A semiconductor light detecting device

Abstract: A light detecting device of the present invention comprises a third semiconductor layer (6) containing a second conductive impurity which is formed in the upper part of a semiconductor layer (2 and 3) containing a first conductive impurity and a fourth semiconductor layer (7) containing the second conductive impurity which is formed in the semiconductor layer (2 and 3) around the third semiconductor layer (6) with an interval between the layers (6) and (7).

Description: The present invention relates to a semiconductor light detecting device, and specifically to a semiconductor light detecting device for monitoring a laser output of a semiconductor laser which is mounted on a module having the semiconductor laser on it. A semiconductor laser varies in its optical output under the influence of heat generation of the device itself, the ambient temperature around it, and the like even if its driving current is kept constant. As a method for keeping the output of a semiconductor laser constant, it is known to control a driving current of the semiconductor laser through an automatic power control (APC) circuit so that the output current of a light detecting device may be kept constant which is disposed behind the semiconductor laser as a monitoring light detecting device and is irradiated with the light outputted from the rear part of the semiconductor laser. The method of keeping the output of a semiconductor laser constant in such a manner as this is described in Japanese First Publication Tokkaihei 5-29712, for example. The APC circuit, for example, is made to monitor the output of the semiconductor laser by measuring the average output current of the light detecting device in a given time period and feed it back into the laser diode driving circuit. A PIN photodiode as shown in Figures 1A and 1B, for example, is used as the light detecting device for monitoring. Figure 1A is a plan view of the photodiode and Figure 1B is a cross-sectional view of it. In the Figures, an n - -type InGaAs layer 102 and an n - -type InP layer 103 are formed on an n + -type InP substrate 101 in that order, and a p + -type diffusion layer 104 which acts as an active area is formed in the n - -type InP layer 103. The n - -type InP layer 103 is covered with a passivation film 105 of silicon nitride, and an opening 106 is formed in the passivation film 105 on the circumference part of the p + -type diffusion layer 104, and a p-electrode 107 formed on the passivation layer 105 is connected with the p + -type diffusion layer 104 through the opening 106. An n-electrode 108 is formed under the n + -type InP substrate 101. Light outputted from the rear part of the semiconductor laser is irradiated almost all over the face of the light detecting device for monitoring which is shown in Figures 1A and 1B. Electrons and holes are generated inside the light detecting device by irradiation of light. The electrons are moved to an n-type domain (the n + -type InP substrate 101) through an electric field generated by a diffusion potential of the pn junction, while the holes flow into a p type domain (the p + -type impurity diffusion layer 104). Electrons and holes generated in a region distant from the depletion layer which exists in the vicinity of the interface between the p + -type diffusion layer 104 and both of the n - -type InGaAs layer 102 and the n - -type InP layer 103 reach the depletion layers through diffusion, but it takes an extra time for these electrons and holes to reach there, so they become slow components in respect of the response speed. Since the slow components can scarcely respond to high frequency input though they can respond to low frequency input, the response of the light detecting device falls in a range of high frequency. As a result the frequency vs. response characteristic deviates from the preferable curve B of flatness shown in Figure 2 to show the curve A. When the frequency vs. response characteristic is not flat, even if an optical pulse signal of rectangular waveform shown in Figure 3A is inputted into the light detecting device, its output waveform becomes distorted as shown in Figure 3B. Therefore, since it is impossible to faithfully monitor the output of the semiconductor laser, it is difficult to control the semiconductor laser in real time. If the distance L from the side face of the light detecting device to its active area (p + -type diffusion laser 104) is made short in order to decrease the number of slow-response carriers to be generated, electrons and holes generated in the outside of a depletion layer can reach the depletion layer in a shorter time, and as a result the response of the device can be made faster, so flatness of the frequency vs. response characteristic is improved. There is a problem, however, that dark current is increased if the distance L between the active area and the side face of the light detecting device is shortened. A result of measurement of the dark current characteristic by the inventors is described later. JP-A-63 122 180 discloses a light detecting device of the same general type as the present invention, in which a "second semiconductor region" referred to below is provided by a semi-insulating InP buried layer for reducing parasitic capacitance. EP-A-0 