Electrodes of improved service life

Abstract: A metal surface is now described having enhanced adhesion of subsequently applied coatings combined with excellent coating service life. The substrate metal of the article, such as a valve metal as represented by titanium, is provided with a highly desirable rough surface characteristic for subsequent coating application. This can be achieved by various operations including etching and melt spray application of metal or ceramic oxide to ensure a roughened surface morphology. Usually in subsequent operations a barrier layer is provided on the surface of enhanced morphology. This may be achieved by operations including heating, as well as including thermal decomposition of a layer precursor. Subsequent coatings provide enhanced lifetime even in the most rugged commercial environments.

Description: Technical Field The invention is directed to metal articles having surfaces providing enhanced coating adhesion and providing coated articles of extended service life. In particular the metal article can be an electrode and the coating an electroactive coating, with the electrode having an extended lifetime in an electrochemical cell. Background of the Invention The adhesion of coatings applied directly to the surface of a substrate metal is of special concern when the coated metal will be utilized in a rigorous industrial environment. Careful attention is usually paid to surface treatment and pre-treatment operation prior to coating. Achievement particularly of a clean surface is a priority sought in such treatment or pre-treatment operation. Representative of a coating applied directly to a base metal is an electrocatalytic coating, often containing a precious metal from the platinum metal group, and applied directly onto a metal such as a valve metal. Within this technical area of electrocatalytic coatings applied to a base metal, the metal may be simply cleaned to give a very smooth surface. U.S. Patent No. 4,797,182. Treatment with fluorine compounds may produce a smooth surface. U.S. Patent 3,864,163. Cleaning might include chemical degreasing, electrolytic degreasing or treatment with an oxidizing acid. U.S. Patent 3,864,163. Cleaning can be followed by mechanical roughening to prepare a surface for coating. U.S. Patent No. 3'778,307. If the mechanical treatment is sandblasting, such may be followed by etching. U.S. Patent No. 3,878,083. Or such may be followed by flame spray application of a fine-particle mixture of metal powders. U.S. Patent No. 4,849,085. Another procedure for anchoring the fresh coating to the substrate, that has found utility in the application of an electrocatalytic coating to a valve metal, is to provide a porous oxide layer which can be formed on the base metal. For example, titanium oxide can be flame or plasma sprayed onto substrate metal before application of electrochemically active substance, as disclosed in U.S. Patent Nos. 4,140,813 and 4,331,528. Or the thermally sprayed material may consist of a metal oxide or nitride or so forth, to which electrocatalytically active particles have been pre-applied, as taught in U.S. Patent No. 4,392,927. US-A-3,882,002 discloses valve metal anodes having an outer coating of noble metal and/or noble metal oxide on a conductive coating of tin dioxide or tin dioxide/antimony oxide. Such coatings were particularly intended for brine electrolysis. US-A-3,324,110 disclosed titanium electrodes with an electrolytically-produced titanium oxide barrier layer top coated with a noble metal coating. It has however, been found difficult to provide long-lived coated metal articles for serving in the most rugged commercial environments, e.g., oxygen evolving anodes for use in the present-day commercial application utilized in electrogalvanizing, electrotinning, electroforming or electrowinning. Such may be continuous operation. They can involve severe conditions including potential surface damage. It would be most desirable to provide coated metal substrates to serve as electrodes in such operation, exhibiting extended stable operation while preserving excellent coating adhesion. It would also be highly desirable to provide such an electrode not only from fresh metal but also from recoated metal. EP-A-0 407 349 discloses electrodes having an improved surface morphology as set out in the preamble of claim 1, obtained by etching or melt spraying, onto which an electrocatalytic coating was directly deposited. EP-A-0 493 326, cited under Article 54(3) EPC, discloses electrodes of the same surface morphology prepared by melt spraying wherein an oxide, hydride or nitride layer, or another protective and conductive intermediate layer, can be produced on the melt-sprayed surface prior to application of the electrocatalytic coating. Summary of the Invention There has now been found a surface which provides a locked on coating of excellent coating adhesion. The coated metal substrate can have highly desirable extended lifetime even in most rigorous industrial environments. The innovative metal surface allows for the use of low coating loadings to achieve lifetimes equivalent to anodes with much higher loadings or to achieve a more cost effective lifetime as measured on a basis of electrical charge passed per coating weight area. The metal substrate can now be coordinated with standard modified electrocatalytic coating formulations to provide electrodes of improved lifetime performance. The surface of the present invention lowers the effective current density for catalytically coated metal surfaces, thus also decreasing the electrode operating potential. Longer lived anodes translate into less down time and cell maintenance, thereby cutting operating costs. In one aspect, the invention is directed to a method of preparing an electrode from a metal substrate, comprising preparing on the substrate a roughened surface having a profilometer-measured average surface roughness of at least about 250 microinches (about 635 micrometers) and an average surface peaks per inch of at least about 40 (about 15.7 peaks per cm), basis a profilometer upper threshold limit of 400 microinches (1016 micrometers) and a profilometer lower threshold limit of 300 microinches (762 micrometers), and applying to the roughened surface an electrocatalytic coating, characterized in that the electrocatalytic coating is applied onto a ceramic oxide barrier layer having said defined surface roughness. According to the invention, this ceramic oxide barrier layer is applied onto the metal substrate by: (a) intergranular etching of the metal substrate, which etching provides three-dimensional grains with deep grain boundaries; or (b) melt spraying a valve metal layer onto the metal substrate; or (c) grit blasting the surface of the metal substrate with sharp grit, preferably followed by etching, to provide a three-dimensional surface; to produce a surface with said defined surface roughness, and producing a ceramic oxide barrier layer on the roughened surface produced by step (a), step (b) or step (c), by one or more of the following steps (1) to (3), while maintaining said defined surface roughness : (1) heating the roughened surface in an oxygen-containing atmosphere to an elevated temperature above about 450°C for at least about 15 minutes, preferably above about 525°C for at least about 30 minutes; or (2) applying a metal oxide precursor, with or without doping agent, in one or more layers to the roughened surface, which metal oxide precursor provides a metal oxide on heating, followed by thermally treating at elevated temperature to convert said precursor to metal oxide, preferably heating after application of each layer in an oxygen-containing environment at above about 400°C for about 1 minute to about 60 minutes; or (3) depositing on the roughened surface a suboxide layer by chemical vapor deposition of a volatile starting material, with or without doping compounds, in an inert carrier gas, and heating to a temperature of at least about 250°C, preferably by depositing a volatile starting material on a heated substrate. According to the invention, after the production of the ceramic oxide barrier layer, and before the electrocatalytic coating is