Method of manufacturing an alumina coated sintered body

Abstract: According to the invention there is now provided a sintered hard material body at least partly coated with at least one 0.5-20 µm wear resistant ceramic oxide coating being <80% thicker in the edges than on the flat surfaces. The oxide coating exhibits a grain size (⊘) in µm for which: ⊘ ≦ kx + 1 where x is coating thickness in µm on at least 80% of the flat surfaces of the body, k = 0.5, preferably 0.3 and 1 = 2 µm for 4≦x<20 and 1=0 for 0.5<x<4. The oxide coating is achieved by using a deposition process in which the body is in contact with a gas containing one or more halides of a metal or metals and a hydrolysing and/or oxidizing agent forming the metal oxides and with an additional reactant (dopant) of sulphur, phosphorus, selenium, tellurium, arsenic, antimony and/or bismuth and/or compounds thereof. The temperature during deposition is in the range of 800-1000°C, preferably 850-970°C, and the volume concentration of the additional reactant is 0.25-3, preferably 0.3-1 % of the total gas volume.

Description: The present invention relates to a method of manufacturing a sintered body of cemented carbide or similar material coated with at least one thin, wear resistant, extremely finegrained surface layer of ceramic oxides, preferably aluminium oxide (alumina) and method of manufacturing the same. It is well known that for, e.g., a cemented carbide cutting tool insert used in metal machining, the wear resistance can be considerably increased by applying hard surface layers of metal oxides, carbides or nitrides with the metal either selected from the transition metals of the groups IV, V and VI of the Periodic Table or from silicon, boron and aluminium. The coating thickness usually varies between 0.1 and 20 µm and the most common technique for depositing such coatings, is CVD (Chemical Vapour Deposition). It is also known that further improvements of the performance of a cutting tool can be achieved if a plurality of coating combinations with double, triple or multilayer structures is deposited on the substrate. A substantial improvement of the wear resistance is obtained if a layer of aluminium oxide, Al 2 O 3 , or zirconium oxide, ZrO 2 , is incorporated in the layer structure or if it is deposited on top of layers of metal carbides, nitrides, oxides and borides or combinations thereof with the metal atoms chosen from Ti, Zr, Hf, V,Nb, Ta, Cr, Mo, W, Si, and, where applicable, B. The first Al 2 O 3 -coating patents (Lux US-A-3 836 392, Hale US-A-3 736 107) were mainly concerned with the deposition of Al 2 O 3 directly onto cemented carbide bodies without using intermediate deposited coatings of e.g. TiC, TiN or TiCON. The use of intermediate deposited coatings, between the cemented carbide body and the outer alumina coating, was first suggested in Lindström US-A-3 837 896. Alumina, Al 2 O 3 , crystallizes in several different polymorphs. The two most often occurring polymorphs in CVD coatings deposited onto cemented carbides at standard CVD temperatures, 1000-1050°C, are the stable alpha and the metastable kappa phases. The alpha phase generally appears on cemented carbide surfaces or e.g. on an underlying TiC-coating, as coarse, protruding grains or as clusters of coarse grains with a diameter of 10-100 µm, whereas the metastable kappa phase is more fine-grained with a grain size approximately ranging from 3 to 6 µm depending on the total alumina coating thickness. The alumina coating generally consists of 5-95 % alpha phase. Quite often cracks appear in and around the alpha phase grains or clusters. The protruding, large alpha grains have a higher tendency to spall off the cutting tool substrate than the finer kappa grains during a cutting operation. This bimodal grain structure also results in an uneven surface topography causing a variation in optical appearance as well as in cutting performance. An improvement of the surface topography can be obtained if the Al 2 O 3 growth process is repeatedly interrupted by e.g. a very short TiC or TiN process step in accordance with previously known techniques (Lindström-Ohlsson GB-A-1389140, Dreyer GB-A-2048960, Schintlemeister US-A-4 599 281, Yamamoto JP52-133782). This multi-sandwich-technique causes a grain refinement in the alumina coating. However, this structure often shows limited internal adhesion between the individual alumina sublayers. In Smith US-A-4 180 400, a method of controlling and producing alumina coatings consisting of at least 85 % of the metastable kappa phase is described. This method, however, does not allow for an enhancement of the growth rate of the coating. In the development of CVD processes of Al 2 