A process for the production of tetrazolyl compounds

Abstract: [Object] A process for producing tetrazolyl compounds is provided. [Constitution] This process is characterized in that an N-protected tetrazolyl compound is reacted with hydrogen chloride in the presence of an alcohol. [Effect] Tetrazolyl compounds can be produced with high efficiency and in good yield.

Description: Field of the invention This invention relates to a technology for producing tetrazolyl compounds. Background of the invention As the technology for removing the protective group from an N-protected tetrazolyl compound to give the unprotected tetrazolyl compound, hydrolysis in hydrochloric acid-methanol (Japanese published unexamined patent application No. H4-364171/1992(JP Kokai H4-364171/1992), J. Med. Chem. 36 , 2343, 1993) and hydrolysis in acetic acid-ethanol (WO93/04059) are known. EP-A-0 539 713 discloses the production of substituted imidazolyl propenic acid derivatives wherein N-protected tetrazolyl compounds are deprotected in the presence of methanol and conc. hydrochloric acid. EP-A-0 470 794 also discloses the deprotection of an N-protected tetrazolyl compound in the presence of methanol and conc. hydrochloric acid. DE 42 12 748 A1 describes the deprotection of an N-protected tetrazolyl compound in the presence of ethanol and formic acid. According to EP-A-0 291 969 2-[1-(β-cyanoethyl)-1-H-tetrazolyl-5-yl]-4'-methylbiphenyl may be deprotected in the presence of 1,0 N NaOH and THF. EP-A-0 550 313 discloses the deprotection of an N-protected tetrazolyl compound in the presence of methanol and acetic acid. In EP-A-0 459 136 the deprotection of an N-protected tetrazolyl compound in the presence of methanol and 1N-HCl is described. The tetrazolyl compound obtained by such hydrolysis reaction can be conveniently separated from the impurity originating from the protective group by extraction with a basic aqueous solution. However, where the tetrazolyl compound contains a carboxylic ester bond, this bond is also liable to be cleaved and, therefore, this technology cannot be utilized. Accordingly in the case of a tetrazolyl compound containing a carboxylic ester bond, it has to be separated and purified by column chromatography. However, purification by column chromatography involves a complicated procedure and is commercially disadvantageous in terms of production efficiency, manpower, time and yield. Therefore, establishment of a commercially profitable process has been awaited. Object of the invention This invention provides a commercially advantageous technology for the production of tetrazolyl compounds. Summary of the invention In view of the above state of the art, the present inventors explored in earnest for an industrially useful technology for deprotecting N-protected tetrazolyl compounds and discovered that the object tetrazolyl compound of high purity can be easily obtained by reacting the starting N-protected tetrazolyl compound with a mineral acid under substantially anhydrous conditions in the presence of an alcohol. This invention has been developed on the basis of the above finding. This invention, therefore, relates to a process for producing a tetrazolyl compound which comprises reacting an N-protected tetrazolyl compound represented by the formula wherein ring A is a benzene ring which may be substituted, in addition to the group R 2 , by a substituent selected from (1) a halogen, (2) a lower (C 1-4 ) alkyl, (3) a lower (C 1-4 ) alkoxy, (4) a nitro, (5) a group of the formula: -CO-D' wherein D' is a hydroxy or a lower (C 1-4 ) alkoxy, the alkyl moiety of which may be substituted by hydroxy, lower (C 1-4 ) alkoxy, lower (C 2-6 ) alkanoyloxy or lower (C 1-6 ) alkoxycarbonyloxy, and (6) an amino which may be substituted by lower (C 1-4 ) alkyl; R 1 is a hydrogen atom or a hydrocarbon residue which may bind through a hetero atom, said hydrocarbon residue being selected from lower (C 1-8 ) alkyl, lower (C 2-8 ) alkenyl, lower (C 2-8 ) alkinyl, lower (C 3-6 ) cycloalkyl, phenyl-lower (C 1-4 ) alkyl and phenyl; said alkyl, alkenyl, alkinyl and cycloalkyl being optionally substituted by a substituent selected from hydroxy, amino, N-lower (C 1-4 ) alkylamino, N,N-di-lower (C 1-4 ) alkylamino, halogen, lower (C 1-4 ) alkoxy and lower (C 1-4 ) alkylthio; and said phenyl-lower (C 1-4 ) alkyl and phenyl being optionally substituted, in any substitutable position or positions of the benzene ring, by a substituent selected from halogen, nitro, amino, N-lower (C 1-4 ) alkylamino, N,N-di-lower (C 1-4 ) alkylamino, lower (C 1-4 ) alkoxy, lower (C 1-4 ) alkylthio and lower (C 1-4 ) alkyl; R 2 is an esterified carboxyl group selected from -COOMe, -COOEt, -COOtBu, -COOPr, pivaloyloxymethoxycarbonyl, 1-(cyclohexyloxycarbonyloxy)ethoxycarbonyl, 5-methyl-2-oxo-1,3-dioxolen-4-ylmethoxycarbonyl, acetoxymethyloxycarbonyl, propionyloxymethoxycarbonyl, n-butyryloxymethoxycarbonyl, isobutyryloxymethoxycarbonyl, 1-(ethoxycarbonyloxy)ethoxycarbonyl, 1-(acetyloxy)ethoxycarbonyl, 1-(isobutyryloxy)ethoxycarbonyl, cyclohexylcarbonyloxymethoxycarbonyl, benzoyloxymethoxycarbonyl, cinnamyloxycarbonyl and cyclopentylcarbonyloxymethoxycarbonyl; Q' is triphenylmethyl; n is 1 or 2, with a mineral acid in the presence of alcohol wherein the concentration of water is at most 1 mole per mole of the N-protected tetrazolyl compound. The compounds produced in accordance with the process of the invention are useful as therapeutics for not only hypertension but also circulatory diseases such as heart failure, strokes, cerebral apoplexy, nephropathy and nephritis. They may be used in the same manner as the products produced in U.S. Patent 5,196,444, EP 459136, and so on, which are incorporated herein by reference. Detailed description of the invention The object of this invention is to deprotect an N-protected tetrazolyl compound to provide the corresponding tetrazolyl compound. For example, this invention comprises subjecting an N-protected tetrazolyl compound to solvolysis by dissolving an N-protected tetrazolyl compound in an inert solvent and either adding an alcohol and introducing a mineral acid under substantially anhydrous conditions or adding an alcohol containing a mineral acid under substantially anhydrous conditions, to provide the corresponding tetrazolyl compound and an ether obtained by reacting the protective group of the N-protected tetrazolyl compound with the alcohol. The reaction product mixture is subjected, where necessary, to extraction, washing, concentration, etc., and an aliphatic hydrocarbon solvent is then added, whereupon the desired tetrazolyl compound is crystallized with high efficiency and in good yield, because the ether in the reaction mixture is extremely highly lipophilic compared to the tetrazolyl compound and is dissolved in the aliphatic hydrocarbon solvent. In accordance with this invention, the object tetrazolyl compound can be obtained in good yield even though the starting N-protected tetrazolyl compound contains a moiety liable to be cleaved by acid hydrolysis, such as an esterified carboxyl group and an alkoxy group. The N-protected tetrazolyl compound is represented by a compound of the following general formula wherein ring A is a benzene ring which may be substituted, in addition to