ION VAPOUR DEPOSITION APPARATUS AND METHOD

Abstract: Spectacle lenses are coated by ion vapour deposition by means of sputtering target materials. A plurality of lenses to be coated are introduced into a sputtering chamber by a load lock device, and when in the chamber the lenses are covered by a disc which is rotated at high speed (50/60 rpm). During this rotation alternate targets of magnetrons are sputtered releasing metallic particles which are oxidised by an oxygen plasma created by a third magnetron and metallic oxide coatings are formed on the lenses as alternate layers of different materials. At the end of the operation of coating, which is pre-programmed, the lenses are returned automatically to the load lock device from whence they can be removed. After placement of the lenses in the load lock device the entire process is effected automatically by pressing a button.

Description: Ion Vapour Deposition Apparatus and Method This invention relates to ion vapour deposition (herein IVD by sputtering and relates to a method of and apparatus fo applying coatings by IVD by sputtering. The invention relates further to the application of coating to articles, in particular optical lenses, and also to othe articles of a width to thickness aspect ratio similar t optical lenses. The invention has particular application t optical lenses of the type used in spectacle frames, a which mainly will be corrective lenses, but could be plai lenses and in the interests of clarity reference is ma hereinafter only to lenses which unless the context otherwis demands, are to be understood as being spectacle lenses. The lenses to which the invention applies may be of glass o plastics material. The IVD sputtering process comprises the placement of a article to be coated in a chamber in which is provided cathode target of the coating material. Negative electri bias is applied to the target, and the chamber is filled wit an inert gas, such as argon. Ionisation of the gas take place, and the gas positive ions bombard the target by virtu of being attracted thereto due to the negative electric bia on the target. Sputtering of the target takes place whic is a phenomenon resulting in the release of atoms of th target material into the chamber atmosphere. These atom are caused to impinge upon the surface of the article to b coated and may be induced to deposit on the article by virtu of an electric bias on the article or in the region of th chamber surrounding the article, and so a coating is buil up. The most usual forms of sputtering apparatu (magnetrons) use magnetic fields in conjunction with th target material to enhance the sputtering process. IVD processes are of course well established for man products, and are typically used for metallic products whic require to be coated to a high degree of accuracy, and wher the articles have to be used in controlled environments or i situations where the performance of the articles is critical For example IVD coated articles such as screws, nuts an bolts may be used in the aircraft industry, in militar applications, or in space vehicle applications. The prio devices use a target with one material attached to it Therefore only one single material can be sputtered from th target. The use of IVD for the coating of spectacle lenses is als known but the available machines for such coating require th careful monitoring by skilled personnel; they are not i common use and generally speaking an alternative proces known as evaporation is used for coating the lenses. Coatings on spectacle lenses perform several functions. Firstly, a reflection control coating serves to allow as muc light of wavelength in the visible range through the len into the eye as possible, whilst reflecting as much ligh which is in the harmful wavelength region, such as UV light, from the eye as possible. Other IVD coatings serve t provide a hard protective surface to protect the lenses fro scratching and the like. Generally speaking, the equipment which is used for IV coating of lenses is evaporation equipment and is large an expensive, and requires considerable investment on the par of a processor, and in commercial terms when a person orders a pair of spectacles from an optician, the optician submits the prescription to a lens manufacturer, but the lens manufacturer in turn will pass on the lenses to the IV coating processor who will coat the lenses as required Coating in the conventional machine can take as much as on hour. The present invention arises out of the objective o providing IVD coatings on lenses by sputtering by means of relatively small and inexpensive machine. In accordance with a first aspect of the invention there i provided a sputtering apparatus for the coating of lenses b IVD comprising a shallow cylindrical chamber, a disc holde mounted for rotation in said chamber, said disc having mean for receiving and holding lens holders at the peripher thereof, at least one