applied, a control is made that the defined surface roughness has been maintained. In another aspect, the invention is directed to an electrode metal substrate, as defined in claim 20. In a still further aspect, the invention is directed to a cell for electrolysis, with the cell having at least one electrode as defined herein. In as yet another aspect the invention is directed to an electrode having a special coating particularly adapted for such electrode. When the metal substrates of the invention are electrocatalytically coated and used as oxygen evolving electrodes, even under the most rigorous commercial operations including continuous electrogalvanizing, electrotinning, copper foil plating, electroforming or electrowinning, and including sodium sulfate electrolysis, such electrodes can have highly desirable service life. The innovations of the present invention are thus particularly applicable to high speed plating applications which involve a process incorporating one or more electrochemical cells having a moving strip cathode, an oxygen evolving anode and a solution containing one or more plateable metal ions, typically with associated supporting electrolytes and additives. Representative cell configurations include flooded cells, falling electrolyte cells and radial jet type cells. Description of the Preferred Embodiments The metals of the substrate are broadly contemplated to be any coatable metal. For the particular application of an electrocatalytic coating, the substrate metal might be such as nickel or manganese, but will most always be valve metals, including titanium, tantalum, aluminum, zirconium and niobium. Of particular interest for its ruggedness, corrosion resistance and availability is titanium. As well as the normally available elemental metals themselves, the suitable metals of the substrate can include metal alloys and intermetallic mixtures, as well as ceramics and cermets such as contain one or more valve metals. For example, titanium may be alloyed with nickel, cobalt, iron, manganese or copper. More specifically, grade 5 titanium may include up to 6.75 weight percent aluminum and 4.5 weight percent vanadium, grade 6 up to 6 percent aluminum and 3 percent tin, grade 7 up to 0.25 weight percent palladium, grade 10, from 10 to 13 weight percent plus 4.5 to 7.5 weight percent zirconium and so on. By use of elemental metals, it is most particularly meant the metals in their normally available condition, i.e., having minor amounts of impurities. Thus, for the metal of particular interest, i.e., titanium, various grades of the metal are available including those in which other constituents may be alloys or alloys plus impurities. Grades of titanium have been more specifically set forth in the standard specifications for titanium detailed in ASTM B 265-79. Regardless of the metal selected and how the metal surface is subsequently processed, the substrate metal advantageously is a cleaned surface. This may be obtained by any of the treatments used to achieve a clean metal surface, but with the provision that unless called for to remove an old coating, and if etching might be employed, as more specifically detailed hereinbelow, mechanical cleaning is typically minimized. Thus the usual cleaning procedures of degreasing, either chemically or electrolytic, or other chemical cleaning operation may be used to advantage. Where an old coating is present on the metal surface, such needs to be addressed before recoating. It is preferred for best extended performance when the finished article will be used with an electrocatalytic coating, such as use as an oxygen evolving electrode, to remove the old coating. In the technical area of the invention which pertains to electrochemically active coatings, coating removal methods are well known. Thus a melt of essentially basic material, followed by an initial pickling will suitably reconstitute the metal surface, as taught in U.S. Patent 3,573,100. Or a melt of alkali metal hydroxide containing alkali metal hydride, which may be followed by a mineral acid treatment, is useful, as described in U.S. Patent No. 3,706,600. Usual rinsing and drying steps can also form a portion of these operations. When a cleaned surface, or prepared and cleaned surface has been obtained, and particularly for later applying an electrocatalytic coating to a valve metal in the practice of the present invention, surface roughness is then obtained. This will often be referred to herein as a "suitably roughened metal surface." This will be achieved by means which include intergranular etching of the substrate metal, plasma spray application, which spray application can be of particulate valve metal or of ceramic oxide particles, or both, and sharp grit blasting of the metal surface, followed by surface treatment to remove embedded grit. For efficient as well as economical surface roughening plasma spray is preferred. Where the surface roughness is obtained by etching, it is important to aggressively etch the metal surface to provide deep grain boundaries providing well exposed, three-dimensional grains. It is preferred that such operation will etch impurities located at such grain boundaries. There can be an inducement at, or introduction to, the grain-boundaries of one or more impurities for the metal. For example, with the particularly representative metal titanium, the impurities of the metal might include iron, nitrogen, carbon, hydrogen, oxygen, and beta-titanium. One particular manner contemplated for impurity enhancement is to subject the titanium metal to a hydrogen-containing treatment. This can be accomplished by exposing the metal to a hydrogen atmosphere at elevated temperature. Or the metal might be subjected to an electrochemical hydrogen treatment, with the metal as a cathode in a suitable electrolyte evolving hydrogen at the cathode. Another consideration for the aspect of surface roughening involving etching, which aspect can lead to impurity enhancement at the grain boundaries, involves the heat treatment history of the metal. For example, to prepare a metal such as titanium for etching, it can be most useful to condition the metal, as by annealing, to diffuse impurities to the grain boundaries. Thus, by way of example, proper annealing of grade 1 titanium will enhance the concentration of the iron impurity at grain boundaries. Also for the aspect of etching, it can be desirable to combine a metal surface having a correct grain boundary metallurgy with an advantageous grain size. Again, referring to titanium as exemplary, at least a substantial amount of the grains having grain size number within the range of from about 3 to about 7 is advantageous. Grain size number as referred to herein is in accordance with the designation provided in ASTM E 112-84. Etching will be with a sufficiently active etch solution to develop aggressive grain boundary attack. Typical etch solutions are acid solutions. These can be provided by hydrochloric, sulfuric, perchloric, nitric, oxalic, tartaric, and phosphoric acids as well as mixtures thereof, e.g., aqua regia. Other etchants that may be utilized include caustic etchants such as a solution of potassium hydroxide/hydrogen peroxide, or a melt of potassium hydroxide with potassium nitrate. Following etching, the etched metal surface can then be subjected to rinsing and drying steps. The suitable preparation of the surface by etching has been more fully discussed in copending U.S. Patent Application Serial No. 686,962. In plasma spraying for a suitably roughened metal surface, although the material will be applied in particulate form such as droplets of molten metal, the feed material, e.g., a metal to be applied, may be in different form such as wire form. This is to be understood even though for convenience, application will typically be discussed as material applied in particulate form. In this plasma spraying, such as it would apply to spraying of a metal, the metal is melted and sprayed in a plasma stream generated by heating with an electric arc to high temperatures in inert gas, such as argon or nitrogen, optionally containing a minor amount of hydrogen. It is to be understood by the use herein of the term "plasma