the group R 2 , by a substituent selected from (1) a halogen, (2) a lower (C 1-4 ) alkyl, (3) a lower (C 1-4 ) alkoxy, (4) a nitro, (5) a group of the formula: -CO-D' wherein D' is a hydroxy or a lower (C 1-4 ) alkoxy, the alkyl moiety of which may be substituted by hydroxy, lower (C 1-4 ) alkoxy, lower (C 2-6 ) alkanoyloxy or lower (C 1-6 ) alkoxycarbonyloxy, and (6) an amino which may be substituted by lower (C 1-4 ) alkyl; R 1 is a hydrogen atom or a hydrocarbon residue which may bind through a hetero atom, said hydrocarbon residue being selected from lower (C 1-8 ) alkyl, lower (C 2-8 ) alkenyl, lower (C 2-8 ) alkinyl, lower (C 3-6 ) cycloalkyl, phenyl-lower (C 1-4 ) alkyl and phenyl; said alkyl, alkenyl, alkinyl and cycloalkyl being optionally substituted by a substituent selected from hydroxy, amino, N-lower (C 1-4 ) alkylamino, N,N-di-lower (C 1-4 ) alkylamino, halogen lower (C 1-4 ) alkoxy and lower (C 1-4 ) alkylthio; and said phenyl-lower (C 1-4 ) alkyl and phenyl being optionally substituted, in any substitutable position or positions of the benzene ring, by a substituent selected from halogen, nitro, amino, N-lower (C 1-4 ) alkylamino, N,N-di-lower (C 1-4 ) alkylamino, lower (C 1-4 ) alkoxy, lower (C 1-4 ) alkylthio and lower (C 1-4 ) alkyl; R 2 is an esterified carboxyl group selected from -COOMe, -COOEt, -COOtBu, -COOPr, pivaloyloxymethoxycarbonyl, 1-(cyclohexyloxycarbonyloxy)ethoxycarbonyl, 5-methyl-2-oxo-1,3-dioxolen-4-ylmethoxycarboynl, acetoxymethyloxycarbonyl, propionyloxymethoxycarbonyl, n-butyryloxymethoxycarbonyl, isobutyryloxymethoxycarbonyl, 1-(ethoxycarbonyloxy)ethoxycarbonyl, 1-(acetyloxy)ethoxycarbonyl, 1-(isobutyryloxy)ethoxycarbonyl, cyclohexylcarbonyloxymethoxycarbonyl, benzoyloxymethoxycarbonyl, cinnamyloxycarbonyl and cyclopentylcarbonyloxymethoxycarbonyl; Q' is triphenylmethyl; n is 1 or 2. The hydrocarbon residue R 1 is preferably alkyl, alkenyl or cycloalkyl. The alkyl group for R 1 is a lower alkyl group of 1 to about 8 carbon atoms, which may be straight-chain or branched, thus typically including methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, i-pentyl, hexyl, heptyl and octyl. The alkenyl group for R 1 is a lower alkenyl group of 2 to about 8 carbon atoms, which may be straight-chain or branched, thus typically including vinyl, propenyl, 2-butenyl, 3-butenyl, isobutenyl and 2-octenyl. The alkinyl group for R 1 is a lower alkinyl group of 2 to about 8 carbon atoms, which may be straight-chain or branched, thus typically including ethinyl, 2-propinyl, 2-butinyl, 2-pentinyl and 2-octinyl. The cycloalkyl group for R 1 is a lower cycloalkyl group of 3 to about 6 carbon atoms, thus typically including cyclopropyl, cyclobutyl, cyclopentyl and cyclohexyl. The phenyl-lower(C 1-4 )alkyl group for R 1 includes groups such as benzyl, phenethyl and so on. The above-mentioned aralkyl and aryl groups may respectively be substituted, in any substitutable position or positions of the benzene ring, by halogen (e.g. F, Cl, Br, etc.), nitro, amino, N-lower(C 1-4 )alkylamino, N,N-di-lower(C 1-4 )alkylamino, lower(C 1-4 )alkoxy (e.g. methoxy, ethoxy, etc.), lower(C 1-4 )alkylthio (e.g. methylthio, ethylthio, etc.) and/or lower(C 1-4 )alkyl (e.g. methyl, ethyl, etc.). Among the above-mentioned groups for R 1 , preferred are alkyl, alkenyl and cycloalkyl groups which may be substituted (e.g. lower(C 1-5 )alkyl, lower(C 2-5 )alkenyl and lower (C 3-6 )cycloalkyl groups which may be substituted by hydroxy, amino, halogen or lower(C 1-4 )alkoxy). R 1 may be bonding through a hetero atom {e.g. nitrogen [N(R 9 ) (R 9 means hydrogen or lower(C 1-4 )alkyl)]; oxygen or sulfur [-S(O)m- (m is a whole number of 0-2)]}. Particularly preferred is a substituted or unsubstituted alkyl or alkenyl group bonding through a hetero atom (e.g. methylamino, ethylamino, propylamino, propenylamino, isopropylamino, allylamino, butylamino, isobutylamino, dimethylamino, methylethylamino, methoxy, ethoxy, propoxy, isopropoxy, propenyloxy, allyloxy, butoxy, isobutoxy, sec-butoxy, tert-butoxy, 2-butenyloxy, 3-butenyloxy, isobutenyloxy, pentoxy, isopentoxy, hexyloxy, methylthio, ethylthio, propylthio, isopropylthio, allylthio, butylthio, isobutylthio, sec-butylthio, tert-butylthio, 2-butenylthio, 3-butenylthio, isobutenylthio, pentylthio, isopentylthio, hexylthio, etc.) The substituent group or groups other than the group R 2 on ring A may be halogen (e.g. F, Cl, Br, etc.), lower(C 1-4 )alkyl, lower(C 1-4 )alkoxy, nitro, groups of the formula -CO-D' [wherein D' represents a hydroxyl group or a lower(C 1-4 )alkoxy group, the alkyl moiety of which may be substituted by hydroxy, lower(C 1-4 )alkoxy, lower(C 2-6 ) alkanoyloxy (e.g. acetoxy, pivaloyloxy, etc.) or lower(C 1-6 ) alkoxycarbonyloxy (e.g. methoxycarbonyloxy, ethoxycarbonyloxy, cyclohexyloxycarbonyloxy, etc.)] and amino which may be substituted by (C 1-4 )alkyl (preferably, lower(C 1-4 )alkyl), halogen, etc). As for ring A, a benzene ring not substituted except by the group R 2 is still more preferred. The compound of general formula (I) can be produced in accordance with the disclosure in JP Kokai H4-364171/1992, EP459136, EP425921, for instance. The alcohol which can be employed in this invention includes methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-methyl-1-propanol, 2-butanol, 2-methyl-2-propanol, 1-pentanol, 2-pentanol, 3-pentanol, 2-methyl-1-butanol, 3-methyl-2-butanol, etc. and is preferably a lower(C 1-4 )alcohol such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-methyl-1-propanol, 2-butanol, 2-methyl-2-propanol, etc. The mineral acid which can be employed in this invention can be any acid that is under substantially anhydrous conditions. The term "substantially anhydrous conditions" means conditions in which water does not substantially take part in the reaction. For example, hydrogen halide, concentrated sulfuric acid, can be mentioned. Particularly preferred is hydrogen halide. The concentration of water is at most 1 mol, preferably at most 0.5 mol, per mole of the N-protected tetrazolyl compound. The hydrogen halide which can be employed in this invention includes hydrogen fluoride, hydrogen chloride, hydrogen bromide, hydrogen iodide, etc. and is preferably hydrogen chloride. The concentration of the concentrated sulfuric acid is at least 95%, preferably 98%. This invention is, for example, carried into practice by dissolving said N-protected tetrazolyl compound in an inert solvent and either adding an alcohol and introducing a mineral acid under substantially anhydrous conditions or adding an alcohol containing a mineral acid under substantially anhydrous conditions. The amount of the alcohol to be added is not so critical but is at least one mole, generally 2-100 moles, preferably 5-50 moles, per mole of the N-protected tetrazolyl compound. The inert solvent for the N-protected tetrazolyl compound can be any solvent that does not take part in the reaction and is capable of dissolving the N-protected tetrazolyl compound. For example, methylene chloride, ethyl acetate, toluene, dioxane, tetrahydrofuran, xylene, chloroform and carbon tetrachloride can be mentioned. Particularly preferred are methylene chloride, ethyl acetate and toluene. These solvents can be used singly or in a suitable combination