High accuracy beam blanker

Abstract: The accuracy of a double-deflection beam blanker is dramatically improved for all blanker voltages by using provided, closed-form, trajectory equations to determine the blanker geometric parameters and compensating for fringe-field effects in order to precisely determine the delay line length for control of an electron or ion beam. This delay line length is maintained by placing alignment apertures above and below the blanker.

Description: FIELD OF THE INVENTION This invention relates to a method of constructing a double deflection beam blanker according to the preamble of claim 1 and to a double deflection beam blanker according to the preamble of claim 5. BACKGROUND OF THE INVENTION The beam blanker is an integral component of electron optical columns dedicated to chip and mask lithography, circuit testing and inspection, and other applications where a charged particle beam must be rapidly turned off and on at a target plane (i.e., the surface of a substrate). A typical beam blanker 1 is shown in Figure 1. A steady state voltage applied to beam blanker 1, comprising two identical vertically aligned U-shaped plates 2 spaced apart by distance 3, produces an electromagnetic field transverse to a beam axis 4. This field deflects the electrons or ions (which comprise the beam emanating from beam source 11) off-axis away from aperture 5 causing the electrons or ions to become embedded in beam stop 6, thereby stopping any beam current from being transmitted past beam stop 6. However, the applied blanker voltage is, in fact, time dependent, i.e. the voltage is varied during the transition between the beam "on" and "off" states. This variation in blanker voltage during the transition, coupled with the beam transit for those electrons passing through aperture 5 results in undesirable motion at the target 26. Various structures have been proposed to eliminate the problem of beam jitter. For example, U.S. Patent 4,445,041 (hereinafter the '041 reference) discloses a double deflection blanker (see Figure 1) in which the bottom halves 9 of plates 2 deflect the electrons which have passed through aperture 5. This second deflection of the electrons attempts to compensate for this time-dependent blanker voltage by creating a steady state voltage effect, thereby minimizing the beam jitter. However, this reference describes solely an operation of the beam blanker at a 20kV beam voltage. An extension of this prior art disclosure to other beam voltages results in serious degradation in performance. Therefore, a need arises for a beam blanker which operates within the positional accuracy range at all times, for all beam voltages. Thus, it is the object of the present invention to provide a method for constructing a double deflection beam blanker which has superior performance at any selected beam voltage. SUMMARY OF THE INVENTION The fore-going object is solved with a method having the eatures as set out in claim 1. In accordance with the invention, an improved blanker includes a delay line length which is a function of a predetermined voltage. Optimal delay line length minimizes beam jitter and compensates for fringe-field effects. Specifically, closed-form trajectory equations are derived in accordance with the present invention to provide an exact understanding of the operation and interaction of the blanker geometry, blanker voltage, and beam in order to provide the optimal delay line length. These equations describe the electron-optical mechanics of the beam-blanker interaction and provide the means to determine the optimum geometric parameters and hence performance for the blanker. Also, with these equations, voltage effects such as ringing, overshoot, and rise and fall time of the blanker can be precisely determined. The reduction in blanker-induced beam jitter is achieved by finding the optimum blanker voltage propagation delay between the upper to lower pair of plates. From this information, the physical length of the delay line is accurately determined for any beam voltage. Different delay line lengths, hence different blankers, are provided for specific blanker voltages in order to optimize blanker performance. Additionally, these equations determine the required mechanical tolerances for the blanker which aids in decreasing beam positional jitter. Furthermore, a method to measure the effect of electrostatic fringe-fields on blanker action is provided which includes construction of a model of the blanker. This model incorporates a delay line length, which minimizes beam jitter based on the assumption there is no fringe field effect. The model is installed in a working system and the fringe field effect is determined by measuring the effective length of the blanking plates. This effective length is derived from the measured blanker plate deflection sensitivity, i.e. the beam deflection angle per