An optical apparatus and a method using the apparatus, which utilizes the occurrence of a change in a both-end voltage of an amplifying region

Abstract: In an optical apparatus, such as a semiconductor optical amplifier device and an optical filtering apparatus, there are provided an optical amplifier device, a detector and a controller. The optical amplifier device has such a structure that exhibits a both-end voltage change at an optical amplification time of an input light. The detector detects the both-end voltage change, and the controller performs a predetermined control of a portion other than the optical amplifier device, such as another optical amplifier portion and a tunable band pass filter portion.

Description: The present invention relates to optical apparatuses and methods of using the apparatuses. Particularly, the present invention relates to a tunable filtering device which is capable of changing a filtering wavelength based on a detection result of the change in a voltage applied to a semiconductor laser structure and a method of this controlling tunable filtering device. Related Background Art Conventionally, when a light is amplified by an optical semiconductor amplifier device, in order to detect in which wavelength range the wavelength of the light lies, a part of an incoming light prior to the incidence onto the optical semiconductor amplifier device, or a part of an amplified light, is split and the split light is input into a detector portion which includes a wavelength detecting means for detecting the split light's wavelength. Further, in order to perform an automatic power control (APC) amplification of the optical semiconductor amplifier device, there has been conventionally presented a system in which the change in a voltage occurring in the optical amplifier device at the time of amplification of a signal light is utilized. Fig. 1 shows such a system. In Fig. 1, reference numeral 601 designates an incoming light, reference numeral 602 designates an optical semiconductor amplifier device, reference numeral 603 designates an emerging light, reference numeral 604 designates a control circuit, reference numeral 605 designates a current source, and reference numeral 606 designates a bias T. The incoming signal light 601 is a digital signal, and a sinusoidal wave signal whose period is sufficiently lower than the transmission rate of the digital signal is overlapped or superposed on the digital signal. Due to this superposition, the change in the applied voltage occurring when the light signal 601 is amplified by the optical amplifier device 602 is supplied to the control circuit 604 by the bias T 606, and a control signal is supplied to the current source 605 so that the amount of the voltage change, synchronized with the frequency of the superposed sinusoidal wave, is maintained at a constant value. Thus, the APC amplification operation is achieved by changing the bias current injected into the optical amplifier device 602 from the current source 605. In the above-discussed prior art detecting apparatus of the amplified wavelength, optical or light loss accompanies the splitting of a part of the signal light, and an optical component for light splitting is inevitably needed. Further, the above-mentioned prior art APC amplification operation entails the following disadvantages: When the incoming signal light travels through the optical semiconductor amplifier device, the light signal is amplified due to the induced emission due to population inversion created by the current injection, to be emitted as the emerging light 603. The amplification operation is the phenomenon that accompanies the carrier recombination in an active layer or region of the optical semiconductor amplifier device. Therefore, at the time of an amplification operation, the carrier density in the active layer becomes small, compared with a non-amplification time, and the voltage produced between both opposite junction ends or the both-end voltage of the device is decreased. The amount of the voltage change grows larger as the incoming light increases and as the amplification factor increases. In the prior art structure wherein the current injection is conducted solely through two opposed electrodes and the voltage change is also detected thereby, the following drawbacks occur: First, since the incoming light 601 is amplified and increased as this light travels through the optical amplifier device 602. the voltage change is gradually increased along a light propagation direction, and hence the amount of the voltage change is detected only in a form of its averaged value. Second, a current flows in the light propagation direction since a voltage gradient appears in this direction, and hence the amplification factor of the entire device is lowered. Third, since a portion for detecting the voltage chance is common to a portion for adjusting the amplification factor, the above control is difficult to achieve. Further, in a wavelength division multiplexing (WDM) optical communication system, a portion that has a wavelength selection function for selecting a light at one wavelength from lights of a plurality of wavelengths is required to be disposed in a receiver of the communication system. Fig. 2 shows an example of a WDM optical communication system. In Fig. 2, a uni-directional N to M transmission of the WDM optical communication is shown. In Fig. 2, reference numerals 700-1 through 700-N designate optical transmitters, reference numeral 701 designates a light combining device, reference numeral 702 designates an optical fiber transmission line, reference numeral 703 designates an optical branching device and reference numerals 704-l through 704-M designate optical receivers. In the structure of such WDM communication, when the transmission is conducted from the transmitter 700-1 to the receivers 704-J and 704-K, the receivers 704-J and 704-K are required to be capable of receiving the same wavelength. In order to achieve this operation, the wavelength selection function portion of the receivers 704-l through 704-M is composed of, for example, an optical demultiplexer and photodetectors for respectively receiving demultiplexed lights, and the output of one photodetector is used according to the need (see Fig. 3). In the alternative, there is arranged a tunable band pass filter that is capable of changing its transmission wavelength range according to a signal from outside, and a part of the output of this band pass filter is split. The split light signal is input into an apparatus having a wavelength-detection function, and the tunable band pass filter is controlled by the output of this wavelength detecting apparatus (see Fig. 4). Further, in another method, an incoming signal light is branched into a plurality of portions, and the split light portions are respectively received by wavelength-fixed type band pass filters and photodetectors to achieve the same performance. Fig. 3 shows an example of wavelength selection means which includes the above-mentioned optical demultiplexer. In Fig. 3, reference numeral 801 designates an optical demultiplexer, reference numerals 802-1 through 802-N designate photodetectors, and reference numeral 803 designates a control apparatus for selecting one of the outputs of the photodetectors 802-1 to 802-N and supplying an electric signal 805 to a terminal equipment. Reference numeral 804 designates a light signal to be input into the optical receiver 704-I. Fig. 4 shows an optical receiver 704-I that includes the above-mentioned tunable band pass filter, and Fig. 5 shows a wavelength selection portion 901 that is contained in the receiver 704 of Fig. 4. In Fig. 4, reference numeral 901 designates a wavelength selection (WS) portion as shown in Fig. 5. In Fig. 4, reference numeral 902 designates a photodetector, reference numeral 903 designates a controller, reference numeral 904 designates a light signal, reference numeral 906 designates a control signal for determining the transmission wavelength of the WS portion 901 and reference numeral 905 designates an electric signal to be supplied to the terminal equipment. Turning to Fig. 5, reference numeral 1001 designates a tu nahle band pass filter whose transmission wavelength range is changeable by a signal from outside. Reference numeral 1002 designates a light branching device, and reference numeral 1004 designates a photodetector. Reference numeral 1003 designates a controller for supplying a control signal to the tunable band pass filter 1001 based on the output signal from the photodetector 1004 and the control signal 906 from outside. In this structure, since it is impossible to directly know the wavelength, a method is needed in which the transmission wavelength range of the tunable band pass filter 1001 is scanned over a predetermined range and the wavelengths corresponding to the wavelength multiplexed signals are identified. In this case, the order of the signals having respective wavelengths are given beforehand. In such a method, it is necessary, for example, to always transmit the wavelength multiplexed signals of all wavelengths even at the time of non-signal. Under those circumstances, the outputs of the photodetector 1004 corresponding to the respective wavelengths are obtained by scanning the transmission wavelength of the band pass filter 1001 from a shorter wavelength side to a longer wavelength side. If information of how many wavelengths are multiplexed in the signals is given, one light signal of the wavelength multiplexed light signals can be taken out. In those prior art apparatuses, the light output from the band pass filter is branched and the wavelength of its split light is detected in order to select light of a predetermined wavelength from signals of a plurality of wavelengths by controlling the transmission wavelength of the band pass filter based on the detection result. Also, there are arranged a plurality of wavelength-fixed band pass filters whose transmission wavelengths are set beforehand and photodetectors that are disposed behind the respective band pass filters, thereby achieving the wavelength selection function by electric selection. However, the following drawbacks exist: First, in the former case, the light signal intensity input into the photodetector is decreased since the light is split behind the band pass filter. Second, in the latter case, the numbers of band pass filters and photodetectors necessarily amount to the number of wavelength multiplicity, and the number of components constructing the receiver increases as the wavelength multiplicity increases. Further, in the case of the wavelength selecting means containing the optical demultiplexer of Fig. 3, the number of the needed photodetectors amounts to the number of wavelength multiplicity, and thus the same drawback as the above-mentioned latter case occurs. Moreover, EP-A-0 377 948 discloses an optical amplifying device, for amplifying an input optical signal. The optical amplifying device includes an optical amplifier having a gain control region in which the input optical signal is amplified, a first detecting region for detecting the input optical signal, and a second detecting region for detecting an amplified optical signal. The gain of the optical amplifier is controlled by a gain control signal from a signal source. In addition, US-A-4 794 346 discloses a broadband semiconductor optical amplifier comprising first and second active semiconductor regions disposed in tandem with each other, and means for injecting current into the first and second active semiconductor regions to provide gain distributions over wavelength regions in the two active semiconductor regions which partially overlap to form a combined gain distribution over a wider range of wavelengths. Furthermore, EP-A-0 356 302 discloses an optical filtering apparatus comprising a semiconductor laser. Additionally, IEEE Photonics Technology Letters, 2(1990) August, No. 8, discloses a similar optical amplifier configuration. It is an object of the present invention to provide a tunable filtering apparatus which has overcome the problems of the prior art and a method for controlling such a tunable filtering apparatus. Moreover, it is an object of the present invention to provide an optical receiver comprising such a tunable filtering apparatus, as well as an optical communication system and a wavelength-division multiplexing optical communication system comprising such an optical receiver. According to the present invention, the above objects are achieved by a tunable filtering apparatus comprising a tunable optical band pass filter, said band pass filter being capable of changing its transmission wavelength based on an external control, an optical semiconductor amplifier device comprising semiconductor