Liquid crystal display panel and projector utilizing the same

Abstract: This invention relates to a liquid crystal display panel which provided with a liquid crystal layer including plural pixels and a microlens array provided at the light incident side of the liquid crystal layer, wherein the distance between said microlenses and said liquid crystal layer is different comparing at a central position with at a peripheral portion of the liquid crystal display panel.

Description: BACKGROUND OF THE INVENTION Field of the Invention The present invention relates to a liquid crystal display panel apparatus for use in a liquid crystal display, a liquid crystal projector and the like. Related Background Art Liquid crystal display panels which an improved practical aperture rate by the utilization of microlenses have already been disclosed for example in the Japanese Patent Laid-Open Application Nos. 57-157215, 60-262131, 2-115889, 2-257119 and 3-136004. In the application of such a liquid crystal display panel to a liquid crystal projector, there is generally adopted an optical system as shown in Fig. 1, and a condenser lens 2 is usually provided behind the liquid crystal display panel 1 in order to concentrate the illuminating light into the projection lens. Consequently, as shown in Fig. 2, the illuminating light enters the liquid crystal display panel 1 obliquely in the peripheral portion thereof. For this reason, the pitch of the microlenses is gradually increased toward the peripheral portion of the panel 1, in such a manner that the optical axes of the incident light to all the microlenses pass through the apertures of the liquid crystal pixels. Figs. 3A and 3B are partial magnified cross-sectional views of said panel 1, respectively in the central portion and in the peripheral portion. In these drawings there are shown GI microlenses 8; a substrate 3c for microlenses; a liquid crystal layer 4; a TFT (thin film transistor) substrate 5; opaque areas 6; and apertures 7. Both in the central and peripheral portions, as indicated by arrows, the optical axis of the incident light to each microlens is provided to pass through the center of the aperture 7. In the peripheral portion, however, since the incident light is oblique against the panel as shown in Fig. 3B, the optical path from the microlens to the aperture becomes longer than that in the central portion. Consequently the focal point of the microlens becomes positioned in front of the aperture, so that the light beam again diverges in passing through the aperture and is partly intercepted by the opaque area. Consequently, even when the pitch of the microlenses is gradually increased toward the peripheral portion, as explained above, in order that all the optical axes of the incident light to the microlenses pass through the apertures of the liquid crystal pixels, the transmission efficiency is lower in the peripheral portion than in the central portion. In order to avoid such drawback, the Japanese Patent Laid-Open Application No. 2-257119 proposed to gradually decrease the power of the microlenses from the central portion toward the peripheral portion, in such a manner that the focal point of the light beam passing through the microlens always positions at the center of the aperture area. However, such variation of the powers of microlenses within a panel requires corresponding alternation of the manufacturing conditions of the microlenses to need a very complicated manufacturing process. Also the above-mentioned conventional configuration has been associated with the following drawbacks since the microlens array is formed on a glass substrate: (1) Configuration provided with microlens array at outside: In a conventional embodiment shown in Fig. 4, a liquid crystal layer 904 is sandwiched between a glass substrate 901 and a TFT substrate 903. On a surface of the TFT substrate 903, facing the liquid crystal layer 904, TFT's 907 (including wiring portions) and pixel electrodes 906 constituting effective pixel areas are alternately formed, and a counter electrode 905 is formed on a face of the glass substrate 901 facing the liquid crystal layer 904. A microlens array 902, provided on the external surface of the glass substrate 901 is so formed as to have a focal length equal to the thickness d (usually 1.1 mm) of the glass plate 901, and as to condense the illuminating lights A, B to the area of the pixel electrode 906. In this manner, the transmittance of the liquid crystal display device can be improved. However, the illuminating light may have a spreading angle  against the optical axis thereof, and oblique incident rays b 1 , b 2 aberrated from the principal ray B cannot reach the pixel electrode 906 constituting the effective pixel area, when the pixel size becomes smaller (particularly less than 100 µm). This phenomenon becomes more conspicuous as the pixel size becomes smaller in comparison with thickness d of the glass substrate 901, and the effect of microlenses 902 for improving the transmittance becomes accordingly reduced: (2) Configuration with microlens array at the liquid crystal side: In a conventional configuration shown in Fig. 5, a microlens array 902 is formed at the side of the liquid crystal layer 904. As the thickness t of the liquid crystal layer 904 is usually as small as 7 to 10 µm, rays A, B illuminating the peripheral area of the pixel are scarcely condensed even with the microlens of a highest power obtainable with the current technology, and cannot hit the effective pixel area. Consequently the microlens array 902 cannot fully exhibit the effect of improving the transmittance. Fig. 6 is a magnified plan view of an active matrix substrate for a liquid crystal display device, wherein a display pixel 603 and a switching TFT 604 are formed close to each crossing point of a row electrode 601 and a column electrode 602. On these elements there is provided with a polyimide alignment film, subjected to a rubbing process for aligning the liquid crystal. A cross section along a line I-II is shown in Fig. 7. On a gate electrode 701 of Al or Cr, there is provided with a gate insulation film 702. Across an amorphous Si layer (hereinafter written as a-Si layer) 703 and an a-Si(n+) layer 704, there are provided with drain electrode 705, a source electrode 706 and pixel electrodes 707 connected thereto. On these elements laminated are a