applied voltage. In general, this length is greater than the physical plate length. An equivalent statement is that the beam is typically deflected off-axis a greater distance at a known axial location below the blanker than expected from using the formula describing this quantity in terms of the physical length of the blanking plates. A new value for the optimum delay line length is then determined based on the measured "effective length" of the prototype blanker. A blanker identical in geometry to the prototype is constructed except having a different delay line length based on the effective length. A blanker incorporating these values is then constructed. In one embodiment, two alignment apertures are placed above and below the blanker to define the maximum off-axis beam excursion (for a movable beam stop) or to specify the concentricity of the beam stop to the blanker axis (for a fixed beam stop). The size of these apertures is typically a function of the maximum allowable beam jitter specified. A range in blanker delay line length is determined from the equations, consistent with the permissible amount of beam jitter. This tolerance range corresponds to a maximum allowable off-axis variation from the ideal beam axis, which is then mechanically defined by the blanker alignment aperture diameter. Therefore, this invention results in greater beam positional accuracy at the target substrate while blanking. DESCRIPTION OF THE DRAWINGS Figure 1 illustrates a typical double-deflection beam blanker with delay line and beam stop both as used in the prior art and in accordance with the invention. Figure 2 shows a typical double-deflection blanker, lens, and substrate geometry in the prior art and also in accordance with the present invention. Figure 3 illustrates a beam diagram showing the general behavior as the lens excitation is varied about the blanker midgap. Figure 4 compares the performance of the prior art blanker with that of the present invention operating at 20 kV beam voltage. Figure 5 compares the beam jitter of the prior art blanker with that of the present invention operating at 10 kV beam voltage. Figure 6 illustrates blanker-induced beam motion X * (Z o ) sensitivity to various drift length Z D settings. Figure 7 compares blanker motion X * (Z o ) curves using blanker conditions noted in the prior art. Figure 8 shows an end view of a double-deflection blanker with alignment apertures. Figure 9 illustrates part of the process and geometries used in the present invention to determine the effective blanker plate length. Figure 10 shows a typical comparison of the plate length Lp and gap g to the effective plate length L p and effective gap g after fringe field effects have been determined. Detailed Description A steady state voltage, as noted previously, applied to a blanker produces a deflection of an electron beam. As seen in Figure 1, a conventional electron focusing lens 12 which is placed between blanker 1 and target 26 focuses the beam onto the target 26. The desired object point of focusing lens 12 is the beam cross-over or rocking point. The double-deflection blanker 1 has an apparent, in optics terminology "virtual", rocking or pivot point in gap 8 between the upper and lower pairs of plates 2. If focusing lens 12 images this rocking point, the electron beam remains on-axis while applying a DC blanker voltage. Figure 2 illustrates typical blanker geometry for two beam trajectories. Curve 20 shows that when the beam emitted from beam source 11 is sufficiently deviated from beam axis 4, beam stop 6 stops the beam and effectively results in an "off" state. However, if beam stop 6 were not present, curve 21 shows that lens 12 would direct the beam 27 to hit target 28 on axis 4 given (i) the blanker voltage was constant and (ii) the lens excitation focused the blanker rocking point, defined by the intersection of dashed line 28 with the vertical beam axis 4, at the substrate 26. Curve 22 indicates a beam trajectory passing through the blanker during voltage decay which will result in beam jitter at the substrate 26. The apparent (virtual) beam off-axis deflection is shown by dashed line 23. Beam jitter X * is defined as a function of both the axial evaluation point Z e (or the lens object position) and the initial position Z o of the electron at the moment the blanker starts its off-to-on transition. Hence, X * (Z e ,Z o ) describes X* as a function of Z e , Z o . The magnitude 25 of the positional jitter at the lens image plane 26 is given by X * Image = X * (Z e , Z o )xM (1) where M is the magnification of lens 12. The rocking point of double-deflection blanker 1 lies at the midpoint of the gap 8 (see Figure 1) along beam axis 4. Figure 3 illustrates that if Z e = L p + g / 2 indicated at point 36, where L p is the plate length 7 and g is the width of gap 8 (both shown in Figure 1), then lens 12 directs the