Superconducting device having an extremely thin superconducting channel formed of oxide superconductor material and method for manufacturing the same

Abstract: A superconducting device comprises a substrate (5) having a principal surface and a non-superconducting oxide layer (50) having a similar crystal structure to that of the oxide superconductor (1) which has a projection at its center portion. A superconducting source region (2) and a superconducting drain region (3) formed of an a-axis oriented oxide superconductor thin film are positioned at both sides of the projection of the non-superconducting oxide layer separated from each other and an extremely thin superconducting channel (10) formed of a c-axis oriented oxide superconductor thin film is positioned on the projection of the non-superconducting oxide layer (50). The superconducting channel (10) electrically connects the superconducting source region (2) to the superconducting drain region (3), so that superconducting current can flow through the superconducting channel (10) between the superconducting source region (2) and the superconducting drain region (3). The superconducting device further includes a gate electrode (4) through a gate insulator (7) on the superconducting channel (10) for controlling the superconducting current flowing through the superconducting channel (10). In the superconducting device the upper surfaces of the superconducting source region (2) and the superconducting drain region (3) have the same level as that of the superconducting channel (10).

Description: Background of the Invention Field of the invention The present invention relates to a superconducting device and a method for manufacturing the same, and more specifically to a superconducting device having an extremely thin superconducting channel formed of oxide superconductor material, and a method for manufacturing the same. Description of related art Devices which utilize superconducting phenomena operate rapidly with low power consumption so that they have higher performance than conventional semiconductor devices. Particularly, by using an oxide superconducting material which has been recently advanced in study, it is possible to produce a superconducting device which operates at relatively high temperature. Josephson device is one of well-known superconducting devices. However, since Josephson device is a two-terminal device, a logic gate which utilizes Josephson devices becomes complicated configuration. Therefore, three-terminal superconducting devices are more practical. Typical three-terminal superconducting devices include two types of super-FET (field effect transistor). The first type of the super-FET includes a semiconductor channel; and a superconductor source electrode and a superconductor drain electrode which are formed closely to each other on both side of the semiconductor channel. A portion of the semiconductor layer between the superconductor source electrode and the superconductor drain electrode has a greatly recessed or undercut rear surface so as to have a reduced thickness. In addition, a gate electrode is formed through a gate insulating layer on the portion of the recessed or undercut rear surface of the semiconductor layer between the superconductor source electrode and the superconductor drain electrode. A superconducting current flows through the semiconductor layer (channel) between the superconductor source electrode and the superconductor drain electrode due to the superconducting proximity effect, and is controlled by an applied gate voltage. This type of the super-FET operates at a higher speed with a low power consumption. The second type of the super-FET includes a channel of a superconductor formed between a source electrode and a drain electrode, so that a current flowing through the superconducting channel is controlled by a voltage applied to a gate formed above the super-conducting channel. Both of the super-FETs mentioned above are voltage controlled devises which are capable of isolating output signal from input one and of having a well defined gain. However, since the first type of the super-FET utilizes the superconducting proximity effect, the superconductor source electrode and the superconductor drain electrode have to be positioned within a distance of a few times the coherence length of the superconductor materials of the superconductor source electrode and the superconductor drain electrode. In particular, since an oxide superconductor has a short coherence length, a distance between the superconductor source electrode and the superconductor drain electrode has to be made less than about a few ten nanometers, if the superconductor source electrode and the superconductor drain electrode are formed of the oxide super-conductor material. However, it is