of 2 or more species. As to this solvent, the alcohol for use in said introduction or dissolution of hydrogen chloride can be utilized as the reaction solvent as well. The amount of the solvent to be used is not so critical but is generally 2-10 or preferably 3-5 volumes relative to the N-protected tetrazolyl compound. The amount of mineral acid is not so critical, either, but is generally 1-5 equivalents or preferably 1-2 equivalents relative to the N-protected tetrazolyl compound. The reaction temperature is not critical but is generally -5-30°C and preferably not higher than 10°C. The reaction time, which is not particularly restricted, is generally 1-6 hours and preferably 1-3 hours. The reaction product mixture is subjected, where necessary, to extraction, washing, concentration, etc., and an aliphatic hydrocarbon solvent is then added, whereupon the desired tetrazolyl compound is crystallized. The aliphatic hydrocarbon solvent that can be used includes pentane, hexane, heptane and others but is preferably hexane or heptane. This aliphatic hydrocarbon solvent can be used in admixture with an inert solvent. The inert solvent that can be used includes lower(C 1-4 ) alcohols (e.g. methanol, ethanol, propanol, butanol, etc.), acetone, methylene chloride, ethyl acetate, toluene, acetonitrile and so on. Particularly preferred is acetone. In accordance with this invention, the objective tetrazolyl compound can be obtained as crystals of high quality in good yield. The compounds produced in accordance with the process of the invention are specifically disclosed as follows: (±)-1-(cyclohexyloxycarbonyloxy)ethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]-1H-benzimidazole-7-carboxylate, Ethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Methyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Methyl 2-methoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Pivaloyloxymethyl 2-butyl-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]-1H-benzimidazole-7-carboxylate, Pivaloyloxymethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Ethyl 2-propoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, (5-Methyl-2-oxo-1,3-dioxolen-4-yl)methyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Acetoxymethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Propionyloxymethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Butyryloxymethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Isobutyryloxymethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, 1-(Ethoxycarbonyloxy)ethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, 1-Acetoxyethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, 1-(Isopropoxycarbonyloxy)ethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Cyclohexylcarbonyloxymethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Benzoyloxymethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, (E)-Cinnamoyloxymethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Cyclopentylcarbonyloxymethyl 2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Pivaloyloxymethyl 2-ethylamino-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, 1-(Cyclohexyloxycarbonyloxy)ethyl 2-ethylamino-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, Methyl 2-allyloxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate, and Methyl 2-butoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methyl]benzimidazole-7-carboxylate. In accordance with this invention, as contrasted to the processes involving the presence of water in the reaction system, the decomposition reaction is remarkably inhibited even though the starting N-protected tetrazolyl compound has a partial structure