Method for treating a surface of an aluminum substrate for a printing plate

Abstract: A method and apparatus for treating a surface of an aluminum substrate for a printing plate includes treating the substrate surface with a treatment liquid being circulated, separating and discharging aluminum ions from a portion of the treatment liquid, recovering a sodium hydroxide solution from the treatment liquid, mixing the recovered sodium hydroxide solution with the treatment liquid being circulated, and maintaining a predetermined concentration of aluminum ions in the treatment liquid to be used. A portion of the treatment liquid containing sodium aluminate solution is mixed with aluminum slag containing an amorphous aluminum hydroxide produced at the time of neutralization of a waste acid and a waste alkali produced during surface treatment to thereby supersaturate the sodium aluminate solution, crystallize the aluminum hydroxide, and recover the sodium hydroxide solution to be returned to a liquid control tank to maintain a predetermined concentration of aluminum ions in the treatment liquid. Further, the characteristics of the aluminum slag are changed to be usable as an industrially available aluminum hydroxide. Still further, a hydrolytic reaction is caused in a separated part of the treatment liquid. Preferably, the supersaturated aluminate solution is passed through a filter, so that aluminum hydroxide is crystallized from the sodium aluminate solution, and the sodium hydroxide solution is recovered.

Description: The present invention relates to a method for performing surface treatment of an aluminum plate used for a printing plate, and particularly relates to a method for recovering an etching liquid containing sodium hydroxide as a main component thereof and a method for improving the quality of aluminum slag generated in the surface treatment. Various treatment liquids are used in performing surface treatment of an aluminum plate for a printing plate. For example, nitric acid and hydrochloric acid are used in an electrical surface-roughening process, sulfuric acid is used in an anodizing process, and aluminum hydroxide is generally used in a process of etching aluminum chemically. On the other hand, as a support or substrate for a lithographic press plate, an aluminum plate or an aluminum alloy plate is used, and the surface shape or the like of the substrate after being treated varies largely depending on the concentration of aluminum ions in the above-mentioned treatment liquid, so that the aluminum ions greatly affect the quality of a plate used for a printing plate. For example, when electrochemically roughening an aluminum plate with nitric acid, the concentration of nitric acid is preferably selected to have a value ranging from 5 g /l to 30 g/l to perform uniform roughening, and the concentration of the aluminum ions is preferably selected to have a value ranging approximately from 5 g/l to 15 g/l. Additionally, when performing an anodizing treatment with sulfuric acid, the concentration of sulfuric acid preferably ranges from 50 g/l to 300 g/l. If the concentration of the aluminum ions exceeds 15 g/l, an anodized film cannot be produced uniformly on the aluminum plate surface. Generally, an etching treatment using sodium hydroxide is performed as a process after roughening the surface mechanically or before or after roughening the surface with nitric acid or sulfuric acid electrochemically. In most cases, aluminum ions exist in a treatment liquid. Thus, the optimum values of the respective concentrations of the sodium hydroxide and aluminum ions range from 200 to 600 g/l, which is not more than the saturation concentration, and from 10 to 100 g/l. Additionally, the ratio of the aluminum ion concentration to the sodium hydroxide concentration is low, and generally the concentration of aluminum ions is made no higher than the saturation concentration. As described above, the aluminum ion concentration greatly influences the quality of an aluminum substrate used for a printing plate, and hence maintaining the proper aluminum ion concentration in the treatment liquid to a predetermined value is critical. To maintain the concentration of aluminum constant, the treatment liquid in the treatment system has generally been discharged externally of the system, or, as disclosed in Japanese Unexamined Patent Publication No. Sho-57-192300, the aluminum ions in a treatment liquid have been absorbed by an ion-exchange resin. However, in the method for discharging the treatment liquid in a treatment system externally of the system to adjust the concentration of aluminum ions, treatment liquid must be discharged together with the aluminum ions, so that the quantity of the treatment liquid