A DEVICE FOR MEASURING FORCE COMPONENTS IN MONOCRISTALLINE MATERIAL, A METHOD FOR MANUFACTURING SUCH A DEVICE AND A USE OF SUCH A DEVICE

Abstract: A device for measuring force components, in single crystal material, consisting of at least one cantilever beam (1, 2, 3, 4) inclined to the plane normal, with adherent mass of inertia is described. It is particularly characterized in that the angle to the plane normal of the cantilever beam is achieved through etching of the single crystal material, and is defined by the inclination of one of the crystal planes that constitute the beam and that normally, the bending of the cantilever beam inclined to the plane normal principally occurs towards the beam. A method of manufacturing such a device is also described.

Description: A DEVICE FOR ME_ASURING FORCE COMPONENTS IN MONOCHRIΞTAL_LINE MATERIAL, A METHOD FOR MANUFACTURING SUCH A DEVICE AND A USE OF SUCH A DEVICE. The present invention relates to a device according to the preamble of Claim 1. The invention also relates to a method of manufacturing a device according to the preamble of Claim 5. Upto this day accelercmeters of the type cantilever beam with adherent mass of inertia formed from a semiconductor substrate have been built and tested for linear acceleration along a dimensional axis, of the type with open loop as well as with closed loop. The most caution solution with open loop is the one comprising a cantilever beam formed frαn a semiconductor substrate, which has a mass of inertia attached at its free end. The beam is formed so that it has high flexibility along an axis perpendicular to the substrate surface and high flexural rigidity along all other directions. Furthermore, there are piezoresistive sensing elements on the cantilever beam. The electric resistance in such sensing elements varies when the beam bends due to the acceleration forces that act on the mass of inertia. One-axial accelercmeters of the type open loop manufactured of silicon show certain disadvantages in the form of high cross sensitivity due to the centre of gravity of the mass of inertia not lying on the neutral axis of the beam. Furthermore, the cross section of the beam is not symmetrical. A one-axial accelerometer in a semiconductor substrate with closed loop is known frcm Swedish patent specification SE 462997. Typical for solutions with closed loop is that the mass of inertia is brought back during acceleration and retardation with the aid of a servo to the zero position which gives higher sensitivity and linearity. One advantage with forming accelercmeters in semiconductor substrate is that servo and signal pro¬ cessing electronics can be integrated into the same substrate. Upto this day, on measuring the acceleration along several dimensional axes with the aid of accelercmeters formed in semiconductor substrate, a one-axial accelerccneter had to be used for every dimensional axis. Hitherto suggested three-dimensional monolithic accelercmeters use one beam for every direc¬ tion, see for instance WD 90/00735. If angular acceleration and angular velocity also is sought, practical experiments have shown that two additional one-axial accelercmeters are required per dimensional axis (Padgaonkar et. al.. Journal of Applied Mechanics, p. 552, Sept. 1975.). SUBSTITUTE SHEET In order to achieve a complete description of a fixed body movement, nine one-axial accelerometers located in a known way relative to each other are thus required, or alternatively three three-axial accelerometers. The present invention stretches the technology of accelerometer con¬ structions formed frαn a semiconductor substrate to simultaneous measuring of linear acceleration along three dimensional axes and, depending on the configuration, with or without sensitivity to angular acceleration and angular velocity about the dimensional axes through the characteristics as are evident frαn the characterizing parts of the independent Claims 1 and 5. The problem with high cross sensitivity in one-axis accelerometers is solved, at the same time as manufacturing is considerably simplified. Depending on the need of the application, the invention can be integrated in several configurations on the same substrate, which makes it possible to have simultaneous coverage of several measuring ranges alternatively makes it possible to measure simultaneously linear acceleration, angular acceleration and angular velocity along three dimensional axes. Further¬ more, depending on the demands for accuracy in the application, the measuring device can be formed either with open or closed loop. The use of well-developed silicon technology in the manufacturing makes mass production possible at low cost with high accuracy and reliability. One embodiment of the device according to the invention for measuring force components in single crystal material comprises four cantilever beams, inclined at an angle to the plane normal, with adhering masses of inertia etched frccn a single crystal material. An example of such a material is (100)-oriented ("Miller indices"), single crystal silicon, that can be doped in order to produce conductive means where necessary. The masses of inertia are attached to the substrate via cantilever beams which all have the same angle to the plane normal but the longitudinal axes of the beams are rotated 90° relative to each other. The beams and the mass of inertia are all formed through anisotropic etching of the single crystal material. The cantilever connections of the mass of inertia to the substrate are obtained through flexible beams that have an angle to the plane normal well-determined by the crystal structure. Thus, the angle α = 54,74° is obtained with (100) silicon substrate and (111)-beams. Through ani¬ sotropic etching from the opposite surfaces of a semiconductor substrate, thin beams inclined at the plane normal