liable to undergo hydrolysis under acidic conditions, thus insuring a high reaction yield of the objective tetrazolyl compound. Since a tetrazolyl compound can be produced with high efficiency and in good yield by deprotecting the N-protected tetrazolyl compound in accordance with this invention, a commercially useful production technology is provided for tetrazolyl compounds. The following examples are intended to describe this invention in further detail and should by no means be construed as defining the scope of the invention. Example 1 In 29 mL of methylene chloride was dissolved 10.00 g of (±)-1-(cyclohexyloxycarbonyloxy)ethyl 2-ethoxy-1-[2'-(N-triphenylmethyl-1H-tetrazol-5-yl)biphenyl-4-yl]methylbenzimidazole-7-carboxylate followed by addition of 23 mL of methanol and cooling to 5°C. Then, 6 mL of methanol containing 0.53 g of hydrogen chloride as dissolved was added dropwise at 5°C over a period of 15 minutes. The mixture was further stirred at 5°C for 3.5 hours, at the end of which time 19 mL of ethyl acetate and 19 mL of water were added. The mixture was adjusted to pH 6.3 with a saturated aqueous solution of sodium hydrogen carbonate and, then, 10 mL of ethyl acetate and 10 mL of 20% NaCl-H 2 O were added. The aqueous layer was separated and extracted with 20 mL of ethyl acetate. The ethyl acetate layers were combined and redistributed into 20% NaCl and 38 mL of ethyl acetate. The organic layer was separated and concentrated and the residue was diluted with ethanol and reconcentrated. To the residue was added 20 mL of acetone and the mixture was stirred at room temperature for 3 hours for sufficient crystallization. Thereafter, 90 mL of hexane was added and the mixture was further stirred at room temperature for 1 hour and, then, under ice-cooling for 2 hours. The resulting crystals were collected by filtration and washed with 25 mL of acetone-hexane (1:9). The crystals were dried under reduced pressure to provide 6.90 g of (±)-1-(cyclohexyloxycarbonyloxy)ethyl 2-ethoxy-1-[2'-(1H-tetrazol-5-yl) biphenyl-4-yl]methylbenzimidazole-7-carboxylate (yield 92%). 1 H-NMR (200 MHz, CDCl 3 ) δ: 1.2-1.53 (12H, m), 1.69 (2H, m), 1.89 (2H, m), 4.55-4.69 (3H, m), 5.51 (1H, d), 5.61 (1H, d), 6.75-7.01 (11H, m), 7.13-7.46 (13H, m), 7.57 (1H, dd), 7.75 (1H, dd), 7.84-7.89 (1H, m) IR (KBr) cm -1 : 2942, 1754, 1717, 1615, 1476 Example 2 In a mixture of 17 mL of methylene chloride and 13 mL of methanol was dissolved 5.79 g of pivaloyloxymethyl 2-ethoxy-1-[2'-(N-triphenylmethyl-1H-tetrazol-5-yl)biphenyl-4-yl]methylbenzimidazole-7- carboxylate and the solution was cooled to 5°C. To this solution was added 3.7 mL of methanol containing 0.344 g of hydrogen chloride dropwise and the mixture was stirred at 5-6°C for 2 hours. Then, 11 mL of ethyl acetate and 11 mL of water were added and the mixture was adjusted to pH 6.2 with a saturated aqueous solution of sodium hydrogen carbonate. Then, 6 mL of ethyl acetate and 20% NaCl-H 2 O were added. The aqueous layer was taken and extracted with 12 mL of ethyl acetate. The organic layers were combined and redistributed into 22 mL of ethyl acetate and 20% NaCl solution. The organic layer was separated and concentrated and the residue was stirred in 15 mL of toluene at room temperature for 30 minutes. Then, 100 mL of hexane was added and the mixture was stirred under ice-cooling for 1 hour. The resulting crystals were collected by filtration, washed with 20 mL of toluene-hexane (1:9), and dried to provide 3.65 g of pivaloyloxymethyl 2-ethoxy-1-[2'-(1H-tetrazol-5-yl)-biphenyl-4-yl]methylbenzimidazole-7-carboxylate (yield 91%). 