spraying" that although plasma spraying is preferred the term is meant to include generally thermal spraying such as magnetohydrodynamic spraying, flame spraying and arc spraying, so that the spraying may simply be referred to as "melt spraying". The spraying parameters, such as the volume and temperature of the flame or plasma spraying stream, the spraying distance, the feed rate of the constituents being sprayed and the like, are chosen so that the sprayed metal is melted by and in the spray stream and deposited on the metal substrate while still substantially in melted form. The spraying almost always provides an essentially continuous coating having a rough surface structure, although it is contemplated that the spraying may be in strip form, with unsprayed strips between the sprayed strips, or in some other partial coating pattern on the substrate. The surface will have a three-dimensional character similar in appearance to a surface following a grain boundary etch. Typically, spray parameters like those used in the examples give satisfactory results. Usually, the metal substrate during melt spraying is maintained near ambient temperature. This may be achieved by means such as streams of air impinging on the substrate during spraying or allowing the substrate to air cool between spray passes. The particulate metal employed, e.g., titanium powder, has a typical particle size range of 0.1-500 microns, and preferably has all particles within the range of 15-325 microns for efficient preparation of surface roughness. Particulate metals having different particle sizes should be equally suitable so long as they are readily plasma spray applied. The metallic constituency of the particles may be as above-described for the metals of the substrate, e.g., the titanium might be one of several grades most usually grade 1 titanium or an alloy of titanium. It is also contemplated that such plasma spray applications may be used in combination with etching of the substrate metal surface. Or the substrate may be first prepared by grit blasting, as discussed hereinabove, which may or may not be followed by etching. However, where a metal or conductive oxide is to be melt sprayed onto the surface already exhibiting the desired surface roughness, the grit blasting will almost always have been followed by treatment to remove embedded grit. Hence, it is to be understood that where a substrate surface preparation has been utilized to achieve desirable roughness characteristic, the melt spraying of a metal may be subsequently utilized to combine the protective effect of the melt spray applied layer, plus retain the desirable surface morphology of the underlying substrate. The metal can be deposited onto a previously prepared surface through melt spraying, and in a manner to conform to the surface topography of the underlying metal surface and not deleteriously reduce the effect of surface roughness. However, the combination of an underlying desired surface roughness and a melt sprayed metal that at least maintains such roughness will provide the preferred surface. It has also been found that a suitably roughened metal surface can be obtained by special grit blasting with sharp grit followed by removal of surface embedded grit. The grit, which will contain usually angular particles, will cut the metal surface as opposed to peening the surface. Serviceable grit for such purpose can include sand, aluminum oxide, steel and silicon carbide. Upon grit removal, this can provide a suitably roughened, three-dimensional surface. Etching, or other treatment such as water blasting, following grit blasting can remove embedded grit and provide the desirably roughened surface. Regardless of the technique employed to reach the suitably prepared roughened surface, e.g., plasma spray or intergranular etch, it is necessary that the metal surface have an average roughness (Ra) of at least about 6.35 micrometers (250 microinches) and an average number of surface peaks per centimeter (Nr) of at least about 15.7 (40 per inch). The surface peaks per centimeter can be typically measured at a lower threshold limit of 7.6 micrometers (300 microinches) and an upper threshold limit of 10.16 micrometers (400 microinches). A surface having an average roughness of below about 6.35 micrometers (250 microinches) will be undesirably smooth, as will a surface having an average number of surface peaks per centimeter of below about 15.7 (40 per inch), for providing the needed, substantially enhanced, coating adhesion. Advantageously, the surface will have an average roughness of on the order of about 7.6 micrometers (300 microinches) or more, e.g., ranging up to about 19.1-38.1 micrometers (about 750-1500 microinches), with substantially no low spots of less than about 5.1 micrometers (about 200 microinches). Advantageously, for best avoidance of surface smoothness, the surface will be free from low spots that are less than about 5.3 to 5.6 micrometers (about 210 to 220 microinches). It is preferable that the surface have an average roughness of from about 8.9 to about 12.7 micrometers (about 350 to about 500 microinches). Advantageously, the surface has an average number of peaks per centimeter of at least about 23.6 (about 60 per inch), but which might be on the order of as great as about 51.2 (130 per inch) or more, with an average from about 27.6 to about 47.2 (70 to 120 per inch) being preferred. It is further advantageous for the surface to have an average distance between the maximum peak and the maximum valley (Rz) of at least about 25.4 micrometers (1000 microinches) and to have a maximum peak height (Rm) of at least about 25.4 micrometers (1000 microinches). More desirably, the surface for coating will have an Rm value of at least about 38.1 micrometers (1500 microinches) up to about 88.9 micrometers (3500 microinches) and have an average distance between the maximum peak and the maximum valley characteristic of at least about 38.1 micrometers (1500 microinches) up to about 88.9 micrometers (3500 microinches). All of such foregoing surface characteristics are as measured by a profilometer. Following the obtaining of the suitably prepared roughened surface, some procedures may be needed, and several can be utilized, to prepare the necessary barrier layer which preferably has a thickness of the order of about 25.4 micrometers to about 635 micrometers (0.001 inch to about 0.025 inch). Where surface roughening has not also provided a serviceable barrier layer, it is preferred for economy to form a suitable barrier layer on the metal substrate by heating the metal substrate in an oxygen-containing atmosphere. Roughened metal surfaces suitable for heat treatment will thus include grain boundary etched surfaces, those with sharp grit blasting with follow-up grit removal and surfaces having melt sprayed metal. Most always, this heat treatment will be used with a representative titanium metal substrate surface. Heating can be conducted in any oxygen-containing atmosphere, with air being preferred for economy. For the representative titanium metal surface, a serviceable temperature for this heating to obtain barrier layer formation will generally be within a range of in excess of about 450°C but less than about 700°C. It will be understood that such heat treatment at a temperature within this range in an oxygen containing atmosphere will form a surface oxide barrier layer on the metal substrate. For the representative titanium metal, the preferred temperature range for the oxygen atmosphere heating is from about 525°C to about 650°C. Typically, the metal will be subject to such elevated temperature heating for a time of from about 15 minutes to about 2 hours or even more, preferred times for the representative titanium metal are within the range of from about 30 minutes to about 60 minutes. A wash solution of a doping agent may be used with this thermal treatment. Doping agents such as niobium chloride to provide niobium, or a tantalum or vanadium salt to provide such constituents in ionic form, can be present in the wash solution. It is also contemplated that for an etched, or sharp grit blasted, with surface grit removed, or melt sprayed metal prepared surface, that