layers of different conductivity types, said amplifier device and said band pass filter being arranged, either such that the amplifier device receives light which is transmitted by said band pass filter or such that the amplifier device receives its own amplified light which is reflected by said band pass filter other than a component transmitted by said band pass filter, whereby said amplifier device exhibits a change of the voltage produced perpendicular to a junction of said semiconductor layers of different conductivity types during an optical amplification in dependence on said received light, and control means for changing the transmission wavelength of said tunable band pass filter based on said change of the voltage produced perpendicular to a junction of said semiconductor layers of different conductivity types. Moreover, the above objects are achieved by an optical receiver comprising a tunable filtering apparatus as defined above, light detecting means for converting an optical signal from said tunable filtering apparatus to an electric signal, and second control means for reproducing the electric signal from said light detecting means to supply a reproduced signal to a terminal equipment and supplying to said control means of said tunable filtering apparatus a control signal for controlling the transmission wavelength. In addition, the above objects are achieved by an optical communication system comprising a transmission line and an optical receiver as defined above for receiving an optical signal from said transmission line. Furthermore, the above objects are achieved by a wavelength-division multiplexing optical communication system comprising a transmission line, and an optical receiver as defined above for receiving an optical signal from said transmission line, wherein the tunable band pass filter of said tunable filtering apparatus of said optical receiver is capable of containing all multiplexed wavelengths within its stop band. Moreover, the above objects are achieved by a control method for controlling a tunable filtering apparatus as defined above, comprising the steps of inputting a light from said tunable optical band pass filter to said optical amplifier device, determining whether there is light transmitted through said tunable optical band pass filter or not, by detecting a change of the voltage produced perpendicular to a junction of said semiconductor layers of different conductivity types of said optical amplifier device, and changing the transmission wavelength of said tunable band pass filter based on said detected change of voltage. These advantages and others will be more readily understood in connection with the following detailed description of prior art examples, examples which are useful for the understanding of the invention and the preferred embodiments in conjunction with the drawings. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the APC operation of a prior art optical amplifier device. Fig. 2 is a view showing an example of prior art wavelength division multiplexing optical communication systems. Fig. 3 is a view showing an example of a prior art optical receiver which includes a demultiplexer. Fig. 4 is a view showing an example of a prior art optical receiver which includes a wavelength selection portion. Fig. 5 is a view showing an example of the WS portion of Fig. 4 which includes a tunable band pass filter. Fig. 6 is a perspective view showing a first explanatory example which is not according to the present invention. Fig. 7 is an A-A' cross-sectional view of Fig. 6. Fig. 8 is a graph showing gain spectra for explaining the operation of a semiconductor optical amplifier device of the first explanatory example. Fig. 9 is a cross-sectional view showing a modification of the first explanatory example. Fig. 10 is a graph showing gain spectra for explaining the operation of a semiconductor optical amplifier device of the modification of the first explanatory example. Fig. 11 is a cross-sectional view showing a second explanatory example which is not according to the present invention. Fig. 12 is a graph showing gain spectra for explaining the operation of a semiconductor optical amplifier device of the second explanatory example. Fig. 13 is a list showing a wavelength dependency of detection voltage of the second explanatory example. Fig. 14 is a cross-sectional view showing a third explanatory example which is not according to the present invention. Fig. 15 is a graph showing gain spectra for explaining the operation of a semiconductor optical amplifier device of the third explanatory example. Fig. 16 is a perspective view showing a fourth explanatory example which is not according to the present invention. Fig. 17 is an A-A ' cross-sectional view of Fig. 16. Fig. 18 is a graph showing gain spectra for explaining the operation of a semiconductor optical amplifier device of the fourth explanatory example. Fig. 19 is a view showing a use example of the semiconductor optical amplifier device of Fig. 16. Fig. 20 is a cross-sectional view showing a fifth explanatory example which is not according to the present invention. Fig. 21 is a cross-sectional view showing a sixth explanatory example which is not according to the present invention. Fig. 22 is a view showing a use example- of the semiconductor optical amplifier device of Fig. 21. Fig. 23 is a view showing another use example of the semiconductor optical amplifier device of Fig. 21. Fig. 24 is a perspective view showing a seventh explanatory example which is not according to the present invention. Fig. 25 is an B-B' cross-sectional view of Fig. 24. Fig. 26 is an A-A ' cross-sectional view of Fig. 24. Fig. 27 is a graph showing gain spectra for explaining the operation of a semiconductor optical amplifier device of the seventh explanatory example. Fig. 28 is a block diagram of an eighth explanatory example of an optical communication system including a semiconductor optical amplifier device. Fig. 29 is a block diagram of a ninth explanatory example of a bi-directional optical communication system including a semiconductor optical amplifier device. Fig. 30 is a block diagram of a tenth explanatory example of a bi-directional N to N wavelength division multiplexing optical communication system including a semiconductor optical amplifier device. Fig. 31 is a block diagram of a eleventh explanatory example of a loop type optical LAN including a semiconductor optical amplifier device. Fig. 32 is a block diagram of a twelfth explanatory example of a bus type optical LAN including a semiconductor optical amplifier device. Fig. 33 is a block diagram of a thirteenth explanatory example of another bus type optical LAN including a semiconductor optical amplifier device. Fig. 34 is a block diagram of a semiconductor optical amplifying apparatus used in an optical communication system. Fig. 35 is a block diagram of an optical receiver used in an optical communication system. Fig. 36 is a block diagram of an optical receiver used in a bi-directional optical communication system. Fig. 37 is a block diagram of an optical receiver used in a bi-directional N to N wavelength division multiplexing optical communication system. Fig. 38 is a block diagram of an optical transceiver used in a bus type optical LAN. Fig. 39 is a block diagram of an optical branching-combining device with a built-in semiconductor optical amplifier device used in a bus type optical LAN. Fig. 40 is a schematic view showing a first embodiment of the present invention. Fig. 41 is a view illustrating a shape of an input light signal varying with time. Fig. 42 is a view illustrating wavelengths constituting the input light signal. Fig. 43 is a view illustrating a transmission peak wavelength, which varies with time, of a tunable band pass filter of the first embodiment. Fig. 44 is a view illustrating a wavelength, which varies with time, of an amplified output light of the first embodiment. Fig. 45 is a view illustrating a both-end voltage, which varies with time, of an optical amplifier device of the first embodiment. Fig. 46 is a schematic view showing a second embodiment of the present invention. Fig. 47A is a view illustrating a wavelength, which varies with time, of ouput light from a DFB filter of the second embodiment and Fig 47B is a view illustrating a both-end voltage, which varies with time, of an optical amplifier device of the second embodiment. Fig. 48 is a perspective view showing a third embodiment of an integrated device of the present invention. Fig. 49 is an A-A ' cross-sectional view of Fig. 48. Fig. 50 is a view showing a use example of the device of Fig. 48. First explanatory example Figs. 6 and 7 show the structure of a first explanatory example . Fig. 7 is an A-A ' cross-sectional view of Fig. 6. In Figs. 6 and 7, reference numeral 1 designates a semiconductor substrate of n-type GaAs, and reference numeral 2 designates a first cladding layer of n-type Al 0.4 Ga 0.6 As. Reference numeral 3a designates a first active layer of undoped Al 0.01 Ga 0.99 As, and reference numeral 3b (shown solely in Fig. 7) designates a second active layer having a single quantum well structure composed of a well (its thickness is 6nm) and barrier layers of Al 0.3 Ga 0.7 As sandwiching the well. Reference numeral 4 designates a second cladding laver of p-type Al 0.4 Ga 0.6 As, and reference numeral 5 designates a cap layer of p-type GaAs. Reference numeral 6 designates a first burying layer of p-type Al 0.5 Ga 0.5 As, and reference numeral 7 designates a second burying layer of n-type Al 0.5 Ga 0.5 As. Reference numeral 8 designates a first electrode of an alloy of Au and Ge deposited on the substrate 1. Reference numeral 9 designates a second electrode of an alloy of Au and Cr formed above the first active layer 3a. Reference numeral 10b designates a third electrode of an alloy of Au and Cr formed above the second active layer 3b. Reference numeral 11 designates an antireflection layer formed on the opposite end surfaces (e.g., ZrO 2 ). Reference numeral 12 designates an injection current I a injected into the first active layer 3a across the first and second electrodes 8 and 9, and reference numeral 13 designates an injection current I D injected into the second active layer 3b across the first and third electrodes 8 and 10. Reference numeral 14 designates a voltage V D produced between the third electrode 10b and the first electrode 8 and reference numeral 15 designates a separation groove for electrically separating the first active layer 3a from the second active layer 3b. In the first explanatory example, the first active layer 3a performs optical amplification in a wide wavelength band range, and the second active layer 3b performs optical amplification in a relatively narrow specified wavelength range. The former active region is referred to as a general amplifying region, while the latter active region is referred to as a wavelength detecting region. The operation of the first explanatory example will now be described. Light is amplified as the light travels in the optical amplifier device of this explanatory example. Prior to the initiation of the amplification operation, however, amounts of injection currents injected into the respective regions should be set to obtain a desired characteristic of the device. First, in the general amplifying region, the amount I a of the injection current is chosen so that the amplification wavelength range includes wavelength detecting region. In the wavelength detecting region, the gain spectral width would be widened if the injection current density thereinto is too much. Therefore, the current I D is injected into the wavelength detecting region so that the gain spectral width is, for example, 10nm. Under such conditions, when a light is input into the device through its end surface at the general amplifying region side, the light is amplified as traveling in the general amplifying region, and the light is further amplified in the following wavelength detecting region to be output through the opposite end surface of the device. When a constant current operation is effected in the wavelength detecting region, the detection voltage V D 14 exhibits the following three behaviors depending on the wavelength of the amplified light: In the case of a wavelength region I shown in Fig. 8 (i.e., the region between band gap wavelengths of the first active layer 3a and the second active layer 3b), the light amplified in the general amplifying region passes through the wavelength detecting region with little interaction, and the light is output from the device. As a result, the voltage V D 14 remains unchanged. In the case of a wavelength region II shown in Fig. 8, the light is amplified in the wavelength detecting region as well and being output from the