A molded field emission electron emitter employing a diamond coating and method for producing same

Abstract: A field emission electron emitter employing a coating of diamond material (406) disposed on a surface of a layer of conductive/semiconductive material (407) is constructed by a method including the steps of implanting carbon ions (404) at a surface of a selectively shaped substrate (401) to function as nucleation sites for the diamond formation. A conductive layer (407) is deposited over the diamond (406) and the substrate (401) is removed to leave an electron emitter with a diamond coating.

Description: Field of the Invention The present invention relates generally to field emission electron emitters and more particularly to field emission electron emitters and methods of producing field emission electron emitters employing low/negative electron affinity coatings. Background of the Invention Field emission devices employing preferentially shaped conductive/semiconductive electrodes as electron emitters are known in the art. The prior art electron emitters are known to exhibit undesirable characteristics such as high operating voltages, surface instability, and susceptibility to ion bombardment damage. Accordingly there exists a need for electron devices employing an electron emitter/electron source which overcomes at least some of the shortcomings of electron emitters of the prior art. EP-A-0 278 405 describes an electron emission element having a plurality of electrodes each having a conical portion. Summary of the Invention According to a first aspect of the present invention there is provided a method of forming a field emission electron emitter characterized by the steps of: providing a substrate having a major surface containing a formation shaped to define an electron emitter; implanting ions, as nucleation sites, onto the formation shaped to define an electron emitter; growing diamond crystallites at the nucleation sites; depositing a layer of conductive/semiconductive material onto the diamond crystallites; and removing the substrate surrounding the diamond crystallites contained on the formation to expose an electron emitter having a coating of diamond disposed on a conductive/semiconductive layer. In a preferred embodiment, the step of implanting ions includes implanting carbon ions. In another aspect of the present invention there is provided a field emission electron emitter characterized by: a conductive/semiconductive electrode having a major surface containing a formation shaped to define an electron emitter; a plurality of ion implanted carbon nucleation sites disposed on the major surface of the conductive/semiconductive electrode; and at least a diamond crystallite disposed on the major surface of the conductive/semiconductive electrode and at the carbon nucleation sites of the plurality of carbon nucleation sites. In a preferred embodiment, the conductive/semiconductive electrode is formed with a relatively sharp projection having an extended tip and the diamond crystallite is disposed on the extended tip. Preferably, the diamond crystallite includes a substantially uniformly distributed plurality of diamond crystallites Exemplary embodiments of the invention will now be described with reference to the accompanying drawings. Brief Description of the Drawings FIG. 1 is a schematic representation of ion implantation apparatus. FIG.2 is a cross sectional depiction of ion implantation. FIG. 3 is a schematic representation of diamond growing environment apparatus. FIGS. 4A - 4D are side elevational depictions of structures which are realized by performing various steps of a preferred method in accordance with the present invention. FIGS. 5A - 5E are side elevational depictions of structures which are realized by performing various steps of another method in accordance with the present invention. FIGS. 6A - 6E are side elevational representations of structures which are realized by performing various steps of yet another method in accordance with the present invention. Detailed Description of the Preferred Embodiments Referring now to FIG. 1 there is shown a representative schematical depiction of one embodiment of ion implantation apparatus. An evacuated enclosure 101 is provided wherein at least an ion source 106 and a substrate (target) holding fixture 103 are disposed. An ion material source aperture 105 is provided, as shown, to supply the ion source 106 with material. An evacuation port 102 is provided to which an evacuating device, not shown, is operably coupled to evacuate enclosure 101. During operation of the implantation apparatus an ion beam 107 is directed to a target, which in this example is a semiconductor substrate 104, due to an electric field which is induced by a voltage source 108, such that at least some of the ions which comprise ion beam 107 are implanted in substrate 104. FIG. 2 is an enlarged side elevational depiction of substrate 104 wherein ions 201 have been implanted. Ions are selectively implanted to a desired depth in substrate 104 material depending on the strength of the associated accelerating electric field (not shown). Correspondingly, the electric field strength is selected so that implanted ions are substantially disposed at the surface of substrate 104. FIG. 3 is a representative schematical depiction of one embodiment of diamond growing environment apparatus. An evacuated enclosure 301 is provided wherein a substrate (target) holder 305 and a heating element 304 are disposed. A source tube 303, which is a part of a gas supply manifold, provides a source of reactive gas constituents into the diamond growing environment. Enclosure 301 is suitably evacuated