METHOD OF MINIMIZING DIFFRACTION GROOVE FORMATION ON LASER ETCHED SURFACES

Abstract: Laser radiation can be directed through an aperture to a target surface without causing the expected diffraction groove effect by moving the target relative to the stage to which the aperture is attached in such a fashion as to interrupt the diffraction pattern and minimize the production of diffraction grooves.

Description: METHOD OF MINIMIZING DIFFRACTION GROOVE FORMATION ON LASER ETCHED SURFACES FIELD OF THE INVENTION The present invention relates to the improved methods of laser etching substrates, especially optically clear sub¬ strates for uses such as contact lenses. BACKGROUND OF THE INVENTION The use of apertures with laser systems in the field of material processing is veil known. An aperture is understood to be an object which has an opening through vhich the laser bean, or a portion of the laser bean, is directed. There are aany applications for apertures in the laser processing field. Apertures say be used to restrict certain portions of the laser bean from reaching the target. For exaaple, the rav bean emitted from an exciner laser does not have a uniform cross-sectional energy distribution across its profile. The "edges" of the bean often have a reduced energy profile as compared with the more central portion of the beam. This is predicted by the characteristic Gaussian distribution along one axis of the rav exciner bean. Therefore, apertures are often used vith excimer lasers in an attempt to create a beam of uniform energy distribution. However, when a laser beam passes through an aperture, the beam undergoes a physical phenomenon known as diffraction. Diffraction is defined as the departure from rectilinear propagation of electromagnetic radiation (light) , and its effects can be observed when the bending or deflection of light or other radiation passes an obstacle such as the edge of a slit, or aperture. The diffraction effects may be seen as a series of lines or grooves at or near the edges of the irradiated field; such field being the area bounded by the aperture which is exposed to radiation on the target surface. Useful applications have been found for the diffraction grooves left by the diffraction effect. The diffraction effects in certain applications are desirable and even necessary. However, when the irradiated substrate aust remain optically clear and unaffected by any irregularity, the presence of diffraction grooves is often not desirable. The grooves aay impact the lens design, otherwise affect the other aspects of the lens or make production of lenses impossible, since the presence of such di fraction grooves in the optical zone aay be unacceptable. SUMMARY OF THE INVENTION It has now been discovered, and is disclosed herein that laser radiation in the form of a laser beam can be directed through an aperture to a target surface without causing the expected diffraction groove effect by moving 1} the beam relative to the target, 2) the beam relative to the aperture or 3) the aperture relative to the substrate such that the formation of diffraction grooves on the target surface is minimized. In one embodiment of the present invention, a method for aodifying a target surface is disclosed comprising directing a beam of radiation through an aperture to a target substrate while shifting the beam position on the target surface by a distance such that the formation of di fraction grooves is minimized. In a further embodiment, a method for aodifying a target surface is disclosed comprising directing a beam of radiation through an aperture to a target substrate while moving the aperture relative to target substrate in a predetermined aotion at a predetermined velocity such that the formation of diffraction grooves is minimized. The predetermined aotion aay be a linear oscillating aotion, or an off-axis rotational aotion. BRIEF DESCRIPTION OF THE DRAWINGS Fig. l ie a perspective view of a laser assembly with a stage housing an aperture and focusing lens showing the stage being oscillated laterally to minimize formation of diffraction grooves. Fig. 2 is a perspective view of a laser assembly with aperture and lens showing the stage being oscillated linearly along with a scanning beam to minimize formation of diffraction grooves. DETAILED DESCRIPTION OF THE INVENTION In one embodiment of the present invention as shown by Fig. 1, a small aperture is imaged onto a target surface. A laser beam (l) from a laser source (not shown) is directed to a airror (2) which in turn directs the beam (1) to a rectangular aperture (3) having a small (1.8mm x 1.2am) opening (4). The beam (1) then engages a focusing lens (5) and is directed to the target sample (6) which is fixed to a positioning means (7). The aperture (3) and focusing lens (5) are aounted to a stage (8) having a connection (9) to a aeans (not shown) capable of oscillating the stage in a desired aotion, which aay be linear, at predetermined and adjustable speeds which can be programmed to work in concert with the scanning motion of the beam. In a further embodiment of the present invention, as shown by Figure 2, a beam is directed through an aperture and focusing lens to a contact lens. The laser beam (1) from a laser source (not shown) is directed to a scanning airror (2) which in turn directs the beam to an aperture (3) having a 20 am diameter circular opening (4). The beam then proceeds through a focusing lens (5) to a target (6) which is fixed to a positioning means (7). The aperture (3) and the focusing lens (5) are aounted to a stage (8) having a connection (9) to a means (not shown) capable of oscillating the stage in a desired motion which aay be linear at predetermined and adjustable speeds. In either embodiment, as the laser is pulsed, the stage to which the aperture is attached is oscillated in either a linear or non-linear direction. This movement causes a shift in the position of the beam on the target surface leading to a shift of the diffraction groove pattern which would ordinarily begin forming on the target surface. Changing the relative position of the groove pattern formed by each pulse results in the formation of the groove pattern being minimized. It will be recognized by those skilled in the field that laser/target assemblies