473 198 discloses a light detecting device according to the preamble of accompanying claim 1. In this device, the "second semiconductor region" is made by selective diffusion of zinc (sealed ampoule method) without a groove or trench, such that this region does not reach the first semiconductor layer. An object of the present invention is to provide a light detecting device for monitoring which is better in frequency vs. response characteristic and exhibits less dark current. According to the present invention, there is provided a light detecting device comprising: a first semiconductor layer containing a first conductive type impurity; a second semiconductor layer formed on said first semiconductor layer, said second semiconductor layer containing the first conductive type impurity with a density lower than that of said first semiconductor layer; a first semiconductor region formed by introducing a second conductive type impurity into said second semiconductor layer to define an active region(s) within said second semiconductor layer (2,3) ; and a second semiconductor region containing the second conductive type impurity formed in at least said second semiconductor layer, said second semiconductor region being apart from said active region to form a pn junction therebetween; characterised in that: a recess formed in said second semiconductor layer surrounds said active region, said recess having a depth reaching to said first semiconductor layer, and in that: said second semiconductor region has been formed by introducing the second conductive type impurity into said first and second semiconductor layers through the surface of said recess. When the second semiconductor layer of the light detecting device is irradiated with light, pairs of electrons and holes are formed in the second semiconductor layer, and they are moved by a diffusion potential and a reverse bias voltage. Electrons or holes generated in the outside of the depletion layer around the first semiconductor region reach the first semiconductor region at a slow speed, but in the case that the semiconductor layer outside the first semiconductor region is small in area, the number of carriers is small, so the frequency vs. response characteristic of output of the light detecting device becomes flat. The light detecting device of the present invention remarkably reduces the dark current in comparison with a light detecting device having no second semiconductor region as defined above. The reason for this is as follows. There are many nuclei of generation and recombination on the end face of a compound semiconductor layer of a light detecting device. Since carriers generated here flow into the depletion layer of pn junction through a channel formed in a hetero interface of the semiconductor layer, dark current is generated. When a barrier consisting of a pn junction is formed in the middle of the channel as in this invention, it is difficult for the carriers to move to the depletion layer because of obstruction of the channel and thus the dark current is reduced. The longer the distance for the carriers to diffuse is, the slower the response of the output current is. Therefore, the shorter the distance between the first semiconductor region and second semiconductor region is, the better the response is. The smaller a ratio of the number of carriers generated outside the depletion layer to the number of carriers generated in the depletion layer around the first semiconductor region is, the more the response in high frequency is improved. Carriers generated outside the depletion layer are reduced by making thinner the semiconductor layer in the outside of the first semiconductor region (active region). Reflectivity of the surface of the semiconductor layer in the outside of the first semiconductor region is improved by controlling the thickness of the protection film on the surface of the active region. Thus, carriers generated outside the depletion layer are reduced. Reference is made, by way of example, to the accompanying drawings in which: Figure 1A is a cross-sectional view of a light detecting device according to the prior art, and Figure 1B is a plan view of it. Figure 2 is a characteristic graph showing a characteristic curve of a frequency vs. response characteristic in the prior art, and an ideal characteristic curve. Figure 3A is a figure of a pulse-shaped waveform of incident light upon the light detecting device, and Figure 3B is a waveform figure of the output signal of the light detecting device of the prior art. Figures 4A to 4D are cross-sectional views showing a manufacturing process of a light detecting device of a first embodiment of the present invention. Figure 5 is a plan view showing the light detecting device of the first embodiment of the present invention. Figure 6 is a characteristic graph showing the relationship between dark current and reverse bias voltage in the light detecting device of the first embodiment of the present invention. Figure 7 is a characteristic graph showing the relationship between dark current and reverse bias voltage in the light detecting device of the prior art. Figure 8 is a characteristic graph showing the relationship between the dark current Id and distance L from the light receiving domain of the light detecting device of the