used becomes very large and the amount of waste treatment liquid is also large. In the method for absorbing aluminum ions with an ion-exchange resin to discharge the aluminum ions externally of a system, the ratio of removing the aluminum ions relative to the amount of ion-exchange resin used is so low that a large quantity of resin must be used. Furthermore, the resin must be exchanged frequently, for instance, every three months, and thus the operating costs of the system are high. Additionally, the present applicants have earlier proposed (see Japanese Unexamined Patent Publication No. Hei-1-200992) a method of discharging aluminum ions externally of a system through diffusion dialysis using an ion-exchange resin to separate aluminum ions from sodium hydroxide. However, in diffusion dialysis, aluminum hydroxide scale and the like tends to adhere to the waste liquid side after removal of undissolved metal such as iron adhering to a film. Thus, after the diffusion dialysis, an acid such as sulfuric acid must be used to clean the system, for instance, every three days, thereby increasing the cost of using such a system. Additionally, a large amount of aluminum slag is discharged during the surface treatment process of an aluminum plate, and there has not been any commercial use of this slag, so that managing and disposing of the slag is burdensome. Additionally, in accordance with a technique disclosed in Japanese Unexamined Patent Publication No. Sho-57-2649, a silicic acid is added, but applications of this technique are limited, and the technique is not preferably used for the surface treatment of a substrate for a lithographic press plate. US-A-3 909 405 relates to a method for treating an acidic or alkaline waste liquid containing aluminium dissolved therein to convect it to a neutral liquid free from colloidal aluminium hydroxide. According to said reference an etching waste liquid, hydrous aluminium oxide and crystalline ortho form of aluminium oxide are mixed to form a mold of the crystalline ortho form of aluminium oxide, which is filtered to separate the solid from the solution. The solution is recycled for etching and the solid is neutralised by waste alkali and waste acid to form hydrous aluminium oxide, which is filtered together with the crystalline ortho form of aluminium oxide. In view of the foregoing conventional methods, when performing surface treatment of an aluminum plate for a lithographic press plate using various alkali treatment liquids, and particularly when performing a surface etching treatment using sodium hydroxide, it has been difficult to maintain the concentration of aluminum ions in a treatment system to a predetermined value to make the quality of the treated surface superior and uniform. Additionally, it has been difficult from the standpoint of environmental integrity and operating costs to reuse the large amount of aluminum slag discharged during the surface treatment process. However, as described above, no suitable method has yet been proposed. Another problem that the invention is directed to solving is to accelerate the crystallizing reaction of the etching liquid and the aluminum hydroxide and to reduce impurities contained in the aluminum hydroxide changed in quality when the liquid in which the above-mentioned aluminum slag is dissolved is crystallized and the aluminum slag is changed in quality. Thus, the conventional methods and apparatus for performing surface treatment of an aluminum plate for a lithographic printing plate using various alkali treatment liquids, and particularly surface etching using sodium hydroxide, are inadequate to: maintain a predetermined concentration of aluminum ions in a treatment liquid (etching liquid) in a treatment system to make the quality of the treated surface superior and uniform, industrially reuse the aluminum hydroxide recovered from the etching liquid, and accelerate the crystallizing reaction to recover the etching liquid, and reduce impurities contained in the recovered aluminum hydroxide. However, as has been described above, no acceptable method therefor has been conventionally proposed. In view of the foregoing problems of the conventional systems and methods, an object of the present invention is to maintain the concentration of aluminum ions in a treatment liquid to a predetermined value to make the quality of the treated surface superior and uniform when performing surface treatment on an aluminum plate for a printing plate by using sodium hydroxide. Another object of the present invention is to industrially and effectively reuse aluminum slag discharged during a surface treatment process. Yet another object of the present invention is to reduce impurities contained in the aluminum slag discharged