device. Therefore, carriers therein are consumed, and the light functions to decrease the detection voltage V D because of the constant current operation. In the case of a wavelength region III shown in Fig. 8, light is absorbed to increase carriers in the wavelength detecting region, and hence the light acts to increase the voltage V D 14. Thus, in the first explanatory example, a wavelength range to which the wavelength of the amplified light belongs can be known from the voltage change in the wavelength detecting region. In the above explanation, the light is input at the general amplifying region side, but the same operation is achieved even if the light is input from the opposite side. However, since the voltage change due to carrier consumption in the wavelength detecting region increases as the intensity of light increases, the voltage change can be detected more readily when the light is input from the general amplifying region side. Fig. 9 shows a modification of the first explanatory example in which the voltage change is detectable even when a bi-directional light input operation is conducted. In Fig. 9, the same portions as those in Figs. 6 and 7 are designated by the same reference numerals. In the structure of Fig. 9, the wavelength detecting region is located at a central portion of the optical semiconductor amplifier device, and input light reaches the wavelength detecting region after being amplified by the first or second general amplifying regions into which an injection current I a1 121 or I a2 122 is injected, regardless of the input side of the light. Therefore, the amount of change in the detection voltage can be increased, from whichever side the light enters. The operation principle is the same as the explanatory example of Fig. 6. Further, the structure of the active layer forming the general amplifying region can be common to that forming the wavelength detecting region. In this case, injection current densities of the respective regions are made different from each other so that the same operation can be achieved. Examples of gain spectra of the respective regions are illustrated in Fig. 10. In this case, there exists no wavelength region I, as illustrated in Fig. 8, and only wavelength regions II (the detection voltage in the wavelength detecting region is lowered) and III (the detection voltage in the wavelength detecting region is increased) exist. Second explanatory example Fig. 11 shows a second explanatory example of the semiconductor optical amplifier device. Fig. 11 corresponds to Figs. 7 and 9 of the first explanatory example. In Fig. 11, the same portions as those in Figs. 7 and 9 are designated by the same reference numerals. In Fig. 11, reference numeral 3c designates a third active layer that is made up of a GaAs well whose thickness is 5nm. Reference numerals 10b and 10c respectively designate third and fourth electrodes composed of, for example, alloy of Au and Cr. Reference numerals 131 and 132 respectively designate injection currents I D1 and I D2 injected into the second and third active layers 3b and 3c, and reference numerals 151 and 152 respectively designate a voltage V D1 between first and third electrodes 8 and 10b and a voltage V D2 between first and fourth electrodes 8 and 10c. The amplifying area or region including the second active layer 3b will be referred to as a first wavelength detecting region, while the amplifying area including the third active layer 3c will be referred to as a second wavelength detecting region. The operation principle of the second explanatory example is substantially the same as that of the first explanatory example . In the second explanatory example, the first and second wavelength detecting regions are made up so that they react to different wavelengths. The amounts I D1 and I D2 of injection currents 131 and 132 injected into the respective wavelength detecting regions are adjusted so that gain spectra of the respective regions are shaped as illustrated in Fig. 12. Center wavelengths of the gain spectra in the first and second wavelength detecting regions are respectively set to 840nm and 855nm, and the widths of the gain spectra wherein the gain is positive are respectively set to 10nm. Further, the general amplifying region of the active layer 3a is fabricated so that its gain spectrum of a positive value extends over a wavelength range including the positive gain ranges of the first and second wavelength detecting regions. Thus, appropriate currents are injected into the respective regions to obtain those gain spectral characteristics, and the optical amplification operation is desirably performed. Depending on the wavelength range of the amplified light, the manner of voltage change alters in the first and second wavelength detecting regions. Fig. 13 is a table explaining the manner of changes of those voltages V D1 and V D2 that is dependent on the wavelength of the amplified light. In Fig. 13, a positive symbol (+) indicates a voltage change in an increasing direction, while a negative symbol (-) indicates a voltage change in a decreasing direction. A symbol zero (0) indicates a range wherein almost no voltage change exists. Thus, the wavelength range to which the amplified light belongs can be readily known by detecting the amounts of voltage changes in the both-end voltages V D1 151 and V D2 152 of the first and second wavelength detecting regions. The second explanatory example can be modified as shown in Fig. 9, i.e., the first and second wavelength detecting regions are disposed at a central portion of the optical semiconductor amplifier device, so that a large voltage change can be obtained in whichever direction the light may enter. In the second explanatory example, two wavelength detecting regions are arranged, but more than two wavelength detecting regions having different gain spectra may be formed. In such a case, the wavelength range of the amplified light can be detected more finely. In the above-discussed explanatory examples, the wavelength range of the amplified light can be effectively detected if the amplified light has only one wavelength. However, when lights having a plurality of wavelengths are simultaneously amplified in the amplifier device as in the case of optical amplification of wavelength division multiplexed signals, there is a possibility that the voltage changes due to plural signal lights in one wavelength detecting region may cancel each other, depending-on the relationship between the wavelength width of gain spectrum in this wavelength detecting range and the wavelength interval of the WDM signals. In this case, such problem can be solved by narrowing the wavelength width of gain spectrum in the wavelength detecting region. In order to narrow this wavelength width of a positive gain, however, the amount of the injection current injected into the wavelength detecting region has to be reduced, and hence the gain coefficient is entirely lowered. As a result, the amount of change in the detection both-end voltage may become insufficient. However, the wavelength selectivity (i.e., narrowness of wavelength width of the gain spectrum having a positive value) can be improved while maintaining a large voltage change in the both-end voltage, by using an active region, such as a quantum line, whose state density function is dense in a much narrower wavelength range. In the above-discussed explanatory examples, materials of GaAs series are basically used to fabricate the device, but materials of InP series and the like can also be used to make up the same device. Further, in the above explanatory examples, the waveguide of a buried-type structure is used for confinement, but any waveguide structure, such as ridge structure, stripe structure, separate confinement hetero-structure (SCH) and GRIN-SCH structure, which has been used in the prior art semiconductor lasers, can be employed. In the above explanatory examples, the examples including the bulk active layer and the quantum well active layer are shown except the example of Fig. 10, but the wavelength range in which the detection both-end voltage is decreased or changed can be greatly narrowed if, for example, an active layer of quantum line is used instead of the quantum well active layer. In the above description, an explanation has been given with regard to the wavelength of the input light. In the case of a digital signal, however, when the digital signal is modulated by a sinusoidal wave signal whose frequency is sufficiently lower than the transmission rate of the digital signal and the both-end voltage change in the wavelength detecting region is detected, a much weaker voltage change can be detected by measuring the voltage change synchronized with this modulation frequency. Such a system has been conventionally utilized in the APC control of optical semiconductor amplifier devices. This APC control will be described in explanatory examples explained below. Third explanatory example Fig. 14 shows an apparatus which includes the optical semiconductor amplifier device described as in the first and second explanatory examples. In Fig. 14, reference numeral 20 designates an optical semiconductor amplifier device illustrated in, for example, Fig. 9. Reference numeral 21 designates an incoming light, and reference numeral 22 designates an emerging light produced by amplifying the incoming light 21. Reference numeral 23 designates a control circuit, and preference numerals 24, 25 and 26 respectively designate first, second and third current sources. Further, similarly to Fig. 9, reference numeral 14 designates the voltage V D in the wavelength detecting region, reference numeral 13 designates the injection current I D injected into the wavelength detecting region, and reference numerals 121 and 122 respectively designate the injection currents I a1 and I a2 injected into the first and second general amplifying regions. The control circuit 23 detects the voltage change in the wavelength detecting region, and controls the amounts of the injection currents I a1 121 and I a2 122 by supplying control signals to the first and second sources 24 and 25. It is possible to construct an optical gate which is switched on and off depending on the input wavelength, by using such a structure. For this purpose, the injection currents I a1 , I a2 and I D are initially adjusted so that the gain spectral characteristic as illustrated in Fig. 8 is achieved. For instance, the injection current I a2 122 is reduced to zero when the light in the region II shown in Fig. 8 is input, and the flow of the injection current I a2 is caused when the light in the region III is input. Further, the wavelength of light which is actually desired to be amplified is set to a wavelength in the region III. Thus, the optical switch that achieves the switching operation in response to the wavelength of an input light can be constructed. In this optical switch, the light in the region II is off-controlled, while the light in the region III is on-controlled. The above explanation is only an example, and the wavelengths in the regions I, II and III can be respectively assigned to switched-off, switched-on and signal lights by properly controlling the injection currents. The number of such combination is six (6=3!). A higher control is possible by using the structure of the second explanatory example that can treat a plurality of wavelengths. For example, the device of the second explanatory example can be built up to the structure shown in Fig. 14. As explained in the second explanatory example, five kinds of states can be distinguished from each other in such a structure. The operation will be described with reference to Fig. 15. Three wavelengths of 840nm, 855nm and 848nm are chosen as wavelengths for switching the device. The injection current into the first general amplifying region at the input side is set so that the gain spectral characteristic of the first state indicated in Fig. 15 can be obtained. In this state, if, for example, a light of 855nm is input, a current is injected into the second general amplifying region at the output side so that the gain spectral characteristic of the first state is achieved. Then, if a light of 848nm is input, the second general amplifying region is changed to the second state by properly controlling the current injected thereinto, and the current injection into the second general amplifying region is terminated if a light of 840nm is input. The control circuit 23 is set to achieve such a control. For example, if wavelengths used in communications and the like are distributed in the regions I and II indicated in Fig. 15, it is possible to transmit a light in a predetermined wavelength range through the device by using an external light signal. In the above case, when a li-ght of 855nm enters the