Ambient-free processing system

Abstract: An apparatus and method for processing a workpiece in an ambient-free, atmosphere of selected gas. A preparation vessel has an opening for entry of the workpiece and a diffuser oriented to emit across the vessel opening a laminar curtain flow of the selected gas which enters, purges the vessel and prevents the infiltration of air. The workpiece on its carrier is transported into the preparation vessel where air is purged out and replaced with selected gas. A processing vessel has a similar workpiece entry opening and diffuser. The preparation vessel and the processing openings are brought into coincidence, and the carrier is transported into the processing vessel for processing of the workpiece in the atmosphere of selected gas provided by the processing vessel diffuser.

Description: Technical Field This invention relates to providing an ambient air-free atmosphere within processing vessels, in particular within processing vessels used in the manufacture of semiconductor devices. Background Many of the manufacturing steps used to make semiconductor devices and integrated circuits require that a very high purity gaseous atmosphere be maintained within the vessel used for processing. Solid particles and vapor phase contaminants, notably moisture and oxygen, must be kept to an absolute minimum. Since these contaminants are contained in air, air infiltration into the vessel must be minimized. Among the processes strongly affected by these contaminants is the annealing of titanium-coated silicon wafers in a nitrogen or argon environment to promote the formation of titanium silicide. As little as 1 to 5 ppm of oxygen and moisture can lead to the formation of undesirable titanium oxide. Similarly, the deposition of polysilicon onto exposed silicon on wafers to form bipolar emitter structures is very sensitive to oxidation of the exposed silicon. If air is initially present in the low pressure processing vessel, an oxide will form on the exposed silicon surfaces which can degrade device performance. The extent of air infiltration into process vessels, the forces governing this phenomenon and the problems it can cause are not fully recognized in the integrated circuit industry. Most commercial semiconductor equipment is operated in batch or semibatch fashion. A load of one or more wafers is placed into a vessel, processed and unloaded. Measurements of the purity of the atmosphere within a wide variety of processing vessels during all phases of their operation reveal that typically considerable infiltration of room air into a processing vessel occurs during loading and unloading, which leads to detrimental contamination. A processing vessel usually must be maintained at elevated temperature at all times because of the long times required for cooling and heating. The primary force for the influx of air into the vessel is the buoyancy difference between cool room air and the hot gases in the vessel. Hot gases in the vessel tend to rise toward the top of the vessel; cool room air flows in and down toward the bottom of the vessel through any openings in the vessel. Thus when a vessel is opened to admit or remove a workpiece, a large influx of room air occurs, and the atmosphere in the vessel becomes seriously contaminated. In commercial practice, wafers are often placed in a boat on an open, motorized cantilevered carrier. When the processing vessel is opened, the carrier is transported into the processing vessel. As the wafers approach the processing vessel, the wafers are heated by radiant and convective heat transfer from the processing vessel. At this point, the wafers are still in a room air environment which is often deleterious to them as their temperature rises. Then, as wafers enter the processing vessel, they are exposed to still higher temperatures and to large concentrations of oxygen, moisture and particles which entered when the processing vessel was open. Once the vessel is closed, the process gases begin to purge the airborne contaminants from the vessel. However, purging to levels below 100 ppm can take tens of minutes. As a result, process time is lost, equipment throughput decreases and capital costs per wafer processed increase. The purging problem is even more severe for a low pressure or evacuated vessel. Here, moisture from infiltrating air adsorbs on the inner surface of the vessel and all other exposed components. Its removal under vacuum is difficult and slow. An apparatus for processing a workpiece in a selected atmosphere comprising a processing vessel, a workpiece carrier and means for transferring the workpiece carrier to the processing vessel, wherein the processing vessel has an opening for entry of the workpiece and a diffuser with an emitting surface oriented to emit a laminar curtain flow for selected gas across the processing