A semiconductor laser device and a method of growing a semiconductor laser device

Abstract: A semiconductor laser has an n-type cladding layer (12), a lower optical guiding layer (13), an active layer (14), an upper optical guiding layer (15), a p-type cladding layer (17) and a p-type capping layer (18). A thin, heavily p-type delta doped layer (16) is provided at the interface between the upper optical guiding layer and the p-type cladding layer. This increases the potential barrier for electrons passing from the upper optical guiding layer to the p-type cladding layer, thereby reducing the leakage of electrons into the p-type cladding layer.

Description: This invention relates to a semiconductor laser device and a method of growing a semiconductor laser device, in particular to a semiconductor laser device which emits visible radiation in the wavelength range 630nm to 680nm. Laser devices or laser diodes (LDs) fabricated in the (AlGaln)P materials systems which emit visible light in the 630nm - 680nm wavelength range are becoming increasingly important components of professional and consumer products. For example, it is envisaged that the Digital Video Disk (DVD) system will require a 635nm wavelength LD capable of delivering 5mW output power up to a temperature of 60°C. The next generation of semiconductor lasers will need an even greater maximum power output within the same temperature range. A principal limitation of current laser diodes is that they are incapable of operating for long periods (or with a sufficiently low threshold current) at the highest specified operating temperature. It is generally believed that this is caused by carriers leaking from the active region of the device into the surrounding guiding and cladding regions. So far, two methods have been employed to try and reduce this carrier leakage, namely (1) increased doping in the cladding layer, and (2) use of a Multiple Quantum Well Barrier (MQB) in the cladding layer. Both of these methods, which are described in "IEEE Journal of Quantum Electronics" Vol 30, pages 593-606 (1994), have disadvantages. Figure 1 shows the conduction and valence band energies (E C , E V ) of a separate confinement heterostructure (SCH) laser device. The diagram shows the active layer 1, an optical guiding layer 2 and a p-type cladding layer 3 under operating conditions. The electron leakage current consists of electrons which have sufficient thermal energy to surmount the potential barrier on the right hand side of the diagram and move into the p-type cladding layer 3. If the doping level of the p-type cladding layer is increased the potential barrier increases from Δε 1 to Δε 2 . However, there are practical limitations to the amount of p-doping which can be incorporated into (AlGaln)P or (Alln)P cladding regions. This is particularly true of MOCVD grown materials where a maximum impurity concentration of approximately 2x10 18 cm -3 can be achieved using either Zn or Mg. An example of this is given in IEEE Journal of Quantum Electrons, Vol. 30, No. 2, pages 593-606 (1994). However, any further increase in dopant concentration using this technique causes the dopant to diffuse into the active region of the device, thereby degrading its performance. The principle of operation of the MQB is illustrated in Figures 2(a) and 2(b). Figure 2(a) shows the conduction band energy of a SCH laser structure incorporating a MQB 4 in the p-type cladding layer. The MQB consists of very thin (a few monolayers thick) alternating layers of, for example, (InGa)P and (InGaAl)P. An electron which has sufficient thermal energy to escape from the SCH structure will be quantum mechanically reflected at each of the interfaces of the MQB. If the layer thicknesses are chosen to be λ4 in thickness, where λ is the electron wavelength, then the quantum mechanical reflectivity of the MQB will be close to 1. This is shown in Figure 2(b), in which the broken and full lines respectively represent the classical reflectivity and the difference between the classical and the quantum mechanical calculation of the reflectivity. It is clear that the reflectivity is close to 1 for electrons with energies well above the classical barrier height Δε. MQB reflectors appear to reduce the temperature dependence of the threshold current for short wavelength lasers (for example, "Applied Physics Letters", Vol 58, pages 1822-1824 (1991)). The effectiveness of MQB reflectors is, however, usually inferred from the characteristics of a laser device rather than from a direct measurement of the enhancement of the barrier height. It is thus difficult to establish what advantage has accrued from the use of an MQB reflector in comparison to any advantage that might have occurred simply due to better processing or better material quality. Furthermore, it should be noted that an MQB is only