O 3 , there is a desire to find means for producing well-adherent, topographically smooth and fine-grained coatings of sufficient thickness for wear purposes. Further requirements of the coating are: satisfactory cohesion with a minimum of defects, porosity and cracks, even coating thickness around the entire substrate, corners, edges and plane surfaces. Smith US-A-4 619 866 ≡ EP-A-0 045 291 describes a method for producing fast growing Al 2 O 3 layers by utilizing a hydrolysis reaction of a metal halide under the influence of a dopant e.g. hydrogen sulphide (H 2 S) in the concentration range 0.01-0.2 % (as given in the patent examples) at a CVD deposition temperature 1000-1050°C (as given in the patent examples). Under these process conditions, essentially two phases of Al 2 O 3 , the alpha and the kappa phases, are produced. The resulting coating consists of a mixture of the smaller kappa grains and the larger alpha grains. The process yields coatings with an even layer thickness distribution around the coated body. During conventional, thermal CVD of alumina at 1000-1050°C, both kappa- and alpha-Al 2 O 3 are nucleated and grown. As described in Chatfield US-A-5 071 696 ≡ EP-A-0 403 461 the kappa phase is nucleated and grown epitaxially on the substrate layer which is often a TiC or a TiCON type coating. This results in a satisfactory coating adherence. The alpha-Al 2 O 3 -phase is believed to nucleate on an oxidized substrate surface area, e.g. on Ti 2 O 3 or Ti 3 O 5 . During the deposition period, these oxides are believed to convert back to the lower oxide TiO or to TiCO and due to the concomitant volume contraction, interfacial pores will be created resulting in a weakened coating adhesion. Furthermore, it has been shown that during post heat treatment of the coating, and presumably also during the coating period itself, at a temperature of 1000-1050°C, the metastable kappa phase may transform into the alpha phase, Chatfield US-A-5 071 696. At lower deposition temperatures, preferably 900-950°C, this transformation will be very slow. Hence, a lower deposition temperature would thus be one of the necessary conditions for growing and sustaining the finegrained kappa or other fine-grained, metastable Al 2 O 3 phases during the entire deposition period. A lower deposition temperature also decreases the rate of potential surface oxidation leading to alpha nucleation. Up to this date, there has not been reported any reliable method for successfully depositing hard, adherent, high-quality alumina coatings in the desired low-temperature region, e.g. below 1000°C and, in particular, below 950°C. When deposition of alumina is carried out by known methods below 950°C, only very thin, powdery deposits are obtained. A low process temperature during the alumina deposition has been mentioned in previous patents but only in connection with very thin coatings and while utilizing very different CVD processes e.g. with Al-metallo-organic compounds as reactants, or e.g. with H 2 O as the oxygen source e.g. Lux US-A-3 836 392. This type of processes is not being used for commercial coating of cemented carbides. According to the invention there is now provided a method for depositing and producing high-quality, well-adherent thin (0.5-4 µm), or preferably thick (4-20 µm) ceramic oxide coatings with a high growth rate. The coatings have an evenly distributed layer thickness around the entire coated body and a smooth coating surface and fine grain size. The deposition process temperature can range from 850 to 970°C or preferably from 900 to 950°C. During the deposition process said body is in contact with a gas containing one or more halides of a metal or metals and a hydrolysing and/or oxidizing agent forming the metal oxides and with an additional doping reactant with a concentration of 0.4-0.8 % of the total gas volume being used during the CVD process. The additional reactant is preferably sulphur and/or phosphorus or a compound of these but can equally well be selenium, tellurium, arsenic, antimony or bismuth or compounds and/or mixtures of all these reactants. Examples of such reactants or dopants are hydrogen sulphide (H 2 S), phosphorus chloride (PCl 3 ), carbon oxysulphide (COS) and phosphine (PH 3 ). Preferably hydrogen sulphide is used. Hence, the use of higher concentration of the additional dopant (reactant) in combination with lower process temperature than were actually employed in Smith 4,619,866 a smooth, high-quality, well-adherent ceramic oxide coating can be successfully grown. Furthermore, the grain-size of the coating can be controlled by carefully varying the dopant concentration and/or the temperature during the nucleation step and during