Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element

Abstract: A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least 1500. Also included is a polymerizable monomer, a photocrosslinkable polyester and a photoinitiator. The photosensitive resins are present at a total weight ratio to the monomer of at least 1.5:1.

Description: This invention relates to a photosensitive composition containing a mixture of photocrosslinkable polymers and a polymerizable monomer. Such compositions are useful in the production of photosensitive elements such as lithographic printing plates. The art of lithographic printing is-based upon the immiscibility of oil and water, wherein the oily material or ink is preferentially retained by the image area and the water or fountain solution is preferentially retained by the non-image areas. When a suitably prepared surface is moistened with water and an ink is then applied, the background or non-image areas retain the water and repel the ink, while the image areas accept the ink and repel the water. The ink on the image areas is then transferred to the surface of a material in which the image is to be reproduced, such as paper or cloth. Negative-working lithographic printing plates are prepared from negative-working radiation-sensitive compositions that are formed from polymers that crosslink in radiation-exposed areas. A developing solution is used to remove the unexposed areas of the plates to thereby form a negative image. The most widely used type of negative-working lithographic printing plates comprises a layer of a radiation-sensitive composition applied to an aluminum substrate and commonly includes a subbing layer or interlayer to control the bonding of the radiation-sensitive layer to the substrate. The aluminum substrate is typically provided with an anodized coating formed by anodically oxidizing the aluminum in an aqueous electrolyte solution. It is well known to prepare negative-working lithographic printing plates using a radiation-sensitive composition that includes a photocrosslinkable polymer containing the photosensitive group, -CH=CH-CO- as an integral part of the polymer backbone. A very common commercially useful photocrosslinkable polymer in lithographic printing plates is a polyester prepared from diethyl p -phenylenediacrylate and 1,4-bis(β-hydroxyethoxy)-cyclohexane. Polyesters in addition to Polymer A that are especially useful in the preparation of lithographic printing plates are those which incorporate ionic moieties derived from monomers such as dimethyl-3,3'-[(sodioimino)disulfonyl]dibenzoate and dimethyl-5-sodiosulfoisophthalate. Polyesters of this type are well known. A preferred polyester of this type, known in the art as "Polymer B", is poly[1,4-cyclohexylene-bis(oxyethylene)- p -phenylenediacrylate]-co-3,3'[(sodioimino)disulfonyl]dibenzoate. Another preferred polyester of this type is known in the art as "Polymer C" and is defined as poly[1,4-cyclohexylene-bis(oxyethylene)- p -phenylenediacrylate]-co-3,3'-[(sodioimino)disulfonyl]dibenzoate-co-3-hydroxyisophthalate. Various other photocrosslinkable polymers are known for use in lithographic printing plates including the polyimide precursors described in US-A-4,416,973. Such compositions are known for durability, chemical resistance, adhesion to metals and high mechanical strength when photocrosslinked. Well-known sensitizers including coumarins and halogenated triazines, as described for example in US-A-4,505,793, can also be used in photocrosslinkable compositions. In EP-A-0 453 237 a film forming, photosensitive, heat-resistant composition comprising a varnish of a polyimide precursor having no photosensitivity in itself. Modern commercial printing plates often require a blend of polymers in the photosensitive layer. Unfortunately, some of those required polymers are incompatible with each other or insoluble in coating solvents, thus necessitating multilayer coatings. Thus, there is a need for a photosensitive formulation that can be used to provide a single-layer element. There is also a need to have a photosensitive formulation that can be processed using environmentally friendly aqueous developer solutions. It is further desired that the resulting printing plate have chemical resistance to chemicals used during printing. Thus, there is a need to provide a highly durable, long-running negative-working lithographic printing plate that is simple to make and use, and is readily prepared in a single-layer formulation. The present invention overcomes the problems noted above with a photosensitive composition characterized as comprising: a) a resin containing ethylenically