Insertion device for use with synchrotron radiation

Abstract: The invention provides an insertion device for use with synchrotron radiation, including a horizontal undulator including a plurality of magnets linearly arranged along an axis of electron beams so that alternately positioned magnets have common polarity, and a vertical undulator including a plurality of magnets linearly arranged along an axis of electron beams so that alternately positioned magnets have common polarity. The horizontal and vertical undulators are perpendicularly centered about axes thereof, and arranged to be axially offset so that magnetic fields produced by the horizontal and vertical undulators are perpendicular to each other and a magnetic field produced by one of the horizontal and vertical undulators is inverted for each period of a magnetic field produced by the other. The insertion device is positioned in a straight section between bending magnets of a circular accelerator. In operation, the insertion device causes electrons beams to rotate alternately in opposite directions in a figure 8 fashion about an axis of the electron beams.

Description: BACKGROUND OF THE INVENTION The invention relates to an insertion device for use with synchrotron radiation, and more particularly to such an insertion device capable of causing highly energized electrons to move in a periodic field to thereby generate polarized lights having high orientation. DESCRIPTION OF THE RELATED ART A synchrotron radiation is a light having been discovered in 1940s based on the fact that electrons moving at approximate light speed in a circular accelerator tangentially emit intensive electromagnetic waves. Such a light can be produced by means of a large-sized radiation light emitting equipment as schematically illustrated in Fig. 1. The illustrated radiation light emitting equipment comprises an electron gun 1, a linear accelerator 2, a synchrotron 3, an accumulation ring 4, a plurality of beam lines 5 and synchrotron radiation experimental devices 6 associated with the beam lines 5. Electrons 7 emitted from the electron gun 1 are accelerated through the linear accelerator 2, for instance, to 1 GeV and fed into the synchrotron 3. The electrons 7 are further accelerated in the synchrotron 3 by radio-frequency waves, for instance, to 8 GeV, and fed to the accumulation ring 4 acting as a circular accelerator. The electrons are made to rotate at high speed in the accumulation ring 4 by means of a radio-frequency accelerator with the electrons being maintained in high energy (for instance, 8 GeV). When orbit of each of the electrons is changed, a synchrotron radiation 8 is emitted. These synchrotron radiations 8 are introduced to the synchrotron radiation experimental devices 6 through the beam lines 5. The accumulation ring or circular accelerator 4 is a large-sized equipment having a perimeter of about 1500 m, and each of the beam lines 5 may have a length ranging from 80 m to 1000 m, for instance, in dependence on a use of the synchrotron radiation 8. The synchrotron radiation as mentioned above is a flux of intensive lights having wide wavelength ranges covering from infrared rays having longer wavelength than that of visible lights to ultraviolet rays, soft X-rays and hard X-rays each having shorter wavelength than that of visible lights, and is characterized by intensive orientation. The synchrotron radiation has been called "a dream light" among scientists, and can be utilized in various fields as follows: (a) research for structure and characteristics of material such as arrangement of atoms in a crystal and structure of superconducting material, (b) research for structure and functions of dynamics such as growing process of a crystal and chemical reaction process, (c) research for life science and biotechnology, (d) development of new material including detection of lattice defects and impurities, and (e) medical application such as diagnosis of cancer. The above mentioned synchrotron radiation is a quite intensive light source in a region ranging from vacuum ultraviolet (VUV) having a wavelength equal to or less than 2 x 10 -7 m (2000 angstroms) to X-rays having a wavelength of about one angstrom, which region is quite difficult to be obtained by other light sources. The synchrotron radiation has advantages as follows. A. If electron energy is sufficiently high, the synchrotron radiation exhibits continuous strength profile in a wide wavelength range from X-ray to far infrared radiation. Therefore synchrotron radiation having desired wavelength can be gained by use of monochromator. B. Due to relativistic effects, the synchrotron radiation has acute orientation