Phosphorus removal from chlorosilane

Abstract: A method is disclosed herein for the purification of chlorosilanes used for the manufacture of electronic-grade silicon and more particularly it provides a method for removing trace contaminants of phosphorus. The method comprises contacting a mixture comprising a chlorosilane and a phosphorus contaminant with an absorbent comprising a copper or compound of copper supported on silica.

Description: This invention relates to purification of chlorosilanes used for the manufacture of electronic-grade silicon and more particularly to a method for removing trace contaminants of phosphorus. The method comprises contacting a mixture comprising a chlorosilane and a phosphorus contaminant with an absorbent comprising a copper or compound of copper supported on silica. The method is effective in reducing the phosphorus levels in chlorosilane to the parts per billion range. The process can be conveniently run as a continuous or batch process. Monocrystalline silicon wafers of extremely high purity are required for integrated circuit manufacture. The purity of the monocrystalline silicon wafers is one factor that limits the circuit density that is formed on silicon wafers. Therefore, as attempts are made to increase circuit density on monocrystalline silicon wafers, there is a need to reduce the impurity level in the silicon wafers. A standard process for producing high purity monocrystalline silicon involves the chemical vapor deposition of hyper-pure chlorosilane gas, for example trichlorosilane, onto a heated silicon element. The formed silicon ingot is then float zone processed into a monocrystalline rod which is thereafter sliced into monocrystalline silicon wafers appropriate for forming integrated circuits. Trace contamination in the chlorosilane deposition gas is a source of impurities in monocrystalline silicon wafers. Therefore, it is desirable to reduce the trace contaminate levels in the chlorosilane deposition gas as low as possible. Many impurities such as iron, copper and manganese, for example, can be removed from the chlorosilanes by distillation. However, phosphorus content cannot be reduced to acceptable levels by simple distillation because phosphorus tends to form compounds with properties similar to those of chlorosilane. Previously proposed methods for the removal of phosphorus from chlorosilanes include, for example, complexing of the phosphorus compounds with selected transitional metal compounds as described in US-A-4,481,178. Also, US-A-3,188,168 discloses reacting phosphorus impurities with iodine, bromine or chlorine to form high-boiling compounds which are subsequently separated from the chlorosilanes. US-A-2,971,607 claims the use of zeolite molecular sieves to separate the phosphorus compounds from chlorosilanes. US-A-4,409,195 teaches reacting chlorosilanes in the presence of oxygen at a temperature of 60 to 300°C.to form Si-OH species which complex with impurities such as PCl 3 . US-A-5,232,602 provides a method for removing trace impurities of phosphorus by contacting liquid tetrachlorosilane with activated charcoal. JP-A 2-153815 (1990) details a method for chloropolysilane purification by contact with activated carbon. US-A-4,099,936 proposes a multi-stage process where at least one stage comprises contacting chlorosilane in the gas phase with activated charcoal at a temperature of -10°C. to 50°C. to remove impurities. The present invention is a method for reducing the phosphorus contamination of chlorosilanes. Our method comprises contacting a mixture comprising as a major portion a chlorosilane described by formula R a H b SiCl 4-a-b and as a minor portion phosphorus or a compound of phosphorus with an absorbent comprising copper or a compound of copper supported on silica at a temperature in the range of 100 to 600°C. In the above chlorosilane formula, each R is independently selected and is a substituted or unsubstituted hydrocarbon group comprising 1 to 6 carbon atoms, a=0, 1, 2 or 3 and b=0, 1, 2 or 3. Contacting chlorosilane with copper or a compound of copper supported on silica is conveniently conducted as either a batch process or a continuous process. A preferred method is a continuous process where the copper or compound of copper is supported on silica and the copper is present as a fixed-bed in an adsorption column or tower. The chlorosilanes suitable for this method are monochlorosilane, dichlorosilane, trichlorosilane, trimethylchlorosilane, dimethylchlorosilane, methyltrichlorosilane, ethyldichlorosilane, ethyltrichlorosilane, propyltrichlorosilane, vinyltrichlorosilane, isobutyltrichlorosilane, dimethylvinylchlorosilane, methylvinyldichlorosilane and tetrachlorosilane. Tetrachlorosilane and trichlorosilane are preferred chlorosilanes for the practice of this