unsaturated photocrosslinkable groups, b) an ethylenically unsaturated photopolymerizable monomer, c) a photocrosslinkable polyester resin, and d) a photoinitiator, the weight ratio of the total of resin a) and resin c) to the monomer b) being at least 1.5:1, the resin a) having any one of the structures I, II or III: wherein X is -NH-, R 1 is a divalent aromatic, cycloaliphatic or aliphatic group having at least 2 carbon atoms, R 2 and R 3 are independently hydrogen or an organic radical containing a photopolymerizable olefinic double bond, provided at least one of R 2 and R 3 is the organic radical, R 4 and R 5 are independently a hydrocarbon having 1 to 8 carbon atoms, perfluoro, or a perhalofluoro aliphatic group having 1 to 8 carbon atoms, or together, R 4 and R 5 form an oxo group, m is 0 or 1, and n is a positive integer corresponding to the number of units in the polymer and is sufficiently large to provide the resin a) with a number average molecular weight of at least 1500. This invention also provides a photosensitive element comprising a support and having thereon a photosensitive image-forming layer formed from the photosensitive composition described above. The photocrosslinkable compositions of this invention have a number of advantages. They contain compatible polymers and polymerizable monomers, and can be readily coated to provide single layer negative-working radiation sensitive elements such as photoresists and lithographic plates. The compositions are easily processed after exposure to remove nonimaged areas with many conventional aqueous developers. Moreover, the compositions exhibit high chemical resistance after thermal crosslinking. This attribute is largely due to the inclusion of the polyamide resin a) described herein (also known as a polyamic acid ester). This resin is not only photochemically curable, but also thermally curable to form the corresponding polyimide, a process known as imidization. The polyimide resin is highly durable and resistant to chemicals. The photosensitive elements of the present invention are capable of generally high run length, and thus the user has an option of using them for any desired run length. Conventional post-exposure will provide additional crosslinking density in the imaged layer, but the present invention extends run length even further by using the heat-curable polyamide resin a) to form the polyimide. The photosensitive composition of this invention has four essential components, the first being a resin (identified herein as "resin a") containing ethylenically unsaturated photocrosslinkable groups, and having any one of the structures I, II or III: wherein X is -NH-. R 1 is a divalent substituted or unsubstituted aromatic carbocyclic or heterocyclic group (such as arylene including naphthylene or phenylene, or pyrimidylene), a divalent non-aromatic cycloaliphatic group (such as those having 5 to 15 carbon, sulfur, oxygen or nitrogen atoms, including cycloalkyl groups of 5 to 15 carbon atoms, and heterocyclic groups having 5 to 15 carbon and heteroatoms in the ring, including cyclohexylene, pyridinylene and pyridylene) or a divalent substituted or unsubstituted aliphatic group having at least 2 carbon atoms and including substituted or unsubstituted aromatic and non-aromatic groups that can also be connected with one or more oxy, amino, thio, carbonyl, oxycarbonyl, carbonyloxy, sulfonyl, sulfonyloxy or oxysulfonyl (such as alkylene, alkyleneoxyalkylene, alkyleneoxyarylene, arylenethioarylene, aryleneoxyarylene, arylenearylene, aryleneaminoarylene, aryleneoxyarylene, aryleneoxyalkylene and others readily apparent to one skilled in the art), or combinations of any of these. Preferably, R 1 is arylene or aryleneoxyarylene as defined above, and most preferably, R 1 is phenylene or phenyleneoxyphenylene. R 2 and R 3 are independently hydrogen or a substituted or unsubstituted organic radical containing a photopolymerizable olefinic double bond (such as - CH=CH-CO- or equivalent groups where one or more of the hydrogen atoms is replaced with an alkyl group). Preferably, at least one of R 2 and R 3 (and more preferably, both) is an organic radical containing a photopolymerizable olefinic double bond that allows for crosslinking. The organic radical can include from 2 to 12 carbon, oxygen and sulfur atoms in the radical backbone, and can be substituted with various groups (such as hydroxy) that would be readily apparent to one skilled in the art. Particularly useful organic radicals are -CH 2 CH 2 OCOC(CH 3 )=CH 2 and -CH 2 CH(OH)CH 2 OCOC(CH 3 )=CH 2 and their acrylate analogs. Other useful organic radicals are described in US-A-4,416,973. R 