Method and apparatus for evaluating the thickness of thin films

Abstract: The apparatus includes a laser (20) for generating a linearly polarized probe beam (22). The probe beam (22) is tightly focused (26) on the surface of a sample (12,14) to create a spread of angles of incidence. The reflected probe beam is passed through a quarter-wave plate (42) and linear polarizer (44) before impinging on a quad cell photodetector (40). The output signals from the photodetector (40) represent an integration of the intensity of individual rays having various angles of incidence. By taking the difference between the sums of the output signals of diametrically opposed quadrants, a processor (40) can obtain a value which varies linearly with film thickness for very thin films. The apparatus can be used in conjunction with other prior devices to enhance sensitivity for measurement of thicker films. Compensating measurements for assymetry in the beam (22) can be made by varying the orientation of the linear polarizer (44) and measuring the full beam intensity with another quad cell detector (30) before reflection of the beam (22).

Description: This invention relates to an apparatus for evaluating a parameter of a thin film on the surface of a sample comprising: means for generating a probe beam of radiation; means for focusing the probe beam substantially normal to the surface of the sample such that various rays within the focused probe beam create a spread of angles of incidence; means for retarding the phase of one polarization state in the probe beam with respect to the phase of the other polarization state in the probe beam; polarizing means for creating interference between the two polarization states in the probe beam after the probe beam has been reflected from the surface of the sample; detector means for measuring the power of the reflected probe beam along two orthogonal axes after it has passed through the retarding and polarizing means; and processor means for evaluating a parameter of the thin film on the sample based on measurement signals output by the detector means. The invention also relates to a method for evaluating a parameter of a thin film on the surface of a sample. There is considerable interest in developing systems for accurately measuring the thickness of thin films and the optical constants of those thin films. The need is particularly acute in the semiconductor manufacturing industry where the thickness of thin film oxide layers on silicon substrates are measured. To be useful, the measurement apparatus must be able to determine the thickness of films with a high degree of accuracy and be able to make the measurements within very localized areas (i.e. on the micron scale). One such apparatus that achieves these goals has been recently introduced by the assignee herein under the trademark Optiprobe. The approach used to obtain the measurements in that apparatus is described in detail in commonly owned U.S. Patent No. 4 999 014 (and European Patent No. 0 397 388). As described in that patent, a high power, spherical, microscope objective is used to tightly focus a probe beam substantially normal to the surface of the sample in a manner to create a spread of angles of incidence. An array of discrete photodetector elements is provided to measure the intensity of individual rays within the reflected probe beam. These individual rays correspond to discrete angles of incidence with respect to the surface of the sample. Using the angularly dependent intensity measurements, the processor can evaluate the parameters of the thin film. Parameters such as layer thickness and index of refraction can be determined using the Fresnel equations. Some of the fundamental concepts that were disclosed in Patent No. 4 999 014 were extended to develop a high resolution ellipsometer apparatus which is described in commonly owned U.S. Patent No. 5 042 951, and in European patent application no. 90304799.1, publication no. 0 396 409. In that apparatus, which is an apparatus of the kind defined hereinbefore at the beginning, the change in polarization state of the probe beam, caused by the reflection off the surface of the sample, was analyzed so that the conventional ellipsometric parameters could be used to evaluate the sample. As in the earlier cited patent, the detector arrangement in the ellipsometer apparatus included an array of discrete detector elements so that angularly dependent intensity measurements could be made. Both of the apparatuses described above provide information about thin film layers. However, and as described in both patents, additional accuracy can be obtained by measuring not only the angularly dependent intensity of the rays with an array of discrete elements, but in addition, by measuring the full power of the reflected probe beam. The advantage to measuring the full power of the reflected probe beam is that it provides a much better signal to noise ratio. It should be noted that a measurement of the full power of the reflected probe beam could not be used to determine thin film thickness alone, since this signal is not linear, but varies sinusoidally with thickness. However, if the approximate thickness can be derived using the angular dependent intensity measurements, the actual thickness can be more accurately determined using the additional full power measurement. In practice, using both angular dependent intensity detection and full probe beam power detection, accurate measurement of the thickness and optical constants of thin films down to 100Å has been achieved. Below 100Å, the interference effects of the film are so small that the signal to noise ratio associated with the discrete element photodetector makes