protective insulation film 708 and a liquid crystal alignment film 709. A liquid crystal display panel is formed by positioning the above-explained first alkaline glass substrate 101 and a second alkaline glass substrate bearing a counter electrode in mutually opposed relationship, and filling the gap therebetween with liquid crystal. In such conventional configurations, however, the function of the TFT 604 formed on the alkaline glass substrate 101 is damaged if alkali ions intrude into said TFT from said alkaline glass substrate 101. There is already known a configuration in which an alkali-free glass substrate, capable of intercepting the alkali ions, is provided between the glass substrate 101 and the TFT 604, but such configuration inevitably increases the thickness of the liquid crystal display panel. Also it is higher in cost, because the alkali-free glass is more expensive than the ordinary alkaline glass. For solving such drawback problem, it is conceived to form an ion intercepting layer, for example by an evaporated film, on the glass substrate 101, but the liquid crystal alignment film 709 cannot be formed flat if the number of films between the liquid crystal alignment film 709 and the glass substrate 101 increases in the display pixel area 603 adjacent to the TFT 604. Therefore the function of the film 709 becomes degraded. JP-A-2 302 726 discloses a liquid crystal display element having a lens array with a high light convergence performance. In this display element microlenses (102) with a high numerical aperture are embedded in a counter substrate. In this arrangement a transparent layer and an orienting layer (109) are formed for holding a liquid crystal layer. By means of this display element light which is incident on the counter substrate is converged by the microlenses. The preamble of claim 1 is based on this document. Furthermore, from EP-A-0 409 619 a projection type image display apparatus is known. This apparatus comprises a light source and a transmissive display device having a number of picture elements, as well as, light converging means for converging rays of light in correspondence to one or more of the picture elements. Finally, a projection lens is provided having a larger numerical aperture than that of the light converging means. In detail, the light converging means comprises a microlens array and optionally a condenser lens, wherein the microlens array functions as a convex lens and all microlenses of the array are provided in a constant distance from the liquid crystal display panel. Additionally, EP-A-0 366 462 discloses a projection type image display apparatus comprising a light source (5) and a liquid crystal display panel (1) having a plurality of pixels. Furthermore, microlens arrays (2a, 2b) having a plurality of microlenses are provided on both sides of the liquid crystal panel (1). Additionally, a projection surface (6) is provided on the side of the apparatus where the light source is not arranged. Moreover, a condenser lens (4) is arranged between the light source (5) and the microlens arrays (2a, 2b). The pitches of the microlenses of the microlens array (2a) at the light source side is set to be larger than pitches of the pixels, while the pitches of the microlenses of the microlens array (2b) at the projection surface side is set to be smaller than those of the pixels. However, in the liquid crystal display panel as disclosed in JP-A-2 302 726 oblique incident rays aberrated from a principal ray cannot reach the respective pixel electrode constituting the effective pixel area, when the pixel size becomes smaller. Furthermore, due to the usually small thickness of the liquid crystal layer rays illuminating the peripheral area of the pixel are scarcely condensed even with the microlens of a highest power obtainable and cannot hit the effective pixel area. Due to these effects optical transmittance is small. Therefore, it is an object of the present invention to provide a liquid crystal display panel, wherein the optical transmittance is improved. According to the present invention this object is accomplished by a liquid crystal display panel, comprising: a liquid crystal cell including plural pixels; and a microlens array provided at the light incident side of said liquid crystal cell; characterized in that the distance between said microlenses and said liquid crystal cell is larger at a central portion than at a peripheral portion of said liquid crystal display panel. Thus, with the liquid crystal display panel according to the present invention the transmittance is increased in comparison with prior art display panels. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the optical configuration of a prior art liquid crystal projector; Fig. 2 is a cross sectional view of a liquid crystal display panel shown in Fig. 1; Figs. 3A and 3B are partial magnified cross-sectional views of a prior art liquid crystal display panel respectively in a central portion and a peripheral portion thereof; Fig. 4 is a cross-sectional view of a prior art liquid crystal display panel; Fig. 5 is a cross-sectional view of a prior art liquid crystal display panel; Fig. 6 is a plan view of a prior art liquid crystal display panel; Fig. 7 is a magnified cross-sectional view of a TFT of a prior art liquid crystal display panel; Fig. 8 is a cross-sectional view of a first embodiment of the liquid crystal display panel of the present invention; Figs. 9A and 9B are partial magnified cross-sectional views of the first embodiment of the liquid crystal display panel of the present invention, respectively in a central portion and a peripheral portion thereof; Fig. 10 is a cross-sectional view of another embodiment of the liquid crystal display panel of the present invention; Fig. 11 is a cross-sectional view of an example of a liquid crystal display panel; Fig. 12 is a cross-sectional view of another example of a liquid crystal display panel; Fig. 13 is a cross-sectional view of still another example of a liquid crystal display panel; Figs. 14 to 16 are cross-sectional views of still other examples of a liquid crystal display panel; Fig. 17 is a view showing an example of an arrangement of microlenses; Figs. 18A and 18B are views showing the configuration of projectors utilizing the present invention, respectively of a transmissive projector and a reflective projector; Fig. 19 is a cross-sectional