device, signals of wavelengths in the regions I and II are amplified and transmitted through the device. When a light of 848nm enters the device, only signals of wavelengths in the region I are amplified and transmitted through the device, while those in the region II is stopped therein. Further, when a light of 840nm enters the device, signals of wavelengths in the regions I and II are absorbed in the device and switched off. Fourth explanatory example Fig. 16 shows a fourth explanatory example of the semiconductor optical amplifier device. Fig. 17 is an A-A ' cross-sectional view of Fig. 16. The basic structure of the fourth explanatory example is the same as the first explantory example of Fig. 6. In Figs. 16 and 17, reference numeral 31 designates a semiconductor substrate of n-type GaAs. Reference numeral 32 designates a first cladding layer of n-type Al 0.3 Ga 0.7 As. Reference numeral 33 designates an active layer of undoped GaAs. Reference numeral 34 designates a second cladding layer of p-type Al 0.3 Ga 0.7 As. Reference numeral 35 designates a cap layer of p-GaAs. Reference numeral 36 designates a first burying layer of p-type Al 0.4 Ga 0.6 As, and reference numeral 37 designates a second burying layer of n-type Al 0.4 Ga 0.6 As. Reference numeral 38 designates a first electrode of an alloy of Au and Ge. Reference numerals 39 and 40 designate second and third electrodes of an alloy of Au and Cr. Reference numeral 41 designates an antireflection layer of ZrO 2 deposited on the input and output end surfaces of the optical semiconductor amplifier device. Reference numerals 42 and 43 respectively designate injection currents I a and I D injected into the second and third electrodes 39 and 40. Reference numeral 44 designates a voltage between the first electrode 38 and the third electrode 40. Reference numeral 45 designates a groove for electrically separating a portion or regionI through which a current flows between the first and second electrodes 38 and 39 and a portion or region II through which a current flows between the first and third electrodes 38 and 40. Typical sizes of the fourth explanatory example are as follows: The thickness of the first cladding layer 32 is 1.5 µm, the thickness of the active layer 33 is 0.1 µm, the thickness of the second cladding layer 34 is 1.5 µm, the thickness of the cap layer 35 is 0.5 µm, the width of the active layer 33 is approximately 1.5 µm the length of the region I is approximately 200 µm, the length of the region II is approximately 50 µm, and the depth of the separating groove 45 is approximately 50 µm. The optical semiconductor amplifier device having such a structure can be readily fabricated by conducting well-known processing methods, such as photolithography, dry etching and deposition, upon an original wafer. The original wafer is formed by layering thin layers on a semiconductor substrate, utilizing conventional crystal growth methods such as molecular beam epitaxy (MBE), metal organic-chemical vapor deposition (MO-CVD) and liquid phase epitaxy (LPE). The operation of this explanatory example will be described. Initially, the operation of the optical semiconductor amplifier device shown in Figs. 16 and 17 will be described. In Fig. 17, when a light signal is input from the left side, through a coupling means such as a lens, into a waveguide composed of the active layer 33, the first cladding layer 32, the second cladding layer 34 and the burying layers 36 and 37, the light advances while being amplified in the amplifying portion or region I into which the injection current I a 42 is injected. The thus amplified light further advances into the active region of the regionII where the population inversion is created by the injection current I D 43. Then the light is further amplified and output through the end surface at the right side of the region II. The basic operation is as described above. Here, the gain spectral characteristic as illustrated in Fig. 18 can be achieved by controlling the current I a 42 flowing into the region I and the current I D 43 flowing into the region II. That is, the gain spectral characteristic of the regionII can be set in such a manner that its peak value and full width at half maximum are respectively smaller and narrower than those of the region I. In the case of the fourth explanatory example, since the active layer 33 is formed with a bulk crystal, this situation can be attained by making the current density in the region II smaller than that in the region I. Under this condition, when a light signal is input into the semiconductor amplifier device of this explanatory example, the light is amplified in the region I and the amplified light input into the region II causes carriers in the active region of the region II to be recombined. At this time, since the injection current density in the region II is small, the recombination of carriers is caused by the amplified light signal and hence the detection both-end voltage V D 44 is varied. Although the injection current densities into the regions I and II may be equal to each other, the amount of voltage change can be increased by making these current densities different. Fig. 19 shows the structure for achieving the APC operation (explained in the description of the prior art) in the fourth explanatory example. In Fig. 19, reference numeral 46 designates an incoming light, and reference numeral 47 designates an output light. Reference numeral 48 designates a control circuit, and reference numeral 49 designates an optical semiconductor amplifier device. Reference numeral 50 designates a source for injecting the injection current I a 42 into the region I, and reference numeral 51 designates a source for injecting the injection current I D 43 into the region II. Reference numeral 52 designates a control signal from the control circuit 48 which adjusts the amount of the current I a 42 from the source 50, and reference numeral 53 designates a control signal for adjusting the amount of the current I D 43 from the source 51. The zero level of the input light 46 is modulated by using sinusoidal wave modulation as well as a digital signal for communication. The frequency of the sinusoidal wave is much slower than the frequency of the digital signal. The control circuit 48 separates only this sinusoidal wave component from the detection voltage V D , and the voltage change in the region II can be known. The intensity degree of light incident on the region II can be learned from the amount of the voltage change. Namely, the voltage change becomes great as the intensity of input light is strong. Therefore, the control circuit 48 supplies the control signal 52 to the source 50 to adjust the amount of the current I a 42 flowing into the region I so that the voltage change in the region II is maintained at a predetermined constant value. Thus, the APC operation can be achieved. In this explanatory example, the structure in which the buried structure and the active layer of a bulk crystal are used is adopted as a basic semicondoctor laser structure. The waveguide structure, however, is not limited to this structure, but any structure used in prior art semiconductor lasers, such as ridge, stripe, SCH, GRIN-SCH structures, can be utilized. Further, multiple quantum well (MQW), single quantum well, quantum line and quantum box structures can also be used in the active region. In this explanatory example, the antireflection layers are deposited on the opposite end surfaces and a so-called traveling wave type optical amplifier device is adopted. However, a structure without antireflection layers can be adopted. Fifth explanatory example Fig. 20 shows a fifth explanatory example. Fig. 20 is a view corresponding to Fig. 17 of the fourth explanatory example. In Fig. 20, the same portions as those in the fourth explanatory example are designated by the same reference numerals. Typical sizes of the fifth explanatory example are as follows: The thickness of the first cladding layer 32 is 1.5 µm, the thickness of the active layer 33 is 0.1 µm, the thickness of the second cladding layer 34 is 1.5 µm, the thickness of the cap layer 35 is 0.5 µm, the width of the active layer 33 is approximately 1.5 µm, the lengths of the regions I -1 and I -2 are respectively approximately 100 µm, the length of the region II is approximately 50 µm, and the depth of the separating groove 45 is approximately 50 µm. The fifth explanatory example differs from the fourth explanatory example in that the region II is located at a central portion of the semiconductor amplifier device. The region I of the fourth explanatory example is thus divided into two portions, and these portions are referred to as regions I -1 and I -2. Currents I a1 141 and I a2 142 are respectively injected into the respective regions I -1 and I-2. The structure of Fig. 20 facilitates a bi-directional optical-amplification operation. The injection currents I a1 141, I a2 142 and I D 43 are set so that the regionsI I -1 and I -2 have gain spectral characteristics of the general amplifying region in Fig. 8 and that the region II has the gain spectral characteristic of the wavelength detecting region in Fig. 8. In this state, when a light signal is input from the left side of Fig. 20, the light is amplified in the region I -1 and changes the voltage V D 44 in the region II. The amplified light signal is further amplified in the region I -2 and output from the right side of the device. An input light incident from the right side is amplified in the region I -2 and changes the voltage V D 44 while being amplified. The light signal is further amplified in the region I -1 and output from the left side. Thus, lights traveling in both opposite directions are amplified, and then their light intensities can bedetected in the regionII as the voltage change. Based on this voltage change, the control circuit 48 as shown in Fig. 19 adjusts the currents I a1 and I a2 flowing into the regions I-1 and I-2, and hence the APC operation is achieved. Sixth explanatory example Fig. 21 shows a sixth explanatory example . Fig. 21 is a view which corresponds to Fig. 17 of the fourth explanatory example shown in Fig. 16. In Fig. 21, the same portions as those in the fourth explanatory example are designated by the same reference numerals. In the sixth explanatory example, regions II-1 and II-2 for detecting the voltage change due to the intensity of light incident thereon are arranged at input and output side portions of the device. The fourth explanatory example includes only one region II, but this region is divided into two portions in the sixth explanatory example. Therefore, the current I D 43 and the detection both-end voltage V D 44 in the fourth explanatory example are respectively indicated by injection currents I D1 143 and I D2 144 and detection voltages V D1 145 and V D2 146 in Fig. 21, corresponding to the regions II-1 and II-2. Typical sizes of the sixth explanatory example are as follows: The thickness of the first cladding layer 32 is 1.5 µm, the thickness of the active layer 33 is 0.1µm, the thickness of the second cladding layer 34 is 1.5µm, the thickness of the cap layer 35 is 0.5µm, the width of the active layer 33 is approximately 1 .5 µm, the length of the region I is approximately 200 µm, the lengths of the region II-1 and II -2 are respectively approximately 50 µ m, and the depth of the separating groove 45 is approximately 50 µm. Fig. 22 shows a structural example to be used at the time of bi-directional optical amplification. Fig. 22 corresponds to Fig. 19 of the fourth explanatory example. In Fig. 22, reference numeral 54 designates an optical semiconductor amplifier device as shown in Fig. 21. Reference numeral 161 designates an input light input into the optical amplifier device 54 from the left side, and reference numeral 162 designates an input light input from the right side. Reference numeral 171 designates an output light originated from the amplified input light 161, and reference numeral 172 designates an output light corresponding to the input light 162. Reference numerals 65, 66 and 67 respectively designate current sources for injecting injection currents I D1 143, I a 42 and I D2 144 into the regions II-1, I and II-2. Reference numeral 58 designates a control circuit for supplying a control signal to the current source 66 so that the current I a 42 injected into the region I is regulated based on the detection of both-end voltages V D1 145 and V D2 146 which are input into the control circuit 58. The operation of the sixth explanatory example will be described. First, a uni-directional light input operation will be explained. The modulation manner of the signal is the same as the fourth explanatory example. As an example, a case where the input light 161 is amplified and the