4 and R 5 are independently a hydrocarbon having 1 to 8 carbon atoms (such as substituted or unsubstituted alkyl, cycloalkyl and aryl groups, each of which can be substituted with one or more hydrocarbon groups), perfluoro, or a perhalofluoro aliphatic group having 1 to 8 carbon atoms, or together, R 4 and R 5 form an oxo group. Preferably, R 4 and R 5 together form an oxo group. Perfluoro and perhalofluoro aliphatic groups designate groups that contain no hydrogen atoms, and wherein the all-hydrogen atoms are substituted with fluoro or other halo atoms. A preferred perhalofluoro aliphatic group is trifluoromethyl, but others would be readily apparent to one skilled in the art. In structure I, m is 0 or 1, ,and preferably, m is 1. Also, in each of the structures, n is a positive integer corresponding to the number of units in the polymer and is sufficiently large to provide resin a) with a number average molecular weight of at least 1500. Preferably, n is sufficiently large to provide a number average molecular weight of from 1500 to 35,000, and more preferably, it is sufficiently large to provide a number average molecular weight of from 2500 to 25,000. More details of useful resin a) materials, including methods of preparation, are described in US-A-4,416,973. Two or more of such resins can be used, if desired. A second essential component of the composition of this invention is one or more ethylenically unsaturated photopolymerizable monomers. Particularly useful monomers are photosensitive acrylates including mono- and polyfunctional acrylates (including methacrylates). The polyfunctional acrylates are most preferred and include, but are not limited to, such compounds as trimethylol propane trimethacrylate, trimethylol propane triacrylate, trimethylol propane ethoxylated triacrylate, trimethylol propane polyethoxylated trimethacrylate, trimethylol propane polyethoxylated triacrylate, pentaerythritol triacrylate, polyethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol dimethacrylate, polymethylene diacrylate, polyethylene dimethacrylate, trimethylene glycol dimethacrylate, and mixtures thereof. Most preferred is pentaerythritol triacrylate. These materials are commercially available from a number of sources. A photocrosslinkable polyester resin (or mixture thereof) is the third essential component of the composition of this invention. This resin typically has one or more photosensitive groups, such as a -CH=CH-CO-group. Such groups can be incorporated into the resin backbone, or be groups pendant to the resin backbone. Preferably, the photosensitive groups are an integral part of the resin backbone. The compounds also have aromatic groups. Representative polyester resins can be prepared from one or more compounds represented by the following structures V-IX: wherein R 6 is one or more substituted or unsubstituted alkyl groups having 1 to 6 carbon atoms, substituted or unsubstituted aryl having 6 to 12 carbon atoms, substituted or unsubstituted aralkyl having 7 to 20 carbon atoms, substituted or unsubstituted alkoxy having 1 to 6 carbon atoms, nitro, amino, acrylic, carboxyl, or halo, and is chosen to provide at least one condensation site. R 7 is hydroxy, substituted or unsubstituted alkoxy having 1 to 6 carbon atoms, halo or oxy if the compound is an acid anhydride. A preferred compound of structure V is p-phenylene diacrylic acid or a functional equivalent thereof. These and other useful compounds are described in US-A-3,030,208, US-A-3,622,320 and US-A-3,702,765. Structure VI: wherein R 7 is as defined above, and R 8 is substituted or unsubstituted alkylidene having 1 to 4 carbon atoms, substituted or unsubstituted aralkylidene having 7 to 16 carbon atoms or a 5- or 6-membered heterocyclic ring. Particularly useful compounds of structure VI include, but are not limited to, cinnamylidenemalonic acid, 2-butenylidenemalonic acid, 3-pentenylidenemalonic acid, o-nitrocinnamylidenemalonic acid, naphthylallylidenemalonic acid, 2-furfurylideneethylidenemalonic acid and functional equivalents thereof. These and other useful compounds are described in US-A-3,674,745. Structure VII: wherein R 7 is as defined above, and R 9 is hydrogen or methyl. Particularly useful compounds of structure VII are trans, trans -muconic acid, cis, trans -muconic acid, cis, cis -muconic acid, α,α'- cis , trans -dimethylmuconic acid, α,α'- cis , cis -dimethylmuconic acid and functional equivalents thereof. These and other useful compounds are described in US-A-3,615,434. Structure VIII: wherein R 7 is as defined above, and Z represents the atoms necessary to form an unsaturated bridged or unbridged, substituted