very difficult to conduct a fine processing such as a fine pattern etching, so as to satisfy the very short separation distance mentioned above. On the other hand, the super-FET having the superconducting channel has a large current capability, and the fine processing which is required to product the first type of the super-FET is not needed to product this type of super-FET. In order to obtain a complete ON/OFF operation, both of the superconducting channel and the gate insulating layer should have an extremely thin thickness. For example, the superconducting channel formed of an oxide superconductor material should have a thickness of less than five nanometers and the gate insulating layer should have a thickness more than ten nanometers which is sufficient to prevent a tunnel current. In the super-FET, since the extremely thin superconducting channel is connected to the relatively thick superconducting source region and the superconducting drain region at their lower portions, the superconducting current flows substantially horizontally through the superconducting channel and substantially vertically in the superconducting source region and the superconducting drain region. Since the oxide superconductor has the largest critical current density J c in the direction perpendicular to c -axes of its crystal lattices, the superconducting channel is preferably formed of a c -axis oriented oxide superconductor thin film and the superconducting source region and the superconducting drain region are preferably formed of a -axis oriented oxide superconductor thin films. In a prior art, in order to manufacture the super-FET which has the superconducting channel of c -axis oriented oxide superconductor thin film and the superconducting source region and the superconducting drain region of a -axis oriented oxide superconductor thin films, a c -axis oriented oxide superconductor thin film is formed at first and the c -axis oriented oxide superconductor thin film is etched and removed excluding a portion which will be the superconducting channel. Then, an a -axis oriented oxide superconductor thin film is deposited so as to form the superconducting source region and the superconducting drain region. In another prior art, at first an a -axis oriented oxide superconductor thin film is deposited and etched so as to form the superconducting source region and the superconducting drain region, and then a c -axis oriented oxide superconductor thin film is deposited so as to form the superconducting channel. However, in the prior art, the oxide superconductor thin film is degraded during the etching so that the superconducting characteristics is affected. In addition, the etched surface of the oxide superconductor thin film is roughened, therefore, if another oxide superconductor thin film is formed so as to contact the rough surface, an undesirable Josephson junction or resistance is generated at the interface. By this, the super-FET manufactured by the above conventional process does not have an enough performance. The document EP-A-0 545 801, which is a document of the prior Art pursuant to Article 54(3) EPC and which can be therefore opposed to the present invention only for the novelty, discloses a superconducting device having a non-superconducting layer formed on a principal surface of a substrate, a superconducting channel formed on the non-superconducting layer, a superconducting source region and a superconducting drain region formed at both sides of the superconducting channel and a gate electrode formed above a gate insulator on the superconducting channel in which the superconducting channel is connected to the superconducting source region and the superconducting drain region at the higher portions than their one third height portion. Furthermore, the document EP-A-0 480 814, which is also a document of the prior Art pursuant to Article 54(3) EPC, discloses a superconducting device comprising a superconducting channel formed on the principal surface of a substrate, which has a projecting insulating region, a superconducting source electrode and a superconducting drain electrode at opposite ends of the superconducting channel, and a gate electrode located above an insulating layer on the superconducting layer. Summary of the Invention Accordingly, it is an object of the present invention to provide an FET type superconducting device having a superconducting region constituted of an extremely thin oxide superconductor film, which have overcome the above mentioned defects of the conventional ones. Another object of the present invention is to provide a method for manufacturing an FET type superconducting device which have overcome the above mentioned defects of the conventional ones. The above and other objects of the present invention are achieved in