output light 171 is output from the optical semiconductor amplifier device 54 will be described. When the input light 161 is input into the optical semiconductor amplifier device 54, the light is amplified in the region II -1, further amplified in the region I and changes the detection voltage V D2 146 while still further amplified in the region II-2. Then the light emerges as the output light 171. The control circuit 58 monitors the change in the detection voltage V D2 146, and supplies the control signal to the source 66 to adjust the injection current I a 42 so that a desired voltage change is obtained in the region II -2. When the light is amplified in a reverse direction, the control circuit 58 controls the injection current I a 42 based on the voltage change appearing in the region II-1. Under general circumstances of its use, the input lights 161 and 162 rarely have the same intensity, and it is difficult to cause the respective input lights to enter the optical amplifier device 54 with the same coupling efficiency. As a result, at the time of bi-directional amplification, the changes in the detection voltages V D1 145 and V D2 146 are different from each other. At this time, it is difficult to achieve the APC operation with respect to the bi-directional input lights. This situation is the same as with the prior art amplifier, but not the only drawback for the sixth explanatory example. In the sixth explanatory example, the AGC (control for maintaining the amplification factor at a constant value) operation is also feasible as well as the APC operation, since the regions for detecting the voltage change are arranged at both input and output portions. For example, in the case where-light is input from the left side of Fig. 21 and output from the right, the voltage changes V D1 145 and V D2 146 due to the input light and the amplified light are obtainable. Therefore, the AGC operation can be achieved by controlling the injection current I a 42 to keep a value of V D1 /V D2 constant. Such AGC operation is also effective at the time of the bi-directional operation, as well as the time of the uni-directional operation. The above-mentioned modulation frequencies (the frequency of a sinusoidal wave signal superposed upon the digital signal) are made different between the input signals input in both opposite directions, and the two wavelength detecting regions respectively detect the modulated signals. Thus, the AGC operation can be conducted in the same manner as the uni-directional AGC operation. As descibed above, the APC operation of the bi-directional operation is difficult in the structure shown in Figs. 21 and 22, but the APC operation is preferably achieved also for the bi-directional operation, by modifying the structure as shown in Fig. 23. In Fig. 23, the same members as those in Fig. 22 are designated by the same reference numerals. In Fig. 23, reference numeral 101 designates a control circuit, and reference numeral 102 designates a round-tip optical fiber. Reference numeral 103 designates a mechanism for finely adjusting the optical fiber 102 in up and down, right and left and forward and rearward directions. The mechanism 103 is composed of, for example, an XYZ adjusting mechanism which is activated by piezoelectric elements. The adjustment is readily conducted in a manner such that the amounts of the first and second input lights 104 and 105 are equalized with each other. Under such condition, lights are input from opposite directions, and the voltage changes V D1 145 and V D2 146 due to these lights are detected by the control circuit 101. In the case of V D1 ≠ V D2 , this result shows that input coupling efficiencies at both opposite end surfaces are different from each other. Therefore, the control signal is supplied to the XYZ adjusting mechanism 103 for finely adjusting one of the round-tip optical fibers 102, so that V D1 =V D2 is attained. Further, when the intensity of the first input light 104 is different from the intensity of the second input light 105, the XYZ adjusting mechanism 103 is controlled, taking into consideration the amplification factor. Thus, a still higher control is obtainable by using information obtained from the sixth explanatory example of Fig. 21, and a stable optical amplification operation is realized. Seventh explanatory example Figs. 24, 25 and 26 show the structure of a seventh explanatory example. Fig. 25 is a B-B' cross-sectional view of Fig. 24, and Fig. 26 is an A-A' cross-sectional view of Fig. 24. In Figs. 24, 25 and 26, reference numeral 71 designates a semiconductor substrate of n-type GaAs. Reference numeral 72 designates a first cladding layer of n-type Al 0.5 Ga 0.5 As. Reference numeral 73 designates a first active layer of undoped GaAs, and reference numeral 74 designates a second active layer of undoped Al 0.02 Ga 0.98 As. Reference numeral 75 designates a second cladding layer of p-type Al 0.5 Ga 0.5 As, and reference numeral 76 designates a cap layer of p-type GaAs. Reference numeral 77 designates a first electrode of an alloy of Au and Ge deposited on the bottom of the substrate 71, reference numeral 78 designates a second electrode of an alloy of Au and Cr, and reference numeral 79 designates a third electrode of an alloy of Au and Cr. Reference numeral 80 designates an antireflection film formed on opposite end surfaces (e.g., consisting of Zr0 2 ). Reference numeral 81 designates an insulating layer of Si 3 N 4 . Reference numeral 82 designates an injection current I a injected into the first active layer 73 interposed between the first and second electrodes 77 and 78, and reference numeral 83 designates an injection current I D injected into the second active layer 74 interposed between the first and third electrodes 77 and 79. Reference numeral 84 designates a detection both-end voltage V D produced between the first electrode 77 and the third electrode 79 and reference numeral 85 designates a separating groove for reducing electric interference between a first region I interposed between the first electrode 77 and the second electrode 78 and a second region II interposed between the first electrode 77 and the third electrode 79. The groove 85 vertically extends to halfway of the second cladding layer 75 through the cap layer 76. Typical sizes of the seventh explanatory example are as follows: The thickness of the first cladding layer 72 is 1.5 µm, the thickness of the first active layer 73 is 0.1 µm, the thickness of the second active layer 74 is 0.1 µm, the thickness of the second cladding layer 75 is 1.5 µm, the thickness of the cap layer 76 is 0.5 µm, the length of the region I is approximately 200 µm, the length of the region II is approximately 50µm, and the depth of the separating groove 85 is approximately 50 µm. As seen from Figs. 24 and 25, the ridge waveguide structure is used in this explanatory example. The width of the ridge structure is 2µm, and the height of the ridge structure is approximately 1.8µm. Thus, the ridge structure is formed so that the transverse mode of the waveguide is a single mode. The operation of this explanatory example will be described. The adjustment of injection currents will be explained before explaining the behavior of light. Since band gap energies of crystals forming the active layers 73 and 74 are different between the regions I and II, gain spectral characteristics shown in Fig. 27 can be obtained by appropriately controlling the amounts of injection currents 82 and 83. Namely, the gain peak wavelength of the region I can be positioned at a longer wavelength side than the gain peak wavelength of the region II. -This is attained by making the band gap energy of the regionII, which is the voltage detecting region, larger than that of the region I which is the general amplifying region. The basic operation at the time when light is input into the optical amplifier device of this explanatory example is the same as that of the fourth explanatory example. The light signal input through the end surface at the side of the region I travels while being amplified by the first active layer 73, and then enters the region II. The amplified light causes the change in the detection voltage V D 84 while being further amplified in the region II, and is output from the end surface at the side of the region II. Therefore, as shown in Fig. 19 of the fourth explanatory example, the APC operation is achieved if the control circuit fulfills the function that adjusts the amount of the injection current I a 82 based on the change in the detection both-end voltage V D 84. In this case, the change in the detection voltage V D 84 can be readily and stably detected if, similarly to the fourth explanatory example, the light signal (e.g., digital signal) is modulated by a sinusoidal wave signal which varies much more gently than the transmitted light signal. The effect due to the structure in which the band gap energies of the active layers are made different between the regions I and II as in the seventh explanatory example will be described. When the light travels in the active region and is amplified, carriers are recombined to cause the voltage change therein. At this time, carriers consumed by light near to the band edge can be quickly supplemented by carriers at a higher energy side. Therefore, the saturation output for the light having an energy near to the band edge is greater than others. In other words, the light having energy near to the band edge (light at a longer wavelength side) can create a greater voltage change. Namely, a maximum value of the voltage change generated in the active layer of the same composition by the same injection carrier density is dependent on the wavelength of light, and the light at a longer wavelength side can cause a larger voltage change. As seen from Fig. 27, the wavelength of the signal light lies at a longer wavelength side of the gain spectrum of the wavelength detecting region or region II in the seventh explanatory example, while the wavelength of the signal light lies at a shorter wavelength side of the gain spectrum of the wavelength detecting region in the fourth explanatory example as illustrated in Fig. 18. Therefore, as compared with the fourth explanatory example, the structure of the seventh explanatory example can give a voltage change having a much better linearity at the time of high-amplification operation. Thus, the APC operation can be preferably achieved. In the seventh explanatory example, the ridge waveguide structure is used for confinement, but any waveguide structure, such as a buried-type structure, stripe structure, SCH structure and GRIN-SCH structure, which has been used in the prior art semiconductor lasers, can be employed. Further, a bulk crystal is used in the active layer of this explanatory example, but MQW, SQW, quantum box, quantum line or the like can also be used. Since the fifth and sixth explanatory examples are modifications of the fourth , the seventh explanatory example can also be used in a structural form of the fifth or sixth explanatory example. As a result thereof, an optical semiconductor amplifier device can be realized which has features of the seventh explanatory example as well as features of the fifth or sixth explanatory example. In the fourth to seventh explanatory examples, materials of a GaAs series are used, but the materials are not limited to the GaAs series. Any material that can construct the semiconductor laser, such as InP series, can be used. Further, in the above explanatory examples, a slit form is adopted as a method for electrically separating a plurality of electrodes, but the separating method is not limited thereto. The separation can be achieved by forming a high-resistance region by an ion-injection method or the like. Eighth explanatory example Fig. 28 shows an optical transmission system in which the semiconductor optical amplifier device or apparatus of any one of the above explanatory examples is used. In Fig. 28, reference numeral 501 designates an optical transmitter, reference numeral 502 designates a semiconductor light amplifying apparatus in which the semiconductor optical amplifier device of the present invention is contained, reference numeral 503 designates an optical receiver and reference numeral 504 designates an optical fiber. The optical transmitter 501 is constructed as shown in Fig. 35. In Fig. 35, reference numeral 522 designates a semiconductor laser (LD) for transmission, reference numeral 523 designates a semiconductor optical amplifier device of the present invention and reference numeral 524 designates a control circuit. A source for supplying an injection current into both the semiconductor laser 522 and the semiconductor optical amplifier device 523 is needed, but in this case this source is contained in the control circuit 