magnetron and target in communicatio with said chamber to enable the target to be sputtered, mean for creating a vacuum in the chamber, and a load lock devic communicating with the chamber, said load lock devic comprising a magazine for holding lens holders with lense therein, means for isolating the load lock device from th chamber, means for creating a vacuum in the load lock device means for releasing the isolating device when the holders an lenses have been loaded into the load lock device magazin and the vacuum has been created therein, means enabling th holders and lenses to be respectively placed in said mean for receiving, and pre-programmable control means arranged t cause the machine to operate on a pre-programmed sequenc after placement of the holders in the load lock device upo actuation of switch means, to apply at least one coating t the lenses by said at least on magnetron and target as th disc is rotated. Preferably,- there are two of said magnetrons which hav targets of different materials, and the respective magnetron are operated alternately. One of said targets may be silicon whilst the other may b titanium. The disc may be rotated during coating at a spee in the order of 50 revs/min. There may be a third magnetron which is arranged to b operated to establish an oxygen plasma in the chamber durin the coating operations to ensure that coatings of titaniu dioxide and silicon dioxide are laid down, the chamber bein supplied with oxygen at different rates depending upon wheth or not the titanium target or silicon target is sputtering. In one embodiment, the chamber is typically a cylindrica chamber of dimensions in the range 75 cm diameter, and o appropriate height. The chamber preferably has a viewing aperture by which the IVD process being performed therein can be observed. The or each magnetron may be of the form set forth in British Patent No 1453377 with water cooling if required provided by passages therein connected for the supply and return of cooling water. The power source may comprise a high voltage DC or radio frequency AC supply for the charging of the target material. Appropriate connections may be provided for the delivery and exhaust of the ionising gas and the supply of oxygen. The disc may have peripheral notches or locations each adapted to carry a holder for holding a spectacle lens, and the disc being rotatable in the chamber so that lenses held thereby can be moved past the target material in sequence and in order to ensure that the coating material is applied evenly to the lens surface. To enhance the operation, a bias potential may be applied to the disc in order to attrac the coating particles during IVD and improve adhesion. The pre-programmable control means ensures that the load loc device after insertion of the lenses and the sealing close of same, is evacuated until the internal pressure matche that of the treatment chamber, when isolation means i released and the magazine of lenses is then lowered step b step into the chamber and at each step a lens and its holde are removed from the magazine and carried by the disc. Whe all lenses have been received on the disc, the disc is the rotated at relatively high speed, in the order of 50/60 rp whilst the sequential sputtering to be described hereinafte takes place. The IVD can be further enhanced by providing inside th treatment chamber a filament and cathode which ar appropriately biased. The target material magnetrons are arranged spaced an opposite in the chamber, each holding a target material, th sputtering surfaces of the materials, which surfaces ar flat, being in the same plane. The control means may comprise a crystal oscillator of whic the crystal is located in the chamber adjacent the targe materials to detect the rate of sputtering thereby t determine the period during which sputtering should tak place to achieve the predetermined build-up of coating on th articles. The control means is programmed to cause th application of alternate, predetermined thickness layers o the target materials to the articles. The various constructional features enable the machine o each embodiment to provide coatings on lenses in a convenien and simple manner, and such machines can be utilised on "do-it-yourself" basis by lens manufacturers which means tha lenses can be manufactured for use in a shorter time, and th lens manufacturers do not have the inconvenience of having t sub-contract the coating operation. The operation i deskilled compared to the evaporation technique, and eac operation can be started simply by pressing a button; th coating process stops automatically. Embodiments of the invention will now be described, by way o example, with reference to the accompanying diagrammati drawings, wherein:- Fig. 1 is a sectional elevation of a machine according to th embodiment of the invention; Fig. 2 is a perspective view showing the treatment chambe and load lock device of the machine