view of an example of a liquid crystal display panel; Fig. 20 is a magnified cross-sectional view of a TFT; Fig. 21 is a magnified cross-sectional view of another TFT; Figs. 22 to 24 are magnified cross-sectional views of further TFTS; Figs. 25 and 26 are cross-sectional views of a liquid crystal display panel of other examples; and Fig. 27 is a schematic view of a projector utilizing a liquid crystal display panel according to the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Fig. 8 shows the first embodiment of the present invention, wherein shown are a condenser lens 2; a liquid crystal display panel la; a microlens substrate 3a; a liquid crystal layer 4; and a TFT substrate 5. The microlens substrate 3a is formed gradually thinner from the central portion thereof toward the peripheral portion. Figs. 9A and 9B are partial magnified cross-sectional views of the liquid crystal display panel la, respectively in a central portion and a peripheral portion thereof. Microlenses 8 are arranged, as in the aforementioned prior art configuration, in such a manner that the optical axes of incident light to the microlenses pass through the centers of the apertures 7. Furthermore the thickness of the substrate 3a is regulated, toward the peripheral portion thereof, in such a manner that the distance between the microlens 8 and the aperture 7 is always constant along the optical axis of the light entering obliquely by the condenser lens 2. Consequently, even in the peripheral portion of the panel, as shown in Fig. 9B, the focal point of the light beam passing through the microlens is positioned always at the center of the aperture, so that a satisfactory transmittance can be obtained as in the central portion of the panel. Also in the present embodiment, all the power of the microlens can be constant regardless of the position, so that the manufacturing process can be simplified. In the present embodiment, the microlenses are assumed to be a two-dimensional array similar to a fly's eye lens, and there is also assumed the corresponding two-dimensional variation in the thickness of the microlens substrate, but this concept is likewise applicable to a one-dimensional array of microlenses. In such a one-dimensional microlens array, the thickness of the microlens substrate can be varied one-dimensionally along the direction of array of the microlenses as the same as the above embodiment. Such a configuration may be effective in a laterally oblong image frame, such as of the high definition television. Also in the foregoing embodiment there are employed GI microlenses, but there may also be employed a method of forming ordinary convex microlenses for example of resin on a glass substrate instead of the microlens substrate 3a. Fig. 10 illustrates a second embodiment, in which a microlens substrate 3b, bearing microlenses thereon, is linearly tapered in the only peripheral portions. The microlens bearing surface of the microlens substrate has to be curved in order that the distance between the microlens 8 and the aperture 7 along the optical axis of the incident light is always adjusted to be constant regardless of any position, but, in the present embodiment, said curved form is approximated by a tapered surface in the peripheral portion. Consequently the manufacturing process can be further simplified. As explained in the foregoing, the liquid crystal display panel in the first embodiment of present invention can provide a satisfactory transmittance even in the peripheral portion of the panel as in the central portion thereof, thereby being capable of achieving uniform display of high quality over the entire area of the panel. Also the panel can be provided by low cost because of a simpler fabricating process. In the foregoing embodiments, the distance between the microlens and the liquid crystal layer is gradually decreased from the central portion of the display panel toward the peripheral portion thereof, because it is assumed that a condenser lens is provided at the entrance side of the liquid crystal display panel. However, in case of a somewhat divergent light beam entering the panel or the absence of said condenser lens, said distance may be formed to be gradually decreased from the peripheral portion of the display panel toward the central portion thereof. Fig. 11 is a cross-sectional view showing the configuration of an example of an liquid crystal display device. In the present example, a liquid crystal layer 104 is sandwiched between a glass substrate 101 and a TFT substrate 103. A TFT substrate 103, a liquid crystal layer 104, a counter electrode 105, and pixel electrodes 106 and TFT's 107 arranged at a pitch of 50 µm are similar to the TFT substrate 903, liquid crystal layer 904, counter electrode 905, pixel electrodes 906 and TFT's 907 shown in Fig. 4, and will not, therefore, be explained further. The glass substrate 101 of the present example is provided therein with a buried-type lens array 108 of distributed refractive index type, corresponding to the arrangement of the pixel electrodes 106. Said buried-type lens array 108 was prepared through the following steps: 1) A KF-3 glass substrate (containing 12 wt.% of Na 2 O; nd = 1.51, ν d = 54.7) of a thickness of 1.1 mm was subjected to the deposition, on both faces, of Ti films of a thickness of 1 - 2 µm, by sputtering or evaporation; 2) Apertures were formed photolithographically, corresponding to the lens forming positions (with a pitch of 50 µm on one face (mask formation)); 3) Ion exchange was conducted for a predetermined period in molten salt (520°C) of Tl 2 SO 4 : ZnSO 4 : K 2 SO 4 = 40 : 40 : 20 (mol.%) (formation of lenses of a diameter of 50 µm); 4) The glass substrate was taken out of the molten salt, then gradually cooled and washed with warm water; 5) Ti films (mask) were removed by etching or polishing; 6) Ion exchange was conducted again for a predetermined period in molten salt (520°C) of Na 2 SO 4 : K 2 SO 4 : ZnSO 4 = 25 : 25 : 50 (mol.