from Figure 11, the drive current deterioration rate greatly increases substantially in proportion to the fourth power of the internal light density at the light radiating end face and greatly depends upon the whole internal light intensity. In a fourth experiment, R f dependency of the catastrophic optical damage was evaluated for laser elements which were 0.11µm in the thickness Wg of the optical waveguide layer. As shown in Figure 12, the catastrophic optical damage was proportional to the internal light power. The result of the aforesaid experiments shows that with the arrangement of the present invention, though the deterioration rate depends upon the light density in the quantum well of the active layer, the catastrophic optical damage was substantially proportional to the whole internal light power. As a fifth example, factors which governed the internal loss (αi[cm -1 ]) were investigated on the basis of the slope efficiency for various laser elements. The experiment was carried out by use of laser elements having an oxide film stripe structure of 50 µ m width for the purpose of material evaluation. Figure 13 shows the dependency of the slope efficiency on the number of the quantum wells Nw (Nw=1~4) with the total thickness of the active layer (including quantum wells (10nm wide), barrier layers (undoped InGaP the same as that of the optical waveguide layers, 10nm thick) parting the quantum wells and optical waveguide layers) fixed to 0.23µm. The slope efficiency is proportional to the external differential quantum efficiency (η d ) for the whole radiating light. The external differential quantum efficiency η d is expressed by the following formula (1). wherein η i represents the internal differential quantum efficiency, R f represents the reflectance of the light radiating end face, R r represents the reflectance of the rear end face, and L represents the length of the resonator. Actually, only light radiated through the front end face is measured and utilized. The slope efficiency is related to the external differential quantum efficiency η d as L f L f + L r η d from the following relation between the amount of light radiated from the front end face L f and that radiated from the read end face L r . L f L r = R r R f (1- R f ) (1- R f ) In the case of a single-quantum well, it has been found that α i =2cm -1 , and η i =0.7 when Wg=0.11 µ m from a result of measurement of resonator length dependency of the slope efficiency carried out separately. The calculated values in Figure 13 were obtained letting n i =0.7 (constant) and α i =Nwx2(cm -1 ) and well conform to the result of the experiment. Accordingly, the residual loss in the semiconductor laser of the present invention may be considered to be mainly governed by loss by the quantum wells themselves. Further single quantum well laser elements (Nw=1) and double quantum well laser elements (Nw=2) which were different from each other in the thickness Wg of the optical waveguide layer were prepared and the slope efficiency of each laser element was measured. As shown in Figure 14, the result of the measurement conformed to the calculated values in tendency that the internal loss increased in proportion to the amount of light in the quantum well. This supports that the residual loss in the semiconductor laser of the present invention is mainly governed by loss by the quantum wells themselves. The result of the experiments shows that in the semiconductor lasers in accordance with the present invention, the deterioration mechanism and the internal loss are due to the inside of the active layer and greatly depend upon the light power in the active layer. Accordingly, these factors can be improved by making the thickness Wg of the optical waveguide layer not smaller than 0.25 µ m. A semiconductor laser in accordance with an example useful for the understanding of the present invention will be described with reference to Figure 16, hereinbelow. In Figure 16, the semiconductor laser comprises an n-GaAs buffer layer 42 (doped with 1x10 18 cm -3 Si, 0.5µm thick), an n-Al 0.55 Ga 0.45 As lower cladding layer 43 (doped with 1x10 18 cm -3 Si, 1 µ m thick), an undoped SCH active layer 44, an n-Al 0.65 Ga 0.35 As current blocking layer 45 (doped with 1x10 18 cm -3 Si, 0.8 µ m thick), an n-GaAs protective layer 46 (doped with 1x10 18 