524. The control circuit 524 supplies a signal from a terminal equipment to the semiconductor laser 522 to generate an optical signal and controls it for achieving the APC operation of the semiconductor optical amplifier device 523. The optical signal from the semiconductor laser 522 is amplified by the semiconductor optical amplifier device 523 and then is input into the optical fiber 504. In this case, the semiconductor optical amplifier device 523 is used as a so-called booster amplifier. This amplifier 523 will suffice if it is adjusted to the entire optical transmission system, and in this case only one amplifier is used as shown in Fig. 35. Two or more amplifiers can be used. Naturally, no booster amplifiers may be used, but only if the optical transmitter 501 functions well. The optical receiver 503 is constructed as shown in Fig. 36. In Fig. 36, reference numeral 523 designates the semiconductor optical amplifier device of the present invention, reference numeral 525 designates a control circuit and reference numeral 526 designates a photodetector (PD). An optical signal from the optical fiber 504 is APC-amplified by the semiconductor optical amplifier device 523 and is converted to an electric signal by the photodetector 526. The control circuit 525 performs the APC control of the semiconductor optical amplifier device 523 and shapes the electric signal from the photodetector 526 to transmit this shaped signal to desired terminal equipment. In the optical receiver 503 shown in Fig. 36, only one semiconductor optical amplifier device 523 is used as a pre-amplifier. Two or more pre-amplifiers can be used, or no pre-amplifiers may be used, but only if the optical receiver 503 functions as such. The semiconductor light amplifying apparatus 502 can be constructed as shown in Fig. 34 by using a semiconductor optical amplifier device . In Fig. 34, reference numeral 518 designates a round-tip fiber, reference numeral 520 designates a control circuit and reference numeral 521 designates a semiconductor optical amplifier device . The control circuit 520 is indicated in a form including the control circuit 23 of the above explanatory examples, a power source and so forth, and performs the control of APC amplification. The optical signal from the optical fiber 504 is coupled to the waveguide of the semiconductor optical amplifier device 521 through the round-tip fiber 518. The optical signal input into the waveguide of the amplifier device 521 is APC-amplified. and its output light is again output into the round-tip fiber 518 to be coupled to the optical fiber 504 of the transmission line. The round-tip fiber 518 is used to effectively couple the light from the optical fiber 504 to the waveguide of the semiconductor optical amplifier device 521 and to effectively couple the output light from the waveguide to the optical fiber 504. There are other ways such as a lens for enhancing such coupling. Further, the semiconductor light amplifying apparatus 502 will function as well even if the tip of the fiber is not rounded, though the coupling efficiency is reduced. The operation of the optical transmission system as shown in Fig. 28 will be described. In a case where one terminal equipment is connected to the optical transmitter 501, that is, in a case of a uni-directional communication between the terminal equipment in a one to one or one to N (N is a given integer) form, any communication access system can be adopted and a signal can be transmitted in accordance with any procedure and interval. In the case of a uni-directional N to N communication, a time division multiple access (TDMA), for example, can be used. This is a communication system in which a signal transmission line is divided with respect to time to provide a plurality of transmission lines. In this case, the control circuit 525 in the optical receiver 503 needs to have a function that judges the address information of the received signal and supplies a desired signal to a desired terminal equipment. The control circuit 524 in the optical transmitter 501 needs to have a function that attaches an address signal to signals received from the terminal equipments and drives the semiconductor laser 522 in accordance with its signal system. Ninth explanatory example Fig. 29 shows a bi-directional optical transmission system in which a semiconductor optical amplifier device of the above explanatory examples is used. In Fig. 29, reference numeral 505 designates an optical transmitter-receiver, reference numeral 502 designates a semiconductor optical amplifier device having the same structure as that shown in Fig. 28 and reference numeral 504 designates an optical fiber. The optical transmitter-receiver 505 has a structure in which the optical transmitter 501 and the receiver 503 of the eighth explanatory example, for example, are combined. Namely, the output of the optical transmitter 501 and the input of the optical receiver 503 are combined into one by an optical branching-combining device. Portions of the optical transmitter and receiver in the optical transmitter-receiver 505 are as described in the eighth explanatory example. Further, the semiconductor light amplifying apparatus 502 is identical with that in the eighth explanatory example. Therefore, explanations of those portions are omitted in this explanatory example. As for the communication access system, that of the eighth explanatory example can be applied with respect to respective directions. Tenth explanatory example Fig. 30 shows a uni-directional N to N wavelength division multiplexing transmission system in which a semiconductor optical amplifier device of the above explanatory exmaples is used. In Fig. 30, reference numerals 506-1∼506-N repectively designate optical transmitters, reference numeral 508 designates an optical combining device, reference numeral 509 designates an optical branching device and reference numerals 507-1∼507-N respectively designate optical receivers. Further, similarly to other explanatory examples, reference numeral 504 designates an optical fiber and reference numeral 502 designates a semiconductor light amplifying apparatus. The optical transmitters 506-1∼506-N respectively have structures as shown in Fig. 35. Semiconductor lasers 522 of the respective transmitters 506-1∼506-N respectively oscillate at different wavelengths. The operation is the same as that described in the eighth explanatory example. The optical receivers 507-1∼507-N respectively have structures as shown, for example, in Fig. 37. In Fig 37, reference numeral 526 designates a photodetector, reference numeral 527 designates a control circuit, reference numeral 528 designates an optical band-pass filter and reference numeral 523 designates a semiconductor optical amplifier device (this is used as a pre-amplifier). The optical band-pass filter 528 is adjusted so that only a wavelength of the optical transmitter 506-k is transmitted therethrough which corresponds to the optical receiver 507-k containing the optical band-pass filter 528. Thus, light signals of a plurality of wavelengths are transmitted through the transmission line from the optical transmitter 506-i to the optical receiver 507-i, and hence a plurality of transmission lines are equivalently formed. This transmission line is constructed by one transmission optical fiber 504 and the semiconductor light amplifying apparatus 502. The transmission access system of a transmission line of one wavelength constructed between the optical transmitter 506-i and the optical receiver 506-i is the same as that in the eighth explanatory example. Further, in Fig. 30, the optical band-pass filter 528 in the optical receiver 507 can be omitted by replacing the optical branching device 509 by an optical demultiplexing device. Eleventh explanatory example Fig. 31 shows a loop type optical LAN in which a semiconductor optical amplifier device of the above explanatory examples is used. In Fig. 31, reference numerals 511-1∼511-4 respectively designate reproduction repeaters, and reference numeral 512 designates a control office. Reference numerals 513-1∼513-4 respectively designate terminal equipments, reference numeral 504 designates an optical fiber, and reference numeral 502 designates a semiconductor light amplifying apparatus (explained in the eighth explanatory example). A conventional access system such as a token ring system can be utilized for the operation of the loop type LAN. In this explanatory example, the semiconductor light amplifying apparatus 502, using the semiconductor optical amplifier device as described above, is used between the repeaters 511 as a booster amplifier, so that the reproduction repeater 511-i can always receive the optical signal transmitted from the reproduction repeater 511-(i-1) at a constant power. The reproduction repeater 511 generally includes a photodetector (O/E converter), semiconductor laser (E/O converter) and an electric reproduction repeater. Also in this reproduction repeater 511, the semiconductor optical amplifier device as described above can be used as a pre-amplifier to be disposed before the photodetector or as a booster amplifier for the semiconductor laser. An input power into the photodetector and an output power from the repeater 511 can be made more stable than those obtained when the semiconductor optical amplifier device as described above is not used, by using this semiconductor optical amplifier device in its APC operation in the repeater 511. One semiconductor light amplifying apparatus 502 is used between the reproduction repeaters 511, but two or more than two amplifying apparatuses can be used when necessary. Twelfth explanatory example Fig. 32 shows an explanatory example of a bus type optical LAN in which a semiconductor optical amplifier device of the above explanatory examples is used. In Fig. 32, reference numeral 514 designates a light branching-combining device, reference numeral 515 designates an optical transceiver, reference numeral 516 designates terminal equipment, reference numeral 502 designates a semiconductor light amplifying apparatus (this is explained in the eighth explanatory example, and reference numeral 504 designates an optical fiber. The optical transceiver 515 has the structure as shown in Fig. 38. In Fig. 38, reference numeral 529 designates a control circuit, reference numeral 530 designates a semiconductor laser, reference numeral 532 designates a photodetector, reference numeral 533 designates a light branching-combining device and reference numeral 523 designates a semiconductor optical amplifier device. In this bus type optical LAN, a CSMA/CD (carrier sense multiple access with collision detection) system, for example, is used as an access system. A token passing, TDMA and so forth can also be used. A communication demand from the terminal equipment 516 is transmitted to the optical transceiver 515, and the control circuit 529 in the transceiver 515 drives the semiconductor laser 530 in accordance with the communication system of the optical LAN to transmit optical pulses (optical digital signals). The transmitted optical signal is APC-amplified by the semiconductor optical amplifier device 523, transmitted to the light branching-combining device 514 through the light branching-combining device 533 and the signal is transmitted to the optical fiber 504. The semiconductor light amplifying apparatus 502 is arranged in some places on the optical fiber 504, and the optical signal is APC-amplified therein. On the other hand, in a signal receiving procedure, the light signal transmitted through the optical fiber 504 is branched by the light branching-combining device 514 to be input into the optical transceiver 515. The light signal input into the optical transceiver 515 is branched by the light branching-combining device 533, APC-amplified by the semiconductor optical amplifier device 523 and is received by the photodetector 532 to be converted to an electric signal. The shaping and reproduction of the electric signal is controlled in the control circuit 529, and the signal is supplied to the terminal equipment 516. In this explanatory example, the semiconductor optical amplifier device 523 of the present invention in the optical transceiver 515 is used as a booster amplifier and pre-amplifier. A plurality of the amplifier devices can be used, or no amplifier devices can be used as well. Further, at least one semiconductor light amplifying apparatus 502 on the optical fiber 504 can be disposed in any place between the light branching-combining devices 514, or the amplifying apparatus 502 can be disposed in any manner. Thirteenth explanatory example Fig. 33 shows an explanatory example of a communication system in which a light branching-combining device 517, containing an optical amplifier device for