or unsubstituted carbocyclic nucleus of 6 or 7 carbon atoms. Particularly useful compounds of structure VIII include, but are not limited to, 4-cyclohexene-1,2-dicarboxylic acid, 5-norbornene-2,3-dicarboxylic acid, hexachloro-5[2:2:1]-bicycloheptene-2,3-dicarboxylic acid and functional equivalents thereof. These and other useful compounds are described in Canadian Patent 824,096. Structure IX: wherein R 7 is as defined above, and R 10 is hydrogen, substituted or unsubstituted alkyl having 1 to 12 carbon atoms, substituted or unsubstituted cycloalkyl having 5 to 12 carbon atoms or substituted or unsubstituted aryl having 6 to 12 carbon atoms. R 10 can be substituted with any group that does not interfere with the condensation reaction, such as halo, nitro, aryl, alkoxy, aryloxy and others readily apparent to those skilled in the art. Particularly useful compounds include, but are not limited to, 1,3-cyclohexadiene-1,4-dicarboxylic acid, 1,3-cyclohexadiene-1,3-dicarboxylic acid, 1,5-cyclohexadiene-1,4-dicarboxylic acid and functional equivalents thereof. These and other useful compounds are described, for example, in Belgian Patent 754,892. Preferred photocrosslinkable polyesters for use in this invention are the p -phenylene diacrylate polyesters. Photoinitiators useful in the practice of this invention include, but are not limited to, aromatic biimidazoles, aromatic ketones, benzoin, benzoin ethers, mercaptobenzothiazoles, mercaptobenzoxazoles, and active halogen compounds, as described for example in US-A-4,416,973 and US-A-4,505,793. Particularly useful photoinitiators include 'the halogenated triazines that are substituted with at least one trihalomethyl group. Such compounds are described in more detail in the noted Tamoto and others patent. Representative compounds include, but are not limited to, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(p-chlorophenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2',4'-dichlorophenyl)-4,6-bis(trichloromethyl)-s-triazine, 2,4,6-tris(trichloromethyl)-s-triazine, 2-methyl-4,6-bis(trichloromethyl)-s-triazine, 2-n-nonyl-4,6-bis(trichloromethyl)-s-triazine, and 2-(α,α,β-trichloroethyl)-4,6-bis(trichloromethyl)-s-triazine. In addition, there can be mentioned the compounds described in GB 1,388,492, for example, 2-styryl-4,6-bis(trichloromethyl)-s-triazine, 2-( p -methylstyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-( p -methoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, and 2-( p -methoxystyryl)-4-amino-6-trichloromethyl-s-triazine. Moreover, the compounds described in J. Org. Chem. Vol. 29, page 1527 (1964), for example, 2-methyl-4,6-bis(tribromomethyl)-s-triazine, 2,4,6-tris(tribromomethyl)-s-triazine, 2,4,6-tris(dibromomethyl)-s-triazine, 2-amino-4-methyl-6-tribromomethyl-s-triazine, and 2-methoxy-4-methyl-6-trichloromethyl-s-triazine. A most preferred halogenated triazine photoinitiator is bis(trichloromethyl)-1-naphthyltriazine or its 4-methoxy derivative. In the compositions of this invention, resin a) comprises from 15 to 65%, the polymerizable monomer comprises from 15 to 50%, the photocrosslinkable polyester comprises from 15 to 65%, and the photoinitiator comprises from 0.5 to 15%, all based on dry coating weight. Preferable amounts include from 30 to 50% of resin a), from 25 to 50% of the polymerizable monomer, from 30 to 50% of the photocrosslinkable polyester, and from 2 to 12% of the photoinitiator, based on dry coating weight. The weight ratio of the total (that is, the sum of weights) of resin a) and resin c) to the monomer b) in the composition is at least 1.5:1, and preferably, at least 2.25:1. Generally, a useful weight ratio range is from 1.5:1 to 5:1, with a range of from 2.25:1 to 4:1 being preferred. Optionally but preferably, a photosensitizer is included in the composition of this invention, especially when the photoinitiator is a halogenated triazine. Particularly useful photosensitizers include coumarins that have an absorption maximum of from 250 to 550 nm. Representative useful coumarins are described in the Tamoto and others patent noted above as 3-keto-substituted coumarins. A particularly useful coumarin is t -n-propoxy ketocoumarin. When present, the amount of the sensitizer is from 0.5 to 15% (based on total dry weight), and in particular, the weight ratio of photoinitiator to sensitizer is from 10:1 to 1:1. The compositions of this invention can also include one or more surfactants, stabilizers, dyes or pigments, plasticizers, binders, anti-scumming agents, antioxidants, extenders, and other addenda commonly employed in such compositions, especially when they are used to prepare photoresists