prior art to its end face. Figure 9 is a graph showing a frequency vs. response characteristic of the light detecting device of the first embodiment of the present invention. Figure 10 is a graph showing a frequency vs. response characteristic of the light detecting device of the prior art. Figure 11A is a cross-sectional view showing a layer structure of a light detecting device of a second embodiment of the present invention, and Figure 11B is a cross-sectional view showing the light detecting device of the second embodiment of the present invention. Figure 12 is a cross-sectional view showing a light detecting device which is useful for understanding the present invention, but not in accordance with the same. A manufacturing process of a light detecting device (PIN photodiode) in a first embodiment of the present invention is described on the basis of Figures 4A to 4D. First, as shown in Figure 4A, an n - -type InGaAs layer 2 of 2.5 µ m in thickness and an n - -type InP layer 3 of 1.5 µ m in thickness are formed one after another on an n + -type InP substrate 1 by using metal organic chemical vapor deposition (MOCVD). The InP substrate 1 contains an n-type impurity of density larger than that of the InGaAs layer 2, and the InGaAs layer 2 and InP layer 3 respectively contain n-type impurities of 2 x 10 15 /cm 3 in density. Silicon, selenium, tin, and the like can be used as the n-type impurity. The energy band gap of the InGaAs layer 2 is smaller than that of the InP layer 3. Next, after the first silicon nitride film 4 is formed up to about 200 µ m in thickness by using CVD, a first opening 4a is formed in a part surrounding a device forming domain, by patterning the first silicon nitride film 4 by means of a photolithography method. The first opening 4a has a ring-shape of about 40 µ m in pattern width in a plan view. Then as shown in Figure 4B, a trench 5 is formed by almost vertically etching the layers under the first opening 4a from the InP layer 3 to the obverse surface layer of the InP substrate 1. The device forming domain surrounded by the trench 5 is nearly in a shape of a rectangle of 290 x 290 µ m 2 . After this, a second opening 4b is formed in an active area S by patterning again the first silicon nitride film 4 by means of the photolithography method. The second opening 4b is formed in a size nearly equal to the area of a circle of 300 µ m in diameter, for example, in a shape of a rectangle of about 270 x 270 µ m 2 . Next, as shown in Figure 4C, by making thermal diffusion of a p type impurity through the first and second openings 4a and 4b, the n - -type InP layer 3 and the obverse surface layer of the n - -type InGaAs layer 2 which are in the active area S are changed into p type to be turned into a p + -type InP layer (a first p + -type impurity doped semiconductor region) 6, and at the same time the n - -type InP layer 3, n - -type InGaAs layer 2 and n + -type InP layer 1 which are in a range of about 10 µ m in depth from the inside wall of the trench 5 are changed into p type to be turned into a p + -type diffusion layer (a second p + -type impurity doped semiconductor region) 7. The impurity density of the p + -type InP region 6 and the p + -type diffusion region 7 is 2 x 10 18 to 3 x 10 18 /cm 3 . Zinc, cadmium, beryllium, and the like can be used as the p type impurity. Then as shown in Figure 4D, a second silicon nitride film 8 is formed on the upper surfaces of the n - type InP layer 3 and p + -type InP region 6 and on the inside surface of the trench 5 by means of CVD. The silicon nitride film acts as an antireflection film 9 in the active area S by being formed up to a thickness of 1/4 of wavelength λ. Next, a third opening 8a being ring-shaped in a plan view is formed in the vicinity of the circumference part of the active area S by patterning the second silicon nitride film 8 by means of photolithography, and thus the p + -type InP region 6 is exposed through the third opening 8a. Then a titanium film, platinum film, and gold film are-formed one after another on the second silicon nitride film 8 and in the third opening 8a by means of a sputtering method. A p-electrode 10 is led from the inside of the third opening 8a by patterning these metal films. Such a method as photolithography, lift-off, or the like is used as the patterning method. Furthermore, a gold film and germanium film are formed one by one on the under surface of the n + -type InP substrate 1 to make an n-electrode 11. After this, a light detecting device is completed by dicing the InP substrate 1 and each semiconductor layer on it along the centre line of trench 5 as indicated in Figure 4D, leaving behind a recess in each light detecting device. A plan view of it is shown in Figure 5. In the light detecting device as mentioned above, when a reverse bias voltage V R is applied between the p-electrode 10 and n-electrode 11 and furthermore the antireflection film 9 is irradiated with light from the outside, pairs of electrons and holes are generated mainly in the n - -type InGaAs layer 2. At this time the electrons are moved to the n-electrode 11 through the n + -type InP substrate 1 by the diffusion potential and electric field, while the holes are moved to the p-electrode 10 through the p + -type InP region 6, and in this way electric current passes. In