attaining an amplification function is used in place of the light branching-combining device 514 on the optical fiber 504 of the twelfth explanatory example. The light branching-combining device 517 with the optical amplifier device built in can be constructed in a manner as shown in Fig. 39. As shown in Fig. 39, the semiconductor optical amplifier devices 523 are disposed in respective input portions (three places ) of a light branching-combining device 534. The communication or access system is the same as that of the twelfth explanatory example. In this explanatory example, the semiconductor light amplifying apparatus 502 can be disposed on the optical fiber 504 between the light branching-combining devices 517 containing the semiconductor optical amplifier device when necessary. In the eighth to thirteenth explanatory examples, the semiconductor optical amplifier device of the fourth to seventh explanatory examples is used in the optical communication system. However, this amplifier device can be used in any optical communication system in which light is used as an information transmitting medium. As described in the semiconductor optical amplifier devices of the foregoing explanatory examples, a portion in which a great both-end voltage change occurs at the time of optical amplification is separated from other portions, so that the voltage change can be detected with a greater value than the prior art devices. As a result, the APC operation, for example, can be more readily controlled than the prior art devices. Further, there are arranged, in the above-discussed semiconductor optical amplifier devices, an active region that has a gain over a relatively narrow wavelength range and an active region that has a gain over a relatively wide wavelength range. The both-end voltage change in the former active region at the time of optical amplification is detected to judge whether wavelengths of the amplified light contain a predetermined wavelength. Therefore, the wavelength range of the amplified light can be known by the same optical system as the prior art, without causing any loss to a light signal and increasing the number of optical components. The detection result obtained from the both-end voltage change due to the amplified light can be used for various controls. First Embodiment Fig. 40 shows a first embodiment of the present invention which is directed to a tunable filter device. In Fig. 40, reference numeral 201 designates a tunable band pass filter, and reference numeral 202 designates a semiconductor optical amplifier device. Reference numeral 203 designates a control circuit, and reference numeral 204 designates a wavelength-multiplexed input light signal. Reference numeral 205 designates an output light from the tunable bandpass filter 201, and reference numeral 206 designates an amplified output light from the semiconductor optical amplifier device 202. Reference numeral 207 designates a source for driving the semiconductor optical amplifier device 202, and reference numeral 208 designates a source for controlling a transmission wavelength of the tunable band pass filter 201. The structure shown in Fig. 40 corresponds to the prior art wavelength selecting portion (WS portion) 901 shown in Fig. 4. Structures and operations of the respective components will be described before explaining the operation of the first embodiment. A so-called phase-shift type (its grating includes a phase transient area for improving a dynamic single mode characteristic) DFB-LD (distributed feedback-laser diode) filter can be used as the tunable band pass filter 201. The phase shift type DFB-LD filter may be what is shown in Fig. 8 of "Progress in Semiconductor Tunable Wavelength Filters" disclosed in Electronics Information Communication Academy Journal C-1, Vol. J 73-C-I, No. 5 (pp. 347-353, May, 1990) by T. Numai. The phase-shift-controlled DFB LD filter shown in Fig. 8 of this article includes two active regions respectively having active layers and a phase control region interposed therebetween. Those regions are arranged in a resonance direction. A grating is formed in the filter. A light at a predetermined wavelength of a light incident on one end surface o-f the filter is diffracted by the grating and causes a laser resonance to be output through the other end surface of the filter. When the amount of an injected current into the phase control region is changed, the refractive index of the phase control region varies and the phase of the light diffracted by the grating is shifted. The resonance mode is changed in accordance with this phase shift, so that the wavelength of the light emerging from the filter alters. In such a tunable bandpass filter, the transmission peak wavelength can be changed within a range of 0,95 nm (9.5Å) by properly attaining the combination of a current injected into the active region and a current injected into the phase control or adjusting region. As the semiconductor optical amplifier device 202, a travelling wave type semiconductor optical amplifier device (TWA) in which antireflection films are deposited on end surfaces of an ordinary semiconductor laser structure can be used. In this embodiment, a semiconductor laser of 1.5 µm wavelength band is a basic laser structure. The semiconductor optical amplifier device 202 has the feature that a voltage between both ends of its junction (bo-th-end voltage) varies when an input light enters the device 202 in a constant-current operative state and the amplification operation is performed. The change in the both-end voltage can be measured more effectively as the amplification factor increases. This embodiment also utilizes this phenomenon. The operation of the first embodiment will be described. First, details of a wavelength-multiplexed input signal carrying information will be described. The details of the wavelength-multiplexed signal are set in accordance with the communication system and so forth, but for readily explaining the operation of this embodiment, the wavelength-multiplexed signal consists of optical digital signals (P P ) having respective DC biases (P DC ) depending on respective wavelengths, as shown in Fig. 41. Five wavelengths λ 1 , λ 2 , λ 3 , λ 4 and λ 5 are multiplexed with an interval of 0.00025 µm from λ 1 =1.5525 µm, as shown in Fig. 42. When the DFB filter 201 is used, all the wavelengths used for optical communication are initially in a range of the stop band of the DFB filter 201. The input signal 204 is input into the tunable band pass filter 201, and the output light 205 is obtained in accordance with the transmission characteristic of the tunable band pass filter 201 which is determined hy the operative condition at that time. The output light 205 is input into the optical amplifier device 202, and is amplified to be an amplified output light 206. At this time, a current Iλ from the source 208 that controls the transmission range of the tunable band pass filter 201 is set, for example, so that the transmission range is gradually scanned from a shorter wavelength side to a longer wavelength side. Thereby, as the output light 205, the input light signals 204 of plural wavelengths shown in Fig. 42 serially appear from the shorter wavelength side. The above operation will be explained with reference to Figs. 43, 44 and 45. Fig. 43 shows that the transmission wavelength of the tunable band pass filter 201 is changed with time from the shorter wavelength side to the longer wavelength side by adjusting the current Iλ. According to the operation illustrated in Fig. 43, the output light 205 from the tunable band pass filter 201 varies with a predetermined interval as shown in Fig. 44. The respective output light signals 205 have wavelengths that are coincident with the transmission wavelengths of the tunable band pass filter 201 at respective times. Fig. 45 shows the change in the both-end voltage of the optical amplifier 202 when the output light 205 illustrated in Fig. 44 is input into the optical amplifier 202. The optical amplifier 202 is driven in a constant current operative state, so that carriers are consumed for amplification operation when there exists an input light into the optical amplifier device 202 or the output light 205. As a result, the voltage applied to the optical amplifier device 202 increases as shown in Fig. 45. Next, the operation will be described, including the control circuit 203. The optical amplifier device 202 is driven by the source 207 in the constant current state, and the voltage V g applied to the optical amplifier device 202 is monitored by the control circuit 203. The source 208 supplies a control current to the tunable band pass filter 201 for controlling its transmission wavelength, and the amount of the control current is controlled by the control circuit 203. Information indicating which channel should be selected is given to the control circuit 203 from the exterior. As described above, the control circuit 203 supplies the control signal to the source 208, so that the transmission center wavelength of the tunable band pass filter 201 varies from the shorter wavelength side to the longer wavelength side. While supplying the control signal to the source 208, the control circuit 203 monitors the change in the both-end voltage V g of the optical amplifier device 202 and recognizes which channel is being transmitted. The control circuit 203 supplies the control signal to the source 208 when the number of transmitted channels is coincident with the order of selected channel given to the control circuit 203. Thus, the scanning of the transmission center wavelength of the tunable band pass filter 201 is stopped and fixed there. In this manner, the wavelength selection is performed, and the signal of the selected wavelength is detected by a photodetector in a receiver. Second Embodiment Fig. 46 shows a second embodiment of the tunable filter device of the present invention. In Fig. 46, the same members as those of the first embodiment are designated by the same reference numerals. Namely, there are provided a tunable band pass filter 201, an optical amplifier device 202, a control circuit 203 and sources 207 and 208. Further, reference numeral 204 designates an input signal, reference numeral 206 designates an amplified output signal, reference numeral 209 designates an amplified light from the optical amplifier device 202 and reference numeral 210 designates a reflected amplified light that is a reflected light of the amplified light 209 from the tunable band pass filter 201. Similarly to the first embodiment, the coupling means for coupling the signal light 204 to the tunable band pass filter 201 and the amplifier device 202 are omitted in Fig. 46, but the signal light 204 can be effectively coupled thereto by using a lens or the like. The operation of the second embodiment will be described. The amplifier device 202 is operated in a constant-current operative state by the source 207. The transmission center wavelength of the tunable band pass filter 201 is controlled by the amount of a current Iλ from the source 208. The input signal light 204 is amplified by the amplifier device 202 to be the amplified light 209, and input into the tunable band pass filter 201. Light of wavelengths other than the transmission wavelength of the tunable band pass filter 201 is reflected thereby to be the reflected amplified light 210, and the light of the transmission wavelength is transmitted therethrough to be the amplified output light 206. The reflected amplified light 210 is again input into the optical amplifier device 202. Here, the DFB filter 201 is initially set so that all the wavelengths used for the wavelength division multiplexed transmission fall within the stop band of the DFB filter 201. At this time, the voltage applied to the amplifier device 202 differs between times when the numbers of light signals at different wavelengths constituting the input light 204 and the reflected amplified light 210 are the same and when these numbers are different (i.e., when light at one wavelength is transmitted through the tunable filter 201, and not reflected thereby). In this embodiment, the wavelength number of the input light 204 is five. The voltage becomes lower when those numbers are different from each other. The output from the DFB filter 201 at this time is illustrated in Fig. 47A (this figure corresponds to Fig. 44), and the both-end voltage change of the optical amplifier device 202 is illustrated in Fig. 47B (this figure corresponds to Fig. 45). The control circuit 203 detects the voltage change, and thereby learns whether the signal light is transmitted through the tunable band pass filter 201 at that time. In contrast to the first embodiment, the voltage of the amplifier device 202 decreases when light of one wavelength of