by operably coupling an evacuation pump (not shown) to an evacuation port 302. During operation a target, which in this example is a substrate 306, is disposed on target holder 305 to which heating element 304 is also proximally disposed. Power source 307 provides electrical current through heating element 304 to heat substrate 306 and in the presence of appropriate gas constituents a reaction occurs at the surface of substrate 306 during which diamond is grown. Diamond growth is at least partially dependent on an ability to nucleate at the surface of a material. In many methods of diamond formation the nucleation is random and not well distributed giving rise to undesirable and incomplete film growth. Carbon ions implanted at a surface of substrate 306 provide a substantially uniformly distributed plurality of nucleation sites from which diamond growth is initiated. Referring now to FIG. 4A, there is shown an enlarged side elevational depiction of a structure 400 which is realized by performing various steps in accordance with a method of the present invention. Structure 400 includes a selectively shaped supporting layer or layers, hereinafter substrate 401, having a major surface, wherein substrate 401 is selectively shaped by any of many known techniques including, but not limited to, anisotropic etching and ion milling, to provide a selectively shaped region, which in this embodiment is a generally notch shaped depression 402. A carbon ion beam, depicted by arrows 405, provides for implantation of carbon nucleation sites 404 at substrate 401. FIG. 4B is a side elevational depiction of structure 400 having undergone additional steps of the method in accordance with the present invention wherein a source of reactant material, depicted by arrows 420, disposed in an intervening region between substrate 401 and a proximal heating element (304 in FIG. 3) gives rise to growth of a diamond crystallite coating 406 preferentially at the implanted carbon nucleation sites. FIG. 4C is a side elevational depiction of structure 400 having undergone an additional step of the method wherein a layer of conductive/semiconductive material 407 is deposited onto any exposed part of the major surface of substrate 401 and onto diamond crystallite coating 406. Conductive/semiconductive material 407 is deposited so as to fill depression 402 with a projection 408. FIG. 4D is a side elevational depiction of structure 400 having undergone an additional process step in accordance with the method of the present invention wherein at least some of substrate 401 has been removed. Removal of substrate 401 material effectively exposes the layer of conductive/semiconductive material 407, and especially exposes projection 408, on which is disposed diamond crystallite coating 406. It should be understood that the material or materials of substrate 401 and the conductive/semiconductive material 407 are chosen so that substrate 401 can be relatively easily removed, by some method such as etching, dissolving or the like, without substantially effecting crystallite coating 406 or conductive/semiconductive material 407. The resultant structure, which includes a coating of diamond, comprises a field emission electron emitter exhibiting a number of desirable operating characteristics including reduced voltage operation, improved surface stability, and reduced susceptability to ion bombardment damage. Incorporation of implanted carbon nucleation sites provides a mechanism for improved diamond crystallite coverage and discourages the formation of a non-uniform coating which may include undesirably large crystallite growth. FIG. 5A is an enlarged side elevational depiction of a structure 500 which is realized by performing steps of another method in accordance with the present invention. A supporting layer or substrate 501 having a major surface is provided. A layer of patternable material 509, such as photoresist or insulator material, is disposed on substrate 501. Subsequently, layer of patternable material 509 is selectively exposed and developed to provide at least one aperture 503 through which selective anisotropic shaping of substrate 501 is performed to provide a selectively shaped region, which in this embodiment is a generally notch shaped depression 502. A carbon ion beam, depicted by arrows 505, provides for implantation of nucleation sites 504 in depression 502 of substrate 501. FIG. 5B is a side elevational depiction of structure 500 showing layer of patternable material 509 removed subsequent to the implantation of nucleation sites 504. FIG. 5C is a side elevational depiction of structure 500 having undergone additional steps of the method wherein a source of reactant material, depicted by arrows 520, disposed in an intervening region between substrate 501 and a proximal heating element (see FIG. 3), gives rise to growth of diamond crystallite 506 preferentially at the implanted carbon nucleation sites. FIG. 5D is a side elevational depiction of structure 500 having undergone an additional step of the method wherein a layer of conductive/semiconductive material 507 is deposited onto any exposed part of the major surface of substrate 501 and onto diamond crystallite 506. Conductive/semiconductive material 507 is deposited so as to fill depression 502 with a projection 508. FIG. 5E is a side elevational view of structure 500 having undergone an additional step of the method of the present invention wherein at least some of substrate 501 has been removed. Removal of substrate 501 material effectively exposes the layer of conductive/semiconductive material 507, and especially exposes projection 508, on which is disposed diamond crystallite 506. Utilizing