an effective barrier layer may be obtained on such surface using a suitable precursor substituent and thermal treatment to convert the precursor substituent to an oxide. Where this thermal decomposition treatment with precursor substituent will be used, for a representative titanium oxide barrier layer, suitable precursor substituents can be either organic or inorganic compositions. Organic precursor substituents include titanium butyl orthotitanate, titanium ethoxide and titanium propoxide. Suitable inorganic precursor substituents can include TiCl 3 or TiCl 4 , usually in acid solution. Where tin oxide is the desired barrier layer constituent, suitable precursor substituents can include SnCl 4 , SnSO 4 , or other inorganic tin salts. It is also contemplated that such precursor substituents may be used with doping agents, such as those which would be incorporated as doping agent precursors into the composition to increase the conductivity of the resulting barrier layer oxide. For example a niobium salt may be used to provide a niobium doping agent in ion form in the oxide lattice. Other doping agents include ruthenium, iridium, platinum, rhodium and palladium, as well as mixtures of any of the doping agents. It has been known to use such doping agents for titanium oxide barrier layers. Doping agents suitable for a tin oxide barrier layer include antimony, indium or fluorine. The precursor substituent will suitably be a precursor solution or dispersion containing a dissolved or dispersed metal salt in liquid medium. Such composition can thus be applied to a suitably prepared surface by any usual method for coating a liquid composition onto a substrate, e.g., brush application, spray application including air or electrostatic spray, and dipping. In addition to dopants which may be present in the applied precursor composition, such composition might additionally contain other materials. These other materials may be particulates and such particulates can take the shape of fibers. The fibers may serve to enhance coating integrity or enhance the three-dimensional surface morphology. These fibers can be silica-based, for example glass fibers, or may be other oxide fibers such as valve metal oxide fibers including titanium oxide and zirconium oxide fibers, as well as strontium or barium titanate fibers, and mixtures of the foregoing. In the coating composition, additional ingredients can include modifiers which will most generally be contained in compositions containing precursor substituents to titanium oxides. Such modifiers are useful for minimizing any mud cracking of the barrier layer during the thermal treatment cycles. For the thermal oxidation of the metal salts applied to the substrate, such will generally be conducted in an oxygen containing environment, preferably air for economy, at a temperature within the range of from greater than about 400 °C up to about 650 °C. For efficient thermal conversion, a preferred temperature will be is in the range of from about 500 °C to about 600 °C. Where the coating is applied as a liquid medium, such thermal treatment will serviceably be observed after each applied coating with such temperature being maintained from about 1 minute to about 60 minutes per coat. Preferably, for efficiency and economy, the temperature will be maintained from about 3 to about 10 minutes per coat. The number of coating cycles can vary depending upon most typically the required amount of barrier layer, with 5 to 40 coats being usual, although fewer coatings, and even a single coating, is contemplated. Usually, the number of coats for a representative titanium oxide coating, such as formed by the thermal decomposition of titanium butyl orthotitanate, will not exceed on the order of about 20, and advantageously for economy will not exceed about 10. Preferably, for economy plus efficient electrode lifetime, such will be less than 10 coats. The resulting amount of barrier layer will usually not exceed about 635 micrometers (0.025 inch) for economy. In a procedure also requiring heat application, and thus not completely unlike thermal oxidation of an applied precursor, it is also contemplated to form a suitable barrier layer by chemical vapor deposition method. For this method, there can be utilized a suitable volatile starting material such as one of the organic titanium compounds mentioned hereinabove with the thermal oxidation procedure, e.g., titanium butyl orthotitanate, titanium ethoxide or titanium propoxide. In this chemical vapor deposition method for obtaining a serviceable barrier layer, the volatile starting material can be transported to a suitably prepared roughened surface by an inert carrier gas, including nitrogen, helium, argon, and the like. This compound is transported to a heated substrate which is heated to a temperature sufficient to oxidize the compound to the corresponding oxide. For application of organic titanium compound, such temperature can be within the range from about 250°C to about 650°C. As has been discussed hereinbefore with thermal oxidation treatment, it is also suitable to utilize in the chemical vapor deposition procedure a doping compound. Such doping compounds have been discussed hereinabove. For example, a niobium salt may be added to the carrier gas transporting the volatile starting material, or such may be applied to the heated substrate by means of a separate carrier gas stream. As with the thermal oxidation process, this chemical vapor deposition procedure is most particularly contemplated for use following preparation of a suitably prepared roughened surface by etching, or by sharp grit blasting followed by surface treatment, or by melt spraying of metal. Subsequent to the formation of the barrier layer over the suitably prepared roughened surface, the subsequent article may be subjected to further treatment. Additional treatments can include thermal treatment, such as annealing of the barrier layer oxide. For example, where the barrier layer comprises a deposition of TiO x , annealing can be useful for converting the deposited oxide to a different crystal form or for modifying the value of the "x". Such annealing may also be serviceably employed for adjusting the conductivity of the deposited barrier layer. Where such additional treatments are thermal treatments, they can include heating in any of a variety of atmospheres, including oxygen-containing environments, such as air, or heating in inert gas environment, such as argon, or in a reducing gas environment, for example, hydrogen or hydrogen mixtures such as hydrogen with argon, or heating in a vacuum. It is to be understood that these additional treatments may be utilized for a barrier layer achieved in any manner as has been discussed herein. Subsequent to the formation of the barrier layer, it is necessary that the metal surface have maintained an average roughness (Ra) of at least about 6.35 micrometers (250 microinches) and an average number of surface peaks per centimeters(Nr) of at least about 15.7 (40 per inch) . Advantageously, the surface will have maintained an average roughness of on the order of about 7.62 micrometers (300 microinches) or more, e.g., ranging up to about 19.1-38.1 micrometers (750-1500 microinches), with substantially no low spots of less than about 5.1 micrometers (200 microinches). It is preferable that the surface have maintained an average roughness of from about 8.9 to about 12.7 micrometers (350 to about 500 microinches). Advantageously, the surface has an average number of peaks per centimeter of at least about 23.6 (60 per inch), but it might be on the order of as great as about 51.2 (130 per inch) or more, with an average from about 27.6 to about 47.2 (70 to about 120 per inch) being preferred. It is further advantageous for the surface to have Rm and Rz values as for the suitably prepared roughened surface, which values have been discussed hereinbefore. After the substrate has attained the necessary barrier layer, it will be understood that it may then proceed through various operations, including pretreatment before coating. For example, the surface may be subjected to a cleaning operation, e.g., a solvent wash. It is to be understood that in some