Illumination device for projection exposure apparatus

Abstract: An illumination device (1-14), includes a secondary light source forming system (101) having a deflecting member (6) with a conical light deflecting surface for transforming received light into substantially ring-like light, the secondary light source forming system forming a ring-like secondary light source by using the ring-like light; and an optical system (13,14) for projecting divergent lights from portions of the secondary light source obliquely onto a surface (15) to be illuminated so that the projected lights are superposed one upon another on the surface.

Description: This invention relates to an illumination device and a projection exposure apparatus.using the same. More particularly, the invention is concerned with an illumination device usable in a microdevice manufacturing exposure apparatus (called a stepper) for illuminating a pattern formed on a reticle in a manner easily attaining high resolution. In another aspect, the invention is concerned with a projection exposure apparatus using such an illumination device. Semiconductor device manufacturing technology has recently been advanced significantly and, along with this, the fine processing technique has been improved considerably. Particularly, the optical processing technique has pressed the fine processing into a submicron region, with manufacture of a device of 1-megabit DRAM. A Conventionally adopted method for improving the resolution is to enlarge the numerical aperture (NA) of an optical system while fixing an exposure wavelength. Recently, however, it has been proposed and practiced to use an exposure wavelength of i-line in place of g-line, in an attempt to improve the resolution in accordance with an exposure method using an ultra-high pressure Hg lamp. Along the advancement of using g-line or i-line as the exposure wavelength, the resist process itself has been advanced. Such improvements in the optical system and in the process together have accomplished rapid advancement of optical lithography. Generally it is known that the depth of focus of a stepper is in inverse proportion to the square of the NA. Thus, enhancing the resolution into a submicron order necessarily results in a problem of decreased depth of focus. In consideration of this problem, many proposals have been made to use shorter wavelengths, as represented by an excimer laser, for enhancement of the resolution, since it is known that the shorter the wavelength is, the deeper is the depth of focus. In their article entitled "photolithography system using annular illumination" published in the Japanese Journal of Applied Physics of November 1991, Vol 30, No. llB, Part 1 pages 3021 to 3029, Kaman et al investigate the improved resolution and depth of focus attainable with illumination light that is annular in pattern. Annular light patterns are achieved in the article by placing a stop having an annular aperture with a central circular blocking region adjacent the light exit surface of the integrator. Light exits the integrators, but can only pass through the annular portion of the stop. A proportion of the light is blocked, leading to reduced illumination levels on the final substrate. The present invention improves the efficiency of annular illumination devices by directing a greater proportion of the light from the source into the required annular region when high resolution is required. EP-A-0507487, an earlier European patent application which was published after the priority date of the present patent, describes an illumination system wherein an annular bundle of rays is passed through a conical lens 77 to increase the radius of the annular bundle. Annular lenses then concentrate the ray bundle to form a high-intensity annular ray of large radius and small radial thickness. The annular ray is used as a light source to illuminate a mask for projection at high resolution. Practical semiconductor device manufacturing processes include on one hand a process wherein high resolution of a pattern is required and, on the other hand, a process wherein a not so high resolution of a pattern is required. Thus, the present invention aims to provide a projection exposure apparatus which can meet the requirement of various resolution performances to be satisfied in various processes. In a first aspect, the present invention provides an illumination system wherein light from a primary light source is projected to an optical integrator whereby a secondary light source is formed, and wherein lights from the secondary light source are projected to a surface, to be illuminated, by an optical system whereby they are superposed one upon another, characterized in that: a deflecting member having a conical light deflection surface is demountably disposed between the primary light source and the optical integrator, the deflecting member serving to transform the light from the deflecting member serving to transform the light from the primary light source into an annular light pattern which is projected to the optical integrator to form an annular secondary light source when the deflecting member is present. In another aspect, the invention provides a method of manufacturing microdevices such as semiconductor memories, liquid crystal panels, magnetic heads or CCDs, for example, using an illumination device such as above. In a further aspect, the invention provides an exposure apparatus for manufacture of microdevices that uses an illumination device such as above. The deflecting member usable in the present invention may be of the type that it