analysis by angular dependent intensity measurements difficult. In addition, the sensitivity of the standard full power measurement in the region below 100Å is also low. Therefore, it is an object of the subject invention to provide an approach for measuring the thickness of films less than 100Å thick. It is another object of the subject invention to provide an apparatus for determining the optical constants of films less than 100Å thick. It is a further object of the subject invention to provide a device for evaluating parameters of a thin film with micron scale resolution. It is a further object of the subject invention to provide a method and apparatus which can be used in conjunction with existing systems to further refine the measurement of the thickness and optical constants of thin films. According to one aspect of the invention, an apparatus of the kind defined hereinbefore at the beginning is characterised in that the detector means is so configured that the said measurement signals are independent signals from respective regions along two orthogonal axes and each signal represents the integrated intensity received by the respective region. In a preferred embodiment of the invention, a high power, spherical, microscope objective is used to tightly focus the beam substantially normal to the surface of the sample to create a spread of angles of incidence. The probe beam is preferably focused to a spot less than a micron in diameter. The probe beam is initially linearly polarized. A quarter-wave plate is used to retard the phase of one polarization state of the reflected probe beam by ninety degrees. The reflected beam is then passed through a linear polarizer to create interference between the two polarization state components. The power of the beam is measured by a photodetector along two orthogonal axes. A quad cell is used having four radially disposed quadrants. Each quadrant will receive all the rays having different angles of incidence and generate an output signal of total power that effectively integrates the angular intensity measurements. As will be described in greater detail below, because of the geometry of the optical components, the power in each quadrant will be the same except for one term which will be positive for one set of diametrically opposed quadrants and negative for the remaining quadrants. By subtracting the sum of the outputs of the diametrically opposed quadrants, a signal can be obtained which is linearly proportional to the thickness of the thin film. Since the signal in each quadrant of the detector derives its magnitude from the power in an entire quadrant of the beam, the signal to noise ratio will be better than that achieved using only small discrete detectors that measure intensity only at specific points within the beam. Further, since the measurement includes information over a range of angles of incidence, the signal is highly sensitive in the region of thin film thickness below 100Å. This result can be compared to the low level of sensitivity available in a standard full power measurement. According to another aspect of the invention there is provided a method for evaluating a parameter of a thin film on the surface of a sample, comprising: generating a probe beam of radiation; focusing the probe beam of radiation substantially normal to the surface of the sample such that various rays within the focused probe beam create a spread of angles of incidence; retarding the phase of one polarization state in the probe beam with respect to the phase of the other polarization state in the probe beam; so polarizing the probe beam after the probe beam has been reflected from the surface of the sample as to create interference between the two polarization states in the probe beam; thereafter measuring the power of the reflected probe beam along two orthogonal axes; and evaluating a parameter of the thin film on the sample based on the measured power, characterised in that the steps of measuring and evaluating include the step of producing independent measurement signals from respective beam detecting regions along two orthogonal axes, each signal representing the integrated intensity received by the respective region. Although the sensitivity of this method, similar to the full power measurement, varies sinusoidally with thickness, it has been found that the subject measurement will also be useful above 100Å. More particularly, in film thickness regions between zero and 5000Å, the sensitivity of this method is greatest in those regions where the full power measurement is a minimum. Accordingly, the subject method can be advantageously implemented with the angular dependent measurements described above to further refine the analysis in thickness regions where the total power measurement is less sensitive. It should be understood that since this approach functions to integrate the angular intensity measurements, information available by measuring individual rays will be lost. Thus, a detailed analysis of the parameters of very thin films would be difficult based on this measurement alone. However, the measurements derived from this approach can be compared to known samples to give a highly accurate assessment of the specific parameters of very thin films. In most cases, the unknown parameter to be evaluated will be the thickness of the thin film. If the thickness is known, the system can be used to determine another optical constant such as the index of refraction of the thin film. The invention will now be described by way of example with reference to the accompanying drawings, in which: Figure 1 is a block diagram of an apparatus embodying the invention. Figure 2 is a schematic diagram of the surface of a