instances of melt spray application of ceramic oxide, e.g., of SnO 2 , the barrier layer may then serve as the electrocatalytic surface without further coating application. Alternatively, various proposals have been made in which an outer layer of electrochemically active material is deposited on the barrier layer which primarily serves as a protective and conductive intermediate. U.K. Patent No. 1,344,540 discloses utilizing an electrodeposited layer of cobalt or lead oxide under a ruthenium-titanium oxide or similar active outer layer. It is also to be understood that subsequent to the preparation of the barrier layer, but prior to the application of a subsequent electrocatalytic coating, intermediate coatings may be employed. Such intermediate coatings can include coatings of platinum group metals or oxides. Various tin oxide based underlayers are disclosed in U.S. Patent Nos. 4,272,354, 3,882,002 and 3,950,240. After providing the barrier layer followed by any pretreatment operation, the coating most contemplated in the present invention is the application of electrochemically active coating. As representative of the electrochemically active coatings that may then be applied, are those provided from platinum or other platinum group metals or they can be represented by active oxide coatings such as platinum group metal oxides, magnetite, ferrite, cobalt spinel or mixed metal oxide coatings. Such coatings have typically been developed for use as anode coatings in the industrial electrochemical industry. They may be water based or solvent based, e.g., using alcohol solvent. Suitable coatings of this type have been generally described in one or more of the U.S. Patent Nos. 3,265,526, 3,632,498, 3,711,385, and 4,528,084. The mixed metal oxide coatings can often include at least one oxide of a valve metal with an oxide of a platinum group metal including platinum, palladium, rhodium, iridium and ruthenium or mixtures of themselves and with other metals. Further coatings in addition to those such as the tin oxide enumerated above include manganese dioxide, lead dioxide, cobalt oxide, ferric oxide, platinate coatings such as M x Pt 3 O 4 where M is an alkali metal and X is typically targeted at approximately 0.5, nickel-nickel oxide and nickel plus lanthanide oxides. Although the electrocatalytic coating may serviceably be iridium oxide, where the coating will contain the iridium oxide together with tantalum oxide, it has been found that improved lifetimes for the resulting article as an electrode can be achieved by adjusting upward the iridium to tantalum mole ratio. This ratio will be adjusted upwardly from an iridium to tantalum mole ratio, as metal from above 75:25 to advantageously above 80:20. The preferred range for best achieved lifetime performance will be from about 80:20 to about 90:10, although higher ratios, e.g., up to as much as 99:1 can be useful. Such coatings will usually contain from about 4 to about 50 grams per square meter of iridium, as metal. For obtaining these improved lifetime coatings, the useful coating composition solutions are typically those comprised of TaCl 5 , IrCl 3 and hydrochloric acid, all in aqueous solution. Alcohol based solutions may also be employed. Thus, the tantalum chloride can be dissolved in ethanol and this mixed with the iridium chloride dissolved in either isopropanol or butanol, all combined with small additions of hydrochloric acid. It is contemplated that coatings will be applied to the metal by any of those means which are useful for applying a liquid coating composition to a metal substrate. Such methods include dip spin and dip drain techniques, brush application, roller coating and spray application such as electrostatic spray. Moreover, spray application and combination techniques, e.g., dip drain with spray application can be utilized. With the above-mentioned coating compositions for providing an electrochemically active coating, a roller coating operation can be most serviceable. Following any of the foregoing coating procedures, upon removal from the liquid coating composition, the coated metal surface may simply dip drain or be subjected to other post coating technique such as forced air drying. Typical curing conditions for electrocatalytic coatings can include cure temperatures of from about 300 °C up to about 600 °C. Curing times may vary from only a few minutes for each coating layer up to an hour or more, e.g., a longer cure time after several coating layers have been applied. However, cure procedures duplicating annealing conditions of elevated temperature plus prolonged exposure to such elevated temperature, are generally avoided for economy of operation. In general, the curing technique employed can be any of those that may be used for curing a coating on a metal substrate. Thus, oven coating, including conveyor ovens may be utilized. Moreover, infrared cure techniques can be useful. Preferably for most economical curing, oven curing is used and the cure temperature used for electrocatalytic coatings will be within the range of from about 450 °C to about 550 °C. At such temperatures, curing times of only a few minutes, e.g., from about 3 to 10 minutes, will most always be used for each applied coating layer. In addition to the resulting article being serviceable as an anode for electrogalvanizing, such may also be useful as an anode in an electrotinning operation opposite a moving cathode, such as a moving steel strip. As an anode, the finished article can also find service in copper foil production. Service for the article as an anode can also be found in current balancing where anodes are placed electrically parallel with consumable anodes. It is also contemplated that the finished fabricated articles can be suitably employed in electrochemical cells having an oxygen evolving anode in a non-plating application such as in a separated cell having a hydrogen-evolving cathode. A particular application would include use in acid recovery or in an acid generation process, such as sodium sulfate electrolysis or chloric acid production, the article being used as an anode in a cell which is typically a multi-compartment cell with diaphragm or membrane separators. In certain applications it is also contemplated that the fabricated article as an anode may comprise essentially an outer coating layer of a conductive, non-platinum metal oxide such as a doped tin oxide. Such an anode may be utilized in a process including peroxy compound formation. The following examples show ways in which the invention has been practiced, as well as showing comparative examples. However, the examples showing ways in which the invention has been practiced should not be construed as limiting the invention. EXAMPLE 1 A titanium plate measuring 5.1 by 15.2 by 0.95 centimeters (2 inches by 6 inches by 3/8 inch) and being an unalloyed grade 1 titanium plate, was degreased in perchloroethylene vapors, rinsed with deionized water and air dried. It was then etched for approximately one hour by immersion in 18 weight percent hydrochloric acid aqueous solution heated to 95-100°C. After removal from the hot hydrochloric acid, the plate was again rinsed with deionized water and air dried. The etched surface was then subjected to surface profilometer measurement using a Hommel model T1000 C instrument manufactured by Hommelwerk GmbH. The plate surface profilometer measurements were taken by running the instrument in a random orientation across a large flat face of the plate. This gave values for surface roughness (Ra) of 16.6 micrometers (653 microinches) and peaks per centimeter (Nr) of 37.4 (95 per inch). The etched titanium plate was placed in an oven heated to 525°C. This air temperature was then held for one hour. The sample was then permitted to air cool. This heating provided an oxide barrier layer on the surface of the titanium plate sample. The resulting thickness of the oxide layer was less than one micrometer. Surface roughness was thereafter measured and the results obtained were essentially the same as above This titanium sample plate was then provided with an electrochemically active oxide coating of tantalum oxide and iridium oxide having a 65:35 weight ratio of