implanted nucleation sites from which diamond crystallite growth may be initiated provides for a more uniform coating. Since coating thicknesses of the order of 10Å to less than 5000Å are desirable it is an important feature of coating formation that irregularities in coating thickness and coverage be minimized. Other methods of realizing diamond film growth do not provide for substantially uniform growth thickness and coverage. FIG. 6A is a side elevational depiction of a structure 600 constructed by yet another method in accordance with the present invention. Structure 600 is similar to structure 500 described previously with reference to FIG. 5B, wherein similar features initially described in FIG. 5B are similarly referenced beginning with the numeral "6". FIG. 6A further depicts a low angle material evaporation employed to deposit material 610 onto a substrate 601 so that a selectively shaped region 602 of substrate 601 is partially closed over. FIG. 6A further illustrates an ion beam, depicted by arrows 605, from which carbon nucleation sites 604 are implanted in selectively shaped region 602 of substrate 601 and substantially at a preferred part of selectively shaped region 602, in this specific embodiment the tip of the notch. FIG. 6B depicts structure 600 having undergone an additional process step wherein material 610 has been removed. FIG. 6C is a side elevational depiction of structure 600 having undergone additional steps of the method wherein a source of reactant material, depicted by arrows 620, disposed in an intervening region between the substrate 601 and a proximal heating element (see FIG. 3), gives rise to growth of diamond crystallite 606 preferentially at the implanted carbon nucleation sites. In the instance of the structure of FIG. 6C the crystallite growth takes place preferentially on only a part of the exposed surface of substrate 601 and, more specifically, in the extreme tip of selectively shaped region 602. FIG. 6D is a side elevational depiction of structure 600 having undergone an additional step of the method wherein a layer of conductive/semiconductive material 607 is deposited onto any exposed part of the major surface of substrate 601 and onto diamond crystallite 606. Conductive/semiconductive material 607 is deposited so as to fill selectively shaped region 602 with a projection 608. FIG. 6E is a side elevational view of structure 600 having undergone an additional step of the method of the present invention wherein at least some of substrate 601 has been removed. Removal of substrate 601 material effectively exposes the layer of conductive/semiconductive material 607, and especially exposes projection 608, on the tip of which is disposed diamond crystallite 606. The methods described provide for electron emitter structures which, when employed in field emission devices, exhibit operating characteristics not attainable by means known in the prior art. Field emission devices employing electron emitters, formed by methods of the present invention, provide for improved operation, increased stability, and longer lifetime devices. The diamond coating, of the electron emitter, exhibits a much lower work function, derived from an inherent low/negative electron affinity, and a more stable crystalline structure than may be realized by using materials previously employed for electron emitters.

Claims: A method of forming a field emission electron emitter characterized by the steps of: providing a substrate (401) having a major surface containing a formation (402) shaped to define an electron emitter; implanting ions, as nucleation sites (404), onto the formation (402) shaped to define an electron emitter; growing diamond crystallites (406) at the nucleation sites (404); depositing a layer of conductive/semiconductive material (407) onto the diamond crystallites (406); and removing the substrate (401) surrounding the diamond crystallites (406) contained on the formation (402) to expose an electron emitter having a coating of diamond (406) disposed on a conductive/semiconductive layer (407). The method of claim 1, wherein the step of implanting ions includes implanting carbon ions (404). The method of claim 1 or 2, wherein the step of providing a substrate includes anisotropically etching a substrate of semiconductor material to provide the formation (402) shaped to define an electron emitter. The method of claim 1 or 2, wherein the step of providing a substrate includes ion milling of the substrate material to provide the formation (402) shaped to define an electron emitter. A field emission electron emitter characterized by: a conductive/semiconductive electrode (407) having a major surface containing a formation shaped to define an electron emitter; a plurality of ion implanted carbon nucleation sites (404) disposed on the formation of the conductive/semiconductive electrode (407); and at least a diamond crystallite (406) disposed on the major surface of the conductive/semiconductive electrode (407) and at the carbon nucleation sites of the plurality of carbon nucleation sites (404). A field emission electron emitter as claimed in claim 5, wherein the conductive/semiconductive electrode is formed with a relatively sharp projection (408) having an extended tip and the diamond crystallite (406) is disposed on the extended tip. A field emission electron emitter as claimed in claim 5 or 6, the diamond crystallite includes a substantially uniformly distributed plurality of diamond crystallites

Inventors: JASKIE JAMES E, KANE ROBERT C, JASKIE, JAMES E., KANE, ROBERT C.
Applicants: MOTOROLA INC, MOTOROLA, INC.
Application year: 1992
Main classification: H01J9
IPC codes: H01J9, H01J1, G01Q70