beam 30 to hit target 28 an axis 4. Hence, with this rocking point, there is no off-axis beam shift (see dotted line 33) when a steady state voltage is applied to the blanker. However, if Z e < L p + g / 2 indicated by point 37 then vector 31, transverse to beam axis 4 and pointing to the ray 33 of the virtual trajectory, will increase the beam jitter magnitude and result in a beam shift during application of a DC blanker voltage. Vector 31 corresponds to the magnitude 34 of the positional jitter at the lens image plane 26. If Z e > L p + g/2 , indicated by point 38 then vector 32 likewise corresponds to the beam shift 35 at the lens image plane 26. However, even when Ze = L p + g/2 , some beam jitter (time-dependent motion) is inevitable. The present invention minimizes this motion by proper setting of the delay line length L D . Beam jitter provides a measure of blanker performance in terms of movement (of the beam) per applied force (by the blanker) with dimensions of [time × distance]. The distance unit is defined as the maximum positional offset during beam transmission. The time unit is defined as that interval during which the beam is still outside its specified positional accuracy range. To reduce beam jitter for any double-deflection beam blanker, the operation and interaction of the blanker 5 geometry, the blanker voltage, and the beam itself should be fully understood. One embodiment of the present invention, using the derived equations shown in Tables I and II below, provides a method for ensuring a high accuracy beam blanker. The double-deflection beam blanker 1 (see Figure 1) and its operating characteristics are completely defined by two sets of blanker variables. The first set of variables includes the geometrical parameters of the blanker: the plate length L p (7), the plate separation D (3), the gap g (8) between upper and lower pairs of plates, the delay line length L D , and the blanker aperture diameter d ap of aperture 5. In general, the plate length L p is made as large as possible to improve deflection sensitivity, i.e. deflection per applied voltage. An increase in plate length L p provides more opportunity for the electron beam to be acted upon, thereby increasing its deflection. This allows the blanker voltage to be reduced thereby increasing the speed of the blanker driver. However, in high speed blanking circuits, this dimension is limited to a ratio L p /D as determined by the magnitude of the impedance desired to make double-deflection beam blanker 1 a transmission line electrically matched to the blanker driver electronics. An impedance mismatch results in reflections at the input 9 and output 10 of the delay line as the voltage signal propagates through plates 2. These reflections inject spurious voltages, thereby degrading a desired step voltage when going from "on" to "off" and vice versa. The design equations describing the relationship between the ratio L p /D and the impedance are well-known for strip-line and parallel plate geometries of blankers and, hence, are not provided herein. See, for example, MECL System Design Handbook , 4th ed., by William R. Blood, Jr., Motorola Inc., 1988. The upper limit on the blanker plate length is typically set by space constraints of the other system components of which the blanker is one part. The second set of variables contains two parameters (a,b) that describe a time-dependent, normalized, exponentially-damped cosine blanker voltage (i.e., the voltage signal that is impressed on the blanker), given by the equation below: V(t)/V d = exp(-at)·cos (bt) This equation models ringing, or oscillation in the voltage, overshoot, when the voltage is above the intended voltage, and the rise and fall time where V d is the maximum applied blanker voltage. This description of the blanker voltage is a general solution for any blanker driver circuit described as a resistive, inductive, capacitive (RLC) network. The formulae in Tables I and II incorporate this form of the blanker voltage. Hence, a and b are to be chosen to match the particular driver electronics of a blanker (which can be determined, for example, with an oscilloscope) so as to model any blanker voltage used in any blanker. Tables I and II express the solution for the normalized, apparent beam motion X* (Z e )/(V d /2V b D) as the complex variable equation: S=-A+iB where A, expressed in units of 1/length, is defined by the further equation A=a(m/2eV b ) ½ where m is the electron mass, e is the electron charge, and V b is the beam voltage. Likewise, B is defined by the equation B=b(m/2eV b ) ½ The real parts of equations given in Tables I and II describe the apparent beam motion at the lens object plane. The beam motion is apparent because X * (Z o ) is the off-axis beam position within the blanker, as magnified by the lens, but does not correspond to the actual trajectory within the blanker X(Z, Z