of Fig. 1; Fig. 3 is a plan view of the part of the apparatus shown i Fig. 2; Fig. 4 is a perspective view showing the receiving disc which is contained in the treatment chamber, the view also illustrating the loading magazine; Fig. 5 is a perspective view showing a part of the loading magazine and a lens holder; Fig. 6 is a sectional elevation of the arrangement shown in Fig. 5; Fig. 7 is a perspective view similar to Fig. 4, but showing an alternative embodiment; Fig. 8 is a perspective view of a lens holder for use wit the disc shown in Fig. 7; Figs. 9 and 10 are sectional views of the holder shown i Fig. 8, when holding the lens concave side up and convex sid up respectively; and Fig. 11 is a sectional view of an edge of the disc of Fig. 7 with a lens holder located thereon. Referring to the drawings, the IVD machine illustrate comprises an outer casing 10 having a partition 12 dividin the interior of the casing into a section 14 which ha shelves on which are supported control units 16, 18, 20 an 22. In the other compartment 24 are contained the variou operational components for effecting the drive and variou displacements of the machine which will be as describe hereinafter. On the front of the machine are provided four operatio buttons 26, 28, 30 and 32 whose function will be explaine hereinafter, but it might be mentioned at this time that a advantage of this machine is that it is operated totally b the use of the said four buttons. The casing 10 is of a height to enable adult persons t operate the machine in the manner to be hereinafte described. On the top of the machine is a treatment chamber 34 which i shown in enlarged detail in Fig. 2, and the chamber 34 is i the form of a narrow cylinder of diameter in the order o 75cm, and of height in the order of 20cm. The cylinder lie with its axis vertical, and on the top surface thereof ar three magnetrons 36, 38 and 42 which operate typically in th manner of the sputtering apparatus described in Britis Patent No. 1453377 in that each is adapted to hold a targe material capable of being sputtered. The magnetrons are o course connected to the control units 16 to 22 of th apparatus. Accessing the interior of the cylinder 34 is a load loc device comprising loading chamber cylinder 44 having a lid 4 which can be opened as shown in dotted lines in Fig. 2 t permit the loading thereinto of articles to be IVD treated. The base of the loading chamber 44 is in fact defined by sealing plate 48 which is shown in Fig. 4, so that th interior of the chamber 44 normally is isolated from the interior of the cylinder 34 when treatment is not taking place. The plate 48 is however attached to a displacement rod 50 which is moved by means of a stepping motor as will be hereinafter described so that the plate 48 is capable of being moved into a receiving chamber 52 to the underside of cylinder 34, and in alignment with the chamber 46. The possible movement of displacement rod 50 is indicated by arrow 53 in Fig. 2. Inside the cylinder 34 and coaxial therewith is a rotatable disc 54 as shown in Fig. 4, the disc being rotatable about the axis 56 by a means not shown. The direction of rotation is indicated by arrow 58. The disc 54 has scallops in its edge, namely a single large scallop 60 and a plurality of smaller but evenly spaced and similar sized scallops 62 which are for receiving holders each carrying a spectacle lens to be IVD treated in the cylinder 34. As shown in Fig. 4, the sealing plate 48 has supported thereon a magazine 64 which is in the form of a post 66 as shown in Fig. 5 provided with support shelves 68. Eac support shelf 68 is provided with a groove 70 in which i received a downwardly turned flange 72 of a circular len holder 74. Fig. 6 shows the profile of the lens holder, an in fact shows a lens 76 therein. The lens it is to be note is positioned with its convex side facing upwards i.e towards the magnetrons 36, 38 and 42. The lens holder 7 and the magazine 64 are arranged so that the lens holders ca be positioned in the scallops 62 and when positioned therein the centre of the lens holder will travel on a pitch circl coinciding with the centres of the magnetrons 36, 38 and 42. In order to load the machine with lenses such as lens 76 t be treated, the lenses are first placed in their holders 74 and then the holders are mounted on the mounting plates 68 and then the magazine is loaded to the loading chamber 44 i the correct position in relation to plate 48. In thi connection, there will be a suitable registration mean ensuring that .the magazine is accurately positioned. A this time the disc 54 will be located so that the larg scallop 60 is in register with the plate 48 which will i fact be above the disc plane. When the lenses have bee thus positioned in the loading chamber 44, the loadin operation of the machine is initiated, which as describe hereinafter, comprises simply pressing of an appropriat button 26-32. After