the subsequent growth period. Preferably, the ceramic oxide is Al 2 O 3 and/or ZrO 2 . Most preferably the ceramic oxide is Al 2 O 3 consisting essentially, preferably of more than 85%, of the kappa phase or other metastable modification. The kappa-to-alpha ratio can be controlled in the same way as the grain size as indicated above. If coatings less than 4 µm in thickness are produced according to the invention, still finer-grained coatings will result as compared to coatings produced by prior-art CVD-processes. The grain size Ø in µm, can be expressed as follows: Ø ≤ kx where x is coating thickness in µm on at least 80% of the flat surfaces of the body and k = 0.5, preferably 0.3 and most preferably 0.15. In the lower temperature region, 850-950°C, and with a fairly high volume concentration of dopant (0.5-2%) in the process gas, thick(4-20 µm), fine-grained, preferably < 2 µm, 100 % kappa Al 2 O 3 coatings can readily be grown. The grain size Ø in µm, can be expressed as follows: Ø ≤ kx + 2 where x is coating thickness in µm on at least 80% of the flat surfaces of the body and k = 0.5, preferably 0.3 and most preferably 0.15. Within the fine-grained coating manufactured according to this invention, occasionally some larger grains can be present. In some cases these large grains may cover up to 10 % of the coated surface. The growth of these large grains may be caused by impurities or dust particles that occasionally are present in the CVD process gas. The larger grains may also originate from oxidized micro-spots on the underlying surface as was discussed previously. In accordance with known technique a coating manufactured according to the invention can be used as a single coating or be deposited on e.g. TiC or TiCON intermediate layers. Further coatings can be deposited on top of the ceramic coating, e.g. TiN and the oxide coating of the present invention can be used within a multicoating structure. Preferably, an innermost layer with a thickness of 0.5-10 µm and comprising at least one member selected from the group consisting of the carbides, nitrides, carbonitrides and oxycarbonitrides of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W or B is used. The products produced according to the invention, include inserts for cutting tools made of cemented carbides, cermets or ceramics, furthermore end mills, drills, reamers, broaches and general wear parts made of steel, high speed steel, cemented carbide, cermets and ceramics. When fine-grained Al 2 O 3 coated cemented carbide cutting tools according to the invention are used in metal machining, several important improvements have been observed: 1) The absence of coarser grains improves the flaking resistance of the tool and also the abrasive wear resistance. This seems to be particularly important in milling operations. 2) The fine-grained kappa alumina layer is less sensitive to chip hammering on the tool surface. See example 1. 3) A fine-grained, smooth alumina coating makes it easier to stay within closer dimensional tolerances of the cutting tool. Example 1 An alumina coating with an intermediate layer of TiC was deposited in a reactor, the essential parts of which were made of Inconel. In this reactor, 3000 sintered cemented carbide inserts were heated to 1000°C. The inserts to be coated were of different grades, among them inserts containing 5.5% Co, 2,6% TiC, 6,2% TaC/ NbC and balance WC. The inserts were placed on precoated metal nets providing good contact with the surrounding process gas, which consisted of a mixture of 6%TiCl 4 , 5% CH 4 and 89% H 2 by volume (Run No. 1). The pressure in the reactor was maintained at 5 kPa. The linear gas velocity in the batch of inserts was 1 m/sec. The inserts were treated for 6 hours. As a result of the treatment, a fine-grained TiC layer of about 6 µm thickness was obtained. In a separate deposition run, 3000 inserts of a different grade containing 8% Co and balance WC, were coated with TiCN and TiN, 1 µm of each compound, in a sequence according to known technique (Run No. 2). N 2 gas was used as the nitrogen source. Half amount of the inserts (1500 + 1500) from the two deposition runs described above, were treated in an apparatus nearly identical to the one described above. A reaction gas with the composition 5% CO 2 , 3% AlCl 3 , 0,4% H 2 S, 2% HCl and balance H 2 were supplied. The gases were introduced sucessively during a time span of 2 hours, H 2 S being the last gas introduced. The temperature in the reactor was 940°C and the pressure 5 kPa. The linear gas velocity in the reactor batch was 3 m/sec. After a deposition time of 7 hours, a 4-5 µm thick layer of Al 2 O 3 was formed on the TiC or TiCN/TiN coated inserts. The remaining 