in a surface treatment process to thereby improve the quality the aluminum slag so that the slag can be reused. With the above objects in mind, the present invention has been developed. In accordance witn the present invention this object is attained with a method for treating a surface of an aluminum substrate for a printing plate, comprising the steps of etching with an alkaline solution, electrolytic treatment with an acidic solution and water rinsing, wherein aluminum ions are circulated in a treatment system, said method comprising: (a) treating the surface of said substrate with an etching liquid containing sodium hydroxide and sodium aluminate and circulating the etching liquid between the etching treatment tank and a liquid control tank; (b) neutralizing waste acid and waste alkali discharged during the electrolytic treatment and the rinsing steps of said surface of said aluminum substrate in a pH control tank to produce an aluminum slag containing amorphous aluminum hydroxide as its main component; (c) mixing said aluminum slag obtained in step (b) with a portion of the used etching liquid of step (a) containing sodium hydroxide and sodium aluminate in a dissolution tank for preparing a sodium aluminate solution; (d) supersaturating the sodium aluminate solution of step (c) to crystallize aluminium hydroxide in a precipitation tank; (e) removing the crystallized aluminum hydroxide of step (d), thereby recovering a sodium hydroxide solution; and (f) mixing the recovered sodium hydroxide solution of step (e) with a further portion of the used etching liquid in the liquid control tank to maintain a predetermined concentration of aluminum ions in the etching liquid to be recycled to etching step (a); and with an apparatus for treating a surface of an aluminum substrate (23,323) for a printing plate comprising means (11,311) for etching, means (15,24,25,315,324,325) for electrolytic treatment and means (6,306) for conducting water rinsing of said aluminum substrate, wherein aluminum ions are circulated in a treatment system, said apparatus further comprising: a liquid control tank (5,305) for mixing and storing the etching liquid having been used for treating the surface of said substrate (23,323) with a recovered sodium hydroxide solution; a liquid feed pipe (12,312) and a liquid return pipe (14,314) interconnecting the liquid control tank (5,305) and the etching means (11,311); means (21,22,321,322) for maintaining the concentration of aluminum ions in the etching liquid stored in the liquid control tank (5,305); pipe (13,313) for separating and discharging externally of said system aluminum ions from a portion of said etching liquid from the liquid control tank (5,305); means (27,327) for neutralizing waste acid (31-33, 331-333) and waste alkali (30,330) from rinsing means (6,306) and electrolytic treatment means (15,315), wherein aluminum slag (16,316) containing amorphous aluminum hydroxide as its main component is produced during neutralisation; dissolution tank (34,334) for mixing said aluminum slag (16,316) with said portion of the etching liquid separated through pipe (13,313), to thereby supersaturate the sodium aluminate solution; precipitation tank (7,307) for crystallizing aluminum hydroxide from said supersaturated sodium aluminate solution; thickener (8,308) for removing the crystallized aluminum hydroxide, thereby recovering said sodium hydroxide solution; and means (20,320) for recirculating said recovered sodium hydroxide solution to the liquid control tank (5,305). According to the present invention, aluminum slag, which contains, as its main component, an amorphous aluminum hydroxide produced during neutralization of a waste acid and a waste alkali produced in a surface treatment process of an aluminum plate, is mixed with a portion of the treatment liquid containing the sodium aluminate solution while the latter is circulated to thereby supersaturate the sodium aluminate solution, crystallize the aluminum hydroxide, and recover the sodium hydroxide solution. The recovered sodium hydroxide solution is returned to a liquid control tank so that the concentration of aluminum ions in the treatment liquid can be maintained at a predetermined value, and the aluminum slag, which prior to the invention was an industrial waste, is used as an industrially available aluminum hydroxide, thereby eliminating industrial waste. In the present invention, the separation of the aluminum ions in the treatment liquid externally of the system refers to the separation of the treatment liquid used in the treatment process externally of the system at a position independent of the treatment process. Further, mixing the recovered treatment liquid with the treatment liquid while the latter