o ) . The curve X*(Z o ) describes 5 the time-evolution of the apparent beam motion for any lens object position Z e since T o = V z Z o , where V z is the relativistically-corrected beam velocity and T o denotes the time it takes the electron to reach the entrance of the blanker after the voltage transition began. The propagation delay of the blanker voltage through plates 2 can be physically defined in three ways. The first way is shown in Figure 1, where a U-shaped blanker plate structure conducts the blanking signal V d (t) from its input 9 at the upper pair of plates 2 to the exit point 10 at the lower set of plates 2 via the length L D . The blanker voltage transit between the upper and lower pairs of plates is given by the delay time T D = L D /c where c is the speed of light and also the propagation velocity of the blanker voltage transition assuming a dielectric constant of one is present. Second, the horseshoe-shaped blanker can also be replaced by a wire or cable connecting two separate pairs of plates (not shown). In that case, the propagation velocity V cable is determined by the cable dielectric and the delay line length. Hence, T D = L D /V cable The third case uses an amplifier stage to set the time delay between a blanking signal applied to the upper and lower pairs of plates (also not shown). This latter configuration is particularly useful in the case of blanking ions, which move slower than electrons at a given beam voltage and, therefore, require longer time delays in the blanker. Nine solutions for beam jitter are possible, as seen in Tables I and II, depending on the variables z₀, z₁, z₂, z₃, and z d (where z d is the electron drift length defined by T D /V z and where V z is the relatavistically corrected beam velocity). Applicable equations from Table I are indicated on Figure 4. The following equations do not appear in this particular example: 1c, 2a, 3a, and 3b. Recall that z₀ is the initial electron position when the blanker voltage transition begins. Therefore, z₀ < 0 implies that the electron was initially above the blanker. Two scales, t₀ and z₀, are indicated on the horizontal axis of Figure 4. The conversion from t₀ to z₀ is accomplished by recognizing that: z 0 (mm) = -t 0 (nsec) x 81.50 mm/nsec where 81.50 mm/nsec is the relativistically-corrected velocity for a 20 kV beam voltage. The minus sign defines a convention where z₀ < 0 implies t₀ > 0, so that t₀ indicates the time taken for an electron at z₀ < 0, i.e. above the blanker, to reach the blanker entrance (z = 0) is a positive number. Referring to Figure 4, for example, the horizontal axis is divided into nine segments. Each solution in Table I, as derived from, for example, equations 3c, 2c, 1b, etc., describes the amount of beam jitter in a particular segment. The size of each segment is determined by the blanker geometry (for example, z₁, z₂ and z₃) and the delay line length L d . The real part of the complex variable equation is combined with the geometrical data on the blankers (already provided) to solve for the apparent beam jitter. Note that Table I applies to the transition from beam "off" to "on", while Table II applies to the transition from "on" to "off". Tables I and II allow optimization of blanker performance by specifying an accurate delay line length L D which minimizes beam jitter in the device. Specifically, given a beam voltage, blanker geometry, blanker voltage, and axial observation point, one varies electron drift length Z d until a minimum off-axis deflection X*(Z o ) is found. For a given Z d , the delay time T D is determined by the equation: T D = Z d ÷ V z . Using T D , L D is determined by recognizing that L D is equal to T D multiplied by the blanker voltage propagation velocity c when the blanker voltage dielectric constant is one. If, after providing the values to the variables specified in Tables I and II, an unacceptable level of jitter is present, a new value of Z d is chosen. In this manner, beam jitter is not only predictable but can be efficiently minimized for any blanker. As previously noted, a blanker voltage applied to the plates produces an electromagnetic field transverse to the electron beam axis. However, this field does not end at the finite end of the plate, but instead extends off the plate into space. This extension is called the fringe-field. Hence, the fringe-field effectively increases the length of the deflection field beyond that defined by the physical plate length. Without a measurement of this field and subsequent incorporation in the blanker design, the blanker positional accuracy is degraded. The present invention in one embodiment compensates for fringe-field effects by a three-step process. First, as seen above, the equations of motion are used to predict the optimum delay line length. Second, an experimental measurement facilitated by construction of a first blanker