vessel opening, is known from EP-A-0 319 948 as well as from US-A-4 915 622. WO-A-88 07 096 discloses an apparatus for providing a selected atmosphere for processing a workpiece, which apparatus comprises a processing vessel having an opening for the workpiece and a diffuser for issuing a flow of selected gas. The known apparatus further comprises a workpiece carrier having a surface for mating with the processing vessel opening, and means for bringing the processing vessel opening and the carrier mating surface into coincidence. In this known apparatus the diffuser issues a turbulent flow of gas, and the turbulent gas flow is converted into a laminar flow by a particular shape and structure of the processing vessel and of the workpiece carrier. An apparatus for providing a selected atmosphere for processing of a workpiece comprising a processing vessel having an opening for entry of the workpiece, a workpiece carrier for retaining and carrying the workpiece through the opening into the processing vessel, means for supporting and transporting the carrier, and diffuser means mounted on the workpiece carrier for issuing gas to protect the workpiece against contaminating gases, is known from US-A-4 955 808 and from US-A-4 911 638. In the apparatus of US-A-4 955 808 the diffuser means on the workpiece carrier are formed by a shielding plate having a gas inlet to which gas is supplied through a rod-like hollow portion of the carrier. The diffuser means of the apparatus of US-A-4 911 638 are defined by a diffusion capsule receiving the workpiece and by one or more injector tubes which extend the length of the diffusion capsule along its bottom. The or each injector tube has multiple rows of high aspect-ratio orifices along its length to disperse inert gas uniformly across the workpiece surfaces. US-A-4 950 156 describes a tube furnace used for high-temperature processing of semiconductor wafers employing an annular manifold around the opening of the furnace tube where wafer boats enter and exit. This manifold has a number of gas outlets to produce a radially-inwardly directed curtain of inert gas to prevent ambient gas from entering the furnace tube during loading and unloading operations. Summary of the Invention An object of the present invention is to provide an improved apparatus and method for creating an ambient free atmosphere of selected gas in a processing vessel and a workpiece preparation vessel. Another object is to provide an improved apparatus and method for processing semiconductor and integrated circuit components in an atmosphere of highly reduced ambient air concentration. One aspect of the invention is an apparatus for processing a workpiece in a selected atmosphere, which apparatus comprises a processing vessel having an opening for entry of the workpiece and a diffuser with an emitting surface oriented to emit a laminar curtain flow of selected gas across the processing vessel opening, and further comprises a workpiece carrier and means for transferring the workpiece carrier to the processing vessel, the apparatus being characterized by a preparation vessel having an opening congruent with the processing vessel opening, and a diffuser with an emitting surface oriented to emit a laminar curtain flow of selected gas across the preparation vessel opening, and by means for bringing the preparation vessel opening and the processing vessel opening into coincidence, the transferring means being designed for transferring the workpiece carrier from the preparation vessel to the processing vessel when the preparation vessel and the processing vessel opening are in coincidence. The means for transferring the workpiece comprises a carrier or boat which is loaded in the normal air atmosphere with the workpiece, and then transported into the preparation vessel which is at atmospheric temperature. Selected gas flow is then started from the diffuser at the opening of the preparation vessel thereby purging the preparation vessel of air. Thus air contacting the surfaces of the work is replaced with selected gas while the work is still at atmospheric temperature. Air is similarly purged from the processing vessel by selected gas emanating from the diffuser at the opening of the processing vessel. Upon bringing the openings of the preparation vessel and processing vessel into coincidence, the work is transferred into the processing vessel without a detrimental influx of atmospheric air into the system. Another aspect of the invention is an apparatus for providing a selected atmosphere for processing of a workpiece, the apparatus comprising a processing vessel having an opening for entry of the workpiece, a workpiece carrier for retaining and carrying the workpiece through the opening into the processing vessel, means for supporting and transporting the carrier, and diffuser means mounted on the