1 H-NMR (200 MHz, CDCl 3 ) δ: 1.13 (9H, s), 1.44 (3H, t), 4.37 (2H, q), 5.61 (2H, s), 5.68 (2H, s), 6.80 (2H, d), 6.93 (2H, d), 6.99-7.11 (2H, m), 7.33-7.37 (1H, m), 7.49-7.54 (1H, m), 7.59-7.62 (2H, m), 8.03-8.07 (1H, m) IR (KBr) cm -1 : 2986, 1755, 1734, 1614, 1554, 1479, 1429 m.p. 145-146°C Example 3 Using 10.0 g of (±)-1-(cyclohexyloxycarbonyloxy)ethyl 2-ethoxy-1-[2'-(N-triphenylmethyl-1H-tetrazol-5-yl)biphenyl-4-yl]methylbenzimidazole-7-carboxylate, the reaction and after-treatment of Example 1 was repeated except that ethanol was used in lieu of methanol. The procedure provided 6.83 g of (±)-1-(cyclohexyloxycarbonyloxy)ethyl 2-ethoxy-1-[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methylbenzimidazole-7- carboxylate (yield 91%). In physicochemical properties, this compound was in agreement with the compound obtained in Example 1. Comparison Example 1 In 15 mL of methylene chloride was dissolved 5.44 g of (±)-1-(cyclohexyloxycarbonyloxy)ethyl 2-ethoxy-1-[2'-(N-triphenylmethyl-1H-tetrazol-5-yl)biphenyl-4-yl]methylbenzimidazole-7-carboxylate followed by addition of 54 mL of methanol and 8.2 mL of 1N-HCl, and the mixture was stirred at 25°C for 2 hours. Then, 19 mL of water and 19 mL of ethyl acetate were added and the mixture was adjusted to pH 3.2 with a saturated aqueous solution of sodium hydrogen carbonate. The mixture was extracted using 19 mL of water and 54 mL of ethyl acetate and the aqueous layer was separated and extracted with 30 mL of ethyl acetate. The organic layers were combined, washed with 40 mL of water and concentrated under reduced pressure to give an oil. This oil was purified by silica gel chromatography (300 mL, methylene chloride-methanol = 10:1) to provide 2.92 g of (±)-1-(cyclohexyloxycarbonyloxy)ethyl 2-ethoxy-1-[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methylbenzimidazole-7-carboxylate (yield 75%). The physicochemical properties of this compound were in good agreement with those of the compound obtained in Example 1. Comparison Example 2 To 2.0 g of pivaloyloxymethyl 2-ethoxy-1-[2'-(N-triphenylmethyl-1H-tetrazol-5-yl)biphenyl-4-yl]methylbenzimidazole-7-carboxylate were added 30 mL of methanol and 6 mL of 1N-hydrochloric acid and the mixture was stirred at room temperature for 30 minutes. The reaction mixture was then concentrated under reduced pressure and extracted using ethyl acetate and water. The organic layer was separated and concentrated under reduced pressure to give an oil. This oil was purified by silica gel chromatography (100 mL, methylene chloride-methanol = 10:1) to provide 1.13 g of pivaloyloxymethyl 2-ethoxy-1-[2'-(1H-tetrazol-5-yl)biphenyl-4-yl]methylbenzimidazole-7-carboxylate (yield 80%). The physicochemical properties of this compound were in good agreement with the compound obtained in Example 2. Example 4 In a mixture of 1.5 mL of methylene chloride and 1.5 mL of methanol was dissolved 0.50 g of (±)-1-(cyclohexyloxycarbonyloxy)ethyl 2-ethoxy-1-[2'-(N-triphenylmethyl-1H-tetrazol-5-yl)biphenyl-4-yl]methylbenzimidazole-7-carboxylate and the solution was cooled to 3°C. To this solution was added 0.040 mL of concentrated sulfuric acid (98%) and the mixture was stirred at 3°C for 3.5 hours. Then, the reaction mixture was analyzed by HPLC. The peak area ratio of precursor material, product and by-product was shown in Table 1 (Run 1). The results of experiment carried out with the same procedure as described above using hydrogen chloride instead of concentrated sulfuric acid were also shown in Table 1 (Run 2). Comparision Example 3 The results of experiment carried out with the same procedure as described in Example 4 using concentrated hydrochloric acid instead of concentrated sulfuric acid were also shown in Table 1 (Run 3). Run No. Acid Reaction temperature Reaction time Product By-product Raw or precursor material 1 98% H 2 SO 4 1.3eq 3°C 3.5hr. 93.6% 3.5% 2.9% 2 HCl (gas) 1.1eq 3°C 2.5hr. 97.9% 1.0% 1.0% 3 35% HCl aq. 1.3eq 3°C 5.0hr. 88.6% 10.0% 1.4%