is being circulated and maintaining a constant value of the aluminum ion concentration in the treatment liquid means that recovered liquid having a small quantity of aluminum ions is returned to the liquid control tank and a make-up liquid and dilution water are added to thereby maintain the concentration of aluminum ions in the treatment liquid at a predetermined value. In a diffusion dialysis method using an ion-exchange film, separation is performed using the concentration difference between liquids on the opposite sides of the ion-exchange film. As a method for crystallizing aluminum hydroxide by using a saturated sodium aluminate solution, there are various methods, including a method for separating aluminum hydroxide by using an agitating blade, as disclosed in Japanese Patent Publication No. Sho-53-27718. According to a preferred embodiment of the present invention, after aluminum slag, which contains, as its main component, amorphous aluminum hydroxide produced during neutralization of waste acid and waste alkali produced in a surface treatment process of an aluminum plate, is mixed with a portion of the treatment liquid containing the sodium aluminate solution used while being circulated, and the dissolved solution is passed through a filter so that undissolved components in the solution are eliminated. The resulting liquid, which has been turned into a supersaturated sodium aluminate solution, is fed to a crystallizing tank, and aluminum hydroxide is crystallized so that the aluminum slag, which prior to the present invention has been an industrial waste, is changed into crystallized aluminum hydroxide having a low content of water, which can be used as an industrially effective aluminum hydroxide. Thus, a surface treatment method according to the invention is preferable over those of the conventional methods. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 shows schematically the configuration of an apparatus for performing etching treatment according to the present invention; Fig. 2 is a flow diagram of the schematic configuration shown in Fig. 1; Fig. 3 shows schematically the configuration of an apparatus for performing etching treatment according to a preferred embodiment of the treatment method of the present invention; Fig. 4 is a flow diagram of the schematic configuration shown in Fig. 3; and DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described with reference to Figs. 1 and 2. However, the present invention is not to be limited by this or any other embodiment described below. Figs. 1 and 2 are, respectively, a schematic configuration diagram and a flow diagram of an apparatus for performing surface treatment of an aluminum plate according to the method of the present invention. In the etching treatment, an aluminum plate 23 is conveyed through a series of rollers 2 through an etching treatment tank 11, a water rinse tank 6, an electrolytic treatment tank 15 having an electrode 26, a second water rinse tank 6, an anodizing power supply tank 24 having an electrode 26, an anodizing tank 25 having an electrode 26, and a third water rinse tank 6. A treatment liquid is mixed in a liquid control tank 5, and the mixed treatment liquid is fed to a spray pipe 3 in an etching treatment tank 11 through a liquid feed pipe 12 by using a liquid feed pump 4. The etching treatment liquid from the liquid control tank 5 may also be fed to a dissolution tank 34 through a liquid feed pipe 13 branching off from the liquid feed pipe 12. The quantity and time of the fed liquid can be controlled by valves (not shown in the drawings) provided in line with the pipe arrangements. The liquid control tank 5 and the etching treatment tank 11 are interconnected through the liquid feed pipe 12 and a return liquid pipe 14, and the etching treatment liquid is circulated among them. Through the etching treatment, the quantity and component concentration of the treatment liquid are changed. For example, a sodium hydroxide component in the treatment liquid decreases by a reaction caused during the etching treatment, the quantity of an aluminum ion component increases, water decreases by evaporation, and so on. Therefore, the sodium hydroxide solution and water used in the treatment liquid in the liquid control tank 5 are replenished through make-up or replenishing pipes 21 and 22, respectively. However, it is not very effective to maintain a predetermined concentration of the aluminum ions in the treatment liquid to by using a make-up liquid without also eliminating the increase of aluminum ions. Therefore, a portion of the treatment liquid which is used while being circulated in the liquid control tank 5 is fed to the dissolution tank 34 through the liquid feed pipe 13 occasionally so