workpiece carrier for issuing gas to protect the workpiece against contaminating gases, which apparatus is characterized in that the diffuser means comprises a leading diffuser mounted on the carrier end intended to lead the entry of the carrier into the processing vessel, said diffuser having an emitting surface for issuing a laminar flow of gas directed at, or away from, or both at and away from the intended workpiece location; and a trailing diffuser mounted on the carrier end intended to trail during entry of the carrier into the processing vessel, said diffuser having an emitting surface for issuing a laminar flow of gas directed at, or away from, or both at and away from the intended workpiece location. The carrier, the diffusers and the work are sized to fit within the processing vessel. The selected gas flow from the diffusers purges the surfaces of the work before transportation of the work into the processing vessel, and maintains an atmosphere of selected gas within the processing vessel upon transportation into the vessel. Further aspects of the invention are defined in claims 15 and 17. The laminar fluid curtain flow provides an atmosphere of selected gas within the processing vessel. An advantage of the invention is that an atmosphere of selected gas is provided with reduced ambient air concentration within a reduced time compared to prior methods and apparatus. Brief Description of the Drawings Figs. 1A through 1E are vertical sectional views showing an embodiment of the apparatus comprising the invention during various stages of operation. Fig. 2 is a vertical sectional view of a variant of the embodiment shown in Fig. 1. Fig. 3 is an end view of the apparatus in Fig. 2 taken in a direction of the arrows labeled 3-3. Fig. 4 is also an end view of a variant of the apparatus in Fig. 2 taken in the direction indicated by arrows 3-3, and showing a variation of the diffuser configuration which may be employed in this invention. Fig. 5 is a vertical sectional view of another embodiment of the invention. Fig. 6 is a vertical sectional view of another embodiment of the invention wherein the normally separable components of the apparatus are shown separated. DETAILED DESCRIPTION OF THE INVENTION Turning now to the drawings, depicted in Fig. 1A through Fig. 1E is an embodiment of a novel apparatus for processing of a workpiece in a selected atmosphere. In Fig. 1A is shown a processing vessel 10 having an opening 12 for a workpiece. Adjacent to the opening is a diffuser 14 with an emitting surface 16 oriented to emit a laminar curtain flow of selected gas across the process vessel opening 12. The diffuser gas enters the processing vessel through the opening, purges the vessel of atmospheric air and prevents atmospheric air from entering, thereby providing an atmosphere of selected gas within the processing vessel. A selected gas may be an inert gas or a process or reactant gas or mixtures thereof. A common processing vessel to which this invention is particularly suited is a furnace tube. A vessel opening may also be provided with a closure so that the vessel may be operated under pressure or under vacuum. When the closure is open, the diffuser performs the functions described. Also provided is a preparation vessel 18 having an opening 20 congruent with the processing vessel opening 12. Adjacent to the preparation vessel opening 20 is a diffuser 22 with an emitting surface 23 oriented to emit a laminar curtain of selected gas across the preparation vessel opening. The diffuser at the opening of the preparation vessel also emits selected gas which enters the preparation vessel, purges it of atmospheric air and prevents atmospheric air from entering, thereby providing an atmosphere of selected gas in the preparation vessel. Exhaust collectors 52 and 54 serve to collect the exhaust gas and are described more fully later. The workpiece or workpieces 24 are retained on a carrier 26 or boat which is loaded with the work or unloaded while the carrier is in the position shown in Fig. 1A. The carrier 26 and the workpieces 24 are sized to enter the workpiece openings 12, 20 in the preparation and processing vessels. Typically, attached to the end of the carrier 26 intended to trail upon entry of the carrier into the processing vessel is an arm 30 which supports the carrier in a cantilever fashion. The arm protrudes through a port 32 in the end of the preparation vessel remote from the workpiece opening. By manipulation of the arm through the port, the carrier with its workpiece is transported into the preparation vessel and subsequently into the processing vessel. Typically a clearance is provided between the arm 30 and the port 32 to avoid rubbing contact and the generation of particles. However, in certain cases a seal is provided. Optionally an inlet 34 may be provided in the processing