%) free from Tl (lens burying); 7) Washing : same as the step (4). In the lens burying of the step (6), the ion exchange time is so determined that the burying depth becomes equal to the focal length of the lenses. The size and arrangement of each lens correspond to the pixel electrodes 106 in the liquid crystal layer 104. The glass substrate 101, in which the buried lens array 108 is formed as explained above, is used as the counter substrate of the liquid crystal display device as shown in Fig. 11, and is aligned thereto in such a manner that the optical axes of the light passing through said buried lens array 108 respectively correspond to the centers of the pixel electrodes 106 on the TFT substrate 103 to thereby form a liquid crystal display cell. The difference Δn in the refractive index between the buried lens array 108 and the glass substrate can be made about 0.1 in the above-explained process. The pixel pitch, based on the arrangement of the pixel electrodes 106, is 50 µm, so that the diameter of lenses of the buried array 108 is also selected as 50 µm. Under these conditions, the focal length and buried depth of the lens array 108 of the present example are selected as 200 µm. When illuminating light is introduced into the above-explained liquid crystal display device, the principal rays A, B of the illuminating light, shown in Fig. 11, are concentrated on and pass through the pixel electrode 106 and the liquid crystal layer 104 (effective pixel area) thereon. Also for oblique incident rays, such as b 1 and b 2 , the spreading on the liquid crystal layer 104 corresponding to the spreading angle  from the principal ray is relatively small because the buried lens array 108 is positioned close (200 µm) to the liquid crystal layer 104, so that the oblique incident ray with a large spreading angle  can also pass through the effective pixel area. Consequently the present example can generally improve the light transmittance. The buried lens array 108 may be formed within the TFT substrate 103 instead of the glass substrate 101, with the identical effects and advantages as in the above-explained example. In such case, however, the light is introduced from the side of the TFT substrate. Also in such case, the ion exchange time may be so regulated that the focal length of the buried lens array 108 becomes shorter by 7 - 8 µm, corresponding to the thickness of the liquid crystal layer 104. In such a manner, the principal rays of the illuminating light are concentrated around the pixel electrodes 106 of every pixels. Fig. 12 is a cross-sectional view of another example, in which the TFT substrate 103 shown in Fig. 11 is replaced by a TFT substrate 201 provided therein with a buried lens array 202. Since other structures are same as those in Fig. 11, they will be numbered similarly and will not explained further. The buried lens array 202, formed in the TFT substrate, similar to that 108 formed in the glass substrate 101. These buried lens arrays 108 and 202 in the substrates are so aligned that the optical axes connecting the respectively corresponding lenses coincide with the centers of the effective pixel areas. The illuminating light is condensed by the buried lens array 108 onto each effective pixel area, and is then converted into a telecentric beam by the microlens array 202. Consequently the present example not only achieves an improvement in the transmittance as in the example shown in Fig. 11, but also provides a telecentric emerging light of reduced spreading (at least of a same level as that of the illuminating light), and is therefore adapted for use in a projector or the like. Fig. 13 shows another example of the present invention, wherein the glass substrate 101 shown in Fig. 11 is replaced by a glass substrate 301 provided therein with a buried lens array 302 and also provided, on a surface at the side of the liquid crystal layer 104, with a lens array 303. The other structures, similar to those in the example shown in Fig. 11, are numbered similarly and will not be explained further. The buried lens array in the glass substrate 301 is achieved similarly as in the example shown in Fig. 11. Also the lens array 303, formed on the face at the side of the liquid crystal layer 104, is formed by the steps (1) to (5) in the example shown in Fig. 11. In said lens array 303, smaller lenses with a larger power are formed by more reducing the ion exchange time in the step (3). In the present example, the lenses of the array 303 are formed with a substantially same power, and are so positioned as to respectively correspond to the effective pixel areas. Also the buried depth of the lens array 302 is made larger than the focal length of the lenses constituting said array 302, by extending the ion exchange time of the step (6). In the present example, the illuminating light is concentrated by the buried lens array 302, then spreaded again and enters the lens array 303, whereby the emerging light beam is transformed into a telecentric state and is narrowed in the width by the arrangements of the lens arrays, thus passing through the effective pixel area in this state. Consequently the present example can provide similar effects as in the example shown in Fig. 12, and be adapted for use in similar applications. Fig. 14 is a cross-sectional view showing another example, wherein the glass substrate 101 shown in Fig. 11 is replaced by a glass substrate 401 provided with a lens array 402 on a face at the side of the liquid crystal layer 104, in combination with a transparent glass sheet 403 and a counter electrode 404. Other structures, being same as those in Fig. 11 are numbered same and will not be explained further. In the present example, the lens array 402 is formed on the surface of the glass substrate through the aforementioned steps (1) to (5), then a transparent glass sheet (or a polymer sheet) of a thickness corresponding to the focal length of the lens array 402 is adhered, and the counter electrode 404 is formed. Such elements are positioned opposite the TFT substrate 103, and the liquid crystal display device is obtained by filling the gap therebetween with the liquid crystal layer 104. The lenses constituting the lens array 402 are so positioned as to respectively correspond to the effective pixel areas. As the illuminating light is condensed by the lens array 402 onto the effective pixel areas and passes through said areas, there can be obtained effects and advantages same as those in the example shown in Fig. 11. Also the present example can simplify the fabricating process, since the step (6) can be omitted. Furthermore, similar effects and advantages can be attained by effecting the formation of the lens array and the adhesion of transparent glass sheet on the TFT substrate. Fig. 15 