could be modified in aany ways to achieve the same results. When relative motion between the target and the aperture is required, either the aperture or the target aay be aoved in relation to one another to ainiaize the formation of the diffraction grooves. More than one component aay move. For example, both the target and the aperture may be moved in a predetermined way to minimize the formation and effect of diffraction grooves. When a focusing lens is present, the focusing lens may be aoved in concert with the aperture, or it aay be aoved independently and relative to the aperture to achieve the effect of ainiaizing formation of diffraction grooves. It is also contemplated that the beam may itself be scanned, or scanned through the use of various moving refractive or reflective optics arrangements relative to the target., as are known to the skilled practitioner in the field, while the aperture is oscillated. In a further embodiment, the aperture aay further be aoved non-1inearly relative to the target to accomplish the process of the present invention. For example, it is contemplated that the stage holding the aperture and, optionally, the focusing lens may be moved relative to the target in a repeating "S" shaped pattern. It is further contemplated that the target aay be aoved relative to the beam and/or aperture in many different patterns and shapes, all of which can effectively minimize the, formation of diffraction grooves. In a still further embodiment, the aperture and/or the target aay be aoved rotationally in relation to one another at an off-center position. In this way, the aperture would predictably move into and out of the path of the pulsed beam, thereby interfering with a number of pulses which would otherwise impact the target surface, shifting the diffraction groove pattern formed by each individual pulse. It is contemplated that the beam may remain stationary while the aperture oscillates or rotates off-axis. It is also contemplated that the beam may itself be scanned, or scanned through the use of various moving refractive or reflective optics arrangements, as are known to the skilled practitioner in the field, while the aperture is oscillated, or rotated off-axis. As stated previously, the oscillating or off-axis rotational movement occurs relative to the target and the aperture. Therefore, it is contemplated that one or aore of the target, the aperture, or the beam move (either as scanned or with the aid of refractive or reflective optics) , relative to one another. It is further contemplated that computer programming which is known to those skilled in the laser scanning field, be attached to the laser set-up as contemplated herein, so that the movement of the aperture and/or the target surface is synchronized in a predetermined way with the pulsing of the laser beam. It is believed that the aperture must only be aoved relative to the target very small distances of from about 1 to about 250 micrometers, preferably from about 50 to about 150 micrometers, and more preferably about 100 aicroaeters, to interrupt and therefore ainiaize the foraation of diffraction grooves. The following definitions and relationships are set forth to enhance the understanding of the invention. The aperture also can be broadly thought of as the element which gives rise to groove formation, caused by diffraction, on the target surface. v aperture is defined to be the uniform linear velocity of the aperture. D is defined to be the distance between the first peak and the first trough on the groove pattern produced by a single pulse. This can be calculated using diffraction theory or aeasured directly. Atarge iE defined to be the maximum range (or amplitude) over which the diffraction pattern on the target is shifted laterally. This quantity is chosen to be greater than or equal to D, defined above. •^aperture is defined to be the maximum range (or amplitude) over which the aperture is translated laterally and in practice its value is calculated from the value of ^t rget as described below: ^aperture " ^target if there are not any optical elements between the aperture and the target; λaperture β ^target if there are optical elements between the aperture and the target and these optical elements move with the aperture; If there are optical elements located between the aperture and the target and such optical elements do not move in concert with the aperture, A^arget * ε nσt necessarily equal to Aa erture- Accordingly, A aperture aust be scaled by a significant factor, c , which is determined by the optical system con iguration between the aperture and the lens., such that ^target " ^ A aperture- ( ) A full oscillation is defined as the occurenee of moving the aperture from one end of its tra el to the other end of its travel and then back to its starting position. The total distance the aperture moves during an oscillation is thus equal to -SAa er ure- A half oscillation is defined as the occurence of moving the aperture from one end of its travel to the other end of its travel. The total distance the aperture moves during a half oscillation is this egua] to λ a perture- Therefore, from a theoretical perspective, the purpose of the invention is to uniformly distribute individual groove patterns, arising from each pulse, across a distance, A rget' on a target. Atarget should be chosen to be greater than or equal to D. For the case of a half oscillation, an expression as follows can be written for the physical offset between individual groove patterns on the target: dtarget β Ataroet - ( 2. ) where N is the total number of pulses delivered toward the target surface. This expression can be written in terms of the laser pulse rate and the uniform velocity of the oscillating aperture, V aperture as dtarget e *>∑aperture ( 3 ) where R is the laser pulse rate. By combining the above equations: v aperture " B&tarσet <* ) This equation allows one to calculate the speed required to provide a uniform distribution of groove patterns on the target for the case of a half oscillation. Similar expressions can be derived for the case of multiple oscillations as would be known by those skilled in the field. In some applications, particularly when using large numbers of pulses, precise placement of each groove pattern is not