vessel at the end remote from the workpiece opening. Selected gas may be admitted through this inlet to assist in purging and maintaining the atmosphere within the preparation vessel. A similar inlet 36 for selected gas may be provided in the preparation vessel. A preferred configuration for introducing selected gas into a preparation vessel at the end remote from the workpiece opening is shown in Fig. 1E. The configuration comprises a short carrier-arm tube 37 mounted in an end wall of the preparation vessel. The carrier-arm tube 37 desirably protrudes from about 0.1 to about 3 carrier-arm tube diameters into the preparation vessel, and extends from about 2 to about 10 diameters outside the preparation vessel. The carrier arm 30 passes through and is movable within the carrier-arm tube 37. The inside diameter of the carrier-arm tube 37 is sufficiently larger than the diameter of the carrier arm to avoid rubbing contact which might generate particles which could enter the preparation and processing vessels and degrade the work. An entry for selected gas supply into the carrier-arm tube 37 is provided by another tube 39 inserted into tube 37 near the end wall of the preparation vessel. A portion of the supplied selected gas flows out of the carrier-arm tube into the atmosphere while a larger portion flows into the preparation vessel. This preferred configuration is more efficient in purging the preparation vessel of air then the configuration comprising openings 36 and 32 shown in Fig. 1A. Fig. 1B depicts the workpiece carrier within the preparation vessel. Selected gas flows from the diffuser at the preparation vessel opening and the gas inlet at the end of the preparation vessel then purge the interior of the preparation vessel. Thus the work is provided an atmosphere of selected gas while at atmospheric temperature and without any deleterious heating of the work in air. Prior to coinciding preparation and processing vessel openings, selected gas flows from the diffuser at the opening of the processing vessel and the inlet at the end are initiated to purge the processing vessel interior. Then as shown in Fig. 1C, the preparation vessel opening is brought into coincidence with the processing vessel opening. With the two vessels in this position, the workpiece in the preparation vessel may be preheated by heat transfer from the processing vessel. Since an atmosphere of selected gas exists in both the processing and preparation vessel, preheating of the work in air is avoided. The workpiece carrier is then transferred into the processing vessel by the arm extending from the carrier into the processing vessel as shown in Fig. 1D. The end 28 of the carrier 26 intended to trail upon entry of the carrier into the processing vessel is provided with an end plate 38 which serves to at least partially or substantially close the opening 12 to the processing vessel. This allows the flow of selected gas necessary to maintain the selected atmosphere within the processing vessel to be reduced or ceased. As shown in Fig. 1E, the preparation vessel may be drawn away from the processing vessel leaving the workpiece within the processing vessel for processing. Selected gas flow may then be altered if desired, for instance from an inert gas flow to a processing gas flow. In Fig. 2 is depicted an optional configuration for the introduction of selected gas at the end remote from the workpiece opening of the processing vessel. The selected gas is introduced through an internal diffuser 40 oriented to direct a laminar flow of selected gas within the processing vessel across the intended workpiece location and toward the workpiece opening. The use of an internal diffuser is more efficient in enveloping the workpiece and preventing the infiltration of air into the processing vessel than discharging selected gas from a wall port or a tube within the processing vessel. Lower levels of air concentration within a vessel may be achieved. The preparation vessel is similarly equipped with an internal diffuser 44 at the end remote from the workpiece opening. A diffuser mounted on a carrier as diffuser 62, 64 in Fig. 5 may have an emitting surface in the form of an annulus, a circle, a disk or other plane geometric figure. As shown in Fig. 3, a diffuser at the opening of a vessel may have the form of an annulus 44 or a portion of an annulus. The emitting surface of an annular diffuser emits fluid to flow radially inward across the protected opening. Alternatively as shown in Fig. 4, a diffuser at the opening of a vessel may have the form of a linear segment 46 positioned adjacent to an opening. The diffuser emitting surface is oriented to direct a flow of fluid across the opening to be protected. A single segment, or two segments positioned diametrically opposite each other across the opening may be employed. Four segments