the multiplexed input signal light 204 is transmitted through the band pass filter 201 to be the amplified output light 206. In the first embodiment, this voltage increases at this time. Therefore, the tunable band pass filter 201 can be adjusted so that light at a predetermined wavelength is transmitted therethrough, by controlling in approximately the same manner as the third embodiment. For the rest, this embodiment is the same as the first embodiment. Third Embodiment Figs. 48, 49 and 50 show an integrated device which achieves the function of the first or second embodiment. Figs. 48 and 49 show a tunable band pass filter and an optical amplifier device that achieve the function of this embodiment. Fig. 50 shows a structural example at the time of use of this embodiment. In Figs. 48 and 49 (Fig. 49 is an A' -A cross-sectional view of Fig. 48), reference numeral 211 designates a substrate of n-type InP, and reference numeral 212 designates a first cladding layer of n-type InP which also functions as a buffer layer. Reference numeral 213 designates a light guide layer of undoped InGaAsP (its band-gap equivalent wavelength λ g =1.3 µm and its thickness is 0.3µm), and reference numeral 214 designates a carrier blocking layer of n-type InP. Reference numeral 215 designates an undoped active layer (λ g =1.55µm and its thickness is 0.1 µm), and reference numeral 216 designates a second cladding layer of p-type InP. Reference numeral 217 designates a cap layer of p + -InP, reference numeral 218 designates an electrode formed on the substrate 211, and reference numeral 219 designates an electrode formed at the side of the cap layer 217. Reference numeral 221 designates an antireflection layer of SiO x , reference numeral 225 designates a separating groove for achieving a lateral electric separation and reference numeral 226 designates a grating formed partly on the boundary between the light guide layer 213 and the first cladding layer 212 as shown in Fig. 49. The device is divided into four portions by the separating grooves 225, and they are active regions 222, a phase adjusting region 223 and an optical amplifying region 224, as shown in Fig. 49. In this embpdiment, a ridge type structure is used, but any structure such as a buried-type structure can be adopted only if such waveguide structure is able to be employed in the semiconductor laser structure. Fig. 50 shows a case where the control system of the first embodiment is applied to the device of the third embodiment. In Fig. 50, the same members as those in Fig. 40 are designated by the same reference nume rals. In Fig. 50, the source 208 portion in Fig. 40 is separated into two sources 320 and 321 which respectively inject currents I p and Iλ into the active regions 222 and the phase adjusting region 223. The basic operation of this embodiment is the same as the first embodiment. Currents injected into the active regions 222 by the source 320 are set so that a DFB-LD portion or tunable filter portion 328 constituted by the two active regions 222 and the phase adjusting region 223 may not oscillate and that those currents I p are as much as possible. Further, an optical amplifying region 324 is driven in a constant current operative state by the source 207. In this state, the input signal 204 is input into the waveguide of the tunable filter portion 328, using an appropriate coupling means such as a lens and a round-tip optical fiber. If the wavelength of a portion of the input signal light 204 is coincident with the transmission wavelength band of the DFB filter portion 328, only light at such a coincident wavelength enters the optical amplifying portion 324 and is amplified therein to be the amplified output light 206. At this amplification time, carriers are consumed and the both-end voltage of the amplifier portion 324 is changed. The control circuit 203 supplies the control signal to the source 321 based on the detection result of the change in the both-end voltage, and thus the current Iλ injected into the phase adjusting region 223 is controlled so that the transmission wavelength is adjusted. In Fig. 50, a case where the control system of the first embodiment is applied to the third embodiment is shown, but the control system of the second embodiment can also be applied to this embodiment by reversing the input and output shown in Fig. 50. Material of InP series is used in the third embodiment, but other materials such as a GaAs series that can be used for forming the semiconductor laser structure can be used to achieve the function of this embodiment. Further, optical amplifier device portions in the first to third embodiments have gain spectral characteristics which are approximately the same as those of the general amplifying regions of the first explanatory example and the like, but their gain spectral characteristics may be those of the wavelength detecting regions. In this case, the scanning of the transmission wavelength of the tunable filter portion is stopped when the transmission wavelength reaches a wavelength that falls within a narrow range of the gain spectrum in the amplifier device portion. In the first to third embodiments, the transmission center wavelength of the band pass filter can be accorded with that of a desired signal light without branching the output light for monitoring. Such filter devices can naturally be used in the receiver of wavelength-division multiplexing communication systems as described with reference to Figs. 28 and onward. The amount of light input into the photodetector of the receiver is not reduced, and therefore, the structure of the system can be simplified even if the wavelength multiplicity is increased. Except as otherwise disclosed herein, the various components shown in outline or in block form in the figure are individually well-known in their internal construction and operation and are not critical either to the making or using of this invention or to a description of the best mode of the invention. While the present invention has been described with respect to what is presently considered to be the preferred embodiments, it is to be understood that the invention is not limited to the disclosed embodiments. The present invention is intended to cover various modifications and equivalent arrangements included within of the appended claims.

Claims: A tunable filtering apparatus comprising: a tunable optical band pass filter (201, 328), said band pass filter (201, 328) being capable of changing its transmission wavelength based on an external control; characterized by an optical semiconductor amplifier device (202, 324) comprising semiconductor layers of different conductivity types; said amplifier device (202, 324) and said band pass filter (201, 328) being arranged, either such that the amplifier device receives light (205) which is transmitted by said band pass filter (201, 328) or such that the amplifier device (202, 324) receives its own amplified light (210) which is reflected by said band pass filter other than a component (206) transmitted by said band pass filter, whereby said amplifier device (202, 324) exhibits a change of the voltage produced perpendicular to a junction of said semiconductor layers of different conductivity types during an optical amplification in dependence on said received light (205, 210); and control means (203) for changing the transmission wavelength of said tunable band pass filter based (201, 328) on said change of the voltage produced perpendicular to a junction of said semiconductor layers of different conductivity types. A tunable filtering apparatus according to claim 1, wherein said optical amplifier device (202, 324) comprises a semiconductor laser structure, and said optical amplifier device performs the optical amplification by using population inversion due to a current injection thereinto. A tunable filtering apparatus according to claim 1, further comprising first coupling means for coupling light to said tunable band pass filter (201, 328), second coupling means for coupling an output light from said tunable band pass filter to said optical amplifier device (202, 324) and third coupling means for coupling an output light from said optical amplifier device to a light transmission line. A tunable filtering apparatus according to claim 1, further comprising first coupling means for coupling light to said optical amplifier device (202, 324), second coupling means for coupling an output light from said optical amplifier device to said tunable band pass filter (201, 328) and third coupling means for coupling an output light from said tunable band pass filter to a light transmission line. A tunable filtering apparatus according to claim 1, wherein said tunable band pass filter (201, 328) comprises a DFB filter having a DFB-LD structure. A tunable filtering apparatus according to claim 1, wherein said optical amplifier device (202, 324) comprises a traveling type optical amplifier device in which its end surface feedback is oppressed. A tunable filtering apparatus according to claim 6, wherein said optical amplifier device (202, 324) comprises an antireflection film (221) formed on its end surface for oppressing the end surface feedback. A tunable filtering apparatus according to claim 6, wherein said optical amplifier device (202, 324) comprises an end surface slanted with respect to a light propagation direction for oppressing the end surface feedback. A tunable filtering apparatus according to claim 1, wherein said optical amplifier device (202, 324) and said tunable band pass filter (201, 328) are monolithically formed on a common substrate (211). An optical receiver comprising: a tunable filtering apparatus according to any of claims 1 to 9; light detecting means for converting an optical signal from said tunable filtering apparatus to an electric signal; and second control means for reproducing the electric signal from said light detecting means to supply a reproduced signal to a terminal equipment and supplying to said control means of said tunable filtering apparatus a control signal for controlling the transmission wavelength. An optical communication system comprising: (a) a transmission line; and (b) an optical receiver according to claim 10 for receiving an optical signal from said transmission line. A wavelength-division multiplexing optical communication system comprising: (a) a transmission line; and (b) an optical receiver according to claim 10 for receiving an optical signal from said transmission line, wherein the tunable band pass filter (201, 328) of said tunable filtering apparatus of said optical receiver is capable of containing all multiplexed wavelengths within its stop band. A control method for controlling a tunable filtering apparatus according to any of claims 1 to 9, comprising the steps of: inputting a light from said tunable optical band pass filter (201, 328) to said optical amplifier device (202, 324); determining whether there is light transmitted through said tunable optical band pass filter (201, 328) or not, by detecting a change of the voltage produced perpendicular to a junction of said semiconductor layers of different conductivity types of said optical amplifier device (202, 324); and changing the transmission wavelength of said tunable band pass filter (201, 328) based on said detected change of voltage. A method according to claim 13, wherein said tunable optical band pass filter (201, 328) and said optical amplifier device (202, 324) are arranged so that the light transmitted through said tunable band pass filter (201, 328) is input into said optical amplifier device (202, 324), and when the change of the voltage produced perpendicular to a junction of said semiconductor layers of different conductivity types is detected, it is determined that said tunable band pass filter has transmitted the light. A method according to claim 13, wherein said tunable optical band pass filter (201, 328) and said optical amplifier device (202, 324) are arranged so that the light output from said optical amplifier device (202, 324) is input to said tunable band pass filter (201, 328), and so that the light reflected by said tunable band pass filter without being transmitted is input into said optical amplifier device, it is determined that said tunable band pass filter has transmitted the light when the change of the voltage produced perpendicular to a junction of said semiconductor layers of different conductivity types generated by inputting the light reflected from said tunable band pass filter is detected.

Inventors: NAKAMURA KENJI, NITTA JUN, NAKAMURA, KENJI, NITTA, JUN, Nakamura, Kenji, c/o Canon Kabushiki Kaisha, NITTA, JUN, C/O CANON KABUSHIKI KAISHA
Applicants: CANON KK, CANON KABUSHIKI KAISHA
Application year: 1993
Main classification: G02F1
IPC codes: H01S5, H04B10