that aluminum ions are discharged externally of the system. On the other hand, a waste alkali 30 and a waste acid 31-33 discharged through the surface treatment are neutralized in a ph control tank 27 so that aluminum slag 16 is coagulated in a coagulation tank 28. After solid and liquid phases are separated in a filter press 29, the aluminum slag 16 is fed to the dissolution tank 34 occasionally. In the dissolution tank 34, the etching treatment liquid and the aluminum slag 16 are mixed and adjusted into a supersaturated sodium aluminate solution, which is fed to a precipitation tank 7 occasionally. In the precipitation tank 7, the aluminum hydroxide is crystallized by using a seed of aluminum hydroxide in the supersaturated sodium aluminate solution as a nucleus. Thereafter, the mixture of the treatment liquid mainly including a sodium hydroxide solution having a reduced concentration of aluminum ions and the crystals of aluminum hydroxide is fed to a thickener 8 through a liquid feed pipe 17. The crystallized aluminum hydroxide is separated in a drum filter 9 through a pipe 18, and collected into a hopper 10. On the other hand, the treatment liquid mainly including a sodium hydroxide solution is returned, as a recovered liquid, to the liquid control tank 5 through a recovery pipe 20. According to the apparatus having the above-mentioned arrangement, the quantity of the treatment liquid used per unit time when performing an etching treatment on the surface of an aluminum plate was measured while the treatment liquid was recovered under the following conditions: aluminum plate width 1000 mm treatment speed 50 m/min treatment liquid: sodium hydroxide 300 g/l aluminum ions 75 g/l temperature 60°C The quantity of the sodium hydroxide solution recovered from the make-up pipe 22 was 60 kg/h (20 g/-m 2 ). The time required for crystal separation reaction in the precipitation tank 7 was about 60 h, and the aluminum hydroxide obtained by crystallization had the following qualities: Comparative Example No.1 Similarly to the conventional methods, etching treatment was performed on the surface of an aluminum plate by a method of external control to maintain the aluminum ion concentration constant while omitting the processes subsequent to the solution tank, and discharging a portion of the surface treatment liquid externally of the system. Other conditions were the same as in the first embodiment described above. The quantity of the sodium hydroxide solution used per unit time was greatly increased to 240 kg/h (80 g/m 2 ). Additionally, it was necessary to treat the surface treatment liquid discharged externally of the system by neutralization or the like, and it was necessary to dispose of the aluminum hydroxide slag discharged in the respective surface treatment processes. Thus, as compared to the conventional methods, the surface treatment method according to the present invention has the following advantages: (1) the efficiency of using the treatment liquid utilized for surface treatment was improved, and the quantity of the sodium hydroxide used was reduced; and (2) it was unnecessary to dispose of the treatment liquid discharged externally of a system, which had been disposed of as an industrial waste hitherto the invention, and the quality of aluminum hydroxide slag discharged in the respective surface treatment processes was changed into an industrially useful form of aluminum hydroxide. Thus, the manufacturing cost was greatly reduced. A preferred embodiment of the present invention will be described with reference to Figs. 3 and 4. Figs. 3 and 4 are a schematic configuration diagram and a flow diagram, respectively, of an apparatus for performing surface treatment of an aluminum plate according to the preferred embodiment of the present invention. In an etching treatment, by performing a surface treatment process similarly to the above-described embodiment of Fig. 1, a portion of treatment liquid used while being circulated in the liquid control tank 305 is fed to the dissolution tank 334 occasionally, and aluminum ions are discharged externally of the system. On the other hand, a waste alkali 330 and a waste acid 331-333 discharged in the respective surface treatment processes are neutralized in a pH control tank 327 so that aluminum slag 316 is coagulated in a coagulation tank 328. Additionally, after solid and liquid phase components are separated from each other in a filter press 329, the aluminum slag 316 is fed to the dissolution tank 334 occasionally. In the dissolution tank 334, the etching treatment liquid and the aluminum slag 316 are mixed and formed into a supersaturated sodium aluminate solution. The liquid thus formed is passed through a filter 335 to eliminate undissolved