surrounding the opening may also be employed. The diffuser segments may be mounted on a plate 48 which is mounted at the vessel opening. Preferably a diffuser at a vessel opening is mounted so that no void or gap exists between the diffuser housing and the perimeter of the vessel opening. Thus any gap between an annular diffuser housing and the surface where the diffuser is mounted is closed by a barrier or seal 50 to prevent induced flow of atmospheric air into the fluid curtain as shown in Fig. 2. As shown in Fig. 4, a diffuser having the form of a linear segment may be conveniently mounted on a plate 48 which has an aperture whereby the plate fits around the vessel at the vessel opening. Seals are provided between the plate 48 and the diffuser housing 46 and between the plate 48 and the vessel 10. The plate 48 and the seals eliminate any gaps and provide a barrier to the induced flow of air between a diffuser housing and the vessel. Since the selected gas emanating from a diffuser might not contain oxygen and thereby pose an asphyxiation hazard, it is desirable to prevent the escape of such selected gas into a room. Thus, encompassing the diffuser at the processing vessel opening is an exhaust collector 52 to collect the selected gas discharging from the diffuser 14 and from the opening 12 of the processing vessel 10. Also encompassing the diffuser 22 at the opening 20 of the preparation vessel 18 is a similar exhaust collector 54 which serves to collect the gases emanating from the diffuser 22 and the preparation vessel. An exhaust collector as shown in Fig. 3 may be a segment of duct having a circular cross section, or as shown in Fig. 4, a segment having a rectangular or square cross section. The gas collected in an exhaust collector is ducted away through a withdrawal port 56 in the side of the exhaust collector. A slight vacuum is maintained on the exhaust port. In some circumstances, the cqllected exhaust gas is reprocessed and reused. A preferred port configuration which reduces the disturbance of a fluid curtain by exhaust withdrawal is shown in Fig. 4. The port comprises a flow resistive media 58, through which the exhausting gas is drawn into a tapering area duct 60. The flow resistive media may, for example, comprise a mesh, a porous plate or a narrow slot. The frontal area extended by the flow resistive media preferably extends over at least a 45° angle lying in the plane of the vessel opening with the angle vertex at the center of the opening. Two withdrawal ports diametrically across the vessel opening further reduce the disturbance of the fluid curtain. Most preferably, the flow resistive media in an exhaust collector extends 360° around the vessel opening. Another embodiment of the invention is depicted in Fig. 5. This embodiment comprises a processing vessel 10 having an opening 12 for the entry of the workpiece 24, and a workpiece carrier 26 for retaining and carrying the workpiece 24 through the opening in the processing vessel. A leading diffuser 64 is mounted on the carrier end intended to lead during entry of the carrier into the processing vessel. The leading diffuser is oriented to discharge a laminar flow of selected gas at the intended workpiece location so as to envelop the workpiece and free the external surfaces of the workpiece of air before introducing the workpiece into the processing vessel. A trailing diffuser 62 is mounted on the carrier end intended to trail during the entry of the carrier into the processing vessel. The trailing diffuser is oriented to discharge a laminar flow of gas away from the workpiece and toward the workpiece opening in the processing vessel when the carrier is within the vessel, thereby preventing the entry of air into the vessel. Alternatively the trailing diffuser discharges a laminar flow towards the workpieces. In yet another variant, the diffuser discharges flow from both its faces. The means for supporting and transporting the carrier comprises an arm 30 extending from the carrier end intended to trail during entry of the carrier into the processing vessel. Mounted on the arm near the trailing end of the carrier is an end plate 38 sized to at least partially close the opening 12 in the processing vessel when the carrier is within the vessel, thereby reducing the consumption of selected gas. Another embodiment is shown in Fig. 6, comprising a processing vessel 66 which may take the form of a bell jar. The workpiece carrier 78 has an annular diffuser 80 with an emitting surface oriented to discharge a laminar flow of selected gas radially inward at the workpiece 24. This laminar flow replaces atmospheric air contacting the workpiece surface with selected gas. The processing vessel 66 has an annular diffuser 82 mounted adjacent to its opening 68. This diffuser is oriented to discharge a laminar flow of selected gas across the