3000 inserts from runs 1 and 2 were coated with Al 2 O 3 according to prior art i.e. at a reactor batch temperature of 1050°C and using only 0,1% H 2 S. All other conditions remained the same. A 4-5 µm coating thickness was obtained but coarse grained areas covered at least 20% of the total area of the inserts. Inserts produced according to the invention had fine grains of Al 2 O 3 in the coating, with occasional inclusions of very oblong fine grains believed to contain Ti-Al-C phases. A continuous turning test in cast iron, SIS 0125 (composition C =3.4%, Si = 1.5%, Mn = 0.7%) with hardness HB=220 was performed with the following data: Cutting speed: 200 m/min Feed: 0.3 mm/rev Depth of cut: 2 mm Insert style: SPUN 120308 The tool life, measured according to current standards, was estimated as follows: Grade corresponding to Tool life, minutes 1 5,5% Co, uncoated 8 2 5,5% Co, TiC (5 µm) only 23 3 5,5% Co, TiC + Al 2 O 3; prior art Al 2 O 3 (6 µm + 4.5 µm) 55 4 5,5% Co, TiC + Al 2 O 3; this invention, (6 µm + 4,5 µm) 950°C and 0.4% H 2 S 65 From these results, it is evident that the insert produced according to the invention, gives a superior tool life as compared to the other coated inserts. In another intermittent cutting test, especially designed to assess the flaking tendency on the edge line of the cutting tool when being used in machining of nodular cast iron, the inserts with alumina coatings corresponding to No 3 and 4 in the above table, but with TiCN/TiN as intermediate coatings, were tested. It could readily be seen that the insert according to the invention, No 4, was much less worn than the prior art insert, No 3. Example 2 (Run No. 1) Commercial cemented carbide inserts of composition 5.5% Co, 2.6% TiC, 6.2% TaC/NbC and balance WC were coated in a reactor similar to the one described in example 1. However, this reactor could be loaded with a significantly larger amount of inserts (up to 16 000 inserts). The inserts were sequently coated with TiC (1 µm), TiCN (4 µm) and Al 2 O 3 (6 µm). For the TiC process, a gas composition of 4% TiCl 4 and 6% CH 4 was used at 1030°C and for the TiCN process, a gas composition of 4% TiCl 4 , 6% CH 4 and 15% N 2 at 1030°C was used. Prior to the Al 2 O 3 deposition start, the process temperature was reduced to 960°C. Al 2 O 3 was then deposited for 8 hours with a reaction gas containing 5% CO 2 ,3% AlCl 3 and 0.4% H 2 S. (Run No. 2) The TiC and TiCN depositions were identical to those inrun No 1. Prior to the Al 2 O 3 deposition start, the temperature was increased to 1040°C and Al 2 O 3 was deposited for 5.5 hours with a gas composition of 5% CO 2 , 3% AlCl 3 and 0.25% H 2 S. The metallurgical investigation showed that inserts from Run No. 1 exhibit a smooth, fine-grained Al 2 O 3 coating of 100 % kappa phase (according to XRD), whereas inserts from Run No. 2 had a mixed grainstructure, both large grains and smaller grains. XRD shows 100 % alphaphase. Tool inserts from run No 1 and No 2 were compared in a cutting operation machining ball bearing rings in which severe chip hammering of the tool surface occurs. The following results were obtained: Insert from run No. Produced pcs of ball bearing rings Tool failure criterium 1 66 worn out 2 5 edge breakage It is presumably the inherent cracks and porosity in the alpha Al 2 O 3 coating obtained in run No 2 that are responsible for the early breakage of the cutting edge and the reduced tool life observed in the test.

Claims: Method of coating a sintered hard material body at least partly with at least one 0.5-20 µm wear resistant ceramic oxide coating being <80% thicker in the edges than on the flat surfaces by a deposition process in which said body is in contact with a gas containing one or more halides of a metal or metals and a hydrolysing and/or oxidizing agent forming the metal oxides and with an additional doping reactant of sulphur, phosphorus, selenium, tellurium, arsenic, antimony and/or bismuth and/or compounds thereof the process conditions being further characterized by a temperature during deposition in the range of 850-970°C and a volume concentration of said additional reactant of 0.4-0.8 % of the total gas volume. Method according to claim 1 characterized in that the extra reactant is hydrogen sulphide. Method according to the preceding claim 1 or 2 characterized in that the ceramic oxide is Al 2 O 3 and/or ZrO 2 .

Inventors: LINDSTROEM JAN, LJUNGBERG BJOERN, SJOESTRAND MATS, LINDSTROEM, JAN, LJUNGBERG, BJOERN, SJOESTRAND, MATS, Lindström, Jan, Ljungberg, Björn, Sjöstrand, Mats
Applicants: SANDVIK AB, SANDVIK AKTIEBOLAG
Application year: 1992
Main classification: C23C16
IPC codes: C04B41, C23C16, B23B27, B23P15, C23C8, B32B9, B32B18