Ir:Ta, as metal. The coating composition was an aqueous, acidic solution of chloride salts, and the coating was applied in layers, each layer being baked in air at 525°C. for ten minutes. The coating weight achieved as 10.5 g/m 2 . The resulting sample was tested as an anode in an electrolyte that was 150 grams per liter (g/l) of sulfuric acid. The test cell was an unseparated cell maintained at 65°C. and operated at a current density of 70 kiloamps per square meter (kA/m 2 ). Periodically the electrolysis was briefly interrupted. The coated titanium plate anode was removed from the electrolyte, rinsed in deionized water, air dried and then cooled to ambient temperature. There was then applied to the coated plate surface, by firmly manually pressing onto the coating, a strip of self-adhesive, pressure sensitive tape. This tape was then removed from the surface by quickly pulling the tape away from the plate. The coating remained well-adhered throughout the test, with the anode ultimately failing by anode passivation with the coating still predominantly intact at 4,927 kA-hr/m 2 -gm of iridium. Comparative Example 1A: A titanium plate sample of unalloyed grade 1 titanium, was etched to provide desirable surface roughness. Subsequent profilometer measurements, conducted in the manner of Example 11 provided average values of 14 (Ra) (551 microinches) and 29.9 (Nr) (76 per inch). This titanium plate, with no barrier layer (thus making it a comparative Example) was coated with the composition of Example 1 and in the manner of Example 1 to the coating weight of Example 1. The coated plate was then tested as in Example 1 and the anode plate failed by passivation at 1,626 kA-hr/m 2 -gm of iridium. Comparative Example 1B: A titanium plate sample as in Example 1 was left smooth. Subsequent profilometer measurements conducted in the manner of Example 1, provided average values of <2,54 (Ra) (<100 microinches) and 0 (Nr). Also, no barrier layer was provided for this comparative sample plate. The plate as nevertheless coated with the composition of Example 1 and in the manner of Example 1 to the coating weight of Example 1. The coated plate was then tested as in Example 1 and the anode failed by passivation at 616 kAhr/m 2 gm of iridium. The anode passivation test results for these Example 1, 1A and 1B series of panels are set forth in the table below : Anode Time to Passivation (kA-hr/M 2 -gm of Iridium) Example Rough Surface Plus Barrier Layer 4927 Comparative Example 1A Rough Surface, No Barrier Layer 1626 Comparative Example 1B No Rough Surface, No Barrier Layer 616 EXAMPLE 2 An unalloyed grade 1 titanium plate was prepared with a suitable roughness by grit blasting with aluminum oxide, followed by rinsing in acetone and drying. A coating on the sample plate of titanium powder was produced using a powder having all particles within the size range of 15-325 micrometers. The sample plate was coated with this powder using a Metco plasma spray gun equipped with a GH spray nozzle. The spraying conditions were: a current of 500 amps; a voltage of 45-50 volts; a plasma gas consisting of argon and helium; a titanium feed rate of 1.36 kilogram (3 pounds) per hour; a spray bandwidth of 6.7 millimeters (mm); and a spraying distance of 64 mm, with the resulting titanium layer on the titanium sample plates having a thickness of about 100 micrometers. The coating surface of the sample plate was then subjected to surface profilometer measurement using a Hommel model T1000 C instrument manufactured by Hommelwerk GmbH. The plate surface profilometer measurements were determined as average values computed from tree separate measurements conducted by running the instrument in random orientation across the coated flat face of the plate. This gave an average value for surface roughness (Ra) of 19.3 micrometers (759 microinches) and peaks per centimeter (Nr) of 45.6 (116 per inch). The peaks per centimeter were measured within the threshold limits of 7.62 micrometers (lower) and 10.16 micrometers (upper) (300-400 microinches). The plasma sprayed titanium plate was placed in an oven heated to 525°C. This air temperature was then held for one hour followed by air cooling. This heating provided an oxide barrier layer on the surface of the plasma spray applied titanium layer on the plate sample. Surface roughness was essentially the same as above. This titanium sample plate was then provided with an electrochemically active oxide coating of tantalum oxide and iridium oxide having a 65:35 weight ratio of Ir:Ta, as metal. The coating composition was an aqueous, acidic solution of chloride salts, and the coating was applied in layers, each layer being baked in air at 525°C for ten minutes. The coating weight was 32 g/m 2 of iridium. The resulting sample was tested as an anode in an electrolyte that was of 285 grams per liter (g/l) of sodium sulfate. The test cell was an unseparated cell maintained at 65 °C and operated at a current density of 15 kiloamps per square meter (kA/m 2 ). Periodically the electrolysis was briefly interrupted. The coated titanium plate anode was removed from the electrolyte, rinsed in deionized water, air dried and then cooled to ambient temperature. There was then applied to the coated plate surface, by firmly manually pressing onto the coating, a strip of self-adhesive, pressure sensitive tape. This tape was then removed from the surface by quickly pulling the tape away from the plate. The coating remained well-adhered throughout the test, with the anode ultimately failing by anode passivation with the coating still predominantly intact at 1495 kA-hr/m 2 -gm of iridium. EXAMPLE 3 An unalloyed grade 1 titanium plate was prepared with suitable surface roughness by grain boundary etching, followed by an oven bake at 525 °C air temperature. A barrier layer titanium oxide coating on the sample plate was produced using an aqueous solution containing a concentration of 0.75 mole/liter of titanium butyl orthotitanate in n-butanol. The sample plate was coated by brush application. Following the first coat, the plate was heated in air at 525 °C for a time of 10 minutes. After cooling of the plate, these coating and treating steps-were repeated, there being a total of three coats applied. This titanium sample plate was then provided with an electrochemically active oxide coating of tantalum oxide and iridium oxide having a 65:35 weight ratio of Ir:Ta, as metal. The coating composition was an aqueous, acidic solution of chloride salts, and the coating was applied in layers, each layer being baked in air at 525 °C. for ten minutes. The applied coating weight was 8.6 g/m 2 . The resulting sample was tested as an anode in an electrolyte that was a mixture of 285 grams per liter (g/l) of sodium sulfate and 60 g/l of magnesium sulfate and having a pH of 2. The test cell was an unseparated cell maintained at 65 °C. and operated at a current density of 15 kiloamps per square meter (kA/m 2 ) Periodically the electrolysis was briefly interrupted. The coated titanium plate anode was removed for the electrolyte, rinsed in deionized water, air dried and then cooled to ambient temperature. There was then applied to the coated plate surface, by firmly manually pressing onto the coating, a strip of self-adhesive, pressure sensitive tape. This tape was then removed from the surface by quickly pulling the tape away from the plate. The coating remained well-adhered throughout the test, with and anode ultimately failing by anode passivation with the coating still predominantly intact at 2,578 kA-hr/m 2 -gm of iridium. Comparative Example 3A: A titanium plate sample of unalloyed grade 1 titanium, had the surface preparation of Example 3, and was coated in the manner of Example 3, but the barrier layer coating cycles were increased until an extra heavy, thick barrier layer from 12 coats was obtained. This titanium plate was top coated with the active oxide coating composition of Example 3 and in the manner of Example 3 to a coating weight of 8.1 g/m 2 . The coated plate was then tested as in Example 3 and owing to the extra thick, heavy barrier layer coating, had an undesirably shortened lifetime to passivation of only 83 kA-hr/m 2 -gm or iridium.