the n - -type InGaAs layer 2 and n - -type InP layer 3 which are around the depletion layer outside the p + -type InP region 6, pairs of electrons and holes are generated by irradiation of light passing through the p + -type InP region 6 and the p + -type diffusion region 7 and light passing through the first and second silicon nitride films 4 and 8. These electrons and holes are moved to the p + -type InP layer 6 and the n + -type InP substrate 1 with some delay. When the relationship between the reverse bias voltage and the dark current was investigated by setting the distance L 0 from the side face of the p + -type InP region 6 to the side face of the light detecting device as 20 µ m, a characteristic curve as shown in Figure 6 was obtained. Since a range of the reverse bias voltage is usually from 0 to 10 volt, the dark current in this range is as minute as 1 nA or less. On the other hand, in a light detecting device of the prior art as shown in Figures 1A and 1B in which a p + -type diffusion layer is not provided around the light detecting device, the distance L from the side face of the p + -type InP layer 104 to the side face of the light detecting device needs to be lengthened up to 100 µ m in order to obtain a dark current characteristic nearly equivalent to the characteristic in Figure 6, as shown in Figure 7. Furthermore, when the relationship between the dark current and the distance L was investigated by setting the reverse bias voltage of the light detecting device shown in Figures 1A and 1B as 10 volt, a result as shown in Figure 8 was obtained, showing that the dark current cannot be kept small enough if the distance L is not set as 100 µ m or more. When the distance L is set as 100 µ m or more, there is a problem that the slow-response component is increased because of increase of diffusion length of the carriers generated outside the depletion layer. Then, when a frequency vs. response characteristic of the light detecting device of this embodiment was investigated by setting the distance L 0 from the side face of the p + -type InP region 6 to the side face of the light detecting device as 20 µ m, a response drop ΔR at 10 Mhz was 0.2 dB or less, and thus a characteristic of good flatness was obtained as shown in Figure 9. On the other hand, it was found that in the light detecting device shown in Figures 1A and 1B, when the distance L between the active area and the side face of the light detecting device is 200 µ m, its characteristic curve is poor in flatness as shown by the curve A, and when the distance L is set as 20 µ m, the curve is good in flatness. These matters are easily understood from a fact that the response is influenced by the time for electrons and holes generated outside the depletion layer to reach the active area S. Thus, it is known that the response characteristic is kept good by making the distance L short even if a p + -type diffusion layer is not formed in the fringe of the light detecting device, but in this case a problem appears that the dark current cannot be reduced, as mentioned above. From the above-mentioned findings, it is determined that in the light detecting device of the embodiment, the dark current does not become greater in comparison with the prior art even if the distance L 0 from the end part of the p + -type InP region 6 to the side face of the device is shortened. According to the embodiment, the rise time and fall time of the device output current in responding to an incident light of pulse-shaped waveform as shown in Figure 3A are shortened and the output current waveform is very little deteriorated. The reason why the dark current is reduced is considered in the following. There are many nuclei of generation and recombination in the compound semiconductor layer of the end face of the light detecting device and since carriers generated in that layer flow into the depletion layer through the channel formed in the hetero interface between the InP layer 3 and the InGaAs layer 2, the dark current is generated. As shown in Figure 4D, a barrier consisting of a pn junction is formed on the end face of the light detecting device when the p + -type diffusion region 7 is formed near the end face of the light detecting device, and this barrier obstructs the channel formed in the hereto interface to prevent the dark current from flowing into the depletion layer. As a result, it is possible to keep the dark current low as well as to make flat the frequency vs. response characteristic by shortening the distance L 0 between the active area S and the end face of the light detecting device. Then, conditions for improving the frequency vs. response characteristic vary with the area of the light receiving face of the active area S. The conditions are satisfied by making the area of the domain (secondary light receiving domain) between the p-electrode 10 and the p + -type diffusion region 7 equal to or less than 1/10 of the area of the light receiving domain surrounded by the p-electrode 10. By taking into consideration that carriers generated in the domain between the p + -type InP region 6 and the p + -type diffusion region 7 diffuse to both of the p + -type InP region 6 and the p + -type diffusion region 7, it is sufficient if the area of the domain (effective secondary light receiving