and lithographic printing plates. Such addenda can be included in conventional amounts. It is frequently desirable to add print out or indicator dyes to the photosensitive compositions to provide a colored print out image after exposure. Useful indicator dyes are well known in the art, as described for example in US-A-5,043,250. The photosensitive compositions of this invention can be prepared by dissolving or dispersing the components in one or more suitable solvents that are commonly employed in the art to prepare polymer dopes. The solvents are chosen to be substantially unreactive toward the polymers and monomer within the time period contemplated for maintaining the solvent(s) and polymers in association, and are chosen to be compatible with the substrate employed for coating. While the best choice of solvent will vary with the exact application under consideration, exemplary preferred solvents include alcohols (such as butanol, benzyl alcohol and 1-methoxy-2-propanol), ketones (such as acetone, 2-butanone and cyclohexanone), butyrolactone, ethers (such as tetrahydrofuran and dioxane), 2-methoxyethyl acetate, N,N'-dimethylformamide, chlorinated hydrocarbons (such as chloroform, trichloroethane, dichloroethane, tetrachloroethane and chlorobenzene), hydrocarbons (such as toluene, xylene and mesitylene). Mixtures of various solvents are preferred since there are several polymeric components in the composition of the invention. For example, a preferred mixture includes toluene, tetrahydrofuran, 1-methoxy-2-propanol and butyrolactone. The photosensitive elements of this invention include electrical or electronic devices such as semiconductors, capacitors and printed circuits, and lithographic printing plates. Preferred elements are negative-working lithographic printing plates. The photosensitive elements comprise a support having thereon a layer containing the photosensitive composition of this invention. Such elements can be prepared by forming coatings with the compositions and removing solvent(s) by drying at ambient or elevated temperatures. Any one of a variety of conventional coating techniques can be employed, such as extrusion coating, doctor-blade coating, spray coating, dip coating, whirl coating, spin coating, roller coating and other procedures known in the art. Suitable supports can be chosen from a wide variety of materials that do not directly chemically react with the coating compositions. Such supports include, but are not limited to, fiber based materials (such as paper, polyethylene-coated papers, polypropylene-coated papers, parchment and cloth), metal sheets and foils (such as aluminum, steel, silver, zinc, copper, gold and platinum), glass and glass coated metals (such as chromium alloys), synthetic resins and polymeric materials [such as poly(alkyl acrylates), poly(alkyl methacrylates), polyesters, poly(vinyl acetals), polyamides, cellulose nitrate, cellulose esters and the like]. Preferred support materials include zinc, anodized aluminum, grained aluminum, and aluminum that has been both anodized and grained, as described in US-A-4,647,346 and US-A-4,865,951. The support can be preliminarily treated or coated before application of the photosensitive coating of this invention. Known subbing layers can be used if desired, including copolymers of vinylidene chloride and acrylic monomers (such as acrylonitrile, methyl acrylate and methyl methacrylate) and unsaturated dicarboxylic acids (such as itaconic acid and benzoic acid), carboxymethyl cellulose, gelatin, polyacrylamide and similar materials. The optimum coating thickness of the photosensitive layer will depend upon such factors as the particular application to which the element will be put, and the nature of the various components in the layer. Typical coating thicknesses can be from 0.05 to 10 mµ or greater, with thicknesses of from 0.1 to 2.5 mµ being preferred. A protective overcoat prepared from conventional polymeric materials can be used, if desired. In a preferred embodiment of this invention, a lithographic printing plate comprises an anodized aluminum support and has thereon a photosensitive image-forming layer and a protective overcoat layer, the photosensitive image-forming layer comprising: a) a polyamide containing ethylenically unsaturated photocrosslinkable groups, b) pentaerythritol triacrylate, c) a photocrosslinkable polyester resin containing aromatic groups having linked thereto photosensitive -CH=CH-CO- or equivalent groups, and d) a halogenated triazine photoinitiator and a coumarin sensitizer that has an absorption maximum of from 250 to 550 nm, the weight ratio of the total of resin a) and