Use of a material for a suscepter.

Abstract: A suscepter, which is composed substantially of a vitreous carbon derived from polycarbodiimide resin; and a process for producing a suscepter, which comprises molding a polycarbodiimide resin or a composition composed mainly of a polycarbodiimide resin, into a shape of a suscepter and then carbonizing the molded material in vacuum or an inert gas atmosphere. Said suscepter is free from the problems of the prior art, which has no pores on the surface and generates no impurity and which causes no cracking when used at high temperatures

Description: Background of the Invention (1) Field of the Invention The present invention relates to the use of a material composed of vitreous carbon for a suscepter used in the gas-phase epitaxy of compound semiconductors (indium, gallium, arsenic and phosphorus are used), as well as to the use of said material made by a process for production of said suscepter. More particularly, the present invention relates to the use of said material for a suscepter which has no pores on the surface and thereby generates no impurity and which causes no crakking when used at high temperatures, as well as to the use of said material made by a process for production of said suscepter. (2) Description of the Prior Art Gas-phase expitaxy is also called CVD" ( C hemical V apor D eposition) and is one of the thin-film formation techniques used in the production of semiconductor elements. In the gas-phase epitaxy, a gas-phase chemical reaction is conducted to form a thin film directly on the semiconductor substrate. In the gas-phase epitaxy, a thin layer of a semiconductor material is formed epitaxially on the semiconductor substrate by thermal decomposition or a hydrogen reduction reaction of a gaseous component at a high temperature. In this case, the semiconductor substrate must be heated. In general, the semiconductor substrate is mounted on a heating substrate (a suscepter) and is heated via the suscepter. When gas-phase epitaxy is conducted as above, the properties of the epitaxial layer obtained are controlled by the material constituting the suscepter used. Therefore, the material of the suscepter is a very important factor in gas-phase epitaxy. As the material of the suscepter, there have been used silicon, molybdenum, tungsten, graphite, etc. Each of these materials is insufficient in stability at the high temperatures and also has a problem in purity, and has not been satisfactory. That is, for example, graphite has pores on the surface and easily adsorbs gases, and emits harmful gases during epitaxial operation; and molybdenum and tungsten adversely affect, per se, the respective products obtained, even when they have high purities. Currently, there is used, as the material of the suscepter, a graphite material comprising a graphite substrate and a carbon silicide (SiC) film formed thereon by CVD. However, since there is a difference in thermal expansion coefficient between the graphite substrate and the SiC film, the graphite material, when used at high temperatures (1,300-1,700°C), causes cracking, which invites staining of semiconductor with impurities. U.S. Patent No. 4,816,338 discloses a glassy carbon-coated article which is used for a suscepter, and process for the preparation thereof. To be free from cracking upon production even on rapid heating or cooling condition, the article contains a graphite substrate and a glassy carbon coating applied on the graphite substrate. The coating has a thickness of 15 to 200 microns. The glassy carbon is obtained by heating a raw material containing a thermal decomposition product of an organic polymer and a heat resistant inorganic substance. The difference of thermal expansion coefficient between the glassy carbon and the graphite substrate is not higher than 1.5 x 10 -6 /°C. Object and Summary of the Invention The object of the present invention is to provide a suscepter which is free from the problems of the prior art, which has no pores on the surface and generates no impurity and which causes no cracking when used at high temperatures. The present inventors made a study based on an idea that a suscepter produced by carbonizing a polycarbodiimide resin (this resin gives a high carbon content and yet a high yield when fired) might be able to satisfy the above object. As a result, the present inventors completed the present invention. The present invention provides: The use of a material for a suscepter according to claim 1, said material composed of vitreous carbon derived from polycarbodiimide resin wherein the vitreous carbon has a bulk density of 1.51-1.8 g/cm 3 , a bending strength of 176-390 Mpa (1,800-4,000 kg/cm 2 ), a Shore hardness of 121-140, a porosity of 0-0.09% and an ash content of 0-4 ppm and the use of said material made by a process for producing said suscepter, said process comprising the steps of molding polycarbodiimide resin or a composition composed mainly of polycarbodiimide resin, into a shape of a suscepter and then carbonizing the molded material in vacuum or an inert gas athmosphere whereby the polycarbodiimide resin includes a homopolymer or a copolymer each composed of at least one repeating unit represented by the formula - R - N = C = N - wherein R represents a residual group of organic diisocyanate. Detailed Description of the Invention The present invention is herinafter described in detail. The suscepter mentioned in the present invention includes a heating substrate which is used for mounting the semiconductor substrate thereon, when the semiconductor substrate is heated so as to form a thin layer of a semiconductor material on the semiconductor substrate epitaxially, in the gas-phase epitaxy process. In the present invention, the suscepter is made of a vitreous carbon derived from polycarbodiimide resin. The polycarbodiimide resin can be produced by a per se known process or a process similar thereto [e.g. , U.S. Patent No. 2,941,966; Japanese Patent Publication No. 47-33279; J. Org. Chem., 28 , 2069-2075 (1963); Chemical Review 1981, Vol. 81, No. 4, 619-621]. It can easily be produced, for example, by subjecting an organic diisocyanate to a condensation reaction (carbon dioxide is removed in the reaction) in the presence of a carbodiimidization catalyst. The organic diisocyanate used in the above production of the polycarbodiimide resin may be any of an aliphatic type, an alicyclic type, an aromatic type, an aromatic-aliphatic type, etc. These may be used singly or in admixture of two or more (in the latter case, a copolycarbodiimide resin is obtained). The polycarbodiimide resin used in the present invention includes a homopolymer or a copolymer each composed of at least one repeating unit represented by the following formula -R-N=C=N- wherein R represents a residual group of organic diisocyanate. The above R is preferably a residual group of aromatic diisocyanate, and herein, the residual group of organic diisocyanate refers to a portion of organic diisocyanate which is the organic diisocyanate molecule minus two isocyanate groups (two NCOs). Specific examples of such a polycarbodiimide resin are the followings. In each of the above formulas, n is 10-10,000, preferably 50-5,000; and the terminal(s) of each polycarbodiimide resin may be blocked with a monoisocyanate or the like. The polycarbodiimide resin can be obtained in the form of a solution, or as a powder precipitated from the solution. The polycarbodiimide obtained in the form of a solution is used as it is or after removing the solvent; and the polycarbodiimide resin obtained as a powder is used as it is or after being dissolved in a solvent to convert it into a solution. In the present invention, the polycarbodiimide resin powder or solution is first made into a molded material having a shape of a suscepter. The method of forming the molded material is not particularly restricted and can be a method generally used in production of such a suscepter, such as injection molding, compression molding, liquid injection molding, vacuum molding or the like. Then, the molded material having a shape of a suscepter is heated to carbonize the polycarbodiimide resin, whereby an intended suscepter for semiconductor according to the present invention can be produced. The carbonization step can be conducted in vacuum or in an inert gas atmosphere such as nitrogen gas or the like. The final firing temperature is preferably 1,000-3,000°C. The thus obtained suscepter according to the present invention is made of a vitreous carbon derived from the polycarbodiimide resin, said vitreous carbon having a bulk density of 1.51-1.8 g/cm 3 , a bending strength of 176-390 MPa (1,800-4,000 kg/cm 2 ), a Shore hardness of 121-140, a porosity of 0-0.09% and an ash content of 0-4 ppm. Therefore, the suscepter of the present invention having substantially no pore, being minute and without crack, free from peeling off of carbon powder, is excellent. The present invention is hereinafter described in more detail by way of Example. Example 54 g of a 2,4-tolylene diisocyanate/2,6-tolylene diisocyanate mixture (80:20) was reacted at 120°C for 4 hours in 500 ml of tetrachloroethylene in the presence of 0.12 g of a carbodiimidization catalyst (1-phenyl-3-methylphospholene oxide) to obtain a polycarbodiimide resin solution. The resin solution was casted into a mold corresponding to the shape of a suscepter to be obtained, and was molded at 60°C for 20 hours and then at 120°C for 10 hours. The resulting molded material was taken out of the mold. The material was heat-treated at 200°C for 10 hours and then heated to 2,000°C in vacuum to obtain a suscepter. The suscepter was set in a small epitaxy apparatus (produced by Kokusai Denki) and subjected to the following durability test using a silane gas. 1. Setting of silicon wafer 2. Epitaxy (105°C, 1 hour) 3. Cooling and evaluation 4. Etching (HCl gas, 1,100°C, 1 hour) The results are shown in Table 1. Number of cycles Condition 50 Normal 100 Normal 150 Normal 200 Normal Comparative Example A suscepter was made from graphite (specific gravity 1.85 g/cm3, produced by Toyo Carbon). On this graphite suscepter was formed a SiC film by CVD. The resulting material was subjected to the same durability test as in Example. The results are shown in Table 2. Number of cycles Condition 50 Normal 100 Cracks appeared 150 Many cracks appeared 200 Many cracks appeared As shown in Tables 1 and 2, the suscepter of the present invention is made mainly of a carbonized polycarbodiimide resin and, unlike the suscepter of Comparative Example comprising graphite and a SiC film formed thereon, causes no cracking.