quad cell photodetector used in the apparatus of Figure 1. Figure 3 is a graph illustrating a comparison of the variation in the amplitude of the output signal with respect to oxide layer thickness for a detector that measures total reflectivity and one that measures the signals from four quadrants (quad-cell difference signal). Figure 4 is an enlarged version of the graph of Figure 3 illustrating the signal in the region of oxide thickness below 500Å. Figure 5 is a block diagram of an alternative embodiment configured to minimize errors due to asymmetries in the probe beam. Detailed Description of the Preferred Embodiments Turning to Figure 1, an apparatus 10 is illustrated for performing the method of the subject invention. The apparatus 10 is designed to evaluate the thickness of a thin film layer 12 on a sample 14. In particular, the apparatus is capable of measuring the thickness of a thin film oxide layer on a silicon substrate. Apparatus 10 includes a laser 20 for generating a probe beam 22 of radiation. One suitable laser source is a solid state laser diode which emits a linearly polarized beam. Such a laser is available from Toshiba, model TLD 9211 having a 3 milliwatt power output at 670nm. Probe beam 22 is turned towards the sample 14 with a 50/50 beam splitter 24. The probe beam is focused onto the surface of the sample with a lens 26. In the preferred embodiment, lens 26 is defined by a spherical, microscope objective with a high numerical aperture on the order of .90 NA. The high numerical aperture functions to create a large spread of angles of incidence with respect to the sample surface. The spot size is on the order of one micron in diameter. A fraction of the probe beam power also passes through splitter 24 and falls on an incident power detector 30. The incident power detector 30 is provided to monitor fluctuations in the output power of the probe laser. As will be discussed below, the incident power detector can be modified to minimize measurement errors which arise due to asymmetries of the beam. Light reflected from the surface of the sample passes up through splitter 24 towards photodetector 40. Prior to reaching detector 40, the beam 22 is passed through a quarter-wave plate 42 for retarding the phase of one of the polarization states of the beam by 90 degrees. It should be noted that the quarter-wave plate could be located in the beam path prior to the probe beam striking the sample so that the system would operate with circularly polarized light. The latter approach might have some advantages in reducing the aberrations created by lens 26. In addition, while a phase retardation of 90 degrees will maximize the desired signal, other intermediate levels of retardation would be possible. The beam is then passed through a linear polarizer 44 which functions to cause the two polarization states of the beam to interfere with each other. In order to maximize the desired signal, the axis of the polarizer should be oriented at an angle of 45 degrees with respect to the fast and slow axes of the quarter-wave plate 42. In accordance with the subject invention, detector 40 is configured to generate independent signals from regions along two orthogonal axes. In the preferred embodiment, this goal is achieved by using a quad cell photodetector. As illustrated in Figure 2, the detector surface includes four radially disposed quadrants 52, 54, 56 and 58. Each quadrant will generate an output signal proportional to the magnitude of the power of probe beam striking the quadrant. This signal represents an integration of the intensities of all the rays having different angles of incidence with respect to the sample surface. While this integration approach results in the loss of some information content as compared to an analysis of individual rays, the composite approach does provide significantly greater sensitivity through enhanced signal to noise performance. The probe beam 22 should be centered on the detector so that each quadrant intercepts one quarter of the probe beam. The probe beam should underfill the detector. As noted above, the geometry of the optical elements results in creating a signal response that can be processed to form a result that varies linearly with layer thickness. This response can be understood from the following analysis which is described with reference to linearly polarized light. As noted above, the system can operate with circularly polarized light as well. In the following analysis, it is assumed that the electric field of the incident light has the form E i (r,)ê x where r is the radial distance from the center of the beam and  is the angle relative to the x-axis. After passing through the objective lens 26, reflecting off the sample surface, and returning through the lens, the electric field will be spatially dependent and have the form E R (r,) = E i (r,) {(R p cos 2 +R s sin 2 )ê x + (R p - R s )sincosê y } where ê x and ê y are the unit vectors along the x and y axes, R p is the complex p-wave amplitude reflection coefficient, and R s is the complex s-wave amplitude reflection coefficient. The radial position within the beam, r, is related to the angle of incidence upon the sample, Θ, through the expression r=dsinΘ, where d is the focal length of the objective lens. R p and R s are functions of Θ and are independent of . If the beam 22 is passed through the quarter-wave retardation plate 42 oriented such that the x-component is retarded 90° relative to the y-component, and then is passed through the linear polarizer 44 oriented at angle α to the x-axis, the electric field will be of the form E R (r,,α) = E i [ i cosα(R p cos 2 +R s sin 2 )ê x + sinα(R p -R s )sincosê y ] The light intensity is