in a direction in which electron beams run, and hence can have practically high light intensity. C. The synchrotron radiation has remarkable linear polarization, and its oscillation plane is in parallel with an orbital plane of electron beams. However, elliptic polarization is caused if a light is received at an angle with respect to an orbital plane. As the synchrotron radiation has been used and researched, it was found that the synchrotron radiation has shortcomings as follows. A. Since the light intensity of the synchrotron radiation ranges in quite broad wavelength range, it is unavoidable for monochromatized lights to contain unignorable amount of higher harmonics and stray lights, and further an optical device is worn out by lights in unused wavelength range. B. The orientation of the synchrotron radiation is better than that of an X-ray tube having three-dimensional orientation, but not so sharp as that of laser having one-dimensional orientation. Thus, as illustrated in Fig. 2 which is a view showing the equipment illustrated in Fig. 1 in more detail, an insertion device called an undulator1 has been researched and developed. This insertion device is disposed in a straight section between bending magnets of the accumulation ring or circular accelerator to emit monochromatic light having improved orientation. Such an undulator has been reported in many articles, for instance, "View about Light Source for Synchrotron Radiation Users", Japanese Society for Synchrotron Radiation Research 2nd Meetings Pre-distributed Booklet, 1989, and "Technology of High Brilliant Synchrotron Radiation", Physical Society of Japan Report, Vol. 44, No. 8, 1989. An undulator includes a linear undulator as illustrated in Fig. 3A and a helical undulator as illustrated in Fig. 4A. The linear undulator comprises a plurality of magnets linearly arranged so that alternatively disposed magnets have common polarity, while the helical undulator comprises horizontal and vertical undulators. Magnetic fields produced by the horizontal and vertical undulators are arranged to be perpendicular to each other, and phases thereof are arranged to be offset to each other. One of examples of the helical undulator is found in Hideo Kitamura (the applicant) "Production of circularly polarized synchrotron radiation", Synchrotron Radiation News, Vol. 5, No. 1, 1992. The linear undulator provides linearly polarized radiation since electron beams 9 orbits in a plane so that the electron beams move in a zigzag direction as illustrated in Fig. 3B, while the helical undulator provides circularly polarized radiation since the electron beams 9 spirally moves as illustrated in Fig. 4B. The linearly polarized intensive radiation caused by an undulator in vacuum ultraviolet and X-rays regions is important in particular in fields such as high resolution spectroscopic experiment utilizing monochromaticity and orientation, X-ray diffraction in minute regions, an X-ray microscope and an X-ray holography. However, in the linear undulator which generates linearly polarized radiation, there is produced linearly polarized radiation having a desired frequency (for instance, υ), and in addition, k-th (k: odd number) higher harmonics (for instance, 3υ and 5υ) are also produced in Z-axis direction. Hence, an optical device is damaged due to heat load (hnυ. h: Planck's constant) of lights in unused wavelength range. In certain cases, an optical device is melted out and hence is no longer usable. SUMMARY OF THE INVENTION In view of the problems of prior art as mentioned above, it is an object of the present invention to provide an insertion device for use with synchrotron radiation, which device is capable of emitting linearly polarized intensive light and emitting less higher harmonics to thereby reduce damages of an optical device caused by heat load of lights in unused wavelength range. The invention provides an insertion device capable of emitting linearly polarized light with lesser harmonics for use with synchrotron radiation, the insertion device being positioned in a straight section between bending magnets of a circular accelerator, the insertion device causing electrons beams to rotate alternately in opposite directions in a figure 8 fashion about an axis of the electron beams. In one embodiment, the insertion device comprises a horizontal undulator including a plurality of magnets linearly arranged along an axis of electron beams so that alternately positioned magnets have common polarity, and a vertical undulator including a plurality of magnets linearly arranged along an axis of electron beams so that alternately positioned magnets have common polarity. The