refracts light at its light deflecting surface to shape or divide the light, or that it reflects the light at its deflecting surface to shape or divide the light. These and other aspects, features and advantages of the present invention will become more apparent upon a consideration of the following description of exemplary embodiments of the present invention taken in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view of a main portion of a first embodiment of the present invention. Figures 2A, 2B and 2C are schematic views, respectively, for explaining a portion of Figure 1. Figures 3A, 3B and 3C are schematic views, respectively, for explaining a portion of Figure 1. Figure 4 is a schematic view for explaining the optical function of a lens system 9 of Figure 1. Figure 5 is a schematic view for further explaining the optical function of the lens system 9 of Figure 1. Figure 6 is a schematic view for further explaining the optical function of the lens system 9 of Figure 1. Figure 7 is a schematic view of a portion of a second embodiment of the present invention. Figures 8, 9 and 10 are schematic views, respectively, each for explaining a portion of a third embodiment of the present invention. Figures 11A and 11B are schematic views, respectively, each for explaining the optical function of the third embodiment. Figures 12A and 12B are schematic views, respectively, each for further explaining the optical function of the third embodiment. Figures 13A and 13B are graphs, respectively, each showing an example of light intensity distribution in the third embodiment of the present invention. Figures 14A and 14B are graphs, respectively, each showing a further example of light intensity distribution in the third embodiment of the present invention. Figures 15A - 15C are schematic views, respectively, each showing a main portion of a fourth embodiment of the present invention. Figure 16 is a schematic view of a main portion of a fifth embodiment of the present invention. Figure 17 is a schematic view of a main portion of a sixth embodiment of the present invention. Figure 18 is a schematic view for explaining a portion of Figure 17. Figure 19 is a schematic view for further explaining a portion of Figure 17. Figures 20A - 20C are schematic views, respectively, each for explaining the state of incidence of light upon a light entrance plane 10a of an optical integrator 10 of Figure 17. Figure 21 is a schematic view of an apertured stop. Figure 22 is a schematic view of a main portion of a seventh embodiment of the present invention. DESCRIPTION OF THE EXEMPLARY EMBODIMENTS Figure 1 is a schematic view of an illumination device and a projection exposure apparatus using the same, according to an embodiment of the present invention. In this embodiment, the invention is applied to a reduction projection type exposure apparatus, called a stepper. This exposure apparatus can be used for manufacture of microdevices such as semiconductor memories, CCDs, liquid crystal panels or magnetic head, for example. Denoted in the drawing at 1 is a light source such as a high luminance ultra high pressure Hg lamp, for example, for emitting ultraviolet light or deep UV light. The light source 1 has its light emitting portion 1a disposed adjacent to the first focal point of an elliptical mirror 2. The light emanating from the light source 1 is reflected and collected by the elliptical mirror 2, and then it is reflected by a cold mirror 3 by which an image 1b of the light emitting portion 1a (an image of light source) is formed in the neighbourhood of the second focal point 4 of the elliptical mirror 2. The cold mirror 3 has a multilayered film and it mainly serves to transmit infrared light but to reflect ultraviolet light. Denoted at 101 is an imaging system having two lens systems 5 and 9. It serves to image the light source image 1b, formed in the neighbourhood of the second focal point 4, upon an entrance plane 10a of an optical integrator 10 through the cooperation of an optical device 8. The optical device 8 comprises a prism member 6 having a conical prism, for deflecting received light to a predetermined direction, and a parallel flat plate 7 for projecting received light directly. Denoted at 8a is a holding member by which the prism member 6 and the parallel plate 7 of the optical device 8 can be alternately and selectively placed on the light path. When the parallel plate 7 is on the path, the imaging system 101 is defined as an telecentric system on the exit side. The optical device 8 is disposed in the neighbourhood of the pupil plane of the imaging system, where the opening of the elliptical mirror is imaged. The optical integrator 10 comprises a plurality of small lenses which are arrayed two-dimensionally, and it serves to define a secondary light source 10c in the neighbourhood of the exit surface 10b thereof. Denoted at 11 is a stop member having a plurality of apertures. The stop member is provided with a mechanism by which the shape of aperture on the light path can be changed. To the secondary light source 10c, the stop member 11 is disposed in such region in which discrete secondary light source elements do not overlap. Denoted at 14a is a lens system for collecting the light from the exit surface 10b of the optical integrator 10 and for illuminating, through the stop member 11 and a mirror 13 as well as a collimator lens 14b, a reticle (surface to be illuminated) 15 placed on a reticle stage 16. The lens system 14a and the collimator lens 14b constitute a condensing lens system 14. Denoted at 17 is a projection optical system for