resin c) to monomer b) being from 2.25:1 to 4:1, the resin a) having structure X: wherein R 1 is phenylene or phenyleneoxyphenylene, R 2 and R 3 are each -CH 2 CH 2 OCOCOC(CH 3 )=CH 2 , and n is a positive integer corresponding to the number of units in the polymer and is sufficiently large to provide said resin a) with a number average molecular weight of from 1500 to 35,000. The elements of this invention can be exposed and processed using conventional procedures and conditions, as described for example in US-A-5,141,842. Exposed printing plates can be developed by flushing, soaking, swabbing or otherwise treating the crosslinked photosensitive layer with a developing solution which selectively removes (that is, solubilizes) the unexposed areas of the layer. The developer is preferably an aqueous solution having a pH near neutral. In a preferred form, the developing solution includes a combination of water and an alcohol that is water-miscible, or is rendered water-miscible with a co-solvent or surfactant. Various useful solvents are known in the art. The developing solutions can also contain various addenda, such as surfactants, dyes and/or pigments, anti-scumming agents as are well known in the art. After development, the elements can be treated in any known manner consistent with its intended use. For example, lithographic printing plates are typically subjected to desensitizing etches or finishing solutions. The following examples illustrate the present invention and are not meant to be limiting in any way. All percentages are by weight, unless otherwise noted. Example 1: Photosensitive Composition A photosensitive composition of this invention was prepared by mixing the following components in a solvent-based formulation (weight % of wet formulation): Example 2: Lithographic Printing Plate The composition of Example 1 was coated on an electrochemically grained and anodized aluminum support that had been treated with polyvinylphosphonic acid. The resulting photosensitive layer was dried to provide a photosensitive layer having a thickness of 1.5 µm. The printing plate (Plate 1) was imagewise exposed at 40 units through a commercial vacuum exposing frame (OLEC). The plate was then machine processed in a commercially available KODAK N-85 Processor at a rate of 0.9 m/min using KODAK Production Series Negative Developer. The plate was also finished using KODAK Aqua Image Plate Finisher, to provide a high density blue image with excellent resolution and sharpness. A second plate (Plate 2) was processed as described above, but then floodwise exposed at 160 units (post-processing exposure). A third plate (Plate 3) was processed as described above, then treated with KODAK Production Series Prebake Solution, and baked at 250 °C for 3 minutes. Each of the three plates were mounted on a ommercial Miehle® printing press and subjected to an accelerated wear test with the following results: Plate 1: 500,000 estimated trade impressions, Plate 2: 1 million estimated trade impressions, and Plate'3: 1.5 million estimated trade impressions. Example 3: A second photosensitive composition of this invention was prepared by mixing the following components in a solvent-based formulation (weight % of wet formulation): Pentaerythritol triacrylate (Nippon Kayaku) 2.01% Polyamic acid ester*(noted above) (DuPont KG-10602) 2.41% Bis(diethylamino) ketocoumarin photosensitizer (Eastman Kodak Company) 0.87% Photosensitive polyester** (noted above) (Eastman Kodak Company) 1.88% Bis(trichloromethyl)-4-methoxy-1-naphthyl triazine (Eastman Kodak Co.) 0.44% 3- t -Butyl-4-hydroxy-5-methylphenyl sulfide stabilizer (Aldrich Chemicals) 0.012% Victoria Blue (Charkit) 0.075% Crystal Violet (Charkit) 0.075% FC-430 surfactant (3M) 0.08% BYK 307 coating aid (BYK) 0.12% Butyrolactone 12.97% Tetrahydrofuran 24.44% Toluene 10.66% 1-Methoxy-2-propanol 43.96% Example 4: The composition of Example 3 was applied to a support to form a printing plate (Plate 1) that was imagewise exposed and processed as described in Example 2. Plates 2 and 3 were also further processed as described in Example 2. All three plates were then subjected to the accelerated wear tests as described above, and it was found that the plates gave similar results. Each plate was also tested for chemical resistance by rubbing it for 2 minutes with various photochemicals, such as Rubber Rejuvinator, Prisco Omni, Rossos plate cleaner, and the organic solvents, isopropyl alcohol, 2-methoxy ethanol, methyl ethyl ketone and cyclohexanone. Plate 1 was resistant to many press chemicals, Plate 2 was resistant to most press chemicals, and Plate 3 was resistant to all press chemicals.