are formed, which connect the masses of inertia to the substrate. The width and the thickness of the beams are so dimensioned that high flexibility is obtained along an axis perpendicular to the respective inclined beam and high flexural rigidity along all other directions. Four beams with the same angle to the plane normal, z-axis, with the longitudinal axes rotated 90° relative to each other thus give four different bending directions where the relationship between the bending force in the respective direction and the forces along the x, y and z axes are known. Evaluation of the overdetermined equation system with four eαuations and three unknown gives the forces along the x, y and z axes and thereby the corresponding accelerations. By using four inclined beams instead of the necessary three, greater accuracy is given and at the same time the signal processing electronics are considerably simplified due to the syπmetry of the measuring device. By choosing a configuration where the centre of gravity for all the masses of inertia is located close to origo, a measuring device of type I is obtained, which is sensitive to accelerations along the x, y and z axes, and which is relatively insensitive to angular accelerations and angular velocity. If instead the fou masses of inertia are located, two on the x axis and two on the y axis on opposite sides of origo and with the longitudinal axes of the inclined beams being directed along the coordinate axes, a measuring device of type II is obtained which is sensitive to accelerations along the x, y and z axes, and for angular accelerations, but which is insensitive to angular velocities. If the four masses of inertia are located symmetrically on a sσuare with the longitudinal axes of the inclined beams directed along the sides of the square, a measuring device of type III is obtained which is sensitive to accelerations along the x, y and z axes, and to angular accelerations and angular velocities. By integrating all the types on the same substrate and with the same origo for type I, II and III, all the linear accele¬ rations, angular accelerations and angular velocities along the three dimensional axes can be calculated. Alternatively, three measuring devices of arbitrary type can be located with different origo at a known distance from each other directly on the semiconductor substrate, which also makes it possible to calculate all linear accelerations, angular accele¬ rations and angular velocities along three dimensional axes. A measuring device in single crystal materials accessible for manufacturing by means of well-known semiconductor manufacturing methods comprising for example photolithographic patterning and anisotropic etching gives many advantages including close tolerance control, possibility to integrate all or some of the signal processing electronics in one single mutual substrate of relatively moderate size, and gives access to a technology which makes effective mass production possible through batch production. Furthermore, the damping of a measuring device formed of the type open loop can easily be accomplished due to the high durability against chemicals for silicon. For example, the whole measuring device with electronics and all can be placed in a damping oil of suitable viscosity. When a zero-balanced measuring device of the type closed loop is desired, patterned conductive surfaces can be located on opposite sides of the masses of inertia with so-called "Silicon Direct Bonding". This method, which has been known since 1986 (Lasky, Applied Physics Letters Vol 48, p. 78, 1986) makes bonding of for example silicon to silicon, silicon to silicon dioxide and silicon dioxide to silicon dioxide possible. "Silicon Direct Bonding" can also be used to apply mecnanical stops for the cantilever beams so that these do not break if they are exposed to greater forces then they are intended for. The invention is described in more detail herebelow with reference to the accompanying drawings, which show the device according to the invention in a three-axial embodiment with four beams, in which Fig. 1 is a plane view of the inclined cantilever beams with adhering mass of inertia according to the invention; Fig. 2 shows a cross-section along the line IV-IV in Fig. 1; Fig. 3 shows a cross-section along the line IV-IV in Fig. 1 with the etch mask that is used during the anisotropic etching; Fig. 4 shows the bending forces on the inclined beams and how these are related to the x, y and z forces; Fig. 5 shows schematically type I, type II and type III configurations of inclined cantilever beams and masses of inertia, where all types are sensitive to accelerations along the x, y and z axes, and where type I is relatively insensitive to angular accelerations and angular velocities, type II is sensitive to angular accelerations but insensitive to angular velocities, type III is sensitive both to angular accelerations and angular velocities. Fig. 1 shows a plane view of 4 inclined cantilever beams (1, 2, 3, 4) with adhering masses of inertia (1' , 2', 3', 4'). When forming the measuring device in a (100)-oriented silicon substrate the indicated x and y axes are oriented along [llOj directions and the z axes normally to the substrate surface along the [lOOj direction. Furthermore, on manufacturing the measuring device in a (100) silicon substrate, a thermal oxidation is first performed, which gives a protective silicon dioxide layer on the substrate surfaces. This layer is used as mask during the anisotropic etching, whereupon the silicondioxide is patterned via a photolithographic process on both substrate surfaces in such a way that the formed openings in the silicondioxide layer are aligned along the llOJ directions. Alter¬ natively, silicon nitride, gold, chromium and various other materials can be used as etch mask depending on what