invention. Types of silica useful herein include silica gels, fumed silica, amorphous silica and precipitated silica. The optimum particle size for the silica represents a trade-off between available surface area and the ability to create a packed column with an adequate flow rate. Generally, silicas having a particle size of 595 - 74 µm (28 to 200 mesh) with a particle size distribution such that 35 to 65% of the particles are retained on a 210 micrometer (65 mesh) screen are preferred. The copper or compound of copper is supported on silica using methods known in the art, such as wet impregnation. The weight of the copper or copper compound is in the range of 0.1 to 15 weight percent of the absorbent. Preferred is when this weight percent is in the range of 1 to 10 weight percent of the absorbent. Most preferred is in the range of 2 to 5 weight percent of the absorbent. Types of copper compounds useful in this invention include copper perchlorate, copper perchlorate hexahydrate, copper (I) chloride, copper (II) chloride dihydrate and copper (II) chloride. Preferred is copper (II) chloride supported on silica. The optimum weight of copper or compound of copper supported on silica to volume of chlorosilane contacted will depend on such factors as the amount of phosphorus in the chlorosilane, the contact temperature, chlorosilane flow-rate, the silica type or particle size and the copper or compound of copper supported on the silica. The examples provided herein provide a general starting point from which one skilled in the art will readily determine the optimum weight of copper or compound of copper supported on silica to be employed. Preferred is when the absorbent comprising copper or a compound of copper supported on silica does not contain residual water, as this can result in chlorosilane hydrolysis. In a preferred method, the absorbent comprising copper or a compound of copper supported on silica is heated at 300 to 600°C. to remove residual water prior to use. It is also believed that during heating the copper or compound of copper is reduced from the +2 oxidation state to the 0 oxidation state. The heating may be conducted in the presence of hydrogen or helium. The temperature at which the chlorosilane is contacted with the absorbent comprising the copper or compound of copper supported on silica is within a range of 100 to 600°C. Preferred is a contact temperature within a range of 300 to 500°C. The contact time of the chlorosilane with the absorbent comprising the copper or compound of copper supported on silica will depend on the particular copper or compound of copper, silica surface area and the chlorosilane flow-rate. Generally the contact time may be, for example, from one second to one minute. The method of this invention is carried out by contacting the mixture comprising the chlorosilane and a phosphorous contaminant with the absorbent comprising copper or a compound of copper supported on silica and recovering the purified chlorosilane effluent. Contacting the chlorosilane with the absorbent comprising copper or a compound of copper supported on silica surprisingly reduces the phosphorus and/or compound of phosphorus component contained in the chlorosilane. By "minor portion of phosphorus", we mean those phosphorus levels typically present as contaminants in chlorosilanes used for the manufacture of electronic-grade silicon which is normally 99.9 percent pure. For example, the present method is considered useful for reducing phosphorus levels initially in the chlorosilane at a parts per billion atomic (ppba) level. The present process is considered useful for reducing the level of phosphorus or compounds of phosphorus typically found in tetrachlorosilane and trichlorosilane for the manufacture of electronic-grade silicon. The compounds of phosphorus are typically described by formula PH x Cl 3-x , where x=0, 1, 2 or 3. The process is most useful for reducing the level of PCl 3 . The following examples are provided to facilitate understanding of the present invention and to demonstrate the effectiveness. Example 1 Trichlorosilane spiked with PCl 3 to contain a level of 143 ppba phosphorus was contacted with an absorbent comprising a compound of copper supported on silica. CuCl 2 was supported on Grade 12 silica (Davidson Chemical Div., W. R. Grace and Co., Baltimore, Md.) by the following method. CuCl 2 (4.2 grams) was dissolved in 17.2 ml of water to form a mixture. This mixture was added to 40 grams of Grade 12 silica. The absorbent comprising CuCl 2 supported on silica was oven dried at 100°C. for 8 to 10 hours yielding a silica absorbent having 5 weight percent CuCl 2 supported on it. A 9.5 mm outside diameter quartz tube was loaded with 6 grams of the silica and heated in the presence of hydrogen gas to 600°C. for 2 hours. The content of