shows another example of the present invention, wherein formation of a lens array 502 and adhesion of a transparent glass sheet 501 are conducted on the TFT substrate 503 in the identical manner as in the example shown in Fig. 14, in addition to the glass substrate 401. Other structures, being same as those in the example shown in Fig. 14, are numbered same and will not be explained further. In the present example, the glass substrate 401 and the TFT substrate 503 are symmetrical with respect to the liquid crystal layer 104, as in the example shown in Fig. 12. For this reason, the present example provides similar effects and advantages as those in the example shown in Fig. 12, and can be adapted for use in similar applications. Formation of a buried lens array by ion exchange method in the TFT substrate may undesirably affect the performance of TFT, but, in the present example, such detrimental influence can be avoided by the presence of the transparent glass sheet between the lens array and the TFT's. Said effect can be further enhanced if said transparent glass sheet is composed of glass free from alkali ions. Fig. 16 shows another example, in which the glass substrate 101 in the example shown in Fig. 11 is replaced by a glass substrate 601 on which, on a face at the side of the liquid crystal layer 104, a resin microlens array 602 is formed by a method disclosed in the Japanese Patent Publication No. 60-59752, then planarized with a resin layer 603 of a lower refractive index, and a counter electrode 604 is formed thereon. Other structures, being same as those in the example shown in Fig. 11, are numbered same and will not be explained further. As the thickness of the resin layer 603 is selected equally to the focal length of the resin microlens array 602, the effects and advantages of the present example are identical with those of the example shown in Fig. 14. In the following there will be explained preferred arrangement of the components, taking the embodiment shown in Fig. 14 as an example. Fig. 17 is a partial magnified view of the example shown in Fig. 14. Incident light with certain spreading can be efficiently introduced into the effective pixel areas by arranging the components so as to satisfy following relationship: 2L·tan ≦ W wherein L is the distance between the lens array 402 and the liquid crystal layer 104; W is the effective pixel width in the liquid crystal layer 104; and  is the spreading angle of the incident light. In this state, there stands following relationship: L ≃ n·f wherein n is the refractive index of the transparent glass sheet 403 (corresponding to the glass substrate 101 in the first embodiment) between the lens array 402 and the liquid crystal layer 104, and f is the focal length of the lens array 402. The liquid crystal display devices shown in the foregoing embodiments are applicable in projectors as shown in Figs. 18A and 18B. Fig. 18A shows the structure of a transmissive projector, in which the light beam emerging from an illuminating system 801, provided with a lamp, a reflector, a condenser lens and so on is transmitted in succession by a transmissive liquid crystal display panel 802 of the present invention and a projection lens system 803, and is projected onto a screen 804. Fig. 18B shows the structure of a reflective projection, in which the light beam emerging from an illuminating system 805 is reflected by a beam splitter 806, then enters and is reflected by a reflective liquid crystal display panel 807 of the present invention, then transmitted in succession by the beam splitter 806 and a projection lens system 803, and is projected onto a screen 809. Both structures can provide with an extremely sharp image, since said panels are of an improved transmittance according to the feature of the present invention. As explained in the foregoing, the present invention has an effect to further improve the light transmittance for the illuminating light, by forming microlenses in a suitable position close to the liquid crystal layer. In the following there will be explained examples for preventing intrusion of alkali ions from the glass substrate to TFT's. As already known, there have been made trials for improving the efficiency of light utilization, by an increase in the aperture rate through the combination of a liquid crystal display panel as shown in Fig. 6 and an array of microlenses respectively corresponding to each pixel of said liquid crystal display panel. Such microlens array can be prepared, for example, by forming a distribution of refractive index, through permeation of thalium ions and the like into alkaline glass by ion exchange as explained before, and, in such method, the use of an alkaline glass substrate is indispensable. Following description assumes the use of such liquid crystal display panel provided with such microlens array. However, regardless whether the microlens array is present or not, the following description is applicable to any configuration involving possibility of intrusion of alkali ions from the substrate to TFT, as in the case of alkaline glass substrae. Fig. 19 is a cross-sectional view of a further example of a liquid crystal display panel. A liquid crystal layer 103 is sandwiched between glass substrates 101 and 102. Within the substrate 101, there is formed a microlens array 104, of which refractive force is obtained by refractive index distribution formed corresponding to the pixels (a pitch of 50 µm) of the displayed image. On a surface of the substrate 101, opposed to the liquid crystal layer 103, there integrally formed a Ti mask 105 composed of a thin titanium film, an insulating film 106 consisting of silicon nitride (SiN x ) or silicon oxide (SiO 2 ), and a TFT 107, corresponding to each pixel. Though not illustrated in Figs, the glass substrate 101 also bears row and column electrodes for actuating the TFT of each pixel, transparent pixel electrodes consisting of ITO, and a liquid crystal alignment film as shown in Fig. 6. Also a surface of the opposed glass substrate 102, facing the liquid crystal layer 103, provides with a transparent electrode and a liquid crystal alignment film. Illuminating means consisting of an unrepresented light source, an unrepresented reflector and so on is so positioned that the illuminating light beam therefrom enters the glass substrate 101 and emerges from the substrate 102. The