pressing of the appropriate button, operation i automatic. In the loading operation, the plate 48 is lo stepping motor by a single step so that it lies under th plane of the disc 54, but so that the bottom lens holder 7 lies above the plane of the disc 54. The disc 58 is the stepped so that the first scallop 62 comes into register wit the bottom holder 74 and stops. The plate 48 is the lowered by a further step which causes the holder 74 to b lifted from the support arm 68 by virtue of flange 74 seating on the portion of the disc surrounding th appropriate scallop 62, and in this connection the disc a the scallop may have a bead to engage behind the turned dow edge 74B of flange 74A to retain the holder on the disc as i rotates in use. The disc steps by another pitch to bring th next scallop 62 into register with the next holder 74 on th magazine, following which the plate 48 is lowered by further step thereby loading the next holder 74 and the len therein onto the disc 54. The process repeats until al lens holders have been positioned on the scalloped disc, a which point the magazine will be lowered into the storag chamber 52. The machine operates in that a vacuum is created inside th chamber of cylinder 34 by machine pumps which are similar i nature to those described in our co-pending paten application PCT/6B90/00195, and an ionising gas such as argo is introduced into the chamber 34 for example throug connection 41 in Fig. 2. This vacuum is maintained at al times, and the condition is indicated by the illumination o a stand-by light. The chamber 44 must be evacuated to th same pressure as inside the chamber 34, before the sealin plate 48 is lowered to connect the interior of the loadin chamber 44 with the interior of the cylinder 34. In thi connection there preferably is an interlock microswitc connected to the lid 46 to ensure that the sealing plate 48 is not lowered until lid 46 is moved to the closed and seale position, and the appropriate vacuum has been created insid the chamber 44. A separate vacuum pump may be provided fo evacuating chamber 44. The depression of the button to commence the loading operation also causes continued and automatic operation of the machine, and in this connection the appropriate button 26-32 would be indicated as convex, meaning convex sid upward as related to the lens position in their holders (se Fig. 6). After the lenses have been loaded, and in accordance with th programming of the machine, the disc 54 starts to spin unti it reaches a speed of 60 rpm. When it reaches this speed, argon is introduced into th chamber 34 and after a short pause oxygen is supplied to th magnetron 42 through inlet 43 (Fig. 2). There is a furthe short pause to enable the pressures to stabilise and then th DC power from one of the controllers 14 to 22 is supplied t the oxygen magnetron 42. Before actuating the othe magentrons 36 and 38, the activation of the oxygen magnetro can be used for providing a plasma to provide a cleanin effect on the lenses prior to deposition of the sputterin material. After this operation, or immediately if no oxygen cleanin effect is required, the magnetron 36 which for example may b provided with a titanium target is switched on so that th rotating lenses are subjected to titanium dioxide deposition The oxygen supply to magnetron 42 is set to match th material being deposited and as magnetron 38 will in th normal circumstances deposit a second metal, so the oxyge control valve 45 (Fig. 2) controlling the supply of oxygen t the magnetron 42 has to be controlled depending upon th metal being deposited. In other words the oxygen supplie to megnetron 42 must match the material being deposited. After a pre-set time, the oxygen valve is adjusted to provid a supply suitable for the deposition of the target materia from magnetron 38, and the magnetron 36 is switched off whilst magnetron 38 is switched on and the target materia therein is sputtered. Typically such target material may b silicon, which is sputtered for a pre-set time period. As each metal is deposited on the lens, it is quickl oxidised by the oxygen plasma provided by magnetron 42 as i must be remembered that the disc 54 is being rotated at th order of 60 rpm so that the appropriate metallic oxide i formed on the lens surface. The process is repeated fo third and fourth cycles as appropriate, and during each cycl different amounts of titanium dioxide and silicon dioxide ma be deposited. Typically, the thinner layers of tin oxid may be created in the initial cycles and in later cycles thicker layers may be created. Typically for coating spectacle lenses, the following no limiting example is given. Target materials: titanium (magnetron 36) silicon (magnetron 38) Disc Speed: Titanium Dioxide deposit: 50 rpm Silicon Dioxide deposit: 50 rpm Deposited each pass:- one atomic layer Gas used for chamber 34. Argon 1st Stage: Titanium dioxide deposit Time: sufficient to deposit 