horizontal and vertical undulators are perpendicularly centered about an axes thereof and are arranged to be axially offset so that magnetic fields produced by the horizontal and vertical undulators are perpendicular to each other and a magnetic field produced by one of the horizontal and vertical undulators is inverted for each period of a magnetic field produced by the other. In another preferred embodiment, one of the horizontal and vertical undulators has a period twice that of the other. In a further embodyment the insertion device for use with synchrotron radiation, including a horizontal undulator including a pair of magnet arrays each including a plurality of linearly arranged magnets along an axis of electron beams so that alternately positioned magnets have common polarity, the magnet arrays being positioned in facing relation to each other, and a vertical undulator including a pair of magnet arrays each including a plurality of linearly arranged magnets along an axis of electron beams so that alternately positioned magnets have common polarity, the magnet arrays being positioned in facing relation to each other. The horizontal and vertical undulators are perpendicularly centered about an axes thereof. Each magnet of the magnet arrays of one of the horizontal and vertical undulators axially has a width twice that of each magnet of the magnet arrays of the other. The insertion device for use with synchrotron radiation made in accordance with the invention causes electron beams to rotate in opposite direction in turn in a figure 8 fashion about axes of the electron beams to thereby significantly suppress generation of higher harmonics, similarly to a helical undulator. In addition, the electron beams are made to move in a figure 8 shaped path between two points spaced away from each other, and hence, the electron beams move in a zigzag direction in both a plane containing therein the above mentioned two points and a Z-axis and a plane perpendicular to the plane, resulting in that it is possible to produce linearly polarized radiation similarly to a linear undulator. Namely, the above mentioned rotational movement suppresses generation of higher harmonics, and in addition, the rotational movement in opposite directions cancels components of circularly polarized radiation and produces linearly polarized radiation. This is based on the fact that combination of circularly polarized radiation in counterclockwise and clockwise directions makes linearly polarized radiation. Thus, the insertion device made in accordance with the invention is capable of emitting linearly polarized intensive light and emitting less higher harmonics to thereby significantly reduce damages of an optical device caused by heat load of lights in unused wavelength range. The above and other objects and advantageous features of the present invention will be made apparent from the following description made with reference to the accompanying drawings, in which like reference characters designate the same or similar parts throughout the drawings. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view illustrating a large-sized radiation light emitting equipment; Fig. 2 is an enlarged view of a part of the equipment illustrated in Fig. 1; Fig. 3A is a schematic view illustrating a conventional linear undulator; Fig. 3B is a schematic view illustrating orbit of an electron beam emitted from the conventional linear undulator illustrated in Fig. 3A; Fig. 4A is a schematic view illustrating a conventional helical undulator; Fig. 4B is a schematic view illustrating orbit of an electron beam emitted from the conventional helical undulator illustrated in Fig. 4B; Fig. 5A is a perspective view illustrating an insertion device for use with synchrotron radiation made in accordance with the first embodiment of the present invention; Fig. 5B is a plan view of the insertion device illustrated in Fig. 5A; Fig. 6A is a perspective view illustrating orbit of an electron beam emitted from the insertion device illustrated in Fig. 5A; Fig. 6B is a Z-axis direction view of the orbit illustrated in Fig. 6A; Fig. 7A is a perspective view illustrating orbit of an electron beam emitted from an insertion device made in accordance with another embodiment of the invention; Fig. 7B is a Z-axis direction view of the orbit illustrated in Fig. 7A; Fig. 8 shows an example of photon flux density of linearly polarized radiation emitted from an insertion device made in accordance with the invention; and Fig. 9 shows an example of photo flux density of radiation emitted from a conventional linear undulator. DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment in accordance