glass substrate 101 of the present example is provided therein with a buried lens array 104 of refractive index distribution type, corresponding to the arrangement of the pixel electrodes. The forming method of said buried lens array 104 is same as explained in the foregoing examples, and will not, therefore, be explained further. Fig. 20 is a magnified cross-sectional view of a TFT, formed corresponding to each pixel on the glass substrate 101, after formation of said microlens array 104. The components of said TFT will be explained in the following, according to the fabricating process. At first, on the glass substrate 101, a Ti film of a thickness of 1 - 2 µm is formed by sputtering or evaporation. Said Ti film is left by a photolithographic process, only in portions where TFT's are to be formed, thereby obtaining a Ti mask 201. A gate insulation film 202, consisting of silicon nitride (SiN x ) ) or silicon oxide (SiO 2 ) of a thickness of ca. 2000 Å, is formed over the entire area of the substrate, then a gate electrode 203 consisting of aluminum or chromium or and a gate oxide film 204 are formed, and a gate insulation film 205 of SiN x of SiO 2 having a thickness of ca. 2000 Å is formed over the entire area of the substrate. Then, on the gate electrode, there are formed, in succession, an amorphous silicon (a-Si) layer 207 of a thickness of ca. 1000 Å, an n-type a-Si ohmic layer 208 of a thickness of ca. 500 Å, and electrode areas of aluminum or chromium of a thickness of ca. 5000 Å. Said ohmic layer and electrode areas are divided by etching into a source electrode 209 and a drain electrode 210. Then a transparent electrode 211, consisting of an ITO film having a thickness of ca. 1000 Å, is formed for connection to the source electrode 209 in each pixel. Finally a protective insulation film 212 of SiN x or SiO 2 of a thickness of ca. 3000 Å is formed over the entire area of the glass substrate, and a liquid crystal alignment film 213, consisting of rubbed polyimide of a thickness of ca. 500 Å is formed thereon. In the present example, the Ti mask 201 serves mainly to prevent intrusion of alkali ions from the glass substrate 101 to the a-Si layer 207 or the insulation layer between the a-Si layer 207 and the gate electrode 203. Consequently, said Ti mask 201 is preferably formed over broader than the lower face of the a-Si layer 207, in order to prevent ion intrusion from the lateral direction. More preferably it is formed as wide as possible, to such extent that plural light beams focused by the microlens array 104 in Fig. 19 are not hindered. The Ti mask layer 201 also serves as a light intercepting layer, for preventing generation of a photocurrent, by the entry of the illuminating light into the a-Si layer 207. The gate insulation film 202 (106 in Fig. 19) serves to insulate the gate electrode 203 and the Ti mask 201, and to prevent lateral ion intrusion into the a-Si layer 207, in cooperation with the gate insulation film 205. Though the SiO 2 or SiN x film constituting the gate insulation films 202 and 205 are inferior to Ti for the ion intercepting power, a sufficient ion intercepting effect can be obtained because the effective layer thickness to the a-Si layer 207 is larger for the lateral ion intrusion. As explained in the foregoing, formation of a layer of a higher ion intercepting power, than the other parts, under the a-Si layer 207 prevents the ion permeation from the glass substrate 101, including therein the microlens array 104 of distributed refractive index type and containing alkali ions therein, to the channel area of the TFT 107, namely the layer between the source and drain electrodes and the gate electrodes, particularly the a-Si layer 207, thereby maintaining satisfactory function of the TFT 107. Each Ti mask 201 may be charged for some reason. Since it is close to the gate electrode 203, the Ti masks 201 are preferably maintained at a same potential in order to achieve stable operation of the TFT's 107. For this purpose a mask pattern may be so formed as to mutually connect the masks of the different pixels and may be grounded. Fig. 21 is a magnified corss-sectional view of a TFT portion in a liquid crystal display panel constituting another example, which is different from the foregoing one in that a Ti mask 301 of a thickness of 0.5 - 2 µm is provided between the protective insulation film 212 and the liquid crystal alignment film 213 shown in Fig. 20. In the configuration shown in Fig. 20, a small amount of the alkali ions present within the glass substrate 101 entering the liquid crystal layer 103 through the pixel electrode area (through gate insulation films 202, 205, pixel electrode 211 and protective insulation film 212), and such alkali ions permeate into the TFT, thus deteriorating the characteristic thereof. Thus, the Ti mask 301 additionally provided on the upper portion of the TFT in the present example serves as an intercepting layer against the ions permeating through the liquid crystal layer 103. It also prevents generation of photocurrent in the a-Si layer 207, by a stray light from the side of the liquid crystal layer 103. Also as in the Ti mask 201 shown in Fig. 20, there may be provided a grounded mask pattern, whereby said Ti mask 301 can exert, in cooperation with the Ti mask 201, a shield effect for protecting the TFT of each pixel from external perturbation. As explained in the foregoing, the characteristic of TFT can be maintained in satisfactory manner by thickening an ion intercepting layer having a cross section consisting of TFT or an larger area than the cross section, to state concretely, by forming ion intercepting layers on both at the side of the liquid crystal layer 103 of the a-Si layer 207 (208) and at the side of the glass substrate 101. Fig. 22 shows another example, in which the Ti mask 201 serving as the ion intercepting layer in Figs. 20 and 21 is replaced by a SiO 2 or SiN x mask and the like which are same in material as the insulation films 202, 205, 212. Thus, the ion intercepting power can be hastened by an increase in the thickness of the insulation film immediately under the TFT. In this case, a SiO 2 mask 202' is selectively formed on the glass substrate 101, and then the gate insulation layers and TFT may be formed like the prior art manner. For the pixel electrode area, however, it is important to maintain the layers under