10 mm Tiθ2 2nd Stage: Silicone dioxide deposit Time: sufficient to deposit 30 mm Siθ2 rd Stage: Titanium dioxide deposit Time: sufficient to deposit 110 mm Tiθ2 th Stage: Silicon dioxide deposit Time: sufficient to deposit 90 mm Siθ2 When the requisite number of cycles have been completed, t apparatus automatically moves to a rest position wherein magnetron is energised. The disc 54 seeks a home positio and the magazine 64 is progressively raised with progressi stepping of the disc 54 so that the holders 74 are re-load into the magazine until the plate 48 moves once again in position sealing the lower end of loading chamber 44. Wh this position has been reached, the lid 46 can be raised provide access to the chamber 44 for the removal of t magazine 64 and the treated lenses. Chamber 44 may arranged to be vented before the lid 46 can be raise signalling the end of the coating operation. The magazi and the treated lenses are removed by hand, and the lens are inverted and re-positioned in the magazine 64 so that t concave sides face upwards, and the magazine is re-position in the chamber 44 which is again closed, and the machine operated for the treatment of the opposite sides of t lenses by the depression of one of the buttons on the fro of the machine which is marked "concave" and the machi repeats these steps indicated above except that the treatme periods are adjusted accordingly because the concave surfac of the lenses will be located a further distance from t magnetrons than the convex sides. As to the means and method for the automatic control of t machine, reference is made to the specificatio PCT/GB90/00195. The machine has two DC power supplies for driving the oxyg magnetron 42 on the one hand, and the respective targ material magnetrons 36 and 38 on the other hand. The pow for the magnetrons 36 and 38 is much greater than th required for the magnetron 42, because in the case of t magnetron 42 it is necessary only to provide an oxygen plas for the oxidation stage. This plasma contains 0,0 2 excite O 9 , 0 excited, and 0 and O2 ions, same or all of which caus the oxidation. It is of advantage to use a loading chamber 44 because th main cylinder 34 can be maintained at a low vacuum pressur at all times, which keeps the target materials in bes condition in that the contaminants are prevented fro reaching the target materials. This enables the machine t be operated in a manner requiring only depression of a star sequence button. By arranging for the chamber 34 to b maintained at a lower pressure at all times, the waiting tim which would be required if the main chamber had to b evacuated for each operation, is avoided. The vacuum loading chamber 44 will preferably be associate with the pressure gauge to ensure that the plate 48 is no moved downwards from its sealing position until the pressur inside the chamber 44 is equal to that inside chamber 34. The configuration of the holders and/or disc may be varie and in one variation the lenses are held in the holders b spider type springs, the legs of which engage the edges onl of the lenses to keep the lenses suspended clear of th holders, avoiding any contact with the surfaces to be coated. In another variation, the disc 54 and the holders are of th configuration shown in Figs. 7 to 11. Referring to these figures, in Fig. 7 it will be seen tha the disc 54 is provided only with the single large scallo 60, and in place of the scallop 62 are provided locatio zones 62A, each defined by an arcuate wall 63 and a locatio peg 65, arranged as shown. The relationship of the loading cylinder 44 with the disc 54 is as described in relation to Fig. 4, and the loadin procedure is similar, but the holders 74 in the Figs. 8 to 1 arrangement comprise essentially flat metal discs. Each dis 74 has a registration hole 75 for receipt of an appropriat location pin 65 when the holder is positioned on the disc and additionally, the holder plate 74 is provided with thre equiangularly spaced slots 77 in which are located len retention pins 79 which are adjustable radially relative t the holder plate 74, by means not shown. Such means ma comprise for example a screw threaded bar located to th underside of the plate 74. These pins serve to hold a len 76 which is positioned on the holder plate 74 for receivin the treatment hereinbefore described. Finally the plate 76 has means enabling it to be engaged b and held by the support arm 68 of the magazine loadin mechanism. Such means may comprise apertures 81 fo receiving appropriate pins on the arm 68. Figs. 9 and 10 show that the lens 76 can be placed conve side upwards or concave side upwards to enable both sides o the lens to be treated as hereinbefore described. The advantage of using a flat plate as described wit radially adjustable holding pin 79 is that the lens is no located in a well or recess as it is in the arrangement o Fig. 6. It has been found that by providing a holder a shown in Fig. 6, it