components, and fed to a precipitation tank 307 occasionally. In the precipitation tank 307, the aluminum hydroxide is crystallized using a seed of aluminum hydroxide in the supersaturated sodium aluminate solution as a nucleus. Therefore, the mixture of the treatment liquid mainly including a sodium hydroxide solution having a reduced concentration of aluminum ions and containing crystals of aluminum hydroxide is fed to a thickener 308 through a liquid feed pipe 317, and the crystallized aluminum hydroxide is separated in a drum filter 309 through a pipe 318, and collected into a hopper 310. On the other hand, the treatment liquid mainly including a sodium hydroxide solution is returned, as a recovered liquid, to the liquid control tank through a recovery pipe 320. According to the apparatus having the above-described arrangement shown in Fig. 3, the quantity of the treatment liquid used per unit time when performing an etching treatment on the surface of an aluminum plate was measured while the treatment liquid was recovered under the following conditions (which were the same as those described above with respect to Fig. 1): aluminum plate width 1000 mm treatment speed 50 m/min treatment liquid: sodium hydroxide 300 g/l aluminum ions 75 g/l temperature 60°C The quantity of the sodium hydroxide solution recovered from the make-up pipe 322 was 60 kg/h (20 g/m 2 ). The time required for the crystallizing reaction in the precipitation tank 307 at this time was about 14 h, and the aluminum hydroxide obtained by the crystallization had the qualities listed below. For the sake of comparison, the quality of the aluminum hydroxide in the first embodiment is also shown. The quality of the aluminum hydroxide obtained in the above-mentioned embodiment was superior to that of the aluminum hydroxide obtained in the embodiment of Fig. 1, so that it is understood that preferably a supersaturated sodium aluminate solution is passed through a filter to thereby remove undissolved components, and then the resulting solution is crystallized in a precipitation tank. With a surface treatment method according to the preferred embodiment of the present invention: (1) the efficiency of the treatment liquid used for surface treatment was improved, and the quantity of the sodium hydroxide used was reduced; and (2) it was unnecessary to dispose of the treatment liquid discharged externally of the system, which had conventionally been disposed of as an industrial waste, and it was possible to improve the quality of aluminum hydroxide slag discharged in the respective surface treatment processes into an industrially available and useful aluminum hydroxide which could be sold as aluminum hydroxide industrial products. Additionally, through mixing an etching treatment liquid with the aluminum slag, adjusting a supersaturated sodium aluminate solution, and passing this adjusted solution through a filter to thereby remove undissolved components the following advantages were achieved: (3) the time for the crystallizing reaction was shortened to 1/4 of that used previously; (4) the capacity of the precipitation tank could be reduced to 1/4 of that used previously because of the reduction of the staying time for crystallization; and (5) the iron component of the aluminum hydroxide obtained by the crystallization became 1/10, the high molecular component thereof became not more than 1/5, and the color thereof became white. Thus, the manufacturing cost could be decreased over that of the conventional systems. Thus, according to a surface treatment method for the present invention: (1) the efficient use of the treatment liquid employed for surface treatment was improved, and the quantity of sodium hydroxide used was reduced, and (2) it became possible to sell the aluminum hydroxide (as an industrial product) recovered from a treatment liquid and discharged externally of a system. Additionally, by adding water to the etching treatment liquid as required, adjusting a supersaturated sodium aluminate solution, and passing this adjusted solution through a filter to thereby remove undissolved components: (3) it was possible to shorten the crystallizing reaction time to 1/4; (4) it became possible to reduce the precipitation tank capacity by 1/4 because of the reduction of the staying time for the crystallization process time; and (5) the iron component of the aluminum hydroxide obtained by crystallization became 1/10 and the color thereof became white. While certain preferred embodiments have been shown and described above, many changes and modifications within the invention will be apparent to those of working skill in this technical field. Thus, the scope of the invention should be considered as limited only by the appended claims.