Claims: A process for producing a tetrazolyl compound which comprises reacting an N-protected tetrazolyl compound represented by the formula wherein ring A is a benzene ring which may be substituted, in addition to the group R 2 , by a substituent selected from (1) a halogen, (2) a lower (C 1-4 ) alkyl, (3) a lower (C 1-4 ) alkoxy, (4) a nitro, (5) a group of the formula: -CO-D' wherein D' is a hydroxy or a lower (C 1-4 ) alkoxy, the alkyl moiety of which may be substituted by hydroxy, lower (C 1-4 ) alkoxy, lower (C 2-6 ) alkanoyloxy or lower (C 1-6 ) alkoxycarbonyloxy, and (6) an amino which may be substituted by lower (C 1-4 ) alkyl; R 1 is a hydrogen atom or a hydrocarbon residue which may bind through a hetero atom, said hydrocarbon residue being selected from lower (C 1-8 ) alkyl, lower (C 2-8 ) alkenyl, lower (C 2-8 ) alkinyl, lower (C 3-6 ) cycloalkyl, phenyl-lower (C 1-4 ) alkyl and phenyl; said alkyl, alkenyl, alkinyl and cycloalkyl being optionally substituted by a substituent selected from hydroxy, amino, N-lower (C 1-4 ) alkylamino, N,N-di-lower (C 1-4 ) alkylamino, halogen, lower (C 1-4 ) alkoxy and lower (C 1-4 ) alkylthio; and said phenyl-lower (C 1-4 ) alkyl and phenyl being optionally substituted, in any substitutable position or positions of the benzene ring, by a substituent selected from halogen, nitro, amino, N-lower (C 1-4 ) alkylamino, N,N-di-lower (C 1-4 ) alkylamino, lower (C 1-4 ) alkoxy, lower (C 1-4 ) alkylthio and lower (C 1-4 ) alkyl; R 2 is an esterified carboxyl group selected from -COOMe, -COOEt, -COOtBu, -COOPr, pivaloyloxymethoxycarbonyl, 1-(cyclohexyloxycarbonyloxy)ethoxycarbonyl, 5-methyl-2-oxo-1,3-dioxolen-4-ylmethoxycarbonyl, acetoxymethyloxycarbonyl, propionyloxymethoxycarbonyl, n-butyryloxymethoxycarbonyl, isobutyryloxymethoxycarbonyl, 1-(ethoxycarbonyloxy)ethoxycarbonyl, 1-(acetyloxy)ethoxycarbonyl, 1-(isobutyryloxy)ethoxycarbonyl, cyclohexylcarbonyloxymethoxycarbonyl, benzoyloxymethoxycarbonyl, cinnamyloxycarbonyl and cyclopentylcarbonyloxymethoxycarbonyl; Q' is triphenylmethyl; n is 1 or 2, with a mineral acid in the presence of alcohol wherein the concentration of water is at most 1 mole per mole of the N-protected tetrazolyl compound. The process according to claim 1, wherein the mineral acid is hydrogen halide. The process according to claim 2, wherein the hydrogen halide is hydrogen chloride. The process according to claim 1, wherein the mineral acid is concentrated sulfuric acid. The process according to claim 4, wherein the concentration of the concentrated sulfuric acid is at least 95%. The process according to claim 1, wherein said alcohol is a lower (C 1-4 ) alcohol. The process according to claim 1, wherein the tetrazolyl compound in the reaction mixture is crystallized using an aliphatic hydrocarbon solvent selected from pentane, hexane and heptane. The process according to claim 7, wherein said aliphatic hydrocarbon solvent is hexane. The process according to claim 1, wherein the tetrazolyl compound is (±)-1-(cyclohexyloxycarbonyloxy) ethyl-2-ethoxy-1-[[2'-(1H-tetrazol-5-yl)biphenyl-4-yl] methyl]-1H-benzimidazole-7-carboxylate.

Inventors: SHIDA YASUSHI, YOSHIDA KOKICHI, SHIDA, YASUSHI, YOSHIDA, KOKICHI
Applicants: TAKEDA CHEMICAL INDUSTRIES LTD, TAKEDA CHEMICAL INDUSTRIES, LTD.
Application year: 1995
Main classification: C07D257
IPC codes: C07D403