equal to the square of the field magnitude, I R =|E R | 2 . I R can be expressed in terms of the ellipsometric parameters @ and 6 through the following relationships: R p R s = R p R s e δ and tanΨ = R p R s . Carrying out the expansion of |E R | 2 , we get I R (r,,α) = I i (r,) R s 2 {[tan 2 Ψcos 4 +sin 4 ]cos 2 α + [tan 2 Ψ+1]sin 2 cos 2 sin 2 α + 2tanΨcosδcos 2 sin 2 (cos 2 α-sin 2 α) + 2tanΨsinδcossincosαsinα} For very thin films, tan Ψ is independent of thickness and δ is linearly proportional to the thickness. Hence, the last term in the above expression is of greatest interest. As noted above, this term is maximized when the analyzer angle, α, is 45°. The total power impinging on each quadrant of the photodetector is equal to the integral of I R over the quadrant. If the incident laser beam, I i , is circularly symmetric, the power in each quadrant is given by The sign of the second integral is positive for quadrants 54 and 58 and negative for quadrants 52 and 56. If the signals from quadrants 52 and 56 are summed and subtracted from the sum of the signals from quadrants 54 and 58, the remainder will have a simple form that is linearly proportional to film thickness for thin films: For very thin films or small δ then The graphs in Figures 3 and 4 illustrate the variation of the output signal S with thickness for a silicon oxide (SiO 2 ) film on a silicon (Si) substrate. The incident laser beam was assumed to have a Gaussian intensity profile and the numerical aperture of the objective lens was 0.9. For comparison, the sum of the four quadrants is also shown which corresponds to the total reflectivity measurement described in the above cited patents. These curves demonstrate the superior sensitivity of the quad-cell difference signal for films thinner than 100Å. They also show that the sum and difference signal techniques are complementary. More specifically, when the difference signal is at a peak or valley, and thus where its thickness sensitivity is at a minimum, the total reflectivity signal has a steep slope. Conversely, when the total reflectivity signal is at a peak or valley, the difference signal has a steep slope. Thus, by using a combination of the two techniques, it is possible to take full advantage of the signal-to-noise benefits of large-area detection for all thicknesses from 0Å to at least 5000Å. To carry out the analysis, the output signals from the detector 40 are supplied to a processor 60. Processor 60 functions to find the difference between the sums of the signals from diametrically opposed quadrants 52, 56 and 54, 58. The difference value can be compared with a calibration table of values for known thicknesses. As can be seen from Figure 4, there is a significant variation in signal in the region below 500Å so that accurate measurements can be made. In the case where thickness of the film is known, the difference signal could be used to determine the other optical constants of the film, specifically the index of refraction and the extinction coefficient. In the broadest sense, the quad-cell difference signal provides a single, very accurate measurement of the ellipsometric parameter δ (when measuring very thin films) which is related to the optical thickness (nt) in thin films and the extinction coefficient of the substrate and can be used to evaluate either parameter. For thicker films, the information provided by the quad-cell difference signal is a complicated function of ψ and δ, but the point remains that the difference signal can be used to refine the calculation of any unknown quantity (thickness, index of refraction or extinction coefficient) given the others. It is envisioned that the subject approach will be incorporated into the devices described in the above cited patents. This incorporation can be very straightforward since the devices described above were already equipped with most of the elements necessary to carry out the subject invention. Significantly, the prior devices both included a full power detector (element 340 in both patents). This standard full power detector can be replaced with a quad cell detector. As can be appreciated, if a full power measurement is desired, all four quadrants can be summed. In contrast, if a difference signal is desired in accordance with the subject approach, the processor can subtract the sums of the diametrically opposed quadrants. The prior devices would be further modified by the addition of the appropriate retardation and polarizing elements. It is envisioned that for films having thicknesses greater than 100Å, the initial evaluation would be based on the angularly dependent intensity measurements. Refinement of the measurement would be made using either the full power measurement or the subject difference measurement. The choice will be based on the sensitivity of the signal in the particular thickness region being measured. The mathematical analysis set forth above assumed that the probe beam was circularly symmetrical or independent of . If it is not, the leading terms in equation (5) will not cancel upon subtraction and there is a residual term which introduces an offset in thin-film measurements and thereby complicates the interpretation of the results. Furthermore, the residual term can degrade the signal-to-noise of the device since it increases the noise level without contributing useful information about the film thickness. Various signal processing techniques can be used to minimize such errors. One approach to minimizing such errors would be to rotate the linear polarizer 44 and record the signals at α=0° and α=90°. From the expression for I R , equation (5), it can be seen that I R (r,,α=45°) = ½{I R (r,,α=0°) + I R (r,,α=90°)} + sinδtanΨcossinI