Claims: A method for treating a surface of an aluminum substrate for a printing plate, comprising the steps of etching with an alkaline solution, electrolytic treatment with an acidic solution and water rinsing, wherein aluminum ions are circulated in a treatment system, said method comprising: (a) treating the surface of said substrate with an etching liquid containing sodium hydroxide and sodium aluminate and circulating the etching liquid between the etching treatment tank and a liquid control tank; (b) neutralizing waste acid and waste alkali discharged during the electrolytic treatment and the rinsing steps of said surface of said aluminum substrate in a pH control tank to produce an aluminum slag containing amorphous aluminum hydroxide as its main component; (c) mixing said aluminum slag obtained in step (b) with a portion of the used etching liquid of step (a) containing sodium hydroxide and sodium aluminate in a dissolution tank for preparing a sodium aluminate solution; (d) supersaturating the sodium aluminate solution of step (c) to crystallize aluminium hydroxide in a precipitation tank; (e) removing the crystallized aluminum hydroxide of step (d), thereby recovering a sodium hydroxide solution; and (f) mixing the recovered sodium hydroxide solution of step (e) with a further portion of the used etching liquid in the liquid control tank to maintain a predetermined concentration of aluminum ions in the etching liquid to be recycled to etching step (a). The method according to claim 1, wherein the aluminum slag obtained in step (b) coagulates in a coagulation tank. The method according to any of claims 1 or 2, wherein the solid and the liquid components of the aluminum slag obtained in step (b) are separated in a filter press, and a predetermined quantity of said solid components is in step (c) fed to the dissolution tank at a predetermined time. The method according to claim 1, wherein in step (d) said aluminum hydroxide is crystallized by using a seed of said aluminum hydroxide in the supersaturated sodium aluminate solution as a nucleus. The method according to claim 1, wherein in step (c) the portion of the used etching liquid of step (a) is fed to the dissolution tank at a predetermined time such that a predetermined quantity of the aluminum ions is discharged externally of the system. The method according to claim 1, wherein removing step (e) is conducted in a thickener. The method according to claim 6, wherein the crystals of aluminum hydroxide removed in step (e) are further dehydrated in a drum filter and are collected in a hopper. The method according to claim 7, wherein the residual sodium hydroxide solution obtained from the drum filter is returned to the liquid control tank in step (f). The method according to claim 1, further comprising the step of conveying the supersaturated aluminate solution of step (d) through a filter before crystallisation of the aluminum hydroxide to remove undissolved components therefrom, in order to enable the sodium hydroxide solution obtained after step (e) to be reused in step (a). An apparatus for treating a surface of an aluminum substrate (23,323) for a printing plate comprising means (11,311) for etching, means (15,24,25,315,324,325) for electrolytic treatment and means (6,306) for conducting water rinsing of said aluminum substrate, wherein aluminum ions are circulated in a treatment system, said apparatus further comprising: a liquid control tank (5,305) for mixing and storing the etching liquid having been used for treating the surface of said substrate (23,323) with a recovered sodium hydroxide solution; a liquid feed pipe (12,312) and a liquid return pipe (14,314) interconnecting the liquid control tank (15, 305) and the etching means (11,311); means (21,22,321,322) for maintaining the concentration of aluminum ions in the etching liquid stored in the liquid control tank (5,305); pipe (13,313) for separating and discharging externally of said system aluminum ions from a portion of said etching liquid from the liquid control tank (5,305); means (27,327) for neutralizing waste acid (31-33, 331-333) and waste alkali (30,330) from rinsing means (6,306) and electrolytic treatment means (15,315), wherein aluminum slag (16,316) containing amorphous aluminum hydroxide is produced during neutralisation; dissolution tank (34,334) for mixing said aluminum slag (16,316) with said portion of the etching liquid separated through pipe (13,313), to thereby supersaturate the sodium aluminate solution; precipitation tank (7,307) for crystallizing aluminum hydroxide from said supersaturated sodium aluminate solution; thickener (8,308) for removing the crystallized aluminum hydroxide, thereby recovering said sodium hydroxide solution; and means (20,320) for recirculating said recovered sodium hydroxide solution to the liquid control tank (5,305). The apparatus according to claim 10, further comprising a filter (335) through which said supersaturated aluminate solution is conveyed to remove undissolved components from said supersaturated aluminate solution to enable the sodium hydroxide solution to be reused.

Inventors: FUKUTA HIROSHI, UESUGI AKIO, FUKUTA, HIROSHI, UESUGI, AKIO, Fukuta, Hiroshi , c/o Fuji Photo Film Co., Ltd., Uesugi, Akio , c/o Fuji Photo Film Co., Ltd.
Applicants: FUJI PHOTO FILM CO LTD, FUJI PHOTO FILM CO., LTD.
Application year: 1992
Main classification: C23F1
IPC codes: C23F1, B41N3