domain) between the outer circumference of the p-electrode 10 and the ring-shaped virtual line passing in the middle of the belt between the outer circumference of the p-electrode 10 and the inner circumference of the p + -type diffusion region 7 is equal to or less than 1/10 of the area of the light receiving domain surrounded by the p-electrode 10. The longer the distance for the carriers to diffuse is, the slower the response of the output current is. Therefore, the shorter the distance L 1 between the first and second impurity diffusion regions 6 and 7 is, the better the response is. The smaller the ratio of the number of carriers generated outside the depletion layer to the number of carriers generated in the depletion layer around the first impurity diffusion region 6 is, the more the high frequency response is improved. In case of designing the device so that the greatest value of monitor current cannot exceed a certain limit, it is expected that the area of the light receiving face is restricted to some degree. Therefore, the concentration of the carriers which cause a response delay of the output current can be reduced by making small the ratio of the area of the secondary light receiving domain or the effective secondary light receiving domain to the area of the light receiving face of the active area S. Figure 11B is a cross-sectional view of a light detecting device of a second embodiment of the present invention. In Figure 11B, the same symbols as Figure 4D show the same elements as Figure 4D. This light detecting device is the same as the first embodiment except that the n - -type InGaAs layer 2 is thinner in an area outside the p + -type InP region 6. In order to partially thin the n - -type InGaAs layer 2, for example, a convex part 12 surrounding the active area S is formed on the main surface of the n + -type InP substrate 1, as shown in Figure 11A. The convex part 12 can be easily formed by making the InP substrate 1 selectively thin by means of masks and etching technology. In this manner, when the n - -type InGaAs layer 2 is formed on the InP substrate 1 having the convex part 12 so as to be 2.5 µ m thick in the active area S, the upper surface of the n - -type InGaAs layer 2 becomes flat. A light detecting device shown in Figure 11B can be obtained by forming the n - -type InP layer 3 in the same way as the first embodiment and forming a trench 5 and diffusing impurities and forming an antireflection film 9 and then forming electrodes 10 and 11 in the same way as the first embodiment. In such a light detecting device, since the n - -type InGaAs layer 2, where pairs of electrons and holes are liable to be generated by irradiation of light, is made thin in the outside of the active area S, the number of carriers generated in the outside of the depletion layer is decreased. Thus, since the number of carriers generated inside the depletion layer is relatively increased, it is hard for the response characteristic to be deteriorated in a range of high frequency. Figure 12 is a cross-sectional view of a light detecting device which is not in accordance with the invention but useful for understanding the same, and the same symbols as Figure 4D show the same elements as Figure 4D. The light detecting device shown in Figure 12 is made different from the light detecting device shown in Figure 4D by having a p + -type diffusion layer 15 formed around the end face of the light detecting device without having a recess 5 formed around the active area S. The reason why the trench 5 is formed in the light detecting device shown in the first embodiment is that it is desired to make the p + -type diffusion region 7 deeper than the p + -type InP region 6 in the active area S. Namely, forming deeply the p + -type diffusion region 7 after forming the trench 5 makes smaller the number of carriers generated in the n'-type InGaAs layer 2 around the depletion layer. In the above-mentioned embodiments, an InP substrate is used, on which an InGaAs layer and an InP layer are formed, but the materials to be used are not particularly limited to them. For example, also in the case that a photodiode made by forming an InGaAsP layer on an InP substrate or a photodiode using GaAs or the like is used, since the dark current can be decreased by diffusing an impurity of conductive type which is opposite to the substrate in polarity toward the outside of the photodiode, a light detecting device can be made small in size. And in the above-mentioned embodiments, by setting the thickness of the first silicon nitride film around the active area S as 1/4 of the wavelength λ of the light passing through it and setting the total thickness of the first and second silicon nitride films 4 and 8 as 1/2 of the λ, these films may be made to act as reflection films. According to this method, an amount of light incident on the semiconductor layer outside the depletion layer is decreased and generation of electrons and holes in that area is suppressed, and as a result the frequency vs. response characteristic is improved. In the above-mentioned embodiments, the first and the second P + -type impurity doped region 6 and 7 are formed by thermal diffusion of impurity into a non-doped layer, but they may be formed by ion implantation. Further, they may be formed by growing a doped layer.