the quartz tube was then cooled and maintained at a temperature of 300°C. A mixture comprising hydrogen gas and trichlorosilane was fed through the quartz tube containing the compound of copper supported on silica at a rate of 0.4 ml/s. The effluent from the quartz tube was recovered in a cold trap collection cylinder and analyzed for phosphorus using ultraviolet colorimetric analysis. No phosphorus was detected. The experimental conditions and results are recorded in Table 1. Example 2 The procedure of Example 1 was repeated except that the quartz tube was cooled and maintained at a temperature of 100°C. Using ultraviolet colorimetric analysis no phosphorus was detected. The experimental conditions and results are recorded in Table 1. Example 3 Trichlorosilane Trichlorosilane spiked with PCl 3 to contain a level of 400 ppba phosphorus was contacted with an absorbent comprising a compound of copper supported on silica. CuCl 2 was supported on Grade 12 silica (Davidson Chemical Div., W. R. Grace and Co., Baltimore, Md.) by the method described in Example 1. A 9.5 mm outside diameter quartz tube was loaded with 6 grams of the silica and heated in the presence of hydrogen gas to 600°C. for 2 hours. The content of the quartz tube was then cooled and maintained at a temperature of 400°C. A mixture comprising hydrogen gas and trichlorosilane was fed through the quartz tube containing the compound of copper supported on silica at a rate of 0.4 ml/s. The effluent from the quartz tube was recovered in a cold trap collection cylinder and analyzed for phosphorus using ultraviolet colorimetric analysis. No phosphorus was detected. The experimental conditions and results are recorded in Table 1. Example 4 The procedure of Example 1 was repeated except that a mixture comprising 8.5% hydrogen in helium and trichlorosilane was fed through the quartz tube containing the compound of copper supported on silica at a rate of 0.4 ml/s. Using ultraviolet colorimetric analysis no phosphorus was detected. The experimental conditions and results are recorded in Table 1. Example 5 (comparative example) Trichlorosilane spiked with PCl 3 to contain a level of 400 ppba phosphorus was contacted with Grade 12 silica (Davidson Chemical Div., W. R. Grace and Co., Baltimore, Md.). A 9.5 mm outside diameter quartz tube was loaded with 6 grams of the silica and heated in the presence of helium gas to 600°C. for 2 hours. The content of the quartz tube was then cooled and maintained at a temperature of 550°C. A mixture comprising helium gas and trichlorosilane was fed through the quartz tube containing the silica at a rate of 0.4 ml/s. The effluent from the quartz tube was recovered in a cold trap collection cylinder and analyzed for phosphorus using ultraviolet colorimetric analysis. The phosphorus level was reduced to 1.5 ppba. The experimental conditions and results are recorded in Table 1. Example 6 (comparative example) The procedure of Example 5 was repeated and the phosphorus level was reduced to 0.7 ppba. The experimental conditions and results are recorded in Table 1. Example 7 (comparative example) The procedure of Example 6 was repeated and the phosphorus level was reduced to 1.7 ppba. The experimental conditions and results are recorded in Table 1. Example No. Adsorbent Temp. (°C) Carrier Gas PCl 3 initial (ppba) Phosphorus final (ppba) 1 CuCl 2 /silica 300 H 2 143 0 2 CuCl 2 /silica 100 H 2 143 8 3 CuCl 2 /silica 400 H 2 400 0 4 CuCl 2 /silica 400 8.5% H 2 in He 400 0 5 silica 550 He 400 1.5 6 silica 550 He 400 0.7 7 silica 600 He 400 1.7

Claims: A method for reducing the phosphorus contaminant of a chlorosilane, the method comprising contacting a mixture comprising as a major portion a chlorosilane described by formula R a H b SiCl 4-a-b and as a minor portion phosphorus or a compound of phosphorus with an absorbent comprising copper or a compound of copper supported on silica at a temperature in the range of 100 to 600°C., where each R is independently selected and is a substituted or unsubstituted hydrocarbon group comprising 1 to 6 carbon atoms, a=0, 1, 2 or 3 and b=0, 1, 2 or 3. A method according to claim 1 where the compound of phosphorus is described by the formula PH x Cl 3-x and where x=0, 1, 2 or 3. A method according to claim 1 where the compound of phosphorus is PCl 3 . A method according to claim 1, where the chlorosilane is trichlorosilane or tetrachlorosilane. A method according to claim 1 where the compound of copper is CuCl 2 . A method according to claim 1, where the weight of the copper or compound of copper supported on silica is in the range of 0.1 to 15 weight percent of the absorbent.

Inventors: TZOU MING-SHIN, TZOU, MING-SHIN
Applicants: DOW CORNING, DOW CORNING CORPORATION
Application year: 1998
Main classification: C07F7
IPC codes: C07F7, B01J20, C01B33