i (r,) R s 2 By subtracting 0° and 90° signals from the 45° signal, the term proportional to small δ can be isolated. Since the subtraction is done for each individual quadrant, circular asymmetry will not effect the result. As indicated in Figure 1, rotation of polarizer 44 can be placed under the control of the processor 60. A second approach is illustrated in Figure 5. In this approach, two identical quad-cell detectors 70 and 72 are used simultaneously to measure the right and left-handed circular components of the reflected beam. This can be accomplished most directly by replacing the final linear polarizer 44 with a polarizing beam splitter 74. After passing through the polarizing beam splitter 74, two beams are created. One beam will be the right-handed component and the other will be the left-handed component. The power hitting the two quad cells is identical except for a sign change in the term linear in small δ. By this arrangement, a subtraction of the signal generated by one quadrant in one detector from the signal generated by the corresponding quadrant in the other detector will produce a result that is linear for thin films. The signal can be maximized by performing a quadrant by quadrant subtraction and summing the result. While either of the above two techniques will guarantee the removal of terms insensitive to small δ, the remaining linear term will still be weighted by any asymmetry of the beam through its dependence on I i (r,). For the most part, the r and  dependence of the incident light can be calculated by measuring the signals from known samples and comparing them to theory. However, to keep track of dynamic changes in the incident beam, it is necessary to monitor the incident intensity with a separate photodetector. In the devices described in the above cited patents, a single photodetector measures the total intensity of the incident beam to remove the effects of the variation in the intensity of the beam generated by the laser. This concept can be extended by modifying the incident beam detector to a quad cell detector (shown as 30 in Figure 1). By using a quad cell detector, small changes in the symmetry of the incident beam can also be measured. By individually normalizing the signals from the quadrants of detector 40 with the incident power measured in the corresponding quadrants of detector 30, the effects of symmetry changes can be greatly reduced. In summary, there has been disclosed a method and apparatus for evaluating a parameter of a thin film. The apparatus includes a linearly polarized probe laser beam which is tightly focused on the sample surface to create a spread of angles of incidence. The reflected probe beam is passed through a quarter-wave plate and a linear polarizer before impinging on a quad cell photodetector. The output signals from the photodetector represent an integration of the intensity of individual rays having various angles of incidence. By taking the difference between the sums of the output signals of diametrically opposed quadrants, a value can be obtained which varies linearly with film thickness for very thin films. The subject device can be used in conjunction with other prior devices to enhance sensitivity for thicker films. While the subject invention has been described with reference to the preferred embodiments, various changes and modifications could be made therein, by one skilled in the art, without varying from the scope of the invention as defined by the appended claims.

Claims: An apparatus for evaluating a parameter of a thin film on the surface of a sample comprising: means (20) for generating a probe beam of radiation; means (26) for focusing the probe beam substantially normal to the surface of the sample such that various rays within the focused probe beam create a spread of angles of incidence; means (42) for retarding the phase of one polarization state in the probe beam with respect to the phase of the other polarization state in the probe beam; polarizing means (44) for creating interference between the two polarization states in the probe beam after the probe beam has been reflected from the surface of the sample; detector means (40) for measuring the power of the reflected probe beam along two orthogonal axes after it has passed through the retarding and polarizing means (42,44); and processor means (60) for evaluating a parameter of the thin film on the sample based on measurement signals output by the detector means (40), characterised in that the detector means (40) is so configured that the said measurement signals are independent signals from respective regions along two orthogonal axes and each signal represents the integrated intensity received by the respective region. An apparatus according to claim 1, characterised in that said detector means (40) is a photodetector having four radially disposed quadrants (52,54,56,58), such that in operation each quadrant generates an output signal representing an integration of all the rays incident thereon. An apparatus according to claim 2, characterised in that said processor means (60) functions to derive a measurement value by calculating the difference between the sums of the output signals of diametrically opposed quadrants. An apparatus according to claim 3, characterised in that said parameter is the thickness of the thin film. An apparatus according to claim 3, characterised in that said parameter is an optical constant of the thin film. An apparatus according to claim 5, characterised in that said optical constant is the index of refraction of the thin film. An apparatus according to claim 5, characterised in that said optical constant is the extinction coefficient of the thin film. An apparatus