accordance with the present invention by a superconducting device comprising a substrate having a principal surface, a non-superconducting oxide layer on the principal surface of the substrate (5), said non-superconducting oxide layer having a crystal structure similar to that of an oxide superconductor and a flat-top projection (50) at its center portion; a superconducting source region (2) and a superconducting drain region (3) formed of an a -axis oriented thin film of said oxide superconductor at the both sides of the projection (50) of the non-superconducting oxide layer separated from each other; an extremely thin, superconducting channel (1) formed of a c -axis oriented thin film of said oxide superconductor on the projection of the non-superconducting oxide layer, which Electrically connects the superconducting source region (2) and the superconducting drain region (3) so that superconducting current can flow through the superconducting channel (10) between the superconducting source region (2) and the superconducting drain region (3), and a gate electrode (4) above a gate insulator(7) on the superconducting channel (10) for controlling the superconducting current flowing through the superconducting channel, in which the gate electrode (4) is formed of said oxide superconductor and the upper surfaces of the superconducting source region (2) and the superconducting drain region (3) are at the same level as the upper surface of the superconducting channel (10). In the superconducting device in accordance with the present invention, upper surfaces of the superconducting channel, the superconducting source region and the superconducting drain region are at the same level. Therefore, superconducting current flows into or flows from the superconducting channel efficiently so that the current capability of the super-FET can be improved. In the superconducting device in accordance with the present invention, the non-superconducting oxide layer preferably has a similar crystal structure to that of a c -axis oriented oxide superconductor thin film. In this case, the superconducting channel of a c -axis oriented oxide superconductor thin film can be easily formed on the projection. Preferably, the above non-superconducting oxide layers is formed of a Pr 1 Ba 2 Cu 3 O 7-ε oxide. A c -axis oriented Pr 1 Ba 2 Cu 3 O 7-ε thin film has almost the same crystal lattice structure as that of a c -axis oriented oxide superconductor thin film. It compensates an oxide superconductor thin film for its crystalline incompleteness at the bottom surface. Therefore, a c -axis oriented oxide superconductor thin film of high crystallinity can be easily formed on the c -axis oriented Pr 1 Ba 2 Cu 3 O 7-ε thin film. In addition, the effect of diffusion of the constituent elements of Pr 1 Ba 2 Cu 3 O 7-ε into the oxide superconductor thin film is negligible and it also prevents the diffusion from substrate. Thus, the oxide superconductor thin film deposited on the Pr 1 Ba 2 Cu 3 O 7-ε thin film has a high quality. In a preferred embodiment, the oxide superconductor is formed of high-T c (high critical temperature) oxide superconductor, particularly, formed of a high-T c copper-oxide type compound oxide superconductor for example a Y-Ba-Cu-O compound oxide superconductor material, a Bi-Sr-Ca-Cu-O compound oxide superconductor material, and a Tl-Ba-Ca-Cu-O compound oxide superconductor material. In addition, the substrate can be formed of an insulating substrate, preferably an oxide single crystalline substrate such as MgO, SrTiO 3 , CdNdAlO 4 , etc. These substrate materials are very effective in forming or growing a crystalline film having a high degree of crystalline orientation. However, the superconducting device can be formed on a semiconductor substrate if an appropriate buffer layer is deposited thereon. For example, the buffer layer on the semiconductor substrate can be formed of a double-layer coating formed of a MgAlO 4 layer and a BaTiO 3 layer if silicon is used as a substrate. Preferably, the superconducting channel is formed of a c -axis oriented oxide superconductor thin film and the superconducting source electrode and the superconducting drain electrode are formed of a -axis oriented oxide superconductor thin films. According to another aspect of the present invention, there is provided method of manufacturing a superconducting device, comprising the steps of forming on a principal surface of a substrate a non-superconducting oxide layer (50, 53) having a crystal structure similar to that of an oxide superconductor and a flat-top projection (50) at its center portion, forming a c -axis oriented thin film (1, 10) of said oxide superconductor having an extremely thin thickness on the non-superconducting oxide layer (50, 53) so as to form a superconducting channel (10) on the projecting portion (50) of the non-superconducting oxide layer, forming an insulating layer (17) on the c -axis oriented oxide superconductor thin film (1, 10) so as to form a gate insulating layer (7) on the superconducting channel (10), and forming an a -axis oriented thin film (2, 3, 4) of said oxide superconductor so as to form a superconducting gate electrode (4) on the gate insulating layer (7) and a superconducting source region (2) and a superconducting drain region (3), the upper surfaces of said superconducting source region and said superconducting drain region are at the same level as the upper surface of the superconducting channel (10). In one preferred embodiment, the flat-top projection of the non-superconducting oxide layer is formed by a process which does not comprises any etching but lift-off. The process comprises the steps of forming on a principal surface of a substrate a lift-off layer excluding a portion on which the projection will be placed, which can be removed without degrading the principal surface, forming a first non-superconducting oxide layer over the exposed portion of the principal surface and the lift-off layer, removing the lift-off layer so that a portion of the first non-superconducting oxide layer which will be the projection remains on the principal surface and the principal surface is exposed at the both sides of the remaining portion of the first non-superconducting oxide layer, and forming a second non-superconducting oxide layer having a thinner thickness than that of the first non-superconducting oxide layer over the exposed portion of the principal surface and the first non-superconducting oxide layer. In this case, the lift-off layer is preferably formed of a CaO layer of which surface is covered with a Zr layer. This lift-off layer can be removed by utilizing water and following reaction: CaO + H 2 O → Ca(OH) 2 In the above process, no reactive agent is used but water. Therefore, if the flat-top projection is formed by the above process, the substrate and the non-superconducting layer are not degraded. The above and other objects, features and advantages of the present invention will be apparent from the following description of preferred embodiments of the invention with reference to the accompanying drawings. Brief Description of the Drawings Figures 1A to 1J are diagrammatic sectional views for illustrating an embodiment of the process in accordance with the present invention for manufacturing the super-FET. Description of the Preferred embodiments Referring to Figures 1A to 1J, the process in accordance with the present invention for manufacturing the super-FET will be described. As shown in Figure 1A, a MgO (100) single crystalline substrate 5 having a substantially planar principal surface 52 ((100) surface) is prepared. As shown in Figure 1B, a photoresist 24 is patterned on a center portion of the principal surface 52. Then, as shown in Figure 1C, a lift-off layer 26 of CaO layer covered with Zr layer having a thickness of 500 nanometers is deposited over the photoresist 24 and the exposed portion of the principal surface 52. This lift-off layer 26 is preferably formed by a sputtering in which temperature of the substrate 5 is room temperature. Thereafter, the photoresist 24 is removed so as to remove a portion of the lift-off layer 26 so that a portion of the principal surface 52 is exposed, as shown in Figure 1D. Then, the substrate 5 is heated to a temperature of 350 to 400 °C under a pressure lower than 1.333x10 -7 Pa (1 x 10 -9 Torr) so as to clean the exposed portion of the principal surface 52. Thereafter, as shown in Figure 1E, a Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 having a thickness on the order of about 300 nanometers is deposited on the exposed portion of the principal surface 52 and the lift-off layer 26. The Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 is preferably c -axis oriented and formed by an MBE (molecular beam epitaxy). A condition of forming the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 by an MBE is as follows: Molecular beam source Pr: 1225°C Ba: 600°C Cu: 1040°C Pressure 1.333 × 10 -3 Pa (1 × 10 -5 Torr) Temperature of the substrate 700°C Then, the lift-off layer 26 is removed so as to remove the portion of the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 so that the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 is remained on the center portion of the principal surface 52 and the principal surface 52 is exposed at the both sides of the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50, as shown in figure 1F. This lift-off process utilizes water and a following reaction: CaO + H 2 O → Ca(OH) 2 Since the lift-off process does not use an agent of high reactivity but use water, the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 