effective if the coherence length of the electron is long. Anything which destroys this coherence, such as interface scattering, will reduce the reflectivity significantly. GB-A-2099624 discloses a light emitting device wherein barrier layers with unspecified dopant (impurity) levels are provided between the active layer and respective cladding layer of opposite conductivity type. The barrier layers prevent carrier migration from the active layer so that the refractive index step between the active and cladding layers can be small. Such barrier layers are of the same general alloy composition, Al x Ga 1-x AS, as the respective cladding layers, but with x being greater in the barrier layers than in the respective cladding layers, so that the barrier layers have bandgaps which are greater than the respective cladding layers. The barrier layers may be compositionally graded. EP-A-0540799 discloses AlGalnP diodes in which, to avoid defect formation when growing thick AlGalnP cladding layers by MOVPE on a slightly misorientated GaAs substrate (and thereby reduce the risk of catastrophic optical damage in use), the usual thick p- and n-doped AlGalnP layers are replaced by thick AlGaAs layers and very thin AlGalnP barrier layers which just avoid tunneling and spill over of carriers from the active region. Such very thin AlGalnP layers are disclosed as having dopant (impurity) concentrations which are less than in the respective AlGaAs layers. According to the present invention there is provided a semiconductor laser device comprising: an active region; a cladding region; and a carrier blocking layer of the same conductivity type as the cladding region disposed on the same side of the active region as the cladding region, characterised in that the carrier blocking layer has a greater impurity concentration than the cladding region such that the leakage current through the cladding region is reduced. The carrier blocking layer has a high impurity concentration and this increases the potential barrier for the carriers, thereby decreasing the leakage current through the cladding region and reducing the temperature dependence of the threshold current. There is only a relatively narrow region where the impurity concentration is high, in contrast to the structure shown in Figure 1 in which the impurity concentration is high throughout the whole cladding region. Furthermore, the increased barrier height does not depend on the coherence of the electron wavefunction. In a preferred embodiment, the laser device is an SCH laser with an optical guiding region disposed between the cladding region and the active region so as to form a heterojunction therebetween. Whilst it is possible to provide the carrier blocking layer in the cladding region at the heterojunction, the carrier blocking layer is preferably provided in the optical guiding region at the heterojunction because the optical guiding region is normally undoped and so the increase in the conduction band energy caused by the presence of the carrier blocking layer is much more pronounced than would be the case if the carrier blocking layer were to be provided in the already heavily doped cladding region. The carrier blocking layer is most preferably a sheet doped layer, i.e. a layer comprised solely of the impurity. Preferably the thickness of the carrier blocking layer is in the range 5 to 20nm. In a preferred embodiment the impurities in the cladding region and the carrier blocking layer are p-type impurities. In a preferred embodiment the impurity concentration of the carrier blocking layer is not less than 10 19 cm -3 . In a preferred embodiment the laser device is constructed from (AlGaln)P materials. The present invention also provides a method of growing a semiconductor laser device comprising an active region, a cladding region, and a carrier blocking layer of the same conductivity type as the cladding region disposed on the same side of the active region as the cladding region, the method comprising the steps of: growing the active region; growing the carrier blocking layer; and growing the cladding region, characterised in that the carrier blocking layer is grown so as to have a greater impurity concentration than the cladding region such that the leakage current through the cladding region is reduced. Preferably, an optical guiding region is grown between the active region and the cladding region so as to form a heterojunction between the optical guiding region and the cladding region, and the carrier blocking layer is grown at the heterojunction. Whilst the carrier blocking layer may be grown in the cladding region, the carrier blocking layer is most preferably grown in the optical guiding region. Preferred embodiments of the invention will now be described in detail with reference to the accompanying Figures in which: Figure 1 is a