Claims: A photosensitive composition characterized as comprising: a) a resin containing ethylenically unsaturated photocrosslinkable groups, b) an ethylenically unsaturated photopolymerizable monomer, c) a photocrosslinkable polyester resin, and d) a photoinitiator, the weight ratio of the total of the resin a) and resin c) to the monomer b) being at least 1.5:1, the resin a) having any of structures I, II or III: wherein X is -NH-, R 1 is a divalent aromatic, cycloaliphatic or aliphatic group having at least 2 carbon atoms, R 2 and R 3 are independently hydrogen or an organic radical containing a photopolymerizable olefinic double bond, provided at least one of R 2 and R 3 is the organic radical, R 4 and R 5 are independently a hydrocarbon having 1 to 8 carbon atoms, perfluoro, or a perhalofluoro aliphatic group having 1 to 8 carbon atoms, or together, R 4 and R 5 form an oxo group, m is 0 or 1, and n is a positive integer corresponding to the number of units in the polymer and is sufficiently large to provide the resin a) with a number average molecular weight of at least 1500. The composition as claimed in claim 1 wherein R 1 is arylene or aryleneoxyarylene, both R 2 and R 3 are organic radicals containing a photopolymerizable olefinic double bond, both of R 4 and R 5 are perfluoro or together form an oxo group, and n is a positive integer sufficiently large to provide the resin a) with a number average molecular weight of from 1500 to 35,000. The composition as claimed in either of claims 1 and 2 wherein the monomer is a photosensitive polyfunctional acrylate. The composition as claimed in any of claims 1 to 3 wherein the photosensitive polyester has aromatic groups and a photosensitive -CH=CH-CO- or equivalent group. The composition as claimed in any of claims 1 to 4 wherein the photoinitiator is a halogenated triazine. The composition as claimed in any of claims 1 to 5 wherein the weight ratio of the total of the resin a) and resin c) to the monomer b) is at least 2.25:1. The composition as claimed in any of claims 1 to 6 further comprising a coumarin co-photoinitiator that has an absorption maximum of from 250 to 550 nm. The composition as claimed in any of claims 1 to 7 wherein the resin a) is present in an amount of from 15 to 65%, the photopolymerizable monomer is present in an amount of from 15 to 50%, the photocrosslinkable polyester resin is present in an amount of from 15 to 65%, and the photoinitiator is present in an amount of from 0.5 to 15%, based on dry coating weight. A photosensitive element comprising a support and having thereon a photosensitive image-forming layer, the photosensitive image-forming layer formed from the composition as claimed in any of claims 1 to 8. The lithographic printing plate as claimed in claim 9 wherein the support is a treated or untreated aluminum support, and the plate further comprises a protective overcoat.

Inventors: DOMINH THAP, KALAMEN JOHN, DOMINH, THAP, KALAMEN, JOHN
Applicants: KODAK POLYCHROME GRAPHICS CO, KODAK POLYCHROME GRAPHICS COMPANY LTD.
Application year: 1997
Main classification: G03F7
IPC codes: G03F7