opening to the processing vessel thereby filling the vessel with selected gas and impeding the entrance of air from the atmosphere. When the workpiece carrier 78 and the processing vessel 66 are in coincidence, the diffuser flows are ceased. The flow from the diffusers are initiated prior to separation of the carrier from the processing vessel, thereby allowing unloading and loading without exposing the internal surfaces to atmospheric air. A dimensionless parameter which is useful as a criterion of dynamic similarity for a fluid curtain is a modified Froude number. This parameter is analogous to a nondimensionalized or normalized flow velocity, and can be used to describe the requirements for establishing an effective laminar fluid curtain. Laminar flow is considered to exist when the root mean square of random fluctuations in fluid velocity does not exceed 10% of the average fluid velocity. The modified Froude number F as used herein is defined as: F = Q A ρ e (ρ a - ρ v )gt where Q is the total volumetric flow rate of fluids provided to the diffusers to establish the curtain, A is the area covered by the curtain, ρ e is the mass density of the fluids emitted by the diffusers, ρ a is the density of the atmospheric air contiguous with the curtain, ρ v is the density of the gas within the free volume of the vessel, g is the acceleration of gravity, and t is the thickness of the curtain at its origin. In all of the embodiments, the emitting surface of each diffuser positioned at a vessel opening desirably has a transverse width or diameter at least 5% of the distance over which the curtain provided by the diffuser is intended to extend. Also comprising the apparatus of each embodiment is a means for controlling the flow of selected gas from each such diffuser so that desirably it will issue at a modified Froude number in the range of from about 0.05 to about 10. With the selected gas provided by a pressurized source, the control means may take the form of a valve or pressure regulator. The pressure within each diffuser is regulated to a preset value which will provide the desired flow and desired modified Froude number. The construction of a diffuser positioned at a vessel opening as used in this invention may comprise a channel with a porous emitting face. The porous face may be a sintered metal sheet with a pore size ranging from about 0.5 microns to about 50 microns and preferably from about 2 microns to about 5 microns. Nonmetallic media such as porous plastic or fritted quartz are also usable. For semiconductor and integrated circuit processing, the porous material provides an added benefit in that it filters the emitted gas of detrimental particulate matter. A preferred diffuser construction comprises a hollow tubular body with an inlet for fluid into the hollow and a perforated wall for emitting fluid. The tubular body is contained in an elongated housing or channel having an outlet running substantially the length of the housing. A channel having a U-shaped cross section is an example. The housing extends substantially the length of the tubular body. The housing outlet directs a curtain of fluid from the housing across the opening to a contained volume desired to have a selected atmosphere. The height of the housing outlet is at least 5% of the distance the fluid curtain is intended to extend. A screen across the housing outlet disperses the flow from the housing and protects the porous body within the housing from damage by external objects. One end of the tubular body preferably has a cylindrical support which passes through and is supported by an end wall of the housing. The other end of the tubular body has the fluid inlet which passes through and is supported by the other end wall of the housing. The perforations in the tubular body are fine, preferably so that the wall of the tubular body comprises a porous wall. The pore size is from about 0.5 microns to about 100 microns, preferably from about 2 microns to about 50 microns. In operation, flow is controlled to issue from the porous tube in a laminar state with a modified Froude number of from about 0.05 to about 10. The screen may be any perforated surface which produces little pressure drop and protects the diffuser against damage by external objects. Wire mesh with from 1 to 50 openings per centimeter functions well. The mesh covers the housing outlet and the edges of the mesh bend around the housing without any additional sealing requirement to the housing. Surprisingly the screen improves the overall performance of a diffuser in excluding air from entering an opening to a protected volume. In addition to mesh, perforated plates and sintered metal surfaces are usable. Any of these surfaces can be mounted to the housing by the technique described, or by other common techniques such as flush or inlaid mounting, for example.