projecting, in a reduced scale, a pattern formed on the reticle 15 upon the surface of a wafer 18 which is placed on a wafer chuck 19. Denoted at 20 is a water stage on which the wafer chuck 19 is mounted. In this embodiment, with the condensing lens system 14, an image of the secondary light source 10c formed in the neighbourhood of the exit surface 10b of the optical integrator 10, is formed in the neighbourhood of a pupil 17a of the projection optical system 17. Next, description will be made on the manner of changing the light intensity distribution of the image of the secondary light source, which image is formed at the pupil plane 17a of the projection optical system 17, in accordance with the present embodiment by changing the light intensity distribution at the light entrance surface 10a of the optical integrator 10 through the optical device 8. Figures 2A and 3A each illustrates the light path from the elliptical mirror 2 (Figure 1) to the optical integrator 10, the path being extended. The mirror 3 is not shown in Figure 2A or 3A. The illustrations of Figures 2A - 2C and 3A - 3C explain that the light intensity distribution upon the entrance surface 10a of the optical integrator 10 is changed by alternately selecting the elements 6 and 7 of the optical device 8. Figures 2A - 2C correspond to a case where the parallel plate 7 of the optical device 8 is disposed on the light path, whereas Figures 3A - 3C correspond to a case where the prism member 6 of the optical device 8 is disposed on the light path. The illumination system of Figure 2A is adapted for a first state of projection in which a very high resolution is not required but in which a larger depth of focus is assured. The illumination system of Figure 3A is adapted for a second state of projection in which a high resolution is required mainly. Figures 2C and 3C each is a schematic representation of light intensity distribution upon the light entrance surface 10a of the optical integrator 10. The zone depicted by hatching in the drawings denotes the region of higher light intensity, as compared with the remaining region. Figures 2B and 3B illustrate distribution of light intensity I along the X-axis direction (Figure 2C or 3C). In Figure 2A, the parallel plate 7 of the optical device 8 is disposed on the light path, and the light source image 1b as formed at the second focal point 4 of the elliptical mirror 2 is imaged by the imaging system 101 upon the light entrance surface 10a of the optical integrator 10. Here, as seen in Figure 2B, the light intensity distribution in section upon the light entrance surface 10a of the optical integrator 10 has an approximately Gaussian shape which is rotationally symmetric. In Figure 3A, the prism member 6 of the optical device 8 is placed on the light path, and the light source image (point image) 1b formed at the second focal point 4 of the elliptical mirror 2 is imaged, into a ring-like shape, on the light entrance surface 10a of the optical integrator 10 by the imaging system 101. The light intensity distribution on the light entrance surface 10a of the integrator 10 has a ring-like shape such as shown in Figures 3B or 3C wherein the light intensity is lower at the optical axis portion but is higher at the peripheral portion. Why this is so will now be explained below. Figure 4 schematically illustrates the disposition of the parallel flat plate 7, the lens system 9 and the light entrance surface 10a of the optical integrator 10 of Figure 2A. In this embodiment, these elements are so disposed that the optical distance between the parallel plate 7 and the forward principal point of the lens system 9 as well as the optical distance between the backward principal point of the lens system 9 and the light entrance surface 10a of the integrator 10 are, if the focal length of the lens system 9 is denoted by f 0 , both equal to a distance f 0 . Here, the incidence height t 1 , from the optical axis, of the light emanating from the parallel plate 7 with an angle α 0 and impinging on the light entrance surface 10a is expressed as follows: t 1 = f 0 ·tanα 0 If the height, from the optical axis, of the outermost light passing through the parallel plate 7 is denoted by S 0 , then the angle β of incidence upon the light entrance surface 10a of the integrator is given by: β = tan -1 (S 0 /f 0 ) It is seen therefrom that, by deflecting the angle of light at the position of the parallel plate 7 (i.e., forward focal plane of the lens system 9), it is possible to change only the position of incidence of light upon the entrance surface 10a of the optical integrator without changing the angle of incidence. Based on the optical principle described, in the present embodiment, by interchanging the parallel plate 7 by the prism member 6 comprising a conical prism, the light intensity distribution on the entrance surface 10a of the integrator 10 is changed into a ring-like intensity distribution having lower intensity at the optical axis portion and higher intensity at the peripheral portion. Since the light intensity distribution on the entrance surface 10a of the integrator 10 corresponds to the light intensity distribution of an effective light source which is defined at the pupil plane 17a of the projection optical system 17, by using the prism member 6 in place of the parallel plate 7 such an effective light source having light intensity distribution having lower intensity at a central portion (optical axis portion) and higher intensity at a peripheral portion is defined on the pupil plane of the projection optical system. In this embodiment, the stop