model determines the effective blanker plate length. The measurement consists of the following procedure (See Figures 9 and 10). The beam is focused at center 94 of blanker aperture 5. Provision is made to collect the current at center 94 preamplify it, and send it to Z-input of a video system 90 where it results in intensity modulation of the video image. The x-y raster scan signal is simultaneously sent from the driver 91 to (a) the video system 90 and (b) a set of beam scan coils 92. In this manner an image of blanker aperture 5 is formed at the video 90. A first blanker aperture 5 image is recorded with a camera (not shown), which corresponds to both blanking plates 2 being at ground potential, so the beam is undeflected. A second image is recorded after having impressed a known DC blanker voltage on plates 2. The second image reveals a translational shift ΔX image in the position of center 94 as seen by distance 95 compared to the first image (undeflected beam case). The video image beam shift ΔX image is converted to the true beam shift Δ X by comparing known blanker aperture diameter d AP to its video image size d BIM , for then Δ X =Δ X image x ( d AP / d BIM ) The relation between the D.C. blanker voltage V dc and the resulting steady state beam shift Δ X is ΔX ( Z e ) =V dc (Z e - L p /2)2V B D where V B is the beam voltage, D is the dimension 3 of Figure 1, L p is the "effective" plate length, g is the "effective" gap, and Ze is the axial evaluation point, which in this case is the center 94 location z e - L p + g /2 . Generally, for any blanker, L p > L p , where L p is the physical plate length defined by dimension 7 of Fig. 1, due to the fringe field increasing the effective length of the blanker plate. The shift ΔX actually observed is greater than that for expected value ΔX if Eq. (12) replaces L p by L p by the amount ε = Δ X Δ X = L p ( L p + g ) L p ( L p + g ) Now, ε is determined from the measured shift Δ X , the known blanker geometry L p , g. Thus, the only unknown variable remaining is L p , which is then solved in terms of the known quantities and is expressed by the equation L p =- ( g + 1 / 2 L p ) + ( g + 1 / 2 L p ) 2 +2ε L p ( L p + g ) g is dependent on L p and follows as g =( g +½ L p ) -½ L p The effective length L p and gap g are thus determined. Third, the delay time is recalculated based on the measured effective plate length. As a result, a final model of the blanker is constructed for a particular, given voltage. By using the preceding derived equations and compensating for fringe field effects, significant performance improvements are demonstrated in accordance with the present invention compared to the prior art. As mentioned previously, the prior art blanker was designed specifically for 20 kV beam voltage operation. Figure 4 illustrates that a blanker in accordance with the present invention improves blanker performance when used at a 20 kV beam voltage because of the increased accuracy of the exact equations of motion and the incorporation of fringe fields. The beam motion in both cases assumes a V d = 7.5 V blanker voltage, a 1.0 nsec 10-90% transition, and M LENS = 0.3. A 25 µm diameter blanker aperture is used. Curve 40 of Figure 4 shows the beam jitter induced by the prior art design at 20 kV which does not compensate for the blanker plate fringe fields. The maximum positional offset 41 is 0.03 µm . The beam is misplaced outside a 0.01 µm limit (i.e. the limit defines when the electron beam is within 0.01 µm from target) shown by dashed lines 42 for 1.4 nsec. This corresponds to 22% of the dose in the first pixel being misplaced in a raster-scan electron beam system, which blanks at 160 MHz. Curve 43 shows the blanker with an increased delay line length as determined by the method of the present disclosure which compensates for the fringe field effect. In this case, the beam positional accuracy is maintained at all times during the blanker exposure. Figure 5 shows that the 20 kV prior art design is unsuitable for 10 kV operation. The operating parameters noted in Figure 4 are used. In this case, the prior art blanker has a 0.50 µm maximum positional offset 51 as shown by curve 50. The time duration outside the 0.01 µm beam accuracy specification (see dashed line 52) is 3.3 nsec. Hence, using this prior art design at a 160 MHz blanking rate results in 53% of the first pixel dosage being misplaced. The blanker in accordance with the present invention remains within the positional accuracy range for all times as shown by curve 53. One specific double-deflection blanker design optimized for V b = 10 kV operation in accordance with the present invention is shown in Figure 5 where L p = 10.16 mm , g = 29.82 mm, D = 2.16 mm , and Z D = 41.615 mm . In an attempt to expand the range of the '041 patent disclosure beyond 20 kV operation, a geometrical scaling rule cast in terms of electron