type of anisotropic etch solution that is used. The openings on the opposite sides are displaced relative to each other (5) where a beam is desired in such a way that the desired beam thickness is obtained after the etching. The silicon substrate is then etched through, from both sides of the substrate with an anisotropic etch that selectively etches the (111) planes that form the beams much more slowly than the (100) and (110) planes. For example, an ethylene diamine/pyrocathecol (EDP)-based etch or a potassium hydroxide (KOH)-based etch can be used for this purpose. The latter etch solutions are heated so that the αesired etching effect is achieved, KOH to about 80°C and EDP to about 110°C. As is best seen from the cross-section IV-IV in Fig. 2 and Fig. 3, the thickness of the inclined beams are easily and most accurately defined bv the photolitographic process (5). The etching is so to speak self stopping which gives high reproducibility of the beam thickness contrarily to etching processes that are stopped according to time, which s a usual method for manufacturing cantilever beams parallel to the substrate surface. It is difficult to obtain even etching speed over large areas, which means that the beam thickness can vary considerably over a wafer. The etching times are in the order of 3-4 hours and the etching speed 1-2 μm/mm. Fig. 4 shows how the bending forces F. , F ? , F, and F. acting on the inclined beams are related to the x, y and z forces F , F and F . As 1 x y z is evident frcm the solution to the overdetermined equation system, the use of four inclined beams with the longitudinal axes rotated at 90° relative to each other instead of the necessary three, simplifies the calculation of F , F and F so it can be implemented with single resistances in con-junction with three operational amplifiers one for each force component. Manufacturing of the measuring device in a semi¬ conductor substrate makes it possible to integrate the signal processing electronics in the same substrate as the measuring device together with for example filter functions, other data processing electronics or servo- electronics for a measuring device of the type with closed loop. Detection of the movements of the masses of inertia is simplest achieved by the aid of the piezoresistive effect that resistances formed through doping of silicon substrate have. To get maximum sensitivity it is suitable to use a balanced bridge connection comprising four resistances located in a suitable way. Furthermore, to get maximum piezoresistive effect the resistances shall be located where bending is the greatest. In this case the greatest bending is close to the attachment to the substrate along the normal of the inclined team. It would therefore be optimal to place two resistances on either side of the mclineσ beam close to the attachment to the substrate. One alternative that gives poorer resolution, but is considerably easier to implement process-technically, is to locate one or two resistances on the upper side of the beam along the outer edge close to the attachment to the substrate and two and three, respectively, in the substrate, or alternatively one or two on the upper side and one or two on the underside of the beam. In one embodiment of the measuring device of the type with closed loop, detection of the movements of the masses of inertia is suitably performed capacitively, as the bring back and prestressing of a mass of inertia then occurs by means of an electric field between the masses of inertia and surrounding conductive plates. It gives access to two capacitors per mass of inertia whose capacity varies with the position of the mass of inertia and a displacement of the mass of inertia can be detected by the aid of a capacity bridge, which in turn gives a signal to a servo system that changes the electric field in such a way that the mass of inertia is brought back to the zero position. For special applications, it can also be conceived to use optic detection of the movements of the masses of inertia for example by using interference phenomena or by using an arrangement where the position of a reflected light beam depends on the position of the mass of inertia. Fig. 5 shows different configurations of a measuring device sensitive to linear accelerations along the x, .y and z axes comprising four inclined beams with adhering masses of inertia. Type I is an example of two con¬ figurations where the centre of gravity of the masses of inertia has been places as close as possible to origo in order to minimize the sensitivity to angular accelerations and angular velocities (the configuration where the masses of inertia have been located symmetrically on the x and y axes is insensitive to angular velocities about the coordinate axes) . Type II is an example of two configurations where the centre of gravity of the masses of inertia has been located two on the x axis and two on the y axis on opposite sides of origo and with the longitudinal axes of the inclined beams directed along the coordinate axes in order to give a measuring device which is insensitive to the angular velocity about the coordinate axes. Type III is an example of two configurations where the centre of gravity of the masses of inertia has been located symmetrically on a square with the longitudinal axes of the inclined beams directed along the sides of the sσuare which gives a measuring device which is sensitive both to the angular acceleration and the angular velocity about the coordinate axes (the configuration where the masses of inertia have been located symmetrically on the x and y axes is insensitive to angular accelerations about the z axis) . Even if the invention has been described here in connection with one embodiment, the invention is not limited to it. The invention is limitied only by what is stated in the claims.