member 11 is provided in the neighbourhood of the exit surface 10b of the optical integrator 10. This stop member has a plurality of apertures and is provided with a mechanism for changing, as desired, the aperture shape thereof. The aperture shape which is variable is predetermined and it corresponds to the shape of the secondary light source to be formed at the pupil plane 17a of the projection optical system 17. For example, the stop member may have a ring-like aperture of a property for passing a larger quantity of light at its peripheral portion than at its central portion. In this embodiment, the selection of the prism member 6 of the optical device 8 singly or the selection of the prism member 6 together with the changing the aperture shape of the stop member 11 in combination, assures a desired shape of effective light source while a attaining high efficiency of light utilization. It is to be noted that the provision of the stop member 11 is not a requisition in this embodiment. With the arrangement of this embodiment as described above, for a reticle 15 pattern having a relatively large minimum linewidth, the structure shown in Figure 2A is selected (like an illumination system of conventional type), whereby a Gaussian shape light intensity distribution is provided at the entrance surface 10a of the optical integrator 10 (first state). On the other hand, for a pattern having a relatively small minimum linewidth, the structure shown in Figure 3A is selected to provide a ring-like light intensity distribution at the entrance surface 10a of the integrator 10. Also, the aperture shape of the stop member 11 is changed. By this, an illumination device for high resolution projection is assured (second state). The insertion of the parallel plate 7 in the first state of Figure 2A is to minimize the difference in optical path length between the lens systems 5 and 9, as compared with that in the case where the prism member 6 is inserted in the second state. If the prism member 6 has a small thickness or is a slight change in optical path length between the lens systems 5 and 9 does not influence the optical performance of the optical integrator 10 or of any other optical elements following it, the parallel plate 7 may be omitted. Figures 5 and 6 are schematic representations for explaining the relationship of the incidence height (heights t 1 and t 2 from the optical axis) at the entrance surface 10a of the optical integrator 10, relative to the position (exit heights S 1 and S 2 ) and deflection angle (α 1 and α 2 ) of light passing through the parallel plate 7, where in the present embodiment the focal length f of the lens system 9 constituting the imaging system 101 is changed. If in Figure 5 the focal length of the lens system 9 is f 1 , then t 1 = f 1 tanα 1 applies. Also, in Figure 6, if the focal length of the lens system 9 is f 2 , then t 2 = f 2 tanα 2 applies. It is seen from these equations that if the focal length of the lens system 9 is made large then it is possible to obtain, at the entrance surface 10a of the optical integrator 10, an incidence position t 1 of desired height with a small deflection angle α at the position of the parallel plate 7. This means that if the focal length f of the lens system 9 is made large then it is possible to make small the angle of the prism member 6 (prism angle) in the second state. This assures an imaging system 101 of smaller aberration. Practically, in consideration of the size of the prism member 6, the focal length of the lens system 9 may be so set to define a prism angle of 5 - 20 deg. Figure 7 is a schematic view of a main portion of a second embodiment of the present invention. In this embodiment, as compared with the first embodiment of Figure 1, a half mirror 30 is disposed on the light path at the position before (light source 1 side) of the optical integrator 10, so that a portion of the light from the imaging system 101 is directed to a photodetector 31 which may comprise a CCD or a quadrant sensor. The remaining portion is of the same structure as of the first embodiment. In this embodiment, the light intensity distribution at the light entrance surface 10a of the optical integrator 10 is measured indirectly to monitor the same. This allows adjustment of the imaging system 101 while monitoring changes in light intensity and/or light intensity distribution at the entrance surface 10a. In this embodiment, a mechanism 60 for rotating the optical member 6 about the optical axis or for shifting the same with respect to the optical axis, may be used. This enables to change the light intensity distribution at the entrance surface 10a of the integrator 10 into a desired shape easily. Figure 8 is a schematic view of a main portion of a third embodiment of the present invention. In this embodiment, as compared with the first embodiment of Figure 1, in addition to the insertion of the prism member 6 into the light path, the lens system 9 is replaced by a lens system 33 of a different focal length which is disposed at the entrance face 10a side of the optical integrator 10. The remaining portion is of the same structure as of the first embodiment. In this embodiment, light is collected to a region narrower than the entrance surface 10a of the integrator 10, and light intensity distribution of a desired shape is obtained. Referring now to Figures 11A, 11B, 12A and 12B, the optical function of this embodiment will be explained. Figures 11A - 12B schematically illustrate the light path from the optical device 8 (prism 6 and parallel plate 7) to the integrator 10. Figures 13A, 13B, 