Claims: A light detecting device comprising: a first semiconductor layer (1) containing a first conductive type impurity; a second semiconductor layer (2,3) formed on said first semiconductor layer, said second semiconductor layer (2,3) containing the first conductive type impurity with a density lower than that of said first semiconductor layer (1); a first semiconductor region (6) formed by introducing a second conductive type impurity into said second semiconductor layer (2,3) to define an active region(S) within said second semiconductor layer (2,3); and a second semiconductor region (7) containing the second conductive type impurity formed in at least said second semiconductor layer (2,3), said second semiconductor region (7) being apart from said active region (S) to form a pn junction therebetween; characterised in that : a recess (5) formed in said second semiconductor layer (2,3) surrounds said active region (S), said recess (5) having a depth reaching to said first semiconductor layer (1), and in that: said second semiconductor region (7) has been formed by introducing the second conductive type impurity into said first and second semiconductor layers (1,2,3) through the surface of said recess (5). A light detecting device as defined in claim 1, wherein said second semiconductor layer (2,3) is composed of two compound semiconductor layers joined with each other through a heterojunction. A light detecting device as defined in claim 1 or 2, wherein a surface area of said active region (S) is 10 or more times as large as the area of said second semiconductor layer (2,3) between said active region (S) and said second semiconductor region (7). A light detecting device as defined in claim 1, 2, or 3, wherein an electrode (10) is formed on said first semiconductor region (6) and along a periphery of said active region (S). A light detecting device as defined in claim 4, wherein an area of said first semiconductor region (6) surrounded by said electrode (10) is 10 or more times as large as an area of a region between an outer circumference of said electrode (10) and a ring-shaped virtual line passing in the middle of a belt between the outer circumference of said electrode (10) and an inner circumference of said second semiconductor layer (2,3). A light detecting device as defined in any preceding claim, wherein a part of the second semiconductor layer (2,3) under said active region (S) has a larger depth than that of a remaining part of said second semiconductor layer (2,3). A light detecting device as defined in any preceding claim, wherein a light-transmitting protection film (9) which is 1/4 of a wavelength of incident light in thickness is formed on the surface of said first semiconductor region (6). A light detecting device as defined in claim 7, wherein a light-reflecting protection film (4,8) which is 1/2 of a wavelength of incident light in thickness is formed on a surface of said second semiconductor layer (2,3) outside said first semiconductor region (6). A light detecting device as defined in any preceding claim, wherein said first semiconductor layer (1) is composed of an indium phosphide layer and said second semiconductor layer (2,3) is composed of an indium gallium arsenide layer and an indium phosphide layer which are formed on said first semiconductor layer (1).

Inventors: KOBAYASHI MASAHIRO, KOBAYASHI, MASAHIRO, KOBAYASHI, MASAHIRO, FUJITSU LIMITED
Applicants: FUJITSU LTD, FUJITSU LIMITED
Application year: 1994
Main classification: H01L31
IPC codes: H01L31