Claims: An apparatus for processing a workpiece in a selected atmosphere, said apparatus comprising: (a) a processing vessel (10) having: (1) an opening (12) for entry of the workpiece (24); (2) a diffuser (14) with an emitting surface (16) oriented to emit a laminar curtain flow of selected gas across said processing vessel opening (12); (b) a workpiece carrier (26); and (c) means (30) for transferring said workpiece carrier (26) to said processing vessel (10); characterized by (d) a preparation vessel (18) having: (1) an opening (20) congruent with said processing vessel opening (12); and (2) a diffuser (22) with an emitting surface (23) oriented to emit a laminar curtain flow of selected gas across said preparation vessel opening (20); and (e) means for bringing said preparation vessel opening (20) and said processing vessel opening (12) into coincidence; (f) said transferring means (30) being designed for transferring said workpiece carrier (26) from said preparation vessel (18) to said processing vessel (10) when said preparation vessel (20) and said processing vessel opening (12) are in coincidence. The apparatus as in claim 1 wherein said diffusers (14, 22) have emitting surfaces (16, 23) with a transverse width at least 5 % of the distance the curtains are intended to extend, and further comprising means for controlling gas to issue from said emitting surfaces at a modified Froude number in the range of from about 0.05 to about 10, said modified Froude number being defined as: F = Q A ρ e (ρ a -ρ v )gt where Q is the total volumetric flow rate of fluids provided to the diffusers to establish the curtain, A is the area covered by the curtain, ρ e is the mass density of the fluids emitted by the diffusers, ρ a is the density of the atmospheric air contiguous with the curtain, ρ v is the density of the gas within the free volume of the vessel, g is the acceleration of gravity, and t is the thickness of the curtain at its origin. The apparatus as in claim 1 or 2 further comprising an inlet (34) for selected gas in said processing vessel (10), said inlet being located remote from said vessel opening (12). The apparatus as in any one of the preceding claims further comprising an inlet (36) for selected gas in said preparation vessel (18), said inlet being located remote from said vessel opening (20), and an inlet comprising a carrier-arm tube (37) mounted in an end wall of said preparation vessel, one end of said carrier-arm tube protruding from about 0.1 to about 3 carrier-arm tube diameters into said preparation vessel, and the other end protruding from about 2 to about 10 carrier-arm tube diameters outside of said preparation vessel, said carrier-arm tube having an entry for selected gas, and wherein said means (30) for transferring the workpiece carrier (26) from said preparation vessel (18) to said processing vessel (10) includes a carrier-arm passing through said carrier-arm tube. The apparatus as in any one of the preceding claims further including a barrier to gas flow between said diffusers (14, 22) and said vessels (10, 18). The apparatus as in any one of the preceding claims wherein said diffusers (14, 22) are annular and encircle said vessel openings (12, 20). The apparatus as in any one of the preceding claims further comprising an end plate (38) for at least partially closing said processing vessel opening (12) and means for positioning said end plate at said processing vessel opening when the workpiece (24) is in said processing vessel (10). The apparatus as in any one of the preceding claims further comprising a diffuser exhaust gas collector (52) about said processing vessel diffuser (14). The apparatus as in claim 8 further comprising a withdrawal port (56) in said collector (52), said port having a flow resistive media (58) so that when said collector (52) is installed on said vessel (10), said flow resistive media has a frontal area extending over a 45° angle lying in the plane of the vessel opening (12) with its vertex at the center of the vessel opening. The apparatus as in any one of the preceding claims further comprising a diffuser exhaust gas collector (54) about said preparation vessel diffuser (22). The apparatus as in any one of the preceding claims further comprising a diffuser (40) within said processing vessel (10), said diffuser located remote to said processing vessel opening (12), connected to receive selected gas, oriented to emit gas toward the intended workpiece location and said processing vessel opening, and having an emitting surface for issuing a laminar flow of gas. The apparatus as in any one of the preceding claims further comprising a diffuser (44) within said preparation vessel (18), said diffuser located remote to said preparation vessel opening (20), connected to receive selected gas, oriented to emit gas toward the intended workpiece location and said preparation vessel opening, and having an emitting surface for issuing a laminar flow of gas. An apparatus for providing a selected atmosphere for processing of a workpiece, said apparatus comprising: (a) a processing vessel (10) having an opening (12) for entry of the workpiece (24); (b) a workpiece carrier (26) for retaining and carrying the workpiece through the opening into said processing vessel; (c) means (30) for supporting and transporting said carrier; and (d) diffuser means (62, 64) mounted on said workpiece carrier (26) for issuing gas to protect the workpiece against contaminating gases; characterized in that said diffuser means comprises a leading diffuser (64) mounted on the carrier end intended to lead the entry of said carrier (26) into said processing vessel (10), said diffuser having an emitting surface for issuing a laminar flow of gas directed at, or away from, or both at and away from the intended workpiece location; and a trailing diffuser (62) mounted on the carrier end intended to trail during entry of said carrier (26) into said processing vessel (10), said diffuser having an emitting surface for issuing a laminar flow of gas directed at, or away from, or both at and away from the intended workpiece location. The apparatus as in claim 13 wherein said means for supporting and transporting said carrier (26) comprises an arm (30) extending from said carrier end intended to trail during entry of said carrier into said processing vessel (10), and further comprising an end plate (38) mounted on the end of said carrier proximate said arm, said end plate sized to at least partially close the opening (12) in said processing vessel. An apparatus for processing a workpiece in a selected atmosphere, said apparatus comprising: (a) a processing vessel (66) having: (1) an opening (68) for the workpiece (24); (2) a diffuser (82) for issuing a flow of selected gas; (b) a workpiece carrier (78) having a surface (72) for mating with said processing vessel opening; and (c) means for bringing said processing vessel opening (68) and said carrier mating surface (72) into coincidence; characterized in that said processing vessel diffuser (82) is designed and oriented to issue laminarly a curtain flow of the selected gas across said processing vessel opening (68); and said workpiece carrier (78) further has a diffuser (80) with an emitting surface designed and oriented to issue a laminar flow of selected gas across the workpiece carrier at the intended workpiece location. The apparatus as in claim 15 wherein said emitting surfaces each have a transverse width at least 5 % of the distance over which each said curtain is intended to extend, and further comprising means for controlling the flow of selected gas from each of said diffusers (80, 82) to issue at a modified Froude number in the range of from about 0.05 to about 10, said modified Froude number being defined as: F = Q A ρ e (ρ a -ρ v )gt where Q is to total volumetric flow rate of fluids provided to the diffusers to establish the curtain, A is the area covered by the curtain, ρ e is the mass density of the fluids emitted by the diffusers, ρ a is the density of the atmospheric air contiguous with the curtain, ρ v is the density of the gas within the free volume of the vessel, g is the acceleration of gravity, and t is the thickness of the curtain at its origin. A method for providing a selected atmosphere for processing of a workpiece (24) in a processing vessel (10) having an opening (12) for receiving the workpiece and a preparation vessel (18) having an opening (20) congruent with the processing vessel opening, said method comprising: (a) placing the workpiece (24) in said preparation vessel (18); (b) flowing a laminar curtain of selected gas across said preparation vessel opening (20); (c) flowing a laminar curtain of selected gas across said processing vessel opening (12); (d) bringing said preparation vessel opening (20) into coincidence with said processing vessel opening (12); and (e) transferring the workpiece (24) from said preparation vessel (18) into said processing vessel (10). The method of claim 17 further comprising the step of issuing laminarly in the processing vessel (10) a flow of selected gas at the intended workpiece location and toward said opening (12) for the workpiece (24). The method as in claim 17 or 18 wherein said steps of flowing laminar curtain flows comprise issuing curtain flows of selected gas at a modified Froude number of from about 0.05 to about 10, said modified Froude number being defined as: F = Q A ρ e (ρ a -ρ v )gt where Q is to total volumetric flow rate of fluids provided to the diffusers to establish the curtain, A is the area covered by the curtain, ρ e is the mass density of the fluids emitted by the diffusers, ρ a is the density of the atmospheric air contiguous with the curtain, ρ v is the density of the gas within the free volume of the vessel, g is the acceleration of gravity, and t is the thickness of the curtain at its origin.

Inventors: BRESTOVANSKY DENNIS FRANCIS, NOWOTARSKI MARK STEPHEN, PLANTE WALTER, BRESTOVANSKY, DENNIS FRANCIS, NOWOTARSKI, MARK STEPHEN, PLANTE, WALTER (NMN)
Applicants: PRAXAIR TECHNOLOGY INC, PRAXAIR TECHNOLOGY, INC.
Application year: 1992
Main classification: C23C16
IPC codes: H01L21, C23C16, C30B25, C30B31, C30B33