14A and 14B show light intensity distribution at the entrance surface 10a of the integrator 10, defined by using the prism member 6 or the parallel plate 7. Figure 11A shows the arrangement where in the first embodiment conventional the illumination is to be done. Generally, the angle of light rays that can enter the optical integrator is determined and, in the example of Figure 11A, the angle is  1 . Thus, the optical system before the integrator 10 is designed so that the angle of incidence upon the integrator 10 becomes not greater than the angle . Here, in the light intensity distribution at the entrance surface 10a of the integrator 10, the degree of convergence is limited due to Lagrange's invariant. For example, it is not possible to improve the degree of convergence beyond that of Figure 13A. An attempt to obtaining higher degree of convergence simply ends in that the angle of incidence upon the integrator 10 goes beyond the angle . Figure 11B shows the state where in the first embodiment the prism member 6 is inserted into the light path. Figure 13B shows corresponding light intensity distribution at the entrance surface 10a. Here, the maximum incidence angle of the light upon the entrance surface 10a, at the point S 1 , is  1 the same as the Figure 11A example. However, the effective light angle of the light actually enters is  2 . As seen from Figure 12A, with the provision of an optical device 32 (which may comprise a prism or a field lens) in front of the entrance surface 10a, it is possible to reduce the maximum incidence angle. Figure 14A shows corresponding light intensity distribution at the entrance surface 10a. Here, since the maximum incidence angle is loosened, by shortening the focal length of the optical system from the prism 6 to the optical integrator it is possible to obtain a higher degree of convergence. Figure 12B shows an example wherein the degree of convergence is improved on the basis of such optical principle just described. Corresponding light intensity distribution is shown in Figure 13B. In the example of Figure 12B, the prism member 6 has an enlarged prism angle so as to obtain light intensity distribution of ring-like shape. In this embodiment, the insertion of the prism member 6 as described causes shift of the angle of incidence at the entrance surface 10a of the integrator 10 while the maximum incidence angle being unchanged. By correcting such shift and optimizing the incidence angle, the incidence angle is loosened. Thus, it becomes possible to increase the degree of convergence to the limit where the incidence angle becomes equal to the critical incidence angle. Practical means for this end may be using a zoom system for the optical system from the prism member 6 to the integrator 10; using interchangeable optical systems; provision of a conical prism in front of the integrator 10; insertion of an aspherical lens; or appropriate combination of them. Figures 15A - 15C are schematic views of a portion of a fourth embodiment of the present invention. In this embodiment, as compared with the first embodiment of Figure 1, the position of the optical device 8 (the position of prism member 6 and/or parallel plate 7) is shifted from the pupil of the imaging system 101 and the focal length of the optical system 9 is changed, to thereby converge the light intensity distribution at the entrance surface 10a of the optical integrator 10. The remaining portion is of the same structure as of the first embodiment. In Figures 15A - 15C, reference character P denotes the pupil plane of the lens system 9. Figure 15A shows the first state of illumination in the first embodiment. The angle of incidence upon the integrator 10 is . Figure 15B shows the second state of illumination in the first embodiment, and the incidence angle is  the same as in the Figure 11A example. Here, if the prism member 6 is shifted from the pupil plane P and the beam diameter on the plane P is reduced such as shown in Figure 15C, then it is possible to make the incidence angle ' smaller than the angle  2 of the Figure 11A and 11B examples. In the present embodiment, in this occasion, the focal length of the lens system 9 is changed so as to assure that the light intensity distribution at the entrance surface 10a of the integrator 10 is collected and converged locally. Figure 16 is a schematic view of a main portion of a fifth embodiment of the present invention. In this embodiment. as compared with the first embodiment of Figure 1, the lens system 5 constituting the imaging system 101 is omitted and the opening 2a of the elliptical mirror 2 is imaged by the lens system 9 upon the entrance surface 10a of the optical integrator 10. Also, the optical device 8 is disposed in the neighbourhood of the second focal point of the elliptical mirror 2. The remaining portion is of the same structure as of the first embodiment. More specifically, in the embodiment of Figure 1, an image of the light emitting portion 1a of the light source 1 is formed on the entrance surface 10a of the integrator 10, and the optical device 8 is disposed in the neighbourhood of the imaging position of the opening 2a of the elliptical mirror 2 (the position of the image of the opening 2a) which is between the light source 1 and the integrator 10. In the present embodiment, as compared, the image of the opening 2a of the elliptical mirror 2 is formed on the entrance surface 10a of the integrator 10, and the optical device 8 is disposed at the imaging position of the light emitting portion 1a (the second focal point position of the elliptical mirror 2) which is between