and the substrate 5 are not degraded. Thereafter, the substrate 5 is again heated to a temperature of 350 to 400 °C under a pressure lower than 1.333x10 -7 Pa (1 × 10 -9 Torr) so as to clean the exposed portion of the principal surface 52. As shown in Figure 1G, a Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 53 having a thickness of 50 nanometers is again deposited on the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 and the exposed portion of the principal surface 52 by an MBE. A condition of forming the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 53 is the same as that of the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50. Thereafter, a c -axis oriented Y 1 Ba 2 Cu 3 O 7-δ oxide superconductor thin film 1 having a thickness of 5 nanometers is deposited on the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin films 50 and 53 by an MBE, as shown in Figure 1H. A condition of forming the Y 1 Ba 2 Cu 3 O 7-δ oxide superconductor thin film 1 by an MBE is as follows: Molecular beam source Y: 1250°C Ba: 600°C Cu: 1040°C Pressure 1.333 × 10 -3 Pa (1 × 10 -5 Torr) Temperature of the substrate 700°C A portion of the deposited Y 1 Ba 2 Cu 3 O 7-δ oxide superconductor thin film 1 on the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 becomes a superconducting channel 10. In this connection, a portion of the second Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 53 which is deposited on the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 functions as a buffer layer on which a Y 1 Ba 2 Cu 3 O 7-δ oxide thin film of high crystallinity grows easily. Then, an insulating layer 17 of MgO or SrTiO 3 is deposited on the Y 1 Ba 2 Cu 3 O 7-δ oxide superconductor thin film 1, as shown in Figure 1I. The insulating layer 17 is formed so as to have a thickness of 10 to 15 nanometers by an MBE. A portion of the insulating layer 17 on the superconducting channel 10 becomes a gate insulating layer 7. Finally, as shown in Figure 1J, an a -axis oriented Y 1 Ba 2 Cu 3 O 7-δ oxide superconductor thin film is deposited on the insulating layer 17 so as to form a superconducting source region 2 and a superconducting drain region 3 at the both sides of the Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film 50 and a superconducting gate electrode 4 on the gate insulating layer 7. The a -axis oriented Y 1 Ba 2 Cu 3 O 7-δ oxide superconductor thin film is formed by an MBE so that the upper surfaces of the superconducting source region 2 and the superconducting drain region 3 have the same level as that of the superconducting channel 10. A condition of forming the a -axis oriented Y 1 Ba 2 Cu 3 O 7-δ oxide superconductor thin film 1 by an MBE is as follows: Molecular beam source Y: 1250°C Ba: 600°C Cu: 1040°C Pressure 1.333 × 10 -3 Pa (1 × 10 -5 Torr) Temperature of the substrate 640°C Metal electrodes may be formed on the superconducting source region 2 and the superconducting drain region 3, if necessary. With this, the super-FET in accordance with the present invention is completed. The above mentioned super-FET manufactured in accordance with the embodiment of the method of the present invention has no undesirable resistance nor undesirable Josephson junction between the superconducting channel and the superconducting source region and between the superconducting channel and the superconducting drain region. Since the upper surfaces of the superconducting source region and the superconducting drain region are at the same level as that of the superconducting channel, superconducting current efficiently flows into and flows from the superconducting channel. In addition, in the above mentioned method in accordance with the present invention, the flat-top projecting portion of Pr 1 Ba 2 Cu 3 O 7-ε oxide thin film on the substrate is formed without using etching process. Therefore, the portion has a high crystallinity so that the superconducting channel formed on the portion has a good superconducting characteristics. By this, the current capability of the super-FET can be improved. In the above mentioned embodiment, the oxide superconductor thin film can be formed of not only the Y-Ba-Cu-O compound oxide superconductor material, but also a high-T c (high critical temperature) oxide superconductor material, particularly a high-T c copper-oxide type compound oxide superconductor material, for example a Bi-Sr-Ca-Cu-O compound oxide superconductor material, and a Tl-Ba-Ca-Cu-O compound oxide superconductor material. The invention has thus been shown and described with reference to the specific embodiments. However, it should be noted that the present invention is in no way limited to the details of the illustrated structures but converts and modifications may be made within the scope of the appended claims.