Claims: A method of preparing an electrode from a metal substrate, comprising preparing on the substrate a roughened surface having a profilometer-measured average surface roughness of at least about 250 microinches (about 635 micrometers) and an average surface peaks per inch of at least about 40 (about 15.7 peaks per cm), basis a profilometer upper threshold limit of 400 microinches (1016 micrometers) and a profilometer lower threshold limit of 300 microinches (762 micrometers), and applying to the roughened surface an electrocatalytic coating, characterized in that the electrocatalytic coating is applied onto a ceramic oxide barrier layer having said defined surface roughness, which ceramic oxide barrier layer is applied onto the metal substrate by: (a) intergranular etching of the metal substrate, which etching provides three-dimensional grains with deep grain boundaries; or (b) melt spraying a valve metal layer onto the metal substrate; or (c) grit blasting the surface of the metal substrate with sharp grit, preferably followed by etching, to provide a three-dimensional surface; to produce a surface with said defined surface roughness, and producing a ceramic oxide barrier layer on the roughened surface produced by step (a), step (b) or step (c), by one or more of the following steps (1) to (3), while maintaining said defined surface roughness : (1) heating the roughened surface in an oxygen-containing atmosphere to an elevated temperature above about 450°C for at least about 15 minutes, preferably above about 525°C for at least about 30 minutes; or (2) applying a metal oxide precursor, with or without doping agent, in one or more layers to the roughened surface, which metal oxide precursor provides a metal oxide on heating, followed by thermally treating at elevated temperature to convert said precursor to metal oxide, preferably heating after application of each layer in an oxygen-containing environment at above about 400°C for about 1 minute to about 60 minutes; or (3) depositing on the roughened surface a suboxide layer by chemical vapor deposition of a volatile starting material, with or without doping compounds, in an inert carrier gas, and heating to a temperature of at least about 250°C, preferably by depositing a volatile starting material on a heated substrate; and controlling, after the production of the ceramic oxide barrier layer, that said defined surface roughness has been maintained. The method of claim 1, wherein valve metal particles are applied in step (b) by plasma spray. The method of claim 1, wherein the metal substrate is roughened by grit blasting in step (c) with grit selected from sand, aluminium oxide, steel and silicon carbide, and the grit-blasted surface is etched to remove surface grit. The method of claim 1, wherein the ceramic oxide barrier layer is produced in step (1) by heating preceded by the application to the roughened surface of a wash solution containing a niobium, tantalum or vanadium doping agent. The method of claim 1, wherein the ceramic oxide barrier layer is produced in step (2) from an organic or inorganic precursor, preferably selected from titanium butyl orthotitanate, titanium ethoxide, titanium propoxide, TiCl 3 , TiCl 4 , SnCl 4 , SnCl 2 , SnSO 4 , and mixtures thereof. The method of claim 5, wherein the organic or inorganic precursor is mixed with a doping agent containing at least one of niobium, ruthenium, iridium, rhodium, platinum, palladium, antimony, indium and fluorine. The method of claim 5 or 6, wherein the organic or inorganic precursor is mixed with glass fibers, valve metal oxide fibers, barium titanate fibers, strontium titanate fibers, and mixtures thereof, which contribute to the three dimensional characteristic of the roughened surface. The method of claim 1, wherein the ceramic oxide barrier layer is produced in step (3) by vapor deposition of a volatile starting material selected from titanium butyl orthotitanate, titanium ethoxide, titanium propoxide and mixtures thereof, in an inert gas preferably nitrogen, helium, argon or mixtures thereof. The method of claim 1 or 8, wherein the ceramic oxide barrier layer is produced in step (3) by vapor deposition of a volatile starting material mixed with a doping agent containing at least one of niobium, ruthenium, iridium, rhodium, platinum, palladium and mixtures thereof. The method of any preceding claim, wherein after formation of the ceramic oxide barrier layer and before application of the electrocatalytic coating the substrate is subjected to at least one further treatment such as an annealing heat treatment while maintaining said defined surface roughness. The method of any preceding claim, wherein the electrocatalytic coating is applied onto the ceramic oxide barrier layer by the application of one or more layers of a solution of a thermally decomposable electrocatalyst-precursor compound or compounds, such as iridium and tantalum salts in solution, followed by heating to produce the electrocatalyst. An electrode comprising a metal substrate, having a roughened surface with a profilometer-measured average surface roughness of at least about 250 microinches (about 635 micrometers) and an average surface peaks per inch of at least about 40 (about 15.7 peaks per cm), basis a profilometer upper threshold limit of 400 microinches (1016 micrometers) and a profilometer lower threshold limit of 300 microinches (762 micrometers), and an electrocatalytic coating on the roughened surface, characterized in that an electrocatalytic coating comprising iridium and tantalum oxides in an amount of from about 4 to about 50 grams per square meter of iridium, as metal, with the ratio of iridium to tantalum being from about 50:50 to about 99:1, is applied on a ceramic oxide barrier layer having said defined surface roughness, which ceramic oxide barrier layer is constituted on the metal substrate by: (a) an intergranularly etched metal substrate having three-dimensional grains with deep grain boundaries; or (b) a melt sprayed valve metal layer on the metal substrate; or (c) a grit blasted three-dimensional surface of the metal substrate produced by blasting with sharp grit, preferably followed by etching; forming a surface with said defined surface roughness, there being provided on the roughened surface of (a), (b) or (c) a ceramic oxide barrier layer which maintains said defined surface roughness, such ceramic oxide barrier layer provided on the roughened surface produced by (a), (b) or (c) being : (1) an oxidized layer of the roughened surface produced by heating the roughened surface in an oxygen-containing atmosphere; or (2) an applied oxide layer formed by applying a metal oxide precursor in one or more layers to the roughened surface and converting the precursor to metal oxide by heat treatment; or (3) an applied oxide layer formed by depositing on the roughened surface a suboxide layer by chemical vapor deposition and heating. The electrode of claim 12, wherein the metal forming the surface of the metal substrate is selected from the metals, alloys and intermetallic mixtures of titanium, tantalum, niobium, aluminium, zirconium, manganese and nickel. The electrode of claim 12 or 13, comprising a melt sprayed layer (b) of valve metal selected from titanium, tantalum, niobium, zirconium, hafnium, their alloys and intermetallic mixtures. The electrode of claim 12 or 13, comprising an