sometimes happens that the periphera edge region of the lens surface remains untreated followin the treatment operation, because the wall of the cavity o recess acts as a shadow preventing impingement on th peripheral edge of the lens of the coating material. Thi would also not take place when the spider springs a described hereinbefore are used. Secondly, by the alternative arrangements described it i possible to grip and hold lenses which are of a non-circula shape and plan view. In other words it is possible to trea the lenses after they have been shaped to fit specifi spectacle frames. The loading and treatment operation are essentially a described in relation to the previous figures, although Fig 11 does show how a holder plate 74 is received on the disc 5 at an appropriate location 62A. The location pin 65 locate in the receiving aperture 75, and the arcuate wall 63 i neatly shaped to the edge of the plate 74 so that when th disc 54 is rotated at the relatively high speed of 60 rpm, the holders 74 remain securely in position, and when rotatio of the disc has terminated and the holders 74 are remove from plate 54, the pins on the magazine mechanism arm 68 wil accurately engage in holes 81 and lift the individual holde plates from the disc 54. Reference has been made hereinbefore to the use of titaniu and silicon targets, but it is to be mentioned that targets of any suitable materials such as tantalum, indium, tin, gol and mixtures of these may be used. Also, although the description hereinbefore suggests that the target materials are sputtered alternately, it is possible in some arrangements to provide for simultaneous sputtering targets of different materials. The oxygen may be supplied to the oxygen magnetron 42 through either of two valves for the achievement of different partial pressures of the oxygen depending upon the materials being sputtered. A gas flow controller may be fitted to ensure the automatic supply of oxygen as related to the material being sputtered. The oxygen magnetron 42 in fact uses a target of titanium o carbon or the like driven at a low power as its purpos simply is to create a plasma of oxygen for providing th oxydation referred to herein. The chamber 34 may be provided with a viewing window whereb the IVD process going on inside the chamber can be viewed Such a viewing window may not be necessary especially whe the process is carried out under automatic control, or if th chamber is constructed from glass, which is a possibl embodiment of the invention. There may be provided within the chamber an electron sourc in the form of a hot wire filament under positively biase probe. The use of this filament and probe can raise th ionisation efficiency of the system. As set forth in said PCT application, the chamber 34 may b evacuated using a turbo molecular pump in series with rotary pump. Each magnetron may be as disclosed in said PCT application and/or as disclosed in British Patent 1,453,377, except tha the target material faces downwardly into the chamber 34. Argon is the gas mainly used for the chamber to create th discharge and sputtering. However, for reactive coating argon reactive gas mixtures are used to provide the require reaction. It will be appreciated that appropriate electrical insulatio will be provided in order to ensure the electrical effects For example the drive shaft which rotates the disc 54 will b appropriately insulated. As described in said PCT application, the control of the tim period during which sputtering and deposition is taking plac in relation to the respective targets, may be pre-programme and then controlled automatically for example by utilisatio of an oscillator to monitor the sputtering rate. Indeed any of the features disclosed in said PCT application may b used in conjunction with the embodiment of the presen invention. As in the invention disclosed in said PCT application, th embodiment of the present invention has many advantage including but not limited to the following:- 1. Uniform and adherent multi-layered anti-reflectio coatings can be deposited on both sides of glass or plasti lenses. 2. Many thin layers can be deposited without interruptin the process. 3. By using thermionically assisted triode discharge it i possible to operate at low gas base pressure thus making th process more efficient and less expensive in terms of gas consumption. 4. It is possible to control independently the lens holde bias, gas pressure, reactive gasses pressure and discharge current density. 5. Different reactive gases could be employed to deposit various layers including "hard diamond" coating which is a carbon coating having a hardness similar to that of diamond. 6. Dense coating can be achieved by increasing the ionisation efficiency and lowering the gas pressure. 7. Metals, semi-conductors and insulators could b sputtered using the process. 8. A uniform coating is created on a non uniform shape i.e curved lens.