drift length Z D was proposed in the prior art. The scaling rule sets the blanker delay time according to a drift length based on the blanker plate length L p and gap g between upper and lower pairs of plates such that Z D = L p + g/2 . Another publication (co-authored by the inventor of the present disclosure), Gesley and Condran, J. Vac. Sci. Technol. vol. B8(6), 1666 Nov/Dec (1990), provides the approximation of Z D = L p + g. However, as shown in Figure 6, neither of these approximations are adequate to achieve the optimum performance at any beam voltage. In the ( L p + g /2) case (see dotted curve 60), the maximum offset is 150 times greater than the optimum setting (see solid line 62). For the ( L p + g ) case (see the dashed curve 61), it is 10 times worse than the optimum. Figure 7 shows another example of the inadequacy of the blanker operation as discussed in the Gesley and Condran publication. The operating parameters for the blankers are V b = 20kV with a 1 nanosecond voltage decay. 5 The solid curve 70 is that found using the solutions given in the present disclosure. The dashed curve 71 is taken from the '041 patent and is matched only at the origin, its scale is given by the dashed lines. The numerical analysis as disclosed in the Gesley and Condran 0 publication cannot determine the magnitude or duration of the "blip" region, which is the rapidly changing portion of the apparent beam jitter. To ensure that the delay line length tolerance is not violated, a mechanical means is introduced to ensure the 5 off-axis beam position with respect to the blanker axis is within a specified limit (assuming the use of a moveable aperture as beam stop). This is accomplished by placing alignment plates 80, 82 having apertures 81, 83, seen in Figure 8, above and below respectively the blanker body 1 to define the blanker mechanical axis 4. When beam stop 6 having aperture 5 is moveable, the apertures 81, 83 define the maximum off-axis beam excursion. Limiting the beam offset ensures that maximum variation of the delay line length is kept to a specified minimum. For a beam stop 6 having aperture 5 which is fixed, apertures 81, 83 specify the concentricity of beam stop 6 to the blanker axis 4. In the embodiment of the present invention, for 10 KV operation (see also reference to Figure 5 for other parameters of blanker), distance 84 in 25 mm, alignment apertures 81 and 83 each have a diameter of 600 mm, and aperture 5 has a diameter of 50 mm. The diameter of alignment apertures 81, 83 is the maximum allowed in order to maintain positional accuracy of the beam within 0.01 µm of the target. The delay length L D has a tolerance which defines the outside limits of this positional accuracy. For this example, by using Tables I and II, L D is determined to be 209.5 mm with a tolerance of 0.3 mm. The method and apparatus provided by the present invention has several advantages: 1. Beam motion at the target is significantly reduced. 2. Blanker delay time is precisely determined which ensures an accurate blanker. 3. The double-deflection blanker voltage propagation delay time is accurately specified for any beam voltage. 4. Beam voltages other than 20 kV can be used in blankers without significant degradation of device performance. 5. Blanker accuracy is improved at all beam voltages by incorporating the fringe field effect into the blanker design. 6. A specific design for 10 kV beam voltage operation compatible with a 50 Ω transmission line is given. 7. A further reduction in beam jitter is achieved for the 20 kV beam blanker by use of exact solutions describing the blanker-beam interaction and incorporation of the experimentally measured blanker fringe field effect. 8. Delay line length tolerance is not violated by placing two alignment apertures above and below the blanker. Other variations of this device will be obvious to those skilled in the art in view of the appended claims. where Z ₁= Z ₁= L p , Z ₂= L p + g , Z ₃=2 L p + g , and S =- A + iB , where A = a ( m /2 eV b ) ½ and B = b ( m /2 eV b ) ½

Claims: A method of constructing a double-deflection beam blanker (1) for an electron beam having two pairs of blanker plates (2) which are arranged such that the electron beam subsequently passes through each intermediate space formed by each of said pairs of blanker plates, wherein a deflection voltage can be supplied to the one pair of blanker plates and after a delay time T D to the other pair of blanker plates, the method being specific for a predetermined beam voltage comprising: (a) choosing a blanker voltage, (b) determining a set of geometric parameters of said blanker including a plate width of each of said blanker plates, a distance separating said two plates in each pair, and a gap determined by said pairs of blanker plates; (c) choosing a value for an electron drift length Z d of said blanker, which is coupled to said