schematic diagram of the conduction and valence band energies of a conventional SCH semiconductor laser device; Figure 2(a) is a schematic diagram of the conduction band energy of a conventional SCH semiconductor laser device provided with an MQB region; Figure 2(b) shows the reflectivity of the MQB region of the laser device of Figure 2(a); Figure 3 is a schematic diagram of a semiconductor laser device according to an embodiment of the present invention; Figure 4(a) is a schematic diagram of the conduction and valence bands of a semiconductor region incorporating a heavily p-type doped layer; Figure 4(b) is a schematic diagram of the conduction and valence bands of a laser at the interface between an optical guiding region and a cladding region; and Figure 4(c) is a schematic diagram of the conduction and valence bands of a laser at the interface between an optical guiding region and a cladding region when a heavily p-type doped layer is provided. A preferred embodiment of the invention is shown in Figure 3. This is a schematic diagram of the layer structure of an edge-emitting SCH laser device. An (AlGa)lnP n-type cladding layer 12 is grown on a n-type GaAs substrate 11, and an (AlGa)lnP optical guiding layer 13 is grown on the cladding layer 12. The active layer 14 can be either a (InGa)P single quantum well or a (InGa)P/(lnGaAl)P multiple quantum well layer. An (AlGa)lnP optical guiding layer 15, a (AlGa)lnP p-type cladding layer 17 and a p-type GaAs capping layer 18 are grown on the active layer 14. Reference numeral 16 denotes a thin, heavily p-type doped layer. This layer will be referred to as a "δ-doped layer". The effect of this layer can be understood with reference to Figures 4(a), 4(b) and 4(c). Figure 4(a) shows the effect of inserting a p-type δ-doped layer 21 in an otherwise uniformly doped p-type layer 20. The need to equalise the Fermi level E f through the structure causes strong band bending in the vicinity of the δ-doped layer. This results in the appearance of a "spike" in the conduction band and valence band edges. The spike in the conduction band forms a barrier to electron transport from one side of the structure to the other. The width of the spike is of the order of 10nm. Figure 4(b) shows the conduction and valence bands that would occur in the vicinity of the interface between the upper optical guiding layer 15 and the p-type cladding layer 17 of the laser of Figure 3 in the absence of the δ-doped layer. The step in the conduction band energy ΔE C is a barrier to electrons. If a δ-doped layer which is doped p-type is provided at the interface between the optical guiding layer 15 and the cladding layer 17 the resultant conduction and valence bands, shown in Figure 4(c), are essentially a combination of the bands shown in figures 4(a) and 4(b). There is an enlarged potential barrier in the conduction band and this reduces the leakage of electrons from the active layer into the p-type cladding layer. A δ-doped layer, also known as a sheet-doped layer, is formed when growth of a bulk semiconductor layer is interrupted, and only dopant species are supplied to the substrate. For example, a δ-doped layer can be produced if the growth of n-type GaAs (n ∼ 5x10 15 cm -3 ) is interrupted for a period of 20-400 sec whilst only Si atoms are supplied to the substrate. This results in an increase in the two dimensional doping level of the GaAs to a value equivalent to 2x10 18 cm -3 (for the bulk Si). This, in turn, produces a change in the electrostatic potential of around 180meV, and this change occurs over a distance of approximately 20nm. The production of such a δ-doped layer is described in "Proceedings of 17th International Conference on the Physics of Semiconductors", San Francisco, 1984, p325-328. Although this example refers to the growth of n-type layers, a similar effect would be expected with a p-type dopant. Be or C could be used as dopants. For maximum effect the δ-doped layer should be inserted in the optical guiding layer at the interface between the optical guiding layer and the cladding layer. Ideally, the δ-doped layer should have as large a doping density as possible without degrading the quality of the host crystal. In practice it is found that there is significant diffusion of dopant in MOCVD grown material when dopant levels exceed 2x10 18 cm -3 . Such a problem is not generally encountered in growth by either MBE or gas source MBE (GSMBE). A further limitation on the maximum impurity density is that, when one tries to increase the amount of dopant in (AlGaln)P materials, the doping eventually becomes degenerate and so the p-doping level has to be increased by large amounts to shift the Fermi level significantly. For example, in "Journal of Crystal Growth", Vol. 105, p116(1990) it is shown that for (Alln)P it is not possible to increase the doping