with the present invention will be explained hereinbelow with reference to drawings. With reference to Figs. 5A and 5B, an insertion device in accordance with the embodiment comprises a horizontal undulator 10 and a vertical undulator 12 each of which are disposed in a straight section between bending magnets of a circular accelerator. Each of the horizontal and vertical undulators 10 and 12 includes a pair of magnet arrays 10a and 12a, respectively. Each of the magnet arrays 10a and 12a comprises a plurality of magnets 11 and 13 linearly arranged along an axis Z of an electron beam 9. The magnets 11 and 13 are arranged so that alternatively disposed magnets have common polarity N or S. Namely, N polarity magnets are sandwiched between S polarity magnets and S polarity magnets are sandwiched between N polarity magnets. The horizontal and vertical undulators 10 and 12 are centered about the axis Z, positioned perpendicularly to each other, and arranged to be axially offset so that magnetic fields produced by the horizontal and vertical undulators 10 and 12 are perpendicular to each other and a magnetic field produced by one of the horizontal and vertical undulators 10 and 12 is inverted for each period of a magnetic field produced by the other. Herein, magnetization orientation of the magnets 11 and 13 is indicated with a small arrow. In the embodiment illustrated in Figs. 5A and 5B, the magnets 13 constituting the vertical undulator 12 has an axial length twice the axial length of the magnets 11 of the horizontal undulator 10, and thereby the vertical undulator 12 has a period length twice the period length of the horizontal undulator 10. This arrangement makes a magnetic field produced by the vertical undulator 12 inverted for each period of a magnetic field produced by the horizontal undulator 10. Figs. 6A is a perspective view showing orbit of the electron beam 9 moving in the insertion device illustrated in Fig. 5A, and Fig. 6B shows the orbit as viewed in the Z-axis direction. As illustrated in Fig. 6B, the electron beam 9 axially moves at approximate velocity of light, and is influenced by the magnetic field produced by the horizontal and vertical undulators 10 and 12 to thereby rotate in counterclockwise and clockwise directions alternatively along a figure 8 shaped path about two points C1 and C2 spaced away from each other as viewed in a direction of an axis of the electron beam 9. It should be noted that Figs. 6A and 6B show enlarged orbit for clarity, and that in practical orbit, an interval between the points C1 and C2 is a few microns (µm) when E=8 GeV. As illustrated in Figs. 7A and 7B, it is also possible to obtain the same orbit as that illustrated in Figs. 6A and 6B by arranging a period length of the horizontal undulator 10 to be twice that of the vertical undulator 12. The orbit illustrated in Figs. 7A and 7B is identical with the orbit illustrated in Figs. 6A and 6B except that the points C1 and C2 are horizontally disposed as illustrated in Figs. 7B. The insertion device made in accordance with the embodiment causes electron beams to rotate in opposite direction in turn in a figure 8 fashion about axes of the electron beams to thereby significantly suppress generation of higher harmonics, similarly to a helical undulator. In addition, the electron beams are made to move in a figure 8 shaped path between the two points C1 and C2 spaced away from each other, and hence, the electron beams move in a zigzag direction in both a plane containing therein the two points C1 and C2 and a Z-axis and a plane perpendicular to the first mentioned plane, resulting in that it is possible to produce linearly polarized radiation similarly to a linear undulator. In other words, the above mentioned rotational movement suppresses generation of higher harmonics, and in addition, the rotational movement in opposite directions cancels components of circularly polarized radiation and produces linearly polarized radiation. This is based on a physical law that combination of circularly polarized radiation in counterclockwise and clockwise directions makes linearly polarized radiation. Fig. 8 shows an example of photon flux density of linearly polarized radiation emitted from an insertion device made in accordance with the invention, whereas Fig. 9 shows an example of photo flux density of radiation emitted from a conventional linear undulator. For comparison, the photon flux densities shown in Figs. 8 and 9 are calculated under the same conditions where accelerator beam energy is 8 GeV and an undulator period length is 10 cm. As is clearly shown in Fig. 9, a conventional undulator produces n-th harmonics (n: odd number ranging