according to claim 1 or 4, characterised in that said retarding means is defined by a quarter-wave plate (42). An apparatus according to claim 8, characterised in that the probe beam is linearly polarized prior to being focused on the sample surface. An apparatus according to claim 8, characterised in that polarizing means (44) is a linear polarizer. An apparatus according to claim 3 or 10, characterised in that said processor means (60) further functions to compare said derived measurement value with known values in a calibration table to determine the parameter of the thin film layer. An apparatus according to claim 9 or 10, characterised in that the quarter-wave plate (42) is positioned in the beam path after the beam has been reflected from the sample. An apparatus according to claim 10, characterised in that the axis of said polarizing means (44) is oriented at a 45 degree angle with respect to the axes of the quarter-wave plate (42). An apparatus according to claim 10 or 13, characterised in that said processor means (60) further functions to rotate said polarizing means (44) and record additional measurements from said detector means (40) when the axis of said polarizing means (44) is oriented at both zero and 90 degrees with respect to an axis of the quarter-wave plate (42), said additional measurements being used to normalize the measurements made when the polarizing means (44) is oriented at a 45 degree angle thereby minimizing errors attributable to asymmetries in the probe beam. An apparatus according to claim 2, characterised by a second photodetector (72) having four radially disposed quadrants and being identical to the first photodetector (70), and said polarising means (74) is defined by a polarizing beam splitter for creating two partial beams with right and left-hand circular components, with one of said partial beams being measured by the first photodetector (70) and with the other partial beam being measured by the second photodetector (72), with the processor means utilizing the output generated by the two photodetectors (70,72) to normalize the measurements and minimize the effects of asymmetries in the probe beam. An apparatus according to claim 2, characterised by an incident beam photodetector (30) for measuring the power of the probe beam before it reaches the sample, and the incident beam photodetector (30) has four radially disposed quadrants and said processor means (60) utilizes the output generated by the incident beam photodetector (30) to normalize the measurement of the reflected beam photodetector (40) to minimize the effects of asymmetries in the probe beam. An apparatus according to claim 1 or 10, characterised in that the focusing means (26) is adapted to focus said probe beam to a spot size of about one micron in diameter. A method for evaluating a parameter of a thin film on the surface of a sample, comprising: generating (20) a probe beam of radiation; focusing (26) the probe beam of radiation substantially normal to the surface of the sample such that various rays within the focused probe beam create a spread of angles of incidence; retarding (42) the phase of one polarization state in the probe beam with respect to the phase of the other polarization state in the probe beam; so polarizing (44) the probe beam after the probe beam has been reflected from the surface of the sample as to create interference between the two polarization states in the probe beam; thereafter measuring (40) the power of the reflected probe beam along two orthogonal axes; and evaluating a parameter of the thin film on the sample based on the measured power, characterised in that the steps of measuring and evaluating include the step of producing independent measurement signals from respective beam detecting regions along two orthogonal axes, each signal representing the integrated intensity received by the respective region. A method according to claim 18, characterised in that said parameter is the thickness of the thin film. A method according to claim 18, characterised in that said parameter is an optical constant of the thin film. A method according to claim 20, characterised in that the optical constant is the index of refraction of the thin film. A method according to claim 20, characterised in that the optical constant is the extinction coefficient of the thin film. A method according to claim 18, characterised by providing a probe beam of linearly polarized radiation and in that the phase of one polarization state in the probe beam is retarded with respect to the phase of the other polarization state in the probe beam by 90 degrees; the probe beam is polarized linearly after the probe beam has been reflected from the surface of the sample; the power of the reflected probe beam is measured in four radially disposed quadrants; from each quadrant an output signal is generated that is proportional to the power of the probe beam incident on that quadrant; and a measurement value is derived by calculating the difference between the sums of the outputs of diametrically opposed quadrants, said measurement value being used to evaluate the thickness of the thin film on the sample. A method according to claim 23, characterised by the step of comparing said derived measurement value with known values in a calibration table to determine the thickness of the thin film layer. A method according to claim 18 or 23, characterised in that said probe beam is focused to a spot size of about one micron in diameter.

Inventors: FANTON JEFFREY T, OPSAL JON, ROSENCWAIG ALLAN, FANTON, JEFFREY T., OPSAL, JON, ROSENCWAIG, ALLAN
Applicants: THERMA WAVE INC, THERMA-WAVE INC.
Application year: 1992
Main classification: G01B11
IPC codes: G01B11