delay time T D by the relation Z d = V Z .T D , characterized by (d) calculating at least a single time a resulting beam jitter by substituting said value for said electron drift length in a set of trajectory equations; (e) if said resulting beam jitter is greater than a predetermined acceptance amount, substituting a new value for said electron drift length Z d in said set of trajectory equations; (f) repeating steps (d) and (e) until said resulting beam jitter is smaller than said acceptance amount; (g) determining said delay time T D based on the current electron drift length Z d of step (e); (h) constructing a prototype of said blanker using said delay time and said geometric parameters; (i) investigating a fringe-field effect, due to the inhomogeneity of the electric field during application of the deflection voltage at the periphery of the condensors formed by each pair of blanker plates by measuring a deflection characteristic when operating said prototype of said blanker; (j) calculating an effective blanker plate width based on said measured deflection characteristic due to said fringe-field effect; (k) calculating an optimal delay time on the basis of said effective blanker plate width for said blanker; and (l) constructing said blanker in accordance with steps (a), (b), and (k). A method according to Claim 1 further comprising the step of positioning two alignment plates (80,82) above and below said two pairs of blanker plates (2), each of said two alignment plates defining an aperture. A method according to Claim 2 wherein each of said apertures (80, 82) limits a maximum off-axis beam position. A method according to Claim 2 wherein said alignment apertures (80, 82) specify a concentricity of a beam stop (6) to a blanker axis (4). A double-deflection beam blanker (1) having a predetermined blanker voltage to deflect a charged particle beam having a predetermined beam voltage comprising: electromagnetic field means (2) having two pairs of conducting plates, each pair being spaced apart in opposing relationship and coupled to a voltage source for deflecting said beam which is arranged such as to pass between end portions of the two pairs of conducting plates, said conducting plates having a plate width (7), an interplate separation (3), a gap (8) defined between the ends of each of said pairs of conducting plates, and a delay line length L D, characterized in that said delay line length L D is such as obtained by steps: (a) choosing a blanker voltage, (b) determining a set of geometric parameters of said blanker including a plate width of each of said blanker plates, a distance separating said two plates in each pair, and a gap between by said pairs of blanker plates; (c) choosing a value for a particle drift length Z d of said blanker, which is coupled to said delay time T D by the relation Z d = V Z .T D , (d) calculating at least a single time a resulting beam jitter by substituting said value for said particle drift length in a set of trajectory equations; (e) if said resulting beam jitter is greater than a predetermined acceptance amount, substituting a new value for said particle drift length in said set of trajectory equations; (f) repeating steps (d) and (e) until said resulting beam jitter is smaller than said acceptance amount; (g) determining said delay time based on the current particle drift length Z d of step (e). A double-deflection beam blanker according to Claim 5 wherein said delay line length is further optimized as a function of a fringe field effect according to the following steps: (h) constructing a prototype of said blanker using said delay time and said geometric parameters; (i) investigating a fringe-field effect, due to the inhomogeneity of the electric field during application of the deflection voltage at the periphery of the condensors formed by each pair of blanker plates by measuring a deflection characteristic when operating said prototype of said blanker; (j) calculating an effective blanker plate width based on said measured deflection characteristic due to said fringe-field effect; (k) calculating an optimal delay time on the basis of said effective blanker plate width for said blanker; and (l) constructing said blanker in accordance with steps (a), (b), and (k). A double-deflection beam blanker according to Claim 6 further comprising a first alignment plate (80) having an aperture secured to one of said conducting plates (2) and a second alignment plate (82) having an aperture secured to the other of said conducting plates to define a maximum movement of said beam. A double-defection beam blanker according to claim 5, wherein each of said pairs of conducting plates is a single substantially U-shaped structure (2).

Inventors: GESLEY MARK, GESLEY, MARK
Applicants: ETEC SYSTEMS INC, ETEC SYSTEMS, INC.
Application year: 1992
Main classification: H01J37
IPC codes: H01J37, H01L21, H01J9