from 3 to 19) having quite high photo flux density in a Z-axis direction as well as radiation having a desired frequency (primary frequency, n=1). Thus, heat load of radiation in unused wavelength range wears an optical device out, and may melt the device in certain cases with the result that the device is no longer usable. The insertion device made in accordance with the invention also produces higher harmonics other than radiation having a desired frequency (n=1). However, as is clear in Fig. 8, the photo flux densities of those higher harmonics are much smaller than those of Fig. 9, indicating that it is possible to remarkably reduce damages of an optical device to be caused by heat load of radiation in unused wavelength range. Table 1 shows comparison in photon flux density and power density between a conventional undulator and an insertion device made in accordance with the invention (figure 8 type) under the same conditions. Comparison between a conventional undulator and a figure 8 type undulator Undulator Photon Flux Density [Photons/sec/mrad 2 /0.1% B.W.] Power Density [kW/mrad 2 ] Conventional 1.8 × 10 17 100 Figure 8 type 1.2 × 10 17 1.4 It is found from Table 1 that the photon flux density of a desired frequency (n=1) is almost the same between conventional and figure 8 type undulators, but the power density of the insertion device made in accordance with the invention is just 1.4% of the conventional undulator, showing that the insertion device made in accordance with the invention makes it possible to remarkably reduce heat load received by an optical device relative to a conventional undulator. While the present invention has been described in connection with certain preferred embodiments, it is to be understood that the subject matter encompassed by way of the present invention is not to be limited to those specific embodiments. On the contrary, it is intended for the subject matter of the invention to include all alternatives, modifications and equivalents as can be included within the scope of the following claims.

Claims: An insertion device for use with synchrotron radiation, for emitting linearly polarized light with less higher harmonics said insertion device being positioned in a straight section between bending magnets of a circular accelerator (4), said insertion device causing electrons beams to rotate altemately in opposite directions in a figure 8 fashion about an axis of said electrons beams. The insertion device as set forth in claim 1, said insertion device comprising: a horizontal undulator (10) including a plurality of magnets (11) linearly arranged along an axis (Z) of electrons beams so that altemately positioned magnets (11) have common polarity; and a vertical undulator (12) including a plurality of magnets (13) linearly arranged along an axis (Z) of electron beams so that altemately positioned magnets (11) have common polarity, said horizontal and vertical undulators (10, 12) being perpendicularly centered about axes (Z) thereof and being arranged to be axially offset so that magnetic fields produced by said horizontal and vertical undulators (10, 12) are perpendicular to each other and a magnetic field produced by one of said horizontal (10) and vertical (12) undulators is inverted for each period of a magnetic field produced by the other. The insertion device as set forth in claim 2, wherein one of said horizontal (10) and vertical (12) undulators has a period twice that of the other. The insertion device as set forth in claim 1, wherein said insertion device comprising: a horizontal undulator (10) including a pair of magnet arrays (10a) each including a plurality of linearly arranged magnets (11) along an axis (Z) of electron beams so that alternately positioned magnets (11) have common polarity, said magnet arrays (10a) being positioned in facing relation to each other; and a vertical undulator (12) including a pair of magnet arrays (12a) each including a plurality of linearly arranged magnets (13) along an axis (Z) of electron beams so that alternately positioned magnets (13) have common polarity, said magnet arrays (12a) being positioned in facing relation to each other; said horizontal and vertical undulators (10, 12) being perpendicularly centered about an axes (Z) thereof, each magnet (11, 13) of said magnet arrays (10a, 12a) of one of said horizontal (10) and vertical (12) undulators axially having a width twice that of each magnet (11, 13) of said magnet arrays (10a, 12a) of the other.

Inventors: KITAMURA HIDEO, TANAKA TAKASHI, KITAMURA, HIDEO, TANAKA, TAKASHI
Applicants: RIKAGAKU KENKYUSHO
Application year: 1996
Main classification: H05H7
IPC codes: H05H7, H05H13