Claims: Claims 1. A device for measuring force components, in single crystal material, consisting of at least one cantilever beam (1, 2, 3, 4) inclined to the plane normal, with adhering mass of inertia (1' , 2', 3', 4'), c h a r a c t e r i z e d in that the angle of the cantilever beam to the plane normal is achieved through etching of the single crystal material and is defined by the inclination of one of the crystal planes that constitute the beam and that, substantially, the bending of the cantilever beam inclined to the plane normal occurs towards the beam. 2. A device according to Claim 1, the device comprising at least two beams, c h a r a c t e r i z e d in that all the beams are constituted by equivalent crystal planes and have the same angle to the plane normal, and that the longitudinal axes of the beams are rotated relative to each other at an angle that is given by the single crystal material. 3. A device according to any one of the preceding claims, c h a r a c¬ t e r i z e d in that the cantilever beams and the masses of inertia adherent to the beams are manufactured of the same single crystal. 4. A device according to any one of the preceding Claims, c h a r a c¬ t e r i z e d in that the single crystal material is silicon. 5. A method of manufacturing a device for measuring force ccmponents, in single crystal material, consisting of at least one cantilever beam (1, 2, 3, 4) inclined to the plane normal with adherent mass of inertia (l', 2 , , 3', 4 I ), c h a r a c t e r i z e d in that the angle to the plane normal of the cantilever beam is obtained through etching of a single crystal material and is defined by the inclination of the crystal planes that constitute the beam. 6. A method according to Claim 5, the device comprising at least two beams, c h a r a c t e r i z e d in that the etcning is so performed, that all beams will be constituted by equivalent crystal planes, and so that the longitudinal axes of the beams will be rotated relative to each other at an angle that is given by the single crystal material. 7. A method according to Claims 5 or 6, c h a r a c t e r i z e d in that the beam or beams inclined to the plane normal (1, 2, 3, 4) is or are etched by means of anisotropic etching, and that the etching occurs frαπ two equivalent opposite crystal planes of a single crystal material. 8. A method according to any one of Claims 5 to 7, c h a r a c t e r¬ i z e d in that the single crystal material is covered by a protective film, that thereupon portions of the protective layer is removed on opposite sides of the single crystal in such a way that the formed openings in the protective layer is alighed with the crystal structure and that the openings on opposite sides are displaced relative to each other (5) where a beam is desired in such a way that the desired beam thickness is obtained after etching, that thereupon the crystal is etched with an anisotropic etch that etches the inclined crystal planes that form the beam or beams much more slowly than the other crystal planes. 9. A method according to any one of Claims 5 to 8, c h a r a c t e r¬ i z e d in that the cantilever beam or beams and the masses of inertia adherent to the beam or beams is or are etched in the same single crystal. 10. A method according to any one of Claims 5 to 9, c h a r a c t e r¬ i z e d in that the device is etched from silicon. 11. Use of the device according to any one of Claims 1 to 5, c h a¬ r a c t e r i z e d in that the device is used to detect linear acceleration and/or angular acceleration and/or angular velocity.

Inventors: ANDERSSON GERT, ANDERSSON, GERT
Applicants: ANDERSSON GERT, SAAB SCANIA COMBITECH AB, ANDERSSON, GERT, SAAB-SCANIA COMBITECH AKTIEBOLAG
Application year: 1993
Main classification: G01P15
IPC codes: G01P15, H01L29