the alignment film 213 as thin as possible, thereby and prevent the deterioration of performance of said alignment film and maintaining satisfactory liquid crystal alignment. This fact can apply to all the examples. As the ion intercepting mask is translucent in this case, the photocurrent generation in the a-Si layer 207 is to be prevented by the gate electrode 203. Thus, it becomes unnecessary to effect extra light interception by the gate electrode 203 in an area where translucency is desired, such as the pixel electrode area, so that an increase of the aperture rate can be obtained as a subsidiary effect. Fig. 23 shows another example which utilizes a normal stagger type a-Si TFT. The method of microlens array formation will be omitted from the explanation as it is same as in the foregoing examples. Elements equivalent in function to those in the foregoing examples are represented by same numerals regardless of the positions or forms thereof. Also in this example, the Ti mask 201 positioned under the a-Si layer 207 serves to prevent direct ion permeation from the glass substrate 101 to the a-Si layer 201. Also an insulation film 401 of SiO 2 or SiN x of a thickness of ca. 2000 Å and the gate insulation film 205 have sufficient ion intercepting effect because of an increased effective thickness to the a-Si layer 207 against the ion permeation to the a-Si layer 207 from the lateral direction. In the present example, there may also be employed a configuration in which a protective insulation film is added on the upper portion of the gate electrode for improving the insulation between the gate electrode 203 and the liquid crystal layer 103, or a configuration of further including an ion intercepting layer of a titanium film thereon. Fig. 24 shows another example which utilizes a planar-type TFT employing polycrystalline Si (p-Si), wherein components equivalent in function to those in the foregoing examples are represented by same numerals. In the present example, the Ti mask 201 having ion intercepting effect is formed under a p-Si layer 501, and an ohmic layers contacting the source electrode 209 and the gate electrode 210. Also insulation films 401, 212, principally consisting of SiO 2 have ion intercepting function, though not perfect. In the foregoing examples, the Ti mask 201 serving as the ion intercepting layer is formed separately from the Ti mask for forming the microlens array 104, but these two purposes may be also met by a single Ti mask, as will be explained in the following example. In such case, if the Ti mask for microlens array formationis so large to cover, the pixel electrode area where translucency should be required, Ti thin film is added by sputtering and the like, so that a part of said mask may be removed by etching in a case that larger shape and area are needed. Also if the Ti mask 201 for ion interception has to be larger, the Ti film may be added for example by sputtering and then removed by etching in the unnecessary portions. Fig. 25 shows another example, in which components equivalent in function to those in the foregoing examples are represented by same numerals. A Ti mask 105 is provided for microlens array formation, and the microlenses 104 are buried within the TFT glass substrate 101 as shown in Fig. 25. The panel of the present example is prepared by the following steps of: 1) forming, on a Na-containing glass substrate 101, a Ti mask pattern 105 of a thickness of 1 - 2 µm by sputtering or evaporation, combined with a photolithographic process; 2) effecting ion exchange in a thalium-containing molten salt (lens formation); 3) rinsing with warm water; 4) effecting ion exchange in a thalium-free Na-containing molten salt (lens burying); 5) rinsing with warm water; 6) forming an insulating SiO 2 layer of a thickness of 2 µm by sputtering; 7) forming a pixel electrode pattern 211 consisting of ITO of a thickness of 0.1 µm; 8) forming TFT 107, signal electrodes and scanning electrodes with such an alignment that the TFT is positioned directly above the Ti mask pattern 105; 9) forming and rubbing an alignment film 213; 10) forming a cell with the TFT substrate prepared through the above steps 1) - 9) and a counter substrate on which a counter electrode 214 and an alignment film 213 are formed in ordinary manner, by the medium of a gap forming material; 11) filling the liquid crystal 103 and sealing the cell. In the lens burying process of step 4, the ion exchange time is so selected that the buried depth becomes equal to the focal length of the lenses. The liquid crystal display panel of the present example fabricated as explained above, improves the efficiency of light utilization as the illuminating light is efficiently condensed by the microlenses into the pixel apertures as indicated by arrows in Fig. 25, and also prevents the photocurrent generation and, as each TFT is shieled from light by the Ti mask. Also the present example simplifies the manufacturing process, since the Ti mask need not be removed after the formation of the microlenses. Furthermore the present example enables formation of microlenses and TFT's in monolithic manner, so that the alignment of the microlenses, the Ti mask, the TFT's and the pixel apertures, can be more accurately achieved. Fig. 26 shows another example, wherein components equivalent in function to those in the foregoing examples are represented by same numerals. Ti mask 105 is provided for microlens forming, and microlenses 104 are buried within the counter glass substrate 101 as shown in Fig. 26. The panel of the present example is prepared by the following steps of: 1) forming, on a Na-containing glass substrate 101, a Ti mask pattern 105 of a thickness of 1 - 2 µm by sputtering or evaporation, combined with a photolithographic process; 2) effecting ion exchange in a thalium-containing molten salt (lens formation); 3) rinsing with warm water; 4) effecting ion exchange in a thalium-free Na-containing molten salt (lens burying); 5) rinsing with warm water; 6) forming an insulating SiO 2 layer of a thickness of 2 µm by sputtering; 7) forming a counter electrode 214 consisting of ITO of a thickness of 0.2 µm; 8) forming and rubbing an alignment film 213; 9) forming a cell with the counter substrate formed through the steps 1) - 8), and a TFT substrate, on which TFT's 107, pixel electrodes 211 and an alignment film 213 and the like are