the light source 1 and the optical integrator 10. Thus, in this embodiment, the forward focal point position of the lens system 9 is placed substantially at the second focal point position of the elliptical mirror 2, and by the lens system 9, the light from the light source image 1b at the second focal point is transformed into substantially parallel light which is then directed to the entrance surface 10a of the integrator 10. Parallel light from the lens system 9 is projected on the entrance surface 10a of the integrator 10. Figure 17 is a schematic view of a main portion of a sixth embodiment of the present invention. In this embodiment, as compared with the first embodiment of Figure 1, the optical device 8 comprises at least two prism members 6a and 6b disposed along the optical axis and, for changing the light intensity distribution at the entrance surface 10a of the integrator 10, namely, for rendering the illumination system into the second state, the optical device 8 (prism members 6a and 6b) is mounted on the optical axis and, additionally, a portion of the lens system 9a constituting the imaging system 101 is replaced by another lens system 9b so as to reduce the incidence angle of off-axis principal ray to the entrance surface 10a. This is done for efficient utilization of light. In the illumination method of this embodiment, in the first state the lens system 9a is placed on the light path (the optical device 8 is not used), so at to provide light intensity distribution at the entrance surface 10a of the integrator 10, that is, light intensity distribution at the pupil plane 17a of the projection optical system 17, which distribution is of a rotationally symmetric shape wherein the intensity is higher at the central portion than at the peripheral portion. The second state is defined by placing the optical device 8 (prism members 6a and 6b) on the light path and by replacing the lens system 9a by the lens system 9b having a different focal length. This makes smaller the angle of incidence of the principal ray upon the entrance surface 10a of the integrator 10, whereby at this entrance surface 10a, namely, at the pupil plane 17a of the projection optical system 17, such light intensity distribution in which the intensity is higher in the peripheral portion than in the central portion is provided. Structural features of this embodiment over the first embodiment will be explained in more detail. In Figure 17, lens system 5 collects the light from the light source image 1b formed in the neighbourhood of the second focal point 4, and it emits parallel light. The imaging system 101 (lens systems 5 and 9a) is telecentric on the exit side. At least a portion of the collecting lens 14 is made movable along the optical axis, to adjust the light intensity distribution on the reticle 15. In this embodiment, in accordance with the orientation and/or the linewidth to be resolved of the pattern of the reticle 15, for example, the lens system 9a which is a constituent element of the imaging system 101 is replaced by the optical device 8 (including two prisms 6a and 6b) and the lens system 9b, to change the light intensity distribution at the entrance surface 10a of the integrator 10. Additionally, if necessary, the aperture shape of the stop member 11 is changed to change the light intensity distribution of the image of the secondary light source which image is formed at the pupil plane 17a of the projection optical system 17. Next, the manner of changing in this embodiment the light intensity distribution on the entrance surface 10a of the integrator 10 as well as the light intensity distribution of the image of the secondary light source to be formed on the pupil plane 17a of the projection optical system 17, on the basis of the optical device 8, will be explained. Figures 18 and 19 each schematically illustrate the light path from the elliptical mirror 2 to the optical integrator 10 of Figure 17, the path being extended. The mirror 3 is not shown in Figure 18 or 19. The illustrations of Figures 18 and 19 explain that the components of the optical device 8 are interchanged to change the light intensity distribution on the entrance surface 10a of the integrator 10. Figure 18 shows the state in which the lens system 9a is placed on the light path. Figure 19 shows the state in which the lens system 9a is removed and, in place thereof, the prism members 6a and 6b of the optical device 8 and the lens system 9b are placed on the light path. The illumination system of Figure 18 is in the first state of projection in which a very high resolution is not required but a large depth of focus is assured, as in the illumination method of conventional type. The illumination system of Figure 19 is in the second state of projection, according to the present invention, mainly for attaining high resolution. The portion (B) of Figure 18 and the portion (B) of Figure 19 schematically each shows corresponding light intensity distribution on the entrance surface 10a of the integrator 10. The zone depicted by hatching denotes the region of higher intensity as compared with the remaining region. In these illustrations, the distribution of light intensity I along the X-axis direction are depicted. Figures 20A, 20B and 20C are schematic representations, for explaining the light rays impinging on the optical integrator 10, in the systems of Figure 18 and 19. Reference characters + and - each denotes the range (angle) of light rays that can enter the optical integrator 10 (that can emerge from the integrator without being eclipsed). Grid portion in each illustration