applied oxide layer (2) codeposited with fibrous particulates selected from glass fibers, valve metal oxide fibers, barium titanate fibers, strontium titanate fibers and mixtures thereof, said fibrous particulates contributing to the three-dimensional characteristic of the roughened surface. The electrode of any one of claims 12 to 15, wherein the ceramic oxide barrier layer has a thickness of from about 0.001 inch to about 0.025 inch (about 25 micrometers to about 635 micrometers). The electrode of any one of claims 12 to 16, wherein said roughened surface has a profilometer-measured average surface roughness of at least about 300 microinches (about 762 micrometers), and an average surface peaks per inch of at least about 60 (about 152 peaks per cm), basis an upper threshold limit of 400 microinches (about 1016 micrometers), and a lower threshold limit of 300 microinches (about 762 micrometers). The electrode of any one of claims 12 to 17, wherein said roughened surface has a profilometer-measured average distance between the maximum peak and the maximum valley of at least about 1000 microinches (about 2540 micrometers), preferably from about 1500 microinches (about 3810 micrometers) to about 3500 microinches (about 8890 micrometers). The electrode of any one of claims 12 to 18, wherein the roughened surface has a profilometer-measured average peaks height of at least about 1000 microinches (about 2540 micrometers), preferably at least about 1500 microinches (about 3800 micrometers) up to about 3500 microinches (about 8890 micrometers). An electrode metal substrate, having a roughened surface with a profilometer-measured average surface roughness of at least about 250 microinches (about 635 micrometers) and an average surface peaks per inch of at least about 40 (about 15.7 peaks per cm), basis a profilometer upper threshold limit of 400 microinches (1016 micrometers) and a profilometer lower threshold limit of 300 microinches (762 micrometers), which roughened surface is adapted to receive an applied electrocatalytic coating, characterized in that the roughened surface of the substrate adapted to receive the applied electrocatalytic coating is a ceramic oxide barrier layer having said defined surface roughness, which ceramic oxide barrier layer is constituted on the metal substrate by: (a) an intergranular etched metal substrate, which provides three-dimensional grains with deep grain boundaries; or (b) a grit blasted three-dimensional surface of the metal substrate produced by blasting with sharp grit, preferably followed by etching; forming a surface with said defined surface roughness, there being a ceramic oxide barrier layer provided on the roughened surface of (a) or (b) which maintains said defined surface roughness, the ceramic oxide barrier layer provided on the roughened surface produced by (a) or (b) being : (1) an oxidized layer of the roughened surface produced by heating the roughened surface in an oxygen-containing atmosphere; or (2) an applied oxide layer formed by applying a metal oxide precursor in one or more layers to the roughened surface and converting the precursor to metal oxide by heat treatment; or (3) an applied oxide layer formed by depositing on the roughened surface a suboxide layer by chemical vapor deposition and heating. The electrode metal substrate of claim 20, wherein the metal forming the surface of the metal substrate is selected from the metals, alloys and intermetallic mixtures of titanium, tantalum, niobium, aluminium, zirconium, manganese and nickel. The electrode metal substrate of claim 20 or 21, comprising an applied oxide layer (2) codeposited with fibrous particulates selected from glass fibers, valve metal oxide fibers, barium titanate fibers, strontium titanate fibers and mixtures thereof, said fibrous particulates contributing to the three-dimensional characteristic of the roughened surface. The electrode metal substrate of claim 20, 21 or 22, wherein the ceramic oxide barrier layer has a thickness of from about 0.001 inch to about 0.025 inch (about 25 micrometers to about 635 micrometers). The electrode metal substrate of any one of claims 20 to 23, wherein said roughened surface has a profilometer-measured average surface roughness of at least about 300 microinches (about 762 micrometers), and an average surface peaks per inch of at least about 60 (about 152 peaks per cm), basis an upper threshold limit of 400 microinches (about 1016 micrometers), and a lower threshold limit of 300 microinches (about 762 micrometers). The electrode metal substrate of any one of claims 20 to 24, wherein said roughened surface has a profilometer-measured average distance between the maximum peak and the maximum valley of at least about 1000 microinches (about 2540 micrometers), preferably from about 1500 microinches (about 3810 micrometers) to about 3500 microinches (about 8890 micrometers). The electrode metal substrate of any one of claims 20 to 25, wherein the roughened surface has a profilometer-measured average peaks height of at least about 1000 microinches (about 2540 micrometers), preferably at least about 1500 microinches (about 3800 micrometers) up to about 3500 microinches (about 8890 micrometers). An electrode comprising the electrode metal substrate of any one of claims 20 to 26, coated with an electrocatalytic coating. The electrode of claim 27, wherein the electrocatalytic coating contains a platinum group metal, or platinum group metal oxide or their mixtures or mixtures with other oxides, in particular a mixed crystal material of at least one oxide of a valve metal and at least one oxide of a platinum group metal. The electrode of claim 27, wherein the electrocatalytic coating contains at least one oxide selected from platinum group metal oxides, platinates, magnetite, ferrite and cobalt oxide spinel and other non-precious metal oxides in particular manganese dioxide, lead dioxide, and tin dioxide and their mixtures, and mixtures such as nickel-nickel oxide and nickel plus lanthanide oxides. The electrode of claim 27, wherein the electrocatalytic coating comprises iridium oxide, or iridium and tantalum oxides in an amount of from about 4 to about 50 grams per square meter of iridium, as metal, with the ratio of iridium to tantalum being from about 50:50 to about 99:1 Use of the electrode of any one of claims 12 to 19 or claims 27 to 30 as anode in anodizing, electroplating or electrowinning, sodium sulfate electrolysis or copper foil plating, or in an acid recovery or acid regeneration process, in particular as oxygen evolving anode in high-speed electrogalvanizing or electrotinning. An electrolytic cell comprising an anode which is an electrode produced by the method of any one of claims 1 to 11, or is an electrode as defined in any one of claims 12 to 19 or claims 27 to 30. The cell of claim 32, which is a flooded cell, a falling electrolyte cell, or a radial jet cell. The cell of claim 32 or 33, which is an anodizing, electroplating or electrowinning cell, or an electrogalvanizing, electrotinning, sodium sulfate electrolysis or copper foil plating cell.

Inventors: CARLSON RICHARD, ERNES LYNNE M, HARDEE KENNETH L, CARLSON, RICHARD, ERNES, LYNNE M., HARDEE, KENNETH L.
Applicants: ELTECH SYSTEMS CORP, ELTECH SYSTEMS CORPORATION
Application year: 1993
Main classification: C23C4
IPC codes: C25B11, C23F1, C23C4, C25C7, C23C26, C25D17, C23C8, C23C28