formed by ordinary manner, across a gap forming material, with alignment in such a manner that the Ti mask pattern is positioned directly above the TFT; 10) filling the cell with liquid crystal 103 and sealing the cell. In the lens burying step 4, the ion exchange time is so selected that the buried depth becomes equal to the focal length of the lenses. The liquid crystal display panel of the present example, fabricated as explained above, improves the efficiency of light utilization, since the illuminating light is efficiently condensed by the microlenses into the pixel apertures as indicated by arrows in Fig. 26, and prevents the photocurrent generation, as the TFT's are shielded by the Ti mask. Also the present examples simplifies the manufacturing process since the Ti mask need not be removed. In the foregoing examples the TFT may change into any type, such as of a-Si or p-Si, that can be formed on a glass substrate. Also the ions for microlens formation, mask material and material for ion intercepting layer and the like are not limited to those explained above, but can be properly modified. In the use of a microlens array, the relationship to be satisfied by the pixel size, focal length of microlenses and the like for achieving the most effective light utilization was explained as above. According to this relationship, if the pixel density is increased for meeting the requirements of high definition television, the microlenses have to positioned closer toward the liquid crystal layer. In such case, it becomes no longer possible to place a thick alkali-free glass substrate, between the TFT and the alkaline glass substrate including the microlens array. As will be understood from this fact, the present invention is most effectively applied to a liquid crystal display panel combined with a microlens array. Fig. 27 shows an embodiment in which the liquid crystal display panel of the present invention explained as above is applied to a projector, wherein the basic constitution is same as in Fig. 18. The light beam emitted from a light source 801 such as a metal halide lamp is converted, by a rotary parabolic reflector 802, into a substantially parallel illuminating light beam, which is transmitted through a filter 803 for eliminating unnecessary infrared and ultraviolet lights, and illuminates a liquid crystal display panel 805 positioned a polarizer 804 in the front and a detector 806 at the back. Said panel 805 modulates the illuminating light beam according to display signals, and the obtained light beam containing the information of displayed image is projected onto an unrepresented screen by a projection lens 807. Furthermore said reflector 802 can be of any configuration providing with a substantially parallel light, such as the combination of a rotary elliptical mirror and a condenser lens. As explained in the foregoing, the method as described can prevent ion permeation from the alkali-containing glass substrate to the channel area of TFT, namely the layer between the source and drain electrodes and the gate electrode, particularly a-Si or p-Si layer, thereby to maintain satisfactory performance of TFT. Also the ion exchange intercepting mask, employed in the formation of distributed refractive index microlens array, may also be utilized as a ion intercepting mask for the TFT gate or a light shielding mask for photocurrent prevention, and the fabricating process can be simplified as said ion exchange intercepting mask need not be removed. Furthermore, since the microlenses and the TFT formation can be prepared in monolithic manner, there can be achieved a more accurate precision in the alignment between the microlenses, the light shielding (ion intercepting) mask, the TFT's and the pixel apertures.

Claims: A liquid crystal display panel, comprising: a liquid crystal cell (4; 104; 103) including plural pixels; and a microlens array (3a, 8; 108; 302, 303-; 402; 602) provided at the light incident side of said liquid crystal cell (4; 104; 103); characterized in that the distance between said microlenses (3a, 8; 108; 302, 303; 402; 602) and said liquid crystal cell (4; 104; 103) is larger at a central portion than at a peripheral portion of said liquid crystal display panel. A liquid crystal display panel according to claim 1, characterized in that the distance between said microlenses (3a, 8; 108; 302, 303; 402; 602) and said liquid crystal cell (4; 104; 103) gradually decreases from the central portion toward the peripheral portion of said liquid crystal display panel. A liquid crystal display panel according to claim 1, characterized in that the positions of said microlenses (3a, 8; 108; 302, 303; 402; 602) are so determined that the principal ray of the incident light to each microlens in said microlens array passes through the substantial center of aperture of each of the pixels. A liquid crystal display panel according to claim 1, characterized in that said liquid crystal pixels correspond to the microlenses (3a, 8; 108; 302, 303; 402; 602), and these elements are arranged in a two-dimensional array. A liquid crystal display panel according to claim 1, characterized in that said liquid crystal pixels are arranged in a one-dimensional array, corresponding respectively to said microlenses (3a, 8; 108; 302, 303; 402; 602). A liquid crystal display panel according to claim 1, characterized in that said microlens array (3a, 8; 108; 302, 302; 402; 602) is adapted to condense the light into plural points respectively corresponding to said plural pixels. A liquid crystal display panel according to claim 1, characterized in that a pair of substrates (3a, 5; 101, 103; 201; 301; 401; 503; 601) is provided sandwiching said liquid crystal cell (4; 104; 103). An information forming apparatus, comprising: a light source (901); a liquid crystal display panel (805) according to any of the preceding claims 1 to 7 for forming information bearing light by modulating the light from said light source (901). An information forming apparatus according to claim 8, characterized in that said information is an image.

Inventors: KUREMATSU KATSUMI, MITSUTAKE HIDEAKI, KUREMATSU, KATSUMI, MITSUTAKE, HIDEAKI, KUREMATSU, KATSUMI, C/O CANON KABUSHIKI KAISHA, MITSUTAKE, HIDEAKI, C/O CANON KABUSHIKI KAISHA
Applicants: CANON KK, CANON KABUSHIKI KAISHA
Application year: 1992
Main classification: G02F1
IPC codes: H04N9, G02F1, G02B3