Claims: CLAIMS 1. A sputtering apparatus for the coating of lenses by IV comprising a shallow cylindrical chamber, a disc holde mounted for rotation in said chamber, said disc having mean for receiving and holding lens holders at the peripher thereof, at least one magnetron and target in communicatio with said chamber to enable the target to be sputtered, mean for creating a vacuum in the chamber, and a load lock devic communicating with the chamber, said load lock devic comprising a magazine for holding lens holders with lense therein, means for isolating the load lock device from th chamber, means for creating a vacuum in the load lock device means for releasing the isolating device when the holders an lenses have been loaded into the load lock device magazin and the vacuum has been created therein, means enabling th holders and lenses to be respectively placed in said mean for receiving, and pre-programmable control means arranged t cause the machine to operate on a pre-programmed sequenc after placement of the holders in the load lock device upo actuation of switch means, to apply at least one coating t the lenses by said at least on magnetron and target as th disc is rotated. 2. Apparatus according to Claim 1, wherein there are two o said magnetrons which have targets of different materials, and the respective magnetrons are operated alternately. 3. Apparatus according to Claim 2, wherein one of sai targets is silicone whilst the other is titanium. 4. Apparatus according to any one of the preceding claims, wherein the disc is adapted to be rotated at a speed in the order of 50/60 rpm. 5. Apparatus according to any preceding claim including further magnetron arranged to operate to establish an oxyg plasma in the chamber during the coating operations to ensu that coatings of the oxides of the target materials are la down. 6. Apparatus according to Claim 5 when taken with Claim 3 wherein the chamber is supplied with oxygen at differe rates depending upon whether or not the titanium target o silicon target is sputtering. 7. Apparatus according to any preceding claim wherein th programme of the control means is for concave/convex lense and wherein said actuator means comprises at least a firs push button which is depressed when the lenses are placed i the holders convex side up and a second push button which i depressed when the lenses are placed in the holders conca side up. 8. Apparatus according to Claim 7, wherein the control mea is set so that following loading of the load lock device wit the holders and lenses and depression of the first or seco button, the following sequence of operations takes plac automatically:- a) deposit of lens holders with lenses on disc; b) rotation of disc; c) operation of magnetron or alternate operation o magnetrons for predetermined time or times and sequence; d) stopping of disc; e) return of holders and lenses to load lock device. 9. A sputtering apparatus for the coating of lense substantially as hereinbefore described with reference to t accompanying drawings. 114 22 10. A method of sputter coating lenses wherein the lenses are loaded in holders into a load lock device which is isolated from a sputtering chamber containing a disc on which the holders are to be placed, creating a vacuum in said chamber, creating a vacuum in said load lock device, connecting the load lock device with said chamber when the said vacuums match, placing the holders and lenses on said disc, rotating the disc whilst sputtering a target which faces into the chamber to cause a coating of the target material to deposit on said lenses stopping the sputtering, returning the holders and coated lenses to the load lock device, isolating the device from the chamber and removing the holders and lenses from the load lock device. 11. A method according to Claim 10, wherein the holders are initially placed on the disc so that the lenses face in one direction relative to the target, and are subsequently placed on the disc to face in the opposite direction relative to the target. 12. A method according to Claim 11, wherein the disc is rotated for a first predetermined time when the lenses face in said one direction and for a second predetermined time when the lenses face in the opposite direction. 13. A method according to any of Claims 10 to 12 wherein two targets of different materials are caused to sputter alternately as the disc rotates, to build up a composite coating of alternating layers of different material. 14. A method of sputter coating lenses substantially as hereinbefore described with reference to the accompanying drawings.

Inventors: ABRAMSON ANTHONY IAN JOSEPH, GALE DERRICK ANDREW, WHITE NORMAN HENRY, ABRAMSON, ANTHONY, IAN, JOSEPH, GALE, DERRICK, ANDREW, WHITE, NORMAN, HENRY
Applicants: ABRAMSON ANTHONY IAN JOSEPH, APPLIED VISION LTD, GALE DERRICK ANDREW, WHITE NORMAN HENRY, ABRAMSON, ANTHONY, IAN, JOSEPH, APPLIED VISION LIMITED, GALE, DERRICK, ANDREW, WHITE, NORMAN, HENRY
Application year: 1992
Main classification: C23C14
IPC codes: C03C17, C23C14