cm -3 Si, 0.01 µ m thick), a p-Al 0.55 Ga 0.45 As upper cladding layer 47 (doped with 1x10 18 cm -3 Zn, 1 µ m thick), a p-GaAs capping layer 48 (doped with 2x10 19 cm -3 Zn, 0.3µm thick), and a p-side electrode 49 formed one on another on one side of an n-GaAs substrate 41 (doped with 2x10 18 cm -3 Si) and an n-side electrode 50 formed on the other side of the substrate 41. The undoped SCH active layer 44 comprises an In 0.48 Ga 0.52 P lower optical waveguide layer 44a (undoped, 0.25 µ m in thickness Wg), an In 0.13 Ga 0.87As0.75 P 0.25 quantum well layer 44b (undoped, 10nm thick) and an In 0.48 Ga 0.52 P upper optical waveguide layer 44c (undoped, 0.25µm in thickness Wg). A method of manufacturing this semiconductor laser will be described, hereinbelow. The laser is produced by two-step low-pressure MOCVD. That is, an n-GaAs buffer layer 42, an n-Al 0.55 Ga 0.45 As lower cladding layer 43, an undoped SCH active layer 44, an n-Al 0.65 Ga 0.35 As current blocking layer 45 and an n-GaAs protective layer 46 are first grown one on another in this order on one side of an n-GaAs substrate 41 by low-pressure MOCVD. Then a mesa stripe channel which is 200 µ m in bottom width is formed by photolithography and chemical etching by use of a 20:1:1 mixture of H 2 SO 4 , H 2 O 2 and H 2 O. At this time, the etching is stopped just above the In 0.48 Ga 0.52 P upper optical waveguide layer 44c since the undoped SCH active layer 44 comprises the In 0.48 Ga 0.52 P lower optical waveguide layer 44a (undoped, 0.25 µ m in thickness Wg), the In 0.13 Ga 0.87As0.75 P 0.25 quantum well layer 44b (undoped, 10nm thick) and the In 0.48 Ga 0.52 P upper optical waveguide layer 44c. Then a p-Al 0.55 Ga 0.45 As upper cladding layer 47 and a p-GaAs capping layer 48 are grown in sequence by low-pressure MOCVD. Thereafter, a p-side electrode 49 is formed, the GaAs substrate 41 is polished, an n-side electrode 50 is formed, a laser bar is cut out, the light radiating end face and the back end face are applied with optical coating films, and the laser bar is cut into a plurality of laser chips in the manner similar to that in the first embodiment. A semiconductor laser in accordance with a second embodiment of the present invention will be described with reference to Figure 17, hereinbelow. In Figure 17, the semiconductor laser in accordance with the second embodiment of the present invention comprises an n-GaAs buffer layer 62 (doped with 1x10 18 cm -3 Si, 0.5 µ m thick), an n-Al 0.6 Ga 0.4 As lower cladding layer 63 (doped with 1x10 18 cm -3 Si, 1 µ m thick), an undoped SCH active layer 64, an n-Al 0.65 Ga 0.35 As current blocking layer 66 (doped with 1x10 18 cm -3 Si, 0.8pm thick), a p-GaAs protective layer 67 (doped with 1x10 18 cm -3 Si, 0.01 µ m thick), a p-Al 0.6 Ga 0.4 As first upper cladding layer 65 (doped with 1x10 18 cm -3 Zn, 1 µ m thick), a p-Al 0.6 Ga 0.4 As second upper cladding layer 68 (doped with 1x10 18 cm -3 Zn, 1 µ m thick), a p-GaAs capping layer 69 (doped with 2x10 19 cm -3 Zn, 0.3 µ m thick), and a p-side electrode 70 formed one on another on one side of an n-GaAs substrate 61 (doped with 2x10 18 cm -3 Si) and an n-side electrode 71 formed on the other side of the substrate 61. The undoped SCH active layer 64 comprises an In 0.48 Ga 0.52 P lower optical waveguide layer 64a (undoped, 0.25 µ m in thickness Wg), an In 0.13 Ga 0.87As0.75 P 0.25 quantum well layer 64b (undoped, 10nm thick) and an In 0.48 Ga 0.52 P upper optical waveguide layer 64c (undoped, 0.25µm in thickness Wg). A method manufacturing this semiconductor laser will be described, hereinbelow. In this embodiment, the laser is produced by three-step low-pressure MOCVD. That is, an n-GaAs buffer layer 62, an n-Al 0.55 Ga 0.45 As lower cladding layer 63, an undoped SCH active layer 64, a pAl 0.6 Ga 0.4 As first upper cladding layer 65 and a p-GaAs protective layer 67 are grown one on another in this order on one side of an n-GaAs substrate 41 by first low-pressure MOCVD. Thereafter, a SiO 2 film 0.25µm thick is formed by plasma CVD, and a stripe-like SiO 2 mask 200 µ m wide is formed by photolithography and etching by use of dilute HF. Then an n-Al 0.65 Ga 0.35 As current blocking layer 66 and a p-GaAs protective layer 67 are grown by second low-pressure MOCVD. At this time, though polycrystal grows also on the SiO 2 mask, it can