Claims: A superconducting device comprising a substrate (5) having a principal surface; a non-superconducting oxide layer (50, 53) on the principal surface of the substrate (5), said non-superconducting oxide layer having a crystal structure similar to that of an oxide superconductor and a flat-top projection (50) at its center portion; a superconducting source region (2) and a superconducting drain region (3) formed of an a -axis oriented thin film of said oxide superconductor at the both sides of the projection (50) of the non-superconducting oxide layer separated from each other; an extremely thin superconducting channel (1) formed of a c -axis oriented thin film of said oxide superconductor on the projection of the non-superconducting oxide layer, which electrically connects the superconducting source region (2) and the superconducting drain region (3) so that superconducting current can flow through the superconducting channel (10) between the superconducting source region (2) and the superconducting drain region (3), and a gate electrode (4) above a gate insulator(7) on the superconducting channel (10) for controlling the superconducting current flowing through the superconducting channel, in which the gate electrode (4) is formed of said oxide superconductor and the upper surfaces of the superconducting source region (2) and the superconducting drain region (3) are at the same level as the upper surface of the superconducting channel (10). A superconducting device as claimed in Claim 1, characterized in that the non-superconducting oxide layer (50) is formed of a Pr 1 Ba 2 Cu 3 O 7-ε thin film. A superconducting device as claimed in Claim 1 or 2, characterized in that the oxide superconductor is formed of high-T c (high critical temperature) oxide superconductor. A superconducting device as claimed in Claim 3, characterized in that the oxide superconductor is formed of a high-T c copper-oxide type compound oxide superconductor. A superconducting device as claimed in Claim 4, characterized in that the oxide superconductor is formed of oxide superconductor material selected from the group consisting of a Y-Ba-Cu-O compound oxide superconductor material, a Bi-Sr-Ca-Cu-O compound oxide superconductor material, and a Tl-Ba-Ca-Cu-O compound oxide superconductor material. A superconducting device as claimed in anyone of Claims 1 to 5, characterized in that the substrate (5) is formed of a material selected from the group consisting of a MgO (100) substrate, a SrTiO 3 (100) substrate and a CdNdAlO 4 (001) substrate, and a semiconductor substrate. A superconducting device as claimed in Claim 6, characterized in that the substrate (5) is formed of a silicon substrate and a principal surface of the silicon substrate is coated with an insulating material layer which is formed of a MgAl 2 O 4 layer and a BaTiO 3 layer. A method of manufacturing a superconducting device, comprising the steps of forming on a principal surface (52) of a substrate (5) a non-superconducting oxide layer (50, 53) having a crystal structure similar to that of an oxide superconductor and a flat-top projection (50) at its center portion, forming a c -axis oriented thin film (1, 10) of said oxide superconductor having an extremely thin thickness on the non-superconducting oxide layer (50, 53) so as to form a superconducting channel (10) on the projecting portion (50) of the non-superconducting oxide layer, forming an insulating layer (17) on the c -axis oriented oxide superconductor thin film (1, 10) so as to form a gate insulating layer (7) on the superconducting channel (10), and forming an a -axis oriented thin film (2, 3, 4) of said oxide superconductor so as to form a superconducting gate electrode (4) on the gate insulating layer (7) and a superconducting source region (2) and a superconducting drain region (3),the upper surfaces of said superconducting source region and said superconducting drain region being at the same level as the upper surface of the superconducting channel (10). A method as claimed in Claim 8, characterized in that the flat-top projection (50) of the non-superconducting oxide layer is formed by a process comprising the steps of forming on a principal surface (52) of a substrate (5) a lift-off layer (26) excluding a portion on which the projection will be placed, which can be removed without degrading the principal surface, forming a first non-superconducting oxide layer (50) over the exposed portion of the principal surface and the lift-off layer, removing the lift-off layer (26) so that a portion of the first non-superconducting oxide (50) layer which will be the projection remains on the principal surface and the principal surface (52) is exposed at the both sides of the remaining portion (50) of the first non-superconducting oxide layer, and forming a second non-superconducting oxide layer (53) having a thinner thickness than that of the first non-superconducting oxide layer over the exposed portion of the principal surface and the first non-superconducting oxide layer. A method claimed in Claim 9, characterized in that the lift-off layer is formed of a CaO layer covered with a Zr layer. A method claimed in Claim 10, characterized in that the lift-off layer is removed by utilizing water and the following reaction: CaO + H 2 O → Ca(OH) 2

Inventors: IIYAMA MICHITOMO, INADA HIROSHI, NAKAMURA TAKAO, IIYAMA, MICHITOMO, INADA, HIROSHI, NAKAMURA, TAKAO
Applicants: SUMITOMO ELECTRIC INDUSTRIES, SUMITOMO ELECTRIC INDUSTRIES, LTD.
Application year: 1992
Main classification: H01L39
IPC codes: H01L39