depicts the zone in which the light intensity is higher than that of the light entering the integrator 10. Figure 18, (A), shows the optical arrangement in ordinary illumination. Here, the light intensity distribution at the entrance face 10a of the integrator 10 is like a Gaussian distribution such as shown in Figure 18, (B). The incidence angle thereof is such as shown in Figure 20A. When in this state the illumination for high resolution is to be done, there may be a method in which a stop 121 having an aperture 121a such as shown in Figure 21 is inserted at the back of or in front of the integrator 10. However, with this method, only the light in the hatched zone of the light intensity distribution of Figure 18, (A), can be used and, therefore, the illuminance decreases considerably. In this embodiment, in consideration thereof, as shown in Figure 19, (A), the lens system 9a is replaced by the lens system 9b of smaller focal length (the optical components are disposed so that, if the focal length of the lens system 9b is f 9b , the optical distance between the prism 6a and the lens system 9b and the optical distance between the lens system 9b and the entrance surface 10a of the integrator 10 are both equal to f 9b ), such that the light intensity distribution as shown in Figure 19, (B), is provided at the entrance surface 10a of the integrator 10. Additionally, the prism member 6b having an appropriate prism angle is inserted in front of the integrator 10, by which the incidence angle of light rays (incidence angle of off-axis light) is made smaller such as shown in Figure 20C. This assures efficient impingement or entrance of light into the integrator 10. '£hus, almost all the input light can be used for the illumination. On the basis of the optical principle described above, the present embodiment uses the optical arrangement such as shown in Figure 19, (A), by which illumination for high resolution is assured without a substantial loss of illuminance at the surface to be illuminated. The prism member 6a or 6b provided within the imaging system 101 is a conical prism. While the embodiment has been explained with reference to an example wherein the lens system 9a of Figure 18 for ordinary illumination is replaced by the lens system 9b of Figure 19 for high resolution illumination, the lens elements of the lens system 9a may be displaced (like a zoom lens system) to define the same condition as by the lens system 9b. Only some of the lens elements may be moved like a zoom lens system or, alternatively, some lens elements may be replaced by different lens elements. The stop member 121 for high resolution such as shown in Figure 21 may be used as desired, or it may be omitted. Further, while in this embodiment the focal length of the lens system 9a is changed to change the magnification of the imaging system 101, the focal length of the lens system 5 may be changed. Alternatively, both of the focal lengths of the lens systems 5 and 9 may be changed. In this embodiment, there are cases wherein, in response to the interchange of the ordinary illumination (first state) and the illumination for high resolution (second state), uniformness in illuminance (non-uniformness of illuminance) upon the surface being illuminated changes into axial symmetry. In that occasion, a portion of the optical system 14 may be displaced along the optical axis to change aberration such as distortion to thereby correct the axially symmetric non-uniformness of illuminance upon the surface (reticle 15 surface) to be illuminated. While in the preceding embodiment the reticle 15 (surface to be illuminated) is disposed just after the optical system 14, an additional imaging system may be disposed between the optical system 14 and the reticle such that a plane which is optically conjugate with the reticle 15 surface with respect to the additional imaging system may be illuminated. Figure 22 is a schematic view of a main portion of a seventh embodiment of the present invention. In this embodiment, as compared with the first embodiment of Figure 1, a half mirror 43 is disposed between the integrator 10 and the surface 15 to be illuminated, so as to allow detection of the amount of exposure of the surface being illuminated. The remaining portion is of substantially the same structure as of the first embodiment. In Figure 22, denoted at 44 is the reticle pattern surface or a plane which is optically conjugate with the reticle pattern surface. Denoted at 45 is a pinhole member which is disposed at a position optically conjugate with the plane 44. Denoted at 33 is a photosensor (e.g., CCD or quadrant sensor). With this arrangement of the present embodiment, it is possible to monitor the effective light source distribution at the center of the surface being illuminated. Also, in this embodiment it is possible to concurrently monitor, with the photodetector 31, the amount of exposure of the surface being illuminated. While in this embodiment the half mirror 43 is placed between the lens system 13a and the collimator lens 14b, it may be disposed at any position between the integrator 10 and the surface 15. In accordance with the present invention, in consideration of fineness and/or orientation of a pattern of a reticle to be projected and transferred, an illumination system suited to such pattern can be selected. While the invention has been described with reference to the structures disclosed herein, it is not confined to the details set forth and this application is intended to cover such modifications or changes as come within the scope of the following claims.