be removed by next etching. Then short etching by use of a mixture of H 2 SO 4 , H 2 O 2 and H 2 O is carried out and the SiO 2 mask is removed by dilute HF. After etching the p-GaAs protective layer 67 for a short time with a mixture of H 2 SO 4 , H 2 O 2 and H 2 O, a pAl 0.6 Ga 0.4 As second upper cladding layer 68 and a p-GaAs capping layer 69 are grown by third low-pressure MOCVD. Thereafter, a p-side electrode 70 is formed, the GaAs substrate 61 is polished, an n-side electrode 71 is formed, a laser bar is cut out, the light radiating end face and the back end face are applied with optical coating films, and the laser bar is cut into a plurality of laser chips in the manner similar to that in the first embodiment. Though the present invention is described above in conjunction with a broad stripe semiconductor laser having a stripe 200 µ m wide, the present invention can also be applied to multiple transverse mode semiconductor lasers having a broad stripe of various widths or a single transverse mode semiconductor lasers which are not larger than about 6 µ m in width of the stripe. The active layer which includes at least a quantum well layer and upper and lower optical waveguide layers has only to be of In x Ga 1-x As y P 1-y (0≦x≦1, 0≦y≦1), and a strain layer which is not lattice-matched with the substrate may be partly used. Further the upper and lower optical waveguide layers on opposite sides of the quantum well layer may be of different thicknesses. In this case, the quantum well layer is shifted from a position in which the light intensity is maximized and the optical confinement factor r is reduced, and accordingly, the light density in the quantum well can be reduced when the thicker one of the optical waveguide layers is not smaller than 0.25 µ m.

Claims: A semiconductor laser comprising an active region (4; 64) which includes at least a quantum well layer (4b, 64b) and upper and lower optical waveguide layers (4a, 4c; 64a, 64c) and is of In x Ga 1- x As y P 1-y with and ≦ x ≦ 1, and upper and lower cladding layers (3, 5; 67, 63) and at least one of the optical waveguide layers (4a, 4c; 64a, 64c) is not smaller than 0. 25 µ m in thickness; wherein a part of the upper cladding layer (5; 67) on the upper optical waveguide layers (4c, 64c) is selectively removed up to the interface of the upper cladding layer and the upper optical waveguide layer (4c, 64c), characterized in that said cladding layers (3, 5; 67, 63) are formed of AlGaAs. A semiconductor laser as defined in Claim 1 in which the structure where a part of the upper cladding layer (5, 67) on the upper optical waveguide layer (4c; 64c) is selectively removed up to the interface of the upper cladding layer (5, 67) and the upper optical waveguide layer (4c; 64c) forms a ridge structure. A method of manufacturing a semiconductor laser defined in Claim 1 comprising the steps of forming at least one of the optical waveguide layers (4a, 4c; 64a, 64c) in thickness not smaller than 0.25 µ m, forming the upper cladding layer (5, 67) of AlGaAs on the upper optical waveguide layer (4c, 64c) and selectively removing by etching a part of the upper cladding layer (5, 67) on the upper optical waveguide layer (4c; 64c) up to the interface of the upper cladding layer (5, 67) and the upper optical waveguide layer (4c, 64c). A semiconductor laser as defined in Claim 1, wherein a thickness of the upper cladding layer is greater than zero, but less than or equal to 1 µm. A semiconductor laser as defined in Claim 1, comprising one quantum well layer. A semiconductor laser as defined in claim 1, wherein a resonator of said semiconductor laser is formed as a stripe, boundaries of the interface between said upper cladding layer and said upper optical waveguide layer defining a stripe width of said resonator, said part of the upper cladding layer on the upper optical waveguide layer which is selectively removed defining a lateral edge of the stripe.

Inventors: FUKUNAGA TOSHIAKI, HAYAKAWA TOSHIRO, WADA MITSUGU, FUKUNAGA, TOSHIAKI, HAYAKAWA, TOSHIRO, WADA, MITSUGU, Fukunaga, Toshiaki, c/o Fuji Photo Film Co.,Ltd., Hayakawa, Toshiro, c/o Fuji Photo Film Co.,Ltd., Wada, Mitsugu, c/o Fuji Photo Film Co.,Ltd.
Applicants: FUJI PHOTO FILM CO LTD, FUJI PHOTO FILM CO., LTD.
Application year: 1999
Main classification: H01S5
IPC codes: H01S5