required as shown in the example below. For such cases, the velocity of the aperture can be set at higher rate than that calculated using equation (4) so that the aperture oscillates multiple .times while the required number of pulses are delivered to the target independently of the aperture position. It is understood that aany different setups coaprising the aperture, the target, additional optical elements and different types of lasers can be arranged to achieve the desired result of minimizing the formation of diffraction grooves. It is therefore contemplated that the present invention can work to ainiaize the e fect of diffraction grooves caused when a continuous wave laser, as opposed to a pulsed laser, is used. It is further understood that the aperture may itself be able to change its radius automatically in relation to the beam in such a way that diffraction grooves are minimized without having to actually move or oscillate the aperture in the path of the beam. The present invention is not limited to direct material removal processes such as photoablation. For example, it is thought that the present invention would be particularly useful in photographic systems, electronic imaging systems or as part of a photochemical removal process in which the target is exposed to radiation and subsequently developed in solution. It is further contemplated that within the scope of the present invention, methods to minimize diffraction grooves could be conceived which use more than one aperture. The aperture may be used for imaging and may be, for example, a small rectangular aperture. The aperture may also be used in a non-imaging system, and therefore may be a system having a 20mm circular aperture. Further, the aperture may be a "contact mask", in close association with the surface of the target. It is further understood that uniform relative velocity of any of the optical elements or the beam as scanned is not necessary. Further, intensity, energy and fluence of the beam at the target surface may be varied during processing. The following examples describe protocols which can be used to determine the parameters for properly impeding the creation of diffraction grooves and serve only to further illustrate aspects of the present invention and should therefore not be construed as limiting the invention. EXAMPLE A pulsed beam of ultra violet radiation was directed through an aperture set-up at a dummy target substrate (a hydrophilic contact lens polymer in its nonhydrated state) as shown in Figure 1 until a diffraction groove pattern became visible. The groove pattern was actually measured using an interferometric surface profiler (Wyko Corp., Tuscon, AZ.), although the predicted pattern could have been calculated theoretically using standard diffraction analysis techniques. The distance between the first peak and trough was found to be approximately 40 micrometers. This value determined the proper oscillation amplitude and oscillation velocity to be set to overcome the formation of the diffraction grooves. Therefore, for the snail rectangular aperture example as shown in Figure 1: D ■ 40 micrometers Atarget * 10 ° micrometers R - 3.3 Hz Λ« 1 N m 60 Substituting these values into equation (4) , v aperture " 5.5 micrometers/sec. This aeans that the aperture aust aove at a minimum speed of 5.5 micrometers/sec to minimize the diffraction groove pattern at the target surface. In this example, the actual velocity chosen was 33 micrometers/sec. The target surface showed no visible diffraction grooves in the linear direction in which the aperture was moved. Many other modifications and variations of the present invention are possible to the skilled practitioner in the field in light of the teachings herein. It is therefore understood that, within the scope of the claims, the present invention can be practiced other than as herein specifically described.

Claims: I Claim: 1. A method for aodifying a target surface using a laser comprising directing a laser beam through an aperture to a target substrate while shifting the beam position at the target by a distance such that the formation of diffraction grooves is minimized. 2. The aethod of Claim 1 wherein said beam is moved relative to said target substrate such that the formation of diffraction grooves is minimized. 3. A method of Claim 1 wherein said beam is moved relative to said aperture such that the formation of diffraction grooves is minimized. 4. The method of Claim 1 wherein said aperture is aoved relative to said target substrate. 5. The aethod of Claim 1 wherein said beam is further directed through a focusing lens placed between said aperture and said target surface. 6. The aethod of Claim 1 wherein said aperture is aoved relative to said target substrate in a predetermined motion at a predetermined velocity. 7. The aethod of Claim 6 wherein said predetermined motion is an oscillating aotion. 8. The aethod of Claim 6 wherein said predetermined motion is an off-axis rotational motion. 9. The aethod of Claia 1 wherein said aperture is circular. 10. The aethod of Claim 1 wherein said beam is pulsed. 11. The aethod of Claim 1 wherein said beam is scanned. 12. The aethod of Claia 1 wherein said beam remains stationary relative to said aperture. 13. The aethod of Claim 1 wherein said target substrate is a cornea. 14. The aethod of Claim 6 wherein said target substrate is a contact lens. 15. A target surface aodified by a laser system comprising directing a beam of laser radiation through an aperture to a target substrate, and moving the aperture relative to the substrate in a predetermined motion at a predetermined velocity such that the diffraction effect imparted to the surface of said target surface is minimized. 16. The aethod of Claim 15 wherein said predetermined aotion is an oscillating aotion. 17. The aethod of Claia 15 wherein said predetermined aotion is an off-axis rotational aotion. 18. The target surface of Claim 15 wherein said target surface is a contact lens. 19. The target surface of Claim 15 wherein said target surface is a cornea.

Inventors: MCINTYRE KEVIN J, SHANNON JOHN H, MCINTYRE, KEVIN, J., SHANNON, JOHN, H.
Applicants: BAUSCH & LOMB, BAUSCH & LOMB INCORPORATED
Application year: 1994
Main classification: B23K26
IPC codes: A61F9, B23K26, G02C7