Claims: An illumination system wherein light from a primary light source (1) is projected to an optical integrator (10) whereby a secondary light source is formed, and wherein lights from the secondary light source are projected to a surface, to be illuminated (15;18) by an optical system (13, 14) whereby they are superposed one upon another, characterized in that: a deflecting member (6) having a conical light deflection surface is demountably disposed between the primary light source (1) and the optical integrator (10), the deflecting member serving to transform the light from the primary light source (1) into an annular light pattern which is projected on to the optical integrator (10) to form an annular secondary light source when the deflecting member (6) is present. A system according to claim 1, further characterized in that an imaging optical system (2, 3, 5, 9) including a collimator lens (5) and a collecting lens (9), is provided to image the primary light source (1) on the optical integrator (10), wherein said deflecting member (6) is demountably disposed in a path of parallel light between said collimator lens (5) and said collecting lens (9). A system according to claim 2, wherein said imaging optical system has a variable imaging magnification. A system according to claim 3, wherein said collecting lens (9) is one of plural lens systems (9, 33; 9a, 9b) which are usable interchangeably, and wherein the imaging magnification can be changed by changing the lens systems. A system according to claim 3, wherein said imaging optical system (2, 3, 5, 9) has a zooming function. A system according to any one of claims 1 - 5, further comprising moving means (600) for moving said deflecting member (6) in a direction intersecting an optical axis. A system according to any one of claims 1 - 6, wherein a second deflecting member (32; 6b) is provided between said collecting lens (9) and the optical integrator (10), for reducing the angle of incidence of the annular light upon the optical integrator. A system according to claim 7, wherein said second deflecting member comprises a field lens (32). A system according to claim 7, wherein said second deflecting member comprises a conical prism (6b). A system according to claim 1, further characterized by an elliptical mirror (2) for reflecting light from the primary light source (1), and a second optical system (9) for projecting the image of the primary light source by said elliptical mirror onto the optical integrator (10), wherein said deflecting member (6) is demountably disposed between said second optical member (9) and the image (1b) of the primary light source. A system according to any one of claims 1 - 10, wherein said deflecting member comprises a conical prism (6). A system according to any one of claims 1 - 11, wherein there is a stop member (11) which provides a stop with an opening outside the optical axis, for defining the shape of the secondary light source. A system according to claim 12, wherein said stop member (11) has a function of varying the shape of the opening. A system according to any one of claims 1 - 12, wherein there is correcting means (14) for correcting illuminance non-uniformity upon the surface (15, 18) to be illuminated. A system according to any one of claims 1 - 12, comprising measuring means (30, 31) for measuring light intensity distribution upon the optical integrator (10). A projection exposure apparatus having an illumination system as recited in any one of claims 1 - 15, and a projection optical system (17) for projecting a pattern of a mask illuminated by the illumination system onto a substrate (18). A method of manufacturing a microdevice, including the steps of transferring a circuit pattern onto a substrate using a projection exposure apparatus according to claim 16, and processing the substrate to realise a functional microdevice in accordance with the projected pattern.

Inventors: HAYATA SHIGERU, ISHII HIROYUKI, MURAKI MASATO, SHIOZAWA TAKAHISA, HAYATA, SHIGERU, ISHII, HIROYUKI, MURAKI, MASATO, SHIOZAWA, TAKAHISA, Hayata, Shigeru, c/o Kosugi Jigyosho, Ishii, Hiroyuki, c/o Kosugi Jigyosho, MURAKI, MASATO, C/O KOSUGI JIGYOSHO, Shiozawa, Takahisa, c/o Kosugi Jigyosho
Applicants: CANON KK, CANON KABUSHIKI KAISHA
Application year: 1993
Main classification: G03F7
IPC codes: G03F7, H01L21