Claims: Use of a material for a suscepter used in the gas-phase eptiasey of compound semiconductors, said material being composed of a vitreous carbon derived from polycarbodiimide resin wherein the vitreous carbon has a bulk density of 1.51-1.8 g/cm 3 , a bending strength of 176-390 MPa (1,800-4,000 kg/cm 2 ), a Shore hardness of 121-140, a porosity of 0-0.09% and an ash content of 0-4 ppm. Use of a material according to claim 1, wherein the vitreous carbon is formed by carbonizing a polycarbodiimide resin in vacuum or an inert gas atmosphere. Use of a material according to any one of claims 1 or 2, wherein said suscepter is made by a process comprising the steps of molding a polycarbodiimide resin or a composition composed mainly of a polycarbodiimide resin, into a shape of a suscepter and then carbonizing the molded material in vacuum or an inert gas atmosphere whereby the polycarbodiimide resin includes a homopolymer or a copolymer each composed of at least one repeating unit represented by the following formula -R-N=C=N- wherein R represents a residual group of organic diisocyanate. Use of a material according to any one of claims 1 or 2, wherein said suscepter is made by a process according to claim 3, wherein the carbonization of the molded material is conducted in a temperature range of 1,000-3,000°C.

Inventors: ISHIMATSU TAKESHI, SAITO KAZUO, ISHIMATSU, TAKESHI, SAITO, KAZUO, ISHIMATSU, TAKESHI, C/O NISSHINBO IND. INC., SAITO, KAZUO, C/O NISSHINBO IND. INC., TOKYO RE.C.
Applicants: NISSHIN SPINNING, NISSHINBO INDUSTRIES, INC.
Application year: 1995
Main classification: C04B35
IPC codes: H01L23, C04B35