level above about 10 18 cm -3 by either MOCVD or MBE, whereas a practical limit for GSMBE material seems to be about a factor of 5 larger. (These are practical limits for bulk materials.) It is possible to estimate the expected enhancement of the barrier height by calculating the change in the electrostatic potential. The change in the electrostatic potential is given by: Ψ = - 26*(T/300)In(P δ /P bulk )(meV) P δ,bulk are the doping levels of the 6-doped and bulk layers respectively and T is the sample temperature in degrees Kelvin ("Semiconductors" (2nd edition) p217, 1978). If the δ-doped layer has an equivalent p-type doping level of 10 19 cm -3 and the undoped guiding layer has a background doping level of 5x10 15 cm -3 equation (1) gives a change in the electrostatic potential of approximately 198meV at T=300K. This compares with 155meV if the δ-doped layer were omitted and the transition were to a bulk layer doped at 2x10 18 cm -3 . This means that an additional barrier height of about 40meV can be realised using the δ-doped layer. This increase would be as much as 130meV if a two dimensional doping level equivalent to 10 20 cm -3 could be realised in the δ-doped layer. Although the above laser device and method of growth have been described in the context of an edge-emitting laser device, the present invention is not intended to be limited to edge-emitting laser devices alone. It is conceivable that the above described features can be incorporated into other laser device, for example, surface-emitting laser devices.

Claims: A semiconductor laser device comprising: an active region (14); a cladding region (17); and a carrier blocking layer (16) of the same conductivity type as the cladding region (17) disposed on the same side of the active region (14) as the cladding region (17), characterised in that the carrier blocking layer (16) has a greater impurity concentration than the cladding region (17), such that the leakage current through the cladding region is reduced. A semiconductor laser device as claimed in Claim 1, further comprising an optical guiding region (15) disposed between the cladding region (17) and the active region (14) so as to form a heterojunction therebetween, the carrier blocking layer (16) being provided at the heterojunction. A semiconductor laser device as claimed in Claim 2, wherein the carrier blocking layer (16) is provided in the optical guiding region (15). A semiconductor laser device as claimed in Claim 1 or 2, wherein the carrier blocking layer (16) is provided in the cladding region (17). A semiconductor laser device as claimed in any one of the preceding claims, wherein the carrier blocking layer (16) is comprised solely of impurity. A semiconductor laser device as claimed in any one of the preceding claims, wherein the thickness of the carrier blocking layer (16) is in the range 5nm to 20nm. A semiconductor laser device as claimed in any one of the preceding claims, wherein the cladding region (17) and the carrier blocking layer (17) are doped with p-type impurities. A semiconductor laser device as claimed in any one of the preceding claims, wherein the impurity concentration of the carrier blocking layer (16) is not less than 10 19 cm -3 . A semiconductor laser device as claimed in any one of the preceding claims, wherein the device is a (AlGaln)P laser. A method of growing a semiconductor laser device comprising an active region (14), a cladding region (17), and a carrier blocking layer (16) of the same conductivity type as the cladding region (17) disposed on the same side of the active region (14) as the cladding region (17), the method comprising the steps of: growing the active region (14); growing the carrier blocking layer (16); and growing the cladding region (17), characterised in that the carrier blocking layer (16) is grown so as to have a greater impurity concentration than the cladding region (17) such that the leakage current through the cladding region is reduced. A method as claimed in Claim 10, wherein an optical guiding region (15) is grown between the active region (14) and the cladding region (17) so as to form a heterojunction between the optical guiding region (15) and the cladding region (17), and the carrier blocking layer (16) is grown at the heterojunction. A method as claimed in Claim 10 or 11, wherein the carrier blocking layer (16) is grown in the cladding region (17). A method as claimed in Claim 11, wherein the carrier blocking layer (16) is grown in the optical guiding region (15). A method as claimed in any one of Claims 10 to 13, wherein the carrier blocking layer (16) is grown by supplying impurity species whilst not supplying semiconductor species.

Inventors: DUGGAN GEOFFREY, DUGGAN, GEOFFREY
Applicants: SHARP KK, SHARP KABUSHIKI KAISHA
Application year: 1996
Main classification: H01S1
IPC codes: H01S5